TWI724933B - Hydrogen purification devices - Google Patents

Hydrogen purification devices Download PDF

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TWI724933B
TWI724933B TW109122254A TW109122254A TWI724933B TW I724933 B TWI724933 B TW I724933B TW 109122254 A TW109122254 A TW 109122254A TW 109122254 A TW109122254 A TW 109122254A TW I724933 B TWI724933 B TW I724933B
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hydrogen
frame
stream
assembly
pores
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TW109122254A
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TW202045437A (en
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大衛 Ｊ 愛德隆
羅伯 陶德 史塔克貝克
羅伯 傑卡斯 史塔克貝克
星浩二
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美商１號組件公司
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • B01D53/228—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
    • B—PERFORMING OPERATIONS; TRANSPORTING
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    • B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
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    • B01D63/00—Apparatus in general for separation processes using semi-permeable membranes
    • B01D63/08—Flat membrane modules
    • B01D63/082—Flat membrane modules comprising a stack of flat membranes
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    • C01B3/00—Hydrogen; Gaseous mixtures containing hydrogen; Separation of hydrogen from mixtures containing it; Purification of hydrogen
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    • B01D2313/146—Specific spacers on the permeate side
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    • Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30—Hydrogen technology
    • Y02E60/50—Fuel cells

Abstract

Hydrogen purification devices and their components are disclosed. In some embodiments, the devices may include at least one foil-microscreen assembly disposed between and secured to first and second end frames. The at least one foil-microscreen assembly may include at least one hydrogen-selective membrane and at least one microscreen structure including a non-porous planar sheet having a plurality of apertures forming a plurality of fluid passages. The planar sheet may include generally opposed planar surfaces configured to provide support to the permeate side. The plurality of fluid passages may extend between the opposed surfaces. The at least one hydrogen-selective membrane may be metallurgically bonded to the at least one microscreen structure. In some embodiments, the devices may include a permeate frame having at least one membrane support structure that spans at least a substantial portion of an open region and that is configured to support at least one foil-microscreen assembly.

Description

氫氣淨化裝置Hydrogen purification device

本案有關一種氫氣淨化裝置。本案係為2013年3月14日申請且專利名稱為「Hydrogen Generation Assemblies and Hydrogen Purification Devices」且現獲准為美國專利第9,187,324號的美國專利申請案第13/829,766號的部分連續申請案，該美國專利申請案第13/829,766號係為2012年8月30日申請且專利名稱為「Hydrogen Generation Assemblies」之美國專利申請案第13/600,096號的部分連續申請案。以上申請案之全部揭示內容出於所有目的特此以引用之方式併入於本文中。This case relates to a hydrogen purification device. This case is a partial continuous application of U.S. Patent Application No. 13/829,766 filed on March 14, 2013 with the patent name "Hydrogen Generation Assemblies and Hydrogen Purification Devices" and is now approved as U.S. Patent No. 9,187,324. Patent Application No. 13/829,766 is a partial continuous application of U.S. Patent Application No. 13/600,096 filed on August 30, 2012 and the patent name is "Hydrogen Generation Assemblies". The entire disclosure of the above application is hereby incorporated by reference for all purposes.

氫氣產生總成為一種將一或多種原料轉化成含有氫氣作為主要組份之產物流的總成。原料可包括含碳原料且在一些實施例中，亦可包括水。將原料自原料遞送系統遞送至氫氣產生總成之氫氣產生區，其中典型地原料係在壓力及高溫下遞送。氫氣產生區通常與諸如加熱總成或冷卻總成之溫度調變總成相關聯，該氫氣產生區消耗一或多個燃料流以維持氫氣產生區在合適的溫度範圍內以有效地產生氫氣。氫氣產生總成可經由諸如蒸汽重組、自發性熱重組、熱解及/或催化部分氧化之任何合適機制產生氫氣。Hydrogen production is an assembly that converts one or more raw materials into a product stream containing hydrogen as the main component. The feedstock may include carbonaceous feedstock and, in some embodiments, may also include water. The feedstock is delivered from the feedstock delivery system to the hydrogen generation zone of the hydrogen generation assembly, where the feedstock is typically delivered under pressure and high temperature. The hydrogen generation area is usually associated with a temperature adjustment assembly such as a heating assembly or a cooling assembly. The hydrogen generation area consumes one or more fuel streams to maintain the hydrogen generation area within a suitable temperature range to efficiently generate hydrogen. The hydrogen generation assembly can generate hydrogen via any suitable mechanism such as steam reformation, spontaneous thermal reformation, pyrolysis, and/or catalytic partial oxidation.

然而，所產出或產生之氫氣可具有雜質。彼氣體可被稱作含有氫氣及其他氣體之混合氣流。在使用混合氣流之前，必須對該混合氣流進行淨化以便移除其他氣體的至少一部分。氫氣產生總成因此可包括用於增加混合氣流之氫氣純度的氫氣淨化裝置。氫氣淨化裝置可包括至少一個氫氣選擇性膜以將混合氣流分離成產物流及副產物流。產物流含有較大濃度之氫氣及/或來自混合氣流的較小濃度之一或多種其他氣體。使用一或多個氫氣選擇性膜進行之氫氣淨化為壓力驅動之分離製程，在該製程中，一或多個氫氣選擇性膜係含有在壓力容器中。混合氣流接觸膜之混合氣體表面，且產物流由穿過膜滲透之混合氣流的至少一部分形成。壓力容器典型地經密封以防止氣體進入或離開壓力容器，除了經由所界定之入口通口及出口通口或管道外。However, the produced or generated hydrogen may contain impurities. That gas can be referred to as a mixed gas stream containing hydrogen and other gases. Before the mixed gas flow is used, the mixed gas flow must be purified in order to remove at least a part of other gases. The hydrogen generation assembly may therefore include a hydrogen purification device for increasing the hydrogen purity of the mixed gas stream. The hydrogen purification device may include at least one hydrogen selective membrane to separate the mixed gas stream into a product stream and a by-product stream. The product stream contains a larger concentration of hydrogen and/or a smaller concentration of one or more other gases from the mixed gas stream. Purification of hydrogen using one or more hydrogen selective membranes is a pressure-driven separation process in which one or more hydrogen selective membranes are contained in a pressure vessel. The mixed gas flow contacts the mixed gas surface of the membrane, and the product flow is formed by at least a part of the mixed gas flow permeating through the membrane. Pressure vessels are typically sealed to prevent gas from entering or leaving the pressure vessel, except through defined inlet ports and outlet ports or pipes.

產物流可用於各種應用中。一種此類應用為能量產生，諸如在電化學燃料電池中。電化學燃料電池為將燃料及氧化劑轉化成電、反應產物及熱之裝置。舉例而言，燃料電池可將氫氣及氧轉換成水及電。在彼等燃料電池中，氫氣為燃料，氧為氧化劑，且水為反應產物。燃料電池堆疊包括複數個燃料電池且可與氫氣產生總成一起使用以提供能量產生總成。The product stream can be used in various applications. One such application is energy generation, such as in electrochemical fuel cells. An electrochemical fuel cell is a device that converts fuel and oxidant into electricity, reaction products, and heat. For example, fuel cells can convert hydrogen and oxygen into water and electricity. In these fuel cells, hydrogen is the fuel, oxygen is the oxidant, and water is the reaction product. The fuel cell stack includes a plurality of fuel cells and can be used with a hydrogen generation assembly to provide an energy generation assembly.

氫氣產生總成、氫氣處理總成及/或彼等總成之組件的實例描述於以下各者中：美國專利第5,861,137號；第6,319,306號；第6,494,937號；第6,562,111號；第7,063,047號；第7,306,868號；第7,470,293號；第7,601,302號；第7,632,322號；第8,961,627號；及美國專利申請案公開案第2006/0090397號；第2006/0272212號；第2007/0266631號；第2007/0274904號；第2008/0085434號；第2008/0138678號；第2008/0230039號；及第2010/0064887號。以上專利及專利申請公開案之全部揭示內容出於所有目的特此以引用之方式併入。Examples of the hydrogen generation assembly, the hydrogen treatment assembly, and/or the components of these assemblies are described in each of the following: U.S. Patent No. 5,861,137; No. 6,319,306; No. 6,494,937; No. 6,562,111; No. 7,063,047; No. 7,306,868; No. 7,470,293; No. 7,601,302; No. 7,632,322; No. 8,961,627; and U.S. Patent Application Publication No. 2006/0090397; No. 2006/0272212; No. 2007/0266631; No. 2007/0274904; No. 2008/0085434; No. 2008/0138678; No. 2008/0230039; and No. 2010/0064887. The entire disclosures of the above patents and patent application publications are hereby incorporated by reference for all purposes.

一些實施例可提供一種氫氣淨化裝置。在一些實施例中，該氫氣淨化裝置可包括第一端框架及第二端框架，第一端框架及第二端框架包括一輸入通口，該輸入通口經組態以接收含有氫氣及其他氣體之一混合氣流。第一端框架及第二端框架可另外包括一輸出通口，其經組態以接收一滲透物流，該滲透物流相較於該混合氣流含有一較大濃度之氫氣及一較低濃度之該等其他氣體中的至少一者；及一副產物通口，其經組態以接收含有該等其他氣體之至少一相當大部分的一副產物流。該氫氣淨化裝置另外包括至少一個箔微孔篩網總成，其安置於該第一端框架與該第二端框架之間且緊固至該第一端框架及該第二端框架。該至少一個箔微孔篩網總成包括具有一進料側及一滲透側之至少一個氫氣選擇性膜。該滲透物流之至少部分由該混合氣流的自該進料側傳遞至該滲透側之部分形成，其中該混合氣流之剩餘在該進料側上之剩餘部分形成該副產物流的至少部分。Some embodiments may provide a hydrogen purification device. In some embodiments, the hydrogen purification device may include a first end frame and a second end frame. The first end frame and the second end frame include an input port configured to receive hydrogen and other One of the gases is a mixed gas stream. The first end frame and the second end frame may additionally include an output port configured to receive a permeate stream containing a higher concentration of hydrogen gas and a lower concentration of the permeate stream than the mixed gas stream. And at least one of the other gases; and a by-product port configured to receive a by-product stream containing at least a substantial portion of the other gases. The hydrogen purification device additionally includes at least one foil microporous screen assembly, which is arranged between the first end frame and the second end frame and fastened to the first end frame and the second end frame. The at least one foil microporous screen assembly includes at least one hydrogen selective membrane with a feed side and a permeate side. At least part of the permeate stream is formed by the portion of the mixed gas stream that passes from the feed side to the permeate side, wherein the remainder of the mixed gas stream on the feed side forms at least part of the byproduct stream.

該至少一個箔微孔篩網總成另外包括：包括一無孔平面薄片之至少一個微孔篩網結構，該無孔平面薄片具有形成複數個流體通路之複數個孔隙。該平面薄片包括經組態以提供對該滲透側之支撐的大體相對之平面表面。該複數個流體通路在該等相對表面之間延伸。該至少一個氫氣選擇性膜以冶金方式接合至至少一個微孔篩網結構。該氫氣淨化裝置進一步包括複數個框架，其安置於該第一端框架及該第二端框架與該至少一個箔微孔篩網總成之間且緊固至該第一端框架及該第二端框架。該複數個框架中之每一框架包括界定一開放區之一周邊殼層。The at least one foil microporous screen assembly additionally includes: at least one microporous screen structure including a non-porous flat sheet, the non-porous flat sheet having a plurality of pores forming a plurality of fluid passages. The planar sheet includes generally opposed planar surfaces configured to provide support to the permeate side. The plurality of fluid passages extend between the opposing surfaces. The at least one hydrogen selective membrane is metallurgically joined to at least one microporous mesh structure. The hydrogen purification device further includes a plurality of frames arranged between the first end frame and the second end frame and the at least one foil microporous screen assembly and fastened to the first end frame and the second end frame End frame. Each of the plurality of frames includes a peripheral shell defining an open area.

在一些實施例中，該氫氣淨化裝置可包括第一端框架及第二端框架，第一端框架及第二端框架包括一輸入通口，該輸入通口經組態以接收含有氫氣及其他氣體之一混合氣流。第一端框架及第二端框架可另外包括一輸出通口，其經組態以接收一滲透物流，該滲透物流相較於該混合氣流含有一較大濃度之氫氣及一較低濃度之該等其他氣體中的至少一者；及一副產物通口，其經組態以接收含有該等其他氣體之至少一相當大部分的一副產物流。該氫氣淨化裝置另外包括至少一個箔微孔篩網總成，其安置於該第一端框架與該第二端框架之間且緊固至該第一端框架及該第二端框架。該至少一個箔微孔篩網總成包括具有一進料側及一滲透側之至少一個氫氣選擇性膜。該滲透物流之至少部分由該混合氣流的自該進料側傳遞至該滲透側之部分形成，其中該混合氣流之剩餘在該進料側上之剩餘部分形成該副產物流的至少部分。該至少一個箔微孔篩網總成另外包括至少一個微孔篩網結構，其包括其經組態以提供對該滲透側之支撐的大體相對之平面表面以及在該等相對表面之間延伸的複數個流體通路。該至少一個氫氣選擇性膜以冶金方式接合至至少一個微孔篩網結構。In some embodiments, the hydrogen purification device may include a first end frame and a second end frame. The first end frame and the second end frame include an input port configured to receive hydrogen and other One of the gases is a mixed gas stream. The first end frame and the second end frame may additionally include an output port configured to receive a permeate stream containing a higher concentration of hydrogen gas and a lower concentration of the permeate stream than the mixed gas stream. And at least one of the other gases; and a by-product port configured to receive a by-product stream containing at least a substantial portion of the other gases. The hydrogen purification device additionally includes at least one foil microporous screen assembly, which is arranged between the first end frame and the second end frame and fastened to the first end frame and the second end frame. The at least one foil microporous screen assembly includes at least one hydrogen selective membrane with a feed side and a permeate side. At least part of the permeate stream is formed by the portion of the mixed gas stream that passes from the feed side to the permeate side, wherein the remainder of the mixed gas stream on the feed side forms at least part of the byproduct stream. The at least one foil microporous screen assembly additionally includes at least one microporous screen structure including substantially opposed planar surfaces configured to provide support to the permeate side and extending between the opposed surfaces Multiple fluid passages. The at least one hydrogen selective membrane is metallurgically joined to at least one microporous mesh structure.

該氫氣淨化裝置進一步包括複數個框架，其安置於該第一端框架及該第二端框架與該至少一個箔微孔篩網總成之間且緊固至該第一端框架及該第二端框架。該複數個框架包括安置於該至少一個箔微孔篩網總成與該第二端框架之間的至少一個滲透物框架。該至少一個滲透物框架包括：一周邊殼層，及一輸出管道，其形成於該周邊殼層上且經組態以自該至少一個氫氣選擇性膜接收該滲透物流的該至少部分。該至少一個滲透物框架另外包括：藉由該周邊殼層包圍之一開放區，及至少一個膜支撐結構，其橫跨該開放區之至少一相當大部分且經組態以支撐該至少一個箔微孔篩網總成。該至少一個膜支撐結構不含穿孔。The hydrogen purification device further includes a plurality of frames arranged between the first end frame and the second end frame and the at least one foil microporous screen assembly and fastened to the first end frame and the second end frame End frame. The plurality of frames includes at least one permeate frame disposed between the at least one foil microporous screen assembly and the second end frame. The at least one permeate frame includes a peripheral shell layer, and an output pipe formed on the peripheral shell layer and configured to receive the at least part of the permeate stream from the at least one hydrogen selective membrane. The at least one permeate frame additionally includes: an open area surrounded by the peripheral shell layer, and at least one membrane support structure that spans at least a substantial portion of the open area and is configured to support the at least one foil Microporous screen assembly. The at least one membrane support structure does not contain perforations.

一些實施例可提供一種箔微孔篩網總成。該箔微孔篩網總成可包括具有一進料側及一滲透側之至少一個氫氣選擇性膜。該至少一個氫氣選擇性膜可經組態以接收一混合氣流、自該混合氣流之自該進料側傳遞至該滲透側之部分形成一滲透物流且自該混合氣流之剩餘在該進料側上的剩餘部分形成一副產物流。該箔微孔篩網總成另外可包括：包括一無孔平面薄片之至少一個微孔篩網結構，該無孔平面薄片具有形成複數個流體通路之複數個孔隙。該平面薄片可包括大體相對之平面表面，其經組態以提供對滲透側的支撐。該複數個流體通路可在該等相對表面之間延伸。該至少一個氫氣選擇性膜之該滲透側可以冶金方式接合至該至少一個微孔篩網結構。Some embodiments may provide a foil microporous screen assembly. The foil microporous screen assembly may include at least one hydrogen selective membrane having a feed side and a permeate side. The at least one hydrogen selective membrane can be configured to receive a mixed gas stream, form a permeate stream from the portion of the mixed gas stream passed from the feed side to the permeate side, and the remainder from the mixed gas stream on the feed side The remainder of the above forms a by-product stream. The foil microporous screen assembly may additionally include: at least one microporous screen structure including a non-porous flat sheet, the non-porous flat sheet having a plurality of pores forming a plurality of fluid passages. The planar sheet may include generally opposed planar surfaces that are configured to provide support to the permeate side. The plurality of fluid passages may extend between the opposing surfaces. The permeate side of the at least one hydrogen selective membrane can be metallurgically joined to the at least one microporous mesh structure.

圖1展示氫氣產生總成20之實例。除非特定地排除，否則氫氣產生總成20可包括本發明中所述之其他氫氣產生總成之一或多個組件。氫氣產生總成可包括經組態以產生產物氫氣流21之任何合適結構。舉例而言，氫氣產生總成可包括原料遞送系統22及燃料處理總成24。原料遞送系統可包括經組態以選擇性遞送至少一個進料流26至燃料處理總成之任何合適結構。Figure 1 shows an example of a hydrogen generating assembly 20. Unless specifically excluded, the hydrogen generating assembly 20 may include one or more components of other hydrogen generating assemblies described in the present invention. The hydrogen generating assembly may include any suitable structure configured to generate the product hydrogen stream 21. For example, the hydrogen generation assembly may include a raw material delivery system 22 and a fuel processing assembly 24. The feedstock delivery system may include any suitable structure configured to selectively deliver at least one feed stream 26 to the fuel processing assembly.

在一些實施例中，原料遞送系統22可另外包括經組態以選擇性遞送至少一個燃料流28至燃料處理總成24之燃燒器或其他加熱總成的任何合適結構。在一些實施例中，進料流26及燃料流28可為遞送至燃料處理總成之不同部分的相同流。原料遞送系統可包括任何合適之遞送機構，諸如用於推進流體流之正排量或其他合適之泵或機構。在一些實施例中，原料遞送系統可經組態以在不需要使用泵及/或其他電動流體遞送機構之情況下遞送進料流26及/或燃料流28。可與氫氣產生總成20一起使用之合適的原料遞送系統之實例包括美國專利第7,470,293號及第7,601,302號以及美國專利申請公開案第2006/0090397號中所述之原料遞送系統。以上專利及專利申請案之全部揭示內容出於所有目的特此以引用之方式併入。In some embodiments, the feedstock delivery system 22 may additionally include any suitable structure configured to selectively deliver at least one fuel stream 28 to the burner or other heating assembly of the fuel processing assembly 24. In some embodiments, the feed stream 26 and the fuel stream 28 may be the same stream delivered to different parts of the fuel processing assembly. The material delivery system may include any suitable delivery mechanism, such as a positive displacement for propelling fluid flow or other suitable pumps or mechanisms. In some embodiments, the feedstock delivery system may be configured to deliver the feed stream 26 and/or the fuel stream 28 without the use of pumps and/or other electric fluid delivery mechanisms. Examples of suitable feedstock delivery systems that can be used with the hydrogen generation assembly 20 include the feedstock delivery systems described in U.S. Patent Nos. 7,470,293 and 7,601,302, and U.S. Patent Application Publication No. 2006/0090397. The entire disclosures of the above patents and patent applications are hereby incorporated by reference for all purposes.

進料流26可包括至少一種氫氣產生流體30，其可包括可用作用以產生產物氫氣流21之反應物的一或多種流體。舉例而言，氫氣產生流體可包括含碳原料，諸如至少一種烴及/或醇。合適烴之實例包括甲烷、丙烷、天然氣、柴油、煤油、汽油等。合適醇之實例包括甲醇、醇、多元醇（諸如乙二醇及丙二醇）等。另外，氫氣產生流體30可包括水，諸如當燃料處理總成經由蒸汽重組及/或自發性熱重組產生產物氫氣流時。當燃料處理總成24經由熱解或催化部分氧化產生產物氫氣流時，進料流26不含水。The feed stream 26 may include at least one hydrogen generating fluid 30, which may include one or more fluids that can be used as reactants to generate the product hydrogen stream 21. For example, the hydrogen generating fluid may include a carbon-containing feedstock, such as at least one hydrocarbon and/or alcohol. Examples of suitable hydrocarbons include methane, propane, natural gas, diesel, kerosene, gasoline, and the like. Examples of suitable alcohols include methanol, alcohols, polyols (such as ethylene glycol and propylene glycol) and the like. Additionally, the hydrogen generating fluid 30 may include water, such as when the fuel processing assembly generates a product hydrogen stream via steam recombination and/or spontaneous thermal recombination. When the fuel treatment assembly 24 produces a product hydrogen stream via pyrolysis or catalytic partial oxidation, the feed stream 26 contains no water.

在一些實施例中，原料遞送系統22可經組態以遞送含有水及可與水混溶之含碳原料（諸如甲醇及/或另一水溶性醇）之混合物的氫氣產生流體30。此類流體流中水與含碳原料之比率可根據諸如以下各者之一或多個因素發生變化：正使用之特定含碳原料、使用者偏好、燃料處理總成之設計、由燃料處理總成使用以產生產物氫氣流的機構等。舉例而言，水與碳之莫耳比可為約1:1至3:1。另外，水與甲醇之混合物可以1:1或接近1:1之莫耳比（37重量%水，63重量%甲醇）遞送，而烴或其他醇之混合物可以大於1:1之水與碳之莫耳比遞送。In some embodiments, the feedstock delivery system 22 may be configured to deliver a hydrogen generating fluid 30 containing a mixture of water and a carbonaceous feedstock that is miscible with water, such as methanol and/or another water-soluble alcohol. The ratio of water to carbonaceous feedstock in such fluid streams can vary based on one or more of the following factors: the specific carbonaceous feedstock being used, user preferences, the design of the fuel processing assembly, the fuel processing assembly It can be used to generate the product hydrogen stream, etc. For example, the molar ratio of water to carbon can be about 1:1 to 3:1. In addition, a mixture of water and methanol can be delivered at a molar ratio of 1:1 or close to 1:1 (37 wt% water, 63 wt% methanol), and a mixture of hydrocarbons or other alcohols can be greater than 1:1 of water and carbon. Moerby delivery.

當燃料處理總成24經由重組產生產物氫氣流21時，進料流26可包括例如約25至75體積%甲醇或乙醇（或另一合適的水可混溶性含碳原料）及約25至75體積%水。對於至少實質上包括甲醇及水之進料流，彼等流可包括約50至75體積%甲醇及約25至50體積%水。含有乙醇或其他水可混溶性醇之流可含有約25至60體積%醇及約40至75體積%水。用於利用蒸汽重組或自發性熱重組之氫氣產生總成20的進料流之實例含有69體積%甲醇及31體積%水。When the fuel processing assembly 24 is recombined to produce the product hydrogen stream 21, the feed stream 26 may include, for example, about 25 to 75% by volume methanol or ethanol (or another suitable water-miscible carbonaceous feedstock) and about 25 to 75% by volume. % Water by volume. For feed streams that at least substantially include methanol and water, these streams may include about 50 to 75% by volume methanol and about 25 to 50% by volume water. The stream containing ethanol or other water-miscible alcohol may contain about 25 to 60% alcohol by volume and about 40 to 75% water by volume. An example of the feed stream for the hydrogen production assembly 20 using steam reforming or spontaneous thermal reforming contains 69 vol% methanol and 31 vol% water.

雖然原料遞送系統22展示為經組態以遞送單一進料流26，但該原料遞送系統可經組態以遞送兩個或多於兩個進料流26。彼等流可含有相同或不同原料且可具有不同組成（至少一種常見組份、不常見組份）或相同組成。舉例而言，第一進料流可包括第一組份，諸如含碳原料；且第二進料流可包括第二組份，諸如水。另外，雖然原料遞送系統22在一些實施例中可經組態以遞送單一燃料流28，但該原料遞送系統可經組態以遞送兩種或多於兩種燃料流。燃料流可具有不同組成（至少一種常見組份、不常見組份）或相同組成。另外，進料流及燃料流可在不同階段自原料遞送系統排出。舉例而言，該等流中之一者可為液流，而其他流為氣流。在一些實施例中，兩個流均可為液流；而在其他實施例中，兩個流均可為氣流。另外，雖然氫氣產生總成20展示為包括單一原料遞送系統22，但該氫氣產生總成可包括兩個或多於兩個原料遞送系統22。Although the feedstock delivery system 22 is shown as being configured to deliver a single feed stream 26, the feedstock delivery system may be configured to deliver two or more feed streams 26. These streams may contain the same or different raw materials and may have different compositions (at least one common component, uncommon component) or the same composition. For example, the first feed stream can include a first component, such as a carbonaceous feedstock; and the second feed stream can include a second component, such as water. In addition, although the feedstock delivery system 22 may be configured to deliver a single fuel stream 28 in some embodiments, the feedstock delivery system may be configured to deliver two or more fuel streams. The fuel streams can have different compositions (at least one common component, uncommon component) or the same composition. In addition, the feed stream and fuel stream can be discharged from the feedstock delivery system at different stages. For example, one of the streams can be a liquid stream, while the other streams are a gas stream. In some embodiments, both streams can be liquid streams; in other embodiments, both streams can be gas streams. In addition, although the hydrogen generation assembly 20 is shown as including a single feedstock delivery system 22, the hydrogen generation assembly may include two or more than two feedstock delivery systems 22.

燃料處理總成24可包括氫氣產生區32，其經組態以經由任何合適之氫氣產生機制產生含有氫氣的輸出流34。輸出流可包括氫氣作為至少大部分組份且可包括額外的氣體組份。輸出流34因此可被稱作含有氫氣作為其大部分組份但包括其他氣體之「混合氣流（mixed gas stream）」。The fuel processing assembly 24 may include a hydrogen generation zone 32 that is configured to generate an output stream 34 containing hydrogen via any suitable hydrogen generation mechanism. The output stream may include hydrogen as at least the majority component and may include additional gas components. The output stream 34 can therefore be referred to as a "mixed gas stream" that contains hydrogen as the majority of its components but includes other gases.

氫氣產生區32可包括任何合適的含催化劑之床或區。當氫氣產生機制為蒸汽重組時，氫氣產生區可包括合適的蒸汽重組催化劑36以促進自含有含碳原料及水之進料流26產生輸出流34。在此類實施例中，燃料處理總成24可被稱作「蒸汽重組器（steam reformer）」，氫氣產生區32可被稱作「重組區（reforming region）」，且輸出流34可被稱作「重組物流（reformate stream）」。可存在於重組物流中之其他氣體可包括一氧化碳、二氧化碳、甲烷、蒸汽及/或未反應的含碳原料。The hydrogen generation zone 32 may include any suitable catalyst-containing bed or zone. When the hydrogen generation mechanism is steam recombination, the hydrogen generation zone may include a suitable steam recombination catalyst 36 to promote the production of an output stream 34 from the feed stream 26 containing carbonaceous feedstock and water. In such embodiments, the fuel processing assembly 24 may be referred to as a "steam reformer", the hydrogen generation region 32 may be referred to as a "reforming region", and the output stream 34 may be referred to as As "reformate stream". Other gases that may be present in the reformed stream may include carbon monoxide, carbon dioxide, methane, steam, and/or unreacted carbonaceous feedstock.

當氫氣產生機制為自發性熱重組時，氫氣產生區32可包括合適的自發性熱重組催化劑以促進在空氣存在下自含有水及含碳原料之進料流26產生輸出流34。另外，燃料處理總成24可包括空氣遞送總成38，其經組態以遞送空氣流至氫氣產生區。When the hydrogen generation mechanism is spontaneous thermal recombination, the hydrogen generation zone 32 may include a suitable spontaneous thermal recombination catalyst to promote the production of an output stream 34 from the feed stream 26 containing water and carbonaceous feedstock in the presence of air. Additionally, the fuel processing assembly 24 may include an air delivery assembly 38 that is configured to deliver air flow to the hydrogen generation area.

在一些實施例中，燃料處理總成24可包括淨化（或分離）區40，其可包括經組態以自輸出（或混合氣）流34產生至少一個富氫氣流42之任何合適的結構。富氫氣流42可包括相較於輸出流34較大的氫氣濃度及/或存在於彼輸出流中的較低濃度之一或多種其他氣體（或雜質）。產物氫氣流21包括富氫氣流42之至少一部分。因此，產物氫氣流21及富氫氣流42可為同一流且具有相同組成及流動速率。替代地，富氫氣流42中之經淨化之氫氣中的一些可儲存在諸如合適之氫氣儲存總成中以供隨後使用及/或由燃料處理總成消耗。淨化區40亦可被稱作「氫氣淨化裝置（hydrogen purification device）」或「氫氣處理總成（hydrogen processing assembly）」。In some embodiments, the fuel processing assembly 24 may include a purification (or separation) zone 40, which may include any suitable structure configured to generate at least one hydrogen-rich gas stream 42 from the output (or mixed gas) stream 34. The hydrogen-rich gas stream 42 may include one or more other gases (or impurities) that have a greater concentration of hydrogen than the output stream 34 and/or a lower concentration present in that output stream. The product hydrogen stream 21 includes at least a portion of the hydrogen-rich stream 42. Therefore, the product hydrogen gas stream 21 and the hydrogen-rich gas stream 42 may be the same stream and have the same composition and flow rate. Alternatively, some of the purified hydrogen in the hydrogen-rich stream 42 may be stored in, for example, a suitable hydrogen storage assembly for subsequent use and/or consumption by the fuel processing assembly. The purification area 40 may also be referred to as a “hydrogen purification device” or a “hydrogen processing assembly”.

在一些實施例中，淨化區40可產生至少一種副產物流44，其可不含氫氣或含有一些氫氣。副產物流可排出、傳送至燃燒器總成及/或其他燃燒源、用作經加熱之流體流、經儲存以供隨後使用，及/或以其他方式利用、儲存及/或安置。另外，淨化區40可以回應於輸出流34之遞送發射作為連續流的副產物流，或可間歇地發射該流，諸如在分批法中或當輸出流之副產物部分至少暫時保留在淨化區中時。In some embodiments, the purification zone 40 may produce at least one by-product stream 44, which may be free of hydrogen or contain some hydrogen. The by-product stream may be discharged, sent to the combustor assembly and/or other combustion source, used as a heated fluid stream, stored for subsequent use, and/or used, stored, and/or placed in other ways. In addition, the purification zone 40 may emit the by-product stream as a continuous stream in response to the delivery of the output stream 34, or the stream may be emitted intermittently, such as in a batch process or when the by-product portion of the output stream remains at least temporarily in the purification zone. Middle time.

燃料處理總成24可包括一或多個淨化區，其經組態以產生含有足夠量氫氣之一或多個副產物流以適用作燃料處理總成之加熱總成的燃料流（或原料流）。在一些實施例中，副產物流可具有足夠的燃燒值或氫氣含量以使得加熱總成能夠將氫氣產生區維持於所需操作溫度下或所選溫度範圍內。舉例而言，副產物流可包括氫氣，諸如10至30體積%氫氣、15至25體積%氫氣、20至30體積%氫氣、至少10或15體積%氫氣、至少20體積%氫氣等。The fuel processing assembly 24 may include one or more purification zones that are configured to produce one or more by-product streams containing a sufficient amount of hydrogen to be suitable for use as the fuel stream (or feedstock stream) of the heating assembly of the fuel processing assembly. ). In some embodiments, the byproduct stream may have sufficient combustion value or hydrogen content to enable the heating assembly to maintain the hydrogen generation zone at a desired operating temperature or within a selected temperature range. For example, the by-product stream may include hydrogen, such as 10 to 30 vol% hydrogen, 15 to 25 vol% hydrogen, 20 to 30 vol% hydrogen, at least 10 or 15 vol% hydrogen, at least 20 vol% hydrogen, and the like.

淨化區40可包括任何合適結構，其經組態以使輸出流21之至少一個組份之濃度富集（及/或增大）。在大部分應用中，富氫氣流42將具有相較於輸出流（或混合氣流）34較大之氫氣濃度。富氫氣流亦可具有存在於輸出流34中之減小濃度的一或多種非氫氣組份，其中富氫氣流之氫氣濃度大於、相同或小於輸出流的氫氣濃度。舉例而言，在習知燃料電池系統中，若存在一氧化碳，即使以百萬分之幾存在，其仍可損壞燃料電池堆疊；而可存在於輸出流34中之諸如水之其他非氫氣組份將不會損壞該堆疊，即使以大得多之濃度存在亦不會。因此，在此類應用中，淨化區可不增加整體氫氣濃度，但將減小對產物氫氣流之所需應用有害或可能有害之一或多種非氫氣組份的濃度。The purification zone 40 may include any suitable structure configured to enrich (and/or increase) the concentration of at least one component of the output stream 21. In most applications, the hydrogen-rich gas stream 42 will have a greater hydrogen concentration than the output stream (or mixed gas stream) 34. The hydrogen-rich stream may also have one or more non-hydrogen components of reduced concentration present in the output stream 34, wherein the hydrogen concentration of the hydrogen-rich stream is greater than, the same, or less than the hydrogen concentration of the output stream. For example, in a conventional fuel cell system, if carbon monoxide is present, even if it is present in parts per million, it can still damage the fuel cell stack; and other non-hydrogen components such as water that may exist in the output stream 34 The stack will not be damaged, even if it is present in a much greater concentration. Therefore, in such applications, the purification zone may not increase the overall hydrogen concentration, but will reduce the concentration of one or more non-hydrogen components that are harmful or potentially harmful to the desired application of the product hydrogen stream.

淨化區40之合適裝置之實例包括一或多種氫氣選擇性膜46、化學一氧化碳移除總成48及/或變壓吸附（pressure swing adsorption；PSA）系統50。淨化區40可包括多於一種類型之淨化裝置，且裝置可具有相同或不同結構及/或由相同或不同機構操作。燃料處理總成24可在淨化區下游包括至少一個約束性孔及/或其他流量限制器，諸如與一或多個產物氫氣流、富氫氣流及/或副產物流相關聯的約束性孔及/或其他流量限制器。Examples of suitable devices for the purification zone 40 include one or more hydrogen selective membranes 46, a chemical carbon monoxide removal assembly 48, and/or a pressure swing adsorption (PSA) system 50. The purification zone 40 may include more than one type of purification devices, and the devices may have the same or different structures and/or be operated by the same or different mechanisms. The fuel treatment assembly 24 may include at least one restrictive orifice and/or other flow restrictors downstream of the purification zone, such as restrictive orifices associated with one or more product hydrogen streams, hydrogen-rich streams, and/or by-product streams. / Or other flow limiter.

氫氣選擇性膜46可對於氫氣可滲透，但對於輸出流34之其他組份至少實質上（若不完全）不可滲透。膜46可由適用於操作淨化區40之操作環境及參數之任何氫氣可滲透材料形成。用於膜46之合適材料的實例包括鈀及鈀合金，且尤其是此類金屬及金屬合金之薄膜。鈀合金已證實為特別有效，尤其是具有35重量%至45重量%銅的鈀。含有約40重量%銅之鈀-銅合金已證實為特別有效，但可使用其他相對濃度及組份。三種其他尤其有效之合金為具有2 wt%至20 wt%金之鈀，尤其是具有5 wt%金之鈀；具有3 wt%至10 wt%銦加上0 wt%至10 wt%釕之鈀，尤其是具有6 wt%銦加0.5 wt%釕之鈀；及具有20 wt%至30 wt%銀的鈀。當使用鈀及鈀合金時，氫氣選擇性膜46有時可被稱作「箔（foil）」。氫氣可滲透金屬箔之典型厚度小於25微米（micron、micormeter），較佳地小於或等於15微米，且最佳地介於5與12微米之間。箔可為任何合適大小，諸如110 mm乘以270 mm。The hydrogen selective membrane 46 may be permeable to hydrogen, but is at least substantially (if not completely) impermeable to other components of the output stream 34. The membrane 46 can be formed of any hydrogen permeable material suitable for the operating environment and parameters of the operating purification zone 40. Examples of suitable materials for the membrane 46 include palladium and palladium alloys, and especially thin films of such metals and metal alloys. Palladium alloys have proven to be particularly effective, especially palladium with 35 wt% to 45 wt% copper. A palladium-copper alloy containing about 40% by weight of copper has proven to be particularly effective, but other relative concentrations and components can be used. Three other particularly effective alloys are palladium with 2 wt% to 20 wt% gold, especially palladium with 5 wt% gold; palladium with 3 wt% to 10 wt% indium plus 0 wt% to 10 wt% ruthenium , Especially palladium with 6 wt% indium plus 0.5 wt% ruthenium; and palladium with 20 wt% to 30 wt% silver. When palladium and palladium alloys are used, the hydrogen selective membrane 46 may sometimes be referred to as a "foil." The typical thickness of hydrogen permeable metal foil is less than 25 microns (micron, micormeter), preferably less than or equal to 15 microns, and most preferably between 5 and 12 microns. The foil can be any suitable size, such as 110 mm by 270 mm.

化學一氧化碳移除總成48為使輸出流34之一氧化碳及/或其他不合需要之組份起化學反應以形成潛在無害之其他組成的裝置。化學一氧化碳移除總成之實例包括：經組態以自水及一氧化碳產生氫氣及二氧化碳的水煤氣轉化反應器；經組態以將一氧化碳及氧（通常來自空氣）轉化成二氧化碳的部分氧化反應器；及經組態以將一氧化碳及氫氣轉化成甲烷及水之甲烷化反應器。燃料處理總成24可包括多於一種類型及/或多於一個化學移除總成48。The chemical carbon monoxide removal assembly 48 is a device that chemically reacts carbon monoxide and/or other undesirable components in the output stream 34 to form other potentially harmless components. Examples of chemical carbon monoxide removal assemblies include: a water gas conversion reactor configured to produce hydrogen and carbon dioxide from water and carbon monoxide; a partial oxidation reactor configured to convert carbon monoxide and oxygen (usually from air) into carbon dioxide; And a methanation reactor configured to convert carbon monoxide and hydrogen into methane and water. The fuel treatment assembly 24 may include more than one type and/or more than one chemical removal assembly 48.

變壓吸附（PSA）為氣態雜質基於如下原理自輸出流34移除的化學製程：某些氣體在恰當的溫度及壓力條件下相較於其他氣體將被更強地吸附於吸附材料上。典型地，非氫氣雜質經吸附且自輸出流34移除。雜質氣體之吸附發生於高壓下。當壓力經減小時，雜質自吸附材料解除吸附，因此使吸附材料再生。典型地，PSA為循環製程且需要至少兩個床用於連續（相對於分批）操作。可用於吸附床中之合適的吸附材料之實例為活性碳及沸石。PSA系統50亦提供用於淨化區40中之裝置的實例，在該淨化區中，副產物或經移除組份並不作為氣流與輸出流之淨化並行地自區排出。實情為，此等副產物組份在吸附材料經再生或以其他方式自淨化區移除時被移除。Pressure swing adsorption (PSA) is a chemical process in which gaseous impurities are removed from the output stream 34 based on the principle that certain gases will be more strongly adsorbed on the adsorbent material than other gases under proper temperature and pressure conditions. Typically, non-hydrogen impurities are adsorbed and removed from the output stream 34. The adsorption of impurity gases occurs under high pressure. When the pressure is reduced, the impurities are desorbed from the adsorption material, thus regenerating the adsorption material. Typically, PSA is a cyclic process and requires at least two beds for continuous (as opposed to batch) operation. Examples of suitable adsorbent materials that can be used in the adsorbent bed are activated carbon and zeolite. The PSA system 50 also provides an example of a device used in the purification zone 40 in which by-products or removed components are not discharged from the zone in parallel with the purification of the gas stream and the output stream. The reality is that these by-product components are removed when the adsorbent material is regenerated or otherwise removed from the purification zone.

在圖1中，淨化區40展示為在燃料處理總成24內。淨化區可替代性地分離地定位在燃料處理總成下游，如圖1中之點劃線示意性地圖示。淨化區40亦可包括在燃料處理總成內部及外部之部分。In FIG. 1, the purification zone 40 is shown as being within the fuel processing assembly 24. The purification zone may alternatively be separately located downstream of the fuel processing assembly, as shown schematically by the dashed line in FIG. 1. The purification zone 40 may also include parts inside and outside the fuel processing assembly.

燃料處理總成24亦可包括呈加熱總成52形式之溫度調變總成。加熱總成可經組態以自至少一個加熱燃料流28產生至少一個經加熱之排出流（或燃燒流）54，典型地在空氣存在下燃燒時。經加熱之排出流54在圖1中示意性地圖示為加熱氫氣產生區32。加熱總成52可包括經組態以產生經加熱之排出流之任何合適結構，諸如與空氣一起燃燒燃料以產生經加熱之排出流的燃燒器或燃燒催化劑。加熱總成可包括點火器或點火源58，其經組態以起始燃料燃燒。合適點火源之實例包括一或多個火花塞、預熱塞、燃燒催化劑、指示燈、壓電點火器、火花點火器、熱表面點火器等。The fuel processing assembly 24 may also include a temperature adjustment assembly in the form of a heating assembly 52. The heating assembly may be configured to generate at least one heated exhaust stream (or combustion stream) 54 from the at least one heated fuel stream 28, typically when combusted in the presence of air. The heated exhaust stream 54 is schematically illustrated in FIG. 1 as heating the hydrogen generation zone 32. The heating assembly 52 may include any suitable structure configured to produce a heated exhaust stream, such as a burner or a combustion catalyst that combusts fuel with air to produce a heated exhaust stream. The heating assembly may include an igniter or ignition source 58, which is configured to initiate fuel combustion. Examples of suitable ignition sources include one or more spark plugs, glow plugs, combustion catalysts, indicator lights, piezoelectric igniters, spark igniters, hot surface igniters, and the like.

在一些實施例中，加熱總成52可包括燃燒器總成60且可被稱作基於燃燒或燃燒驅動之加熱總成。在基於燃燒之加熱總成中，加熱總成52可經組態以接收至少一個燃料流28且在空氣存在下燃燒燃料流以提供熱的燃燒流54，該熱的燃燒流可用於加熱至少燃料處理總成之氫氣產生區。可經由各種機構將空氣遞送至加熱總成。舉例而言，空氣流62可作為分離流遞送至加熱總成，如圖1所示。替代地或另外，空氣流62可與加熱總成52之燃料流28中之至少一者一起遞送至加熱總成及/或自利用加熱總成之環境抽取。In some embodiments, the heating assembly 52 may include a burner assembly 60 and may be referred to as a combustion-based or combustion-driven heating assembly. In a combustion-based heating assembly, the heating assembly 52 can be configured to receive at least one fuel stream 28 and combust the fuel stream in the presence of air to provide a hot combustion stream 54 that can be used to heat at least the fuel Process the hydrogen generation area of the assembly. The air can be delivered to the heating assembly via various mechanisms. For example, the air stream 62 may be delivered to the heating assembly as a separate stream, as shown in FIG. 1. Alternatively or in addition, the air flow 62 may be delivered to the heating assembly and/or drawn from the environment in which the heating assembly is used together with at least one of the fuel flows 28 of the heating assembly 52.

另外或替代地，可使用燃燒流54來加熱使用加熱總成之燃料處理總成及/或燃料電池系統之其他部分。另外，可使用加熱總成52之其他組態及類型。舉例而言，加熱總成52可為電動加熱總成，其經組態以藉由使用至少一個諸如電阻加熱元件之加熱元件產生熱來加熱至少燃料處理總成24之氫氣產生區32。在彼等實施例中，加熱總成52可不接收且不燃燒可燃燃料流來將氫氣產生區加熱至合適的氫氣產生溫度。加熱總成之實例揭示於美國專利第7,632,322號中，其全部揭示內容出於所有目的特此以引用之方式併入本文中。Additionally or alternatively, the combustion stream 54 may be used to heat the fuel processing assembly and/or other parts of the fuel cell system that use the heating assembly. In addition, other configurations and types of heating assembly 52 can be used. For example, the heating assembly 52 may be an electric heating assembly configured to heat at least the hydrogen generating area 32 of the fuel processing assembly 24 by generating heat using at least one heating element such as a resistance heating element. In these embodiments, the heating assembly 52 may not receive and burn the combustible fuel stream to heat the hydrogen generation area to a suitable hydrogen generation temperature. An example of the heating assembly is disclosed in US Patent No. 7,632,322, the entire disclosure of which is hereby incorporated by reference for all purposes.

加熱總成52可容納在具有氫氣產生區及/或分離區（如下文進一步論述）之常見殼層或外殼中。加熱總成可相對於氫氣產生區32分離地定位但與彼區熱及/或流體連通以提供至少氫氣產生區之所需加熱。加熱總成52可部分或完全位於常見殼層內，及/或至少一部分（或所有）加熱總成可位於彼殼層外。當加熱總成位於殼層外部時，來自燃燒器總成60之熱燃燒氣體可經由合適之熱傳遞管道遞送至該殼層內之一或多個組件。The heating assembly 52 may be housed in a common shell or enclosure with a hydrogen generation zone and/or separation zone (discussed further below). The heating assembly may be located separately from the hydrogen generating zone 32 but in thermal and/or fluid communication with that zone to provide at least the required heating of the hydrogen generating zone. The heating assembly 52 may be partly or completely located inside the common shell layer, and/or at least a part (or all) of the heating assembly may be located outside the other shell layer. When the heating assembly is located outside the shell, the hot combustion gas from the burner assembly 60 can be delivered to one or more components in the shell via a suitable heat transfer pipe.

加熱總成亦可經組態以加熱原料遞送系統22、原料供應流、氫氣產生區32、淨化（或分離）區40或彼等系統、流及區之任何合適之組合。原料供應流之加熱可包括蒸發用於在氫氣產生區中產生氫氣之氫氣產生流體的液體反應物流或組份。在彼實施例中，燃料處理總成24可描述為包括汽化區64。加熱總成可另外經組態以加熱氫氣產生總成之其他組件。舉例而言，經加熱之排出流可經組態以加熱壓力容器及/或其他罐，該壓力容器及/或其他罐含有形成進料流26及燃料流28之至少數個部分的加熱燃料及/或氫氣產生流體。The heating assembly may also be configured to heat the feedstock delivery system 22, feedstock supply stream, hydrogen generation zone 32, purification (or separation) zone 40, or any suitable combination of these systems, streams, and zones. The heating of the feedstock supply stream may include evaporating a liquid reactant stream or component of the hydrogen generating fluid used to generate hydrogen in the hydrogen generating zone. In that embodiment, the fuel processing assembly 24 can be described as including a vaporization zone 64. The heating assembly can be additionally configured to heat other components of the hydrogen generating assembly. For example, the heated exhaust stream can be configured to heat a pressure vessel and/or other tanks that contain heating fuel and heating fuel that form at least several portions of the feed stream 26 and the fuel stream 28 / Or hydrogen gas generating fluid.

加熱總成52可在氫氣產生區32中達成及/或維持任何合適溫度。蒸汽重組器典型地在200℃與900℃範圍內之溫度下操作。然而，超出此範圍之溫度在本發明之範疇內。當含碳原料為甲醇時，蒸汽重組反應將典型地在約200℃至500℃之溫度範圍內操作。該範圍之實例子集包括350至450℃、375至425℃及375至400℃。當含碳原料為烴、乙醇或另一醇時，約400至900℃之溫度範圍將典型地用於蒸汽重組反應。該範圍之例示性子集包括750至850℃、725至825℃、650至750℃、700至800℃、700至900℃、500至800℃、400至600℃及600至800℃。氫氣產生區32可包括兩個或多於兩個區域或部分，該等區域或區各自可在相同或不同溫度下操作。舉例而言，當氫氣產生流體包括烴時，氫氣產生區32可包括兩個不同的氫氣產生部分或區，其中一個氫氣產生部分或區在比另一個氫氣產生部分或區低之溫度下操作以提供預重組區。在彼等實施例中，燃料處理總成亦可被稱作包括兩個或多於兩個氫氣產生區。The heating assembly 52 can achieve and/or maintain any suitable temperature in the hydrogen generation zone 32. Steam reformers typically operate at temperatures in the range of 200°C and 900°C. However, temperatures outside this range are within the scope of the present invention. When the carbonaceous feedstock is methanol, the steam reforming reaction will typically operate in a temperature range of about 200°C to 500°C. Example subsets of this range include 350 to 450°C, 375 to 425°C, and 375 to 400°C. When the carbon-containing feedstock is a hydrocarbon, ethanol, or another alcohol, a temperature range of about 400 to 900°C will typically be used for the steam reforming reaction. Exemplary subsets of this range include 750 to 850°C, 725 to 825°C, 650 to 750°C, 700 to 800°C, 700 to 900°C, 500 to 800°C, 400 to 600°C, and 600 to 800°C. The hydrogen generation zone 32 may include two or more zones or sections, each of which may be operated at the same or different temperatures. For example, when the hydrogen-generating fluid includes hydrocarbons, the hydrogen-generating zone 32 may include two different hydrogen-generating parts or zones, where one hydrogen-generating part or zone operates at a lower temperature than the other hydrogen-generating part or zone. Provide pre-recombination area. In their embodiments, the fuel processing assembly may also be referred to as including two or more hydrogen generation zones.

燃料流28可包括適用於藉由加熱總成52消耗以提供所需熱輸出之任何可燃液體及/或氣體。一些燃料流在遞送且藉由加熱總成52燃燒時可為氣體，而其他燃料流可以液流形式遞送至加熱總成。燃料流28之合適加熱燃料的實例包括含碳原料，諸如甲醇、甲烷、乙烷、乙醇、乙烯、丙烷、丙烯、丁烷等。額外實例包括低分子量可冷凝燃料，諸如液化石油氣、氨、輕質胺、二甲醚及低分子量烴。又其他實例包括氫氣及一氧化碳。在包括呈冷卻總成而非加熱總成之形式的溫度調變總成（諸如在發熱氫氣產生製程例如部分氧化經利用而非諸如蒸汽重組之吸熱製程經利用時可使用）之氫氣產生總成20的實施例中，原料遞送系統可經組態以供應燃料或冷卻劑流至總成。可使用任何合適的燃料或冷卻劑流體。The fuel stream 28 may include any combustible liquid and/or gas suitable for consumption by the heating assembly 52 to provide the required heat output. Some fuel streams may be gases when delivered and burned by the heating assembly 52, while other fuel streams may be delivered to the heating assembly as liquid streams. Examples of suitable heating fuels for fuel stream 28 include carbon-containing feedstocks such as methanol, methane, ethane, ethanol, ethylene, propane, propylene, butane, and the like. Additional examples include low molecular weight condensable fuels such as liquefied petroleum gas, ammonia, light amines, dimethyl ether, and low molecular weight hydrocarbons. Yet other examples include hydrogen and carbon monoxide. A hydrogen generating assembly that includes a temperature adjustment assembly in the form of a cooling assembly instead of a heating assembly (such as when a heat-generating hydrogen generation process such as partial oxidation is used instead of an endothermic process such as steam recombination) In the 20 embodiment, the feedstock delivery system can be configured to supply fuel or coolant to the assembly. Any suitable fuel or coolant fluid can be used.

燃料處理總成24可另外包括殼層或外殼66，在該殼層或外殼中含有至少氫氣產生區32，如圖1所示。在一些實施例中，汽化區64及/或淨化區40可另外含有於該殼層內。殼層66可使蒸汽重組器或其他燃料處理機構之組件能夠作為一單元移動。殼層亦可藉由提供保護性封裝來保護燃料處理總成之組件免遭損壞及/或可降低燃料處理總成之加熱需求，此係因為組件可作為一單元加熱。殼層66可包括絕緣材料68，諸如固態絕緣材料、毯覆式絕緣材料及/或空氣填充腔。絕緣材料可在殼層內部、在殼層外部或既在殼層內部亦在殼層外部。當絕緣材料在殼層外部時，燃料處理總成24可在絕緣材料外部進一步包括外部封皮或護套70，如圖1中示意性地圖示。燃料處理總成可包括不同殼層，該殼層包括燃料處理總成之額外組件，諸如原料遞送系統22及/或其他組件。The fuel processing assembly 24 may additionally include a shell or shell 66 in which at least a hydrogen generation zone 32 is contained, as shown in FIG. 1. In some embodiments, the vaporization zone 64 and/or the purification zone 40 may be additionally contained in the shell. The shell 66 allows components of the steam reformer or other fuel processing mechanism to be moved as a unit. The shell can also protect the components of the fuel processing assembly from damage by providing a protective encapsulation and/or can reduce the heating requirements of the fuel processing assembly, because the components can be heated as a unit. The shell 66 may include an insulating material 68, such as a solid insulating material, a blanket insulating material, and/or an air-filled cavity. The insulating material can be inside the shell, outside the shell, or both inside and outside the shell. When the insulating material is outside the shell layer, the fuel processing assembly 24 may further include an outer cover or sheath 70 outside the insulating material, as shown schematically in FIG. 1. The fuel processing assembly may include different shell layers that include additional components of the fuel processing assembly, such as the feedstock delivery system 22 and/or other components.

燃料處理總成24之一或多個組件可延伸超出殼層或位於殼體外部。舉例而言，可使淨化區40位於在殼層66外部，諸如與殼層間隔開但藉由合適流體傳遞管道流體連通。作為另一實例，氫氣產生區32之一部分（諸如一或多個重組催化劑床之部分）可延伸超出殼層，諸如在圖1中用表示替代性殼層組態之虛線示意性地指示。合適氫氣產生總成及其組件之實例揭示於美國專利第5,861,137號、第5,997,594號及第6,221,117號中，此等專利之全部揭示內容出於所有目的特此以引用之方式併入。One or more components of the fuel processing assembly 24 may extend beyond the shell or be located outside the shell. For example, the purification zone 40 can be located outside the shell 66, such as spaced apart from the shell but in fluid communication with a suitable fluid transfer pipe. As another example, a portion of the hydrogen generation zone 32 (such as a portion of one or more recombined catalyst beds) may extend beyond the shell, as indicated schematically in FIG. 1 by a dashed line representing an alternative shell configuration. Examples of suitable hydrogen generating assemblies and their components are disclosed in US Patent Nos. 5,861,137, 5,997,594, and 6,221,117, the entire disclosures of these patents are hereby incorporated by reference for all purposes.

氫氣產生總成20之另一實例展示於圖2中，且通常以72表示。除非特定地排除，否則氫氣產生總成72可包括氫氣產生總成20之一或多個組件。氫氣產生總成72可包括原料遞送系統74、汽化區76、氫氣產生區78及加熱總成80，如圖2中所示。在一些實施例中，氫氣產生總成20亦可包括淨化區82。Another example of the hydrogen generation assembly 20 is shown in FIG. 2 and is generally indicated at 72. Unless specifically excluded, the hydrogen generation assembly 72 may include one or more components of the hydrogen generation assembly 20. The hydrogen generation assembly 72 may include a raw material delivery system 74, a vaporization zone 76, a hydrogen generation zone 78, and a heating assembly 80, as shown in FIG. 2. In some embodiments, the hydrogen generation assembly 20 may also include a purification zone 82.

原料遞送系統可包括經組態以遞送一或多個進料及/或燃料流至氫氣產生總成之一或多個其他組件的任何合適結構。舉例而言，原料遞送系統可包括原料槽（或容器）84及泵86。原料槽可含有任何合適的氫氣產生流體88，諸如水及含碳原料（例如甲醇/水混合物）。泵86可具有經組態以遞送氫氣產生流體至汽化區76及/或氫氣產生區78之任何合適的結構，該氫氣產生流體可呈包括水及含碳原料之含有至少一種液體之進料流90的形式。The feedstock delivery system may include any suitable structure configured to deliver one or more feeds and/or fuel streams to one or more other components of the hydrogen generation assembly. For example, the material delivery system may include a material tank (or container) 84 and a pump 86. The feedstock tank may contain any suitable hydrogen generating fluid 88, such as water and carbonaceous feedstock (e.g., methanol/water mixture). The pump 86 may have any suitable structure configured to deliver the hydrogen-generating fluid to the vaporization zone 76 and/or the hydrogen-generating zone 78. The hydrogen-generating fluid may be a feed stream containing at least one liquid including water and carbonaceous feedstock. 90 form.

汽化區76可包括經組態以接收且汽化含液體進料流（諸如含液體進料流90）之至少一部分的任何合適結構。舉例而言，汽化區76可包括汽化器92，其經組態以將含液體進料流90至少部分轉換成一或多個氣相進料流94。氣相進料流在一些實施例中可包括液體。合適汽化器之實例為盤管汽化器，諸如不鏽鋼盤管。Vaporization zone 76 may include any suitable structure configured to receive and vaporize at least a portion of a liquid-containing feed stream, such as liquid-containing feed stream 90. For example, the vaporization zone 76 may include a vaporizer 92 that is configured to at least partially convert the liquid-containing feed stream 90 into one or more gas-phase feed streams 94. The gas phase feed stream may include liquid in some embodiments. An example of a suitable vaporizer is a coil vaporizer, such as a stainless steel coil.

氫氣產生區78可包括經組態以接收一或多個進料流（諸如來自汽化區之氣相進料流94）從而產生一或多個輸出流96的任何合適結構，該一或多個輸出流含有作為大部分組份之氫氣以及其他氣體。氫氣產生區可經由任何合適機構產生輸出流。舉例而言，氫氣產生區78可經由蒸汽重組反應產生輸出流96。在彼例中，氫氣產生區78可包括具有重組催化劑98之蒸汽重組區97，該重組催化劑經組態以促進及/或促成蒸汽重組反應。當氫氣產生區78經由蒸汽重組反應產生輸出流96時，氫氣產生總成72可被稱作「蒸汽重組氫氣產生總成（steam reforming hydrogen generation assembly）」且輸出流96可被稱作「重組物流（reformate stream）」。The hydrogen generation zone 78 may include any suitable structure configured to receive one or more feed streams (such as the gas phase feed stream 94 from the vaporization zone) to produce one or more output streams 96, the one or more The output stream contains hydrogen and other gases as a major component. The hydrogen generation zone can generate an output stream via any suitable mechanism. For example, the hydrogen generation zone 78 may generate an output stream 96 via a steam reforming reaction. In that example, the hydrogen generation zone 78 may include a steam recombination zone 97 with a recombination catalyst 98 that is configured to promote and/or facilitate a steam recombination reaction. When the hydrogen generation zone 78 generates an output stream 96 through a steam reforming reaction, the hydrogen generation assembly 72 can be referred to as a "steam reforming hydrogen generation assembly" and the output stream 96 can be referred to as a "recombination stream". (Reformate stream)".

加熱總成80可包括經組態以產生至少一個經加熱之排出流99用於加熱氫氣產生總成72之一或多個其他組件的任何合適結構。舉例而言，加熱總成可將汽化區加熱至任何合適溫度，諸如至少最低汽化溫度或汽化至少一部分含液體進料流以形成氣相進料流之溫度。另外或替代地，加熱總成80可加熱氫氣產生區至任何合適溫度，諸如至少最低氫氣產生溫度或氣相進料流之至少一部分反應以產生氫氣以形成輸出流的溫度。加熱總成可與氫氣產生總成之一或多個組件諸如汽化區及/或氫氣產生區熱連通。The heating assembly 80 may include any suitable structure configured to generate at least one heated exhaust stream 99 for heating one or more other components of the hydrogen generating assembly 72. For example, the heating assembly can heat the vaporization zone to any suitable temperature, such as at least the minimum vaporization temperature or the temperature at which at least a portion of the liquid-containing feed stream is vaporized to form the gas-phase feed stream. Additionally or alternatively, the heating assembly 80 may heat the hydrogen generation zone to any suitable temperature, such as at least the minimum hydrogen generation temperature or the temperature at which at least a portion of the gas phase feed stream reacts to generate hydrogen to form an output stream. The heating assembly may be in thermal communication with one or more components of the hydrogen generating assembly, such as the vaporization zone and/or the hydrogen generating zone.

加熱總成可包括燃燒器總成100、至少一個鼓風機102及點火器總成104，如圖2所示。燃燒器總成可包括經組態以接收至少一個空氣流106及至少一個燃料流108且在燃燒區110內燃燒至少一個燃料流以產生經加熱之排出流99的任何合適結構。燃料流可由原料遞送系統74及/或淨化區82提供。燃燒區可含有在氫氣產生總成之殼體內。鼓風機102可包括經組態以產生空氣流106之任何合適結構。點火器總成104可包括經組態以點燃燃料流108之任何合適結構。The heating assembly may include a burner assembly 100, at least one blower 102, and an igniter assembly 104, as shown in FIG. 2. The combustor assembly may include any suitable structure configured to receive at least one air flow 106 and at least one fuel flow 108 and burn the at least one fuel flow in the combustion zone 110 to produce a heated exhaust flow 99. The fuel flow may be provided by the feedstock delivery system 74 and/or the purification zone 82. The combustion zone may be contained in the casing of the hydrogen generating assembly. The blower 102 may include any suitable structure configured to generate an air flow 106. The igniter assembly 104 may include any suitable structure configured to ignite the fuel stream 108.

淨化區82可包括經組態以產生至少一個富氫氣流112之任何合適結構，該富氫氣流112可包括比輸出流96大的氫氣濃度及/或存在於彼輸出流中之降低濃度之一或多種其他氣體（或雜質）。淨化區可產生至少一個副產物流或燃料流108，可將該副產物流或燃料流發送至燃燒器總成100且將其用作彼總成之燃料流，如圖2所示。淨化區82可包括流量限制孔口111、過濾器總成114、膜總成116及甲烷化反應器總成118。過濾器總成（諸如一或多個熱氣體過濾器）可經組態以在氫氣淨化膜總成之前移除來自輸出流96之雜質。The purification zone 82 may include any suitable structure configured to produce at least one hydrogen-rich gas stream 112, which may include one of a greater concentration of hydrogen than the output stream 96 and/or a reduced concentration present in that output stream Or a variety of other gases (or impurities). The purification zone can generate at least one by-product stream or fuel stream 108, which can be sent to the combustor assembly 100 and used as the fuel stream of that assembly, as shown in FIG. 2. The purification zone 82 may include a flow restriction orifice 111, a filter assembly 114, a membrane assembly 116 and a methanation reactor assembly 118. The filter assembly (such as one or more hot gas filters) may be configured to remove impurities from the output stream 96 before the hydrogen purification membrane assembly.

膜總成116可包括任何合適結構，其經組態以接收含有氫氣及其他氣體之輸出或混合氣流96且產生相較於混合氣流含有較大濃度之氫氣及/或較低濃度之其他氣體的滲透物或富氫氣流112。膜總成116可併有平面或管狀的氫氣可滲透（或氫氣選擇性）膜，且可將多於一種氫氣可滲透膜併入膜總成116中。滲透物流可用於任何合適應用，諸如用於一或多個燃料電池。在一些實施例中，膜總成可產生包括其他氣體之至少相當大部分的副產物或燃料流108。甲烷化反應器總成118可包括經組態以將一氧化碳及氫氣轉化成甲烷及水之任何合適結構。雖然淨化區82展示為包括流量限制孔口111、過濾器總成114、膜總成116及甲烷化反應器總成118，但淨化區相較於所有彼等總成可具有較少組件，及/或可替代地或另外包括經組態以淨化輸出流96之一或多個其他組件。舉例而言，淨化區82可僅包括膜總成116。The membrane assembly 116 may include any suitable structure that is configured to receive an output or mixed gas stream 96 containing hydrogen and other gases and generate a gas containing a greater concentration of hydrogen and/or a lower concentration of other gases than the mixed gas stream. Permeate or hydrogen-rich stream 112. The membrane assembly 116 may incorporate a flat or tubular hydrogen permeable (or hydrogen selective) membrane, and more than one hydrogen permeable membrane may be incorporated into the membrane assembly 116. The permeate stream can be used for any suitable application, such as for one or more fuel cells. In some embodiments, the membrane assembly may produce a by-product or fuel stream 108 that includes at least a substantial portion of other gases. The methanation reactor assembly 118 may include any suitable structure configured to convert carbon monoxide and hydrogen into methane and water. Although the purification zone 82 is shown as including the flow restriction orifice 111, the filter assembly 114, the membrane assembly 116, and the methanation reactor assembly 118, the purification zone may have fewer components than all of these assemblies, and /Or may alternatively or additionally include one or more other components configured to purify the output stream 96. For example, the purification zone 82 may only include the membrane assembly 116.

在一些實施例中，氫氣產生總成72可包括殼層或外殼120，其可至少部分含有彼總成之一或多個其他組件。舉例而言，殼層120可至少部分含有汽化區76、氫氣產生區78、加熱總成80及/或淨化區82，如圖2所示。殼層120可包括經組態以放出由加熱總成80產生之至少一個燃燒排出流124的一或多個排出通口122。In some embodiments, the hydrogen generating assembly 72 may include a shell or outer shell 120, which may at least partially contain one or more other components of the assembly. For example, the shell layer 120 may at least partially contain a vaporization zone 76, a hydrogen generation zone 78, a heating assembly 80, and/or a purification zone 82, as shown in FIG. 2. The shell 120 may include one or more discharge ports 122 configured to discharge at least one combustion discharge stream 124 generated by the heating assembly 80.

氫氣產生總成72在一些實施例中可包括控制系統126，其可包括經組態以控制氫氣產生總成72之操作的任何合適結構。舉例而言，控制總成126可包括控制總成128、至少一個閥130、至少一個泄壓閥132及一或多個溫度量測裝置134。控制總成128可經由溫度量測裝置134偵測氫氣產生區及/或淨化區中之溫度，該溫度量測裝置可包括一或多個熱電偶及/或其他合適裝置。基於所偵測之溫度，控制總成及/或控制系統之操作者可經由閥130及泵86調整進料流90至汽化區76及/或氫氣產生區78的遞送。閥130可包括螺線管閥及/或任何合適閥。泄壓閥132可經組態以確保減輕系統中之過量壓力。The hydrogen generating assembly 72 may include a control system 126 in some embodiments, which may include any suitable structure configured to control the operation of the hydrogen generating assembly 72. For example, the control assembly 126 may include a control assembly 128, at least one valve 130, at least one pressure relief valve 132 and one or more temperature measuring devices 134. The control assembly 128 can detect the temperature in the hydrogen generation area and/or the purification area through a temperature measuring device 134, which may include one or more thermocouples and/or other suitable devices. Based on the detected temperature, the operator of the control assembly and/or control system can adjust the delivery of the feed stream 90 to the vaporization zone 76 and/or the hydrogen generation zone 78 via the valve 130 and the pump 86. The valve 130 may include a solenoid valve and/or any suitable valve. The pressure relief valve 132 can be configured to ensure that excess pressure in the system is relieved.

在一些實施例中，氫氣產生總成72可包括熱交換總成136，其可包括經組態以將熱自一部分氫氣產生總成傳遞至另一部分之一或多個熱交換器138。舉例而言，熱交換總成136可將熱自富氫氣流112傳遞至進料流90，從而在進入汽化區76之前提昇進料流之溫度，以及冷卻富氫氣流112。In some embodiments, the hydrogen generation assembly 72 may include a heat exchange assembly 136, which may include one or more heat exchangers 138 configured to transfer heat from one part of the hydrogen generation assembly to another part. For example, the heat exchange assembly 136 can transfer heat from the hydrogen-rich stream 112 to the feed stream 90 to increase the temperature of the feed stream and cool the hydrogen-rich stream 112 before entering the vaporization zone 76.

圖1之氫氣產生總成20之淨化區40（或氫氣淨化裝置）的實例在圖3中通常以144指示。An example of the purification zone 40 (or hydrogen purification device) of the hydrogen generation assembly 20 in FIG. 1 is generally indicated by 144 in FIG. 3.

除非特定地排除，否則氫氣淨化裝置可包括本發明中描述之其他淨化區的一或多個組件。氫氣淨化裝置40可包括氫氣分離區146及殼體148。殼體可界定具有內部周邊152之內部容積150。殼體148可包括至少一第一部分154及第二部分156，其耦接在一起以形成呈可包括所界定之輸入通口及輸出通口之密封壓力容器之形式的主體149。彼等通口可界定氣體及其他流體遞送至殼體之內部容積且自該內部容積移除藉由的流徑。Unless specifically excluded, the hydrogen purification device may include one or more components of other purification zones described in the present invention. The hydrogen purification device 40 may include a hydrogen separation zone 146 and a casing 148. The housing may define an internal volume 150 having an internal periphery 152. The housing 148 may include at least a first portion 154 and a second portion 156 that are coupled together to form a main body 149 in the form of a sealed pressure vessel that may include a defined input port and an output port. These ports can define a flow path through which gas and other fluids are delivered to and removed from the internal volume of the housing.

第一部分154及第二部分156可使用任何合適保持機構或結構158耦接在一起。合適保持結構之實例包括焊縫及/或螺釘。可用以在第一部分與第二部分之間提供流體密封界面之密封件的實例可包括密封墊及/或焊縫。另外或替代地，第一部分154及第二部分156可緊固在一起，使得至少一預定量之壓縮施加至各種組件，該等組件界定可併入至氫氣產生總成之殼體及/或其他組件內的氫氣分離區。所施加壓縮可確保，各種組件於殼體內保持於適當位置。另外或替代地，施加至界定氫氣分離區之各種組件及/或其他組件之壓縮可在界定氫氣分離區之各種組件、各種其他組件之間及/或界定氫氣分離區之組件與其他組件之間提供流體密封界面。The first part 154 and the second part 156 can be coupled together using any suitable holding mechanism or structure 158. Examples of suitable retention structures include welds and/or screws. Examples of seals that can be used to provide a fluid-tight interface between the first part and the second part may include gaskets and/or welds. Additionally or alternatively, the first part 154 and the second part 156 can be fastened together so that at least a predetermined amount of compression is applied to various components that define a housing and/or other components that can be incorporated into the hydrogen generation assembly The hydrogen separation zone in the module. The applied compression ensures that the various components are kept in place within the housing. Additionally or alternatively, the compression applied to the various components defining the hydrogen separation zone and/or other components may be between the various components defining the hydrogen separation zone, between various other components, and/or between the components defining the hydrogen separation zone and other components Provide a fluid-tight interface.

殼體148可包括混合氣體區160及滲透物區162，如圖3中所展示。混合氣體區及滲透物區可藉由氫氣分離區146分離。可提供至少一個輸入通口164，流體流166經由該至少一個輸入通口遞送至殼體。流體流166可為混合氣流168，其含有遞送至混合氣體區160之氫氣170及其他氣體172。氫氣可為混合氣流之大部分組份。氫氣分離區146可在混合氣體區160與滲透物區162之間延伸，使得混合氣體區中之氣體必須通過氫氣分離區以便進入滲透物區。舉例而言，可要求氣體通過如文以下進一步論述的至少一個氫氣選擇性膜。滲透物區及混合氣體區可在殼體內具有任何合適相對大小。The housing 148 may include a mixed gas zone 160 and a permeate zone 162, as shown in FIG. 3. The mixed gas zone and the permeate zone can be separated by the hydrogen separation zone 146. At least one input port 164 may be provided through which fluid flow 166 is delivered to the housing. The fluid stream 166 may be a mixed gas stream 168 containing hydrogen 170 and other gases 172 delivered to the mixed gas zone 160. Hydrogen can be the most part of the mixed gas stream. The hydrogen separation zone 146 may extend between the mixed gas zone 160 and the permeate zone 162, so that the gas in the mixed gas zone must pass through the hydrogen separation zone in order to enter the permeate zone. For example, the gas may be required to pass through at least one hydrogen selective membrane as discussed further below. The permeate zone and the mixed gas zone can have any suitable relative size within the housing.

殼體148亦可包括至少一個產物輸出通口174，滲透物流176可經由該至少一個產物輸出通口自滲透物區162接收並移除。滲透物流可含有相較於混合氣流一較大濃度之氫氣及一較低濃度之其他氣體中的至少一者。在一些實施例中，滲透物流176可至少初始地包括載體氣體組份或殘氣氣體組份，諸如可經由與滲透物區流體連通之殘氣通口180作為殘氣流178遞送。殼體亦可包括至少一個副產物輸出通口182，含有其他氣體172之一相當大部分之及一減小濃度之氫氣170（相對於混合氣流）中之至少一者的副產物流184經由該至少一個副產物輸出通口自混合氣體區移除。The housing 148 may also include at least one product output port 174 through which the permeate stream 176 can be received and removed from the permeate zone 162 through the at least one product output port. The permeate stream may contain at least one of a higher concentration of hydrogen gas and a lower concentration of other gases than the mixed gas stream. In some embodiments, the permeate stream 176 may at least initially include a carrier gas component or a residual gas component, such as may be delivered as a residual gas stream 178 via a residual gas vent 180 in fluid communication with the permeate zone. The housing may also include at least one by-product output port 182, through which a by-product stream 184 containing at least one of a substantial part of the other gases 172 and a reduced concentration of hydrogen 170 (relative to the mixed gas stream) passes At least one by-product output port is removed from the mixed gas zone.

氫氣分離區146可包括：具有第一或混合氣體表面188之至少一個氫氣選擇性膜186，該第一或混合氣體表面經定向以與混合氣流168接觸；及第二或滲透物表面190，其與表面188大體相對。混合氣流168可經遞送至殼體之混合氣體區，使得該混合氣流與一或多個氫氣選擇性膜之混合氣體表面接觸。滲透物流176可由混合氣流的通過氫氣分離區至滲透物區162之至少一部分形成。副產物流184可由混合氣流的並不通過氫氣分離區之至少一部分形成。在一些實施例中，副產物流184可含有存在於混合氣流中之氫氣的一部分。氫氣分離區亦可經組態以截獲或以其他方式保留其他氣體的至少一部分，該等其他氣體之至少一部分可接著隨著分離區經替換、再生或以其他方式再裝載而作為副產物流被移除。The hydrogen separation zone 146 may include: at least one hydrogen selective membrane 186 having a first or mixed gas surface 188 oriented to contact the mixed gas stream 168; and a second or permeate surface 190, which It is generally opposite to the surface 188. The mixed gas stream 168 may be delivered to the mixed gas zone of the housing so that the mixed gas stream contacts the mixed gas surface of one or more hydrogen selective membranes. The permeate stream 176 may be formed from at least a portion of the mixed gas stream that passes through the hydrogen separation zone to the permeate zone 162. The byproduct stream 184 may be formed from at least a portion of the mixed gas stream that does not pass through the hydrogen separation zone. In some embodiments, the byproduct stream 184 may contain a portion of the hydrogen present in the mixed gas stream. The hydrogen separation zone can also be configured to intercept or otherwise retain at least a portion of other gases, and at least a portion of these other gases can then be used as a byproduct stream as the separation zone is replaced, regenerated, or otherwise reloaded. Remove.

在圖3中，流166、176、178及/或184可包括流入或流出氫氣淨化裝置144之多於一個實際流。舉例而言，氫氣淨化裝置可接收複數個混合氣流168、在接觸氫氣分離區146之前劃分成兩個或多於兩個流之單一混合氣流168、經遞送至內部容積150中之單一流等。因此，殼體148可包括多於一個輸入通口164、產物輸出通口174、殘氣通口180及/或副產物輸出通口182。In FIG. 3, the streams 166, 176, 178, and/or 184 may include more than one actual stream flowing into or out of the hydrogen purification device 144. For example, the hydrogen purification device may receive a plurality of mixed gas streams 168, a single mixed gas stream 168 divided into two or more streams before contacting the hydrogen separation zone 146, a single stream delivered into the internal volume 150, and the like. Therefore, the housing 148 may include more than one input port 164, a product output port 174, a residual air port 180, and/or a by-product output port 182.

氫氣選擇性膜可由適用於操作環境及操作氫氣淨化裝置所用之參數的任何氫氣可滲透材料形成。氫氣淨化裝置之實例揭示於美國專利第5,997,594號及第6,537,352號中，該等專利之全部揭示內容出於所有目的特此以引用之方式併入。在一些實施例中，氫氣選擇性膜可由鈀及鈀合金中之至少一者形成。鈀合金之實例包括鈀與銅、銀及/或金之合金。各種膜、膜組態及用於製備膜及膜組態之方法的實例揭示於美國專利第6,152,995號、第6,221,117號、第6,319,306號及第6,537,352號中，該等專利之全部揭示內容出於所有目的特此以引用之方式併入。The hydrogen selective membrane can be formed of any hydrogen permeable material that is suitable for the operating environment and the parameters used to operate the hydrogen purification device. Examples of hydrogen purification devices are disclosed in US Patent Nos. 5,997,594 and 6,537,352, and the entire disclosures of these patents are hereby incorporated by reference for all purposes. In some embodiments, the hydrogen selective membrane may be formed of at least one of palladium and a palladium alloy. Examples of palladium alloys include alloys of palladium and copper, silver and/or gold. Examples of various membranes, membrane configurations, and methods for preparing membranes and membrane configurations are disclosed in U.S. Patent Nos. 6,152,995, 6,221,117, 6,319,306, and 6,537,352. The entire disclosure of these patents is for all The purpose is hereby incorporated by reference.

在一些實施例中，複數個隔開之氫氣選擇性膜186可用於氫氣分離區中以形成氫氣分離總成192的至少一部分。在存在時，複數個膜可共同地界定一或多個膜總成194。在此等實施例中，氫氣分離總成可通常自第一部分154延伸至第二部分156。因此，第一部分及第二部分可有效地壓縮氫氣分離總成。在一些實施例中，殼體148可另外或替代地包括耦接至主體部分之相對側的端板（或端框架）。在此等實施例中，端板可有效地壓縮該對相對端板之間的氫氣分離總成（及可容納於殼體內之其他組件）。In some embodiments, a plurality of separated hydrogen selective membranes 186 may be used in the hydrogen separation zone to form at least a part of the hydrogen separation assembly 192. When present, a plurality of membranes may collectively define one or more membrane assemblies 194. In these embodiments, the hydrogen separation assembly may generally extend from the first part 154 to the second part 156. Therefore, the first part and the second part can effectively compress the hydrogen separation assembly. In some embodiments, the housing 148 may additionally or alternatively include end plates (or end frames) coupled to opposite sides of the main body portion. In these embodiments, the end plates can effectively compress the hydrogen separation assembly (and other components that can be contained in the housing) between the pair of opposite end plates.

使用一或多個氫氣選擇性膜之氫氣淨化典型地為壓力驅動分離製程，在該製程中，混合氣流在高於氫氣分離區之滲透區中之氣體的壓力下經遞送而與膜之混合氣體表面接觸。在一些實施例中，當氫氣分離區用以將混合氣流分離成滲透物流及副產物流時，氫氣分離區可經由任何合適機構加熱至高溫。用於使用鈀及鈀合金膜之氫氣淨化的合適操作溫度之實例包括至少275℃之溫度、至少325℃之溫度、至少350℃的溫度、在275至500℃之範圍內的溫度、在275至375℃之範圍內的溫度、在300至450℃之範圍內的溫度、在350至450℃之範圍內的溫度等。Hydrogen purification using one or more hydrogen selective membranes is typically a pressure-driven separation process in which a mixed gas stream is delivered at a pressure higher than the gas in the permeation zone of the hydrogen separation zone to mix the gas with the membrane Surface contact. In some embodiments, when the hydrogen separation zone is used to separate the mixed gas stream into a permeate stream and a by-product stream, the hydrogen separation zone can be heated to a high temperature by any suitable mechanism. Examples of suitable operating temperatures for hydrogen purification using palladium and palladium alloy membranes include a temperature of at least 275°C, a temperature of at least 325°C, a temperature of at least 350°C, a temperature in the range of 275 to 500°C, and a temperature in the range of 275 to 500°C. The temperature in the range of 375°C, the temperature in the range of 300 to 450°C, the temperature in the range of 350 to 450°C, etc.

氫氣淨化裝置144之實例在圖4中通常以196指示。除非具體地排除，否則氫氣淨化裝置196可包括本發明中描述之其他氫氣淨化裝置之一或多個組件及/或淨化區。氫氣淨化裝置196可包括殼層或殼體198，其可包括第一端板或端框架200及第二端板或端框架202。第一端板及第二端板可經組態以緊固及/或壓縮在一起以界定具有一內部隔室204之密封壓力容器，在該內部隔室中支援氫氣分離區。類似於氫氣淨化裝置144，第一端板及第二端板可包括輸入通口、輸出通口、殘氣通口及副產物通口（圖中未示）。An example of the hydrogen purification device 144 is generally indicated at 196 in FIG. 4. Unless specifically excluded, the hydrogen purification device 196 may include one or more components and/or purification regions of other hydrogen purification devices described in the present invention. The hydrogen purification device 196 may include a shell or housing 198, which may include a first end plate or end frame 200 and a second end plate or end frame 202. The first end plate and the second end plate may be configured to be fastened and/or compressed together to define a sealed pressure vessel with an internal compartment 204 in which the hydrogen separation zone is supported. Similar to the hydrogen purification device 144, the first end plate and the second end plate may include an input port, an output port, a residual gas port, and a by-product port (not shown in the figure).

氫氣淨化裝置196亦可包括至少一個箔微孔篩網總成205，其可安置於第一端板與第二端板之間及/或緊固至該第一端板及該第二端板。箔微孔篩網總成可包括至少一個氫氣選擇性膜206及至少一個微孔篩網結構208，如圖5中所示。氫氣選擇性膜可經組態以自輸入通口接收混合氣流之至少部分且將混合氣流分離成滲透物流之至少部分及副產物流的至少部分。氫氣選擇性膜206可包括一進料側210及一滲透側212。滲透物流之至少部分由混合氣流之自進料側傳遞至滲透側之部分形成，其中混合氣流之剩餘在進料側上之剩餘部分形成副產物流的至少部分。The hydrogen purification device 196 can also include at least one foil microporous screen assembly 205, which can be arranged between the first end plate and the second end plate and/or fastened to the first end plate and the second end plate . The foil microporous screen assembly may include at least one hydrogen selective membrane 206 and at least one microporous screen structure 208, as shown in FIG. 5. The hydrogen selective membrane may be configured to receive at least part of the mixed gas stream from the input port and separate the mixed gas stream into at least part of the permeate stream and at least part of the byproduct stream. The hydrogen selective membrane 206 may include a feed side 210 and a permeate side 212. At least part of the permeate stream is formed by the portion of the mixed gas stream that passes from the feed side to the permeate side, wherein the remainder of the mixed gas stream on the feed side forms at least part of the by-product stream.

氫氣選擇性膜中之一或多者可以冶金方式接合至微孔篩網結構208。舉例而言，氫氣選擇性膜之滲透側可以冶金方式接合至微孔篩網結構。在一些實施例中，氫氣選擇性膜206（及/或彼等膜之滲透側）中之一或多者可擴散接合至微孔篩網結構以在膜與微孔篩網結構之間形成固態擴散接合。舉例而言，膜之滲透側及微孔篩網結構可彼此接觸且暴露至高溫及/或高壓以允許膜及微孔篩網結構之表面隨時間自身穿插。One or more of the hydrogen selective membranes may be metallurgically joined to the microporous mesh structure 208. For example, the permeate side of the hydrogen selective membrane can be metallurgically joined to the microporous mesh structure. In some embodiments, one or more of the hydrogen selective membranes 206 (and/or the permeate side of those membranes) can be diffusion bonded to the microporous mesh structure to form a solid state between the membrane and the microporous mesh structure. Diffusion bonding. For example, the permeate side of the membrane and the microporous screen structure can be in contact with each other and exposed to high temperature and/or high pressure to allow the surface of the membrane and the microporous screen structure to penetrate itself over time.

在一些實施例中，微孔篩網結構可塗佈有薄金屬層或輔助擴散接合的中間接合層。舉例而言，鎳、銅、銀、金或其他金屬之薄塗層經受固態擴散接合，但並不（1）在低於或等於700℃下熔融並進入液相及（2）在擴散至氫氣選擇性膜之後便在低於或等於700℃下形成低熔融合金。薄金屬層可經由中間接合層於將與氫氣選擇性膜接觸之微孔篩網結構之表面上的薄塗佈的合適沉積製程（例如，電化學鍍敷、氣相沉積、濺鍍等）來塗覆至微孔篩網結構。在其他實施例中，氫氣選擇性膜可緊固至至少一個膜框架（圖中未示），其可接著緊固至第一端框架及第二端框架。In some embodiments, the microporous mesh structure may be coated with a thin metal layer or an intermediate bonding layer to assist diffusion bonding. For example, thin coatings of nickel, copper, silver, gold or other metals undergo solid-state diffusion bonding, but they do not (1) melt and enter the liquid phase at a temperature lower than or equal to 700°C and (2) diffuse to hydrogen After the selective film, a low-melting alloy is formed at a temperature lower than or equal to 700°C. The thin metal layer can be formed by a suitable deposition process (for example, electrochemical plating, vapor deposition, sputtering, etc.) by thin coating of the intermediate bonding layer on the surface of the microporous mesh structure that will be in contact with the hydrogen selective membrane Coated to the microporous mesh structure. In other embodiments, the hydrogen selective membrane can be fastened to at least one membrane frame (not shown), which can then be fastened to the first end frame and the second end frame.

微孔篩網結構208可包括經組態以支撐至少一個氫氣選擇性膜之任何合適結構。舉例而言，微孔篩網結構可包括：具有大體相對表面214及215的無孔平面薄片213，該等表面經組態以提供對滲透側212之支撐；及複數個孔隙216，其形成在相對表面之間延伸的複數個流體通路217，該等流體通路允許滲透物流流過微孔篩網結構，如圖6中所示。孔隙可經由電化學蝕刻、雷射鑽孔及諸如衝壓或刀模切割之其他機械成型製程而形成於無孔平面薄片上。在一些實施例中，孔隙中之一或多者（或孔隙之全部）可形成於無孔平面薄片上，使得其（縱向）軸線或流體通路之縱向軸線垂直於無孔平面薄片的平面，如圖6中所示。無孔平面薄片可為任何合適厚度，諸如介於100微米與約200微米之間的厚度。The microporous mesh structure 208 may include any suitable structure configured to support at least one hydrogen selective membrane. For example, the microporous mesh structure may include: a non-porous planar sheet 213 with substantially opposed surfaces 214 and 215, which are configured to provide support for the permeable side 212; and a plurality of pores 216 formed in A plurality of fluid passages 217 extending between the opposite surfaces allow the permeate to flow through the microporous mesh structure, as shown in FIG. 6. Pores can be formed in the non-porous flat sheet through electrochemical etching, laser drilling, and other mechanical molding processes such as stamping or die cutting. In some embodiments, one or more of the pores (or all of the pores) may be formed on the non-porous planar sheet so that its (longitudinal) axis or the longitudinal axis of the fluid passage is perpendicular to the plane of the non-porous planar sheet, such as Shown in Figure 6. The non-porous planar sheet can be any suitable thickness, such as a thickness between 100 microns and about 200 microns.

在一些實施例中，微孔篩網結構208可包括：包括複數個孔隙之一或多個穿孔區域（或部分）218，及不包括（或排除）複數個孔隙之一或多個非穿孔區域（或部分）219。儘管僅少許孔隙216說明於圖6中，孔隙216越過僅穿孔部分之整個長度及寬度分佈。穿孔區域可為離散的或與一或多個其他穿孔區域分隔。非穿孔區域219可包括：在穿孔區域中之一或多者周圍形成框架之周邊區域（或部分）220；及/或分離或界定穿孔區域之多於兩個離散部分的一或多個邊界區域（或部分）221。換言之，每一穿孔部分可藉由不含複數個孔隙之至少一個邊界部分與其他鄰接離散穿孔部分分隔。In some embodiments, the microporous mesh structure 208 may include one or more perforated regions (or portions) 218 that includes a plurality of pores, and one or more non-perforated regions that do not include (or exclude) a plurality of pores. (Or part of) 219. Although only a few pores 216 are illustrated in FIG. 6, the pores 216 are distributed across the entire length and width of only the perforated portion. The perforated area may be discrete or separated from one or more other perforated areas. The non-perforated area 219 may include: a peripheral area (or portion) 220 that forms a frame around one or more of the perforated areas; and/or one or more boundary areas that separate or define more than two discrete portions of the perforated area (Or part of) 221. In other words, each perforated portion can be separated from other adjacent discrete perforated portions by at least one boundary portion without a plurality of pores.

孔隙216可包括任何合適圖案、形狀及/或大小。在一些實施例中，孔隙可形成有一或多個圖案，該一或多個圖案使組合式孔隙區域最大化同時維持微孔篩網結構之足夠高的硬度以防止在壓力負載下過度偏轉。孔隙216如圖6中所示可為圓形（環形），如圖7中所展示為狹長圓形、如圖8中所示為卵形、如圖9中所示為六邊形、三角形、正方形、矩形、八邊形及/或其他合適形狀。在一些實施例中，穿孔區域中之孔隙216可為單一不變形狀。在其他具體例中，穿孔區域中之孔隙216可為兩個或多於兩個不同形狀之任何合適組合。孔隙可為任何合適大小。舉例而言，當孔隙為圓形時，直徑範圍可為約0.003吋至約0.020吋。另外，當孔隙為卵形時，卵形之修圓末端的半徑範圍可為0.001吋至約0.010吋，且卵形之長度可高達半徑的十倍。在一些實施例中，穿孔區域中之孔隙可為單一不變大小。在其他具體例中，穿孔區域中之孔隙216可為兩個或多於兩個不同大小的任何合適組合。The aperture 216 may include any suitable pattern, shape, and/or size. In some embodiments, the pores may be formed in one or more patterns that maximize the combined pore area while maintaining the hardness of the microporous mesh structure high enough to prevent excessive deflection under pressure loads. The aperture 216 may be circular (annular) as shown in FIG. 6, as shown in FIG. 7 as an oblong circle, as shown in FIG. 8 as an oval, as shown in FIG. 9 as a hexagon, triangle, Square, rectangle, octagon and/or other suitable shapes. In some embodiments, the aperture 216 in the perforated area may have a single constant shape. In other specific examples, the pores 216 in the perforated area may be any suitable combination of two or more different shapes. The pores can be any suitable size. For example, when the aperture is circular, the diameter may range from about 0.003 inch to about 0.020 inch. In addition, when the pore is oval, the radius of the rounded end of the oval can range from 0.001 inch to about 0.010 inch, and the length of the oval can be up to ten times the radius. In some embodiments, the pores in the perforated area may have a single constant size. In other specific examples, the pores 216 in the perforated area may be any suitable combination of two or more different sizes.

無孔平面薄片可包括任何合適材料。舉例而言，無孔平面薄片可包括不鏽鋼。不鏽鋼可包括300系列不鏽鋼（例如，不鏽鋼303（經鋁改質）、不鏽鋼304等）、400系列不鏽鋼、17-7PH、14-8 PH及/或15-7 PH。在一些實施例中，不鏽鋼可包括大約0.6 wt%至約3.0 wt%的鋁。在一些實施例中，無孔平面薄片可包括碳鋼、銅或銅合金、鋁或鋁合金、鎳、鎳-銅合金及/或電鍍有銀、鎳及/或銅的基材金屬。基材金屬可包括上文所述之碳鋼或者不鏽鋼中的一或多者。The non-porous planar sheet may include any suitable material. For example, the non-porous planar sheet may include stainless steel. Stainless steel may include 300 series stainless steel (for example, stainless steel 303 (modified by aluminum), stainless steel 304, etc.), 400 series stainless steel, 17-7PH, 14-8 PH and/or 15-7 PH. In some embodiments, the stainless steel may include about 0.6 wt% to about 3.0 wt% aluminum. In some embodiments, the non-porous planar sheet may include carbon steel, copper or copper alloy, aluminum or aluminum alloy, nickel, nickel-copper alloy, and/or base metal electroplated with silver, nickel, and/or copper. The base metal may include one or more of the above-mentioned carbon steel or stainless steel.

氫氣選擇性膜206可經設定為大於微孔篩網結構之穿孔區域或場地（field），使得當氫氣選擇性膜以冶金方式接合至微孔篩網結構時，氫氣選擇性膜之周邊部分222接觸微孔篩網結構之一或多個非穿孔區域219。在一些實施例中，單一氫氣選擇性膜可以冶金方式接合至單一微孔篩網結構，如圖5中所示。在其他具體例中，兩個或多於兩個氫氣選擇性膜206可以冶金方式接合至單一微孔篩網結構208。舉例而言，兩個、三個、四個、五個、六個、七個、八個、九個、十個或多於十個之氫氣選擇性膜206可以冶金方式接合至單一微孔篩網結構208。圖10展示實例箔微孔篩網總成205，其具有以冶金方式接合至單一微孔篩網結構208的六個氫氣選擇性膜206。圖12展示具有以冶金方式接合至單一微孔篩網結構208之兩個氫氣選擇性膜206的實例箔微孔篩網總成205，而圖13展示具有以冶金方式接合至單一微孔篩網結構208之四個氫氣選擇性膜206的實例箔微孔篩網總成205。The hydrogen selective membrane 206 can be set to be larger than the perforated area or field of the microporous mesh structure, so that when the hydrogen selective membrane is metallurgically joined to the microporous mesh structure, the peripheral portion 222 of the hydrogen selective membrane Contact one or more non-perforated areas 219 of the microporous mesh structure. In some embodiments, a single hydrogen selective membrane can be metallurgically joined to a single microporous mesh structure, as shown in FIG. 5. In other specific examples, two or more hydrogen selective membranes 206 may be metallurgically joined to a single microporous mesh structure 208. For example, two, three, four, five, six, seven, eight, nine, ten, or more than ten hydrogen selective membranes 206 can be metallurgically joined to a single microporous sieve网结构208。 Network structure 208. Figure 10 shows an example foil microporous screen assembly 205 having six hydrogen selective membranes 206 metallurgically joined to a single microporous screen structure 208. Figure 12 shows an example foil microporous screen assembly 205 with two hydrogen selective membranes 206 metallurgically joined to a single microporous screen structure 208, and Figure 13 shows an example foil microporous screen assembly 205 with metallurgically joined to a single microporous screen An example foil microporous mesh assembly 205 of four hydrogen selective membranes 206 of structure 208.

當兩個或多於兩個氫氣選擇性膜206以冶金方式接合至微孔篩網結構時，微孔篩網結構可包括藉由一或多個非穿孔區域219分離的兩個或多於兩個離散穿孔區域218。在一些實施例中，穿孔區域218可大小設定為與其他穿孔區域218相同。舉例而言，圖11展示大小大約相同之六個離散穿孔區域218。在其他具體例中，一或多個穿孔區域218可設定大小為小於及/或大於其他穿孔區域218。氫氣選擇性膜206可以冶金方式接合至穿孔區域中之每一者，如圖10中所示。替代地或另外，氫氣選擇性膜可以冶金方式接合至兩個或多於兩個離散穿孔區域218。氫氣選擇性膜206可經設定大小，使得當膜以冶金方式接合至一或多個穿孔區域218時，膜之周邊部分222接觸一或多個非穿孔區域219。When two or more hydrogen selective membranes 206 are metallurgically joined to the microporous mesh structure, the microporous mesh structure may include two or more separated by one or more non-perforated regions 219. A discrete perforated area 218. In some embodiments, the perforated area 218 can be set to be the same size as other perforated areas 218. For example, Figure 11 shows six discrete perforated regions 218 of approximately the same size. In other specific examples, one or more perforated areas 218 can be set to be smaller and/or larger than other perforated areas 218. The hydrogen selective membrane 206 may be metallurgically joined to each of the perforated regions, as shown in FIG. 10. Alternatively or in addition, the hydrogen selective membrane may be metallurgically joined to two or more discrete perforated regions 218. The hydrogen selective membrane 206 may be sized such that when the membrane is metallurgically joined to the one or more perforated regions 218, the peripheral portion 222 of the membrane contacts the one or more non-perforated regions 219.

微孔篩網結構208可經設定大小為含有於（諸如完全含有於）滲透物框架之開放區內及/或藉由開放區內之膜支撐結構支撐，如圖5中所示。換言之，微孔篩網結構可經設定大小以在微孔篩網結構及滲透物框架緊固或壓縮至第一端框架及第二端框架時並不接觸滲透物框架的周邊殼層。替代地，微孔篩網結構可藉由無孔周邊壁部分或框架（圖中未示）支撐及/或緊固至該無孔周邊壁部分或框架，諸如緊固至滲透物框架之周邊殼層。當微孔篩網結構緊固至無孔周邊壁部分時，微孔篩網結構可被稱作「多孔中心區域部分」。其他微孔篩網結構之實例揭示於美國專利申請公開案第2010/0064887號中，該公開案之全部揭示內容出於所有目的特此以引用之方式併入。The microporous mesh structure 208 can be sized to be contained in (such as completely contained in) the open area of the permeate frame and/or supported by a membrane support structure in the open area, as shown in FIG. 5. In other words, the microporous screen structure can be sized so as not to contact the peripheral shell of the permeate frame when the microporous screen structure and the permeate frame are fastened or compressed to the first end frame and the second end frame. Alternatively, the microporous mesh structure may be supported and/or fastened to the non-porous peripheral wall portion or frame by a non-porous peripheral wall portion or frame (not shown), such as a peripheral shell fastened to the permeate frame Floor. When the microporous mesh structure is fastened to the non-porous peripheral wall portion, the microporous mesh structure can be referred to as a "porous central region portion". Examples of other microporous mesh structures are disclosed in US Patent Application Publication No. 2010/0064887, the entire disclosure of which is hereby incorporated by reference for all purposes.

氫氣淨化裝置196亦可包括複數個板或框架224，其安置於第一端框架及/或第二框架之間且緊固至第一端框架及/或第二框架。框架可包括任何合適結構及/或可為任何合適形狀，諸如正方形、矩形或圓形。舉例而言，框架224可包括周邊殼層226及至少一第一支撐部件228，如圖4中所示.周邊殼層可界定開放區230及框架平面232。另外，周邊殼層226可包括第一相對側234及第二相對側236以及第三相對側238及第四相對側240，如圖4中所示。The hydrogen purification device 196 may also include a plurality of plates or frames 224 arranged between the first end frame and/or the second frame and fastened to the first end frame and/or the second frame. The frame may include any suitable structure and/or may be any suitable shape, such as square, rectangular, or circular. For example, the frame 224 may include a peripheral shell layer 226 and at least one first support member 228, as shown in FIG. 4. The peripheral shell layer may define an open area 230 and a frame plane 232. In addition, the peripheral shell 226 may include a first opposite side 234 and a second opposite side 236 and a third opposite side 238 and a fourth opposite side 240, as shown in FIG. 4.

第一支撐部件228可包括經組態以支撐箔微孔篩網總成205之第一部分242的任何合適結構，如圖4中所示。舉例而言，複數個框架之第一支撐部件可在第一支撐平面244內彼此共面（或與複數個框架中之其他框架的其他第一支撐部件共面）以支撐氫氣選擇性膜的第一部分242，如圖4中所示。換言之，複數個框架中之每一框架的第一支撐部件可鏡像複數個框架之其他框架的第一支撐部件。第一支撐部件相對於框架平面232可具有任何合適定向。舉例而言，第一支撐平面244可垂直於框架平面，如圖4中所示。替代地，第一膜支撐平面可與框架平面232相交，但不垂直於該框架平面。The first support member 228 may include any suitable structure configured to support the first portion 242 of the foil microporous screen assembly 205, as shown in FIG. 4. For example, the first support members of the plurality of frames may be coplanar with each other in the first support plane 244 (or coplanar with other first support members of other frames in the plurality of frames) to support the first support member of the hydrogen selective membrane Part 242, as shown in Figure 4. In other words, the first supporting member of each of the plurality of frames can mirror the first supporting member of the other frames of the plurality of frames. The first support member may have any suitable orientation relative to the frame plane 232. For example, the first support plane 244 may be perpendicular to the frame plane, as shown in FIG. 4. Alternatively, the first membrane support plane may intersect the frame plane 232, but not perpendicular to the frame plane.

在一些實施例中，框架224可包括第二支撐部件246及/或第三支撐部件248，其可包括經組態以支撐箔微孔篩網總成205之第二部分250及/或第三部分252的任何合適結構，如圖4中所示。舉例而言，複數個框架之第二支撐部件可在第二支撐平面254內彼此共面（或與複數個框架之其他第二支撐部件共面）以支撐箔微孔篩網總成的第二部分250。另外，複數個框架之第三支撐部件可在第三支撐平面256內彼此共面（或與複數個框架之其他第三支撐部件共面）以支撐箔微孔篩網總成的第三部分252。換言之，複數個框架中之每一框架的第二支撐部件可鏡像複數個框架中之其他框架的第二支撐部件，而複數個框架中之每一框架的第三支撐部件可鏡像複數個框架中之其他框架的第三支撐部件。第二支撐平面及/或第三支撐平面相對於框架平面232可具有任何合適定向。舉例而言，第二支撐平面254及/或第三支撐平面256可垂直於框架平面，如圖4中所示。替代地，第二支撐平面及/或第三支撐平面可與框架平面232相交，但不垂直於該框架平面。In some embodiments, the frame 224 may include a second support member 246 and/or a third support member 248, which may include a second portion 250 and/or a third portion configured to support the foil microporous screen assembly 205 Any suitable structure of portion 252 is as shown in FIG. 4. For example, the second support members of the plurality of frames may be coplanar with each other (or coplanar with other second support members of the plurality of frames) in the second support plane 254 to support the second of the foil microporous screen assembly Part 250. In addition, the third support members of the plurality of frames may be coplanar with each other (or coplanar with other third support members of the plurality of frames) in the third support plane 256 to support the third portion 252 of the foil microporous screen assembly . In other words, the second support member of each frame in the plurality of frames can mirror the second support member of the other frame in the plurality of frames, and the third support member of each frame in the plurality of frames can mirror the second support member of the frame in the plurality of frames. The third supporting part of the other frame. The second support plane and/or the third support plane can have any suitable orientation relative to the frame plane 232. For example, the second support plane 254 and/or the third support plane 256 may be perpendicular to the frame plane, as shown in FIG. 4. Alternatively, the second support plane and/or the third support plane may intersect the frame plane 232 but not perpendicular to the frame plane.

第二支撐部件246及/或第三支撐部件248相對於第一支撐部件228可具有任何合適定向。舉例而言，第一支撐部件228可自周邊殼層226之第三側238延伸至開放區230中；第二支撐部件246可自周邊殼層之第四側240（其與第三側相對）延伸至開放區中；且第三支撐部件248可自第三側延伸至開放區中。替代地，第一支撐部件、第二支撐部件及/或第三支撐部件可自周邊殼層之同一側諸如自第一側、第二側、第三側或第四側延伸至開放區中。在一些實施例中，第一支撐部件、第二支撐部件及/或第三支撐部件可自周邊殼層之第一側及/或第二側（其與第一側相對）延伸至開放區中。The second support member 246 and/or the third support member 248 can have any suitable orientation relative to the first support member 228. For example, the first support member 228 may extend from the third side 238 of the peripheral shell 226 into the open area 230; the second support member 246 may extend from the fourth side 240 of the peripheral shell (which is opposite to the third side) Extend into the open area; and the third support member 248 can extend into the open area from the third side. Alternatively, the first support member, the second support member, and/or the third support member may extend into the open area from the same side of the peripheral shell, such as from the first side, the second side, the third side, or the fourth side. In some embodiments, the first support member, the second support member and/or the third support member may extend from the first side and/or the second side (which is opposite to the first side) of the peripheral shell into the open area .

第一支撐部件、第二支撐部件及/或第三支撐部件可例如呈附接至周邊殼層及/或形成有周邊殼層的一或多個突出部或指258的形式。突出部可在任何合適方向上自周邊殼層延伸。突出部可為具有周邊殼層之完整厚度，或可小於該殼層之完整厚度。框架224中之每一框架的突出部可與箔微孔篩網總成相抵地壓縮，藉此將該總成鎖定於適當位置。換言之，框架224之突出部可藉由係第一膜支撐平面及/或第二膜支撐平面內之端框架的堆疊式延伸部支撐箔微孔篩網總成。在一些實施例中，突出部258可包括一或多個插孔或孔隙（圖中未示），其經組態以收納至少一個扣件（圖中未示）以將框架224緊固至第一端框架及/或第二端框架。The first support member, the second support member, and/or the third support member may, for example, be in the form of one or more protrusions or fingers 258 attached to the peripheral shell layer and/or formed with the peripheral shell layer. The protrusion may extend from the peripheral shell in any suitable direction. The protrusion may have the entire thickness of the surrounding shell layer, or may be less than the entire thickness of the shell layer. The protrusion of each of the frames 224 can be compressed against the foil microporous screen assembly, thereby locking the assembly in place. In other words, the protrusions of the frame 224 can support the foil microporous screen assembly by the stacked extensions of the end frame in the first membrane support plane and/or the second membrane support plane. In some embodiments, the protrusion 258 may include one or more insertion holes or apertures (not shown), which are configured to receive at least one fastener (not shown) to fasten the frame 224 to the first One end frame and/or second end frame.

框架224可包括至少一個進料框架260、至少一個滲透物框架262及複數個密封墊或密封墊框架264，如圖4中所示。進料框架260可安置於第一端框架及第二端框架中之一者與至少一個箔微孔篩網總成205之間，或兩個箔微孔篩網總成205之間。進料框架可包括進料框架周邊殼層266、進料框架輸入管道268、進料框架輸出管道270、進料框架開放區272、至少一第一進料框架支撐部件274，如圖4中所示。在一些實施例中，進料框架可包括第二進料框架支撐部件276及/或第三進料框架支撐部件278。The frame 224 may include at least one feed frame 260, at least one permeate frame 262, and a plurality of gaskets or gasket frames 264, as shown in FIG. 4. The feed frame 260 may be disposed between one of the first end frame and the second end frame and the at least one foil microporous screen assembly 205, or between two foil microporous screen assemblies 205. The feed frame may include a peripheral shell 266 of the feed frame, a feed frame input pipe 268, a feed frame output pipe 270, a feed frame open area 272, and at least one first feed frame support member 274, as shown in FIG. 4 Show. In some embodiments, the feed frame may include a second feed frame support part 276 and/or a third feed frame support part 278.

進料框架周邊殼層266可包括任何合適結構。舉例而言，進料框架周邊殼層可包括第一區段或第一周邊殼層280及第二區段或第二周邊殼層282，如圖14中所示。請注意，圖14之組件已出於說明之目的予以誇示且可能不反映彼等組件之相對尺寸。第一區段及第二區段可為周邊殼層之第一半及第二半，或可為該周邊殼層的任何合適部分。另外，第一區段及/或第二區段可包括彼此處於任何合適關係諸如自彼此偏移的通道或凹槽（圖中未示）。第一區段280及第二區段282可經由任何合適方法結合以在彼等區段之間形成氣密密封。舉例而言，進料框架密封墊284可用於彼等區段之間。替代地，第一區段及第二區段可熔合在一起，或成層金屬可用以結合第一區段與第二區段，如美國專利申請案公開案第2013/0011301號中所描述。該案之全部揭示內容出於所有目的特此以引用之方式併入。The perimeter shell 266 of the feed frame may include any suitable structure. For example, the feed frame peripheral shell may include a first section or first peripheral shell 280 and a second section or second peripheral shell 282, as shown in FIG. 14. Please note that the components in FIG. 14 have been exaggerated for illustrative purposes and may not reflect the relative sizes of their components. The first section and the second section may be the first and second halves of the peripheral shell, or may be any suitable parts of the peripheral shell. In addition, the first section and/or the second section may include channels or grooves (not shown in the figure) that are in any suitable relationship with each other, such as offset from each other. The first section 280 and the second section 282 may be combined via any suitable method to form an airtight seal between them. For example, the feed frame gasket 284 may be used between these sections. Alternatively, the first section and the second section may be fused together, or a layered metal may be used to join the first section and the second section, as described in US Patent Application Publication No. 2013/0011301. The entire disclosure of the case is hereby incorporated by reference for all purposes.

另外，進料框架周邊殼層266可包括任何合適尺寸，其經組態以支撐氫氣淨化裝置196之其他組件。舉例而言，進料框架周邊殼層可經設定大小，使得其沿著複數個進料框架支撐平面288支撐滲透物框架262之周邊殼層及彼等框架之膜支撐結構286。舉例而言，周邊殼層266可具有大於滲透物框架框架262之周邊殼層之寬度292的寬度290，使得周邊殼層之至少一部分294支撐膜支撐結構286之一部分296，如圖14中所示。換言之，進料框架周邊殼層可將膜支撐結構鎖定於適當位置，且充當該支撐結構之擋止件。進料框架支撐平面相對於進料框架平面300可具有任何合適定向。舉例而言，進料框架支撐平面可垂直於進料框架平面，如圖14中所示。替代地，進料框架支撐平面可相交但不垂直於進料框架平面300。In addition, the perimeter shell 266 of the feed frame may include any suitable size, which is configured to support other components of the hydrogen purification device 196. For example, the peripheral shell of the feed frame may be sized such that it supports the peripheral shell of the permeate frame 262 and the membrane support structure 286 of the frames along the plurality of feed frame support planes 288. For example, the peripheral shell 266 may have a width 290 greater than the width 292 of the peripheral shell of the permeate frame frame 262, such that at least a portion 294 of the peripheral shell supports a portion 296 of the membrane support structure 286, as shown in FIG. . In other words, the peripheral shell of the feed frame can lock the membrane support structure in place and act as a stopper for the support structure. The feed frame support plane can have any suitable orientation relative to the feed frame plane 300. For example, the feeding frame support plane may be perpendicular to the feeding frame plane, as shown in FIG. 14. Alternatively, the feeding frame support plane may intersect but not perpendicular to the feeding frame plane 300.

進料框架輸入管道可形成於進料框架周邊殼層上及/或經組態以自輸入通口接收混合氣流的至少一部分。進料框架輸出管道270可形成於進料框架周邊殼層上及/或經組態以接收混合氣流之剩餘在氫氣選擇性膜206之進料側210上的剩餘部分。進料框架開放區272可安置於進料框架輸入管道與輸出管道之間。進料框架周邊殼層266可包括複數個凹槽或通道（圖中未示），從而以流體方式連接輸入管道及輸出管道與進料框架開放區。通道可經由任何合適方法形成於周邊殼層上，及/或可具有任何合適定向，諸如可在進料框架開放區260上引入混合的成角度定向。The feed frame input pipe may be formed on the peripheral shell of the feed frame and/or configured to receive at least a part of the mixed gas flow from the input port. The feed frame output pipe 270 may be formed on the peripheral shell of the feed frame and/or configured to receive the remaining portion of the mixed gas flow on the feed side 210 of the hydrogen selective membrane 206. The feed frame open area 272 may be disposed between the feed frame input pipe and the output pipe. The peripheral shell 266 of the feed frame may include a plurality of grooves or channels (not shown in the figure) to fluidly connect the input pipe and the output pipe with the open area of the feed frame. The channels can be formed on the peripheral shell via any suitable method, and/or can have any suitable orientation, such as an angled orientation that can introduce mixing on the feed frame open area 260.

第一進料框架支撐部件、第二進料框架支撐部件及/或第三進料框架支撐部件可包括經組態以支撐至少一個氫氣選擇性膜之第一部分、第二部分及/或第三部分的任何合適結構，及/或可鏡像其他框架之第一支撐部件、第二支撐部件及/或第三支撐部件，如上文所論述。另外，第一進料框架支撐部件、第二進料框架支撐部件及/或第三進料框架支撐部件可包括任何合適結構，其經組態以隨著混合氣流流過輸入管道與輸出管道之間的進料框架開放區而改變混合氣流之至少部分的流動方向。第一進料框架支撐部件及/或第二進料框架支撐部件亦可經組態以在進料框架開放區中促成紊流或混合。舉例而言，在無第一進料框架支撐部件及/或第二進料框架支撐部件情況下，混合氣流之越過輸入管道與輸出管道之間的進料框架開放區的至少部分之流動可在至少第一方向（圖中未示）上移動。第一進料框架膜支撐結構及/或第二進料框架膜支撐結構可經組態以將混合氣流之至少部分的流動自至少第一方向改變至不同於第一方向的第二方向（圖中未示）。The first feed frame support member, the second feed frame support member, and/or the third feed frame support member may include a first portion, a second portion, and/or a third portion configured to support at least one hydrogen selective membrane Part of any suitable structure, and/or may mirror the first support member, second support member, and/or third support member of other frames, as discussed above. In addition, the first feed frame support member, the second feed frame support member, and/or the third feed frame support member may include any suitable structure that is configured to flow through the input pipe and the output pipe along with the mixed air flow. The open area of the feed frame changes the flow direction of at least part of the mixed gas flow. The first feed frame support member and/or the second feed frame support member may also be configured to promote turbulence or mixing in the open area of the feed frame. For example, in the absence of the first feed frame support member and/or the second feed frame support member, at least part of the flow of the mixed gas flow across the open area of the feed frame between the input pipe and the output pipe can be Move up at least in the first direction (not shown in the figure). The first feed frame membrane support structure and/or the second feed frame membrane support structure can be configured to change at least part of the flow of the mixed gas flow from at least a first direction to a second direction different from the first direction (Figure Not shown in).

第一進料框架支撐部件、第二進料框架支撐部件及/或第三進料框架支撐部件可例如呈附接至進料框架周邊殼層及/或形成有進料框架周邊殼層的至少一個進料框架突出部或指狀物302的形式。進料框架突出部可在任何合適方向上自周邊殼層延伸。舉例而言，進料框架突出部可在一方向上自進料框架周邊殼層延伸，該方向大體上垂直（及/或大體上平行）於混合氣流之至少部分自輸入管道朝向進料框架開放區流動的方向。舉例而言，若混合氣流自輸入管道朝向進料框架開放區之流動大體上係在水平方向上，則進料框架突出部可大體在垂直方向及/或水平方向上自進料框架周邊殼層延伸。The first feed frame support member, the second feed frame support member and/or the third feed frame support member may, for example, be attached to the peripheral shell of the feed frame and/or formed with at least the peripheral shell of the feed frame A feed frame in the form of protrusions or fingers 302. The feed frame protrusions may extend from the peripheral shell in any suitable direction. For example, the feed frame protrusions may extend from the peripheral shell of the feed frame in a direction that is substantially perpendicular (and/or substantially parallel) to at least part of the mixed gas flow from the inlet pipe toward the open area of the feed frame The direction of flow. For example, if the flow of the mixed air flow from the input pipe toward the open area of the feed frame is substantially in the horizontal direction, the protrusion of the feed frame may be substantially vertical and/or horizontal from the surrounding shell of the feed frame extend.

滲透物框架262可經定位，使得至少一個箔微孔篩網總成安置於第一端框架及第二端框架中之一者與滲透物框架之間或兩個箔微孔篩網總成之間。滲透物框架可包括滲透物框架周邊殼層304、滲透物框架輸出管道306、滲透物框架開放區308及膜支撐結構286，如圖15中所示。The permeate frame 262 may be positioned such that at least one foil microporous screen assembly is placed between one of the first end frame and the second end frame and the permeate frame or between the two foil microporous screen assemblies between. The permeate frame may include a permeate frame peripheral shell 304, a permeate frame output pipe 306, a permeate frame open area 308, and a membrane support structure 286, as shown in FIG. 15.

滲透物框架周邊殼層可包括任何合適結構。舉例而言，滲透物框架周邊殼層可包括第一區段或第一周邊殼層310及第二區段或第二周邊殼層312，如圖14中所示。第一區段及第二區段可為周邊殼層之第一半及第二半，或可為該周邊殼層的任何合適部分。另外，第一區段及/或第二區段可包括彼此處於任何合適關係諸如自彼此偏移的通道或凹槽（圖中未示）。第一區段310及第二區段312可經由任何合適方法結合以在彼等區段之間形成氣密密封。舉例而言，滲透物框架密封墊314可用於彼等區段之間。滲透物框架密封墊可經組態，使得當滲透物框架262緊固至第一端框架及第二端框架時，滲透物框架周邊殼層之厚度316與膜支撐結構之厚度318匹配或實質上匹配（相同或實質上相同），如圖14中所示且下文進一步論述。The peripheral shell of the permeate frame may include any suitable structure. For example, the permeate frame peripheral shell may include a first section or first peripheral shell 310 and a second section or second peripheral shell 312, as shown in FIG. 14. The first section and the second section may be the first and second halves of the peripheral shell, or may be any suitable parts of the peripheral shell. In addition, the first section and/or the second section may include channels or grooves (not shown in the figure) that are in any suitable relationship with each other, such as offset from each other. The first section 310 and the second section 312 may be combined via any suitable method to form an airtight seal between them. For example, permeate frame gaskets 314 can be used between these sections. The permeate frame gasket can be configured so that when the permeate frame 262 is fastened to the first end frame and the second end frame, the thickness 316 of the peripheral shell of the permeate frame matches or substantially matches the thickness 318 of the membrane support structure Matching (the same or substantially the same), as shown in Figure 14 and discussed further below.

替代地，第一區段及第二區段可熔合在一起，或成層金屬可用以結合第一區段與第二區段，如美國專利申請案公開案第2013/0011301號中所描述。該案之全部揭示內容出於所有目的特此以引用之方式併入。Alternatively, the first section and the second section may be fused together, or a layered metal may be used to join the first section and the second section, as described in US Patent Application Publication No. 2013/0011301. The entire disclosure of the case is hereby incorporated by reference for all purposes.

在一些實施例中，滲透物框架周邊殼層304可包括第一區段320、第二區段322及安置於該第一區段與該第二區段之間的第三區段324，如圖16中所示。彼等區段可為周邊殼層之第一區段、第二區段及第三區段，或可為該周邊殼層的任何合適部分。另外，第一區段、第二區段及/或第三區段可包括彼此處於任何合適關係諸如自彼此偏移的通道或凹槽（圖中未示）。請注意，圖16之組件已出於說明之目的予以誇示且可能不反映彼等組件之相對尺寸。In some embodiments, the permeate frame peripheral shell 304 may include a first section 320, a second section 322, and a third section 324 disposed between the first section and the second section, such as Shown in Figure 16. These sections may be the first section, the second section and the third section of the peripheral shell, or may be any suitable part of the peripheral shell. In addition, the first section, the second section, and/or the third section may include channels or grooves (not shown) that are in any suitable relationship with each other, such as offset from each other. Please note that the components in FIG. 16 have been exaggerated for illustrative purposes and may not reflect the relative sizes of their components.

第一區段320、第二區段322及第三區段324可經由任何合適方法結合以在彼等區段之間形成氣密密封。舉例而言，滲透物框架密封墊326可用於彼等區段之間。滲透物框架密封墊可經組態，使得當滲透物框架262緊固至第一端框架及第二端框架時，滲透物框架周邊殼層之厚度316與膜支撐結構之厚度318匹配或實質上匹配（與該厚度相同或實質上相同），如圖14中所示。替代地，第一區段、第二區段及/或第三區段可經熔合在一起，或成層金屬可用以結合第一區段、第二區段及/或第三區段，如美國專利申請公開案第2013/0011301號中所描述。該案之全部揭示內容出於所有目的特此以引用之方式併入。The first section 320, the second section 322, and the third section 324 may be combined via any suitable method to form an airtight seal between them. For example, permeate frame gaskets 326 can be used between these sections. The permeate frame gasket can be configured so that when the permeate frame 262 is fastened to the first end frame and the second end frame, the thickness 316 of the peripheral shell of the permeate frame matches or substantially matches the thickness 318 of the membrane support structure Matching (same or substantially the same thickness as this), as shown in Figure 14. Alternatively, the first section, the second section and/or the third section may be fused together, or the layered metal may be used to join the first section, the second section and/or the third section, as in the United States Patent Application Publication No. 2013/0011301. The entire disclosure of the case is hereby incorporated by reference for all purposes.

輸出管道306可形成於滲透物框架周邊殼層282上及/或經組態以自膜支撐結構286、滲透物框架開放區308及/或氫氣選擇性膜接收滲透物流。周邊殼層282可包括複數個凹槽或通道（圖中未示），從而以流體方式連接輸出管道284與滲透物框架開放區及/或膜支撐結構。通道可經由任何合適方法形成於周邊殼層282上，及/或可具有任何合適定向，諸如成角度定向。The output pipe 306 may be formed on the permeate frame peripheral shell 282 and/or be configured to receive the permeate stream from the membrane support structure 286, the permeate frame open area 308, and/or the hydrogen selective membrane. The peripheral shell 282 may include a plurality of grooves or channels (not shown in the figure) to fluidly connect the output pipe 284 with the open area of the permeate frame and/or the membrane support structure. The channels may be formed on the peripheral shell 282 via any suitable method, and/or may have any suitable orientation, such as an angular orientation.

膜支撐結構286可包括經組態以支撐至少一個箔微孔篩網總成諸如箔微孔篩網總成之第一部分、第二部分、第三部分及/或其他部分的任何合適結構。在一些實施例中，膜支撐結構可包括類似於其他框架中之一或多者的第一支撐部件、第二支撐部件及/或第三支撐部件（圖中未示）。替代地，膜支撐結構288可包括一或多個膜支撐板328，如圖14中所示。膜支撐板可橫跨開放區之任何合適部分，諸如至少開放區的相當大部分。另外，膜支撐板可為實心、平坦或平面的，不含穿孔或孔洞（或無穿孔或孔洞）的，不含凸塊及/或凸出部（或無凸塊及/或凸出部），及/或可為不可壓縮的（或實質上不可壓縮的）。此外，膜支撐板可能並不附接至滲透物框架周邊殼層（或不含至滲透物框架周邊殼層的附接）。換言之，當進料框架緊固至第一端板及第二端板時，僅進料框架可在滲透物框架周邊殼層之開放區內將膜支撐結構鎖定於適當位置。The membrane support structure 286 may include any suitable structure configured to support at least one foil microporous screen assembly, such as the first portion, second portion, third portion, and/or other portions of the foil microporous screen assembly. In some embodiments, the membrane support structure may include a first support member, a second support member, and/or a third support member (not shown in the figure) similar to one or more of other frames. Alternatively, the membrane support structure 288 may include one or more membrane support plates 328, as shown in FIG. 14. The membrane support plate may span any suitable part of the open area, such as at least a substantial part of the open area. In addition, the membrane support plate can be solid, flat or flat, without perforations or holes (or without perforations or holes), without bumps and/or protrusions (or without bumps and/or protrusions) , And/or may be incompressible (or substantially incompressible). In addition, the membrane support plate may not be attached to the permeate frame peripheral shell (or does not contain attachment to the permeate frame peripheral shell). In other words, when the feed frame is fastened to the first end plate and the second end plate, only the feed frame can lock the membrane support structure in place in the open area of the permeate frame peripheral shell.

此外，膜支撐板可由諸如不鏽鋼之任何合適材料製成。In addition, the membrane support plate can be made of any suitable material such as stainless steel.

膜支撐板328可包括第一面（或表面）330及第二相對面（或相對表面）332，如圖14中所展示。膜支撐板中之任一面或兩面可排除或不含任何或全部凹槽、凸塊、凸出部等，如圖17中所示。在一些實施例中，膜支撐板328之任一面或兩個面可包括複數個微凹槽334，如圖18中所示，該等微凹槽可包括提供用於滲透物流之一或多個流徑的任何合適結構。當膜支撐板328包括表面微凹槽時，彼等板可被稱作「表面凹槽化板」。微凹槽可具有任何合適定向，諸如彼此平行。另外，微凹槽334可自膜支撐板之第一邊緣336延伸至第二相對邊緣338，如圖18中所示（或自第三邊緣延伸至第四相對邊緣）。替代地，微凹槽中之一或多者可自第一邊緣延伸至第二邊緣之前，自第二邊緣延伸至第一邊緣之前，在第一邊緣與第二邊緣之間延伸但不包括第一邊緣及第二邊緣等。此外，微凹槽334可係僅在第一面上、僅第二面上或第一面及第二面兩者上。此外，微凹槽可沿著膜支撐板之整個長度或寬度被包括（如圖18中所示），或可係沿著長度或寬度之任何合適部分，諸如長度或寬度的25%、50%或75%。The membrane support plate 328 may include a first surface (or surface) 330 and a second opposite surface (or opposite surface) 332, as shown in FIG. 14. Either or both sides of the membrane support plate can exclude or contain any or all grooves, bumps, protrusions, etc., as shown in FIG. 17. In some embodiments, either side or both sides of the membrane support plate 328 may include a plurality of micro grooves 334, as shown in FIG. 18, the micro grooves may include one or more Any suitable structure of the flow path. When the film support plate 328 includes surface microgrooves, these plates may be referred to as "surface grooved plates." The microgrooves can have any suitable orientation, such as parallel to each other. In addition, the micro-grooves 334 may extend from the first edge 336 to the second opposite edge 338 of the film support plate, as shown in FIG. 18 (or extend from the third edge to the fourth opposite edge). Alternatively, one or more of the microgrooves may extend from the first edge to before the second edge, from the second edge to before the first edge, and extend between the first edge and the second edge but not including the first edge. One edge and second edge, etc. In addition, the micro-grooves 334 may be on the first surface only, the second surface only, or both the first surface and the second surface. In addition, the microgrooves can be included along the entire length or width of the film support plate (as shown in Figure 18), or can be along any suitable portion of the length or width, such as 25%, 50% of the length or width Or 75%.

微凹槽334可具有任何合適尺寸。舉例而言，微凹槽可具有介於0.005吋與0.020吋（或較佳地介於0.010吋與0.012吋之間）的寬度，及介於0.003吋至0.020之間（或較佳地0.008吋至0.012吋）的深度。微凹槽可以諸如0.003至0.020吋（或較佳地0.003至0.007吋）之任何合適距離隔開。微凹槽可藉由任何合適方法諸如化學蝕刻、機械加工及/或類似者來製造。The microgrooves 334 may have any suitable size. For example, the micro grooves may have a width between 0.005 inches and 0.020 inches (or preferably between 0.010 inches and 0.012 inches), and between 0.003 inches and 0.020 inches (or preferably 0.008 inches). To 0.012 inch) depth. The microgrooves can be separated by any suitable distance, such as 0.003 to 0.020 inches (or preferably 0.003 to 0.007 inches). The microgrooves can be manufactured by any suitable method such as chemical etching, machining and/or the like.

在一些實施例中，膜支撐結構286可包括具有相對面（具具有微凹槽334之任一面或兩個面）的單一支撐板339，如圖14中所示。替代地，膜支撐結構可包括第一膜支撐板340及第二膜支撐板342，如圖14中之虛線所展示。第一膜支撐板可包括第一面344及第二相對面346。第二膜支撐板342可包括第一面348及第二相對面349。第一膜支撐板及/或第二膜支撐板之第一面可包括或不包括微凹槽334。另外，第一膜支撐板及第二膜支撐板之第二面可面向彼此。換言之，第一膜支撐板及第二膜支撐板可堆疊於膜支撐結構中，使得第一膜支撐板之第二面面向第二膜支撐板之第二面，及/或反之亦然。在一些實施例中，第一膜支撐板之第二面可接觸第二膜支撐板的第二面。In some embodiments, the membrane support structure 286 may include a single support plate 339 having opposing surfaces (with either or two surfaces having micro-grooves 334), as shown in FIG. 14. Alternatively, the membrane support structure may include a first membrane support plate 340 and a second membrane support plate 342, as shown by the dashed line in FIG. 14. The first membrane supporting plate may include a first surface 344 and a second opposite surface 346. The second membrane supporting plate 342 may include a first surface 348 and a second opposite surface 349. The first surface of the first membrane support plate and/or the second membrane support plate may or may not include the micro grooves 334. In addition, the second surfaces of the first membrane support plate and the second membrane support plate may face each other. In other words, the first membrane support plate and the second membrane support plate can be stacked in the membrane support structure such that the second surface of the first membrane support plate faces the second surface of the second membrane support plate, and/or vice versa. In some embodiments, the second surface of the first membrane support plate may contact the second surface of the second membrane support plate.

在一些實施例中，膜支撐結構可包括第三膜支撐板350，其可安置於第一膜支撐板與第二膜支撐板之間，如圖19中所示。請注意，圖19之組件已出於說明之目的予以誇示且可能不反映彼等組件之相對尺寸。膜支撐結構可包括第一膜支撐板、第二膜支撐板及第三膜支撐板，其經堆疊使得第三膜支撐板接觸第一膜支撐板及/或第二膜支撐板的第二面。當第三膜支撐板安置於第一膜支撐板與第二膜支撐板之間時，第三膜支撐板有時可被稱作「中心板」。第三膜支撐板可在其面中之任一者或兩者上不含微凹槽。第一膜支撐板、第二膜支撐板及第三膜支撐板可具有任何合適尺寸。舉例而言，第一膜支撐板及第二膜支撐板可為0.060吋，而第三膜支撐板可為0.105吋。In some embodiments, the membrane support structure may include a third membrane support plate 350, which may be disposed between the first membrane support plate and the second membrane support plate, as shown in FIG. 19. Please note that the components of FIG. 19 have been exaggerated for illustrative purposes and may not reflect the relative sizes of their components. The membrane supporting structure may include a first membrane supporting plate, a second membrane supporting plate, and a third membrane supporting plate, which are stacked such that the third membrane supporting plate contacts the second surface of the first membrane supporting plate and/or the second membrane supporting plate . When the third membrane support plate is placed between the first membrane support plate and the second membrane support plate, the third membrane support plate may sometimes be referred to as a "center plate". The third membrane support plate may not contain micro-grooves on either or both of its faces. The first membrane support plate, the second membrane support plate, and the third membrane support plate may have any suitable size. For example, the first membrane support plate and the second membrane support plate may be 0.060 inches, and the third membrane support plate may be 0.105 inches.

如上文所論述，滲透物框架密封墊314及/或326可經組態，使得當滲透物框架緊固及/或壓縮至第一端框架及第二端框架時，滲透物框架之厚度與膜支撐結構的厚度匹配。彼等密封墊可在壓縮之前產生大於膜支撐結構之厚度的厚度。當可撓性石墨密封墊在15至50%之壓縮限值情況下用於滲透物框架密封墊時，則滲透物框架密封墊在壓縮之前可具有一厚度，該厚度導致係在彼等壓縮限值內的所要最終厚度。當滲透物框架包括此類密封墊時，滲透物框架有時可被稱作「自調整滲透物框架」。當自調整滲透物框架在裝配期間藉由經由進料框架進行壓縮（諸如，在1000至2000 psi壓縮）下壓縮以在進料框架與氫氣選擇性膜之間形成氣密密封時，進料框架與滲透物框架相抵之壓縮力在進料框架接觸氫氣選擇性膜、微孔篩網結構及膜支撐結構時被阻止，氫氣選擇性膜、微孔篩網結構及膜支撐結構可一起形成組件之大體不可壓縮群組或堆疊。As discussed above, the permeate frame gaskets 314 and/or 326 can be configured such that when the permeate frame is fastened and/or compressed to the first end frame and the second end frame, the thickness of the permeate frame and the membrane The thickness of the support structure is matched. These gaskets can produce a thickness greater than the thickness of the membrane support structure before compression. When flexible graphite gaskets are used for permeate frame gaskets under the compression limit of 15 to 50%, the permeate frame gaskets can have a thickness before compression, which results in being within their compression limit. The desired final thickness within the value. When the permeate frame includes such a gasket, the permeate frame may sometimes be referred to as a "self-adjusting permeate frame." When the self-adjusting permeate frame is compressed through the feed frame during assembly (such as compression at 1000 to 2000 psi) to form an airtight seal between the feed frame and the hydrogen selective membrane, the feed frame The compressive force against the permeate frame is prevented when the feed frame contacts the hydrogen selective membrane, the microporous screen structure and the membrane support structure. The hydrogen selective membrane, the microporous screen structure and the membrane support structure can together form the component Generally not compressible groups or stacks.

作為一實例，若膜支撐結構具有0.257吋之厚度，則滲透物框架理想地將具有準確為或為約0.257吋的厚度。當滲透物框架周邊殼層包括各自例如為0.120吋厚之兩個區段時，則滲透物框架密封墊應經組態以在壓縮之後為0.017吋厚。舉例而言，在壓縮之前為0.030吋厚之滲透物框架密封墊在壓縮之後可在其壓縮限值內壓縮至0.017吋，此舉將產生與膜支撐結構厚度匹配的滲透物框架厚度。儘管膜支撐結構286展示為包括膜支撐板328，但膜支撐結構可包括金屬絲網及/或穿孔金屬薄片（圖中未示）。As an example, if the membrane support structure has a thickness of 0.257 inches, the permeate frame ideally will have a thickness of exactly or about 0.257 inches. When the peripheral shell of the permeate frame includes two sections each, for example, 0.120 inches thick, the permeate frame gasket should be configured to be 0.017 inches thick after compression. For example, a permeate frame gasket that was 0.030 inches thick before compression can be compressed to 0.017 inches within its compression limit after compression, which will produce a permeate frame thickness that matches the thickness of the membrane support structure. Although the membrane support structure 286 is shown as including a membrane support plate 328, the membrane support structure may include wire mesh and/or perforated metal foil (not shown).

框架224亦可包括密封墊或密封墊框架264，如圖4中所示。密封墊框架可包括任何合適結構，其經組態以在其他框架之間，諸如在第一端板200及第二端板202與進料框架260之間、在框架260與箔微孔篩網總成205之間、在箔微孔篩網總成與滲透物框架262之間提供流體密封界面。用於密封墊框架264之合適密封墊的實例為可撓性石墨密封墊。合適的密封墊材料之另一實例為藉由Flexitallic LP （德克薩斯迪爾派克（Deer Park, Texas））出售的THERMICULITE®866。儘管框架224展示為包括兩個進料框架260及單一滲透物框架262，但框架可包括任何合適數目個進料框架及滲透物框架。另外，儘管氫氣淨化裝置196展示為包括兩個氫氣選擇性膜206，但裝置可包括任何合適數目個彼等膜。The frame 224 may also include a gasket or gasket frame 264, as shown in FIG. 4. The gasket frame may include any suitable structure that is configured to be between other frames, such as between the first end plate 200 and the second end plate 202 and the feed frame 260, between the frame 260 and the foil microporous screen A fluid tight interface is provided between the assemblies 205, between the foil microporous mesh assembly and the permeate frame 262. An example of a suitable gasket for the gasket frame 264 is a flexible graphite gasket. Another example of a suitable gasket material is THERMICULITE®866 sold by Flexitallic LP (Deer Park, Texas). Although the frame 224 is shown as including two feed frames 260 and a single permeate frame 262, the frame may include any suitable number of feed frames and permeate frames. In addition, although the hydrogen purification device 196 is shown as including two hydrogen selective membranes 206, the device may include any suitable number of these membranes.

儘管框架224中之一或多者展示為包括僅在垂直方向上或僅在水平方向延伸之突出部，但框架可另外或替代地包括在水平、垂直及/或諸如對角線之其他合適方向等上延伸的突出部。另外，儘管一或多個框架224展示為包括三個突出部，但框架可包括一個、兩個、四個、五個或多於五個突出部。此外，儘管一或多個框架224展示為包括在第一支撐平面、第二支撐平面及/或第三支撐平面內共面的突出部，但框架可另外或替代地包括在第四支撐平面、第五支撐平面或更多支撐平面內共面的突出部。Although one or more of the frames 224 are shown as including protrusions that extend only in the vertical direction or only in the horizontal direction, the frames may additionally or alternatively include horizontal, vertical, and/or other suitable directions such as diagonal Wait for the extended protrusion. Additionally, although the one or more frames 224 are shown as including three protrusions, the frames may include one, two, four, five, or more than five protrusions. In addition, although one or more frames 224 are shown as including protrusions that are coplanar in the first support plane, the second support plane, and/or the third support plane, the frames may additionally or alternatively be included in the fourth support plane, Coplanar protrusions in the fifth supporting plane or more supporting planes.

氫氣淨化裝置144之另一實例在圖20中通常以396指示。除非具體地排除，否則氫氣淨化裝置396可包括本發明中描述之其他氫氣淨化裝置之一或多個組件及/或淨化區。Another example of the hydrogen purification device 144 is generally indicated by 396 in FIG. 20. Unless specifically excluded, the hydrogen purification device 396 may include one or more components and/or purification regions of other hydrogen purification devices described in the present invention.

氫氣淨化裝置396在許多方面類似於氫氣淨化裝置196但具有不同形狀的框架、無支撐部件、不同化箔微孔篩網總成及較少密封墊框架，如下文進一步描述。氫氣淨化裝置396之組件或部分對應於氫氣淨化裝置196之組件或部分，且圖20中藉由具有通用形式「3XX」而非「1XX」及「4XX」並非「2XX」的附圖標號來標記。因此，特徵398、400、402、404、405、406、408、424、426、434、436、438、440、460、462、464等可與氫氣淨化裝置196中之其各別對應物即特徵198、200、202、204、205、206、208、224、226、234、236、238、240、260、262、264等相同或大體上相同。The hydrogen purification device 396 is similar to the hydrogen purification device 196 in many respects but has a differently shaped frame, unsupported components, a different foil microporous screen assembly, and a less gasket frame, as described further below. The components or parts of the hydrogen purification device 396 correspond to the components or parts of the hydrogen purification device 196, and are marked by reference numerals having the general form "3XX" instead of "1XX" and "4XX" instead of "2XX" in FIG. 20 . Therefore, the features 398, 400, 402, 404, 405, 406, 408, 424, 426, 434, 436, 438, 440, 460, 462, 464, etc. can be compared with their respective counterparts in the hydrogen purification device 196, that is, features 198, 200, 202, 204, 205, 206, 208, 224, 226, 234, 236, 238, 240, 260, 262, 264, etc. are the same or substantially the same.

氫氣淨化裝置396可包括殼層或殼體398，其可包括第一端板或端框架400及第二端板或端框架402。第一端板及第二端板可經組態以緊固及/或壓縮在一起以界定具有一內部隔室404之密封壓力容器，氫氣分離區於該內部隔室中被支援。The hydrogen purification device 396 may include a shell or housing 398, which may include a first end plate or end frame 400 and a second end plate or end frame 402. The first end plate and the second end plate can be configured to be fastened and/or compressed together to define a sealed pressure vessel with an internal compartment 404 in which the hydrogen separation zone is supported.

氫氣淨化裝置396亦可包括至少一個箔微孔篩網總成405，其可安置於第一端板與第二端板之間及/或緊固至該第一端板及該第二端板。箔微孔篩網總成可包括至少一個氫氣選擇性膜406及至少一個微孔篩網結構408。氫氣選擇性膜中之一或多者可以冶金方式接合至微孔篩網結構408。舉例而言，氫氣選擇性膜406中之一或多者可擴散接合至微孔篩網結構以在膜與微孔篩網結構之間形成固態擴散接合件。箔微孔篩網總成405經設定大小以適配於滲透物框架之開放區，且因此相較於或相對於箔微孔篩網總成205而言長度及寬度較小。The hydrogen purification device 396 can also include at least one foil microporous screen assembly 405, which can be arranged between the first end plate and the second end plate and/or fastened to the first end plate and the second end plate . The foil microporous screen assembly may include at least one hydrogen selective membrane 406 and at least one microporous screen structure 408. One or more of the hydrogen selective membranes may be metallurgically joined to the microporous mesh structure 408. For example, one or more of the hydrogen selective membranes 406 may be diffusion bonded to the microporous mesh structure to form a solid diffusion bond between the membrane and the microporous mesh structure. The foil microporous screen assembly 405 is sized to fit in the open area of the permeate frame, and therefore has a smaller length and width compared to or relative to the foil microporous screen assembly 205.

氫氣淨化裝置396亦可包括複數個板或框架424，其安置於第一端框架及/或第二框架之間且緊固至第一端框架及/或第二端框架。框架424可包括周邊殼層426。周邊殼層可界定開放區430。另外，周邊殼層426可包括第一相對側434及第二相對側436，以及第三相對側438及第四相對側440。不同於氫氣淨化裝置196之框架224，框架424不包括任何支撐部件。The hydrogen purification device 396 may also include a plurality of plates or frames 424 arranged between the first end frame and/or the second frame and fastened to the first end frame and/or the second end frame. The frame 424 may include a peripheral shell 426. The peripheral shell layer may define an open area 430. In addition, the peripheral shell 426 may include a first opposite side 434 and a second opposite side 436, and a third opposite side 438 and a fourth opposite side 440. Unlike the frame 224 of the hydrogen purification device 196, the frame 424 does not include any supporting components.

框架424可包括至少一個進料框架460、至少一個滲透物框架462及複數個密封墊或密封墊框架464。進料框架460可安置於第一端框架及第二端框架中之一者與至少一個箔微孔篩網總成405之間，或兩個箔微孔篩網總成405之間。進料框架可包括與進料框架260至少實質上類似的組件，諸如進料框架周邊殼層、進料框架輸入管道、進料框架輸出管道及/或進料框架開放區。The frame 424 may include at least one feed frame 460, at least one permeate frame 462, and a plurality of gaskets or gasket frames 464. The feed frame 460 may be disposed between one of the first end frame and the second end frame and the at least one foil microporous screen assembly 405, or between two foil microporous screen assemblies 405. The feed frame may include components that are at least substantially similar to the feed frame 260, such as a peripheral shell of the feed frame, a feed frame input pipe, a feed frame output pipe, and/or a feed frame open area.

滲透物框架462可經定位，使得至少一個箔微孔篩網總成安置於第一端框架及第二端框架中之一者與滲透物框架之間或兩個箔微孔篩網總成之間。滲透物框架可包括與滲透物框架262至少實質上類似的組件，諸如滲透物框架周邊殼層、滲透物框架輸出管道、滲透物框架開放區及/或膜支撐結構。The permeate frame 462 may be positioned such that at least one foil microporous screen assembly is placed between one of the first end frame and the second end frame and the permeate frame or between the two foil microporous screen assemblies between. The permeate frame may include components that are at least substantially similar to the permeate frame 262, such as a permeate frame peripheral shell, a permeate frame output duct, a permeate frame open area, and/or a membrane support structure.

框架424亦可包括密封墊或密封墊框架464。密封墊框架可包括經組態以在其他框架之間，諸如在第一端板400及第二端板402與進料框架460之間及/或進料框架460與箔微孔篩網總成405之間提供流體密封界面的任何合適結構。不同於氫氣淨化裝置196，氫氣淨化裝置396不包括箔微孔篩網總成與滲透物框架462之間的密封墊框架464。類似於氫氣淨化裝置196，進料框架及密封墊框架之寬度大於滲透物框架之寬度（或進料框架及密封墊框架之開放區小於滲透物框架之開放區），使得額外寬度覆蓋箔微孔篩網總成之邊緣以使自進料側至滲透側或自滲透側至進料側之洩漏消除或最小化（參見例如圖14，該圖展示進料框架及密封墊框架之額外寬度如何覆蓋箔微孔篩網總成之邊緣）。在一些實施例中，額外寬度對應於箔微孔篩網總成之微孔篩網結構之周邊（非穿孔）部分的寬度。The frame 424 may also include a gasket or gasket frame 464. The gasket frame may include an assembly configured to be between other frames, such as between the first end plate 400 and the second end plate 402 and the feed frame 460 and/or the feed frame 460 and the foil microporous screen assembly Any suitable structure that provides a fluid-tight interface between 405. Unlike the hydrogen purification device 196, the hydrogen purification device 396 does not include a gasket frame 464 between the foil microporous screen assembly and the permeate frame 462. Similar to the hydrogen purification device 196, the width of the feed frame and gasket frame is greater than the width of the permeate frame (or the open area of the feed frame and gasket frame is smaller than the open area of the permeate frame), so that the extra width covers the foil pore The edge of the screen assembly to eliminate or minimize leakage from the feed side to the permeate side or from the permeate side to the feed side (see, for example, Figure 14, which shows how the additional width of the feed frame and gasket frame covers The edge of the foil microporous screen assembly). In some embodiments, the additional width corresponds to the width of the peripheral (non-perforated) portion of the microporous screen structure of the foil microporous screen assembly.

本發明之氫氣淨化裝置及/或其組件（例如，箔微孔篩網總成）可包括以下（第[0107]至[0188]段）各特徵中之一個或多個特徵：The hydrogen purification device of the present invention and/or its components (for example, foil microporous screen assembly) may include one or more of the following (paragraphs [0107] to [0188]):

第一端框架及第二端框架，其包括一輸入通口，該輸入通口經組態以接收含有氫氣及其他氣體之一混合氣流。The first end frame and the second end frame include an input port configured to receive a mixed gas flow containing hydrogen and other gases.

第一端框架及第二端框架包括一輸出通口，該輸出通口經組態以接收一滲透物流，該滲透物流相較於該混合氣流含有一較大濃度之氫氣及一較低濃度之該等其他氣體中的至少一者。The first end frame and the second end frame include an output port configured to receive a permeate stream that contains a higher concentration of hydrogen and a lower concentration of hydrogen than the mixed gas stream. At least one of these other gases.

第一端框架及第二端框架包括一副產物通口，該副產物通口經組態以接收含有其他氣體之至少一相當大部分的一副產物流。The first end frame and the second end frame include a by-product port configured to receive a by-product stream containing at least a substantial portion of other gases.

至少一個箔微孔篩網總成，其安置於該第一端框架與該第二端框架之間且緊固至該第一端框架及該第二端框架。At least one foil microporous screen assembly is arranged between the first end frame and the second end frame and fastened to the first end frame and the second end frame.

至少一個氫氣選擇性膜，其安置於該第一端框架與該第二端框架之間且緊固至該第一端框架及該第二端框架。At least one hydrogen selective membrane is arranged between the first end frame and the second end frame and fastened to the first end frame and the second end frame.

至少一個氫氣選擇性膜，其具有一進料側及一滲透側，滲透物流之至少部分由混合氣流的自該進料側傳遞至該滲透側之一部分形成，其中混合氣流之剩餘在該進料側上之剩餘部分形成副產物流的至少部分。At least one hydrogen selective membrane, which has a feed side and a permeate side, at least part of the permeate stream is formed by a part of the mixed gas flow transferred from the feed side to the permeate side, wherein the remainder of the mixed gas stream is in the feed The remaining part on the side forms at least part of the byproduct stream.

至少一個氫氣選擇性膜，其以冶金方式接合至至少一個微孔篩網結構。At least one hydrogen selective membrane is metallurgically joined to at least one microporous mesh structure.

至少一個氫氣選擇性膜之滲透側以冶金方式接合至該至少一個微孔篩網結構。The permeate side of at least one hydrogen selective membrane is metallurgically joined to the at least one microporous mesh structure.

至少一個氫氣選擇性膜，其擴散接合至該至少一個微孔篩網結構。At least one hydrogen selective membrane is diffusion bonded to the at least one microporous mesh structure.

至少一個氫氣選擇性膜之滲透側，其擴散接合至該至少一個微孔篩網結構。The permeate side of at least one hydrogen selective membrane is diffusion bonded to the at least one microporous mesh structure.

至少一個微孔篩網結構，其安置於至少一個氫氣選擇性膜與至少一個滲透物框架之間。At least one microporous mesh structure is arranged between at least one hydrogen selective membrane and at least one permeate frame.

至少一個微孔篩網結構，其經組態以支撐至少一個氫氣選擇性膜。At least one microporous screen structure configured to support at least one hydrogen selective membrane.

至少一個微孔篩網結構包括大體相對表面，其經組態以提供對滲透側之支撐。At least one microporous screen structure includes generally opposed surfaces that are configured to provide support to the permeate side.

至少一個微孔篩網結構包括在相對表面之間延伸的複數個流體通路。The at least one microporous mesh structure includes a plurality of fluid passages extending between opposing surfaces.

至少一個微孔篩網結構，其經設定大小以不接觸至少一個滲透物框架的周邊殼層。At least one microporous mesh structure that is sized so as not to contact the peripheral shell of the at least one permeate frame.

至少一個微孔篩網結構，其經設定大小以在至少一個微孔篩網結構及至少一個滲透物框架緊固至第一端框架及第二端框架時不接觸周邊殼層。The at least one microporous screen structure is sized so as not to contact the peripheral shell when the at least one microporous screen structure and the at least one permeate frame are fastened to the first end frame and the second end frame.

至少一個微孔篩網結構，其包括無孔平面薄片，該無孔平面薄片具有形成複數個流體通路的複數個孔隙。At least one microporous mesh structure includes a non-porous flat sheet with a plurality of pores forming a plurality of fluid passages.

一無孔平面薄片，其包括經組態以提供對滲透側之支撐的大體相對之平面表面。A non-porous planar sheet comprising generally opposed planar surfaces configured to provide support to the permeate side.

一無孔平面薄片，其包括不含孔隙之至少一周邊部分。A non-porous flat sheet, which includes at least one peripheral portion that does not contain pores.

一無孔平面薄片，其包括具有孔隙之兩個或多於兩個離散部分。A non-porous planar sheet comprising two or more discrete parts with pores.

至少一個微孔篩網結構，其包括無孔金屬薄片，該無孔金屬薄片具有形成複數個流體通路的複數個孔隙。At least one microporous mesh structure includes a non-porous metal sheet with a plurality of pores forming a plurality of fluid passages.

界定平面之一無孔金屬薄片，其中該無孔薄片之孔隙包括垂直於平面之軸線。A non-porous metal sheet that defines a plane, wherein the pores of the non-porous sheet include an axis perpendicular to the plane.

該無孔薄片之孔隙為圓形。The pores of the non-porous sheet are round.

該無孔薄片之孔隙為狹長圓。The pores of the non-porous sheet are elongated and round.

該無孔薄片之孔隙為卵形。The pores of the non-porous sheet are oval.

該無孔薄片之孔隙為六邊形。The pores of the non-porous sheet are hexagonal.

一無孔金屬薄片包括不鏽鋼。A non-porous metal sheet includes stainless steel.

一無孔金屬薄片，其包括300系列不鏽鋼。A non-porous sheet metal including 300 series stainless steel.

一無孔金屬薄片，其包括400系列不鏽鋼。A non-porous sheet metal including 400 series stainless steel.

一無孔金屬薄片，其包括具有約0.6wt%至約3.0wt%鋁的不鏽鋼。A non-porous metal sheet including stainless steel with about 0.6 wt% to about 3.0 wt% aluminum.

一無孔金屬薄片，其包括一或多種鎳合金。A non-porous metal sheet, which includes one or more nickel alloys.

一無孔金屬薄片，其包括具有電鍍鎳表面之一或多種鎳合金。A non-porous metal sheet, which includes one or more nickel alloys with an electroplated nickel surface.

一無孔金屬薄片，其包括具有銅之一或多種鎳合金。A non-porous metal sheet including one or more nickel alloys with copper.

一或多個離散部分，其藉由不含孔隙之至少一個邊界部分與鄰接離散部分分隔。One or more discrete parts are separated from adjacent discrete parts by at least one boundary part without voids.

一不同氫氣選擇性膜以冶金方式接合至一離散部分。A different hydrogen selective membrane is metallurgically joined to a discrete part.

一氫氣選擇性膜經設定大小為大於離散部分，使得氫氣選擇性膜之一周邊部分接觸該無孔平面薄片的不包括孔隙之一或多個部分。The size of a hydrogen selective membrane is set to be larger than the discrete parts, so that a peripheral part of the hydrogen selective membrane contacts one or more parts of the non-porous planar sheet that does not include pores.

複數個框架，其安置於第一端框架及第二端框架與至少一個箔微孔篩網總成之間且緊固至該第一端框架及該第二端框架。A plurality of frames are arranged between the first end frame and the second end frame and the at least one foil microporous screen assembly and fastened to the first end frame and the second end frame.

複數個框架包括安置於該至少一個氫氣選擇性膜與第二端框架之間的至少一個滲透物框架。The plurality of frames includes at least one permeate frame disposed between the at least one hydrogen selective membrane and the second end frame.

至少一個滲透物框架，其包括周邊殼層。At least one permeate frame, which includes a peripheral shell.

至少一個滲透物框架，其包括一輸出管道，其形成於周邊殼層上且經組態以自至少一個氫氣選擇性膜接收滲透物流的至少部分。At least one permeate frame including an output pipe formed on the peripheral shell and configured to receive at least part of the permeate stream from at least one hydrogen selective membrane.

至少一個滲透物框架，其包括藉由周邊殼層包圍之一開放區。At least one permeate frame, which includes an open area surrounded by a peripheral shell.

至少一個滲透物框架，其包括至少一個膜支撐結構。At least one permeate frame, which includes at least one membrane support structure.

至少一個膜支撐結構，其橫跨開放區之至少一相當大部分。At least one membrane support structure spans at least a substantial portion of the open area.

至少一個膜支撐結構，其經組態以支撐至少一個氫氣選擇性膜。At least one membrane support structure configured to support at least one hydrogen selective membrane.

至少一個膜支撐結構，其包括單一膜支撐板，單一膜支撐板包括一第一面及與該第一面相對之一第二面。At least one membrane support structure includes a single membrane support plate, and the single membrane support plate includes a first surface and a second surface opposite to the first surface.

第一面及/或第二面具有複數個微凹槽，其經組態以提供用於滲透物流之至少部分之流動通道。The first side and/or the second side have a plurality of micro-grooves, which are configured to provide at least part of the flow channel for the permeate stream.

第一面及第二面不含微凹槽。The first side and the second side do not contain micro-grooves.

至少一個膜支撐結構，其包括第一膜支撐板及第二膜支撐板。At least one membrane support structure, which includes a first membrane support plate and a second membrane support plate.

第一膜支撐板及第二膜支撐板不含穿孔。The first membrane support plate and the second membrane support plate do not contain perforations.

第一膜支撐板及第二膜支撐板板具有第一面，該第一面具有經組態以提供用於滲透物流之至少部分之流動通道的複數個微凹槽。The first membrane support plate and the second membrane support plate have a first surface with a plurality of microgrooves configured to provide at least part of the flow channel for the permeate stream.

第一膜支撐板及第二膜支撐板，其具有與第一面相對之第二面。The first membrane supporting plate and the second membrane supporting plate have a second surface opposite to the first surface.

第一膜支撐板及第二膜支撐板堆疊於至少一個膜支撐結構中。The first membrane support plate and the second membrane support plate are stacked in at least one membrane support structure.

第一膜支撐板及第二膜支撐板，其堆疊於至少一個膜支撐結構中，使得第一膜支撐板之第二面面向第二膜支撐板的第二面。The first membrane supporting plate and the second membrane supporting plate are stacked in at least one membrane supporting structure such that the second surface of the first membrane supporting plate faces the second surface of the second membrane supporting plate.

非可壓縮之第一膜支撐板及第二膜支撐板。Non-compressible first membrane support plate and second membrane support plate.

平坦的第一膜支撐板及第二膜支撐板。Flat first film support plate and second film support plate.

至少一個進料框架，其安置於第一端框架與至少一個氫氣選擇性膜之間。At least one feed frame is arranged between the first end frame and the at least one hydrogen selective membrane.

至少一個進料框架，其包括周邊殼層。At least one feed frame, which includes a peripheral shell.

至少一個進料框架，其包括形成於至少一個進料框架之周邊殼層上的輸入管道。At least one feed frame includes an input pipe formed on the peripheral shell of the at least one feed frame.

至少一個進料框架，其包括經組態以自輸入通口接收混合氣流之至少部分的輸入管道。At least one feed frame including an input pipe configured to receive at least part of the mixed gas flow from the input port.

至少一個進料框架，其包括形成於至少一個進料框架之周邊殼層上的輸出管道。At least one feed frame includes an output pipe formed on the peripheral shell of the at least one feed frame.

至少一個進料框架，其包括輸出管道，該輸出管道經組態以接收混合氣流的剩餘在至少一個氫氣選擇性膜之進料側上的至少部分之剩餘部分。At least one feed frame including an output pipe configured to receive at least a portion of the remaining portion of the mixed gas stream remaining on the feed side of the at least one hydrogen selective membrane.

至少一個進料框架，其包括進料框架開放區，該開放區藉由進料框架之周邊殼層包圍且安置於輸入管道與輸出管道之間。At least one feed frame includes a feed frame open area surrounded by a peripheral shell of the feed frame and arranged between the input pipe and the output pipe.

至少一個進料框架之周邊殼層，其經設定大小，使得至少一個進料框架之周邊殼層支撐至少一個滲透物框架之周邊殼層以及至少一個膜支撐結構的一部分。The peripheral shell of at least one feed frame is sized such that the peripheral shell of at least one feed frame supports the peripheral shell of at least one permeate frame and a part of at least one membrane support structure.

至少一個進料框架之周邊殼層，其經設定大小，使得至少一個進料框架之周邊殼層沿著複數個支撐平面支撐至少一個滲透物框架之周邊殼層及至少一個膜支撐結構的一部分，該複數個支撐平面垂直於複數個框架中每一框架的框架平面。The peripheral shell of at least one feed frame is sized so that the peripheral shell of at least one feed frame supports the peripheral shell of at least one permeate frame and a part of at least one membrane support structure along a plurality of support planes, The plurality of support planes are perpendicular to the frame plane of each of the plurality of frames.

至少一個膜支撐結構，其包括第三膜支撐板。At least one membrane support structure, which includes a third membrane support plate.

第三膜支撐板，其安置於第一膜支撐板與第二膜支撐板之間。The third membrane supporting plate is arranged between the first membrane supporting plate and the second membrane supporting plate.

非可壓縮的第三膜支撐板。Non-compressible third membrane support plate.

平坦的第三膜支撐板。Flat third membrane support plate.

不含穿孔之第三膜支撐板。The third membrane support plate without perforations.

不含微凹槽之第三膜支撐板。The third membrane support plate without microgrooves.

滲透物框架之周邊殼層包括第一周邊殼層及第二周邊殼層。The peripheral shell of the permeate frame includes a first peripheral shell and a second peripheral shell.

滲透物框架之周邊殼層，其包括安置於第一周邊殼層與第二周邊殼層之間的密封墊。The peripheral shell layer of the permeate frame includes a gasket arranged between the first peripheral shell layer and the second peripheral shell layer.

密封墊，其經組態，使得滲透物框架周邊殼層之厚度與膜支撐結構之厚度匹配。The gasket is configured so that the thickness of the peripheral shell of the permeate frame matches the thickness of the membrane support structure.

密封墊，其經組態使得當滲透物框架緊固至第一端框架及第二端框架時，滲透物框架周邊殼層之厚度與膜支撐結構的厚度匹配。The gasket is configured such that when the permeate frame is fastened to the first end frame and the second end frame, the thickness of the peripheral shell of the permeate frame matches the thickness of the membrane support structure.

滲透物框架周邊殼層，其包括第一周邊殼層、第二周邊殼層及第三周邊殼層。The peripheral shell of the permeate frame includes a first peripheral shell, a second peripheral shell, and a third peripheral shell.

滲透物框架周邊殼層，其包括安置於第一周邊殼層與第二周邊殼層之間的密封墊。A peripheral shell of the permeate frame includes a gasket disposed between the first peripheral shell and the second peripheral shell.

滲透物框架周邊殼層，其包括安置於第二周邊殼層與第三周邊殼層之間的第二密封墊。The permeate frame peripheral shell layer includes a second gasket arranged between the second peripheral shell layer and the third peripheral shell layer.

第一密封墊及第二密封墊，其經組態使得滲透物框架周邊殼層之厚度與膜支撐結構的厚度匹配。The first gasket and the second gasket are configured so that the thickness of the peripheral shell of the permeate frame matches the thickness of the membrane support structure.

第一密封墊及第二密封墊，其經組態使得當滲透物框架緊固至第一端框架及第二端框架時，滲透物框架周邊殼層之厚度與膜支撐結構的厚度匹配。The first gasket and the second gasket are configured such that when the permeate frame is fastened to the first end frame and the second end frame, the thickness of the peripheral shell of the permeate frame matches the thickness of the membrane support structure.

第一膜支撐板及第二膜支撐板，其各自具有相對之第一邊緣及第二邊緣。The first film support plate and the second film support plate each have a first edge and a second edge opposite to each other.

複數個微凹槽，其自第一邊緣延伸至第二邊緣。A plurality of micro-grooves extend from the first edge to the second edge.

複數個並行微凹槽。 產業利用性Multiple parallel micro grooves. Industrial availability

包括氫氣淨化裝置及彼等裝置之組件的本發明揭示內容適用於氫氣經淨化、產生及/或利用的燃料處理及其他產業。The present disclosure including hydrogen purification devices and their components is applicable to fuel processing and other industries where hydrogen is purified, generated, and/or utilized.

以上闡明之揭示內容涵蓋具有獨立效用之多個獨特發明。雖然此等發明中之每一者已以較佳形式揭示，但其如本文中所揭示並說明的特定實施例並不在限制性含義上考慮，此係由於大量變化為可能的。本發明之標的包括本文揭示之各種元件、特徵、功能及/或特性之所有新穎及不明顯的組合及子組合。類似地，當任何技術方案敍述「一（a）」或「一第一（a first）」元件或其等效物時，該技術方案應理解為包括併入一或多個該等元件，既不要求亦不排除兩個或多於兩個該等元件。The above-explained disclosures cover multiple unique inventions with independent utility. Although each of these inventions has been disclosed in a preferred form, the specific embodiments disclosed and described herein are not considered in a restrictive sense, and this is possible due to a large number of variations. The subject matter of the present invention includes all novel and non-obvious combinations and sub-combinations of various elements, features, functions and/or characteristics disclosed herein. Similarly, when any technical solution describes "a (a)" or "a first" element or its equivalent, the technical solution should be understood to include the incorporation of one or more of these elements, both Two or more of these elements are not required nor excluded.

可經由在相關申請案中呈現新的申請專利範圍來主張在特徵、功能、元件及/或特性之各種組合及子組合中體現的發明。該等新申請專利範圍，無論其係關於不同發明或關於相同發明，無論不同於、大於、小於或相同於原始申請專利範圍之範疇，皆亦視為包括在本發明之申請標的之內。Inventions embodied in various combinations and sub-combinations of features, functions, elements, and/or characteristics can be claimed by presenting a new patent application scope in related applications. The scope of these newly applied patents, whether they are related to different inventions or the same invention, whether different from, greater than, less than or the same as the scope of the original patent application, are all deemed to be included in the subject matter of the present invention.

20:氫氣產生總成 21:產物氫氣流 22:原料遞送系統 24:燃料處理總成 26:進料流 28:燃料流 30:氫氣產生流體 32:氫氣產生區 34:輸出流 36:蒸汽重組催化劑 38:空氣遞送總成 40:淨化（或分離）區 42:富氫氣流 44:副產物流 46:氫氣選擇性膜 48:化學一氧化碳移除總成 50:變壓吸附（PSA）系統 52:加熱總成 54:排出流（或燃燒流） 58:點火器或點火源 60:燃燒器總成 62:空氣流 64:汽化區 66:殼層或外殼 68:絕緣材料 70:外部封皮或護套 72:氫氣產生總成 74:原料遞送系統 76:汽化區 78:氫氣產生區 80:加熱總成 82:淨化區 84:原料槽（或容器） 86:泵 88:氫氣產生流體 90:進料流 92:汽化器 94:氣相進料流 96:輸出流 97:蒸汽重組區 98:重組催化劑 99:排出流 100:燃燒器總成 102:鼓風機 104:點火器總成 106:空氣流 108:燃料流 110:燃燒區 111:流量限制孔口 112:滲透物或富氫氣流 114:過濾器總成 116:膜總成 118:甲烷化反應器總成 120:殼層或外殼 122:排出通口 124:燃燒排出流 126:控制系統 128:控制總成 130:閥 132:泄壓閥 134:溫度量測裝置 136:熱交換總成 138:熱交換器 144:氫氣淨化裝置 146:氫氣分離區 148:殼體 149:主體 150:內部容積 152:內部周邊 154:第一部分 156:第二部分 158:保持機構或結構 160:混合氣體區 162:滲透物區 164:輸入通口 166:流體流 168:混合氣體流 170:氫氣 172:其他氣體 174:產物輸出通口 176:滲透物流 178:殘氣流 180:殘氣通口 182:副產物輸出通口 184:副產物流 186:氫氣選擇性膜 188:第一或混合氣體表面 190:第二或滲透物表面 192:氫氣分離總成 194:膜總成 196:氫氣淨化裝置 198:殼層或殼體 200:第一端板或端框架 202:第二端板或端框架 204:內部隔室 205:箔微孔篩網總成 206:氫氣選擇性膜 208:微孔篩網結構 210:進料側 212:滲透側 213:無孔平面薄片 214:表面 215:表面 216:孔隙 217:流體通路 218:穿孔區域（或部分） 219:非穿孔區域（或部分） 220:周邊區域（或部分） 221:邊界區域（或部分） 222:周邊部分 224:板或框架 226:周邊殼層 228:第一支撐部件 230:開放區 232:框架平面 234:第一相對側 236:第二相對側 238:第三相對側 240:第四相對側 242:第一部分 244:第一支撐平面 246:第二支撐部件 248:第三支撐部件 250:第二部分 252:第三部分 254:第二支撐平面 256:第三支撐平面 258:突出部或指 260:進料框架 262:滲透物框架 264:密封墊或密封墊框架 266:進料框架周邊殼層 268:進料框架輸入管道 270:進料框架輸出管道 272:進料框架開放區 274:第一進料框架支撐部件 276:第二進料框架支撐部件 278:第三進料框架支撐部件 280:第一區段或第一周邊殼層 282:第二區段或第二周邊殼層 284:進料框架密封墊 286:膜支撐結構 288:進料框架支撐平面 290:寬度 292:寬度 294:部分 296:部分 300:進料框架平面 302:進料框架突出部或指狀物 304:滲透物框架周邊殼層 306:滲透物框架輸出管道 308:滲透物框架開放區 310:第一區段或第一周邊殼層 312:第二區段或第二周邊殼層 314:滲透物框架密封墊 316:厚度 318:厚度 320:第一區段 322:第二區段 324:第三區段 326:滲透物框架密封墊 328:膜支撐板 330:第一面（或表面） 332:第二相對面（或相對表面） 334:微凹槽 336:第一邊緣 338:第二相對邊緣 339:單一支撐板 340:第一膜支撐板 342:第二膜支撐板 344:第一面 346:第二相對面 348:第一面 349:第二相對面 350:第三膜支撐板 396:氫氣淨化裝置 398:殼層或殼體 400:第一端板或端框架 402:第二端板或端框架 404:內部隔室 405:箔微孔篩網總成 406:氫氣選擇性膜 408:微孔篩網結構 424:板或框架 426:周邊殼層 430:開放區 434:第一相對側 436:第二相對側 438:第三相對側 440:第四相對側 460:進料框架 462:滲透物框架 464:密封墊或密封墊框架20: Hydrogen generation assembly 21: Product hydrogen flow 22: Raw material delivery system 24: Fuel treatment assembly 26: feed flow 28: Fuel flow 30: Hydrogen generating fluid 32: Hydrogen generation area 34: output stream 36: Steam reforming catalyst 38: Air delivery assembly 40: Purification (or separation) zone 42: Hydrogen-rich stream 44: By-product stream 46: Hydrogen selective membrane 48: Chemical carbon monoxide removal assembly 50: Pressure swing adsorption (PSA) system 52: heating assembly 54: discharge flow (or combustion flow) 58: igniter or ignition source 60: Burner assembly 62: Air flow 64: Vaporization zone 66: Shell or outer shell 68: Insulation material 70: External cover or sheath 72: Hydrogen generation assembly 74: Raw material delivery system 76: Vaporization Zone 78: Hydrogen generation area 80: heating assembly 82: Purification area 84: Raw material tank (or container) 86: Pump 88: Hydrogen generating fluid 90: feed flow 92: Vaporizer 94: Gas phase feed stream 96: output stream 97: Steam reforming area 98: Recombination Catalyst 99: discharge stream 100: Burner assembly 102: Blower 104: igniter assembly 106: Air Flow 108: fuel flow 110: Burning Zone 111: Flow restriction orifice 112: Permeate or hydrogen-rich gas stream 114: filter assembly 116: Membrane assembly 118: Methanation reactor assembly 120: Shell or outer shell 122: discharge port 124: Combustion exhaust stream 126: Control System 128: control assembly 130: Valve 132: Pressure relief valve 134: Temperature measuring device 136: Heat Exchange Assembly 138: Heat Exchanger 144: Hydrogen purification device 146: Hydrogen separation zone 148: Shell 149: Subject 150: internal volume 152: inner periphery 154: Part One 156: Part Two 158: Maintaining an institution or structure 160: Mixed gas area 162: Permeate Area 164: Input port 166: Fluid Flow 168: Mixed gas flow 170: Hydrogen 172: other gases 174: Product output port 176: Infiltration Logistics 178: Remnant Airflow 180: Residual Vent 182: By-product output port 184: By-product stream 186: Hydrogen selective membrane 188: First or mixed gas surface 190: second or permeate surface 192: Hydrogen separation assembly 194: Membrane Assembly 196: Hydrogen purification device 198: Shell or shell 200: The first end plate or end frame 202: second end plate or end frame 204: Internal compartment 205: Foil microporous screen assembly 206: Hydrogen selective membrane 208: Microporous mesh structure 210: feed side 212: Infiltration side 213: Non-porous flat sheet 214: Surface 215: Surface 216: Pore 217: Fluid Path 218: Perforated area (or part) 219: Non-perforated area (or part) 220: Surrounding area (or part) 221: Boundary area (or part) 222: Peripheral part 224: board or frame 226: Peripheral Shell 228: The first support member 230: open area 232: frame plane 234: first opposite side 236: second opposite side 238: third opposite side 240: Fourth opposite side 242: Part One 244: The first support plane 246: second support member 248: The third support member 250: Part Two 252: Part Three 254: second support plane 256: third support plane 258: protrusion or finger 260: feed frame 262: Permeate Frame 264: gasket or gasket frame 266: Shell around the feed frame 268: Feed frame input pipe 270: Feed frame output pipe 272: Feeding frame open area 274: The first feed frame support part 276: The second feed frame support part 278: The third feed frame support part 280: The first section or the first peripheral shell 282: Second section or second peripheral shell 284: Inlet frame gasket 286: Membrane Support Structure 288: Feeding frame support plane 290: width 292: width 294: part 296: part 300: Feeding frame plane 302: Feeding frame protrusions or fingers 304: Perimeter shell of permeate frame 306: Permeate frame output pipeline 308: Permeate Frame Open Area 310: The first section or the first peripheral shell 312: Second section or second peripheral shell 314: Permeate frame gasket 316: Thickness 318: Thickness 320: first section 322: second section 324: Third Section 326: Permeate frame gasket 328: Membrane Support Plate 330: The first side (or surface) 332: The second opposite surface (or opposite surface) 334: Micro Groove 336: The First Edge 338: The second opposite edge 339: Single support plate 340: The first membrane support plate 342: second membrane support plate 344: first side 346: The second opposite side 348: The first side 349: Second Opposite Face 350: The third membrane support plate 396: Hydrogen purification device 398: Shell or shell 400: The first end plate or end frame 402: second end plate or end frame 404: Internal compartment 405: Foil microporous screen assembly 406: Hydrogen selective membrane 408: Microporous mesh structure 424: board or frame 426: Peripheral Shell 430: open area 434: first opposite side 436: second opposite side 438: third opposite side 440: Fourth Opposite Side 460: feed frame 462: Permeate Frame 464: gasket or gasket frame

[圖1]為氫氣產生總成之實例的示意圖。 [圖2]為氫氣產生總成之另一實例的示意圖。 [圖3]為圖1之氫氣產生總成之氫氣淨化裝置的示意圖。 [圖4]為圖3之氫氣淨化裝置之實例的分解立體圖。 [圖5]為圖4之氫氣淨化裝置之箔微孔篩網總成之實例的俯視圖。 [圖6]為圖5之箔微孔篩網總成之微孔篩網結構之實例的俯視圖。 [圖7]為具有孔隙之另一實例的圖6之微孔篩網結構的局部視圖。 [圖8]為具有孔隙之又一實例的圖6之微孔篩網結構的局部視圖。 [圖9]為具有孔隙之另一實例的圖6之微孔篩網結構的局部視圖。 [圖10]為圖4之氫氣淨化裝置之箔微孔篩網總成之另一實例的俯視圖。 [圖11]為圖10之箔微孔篩網總成之微孔篩網結構之實例的俯視圖。 [圖12]為圖4之氫氣淨化裝置之箔微孔篩網總成之另一實例的俯視圖。 [圖13]為圖4之氫氣淨化裝置之箔微孔篩網總成之另一實例的俯視圖。 [圖14]為圖4之氫氣淨化裝置的滲透物框架、箔微孔篩網總成、密封墊框架及進料框架之實例的在未展示箔微孔篩網總成與滲透物框架之間的密封墊框架情況下之局部剖面圖。 [圖15]為圖4之氫氣淨化裝置的展示滲透物框架之周邊殼層及滲透物框架之膜支撐結構之實例的俯視圖。 [圖16]為圖4之氫氣淨化裝置的滲透物框架之周邊殼層之另一實例的局部剖面圖。 [圖17]為圖4之氫氣淨化裝置之滲透物框架的膜支撐結構之膜支撐板的實例之立體圖。 [圖18]為圖4之氫氣淨化裝置之滲透物框架之膜支撐結構的膜支撐板之另一實例的立體圖。 [圖19]為圖4之氫氣淨化裝置之膜支撐結構的另一實例之剖面圖。 [圖20]為圖3之氫氣淨化裝置之另一實例的分解立體圖。[Figure 1] is a schematic diagram of an example of a hydrogen generation assembly. [Figure 2] is a schematic diagram of another example of the hydrogen generation assembly. [Fig. 3] is a schematic diagram of the hydrogen purification device of the hydrogen generation assembly of Fig. 1. [Fig. [Fig. 4] is an exploded perspective view of an example of the hydrogen purification device of Fig. 3. [Fig. [Fig. 5] is a top view of an example of the foil microporous screen assembly of the hydrogen purification device of Fig. 4. [Fig. [Figure 6] is a top view of an example of the microporous screen structure of the foil microporous screen assembly of Figure 5; [Fig. 7] is a partial view of the microporous mesh structure of Fig. 6 having another example of pores. [Fig. 8] is a partial view of the microporous mesh structure of Fig. 6 having still another example of pores. [Fig. 9] is a partial view of the microporous mesh structure of Fig. 6 having another example of pores. [Fig. 10] is a top view of another example of the foil microporous screen assembly of the hydrogen purification device of Fig. 4. [Fig. [FIG. 11] is a top view of an example of the microporous mesh structure of the foil microporous mesh assembly of FIG. 10. [Fig. 12] is a top view of another example of the foil microporous mesh assembly of the hydrogen purification device of Fig. 4. [Fig. [Fig. 13] is a top view of another example of the foil microporous screen assembly of the hydrogen purification device of Fig. 4. [Fig. [Figure 14] is an example of the permeate frame, foil microporous screen assembly, gasket frame, and feed frame of the hydrogen purification device of Figure 4 between the foil microporous screen assembly and the permeate frame not shown Partial cross-sectional view of the frame of the gasket. [Fig. 15] is a top view showing an example of the peripheral shell layer of the permeate frame and the membrane support structure of the permeate frame of the hydrogen purification device of Fig. 4. [Fig. 16] is a partial cross-sectional view of another example of the peripheral shell of the permeate frame of the hydrogen purification device of Fig. 4. [Fig. [FIG. 17] is a perspective view of an example of a membrane support plate of the membrane support structure of the permeate frame of the hydrogen purification device of FIG. 4. [FIG. 18] is a perspective view of another example of the membrane support plate of the membrane support structure of the permeate frame of the hydrogen purification device of FIG. 4. [Fig. 19] is a cross-sectional view of another example of the membrane support structure of the hydrogen purification device of Fig. 4. [Fig. [Fig. 20] is an exploded perspective view of another example of the hydrogen purification device of Fig. 3. [Fig.

196:氫氣淨化裝置 196: Hydrogen purification device

200:第一端板或端框架 200: The first end plate or end frame

202:第二端板或端框架 202: second end plate or end frame

204:內部隔室 204: Internal compartment

205:箔微孔篩網總成 205: Foil microporous screen assembly

210:進料側 210: feed side

212:滲透側 212: Infiltration side

220:周邊區域(或部分) 220: surrounding area (or part)

221:邊界區域(或部分) 221: Boundary area (or part)

224:板或框架 224: board or frame

226:周邊殼層 226: Peripheral Shell

228:第一支撐部件 228: The first support member

230:開放區 230: open area

232:框架平面 232: frame plane

234:第一相對側 234: first opposite side

236:第二相對側 236: second opposite side

238:第三相對側 238: third opposite side

240:第四相對側 240: Fourth opposite side

242:第一部分 242: Part One

244:第一支撐平面 244: The first support plane

246:第二支撐部件 246: second support member

248:第三支撐部件 248: The third support member

250:第二部分 250: Part Two

252:第三部分 252: Part Three

254:第二支撐平面 254: second support plane

256:第三支撐平面 256: third support plane

258:突出部或指 258: protrusion or finger

260:進料框架 260: feed frame

262:滲透物框架 262: Permeate Frame

264:密封墊或密封墊框架 264: gasket or gasket frame

266:進料框架周邊殼層 266: Shell around the feed frame

268:進料框架輸入管道 268: Feed frame input pipe

270:進料框架輸出管道 270: Feed frame output pipe

272:進料框架開放區 272: Feeding frame open area

274:第一進料框架支撐部件 274: The first feed frame support part

276:第二進料框架支撐部件 276: The second feed frame support part

278:第三進料框架支撐部件 278: The third feed frame support part

300:進料框架平面 300: Feeding frame plane

302:進料框架突出部或指狀物 302: Feeding frame protrusions or fingers

340:第一膜支撐板 340: The first membrane support plate

Claims (15)

一種箔微孔篩網總成，其包含： 至少一個氫氣選擇性膜，其具有一進料側及一滲透側；以及 至少一個無孔平面薄片，其具有形成複數個流體通路之複數個孔隙，該至少一個無孔平面薄片包括經組態以提供對該滲透側之支撐的大體相對之平面表面，該複數個流體通路在該等相對表面之間延伸，其中該至少一個氫氣選擇性膜之該滲透側以冶金方式接合至該至少一個無孔平面薄片，其中該無孔平面薄片包括具有該複數個孔隙的兩個或多於兩個離散部分。A foil microporous screen assembly, which comprises: At least one hydrogen selective membrane having a feed side and a permeate side; and At least one non-porous planar sheet having a plurality of pores forming a plurality of fluid passages, the at least one non-porous planar sheet including a substantially opposed planar surface configured to provide support for the permeable side, the plurality of fluid passages Extending between the opposing surfaces, wherein the permeation side of the at least one hydrogen selective membrane is metallurgically joined to the at least one non-porous planar sheet, wherein the non-porous planar sheet includes two or More than two discrete parts. 如請求項1所述之箔微孔篩網總成，其中該兩個或多於兩個離散部分中之每一離散部分藉由不含該複數個孔隙之至少一個邊界部分與該兩個或多於兩個離散部分的鄰接離散部分隔開。The foil microporous screen assembly according to claim 1, wherein each of the two or more discrete parts has at least one boundary part free of the plurality of pores and the two or Adjacent discrete parts of more than two discrete parts are spaced apart. 如請求項1所述之箔微孔篩網總成，其中該至少一個氫氣選擇性膜包括兩個或多於兩個氫氣選擇性膜，且其中該兩個或多於兩個氫氣選擇性膜中之一不同氫氣選擇性膜以冶金方式接合至該兩個或多於兩個離散部分中的每一離散部分。The foil microporous screen assembly according to claim 1, wherein the at least one hydrogen selective membrane comprises two or more hydrogen selective membranes, and wherein the two or more hydrogen selective membranes One of the different hydrogen selective membranes is metallurgically joined to each of the two or more discrete parts. 如請求項3所述之箔微孔篩網總成，其中該兩個或多於兩個氫氣選擇性膜中之每一氫氣選擇性膜經設定大小為大於對應離散部分，使得該氫氣選擇性膜之一周邊部分接觸該無孔平面薄片的不包括該複數個孔隙之一或多個部分。The foil microporous screen assembly according to claim 3, wherein each hydrogen selective membrane of the two or more hydrogen selective membranes is set to be larger than the corresponding discrete part, so that the hydrogen selective A peripheral part of the membrane that contacts the non-porous flat sheet does not include one or more parts of the plurality of pores. 如請求項1所述之箔微孔篩網總成，其中該至少一個氫氣選擇性膜擴散接合至該至少一個微孔篩網結構。The foil microporous screen assembly of claim 1, wherein the at least one hydrogen selective membrane is diffusion bonded to the at least one microporous screen structure. 如請求項1所述之箔微孔篩網總成，其中，該無孔平面薄片界定一平面，並且其中，該複數個孔隙中的一個或多個孔隙的縱向軸線垂直於該平面。The foil microporous screen assembly of claim 1, wherein the non-porous planar sheet defines a plane, and wherein the longitudinal axis of one or more of the plurality of pores is perpendicular to the plane. 如請求項6所述之箔微孔篩網總成，其中，該複數個孔隙中的所有孔隙的縱向軸線垂直於該平面。The foil microporous screen assembly according to claim 6, wherein the longitudinal axis of all the pores in the plurality of pores is perpendicular to the plane. 如請求項1所述之箔微孔篩網總成，其中，該無孔平面薄片的厚度介於100微米與約200微米之間。The foil microporous screen assembly according to claim 1, wherein the thickness of the non-porous flat sheet is between 100 micrometers and about 200 micrometers. 一種製造一箔微孔篩網總成的方法，其包含： 提供至少一個氫氣選擇性膜，其具有一進料側及一滲透側； 提供至少一個無孔平面薄片，其具有形成複數個流體通路之複數個孔隙，該至少一個無孔平面薄片包括一大體相對之平面表面以及在該等相對表面之間延伸的複數個流體通路，該無孔平面薄片包括具有該複數個孔隙的兩個或多於兩個離散部分；以及 將該至少一個氫氣選擇性膜之該滲透側以冶金方式接合至該至少一個無孔平面薄片。A method of manufacturing a foil microporous mesh assembly, which comprises: Providing at least one hydrogen selective membrane, which has a feed side and a permeate side; Providing at least one non-porous planar sheet having a plurality of pores forming a plurality of fluid passages, the at least one non-porous planar sheet including substantially opposed planar surfaces and a plurality of fluid passages extending between the opposed surfaces, the The non-porous planar sheet includes two or more discrete portions having the plurality of pores; and The permeate side of the at least one hydrogen selective membrane is metallurgically joined to the at least one non-porous planar sheet. 如請求項9所述之方法，其中，將該至少一個氫氣選擇性膜之該滲透側以冶金方式接合至該至少一個無孔平面薄片的步驟包含將該至少一種氫氣選擇性膜的滲透側擴散接合到該至少一個無孔平面薄片。The method according to claim 9, wherein the step of metallurgically bonding the permeate side of the at least one hydrogen selective membrane to the at least one non-porous planar sheet comprises diffusing the permeate side of the at least one hydrogen selective membrane Bonded to the at least one non-porous planar sheet. 如請求項10所述之方法，其中，將該至少一個氫氣選擇性膜之該滲透側擴散接合至該至少一個無孔平面薄片的步驟包含使用有助於擴散接合的薄金屬層或中間接合層塗佈該至少一個無孔平面薄片。The method according to claim 10, wherein the step of diffusion bonding the permeation side of the at least one hydrogen selective membrane to the at least one non-porous planar sheet includes using a thin metal layer or an intermediate bonding layer that facilitates diffusion bonding The at least one non-porous flat sheet is coated. 如請求項11所述之方法，其中，使用有助於擴散接合的薄金屬層或中間接合層塗佈該至少一個無孔平面薄片的步驟包含通過沉積步驟將薄金屬層或中間接合層施加到該至少一個無孔平面薄片上。The method according to claim 11, wherein the step of coating the at least one non-porous planar sheet with a thin metal layer or an intermediate bonding layer that facilitates diffusion bonding includes applying the thin metal layer or the intermediate bonding layer to the The at least one non-porous flat sheet. 如請求項9所述之方法，其中，提供具有形成複數個流體通路之複數個孔隙的至少一個無孔平面薄片的步驟包含： 提供不具有複數個孔隙的無孔平面薄片；以及 通過電化學蝕刻、雷射鑽孔、衝壓或刀模切割中的其中一種方式在該無孔平面薄片上形成複數個孔隙。The method according to claim 9, wherein the step of providing at least one non-porous planar sheet having a plurality of pores forming a plurality of fluid passages comprises: Provide a non-porous flat sheet without a plurality of pores; and A plurality of pores are formed in the non-porous flat sheet by one of electrochemical etching, laser drilling, punching or die cutting. 如請求項13所述之方法，其中，該無孔平面薄片界定一平面，其中通過電化學蝕刻、雷射鑽孔、衝壓或刀模切割中的其中一種方式在該無孔平面薄片上形成複數個孔隙的步驟包括通過電化學蝕刻、雷射鑽孔、衝壓或刀模切割的其中一種方式在該無孔平面薄片上形成復數個孔隙，使得該複數個孔隙中一個或多個孔隙的縱向軸線垂直於該平面。The method according to claim 13, wherein the non-porous flat sheet defines a plane, and a plurality of non-porous flat sheets are formed on the non-porous flat sheet by one of electrochemical etching, laser drilling, punching or die cutting. The step of forming a plurality of pores includes forming a plurality of pores on the non-porous planar sheet by one of electrochemical etching, laser drilling, punching or die cutting, so that the longitudinal axis of one or more pores in the plurality of pores Perpendicular to the plane. 如請求項13所述之方法，其中，該無孔平面薄片界定一平面，其中通過電化學蝕刻、雷射鑽孔、衝壓或刀模切割中的其中一種方式在該無孔平面薄片上形成複數個孔隙的步驟包括通過電化學蝕刻、雷射鑽孔、衝壓或刀模切割的其中一種方式在該無孔平面薄片上形成該複數個孔隙，使得該複數個孔隙中的所有孔隙的縱向軸線垂直於該平面。The method according to claim 13, wherein the non-porous flat sheet defines a plane, and a plurality of non-porous flat sheets are formed on the non-porous flat sheet by one of electrochemical etching, laser drilling, punching or die cutting. The step of forming the plurality of pores includes forming the plurality of pores on the non-porous planar sheet by one of electrochemical etching, laser drilling, punching or die cutting, so that the longitudinal axes of all the pores in the plurality of pores are vertical In the plane.
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