TWI676605B - Score apparatus including a score device and methods of scoring a glass ribbon - Google Patents

Score apparatus including a score device and methods of scoring a glass ribbon Download PDF

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Publication number
TWI676605B
TWI676605B TW105127438A TW105127438A TWI676605B TW I676605 B TWI676605 B TW I676605B TW 105127438 A TW105127438 A TW 105127438A TW 105127438 A TW105127438 A TW 105127438A TW I676605 B TWI676605 B TW I676605B
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scoring
support member
glass
rotation axis
rotational movement
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TW105127438A
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TW201722873A (en
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尼可拉斯多明尼克 卡法拉羅三世
Nicholas Dominic Cavallaro Iii
宗興 張
Zung-Sing Chang
基斯米契爾 希爾
Keith Mitchell Hill
尤瑟夫凱德 庫羅許
Yousef Kayed QAROUSH
喬治達維斯 崔契勒
George Davis Treichler
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美商康寧公司
Corning Incorporated
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/0235—Ribbons
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/027—Scoring tool holders; Driving mechanisms therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/033—Apparatus for opening score lines in glass sheets
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/02—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor
    • C03B33/023—Cutting or splitting sheet glass or ribbons; Apparatus or machines therefor the sheet or ribbon being in a horizontal position
    • C03B33/037—Controlling or regulating
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B33/00—Severing cooled glass
    • C03B33/09—Severing cooled glass by thermal shock
    • C03B33/091—Severing cooled glass by thermal shock using at least one focussed radiation beam, e.g. laser beam
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Thermal Sciences (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

刻痕設備包括刻痕裝置。刻痕裝置包括：支撐構件，該支撐構件經安裝以用於相對於基座的旋轉及軸向移動兩者；刻痕元件，該刻痕元件安裝在離支撐構件的旋轉軸的偏移距離處；及限制裝置，該限制裝置限制支撐構件的旋轉移動。在另一個實例中，刻痕設備的刻痕裝置包括支撐構件，該支撐構件相對於流體軸承安裝。在又另一個實例中，揭示了使用刻痕設備來對玻璃條帶刻痕的方法。The scoring device includes a scoring device. The scoring device includes: a support member that is installed for both rotation and axial movement relative to the base; a scoring element that is mounted at an offset distance from a rotation axis of the support member And a restriction device that restricts the rotational movement of the support member. In another example, a scoring device of a scoring device includes a support member that is mounted relative to a fluid bearing. In yet another example, a method for scoring a glass ribbon using a scoring device is disclosed.

Description

包括刻痕裝置的刻痕設備及對玻璃條帶刻痕的方法Scoring device including scoring device and method for scoring glass strip

本揭示案一般而言係關於刻痕設備及刻痕的方法，且更具體而言，係關於包括刻痕裝置的刻痕設備及對玻璃條帶刻痕的方法。This disclosure relates generally to a scoring device and a method of scoring, and more specifically, to a scoring device including a scoring device and a method of scoring a glass ribbon.

將玻璃薄板從玻璃條帶分離是已知的。已知的分離技術可包括在玻璃條帶中形成刻痕，以促進玻璃薄板沿著刻痕線從玻璃條帶分離。It is known to separate glass sheets from glass ribbons. Known separation techniques may include forming scores in the glass ribbon to facilitate separation of the glass sheet from the glass ribbon along the score line.

以下呈現本揭示案的簡要總結，以提供詳細描述中所描述的一些示例性態樣的基本理解。A brief summary of this disclosure is presented below to provide a basic understanding of some exemplary aspects described in the detailed description.

根據第一態樣，刻痕設備包括刻痕裝置，該刻痕裝置包括：支撐構件，該支撐構件相對於基座安裝，其中支撐構件可相對於基座而繞著支撐構件的旋轉軸旋轉。支撐構件可進一步相對於基座而沿著支撐構件的旋轉軸的軸向方向移動。刻痕裝置進一步包括刻痕元件，該刻痕元件在離支撐構件的旋轉軸的偏移距離處耦合到支撐構件的外端。刻痕裝置又進一步包括限制裝置，該限制裝置限制支撐構件繞著支撐構件的旋轉軸的旋轉移動。如本文所使用，第一物件耦合到第二物件的上下文中的耦合之術語可代表直接耦合(例如，第一物件直接安裝到或連接到第二物件)，或間接耦合(例如，一或更多個額外物件在第一物件及第二物件之間)。According to a first aspect, the scoring device includes a scoring device, the scoring device including a support member that is mounted relative to the base, wherein the support member is rotatable about a rotation axis of the support member relative to the base. The support member is further movable relative to the base in the axial direction of the rotation axis of the support member. The scoring device further includes a scoring element coupled to the outer end of the support member at an offset distance from a rotation axis of the support member. The scoring device further includes a restriction device that restricts a rotational movement of the support member about a rotation axis of the support member. As used herein, the term coupling in the context of a first object being coupled to a second object may represent a direct coupling (e.g., the first object is directly mounted or connected to the second object), or an indirect coupling (e.g., one or more Multiple additional objects are between the first and second objects).

在第一態樣的一個實例中，限制裝置包括自支撐構件及基座其中一者延伸的突部，該突部定位在延長開口內，該延長開口由支撐構件及基座的另一者所界定。在一個實例中，延長開口可沿著行進路徑而軸向地拉錐(tapered)，該行進路徑由延長開口所界定，使得支撐構件繞著支撐構件的旋轉軸的旋轉移動的限制取決於沿著行進路徑的延長開口內的突部的位置而變化。在另一個實例中，支撐構件可相對於基座而定位在完全延伸的軸向位置中，其中限制裝置對支撐構件提供繞著旋轉軸的旋轉移動的第一限制。支撐構件亦可相對於基座而定位在至少部分縮回的軸向位置中，其中限制裝置對支撐構件提供繞著旋轉軸的旋轉移動的第二限制，該旋轉移動的第二限制可大於旋轉移動的第一限制。In one example of the first aspect, the restriction device includes a protrusion extending from one of the self-supporting member and the base, the protrusion being positioned within the extension opening, the extension opening being held by the other of the support member and the base. Define. In one example, the extension opening may be tapered axially along a path of travel defined by the extension opening such that the restriction of the rotational movement of the support member about the axis of rotation of the support member depends on the The position of the protrusion in the extension opening of the travel path changes. In another example, the support member may be positioned in a fully extended axial position relative to the base, wherein the restriction device provides the support member with a first restriction on rotational movement about the rotation axis. The support member may also be positioned in an axial position that is at least partially retracted relative to the base, wherein the restriction device provides the support member with a second restriction on rotational movement about the rotation axis, which second restriction may be greater than rotation The first limit of movement.

在第一態樣的另一個實例中，基座包括流體軸承，該流體軸承經配置以用流體緩衝來支撐支撐構件。在一個實例中，刻痕裝置進一步包括摩擦構件，該摩擦構件靠著支撐構件及基座的其中一者偏壓，以對支撐構件相對於基座而繞著支撐構件的旋轉軸的旋轉移動提供預定等級的阻力。In another example of the first aspect, the base includes a fluid bearing configured to support the support member with a fluid buffer. In one example, the scoring device further includes a friction member biased against one of the support member and the base to provide a rotational movement of the support member relative to the base about the rotation axis of the support member. A predetermined level of resistance.

在第一態樣的又另一個實例中，刻痕設備進一步包括支撐裝置，該支撐裝置經配置以在刻痕元件對玻璃條帶的第一主要表面刻痕的同時，支撐玻璃條帶的第二主要表面。在一個實例中，支撐裝置包括支撐滾輪，該支撐滾輪經配置以在刻痕元件對玻璃條帶的第一主要表面刻痕的同時，接合玻璃條帶的第二主要表面。In yet another example of the first aspect, the scoring apparatus further includes a support device configured to support the first major surface of the glass ribbon while the scoring element notches the first major surface of the glass ribbon while supporting the first Two major surfaces. In one example, the support device includes a support roller configured to engage a second major surface of the glass ribbon while the notch element scores the first major surface of the glass ribbon.

第一態樣可用以上論述的第一態樣的實例 的其中一種或任何組合來單獨或組合提供。The first aspect may be provided individually or in combination in one or any combination of the examples of the first aspect discussed above.

根據第二態樣，提供了以第一態樣的刻痕裝置來對玻璃條帶刻痕的方法。方法包括以下步驟：將刻痕元件降落在玻璃條帶的第一主要表面上，並藉由使刻痕裝置相對於玻璃條帶橫動而以刻痕元件產生刻痕線。支撐構件可在支撐構件的旋轉軸的軸向方向中從相對於基座的完全延伸的軸向位置而相對於基座軸向地移動到至少部分縮回的軸向位置。在支撐構件位於至少部分縮回的軸向位置同時，刻痕元件產生具有裂口深度的刻痕線部分。According to a second aspect, a method for scoring a glass ribbon with the scoring device of the first aspect is provided. The method includes the steps of dropping the scoring element on a first major surface of the glass ribbon and generating a scoring line with the scoring element by traversing the scoring device relative to the glass ribbon. The support member is axially movable relative to the base to an axial position at least partially retracted in the axial direction of the rotation axis of the support member from a fully extended axial position relative to the base. While the support member is in an axial position that is at least partially retracted, the scoring element produces a score line portion having a slit depth.

在第二態樣的一個實例中，當刻痕裝置在裂口深度沿著刻痕線部分刻痕的同時，刻痕元件可用幾乎固定的力量壓靠在玻璃條帶上。In an example of the second aspect, while the scoring device is partially scoring along the scoring line at the depth of the nick, the scoring element can be pressed against the glass strip with almost fixed force.

在第二態樣的另一個實例中，限制裝置對支撐構件提供在完全延伸的軸向位置中繞著旋轉軸的旋轉移動的第一限制，及在至少部分縮回的軸向位置中繞著旋轉軸的旋轉移動的第二限制，該旋轉移動的第二限制可大於旋轉移動的第一限制。In another example of the second aspect, the restriction device provides a first restriction on the rotational movement of the support member about the rotation axis in a fully extended axial position, and surrounds the at least partially retracted axial position The second limit of the rotational movement of the rotation axis may be larger than the first limit of the rotational movement.

在第二態樣的又另一個實例中，方法進一步包括以下步驟：用流體緩衝來支撐支撐構件，以促進支撐構件相對於基座繞著支撐構件的旋轉軸的旋轉移動，並促進支撐構件相對於基座沿著支撐構件的旋轉軸的軸向方向的軸向移動。在進一步的實例中，方法亦包括以下步驟：對支撐構件相對於基座而繞著支撐構件的旋轉軸的旋轉移動施加預定等級的阻力。In yet another example of the second aspect, the method further includes the steps of: supporting the support member with a fluid buffer to promote rotational movement of the support member relative to the base about a rotation axis of the support member, and to facilitate the relative movement of the support member The base moves axially along the axial direction of the rotation axis of the support member. In a further example, the method also includes the step of applying a predetermined level of resistance to a rotational movement of the support member relative to the base about a rotation axis of the support member.

在第二態樣的進一步實例中，方法進一步包括以下步驟：將支撐元件降落在玻璃條帶的第二主要表面上，並包括以下步驟：使支撐元件與刻痕元件一起橫動，同時以刻痕元件產生刻痕線。In a further example of the second aspect, the method further comprises the steps of: lowering the supporting element on the second major surface of the glass strip, and comprising the steps of: traversing the supporting element with the scoring element, and simultaneously engraving The score element generates a score line.

第二態樣可用以上論述的第二態樣的實例 的其中一種或任何組合來單獨或組合提供。The second aspect may be provided individually or in combination in one or any combination of the examples of the second aspect discussed above.

根據第三態樣，刻痕設備包括刻痕裝置，該刻痕裝置包括：支撐構件，該支撐構件相對於基座的流體軸承安裝。支撐構件可相對於基座而繞著支撐構件的旋轉軸旋轉。刻痕裝置可進一步包括刻痕元件，該刻痕元件在離支撐構件的旋轉軸的偏移距離處相對於支撐構件的外端安裝。According to a third aspect, the scoring device includes a scoring device that includes a support member that is mounted relative to a fluid bearing of the base. The support member is rotatable about a rotation axis of the support member with respect to the base. The scoring device may further include a scoring element that is mounted relative to an outer end of the support member at an offset distance from a rotation axis of the support member.

在第三態樣的一個實例中，支撐構件可相對於基座而沿著支撐構件的旋轉軸的軸向方向移動。In one example of the third aspect, the support member is movable relative to the base in the axial direction of the rotation axis of the support member.

在第三態樣的另一個實例中，刻痕裝置進一步包括限制裝置，該限制裝置限制支撐構件繞著支撐構件的旋轉軸的旋轉移動。在進一步的實例中，刻痕裝置除了限制裝置之外，進一步包括摩擦構件。該摩擦構件靠著支撐構件及基座的其中一者偏壓，以對支撐構件相對於基座而繞著支撐構件的旋轉軸的旋轉移動提供預定等級的阻力。In another example of the third aspect, the scoring device further includes a restriction device that restricts a rotational movement of the support member about a rotation axis of the support member. In a further example, the scoring device further includes a friction member in addition to the restriction device. The friction member is biased against one of the support member and the base to provide a predetermined level of resistance to a rotational movement of the support member relative to the base about a rotation axis of the support member.

在第三態樣的另一個實例中，刻痕裝置進一步包括沒有限制裝置的摩擦構件。摩擦構件靠著支撐構件及基座的其中一者偏壓，以對支撐構件相對於基座而繞著支撐構件的旋轉軸的旋轉移動提供預定等級的阻力。In another example of the third aspect, the scoring device further includes a friction member without a restriction device. The friction member is biased against one of the support member and the base to provide a predetermined level of resistance to the rotational movement of the support member relative to the base around the rotation axis of the support member.

在第三態樣的進一步實例中，刻痕裝置進一步包括支撐裝置，該支撐裝置經配置以在刻痕元件對玻璃條帶的第一主要表面刻痕的同時，支撐玻璃條帶的第二主要表面。在一個實例中，支撐裝置包括支撐滾輪，該支撐滾輪經配置以在刻痕元件對玻璃條帶的第一主要表面刻痕的同時，接合玻璃條帶的第二主要表面。In a further example of the third aspect, the scoring device further includes a support device configured to support the second main surface of the glass ribbon while the first main surface of the glass ribbon is scored by the scoring element. surface. In one example, the support device includes a support roller configured to engage a second major surface of the glass ribbon while the notch element scores the first major surface of the glass ribbon.

第三態樣可用以上論述的第三態樣的實例 的其中一種或任何組合來單獨或組合提供。The third aspect may be provided individually or in combination using one or any combination of the examples of the third aspect discussed above.

根據第四態樣，提供了以第三態樣的刻痕裝置對玻璃條帶刻痕的方法。方法包括以下步驟：用流體緩衝來支撐支撐構件，該流體緩衝提供於流體軸承及支撐構件之間，以促進支撐構件相對於基座繞著支撐構件的旋轉軸的旋轉移動。方法進一步包括以下步驟：將刻痕元件降落在玻璃條帶的第一主要表面上，並包括以下步驟：藉由使刻痕裝置相對於玻璃條帶橫動而以刻痕元件產生刻痕線。According to a fourth aspect, a method of scoring a glass ribbon with a scoring device of a third aspect is provided. The method includes the steps of supporting the support member with a fluid buffer provided between the fluid bearing and the support member to facilitate rotational movement of the support member relative to the base about a rotation axis of the support member. The method further includes the steps of dropping the scoring element on the first major surface of the glass strip, and including the step of generating a scoring line with the scoring element by traversing the scoring device relative to the glass strip.

在第四態樣的一個實例中，流體緩衝進一步促進支撐構件相對於基座沿著支撐構件的旋轉軸的軸向方向的軸向移動。在一個實例中，在刻痕裝置沿著刻痕線部分刻痕的同時，刻痕裝置對玻璃條帶產生刻痕元件的幾乎固定的力量。在另一個實例中，支撐構件可在支撐構件的旋轉軸的軸向方向中從相對於基座的完全延伸軸向位置而相對於基座移動到至少部分縮回的軸向位置。在刻刻痕線部分的同時，支撐構件可位於至少部分縮回的軸向位置中。在一個特定實例中，支撐構件包括在完全延伸的軸向位置中繞著旋轉軸的旋轉移動的第一限制，及在至少部分縮回的軸向位置中繞著旋轉軸的旋轉移動的第二限制，該旋轉移動的第二限制可大於旋轉移動的第一限制。In one example of the fourth aspect, the fluid buffer further promotes the axial movement of the support member relative to the base in the axial direction of the rotation axis of the support member. In one example, while the scoring device is partially scoring along the scoring line, the scoring device produces an almost constant force of the scoring element on the glass ribbon. In another example, the support member may move from a fully extended axial position relative to the base to an at least partially retracted axial position in the axial direction of the axis of rotation of the support member. While the score line portion is scored, the support member may be located in an axial position that is at least partially retracted. In one particular example, the support member includes a first restriction on rotational movement about the rotation axis in a fully extended axial position, and a second restriction on rotational movement about the rotation axis in an axial position that is at least partially retracted Limit, the second limit of the rotational movement may be greater than the first limit of the rotational movement.

在第四態樣的另一個實例中，方法進一步包括以下步驟：對支撐構件相對於基座而繞著支撐構件的旋轉軸的旋轉移動施加預定等級的阻力。In another example of the fourth aspect, the method further includes the step of applying a predetermined level of resistance to a rotational movement of the support member relative to the base around a rotation axis of the support member.

在第四態樣的進一步實例中，方法進一步包括以下步驟：將支撐元件降落在玻璃條帶的第二主要表面上，並包括以下步驟：使支撐元件與刻痕元件一起橫動，同時以刻痕元件產生刻痕線。In a further example of the fourth aspect, the method further comprises the steps of: lowering the support element on the second major surface of the glass strip, and comprising the steps of: traversing the support element with the scoring element, and simultaneously The score element generates a score line.

第四態樣可用以上論述的第四態樣的實例 的其中一種或任何組合來單獨或組合提供。The fourth aspect may be provided separately or in combination using one or any combination of the examples of the fourth aspect discussed above.

根據第五態樣，提供了對玻璃條帶刻痕的方法。玻璃條帶包括第一圓緣，該第一圓緣界定玻璃條帶的第一外部限制、第二圓緣，該第二圓緣界定玻璃條帶的第二外部限制，及界定在第一外部限制及第二外部限制之間的寬度。玻璃條帶的中央部分的厚度可小於第一圓緣的厚度及第二圓緣的厚度。每個圓緣包括幾乎平坦的表面，該幾乎平坦的表面界定在圓緣的內邊緣及外邊緣之間。方法包括以下步驟：(I)將刻痕裝置的刻痕元件通過第一圓緣的幾乎平坦的表面，同時在以刻痕元件接觸玻璃條帶之前，以至少500 mm/s的橫向刻痕速率行進。方法隨後包括以下步驟：(II)在刻痕元件可能在橫向刻痕速率(例如約2 mm至約20 mm的範圍中)行進的同時，將刻痕元件降落在玻璃條帶的第一主要表面上的降落點處，該降落點可位於離第一圓緣的幾乎平坦表面的內邊緣小於或等於約20 mm的距離。According to a fifth aspect, a method for scoring a glass strip is provided. The glass strip includes a first rounded edge that defines a first outer limit of the glass strip, a second rounded edge, the second rounded edge that defines a second outer limit of the glass strip, and defines the first outer edge The width between the limit and the second outer limit. The thickness of the central portion of the glass strip may be smaller than the thickness of the first round edge and the thickness of the second round edge. Each round edge includes an almost flat surface defined between an inner edge and an outer edge of the round edge. The method includes the following steps: (I) Pass the scoring element of the scoring device through the almost flat surface of the first round edge, and at the same time at a lateral scoring rate of at least 500 mm / s before contacting the glass strip with the scoring element March. The method then includes the following steps: (II) while the scoring element is likely to travel at a lateral scoring rate (e.g., in a range of about 2 mm to about 20 mm), the scoring element is dropped onto the first major surface of the glass ribbon The landing point may be located at a distance less than or equal to about 20 mm from the inner edge of the almost flat surface of the first round edge.

在其他實例中，將刻痕元件降落在玻璃條帶的第一主要表面的步驟(II)可包括以下步驟：在刻痕元件可能在橫向刻痕速率行進的同時，將刻痕元件降落在玻璃條帶的第一主要表面的降落點，該降落點所位在的距離是在離玻璃條帶的寬度方向中的第一側向邊緣約25 mm至約75 mm的範圍中。In other examples, step (II) of dropping the scoring element on the first major surface of the glass strip may include the step of dropping the scoring element on the glass while the scoring element may travel at a lateral scoring rate. The landing point of the first major surface of the strip is located at a distance in the range of about 25 mm to about 75 mm from the first lateral edge in the width direction of the glass strip.

在第五態樣的一個實例中，橫向刻痕速率可為約750 mm/s至約1500 mm/s。In one example of the fifth aspect, the lateral score rate may be about 750 mm / s to about 1500 mm / s.

在第五態樣的另一個實例中，在步驟(II)之後，方法進一步包括以下步驟：以橫向刻痕速率使刻痕元件橫動，以在玻璃條帶的第一主要表面中產生刻痕線，該刻痕線具有裂口深度，該裂口深度為玻璃條帶的中央部分的厚度的約8%至約12%。裂口深度可在離降落點小於或等於約5 mm處達到。In another example of the fifth aspect, after step (II), the method further includes the step of traversing the scoring element at a lateral scoring rate to generate a scoring in the first major surface of the glass ribbon Line, the score line has a slit depth that is about 8% to about 12% of the thickness of the central portion of the glass ribbon. The crack depth can be reached at a distance of less than or equal to about 5 mm from the landing point.

在第五態樣的又另一個實例中，刻痕裝置包括支撐構件，該支撐構件經配置以繞著支撐構件的旋轉軸進行旋轉移動。刻痕元件可在離支撐構件的旋轉軸大於2 mm的偏移距離處相對於支撐構件的外端安裝。橫向刻痕速率對偏移距離的比率可小於或等於約267s-1 。In yet another example of the fifth aspect, the scoring device includes a support member configured to rotate around a rotation axis of the support member. The scoring element may be mounted relative to the outer end of the support member at an offset distance greater than 2 mm from the rotation axis of the support member. The ratio of the lateral score rate to the offset distance may be less than or equal to about 267 s -1 .

在第五態樣的又另一個實例中，步驟(II)之後，方法進一步包括以下步驟：將刻痕元件以橫向刻痕速率橫動，以在玻璃條帶的第一主要表面中產生刻痕線。方法進一步包括以下步驟：在刻痕元件可能以橫向刻痕速率行進的同時，將刻痕元件從第一主要表面的升起點升起，該升起點可位於離第二圓緣的內邊緣小於或等於約20 mm的距離。In yet another example of the fifth aspect, after step (II), the method further includes the step of traversing the scoring element at a lateral scoring rate to generate a scoring in the first major surface of the glass ribbon. line. The method further includes the step of raising the scoring element from a rising point of the first major surface while the scoring element may travel at a lateral scoring rate, the rising point may be less than or equal to the inner edge of the second round edge. Equal to a distance of approximately 20 mm.

在其他實例中，步驟(II)之後，方法可進一步包括以下步驟：在刻痕元件可能以橫向刻痕速率行進的同時，將刻痕元件從第一主要表面的升起點升起，該升起點可位在離玻璃條帶的寬度方向中的第二側向邊緣約25 mm至約75 mm的範圍中之距離。In other examples, after step (II), the method may further include the step of raising the scoring element from a rising point of the first major surface while the scoring element may travel at a lateral scoring rate, the rising point It may be located at a distance in the range of about 25 mm to about 75 mm from the second lateral edge in the width direction of the glass strip.

在第五態樣的進一步實例中，方法進一步包括以下步驟：使支撐元件降落在玻璃條帶的第二主要表面上，並包括以下步驟：使支撐元件與刻痕元件以橫向刻痕速率一起橫動，同時以刻痕元件產生刻痕線。In a further example of the fifth aspect, the method further comprises the steps of dropping the supporting element on the second major surface of the glass strip, and including the step of allowing the supporting element and the scoring element to traverse together at a lateral scoring rate. And simultaneously generate a score line with a score element.

第五態樣可用以上論述的第五態樣的實例 的其中一種或任何組合來單獨或組合提供。The fifth aspect may be provided individually or in combination in one or any combination of the examples of the fifth aspect discussed above.

將理解到，以上的概述及以下的詳細描述呈現本揭示案的實施例，且意欲提供概觀或架構，以隨著實施例被描述並主張而用於理解實施例的本質及特性。附圖被包括以提供對實施例的進一步理解，且該等附圖被併入本說明書並構成本說明書的一部分。附圖繪示本揭示案的各種實施例，並與說明書一起用來解釋實施例的原理及操作。It will be understood that the above summary and the following detailed description present embodiments of the present disclosure and are intended to provide an overview or architecture for understanding the nature and characteristics of the embodiments as they are described and claimed. The accompanying drawings are included to provide a further understanding of the embodiments, and they are incorporated in and constitute a part of this specification. The drawings illustrate various embodiments of the present disclosure and, together with the description, serve to explain the principles and operations of the embodiments.

設備及方法現在將參考附圖而在下文更完整地描述，其中該等附圖顯示本揭示案的實施例。在可能之情況下，相同的參考符號於整個繪圖中用來代表相同的或相似的部件。然而，本揭示案可體現於許多不同的形式中，且不應被建構為受限於在此所闡述的實施例。The apparatus and method will now be described more fully hereinafter with reference to the accompanying drawings, which show embodiments of the present disclosure. Wherever possible, the same reference numbers will be used throughout the drawings to refer to the same or similar parts. This disclosure may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.

本揭示案的各種玻璃製造設備及方法可用來產生玻璃條帶，該玻璃條帶可被進一步處理成一或更多個玻璃薄板。例如，玻璃製造設備可經配置以藉由下拉、上拉、漂浮、熔合、壓輥，狹槽拉製，或其他玻璃形成技術來產生玻璃條帶。Various glass manufacturing equipment and methods of the present disclosure can be used to produce glass ribbons that can be further processed into one or more glass sheets. For example, glass manufacturing equipment may be configured to produce glass ribbons by pull-down, pull-up, float, fusion, pressure rolls, slot drawing, or other glass-forming techniques.

來自任何該等處理的玻璃條帶可被後續分割，以提供適合進一步加工成所需應用的薄板玻璃，例如顯示器應用。玻璃薄板可用於，例如，廣泛的顯示器應用範圍中，例如液晶顯示器(LCD)、電泳顯示器(EPD)、有機發光二極體顯示器(OLED)、電漿顯示器面板(PDP)，或類者。The glass strip from any such treatment can be subsequently divided to provide sheet glass suitable for further processing into desired applications, such as display applications. Glass sheets can be used, for example, in a wide range of display applications, such as liquid crystal displays (LCD), electrophoretic displays (EPD), organic light emitting diode displays (OLED), plasma display panels (PDP), or the like.

圖1示意性地繪示示例性玻璃製造設備101，該玻璃製造設備經配置以拉製玻璃條帶103。為了說明的目的，玻璃製造設備101被繪示為熔融下拉(fusion down-draw)設備，儘管進一步的實例中可提供其他玻璃製造設備，該等其他玻璃製造設備經配置以上拉、漂浮、壓輥，狹槽拉製等等。此外，如上文所提及，本揭示案的實施例不受限於製造玻璃條帶。確實，本揭示案中呈現的概念可用於廣泛的玻璃製造設備中，以產生廣泛的玻璃製品。FIG. 1 schematically illustrates an exemplary glass manufacturing apparatus 101 configured to draw a glass ribbon 103. For the purpose of illustration, the glass manufacturing equipment 101 is shown as a fusion down-draw equipment, although other glass manufacturing equipment may be provided in further examples, which are configured to pull, float, and press rolls , Slot drawing and so on. Further, as mentioned above, embodiments of the present disclosure are not limited to making glass ribbons. Indeed, the concepts presented in this disclosure can be used in a wide range of glass manufacturing equipment to produce a wide range of glass products.

如所繪示地，玻璃製造設備101可包括熔融容器105，該熔融容器經配置以從儲存槽109接收批量材料107。批量材料107可由馬達113所推動的批量傳遞裝置111所引入。馬達113可將所需量之批量材料107引入到熔融容器105中，如箭頭117所指示。熔融容器105隨後可將批量材料107熔化成大量熔融材料121。As illustrated, the glass manufacturing apparatus 101 may include a melting vessel 105 configured to receive a batch of material 107 from a storage tank 109. The batch material 107 may be introduced by a batch transfer device 111 pushed by a motor 113. The motor 113 may introduce the required amount of batch material 107 into the melting vessel 105 as indicated by arrow 117. The melting vessel 105 may then melt the bulk material 107 into a large amount of molten material 121.

玻璃製造設備101亦可包括淨化容器127，例如淨化管，該淨化管位於熔融容器105的下游並藉由第一連接管129的方式耦合到熔融容器105。混合容器131，例如攪拌腔室，亦可位於淨化容器127的下游，且傳遞容器133可位於混合容器131的下游。如所顯示地，第二連接管135可將淨化容器127耦合到混合容器131，且第三連接管137可將混合容器131耦合到傳遞容器133。如所進一步繪示地，選擇性的傳遞管線139可經定位以將熔融材料121從傳遞容器133傳遞到熔融拉製機器140。如下文所更完整地論述，熔融拉製機器140可經配置以將熔融材料121拉製成為玻璃條帶103。在所繪示的實施例中，熔融拉製機器140可包括成形容器143，入口141被提供給該成形容器，該入口經配置以直接地或間接地從傳遞容器133接收熔融材料，例如藉由傳遞管線139。若有提供，傳遞管線139可經配置以從傳遞容器133接收熔融材料，且成形容器143的入口141可經配置以從傳遞管線139接收熔融材料。The glass manufacturing apparatus 101 may also include a purification vessel 127, such as a purification pipe, which is located downstream of the melting vessel 105 and is coupled to the melting vessel 105 by means of a first connection pipe 129. The mixing container 131, such as a stirring chamber, may also be located downstream of the purification container 127, and the transfer container 133 may be located downstream of the mixing container 131. As shown, the second connection pipe 135 may couple the purification container 127 to the mixing container 131 and the third connection pipe 137 may couple the mixing container 131 to the transfer container 133. As further illustrated, the selective transfer line 139 may be positioned to transfer the molten material 121 from the transfer container 133 to the melt-drawing machine 140. As discussed more fully below, the melt drawing machine 140 may be configured to draw the molten material 121 into a glass ribbon 103. In the illustrated embodiment, the melt-drawing machine 140 may include a forming container 143 to which an inlet 141 is provided that is configured to receive molten material directly or indirectly from the transfer container 133, such as by Passing line 139. If provided, the transfer line 139 may be configured to receive molten material from the transfer container 133, and the inlet 141 of the forming container 143 may be configured to receive molten material from the transfer line 139.

如所顯示地，熔融容器105、淨化容器127、混合容器131、傳遞容器133，及成形容器143為熔融材料站的實例，該等熔融材料站可沿著玻璃製造設備101而以序列定位。As shown, the melting container 105, the purification container 127, the mixing container 131, the transfer container 133, and the forming container 143 are examples of molten material stations, which may be positioned in series along the glass manufacturing apparatus 101.

熔融容器105及成形容器143的特徵通常是由耐火(refractory)材料製成，該耐火材料例如耐火陶瓷(例如陶瓷磚塊、陶瓷單晶形成體，等等)。玻璃製造設備101可進一步包括通常由鉑或包含鉑的金屬所製成的元件，例如鉑-銠、鉑-銥及其組合，但亦可包括其他耐火金屬，例如鉬、鈀、錸、鉭、鈦、鎢、釕、鋨、鋯及其合金及/或二氧化鋯。含鉑的元件可包括以下一或更多者：第一連接管129、淨化容器127(例如淨化管)、第二連接管135、混合容器131(例如攪拌腔室)、第三連接管137、傳遞容器133、傳遞管線139、入口141及成形容器143的特徵。The melting container 105 and the forming container 143 are typically made of refractory materials, such as refractory ceramics (eg, ceramic bricks, ceramic single crystal formations, etc.). The glass manufacturing apparatus 101 may further include elements generally made of platinum or a metal containing platinum, such as platinum-rhodium, platinum-iridium, and combinations thereof, but may also include other refractory metals such as molybdenum, palladium, rhenium, tantalum, Titanium, tungsten, ruthenium, hafnium, zirconium and their alloys and / or zirconia. The platinum-containing element may include one or more of the following: a first connection pipe 129, a purification vessel 127 (such as a purification pipe), a second connection pipe 135, a mixing vessel 131 (such as a stirring chamber), a third connection pipe 137, Features of the transfer container 133, the transfer line 139, the inlet 141, and the forming container 143.

圖2為圖1的玻璃製造設備101沿著線2-2的剖面透視圖。如所顯示地，成形容器143可包括凹槽200，該凹槽經配置以從入口141接收熔融材料121。成形容器143進一步包括成形楔子(forming wedge)201，該成形楔子包含一對向下傾斜收斂的表面部分203、205，該對向下傾斜收斂的表面部分在成形楔子201的相對端點之間延伸。該對向下傾斜收斂的表面部分203、205沿著拉製方向207收斂以形成根部209。拉製平面211延伸通過根部209，其中玻璃條帶103可在拉製方向207中沿著拉製平面211拉製。如所顯示地，拉製平面211可對分根部209，儘管拉製平面211可相對於根部209而在其他定向中延伸。FIG. 2 is a sectional perspective view of the glass manufacturing apparatus 101 of FIG. 1 along a line 2-2. As shown, the forming container 143 may include a groove 200 configured to receive the molten material 121 from the inlet 141. The forming container 143 further includes a forming wedge 201 comprising a pair of downwardly converging surface portions 203, 205, the pair of downwardly converging surface portions extending between opposite endpoints of the forming wedge 201 . The pair of downwardly converging surface portions 203, 205 converge along the drawing direction 207 to form a root 209. The drawing plane 211 extends through the root 209, wherein the glass strip 103 can be drawn along the drawing plane 211 in the drawing direction 207. As shown, the drawing plane 211 may bisect the root 209, although the drawing plane 211 may extend in other orientations relative to the root 209.

參考圖2，在一個實例中，熔融材料121可從入口141流到成形容器143的凹槽200中。熔融材料121可隨後藉由流過相對應的堰(weirs)202a、202b並同時向下流過相對應的堰202a、202b的外表面204a、204b而從凹槽200溢出。熔融材料的分別串流隨後沿著成形楔子201的向下傾斜收斂的表面部分203、205流動，以從成形容器143的根部209被拉離，其中流體收斂並熔融成為玻璃條帶103。玻璃條帶103可隨後在拉製平面211中沿著拉製方向207從根部209拉離。Referring to FIG. 2, in one example, the molten material 121 may flow from the inlet 141 into the groove 200 of the forming container 143. The molten material 121 may then overflow from the groove 200 by flowing through the corresponding weirs 202a, 202b and simultaneously downward through the outer surfaces 204a, 204b of the corresponding weirs 202a, 202b. The separate streams of molten material then flow along the downwardly inclined convergent surface portions 203, 205 of the forming wedge 201 to be pulled away from the root 209 of the forming container 143, where the fluid converges and melts into a glass ribbon 103. The glass strip 103 can then be pulled away from the root 209 in the drawing plane 211 in the drawing direction 207.

如圖2所顯示，玻璃條帶103可從具有第一主要表面213及第二主要表面215的根部209拉製。如所顯示地，第一主要表面213及第二主要表面215面向相對的方向並具有厚度217，該厚度可小於或等於約1 mm，例如約50μm到約750μm，例如約100μm到約700μm，例如約200μm到約600μm，例如約300μm到約500μm，及以上引用的範圍的所有子範圍。As shown in FIG. 2, the glass strip 103 may be drawn from a root portion 209 having a first major surface 213 and a second major surface 215. As shown, the first major surface 213 and the second major surface 215 face opposite directions and have a thickness 217, which may be less than or equal to about 1 mm, such as about 50 μm to about 750 μm, such as about 100 μm to about 700 μm, such as About 200 μm to about 600 μm, such as about 300 μm to about 500 μm, and all subranges of the ranges cited above.

在一些實施例中，用於熔融拉製玻璃條帶的玻璃製造設備101亦可包括至少一個邊緣滾輪組件149a、149b。所繪示的每個邊緣滾輪組件149a、149b可包括一對邊緣滾輪221，該等邊緣滾輪經配置以提供玻璃條帶103的相對應的相對邊緣部分223a、223b的適當加工。在進一步實例中，玻璃製造設備101可進一步包括第一及第二拉動滾輪組件151a、151b。所繪示的每個拉動滾輪組件151a、151b可包括一對拉動滾輪153，該等拉動滾輪經配置以在拉製平面211的拉製方向207中促進玻璃條帶103的拉動。In some embodiments, the glass manufacturing apparatus 101 for melt-drawn glass ribbon may also include at least one edge roller assembly 149a, 149b. Each of the illustrated edge roller assemblies 149a, 149b may include a pair of edge rollers 221 that are configured to provide appropriate processing of corresponding opposite edge portions 223a, 223b of the glass ribbon 103. In a further example, the glass manufacturing apparatus 101 may further include first and second pulling roller assemblies 151a, 151b. Each of the illustrated drawing roller assemblies 151a, 151b may include a pair of drawing rollers 153 configured to facilitate the drawing of the glass ribbon 103 in the drawing direction 207 of the drawing plane 211.

在一個實例中，如圖1及圖2所示意性的顯示，玻璃製造設備101亦可包括玻璃刻痕設備161a，該玻璃刻痕設備經配置以沿著分離路徑163促進玻璃條帶103的分離過程，該分離路徑延伸經過玻璃條帶103的寬度「W」。玻璃刻痕設備161a可沿著分離路徑163而將玻璃條帶分離成玻璃薄板104。在一個實例中，當足夠的玻璃條帶103長度從成形容器143拉離後，玻璃刻痕設備161a可操作以促進玻璃薄板104從玻璃條帶103的剩餘部分分離。在操作中，玻璃刻痕設備161a可隨著玻璃條帶從成形容器拉離而將分別的玻璃薄板104從玻璃條帶103週期性地分離。進一步而言，如所繪示地，刻痕設備161a可沿著方向165行進，該方向是與拉製平面211的拉製方向207相同的方向。此外，在操作中，刻痕設備161a可用與玻璃條帶103於拉製方向207中被拉製的速率相同的速率行進。結果，在刻痕程序期間，界定支撐裝置169a及刻痕裝置169b的行進路徑的移動軌道167a、167b是與玻璃條帶103在相同的速率下幾乎一起移動，因此在刻痕程序期間，玻璃條帶103及移動軌道167a、167b之間可具有微小的相對移動或沒有相對移動。例如，刻痕裝置169b可橫越一個移動軌道，同時支撐裝置169a橫越其他移動軌道。同時，支撐裝置169a及刻痕裝置169b經配置以沿著移動軌道167a、167b以橫向刻痕速率沿著方向168一起行進，同時產生達到裂口深度的刻痕。例如，移動軌道167a、167b可沿著玻璃條帶103的相對側邊定位，並彼此平行走向。In one example, as shown schematically in FIGS. 1 and 2, the glass manufacturing apparatus 101 may also include a glass scoring apparatus 161 a configured to facilitate separation of the glass ribbon 103 along the separation path 163 In the process, the separation path extends across the width "W" of the glass strip 103. The glass scoring device 161 a can separate the glass strips into the glass sheets 104 along the separation path 163. In one example, the glass scoring device 161a is operable to facilitate separation of the glass sheet 104 from the remainder of the glass ribbon 103 when sufficient length of the glass ribbon 103 is pulled away from the forming container 143. In operation, the glass scoring device 161a may periodically separate the respective glass sheets 104 from the glass ribbon 103 as the glass ribbon is pulled away from the forming container. Further, as shown, the scoring device 161a may travel in a direction 165, which is the same direction as the drawing direction 207 of the drawing plane 211. Further, in operation, the scoring device 161a can travel at the same rate as the glass ribbon 103 is being drawn in the drawing direction 207. As a result, during the scoring process, the moving tracks 167a, 167b, which define the path of travel of the support device 169a and the scoring device 169b, move almost together at the same rate as the glass strip 103, so during the scoring process, the glass strip There may be slight relative movement or no relative movement between the belt 103 and the movement tracks 167a, 167b. For example, the scoring device 169b may traverse one moving track while the supporting device 169a traverses the other moving track. At the same time, the supporting device 169a and the scoring device 169b are configured to travel together along the moving tracks 167a, 167b at a lateral scoring rate in the direction 168, while generating a scoring to the depth of the nick. For example, the moving rails 167a, 167b may be positioned along opposite sides of the glass strip 103 and run parallel to each other.

在另一個實例中，如圖1及圖2中所示意性地顯示，玻璃製造設備101可替代地包括玻璃刻痕設備161b，該玻璃刻痕設備亦經配置以促進玻璃條帶103沿著分離路徑163的分離過程，該分離過程延伸橫越玻璃條帶103的寬度「W」。玻璃刻痕設備161b亦可沿著分離路徑163將玻璃條帶分離成玻璃薄板104。在一個實例中，當足夠的玻璃條帶103長度從成形容器143拉離後，玻璃刻痕設備161b可操作以促進玻璃薄板104從玻璃條帶103的剩餘部分分離。在操作中，玻璃刻痕設備161b可隨著玻璃條帶從成形容器拉離而將分別的玻璃薄板104從玻璃條帶103週期性地分離。進一步而言，如所繪示地，刻痕設備161b可包括固定軌道171a、171b，該等固定軌道界定用於支撐裝置169a及刻痕裝置169b的行進路徑。例如，刻痕裝置169b可橫越一個固定軌道，同時支撐裝置169a橫越另一個固定軌道。在玻璃條帶103相對於固定軌道171a、171b沿著拉製方向207行進的同時，固定軌道171a、171b可維持在固定位置。例如，固定軌道171a、171b可沿著玻璃條帶103的相對側邊定位，並彼此平行走向。進一步而言，支撐裝置169a及刻痕裝置169b以合力速率向量175沿著固定軌道171a、171b所界定的行進路徑一起行進，該合力速率向量包括水平速率分量177及垂直速率分量179，該水平速率分量平行於分離路徑163。垂直速率分量179與在拉製方向207中的玻璃條帶103的速率向量在同一方向中延伸，並具有相同的大小。如此，每個刻痕設備161a、161b為可界定支撐裝置169a及刻痕裝置169b的行進路徑的兩個替代示例性配置，該等刻痕設備可沿著分離路徑163產生刻痕線，該刻痕線可例如包含路徑，該路徑可垂直於拉製方向207。儘管未顯示，但進一步的配置可對支撐裝置169a及刻痕裝置169b提供合適的行進路徑。例如，機器人可經設計以提供支撐裝置及刻痕裝置的合適移動，而不需要移動軌道或固定軌道。In another example, as shown schematically in FIGS. 1 and 2, the glass manufacturing apparatus 101 may alternatively include a glass scoring apparatus 161 b that is also configured to facilitate separation of the glass strip 103 along The separation process of the path 163 extends across the width “W” of the glass strip 103. The glass scoring device 161b can also separate the glass strips into glass sheets 104 along the separation path 163. In one example, the glass scoring device 161b is operable to facilitate separation of the glass sheet 104 from the remainder of the glass ribbon 103 when sufficient length of the glass ribbon 103 is pulled away from the forming container 143. In operation, the glass scoring device 161b may periodically separate the respective glass sheets 104 from the glass ribbon 103 as the glass ribbon is pulled away from the forming container. Further, as shown, the scoring device 161b may include fixed rails 171a, 171b that define a travel path for the support device 169a and the scoring device 169b. For example, the scoring device 169b may traverse one fixed track while the support device 169a traverses another fixed track. While the glass strip 103 travels in the drawing direction 207 relative to the fixed rails 171a, 171b, the fixed rails 171a, 171b can be maintained in a fixed position. For example, the fixed rails 171a, 171b may be positioned along opposite sides of the glass strip 103 and run parallel to each other. Further, the supporting device 169a and the scoring device 169b travel together along a travel path defined by the fixed tracks 171a, 171b with a resultant velocity vector 175, the resultant velocity vector including a horizontal velocity component 177 and a vertical velocity component 179, the horizontal velocity The components are parallel to the separation path 163. The vertical velocity component 179 extends in the same direction as the velocity vector of the glass strip 103 in the drawing direction 207 and has the same magnitude. As such, each scoring device 161a, 161b is two alternative exemplary configurations that can define the travel path of the support device 169a and the scoring device 169b, and the scoring devices can generate a scoring line along the separation path 163. The score line may, for example, include a path, which may be perpendicular to the drawing direction 207. Although not shown, further configurations may provide suitable travel paths for the support device 169a and the scoring device 169b. For example, the robot may be designed to provide suitable movement of the support device and the scoring device without the need for a moving or fixed track.

在進一步的實例中，玻璃條帶103可在操作玻璃刻痕設備以將經處理的玻璃薄板（例如，包括電子元件之薄板）從玻璃條帶的剩餘部分分離之前進一步處理(例如，增加電子元件等等)。In a further example, the glass strip 103 may be further processed (e.g., adding electronic components) before operating a glass scoring device to separate processed glass sheets (e.g., sheets including electronic components) from the remainder of the glass strip and many more).

額外地或替代地，在進一步實例中，玻璃條帶103可儲存為玻璃條帶卷。在一些實例中，玻璃條帶可從成形容器143拉離並盤旋成玻璃條帶卷，該玻璃條帶卷在捲動前具有或不具有玻璃條帶的進一步處理。在進一步實例中，玻璃條帶可在將玻璃條帶盤旋成玻璃條帶卷之前進一步處理(例如，增加電子元件、清潔、加工、處理等等)。在此類實施例中，一旦捲到足夠量的玻璃條帶後，玻璃刻痕設備161a、161b可經操作以將玻璃條帶卷刻痕並後續從玻璃條帶的剩餘部分分離，該玻璃條帶的剩餘部分是從成形容器143拉離。在進一步的實例中，玻璃條帶最終可從玻璃條帶卷展開(unwound)。在此類實例中，玻璃刻痕設備161a、161b可用來隨著條帶從玻璃條帶卷展開而將玻璃薄板刻痕並後續從玻璃條帶分離。Additionally or alternatively, in further examples, the glass ribbon 103 may be stored as a glass ribbon roll. In some examples, the glass ribbon may be pulled away from the forming container 143 and coiled into a glass ribbon roll, with or without further processing of the glass ribbon before rolling. In further examples, the glass ribbon may be further processed (eg, adding electronics, cleaning, processing, processing, etc.) before the glass ribbon is coiled into a glass ribbon roll. In such embodiments, once a sufficient amount of glass ribbon is rolled, the glass scoring device 161a, 161b can be operated to score the glass ribbon and subsequently separate it from the remainder of the glass ribbon, the glass ribbon The remainder of the tape is pulled away from the forming container 143. In a further example, the glass ribbon may eventually be unwound from the glass ribbon roll. In such examples, the glass scoring device 161a, 161b may be used to score and subsequently separate the glass sheet from the glass strip as the strip is unrolled from the glass strip roll.

刻痕設備，例如以上參考的刻痕設備161a、161b，可每個包括刻痕裝置，該刻痕裝置例如在圖3至圖14中示意性地顯示的刻痕裝置169b。如圖3所顯示，刻痕裝置169b可包括基座303及支撐構件301，該支撐構件經配置以相對於基座303移動。在一些實例中，基座303可包括刻痕裝置169b的各種特徵，該等特徵不與支撐構件301一起移動。例如，在所繪示的實例中，基座303可選擇性地包括殼體305。如圖4所顯示，殼體305可界定內部區域401，該內部區域經配置以接收支撐構件301的內端301a。在一些實例中，殼體305可經配置以從一或更多個壓力端口405對內部區域401提供加壓流體(例如空氣)。為了簡化建構，殼體305可選擇性地包括端部蓋403a、403b，該等端部蓋配置為流體限制機構(例如流體密封件)，以將內部區域401提供為壓力腔室。Scoring equipment, such as the scoring equipment 161a, 161b referred to above, may each include a scoring device, such as the scoring device 169b shown schematically in FIGS. 3 to 14. As shown in FIG. 3, the scoring device 169 b may include a base 303 and a support member 301 configured to move relative to the base 303. In some examples, the base 303 may include various features of the scoring device 169b that do not move with the support member 301. For example, in the illustrated example, the base 303 may optionally include a housing 305. As shown in FIG. 4, the housing 305 may define an inner region 401 that is configured to receive an inner end 301 a of the support member 301. In some examples, the housing 305 may be configured to provide a pressurized fluid (eg, air) to the inner region 401 from one or more pressure ports 405. To simplify construction, the housing 305 may optionally include end covers 403a, 403b, which are configured as a fluid restriction mechanism (eg, a fluid seal) to provide the inner region 401 as a pressure chamber.

如圖3至圖4所顯示，在一些實例中，支撐構件301可相對於基座303而可移動地安裝。例如，如所顯示地，刻痕裝置169b可經配置以用於支撐構件301相對於基座303繞著支撐構件301的旋轉軸309的旋轉移動307。額外地或替代地，支撐構件301可相對於基座303沿著支撐構件301的旋轉軸309的軸向方向移動。As shown in FIGS. 3 to 4, in some examples, the support member 301 may be movably mounted relative to the base 303. For example, as shown, the scoring device 169b may be configured for a rotational movement 307 of the support member 301 relative to the base 303 about a rotation axis 309 of the support member 301. Additionally or alternatively, the support member 301 can be moved relative to the base 303 along the axial direction of the rotation axis 309 of the support member 301.

在一些實例中，刻痕裝置169b可進一步包括限制裝置，該限制裝置限制支撐構件301繞著支撐構件301的旋轉軸309的旋轉移動307。額外地或替代地，限制裝置或其他機構可經配置以限制支撐構件301相對於基座303沿著支撐構件301的旋轉軸309的軸向方向的軸向移動311。例如，如圖4至圖5所顯示，刻痕裝置169b包括限制裝置407，該限制裝置經配置以限制旋轉移動307及軸向移動311。儘管未顯示，但若提供限制裝置，該限制裝置在進一步的實例中可經配置以僅限制旋轉移動或僅限制軸向移動。In some examples, the scoring device 169b may further include a restriction device that restricts the rotation movement 307 of the support member 301 about the rotation axis 309 of the support member 301. Additionally or alternatively, a restriction device or other mechanism may be configured to restrict the axial movement 311 of the support member 301 relative to the base 303 along the axial direction of the rotation axis 309 of the support member 301. For example, as shown in FIGS. 4 to 5, the scoring device 169 b includes a restriction device 407 configured to restrict the rotational movement 307 and the axial movement 311. Although not shown, if a restraining device is provided, the restraining device may in a further example be configured to limit only rotational movement or only axial movement.

在一個實例中，限制裝置407可包括突部，該突部從支撐構件及基座的其中一者延伸，該突部可定位在延長開口內，該延長開口由支撐構件及基座的其中另一者所界定。例如，藉由例示的方式，限制裝置407可包括突部409，該突部從支撐構件301延伸，該突部可定位在延長開口411內，該延長開口界定在基座303中。儘管未顯示，但在替代實例中，突部可從基座303延伸並定位在延長開口內，該延長開口界定在支撐構件301中。In one example, the restriction device 407 may include a protrusion extending from one of the support member and the base, the protrusion may be positioned within an extension opening formed by the other of the support member and the base. One is defined. For example, by way of example, the restricting device 407 may include a protrusion 409 that extends from the support member 301, the protrusion may be positioned within an extension opening 411 that is defined in the base 303. Although not shown, in an alternative example, the protrusions may extend from the base 303 and be positioned within an extension opening defined in the support member 301.

進一步參考圖4及圖5，突部409可包含柄部，該柄部有一端可連接(藉由螺紋連接)到支撐構件301的內端301a。如圖4及圖5所進一步顯示，示例性柄部亦可包括相對端部，該相對端部包含所繪示的頭部，該頭部定位在延長開口411內，該延長開口界定在基座303中。With further reference to FIGS. 4 and 5, the protrusion 409 may include a shank having one end connectable (by screwing) to the inner end 301 a of the support member 301. As further shown in FIGS. 4 and 5, the exemplary handle may also include an opposite end portion, which includes the illustrated head portion, the head portion being positioned within the extension opening 411, the extension opening being defined on the base 303.

所繪示的延長開口411包含貫穿槽，該貫穿槽延伸通過殼體305的側壁413，儘管開口在進一步的實例中可在側壁413的內部表面內包含百葉表面溝槽埋頭孔(countersunk)。若延長開口411被提供了所繪示的貫穿槽，則密封板材415可被提供以促進基座303的內部區域401內的流體壓力的維持。The illustrated extended opening 411 includes a through slot that extends through the side wall 413 of the housing 305, although the opening may include a louver surface groove countersunk in the inner surface of the side wall 413 in a further example. If the extended opening 411 is provided with the illustrated through groove, the sealing plate 415 may be provided to promote the maintenance of the fluid pressure in the inner region 401 of the base 303.

如圖5所顯示，突部409及界定延長開口411的內壁之間的互動可限制支撐構件301繞著旋轉軸309的旋轉移動307。例如，若允許，任何旋轉移動307將造成突部409沿著方向503a、503b移動，該等方向是垂直於支撐構件301的旋轉軸309。突部409沿著方向503a、503b的移動是受限於突部409的尺寸(例如所繪示的頭部直徑等於半徑的兩倍「2R1」)扣掉延長開口411在突部409的位置處的寬度505。在所繪示的實例中，突部409可位於第一位置「P1」中，其中寬度505可等於突部409的尺寸(例如「2R1」)，其中限制裝置抑制(例如防止)支撐構件301繞著旋轉軸309旋轉。替代地，如第二位置「P2」中所顯示，突部409在方向503a、503b中的受限移動允許支撐構件301繞著旋轉軸309的受限旋轉移動307。As shown in FIG. 5, the interaction between the protrusion 409 and the inner wall defining the extension opening 411 may restrict the rotation movement 307 of the support member 301 about the rotation axis 309. For example, if allowed, any rotational movement 307 will cause the protrusion 409 to move in directions 503a, 503b, which are perpendicular to the rotation axis 309 of the support member 301. The movement of the protrusion 409 in the directions 503a and 503b is limited by the size of the protrusion 409 (for example, the diameter of the head shown is equal to twice the radius "2R1"). The extension opening 411 is buckled at the position of the protrusion 409 The width of 505. In the illustrated example, the protrusion 409 may be located in the first position “P1”, wherein the width 505 may be equal to the size of the protrusion 409 (for example, “2R1”), and the restraining device inhibits (for example, prevents) the support member 301 from being wound Rotates around the rotation shaft 309. Alternatively, as shown in the second position “P2”, the restricted movement of the protrusion 409 in the directions 503a, 503b allows the restricted rotation movement 307 of the support member 301 about the rotation axis 309.

如上文所論述，限制裝置407可因此改變支撐構件301繞著旋轉軸309的旋轉移動307的程度(若有)，其取決於突部409在延長開口411內的位置。例如，延長開口可沿著行進路徑501而軸向拉錐，該行進路徑可平行於旋轉軸309。確實，如所顯示地，延長開口411可在延伸方向507中從支撐構件301相對於基座303的至少部分縮回位置「P2」拉錐到支撐構件301相對於基座303的完全延伸位置「P1」。由於延伸方向507中的延長開口411的選擇性拉錐性質，支撐構件301在完全延伸位置「P1」中可具有相對小的旋轉移動307或沒有旋轉移動307，並在至少部分縮回位置「P2」中可具有較大的受限旋轉移動307。As discussed above, the restriction device 407 may thus change the extent, if any, of the rotational movement 307 of the support member 301 about the rotation axis 309, depending on the position of the protrusion 409 within the extension opening 411. For example, the extension opening may be tapered axially along a travel path 501, which may be parallel to the rotation axis 309. Indeed, as shown, the extension opening 411 can be tapered from the at least partially retracted position "P2" of the support member 301 relative to the base 303 in the extension direction 507 to the fully extended position of the support member 301 relative to the base 303 " P1 ". Due to the selective taper nature of the extension opening 411 in the extension direction 507, the support member 301 may have a relatively small rotational movement 307 or no rotational movement 307 in the fully extended position "P1", and in at least a partially retracted position "P2 ”May have a larger restricted rotational movement 307.

如此，參考圖3至圖5，支撐構件301可在完全延伸軸向位置「P1」中相對於基座303定位，其中限制裝置407對支撐構件301提供繞著旋轉軸309的旋轉移動307的第一限制。例如，在圖5中顯示的完全延伸軸向位置「P1」處，限制裝置407提供旋轉移動307的幾乎0∘的第一限制，因為突部409(例如所繪示的柄部的頭部)可緊實地坐落在延長開口411的端部內，從而防止突部409在方向503a、503b中相對於延長開口411移動。進一步而言，支撐構件301可在至少部分縮回位置「P2」中相對於基座303定位，其中限制裝置407對支撐構件301提供繞著旋轉軸309的旋轉移動307的第二限制，該第二限制可大於旋轉移動的第一限制。確實，限制裝置407提供旋轉移動307的大於0∘的第二限制，因為突部409(例如所繪示的柄部的頭部)可被允許在方向503a、503b中具有受限的移動，其取決於延長開口411在突部位置處的寬度505相較於突部的尺寸(例如直徑)的差異。In this way, referring to FIGS. 3 to 5, the support member 301 can be positioned relative to the base 303 in the fully extended axial position “P1”, wherein the restricting device 407 provides the support member 301 with a first One limitation. For example, at the fully extended axial position “P1” shown in FIG. 5, the restricting device 407 provides a first limit of almost 0 ° of the rotational movement 307 because the protrusion 409 (such as the head of the handle shown) It can be seated tightly in the end of the extension opening 411, thereby preventing the protrusion 409 from moving relative to the extension opening 411 in the directions 503a, 503b. Further, the support member 301 can be positioned relative to the base 303 in at least a part of the retracted position “P2”, wherein the restriction device 407 provides the support member 301 with a second restriction on the rotational movement 307 about the rotation axis 309. The second limit may be greater than the first limit of the rotational movement. Indeed, the restriction device 407 provides a second restriction greater than 0 ° of the rotational movement 307, because the protrusion 409 (such as the head of the handle shown) may be allowed to have restricted movement in the directions 503a, 503b, which Depending on the difference in the width (505) of the extension opening 411 at the location of the protrusion compared to the size (eg, diameter) of the protrusion.

如圖5所顯示，突部409及延長開口411之間的互動可進一步限制支撐構件301相對於基座303沿著支撐構件301的旋轉軸309的軸向方向的軸向移動311。例如，如圖5所顯示，突部(例如所繪示的柄部的頭部)可在延伸方向507中沿著行進路徑501移動至完全延伸位置「P1」，其中突部及延長開口沿著鄰接區域509的邊緣之間的互動防止支撐構件301相對於基座303進一步的延伸。如所進一步繪示地，突部可在相反縮回方向中沿著行進路徑501移動至完全縮回位置「P3」，其中突部及延長開口沿著鄰接點或區域511的邊緣之間的互動防止支撐構件301相對於基座303進一步的縮回。在一個實例中，對應至完全延伸位置的鄰接區域509可包括半徑R1，該半徑R1可小於鄰接區域511對應至完全縮回位置的半徑R2，其中R2可大於R1。As shown in FIG. 5, the interaction between the protrusion 409 and the extension opening 411 can further limit the axial movement 311 of the support member 301 relative to the base 303 along the axial direction of the rotation axis 309 of the support member 301. For example, as shown in FIG. 5, the protrusion (such as the head of the handle shown) can be moved in the extension direction 507 along the travel path 501 to the fully extended position “P1”, where the protrusion and the extension opening are along The interaction between the edges of the abutment area 509 prevents the support member 301 from further extending relative to the base 303. As further illustrated, the protrusions can be moved in the opposite retraction direction along the travel path 501 to the fully retracted position "P3", where the protrusions and extension openings interact along the edge of the adjacent point or area 511 The support member 301 is prevented from further retracting with respect to the base 303. In one example, the abutting region 509 corresponding to the fully extended position may include a radius R1, which may be smaller than the radius R2 of the abutting region 511 corresponding to the fully retracted position, where R2 may be greater than R1.

在進一步的實例中，基座303可包括流體軸承417，該流體軸承經配置以用流體緩衝來支撐支撐構件301。流體可包含諸如水或其他流體的液體，例如用於清潔的洗滌劑、促進刻痕程序的潤滑液，或其他液體。流體可替代地包含空氣或其他氣體。在任何情況中，流體緩衝可在支撐構件301的外表面(例如，所繪示的軸桿的外表面)及由流體軸承417所界定的內孔的內表面之間產生。流體緩衝可經作用以浮置(levitate)在流體軸承417的內孔內的支撐構件301，以減少摩擦，否則該摩擦將藉由支撐構件301與基座303的直接接觸而存在。In a further example, the base 303 may include a fluid bearing 417 configured to support the support member 301 with a fluid buffer. The fluid may include a liquid such as water or other fluids, such as a detergent for cleaning, a lubricating liquid to facilitate the scoring process, or other liquids. The fluid may alternatively contain air or other gases. In any case, a fluid cushion may be created between the outer surface of the support member 301 (eg, the outer surface of the shaft as shown) and the inner surface of the inner hole defined by the fluid bearing 417. The fluid buffer can be used to levitate the support member 301 in the inner hole of the fluid bearing 417 to reduce friction, otherwise the friction will exist through direct contact between the support member 301 and the base 303.

如圖4所進一步繪示，刻痕裝置169b可進一步包含摩擦構件419，該摩擦構件可靠在支撐構件301及基座303的其中一者偏壓(例如，藉由彈簧421)，以提供預定等級的阻力，該阻力抵抗支撐構件301相對於基座303繞著支撐構件301的旋轉軸309的旋轉移動307。在一些實例中，摩擦構件可包括所繪示的摩擦區塊，該摩擦區塊經設計以藉由摩擦提供抵抗旋轉的阻力，該摩擦是由摩擦區塊經偏壓以直接與支撐構件及基座的其中一者直接接觸而產生。在所繪示的實施例中，壓縮彈簧可壓縮地設置，使得摩擦區塊可壓靠至支撐構件301的外表面。在一些實例中，摩擦構件419可經建構以使對支撐構件相對於基座的旋轉移動所施加的摩擦阻力比對支撐構件相對於基座的軸向移動所施加的摩擦阻力更大。例如，區塊可包括一或更多個接合凸條，該等接合凸條在旋轉軸309的方向中延伸。結果，所期望的減少摩擦仍可針對支撐構件相對於基座的軸向移動達成，同時所期望的摩擦量可針對支撐構件相對於基座的旋轉移動引入。As further illustrated in FIG. 4, the scoring device 169b may further include a friction member 419, which is reliably biased (for example, by a spring 421) to one of the support member 301 and the base 303 to provide a predetermined level This resistance resists the rotational movement 307 of the support member 301 relative to the base 303 around the rotation axis 309 of the support member 301. In some examples, the friction member may include a friction block as shown, the friction block is designed to provide resistance to rotation by friction, and the friction is biased by the friction block to directly contact the support member and the base. One of the seats comes into direct contact. In the illustrated embodiment, the compression spring is compressively disposed so that the friction block can be pressed against the outer surface of the support member 301. In some examples, the friction member 419 may be configured such that the frictional resistance applied to the rotational movement of the support member relative to the base is greater than the frictional resistance applied to the axial movement of the support member relative to the base. For example, the block may include one or more engaging ridges that extend in the direction of the rotation axis 309. As a result, the desired reduction in friction can still be achieved for the axial movement of the support member relative to the base, while the desired amount of friction can be introduced for the rotational movement of the support member relative to the base.

刻痕裝置169b可進一步包括刻痕元件312，該刻痕元件相對於支撐構件301的外端313而安裝在離支撐構件301的旋轉軸309偏移距離「D」處。刻痕元件312可包括刻痕輪、固定刻痕點或其他經配置以對玻璃薄板的表面刻痕的合適刻痕裝置。在一些實例中，刻痕元件312可裝載於可移除匣體，該可移除匣體經配置以相對於支撐構件301的外端313可移除地附接。The scoring device 169b may further include a scoring element 312 which is mounted at an offset distance “D” from the rotation axis 309 of the support member 301 with respect to the outer end 313 of the support member 301. The scoring element 312 may include a scoring wheel, a fixed scoring point, or other suitable scoring device configured to score the surface of the glass sheet. In some examples, the scoring element 312 may be loaded on a removable cassette configured to be removably attached relative to the outer end 313 of the support member 301.

如上文所述，刻痕設備161a、161b可進一步包括以上論述且在圖1及圖2中示意性地呈現的支撐裝置169a。支撐裝置169a的一個實例進一步在圖6至圖14中示意性地繪示。支撐裝置169a可經配置以在刻痕元件312對玻璃條帶103的第一主要表面213刻痕的同時，支撐玻璃條帶103的第二主要表面215。參考，例如圖6，在一個實例中，支撐裝置169a可包括匣體基座621，該匣體基座可以橫向刻痕速率沿著軌道167a的方向168移動，該橫向刻痕速率與刻痕裝置169b的橫向刻痕速率匹配。支撐裝置169a可進一步包括延伸基座623，該延伸基座可相對於匣體基座621而在朝向玻璃條帶的第二主要表面215的方向625中延伸，舉例而言，藉由所繪示的驅動齒輪627。驅動齒輪627可替代地使延伸基座623在相反於方向625的方向中相對於匣體基座621縮回，亦即，遠離玻璃條帶的第二主要表面215。支撐裝置169a可進一步包括支撐元件，例如所繪示的輪子629，該輪子可藉由臂部631而相對於延伸基座623延伸或縮回。在一個實例中，臂部可由空氣缸體或其他偏壓裝置而偏壓至延伸位置，例如圖6中所顯示。所繪示的輪子629包括不被驅動的閒置轉輪，儘管進一步的實例中可提供驅動輪。輪子可包括平坦外表面633，儘管在進一步的實例中，該外表面可具有其他形狀(例如彎曲形狀)。As mentioned above, the scoring device 161a, 161b may further include a support device 169a discussed above and schematically presented in Figs. 1 and 2. An example of the supporting device 169a is further schematically illustrated in FIGS. 6 to 14. The support device 169a may be configured to support the second major surface 215 of the glass ribbon 103 while the notch element 312 scores the first major surface 213 of the glass ribbon 103. Referring to, for example, FIG. 6, in one example, the supporting device 169a may include a box base 621 that can be moved along the direction 168 of the track 167a at a lateral scoring rate, the lateral scoring rate and the scoring device The 169b lateral score rate matches. The supporting device 169a may further include an extension base 623 that may extend in a direction 625 toward the second major surface 215 of the glass strip relative to the box base 621, for example, as shown by the drawing Driving gear 627. The drive gear 627 may alternatively retract the extension base 623 relative to the cassette base 621 in a direction opposite to the direction 625, that is, away from the second major surface 215 of the glass ribbon. The support device 169a may further include a support element, such as the illustrated wheel 629, which can be extended or retracted relative to the extension base 623 by the arm portion 631. In one example, the arms may be biased to an extended position by an air cylinder or other biasing means, such as shown in FIG. 6. The illustrated wheels 629 include idle wheels that are not driven, although drive wheels may be provided in further examples. The wheel may include a flat outer surface 633, although in further examples, the outer surface may have other shapes (eg, a curved shape).

現在將描述對玻璃條帶刻痕的方法。在一些實例中，方法可包括以下步驟：將刻痕元件312降落在玻璃條帶103的第一主要表面213上。例如，圖8繪示刻痕元件312在降落點801處降落在玻璃條帶103的第一主要表面213上。在所繪示的實例中，降落可發生在刻痕裝置169b於軌道167b的方向168中行進的同時。確實，如圖8所示意性地繪示，刻痕裝置169b可包括匣體基座803，該匣體基座可以橫向刻痕速率沿著軌道167b的方向168移動，該橫向刻痕速率與支撐裝置169a的橫向刻痕速率匹配。刻痕裝置169b可進一步包括延伸基座805，該延伸基座可相對於匣體基座803而在朝向玻璃條帶的第一主要表面213的方向807中延伸，舉例而言，藉由所繪示的驅動齒輪809。驅動齒輪809可替代地使延伸基座805在相反於方向807的方向中相對於匣體基座803縮回，亦即，遠離玻璃條帶的第一主要表面213。A method of scoring a glass strip will now be described. In some examples, the method may include the step of dropping the scoring element 312 on the first major surface 213 of the glass strip 103. For example, FIG. 8 illustrates that the scoring element 312 is dropped on the first major surface 213 of the glass strip 103 at the landing point 801. In the illustrated example, the landing may occur while the scoring device 169b is traveling in the direction 168 of the track 167b. Indeed, as shown schematically in FIG. 8, the scoring device 169 b may include a box base 803 that can move along the direction 168 of the track 167 b at a lateral scoring rate, and the lateral scoring rate and support The lateral scoring rate of the device 169a is matched. The scoring device 169b may further include an extension base 805 that may extend in a direction 807 toward the first major surface 213 of the glass strip relative to the cassette base 803, for example, by drawing Illustrative drive gear 809. The drive gear 809 may alternatively retract the extension base 805 relative to the cassette base 803 in a direction opposite to the direction 807, that is, away from the first major surface 213 of the glass ribbon.

降落的步驟可包括以下步驟：將支撐構件301相對於刻痕裝置169b的基座303朝向延伸位置偏壓，該刻痕裝置可結合為延伸基座805的一部分。例如，參考圖4，基座303的內部區域401可借助於壓力源的方式而用流體源(例如，流體、氣體)加壓，該壓力源經設置以與壓力端口405流體連通。在一個實例中，加壓空氣源可經設置以借助於壓力端口405的方式與內部區域401連通。閥或其他壓力管制機構可控制內部區域401內的壓力，並從而控制支撐構件301的偏壓力量。在一些實例中，內部區域401內的壓力可由壓力控制系統維持在幾乎固定的壓力。替代地，內部區域401內的壓力可由壓力控制系統控制以在刻痕程序期間變化。在進一步的實例中，內部區域401內的壓力可經控制以提供幾乎固定的力量，例如變化不大於標稱施加力量的5%的力量，而支撐構件301可位於至少部分縮回的軸向位置中。例如，在圖8中所顯示的刻痕元件312的初始降落處，支撐構件301可位於完全延伸位置中。由於延伸基座805可藉由驅動齒輪809進一步相對於匣體基座803延伸，隨著支撐構件301達到圖9中顯示的部分縮回位置，由支撐構件所施加的力量可幾乎維持固定。從而，刻痕元件312可在方向807中或相反方向807中前後地以受限的程度橫動，而刻痕元件312壓靠在玻璃條帶103的第一主要表面213的力量維持幾乎固定。The step of landing may include the step of biasing the support member 301 relative to the base 303 of the scoring device 169b toward the extended position, which may be incorporated as a part of the extended base 805. For example, referring to FIG. 4, the inner region 401 of the base 303 may be pressurized with a fluid source (eg, fluid, gas) by means of a pressure source, which is arranged to be in fluid communication with the pressure port 405. In one example, a source of pressurized air may be provided to communicate with the internal region 401 by means of a pressure port 405. A valve or other pressure control mechanism may control the pressure in the inner region 401 and thereby control the biasing force of the support member 301. In some examples, the pressure in the inner region 401 may be maintained at a nearly fixed pressure by a pressure control system. Alternatively, the pressure in the inner region 401 may be controlled by a pressure control system to vary during the scoring procedure. In a further example, the pressure in the inner region 401 may be controlled to provide an almost fixed force, such as a force that does not vary by more than 5% of the nominal applied force, and the support member 301 may be located in an axial position that is at least partially retracted in. For example, at the initial landing of the scoring element 312 shown in FIG. 8, the support member 301 may be in a fully extended position. Since the extension base 805 can be further extended relative to the case base 803 by the driving gear 809, as the support member 301 reaches the partially retracted position shown in FIG. 9, the force exerted by the support member can be kept almost fixed. Thus, the scoring element 312 can traverse back and forth to a limited extent in the direction 807 or the opposite direction 807, while the force of the scoring element 312 against the first major surface 213 of the glass strip 103 remains almost constant.

對玻璃條帶103刻痕的方法亦可包括以下步驟：產生圖10中顯示的刻痕線1001。如上文所論述，圖8繪示刻痕元件312在降落點801處的初始降落。刻痕元件312在方向168中持續以完全刻痕速率橫動，直到達到完全裂口深度「V」，如圖10中所顯示。由於浮動偏壓的支撐構件301，刻痕元件可隨著其沿著刻痕線1001的長度行進而用幾乎固定的力量壓靠至玻璃條帶103，從而沿著刻痕線1001從圖10中顯示的點1003至圖11中顯示的點1101提供幾乎固定的裂口深度「V」，其中在點1101處，刻痕元件312開始在遠離玻璃條帶103的第一主要表面213的方向中升高。The method of scoring the glass strip 103 may also include the following steps: generating a scoring line 1001 shown in FIG. 10. As discussed above, FIG. 8 illustrates the initial landing of the scoring element 312 at the landing point 801. The scoring element 312 continues to traverse at the full scoring rate in the direction 168 until the full nick depth “V” is reached, as shown in FIG. 10. Due to the floating-biased support member 301, the scoring element can be pressed against the glass strip 103 with a nearly constant force as it travels along the length of the scoring line 1001, thus following the scoring line 1001 from FIG. 10 The point 1003 shown to point 1101 shown in FIG. 11 provides an almost constant nick depth “V”, where at the point 1101, the scoring element 312 begins to rise in a direction away from the first major surface 213 of the glass strip 103 .

因此應理解，支撐構件301可相對於基座303而在支撐構件301的旋轉軸309的軸向方向311中軸向移動。確實，支撐構件301可從相對於基座303的完全延伸軸向位置(圖8中所顯示)而相對於基座303軸向移動到至少部分縮回的軸向位置(圖9中所顯示)。如圖10中所顯見地，刻痕元件312產生刻痕線1001的一部分(具有裂口深度「V」)，而支撐構件301位於至少部分縮回的軸向位置中。It should therefore be understood that the support member 301 is axially movable relative to the base 303 in the axial direction 311 of the rotation axis 309 of the support member 301. Indeed, the support member 301 can move axially relative to the base 303 from a fully extended axial position relative to the base 303 (shown in FIG. 8) to an axial position that is at least partially retracted (shown in FIG. 9). . As is apparent from FIG. 10, the scoring element 312 produces a portion of the scoring line 1001 (with a nick depth "V"), while the support member 301 is in an axial position that is at least partially retracted.

進一步而言，在刻痕裝置169b沿著刻痕線1001的一部分於裂口深度「V」刻痕的同時，刻痕元件312可用幾乎固定的力量壓靠至玻璃條帶103。確實，借助於偏壓裝置的方式，例如由加壓內部區域401提供的流體彈簧，刻痕裝置169b可在刻痕裝置169b沿著刻痕線1001的一部分刻痕的同時產生刻痕元件312靠至玻璃條帶103幾乎固定的力量。如此，刻痕元件312可橫越微小的表面不規則性，同時刻痕元件持續以幾乎相同的力量被偏壓靠到玻璃條帶，並從而沿著大部分的刻痕線1001以幾乎相同的裂口深度「V」持續對刻痕線1001刻痕。Further, while the scoring device 169b scribes along the part of the scoring line 1001 at the nick depth "V", the scoring element 312 can be pressed against the glass strip 103 with almost a fixed force. Indeed, by means of a biasing means, such as a fluid spring provided by the pressurized inner region 401, the scoring device 169b can generate a scoring element 312 while the scoring device 169b is scoring along a portion of the scoring line 1001. The force to the glass strip 103 is almost fixed. In this way, the scoring element 312 can traverse minute surface irregularities, while the scoring element continues to be biased against the glass strip with almost the same force, and thus along most of the scoring line 1001 with almost the same The nick depth "V" continues to score the score line 1001.

玻璃條帶103的刻痕方法亦可包括以下步驟：提供支撐構件301，該支撐構件具有在完全延伸軸向位置中繞著旋轉軸309的旋轉移動307的第一限制，及在至少部分縮回軸向位置中繞著旋轉軸309的旋轉移動307的第二限制，該第二限制可大於旋轉移動307的第一限制。如此，在圖6至圖8中所顯示的完全延伸位置中，受限制的旋轉移動307(例如，0∘軸向移動)可被提供，使得在刻痕元件312初始降落在玻璃條帶103的第一主要表面213之前，刻痕元件312可沿著行進方向168而在旋轉軸309後方的距離「D」適當地預先對準。如此，刻痕元件不受控制的初始移動可被避免，否則因刻痕元件312可能傾向沿著行進方向168而在旋轉軸309後方擺動至平衡而使該初始移動發生。同時，一旦做初始接觸以允許刻痕元件312在旋轉軸309背後沿著行進方向168自然地跟隨，部分縮回的位置允許受限制的旋轉移動307，此舉是因為刻痕元件312相對於旋轉軸309的偏移距離「D」。結果，藉由在初始接觸期間避免不受控制的初始移動，可提供減少的刻痕線不規則性，同時進一步在與玻璃條帶103的初始接觸之後，提供允許繞著旋轉軸309的受限制旋轉移動的益處。The scoring method of the glass strip 103 may also include the steps of providing a support member 301 having a first restriction on the rotational movement 307 about the rotation axis 309 in a fully extended axial position, and retracting at least partially The second limit of the rotational movement 307 around the rotation axis 309 in the axial position may be greater than the first limit of the rotational movement 307. As such, in the fully extended position shown in FIGS. 6 to 8, a restricted rotational movement 307 (for example, 0 ° axial movement) may be provided such that the scoring element 312 initially falls on the glass ribbon 103 Before the first major surface 213, the scoring element 312 may be properly aligned in advance along the direction of travel 168 and a distance "D" behind the rotation axis 309. In this way, the uncontrolled initial movement of the scoring element can be avoided, otherwise the initial movement occurs because the scoring element 312 may tend to swing to a balance behind the rotation axis 309 in the direction of travel 168. At the same time, once the initial contact is made to allow the scoring element 312 to naturally follow the travel direction 168 behind the rotation axis 309, the partially retracted position allows a restricted rotational movement 307, which is because the scoring element 312 is relatively rotated The offset distance "D" of the shaft 309. As a result, by avoiding uncontrolled initial movement during the initial contact, it is possible to provide reduced scoring line irregularities while further providing a restricted allowance around the rotation axis 309 after the initial contact with the glass ribbon 103 Benefits of rotary movement.

對玻璃條帶103刻痕的方法亦可包括以下步驟：以流體緩衝支撐支撐構件301，以促進支撐構件301相對於基座303繞著支撐構件301的旋轉軸309的旋轉移動307。額外地或替代地，流體緩衝進一步促進支撐構件301相對於基座303沿著支撐構件301的旋轉軸309的軸向方向的軸向移動311。例如，流體(液體、氣體等等)可被提供於基座303的流體軸承及支撐構件301之間，以促進旋轉移動307及/或軸向移動311。在僅一個實例中，如位於兩個示例性位置中的模範示意壓力端口315所顯示，加壓空氣(或其他氣體)可被引入由殼體305所界定的軸承壓力腔室425的外周邊區域423。加壓空氣可隨後通過流體軸承。確實，流體軸承可包括多孔材料，其中加壓流體(例如空氣)可從外周邊區域423通過多孔流體軸承417，並隨後在周邊內空間427處累積為流體(例如空氣)的緩衝，該周邊內空間界定在支撐構件301的外周邊表面與流體軸承417的內周邊內孔表面之間。壓力端口315可經設置以與流體源流體連通，該流體源例如加壓空氣源，該加壓空氣源可人工地或者自動地由閥及/或控制機構調節。The method of scoring the glass strip 103 may also include the following steps: supporting the support member 301 with a fluid buffer to promote the rotation movement 307 of the support member 301 relative to the base 303 around the rotation axis 309 of the support member 301. Additionally or alternatively, the fluid buffering further promotes the axial movement 311 of the support member 301 relative to the base 303 along the axial direction of the rotation axis 309 of the support member 301. For example, a fluid (liquid, gas, etc.) may be provided between the fluid bearing of the base 303 and the support member 301 to facilitate rotational movement 307 and / or axial movement 311. In just one example, as shown by the exemplary schematic pressure port 315 in two exemplary locations, pressurized air (or other gas) may be introduced into the outer peripheral region of the bearing pressure chamber 425 defined by the housing 305 423. Pressurized air can then pass through the fluid bearing. Indeed, the fluid bearing may include a porous material in which pressurized fluid (e.g., air) may pass from the outer peripheral region 423 through the porous fluid bearing 417 and then accumulate as a buffer of fluid (e.g., air) at the peripheral inner space 427, which A space is defined between the outer peripheral surface of the support member 301 and the inner peripheral inner hole surface of the fluid bearing 417. The pressure port 315 may be provided in fluid communication with a fluid source, such as a source of pressurized air, which may be manually or automatically adjusted by a valve and / or control mechanism.

流體軸承417可大幅減少基座303與支撐構件301之間的摩擦。確實，由於支撐構件301可實質上在流體緩衝(例如空氣)上漂浮，故由基座303與支撐構件301之間實際接觸所造成的大摩擦力量可被減少或消除。同時，流體串流可被允許從外介面429流出，從而產生導向刻痕元件312的流體串流。從而，在刻痕程序期間所自然地產生的玻璃晶片可依期望地被外介面429所發射的流體串流所吹走。如此，加壓流體可經動作以提供流體軸承，而同時亦提供移除所不期望的殘餘玻璃晶片的益處，否則該等玻璃晶片可能汙染玻璃條帶103的初始主要表面213、215之其中一者或兩者。The fluid bearing 417 can greatly reduce the friction between the base 303 and the support member 301. Indeed, since the support member 301 can float substantially on a fluid buffer (such as air), the large frictional force caused by the actual contact between the base 303 and the support member 301 can be reduced or eliminated. At the same time, a fluid stream may be allowed to flow out of the outer interface 429, thereby creating a fluid stream directed to the scoring element 312. Thus, the glass wafer naturally generated during the scoring process can be blown away by the fluid stream emitted by the external interface 429 as desired. In this way, the pressurized fluid can be acted upon to provide a fluid bearing, while also providing the benefit of removing undesired residual glass wafers that would otherwise contaminate one of the original major surfaces 213, 215 of the glass ribbon 103 Or both.

如上文所論述地，對流體軸承417提供流體緩衝可減少基座303與支撐構件301之間的摩擦。如此，刻痕元件312在降落時可減少對玻璃薄板的衝擊(見圖8)。確實，減少的摩擦從而減少支撐構件相對於基座303的縮回阻力。此外，如圖4所顯示，支撐構件301可具有藉由移除部分支撐構件所提供的減少的質量。例如，僅在一個實例中，支撐構件301可包括幾乎中空的管子，該管子由內孔431沿著支撐構件301的旋轉軸309軸向延伸而產生。當刻痕元件312降落到玻璃條帶103的第一主要表面時，減少質量進一步減少刻痕裝置312的衝擊力量。由於支撐構件301的減少質量及基座303與支撐構件301之間的減少摩擦，可相對快速地達成刻痕元件312降落到第一主要表面213而同時減少衝擊力量，否則該衝擊力量可能造成玻璃條帶的第一主要表面213的損傷。As discussed above, providing fluid cushioning to the fluid bearing 417 may reduce friction between the base 303 and the support member 301. In this way, the scoring element 312 can reduce the impact on the glass sheet when landing (see FIG. 8). Indeed, the reduced friction thus reduces the retraction resistance of the support member relative to the base 303. Further, as shown in FIG. 4, the support member 301 may have a reduced mass provided by removing a portion of the support member. For example, in only one example, the support member 301 may include an almost hollow tube produced by an inner hole 431 extending axially along the rotation axis 309 of the support member 301. When the scoring element 312 falls to the first major surface of the glass strip 103, reducing the mass further reduces the impact force of the scoring device 312. Due to the reduced mass of the support member 301 and the reduced friction between the base 303 and the support member 301, the scoring element 312 can be relatively quickly reached the first major surface 213 while reducing the impact force, otherwise the impact force may cause glass Damage to the first major surface 213 of the strip.

基座303與支撐構件301之間的減少摩擦及/或支撐構件301的減少質量亦可促進刻痕元件312快速地從玻璃條帶103的第一主要表面213升起。確實，在一個實例中，內部區域401可被減壓，其中支撐構件301可快速地相對於基座303縮回，多虧流體軸承所提供的減少摩擦及支撐構件301所提供的減少質量。此外，驅動齒輪809可快速地將刻痕裝置169b拉離玻璃條帶103，多虧支撐構件301提供的減少質量。The reduced friction between the base 303 and the support member 301 and / or the reduced mass of the support member 301 may also facilitate the rapid rise of the scoring element 312 from the first major surface 213 of the glass strip 103. Indeed, in one example, the inner region 401 can be decompressed, wherein the support member 301 can be quickly retracted relative to the base 303, thanks to the reduced friction provided by the fluid bearing and the reduced mass provided by the support member 301. In addition, the drive gear 809 can quickly pull the scoring device 169b away from the glass ribbon 103, thanks to the reduced mass provided by the support member 301.

儘管可能對支撐構件301繞著旋轉軸309的旋轉期望特定等級的減少阻力，但亦可能期望對支撐構件301相對於基座303繞著支撐構件301的旋轉軸309的旋轉移動307重新引入預定等級的阻力(例如，藉由摩擦構件419)。例如，對旋轉移動307重新引入預定等級的阻力可隨著刻痕元件312初始降落在玻璃條帶103的第一主要表面213上而協助進一步抑制刻痕元件不受控制的初始移動。額外地或替代地，以上提及的限制裝置407亦可幫助適當地將刻痕元件312在行進方向168後方的距離「D」處預先對準。如此，在一些實例中，預定等級的阻力(例如藉由摩擦構件419提供)及限制裝置407兩者可一起作用，以協助防止刻痕元件不受控制的移動，否則該不受控制的移動可能隨著刻痕元件312沿著行進方向擺動到旋轉軸309後方的平衡位置而發生。Although a specific level of resistance may be desired for rotation of the support member 301 about the rotation axis 309, it may also be desirable to reintroduce a predetermined level of rotation 307 of the support member 301 relative to the base 303 around the rotation axis 309 of the support member 301 (For example, by friction member 419). For example, reintroducing a predetermined level of resistance to the rotational movement 307 may assist in further suppressing the uncontrolled initial movement of the scoring element as the scoring element 312 initially falls on the first major surface 213 of the glass strip 103. Additionally or alternatively, the above-mentioned restriction device 407 can also help properly align the scoring element 312 in advance at a distance “D” behind the direction of travel 168. As such, in some examples, both a predetermined level of resistance (e.g., provided by the friction member 419) and the restriction device 407 may work together to help prevent uncontrolled movement of the scoring element, which could otherwise be prevented Occurs as the scoring element 312 swings to a balanced position behind the rotation shaft 309 in the direction of travel.

對玻璃條帶103刻痕的方法亦可包括以下步驟：將支撐元件(例如輪子629)降落到玻璃條帶103的第二主要表面215上。確實，如圖6至圖14中所顯示，在一些實例中，支撐元件可與刻痕元件312一起行進，使得在輪子629對第二主要表面215提供合適的支撐及力量的同時，刻痕線1001被刻痕元件312產生，該力量可與刻痕元件312對第一主要表面提供的力量相對應或相匹配。進一步而言，支撐元件可施加幾乎固定的力量(例如，藉由流體缸體)，其中臂部631可允許輪子629在方向625或反方向625中移動，以允許輪子629行進經過表面不規則性而同時仍提供幾乎固定的力量。The method of scoring the glass strip 103 may also include the step of dropping a support element (such as a wheel 629) onto the second major surface 215 of the glass strip 103. Indeed, as shown in FIGS. 6 to 14, in some examples, the support element may travel with the scoring element 312 such that while the wheel 629 provides suitable support and strength to the second major surface 215, the scoring line 1001 is generated by the scoring element 312, which force may correspond to or match the force provided by the scoring element 312 on the first major surface. Further, the support element may apply an almost fixed force (e.g., by a fluid cylinder), wherein the arm portion 631 may allow the wheel 629 to move in a direction 625 or a reverse direction 625 to allow the wheel 629 to travel through surface irregularities While still providing almost fixed power.

現在將進一步參考圖1、圖2及圖6至圖14來進一步描述進一步的示例性方法。在一些實例中，方法可經應用以對圖1中所繪示的玻璃條帶103刻痕，該玻璃條帶可包括第一圓緣225a，該第一圓緣界定玻璃條帶103的第一外部限制227a、第二圓緣225b，該第二圓緣界定玻璃條帶103的第二外部限制227b，及界定在第一外部限制227a及第二外部限制227b之間的寬度「W」。如圖6所顯示，玻璃條帶103的中央部分603的厚度217可小於第一圓緣225a的厚度605。類似地，如圖12所顯示，中央部分603的厚度217可小於第二圓緣225b的厚度605。在一些實例中，第一圓緣225a的厚度605可幾乎等於第二圓緣225b的厚度605，儘管在進一步的實例中圓緣可具有不同的厚度，每個該等圓緣的厚度是大於中央部分603的厚度217。每個圓緣225a、225b亦包括幾乎平坦的表面607a、607b，該等幾乎平坦的表面界定在分別的圓緣的分別內邊緣609a、610a及分別外邊緣609b、610b之間。在一些實例中，幾乎平坦的表面607a、607b是由邊緣滾輪組件149a、149b的邊緣滾輪221所提供。確實，在所繪示的實施例中，邊緣滾輪221可包括所繪示的滾紋(knurled)表面，該等滾紋表面從而對幾乎平坦的表面607a、607b提供如圖1所顯示的滾紋表面。儘管具有滾紋表面，表面607a、607b被認定是幾乎平坦的，因為每個該等表面沿著分別的平面635a、635b延伸。在一些實例中，如所顯示地，分別的平面635a、635b是幾乎相對於彼此平行的。Further exemplary methods will now be further described with reference to FIGS. 1, 2, and 6 to 14. In some examples, the method may be applied to score the glass strip 103 illustrated in FIG. 1, which may include a first rounded edge 225 a that defines a first The outer limit 227a, the second rounded edge 225b, which defines the second outer limit 227b of the glass strip 103, and the width "W" defined between the first outer limit 227a and the second outer limit 227b. As shown in FIG. 6, the thickness 217 of the central portion 603 of the glass strip 103 may be smaller than the thickness 605 of the first rounded edge 225 a. Similarly, as shown in FIG. 12, the thickness 217 of the central portion 603 may be smaller than the thickness 605 of the second rounded edge 225b. In some examples, the thickness 605 of the first rounded edge 225a may be almost equal to the thickness 605 of the second rounded edge 225b, although the rounded edges may have different thicknesses in further examples, the thickness of each such rounded edge is greater than the center The thickness of the portion 603 is 217. Each of the rounded edges 225a, 225b also includes almost flat surfaces 607a, 607b, which are defined between respective inner edges 609a, 610a and respective outer edges 609b, 610b of the respective rounded edges. In some examples, the almost flat surfaces 607a, 607b are provided by the edge rollers 221 of the edge roller assemblies 149a, 149b. Indeed, in the illustrated embodiment, the edge roller 221 may include a knurled surface as shown, thereby providing the knurled surface as shown in FIG. 1 to the almost flat surfaces 607a, 607b. surface. Despite having a rolled surface, the surfaces 607a, 607b are considered to be almost flat, as each such surface extends along a separate plane 635a, 635b. In some examples, as shown, the respective planes 635a, 635b are almost parallel to each other.

為了此申請案的目的，每個圓緣225a、225b的第一內邊緣609a被界定為分別圓緣的最內圍的線，在該最內圍的線處，第一平面636a與分別的圓緣交會，該圓緣是平行於玻璃條帶103的第一主要表面213，並從玻璃條帶的第一主要表面213偏離10%的玻璃條帶103的中央部分603的厚度217。類似地，為了此申請案的目的，每個圓緣225a、225b的第二內邊緣610a被界定為分別圓緣的最內圍的線，在該最內圍的線處，第二平面636b與分別的圓緣交會，該圓緣是平行於玻璃條帶103的第二主要表面215，並從玻璃條帶的第二主要表面215偏離10%的玻璃條帶103的中央部分603的厚度217。For the purpose of this application, the first inner edge 609a of each round edge 225a, 225b is defined as the innermost line of the respective rounded edge, and at the innermost line, the first plane 636a and the respective circle At the intersection, the round edge is parallel to the first major surface 213 of the glass strip 103 and deviates from the first major surface 213 of the glass strip by 10% of the thickness 217 of the central portion 603 of the glass strip 103. Similarly, for the purposes of this application, the second inner edge 610a of each of the rounded edges 225a, 225b is defined as the innermost line of the rounded edge, respectively. At the innermost line, the second plane 636b and The respective rounded edges meet, the rounded edges being parallel to the second major surface 215 of the glass strip 103 and deviating from the second major surface 215 of the glass strip by a thickness 217 of the central portion 603 of the glass strip 103.

在整個申請案中，如圖6所顯示，第一平面636a及第二平面636b可彼此以距離612間隔開來，該距離是20%大於玻璃條帶103的中央部分603的厚度217。此外，如所顯示地，第一平面636a及第二平面636b的每一個是從玻璃條帶103的中央部分603的中央對稱平面216以距離612的一半(1/2)間隔開來。Throughout the application, as shown in FIG. 6, the first plane 636 a and the second plane 636 b may be spaced apart from each other by a distance 612, which is 20% greater than the thickness 217 of the central portion 603 of the glass strip 103. Further, as shown, each of the first plane 636a and the second plane 636b is spaced from the central symmetrical plane 216 of the central portion 603 of the glass strip 103 by a half (1/2) of the distance 612.

為了此應用程式的目的，每個圓緣225a、225b的第一外邊緣609b被界定為分別圓緣的最外圍的線，在該最外圍的線處，第一平面636a與分別的圓緣交會。如先前所述，第一平面636a是平行於玻璃條帶103的第一主要表面213，並從玻璃條帶的第一主要表面213偏離10%的玻璃條帶103的厚度217。為了此申請案的目的，每個圓緣225a、225b的第二外邊緣610b被定義為分別圓緣的最外圍的線，在該最外圍的線處，第二平面636b與分別的圓緣交會。如先前所述，第二平面636b是平行於玻璃條帶103的第二主要表面215，並從玻璃條帶的第二主要表面215偏離10%的玻璃條帶103的厚度217。For the purpose of this application, the first outer edge 609b of each rounded edge 225a, 225b is defined as the outermost line of the rounded edge, respectively, at which the first plane 636a meets the respective rounded edge . As described previously, the first plane 636a is parallel to the first major surface 213 of the glass ribbon 103 and deviates from the first major surface 213 of the glass ribbon by 10% of the thickness 217 of the glass ribbon 103. For the purpose of this application, the second outer edge 610b of each rounded edge 225a, 225b is defined as the outermost line of the rounded edge, respectively, at which the second plane 636b meets the respective rounded edge . As described previously, the second plane 636b is parallel to the second major surface 215 of the glass ribbon 103 and deviates from the second major surface 215 of the glass ribbon by 10% of the thickness 217 of the glass ribbon 103.

某些實施例的建構所提供的效益在於，在刻痕元件312沿著方向168以刻痕速率橫動的期間經過第一圓緣225a的第一內邊緣609a之後，該刻痕元件在第一主要表面213上的降落可相對快速地發生。確實，降落甚至可在不減緩刻痕裝置169b的情況下發生，從而允許刻痕線1001相對快速的刻痕，相較於在降落之前減緩刻痕裝置的替代程序而言。此外，由於支撐構件301相對低的質量及流體軸承417所提供的相對低的摩擦，支撐構件301可相對快速地延伸，以達到刻痕元件312的降落而未不利地影響玻璃條帶(從而造成潛在的應力裂痕及斷裂)，否則該不利的影響可能會隨著相對高質量的支撐構件301而發生。The benefit provided by the construction of certain embodiments is that after the notch element 312 traverses the first inner edge 609a of the first round edge 225a during the traverse of the notch rate 312 along the direction 168, the notch element is at the first Landing on the major surface 213 can occur relatively quickly. Indeed, the landing can occur even without slowing down the scoring device 169b, allowing the score line 1001 to be scored relatively quickly compared to an alternative procedure to slow down the scoring device before landing. In addition, due to the relatively low mass of the support member 301 and the relatively low friction provided by the fluid bearing 417, the support member 301 can be extended relatively quickly to achieve the landing of the scoring element 312 without adversely affecting the glass ribbon (thus causing Potential stress cracks and fractures), otherwise this adverse effect may occur with relatively high-quality support members 301.

如圖6及圖7所顯示，在一個實例中，在刻痕元件312接觸玻璃條帶103之前，刻痕裝置169b的刻痕元件312可在以至少500 mm/s的橫向刻痕速率行進的同時，通過第一圓緣225a的幾乎平坦的表面607a、607b。在一些實例中，橫向刻痕速率可為約500 mm/s至約1500 mm/s，例如約750 mm/s至約1500 mm/s。As shown in FIGS. 6 and 7, in one example, before the scoring element 312 contacts the glass strip 103, the scoring element 312 of the scoring device 169 b may travel at a lateral scoring rate of at least 500 mm / s. At the same time, the almost flat surfaces 607a, 607b of the first rounded edge 225a are passed. In some examples, the lateral scoring rate may be about 500 mm / s to about 1500 mm / s, such as about 750 mm / s to about 1500 mm / s.

如圖8所顯示，方法可進一步包括以下步驟：在刻痕元件312可能在上述的橫向刻痕速率行進的同時，將刻痕元件312降落在玻璃條帶103的第一主要表面213上的降落點801處，該降落點可位在離第一圓緣225a的幾乎平坦表面607a的內邊緣609a小於或等於約20 mm的距離804處。在離內邊緣609a小於或等於約20 mm的距離804處提供降落點801可協助將刻痕線1001最大化，而仍提供刻痕線相對快速的形成，因為刻痕裝置169b可以刻痕裝置169b於完全裂口深度「V」處對刻痕線1001刻痕時所行進的速率降落。As shown in FIG. 8, the method may further include the step of landing the scoring element 312 onto the first major surface 213 of the glass strip 103 while the scoring element 312 may travel at the above-mentioned lateral scoring rate. At point 801, the landing point may be located at a distance 804 less than or equal to about 20 mm from the inner edge 609a of the almost flat surface 607a of the first rounded edge 225a. Providing a landing point 801 at a distance 804 that is less than or equal to about 20 mm from the inner edge 609a can help maximize the score line 1001, while still providing a relatively rapid formation of the score line because the score device 169b can scoring device 169b The rate at which the scoring line 1001 is scored at the full breach depth "V" drops.

在其他實施例中，在刻痕元件312可能以上述的橫向刻痕速率行進的同時，刻痕元件312可降落在玻璃條帶103的第一主要表面213上的降落點處，該降落點所位在的距離是離玻璃條帶103的寬度方向中的側向邊緣的約25 mm至約75mm的範圍中。In other embodiments, while the scoring element 312 may travel at the above-mentioned lateral scoring rate, the scoring element 312 may land at a landing point on the first major surface 213 of the glass strip 103, the landing point being The distance is in the range of about 25 mm to about 75 mm from the lateral edge in the width direction of the glass strip 103.

完全裂口深度「V」被認定是為玻璃條帶103的中央部分603的厚度217的約8%至約15%，包含其間的所有範圍及子範圍，例如約8%至約12%的範圍中，或約10%至約15%的範圍中。在一些實例中，在降落刻痕元件312後，方法可進一步包括以下步驟：以橫向刻痕速率使刻痕元件312橫動，以在玻璃條帶103的第一主要表面213中產生刻痕線1001，該刻痕線具有裂口深度「V」，該裂口深度為玻璃條帶103的中央部分603的厚度217的約8%至約15%，包含其間的所有範圍及子範圍，例如約8%至約12%的範圍中，或約10%至約15%的範圍中。在一些實例中，由於適當地施加刻痕元件312幾乎固定的力量，故可在離降落點810小於或等於約5 mm處達到裂口深度「V」。如此，本揭示案的特徵可在刻痕裝置169a以完全刻痕速率行進的同時，相對靠近內邊緣609a地提供刻痕線1001，該刻痕線具有完全裂口深度「V」。The full rip depth "V" is considered to be about 8% to about 15% of the thickness 217 of the central portion 603 of the glass strip 103, including all ranges and subranges therebetween, such as in the range of about 8% to about 12% , Or in the range of about 10% to about 15%. In some examples, after landing the scoring element 312, the method may further include the step of traversing the scoring element 312 at a lateral scoring rate to generate a scoring line in the first major surface 213 of the glass ribbon 103 1001, the score line has a slit depth "V", which is about 8% to about 15% of the thickness 217 of the central portion 603 of the glass strip 103, including all ranges and subranges therebetween, such as about 8% In the range of about 12%, or in the range of about 10% to about 15%. In some examples, the nick depth “V” may be reached at a distance of less than or equal to about 5 mm from the landing point 810 due to the almost constant force applied by the scoring element 312. As such, the features of the present disclosure can provide a score line 1001 relatively near the inner edge 609a while the score device 169a travels at a full score rate, the score line having a full rip depth "V".

如上文所述，支撐構件301可經配置以用於繞著支撐構件301的旋轉軸309的旋轉移動307，其中刻痕元件312可在偏移距離「D」處相對於支撐構件301的外端313安裝。在一些實例中，偏移距離「D」可大於2 mm，以在刻痕元件312接觸玻璃條帶的表面之後，於旋轉軸後方提供有效的對準。確實，提供大於2 mm的偏移距離「D」可協助防止刻痕元件繞著旋轉軸的擺動，以產生相對直的刻痕線。圖15繪示速率相對於偏移距離「D」的模擬結果，其中垂直或Y軸是mm/s中的速率，而水平或X軸是mm中的偏移距離「D」。所描繪的曲線代表橫向刻痕速率對偏移距離「D」的比率，該比率為267 s-1 ，有效地提供旋轉軸後方的良好對準。如此，提供小於或等於約267 s-1 的比率將協助抑制震盪，該等震盪可能干擾刻痕線1001的品質。As described above, the support member 301 may be configured for rotational movement 307 about the rotation axis 309 of the support member 301, wherein the scoring element 312 may be relative to the outer end of the support member 301 at an offset distance "D" 313 installation. In some examples, the offset distance "D" may be greater than 2 mm to provide effective alignment behind the axis of rotation after the scoring element 312 contacts the surface of the glass ribbon. Indeed, providing an offset distance "D" greater than 2 mm can help prevent the scoring element from swinging around the axis of rotation to produce a relatively straight scoring line. FIG. 15 shows the simulation results of the velocity versus the offset distance “D”, where the vertical or Y axis is the velocity in mm / s, and the horizontal or X axis is the offset distance “D” in mm. The depicted curve represents the ratio of the lateral nick rate to the offset distance "D", which is 267 s -1 , effectively providing good alignment behind the axis of rotation. As such, providing a ratio of less than or equal to about 267 s -1 will help suppress oscillations, which may interfere with the quality of the score line 1001.

如圖9所顯示，在刻痕元件312降落後，刻痕元件312可以上述的刻痕速率橫動，以在玻璃條帶的第一主要表面213中產生位於點1003處的完全裂口深度「V」的刻痕線1001，如圖10所顯示。隨後，如圖11至圖13所顯示，刻痕元件可在升起點1103處從第一主要表面213升起，該升起點可位於離第二圓緣225b的幾乎平坦表面607a的內邊緣609a小於或等於約20 mm的距離1201處，而同時刻痕元件312可以橫向刻痕速率行進。由於流體軸承417提供的低摩擦及支撐構件301相對低的質量，刻痕元件312可快速地從玻璃條帶升起，從而允許刻痕元件刻痕相對較長的時間，而仍能夠清除第二圓緣225b的厚度。結果，較長的有效刻痕線可相對快速地達成，因為刻痕元件312可以完全刻痕速率從玻璃條帶升起。As shown in FIG. 9, after the scoring element 312 descends, the scoring element 312 can be traversed at the above-mentioned scoring rate to generate a full slit depth “V” at the point 1003 in the first major surface 213 of the glass strip. The score line 1001 is shown in FIG. 10. Subsequently, as shown in FIGS. 11 to 13, the scoring element may rise from the first major surface 213 at a rising starting point 1103, which may be located at an inner edge 609 a of an almost flat surface 607 a from the second rounded edge 225 b to Or at a distance 1201 of about 20 mm, while the scoring element 312 can travel at a lateral scoring rate. Due to the low friction provided by the fluid bearing 417 and the relatively low mass of the support member 301, the scoring element 312 can be quickly raised from the glass strip, thereby allowing the scoring element to be scribed for a relatively long time, while still being able to remove The thickness of the rounded edge 225b. As a result, longer effective scoring lines can be achieved relatively quickly because the scoring element 312 can rise from the glass ribbon at the full scoring rate.

如圖8所顯示，方法亦可包括以下步驟：將支撐元件(例如輪子629)降落在玻璃條帶103的第二主要表面215上，使支撐元件629與刻痕元件312以橫向刻痕速率一起橫動，而同時以刻痕元件312產生刻痕線1001。As shown in FIG. 8, the method may also include the steps of: lowering a supporting element (such as a wheel 629) on the second major surface 215 of the glass strip 103, so that the supporting element 629 and the scoring element 312 together at a lateral scoring rate Traverse, while simultaneously generating a score line 1001 with the score element 312.

應理解，在此的刻痕設備及方法的特徵允許相對快速地形成增進刻痕線，並在著陸時刻痕線具有減少的不規則性。確實，由於支撐構件301相對低的質量及流體軸承417提供的低摩擦允許支撐構件的軸向移動，刻痕裝置169b在刻痕元件312降落在玻璃條帶上時不需要被減緩。確實，刻痕裝置169b在降落期間可以完全刻痕速率行進(例如，大於500 mm/s，例如約500 mm/s至約1500 mm/s，例如約750 mm/s至約1500 mm/s)。如此，當比較於替代配置時，完全刻痕線可相對快速地產生，該替代配置於刻痕元件降落在玻璃條帶上時減緩刻痕裝置，以隨著刻痕元件著陸時衝擊玻璃條帶而避免應力斷裂。刻痕線快速的形成可減少完成刻痕過程所需要的垂直區域，並且對較大寬度的玻璃條帶是較理想的，否則對玻璃條帶的整個寬度刻痕將需要較長的時間。It should be understood that the features of the scoring apparatus and method herein allow relatively rapid formation of enhanced scoring lines and that the scoring lines have reduced irregularities at the moment of landing. Indeed, because the relatively low mass of the support member 301 and the low friction provided by the fluid bearing 417 allow the axial movement of the support member, the scoring device 169b need not be slowed down when the scoring element 312 is dropped on the glass strip. Indeed, the scoring device 169b can travel at a full scoring rate during landing (eg, greater than 500 mm / s, such as about 500 mm / s to about 1500 mm / s, such as about 750 mm / s to about 1500 mm / s) . In this way, when compared to an alternative configuration, a full score line can be generated relatively quickly. This alternative configuration slows down the score device when the score device is dropped on the glass ribbon to impact the glass ribbon as the score device lands Avoid stress cracking. The rapid formation of the scoring lines can reduce the vertical area required to complete the scoring process and is ideal for larger width glass strips, otherwise it will take longer to scoring the entire width of the glass strips.

進一步而言，限制裝置及/或摩擦構件419協助減少著陸期間不可控制的或不穩定的震盪，而偏移距離「D」允許刻痕元件312降落後在旋轉軸309後方的正確對準。Further, the restraint device and / or the friction member 419 help reduce uncontrollable or unstable vibrations during landing, and the offset distance “D” allows correct alignment of the scoring element 312 behind the rotation axis 309 after landing.

在操作中，如圖6所顯示的一個實例中，刻痕裝置169b及支撐裝置169a可兩個一起在方向168中以相同的完全刻痕速率行進，其中刻痕元件312位於第一圓緣225a的外邊緣609b之外。刻痕元件312及輪子629兩者隨後通過分別的平坦表面607a、607b，並經過平坦表面607a、607b的分別內邊緣。In operation, as shown in an example in FIG. 6, the scoring device 169b and the supporting device 169a can both travel at the same full scoring rate in direction 168, wherein the scoring element 312 is located at the first round edge 225a Outside the outer edge 609b. Both the scoring element 312 and the wheel 629 then pass through the respective flat surfaces 607a, 607b and through the respective inner edges of the flat surfaces 607a, 607b.

參考圖8，在仍沿著方向168以相同的完全刻痕速率行進的同時，驅動齒輪627、809分別使輪子629延伸以接合玻璃條帶103的第二主要表面215，並使刻痕元件312延伸以接合玻璃條帶103的第一主要面213。在各種實例中，刻痕元件312與玻璃表面接觸及輪子629與相對玻璃接觸之間的時間可被控制，使得在刻痕元件312與相對玻璃表面接觸之前，輪子629接觸分別的相鄰玻璃表面，以隨著刻痕的開始而確保對玻璃條帶的足夠支撐。如圖9至圖11所顯示，在仍沿著方向168以相同的完全刻痕速率橫動的同時，刻痕裝置169b產生具有完全裂口深度「V」的刻痕線1001。如圖12所顯示，在刻痕線的完全深度部分形成後，驅動齒輪627、809分別使輪子629從玻璃條帶103的第二主要面215的接合縮回，並使刻痕元件312從玻璃條帶103的第一主要面213的接合縮回。輪子629及刻痕元件312隨後以完全橫向刻痕速率通過分別的平坦表面及第二圓緣225b的外側。Referring to FIG. 8, while still traveling at the same full scoring rate in direction 168, the driving gears 627, 809 respectively extend the wheels 629 to engage the second major surface 215 of the glass ribbon 103, and the scoring element 312 Extending to engage the first major face 213 of the glass strip 103. In various examples, the time between the contact of the scoring element 312 with the glass surface and the contact of the wheel 629 with the opposite glass can be controlled such that the wheel 629 contacts the respective adjacent glass surface before the contact of the scoring element 312 with the opposite glass surface. To ensure adequate support for the glass ribbon as the nicks begin. As shown in FIGS. 9 to 11, the scoring device 169 b generates a scoring line 1001 having a full nick depth “V” while still traversing at the same full scoring rate in the direction 168. As shown in FIG. 12, after the full depth portion of the score line is formed, the driving gears 627 and 809 retract the wheel 629 from the engagement of the second major surface 215 of the glass strip 103 and the score element 312 from the glass, respectively. The engagement of the first major face 213 of the strip 103 is retracted. The wheel 629 and the scoring element 312 then pass through the respective flat surface and the outside of the second rounded edge 225b at a full lateral scoring rate.

一旦刻痕線完成，玻璃條帶103可藉由沿著刻痕線施加應力而沿著刻痕線斷開。例如，熱應力可被施加。在一個實例中，雷射(例如，CO2 雷射)可被施加至刻痕線，以使玻璃條帶沿著刻痕線斷裂。在另一個實例中，雷射可被流體冷卻串流跟隨，該流體冷卻串流經配置以進一步增加應力，並類似地進一步促進沿著刻痕線的斷裂。在仍進一步的實例中，可實現玻璃條帶的機械彎曲，以使玻璃條帶沿著刻痕線斷裂。此類機械彎曲可由，例如，機器人所實現，該機器人抓住玻璃條帶並在刻痕線附近彎曲玻璃條帶。Once the score line is complete, the glass strip 103 may be broken along the score line by applying stress along the score line. For example, thermal stress may be applied. In one example, a laser (eg, a CO 2 laser) may be applied to the score line to break the glass ribbon along the score line. In another example, the laser may be followed by a fluid-cooled stream that is configured to further increase stress and similarly further promote fracture along the score line. In a still further example, mechanical bending of the glass ribbon may be achieved to break the glass ribbon along the score line. Such mechanical bending can be achieved, for example, by a robot that grasps the glass strip and bends the glass strip near the score line.

本領域技藝人士將明顯觀察到，本揭示案可做各種修改及變化而不背離本發明的精神及範疇。因此，本發明是意欲涵蓋此揭示案的修改及變化，只要該等修改及變化落在所附隨的請求項範疇及其等同物內。It will be apparent to those skilled in the art that various modifications and variations can be made in the present disclosure without departing from the spirit and scope of the invention. Accordingly, the invention is intended to cover modifications and variations of this disclosure, provided that such modifications and variations fall within the scope of the appended claims and their equivalents.

101‧‧‧玻璃製造設備101‧‧‧ glass manufacturing equipment

103‧‧‧玻璃條帶103‧‧‧glass strip

104‧‧‧玻璃薄板104‧‧‧Glass Sheet

105‧‧‧熔融容器105‧‧‧melt container

107‧‧‧批量材料107‧‧‧ Bulk materials

109‧‧‧儲存槽109‧‧‧Storage tank

111‧‧‧批量傳遞裝置111‧‧‧ Batch transfer device

113‧‧‧馬達113‧‧‧ Motor

117‧‧‧箭頭117‧‧‧arrow

121‧‧‧熔融材料121‧‧‧ Molten Materials

127‧‧‧淨化容器127‧‧‧Purification container

129‧‧‧第一連接管129‧‧‧first connecting pipe

131‧‧‧混合容器131‧‧‧mixing container

133‧‧‧傳遞容器133‧‧‧ Delivery Container

135‧‧‧第二連接管135‧‧‧Second connection pipe

137‧‧‧第三連接管137‧‧‧Third connection pipe

139‧‧‧傳遞管線139‧‧‧Transfer pipeline

140‧‧‧熔融拉製機器140‧‧‧melt drawing machine

141‧‧‧入口141‧‧‧Entrance

143‧‧‧成形容器143‧‧‧formed container

149a‧‧‧邊緣滾輪組件149a‧‧‧Edge roller assembly

149b‧‧‧邊緣滾輪組件149b‧‧‧Edge roller assembly

151a‧‧‧拉動滾輪組件151a‧‧‧pull the roller assembly

151b‧‧‧拉動滾輪組件151b‧‧‧pull roller assembly

153‧‧‧拉動滾輪153‧‧‧Pull the wheel

161a‧‧‧玻璃刻痕設備161a‧‧‧Glass scoring equipment

161b‧‧‧玻璃刻痕設備161b‧‧‧Glass scoring equipment

163‧‧‧分離路徑163‧‧‧Separation path

165‧‧‧方向165‧‧‧ direction

167a‧‧‧移動軌道167a‧‧‧moving track

167b‧‧‧移動軌道167b‧‧‧moving track

168‧‧‧方向168‧‧‧ direction

169a‧‧‧支撐裝置169a‧‧‧ support device

169b‧‧‧刻痕裝置169b‧‧‧Scoring device

171a‧‧‧固定軌道171a‧‧‧ fixed rail

171b‧‧‧固定軌道171b‧‧‧ fixed rail

175‧‧‧合力速率向量175‧‧‧ resultant velocity vector

177‧‧‧水平速率分量177‧‧‧Horizontal rate component

179‧‧‧垂直速率分量179‧‧‧Vertical velocity component

200‧‧‧凹槽200‧‧‧ groove

201‧‧‧成形楔子201‧‧‧formed wedge

202a‧‧‧堰202a‧‧‧ weir

202b‧‧‧堰202b‧‧‧ weir

203‧‧‧表面部分203‧‧‧ surface part

204a‧‧‧外表面204a‧‧‧outer surface

204b‧‧‧外表面204b‧‧‧outer surface

205‧‧‧表面部分205‧‧‧ surface part

207‧‧‧拉製方向207‧‧‧Drawing direction

209‧‧‧根部209‧‧‧root

211‧‧‧拉製平面211‧‧‧Drawing plane

213‧‧‧第一主要表面213‧‧‧First major surface

215‧‧‧第二主要表面215‧‧‧Second major surface

216‧‧‧中央對稱平面216‧‧‧central symmetry plane

217‧‧‧厚度217‧‧‧thickness

221‧‧‧邊緣滾輪221‧‧‧Edge roller

223a‧‧‧邊緣部分223a‧‧‧Edge

223b‧‧‧邊緣部分223b‧‧‧Edge

225a‧‧‧第一圓緣225a‧‧‧First round edge

225b‧‧‧第二圓緣225b‧‧‧Second round edge

227a‧‧‧第一外部限制227a‧‧‧First external restriction

227b‧‧‧第二外部限制227b‧‧‧Second External Limit

301‧‧‧支撐構件301‧‧‧ support member

301a‧‧‧內端301a‧‧‧inner end

303‧‧‧基座303‧‧‧pedestal

305‧‧‧殼體305‧‧‧shell

307‧‧‧旋轉移動307‧‧‧rotation

309‧‧‧旋轉軸309‧‧‧rotation axis

311‧‧‧軸向移動311‧‧‧ axial movement

312‧‧‧刻痕元件312‧‧‧Scoring element

313‧‧‧外端313‧‧‧ outer end

315‧‧‧壓力端口315‧‧‧Pressure port

401‧‧‧內部區域401‧‧‧internal area

403a‧‧‧端部蓋403a‧‧‧End cap

403b‧‧‧端部蓋403b‧‧‧End cap

405‧‧‧壓力端口405‧‧‧Pressure port

407‧‧‧限制裝置407‧‧‧Restriction device

409‧‧‧突部409‧‧‧ protrusion

411‧‧‧延長開口411‧‧‧Extended opening

413‧‧‧側壁413‧‧‧ sidewall

415‧‧‧密封板材415‧‧‧sealing sheet

417‧‧‧流體軸承417‧‧‧ fluid bearing

419‧‧‧摩擦構件419‧‧‧Friction member

421‧‧‧彈簧421‧‧‧Spring

423‧‧‧外周邊區域423‧‧‧outer area

425‧‧‧軸承壓力腔室425‧‧‧bearing pressure chamber

427‧‧‧周邊內空間427‧‧‧Peripheral space

429‧‧‧外介面429‧‧‧outer interface

431‧‧‧內孔431‧‧‧Inner hole

501‧‧‧行進路徑501‧‧‧ travel path

503a‧‧‧方向503a‧‧‧ direction

503b‧‧‧方向503b‧‧‧direction

505‧‧‧寬度505‧‧‧Width

507‧‧‧延伸方向507‧‧‧Extending direction

509‧‧‧鄰接區域509‧‧‧adjacent area

511‧‧‧區域511‧‧‧area

603‧‧‧中央部分603‧‧‧ Central Section

605‧‧‧厚度605‧‧‧thickness

607a‧‧‧幾乎平坦的表面607a‧‧‧Almost flat surface

607b‧‧‧幾乎平坦的表面607b‧‧‧Almost flat surface

609a‧‧‧內邊緣609a‧‧‧Inner edge

609b‧‧‧外邊緣609b‧‧‧outer edge

610a‧‧‧內邊緣610a‧‧‧Inner edge

610b‧‧‧外邊緣610b‧‧‧outer edge

612‧‧‧距離612‧‧‧distance

621‧‧‧匣體基座621‧‧‧Box base

623‧‧‧延伸基座623‧‧‧Extended base

625‧‧‧方向625‧‧‧ direction

627‧‧‧驅動齒輪627‧‧‧Drive gear

629‧‧‧輪子629‧‧‧wheel

631‧‧‧臂部631‧‧‧arm

633‧‧‧平坦外表面633‧‧‧ flat outer surface

635a‧‧‧平面635a‧‧‧plane

635b‧‧‧平面635b‧‧‧plane

636a‧‧‧第一平面636a‧‧‧First Plane

636b‧‧‧第二平面636b‧‧‧Second Plane

801‧‧‧降落點801‧‧‧ landing point

803‧‧‧匣體基座803‧‧‧Box base

804‧‧‧距離804‧‧‧distance

805‧‧‧延伸基座805‧‧‧ extension base

807‧‧‧方向807‧‧‧direction

809‧‧‧驅動齒輪809‧‧‧Drive gear

1001‧‧‧刻痕線1001‧‧‧ Notch line

1003‧‧‧點1003‧‧‧ points

1101‧‧‧點1101‧‧‧points

1103‧‧‧升起點1103‧‧‧liter starting point

D‧‧‧偏移距離D‧‧‧offset distance

P1‧‧‧完全延伸位置P1‧‧‧ Fully extended position

P2‧‧‧至少部分縮回位置P2‧‧‧ at least partially retracted

P3‧‧‧完全縮回位置P3‧‧‧ Fully retracted position

R1‧‧‧半徑R1‧‧‧ radius

R2‧‧‧半徑R2‧‧‧radius

W‧‧‧寬度W‧‧‧Width

本揭示案的該等特徵及其他特徵、態樣及優點可在參考附圖閱讀時進一步理解：These and other features, aspects, and advantages of this disclosure can be further understood when reading with reference to the drawings:

圖1示意性地繪示玻璃製造設備，該玻璃製造設備經配置以促進分離玻璃條帶的過程；FIG. 1 schematically illustrates a glass manufacturing apparatus configured to facilitate the process of separating glass ribbons;

圖2是沿著圖1的2-2線的玻璃製造設備的剖面透視圖；2 is a sectional perspective view of the glass manufacturing equipment taken along line 2-2 of FIG. 1;

圖3是根據本揭示案的實例的刻痕裝置的透視圖；3 is a perspective view of a scoring device according to an example of the present disclosure;

圖4是沿著圖3的4-4線的圖3之刻痕裝置的剖面圖；4 is a sectional view of the scoring device of FIG. 3 along line 4-4 of FIG. 3;

圖5是圖4中所顯示的刻痕裝置的基座的側壁的內部視圖；5 is an internal view of a side wall of a base of the scoring device shown in FIG. 4;

圖6示意性地繪示刻痕元件，該刻痕元件側向地定位在玻璃條帶的第一外部界限之外，其中支撐元件及刻痕元件以橫向刻痕速率一起橫動；FIG. 6 schematically illustrates a scoring element, which is positioned laterally outside the first outer limit of the glass strip, wherein the support element and the scoring element traverse together at a lateral scoring rate;

圖7示意性地繪示在刻痕元件剛通過玻璃條帶的第一圓緣的幾乎平坦表面之後，並在使玻璃條帶接觸刻痕元件之前，支撐元件及刻痕元件以橫向刻痕速率一起橫動；FIG. 7 schematically illustrates the supporting element and the scoring element at a lateral scoring rate immediately after the scoring element has passed the almost flat surface of the first round edge of the glass strip and before the glass strip contacts the scoring element Traverse together

圖8示意性地繪示在支撐元件及刻痕元件以橫向刻痕速率行進的同時，將刻痕元件降落在玻璃條帶的第一主要表面上，並將支撐元件降落在玻璃條帶的第二主要表面上；FIG. 8 schematically illustrates that while the supporting element and the scoring element are traveling at a lateral scoring rate, the scoring element is dropped on the first major surface of the glass ribbon, and the supporting element is dropped on the first Two major surfaces

圖9示意性地繪示使刻痕元件以橫向刻痕速率橫動來產生達到裂口深度的刻痕的步驟；FIG. 9 schematically illustrates a step of moving the scoring element to traverse at a lateral scoring rate to generate a scoring that reaches the depth of the nick;

圖10是在圖9的視野10處的刻痕達到裂口深度的放大示意圖；FIG. 10 is an enlarged schematic diagram of the score reaching the crack depth at the visual field 10 of FIG. 9; FIG.

圖11是在圖12的視野11處的玻璃條帶的第一主要表面中的刻痕的放大示意圖，其中刻痕元件位於正要從玻璃條帶的第一主要表面升起之前的位置中；11 is an enlarged schematic view of a score in the first major surface of the glass strip at the field of view 11 of FIG. 12, wherein the score element is in a position just before rising from the first major surface of the glass strip;

圖12示意性地繪示刻痕元件以橫向刻痕速率行進期間產生刻痕之後，正要從玻璃條帶的第一主要表面升起之前的刻痕元件；FIG. 12 schematically illustrates the scoring element before the scoring element is raised from the first major surface of the glass strip after the scoring element is generated during the travel of the scoring element at a lateral scoring rate;

圖13示意性地繪示在刻痕元件從玻璃條帶的第一主要表面升起且支撐元件從玻璃條帶的第二主要表面升起後，支撐元件及刻痕元件以橫向刻痕速率一起橫動；FIG. 13 schematically illustrates that after the scoring element is raised from the first major surface of the glass strip and the supporting element is raised from the second major surface of the glass strip, the supporting element and the scoring element are together at a lateral scoring rate. Traverse

圖14示意性地繪示在刻痕元件通過玻璃條帶的第二圓緣的幾乎平坦表面之後，支撐元件及刻痕元件以橫向刻痕速率一起橫動，其中刻痕元件側向地定位在玻璃條帶的第二外部界限之外；及FIG. 14 schematically illustrates that after the scoring element passes the almost flat surface of the second round edge of the glass strip, the support element and the scoring element traverse together at a lateral scoring rate, where the scoring element is positioned laterally Outside the second outer limit of the glass strip; and

圖15繪示刻痕元件的橫向刻痕速率相對於刻痕元件的偏移距離的實例比率，該比率預期產生具有所期望的特徵的刻痕線。FIG. 15 illustrates an example ratio of the lateral scoring rate of the scoring element relative to the offset distance of the scoring element, which is expected to produce a scoring line with the desired characteristics.

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Claims (10)

一種刻痕設備，包括一刻痕裝置，該刻痕裝置包含： 一支撐構件，該支撐構件耦合到一基座，該支撐構件可繞著一旋轉軸旋轉，並可沿著一軸向方向移動，該軸向方向由該支撐構件的該旋轉軸所界定；一刻痕元件，該刻痕元件在離支撐構件的該旋轉軸一偏移距離處耦合到該支撐構件的一外端；及一限制裝置，該限制裝置限制該支撐構件繞著該支撐構件的該旋轉軸的旋轉移動。A scoring device includes a scoring device, the scoring device comprising: a support member coupled to a base, the support member being rotatable about a rotation axis and movable in an axial direction, The axial direction is defined by the rotation axis of the support member; a notch element coupled to an outer end of the support member at an offset distance from the rotation axis of the support member; and a restriction device The limiting device restricts the rotational movement of the support member around the rotation axis of the support member. 如請求項1所述之刻痕設備，其中該限制裝置包括一突部，該突部從定位在一延長開口內的該支撐構件及該基座的其中一者延伸，該延長開口由該支撐構件及該基座的另一者所界定。The scoring device according to claim 1, wherein the restriction device includes a protrusion extending from one of the support member and the base positioned in an extension opening, the extension opening being supported by the support The component and the other are defined by the base. 如請求項2所述之刻痕設備，其中該延長開口沿著行進路徑而軸向地拉錐(tapered)，該行進路徑由該延長開口所界定，使得該支撐構件繞著該支撐構件的該旋轉軸的該旋轉移動的該限制取決於沿著該行進路徑的該延長開口內的該突部的一位置而變化。The scoring device as claimed in claim 2, wherein the extension opening is tapered axially along a travel path defined by the extension opening such that the support member surrounds the support member The limitation of the rotational movement of the rotation axis varies depending on a position of the protrusion in the extension opening along the travel path. 如請求項2所述之刻痕設備，其中該支撐構件可定位在一完全延伸位置中，使得該限制裝置對該支撐構件提供繞著該旋轉軸的一旋轉移動的第一限制，且該支撐構件可進一步定位在一至少部分縮回的軸向位置中，其中該限制裝置對該支撐構件提供繞著該旋轉軸的一旋轉移動的第二限制，該旋轉移動的第二限制可大於該旋轉移動的第一限制。The scoring device according to claim 2, wherein the support member is positionable in a fully extended position such that the restriction device provides the support member with a first restriction on a rotational movement about the rotation axis, and the support The member may be further positioned in an axial position that is at least partially retracted, wherein the restriction means provides the support member with a second restriction on a rotational movement about the rotation axis, the second restriction on the rotational movement may be greater than the rotation The first limit of movement. 如請求項1所述之刻痕設備，其中該基座包括一流體軸承，該流體軸承經配置以用一流體緩衝來支撐該支撐構件。The scoring device of claim 1, wherein the base includes a fluid bearing configured to support the support member with a fluid buffer. 如請求項1至5任何一項所述之刻痕設備，進一步包括一支撐裝置，該支撐裝置經配置以在該刻痕元件對一玻璃條帶的一第一主要表面刻痕的同時，支撐該玻璃條帶的一第二主要表面。The scoring device according to any one of claims 1 to 5, further comprising a support device configured to support the scoring element while scoring a first major surface of a glass ribbon, while supporting A second major surface of the glass strip. 一種用請求項1至6任何一項中所述之刻痕裝置對一玻璃條帶刻痕的方法，該方法包括以下步驟： 將該刻痕元件降落在該玻璃條帶的一第一主要表面上； 藉由使該刻痕元件相對於該玻璃條帶橫動而以該刻痕元件產生一刻痕線；及 使該支撐構件在該支撐構件的該旋轉軸的該軸向方向中從相對於該基座的一完全延伸的軸向位置移動到一至少部分縮回的軸向位置，其中在該支撐構件位於該至少部分縮回的軸向位置同時，該刻痕元件產生具有一裂口深度的該刻痕線的一部分。A method for scoring a glass strip with the scoring device described in any one of claims 1 to 6, the method comprising the steps of: dropping the scoring element on a first major surface of the glass strip Up; generating a score line with the score element by traversing the score element with respect to the glass ribbon; and enabling the support member to be relative to the axial direction of the rotation axis of the support member from A fully extended axial position of the base is moved to an at least partially retracted axial position, wherein while the support member is located in the at least partially retracted axial position, the score element generates a Part of the score line. 如請求項7所述之方法，進一步包括以下步驟：當該刻痕裝置在該裂口深度沿著該刻痕線的該部分刻痕的同時，使該刻痕元件用一幾乎固定的力量壓靠在該玻璃條帶上。The method according to claim 7, further comprising the step of: while the notch device is notched along the portion of the notch line along the notch line, the notch element is pressed against with an almost constant force. On the glass strip. 如請求項7或8所述之方法，進一步包括以下步驟：以該完全延伸的軸向位置中繞著該旋轉軸的一旋轉移動的第一限制來限制該支撐構件的旋轉移動。The method as claimed in claim 7 or 8, further comprising the step of restricting the rotational movement of the support member with a first limit of a rotational movement around the rotation axis in the fully extended axial position. 如請求項9所述之方法，進一步包括以下步驟：以該至少部分縮回的軸向位置中繞著該旋轉軸的一旋轉移動的第二限制來限制該支撐構件的旋轉移動，該旋轉移動的第二限制大於該旋轉移動的第一限制。The method according to claim 9, further comprising the step of restricting the rotational movement of the support member with a second restriction of a rotational movement around the rotation axis in the at least partially retracted axial position, the rotational movement The second limit of is greater than the first limit of the rotational movement.
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