TWI733447B - 可釋放中紅外線鏡片及其製造方法 - Google Patents
可釋放中紅外線鏡片及其製造方法 Download PDFInfo
- Publication number
- TWI733447B TWI733447B TW109115893A TW109115893A TWI733447B TW I733447 B TWI733447 B TW I733447B TW 109115893 A TW109115893 A TW 109115893A TW 109115893 A TW109115893 A TW 109115893A TW I733447 B TWI733447 B TW I733447B
- Authority
- TW
- Taiwan
- Prior art keywords
- film layer
- refractive index
- lens
- infrared
- far
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 28
- 239000007788 liquid Substances 0.000 claims abstract description 26
- 230000005855 radiation Effects 0.000 claims abstract description 23
- 238000001035 drying Methods 0.000 claims abstract description 20
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 14
- 239000002131 composite material Substances 0.000 claims abstract description 12
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 claims abstract description 10
- 239000011248 coating agent Substances 0.000 claims abstract description 4
- 238000000576 coating method Methods 0.000 claims abstract description 4
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 3
- 239000010703 silicon Substances 0.000 claims abstract description 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract 2
- 239000010408 film Substances 0.000 claims description 81
- 239000010409 thin film Substances 0.000 claims description 72
- 238000001704 evaporation Methods 0.000 claims description 16
- 238000010438 heat treatment Methods 0.000 claims description 14
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 12
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 12
- 238000000034 method Methods 0.000 claims description 11
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 9
- 230000008020 evaporation Effects 0.000 claims description 9
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 9
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 8
- 238000007740 vapor deposition Methods 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 6
- 239000010931 gold Substances 0.000 claims description 6
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- 239000000395 magnesium oxide Substances 0.000 claims description 6
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 6
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 6
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 6
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims description 6
- 229920001296 polysiloxane Polymers 0.000 claims description 6
- 239000013077 target material Substances 0.000 claims description 6
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 5
- MCMNRKCIXSYSNV-UHFFFAOYSA-N ZrO2 Inorganic materials O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 5
- 239000000203 mixture Substances 0.000 claims description 5
- 239000000377 silicon dioxide Substances 0.000 claims description 5
- 235000012239 silicon dioxide Nutrition 0.000 claims description 5
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 claims description 3
- 239000011651 chromium Substances 0.000 claims description 3
- 229940117975 chromium trioxide Drugs 0.000 claims description 3
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 claims description 3
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- JEIPFZHSYJVQDO-UHFFFAOYSA-N ferric oxide Chemical compound O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 3
- 229910052737 gold Inorganic materials 0.000 claims description 3
- DEIVNMVWRDMSMJ-UHFFFAOYSA-N hydrogen peroxide;oxotitanium Chemical compound OO.[Ti]=O DEIVNMVWRDMSMJ-UHFFFAOYSA-N 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 150000004767 nitrides Chemical class 0.000 claims description 3
- 229910052697 platinum Inorganic materials 0.000 claims description 3
- 229910021332 silicide Inorganic materials 0.000 claims description 3
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims description 3
- 229910052715 tantalum Inorganic materials 0.000 claims description 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims description 3
- 239000004408 titanium dioxide Substances 0.000 claims description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 3
- 229910052721 tungsten Inorganic materials 0.000 claims description 3
- 239000010937 tungsten Substances 0.000 claims description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 2
- AZCUJQOIQYJWQJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) trihydrate Chemical compound [O-2].[O-2].[Ti+4].O.O.O AZCUJQOIQYJWQJ-UHFFFAOYSA-N 0.000 claims description 2
- 239000007787 solid Substances 0.000 claims description 2
- 230000000750 progressive effect Effects 0.000 claims 4
- 239000012530 fluid Substances 0.000 claims 3
- 238000000151 deposition Methods 0.000 claims 1
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 1
- 238000012360 testing method Methods 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 230000004060 metabolic process Effects 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 230000017531 blood circulation Effects 0.000 description 3
- 229910003437 indium oxide Inorganic materials 0.000 description 3
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 3
- 239000004033 plastic Substances 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002148 esters Chemical class 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001639 boron compounds Chemical class 0.000 description 1
- -1 carbide Inorganic materials 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000035558 fertility Effects 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 230000036039 immunity Effects 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 230000005923 long-lasting effect Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 230000000191 radiation effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
- G02C7/104—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses having spectral characteristics for purposes other than sun-protection
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/10—Filters, e.g. for facilitating adaptation of the eyes to the dark; Sunglasses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/18—Processes for applying liquids or other fluent materials performed by dipping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/36—Successively applying liquids or other fluent materials, e.g. without intermediate treatment
- B05D1/38—Successively applying liquids or other fluent materials, e.g. without intermediate treatment with intermediate treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0218—Pretreatment, e.g. heating the substrate
- B05D3/0227—Pretreatment, e.g. heating the substrate with IR heaters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
- B05D3/0254—After-treatment
- B05D3/0263—After-treatment with IR heaters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
- B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
- B05D3/062—Pretreatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/02—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber
- B05D7/04—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials to macromolecular substances, e.g. rubber to surfaces of films or sheets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/52—Two layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D7/00—Processes, other than flocking, specially adapted for applying liquids or other fluent materials to particular surfaces or for applying particular liquids or other fluent materials
- B05D7/50—Multilayers
- B05D7/56—Three layers or more
- B05D7/57—Three layers or more the last layer being a clear coat
- B05D7/577—Three layers or more the last layer being a clear coat some layers being coated "wet-on-wet", the others not
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/042—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material including a refractory ceramic layer, e.g. refractory metal oxides, ZrO2, rare earth oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material
- C23C28/048—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material with layers graded in composition or physical properties
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/0006—Arrays
- G02B3/0012—Arrays characterised by the manufacturing method
- G02B3/0018—Reflow, i.e. characterized by the step of melting microstructures to form curved surfaces, e.g. manufacturing of moulds and surfaces for transfer etching
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B3/00—Simple or compound lenses
- G02B3/02—Simple or compound lenses with non-spherical faces
- G02B3/04—Simple or compound lenses with non-spherical faces with continuous faces that are rotationally symmetrical but deviate from a true sphere, e.g. so called "aspheric" lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/02—Lenses; Lens systems ; Methods of designing lenses
- G02C7/022—Ophthalmic lenses having special refractive features achieved by special materials or material structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
-
- G—PHYSICS
- G02—OPTICS
- G02C—SPECTACLES; SUNGLASSES OR GOGGLES INSOFAR AS THEY HAVE THE SAME FEATURES AS SPECTACLES; CONTACT LENSES
- G02C7/00—Optical parts
- G02C7/02—Lenses; Lens systems ; Methods of designing lenses
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Ophthalmology & Optometry (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Inorganic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Plasma & Fusion (AREA)
- Ceramic Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Toxicology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Eyeglasses (AREA)
- Optical Filters (AREA)
- Lenses (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Abstract
本發明關於一種可釋放中紅外線鏡片及其製造方法，該釋放中紅外線鏡片包含一鏡片及一硬化層。而可釋放中紅外線鏡片製造方法包含下列步驟；將該鏡片放置在一遠紅外線幅射源中；將該鏡片浸漬在一硬化液中，將鏡片浸漬在一硬化液中，使該硬化液塗覆在該鏡片上，該硬化液係為一矽利康及一異丙醇或一甲醇之任一，且添加有一遠紅外線材料或一遠紅外線複合材料；對披覆有該硬化液的該鏡片在放置在一烘乾空間中烘乾，使該硬化液乾燥硬化而在該鏡片的表面形成一硬化層，其中，該烘乾空間的溫度介於攝氏80至120度之間，烘乾的時間介於1至10小時之間。
Description
本發明係有關於一種可釋放中紅外線鏡片及其製造方法。
根據ISO 20473的分類，近紅外線的波長在0.78至3微米之間、中紅外線的波長在3至50微米之間，遠紅外線的波長在50-1000微米之間。其中波長介於4至14微米之間的中紅外線可以與人體的分子產生共振，促進微血管擴張、使血液循環順暢，促進新陳代謝，進而增加身體的免疫力，此波長段遠紅外線被稱為「生育之光」。目前市面上有一些具有遠紅外線效果的鏡框，但鏡框的遠紅外線無法直接照射到眼睛增加眼睛的新陳代謝。
中華民國公告號I293287「具遠紅外線放射之鏡片製造方法」，其揭露係將具遠紅外線放射之陶瓷粉末、分散劑、塑劑、塑膠酯粒等塑膠系列的高分子聚合物於溶融狀態下相互攪拌均勻加以混練，將混練後含遠紅外線材質之液態化混練物注入模具，接著經脫膜後製作出鏡片成品，且其經均勻混練射出成型脫膜為鏡片成品後，可令具遠紅外線放射機能之成品鏡片上達到長效永久型功能。
上述專利案在製作上雖然直接製作具遠紅外線放射效果的鏡片，但製程上可能會因陶瓷粉末與塑膠酯粒分散不均而造成釋放遠紅外線效果較差，或者造成鏡片透明度較差。
爰此，有鑑於目前製程上有所缺失，本發明可釋放中紅外線鏡片及其製造方法具有解決上述之缺點。
故本發明關於一種可釋放中紅外線鏡片及可釋放中紅外線鏡片的製造方法，係將一鏡片與一第一遠紅外線幅射源一同置放在一工作空間中，該工作空間的溫度介於攝氏40至115度之間，加熱的時間介於1至3小時之間，使該鏡片接受一遠紅外線；將該鏡片浸漬在一硬化液中，使該硬化液塗覆在該鏡片上，該硬化液塗覆厚度介於1至3微米之間，該硬化液係為一矽利康及一異丙醇或一甲醇之任一，且該硬化液中係添加有一遠紅外線材料或一遠紅外線複合材料，該遠紅外線複合材料為該遠紅外線材料與一氧化鋅(ZnO)的混合物；對披覆有該硬化液的該鏡片在放置在一烘乾空間中進行烘乾，使該硬化液乾燥硬化而在該鏡片的表面形成一硬化層，其中，該烘乾空間的溫度介於攝氏80至120度之間，烘乾的時間介於1至10小時之間。
本發明再提出關於一種可釋放中紅外線鏡片，係使用可釋放中紅外線鏡片的製造方法所製造。
進一步，該遠紅外線材料為下列任一：該遠紅外線材料為下列任一：氧化鎂(MgO)、氧化鈣(CaO)、氧化鋇(BaO)、二氧化鋯(ZrO2)、二氧化鈦(TiO2)、三氧化二鉻(Cr2O3)、二氧化錳(MnO2)、三氧化二鐵(Fe2O3)、三氧化二鋁(Al2O3)、碳化物、矽化物、硼化物、氮化物、鉭(Ta)、鉬(Mo)、鎢(W)、鐵(Fe)、鎳(Ni)、鉑(Pt)、銅(Cu)、金(Au)，該硬化液之矽利康固成份介於20%至35%之間。
進一步，該工作溫度在加熱過程係執行一漸進式升溫，該漸進式升溫係在攝氏40至115度之間與加熱時間1至3小時之間，由低溫至高溫分段升溫，每升一段溫度即維持一段時間。
進一步，該工作溫度在加熱過程係執行一漸進式升溫，該漸進式升溫係在攝氏40至115度之間與加熱時間1至3小時之間，由低溫直接升溫至高溫，且在最高溫時維持一段時間。
進一步，該工作空間中係設置多個該第一遠紅外線幅射源在該鏡片周圍。
進一步，在該烘乾空間中設置有一第二遠紅外線幅射源，使該鏡片在烘乾過程中接受該第二遠紅外線幅射源所輻射出的遠紅外線。
進一步，在該硬化層上係執行一蒸鍍步驟，該蒸鍍步驟包含：蒸鍍一第一折射率薄膜層；在該第一折射率薄膜層上蒸鍍一第二折射率薄膜層；上述蒸鍍一第一折射率薄膜層與蒸鍍一第二折射率薄膜層的操作係依序執行一次或多次；最後再於該第二折射率薄膜層上蒸鍍該第一折射率薄膜層；其中該第一折射率薄膜層的折射率係低於該第二折射率薄膜層的折射率。
進一步，該第一折射率薄膜層的折射率為1.46~1.98，該第二折射率薄膜層的折射率為2.15~2.76。
進一步，該第一折射率薄膜層係為下列之一：一一氧化矽薄膜層、一二氧化矽薄膜層、一一氧化矽與二氧化矽複合薄膜層，該第二折射率薄膜層係為下列之一：一二氧化鋯薄膜層、一二氧化鈦薄膜層、一三氧化二鈦薄膜層、一五氧化三鈦薄膜層。
進一步，蒸鍍有一氧化銦錫薄膜層在該第一折射率薄膜層與該第二折射率薄膜層之間。
進一步，在該硬化層上蒸鍍複數薄膜層前，先將該蒸鍍之靶材與該第一遠紅外線幅射源一同置放在該工作空間中，該工作空間的工作溫度控制於攝氏40至115度之間，時間為1至3小時之間，使該靶材接受該遠紅外線。
上述技術特徵具有下列之優點：
1.本發明藉由鏡片放置在遠紅外線幅射源中，使鏡片具有釋放中紅外線的功能，藉由鏡片釋放中紅外線幫助眼睛血液循環使新陳代謝加快。
2.本發明藉由將鏡片浸漬在硬化液，而硬化液包括該硬化液係為矽利康、異丙醇或甲醇之任一，且該添加遠紅外線材料或遠紅外線複合材料，將披覆硬化液的鏡片放至熱源乾燥，使鏡片上形成硬化層，藉由該硬化層內的遠紅外線材料延長該鏡片釋放中紅外線的時間。
3.本發明在硬化層上蒸鍍蒸鍍有第一折射率薄膜層、第二折射率薄膜層及氧化銦錫薄膜層，藉由複數薄膜層將藍光、紅外線之有害光線阻隔，並吸收具反射光之有害紫外線，達到保護使用者眼睛。
1:可釋放中紅外線鏡片
2:鏡片
3:硬化層
4:第一折射率薄膜層
5:第二折射率薄膜層
6:氧化銦薄膜層
A:遠紅外線幅射源
[第一圖]係為本發明可釋放中紅外線鏡片製造方法之流程圖。
[第二圖]係為本發明可釋放中紅外線鏡片的硬化層蒸鍍第一折射率薄膜層、第二折射率薄膜層及第一折射率薄膜層結構示意圖。
[第三圖]係為本發明可釋放中紅外線鏡片的硬化層蒸鍍第一折射率薄膜層、氧化銦錫薄膜層、第二折射率薄膜層及第一折射率薄膜層結構示意圖。
[第四圖]係為本發明可釋放中紅外線鏡片的硬化層蒸鍍第一折射率薄膜層、第二折射率薄膜層、氧化銦錫薄膜層及第一折射率薄膜層結構示意圖。
[第五圖]係為本發明可釋放中紅外線鏡片的硬化層蒸鍍第一折射率薄膜層、第二折射率薄膜層、第一折射率薄膜層、第二折射率薄膜層及第一折射率薄膜層結構示意圖。
[第六圖]係為本發明可釋放中紅外線鏡片的硬化層蒸鍍第一折射率薄膜層、氧化銦錫薄膜層、第二折射率薄膜層、第一折射率薄膜層、第二折射率薄膜層及第一折射率薄膜層結構示意圖。
[第七圖]係為本發明可釋放中紅外線鏡片的硬化層蒸鍍第一折射率薄膜層、第二折射率薄膜層、氧化銦錫薄膜層、第一折射率薄膜層、第二折射率薄膜層及第一折射率薄膜層結構示意圖。
[第八圖]係為本發明熱源內設置多個遠紅外線幅射源圍繞鏡片示意圖。
[第九圖]係為本發明釋放中紅外線鏡片使用示意圖。
請參閱第一圖及第二圖所示，一種可釋放中紅外線鏡片的製造方法，以該可釋放中紅外線鏡片的製造方法製作一種可釋放中紅外線鏡片1，該可釋放中紅外線鏡片1製造方法如下，將一鏡片2與一第一遠紅外線幅射源A一同置放在一工作空間中，該工作空間的溫度介於攝氏40至115度之間，加熱的時間介於1至3小時之間，使該鏡片2接受一遠紅外線，而上述將該鏡片2可以重複放置該第一遠紅外線幅射源A再將該鏡片2浸漬在該硬化液，本實施例設置有多個遠紅外線幅射源A圍繞該鏡片2。然後再將與該第一遠紅外線幅射源A加熱過的該鏡片2浸漬在一硬化液中，使該硬化液塗覆在該鏡片2上，該硬化液係為重量份介於19至33之間的一矽利康及重量份介於62至76之間的一異丙醇或重量份介於62至76之間的一甲醇之任一，且該硬化液中係添加有一遠紅外線材料或一遠紅外線複合材料，該遠紅外線複合材料為該遠紅外線材料與一氧化鋅(ZnO)的混合物，該遠紅外線材料為下列任一：氧化鎂(MgO)、氧化鈣(CaO)、氧化鋇(BaO)、二氧化鋯(ZrO2)、二氧化鈦(TiO2)、三氧化二鉻(Cr2O3)、二氧化錳(MnO2)、三氧化二鐵(Fe2O3)、三氧化二鋁(Al2O3)、碳化物、矽化物、硼化物、氮化物、鉭(Ta)、鉬(Mo)、鎢(W)、鐵(Fe)、鎳(Ni)、鉑(Pt)、銅(Cu)、金(Au)，該硬化液之矽利康固成份介於20%至35%之間，對披覆有該硬化液的該鏡片2在放置在一烘乾空間中進行烘乾，使該硬化液乾燥硬化而在該鏡片2的表面形成一硬化層3，其中，該烘乾空間的溫度介於攝氏80至120度之間，烘乾的時間介於1至10小
時之間，該硬化層3厚度介於1至3微米之間，製造出該可釋放中紅外線鏡片1，其中該烘乾空間內可設置一第二遠紅外線幅射源。
上述該工作溫度在加熱過程係執行一漸進式升溫，該漸進式升溫係在攝氏40至115度之間與加熱時間1至3小時之間，可以為由低溫至高溫分段升溫，每升一段溫度即維持一段時間，或者由低溫直接升溫至高溫，在最高溫時維持一段時間兩種方式，而由低溫至高溫分段升溫，每升一段溫度即維持一段時間，例如升溫溫度為115度時，可以每升溫10度持溫10分鐘至115度；也可以由低溫直接升溫至高溫，且在最高溫時維持一段時間，例如升溫溫度為115度時，可以直接升溫至115度再以115溫度持溫1至3小時之間，而上述兩種升溫實施例僅係為本發明之較佳實施例，當不能以此限定本發明實施之範圍，即依本發明申請專利範圍及發明說明內容所作簡單的等效變化與修飾，皆屬本發明涵蓋之範圍內。
請參閱第二圖至第四圖所示，將該可釋放中紅外線鏡片1表面的硬化層3上再執行一蒸鍍步驟，以蒸鍍複數薄膜層，而該複數薄膜層包含一第一折射率薄膜層4、一第二折射率薄膜層5、其中該第一折射率薄膜層4的折射率係低於該第二折射率薄膜層5的折射率，該第一折射率薄膜層4的靶材係為下列之一：一一氧化矽薄膜層、一二氧化矽薄膜層、一一氧化矽與二氧化矽複合薄膜層，該第一折射率薄膜層4的折射率為1.46~1.98，該第二折射率薄膜層5的靶材係為下列之一：一二氧化鋯薄膜層、一二氧化鈦薄膜層、一三氧化二鈦薄膜層、一五氧化三鈦薄膜層，該第二折射率薄膜層5的折射率為2.15~2.76。以蒸鍍三層薄膜層為例，係在該硬化層3上先蒸鍍第一折射率薄膜層4，然後在該第一折射率薄膜層4再蒸鍍一第二折射率薄膜層5，最後在第二折射率薄膜層5上再蒸鍍一第一折射率薄膜層4。以蒸鍍五層薄膜層為例，係在該硬化層3依序蒸鍍第一折射率薄膜層4、第二折射率薄膜層5、第一折射率
薄膜層4、第二折射率薄膜層5，最後在該第二折射率薄膜層5上再蒸鍍該第一折射率薄膜層4。以蒸鍍七層薄膜層為例，係在該硬化層3依序蒸鍍第一折射率薄膜層4、第二折射率薄膜層5、第一折射率薄膜層4、第二折射率薄膜層5、第一折射率薄膜層4、第二折射率薄膜層5，最後在該第二折射率薄膜層5上再蒸鍍第一折射率薄膜層4。亦即，在最後一次蒸鍍第一折射率薄膜層4之前，該第一折射率薄膜層4與該第二折射率薄膜層5的蒸鍍係可以執行一次或多次。此外，在該第一折射率薄膜層4與該第二折射率薄膜層5之間係可蒸鍍一氧化銦錫薄膜層7。
執行上述蒸鍍步驟之前，靶材可以直接用於蒸鍍，但也可以先將靶材與該第一遠紅外線幅射源A一同置放在該工作空間中，該工作空間的工作溫度控制於攝氏40至115度之間，時間為1至3小時之間，以使該靶材接受該遠紅外線，然後在將靶材用於蒸鍍。
參閱第二圖所示，在該鏡片2的硬化層3上依序蒸鍍該第一折射率薄膜層4、該第二折射率薄膜層5及該第一折射率薄膜層4，而請參閱第三圖及第四圖所示，在該第一折射率薄膜層4與該第二折射率薄膜層5之間或者該第二折射率薄膜層5與該第一折射率薄膜層4之間蒸鍍該氧化銦薄膜層6。
參閱第五圖所示，在該鏡片2的硬化層3上依序蒸鍍第一折射率薄膜層4、第二折射率薄膜層5、第一折射率薄膜層4、第二折射率薄膜層5及該第一折射率薄膜層4。而請參閱第六圖及第七圖所示，在該第一折射率薄膜層4與該第二折射率薄膜層5之間或者該第二折射率薄膜層5與該第一折射率薄膜層4之間蒸鍍該氧化銦薄膜層6，然後再重複蒸鍍該第二折射率薄膜層5及該第一折射率薄膜層4。
請參閱第九圖所示，使用者戴上一鏡框，該鏡框裝有該可釋放中紅外線鏡片1，藉由該鏡片2內的複數薄膜層，使該可釋放中紅外線鏡片1具有阻
隔藍光、紅外光及吸收具反射光之紫外線等有害光線，以此可以保護眼用者的眼睛，避免使用者眼睛為藍光、紅外光及反射光之紫外線等有害光線所傷害，且藉由釋放中紅外線幫助眼睛的血液循環使新陳代謝加快。
將該可釋放中紅外線鏡片1送至工業技術研究院進行全頻譜平均放射率，檢測原理為ASTM-E1933-99a規範，上述規範檢測範圍為全頻平均放射率的頻譜在8至14um之間經過檢測後，檢測數據為表1所示。
檢測時，依照本發明所揭露方法而製造的試片係成形為一眼鏡鏡片的型態，該試片具有一凸面與一凹面，其中凸面為上述眼鏡鏡片的外表面，凹面為上述眼鏡鏡片的內表面，因為使用光譜儀做反射波長測試，所以測試時係將試片的凹面塗黑，藉以反射光譜儀產生的光源，塗黑係使用奇異筆。經測試，在放射率頻譜在8至14um之間，試片的放射率為0.99(99%)，證明本發明可釋放中紅外線鏡片的製造方法確實可以製造高放射率的鏡片。
綜合上述實施例之說明，當可充分瞭解本發明之操作、使用及本發明產生之功效，惟以上所述實施例僅係為本發明之較佳實施例，當不能以此限定本發明實施之範圍，即依本發明申請專利範圍及發明說明內容所作簡單的等效變化與修飾，皆屬本發明涵蓋之範圍內。
1:可釋放中紅外線鏡片
2:鏡片
3:硬化層
4:第一折射率薄膜層
5:第二折射率薄膜層
Claims (12)
- 一種可釋放中紅外線鏡片的製造方法，包含：將一鏡片與一第一遠紅外線幅射源一同置放在一工作空間中，該工作空間的溫度介於攝氏40至115度之間，加熱的時間介於1至3小時之間，使該鏡片接受一遠紅外線；將該鏡片浸漬在一硬化液中，使該硬化液塗覆在該鏡片上，該硬化液塗覆厚度介於1至3微米之間，該硬化液係為一矽利康及一異丙醇或一甲醇之任一，且該硬化液中係添加有一遠紅外線材料或一遠紅外線複合材料，該遠紅外線複合材料為該遠紅外線材料與一氧化鋅(ZnO)的混合物；對披覆有該硬化液的該鏡片在放置在一烘乾空間中進行烘乾，使該硬化液乾燥硬化而在該鏡片的表面形成一硬化層，其中，該烘乾空間的溫度介於攝氏80至120度之間，烘乾的時間介於1至10小時之間。
- 如請求項1之可釋放中紅外線鏡片的製造方法，其中，該遠紅外線材料為下列任一：氧化鎂(MgO)、氧化鈣(CaO)、氧化鋇(BaO)、二氧化鋯(ZrO2)、二氧化鈦(TiO2)、三氧化二鉻(Cr2O3)、二氧化錳(MnO2)、三氧化二鐵(Fe2O3)、三氧化二鋁(Al2O3)、碳化物、矽化物、硼化物、氮化物、鉭(Ta)、鉬(Mo)、鎢(W)、鐵(Fe)、鎳(Ni)、鉑(Pt)、銅(Cu)、金(Au)，該硬化液之矽利康固成份介於20%至35%之間。
- 如請求項1之可釋放中紅外線鏡片的製造方法，其中，該工作溫度在加熱過程係執行一漸進式升溫，該漸進式升溫係在攝氏40至115度之間與加熱時間1至3小時之間，由低溫至高溫分段升溫，每升一段溫度即維持一段時間。
- 如請求項1之可釋放中紅外線鏡片的製造方法，其中，該工作溫度在加熱過程係執行一漸進式升溫，該漸進式升溫係在攝氏40至115度之間與加熱時間1至3小時之間，由低溫直接升溫至高溫，且在最高溫時維持一段時間。
- 如請求項1之可釋放中紅外線鏡片的製造方法，其中，該工作空間中係設置多個該第一遠紅外線幅射源在該鏡片周圍。
- 如請求項1之可釋放中紅外線鏡片的製造方法，其中，該烘乾空間中設置有一第二遠紅外線幅射源，使該鏡片在烘乾過程中接受該第二遠紅外線幅射源所輻射出的遠紅外線。
- 如請求項1之可釋放中紅外線鏡片的製造方法，進一步，在該硬化層上係執行一蒸鍍步驟，該蒸鍍步驟包含：蒸鍍一第一折射率薄膜層；在該第一折射率薄膜層上蒸鍍一第二折射率薄膜層；上述蒸鍍一第一折射率薄膜層與蒸鍍一第二折射率薄膜層的操作係依序執行一次或多次；最後再於該第二折射率薄膜層上蒸鍍該第一折射率薄膜層；其中該第一折射率薄膜層的折射率係低於該第二折射率薄膜層的折射率。
- 如請求項7之可釋放中紅外線鏡片的製造方法，其中，該第一折射率薄膜層的折射率為1.46~1.98，該第二折射率薄膜層的折射率為2.15~2.76。
- 如請求項7之可釋放中紅外線鏡片的製造方法，其中，該第一折射率薄膜層係為下列之一：一一氧化矽薄膜層、一二氧化矽薄膜層、一一氧化矽與二氧化矽複合薄膜層，該第二折射率薄膜層係為下列之一：一二 氧化鋯薄膜層、一二氧化鈦薄膜層、一三氧化二鈦薄膜層、一五氧化三鈦薄膜層。
- 請求項7之可釋放中紅外線鏡片的製造方法，進一步，蒸鍍有一氧化銦錫薄膜層在該第一折射率薄膜層與該第二折射率薄膜層之間。
- 如請求項7之可釋放中紅外線鏡片的製造方法，進一步，在該硬化層上蒸鍍複數薄膜層前，先將該蒸鍍之靶材與該第一遠紅外線幅射源一同置放在該工作空間中，該工作空間的工作溫度控制於攝氏40至115度之間，時間為1至3小時之間，使該靶材接受該遠紅外線。
- 一種可釋放中紅外線鏡片，係使用請求項1至請求項11任一項所述可釋放中紅外線鏡片的製造方法所製造。
Priority Applications (9)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW109115893A TWI733447B (zh) | 2020-05-13 | 2020-05-13 | 可釋放中紅外線鏡片及其製造方法 |
| CN202110233927.XA CN113671726B (zh) | 2020-05-13 | 2021-03-03 | 可释放中红外线镜片及其制造方法 |
| JP2021034956A JP7154333B2 (ja) | 2020-05-13 | 2021-03-05 | 中赤外線を放出可能なレンズ及びその製造方法 |
| US17/212,357 US11703615B2 (en) | 2020-05-13 | 2021-03-25 | Mid-infrared lens and manufacturing method thereof |
| AU2021201887A AU2021201887A1 (en) | 2020-05-13 | 2021-03-26 | Mid-Infrared Lens and Manufacturing Method Thereof |
| DE102021108403.2A DE102021108403A1 (de) | 2020-05-13 | 2021-04-01 | Mittelinfrarot-linse und deren herstellungsmethode |
| KR1020210047201A KR102502214B1 (ko) | 2020-05-13 | 2021-04-12 | 중적외선 방출 가능 렌즈 및 이의 제조 방법 |
| SG10202104061QA SG10202104061QA (en) | 2020-05-13 | 2021-04-21 | Mid-infrared lens and manufacturing method thereof |
| FR2104956A FR3110157A1 (fr) | 2020-05-13 | 2021-05-11 | Lentille émettant dans l'infrarouge moyen et son procédé de fabrication |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW109115893A TWI733447B (zh) | 2020-05-13 | 2020-05-13 | 可釋放中紅外線鏡片及其製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TWI733447B true TWI733447B (zh) | 2021-07-11 |
| TW202142895A TW202142895A (zh) | 2021-11-16 |
Family
ID=77911455
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109115893A TWI733447B (zh) | 2020-05-13 | 2020-05-13 | 可釋放中紅外線鏡片及其製造方法 |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US11703615B2 (zh) |
| JP (1) | JP7154333B2 (zh) |
| KR (1) | KR102502214B1 (zh) |
| CN (1) | CN113671726B (zh) |
| AU (1) | AU2021201887A1 (zh) |
| DE (1) | DE102021108403A1 (zh) |
| FR (1) | FR3110157A1 (zh) |
| SG (1) | SG10202104061QA (zh) |
| TW (1) | TWI733447B (zh) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20240070923A (ko) | 2022-11-15 | 2024-05-22 | 한국과학기술연구원 | 황 공중합체의 제조방법, 이를 이용하여 제조된 황 공중합체, 광학 소자 및 광학 장치 |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200613030A (en) * | 2004-10-20 | 2006-05-01 | Shi-Liang Lin | Heat-resistant silica gel piece containing inorganic ceramic hollow microsphere |
| TW201000423A (en) * | 2008-06-26 | 2010-01-01 | Jen-Zen Chen | Method of manufacturing molded glass articles |
| TW201130776A (en) * | 2010-03-02 | 2011-09-16 | Chun-Ming Yu | Production method of energy ceramic decoration accessories with functions of emitting negative ions and far infrared ray and products thereof |
| TWM435851U (en) * | 2011-12-23 | 2012-08-21 | Artificer Life Corp | Raw materials structure for energy product |
| TW201336092A (zh) * | 2012-02-27 | 2013-09-01 | Panasonic Corp | 光學構件 |
| CN104245303A (zh) * | 2012-04-05 | 2014-12-24 | 柯尼卡美能达株式会社 | 红外线遮蔽膜和红外线遮蔽体 |
| TW201945438A (zh) * | 2018-04-27 | 2019-12-01 | 日商住友化學股份有限公司 | 光學膜 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100242823B1 (ko) * | 1998-03-20 | 2000-03-02 | 이한수 | 원적외선항균 안경렌즈의 제조방법 |
| TW392855U (en) * | 1999-06-23 | 2000-06-01 | Penglin Jin Shia | Eyeglass lenses with anti-electrostatic and IR reflection antibacterial |
| JP3712103B2 (ja) * | 1999-11-15 | 2005-11-02 | Ｈｏｙａ株式会社 | プラスチックレンズの製造方法及びプラスチックレンズ |
| JP3717846B2 (ja) * | 2001-12-25 | 2005-11-16 | Ｈｏｙａ株式会社 | 反射防止膜を有するプラスチックレンズの製造方法 |
| TW200610745A (en) * | 2004-09-24 | 2006-04-01 | Nano Win Tech Co Ltd | Lens having far infrared emission and manufacturing method thereof |
| JP5489604B2 (ja) * | 2009-01-14 | 2014-05-14 | ホーヤ レンズ マニュファクチャリング フィリピン インク | 光学物品の製造方法 |
| CN101614880A (zh) * | 2009-07-24 | 2009-12-30 | 厦门立扬光学科技有限公司 | 远红外线能量镜片的加工方法 |
| JP5695356B2 (ja) * | 2010-07-13 | 2015-04-01 | 株式会社カネカ | 近赤外線吸収能を有する硬化性コーティング剤、および近赤外線吸収材 |
| CN101866063B (zh) * | 2010-06-02 | 2012-05-02 | 温州医学院 | 一种具有抗红外作用的树脂镜片及其制备方法 |
| US20160116718A1 (en) * | 2014-10-22 | 2016-04-28 | Roger Wen Yi Hsu | Methods and System for Manufacturing Infrared (IR) Absorbing Lens |
| CN105077941B (zh) * | 2015-07-20 | 2016-08-31 | 京东方科技集团股份有限公司 | 一种移动设备保护套、移动设备 |
| TWM519743U (zh) * | 2015-11-17 | 2016-04-01 | Wei-Xian Lai | 護目鏡片結構 |
| JP6473281B1 (ja) * | 2017-09-29 | 2019-02-20 | ホヤ レンズ タイランド リミテッドＨＯＹＡ Ｌｅｎｓ Ｔｈａｉｌａｎｄ Ｌｔｄ | 眼鏡レンズおよび眼鏡 |
-
2020
- 2020-05-13 TW TW109115893A patent/TWI733447B/zh active
-
2021
- 2021-03-03 CN CN202110233927.XA patent/CN113671726B/zh active Active
- 2021-03-05 JP JP2021034956A patent/JP7154333B2/ja active Active
- 2021-03-25 US US17/212,357 patent/US11703615B2/en active Active
- 2021-03-26 AU AU2021201887A patent/AU2021201887A1/en not_active Abandoned
- 2021-04-01 DE DE102021108403.2A patent/DE102021108403A1/de active Pending
- 2021-04-12 KR KR1020210047201A patent/KR102502214B1/ko active IP Right Grant
- 2021-04-21 SG SG10202104061QA patent/SG10202104061QA/en unknown
- 2021-05-11 FR FR2104956A patent/FR3110157A1/fr active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW200613030A (en) * | 2004-10-20 | 2006-05-01 | Shi-Liang Lin | Heat-resistant silica gel piece containing inorganic ceramic hollow microsphere |
| TW201000423A (en) * | 2008-06-26 | 2010-01-01 | Jen-Zen Chen | Method of manufacturing molded glass articles |
| TW201130776A (en) * | 2010-03-02 | 2011-09-16 | Chun-Ming Yu | Production method of energy ceramic decoration accessories with functions of emitting negative ions and far infrared ray and products thereof |
| TWM435851U (en) * | 2011-12-23 | 2012-08-21 | Artificer Life Corp | Raw materials structure for energy product |
| TW201336092A (zh) * | 2012-02-27 | 2013-09-01 | Panasonic Corp | 光學構件 |
| CN104245303A (zh) * | 2012-04-05 | 2014-12-24 | 柯尼卡美能达株式会社 | 红外线遮蔽膜和红外线遮蔽体 |
| TW201945438A (zh) * | 2018-04-27 | 2019-12-01 | 日商住友化學股份有限公司 | 光學膜 |
Also Published As
| Publication number | Publication date |
|---|---|
| CN113671726A (zh) | 2021-11-19 |
| SG10202104061QA (en) | 2021-12-30 |
| KR20210141336A (ko) | 2021-11-23 |
| US20210356630A1 (en) | 2021-11-18 |
| FR3110157A1 (fr) | 2021-11-19 |
| DE102021108403A1 (de) | 2021-11-18 |
| TW202142895A (zh) | 2021-11-16 |
| KR102502214B1 (ko) | 2023-02-20 |
| US11703615B2 (en) | 2023-07-18 |
| CN113671726B (zh) | 2023-10-03 |
| AU2021201887A1 (en) | 2021-12-02 |
| JP7154333B2 (ja) | 2022-10-17 |
| JP2021179598A (ja) | 2021-11-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5489604B2 (ja) | 光学物品の製造方法 | |
| US7880966B2 (en) | Optical article including a layer siox as main component and manufacturing method of the same | |
| CN102385075A (zh) | 光学部件、其制备方法和光学*** | |
| TWI733447B (zh) | 可釋放中紅外線鏡片及其製造方法 | |
| US10490679B2 (en) | Fabrication of multilayer nanograting structures | |
| CN114133226B (zh) | 一种光学镀层基材及使用方法 | |
| JP5489603B2 (ja) | 光学物品およびその製造方法 | |
| JP7376777B2 (ja) | 光学薄膜の製造方法、光学薄膜、及び光学部材 | |
| JP4249937B2 (ja) | 撥水性薄膜を有する光学部材およびレンズの製造方法 | |
| JP2006519305A (ja) | 高屈折率の光学的層を製造するための蒸着材料 | |
| JP2023009170A (ja) | 眼鏡レンズの製造方法 | |
| CN108640530B (zh) | 保护盖板及其制备方法和应用 | |
| JP6627828B2 (ja) | 薄膜の製造方法、薄膜形成材料、光学薄膜、及び光学部材 | |
| WO2022097751A1 (ja) | 眼鏡レンズおよび眼鏡 | |
| TWM599914U (zh) | 可釋放中紅外線鏡片 | |
| CN113848600A (zh) | 微透镜阵列模板及制备方法、散射型微透镜、衬底及制备方法和应用、量子点发光二极管 | |
| JP5145864B2 (ja) | 光学物品の製造方法 | |
| US8029923B2 (en) | Vaporizing material for producing highly refractive optical layers | |
| JP7203147B2 (ja) | 眼鏡レンズの製造方法 | |
| KR100242823B1 (ko) | 원적외선항균 안경렌즈의 제조방법 | |
| JPH09189801A (ja) | 耐熱性反射防止膜付き光学部品 | |
| JP7242753B2 (ja) | 眼鏡レンズおよび眼鏡 | |
| WO2017131588A1 (en) | Textured surface ophthalmic device | |
| JP2016008325A (ja) | 光触媒積層体の製造方法、スパッタリングターゲット、およびスパッタリングターゲットの製造方法 | |
| WO2022193292A1 (en) | Spectacle lens with antibacterial and/or antiviral properties and method for manufacturing the same |