TWI800495B - 黑色感光性樹脂組合物，以及由其衍生的有機發光元件、量子點發光元件及顯示裝置 - Google Patents

黑色感光性樹脂組合物，以及由其衍生的有機發光元件、量子點發光元件及顯示裝置 Download PDF

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Publication number
TWI800495B
TWI800495B TW106143171A TW106143171A TWI800495B TW I800495 B TWI800495 B TW I800495B TW 106143171 A TW106143171 A TW 106143171A TW 106143171 A TW106143171 A TW 106143171A TW I800495 B TWI800495 B TW I800495B
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TW
Taiwan
Prior art keywords
light emitting
emitting device
quantum
resin composition
sensitive resin
Prior art date
Application number
TW106143171A
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English (en)
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TW201841061A (zh
Inventor
朴聖基
金勳植
Original Assignee
南韓商東友精細化工有限公司
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Publication of TW201841061A publication Critical patent/TW201841061A/zh
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Publication of TWI800495B publication Critical patent/TWI800495B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)
TW106143171A 2017-02-09 2017-12-08 黑色感光性樹脂組合物，以及由其衍生的有機發光元件、量子點發光元件及顯示裝置 TWI800495B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
KR10-2017-0018323 2017-02-09
KR1020170018323A KR102622857B1 (ko) 2017-02-09 2017-02-09 유기발광소자 및 양자점발광소자의 화소정의막 형성용 흑색 감광성 수지 조성물
??10-2017-0018323 2017-02-09

Publications (2)

Publication Number Publication Date
TW201841061A TW201841061A (zh) 2018-11-16
TWI800495B true TWI800495B (zh) 2023-05-01

Family

ID=63125625

Family Applications (1)

Application Number Title Priority Date Filing Date
TW106143171A TWI800495B (zh) 2017-02-09 2017-12-08 黑色感光性樹脂組合物，以及由其衍生的有機發光元件、量子點發光元件及顯示裝置

Country Status (4)

Country Link
JP (1) JP2018129292A (zh)
KR (1) KR102622857B1 (zh)
CN (1) CN108415220A (zh)
TW (1) TWI800495B (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102300328B1 (ko) * 2017-03-29 2021-09-09 동우 화인켐 주식회사 흑색 감광성 수지 조성물, 이를 이용하여 제조된 표시 장치
KR20220042541A (ko) 2020-09-28 2022-04-05 함호상 신뢰도 향상을 위한 그린 부동산시스템
CN115433486B (zh) * 2021-06-02 2023-12-05 广东聚华印刷显示技术有限公司 印刷油墨、发光器件及显示器件

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011099918A (ja) * 2009-11-04 2011-05-19 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物、塗膜、パターン及び表示装置

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JP2008031248A (ja) * 2006-07-27 2008-02-14 Daicel Chem Ind Ltd 硬化性樹脂組成物及び硬化塗膜の形成方法
TWI582174B (zh) * 2012-06-11 2017-05-11 住友化學股份有限公司 著色感光性樹脂組成物
CN104298074B (zh) * 2013-07-19 2019-11-01 东友精细化工有限公司 透明像素形成用感光性树脂组合物及使用其形成的滤色器
KR20150072581A (ko) 2013-12-20 2015-06-30 주식회사 이그잭스 폴리실록산을 함유한 감광성 수지 조성물
CN106031306B (zh) * 2014-02-18 2018-05-22 旭硝子株式会社 负型感光性树脂组合物、树脂固化膜、分隔壁和光学元件
KR101987107B1 (ko) * 2014-03-31 2019-06-10 동우 화인켐 주식회사 착색 감광성 수지 조성물 및 이로부터 제조되는 컬러 필터
JP6536578B2 (ja) * 2014-07-18 2019-07-03 Ａｇｃ株式会社 ネガ型感光性樹脂組成物、樹脂硬化膜、隔壁、光学素子および光学素子の製造方法
KR101609234B1 (ko) * 2015-01-13 2016-04-05 동우 화인켐 주식회사 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치
KR101611836B1 (ko) * 2015-01-13 2016-04-12 동우 화인켐 주식회사 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치
KR102116971B1 (ko) * 2015-01-23 2020-06-02 삼성디스플레이 주식회사 감광성 수지 조성물 및 표시장치
KR20160091646A (ko) * 2015-01-26 2016-08-03 동우 화인켐 주식회사 감광성 수지 조성물, 이로부터 형성된 광경화 패턴 및 이를 포함하는 화상 표시 장치
KR20160094668A (ko) * 2015-02-02 2016-08-10 동우 화인켐 주식회사 착색 감광성 수지 조성물, 이로써 제조된 컬럼 스페이서 및 이를 구비한 액정 표시 장치
KR20160114362A (ko) * 2015-03-24 2016-10-05 동우 화인켐 주식회사 컬러필터 및 화상표시장치
KR102491715B1 (ko) * 2015-03-27 2023-01-25 미쯔비시 케미컬 주식회사 착색 수지 조성물, 컬러 필터, 및 화상 표시 장치
KR102206015B1 (ko) * 2015-03-27 2021-01-20 동우 화인켐 주식회사 적외선 투과 감광성 수지 조성물
KR102561735B1 (ko) * 2015-03-30 2023-07-31 스미또모 가가꾸 가부시키가이샤 착색 감광성 수지 조성물

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011099918A (ja) * 2009-11-04 2011-05-19 Sumitomo Chemical Co Ltd 着色感光性樹脂組成物、塗膜、パターン及び表示装置

Also Published As

Publication number Publication date
TW201841061A (zh) 2018-11-16
CN108415220A (zh) 2018-08-17
KR20180092529A (ko) 2018-08-20
KR102622857B1 (ko) 2024-01-10
JP2018129292A (ja) 2018-08-16

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