TWI754854B - Optical resonator - Google Patents
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- TWI754854B TWI754854B TW108140195A TW108140195A TWI754854B TW I754854 B TWI754854 B TW I754854B TW 108140195 A TW108140195 A TW 108140195A TW 108140195 A TW108140195 A TW 108140195A TW I754854 B TWI754854 B TW I754854B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/086—One or more reflectors having variable properties or positions for initial adjustment of the resonator
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Abstract
本發明提供一種光共振器,其即使使前鏡的朝向外側之面傾斜,並將屋頂鏡用於後鏡,亦能夠抑制由前鏡的朝向外側之面引起之不必要的振盪。光共振器具有前鏡及後鏡,並使光通過激勵雷射氣體之放電區域而往返。前鏡的朝向外側之面相對於與光共振器的光軸垂直之假想平面傾斜。後鏡具有處於彼此交叉之位置關係之平面狀的2個反射區域。分別包括後鏡的2個反射區域之2個假想平面的交線與前鏡的朝向外側之面的傾斜方向偏離正交的關係。The present invention provides an optical resonator capable of suppressing unnecessary oscillation caused by the outside facing surface of the front mirror even if the outside facing surface of the front mirror is inclined and a roof mirror is used for the rear mirror. The optical resonator has a front mirror and a rear mirror, and makes the light reciprocate through the discharge region of the excited laser gas. The outer-facing surface of the front mirror is inclined with respect to an imaginary plane perpendicular to the optical axis of the optical resonator. The rear mirror has two planar reflection areas in a positional relationship crossing each other. The intersection of the two imaginary planes including the two reflection areas of the rear mirror, respectively, and the inclination direction of the outer surface of the front mirror are deviated from the orthogonal relationship.
Description
本發明係有關一種光共振器。 The present invention relates to an optical resonator.
已知有一種光共振器,其藉由使光共振器的前鏡的朝向外側之表面相對於光共振器的光軸傾斜,抑制由朝向外側之表面上的反射引起之不必要的諧振(例如,下述專利文獻1的[0054]段)。又,已知有一種光共振器,其為了抑制高階橫向模態的產生而提高模態穩定性,作為光共振器的後鏡,使用包括彼此正交之2個反射面之屋頂鏡。 There is known an optical resonator that suppresses unnecessary resonance caused by reflection on the outer-facing surface by inclining the outer-facing surface of the front mirror of the optical resonator with respect to the optical axis of the optical resonator (such as , paragraph [0054] of the following Patent Document 1). In addition, there is known an optical resonator in which, in order to suppress the generation of high-order transverse modes and improve modal stability, a roof mirror including two reflecting surfaces orthogonal to each other is used as a rear mirror of the optical resonator.
專利文獻1:國際公開第2014/046161號公報 Patent Document 1: International Publication No. 2014/046161
當後鏡為平面鏡時,若前鏡的朝向外側之面傾斜,則往返於前鏡的朝向外側之面與後鏡之間的光以較少的往返次數被配置於光共振器內之光圈遮蔽。因此,被封閉到前鏡的朝向外側之面與後鏡之間之光不會成長至雷射光。 When the rear mirror is a flat mirror, if the outer surface of the front mirror is inclined, the light traveling between the outer surface of the front mirror and the rear mirror will be blocked by the aperture arranged in the optical resonator with a small number of round trips. . Therefore, the light enclosed between the outer-facing surface of the front mirror and the rear mirror does not grow to the laser light.
然而,當將屋頂鏡用作後鏡時,與使用平面鏡時相比,有時往返於前鏡的朝向外側之面與後鏡之間的次數會增加。若往返次數增加,則除了本來待振盪之雷射光束之外,有時沿著相對於光共振器的光軸傾斜之方向傳播之光 成長至雷射光。沿著相對於光軸傾斜之方向傳播之雷射光束會影響本來待振盪之雷射光束的橫剖面上之強度分布(橫向模態)。 However, when a roof mirror is used as a rear mirror, the number of times of going back and forth between the outside facing surface of the front mirror and the rear mirror is sometimes increased compared to when a flat mirror is used. If the number of round trips increases, in addition to the laser beam to be oscillated originally, there may be cases where light propagating in a direction inclined with respect to the optical axis of the optical resonator Grow into laser light. A laser beam propagating in a direction inclined with respect to the optical axis affects the intensity distribution (transverse mode) in the cross-section of the laser beam that would otherwise be oscillated.
為了在光共振器的外部將沿著相對於光共振器的光軸傾斜之方向傳播之雷射光束從本來待振盪之雷射光束中分離,需要幾米左右的距離。因此,用於分離兩者之光學系統變長,從而光學裝置變得昂貴。 In order to separate the laser beam propagating in a direction inclined with respect to the optical axis of the optical resonator from the laser beam to be oscillated at the outside of the optical resonator, a distance of about several meters is required. Therefore, the optical system for separating the two becomes long, and the optical device becomes expensive.
本發明的目的為提供一種光共振器,其即使使前鏡的朝向外側之面傾斜,並將屋頂鏡用於後鏡,亦能夠抑制由前鏡的朝向外側之面引起之不必要的振盪。 An object of the present invention is to provide an optical resonator capable of suppressing unnecessary oscillation caused by the outer surface of the front mirror even if the outer surface of the front mirror is inclined and a roof mirror is used for the rear mirror.
依本發明的一觀點,提供一種光共振器,其具有前鏡及後鏡,並使光通過激勵雷射氣體之放電區域而往返,前述後鏡為屋頂鏡,前述前鏡的朝向內側之面相對於前述光共振器的光軸正交,前述前鏡的朝向外側之面相對於與前述光共振器的光軸垂直之假想平面傾斜,前述後鏡具有處於彼此交叉之位置關係之平面狀的2個反射區域,分別包括前述後鏡的前述2個反射區域之2個假想平面的交線與前述前鏡的朝向外側之面的傾斜方向偏離正交的關係。According to an aspect of the present invention, an optical resonator is provided, which has a front mirror and a rear mirror, and enables light to travel back and forth through the discharge area of the excitation laser gas, the rear mirror is a roof mirror, and the inward facing surface of the front mirror is opposite. The optical axis of the optical resonator is orthogonal, the outer surface of the front mirror is inclined with respect to an imaginary plane perpendicular to the optical axis of the optical resonator, and the rear mirror has two planes in a positional relationship crossing each other. The reflection area includes a relationship in which the intersection line of the two imaginary planes of the two reflection areas of the rear mirror and the inclination direction of the outer surface of the front mirror are deviated from orthogonality.
若使分別包括後鏡的2個反射區域之2個假想平面的交線與前鏡的朝向外側之面的傾斜方向偏離正交的關係,則在前鏡的朝向外側之面上反射之光能夠往返於光共振器內之次數減少。其結果,能夠抑制由前鏡的朝向外側之面引起之不必要的振盪。If the intersection line of the two imaginary planes including the two reflective areas of the rear mirror and the inclination direction of the outside facing surface of the front mirror are deviated from the orthogonal relationship, the light reflected on the outside facing surface of the front mirror can be The number of round trips to and from the optical resonator is reduced. As a result, unnecessary oscillation caused by the outer surface of the front mirror can be suppressed.
參閱圖1~圖3C,對基於實施例之光共振器及搭載有該光共振器之氣體雷射裝置進行說明。
圖1係搭載有基於實施例之光共振器之氣體雷射裝置的包含光軸之剖面圖。將光共振器的光軸方向設為z軸方向且將鉛直上方設為x軸方向之xyz正交座標系進行定義。
雷射氣體收容於腔室10中。腔室10的內部空間被劃分為相對位於鉛直方向上側之光學室11及相對位於鉛直方向下側之送風機室12。光學室11與送風機室12被上下隔板13隔開。另外,在上下隔板13設置有開口,以使雷射氣體在光學室11與送風機室12之間流通。光學室11的底板14從送風機室12的側壁向z軸方向上的兩側突出,且光學室11的z軸方向上的長度比送風機室12的z軸方向上的長度長。腔室10在光學室11的底板14上藉由腔室支撐構件16支撐於光學基座。
在光學室11內配置有一對放電電極21。一對放電電極21分別間隔著放電電極支撐構件22、23被支撐在底板14。一對放電電極21在x軸方向上隔著間隔配置,從而在兩者之間劃定放電區域24。放電電極21藉由在放電區域24產生放電來激勵雷射氣體。如在後面參閱圖2進行之說明,雷射氣體沿著與圖1的紙面垂直之方向流過放電區域24。
在配置於光學室11內之共同支撐構件26支撐有光共振器25。光共振器25由前鏡25F及後鏡25R構成。光共振器25的光軸通過放電區域24內。共同支撐構件26間隔著光共振器支撐構件27被支撐在底板14。在使光共振器25的光軸向前鏡25F側(圖1中為左側)延伸之延長線與光學室11的壁面的交叉部位安裝有使雷射光束透過之透光窗28。在光共振器25內被激勵之雷射光束透過透光窗28向外部放射。
在送風機室12配置有送風機50。送風機50使雷射氣體在光學室11與送風機室12之間循環。
圖2係搭載有基於本實施例之光共振器25(圖1)之氣體雷射裝置的與z軸垂直之剖面圖。腔室10的內部空間藉由上下隔板13被劃分為上方光學室11及下方送風機室12。在光學室11內配置有支撐一對放電電極21、光共振器25(圖1)之共同支撐構件26。在放電電極21之間劃定放電區域24。
在光學室11內配置有隔板15。隔板15劃定從設置於上下隔板13之開口13A至放電區域24為止的第1氣體流路51、從放電區域24至設置於上下隔板13之另一開口13B為止的第2氣體流路52。雷射氣體沿著相對於光軸正交之方向(y軸方向)流過放電區域24。放電方向(x軸方向)與雷射氣體流過之方向(y軸方向)及光軸方向(z軸方向)的兩個方向正交。由送風機室12、第1氣體流路51、放電區域24及第2氣體流路52構成雷射氣體循環之循環流路。送風機50產生雷射氣體流,以使雷射氣體在該循環流路循環。
在送風機室12內的循環流路收容有熱交換器56。在放電區域24加熱之雷射氣體通過熱交換器56被冷卻,被冷卻之雷射氣體再供給至放電區域24。
在上下隔板13設置有使雷射氣體從送風機室12向光學室11流出之流出孔58。藉由送風機50流向第1氣體流路51之雷射氣體流中所包含之一部分雷射氣體通過流出孔58向光學室11流出。在流出孔58設置有去除微粒之過濾器59。例如,過濾器59堵住流出孔58,從送風機室12向光學室11流出之雷射氣體通過過濾器59而被過濾。
圖3A、圖3B及圖3C分別係基於本實施例之光共振器25的立體圖、與y軸垂直之剖面圖(垂直剖面圖)及與x軸垂直之剖面圖(水平剖面圖)。
後鏡25R由具有彼此交叉之2個反射面之屋頂鏡構成。2個反射面所成之角度大致為直角。具有大致正交之2個反射面之後鏡25R具有抑制橫向上的光束的變動並提高光束強度分布的穩定性之功能。在放電區域24與前鏡25F之間配置有前光圈29F,並在放電區域24與後鏡25R之間配置有後光圈29R。另外,在圖3A的立體圖中,省略前光圈29F及後光圈29R的記載。前光圈29F及後光圈29R具有對在光共振器25的遠離光軸之區域傳播之不必要的光進行遮蔽之功能。
後鏡25R以2個反射面的谷線251與x軸平行之姿勢固定。前鏡25F具有朝向光共振器25的內側之面255及朝向外側之面256。朝向內側之面255局部被反射塗佈,而朝向外側之面256無反射塗佈。朝向內側之面255與光共振器25的光軸(z軸)正交,朝向外側之面256相對於與光軸正交之假想平面(與xy面平行之面)傾斜。另外,可以將朝向內側之面255作為在光軸上具有焦點之凹面。有時將前鏡25F的朝向外側之面256相對於與光軸正交之假想平面(與xy面平行之面)傾斜之角度簡稱為“朝向外側之面的傾斜角”。
朝向外側之面256相對於與光軸垂直之假想平面(xy面)傾斜之方向為x軸的正方向或負方向。在此,“傾斜之方向”係指,包含於朝向外側之面256的直線中,相對於xy面之傾斜角成最大之直線的下降方向。換言之,前鏡25F的朝向外側之面256的傾斜方向與後鏡25R的谷線251成為平行的關係。作為光共振器25,亦可以採用包括折返鏡等之折返光共振器。此時,在配置有前鏡25F之位置上之與光軸垂直之假想平面,經由構成光共振器25之折返鏡等光學組件而對谷線251進行投影之線像與朝向外側之面256的傾斜方向平行。“平行的關係”包括對谷線251進行投影之線像與朝向外側之面256的傾斜方向平行之關係。
接著,參閱圖4A及圖4B,對本實施例的優異之效果進行說明。
圖4A係表示在基於本實施例之光共振器25的前鏡25F的朝向外側之面256上垂直反射之光在xz剖面上傳播之狀態之圖。後鏡25R的2個反射面與平行於xz面之平面的交線成為與x軸平行之直線。因此,能夠認為在xz剖面中後鏡25R為與光軸(z軸)垂直之平面鏡。在圖4A中,將後鏡25R表示為平面鏡。前鏡25F的朝向外側之面256傾斜之方向設為x軸的負方向。
待振盪之雷射光束閉鎖到前鏡25F的朝向內側之面255與後鏡25R之間。該雷射光束的傳播方向與光共振器25的光軸(z軸)平行。前鏡25F的朝向外側之面256無反射塗佈,但反射率並不完全為零,前鏡25F的朝向外側之面256具有1%以下的反射率。藉由在放電區域24內自然發光之光在朝向外側之面256垂直反射,產生相對於光共振器25的光軸在xz面內沿傾斜方向傳播之光40。光40的傳播方向上的x分量為正。
沿傾斜方向傳播之光40被後鏡25R向傾斜方向反射,並再入射到前鏡25F的朝向外側之面256。被後鏡25R向傾斜方向反射之光41的傳播方向上的x分量與入射之光40的傳播方向上的x分量同樣為正。因此,被反射之光41再入射之位置向比光40的起點更靠x軸之正側偏離。再入射之光41向相對於光共振器25的光軸之傾斜角更大的傾斜方向反射。如此,在前鏡25F的朝向外側之面256上垂直反射之光隨著在光共振器25內傳播而遠離光共振器25的光軸。因此,在前鏡25F的朝向外側之面256上反射之光以較少的往返次數被前光圈29F或後光圈29R遮蔽。因此,在前鏡25F的朝向外側之面256上垂直反射之光不易成長至雷射光。
圖4B係在基於比較例之光共振器25的前鏡25F的朝向外側之面256上反射之光在xz剖面上傳播之狀態之圖。在比較例中,後鏡25R的2個反射面的谷線251配置為與y軸平行。亦即,後鏡25R的谷線251與前鏡25F的朝向外側之面的傾斜方向處於正交的關係。在此,“正交的關係”不僅包括2條直線在三維空間直角相交之情況,還包括若將其中一條直線沿著光共振器25的光軸平行移動則與另一條直線直角相交之關係。當光共振器25的光軸被折返時,使直線沿著光軸平行移動,以使得沿折返前的光軸移動之直線與沿著折返後的光軸移動之直線成為物體與像的關係。在前鏡25F的朝向外側之面256上垂直反射而相對於光共振器25的光軸沿傾斜方向傳播之光43在後鏡25R的2個反射面進行兩次反射之後,朝向前鏡25F傳播。
入射到後鏡25R之光43的傳播方向與反射之光44的傳播方向具有反平行的關係。光43的傳播方向與朝向外側之面256垂直,因此從後鏡25R朝向前鏡25F之光44垂直入射到朝向外側之面256。垂直入射到朝向外側之面256之光44的一部分分量在朝向外側之面256反射,反射光沿著與光43、44的路徑相反的方向傳播,再入射到朝向外側之面256。其結果,有時相對於光軸朝向傾斜方向之光被封閉到光共振器25內而成長至雷射光。相對於光共振器25的光軸傾斜地傳播之雷射光束會影響本來待振盪之雷射光束的橫向上的強度分布,因此光束在橫剖面上之強度分布的穩定性下降。
在本實施例中,抑制了由在前鏡25F的朝向外側之面256上的反射引起之雷射振盪,因此能夠抑制待振盪之雷射光束在橫剖面上之強度分布的穩定性的下降。
接著,對上述實施例的變形例進行說明。
在上述實施例中,如圖3A~圖3C所示,使用前鏡25F與後鏡25R的2組鏡片,但亦可以在兩者之間配置折返鏡等而構成折返光共振器。
又,在上述實施例中,將後鏡25R的谷線251與前鏡25F的朝向外側之面256的傾斜方向設成平行的關係,但兩者無需一定是平行的關係。若兩者偏離正交的關係,則與具有正交的關係時相比,在前鏡25F的朝向外側之面256上反射之光能夠在光共振器25往返的次數減少。其結果,與圖4B所示之比較例相比,能夠抑制雷射光束的強度分布的穩定性的下降。
又,在上述實施例中,作為後鏡25R使用了屋頂鏡,除此之外,亦可以使用具有處於彼此交叉之位置關係之平面狀的2個反射區域之鏡片。此時,分別包括2個反射區域之2個假想平面的交線方向相當於屋頂鏡的谷線251的方向。
接著,參閱圖5,對前光圈29F與後光圈29R的間隔L、前光圈29F與後光圈29R的開口直徑D及前鏡25F的朝向外側之面256的傾斜角θ的較佳之關係進行說明。
圖5係前光圈29F、後光圈29R及在兩者之間相對於光共振器25的光軸沿傾斜方向傳播光之模示圖。前鏡25F的朝向外側之面256相對於與z軸垂直之假想平面在x軸方向上傾斜傾斜角θ。相對於前鏡25F的朝向外側之面256向垂直方向反射之光46沿著相對於z軸傾斜傾斜角θ的方向傳播。假設在後光圈29R的位置配置有平面的後鏡。由該後鏡反射之光47在前光圈29F的位置上,通過從最開始的光46的通過位置向x軸方向偏離之位置。該偏離量Δd由以下式表示。
Δd=2L×tanθ……(1)
若前光圈29F的開口直徑D為偏離量Δd以下,則在前鏡25F的朝向外側之面256上垂直反射之光在往返一次光共振器25內之期間,被前光圈29F遮蔽。若往返於光共振器25內之光在往返兩次之前被遮蔽,則可以認為該光不會成長至雷射光。為了使往返於光共振器25內之光在往返兩次之前被遮蔽,傾斜角θ、光圈的間隔L、光圈的開口直徑D滿足以下的關係為較佳。
θ≥tan-1
(D/4L)……(2)
實際上,後鏡25R配置於比後光圈29R更靠外側。因此,偏離量Δd大於由式(1)表示之值。進而,如參閱圖5進行之說明,光47在前鏡25F的朝向外側之面256上反射之光的傳播方向上的相對於光軸(z軸)之傾斜角大於傾斜角θ。因此,往返於光共振器25內之光在往返兩次之前被遮蔽之條件比上述條件式(2)寬鬆。若滿足上述條件式(2),則在實際的氣體雷射裝置中,可以獲得抑制由前鏡25F的朝向外側之面256引起之不必要的雷射振盪的產生的效果。
接著,參閱圖6,對搭載有基於上述實施例之光共振器25之雷射加工裝置進行說明。
圖6係雷射加工裝置的概略圖。雷射振盪器70依據來自控制裝置73的指令輸出脈衝雷射光束。從雷射振盪器70輸出之脈衝雷射光束通過光束整形掃描光學系統71入射到加工對象物75。光束整形掃描光學系統71對雷射光束的光束截面形狀進行整形,並且沿二維方向掃描雷射光束。
加工對象物75例如為印刷基板,保持於工作台72。工作台72能夠藉由來自控制裝置73的指令,使加工對象物75沿著與其被加工面平行之兩個方向移動。該雷射加工裝置用於基於脈衝雷射光束之加工對象物75的鑽孔加工。
雷射振盪器70使用了基於上述實施例之光共振器25。因此,能夠提高從雷射振盪器70輸出之脈衝雷射光束的強度分布的穩定性。其結果,脈衝雷射光束的光束剖面的正圓度提高,能夠提高鑽孔加工的加工品質。
上述各個實施例僅是示例,本發明並不限定於上述實施例。例如,本發明可以進行各種變更、改良及組合等,這對本案發明所屬技術領域中具有通常知識者來講是顯而易見的。Referring to FIGS. 1 to 3C , the optical resonator according to the embodiment and the gas laser device equipped with the optical resonator will be described. FIG. 1 is a cross-sectional view including an optical axis of a gas laser device equipped with an optical resonator according to an embodiment. An xyz orthogonal coordinate system in which the optical axis direction of the optical resonator is the z-axis direction and the vertical upper direction is the x-axis direction is defined. The laser gas is contained in the
10:腔室
11:光學室
12:送風機室
13:上下隔板
13A,13B:開口
14:底板
15:隔板
16:腔室支撐構件
21:放電電極
22,23:放電電極支撐構件
24:放電區域
25:光共振器
25F:前鏡
25R:後鏡
26:共同支撐構件
27:光共振器支撐構件
28:透光窗
29F:前光圈
29R:後光圈
40,41,43,44,46,47:在光共振器內傳播之光
50:送風機
51:第1氣體流路
52:第2氣體流路
56:熱交換器
58:流出孔
59:過濾器
70:雷射振盪器
71:光束整形掃描光學系統
72:工作台
73:控制裝置
75:加工對象物
251:後鏡的谷線
255:前鏡的朝向內側之面
256:前鏡的朝向外側之面10: Chamber
11: Optical Room
12: Blower room
13: Upper and
[圖1]係搭載有基於實施例之光共振器之氣體雷射裝置的包含光軸之剖面圖。 [圖2]係搭載有基於實施例之光共振器之氣體雷射裝置的與光軸垂直之剖面圖。 [圖3A]、[圖3B]及[圖3C]分別係基於實施例之光共振器的立體圖、與y軸垂直之剖面圖及與x軸垂直之剖面圖。 [圖4A]及[圖4B]分別係表示在基於實施例及比較例之光共振器的前鏡的朝向外側之面上垂直反射之光在xz剖面上傳播之狀態之圖。 [圖5]係前光圈、後光圈及光在兩者之間相對於光共振器的光軸沿傾斜方向傳播之模示圖。 [圖6]係使用了搭載有基於實施例之光共振器之雷射振盪器之雷射加工裝置的概略圖。1 is a cross-sectional view including an optical axis of a gas laser device equipped with an optical resonator according to an embodiment. FIG. 2 is a cross-sectional view perpendicular to the optical axis of the gas laser device equipped with the optical resonator according to the embodiment. [FIG. 3A], [FIG. 3B], and [FIG. 3C] are a perspective view, a cross-sectional view perpendicular to the y-axis, and a cross-sectional view perpendicular to the x-axis of the optical resonator according to the embodiment, respectively. 4A ] and [ FIG. 4B ] are diagrams showing a state in which light vertically reflected on the outer surface of the front mirror of the optical resonator according to the example and the comparative example propagates on the xz cross-section, respectively. [ Fig. 5 ] It is a schematic diagram of the front aperture, the rear aperture, and light propagating in an oblique direction with respect to the optical axis of the optical resonator between them. FIG. 6 is a schematic diagram of a laser processing apparatus using a laser oscillator mounted with the optical resonator according to the embodiment.
24:放電區域 24: Discharge area
25F:前鏡 25F: Front mirror
25R:後鏡 25R: rear mirror
29F:前光圈 29F: Front Aperture
29R:後光圈 29R: rear aperture
251:後鏡的谷線 251: Valley line of rear mirror
255:前鏡的朝向內側之面 255: Inward facing side of the front mirror
256:前鏡的朝向外側之面 256: The outer face of the front mirror
x:x軸 x:x axis
y:y軸 y: y axis
z:z軸 z: z axis
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