TWI761943B

TWI761943B - Rotary vehicle

Info

Publication number: TWI761943B
Application number: TW109130603A
Authority: TW
Inventors: 許哲維; 徐慶吉; 唐肇蔚
Original assignee: 凱爾迪科技股份有限公司
Priority date: 2020-09-07
Filing date: 2020-09-07
Publication date: 2022-04-21
Also published as: TW202211365A

Abstract

本發明係一種旋轉載具，其包含一主基座盤，主基座盤包含一主頂面及一主底面，主頂面環繞間隔凸設有複數主限位銷，主頂面凹設有一主結合槽及一主斜面，主結合槽的槽底貫穿有一第一流道及複數第二流道，主斜面環繞間隔凸設有複數主凸肋；一次基座盤，其外徑小於主結合槽的內徑，次基座盤包含一次頂面及一次底面，次頂面環繞間隔凸設有複數次限位銷，次頂面凹設有一次結合槽及一次斜面，次結合槽的槽底貫穿有一次流道，次流道與第一流道相連通，次斜面環繞間隔凸設有複數次凸肋，次基座盤容置於主結合槽內且次底面貼靠於各主凸肋，次基座盤的外緣與主斜面之間形成一主出氣口；一固定盤，其外徑小於次結合槽的內徑且容置於次結合槽內，固定盤的外緣與次斜面之間形成一次出氣口；當本發明放置晶圓時，藉由提供氣體從第一流道或第二流道流入，並從主出氣口或次出氣孔吹出，達到晶圓底面正壓氣源所圍繞形成的空間產生負壓氣場，由負壓氣場達到吸住並固定晶圓之功效。The present invention relates to a rotating carrier, which comprises a main base plate, the main base plate includes a main top surface and a main bottom surface, the main top surface is surrounded with a plurality of main limit pins, and the main top surface is concavely provided with a plurality of main limit pins. The main combining groove and a main inclined surface, the bottom of the main combining groove has a first flow channel and a plurality of second flow channels, and the main inclined surface is surrounded by a plurality of main convex ribs at intervals; the primary base plate, the outer diameter of which is smaller than the main combining groove The inner diameter of the secondary base plate includes a primary top surface and a primary bottom surface, the secondary top surface is surrounded by spaced convexes with a plurality of secondary limiting pins, the secondary top surface is concavely provided with a primary bonding groove and a primary inclined surface, and the groove bottom of the secondary bonding groove runs through There is a primary flow channel, the secondary flow channel is communicated with the first flow channel, the secondary inclined surface is surrounded by a plurality of convex ribs, and the secondary base plate is accommodated in the main combining groove and the secondary bottom surface is abutted against each main convex rib. A main air outlet is formed between the outer edge of the base plate and the main slope; a fixed plate, the outer diameter of which is smaller than the inner diameter of the secondary combination groove, is accommodated in the secondary combination groove, between the outer edge of the fixed plate and the secondary slope A primary air outlet is formed; when the wafer is placed in the present invention, gas is provided to flow in from the first flow channel or the second flow channel, and is blown out from the main air outlet or the secondary air outlet to reach the bottom surface of the wafer surrounded by a positive pressure gas source. A negative pressure gas field is generated in the space, and the negative pressure gas field achieves the effect of sucking and fixing the wafer.

Description

旋轉載具Rotary vehicle

本發明係涉及一種半導體製程的晶圓載具，尤指一種用於固定晶圓以進行蝕刻、顯影、去光阻或清洗等加工的旋轉載具。 The present invention relates to a wafer carrier for semiconductor manufacturing, especially a rotary carrier for fixing wafers for etching, developing, removing photoresist or cleaning.

現有技術的半導體製程設備，其中有一種如中國發明公告CN101292325所述之旋轉卡盤，其包含一旋轉頭，旋轉頭上放置有基底；一驅動部件，驅動部件用以驅動旋轉頭轉動；一固定支架，固定支架安裝在旋轉頭上對應於基底的平台區位置，固定支架包含與平台區的平台面相接觸的接觸表面，以抑制平台區所引起的的氣流不平衡，從而可以將蝕刻劑均勻地注射到基底背面，而針對不同晶圓的大小，可藉由固定支架可來回移動的行程，將其調整至合適的位置以貼合固定晶片。 In the prior art semiconductor process equipment, there is a rotary chuck as described in Chinese Invention Bulletin CN101292325, which includes a rotary head on which a substrate is placed; a driving part used to drive the rotary head to rotate; a fixed bracket , the fixed bracket is installed on the rotary head corresponding to the platform area of the substrate, and the fixed bracket includes a contact surface that is in contact with the platform surface of the platform area to suppress the airflow imbalance caused by the platform area, so that the etchant can be uniformly injected into the The backside of the substrate, according to the size of different wafers, can be adjusted to an appropriate position to fit and fix the wafer by the back and forth movement of the fixing bracket.

然而，現有技術的旋轉卡盤以圓形晶圓加工為例，使用側邊的固定支架固定晶圓時，該固定支架係以面或點與該晶圓之單點接觸的固定方式，當旋轉卡盤旋轉速度過快時，則易使晶片產生滑動而脫離固定支架，導致晶圓破片；此外，使用固定支架固定晶圓時，具有移動行程的設計不易符合不同尺寸的晶圓，例如，在需相容多種晶圓尺寸需求的製程設備上，現有技術的固定支架於機構設計上需預留較長的行程，容易因為空間的限制而導致固定支架於設計上產生困難，尤其應用在8英寸或12英寸較大的晶圓尺寸上，固定支架將會佔據較多的設備空間且固定支架的移動行程亦將增加生產時間，進而降低生產效率；因此，現有技術之旋轉卡盤，其整體構造存在有如前述的問題及缺點，實有待加以改良。 However, the spin chuck in the prior art takes the processing of a circular wafer as an example. When a side fixing bracket is used to fix the wafer, the fixing bracket is fixed in a single-point contact with the wafer at a surface or point. When rotating When the chuck rotates too fast, it is easy for the wafer to slide and break away from the fixing bracket, resulting in wafer fragmentation; in addition, when using the fixing bracket to fix the wafer, the design with the moving stroke is not easy to meet the wafers of different sizes. In the process equipment that needs to be compatible with various wafer sizes, the conventional fixing bracket needs to reserve a long stroke in the mechanism design, which is easy to cause difficulties in the design of the fixing bracket due to space constraints, especially when applied to 8 inches. For larger wafer sizes of 12 inches or 12 inches, the mounting bracket will occupy more equipment space and the travel of the mounting bracket will increase the production time, thereby reducing the production time. Low production efficiency; therefore, the overall structure of the rotary chuck in the prior art has the aforementioned problems and shortcomings, and needs to be improved.

有鑒於現有技術的缺點及不足，本發明提供一種旋轉載具，其藉由於晶圓底面吹氣，使得晶圓底面正壓氣源所圍繞形成的空間產生負壓氣場，由負壓氣場達到吸住並固定晶圓之目的。 In view of the shortcomings and deficiencies of the prior art, the present invention provides a rotating carrier, which blows air on the bottom surface of the wafer, so that a negative pressure gas field is generated in the space surrounded by the positive pressure gas source on the bottom surface of the wafer, and the negative pressure gas field is generated. To achieve the purpose of sucking and fixing the wafer.

為達上述之創作目的，本發明所採用的技術手段為設計一種旋轉載具，其包含：一主基座盤，其為一環形盤體且包含一主頂面及一主底面，該主頂面與該主底面位於該主基座盤的上、下相對二側面，該主頂面環繞間隔凸設有複數主限位銷，該主頂面凹設有一主結合槽，該主結合槽具有一主槽底及一主斜面，該主槽底貫穿有一第一流道及複數第二流道，該主斜面為環繞成形於該主槽底與該主頂面之間的斜面，該主斜面環繞間隔凸設有複數主凸肋，該主底面凹設有一連接槽，該連接槽與各該第一流道及各該第二流道相連通；一次基座盤，其為一環形盤體且形狀對應於該主結合槽的形狀，該次基座盤的外徑小於該主結合槽的內徑，該次基座盤包含一次頂面及一次底面，該次頂面與該次底面位於該次基座盤的上、下相對二側面，該次頂面環繞間隔凸設有複數次限位銷，該次頂面凹設有一次結合槽，該次結合槽具有一次槽底及一次斜面，該次槽底貫穿有一次流道，該次流道與該第一流道相連通，該次斜面為環繞成形於該次槽底與該次頂面之間的斜面，該次斜面環繞間隔凸設有複數次凸肋，該次底面凸設有一連接部，該連接部與該次流道相連通，該次基座盤容置於該主結合槽內且該次底面貼靠於各該主凸肋，該次基座盤的外緣與該主斜面之間形成一主出氣口；一固定盤，其為一環形盤體且形狀對應於該次結合槽的形狀，該固定盤的外徑小於該次結合槽的內徑，該固定盤固設於該次結合槽內，該固定盤的盤底貼靠於各該次凸肋，且該固定盤的外緣與該次斜面之間形成一次出氣口。 In order to achieve the above-mentioned creative purpose, the technical means adopted in the present invention is to design a rotating carrier, which includes: a main base plate, which is an annular plate body and includes a main top surface and a main bottom surface, the main top surface The main bottom surface and the main bottom surface are located on the upper and lower opposite sides of the main base plate. The main top surface is protruded with a plurality of main limit pins around the interval. The main top surface is concavely provided with a main combination groove. a main groove bottom and a main inclined surface, the main groove bottom runs through a first flow channel and a plurality of second flow channels, the main inclined surface is an inclined surface formed around the main groove bottom and the main top surface, the main inclined surface surrounds A plurality of main protruding ribs are arranged at intervals, and a connecting groove is concavely arranged on the main bottom surface, and the connecting groove is communicated with each of the first flow channels and each of the second flow channels; the primary base plate is an annular plate body and has a shape of Corresponding to the shape of the main combination groove, the outer diameter of the secondary base plate is smaller than the inner diameter of the main combination groove, the secondary base plate includes a primary top surface and a primary bottom surface, and the secondary top surface and the secondary bottom surface are located in the secondary base plate. The upper and lower opposite sides of the base plate, the sub-top surface is protruded with a plurality of time-limiting pins around the interval, the sub-top surface is concavely provided with a primary combination groove, and the primary combination groove has a primary groove bottom and a primary inclined surface. A primary flow channel runs through the bottom of the secondary groove, and the secondary flow channel is communicated with the first flow channel. The secondary inclined surface is an inclined surface formed around the bottom of the secondary groove and the top surface. A plurality of convex ribs, the sub bottom surface is protruded with a connecting part, the connecting part communicates with the sub flow channel, the sub base plate is accommodated in the main combination groove, and the sub bottom surface is abutted against each of the main convex ribs , a main air outlet is formed between the outer edge of the secondary base plate and the main slope; A fixed plate, which is an annular plate with a shape corresponding to the shape of the primary bonding groove, the outer diameter of the fixing disk is smaller than the inner diameter of the primary bonding groove, the fixing disk is fixed in the secondary bonding groove, the fixing The bottom of the disk is abutted against each of the secondary protruding ribs, and a primary air outlet is formed between the outer edge of the fixed disk and the secondary inclined surface.

進一步而言，所述之旋轉載具，其中該主頂面環繞間隔貫穿有複數主螺孔，各該主螺孔形成有內螺紋，各該主限位銷包含一主結合端，該主結合端位於該主限位銷的另一端且形成有外螺紋，該主結合端以其外螺紋與該主螺孔相連接。 Further, in the rotating carrier, the main top surface is surrounded by a plurality of main screw holes at intervals, each of the main screw holes is formed with an internal thread, and each of the main limit pins includes a main joint end, the main joint The end is located at the other end of the main limiting pin and is formed with an external thread, and the main combining end is connected with the main screw hole by its external thread.

進一步而言，所述之旋轉載具，其中該次頂面環繞間隔貫穿有複數次螺孔，各該次螺孔形成有內螺紋，各該次限位銷包含一次結合端，該次結合端位於該次限位銷的另一端且形成有外螺紋，該次結合端以其外螺紋與該次螺孔相連接。 Further, in the rotating carrier, the sub-top surface is surrounded by a plurality of screw holes, each of which is formed with an internal thread, and each of the sub-limiting pins includes a primary joint end, and the sub-joint end The other end of the secondary limiting pin is formed with an external thread, and the secondary combining end is connected with the secondary screw hole by its external thread.

進一步而言，所述之旋轉載具，其進一步包含複數主頂銷及複數次頂銷，各該主頂銷環繞間隔凸設於該主頂面鄰近於周緣位置，且各該主頂銷位於各該主限位銷之間，各該次頂銷環繞間隔凸設於該次頂面鄰近於周緣位置，且各該次頂銷位於各該次限位銷之間。 Further, the rotating carrier further comprises a plurality of main ejector pins and a plurality of sub-ejection pins, each of the main ejector pins is protruded around the main top surface at a position adjacent to the peripheral edge, and each of the main ejector pins is located at Between each of the primary limiting pins, each of the secondary ejecting pins is protruded around the interval on the secondary top surface adjacent to the peripheral edge, and each of the secondary ejecting pins is located between each of the secondary limiting pins.

進一步而言，所述之旋轉載具，其中該複數主凸肋及該複數次凸肋皆為長條狀，且皆朝向徑向方向延伸。 Further, in the rotating carrier, the plurality of main protruding ribs and the plurality of secondary protruding ribs are all elongated and extend toward the radial direction.

進一步而言，所述之旋轉載具，其進一步包含複數鎖固件，各該鎖固件形成有外螺紋，該主基座盤進一步貫穿有複數主鎖固孔，各該主鎖固孔形成有內螺紋且環繞間隔位於該第一流道與各該第二流道之間，該次基座盤進一步貫穿有複數次鎖固孔，各該次鎖固孔形成有內螺紋且環繞間隔位於該次流道的外側，各該次鎖固孔的位置對應於各該主鎖固孔的位置，該固定盤進一步貫穿有複數固定孔，各該固定孔形成有內螺紋且各該固定孔的位置對應於各該次螺孔的位置，各該鎖固件以其外螺紋與各該固定孔、各該次鎖固孔及各該主鎖固孔相結合。 Further, the rotating carrier further includes a plurality of locking members, each of which is formed with an external thread, the main base plate is further penetrated with a plurality of main locking holes, and each of the main locking holes is formed with an inner thread. The thread and the surrounding space are located between the first flow channel and each of the second flow channels, the secondary base plate is further penetrated with a plurality of locking holes, and each of the secondary locking holes is formed with internal threads and the surrounding space is located in the secondary flow On the outside of the channel, the position of each secondary locking hole corresponds to the position of each main locking hole, the fixing plate is further penetrated with a plurality of fixing holes, each fixing hole is formed with an internal thread, and the position of each fixing hole corresponds to each At the position of the secondary screw hole, the external thread of each locking member is combined with each of the fixing holes, each of the secondary locking holes and each of the main locking holes.

進一步而言，所述之旋轉載具，其中各該次鎖固孔周緣分別凸設有一支撐柱，各該支撐柱為中空柱體，該固定盤的盤底貼靠於各該支撐柱。 Further, in the rotating carrier, a supporting column is protruded from the periphery of each secondary locking hole, each supporting column is a hollow cylinder, and the bottom of the fixing plate is abutted against each supporting column.

進一步而言，所述之旋轉載具，其中該主基座盤的中心與各該主限位銷之間的距離大於該主基座盤的中心與各該主頂銷之間的距離，該次基座盤的中心與各該次限位銷之間的距離大於該次基座盤的中心與各該次頂銷之間的距離。 Further, in the rotation carrier, the distance between the center of the main base plate and each of the main stop pins is greater than the distance between the center of the main base plate and each of the main ejector pins, the The distance between the center of the sub-base plate and each of the sub-limiting pins is greater than the distance between the center of the sub-base plate and each of the sub-top pins.

本發明的優點在於，藉由氣體從晶圓底部方向吹出，利用晶圓底面周緣的正壓氣源，使得晶圓底面正壓氣源所圍繞形成的空間產生負壓氣場，由負壓氣場達到吸住並固定晶圓之功效；由於主限位銷及次限位銷可依據不同晶圓的大小調整設置於適切的位置，且不同形狀的晶圓亦可放置，因此具有高度通用性；透過負壓氣場固定晶圓加上限位銷可限制晶圓位置，因此可以解決晶圓在旋轉過程中滑出晶圓載台導致破片的風險；相較於現有技術由於不需額外增設固定支架，因此可降低本發明的整體體積。 The advantage of the present invention is that the gas is blown out from the bottom of the wafer, and the positive pressure gas source at the periphery of the bottom surface of the wafer is used to generate a negative pressure gas field in the space surrounded by the positive pressure gas source on the bottom surface of the wafer. The field achieves the effect of attracting and fixing the wafer; since the main limit pin and the secondary limit pin can be adjusted and set at the appropriate position according to the size of different wafers, and wafers of different shapes can also be placed, so it has a high degree of versatility ;Fixing the wafer through the negative pressure gas field and the positioning pin can limit the position of the wafer, so it can solve the risk of the wafer slipping out of the wafer carrier during the rotation process and causing fragmentation; Compared with the prior art, no additional fixing brackets are required , so the overall volume of the present invention can be reduced.

10:主基座盤 10: Main base plate

11:主頂面 11: Main top surface

111:主限位銷 111: main limit pin

113:主結合端 113: main binding end

114:主頂銷 114: main ejector pin

115:主螺孔 115: main screw hole

12:主結合槽 12: Main Combination Slot

121:主槽底 121: Bottom of main groove

122:第一流道 122: First runner

123:第二流道 123: Second runner

124:主鎖固孔 124: Main locking hole

13:主斜面 13: Main bevel

131:主凸肋 131: Main rib

14:主底面 14: Main bottom surface

141:連接槽 141: Connection slot

20:次基座盤 20: Sub-base plate

21:次頂面 21: Sub-Top

211:次限位銷 211: Secondary limit pin

213:次結合端 213: Secondary binding end

214:次頂銷 214: Secondary ejector

215:次螺孔 215: Secondary screw hole

22:次結合槽 22: Sub-combination slot

221:次槽底 221: Secondary groove bottom

222:次流道 222: Secondary runner

223:次鎖固孔 223: Secondary locking hole

224:次支撐柱 224: Secondary support column

23:次斜面 23: Secondary Bevel

231:次凸肋 231: Secondary rib

24:次底面 24: Secondary Bottom

241:連接部 241: Connector

25:主流道空間 25: Main channel space

26:主出氣口 26: Main air outlet

30:固定盤 30: Fixed plate

31:固定孔 31: Fixing hole

32:鎖固件 32: Lock firmware

33:次流道空間 33: Secondary runner space

34:次出氣口 34: Secondary air outlet

40:晶圓 40: Wafer

圖1為本發明之立體外觀圖。 FIG. 1 is a three-dimensional external view of the present invention.

圖2為本發明之俯視分解圖。 Figure 2 is a top exploded view of the present invention.

圖3為本發明之仰視分解圖。 FIG. 3 is an exploded view of the present invention from the bottom.

圖4為本發明之仰視圖。 Figure 4 is a bottom view of the present invention.

圖5為本發明之局部剖面放大圖。 FIG. 5 is an enlarged partial cross-sectional view of the present invention.

以下配合圖式以及本發明之較佳實施例，進一步闡述本發明為達成預定創作目的所採取的技術手段。 The technical means adopted by the present invention to achieve the predetermined creation purpose are further described below with reference to the drawings and preferred embodiments of the present invention.

請參閱圖1所示，本發明之旋轉載具包含一主基座盤10、一次基座盤20及一固定盤30。 Please refer to FIG. 1 , the rotating carrier of the present invention includes a main base plate 10 , a primary base plate 20 and a fixed plate 30 .

請參閱圖2至圖4所示，主基座盤10為一環形盤體且包含一主頂面11及一主底面14，主頂面11與主底面14位於主基座盤10的上、下相對面，主頂面11鄰近於周緣位置環繞間隔凸設有複數主限位銷111及複數主頂銷114，在本實施例中，主頂面11環繞間隔貫穿有複數主螺孔115，各主螺孔115形成有內螺紋，各主限位銷111包含一主結合端113，主結合端113位於主限位銷111的另一端且形成有外螺紋，各主限位銷111以其主結合端113的外螺紋與各主螺孔115相連接，但不以此為限，主限位銷111之形式可依使用者需求作改變，僅要能達到限位功效即可；主頂銷114位於各主限位銷111之間且主基座盤10的中心與主限位銷111之間的距離大於主基座盤10的中心與主頂銷114之間的距離，主頂銷114提供產生負壓氣場的流體空間及路徑，以致能產生負壓氣場達到吸住並固定晶圓(圖式中未示)之功效。 Please refer to FIGS. 2 to 4 , the main base plate 10 is an annular plate body and includes a main top surface 11 and a main bottom surface 14 , the main top surface 11 and the main bottom surface 14 are located on the main base plate 10 , On the lower opposite surface, the main top surface 11 is protruded with a plurality of main limit pins 111 and a plurality of main ejector pins 114 around the space adjacent to the peripheral position. Each main screw hole 115 is formed with an internal thread, each main limit pin 111 includes a main joint end 113, the main joint end 113 is located at the other end of the main limit pin 111 and is formed with an external thread, each main limit pin 111 uses its The external thread of the main joint end 113 is connected with each main screw hole 115, but it is not limited to this. The form of the main limit pin 111 can be changed according to the needs of the user, as long as the limit function can be achieved; The pins 114 are located between the main limit pins 111 and the distance between the center of the main base plate 10 and the main limit pins 111 is greater than the distance between the center of the main base plate 10 and the main lift pins 114, the main lift pins 114 provides a fluid space and a path for generating a negative pressure gas field, so that the negative pressure gas field can be generated to achieve the effect of sucking and fixing the wafer (not shown in the figure).

主頂面11凹設有一主結合槽12，主結合槽12具有一主槽底121及一主斜面13，主槽底121貫穿有一第一流道122、複數第二流道123及複數主鎖固孔124，第一流道122為一貫孔且位於主槽底121的中心位置，各第二流道123為長孔且環繞間隔位於該第一流道122孔的外側，各主鎖固孔124形成有內螺紋且環繞間隔位於第一流道122與各第二流道123之間，但不以此為限，第一流道122、第二流道123及主鎖固孔124之形式可依使用者需求作改變。 The main top surface 11 is recessed with a main combination groove 12, the main combination groove 12 has a main groove bottom 121 and a main inclined surface 13, and the main groove bottom 121 runs through a first flow channel 122, a plurality of second flow channels 123 and a plurality of main locks The hole 124, the first flow channel 122 is a through hole and is located at the center of the main groove bottom 121, each second flow channel 123 is a long hole and is located at the outer side of the first flow channel 122 at a circumferential interval, and each main locking hole 124 is formed with a The inner thread is located between the first flow channel 122 and each of the second flow channels 123 at a circumferential interval, but not limited to this. The form of the first flow channel 122, the second flow channel 123 and the main locking hole 124 can be determined according to user needs make changes.

主斜面13為環繞成形於主槽底121與主頂面11之間的斜面，主斜面13環繞間隔凸設有複數主凸肋131，在本實施例中，各主凸肋131為長條狀且朝徑向方向延伸；主底面14凹設有一連接槽141，連接槽141與第一流道122、各第二流道123及各主鎖固孔124相連通；連接槽141可連接於外部的旋轉頭(圖式中未示)及供氣設備(圖式中未示)，旋轉頭可藉由驅動裝置(圖式中未示)驅動帶動主基座盤10轉動，供氣設備可將氣體輸送至第一流道122或第二流道123，旋轉頭及供氣設備為現有技術之制式組件，其細部構造不再贅述。 The main inclined surface 13 is an inclined surface formed around the main groove bottom 121 and the main top surface 11 , and a plurality of main convex ribs 131 are protruded around the main inclined surface 13 at intervals. In this embodiment, each main convex rib 131 is a long strip. and Extends in the radial direction; the main bottom surface 14 is recessed with a connecting groove 141, and the connecting groove 141 communicates with the first flow channel 122, each second flow channel 123 and each main locking hole 124; the connecting groove 141 can be connected to the external rotation The head (not shown in the figure) and the air supply device (not shown in the figure), the rotating head can be driven by the driving device (not shown in the figure) to drive the main base plate 10 to rotate, and the air supply device can deliver the gas As for the first flow channel 122 or the second flow channel 123 , the rotary head and the air supply equipment are standard components in the prior art, and the detailed structure thereof will not be repeated here.

次基座盤20為一環形盤體且形狀對應於主結合槽12的形狀，次基座盤20的外徑小於主結合槽12的內徑，次基座盤20包含一次頂面21及一次底面24，次頂面21與次底面24位於次基座盤20的上、下相對二側面，次頂面21環繞間隔凸設有複數次限位銷211及複數次頂銷214，在本實施例中，次頂面21環繞間隔貫穿有複數次螺孔215，各次螺孔215形成有內螺紋，各次限位銷211包含一次結合端213，次結合端213位於次限位銷211的另一端且形成有外螺紋，各次限位銷211以其次結合端213的外螺紋與各次螺孔215相連接，但不以此為限，次限位銷211之形式可依使用者需求作改變，僅要能達到限位功效即可；次頂銷214位於各次限位銷211之間且次基座盤20的中心與次限位銷211之間的距離大於次基座盤20的中心與次頂銷214之間的距離，次頂銷214提供產生負壓氣場的流體空間及路徑，以致能產生負壓氣場達到吸住並固定晶圓(圖式中未示)之功效。 The secondary base plate 20 is an annular disc body and the shape corresponds to the shape of the main combining groove 12 , the outer diameter of the secondary base plate 20 is smaller than the inner diameter of the main combining groove 12 , and the secondary base plate 20 includes a primary top surface 21 and a primary The bottom surface 24, the sub-top surface 21 and the sub-bottom surface 24 are located on the upper and lower opposite sides of the sub-base plate 20, and the sub-top surface 21 is protruded with a plurality of times limit pins 211 and a plurality of times of push pins 214 around the interval. In the example, the secondary top surface 21 is surrounded by a plurality of secondary screw holes 215 at intervals, and each secondary screw hole 215 is formed with an internal thread. The other end is formed with an external thread, and each secondary limit pin 211 is connected with each secondary screw hole 215 by the external thread of the secondary joint end 213, but not limited to this, the form of the secondary limit pin 211 can be based on user needs Changes are made as long as the limiting effect can be achieved; the secondary ejector pins 214 are located between the secondary limiting pins 211 and the distance between the center of the secondary base plate 20 and the secondary limiting pins 211 is greater than that of the secondary base plate 20 The distance between the center and the secondary ejector pin 214, the secondary ejector pin 214 provides a fluid space and a path for generating a negative pressure gas field, so that a negative pressure gas field can be generated to attract and fix the wafer (not shown in the figure). effect.

次頂面21凹設有一次結合槽22，次結合槽22具有一次槽底221及一次斜面23，次槽底221貫穿有一次流道222及複數次鎖固孔223，次流道222為一貫孔且位於次槽底221的中心位置，次流道222與第一流道122相連通，各次鎖固孔223形成有內螺紋且環繞間隔位於次流道222的外側，各次鎖固孔223的位置對應於各主鎖固孔124的位置，但不以此為限，次流道222及次鎖固孔223之形式可依使用者需求作改變；在本實施例中，各次鎖固孔223周緣分別凸設有一支撐柱224，各支撐柱224為中空柱體。 The secondary top surface 21 is recessed with a primary coupling groove 22 , the secondary coupling groove 22 has a primary groove bottom 221 and a primary inclined surface 23 , and the secondary groove bottom 221 penetrates a primary flow channel 222 and a plurality of secondary locking holes 223 , and the secondary flow channel 222 is a consistent The hole is located in the center of the secondary groove bottom 221, the secondary flow channel 222 is communicated with the first flow channel 122, each secondary locking hole 223 is formed with an internal thread and is located at the outer side of the secondary flow channel 222 at a surrounding interval, and each secondary locking hole 223 The position of each main locking hole 124 corresponds to, but is not limited to, the form of the secondary flow channel 222 and the secondary locking hole 223 can be changed according to the needs of the user; in this embodiment, each secondary locking A supporting column 224 is respectively protruded from the periphery of the hole 223 , and each supporting column 224 is a hollow cylinder.

請參閱圖2、圖3及圖5所示，次斜面23為環繞成形於次槽底221與次頂面21之間的斜面，次斜面23環繞間隔凸設有複數次凸肋231，在本實施例中，各次凸肋231為長條狀且朝徑向方向延伸；次底面24凸設有一連接部241，連接部241與次流道222及各次鎖固孔223相連通，次基座盤20容置於主結合槽12內且次底面24貼靠於各主凸肋131，次基座盤20的次底面24與主基座盤10的主結合槽12圍繞形成一主流道空間25，主流道空間25與第二流道123相連通，且次基座盤20的外緣與主結合槽12的主斜面13之間形成一主出氣口26。 Please refer to FIGS. 2 , 3 and 5 , the sub-inclined surface 23 is an inclined surface formed around the sub-groove bottom 221 and the sub-top surface 21 , and the sub-inclined surface 23 is surrounded by a plurality of convex ribs 231 at intervals. In the embodiment, each secondary protruding rib 231 is elongated and extends in the radial direction; the secondary bottom surface 24 is protruded with a connecting portion 241, and the connecting portion 241 communicates with the secondary flow channel 222 and each secondary locking hole 223, and the secondary base The base plate 20 is accommodated in the main combining groove 12 and the sub-bottom surface 24 is abutted against each main protruding rib 131. The sub-bottom surface 24 of the sub-base plate 20 and the main combining groove 12 of the main base plate 10 are surrounded to form a main channel space. 25. The main channel space 25 is communicated with the second channel 123, and a main air outlet 26 is formed between the outer edge of the sub-base plate 20 and the main inclined surface 13 of the main combining groove 12.

固定盤30為一環形盤體且形狀對應於次結合槽22的形狀，固定盤30的外徑小於次結合槽22的內徑，固定盤30貫穿有複數固定孔31，各固定孔31形成有內螺紋且各固定孔31的位置對應於各次螺孔215的位置，藉由複數具有外螺紋的鎖固件32分別穿設於固定孔31及次螺孔215，並與主螺孔115的內螺紋相結合，使得固定盤30固設於次結合槽22內，且固定盤30的盤底貼靠於各次凸肋231及各支撐柱224，固定盤30的盤底與次結合槽22之間圍繞形成一次流道空間33，次流道空間33與第一流道122相連通，且固定盤30的外緣與次結合槽22的槽口之間形成一次出氣口34。 The fixed disk 30 is an annular disk body and the shape corresponds to the shape of the secondary bonding groove 22 , the outer diameter of the fixing disk 30 is smaller than the inner diameter of the secondary bonding groove 22 , the fixing disk 30 penetrates a plurality of fixing holes 31 , and each fixing hole 31 is formed with a The internal thread and the position of each fixing hole 31 correspond to the position of each secondary screw hole 215 , and a plurality of fasteners 32 with external threads are respectively penetrated through the fixing hole 31 and the secondary screw hole 215 , and are connected with the inner part of the main screw hole 115 . Threads are combined, so that the fixing plate 30 is fixed in the sub-combination groove 22, and the bottom of the fixing plate 30 abuts against each of the secondary ribs 231 and each support column 224, and the bottom of the fixed plate 30 and the sub-combination groove 22. A primary flow channel space 33 is formed around it, the secondary flow channel space 33 communicates with the first flow channel 122 , and a primary air outlet 34 is formed between the outer edge of the fixing plate 30 and the notch of the secondary bonding groove 22 .

本發明使用時，請參閱圖5所示，以次頂銷214上放置一晶圓40為例說明，主基座盤10的連接槽141可連接外部的旋轉頭(圖式中未示)及供氣設備(圖式中未示)，藉此邊旋轉且邊提供氣體輸入至連接槽141內，氣體自連接槽141內經由各第一流道122朝向上方方向移動通往次流道222進入到次流道空間33，並從次出氣口34吹出，而吹出位置鄰近於晶圓40的外周緣，吹出的方向為朝向晶圓40外側的方向，利用晶圓40底面周緣的正壓氣源，使得晶圓40底面正壓氣源所圍繞形成的空間產生負壓氣場，由負壓氣場達到吸住並固定晶圓40之功效，此為真空發生器的工作原理，此原理為現有技術故不再贅述；反之，如以主頂銷114上放置一外徑較大的晶圓(圖式中未示)為例，則氣體可自第二流道 123朝向上方方向移動進入到主流道空間25，並從主出氣口26吹出形成負壓氣場達到吸住並固定晶圓之功效。 When the present invention is used, please refer to FIG. 5 . Taking a wafer 40 placed on the secondary ejector pin 214 as an example, the connecting groove 141 of the main base plate 10 can be connected to an external rotary head (not shown in the figure) and The gas supply device (not shown in the figure) is used to provide gas input into the connecting groove 141 while rotating, and the gas moves from the connecting groove 141 to the upper direction through each first flow channel 122 and enters the secondary flow channel 222. The secondary runner space 33 is blown out from the secondary air outlet 34, and the blowing position is adjacent to the outer periphery of the wafer 40, and the blowing direction is the direction toward the outer side of the wafer 40, using the positive pressure air source on the periphery of the bottom surface of the wafer 40, The space surrounded by the positive pressure gas source on the bottom surface of the wafer 40 generates a negative pressure gas field, and the negative pressure gas field achieves the effect of sucking and fixing the wafer 40. This is the working principle of the vacuum generator, and this principle is the prior art. Therefore, it will not be repeated; on the contrary, if a wafer with a larger outer diameter (not shown in the figure) is placed on the main ejector pin 114 as an example, the gas can flow from the second flow channel The 123 moves toward the upper direction into the main channel space 25, and is blown out from the main air outlet 26 to form a negative pressure air field to achieve the effect of sucking and fixing the wafer.

前述過程中，由於主限位銷111、次限位銷211、主頂銷114及次頂銷214可依據不同晶圓的大小調整設置於適切的位置，且不同形狀(方形、圓形或其他異形)的晶圓亦可放置，因此具有高度通用性之功效。 In the aforementioned process, since the main stopper pin 111, the secondary stopper pin 211, the main ejector pin 114 and the secondary ejector pin 214 can be adjusted and arranged at appropriate positions according to the size of different wafers, and different shapes (square, round or other) Special-shaped) wafers can also be placed, so it has the effect of high versatility.

前述過程中，由於透過負壓氣場固定晶圓40，加上主限位銷111及次限位銷211的限位功能，可以解決晶圓40在旋轉過程中產生滑離載台導致破片的風險。 In the aforementioned process, since the wafer 40 is fixed by the negative pressure gas field, and the limiting functions of the primary limiting pin 111 and the secondary limiting pin 211 are added, the wafer 40 may slip off the stage during the rotation process and cause fragmentation. risk.

前述過程中，相較於現有技術由於不需額外增設固定支架，因此可降低本發明的整體體積。 In the foregoing process, compared with the prior art, since there is no need to add additional fixing brackets, the overall volume of the present invention can be reduced.

以上所述僅是本發明之較佳實施例而已，並非對本發明做任何形式上的限制，雖然本發明已以較佳實施例揭露如上，然而並非用以限定本發明，任何所屬技術領域中具有通常知識者，在不脫離本發明技術方案的範圍內，當可利用上述揭示的技術內容作出些許更動或修飾作為等同變化的等效實施例，但凡是未脫離本發明技術方案的內容，依據本發明的技術實質對以上實施例所做的任何簡單修改、等同變化與修飾，均仍屬於本發明技術方案的範圍內。 The above descriptions are only preferred embodiments of the present invention, and are not intended to limit the present invention in any form. Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Those of ordinary knowledge, within the scope of the technical solution of the present invention, can make some changes or modifications by using the technical content disclosed above as equivalent embodiments of equivalent changes, provided that any content that does not depart from the technical solution of the present invention, according to this Any simple modifications, equivalent changes and modifications made to the above embodiments by the technical essence of the invention still fall within the scope of the technical solutions of the present invention.

10:主基座盤 11:主頂面 111:主限位銷 114:主頂銷 20:次基座盤 21:次頂面 211:次限位銷 214:次頂銷 26:主出氣口 30:固定盤 34:次出氣口 10: Main base plate 11: Main top surface 111: main limit pin 114: main ejector pin 20: Sub-base plate 21: Sub-Top 211: Secondary limit pin 214: Secondary ejector 26: Main air outlet 30: Fixed plate 34: Secondary air outlet

Claims

一種旋轉載具，其包含：一主基座盤，其為一環形盤體且包含一主頂面及一主底面，該主頂面與該主底面位於該主基座盤的上、下相對二側面，該主頂面環繞間隔凸設有複數主限位銷，該主頂面凹設有一主結合槽，該主結合槽具有一主槽底及一主斜面，該主槽底貫穿有一第一流道及複數第二流道，該主斜面為環繞成形於該主槽底與該主頂面之間的斜面，該主斜面環繞間隔凸設有複數主凸肋，該主底面凹設有一連接槽，該連接槽與各該第一流道及各該第二流道相連通；一次基座盤，其為一環形盤體且形狀對應於該主結合槽的形狀，該次基座盤的外徑小於該主結合槽的內徑，該次基座盤包含一次頂面及一次底面，該次頂面與該次底面位於該次基座盤的上、下相對二側面，該次頂面環繞間隔凸設有複數次限位銷，該次頂面凹設有一次結合槽，該次結合槽具有一次槽底及一次斜面，該次槽底貫穿有一次流道，該次流道與該第一流道相連通，該次斜面為環繞成形於該次槽底與該次頂面之間的斜面，該次斜面環繞間隔凸設有複數次凸肋，該次底面凸設有一連接部，該連接部與該次流道相連通，該次基座盤容置於該主結合槽內且該次底面貼靠於各該主凸肋，該次基座盤的外緣與該主斜面之間形成一主出氣口；一固定盤，其為一環形盤體且形狀對應於該次結合槽的形狀，該固定盤的外徑小於該次結合槽的內徑，該固定盤固設於該次結合槽內，該固定盤的盤底貼靠於各該次凸肋，且該固定盤的外緣與該次斜面之間形成一次出氣口。 A rotating carrier, which comprises: a main base plate, which is an annular plate body and includes a main top surface and a main bottom surface, the main top surface and the main bottom surface are located on the upper and lower sides of the main base plate opposite On two sides, the main top surface is protruded with a plurality of main limit pins around the interval, the main top surface is concavely provided with a main combination groove, the main combination groove has a main groove bottom and a main inclined surface, and the main groove bottom runs through a first A flow channel and a plurality of second flow channels, the main inclined surface is a inclined surface formed around the main groove bottom and the main top surface, the main inclined surface is surrounded by a plurality of main convex ribs at intervals, and the main bottom surface is concavely provided with a connection a groove, the connecting groove communicates with each of the first flow channels and each of the second flow channels; a primary base plate, which is an annular disc body and has a shape corresponding to the shape of the main combining groove, and the outer surface of the secondary base plate The diameter is smaller than the inner diameter of the main combination groove, the secondary base plate includes a primary top surface and a primary bottom surface, the secondary top surface and the secondary bottom surface are located on the upper and lower opposite sides of the secondary base plate, and the secondary top surface surrounds A plurality of time-limiting pins are arranged on the interval protrusions, and the primary top surface is concavely provided with a primary combining groove. The primary combining groove has a primary groove bottom and a primary inclined surface. The secondary groove bottom runs through a primary flow channel. The flow channels are communicated with each other, the sub-inclined surface is an inclined surface formed around the sub-groove bottom and the sub-top surface, the sub-inclined surface is provided with a plurality of convex ribs around the interval, and the sub-bottom surface is convexly provided with a connecting part, the connection The sub-base plate is in communication with the sub-flow channel, the sub-base plate is accommodated in the main combination groove and the sub-bottom is abutted against each of the main protruding ribs, and the outer edge of the sub-base plate and the main slope are formed a main air outlet; a fixed plate, which is an annular plate with a shape corresponding to the shape of the secondary bonding groove, the outer diameter of the fixing disk is smaller than the inner diameter of the secondary bonding groove, and the fixing disk is fixed on the secondary bonding groove In the groove, the bottom of the fixed plate abuts against each of the secondary protruding ribs, and a primary air outlet is formed between the outer edge of the fixed plate and the sub-inclined surface.

如請求項1所述之旋轉載具，其中該主頂面環繞間隔貫穿有複數主螺孔，各該主螺孔形成有內螺紋，各該主限位銷包含一主結合端，該主結合端位於該主限位銷的另一端且形成有外螺紋，該主結合端以其外螺紋與該主螺孔相連接。 The rotary carrier according to claim 1, wherein a plurality of main screw holes are formed around the main top surface at intervals, each of the main screw holes is formed with an internal thread, and each of the main limit pins includes a main joint end, the main joint The end is located at the other end of the main limiting pin and is formed with an external thread, and the main combining end is connected with the main screw hole by its external thread.

如請求項1或2所述之旋轉載具，其中該次頂面環繞間隔貫穿有複數次螺孔，各該次螺孔形成有內螺紋，各該次限位銷包含一次結合端，該次結合端位於該次限位銷的另一端且形成有外螺紋，該次結合端以其外螺紋與該次螺孔相連接。 The rotary carrier according to claim 1 or 2, wherein the sub-top surface is surrounded by a plurality of screw holes, each of the sub-threaded holes is formed with an internal thread, each of the sub-limiting pins The coupling end is located at the other end of the secondary limiting pin and is formed with an external thread, and the secondary coupling end is connected with the secondary screw hole by its external thread.

如請求項3所述之旋轉載具，其進一步包含複數主頂銷及複數次頂銷，各該主頂銷環繞間隔凸設於該主頂面鄰近於周緣位置，且各該主頂銷位於各該主限位銷之間，各該次頂銷環繞間隔凸設於該次頂面鄰近於周緣位置，且各該次頂銷位於各該次限位銷之間。 The rotary carrier according to claim 3, further comprising a plurality of main ejector pins and a plurality of secondary ejector pins, each of the main ejector pins is protruded around the main top surface at a position adjacent to the periphery, and each of the main ejector pins is located at a position near the periphery of the main top surface. Between each of the primary limiting pins, each of the secondary ejecting pins is protruded around the interval on the secondary top surface adjacent to the peripheral edge, and each of the secondary ejecting pins is located between each of the secondary limiting pins.

如請求項4所述之旋轉載具，其中該複數主凸肋及該複數次凸肋皆為長條狀，且皆朝向徑向方向延伸。 The rotary carrier according to claim 4, wherein the plurality of main protruding ribs and the plurality of secondary protruding ribs are all elongated and extend toward the radial direction.

如請求項5所述之旋轉載具，其進一步包含複數鎖固件，各該鎖固件形成有外螺紋，該主基座盤進一步貫穿有複數主鎖固孔，各該主鎖固孔形成有內螺紋且環繞間隔位於該第一流道與各該第二流道之間，該次基座盤進一步貫穿有複數次鎖固孔，各該次鎖固孔形成有內螺紋且環繞間隔位於該次流道的外側，各該次鎖固孔的位置對應於各該主鎖固孔的位置，該固定盤進一步貫穿有複數固定孔，各該固定孔形成有內螺紋且各該固定孔的位置對應於各該次螺孔的位置，各該鎖固件以其外螺紋與各該固定孔、各該次鎖固孔及各該主鎖固孔相結合。 The rotary carrier according to claim 5, further comprising a plurality of locking members, each of the locking members is formed with an external thread, the main base plate further penetrates a plurality of main locking holes, and each of the main locking holes is formed with an inner The thread and the surrounding space are located between the first flow channel and each of the second flow channels, the secondary base plate is further penetrated with a plurality of locking holes, and each of the secondary locking holes is formed with internal threads and the surrounding space is located in the secondary flow Outside the channel, the position of each secondary locking hole corresponds to the position of each main locking hole, the fixing plate is further penetrated with a plurality of fixing holes, each fixing hole is formed with an internal thread, and the position of each fixing hole corresponds to The position of each of the secondary screw holes, the external thread of each of the locking members is combined with each of the fixing holes, each of the secondary locking holes and each of the main locking holes.

如請求項6所述之旋轉載具，其中各該次鎖固孔周緣分別凸設有一支撐柱，各該支撐柱為中空柱體，該固定盤的盤底貼靠於各該支撐柱。 The rotary carrier according to claim 6, wherein a supporting column is protruded from the periphery of each secondary locking hole, each supporting column is a hollow cylinder, and the bottom of the fixing plate is abutted against each supporting column.

如請求項7所述之旋轉載具，其中該主基座盤的中心與各該主限位銷之間的距離大於該主基座盤的中心與各該主頂銷之間的距離，該次基座盤的中心與各該次限位銷之間的距離大於該次基座盤的中心與各該次頂銷之間的距離。 The rotary carrier of claim 7, wherein the distance between the center of the main base plate and each of the main stop pins is greater than the distance between the center of the main base plate and each of the main ejector pins, the The distance between the center of the sub-base plate and each of the sub-limiting pins is greater than the distance between the center of the sub-base plate and each of the sub-top pins.