TWI684002B - 用於產生黑體光譜的裝置、薄膜及方法 - Google Patents

用於產生黑體光譜的裝置、薄膜及方法 Download PDF

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Publication number
TWI684002B
TWI684002B TW104134192A TW104134192A TWI684002B TW I684002 B TWI684002 B TW I684002B TW 104134192 A TW104134192 A TW 104134192A TW 104134192 A TW104134192 A TW 104134192A TW I684002 B TWI684002 B TW I684002B
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TW
Taiwan
Prior art keywords
carbon nanotube
layer
nanotube layer
graphene sheet
heat
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TW104134192A
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English (en)
Chinese (zh)
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TW201625937A (zh
Inventor
詹姆士R 周
柯特S 凱多拉
康史基 大衛M 賴
卡爾W 湯森得
威廉E 艾利亞思
史陶特J 馬擘
Original Assignee
美商瑞西恩公司
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Priority claimed from US14/548,135 external-priority patent/US9459154B2/en
Application filed by 美商瑞西恩公司 filed Critical 美商瑞西恩公司
Publication of TW201625937A publication Critical patent/TW201625937A/zh
Application granted granted Critical
Publication of TWI684002B publication Critical patent/TWI684002B/zh

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/52Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
    • G01J5/53Reference sources, e.g. standard lamps; Black bodies
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/52Radiation pyrometry, e.g. infrared or optical thermometry using comparison with reference sources, e.g. disappearing-filament pyrometer
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/02Semiconductor bodies ; Multistep manufacturing processes therefor
    • H01L29/06Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y20/00Nanooptics, e.g. quantum optics or photonic crystals

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Radiation Pyrometers (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
TW104134192A 2014-11-19 2015-10-19 用於產生黑體光譜的裝置、薄膜及方法 TWI684002B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14/548,135 US9459154B2 (en) 2013-05-15 2014-11-19 Multi-layer advanced carbon nanotube blackbody for compact, lightweight, and on-demand infrared calibration
US14/548,135 2014-11-19

Publications (2)

Publication Number Publication Date
TW201625937A TW201625937A (zh) 2016-07-16
TWI684002B true TWI684002B (zh) 2020-02-01

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW104134192A TWI684002B (zh) 2014-11-19 2015-10-19 用於產生黑體光譜的裝置、薄膜及方法

Country Status (8)

Country Link
EP (1) EP3221673B1 (ko)
JP (1) JP6567666B2 (ko)
KR (1) KR102007588B1 (ko)
CN (1) CN107076617B (ko)
CA (1) CA2962978C (ko)
IL (1) IL251886A0 (ko)
TW (1) TWI684002B (ko)
WO (1) WO2016081293A1 (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3500817B1 (en) * 2016-06-07 2021-01-27 Coskun Kocabas System for controlling thermal radiation
US10248015B2 (en) * 2016-12-22 2019-04-02 Raytheon Company Dynamic blackbody scene display
CN110031104A (zh) 2018-01-11 2019-07-19 清华大学 面源黑体
CN110031103A (zh) * 2018-01-11 2019-07-19 清华大学 面源黑体以及面源黑体的制备方法
CN110031107B (zh) 2018-01-11 2022-08-16 清华大学 黑体辐射源及黑体辐射源的制备方法
CN110031115A (zh) * 2018-01-11 2019-07-19 清华大学 面源黑体
CN110031109A (zh) 2018-01-11 2019-07-19 清华大学 黑体辐射源及黑体辐射源的制备方法
CN110031117A (zh) 2018-01-11 2019-07-19 清华大学 腔式黑体辐射源以及腔式黑体辐射源的制备方法
CN110031108A (zh) 2018-01-11 2019-07-19 清华大学 黑体辐射源及黑体辐射源的制备方法
CN110031106B (zh) * 2018-01-11 2021-04-02 清华大学 黑体辐射源
CN110031118A (zh) 2018-01-11 2019-07-19 清华大学 腔式黑体辐射源以及腔式黑体辐射源的制备方法
CN110031116A (zh) * 2018-01-11 2019-07-19 清华大学 腔式黑体辐射源
CN110031105A (zh) 2018-01-11 2019-07-19 清华大学 腔式黑体辐射源以及腔式黑体辐射源的制备方法
CN111121981B (zh) * 2018-11-01 2021-04-02 清华大学 黑体辐射源的制备方法
CN113375814A (zh) 2020-03-10 2021-09-10 百度在线网络技术(北京)有限公司 红外测温校准方法、装置、电子设备及存储介质

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JPH0729427U (ja) * 1993-10-28 1995-06-02 株式会社日鉄エレックス 放射温度計のオンライン点検装置
JPH0854285A (ja) * 1994-08-11 1996-02-27 Tokai Carbon Co Ltd 黒体炉
TW387992B (en) * 1997-09-16 2000-04-21 Applied Materials Inc Papid thermal processing system for heating a substrate, temperature probe, and mthod for making a temperature probe
JP2011103293A (ja) * 2009-11-10 2011-05-26 Qinghua Univ ヒーター及びその製造方法
JP2012154777A (ja) * 2011-01-26 2012-08-16 National Institute Of Advanced Industrial & Technology 熱放射光源
WO2014176185A1 (en) * 2013-04-26 2014-10-30 3M Innovative Properties Company Heat dissipating sheet

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JPH03257334A (ja) * 1990-03-08 1991-11-15 Chino Corp 放射源
IL148746A0 (en) 2000-07-27 2002-09-12 Bae Systems Information Spectral drift and correction technique for hyperspectral imaging systems
WO2006121461A2 (en) * 2004-09-16 2006-11-16 Nantero, Inc. Light emitters using nanotubes and methods of making same
US7812327B2 (en) * 2004-10-01 2010-10-12 Bae Systems Plc High-emissivity radiator
DE102007004953A1 (de) * 2007-01-26 2008-07-31 Tesa Ag Heizelement
KR101081378B1 (ko) * 2009-11-06 2011-11-08 한국기초과학지원연구원 흑체의 온도제어장치 및 그 제어방법
JP5536436B2 (ja) * 2009-12-22 2014-07-02 スタンレー電気株式会社 黒体放射光源及びその製造方法
US8895997B2 (en) * 2010-04-28 2014-11-25 Keio University Carbon nanotube light emitting device, light source, and photo coupler
US8552381B2 (en) * 2011-07-08 2013-10-08 The Johns Hopkins University Agile IR scene projector
KR20130069035A (ko) * 2011-12-16 2013-06-26 삼성전자주식회사 그래핀상의 하이브리드 나노구조체 형성 방법
KR20130106932A (ko) * 2012-03-21 2013-10-01 에스에스씨피 주식회사 분산성이 향상된 열확산 조성물 및 열확산 시트
US9363932B2 (en) * 2012-06-11 2016-06-07 Nanotek Instruments, Inc. Integrated graphene film heat spreader for display devices
KR101455834B1 (ko) * 2013-04-01 2014-11-03 채경남 그래핀의 피에조 저항 특성을 이용한 스마트 복합재
US9086327B2 (en) * 2013-05-15 2015-07-21 Raytheon Company Carbon nanotube blackbody film for compact, lightweight, and on-demand infrared calibration

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0729427U (ja) * 1993-10-28 1995-06-02 株式会社日鉄エレックス 放射温度計のオンライン点検装置
JPH0854285A (ja) * 1994-08-11 1996-02-27 Tokai Carbon Co Ltd 黒体炉
TW387992B (en) * 1997-09-16 2000-04-21 Applied Materials Inc Papid thermal processing system for heating a substrate, temperature probe, and mthod for making a temperature probe
JP2011103293A (ja) * 2009-11-10 2011-05-26 Qinghua Univ ヒーター及びその製造方法
JP2012154777A (ja) * 2011-01-26 2012-08-16 National Institute Of Advanced Industrial & Technology 熱放射光源
WO2014176185A1 (en) * 2013-04-26 2014-10-30 3M Innovative Properties Company Heat dissipating sheet

Also Published As

Publication number Publication date
EP3221673A1 (en) 2017-09-27
IL251886A0 (en) 2017-06-29
EP3221673B1 (en) 2019-05-29
KR102007588B1 (ko) 2019-08-05
KR20170086578A (ko) 2017-07-26
CN107076617A (zh) 2017-08-18
JP6567666B2 (ja) 2019-08-28
WO2016081293A1 (en) 2016-05-26
CA2962978A1 (en) 2016-05-26
JP2018501469A (ja) 2018-01-18
CN107076617B (zh) 2019-10-08
CA2962978C (en) 2023-03-21
TW201625937A (zh) 2016-07-16

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