TWI687291B - Triple handling forks robot structure and angle monitoring module thereof - Google Patents
Triple handling forks robot structure and angle monitoring module thereof Download PDFInfo
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Abstract
Description
本發明為一種三重托叉式之機械手臂結構及其角度監測模組,其特別為一種應用於半導體光阻塗佈顯影機中,對晶圓片進行搬移之三重托叉式之機械手臂及其手臂模組/吸附式牙叉臂/托夾式牙叉臂結構。 The invention is a triple fork-type mechanical arm structure and its angle monitoring module, which is especially a triple fork-type mechanical arm and its application in semiconductor photoresist coating and developing machine to move wafers and its Arm module/adsorption type fork arm/support clip type fork arm structure.
如第1A圖至第1B圖所示,有關半導體的製造技術,在黃光製程中,光阻塗佈機可說是第一站,因此塗佈機的穩定及均勻性,可說是決定製程良莠的首站關卡。為了達到自動化生產,一般均藉由塗佈機加以大量生產及製造,而塗佈機內設有雙牙叉臂的機械手臂P100,其具有一第一牙叉臂310及一第二牙叉臂320,又每一牙叉臂設有一晶圓片托盤。
As shown in Figures 1A to 1B, regarding the semiconductor manufacturing technology, in the yellow light process, the photoresist coating machine can be said to be the first station, so the stability and uniformity of the coating machine can be said to determine the process Liangju's first stop. In order to achieve automated production, it is generally mass-produced and manufactured by a coating machine, and the coating machine is equipped with a double-prong arm mechanical arm P100, which has a
塗佈機內依照製程的順序,大致設有一卡匣模組(CST),用以在常溫下存放晶圓片900;一對位模組(ALN),用以在常溫下使被搬運的晶圓片900設定正確的位置;一塗佈模組(COT/DEV),一般在23℃的溫度下對晶圓片900進行鍍膜作業;一加熱模組(HPL),一般在120℃的溫度下對
鍍膜後的晶圓片900加熱,以使鍍膜固化成型;固化後的晶圓片900又會再次放回卡匣模組(CST),以便後續的搬運。
In the coating machine, according to the order of the process, there is roughly a cassette module (CST) for storing
如第2圖所示,而上述的製程中,所有晶圓片900的搬運,都必須藉由機器手臂P100加以完成。目前習知的機器手臂P100,均使用雙牙叉臂的機械手臂;又在作業的安排上,兩隻牙叉臂必須頻繁進出塗佈模組(23℃)及加熱模組(120℃),使得兩隻牙叉臂310,320隨著進出的次數增加,不斷的產生升溫現象。累積在兩支牙叉臂上的溫度,也造成不同時期被搬運晶圓片900,產生不同的溫度影響。
As shown in FIG. 2, in the above process, all
經過實際檢測,習知製程使用雙牙叉臂機械手臂時,針對一卡匣模組共25片晶圓片之每一片晶圓片其五個量測點,中央(Center)、底側(Bottom)、右側(Right)、左側(Left)、及頂側(Top)進行膜厚量測,發現當製作到第8片晶圓片時,在上述各量測點的膜厚(Thickness),開始產生了嚴重的膜厚不一致性,這對後續元件的製做,在良率上也將造成嚴重的影響。 After actual inspection, when the conventional manufacturing process uses a double-wish-arm mechanical arm, it has five measurement points for each wafer of 25 wafers in a cassette module, Center and Bottom. ), the right side (Right), the left side (Left), and the top side (Top) film thickness measurement, found that when the eighth wafer is produced, the film thickness (Thickness) at each measurement point above, start A serious film thickness inconsistency is generated, which will also have a serious impact on the yield of subsequent components.
造成上述膜厚不一致所產生的均勻性(Uniformity)問題,其主要的原因是因為習知使用兩支牙叉臂310,320進行全流程的搬運,牙叉臂310,320被加工後的熱晶圓片持續加熱後,造成後續待鍍膜晶圓片,在搬運過程中就開始被具有餘熱之牙叉臂所加熱,導致進塗佈模組(COT/DEV)的晶圓片,其表面温度已經被熱的牙叉臂310,320所影響,以致塗佈模組生產的晶圓片膜厚均勻度(U%)也受到嚴重的影響。因此如何有效克服膜厚不一致的問題,已經成為半導體製程中一項重要的課題。
The main reason for the uniformity (Uniformity) problem caused by the above-mentioned film thickness inconsistency is that it is known to use two
本發明為一種三重托叉式之機械手臂結構及其角度監測模組,其主要是要解決機械手臂設計及使用上造成晶圓片生產時,膜厚不均勻、水平旋轉位置不精準、晶圓片夾持不當及機械手臂維修不易…等問題。 The invention is a triple fork-type mechanical arm structure and its angle monitoring module, which is mainly to solve the problem of uneven film thickness, inaccurate horizontal rotation position and wafers during wafer production caused by the design and use of the mechanical arm Problems such as improper clamping of the film and maintenance of the robot arm are not easy.
本發明提供一種三重托叉式之機械手臂結構,其包括:一支撐框架,其內側設有一滑軌;一升降模組,其具有一升降座,又藉由一升降驅動單元之驅動,使升降座可上、下滑動的結合於滑軌;一旋轉模組,其具有一旋轉桿,又藉由一水平旋轉驅動單元之驅動,使旋轉桿可水平旋轉的設置於升降座上;以及一手臂模組,其具有:一手臂框架,其固設於旋轉桿之頂端;一第一牙叉臂,其藉由一第一驅動單元,伸縮滑動的結合於手臂框架;一第二牙叉臂,其藉由一第二驅動單元,伸縮滑動的結合於手臂框架;一第三牙叉臂,其藉由一第三驅動單元,伸縮滑動的結合於手臂框架;其中第一牙叉臂、第二牙叉臂、及第三牙叉臂均為一板狀且彼此上下平行並列之結構。 The invention provides a triple fork-type mechanical arm structure, which includes: a support frame with a slide rail inside; a lifting module with a lifting seat, which is driven by a lifting driving unit to make the lifting The seat can be combined with the slide rail up and down; a rotating module with a rotating rod, which is driven by a horizontal rotating drive unit, so that the rotating rod can be horizontally arranged on the lifting seat; and an arm The module has: an arm frame fixed on the top of the rotating rod; a first prong arm, which is telescopically coupled to the arm frame by a first drive unit; a second prong arm, It is telescopically coupled to the arm frame by a second drive unit; a third prong arm is telescopically coupled to the arm frame by a third drive unit; wherein the first prong arm and the second The tine fork arm and the third tine fork arm are both a plate-like structure parallel to each other up and down.
本發明又提供一種角度監測模組,其係應用於上述之一種三重托叉式之機械手臂結構中,又角度監測模組具有:一旋轉位置件,其係固設於一旋轉桿一側;以及複數個位置感測件,其係設置於旋轉桿之旋轉半徑上,當任一位置感測件與旋轉位置件產生重疊時,產生一位置訊號。 The invention also provides an angle monitoring module, which is applied to the above-mentioned three-fold fork type mechanical arm structure, and the angle monitoring module has: a rotating position piece, which is fixed on a side of a rotating rod; And a plurality of position sensing elements, which are arranged on the rotation radius of the rotating rod, and when any position sensing element overlaps with the rotating position element, a position signal is generated.
藉由本發明之實施,至少可以達成下列之進步功效: Through the implementation of the present invention, at least the following improved effects can be achieved:
一、可以有效的改善膜厚不均勻的問題。 1. It can effectively improve the problem of uneven film thickness.
二、可以精準監控旋轉桿及機械手臂的水平旋轉位置。 Second, it can accurately monitor the horizontal rotation position of the rotating rod and the mechanical arm.
三、可以穩固有效的夾持晶圓片並進行搬移。 3. It can firmly and effectively hold the wafer and move it.
四、可以更方便的使機械手臂平移,以方便維修。 4. The robot arm can be moved more conveniently to facilitate maintenance.
為了使任何熟習相關技藝者了解本發明之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易的理解本發明相關之目的及優點,因此將在實施方式中詳細敘述本發明之詳細特徵以及優點。 In order to let any person skilled in the art understand the technical content of the present invention and implement it accordingly, and according to the content, patent application scope and drawings disclosed in this specification, any person skilled in the art can easily understand the purpose and advantages related to the present invention Therefore, the detailed features and advantages of the present invention will be described in detail in the embodiments.
P100:習知雙牙叉臂的機械手臂 P100: The mechanical arm of the conventional double-wish-fork arm
100:三重托叉式之機械手臂結構 100: Triple-arm type robot arm structure
10:支撐框架 10: Support frame
110:滑軌 110: Slide rail
20:升降模組 20: Lifting module
210:升降座 210: Lifting seat
211:升降驅動單元 211: Lifting drive unit
212:升降螺桿 212: Lifting screw
25:旋轉模組 25: Rotating module
220:旋轉桿 220: Rotating rod
221:水平旋轉驅動單元 221: Horizontal rotation drive unit
230:角度監測模組 230: Angle monitoring module
231:旋轉位置件 231: Rotating position piece
232:位置感測件 232: Position sensor
233:歸位感測件 233: Homing sensor
234:正角度位置感測件 234: Positive angle position sensor
235:負角度位置感測件 235: Negative angle position sensor
30:手臂模組 30: Arm module
301:手臂框架 301: Arm frame
302:平行滑軌 302: parallel rail
310:第一牙叉臂 310: The first fork arm
311:第一驅動單元 311: First drive unit
320:第二牙叉臂 320: second fork arm
321:第二驅動單元 321: Second drive unit
330:第三牙叉臂 330: Third fork arm
331:第三驅動單元 331: Third drive unit
340:散熱模組 340: Cooling module
341:複數個開孔 341: plural openings
350:晶圓片感測單元 350: Wafer sensing unit
360:吸附式牙叉臂 360: adsorption fork arm
361:托盤 361: Tray
362:支撐件 362: Support
363:真空吸附件 363: vacuum suction parts
364:吸氣孔 364: suction hole
365:環狀吸氣槽 365: annular suction trough
366:連通氣槽 366: Connect the air tank
370:托夾式牙叉臂 370: Bracket type fork arm
371:托夾部 371: Holder
372:檔塊托盤 372: Block tray
373:伸縮夾 373: Telescopic clip
374:檔塊 374: Block
375:夾持塊 375: clamping block
376:汽壓缸 376: Cylinder
380:冷卻流道 380: cooling runner
390:噴氣單元 390: Jet unit
391:氣體流道 391: Gas channel
392:噴氣口 392: Jet port
40:控制單元 40: control unit
50:維修模組 50: maintenance module
510:底盤 510: Chassis
520:頂盤 520: Top plate
530:平移滑軌 530: Pan slide
540:防滑卡塊 540: Non-slip card block
550:手動閥 550: Manual valve
560:頂升氣缸 560: jacking cylinder
900:晶圓片 900: Wafer
CST:卡匣模組 CST: cassette module
ALN:對位模組 ALN: alignment module
COT/DEV:塗佈模組 COT/DEV: coating module
HPL:加熱模組 HPL: heating module
M:伺服馬達 M: servo motor
B:皮帶 B: belt
HOME:初始位置 HOME: initial position
[第1A圖]為習知之一種雙牙叉臂的機械手臂之側視圖;[第1B圖]為習知雙牙叉臂應用於塗佈機之製程循序圖;[第2圖]為習知以雙牙叉臂搬運晶圓片產生不同膜厚及均勻性之檢測圖;[第3圖]為本發明之一種三重托叉式之機械手臂實施例圖;[第4圖]為本發明之一種升降模組實施例圖;[第5圖]為本發明之一種旋轉模組角度監測模組實施例圖;[第5A圖]為本發明之一種角度監測模組實施例圖;[第6圖]為本發明之一種手臂模組之分解實施例圖;[第7A圖]為本發明之一種吸附式牙叉臂之施例圖;[第7B圖]為本發明之一種托夾式牙叉臂之施例圖;[第8A圖]為本發明之一種具有冷卻流道及氣道之吸附式牙叉臂施例圖;[第8B圖]為本發明之一種具有冷卻流道及氣道之托夾式牙叉臂之施例圖;[第9圖]為習知與本發明機械手臂應用於塗佈機製程之循序對照施例圖;[第10圖]為習知與本發明機械手臂之膜厚及均勻性檢測對照圖; [第11圖]為使用習知與本發明機械手臂之塗佈機製程效能對照圖;[第12A圖]為本發明之一種維修模組立體實施例圖;[第12B圖]為本發明之一種維修模組分解實施例圖;[第12C圖]為本發明之一種維修模組鎖固狀態實施例圖;以及[第13圖]為本發明之一種電路架構實施例圖。 [Picture 1A] is a side view of a conventional double-wish-fork arm mechanical arm; [Picture 1B] is a sequential diagram of the conventional double-wish-fork arm applied to a coating machine; [Picture 2] is a conventional The inspection graphs of different film thickness and uniformity are produced when the wafers are transported by the double-pronged fork arms; [Picture 3] is an embodiment of a three-fold fork-type robot arm of the invention; [Picture 4] is the invention An embodiment diagram of a lifting module; [Figure 5] is an embodiment diagram of a rotation module angle monitoring module of the present invention; [Figure 5A] is an embodiment diagram of an angle monitoring module of the present invention; [第6 [Figure 7] is an exploded embodiment diagram of an arm module of the present invention; [Figure 7A] is an embodiment diagram of an adsorption fork arm of the present invention; [Figure 7B] is a bracket-type tooth of the present invention [Picture 8A] is an embodiment of an adsorption tine fork arm with cooling flow channels and air channels; [Picture 8B] is a embodiment of the invention having cooling flow channels and air channels Example drawing of the bracket-type fork arm; [Figure 9] is a sequential comparison example of the application of the mechanical arm of the conventional and the present invention to the coating mechanism; [Figure 10] is the mechanical arm of the conventional and the present invention Comparison chart of film thickness and uniformity detection; [Figure 11] is a comparison chart of the coating mechanism performance of the conventional and the robot arm of the present invention; [Figure 12A] is a three-dimensional embodiment of a maintenance module of the present invention; [Figure 12B] is the present invention A diagram of an exploded embodiment of a maintenance module; [Figure 12C] is a diagram of an embodiment of a locked state of a maintenance module of the present invention; and [Figure 13] is a diagram of an embodiment of a circuit architecture of the present invention.
如第3圖所示,本發明提供一種三重托叉式之機械手臂結構100,其包括:一支撐框架10;一升降模組20;以及一手臂模組30。
As shown in FIG. 3, the present invention provides a triple-arm type
手臂模組30,其又具有:一手臂框架301;一第一牙叉臂310;一第二牙叉臂320;以及一第三牙叉臂330。其中第三牙叉臂330負責對位模組(ALN)與塗佈模組(COT/DEV)間之晶圓片900搬運,藉此以漸少牙叉臂310,320,330上之餘熱,造成製程上晶圓片900膜厚均勻性不佳的問題。
The
如第3圖所示,支撐框架10,其主要是作為整個機械手臂之支撐結構,支撐框架10之一內側設有一滑軌110,用以引導升降模組20進行上、下移動。
As shown in FIG. 3, the supporting
如第4圖所示,升降模組20,其具有一升降座210,又升降座210藉由一升降驅動單元211之驅動,例如是一伺服馬達M藉由皮帶B驅動一升降螺桿212,然後使升降座210可上、下滑動的結合於滑軌110。當升降驅動單元211,其使升降座210完成上、下滑動時,整個機械手臂100也同時完成上、下移動之動作。
As shown in FIG. 4, the
如第5圖所示,旋轉模組25,其具有一旋轉桿220,其可水平旋轉的設置於升降座210上;旋轉桿220其藉由一水平旋轉驅動單元221之驅動,例如是一伺服馬達M驅動一皮帶B然後又帶動旋轉桿220旋轉,進而使整個機械手臂100完成水平旋轉動作。
As shown in FIG. 5, the rotating
如第5A圖所示,為了有效的完成鍍膜機的調校及控制,因此有必要掌握或控制機械手臂100其旋轉位置狀態;因此、旋轉桿220可進一步設有一角度監測模組230,角度監測模組230其具有:一旋轉位置件231;以及複數個位置感測件232。
As shown in FIG. 5A, in order to effectively complete the adjustment and control of the coating machine, it is necessary to grasp or control the rotation position of the
旋轉位置件231,其係固設於旋轉桿220一側,旋轉位置件231將隨著旋轉桿220進行同步旋轉;此外、旋轉位置件231又配合設置於旋轉桿220旋轉半徑上的複數個位置感測件232,當任一位置感測件232與旋轉位置件231產生重疊或訊號耦合時,即可以藉由例如磁感應或光電訊號之檢測,而產生一位置訊號。
The
上述之位置感測件232,可以包括一機械手臂回到初始位置,用以偵測一歸位訊號(HOME)的歸位感測件233,或一正角度位置的正角度位置感測件234,或者一負角度位置的負角度位置感測件235;藉由上述位置訊號,即可達到有效操作機械手臂100,及使機械手臂100操作在安全範圍的目的。
The
如第6圖所示,手臂模組30,其具有:一手臂框架301;一第一牙叉臂310;一第二牙叉臂320;以及一第三牙叉臂330。藉由手臂框架301,可以有效的使第一牙叉臂310、第二牙叉臂320、以及第三牙叉臂330獲得穩固的結構支撐,同時也能穩定的運作。
As shown in FIG. 6, the
手臂框架301,其固設於旋轉桿220之頂端,因此手臂框架301會隨著旋轉桿220進行同步旋轉;手臂框架301其內部設有三組平行滑軌302,分別用以與第一牙叉臂310、第二牙叉臂320、及第三牙叉臂330結合。又第一牙叉臂310、第二牙叉臂320、及第三牙叉臂330,其均為一板狀且彼此上、下平行並列之結構。
The
第一牙叉臂310、第二牙叉臂320、及第三牙叉臂330係分別以一第一驅動單元311、一第二驅動單元321、及一第三驅動單元331,例如是一伺服馬達M驅動一皮帶B,然後又分別帶動第一牙叉臂310、第二牙叉臂320、及第三牙叉臂330,於該些平行滑軌302內保持水平又可伸縮的滑動。
The
為了讓第一牙叉臂310、第二牙叉臂320、及第三牙叉臂330,有更好的散熱效果,因次在第二牙叉臂320之托盤與第三牙叉臂330之托盤間,可進一步設置一散熱模組340,又散熱模組340可以是一平板,又平板具有複數個開孔341;藉此、散熱模組340不但能阻隔牙叉臂間的熱傳導或熱輻射,也可以使塗佈機台內部之下降氣流,能快速的穿過散熱模組340進行降溫。
In order to allow the
當手臂模組30於晶圓卡匣中取片時,為了精準的掌握每一卡匣內是否仍有晶圓片900的存在,因此在手臂模組30之取片側,可以設有一晶圓片感測單元350,其可以藉由例如紅外線或雷射之光學感測,辨識出卡匣內是否有待製作的晶圓片900。
When the
第7A圖所示,吸附式牙叉臂360,為了穩固的夾持晶圓片900,第一牙叉臂310、第二牙叉臂320、或第三牙叉臂330其可以為一吸附式牙叉臂360。
As shown in FIG. 7A, the
吸附式牙叉臂360其係於第一牙叉臂310、第二牙叉臂320、或第三牙叉臂330之端部形成具有一托盤361,又托盤361可以為一雙叉子狀平板。此外,托盤361可以設有複數個相對稱之支撐件362及複數個相對稱之真空吸附件363,以有效吸附晶圓片900。
The suction-
真空吸附件363具有一吸氣孔364,將吸氣孔364藉由一管線進行抽氣,如此可以有效的吸附住晶圓片900。又真空吸附件363之頂面,可設有一環狀吸氣槽365,又環狀吸氣槽365與吸氣孔364係藉由至少一連通氣槽366相互連通。如此可以增加晶圓片900的吸附面積。
The
第7B圖所示,托夾式牙叉臂370,除了上述的吸附式牙叉臂360外,第一牙叉臂310、第二牙叉臂320、或第三牙叉臂330亦可以為一托夾式牙叉臂370。
As shown in FIG. 7B, in addition to the above-mentioned suction-
托夾式牙叉臂370,其同樣於第一牙叉臂310、第二牙叉臂320、或第三牙叉臂330之端部,形成具有一托夾部371,又托夾部371具有:一檔塊托盤372;以及一伸縮夾373。
A bracket-
檔塊托盤372,其可以為一雙叉子狀平板,用以托住晶圓片900,又於每一叉子端部設有一檔塊374,以防止晶圓片900滑脫;此外托夾部371又具有一伸縮夾373,其亦為一雙叉子結構,在每一端部設有一夾持塊375。伸縮夾373設置於檔塊托盤372上方,並位於檔塊374相對之另一側。
The
伸縮夾373係藉由一汽壓缸376之帶動,進行一夾放移動,也就是說,當晶圓片900置放於檔塊托盤372上時,托夾式牙叉臂370藉由檔塊托盤372托住晶圓片900,又藉由檔塊374、夾持塊375在汽壓缸376帶動、及到位磁簧377的偵測下進行一夾放移動;夾持後即可進行晶圓片900的搬
移動作,又當晶圓片900移動到定位時,伸縮夾373進行一釋放動作,然後置放晶圓片900。
The
如第8A圖及第8B圖所示,上述之第一牙叉臂310、第二牙叉臂320、或第三牙叉臂330也就是吸附式牙叉臂360或托夾式牙叉臂370,均可分別再進一步具有一冷卻流道380及/或一噴氣單元390;冷卻流道380係藉由冷卻液體在第一牙叉臂310、第二牙叉臂320、或第三牙叉臂330內流動,將第一牙叉臂310、第二牙叉臂320、或第三牙叉臂330上所累積的餘熱去除;而噴氣單元390係藉由氣體流道391傳輸冷卻空氣,並藉由噴氣口392向晶圓片900吹送,藉此加速晶圓片900的冷卻。
As shown in FIG. 8A and FIG. 8B, the
如第9圖所示,設計成三隻牙叉臂310,320,330,其主要是在鍍膜機的應用上,藉由控制單元40將第一牙叉臂310及第二牙叉臂320,應用於卡匣模組(CST)至對位模組(ALN)間、塗佈模組(COT/DEV)與加熱模組(HPL)間、或者進一步應用於冷卻模組(CST)製程前後之晶圓片900搬運。
As shown in Fig. 9, it is designed as three
又藉由控制單元40將第二牙叉臂320,應用於對位模組(ALN)與塗佈模組(COT/DEV)間的晶圓片900搬運,如此可以避免牙叉臂310,320殘餘溫度,使晶圓片900於鍍膜前產生不均勻加熱,進而克服晶圓片900製程上膜厚不均勻的問題。
The
如第10圖所示,以與習知相同的5個量測點,針對25片晶圓片900進行習知雙叉臂(Two Handling Forks)與本實施例三叉臂(Triple Handling Forks)之對照測試,可以清楚的得知,習知膜厚均勻(Uniformity)度係大於3%,而本實施例之膜厚均勻度係小於或等於0.7%。
As shown in FIG. 10, using the same 5 measurement points as the conventional one, the comparison between the conventional two-handling forks and the three-handling forks of this embodiment is performed for 25
此外、在習知雙叉臂(Two Handling Forks)的檢測,可以得知在底側(Bottom)、左側(Left)、及頂側(Top)三個量測點的膜厚,從第8片晶圓片900開始產生膜厚變厚的問題;而本實施例三叉臂(Triple Handling Forks)的檢測結果顯示,膜厚不均勻的現象已經被有效的被克服了。
In addition, in the conventional two-handling forks (Two Handling Forks) test, you can know the thickness of the three measurement points on the bottom side (Bottom), left side (Left), and top side (Top), from the eighth piece The
第11圖所示,由產能試驗得知,當增加使用冷卻模組(CPL)製程時,即使增加了第三牙叉臂(X3),每小時機臺產出晶片數(WPH)依然維持在145片;假若在不使用冷卻模組(CPL)製程時,每小時機臺產出晶片數(WPH)也是維持在180片。 As shown in Figure 11, from the capacity test, when the cooling module (CPL) process is added, even if the third fork arm (X3) is added, the number of wafers per hour (WPH) is still maintained at 145 wafers; if the cooling module (CPL) process is not used, the number of wafers per hour (WPH) of the machine is also maintained at 180 wafers.
在上述在產能相同的情況下,再次就膜厚均勻度(U%)進行比較實則發現,測試代碼(Test ID)為U%-X1X2X3+CPL及U%-X1X2X3者,是本實施例三叉臂(Triple Handling Forks)的部分,其膜厚均勻度(U%)顯然比測試代碼(Test ID)為U%-X1X2及U%-X1X2+CPL使用習知雙叉臂(Two Handling Forks)的部分,有更佳的表現。 In the above case under the same production capacity, the film thickness uniformity (U%) is again compared and it is found that the test code (Test ID) is U%-X1X2X3+CPL and U%-X1X2X3, which is the trigeminal arm of this embodiment (Triple Handling Forks), the film thickness uniformity (U%) is obviously better than the test code (Test ID) of U%-X1X2 and U%-X1X2+CPL using the conventional two-handling forks (Two Handling Forks) , With better performance.
第12A圖至第12C圖所示,維修模組50,其為一滑動托盤,維修模組50,其具有一底盤510及一頂盤520,底盤510及頂盤520係藉由一組平移滑軌530相互滑動連接。
As shown in FIGS. 12A to 12C, the
維修模組50之設計,主要是為了方便對整個三重托叉式之機械手臂100進行維修。應用時,藉由支撐框架10固設於頂盤520上;當維修時,三重托叉式之機械手臂100可以藉由維修模組50的平移,將機械手臂100從塗佈機之中央位置移至側邊位置,以方便維修。
The design of the
為了確保維修模組50在應用時的穩固及安全,當維修模組50在塗佈機中央位置處於鍍膜作業狀態時,此時可操作手動閥550,使頂升氣缸560讓防滑卡塊540與頂盤520相干涉,因此頂盤520被鎖固不動;當維修模組50欲進行維修時,可操作手動閥550,使頂升氣缸560讓防滑卡塊540與頂盤520相脫離,因此頂盤520被釋放可以平移,並使三重托叉式之機械手臂100進行位置移動。
In order to ensure the stability and safety of the
第13圖所示,控制單元40,為了使上述的操作流程可以自動化的完成,因此本實施例之升降模組20、旋轉模組25、手臂模組30、及維修模組50可藉由可程式化的控制單元40,進一步完成相關自動化生產作業。
As shown in FIG. 13, the
惟上述各實施例係用以說明本發明之特點,其目的在使熟習該技術者能瞭解本發明之內容並據以實施,而非限定本創作之專利範圍,故凡其他未脫離本發明所揭示之精神而完成之等效修飾或修改,仍應包含在以下所述之申請專利範圍中。 However, the above embodiments are used to illustrate the characteristics of the present invention, and its purpose is to enable those skilled in the art to understand the content of the present invention and implement it accordingly, rather than limiting the scope of the patent of this creation, so any other The equivalent modification or modification done by the spirit of disclosure should still be included in the scope of the patent application described below.
100:三重托叉式之機械手臂結構 100: Triple-arm type robot arm structure
10:支撐框架 10: Support frame
110:滑軌 110: Slide rail
20:升降模組 20: Lifting module
210:升降座 210: Lifting seat
211:升降驅動單元 211: Lifting drive unit
25:旋轉模組 25: Rotating module
220:旋轉桿 220: Rotating rod
221:水平旋轉驅動單元 221: Horizontal rotation drive unit
30:手臂模組 30: Arm module
301:手臂框架 301: Arm frame
310:第一牙叉臂 310: The first fork arm
311:第一驅動單元 311: First drive unit
320:第二牙叉臂 320: second fork arm
321:第二驅動單元 321: Second drive unit
330:第三牙叉臂 330: Third fork arm
331:第三驅動單元 331: Third drive unit
340:散熱模組 340: Cooling module
Claims (11)
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Citations (4)
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JPH10256344A (en) * | 1997-03-13 | 1998-09-25 | Tokyo Electron Ltd | Method of cooling substrate, substrate treating apparatus and substrate transferring apparatus |
JP2001253536A (en) * | 2000-03-09 | 2001-09-18 | Hirata Corp | Substrate transfer robot device |
JP2011119348A (en) * | 2009-12-01 | 2011-06-16 | Kawasaki Heavy Ind Ltd | Edge grip device, and robot with the same |
US9401296B2 (en) * | 2011-11-29 | 2016-07-26 | Persimmon Technologies Corporation | Vacuum robot adapted to grip and transport a substrate and method thereof with passive bias |
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2018
- 2018-10-08 TW TW107135374A patent/TWI687291B/en active
Patent Citations (4)
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JPH10256344A (en) * | 1997-03-13 | 1998-09-25 | Tokyo Electron Ltd | Method of cooling substrate, substrate treating apparatus and substrate transferring apparatus |
JP2001253536A (en) * | 2000-03-09 | 2001-09-18 | Hirata Corp | Substrate transfer robot device |
JP2011119348A (en) * | 2009-12-01 | 2011-06-16 | Kawasaki Heavy Ind Ltd | Edge grip device, and robot with the same |
US9401296B2 (en) * | 2011-11-29 | 2016-07-26 | Persimmon Technologies Corporation | Vacuum robot adapted to grip and transport a substrate and method thereof with passive bias |
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