TWI745581B

TWI745581B - High magnetic permeability target device

Info

Publication number: TWI745581B
Application number: TW107112438A
Authority: TW
Inventors: 李原吉; 劉品均; 楊峻杰; 陳松醮; 蔡明展; 林子平
Original assignee: 友威科技股份有限公司
Priority date: 2018-04-11
Filing date: 2018-04-11
Publication date: 2021-11-11
Also published as: TW201943879A

Abstract

A high magnetic permeability target device includes a plate, a target unit, and a magnetic unit. The target unit is disposed on one side of the plate and includes a middle target, an inner target ring, and an outer target ring. A sectional face of the inner target ring is formed in a trapezoid shape having a narrower top edge and a wider bottom edge. A first guide face and a second guide face are disposed on two sides of the inner target ring, respectively, with an inclined inner channel formed between the first guide face and the inner target ring, and an inclined outer channel formed between the second face and the inner target ring. The magnetic unit is disposed on another side of the plate in opposite to the target unit. The inclined inner channel and outer channel prevent the weakening of line of magnetic force and the magnetic field disturbance, thus effectively forcing the plasma to carry out the sputtering operation upon the inner target ring

Description

具高磁穿性之磁性靶材Magnetic target with high magnetic penetration

本發明係關於一種磁性靶材，尤指一種提高磁力穿透並集中電漿轟擊濺鍍的具高磁穿性之磁性靶材。The present invention relates to a magnetic target material, in particular to a magnetic target material with high magnetic penetrability that improves magnetic penetration and concentrates plasma bombardment and sputtering.

查，依據中國大陸專利公告第CN204644457U號所揭示之一種磁性靶材裝置，其包含一背板及一濺鍍靶。濺鍍靶由磁性金屬製成並包含一設置於背板之一基底面、一相反於基底面之轟擊面及至少一由轟擊面貫通至基底面的導磁通道，其中，導磁通道具有一由轟擊面朝背板方向延伸的第一導磁段、一連通第一導磁段並與第一導磁段形成一第一夾角延伸的第二導磁段，及一連通第二導磁段並與第二導磁段形成一第二夾角朝背板延伸的第三導磁段。According to the investigation, a magnetic target device disclosed in Mainland China Patent Publication No. CN204644457U includes a back plate and a sputtering target. The sputtering target is made of magnetic metal and includes a base surface arranged on the back plate, a bombarding surface opposite to the base surface, and at least one magnetic channel penetrating from the bombarding surface to the base surface, wherein the magnetic channel has a A first magnetically permeable section extending from the bombardment surface toward the back plate, a second magnetically permeable section that communicates with the first magnetically permeable section and forms a first angle with the first magnetically permeable section, and a connected second magnetically permeable section It forms a third magnetically permeable section extending toward the back plate at a second angle with the second magnetically permeable section.

於實際轟擊濺鍍靶時，由於第一導磁段與第二導磁段間形成有第一夾角，以及第二導磁段與第三導磁段間形成有第二夾角，因此磁場穿越濺鍍靶的兩導磁通道過程中，磁場的穿越效率會受到第一角度及第二角度的干擾，接著，請配合圖5所示，其係習知偵測濺鍍靶的磁場強度分布曲線圖，顯然地，偵測出的磁場強度呈現雙峰曲線，其中，兩個峰值的位置分別是對應於濺鍍靶的內側與外側靶區塊，對應雙峰之間谷值部分則為中間靶區塊；換句話說，實際上承受轟擊較多的中間靶區塊反而磁場強度較低，其可能是因為磁場穿越兩導磁通道過程受到干擾而產生磁力分散的現象，進而會產生降低濺鍍靶的濺鍍效能之問題。In the actual bombardment of the sputtering target, since the first angle is formed between the first and second magnetically permeable segments, and the second angle is formed between the second and third magnetically permeable segments, the magnetic field passes through the sputtering During the process of the two magnetic channels of the plating target, the traversing efficiency of the magnetic field will be interfered by the first angle and the second angle. Then, please cooperate with the graph shown in Figure 5, which is a conventional sputtering target detection magnetic field intensity distribution curve. Obviously, the detected magnetic field intensity presents a double-peak curve, where the positions of the two peaks correspond to the inner and outer target blocks of the sputtering target, and the valley between the two peaks is the middle target block. In other words, in fact, the middle target block that has suffered more bombardment actually has lower magnetic field strength. This may be due to the interference of the magnetic field passing through the two magnetic channels and the dispersion of magnetic force, which will reduce the sputtering target. The problem of sputtering performance.

本發明之主要目的在於解決習知濺鍍靶材之磁場強度不均的缺失，並解決濺鍍靶材濺鍍效能不佳的問題。The main purpose of the present invention is to solve the lack of uneven magnetic field intensity of the conventional sputtering target and solve the problem of poor sputtering performance of the sputtering target.

為了解決上述課題，本發明提供一種具高磁穿性之磁性靶材，其包含：一背板、一靶材單元及一磁性單元。背板為非磁性材料，靶材單元設於背板之一面，靶材單元包含一內側靶材、一環設內側靶材的內環靶材，以及一遠離內側靶材環設內環靶材一側的外環靶材，內環靶材為磁性材料製成，其具有接觸於背板之一基底面、遠離基底面之一轟擊面、一第一導磁面及一第二導磁面，第一導磁面及第二導磁面相對設置且分別連接基底面與轟擊面，基底面連接第一導磁面與第二導磁面之長度大於轟擊面連接第一導磁面與第二導磁面之長度，內側靶材鄰設於第一導磁面並與內環靶材間形成一內側導磁通道，外環靶材遠離內側靶材鄰設於第二導磁面並與內環靶材間形成一外側導磁通道，磁性單元遠離靶材單元設於背板之另一面，磁性單元包含一第一磁鐵及一第二磁鐵，第一磁鐵對應設置於內側靶材之位置，第二磁鐵對應設置於外環靶材之位置。In order to solve the above-mentioned problems, the present invention provides a magnetic target with high magnetic penetration, which includes: a back plate, a target unit, and a magnetic unit. The back plate is made of non-magnetic material. The target unit is arranged on one side of the back plate. The target unit includes an inner target, an inner ring target with an inner target ring, and an inner ring target that is ringed away from the inner target The outer ring target material on the side, the inner ring target material is made of magnetic material, which has a base surface contacting the back plate, a bombarding surface away from the base surface, a first magnetic conductive surface and a second magnetic conductive surface, The first magnetic surface and the second magnetic surface are opposed to each other and respectively connect the base surface and the bombardment surface. The base surface connects the first magnetic surface and the second magnetic surface longer than the bombardment surface connects the first magnetic surface and the second magnetic surface. The length of the magnetic surface, the inner target is adjacent to the first magnetic surface and an inner magnetic channel is formed between the inner target An outer magnetic channel is formed between the ring targets. The magnetic unit is located on the other side of the back plate away from the target unit. The magnetic unit includes a first magnet and a second magnet. The first magnet is corresponding to the position of the inner target. The second magnet is correspondingly arranged at the position of the outer ring target.

藉此，透過本發明傾斜設置的內側導磁通道與外側導磁通道能提升磁性單元的磁場穿越靶材單元的效果，提升內環靶材上方的磁場強度，使電漿更能夠集中轟擊於內環靶材的轟擊面上，藉以提升靶材單元的磁場穿透性以及濺鍍效率，而且還可以達到防止電漿直接轟擊背板的功效。Thereby, through the obliquely arranged inner magnetic channel and outer magnetic channel of the present invention, the effect of the magnetic field passing through the target unit of the magnetic unit can be improved, and the magnetic field strength above the target of the inner ring can be increased, so that the plasma can more concentrated bombardment in the inner ring. The bombardment surface of the ring target can improve the magnetic field penetration and sputtering efficiency of the target unit, and it can also achieve the effect of preventing the plasma from directly bombarding the backplane.

為便於說明本發明於上述發明內容一欄中所表示的中心思想，茲以具體實施例表達。實施例中各種不同物件係按適於列舉說明之比例，而非按實際元件的比例予以繪製，合先敘明。In order to facilitate the description of the central idea of the present invention expressed in the column of the above-mentioned summary of the invention, specific embodiments are used to express it. Various objects in the embodiments are drawn according to the proportions suitable for enumeration and description, rather than according to the proportions of actual elements, and are described first.

請參閱圖1至圖4所示，本發明提供一種具高磁穿性之磁性靶材，其包含：一背板10、一靶材單元20及一磁性單元30。Please refer to FIGS. 1 to 4, the present invention provides a magnetic target with high magnetic penetration, which includes a back plate 10, a target unit 20 and a magnetic unit 30.

背板10，其為非磁性材料，且本實施例中背板10的厚度為3毫米至6毫米。The back plate 10 is a non-magnetic material, and the thickness of the back plate 10 in this embodiment is 3 mm to 6 mm.

靶材單元20，其設於背板10之一面，於本實施例中，靶材單元20整體為具有兩端為弧形的長方結構，類似於操場之形狀，靶材單元20包含一內側靶材21、一環設內側靶材21的內環靶材22，以及一環設內環靶材22遠離內側靶材21一側的外環靶材23，其中，內環靶材22為磁性材料製成，而內側靶材21與外環靶材23之材質視需求情況而可為磁性材料。除此之外，於本實施例中，內側靶材21與外環靶材23垂直於背板10之厚度大於內環靶材22垂直於背板10之厚度，值得詳細說明的是，內側靶材21與外環靶材23之厚度大於內環靶材22之厚度1毫米至6毫米，且內側靶材21與外環靶材23彼此等高設置，藉由如此的結構設計，能夠進一步的降低磁性單元30內側靶材21與外環靶材23的磁場強度，以集中磁場強度於內環靶材22，提升濺鍍的效率。舉例來說，本發明之背板10厚度為4公釐（mm），內側靶材21以及外環靶材23之厚度為8公釐，而內環靶材22之厚度為6公釐。The target unit 20 is arranged on one surface of the back plate 10. In this embodiment, the target unit 20 has a rectangular structure with arc-shaped ends, similar to the shape of a playground. The target unit 20 includes an inner side The target material 21, an inner ring target material 22 ringed with an inner target material 21, and an outer ring target material 23 ringed with an inner ring target material 22 away from the inner target material 21, wherein the inner ring target material 22 is made of a magnetic material The inner target material 21 and the outer ring target material 23 can be made of magnetic materials as required. In addition, in this embodiment, the thickness of the inner target material 21 and the outer ring target material 23 perpendicular to the back plate 10 is greater than the thickness of the inner ring target material 22 perpendicular to the back plate 10. It is worth explaining in detail that the inner target The thickness of the material 21 and the outer ring target material 23 is 1 mm to 6 mm greater than the thickness of the inner ring target material 22, and the inner target material 21 and the outer ring target material 23 are arranged at the same height with each other. Through such a structural design, it can be further The magnetic field intensity of the inner target 21 and the outer ring target 23 of the magnetic unit 30 is reduced to concentrate the magnetic field intensity on the inner ring target 22 to improve the efficiency of sputtering. For example, the thickness of the back plate 10 of the present invention is 4 mm (mm), the thickness of the inner target 21 and the outer target 23 are 8 mm, and the thickness of the inner target 22 is 6 mm.

請配合參酌圖2及圖3所示，內環靶材22具有接觸於背板10之一基底面221、遠離基底面221之一轟擊面222、一第一導磁面223及一第二導磁面224，第一導磁面223及第二導磁面224相對設置於內環靶材22之兩側面，且第一導磁面223及第二導磁面224分別連接於基底面221與轟擊面222，於本發明實施例中，基底面221連接第一導磁面223與第二導磁面224之長度大於轟擊面222連接第一導磁面223與第二導磁面224之長度。Please refer to FIGS. 2 and 3, the inner ring target 22 has a base surface 221 contacting the back plate 10, a bombarding surface 222 away from the base surface 221, a first magnetic conductive surface 223, and a second conductive surface. The magnetic surface 224, the first magnetic surface 223 and the second magnetic surface 224 are disposed opposite to the two side surfaces of the inner ring target 22, and the first magnetic surface 223 and the second magnetic surface 224 are respectively connected to the base surface 221 and Bombardment surface 222. In the embodiment of the present invention, the length of the base surface 221 connecting the first magnetic surface 223 and the second magnetic surface 224 is greater than the length of the bombardment surface 222 connecting the first magnetic surface 223 and the second magnetic surface 224 .

換句話說，請配合參酌圖3所示，內環靶材22的第一導磁面223與第二導磁面224分別由基底面221往轟擊面222方向傾斜延伸，其中，基底面221與第一導磁面223及第二導磁面224間的角度可介於30∘至85∘之間，於本發明實施例中，基底面221與第一導磁面223及第二導磁面224間的角度為45∘，使內環靶材22之截面形成上窄下寬之等腰梯形，但本發明不限於此，第一導磁面223與第二導磁面224分別可由基底面221往轟擊面222方向弧形延伸或者呈鋸齒狀設置In other words, please refer to FIG. 3, the first magnetic surface 223 and the second magnetic surface 224 of the inner ring target 22 extend obliquely from the base surface 221 to the bombardment surface 222, wherein the base surface 221 and The angle between the first magnetic surface 223 and the second magnetic surface 224 may be between 30∘ to 85∘. In the embodiment of the present invention, the base surface 221 is connected to the first magnetic surface 223 and the second magnetic surface The angle between 224 is 45∘, so that the cross section of the inner ring target 22 forms an isosceles trapezoid with a narrow top and a wide bottom. However, the present invention is not limited to this. 221 extends toward the bombardment surface 222 in an arc shape or is arranged in a zigzag shape

更進一步的說明，內側靶材21具有一內側導磁面211以及一內側延伸面212，內側導磁面211之位置對應鄰設於內環靶材22之第一導磁面223，使內側導磁面211與第一導磁面223間貫穿形成一內側導磁通道24，內側導磁通道24的間隔距離為0.5毫米至3毫米，內側延伸面212由內側導磁面211往遠離背板10之方向縱向延伸，使內側延伸面212凸出內環靶材22之轟擊面222。內側導磁面211與背板10間具有一內側接點213。而外環靶材23具有一外環導磁面231以及一外環延伸面232，外環導磁面231之位置遠離內側靶材21對應鄰設於內環靶材22之第二導磁面224，使外環導磁面231與第二導磁面224間貫穿形成一外側導磁通道25，而外側導磁通道25的間隔距離為0.5毫米至3毫米，外環延伸面232由外環導磁面231往遠離背板10之方向縱向延伸，且外環延伸面232凸出內環靶材22之轟擊面222。外環導磁面231與背板10間具有一外側接點233。藉由這樣的設計，可減少內側靶材21與外環靶材23因部分遮蓋於內環靶材22，而受到離子轟擊的問題，藉此增加內側靶材21與外環靶材23的使用壽命。To further illustrate, the inner target 21 has an inner magnetic conductive surface 211 and an inner extending surface 212. The position of the inner magnetic conductive surface 211 corresponds to the first magnetic conductive surface 223 adjacent to the inner ring target 22, so that the inner magnetic conductive surface An inner magnetic channel 24 is formed between the magnetic surface 211 and the first magnetic surface 223. The distance between the inner magnetic channel 24 is 0.5 mm to 3 mm. The inner extension surface 212 extends from the inner magnetic surface 211 away from the back plate 10 The direction extends longitudinally, so that the inner extension surface 212 protrudes from the bombardment surface 222 of the inner ring target 22. There is an inner contact 213 between the inner magnetic conducting surface 211 and the back plate 10. The outer ring target 23 has an outer ring magnetic surface 231 and an outer ring extension surface 232. The outer ring magnetic surface 231 is located far away from the inner target 21 and corresponds to the second magnetic surface adjacent to the inner ring 22 224. The outer magnetic conductive surface 231 and the second magnetic conductive surface 224 penetrate through to form an outer magnetic conductive channel 25, and the outer magnetic conductive channel 25 is separated by 0.5 mm to 3 mm. The outer ring extension surface 232 is formed by the outer ring The magnetic conductive surface 231 extends longitudinally away from the back plate 10, and the outer ring extension surface 232 protrudes from the bombarding surface 222 of the inner ring target 22. There is an outer contact 233 between the outer ring magnetic conducting surface 231 and the back plate 10. With this design, the problem of ion bombardment due to the inner target 21 and outer ring target 23 being partially covered by the inner ring target 22 can be reduced, thereby increasing the use of the inner target 21 and outer ring target 23 life.

磁性單元30，其遠離靶材單元20設於背板10之另一面，磁性單元30包含一第一磁鐵31及一第二磁鐵32，請配合參酌圖3所示，第一磁鐵31對應設置於內側靶材21之位置，且第一磁鐵31之一第一邊緣311係縱向切齊於內側接點213，第二磁鐵32對應設置於外環靶材23之位置，且第二磁鐵32之一第二邊緣321係縱向切齊於外側接點233，值得詳細說明的是，由於磁性單元30的磁場難以直接穿透內側靶材21與外環靶材23，因此，透過第一磁鐵31與第二磁鐵32切齊於內側接點213及外側接點233的設置方式，可集中磁場經由內側導磁通道24與外側導磁通道25穿透靶材單元20。The magnetic unit 30 is arranged on the other side of the back plate 10 away from the target unit 20. The magnetic unit 30 includes a first magnet 31 and a second magnet 32. Please refer to FIG. The position of the inner target 21, and the first edge 311 of the first magnet 31 is longitudinally aligned with the inner contact 213, the second magnet 32 is correspondingly arranged at the position of the outer ring target 23, and one of the second magnets 32 The second edge 321 is longitudinally aligned with the outer contact 233. It is worth explaining in detail that it is difficult for the magnetic field of the magnetic unit 30 to directly penetrate the inner target 21 and the outer ring target 23. Therefore, it passes through the first magnet 31 and the first magnet 31. The arrangement of the two magnets 32 aligned with the inner contact 213 and the outer contact 233 can concentrate the magnetic field through the inner magnetic channel 24 and the outer magnetic channel 25 to penetrate the target unit 20.

此外，第一磁鐵31與第二磁鐵32分別設於背板10，於本實施例中，第一磁鐵31之S極相鄰於背板10，而N極則是遠離背板10，第二磁鐵32之N極相鄰於背板10，而S極則是遠離背板10，藉以磁性單元30的磁場會由第二磁鐵32與第一磁鐵31之相異極性形成封閉磁力線。更進一步的說明，第一磁鐵31與第二磁鐵32之磁力線會藉由內側導磁通道24與外側導磁通道25的導引，而增加位於內環靶材22上方的磁場強度。In addition, the first magnet 31 and the second magnet 32 are respectively disposed on the back plate 10. In this embodiment, the S pole of the first magnet 31 is adjacent to the back plate 10, and the N pole is far away from the back plate 10. The N pole of the magnet 32 is adjacent to the back plate 10, and the S pole is far away from the back plate 10, so that the magnetic field of the magnetic unit 30 will form a closed magnetic field line by the opposite polarity of the second magnet 32 and the first magnet 31. To further explain, the magnetic field lines of the first magnet 31 and the second magnet 32 will be guided by the inner magnetic channel 24 and the outer magnetic channel 25 to increase the intensity of the magnetic field above the inner ring target 22.

請特別配合參閱圖4所示，其係對應於本發明之靶材結構的磁場強度位置對應分佈圖，如圖所示，對應於內側靶材21與外環靶材23位置的磁場強度遠較對應於內環靶材22位置的磁場強度低，而形成一高斯分佈的曲線圖，因而可在進行磁性濺鍍時，將轟擊力量集中於內環靶材22之位置，而提升靶材濺鍍效率。Please refer to FIG. 4 in particular, which is a corresponding distribution diagram of the magnetic field intensity position corresponding to the target structure of the present invention. As shown in the figure, the magnetic field intensity corresponding to the position of the inner target 21 and the outer ring target 23 is much higher The intensity of the magnetic field corresponding to the position of the inner ring target 22 is low, and a Gaussian distribution curve is formed. Therefore, when magnetic sputtering is performed, the bombardment force can be concentrated on the position of the inner ring target 22, and the target sputtering can be improved. efficient.

藉此，本發明具有以下優點：Therefore, the present invention has the following advantages:

1.利用內側導磁通道24與外側導磁通道25之傾斜方向對應於第一磁鐵31與第二磁鐵32之封閉磁力線的弧形範圍，因此可有效的避免靶材單元20影響磁場強度的問題，提升位於內環靶材22位置所對應的磁場強度。1. Utilize the inclination direction of the inner magnetic channel 24 and the outer magnetic channel 25 to correspond to the arc range of the enclosed magnetic field lines of the first magnet 31 and the second magnet 32, so the problem of the target unit 20 affecting the magnetic field strength can be effectively avoided , Increase the magnetic field intensity corresponding to the position of the target 22 in the inner ring.

2.藉由傾斜的內側導磁通道24與外側導磁通道25，亦可達到降低離子直接轟擊背板10的優點。2. With the inclined inner magnetic channel 24 and outer magnetic channel 25, the advantage of reducing direct ion bombardment of the back plate 10 can also be achieved.

3.透過第一磁鐵31之第一邊緣311縱向切齊內側接點213，而第二磁鐵32之第二邊緣321縱向切齊外側接點233，能夠有效讓磁力線通過內側導磁通道24與外側導磁通道25，避免磁力耗損之狀況。3. The first edge 311 of the first magnet 31 is longitudinally aligned with the inner contact 213, and the second edge 321 of the second magnet 32 is longitudinally aligned with the outer contact 233, which can effectively allow the lines of magnetic force to pass through the inner magnetic channel 24 and the outer The magnetic channel 25 avoids the loss of magnetic force.

4.內側靶材21之內側延伸面212與外環靶材23之外環延伸面232係縱向垂直於背板10，可減少內側靶材21與外環靶材23因部分遮蓋於內環靶材22之位置，而受到離子轟擊的問題，藉此增加內側靶材21與外環靶材23的使用壽命。4. The inner extension surface 212 of the inner target material 21 and the outer ring extension surface 232 of the outer ring target material 23 are longitudinally perpendicular to the back plate 10, which can reduce the inner target material 21 and the outer ring target material 23 being partially covered by the inner ring target The position of the material 22 is subject to ion bombardment, thereby increasing the service life of the inner target 21 and the outer ring target 23.

以上所舉實施例僅用以說明本發明而已，非用以限制本發明之範圍。舉凡不違本發明精神所從事的種種修改或變化，俱屬本發明意欲保護之範疇。The above-mentioned embodiments are only used to illustrate the present invention, and are not used to limit the scope of the present invention. All modifications or changes made without violating the spirit of the present invention fall within the scope of the present invention's intended protection.

10‧‧‧背板 23‧‧‧外環靶材 20‧‧‧靶材單元 231‧‧‧外環導磁面 21‧‧‧內側靶材 232‧‧‧外環延伸面 211‧‧‧內側導磁面 233‧‧‧外側接點 212‧‧‧內側延伸面 24‧‧‧內側導磁通道 213‧‧‧內側接點 25‧‧‧外側導磁通道 22‧‧‧內環靶材 30‧‧‧磁性單元 221‧‧‧基底面 31‧‧‧第一磁鐵 222‧‧‧轟擊面 311‧‧‧第一邊緣 223‧‧‧第一導磁面 32‧‧‧第二磁鐵 224‧‧‧第二導磁面 321‧‧‧第二邊緣 10‧‧‧Back plate 23‧‧‧Outer Ring Target 20‧‧‧Target unit 231‧‧‧Outer ring magnetic surface 21‧‧‧Inner target 232‧‧‧Extended surface of outer ring 211‧‧‧Inner magnetic surface 233‧‧‧Outside contact 212‧‧‧Inside extension surface 24‧‧‧Inner magnetic channel 213‧‧‧Inside contact 25‧‧‧Outside magnetic channel 22‧‧‧Inner ring target 30‧‧‧Magnetic unit 221‧‧‧Base surface 31‧‧‧The first magnet 222‧‧‧Bombardment surface 311‧‧‧First Edge 223‧‧‧The first magnetic surface 32‧‧‧Second Magnet 224‧‧‧Second magnetic surface 321‧‧‧Second Edge

圖1係為本發明之俯視外觀示意圖。圖2係為本發明沿剖面線2-2之剖面示意圖。圖3係圖2之局部放大示意圖。圖4係為本發明之磁場強度位置對應分佈曲線圖。圖5係為習知之磁場強度分佈曲線圖。Figure 1 is a schematic top view of the appearance of the present invention. Figure 2 is a schematic cross-sectional view of the present invention along the section line 2-2. Fig. 3 is a partial enlarged schematic diagram of Fig. 2. Fig. 4 is a graph showing the corresponding distribution curve of the magnetic field strength position of the present invention. Figure 5 is a graph of the conventional magnetic field intensity distribution.

10‧‧‧背板 10‧‧‧Back plate

20‧‧‧靶材單元 20‧‧‧Target unit

21‧‧‧內側靶材 21‧‧‧Inner target

211‧‧‧內側導磁面 211‧‧‧Inner magnetic surface

212‧‧‧內側延伸面 212‧‧‧Inside extension surface

213‧‧‧內側接點 213‧‧‧Inside contact

22‧‧‧內環靶材 22‧‧‧Inner ring target

221‧‧‧基底面 221‧‧‧Base surface

222‧‧‧轟擊面 222‧‧‧Bombardment surface

223‧‧‧第一導磁面 223‧‧‧The first magnetic surface

224‧‧‧第二導磁面 224‧‧‧Second magnetic surface

23‧‧‧外環靶材 23‧‧‧Outer Ring Target

231‧‧‧外環導磁面 231‧‧‧Outer ring magnetic surface

232‧‧‧外環延伸面 232‧‧‧Extended surface of outer ring

233‧‧‧外側接點 233‧‧‧Outside contact

24‧‧‧內側導磁通道 24‧‧‧Inner magnetic channel

25‧‧‧外側導磁通道 25‧‧‧Outside magnetic channel

30‧‧‧磁性單元 30‧‧‧Magnetic unit

31‧‧‧第一磁鐵 31‧‧‧The first magnet

311‧‧‧第一邊緣 311‧‧‧First Edge

32‧‧‧第二磁鐵 32‧‧‧Second Magnet

321‧‧‧第二邊緣 321‧‧‧Second Edge

Claims

一種具高磁穿性之磁性靶材，其包含：一背板，其為非磁性材料；一靶材單元，其設於該背板之一面，該靶材單元包含一內側靶材、一環設該內側靶材的內環靶材，以及一遠離該內側靶材環設該內環靶材一側的外環靶材，該內環靶材為磁性材料製成，其具有接觸於該背板之一基底面、遠離該基底面之一轟擊面、一第一導磁面及一第二導磁面，該第一導磁面及該第二導磁面相對設置且分別連接該基底面與該轟擊面，且該第一導磁面與該第二導磁面分別由該基底面往該轟擊面方向直線地傾斜延伸，該基底面連接該第一導磁面與該第二導磁面之長度大於該轟擊面連接該第一導磁面與該第二導磁面之長度，該基底面與該第一導磁面間的角度為30°至85°，該基底面與該第二導磁面間的角度為30°至85°，使該內環靶材的截面形成梯形形狀，其中該內側靶材鄰設於該第一導磁面並與該內環靶材間形成對應該第一導磁面直線地傾斜延伸的一內側導磁通道，該外環靶材遠離該內側靶材鄰設於該第二導磁面並與該內環靶材間形成對應該第二導磁面直線地傾斜延伸的一外側導磁通道，該內側導磁通道與該外側導磁通道分別從鄰近該背板處朝向該內側導磁通道與該外側導磁通道之間的該內環靶材傾斜；以及一磁性單元，其遠離該靶材單元設於該背板之另一面，該磁性單元包含一第一磁鐵及一第二磁鐵，該第一磁鐵對應設置於該內側靶材之位置，該第二磁鐵對應設置於該外環靶材之位置。 A magnetic target with high magnetic penetration, which comprises: a back plate, which is a non-magnetic material; a target unit, which is arranged on one surface of the back plate, and the target unit comprises an inner target and a ring The inner ring target material of the inner target material, and an outer ring target material on the side away from the inner target material surrounding the inner ring target material, the inner ring target material is made of magnetic material, and has contact with the back plate A base surface, a bombardment surface far from the base surface, a first magnetic conductive surface and a second magnetic conductive surface, the first magnetic conductive surface and the second magnetic conductive surface are arranged oppositely and respectively connect the base surface and The bombardment surface, the first magnetic conductive surface and the second magnetic conductive surface respectively extend linearly and obliquely from the base surface toward the bombardment surface, and the base surface connects the first magnetic conductive surface and the second magnetic conductive surface The length is greater than the length of the bombardment surface connecting the first magnetic surface and the second magnetic surface, the angle between the base surface and the first magnetic surface is 30° to 85°, and the base surface is connected to the second magnetic surface. The angle between the magnetic conductive surfaces is 30° to 85°, so that the cross section of the inner ring target material forms a trapezoidal shape, wherein the inner target material is adjacent to the first magnetic surface and forms a correspondence with the inner ring target material An inner magnetic permeable channel extending linearly and obliquely from the first magnetic surface, the outer ring target material is away from the inner target material and is adjacent to the second magnetic surface and forms a corresponding second magnetic permeable channel between the inner ring target material An outer magnetic permeable channel extending linearly and obliquely, the inner magnetic permeable channel and the outer magnetic permeable channel respectively from adjacent to the back plate toward the inner ring target between the inner magnetic permeable channel and the outer magnetic permeable channel Tilt; and a magnetic unit, which is located away from the target unit on the other side of the back plate, the magnetic unit includes a first magnet and a second magnet, the first magnet is corresponding to the position of the inner target, The second magnet is correspondingly arranged at the position of the outer ring target.

如請求項1所述之具高磁穿性之磁性靶材，其中，該內側靶材與該外環靶材垂直於該背板之厚度大於該內環靶材垂直於該背板之厚度。 The magnetic target material with high magnetic penetration according to claim 1, wherein the thickness of the inner target material and the outer ring target material perpendicular to the back plate is greater than the thickness of the inner ring target material perpendicular to the back plate.

如請求項2所述之具高磁穿性之磁性靶材，其中，該內側靶材具有一內側導磁面以及一內側延伸面，該內側導磁面之位置對應於該第一導磁面，該內側延伸面由該內側導磁面往遠離該背板之方向縱向延伸且凸出該轟擊面。 The magnetic target material with high magnetic permeability according to claim 2, wherein the inner target material has an inner magnetically permeable surface and an inner extending surface, and the position of the inner magnetically permeable surface corresponds to the first magnetically permeable surface The inner extension surface extends longitudinally from the inner magnetic conductive surface in a direction away from the back plate and protrudes from the bombardment surface.

如請求項2所述之具高磁穿性之磁性靶材，其中，該外環靶材具有一外環導磁面以及一外環延伸面，該外環導磁面之位置對應於該第二導磁面，該外環延伸面由該外環導磁面往遠離該背板之方向縱向延伸且凸出該轟擊面。 The magnetic target with high magnetic penetration according to claim 2, wherein the outer ring target has an outer ring magnetic surface and an outer ring extension surface, and the position of the outer ring magnetic surface corresponds to the first Two magnetic conductive surfaces, the outer ring extension surface extends longitudinally from the outer ring magnetic conductive surface in a direction away from the back plate and protrudes from the bombarding surface.

如請求項2所述之具高磁穿性之磁性靶材，其中，該外環靶材與該內側靶材之厚度大於該內環靶材之厚度1毫米至6毫米。 The magnetic target material with high magnetic penetration according to claim 2, wherein the thickness of the outer ring target material and the inner target material is greater than the thickness of the inner ring target material by 1 mm to 6 mm.

如請求項1所述之具高磁穿性之磁性靶材，其中，該內側導磁通道的間隔距離為0.5毫米至3毫米，該外側導磁通道的間隔距離為0.5毫米至3毫米。 The magnetic target material with high magnetic permeability according to claim 1, wherein the separation distance of the inner magnetic passage is 0.5 mm to 3 mm, and the separation distance of the outer magnetic passage is 0.5 mm to 3 mm.

如請求項1所述之具高磁穿性之磁性靶材，其中，該背板的厚度為3毫米至6毫米。 The magnetic target material with high magnetic permeability according to claim 1, wherein the thickness of the back plate is 3 mm to 6 mm.

如請求項1所述之具高磁穿性之磁性靶材，其中，該內側靶材具有位置對應於該第一導磁面之一內側導磁面，該內側導磁面與該第一導磁面相互間隔而形成該內側導磁通道，該內側導磁面與該背板具有一內側接點，該第一磁鐵之一第一邊緣係縱向切齊於該內側接點；該外環靶材具有位置對應於該第二導磁面之一外環導磁面，該外環導磁面與該第二導磁面相互間隔而形成該外側導磁通道，該外環導磁面與該背板具有一外側接點，該第二磁鐵之一第二邊緣係縱向切齊於該外側接點。 The magnetic target with high magnetic penetration according to claim 1, wherein the inner target has an inner magnetic surface corresponding to the first magnetic surface, the inner magnetic surface and the first magnetic surface The magnetic surfaces are spaced apart to form the inner magnetic channel, the inner magnetic surface and the back plate have an inner contact, and a first edge of the first magnet is longitudinally aligned with the inner contact; the outer ring target The material has an outer-ring magnetic-permeable surface corresponding to the second magnetic-permeable surface, the outer-ring magnetic-permeable surface and the second magnetic-permeable surface are separated from each other to form the outer magnetic-permeable channel, and the outer-ring magnetic-permeable surface and the The back plate has an outer contact point, and a second edge of the second magnet is longitudinally aligned with the outer contact point.