TWI720922B - Impeller type exhaust gas treatment device - Google Patents
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Abstract
一種葉輪式廢氣處理裝置，包括一第一葉輪與一第二葉輪，係分別設置於廢氣處理容器之上腔室與容置空間內；至少一濾網，係固設在第二葉輪其葉片之周緣；一馬達，同步帶動第一葉輪及第二葉輪之葉片旋轉；而洗淨水係導入第二葉輪之內緣，使其在濾網之網格上附著而形成水膜；廢氣係進入容置空間內，則其中之微粒將與水膜相互融和成大水珠，再被第二葉輪甩落後經排水管導出；而已分離出微粒之乾淨氣體，則透過第一葉輪之抽引而排放至外部。由於本發明係應用一馬達同時帶動兩部葉輪之葉片旋轉，具有減少設備投資與耗能以及減少空間浪費之效益，同時洗淨水在濾網上形成之水膜將增加與廢氣微粒之接觸面積，進而提高微粒捕捉量達到廢氣潔淨化之成效。 An impeller type exhaust gas treatment device, comprising a first impeller and a second impeller, which are respectively arranged in the upper chamber and the accommodating space of the exhaust gas treatment container; at least one filter screen is fixed on the blades of the second impeller Perimeter; a motor synchronously drives the blades of the first impeller and the second impeller to rotate; and the washing water system is introduced into the inner edge of the second impeller to make it adhere to the mesh of the filter to form a water film; the exhaust gas enters the container In the space, the particles in it will fuse with the water film into large water droplets, which are then thrown out by the second impeller and then discharged through the drain pipe; while the clean gas from which the particles have been separated is drawn by the first impeller and discharged to external. Since the present invention uses a motor to drive the blades of the two impellers to rotate at the same time, it has the benefits of reducing equipment investment and energy consumption and reducing space waste. At the same time, the water film formed by the washing water on the filter will increase the contact area with the exhaust particles. , Thereby increasing the amount of particulates captured to achieve the effect of cleaning exhaust gas.
Description
本發明係有關一種廢氣處理裝置，尤指一種以一顆馬達同軸帶動二個葉輪其濾網同步旋轉，並利用第二葉輪周緣裝設濾網，使噴灑之洗淨水形成水膜，以增加其與廢氣微粒的接觸面機，進而提升微粒捕捉量之一種葉輪式廢氣處理裝置。 The present invention relates to an exhaust gas treatment device, in particular to a motor that drives two impellers with a filter screen to rotate synchronously, and uses the second impeller to install a filter screen so that the sprayed washing water forms a water film to increase It is a kind of impeller type exhaust gas treatment device that can contact the exhaust gas particles to increase the amount of particles captured.
按，一般半導體產業產生之廢氣，主要係來自製程反應上，諸如半導體元件之蝕刻、沉積、以及電路板酸洗作業等產生之粉塵及微粒，其粒徑多在微米以下，極為不易捕捉；目前半導體及光電製程所產生的廢氣，多透過真空泵抽到污染防制設備內，進行廢氣燃燒處理及洗滌；惟查，現行所用的污染防治設備，例如文氏洗滌器(Venturiscrubber)係針對處理1μm以上的微粒，但對於廢氣中次微米微粒的處置則無法有效控制。是以，如何有效的處理細微粒的廢氣排放便成為十分重要的課題。 According to the general semiconductor industry, exhaust gas mainly comes from process reactions, such as the dust and particles generated by the etching, deposition, and circuit board pickling operations of semiconductor components. The particle size is mostly below micrometers, which is extremely difficult to capture; currently Exhaust gas generated by semiconductor and optoelectronic processes is mostly pumped into pollution prevention equipment through vacuum pumps for exhaust gas combustion treatment and washing. However, the current pollution prevention equipment used, such as Venturi scrubber, is aimed at processing more than 1μm However, the disposal of sub-micron particles in the exhaust gas cannot be effectively controlled. Therefore, how to effectively deal with the exhaust emission of fine particles has become a very important issue.
次按，當廢氣自製程中抽離後，前段會採用高溫加熱，使製程廢氣氧化，後段再經灑水裝置以清水噴灑沖洗，將高溫廢氣降溫同時洗滌高溫廢氣，使廢氣中的微粒溶解於水中，再將廢水經由排水管排出，並透過抽風裝置將處理過之廢氣排放至外界。 Second press, when the exhaust gas is extracted during the self-made process, the first stage will use high temperature heating to oxidize the process exhaust gas, and the latter stage will be sprayed and rinsed with clean water through a sprinkler device to cool the high temperature exhaust gas while washing the high temperature exhaust gas, so that the particles in the exhaust gas are dissolved in In the water, the waste water is discharged through the drain pipe, and the treated waste gas is discharged to the outside through the exhaust device.
請參閱圖1所示，為台灣第542747號發明專利，其係揭露一種填充式洗滌塔(Counter-flow Packing Absorption Tower)200之結構；其主要係在洗滌塔200之底部設有一水槽212，其中之洗淨水可經由一抽水幫浦214抽引至洗滌塔200之上方，並經由複數個噴水孔216而向下噴灑，而噴灑之洗淨水將經過複數個拉西環(Packing)218後再向下流入水槽212中。廢氣係經由管路220進入洗滌
塔200中，並向上通過複數個拉西環218，則廢氣中之微粒在拉西環218中將被洗淨水吸附後會流入水槽212中，而其餘之廢氣將經由洗滌塔200頂部之排氣孔222排出。然而，此種習知之填充式洗滌塔200處理廢氣之方式僅是藉由水滴來吸附廢氣中之污染物，即使配合拉西環218亦無法真正有效地擴大廢氣與水之接觸面積，以使廢氣中之污染物有效地被水吸附，故廢氣在經由填充式洗滌塔200處理後，其污染物之含量還是很高，仍會對於週遭環境造成相當程度的傷害。
Please refer to Figure 1, which is Taiwan Invention Patent No. 542747, which discloses the structure of a Counter-flow Packing Absorption Tower 200; it is mainly provided with a
另外，請參閱圖2所示，為台灣第352007號專利，其係揭露一種文氏洗滌塔(Collision Venturi Scrubber)300之結構；其主要係利用一具後置式之誘引風車320(Introduced Fan)將廢氣321抽入，並與經文氏管喉部322霧化後之微細液體323垂直對撞，使微粒包入水滴內而形成粒徑較原來大數千倍之液滴324，再藉著液滴324之體積與質量慣性雙重增加結果，使液滴324無法通過洗滌塔之氣液分離器325，而被阻截、滴落、沉浸收集於水槽內，乾淨空氣遂與液滴分離而排出系統外。惟查，文氏洗滌塔之微粒去除效率僅約50%~70%間，無法達到99%的去除要求；此外，為了使洗滌塔之文氏管達到加速霧化混合要求，所需之壓差較其他設備高出至少760~2030mmAq，由於誘引風車320之耗電量大，其初設投資與運轉維護費用昂貴、操作技術要求高、估地面積大等，皆為其缺點。
In addition, please refer to Figure 2, which is Taiwan Patent No. 352007, which discloses the structure of a Collision Venturi Scrubber 300; it mainly uses a rear-mounted attracting windmill 320 (Introduced Fan)
是以，目前半導體產業並無一經濟又實用處理廢氣的裝置。本發明人有鑑於此，乃積極研究改良，以期一種效率更佳，成本更低的技術，以符合環保法規的要求，且上述問題均可由本發明所克服。 Therefore, the current semiconductor industry does not have an economical and practical device for treating exhaust gas. In view of this, the inventor is actively researching and improving a technology with better efficiency and lower cost to meet the requirements of environmental protection regulations, and the above-mentioned problems can be overcome by the present invention.
緣是，本發明之主要目的，係在提供一種解決習用廢氣處理裝置中無法妥善處理半導體產業各種廢氣之缺失，其以一顆馬達同軸帶動二個葉輪其 濾網同步旋轉，並利用在葉輪周緣固設濾網使洗淨水在網格上形成水膜，使通過之廢氣可增加其微粒與水膜的接觸面積，進而提升微粒的捕捉效果，以有效移除工業製程中對環境有害的次微米(小於1μm)微粒，達到廢氣潔淨化之成效。 The reason is that the main purpose of the present invention is to provide a solution to the conventional waste gas treatment device that cannot properly handle various waste gas defects in the semiconductor industry. It uses a motor to coaxially drive two impellers. The filter screen rotates synchronously, and the filter screen is fixed on the periphery of the impeller to make the washing water form a water film on the grid, so that the passing waste gas can increase the contact area between the particles and the water film, thereby improving the particle capture effect to be effective Remove the submicron (less than 1μm) particles that are harmful to the environment in the industrial process to achieve the effect of cleaning the exhaust gas.
按，廢氣中所含之微粒，當其直徑小於1μm以上時該微粒係作布朗運動(Brownian motion)；由於流體中分子的熱運動，使得流體中的微粒受到來自各個方向流體分子的碰撞，且因這種不平衡的碰撞，使得微粒不斷地改變方向而出現不規則性的運動；通常微粒在流體中碰撞的頻率約為102次/秒，且劇烈程度隨著流體的溫度上升而增加，換言之，流體的溫度越高，微粒的運動將越活潑越不規則性。再按，半導體產業的製程廢氣處理，前段多採用高溫加熱，使其廢氣氧化後，再進行將廢氣中的微粒溶解於水中的後段作業；由於前段處理係將廢氣加熱升溫，因此進入後段的次微米微粒將作高度不規則性的布朗運動，故而導致後段作業中捕捉微粒的困難度；其解決之道在於增加廢氣中其微粒與洗淨水的接觸面積，而本發明人更進一步思及使洗淨水形成水膜的形式，就像在次微米微粒其高度不規則性的運動路徑中，佈下天羅地網一般將其一網打盡，使半導體產業的製程廢氣達到潔淨化的效果。 According to, the particles contained in the exhaust gas, when the diameter is less than 1μm or more, the particles perform Brownian motion; due to the thermal motion of the molecules in the fluid, the particles in the fluid are collided by the fluid molecules from all directions, and Due to this unbalanced collision, the particles constantly change directions and appear irregular motion; usually the frequency of particle collisions in the fluid is about 102 times per second, and the severity increases as the temperature of the fluid rises, in other words , The higher the temperature of the fluid, the more active and irregular the movement of the particles will be. Press again, in the semiconductor industry process waste gas treatment, high-temperature heating is often used in the front stage to oxidize the exhaust gas, and then the second stage operation of dissolving the particles in the exhaust gas in water is carried out; because the front-end treatment system heats the exhaust gas to heat up, it enters the second Micron particles will perform highly irregular Brownian motion, which will cause difficulty in capturing particles in the subsequent operations; the solution is to increase the contact area between the particles in the exhaust gas and the washing water, and the present inventors have further thought of using The form of the washing water forming a water film is like in the highly irregular movement path of sub-micron particles, laying a net of heaven and earth generally sweeps it all out, so that the process exhaust gas of the semiconductor industry can be cleaned.
為達上述目的，本發明所採取的技術手段，包含：一第一葉輪與一第二葉輪，係分別設置於一廢氣處理容器之上腔室與容置空間內；至少一層呈現網格狀之濾網，係固設在該第二葉輪其葉片之周緣；一馬達，設置於該廢氣處理容器之頂端，其馬達軸與該第一葉輪及該第二葉輪連結以同步帶動其葉片旋轉；一進水管，設有複數個噴水孔，係置入該第二葉輪之內緣，並令幫浦加壓之洗淨水自該進水管導入再經該噴水孔向四周噴灑，則該洗淨水將在該濾網之網格上附著而形成水膜；一進氣管，係與該容置空間連通以導入廢氣，再令 該廢氣通過該附著在濾網上的水膜，則廢氣中之微粒將與該水膜相互融和成大水珠，經該第二葉輪葉片旋轉之高速離心力作用而甩出，再經排水管導出該廢氣處理容器之外部；而已分離出微粒之乾淨氣體，則透過第一葉輪之抽引進入上腔室，再經排氣管排放至廢氣處理容器之外部。 To achieve the above objective, the technical means adopted by the present invention include: a first impeller and a second impeller, which are respectively arranged in the upper chamber and the accommodating space of an exhaust gas treatment container; and at least one layer presents a grid-like shape. A filter screen is fixedly arranged on the periphery of the blades of the second impeller; a motor is arranged on the top of the exhaust gas treatment container, and the motor shaft is connected with the first impeller and the second impeller to synchronously drive the blades to rotate; The water inlet pipe is provided with a plurality of water spray holes, which are inserted into the inner edge of the second impeller, and the washing water pressurized by the pump is introduced from the water inlet pipe and sprayed around through the water spray holes, then the washing water Will be attached to the mesh of the filter to form a water film; an air inlet pipe is connected to the accommodating space to introduce exhaust gas, and then make When the exhaust gas passes through the water film attached to the filter screen, the particles in the exhaust gas will fuse with the water film into large water droplets, which are thrown out by the high-speed centrifugal force of the second impeller blade rotation, and then lead out through the drain pipe The outside of the waste gas treatment container; and the clean gas from which the particles have been separated is drawn into the upper chamber through the suction of the first impeller, and then discharged to the outside of the waste gas treatment container through the exhaust pipe.
依據前揭特徵，本發明第一實施例中之廢氣處理容器，設有一上腔室、一下腔室、及位於其間之一容置空間，該容置空間之下方設有一通道與該下腔室連通，且其外緣設有一導氣通路以連結該上、下腔室，一排氣管，設於該上腔室之側邊，且該容置空間之底部設有一排水管；且其進氣管係與該容置空間連通以側向導入廢氣，再令該廢氣自該第二葉輪之外緣吸入而通過該附著在濾網上的水膜，使廢氣中之微粒與水膜相互融和；而已分離出微粒之乾淨氣體則進入該第二葉輪之內緣，再透過該第一葉輪之抽引而流經該通道、下腔室、導氣通路後進入該上腔室，再經該排氣管排放至該廢氣處理容器之外部。 According to the features disclosed in the foregoing, the waste gas treatment container in the first embodiment of the present invention is provided with an upper chamber, a lower chamber, and an accommodating space between them. A passage and the lower chamber are provided below the accommodating space Is connected, and the outer edge is provided with an air duct to connect the upper and lower chambers, an exhaust pipe is arranged on the side of the upper chamber, and the bottom of the containing space is provided with a drainage pipe; and its inlet The air pipe system communicates with the accommodating space to introduce exhaust gas laterally, and then the exhaust gas is sucked from the outer edge of the second impeller and passes through the water film attached to the filter, so that the particles in the exhaust gas and the water film are mutually fused ; And the clean gas that has separated the particles enters the inner edge of the second impeller, and then flows through the passage, lower chamber, and air passage through the suction of the first impeller, and then enters the upper chamber, and then passes through the The exhaust pipe is discharged to the outside of the exhaust gas treatment container.
依據前揭特徵，本發明第二實施例中之廢氣處理容器，設有一上腔室、及一容置空間，該容置空間之外緣設有一通孔及一導氣通路以連結該上腔室，一排氣管，設於該上腔室之側邊，且該容置空間之底部設有一排水管；且其進氣管係與該容置空間連通並自其下方將廢氣導入該第二葉輪之內緣，再令該廢氣自該第二葉輪之內緣被導出而通過該附著在濾網上的水膜，使廢氣中之微粒與水膜相互融和；而已分離出微粒之乾淨氣體則則流出該第二葉輪，再透過該第一葉輪之抽引而流經該通孔、導氣通路後進入該上腔室，再經該排氣管排放至該廢氣處理容器之外部。 According to the features disclosed above, the waste gas treatment container in the second embodiment of the present invention is provided with an upper chamber and an accommodating space, and the outer edge of the accommodating space is provided with a through hole and an air guide path to connect the upper cavity Chamber, an exhaust pipe, arranged on the side of the upper chamber, and a drain pipe is arranged at the bottom of the accommodating space; and the air inlet pipe is connected with the accommodating space and introduces exhaust gas into the first chamber from below On the inner edge of the two impellers, the exhaust gas is led out from the inner edge of the second impeller and passes through the water film attached to the filter, so that the particles in the exhaust gas and the water film are fused together; and the particles are separated into a clean gas Then it flows out of the second impeller, and then flows through the through hole and the air guiding passage through the suction of the first impeller, and then enters the upper chamber, and then is discharged to the outside of the waste gas treatment container through the exhaust pipe.
依據前揭特徵，本發明中該濾網係固設在該第二葉輪其葉片之外周緣；又者，該濾網係固設在該第二葉輪其葉片之內周緣；再者，該濾網係有兩層，一層固設在該第二葉輪其葉片之外周緣，另一層則固設在該第二葉輪其葉片之內周緣。 According to the features disclosed above, in the present invention, the filter screen is fixed on the outer periphery of the blade of the second impeller; further, the filter screen is fixed on the inner periphery of the blade of the second impeller; The net system has two layers, one layer is fixed on the outer periphery of the blade of the second impeller, and the other layer is fixed on the inner periphery of the blade of the second impeller.
依據前揭特徵，該濾網係直接成型在該第二葉輪的葉片或其周緣上。 According to the features disclosed above, the filter screen is directly formed on the blade of the second impeller or its periphery.
藉助前揭特徵，本發明「葉輪式廢氣處理裝置」具有之效益為： With the help of the aforementioned features, the "impeller-type exhaust gas treatment device" of the present invention has the following benefits:
(1)本發明係利用在第二葉輪周緣固設濾網使洗淨水在網格上形成水膜，再使廢氣因第二葉輪的旋轉而被吸入(第一實施例)或被導出(第二實施例)，則廢氣將通過存在網格上的水膜；由於水膜好似天羅地網一般，完全阻絕了次微米微粒其不規則性運動的路徑，廢氣中的微粒幾可全部捕捉；因此本發明可以有效移除半導體製程中對環境有害的次微米(小於1μm)微粒，達到廢氣潔淨化之成效。 (1) In the present invention, a filter screen is fixed on the periphery of the second impeller to form a water film on the washing water on the grid, and then the exhaust gas is sucked in or discharged due to the rotation of the second impeller (first embodiment) The second embodiment), the exhaust gas will pass through the water film on the grid; because the water film is like a net of heaven and earth, it completely blocks the irregular movement path of sub-micron particles, and almost all the particles in the exhaust gas can be captured; therefore, this The invention can effectively remove sub-micron (less than 1 μm) particles that are harmful to the environment in the semiconductor manufacturing process, and achieve the effect of purifying exhaust gas.
(2)本發明係以第二葉輪來捕捉廢氣中的微粒，再以第一葉輪來排出已潔淨化的乾淨氣體，而兩部葉輪係應用同一個馬達來同步帶動其葉片旋轉，不似習知的廢氣處理裝置需另設大馬力的風機來排放已處理過的廢氣；因此本發明具有減少設備投資與耗能以及減少空間浪費之效益。 (2) In the present invention, the second impeller is used to capture the particles in the exhaust gas, and then the first impeller is used to discharge the cleaned gas. The two impeller systems use the same motor to synchronously drive their blades to rotate. The known exhaust gas treatment device requires an additional high-horsepower fan to discharge the treated exhaust gas; therefore, the present invention has the benefits of reducing equipment investment and energy consumption and reducing space waste.
10:廢氣處理容器 10: Waste gas treatment container
11:上腔室 11: Upper chamber
12:下腔室 12: Lower chamber
13:容置空間 13: accommodating space
14:通道 14: Channel
15:導氣通路 15: Airway
16:排氣管 16: Exhaust pipe
17:排水管 17: Drain pipe
18:通孔 18: Through hole
21:第一葉輪 21: The first impeller
22:第二葉輪 22: The second impeller
23:葉片 23: blade
24:第二葉輪之內緣 24: Inner edge of the second impeller
25:旋轉軸 25: Rotation axis
31:濾網 31: Filter
40:馬達 40: Motor
41:馬達軸 41: Motor shaft
51:進水管 51: Inlet pipe
52:噴水孔 52: spray hole
61:進氣管 61: intake pipe
100:葉輪式廢氣處理裝置 100: Impeller type exhaust gas treatment device
G1:廢氣 G1: Exhaust gas
G2:乾淨氣體 G2: Clean gas
W1:洗淨水 W1: Washing water
W2:水膜 W2: Water film
W3:水珠 W3: Water drops
圖1 係習用一種填充式洗滌塔的結構示意圖。 Figure 1 is a schematic diagram of a conventional packed scrubber.
圖2 係習用一種文氏洗滌塔的結構示意圖。 Figure 2 is a schematic diagram of a conventional venturi scrubber.
圖3 係本發明第一實施例的結構示意圖。 Fig. 3 is a schematic diagram of the structure of the first embodiment of the present invention.
圖4A 係本發明中第二葉輪之分解立體圖。 Figure 4A is an exploded perspective view of the second impeller of the present invention.
圖4B 係本發明中第二葉輪A態樣之組合立體圖。 Figure 4B is a combined perspective view of the second impeller A in the present invention.
圖4C 係本發明中第二葉輪A態樣之剖視圖。 Figure 4C is a cross-sectional view of the second impeller A in the present invention.
圖5A 係本發明中第二葉輪B態樣之組合立體圖。 Figure 5A is a combined perspective view of the second impeller B in the present invention.
圖5B 係本發明中第二葉輪B態樣之剖視圖。 Figure 5B is a cross-sectional view of the second impeller B in the present invention.
圖5C 係本發明中第二葉輪C態樣之剖視圖。 Figure 5C is a cross-sectional view of the second impeller C in the present invention.
圖5D 係本發明中第二葉輪D態樣之剖視圖。 Figure 5D is a cross-sectional view of the D state of the second impeller in the present invention.
圖6 係本發明中第二實施例的結構示意圖。 Fig. 6 is a schematic diagram of the structure of the second embodiment of the present invention.
以下說明將配合圖式作為實施例，但不限定於此，本發明尚可施行於其它的實施例中，而公知的步驟或元件並未描述於細節中，以避免對本發明形成不必要之限制。特別注意的是，圖式僅為示意之用，並非代表元件實際之尺寸或數量，有些細節可能未完全繪出，以求圖式之簡潔。 The following description uses the drawings as an embodiment, but is not limited thereto. The present invention can be implemented in other embodiments, and the well-known steps or elements are not described in the details, so as to avoid unnecessary limitations on the present invention. . It is especially important to note that the drawings are for illustrative purposes only, and do not represent the actual size or quantity of the components. Some details may not be completely drawn in order to keep the drawings concise.
首先，請參閱圖3所示，為本發明葉輪式廢氣處理裝置100之第一實施例結構，其包含有：一廢氣處理容器10，設有一上腔室11、一下腔室12、及一容置空間13，該容置空間13係位於該上、下腔室11/12之間，且其下方設有一通道14與該下腔室12連通，其外緣並設有一導氣通路15以連結該上、下腔室11/12，一排氣管16，設於該上腔室11之側邊，且該容置空間13之底部設有一排水管17；一第一葉輪21，係設置於該上腔室11內；一第二葉輪22，則設置於該容置空間13內，一濾網31，呈現網格狀，係設置在該第二葉輪22其葉片之周緣；一馬達40，設置於該廢氣處理容器10之頂端，其馬達軸41與該第一葉輪21及該第二葉輪22連結並同步帶動其葉片23旋轉；一進水管51，設有複數個噴水孔52，係置入該第二葉輪22之內緣24以導入洗淨水W1；一進氣管61，係與該容置空間13連通以側向導入廢氣G1。 First, please refer to FIG. 3, which is the structure of the first embodiment of the impeller-type exhaust gas treatment device 100 of the present invention, which includes: an exhaust gas treatment container 10 with an upper chamber 11, a lower chamber 12, and a container The accommodating space 13 is located between the upper and lower chambers 11/12, and a channel 14 is provided below it to communicate with the lower chamber 12, and the outer edge of the accommodating space 13 is provided with an air-conducting passage 15 to connect The upper and lower chambers 11/12, an exhaust pipe 16 are arranged on the side of the upper chamber 11, and the bottom of the containing space 13 is provided with a drain pipe 17; a first impeller 21 is arranged at In the upper chamber 11; a second impeller 22 is arranged in the accommodating space 13, a filter screen 31, showing a grid shape, is arranged on the periphery of the blades of the second impeller 22; a motor 40, Set at the top of the waste gas treatment container 10, its motor shaft 41 is connected to the first impeller 21 and the second impeller 22 and synchronously drives its blades 23 to rotate; a water inlet pipe 51 is provided with a plurality of spray holes 52, Enter the inner edge 24 of the second impeller 22 to introduce the washing water W1; an air inlet pipe 61 communicates with the accommodating space 13 to introduce the exhaust gas G1 laterally.
承上，令幫浦(圖未示)加壓之洗淨水W1自該進水管51導入再經該噴水孔52自該第二葉輪22之內緣24向四周噴灑，則該洗淨水W1將在該濾網31之網格上附著而形成水膜W2；再令廢氣G1自該第二葉輪22之外緣吸入而通過水膜W2，則廢氣G1中之微粒將與該水膜W2相互融和成更大水珠W3，經該第二葉輪22之葉片23旋轉，水珠W3將承受高速離心力之作用而甩出該第二葉輪22之外，則水珠W3將落入該容置空間13之底部後，再經該排水管17導出該廢氣處理
容器10之外部；而已分離出微粒之乾淨氣體G2則進入該第二葉輪22之內緣24，再透過該第一葉輪21之抽引而流經該通道14、下腔室12、導氣通路15後進入該上腔室11，再經該排氣管16排放至該廢氣處理容器10之外部。
In addition, the washing water W1 pressurized by the pump (not shown) is introduced from the
請進一步參閱圖4A~5B所示，為本發明中其第二葉輪22裝設濾網31之結構；其中，該第二葉輪22包含有葉片23與旋轉軸25，該旋轉軸25係與馬達軸41連結而使其葉片23被馬達40帶動而旋轉；而濾網31除了呈現網格狀之外，也配合葉片23型態而作成圓筒狀；本發明中該濾網31係以焊接方式固設於第二葉輪22的周緣，但固接的方式並不以焊接為限，且固設的位置包括：該濾網31係固設在該第二葉輪22其葉片23之內周緣，如圖4B~4C所示。或該濾網31固設在該第二葉輪22其葉片23之外周緣，如圖5A~5B所示。或是該濾網31係有兩層，一層固設在該第二葉輪22其葉片23之外周緣，另一層則固設在該第二葉輪22其葉片23之內周緣，如圖5C所示。再者，亦可如圖5D所示，該濾網31的網格係直接成型在該第二葉輪22的葉片23或其周緣上。
Please further refer to Figures 4A to 5B, which is a structure in which the
再者，圖6所示，為本發明葉輪式廢氣處理裝置100之第二實施例結構，其包含有：一廢氣處理容器10，設有一上腔室11、及一容置空間13，該容置空間13之外緣設有一通孔18及一導氣通路15以連結該上腔室11，一排氣管16，設於該上腔室11之側邊，且該容置空間13之底部設有一排水管17；一第一葉輪21，係設置於該上腔室11內；一第二葉輪22，則設置於該容置空間13內，一濾網31，呈現網格狀，係設置在該第二葉輪22其葉片之周緣；一馬達40，設置於該廢氣處理容器10之頂端，其馬達軸41與該第一葉輪21及該第二葉輪22連結並同步帶動其葉片23旋轉；一進水管51，設有複數個噴水孔52，係置入該第二葉輪22之內緣24以導入洗淨水W1；一進氣管61，係與該容置空間13連通並自其下方將廢氣G1導入該第二葉輪22之內緣24。 Furthermore, FIG. 6 shows the structure of the second embodiment of the impeller type exhaust gas treatment device 100 of the present invention, which includes: an exhaust gas treatment container 10 provided with an upper chamber 11 and an accommodating space 13, which contains A through hole 18 and an air passage 15 are provided on the outer edge of the accommodating space 13 to connect the upper chamber 11 and an exhaust pipe 16 on the side of the upper chamber 11 and at the bottom of the accommodating space 13 A drain pipe 17 is provided; a first impeller 21 is arranged in the upper chamber 11; a second impeller 22 is arranged in the accommodating space 13, and a filter screen 31 is grid-shaped and arranged At the periphery of the blades of the second impeller 22; a motor 40 is arranged at the top of the exhaust gas treatment container 10, and the motor shaft 41 is connected with the first impeller 21 and the second impeller 22 and synchronously drives the blade 23 to rotate; A water inlet pipe 51 is provided with a plurality of water spray holes 52, which are inserted into the inner edge 24 of the second impeller 22 to introduce the washing water W1; an air inlet pipe 61 is connected to the accommodating space 13 and extends from below it The exhaust gas G1 is introduced into the inner edge 24 of the second impeller 22.
承上，令幫浦(圖未示)加壓之洗淨水W1自該進水管51導入再經該噴水
孔52自該第二葉輪22之內緣24向四周噴灑，則該洗淨水W1將在該濾網31之網格上附著而形成水膜W2；再令廢氣G1自該第二葉輪22之內緣24向外導出而通過水膜W2，則廢氣G1中之微粒將與該水膜W2相互融和成更大水珠W3，經該第二葉輪22之葉片23旋轉，水珠W3將承受高速離心力之作用而甩出該第二葉輪22之外，則水珠W3將落入該容置空間13之底部後，再經該排水管17導出該廢氣處理容器10之外部；而已分離出微粒之乾淨氣體G2則被導出該第二葉輪22之外緣，再透過該第一葉輪21之抽引而流經該通孔18、導氣通路15後進入該上腔室11，再經該排氣管16排放至該廢氣處理容器10之外部。
Continuing the above, make the pump (not shown) pressurized washing water W1 introduced from the
本發明係利用在第二葉輪22周緣固設濾網31使洗淨水W1在網格上形成水膜W2，再使廢氣G1因第二葉輪22的旋轉而被吸入(第一實施例)或被導出(第二實施例)，則廢氣G1將通過存在網格上的水膜W2；由於水膜W2好似天羅地網一般，完全阻絕了次微米微粒其不規則性運動的路徑，則廢氣G1中的微粒幾可全部捕捉；因此本發明可以有效移除半導體製程中對環境有害的次微米(小於1μm)微粒，達到廢氣潔淨化之成效。再者，本發明係以第二葉輪22來捕捉廢氣G1中的微粒，再以第一葉輪21來排出已潔淨化的乾淨氣體G2，而兩部葉輪21/22係應用同一個馬達40來同步帶動其葉片23旋轉，不似習知的廢氣處理裝置需另設大馬力的風機來排放已處理過的廢氣；因此本發明具有減少設備投資與耗能以及減少空間浪費之效益。
The present invention uses a
綜上所述，本發明所揭示之技術手段，確具「新穎性」、「進步性」及「可供產業利用」等發明專利要件，祈請 鈞局惠賜專利，以勵發明，無任德感。 To sum up, the technical means disclosed in the present invention do have the requirements of invention patents such as "novelty", "progressiveness" and "available for industrial use". I hope that the Jun Bureau will grant patents to encourage invention without any responsibility. Sense of virtue.
惟，上述所揭露之圖式、說明，僅為本發明之較佳實施例，大凡熟悉此項技藝人士，依本案精神範疇所作之修飾或等效變化，仍應包括在本案申請專利範圍內。 However, the drawings and descriptions disclosed above are only preferred embodiments of the present invention. Anyone who is familiar with the art and makes modifications or equivalent changes based on the spirit of the case should still be included in the scope of the patent application in this case.
10:廢氣處理容器 10: Waste gas treatment container
11:上腔室 11: Upper chamber
12:下腔室 12: Lower chamber
13:容置空間 13: accommodating space
14:通道 14: Channel
15:導氣通路 15: Airway
16:排氣管 16: Exhaust pipe
17:排水管 17: Drain pipe
21:第一葉輪 21: The first impeller
22:第二葉輪 22: The second impeller
23:葉片 23: blade
24:第二葉輪之內緣 24: Inner edge of the second impeller
31:濾網 31: Filter
40:馬達 40: Motor
41:馬達軸 41: Motor shaft
51:進水管 51: Inlet pipe
52:噴水孔 52: spray hole
61:進氣管 61: intake pipe
100:葉輪式廢氣處理裝置 100: Impeller type exhaust gas treatment device
G1:廢氣 G1: Exhaust gas
G2:乾淨氣體 G2: Clean gas
W1:洗淨水 W1: Washing water
W2:水膜 W2: Water film
W3:水珠 W3: Water drops
Claims (6)
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| Application Number | Priority Date | Filing Date | Title |
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| TW109124614A TWI720922B (en) | 2020-07-21 | 2020-07-21 | Impeller type exhaust gas treatment device |
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| Application Number | Priority Date | Filing Date | Title |
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| TW109124614A TWI720922B (en) | 2020-07-21 | 2020-07-21 | Impeller type exhaust gas treatment device |
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| Publication Number | Publication Date |
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| TWI720922B true TWI720922B (en) | 2021-03-01 |
| TW202204031A TW202204031A (en) | 2022-02-01 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2536289Y (en) * | 2001-10-08 | 2003-02-19 | 江崇侠 | Desulfurizing dust collector by vortex wet method |
| US20130025462A1 (en) * | 2009-08-14 | 2013-01-31 | Jangshik Yun | Centrifugal, wet-type air cleaner |
| WO2013141549A1 (en) * | 2012-03-19 | 2013-09-26 | Yun Jangshik | Centrifugal-type wet air purifier |
| TW201814218A (en) * | 2016-10-14 | 2018-04-16 | 吳聰長 | Oil fume filtering device capable of preventing the filtering cartridge from being attached with a great amount of oil dirt |
| TWM588577U (en) * | 2019-08-19 | 2020-01-01 | 智和股份有限公司 | Supergravity purification device for exhaust gas |
-
2020
- 2020-07-21 TW TW109124614A patent/TWI720922B/en active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2536289Y (en) * | 2001-10-08 | 2003-02-19 | 江崇侠 | Desulfurizing dust collector by vortex wet method |
| US20130025462A1 (en) * | 2009-08-14 | 2013-01-31 | Jangshik Yun | Centrifugal, wet-type air cleaner |
| WO2013141549A1 (en) * | 2012-03-19 | 2013-09-26 | Yun Jangshik | Centrifugal-type wet air purifier |
| TW201814218A (en) * | 2016-10-14 | 2018-04-16 | 吳聰長 | Oil fume filtering device capable of preventing the filtering cartridge from being attached with a great amount of oil dirt |
| TWM588577U (en) * | 2019-08-19 | 2020-01-01 | 智和股份有限公司 | Supergravity purification device for exhaust gas |
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| TW202204031A (en) | 2022-02-01 |
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