TWI624377B - Detaching apparatus - Google Patents

Abstract

本發明係關於一種使相互貼合之2片板狀體剝離之剝離裝置。於保持器件30之保持面310設置有開口部314，相對於開口部314配設有支持第1板狀體之支持構件。於軸向上隔開而設置有複數個限制剝離之推進之輥組件40。各個輥組件40所形成之抵接夾持部於軸向上相互隔開，抵接夾持部之剝離方向上之後端部之位置於剝離方向上相同，保持面310之開口部314設置於與於軸向上相鄰之2個抵接夾持部間之間隙部對應之位置。 The present invention relates to a peeling device for peeling off two sheets of plate-shaped bodies that are bonded to each other. An opening portion 314 is provided on the holding surface 310 of the holding device 30, and a supporting member that supports the first plate-shaped body is disposed with respect to the opening portion 314. A plurality of roller assemblies 40 are provided in the axial direction and spaced apart to limit peeling. The abutting and clamping portions formed by each roller assembly 40 are spaced apart from each other in the axial direction. The position of the rear end portion in the peeling direction of the abutting clamping portion is the same in the peeling direction. The opening portion 314 of the holding surface 310 is provided at Positions corresponding to the gap between two adjacent abutting and clamping portions in the axial direction.

Description

剝離裝置 Stripping device

本發明係關於一種使相互貼合之2片板狀體剝離之剝離裝置。 The present invention relates to a peeling device for peeling off two sheets of plate-shaped bodies that are bonded to each other.

作為於玻璃基板或半導體基板等板狀體上形成特定之圖案或薄膜之技術，存在將擔載於另一板狀體上之圖案或薄膜(以下，稱為「圖案等」)轉印至基板上者。於該技術中，於使2片板狀體密接而將圖案等自一者轉印至另一者上之後，需要不使圖案等損壞地將2片板狀體剝離。 As a technique for forming a specific pattern or film on a plate-shaped body such as a glass substrate or a semiconductor substrate, there is a pattern or film (hereinafter, referred to as a "pattern, etc.") carried on another plate-shaped body and transferred to a substrate The former. In this technique, after two sheets of plate-like bodies are brought into close contact and a pattern or the like is transferred from one to the other, it is necessary to peel off the two sheets of plate-like bodies without damaging the patterns or the like.

作為可為該目的而加以利用之技術，存在例如日本專利特開2014-189350號公報(專利文獻1)中所記載者。於該技術中，包含相互密接之第1板狀體及第2板狀體之密接體藉由第1板狀體吸附保持於載置台上而保持為水平姿勢。然後，排列於第2板狀體側之複數個剝離器件依序抵接於第2板狀體，一面保持第2板狀體，一面於離開第1板狀體之方向上移動，藉此，第1板狀體與第2板狀體之間之剝離於特定之剝離方向上推進。此時，輥狀之抵接構件一面抵接於第2板狀體之表面，一面於剝離方向上移動，藉此以剝離係以固定之速度推進之方式進行管理。 As a technology that can be utilized for this purpose, there is a device described in, for example, Japanese Patent Laid-Open No. 2014-189350 (Patent Document 1). In this technique, the first plate-shaped body and the second plate-shaped body, which are in close contact with each other, are held in a horizontal posture by being adsorbed and held on the mounting table by the first plate-shaped body. Then, the plurality of peeling devices arranged on the side of the second plate-shaped body sequentially abut against the second plate-shaped body, while holding the second plate-shaped body, while moving in a direction away from the first plate-shaped body, thereby, The peeling between the first plate-like body and the second plate-like body is advanced in a specific peeling direction. At this time, the roller-shaped contact member abuts on the surface of the second plate-shaped body while moving in the peeling direction, thereby managing the peeling by advancing at a constant speed.

若板狀體之尺寸大型化，則於上述先前技術中要求進一步之改 良。即，因大型之板狀體易於撓曲，故為一面使板狀體維持為水平狀態一面向裝置中進行搬入及搬出而需要特別之機構。又，伴隨板狀體之大型化，輥狀之抵接構件亦於軸向上變長，故而存在施加於板狀體之按壓力因輥之撓曲而變得不均勻之情況。此種按壓力之差異可能會成為被轉印物之損傷及剝離不良之原因。 If the size of the plate-like body becomes large, further modification is required in the above-mentioned prior art. good. That is, since a large plate-like body is easily bent, a special mechanism is required to carry in and out of the device while maintaining the plate-like body in a horizontal state. Further, as the plate-shaped body becomes larger, the roller-shaped abutment member also becomes longer in the axial direction. Therefore, the pressing force applied to the plate-shaped body may become uneven due to the deflection of the roller. Such a difference in pressing force may cause damage to the transferred material and poor peeling.

如此，為對於大型之板狀體亦良好地執行剝離，需要應對板狀體及輥狀構件之撓曲。於該點上，上述先前技術中留有改良之餘地。 In this way, in order to perform peeling well even for a large plate-shaped body, it is necessary to cope with deflection of a plate-shaped body and a roll-shaped member. In this regard, there is room for improvement in the aforementioned prior art.

本發明係鑒於上述課題而完成者，其目的在於：提供一種於使相互貼合之2片板狀體剝離之剝離裝置中，對於大型之板狀體亦可良好地執行剝離之技術。 This invention is made in view of the said subject, and an object of this invention is to provide the peeling apparatus which peels two sheet-shaped bodies adhered to each other, and can also perform a technique which can perform peeling | separation favorably with respect to a large plate-shaped body.

本發明之一態樣係於使主面彼此貼合之第1板狀體與第2板狀體剝離之剝離裝置中，為達成上述目的而具備：保持器件，其上表面為大致水平之保持面，且於上述保持面設置有開口部，使與上述第2板狀體為相反側之面向下而保持載置於上述保持面之上述第1板狀體；支持構件，其於上端部自上述開口部向較上述保持面靠上方突出之突出位置與上述上端部於上述開口部內退避至較上述保持面靠下方之退避位置之間移動，且於上述突出位置使上述第1板狀體離開上述保持面而自下方對其加以支持；剝離器件，其保持上述第2板狀體並使其於離開上述第1板狀體之方向上移動，使上述第2板狀體自藉由上述保持器件而保持之上述第1板狀體剝離；以及限制器件，其抵接於上述第2板狀體中與上述第1板狀體為相反側之面，限制藉由上述剝離器件而剝離上述第2板狀體之推進。 One aspect of the present invention is a peeling device for peeling a first plate-like body and a second plate-like body that have their main surfaces adhered to each other, and in order to achieve the above-mentioned object, it is provided with a holding device whose upper surface is held substantially horizontally Surface, and an opening portion is provided on the holding surface, so that the first plate-shaped body placed on the holding surface is held downward by the side opposite to the second plate-shaped body, and the supporting member is provided at the upper end portion. The opening portion moves between a protruding position protruding above the holding surface, and the upper end portion retracts within the opening portion to a retracted position below the holding surface, and separates the first plate-like body from the protruding position. The holding surface supports it from below; the peeling device holds the second plate-shaped body and moves it in a direction away from the first plate-shaped body, so that the second plate-shaped body is held by the above-mentioned The first plate-like body held by the device is peeled off; and the device is restricted from abutting on the surface of the second plate-like body opposite to the first plate-shaped body, and the peeling of the first plate-like body by the peeling device is restricted. 2 of plate Into.

此處，上述限制器件具有：複數個輥構件，其等各自抵接於上述第2板狀體而於與上述第2板狀體之間形成抵接夾持部；支持部，其繞著沿平行於上述保持面之軸向之旋轉軸自由旋轉且個別地支持上述 複數個輥構件之各者；以及移動機構，其使上述支持部於平行於上述保持面且與上述軸向正交之剝離方向上移動；且上述輥構件之各者所形成之上述抵接夾持部於上述軸向上相互隔開，上述抵接夾持部之上述剝離方向上之後端部之位置於上述剝離方向上彼此相同，上述開口部設置於與於上述軸向上相鄰之2個上述抵接夾持部間之間隙部對應之位置。 Here, the restricting device includes a plurality of roller members, each of which abuts against the second plate-like body to form an abutting and clamping portion between the second plate-like body and a support portion, which surrounds the edge. The rotation axis parallel to the axial direction of the holding surface is free to rotate and individually supports the above Each of a plurality of roller members; and a moving mechanism that moves the support portion in a peeling direction parallel to the holding surface and orthogonal to the axial direction; and the abutment clip formed by each of the roller members The holding portions are spaced apart from each other in the axial direction, the positions of the rear end portions in the peeling direction of the abutting clamping portion are the same as each other in the peeling direction, and the opening portions are provided in the two adjacent ones in the axial direction. Abut the position corresponding to the gap between the clamping portions.

於以此方式構成之發明中，剝離器件使第2板狀體向自保持於保持器件之保持面之第1板狀體拉離之方向移動，藉此執行剝離。而且，輥構件與第2板狀體抵接而形成之抵接夾持部限制剝離之推進，藉由該抵接夾持部於剝離方向上移動，而管理剝離之推進。藉此，可使剝離良好地推進。 In the invention structured in this manner, the peeling device performs the peeling by moving the second plate-like body in a direction in which the second plate-like body is pulled away from the first plate-like body held on the holding surface of the holding device. In addition, the abutment nip formed by the roller member contacting the second plate-shaped body restricts the advancement of peeling, and the advancement of the detachment is managed by the abutment nip moving in the peeling direction. Thereby, peeling can be advanced favorably.

於用以限制剝離之推進之輥構件係單個之情形時，若第2板狀體之尺寸特別是輥之軸向上之長度變大，則易於發生軸向上之輥徑之變動或動作時之撓曲。故而，有抵接夾持部相對於第2板狀體之抵接壓於軸向上存在差異之虞。若如此地抵接壓存在差異，則會造成限制剝離之功能視軸向位置而有所不同，從而無法恰當地管理剝離之推進，可能會造成剝離不良。又，為以高加工精度製造長條之輥構件，需要更高之製造技術，會導致裝置成本之上升。 In the case where the roll member used to limit the advancement of peeling is single, if the size of the second plate-shaped body, particularly the length in the axial direction of the roll, becomes large, the roll diameter in the axial direction or the deflection during operation is liable to occur. song. Therefore, there is a possibility that the contact pressure of the contact holding portion with respect to the second plate-shaped body may be different in the axial direction. If there is a difference in the abutment pressure in this way, the function of restricting peeling will vary depending on the axial position, and the advancement of peeling cannot be managed properly, which may cause defective peeling. In addition, in order to manufacture a long roll member with high processing accuracy, higher manufacturing technology is required, which leads to an increase in equipment cost.

另一方面，於本發明中，於軸向上配置有複數個輥構件，且各輥構件相互獨立地得到支持。故而，使各個輥構件之軸向長度更短即可，可減小輥徑之變動或撓曲。藉此，可使抵接夾持部之抵接壓均勻而使剝離良好地推進。又，相較於製造長條輥之情形，亦可抑制製造成本。 On the other hand, in the present invention, a plurality of roller members are arranged in the axial direction, and each roller member is supported independently of each other. Therefore, it is only necessary to make the axial length of each roller member shorter, and the variation or deflection of the roller diameter can be reduced. Thereby, the abutting pressure of the abutting nip can be made uniform and the peeling can be favorably advanced. Moreover, compared with the case where a long roll is manufactured, manufacturing cost can also be suppressed.

又，於本發明中，於設置於保持器件之保持面之開口部，設置有支持構件。支持構件係於使第1板狀體離開保持面之狀態下進行支持。藉此，例如於將貼合後之第1板狀體與第2板狀體載置於保持面上 時或將剝離後之第1板狀體自保持面搬出時，可抑制第1板狀體之撓曲而使自外部之進入較為容易。 Further, in the present invention, a support member is provided in the opening portion provided on the holding surface of the holding device. The supporting member supports the first plate-like body in a state where it is separated from the holding surface. Thereby, for example, the first plate-shaped body and the second plate-shaped body after being bonded are placed on the holding surface. When the first plate-like body is peeled off from the holding surface at the time of peeling, the first plate-like body can be restrained from deflection and can be easily accessed from the outside.

於載置於保持面之第1板狀體中與保持面之開口部之周緣對應之部位，有如下之虞：若受到來自輥構件之按壓，則於該部位局部作用有較高之應力，而使第1板狀體損傷。又，有此種應力集中成為剝離不良之契機之虞。另一方面，於本發明中，於與藉由複數個輥構件而形成之複數個抵接夾持部間之間隙對應之位置設置有開口部。故而，於開口部之正上方，第1及第2板狀體不會受到來自輥構件之按壓。藉此，可防止因於開口部上之按壓而導致之板狀體之損傷及剝離不良。 At the position corresponding to the peripheral edge of the opening portion of the holding surface in the first plate-shaped body placed on the holding surface, there is a possibility that if a pressure is applied from the roller member, a high stress locally acts on the portion, Then, the first plate-shaped body is damaged. In addition, there is a possibility that such stress concentration becomes an opportunity for poor peeling. On the other hand, in the present invention, an opening portion is provided at a position corresponding to a gap between the plurality of abutting nip portions formed by the plurality of roller members. Therefore, the first and second plate-like bodies are not pressed by the roller member directly above the opening. This can prevent damage to the plate-like body and poor peeling caused by pressing on the opening.

如此，於本發明中，於軸向上配置之複數個輥構件抵接於第2板狀體而形成抵接夾持部。又，設置有支持構件，該支持構件自開口部突出而支持第1板狀體，該開口部設置於保持器件之保持面中碰到軸向上之抵接夾持部間之間隙之部位。故而，於本發明中，即便於第1及第2板狀體之尺寸為大型之情形時亦可良好地執行該等之剝離。 As described above, in the present invention, the plurality of roller members arranged in the axial direction are brought into contact with the second plate-like body to form a contact nip. Further, a supporting member is provided which protrudes from the opening to support the first plate-like body, and the opening is provided at a portion of the holding surface of the holding device which is in contact with a gap between the clamping portions in the axial direction. Therefore, in the present invention, even when the sizes of the first and second plate-like bodies are large, such peeling can be performed well.

1‧‧‧剝離裝置 1‧‧‧ peeling device

3‧‧‧載置台區塊 3‧‧‧ mounting platform block

4‧‧‧輥單元(限制器件) 4‧‧‧ roller unit (restrictive device)

5‧‧‧上部吸附區塊 5‧‧‧ Upper adsorption block

11‧‧‧主框架 11‧‧‧ main frame

30‧‧‧載置台(保持器件) 30‧‧‧mounting table (holding device)

31‧‧‧水平台部 31‧‧‧Water Platform Department

32‧‧‧楔形台部 32‧‧‧ Wedge-shaped platform

33‧‧‧初始剝離單元 33‧‧‧ initial stripping unit

36‧‧‧提昇機構 36‧‧‧Lifting mechanism

40‧‧‧輥組件 40‧‧‧ roller assembly

41‧‧‧滑件 41‧‧‧ Slider

42‧‧‧滑件 42‧‧‧ Slider

43‧‧‧下部角鋼 43‧‧‧ Lower Angle

44‧‧‧升降機構 44‧‧‧Lifting mechanism

45‧‧‧上部角鋼(基底構件、支持部) 45‧‧‧ Upper angle steel (base member, support)

46‧‧‧螺桿 46‧‧‧Screw

50‧‧‧支持框架 50‧‧‧ Support Framework

51‧‧‧吸附單元(剝離器件，第1吸附單元) 51‧‧‧ Adsorption unit (stripping device, first adsorption unit)

52‧‧‧吸附單元(剝離器件，第2吸附單元) 52‧‧‧ Adsorption unit (stripping device, second adsorption unit)

53‧‧‧吸附單元(剝離器件，第3吸附單元) 53‧‧‧ Adsorption unit (stripping device, third adsorption unit)

54‧‧‧吸附單元(剝離器件，第4吸附單元) 54‧‧‧ Adsorption unit (stripping device, 4th adsorption unit)

70‧‧‧控制單元 70‧‧‧control unit

74‧‧‧負壓供給部 74‧‧‧Negative pressure supply department

310‧‧‧(水平台部31之)上表面(保持面) 310‧‧‧ (of the water platform section 31) upper surface (holding surface)

311‧‧‧槽 311‧‧‧slot

312‧‧‧槽 312‧‧‧slot

313‧‧‧第1開口(開口部) 313‧‧‧The first opening (opening)

314‧‧‧第2開口(開口部) 314‧‧‧Second opening (opening)

320‧‧‧(楔形台部之)上表面 320‧‧‧ (of the wedge-shaped platform)

321‧‧‧水平面 321‧‧‧horizontal

322‧‧‧楔形面 322‧‧‧Wedge

331‧‧‧按壓構件 331‧‧‧Pressing member

332‧‧‧支持臂 332‧‧‧ support arm

333‧‧‧導軌 333‧‧‧rail

334‧‧‧柱構件 334‧‧‧post member

335‧‧‧升降機構 335‧‧‧Lifting mechanism

336‧‧‧基底部 336‧‧‧ base

337‧‧‧位置調整機構 337‧‧‧Position adjustment mechanism

351‧‧‧導軌 351‧‧‧rail

352‧‧‧導軌 352‧‧‧rail

353‧‧‧馬達(移動機構) 353‧‧‧Motor (moving mechanism)

354‧‧‧滾珠螺桿機構(移動機構) 354‧‧‧ball screw mechanism (moving mechanism)

361‧‧‧頂起銷(支持構件) 361‧‧‧ jacking pin (supporting member)

362‧‧‧外殼 362‧‧‧shell

363‧‧‧驅動部 363‧‧‧Driver

365‧‧‧升降機構 365‧‧‧Lifting mechanism

401‧‧‧剝離輥(輥構件) 401‧‧‧ peeling roller (roller member)

403‧‧‧墊片(間隔件) 403‧‧‧Gasket (spacer)

402‧‧‧輥支持部(支持框架、支持部) 402‧‧‧roller support department (support frame, support department)

451‧‧‧貫通孔 451‧‧‧through hole

452‧‧‧定位用基準面 452‧‧‧ datum for positioning

461‧‧‧剝離輥 461‧‧‧ peeling roller

462‧‧‧剝離輥 462‧‧‧ peeling roller

463‧‧‧剝離輥 463‧‧‧ peeling roller

517‧‧‧吸附墊 517‧‧‧Adsorption pad

521‧‧‧樑構件 521‧‧‧Beam member

522‧‧‧柱構件 522‧‧‧pillar members

523‧‧‧柱構件 523‧‧‧Column member

524‧‧‧板構件 524‧‧‧ plate member

525‧‧‧升降機構 525‧‧‧Lifting mechanism

526‧‧‧墊支持構件 526‧‧‧mat support member

527‧‧‧吸附墊 527‧‧‧Adsorption pad

537‧‧‧吸附墊 537‧‧‧Adsorption pad

547‧‧‧吸附墊 547‧‧‧Adsorption pad

701‧‧‧CPU 701‧‧‧CPU

702‧‧‧馬達控制部 702‧‧‧Motor control unit

703‧‧‧閥控制部 703‧‧‧valve control unit

704‧‧‧負壓控制部 704‧‧‧Negative pressure control department

705‧‧‧使用者介面部 705‧‧‧user interface

AR‧‧‧有效區域 AR‧‧‧Effective area

BL‧‧‧橡皮布(第1板狀體) BL‧‧‧ blanket (the first plate-shaped body)

Dx‧‧‧(開口314之)直徑 Dx‧‧‧ (with opening 314) diameter

E‧‧‧脊線部 E‧‧‧Spine Line

G12‧‧‧間隙 G12‧‧‧Gap

G23‧‧‧間隙 G23‧‧‧Gap

N1‧‧‧抵接夾持部 N1‧‧‧ abutting clamping part

N2‧‧‧抵接夾持部 N2‧‧‧ abutting clamping part

N3‧‧‧抵接夾持部 N3‧‧‧ abutting clamping part

N61‧‧‧抵接夾持部 N61‧‧‧ abutting clamping part

N62‧‧‧抵接夾持部 N62‧‧‧ abutting clamping part

N63‧‧‧抵接夾持部 N63‧‧‧ abutting clamping part

R‧‧‧輥構件 R‧‧‧ roller member

R1‧‧‧區域 R1‧‧‧ area

R2‧‧‧區域 R2‧‧‧ area

R3‧‧‧區域 R3‧‧‧ area

R4‧‧‧區域 R4‧‧‧ area

R5‧‧‧區域 R5‧‧‧ area

R6‧‧‧區域 R6‧‧‧ area

SB‧‧‧基板(第2板狀體) SB‧‧‧ substrate (second plate-shaped body)

V3‧‧‧閥群 V3‧‧‧valve group

V5‧‧‧閥群 V5‧‧‧valve group

WK‧‧‧工件 WK‧‧‧Workpiece

+X‧‧‧方向 + X‧‧‧ direction

-X‧‧‧方向 -X‧‧‧ direction

+Y‧‧‧方向 + Y‧‧‧ direction

-Y‧‧‧方向 -Y‧‧‧ direction

+Z‧‧‧方向 + Z‧‧‧ direction

-Z‧‧‧方向 -Z‧‧‧ direction

圖1係表示本發明之剝離裝置之一實施形態之立體圖。 FIG. 1 is a perspective view showing an embodiment of a peeling device according to the present invention.

圖2係表示該剝離裝置之主要構成之立體圖。 FIG. 2 is a perspective view showing a main structure of the peeling device.

圖3A、圖3B係表示輥單元之構造之圖。 3A and 3B are diagrams showing the structure of a roller unit.

圖4A、圖4B、圖4C係表示提昇機構之構成例之剖視圖。 4A, 4B, and 4C are sectional views showing a configuration example of a lifting mechanism.

圖5係表示該剝離裝置之電氣構成之方塊圖。 Fig. 5 is a block diagram showing the electrical configuration of the peeling device.

圖6A、圖6B、圖6C、圖6D係表示各部於剝離動作之過程中之動作之圖。 FIG. 6A, FIG. 6B, FIG. 6C, and FIG. 6D are diagrams showing the operation of each part during the peeling operation.

圖7係表示輥單元與工件之抵接狀態之圖。 Fig. 7 is a view showing a contact state between a roller unit and a workpiece.

圖8A、圖8B、圖8C係將剝離輥為單個之情形與複數個之情形加以比較之圖。 8A, 8B, and 8C are diagrams comparing a case where a single peeling roller is used and a case where a plurality of peeling rollers are used.

圖9A、圖9B係表示載置台上之開口部與剝離輥之位置關係之圖。 9A and 9B are diagrams showing the positional relationship between the opening on the mounting table and the peeling roller.

圖10係表示載置台與載置於載置台上之工件之位置關係之圖。 FIG. 10 is a diagram showing a positional relationship between a mounting table and a workpiece placed on the mounting table.

圖11係表示剝離裝置之變化例之圖。 FIG. 11 is a diagram showing a modified example of the peeling device.

圖12A、圖12B係表示輥徑不同之剝離輥之組合例之圖。 12A and 12B are diagrams showing a combination example of peeling rollers having different roller diameters.

圖1係表示本發明之剝離裝置之一實施形態之立體圖。為統一地表示各圖中之方向，如圖1右下方所示設定XYZ正交座標軸。此處，XY平面表示水平面。又，Z軸表示鉛垂軸，更詳細而言，(-Z)方向表示朝向鉛垂下方之方向。 FIG. 1 is a perspective view showing an embodiment of a peeling device according to the present invention. In order to show the directions in each figure uniformly, the XYZ orthogonal coordinate axis is set as shown in the lower right of FIG. 1. Here, the XY plane represents a horizontal plane. The Z axis indicates a vertical axis, and more specifically, the (-Z) direction indicates a direction toward the vertical downward direction.

該剝離裝置1係用以使於主面彼此相互密接之狀態下搬入之2片板狀體剝離之裝置。例如可於在玻璃基板或半導體基板等基板之表面形成特定之圖案之圖案形成製程之一部分中使用。更具體而言，於該圖案形成製程中，於橡皮布表面，均勻地塗佈圖案形成材料(塗佈步驟)，上述橡皮布作為暫時擔載應對作為被轉印體之基板轉印之圖案之擔載體。然後，將已根據圖案形狀經過表面加工之版壓抵於橡皮布上之塗佈層，藉此使塗佈層圖案化(圖案化步驟)。使以此方式而形成有圖案之橡皮布密接於基板(轉印步驟)，藉此圖案最終被自橡皮布轉印至基板上。 This peeling device 1 is a device for peeling off two sheet-like bodies carried in in a state where the main surfaces are in close contact with each other. For example, it can be used in a part of a pattern forming process of forming a specific pattern on the surface of a substrate such as a glass substrate or a semiconductor substrate. More specifically, in the pattern forming process, the surface of the blanket is uniformly coated with a pattern forming material (coating step), and the blanket is used as a temporary support for the pattern to be transferred to the substrate to be transferred. Bear the carrier. Then, the plate subjected to the surface processing according to the pattern shape is pressed against the coating layer on the blanket, thereby patterning the coating layer (patterning step). The blanket with the pattern formed in this manner is brought into close contact with the substrate (transfer step), whereby the pattern is finally transferred from the blanket to the substrate.

此時，為使於圖案化步驟中得以密接之版與橡皮布之間、或於轉印步驟中得以密接之基板與橡皮布之間分離，可恰當地應用本裝置。當然，既可用於該等兩種用途，亦可用於除此以外之用途。例如於將擔載於擔載體上之薄膜轉印至基板上時之剝離製程中亦可應用本裝置。此外，於將直接或隔著薄膜等薄層而密接之2個板狀體剝離之全體製程中，均可應用本裝置。以下，將圖案及薄膜總稱為「圖案等」。 At this time, in order to separate the plate and the blanket tightly adhered in the patterning step, or the substrate and the blanket tightly adhered in the transfer step, this device can be suitably applied. Of course, it can be used for both of these and other uses. For example, the device can also be applied in a peeling process when a film carried on a carrier is transferred to a substrate. In addition, this device can be applied to the entire system of peeling off two plate-like bodies that are in close contact directly or through a thin layer such as a film. Hereinafter, a pattern and a film are collectively called "pattern etc.".

該剝離裝置1具有於安裝於殼體之主框架11上分別固定有載置台區塊3及上部吸附區塊5之構造。於圖1中，為表示裝置之內部構造而省略殼體之圖示。又，除該等各區塊以外，該剝離裝置1亦具備控制單元70(圖5)。 The peeling device 1 has a structure in which a mounting table block 3 and an upper suction block 5 are fixed to a main frame 11 mounted on a casing, respectively. In FIG. 1, the illustration of the housing is omitted to show the internal structure of the device. In addition to these blocks, the peeling device 1 also includes a control unit 70 (FIG. 5).

載置台區塊3具有載置台30，該載置台30用以載置使版與橡皮布、或基板與橡皮布密接而形成之密接體(以下，稱為「工件」)。載置台30具備：水平台部31，其上表面為大致水平之平面；以及楔形台部32，其上表面為相對於水平面具有數度(例如2度左右)之傾斜度之平面。於載置台30之楔形台部32側即(-Y)側之端部附近，設置有初始剝離單元33。又，以橫跨水平台部31之方式設置有輥單元4。 The mounting table block 3 includes a mounting table 30 for mounting a dense body (hereinafter, referred to as a “workpiece”) formed by closely contacting a plate and a blanket, or a substrate and a blanket. The mounting table 30 includes a water table portion 31 whose upper surface is a substantially horizontal plane, and a wedge-shaped table portion 32 whose upper surface is a plane having an inclination of several degrees (for example, about 2 degrees) with respect to the horizontal plane. An initial peeling unit 33 is provided near an end portion on the wedge-shaped table portion 32 side, that is, on the (-Y) side of the mounting table 30. A roller unit 4 is provided so as to straddle the water table portion 31.

另一方面，上部吸附區塊5具備支持框架50，該支持框架50以自主框架11立設並且覆蓋載置台區塊3之上部之方式設置。於支持框架50上安裝有第1吸附單元51、第2吸附單元52、第3吸附單元53及第4吸附單元54。該等吸附單元51~54係於(+Y)方向上依序排列。再者，吸附單元之配設數量任意而並不限定於上述數量。 On the other hand, the upper suction block 5 is provided with a support frame 50 which is provided so that the autonomous frame 11 stands and covers the upper portion of the mounting table block 3. A first adsorption unit 51, a second adsorption unit 52, a third adsorption unit 53, and a fourth adsorption unit 54 are mounted on the support frame 50. The adsorption units 51 to 54 are sequentially arranged in the (+ Y) direction. In addition, the number of the disposition units is arbitrary and is not limited to the above number.

圖2係表示該剝離裝置之主要構成之立體圖。更具體而言，圖2表示剝離裝置1之各構成中之載置台30、輥單元4及第2吸附單元52之構造。載置台30具備：水平台部31，其上表面310為大致水平面；以及楔形台部32，其上表面320為相對於水平面傾斜數度之楔形面。水平台部31之上表面310具有較所載置之工件之平面尺寸略大之平面尺寸。 FIG. 2 is a perspective view showing a main structure of the peeling device. More specifically, FIG. 2 shows the structures of the mounting table 30, the roller unit 4, and the second suction unit 52 in each configuration of the peeling device 1. The mounting table 30 includes a water table portion 31 whose upper surface 310 is a substantially horizontal plane, and a wedge-shaped table portion 32 whose upper surface 320 is a wedge-shaped surface inclined several degrees with respect to the horizontal plane. The upper surface 310 of the water table portion 31 has a plane size slightly larger than the plane size of the workpiece to be placed.

楔形台部32係密接於水平台部31之(-Y)側端部而設置，其上表面320具有水平面321及楔形面322。更具體而言，楔形台部32之上表面320中與水平台部31接觸之部分成為位於與水平台部31之上表面310相同高度(Z方向位置)之水平面321。另一方面，於較該水平面321靠(-Y)方向側，楔形台部32之上表面320成為具有伴隨自水平台部31向(-Y) 方向偏離而向下方即向(-Z)方向後退之下行坡度之楔形面322。因此，自載置台30整體而言，水平台部31之上表面310之水平面與楔形台部32之上表面320中之水平面321連續而成為一體之水平面，於該水平面之(-Y)側端部連接有楔形面322。水平面321與楔形面322連接之脊線部E形成為於X方向上延伸之直線狀。 The wedge-shaped platform portion 32 is provided in close contact with the (-Y) side end portion of the water platform portion 31. The upper surface 320 has a horizontal surface 321 and a wedge-shaped surface 322. More specifically, a portion of the upper surface 320 of the wedge-shaped platform portion 32 that is in contact with the platform portion 31 becomes a horizontal plane 321 located at the same height (position in the Z direction) as the upper surface 310 of the platform portion 31. On the other hand, at the (-Y) direction side from the horizontal plane 321, the upper surface 320 of the wedge-shaped platform portion 32 has a direction from the water-level platform portion 31 to (-Y). The wedge-shaped surface 322 of a downward slope that deviates from the direction and moves downward toward the (-Z) direction. Therefore, as a whole, the horizontal plane of the upper surface 310 of the platform portion 31 and the horizontal plane 321 of the upper surface 320 of the wedge-shaped platform portion 32 are continuous from the mounting platform 30 to form an integrated horizontal plane. The part is connected with a wedge surface 322. The ridgeline portion E connecting the horizontal plane 321 and the wedge-shaped surface 322 is formed in a linear shape extending in the X direction.

於水平台部31之上表面310刻設有格子狀之槽。更具體而言，於水平台部31之上表面310之中央部設置有格子狀之槽311。又，以包圍形成有槽311之區域之方式，於水平台部31之上表面310周緣部設置有槽312。該等槽311、312經由控制閥而連接於下述負壓供給部74(圖5)，具有作為藉由被供給負壓而吸附保持載置於載置台30上之工件之吸附槽之功能。兩種槽311、312於載置台上不相連，且經由相互獨立之控制閥而連接於負壓供給部74。因此，除使用兩種槽進行強力吸附以外，亦可僅使用一種槽進行吸附。 A grid-shaped groove is formed on the upper surface 310 of the water platform portion 31. More specifically, a grid-shaped groove 311 is provided in a central portion of the upper surface 310 of the water table portion 31. Further, a groove 312 is provided on a peripheral edge portion of the upper surface 310 of the water table portion 31 so as to surround a region where the groove 311 is formed. The tanks 311 and 312 are connected to a negative pressure supply unit 74 (FIG. 5) described below via a control valve, and have a function as an adsorption tank that sucks and holds a workpiece placed on the mounting table 30 by being supplied with negative pressure. The two types of grooves 311 and 312 are not connected on the mounting table, and are connected to the negative pressure supply portion 74 through mutually independent control valves. Therefore, in addition to using two types of tanks for strong adsorption, it is also possible to use only one type of tank for adsorption.

如圖1所示，於載置台30之(-Y)側端部附近配置有初始剝離單元33。初始剝離單元33具有於楔形台部32之上方於X方向上延設之棒狀之按壓構件331，按壓構件331係受支持臂332支持。支持臂332經由於鉛垂方向上延設之導軌333而自由升降地安裝於柱構件334上。藉由升降機構335之作動，支持臂332相對於柱構件334而上下活動。柱構件334係受安裝於主框架11上之基底部336支持，但柱構件334之Y方向位置可藉由位置調整機構337而於基底部336上於特定之範圍內調整。 As shown in FIG. 1, an initial peeling unit 33 is arranged near the end of the (-Y) side of the mounting table 30. The initial peeling unit 33 includes a rod-shaped pressing member 331 extending in the X direction above the wedge-shaped table portion 32. The pressing member 331 is supported by a support arm 332. The support arm 332 is attached to the pillar member 334 so as to be freely liftable via a guide rail 333 extending in the vertical direction. The support arm 332 moves up and down with respect to the pillar member 334 by the action of the lifting mechanism 335. The pillar member 334 is supported by the base portion 336 mounted on the main frame 11, but the Y-direction position of the pillar member 334 can be adjusted within a specific range on the base portion 336 by the position adjustment mechanism 337.

如下所述，於在載置台上表面310之特定位置載置有工件之狀態下，工件之(-Y)側端部向楔形台部32之上方突出。根據來自控制單元70之控制指令，支持臂332向下方移動，按壓構件331之下端抵接於工件而將該工件往下方按壓。此製造了剝離之契機。 As described below, in a state where a workpiece is placed at a specific position on the upper surface 310 of the mounting table, the (-Y) side end portion of the workpiece protrudes above the wedge-shaped table portion 32. According to a control instruction from the control unit 70, the support arm 332 moves downward, and the lower end of the pressing member 331 abuts against the workpiece to press the workpiece downward. This created an opportunity for divestiture.

以橫跨按照上述方式構成之載置台30之方式，設置有輥單元4。具體而言，沿水平台部31之X方向兩端部，於Y方向上延設有1對導軌 351、352，該等導軌351、352固定於主框架11。又，以相對於導軌351、352而自由滑動之方式安裝有輥單元4。 The roller unit 4 is provided so as to straddle the mounting table 30 configured as described above. Specifically, one pair of guide rails are extended in the Y direction along both ends of the X platform in the X direction. 351, 352, the guide rails 351, 352 are fixed to the main frame 11. In addition, the roller unit 4 is attached so as to freely slide with respect to the guide rails 351 and 352.

輥單元4具備分別自由滑動地與導軌351、352卡合之滑件41、42。以將該等滑件41、42相連之方式，設置有橫跨載置台30上部且於X方向上延設之下部角鋼43。於下部角鋼43經由升降機構44而自由升降地安裝有上部角鋼45。又，相對於上部角鋼45安裝有複數個、於該例中為3套輥組件40。 The roller unit 4 includes sliders 41 and 42 which are slidably engaged with the guide rails 351 and 352, respectively. To connect these sliders 41 and 42, a lower angle steel 43 extending in the X direction is provided across the upper portion of the mounting table 30. An upper angle steel 45 is attached to the lower angle steel 43 via a lifting mechanism 44 so as to be freely liftable. In addition, a plurality of roller assemblies 40 are attached to the upper angle steel 45 in this example.

圖3A及圖3B係表示輥單元之構造之圖。更具體而言，圖3A係表示輥單元4之主要部分之構造之分解立體圖，圖3B係自X方向觀察輥單元4之主要部分之圖。各輥組件40分別具備將X方向設定為長度方向之圓柱狀之剝離輥401、及對剝離輥401繞著沿X方向之旋轉軸自由旋轉地予以支持之輥支持部402。 3A and 3B are diagrams showing the structure of a roller unit. More specifically, FIG. 3A is an exploded perspective view showing the structure of the main part of the roller unit 4, and FIG. 3B is a view when the main part of the roller unit 4 is viewed from the X direction. Each of the roller units 40 includes a cylindrical peeling roller 401 having the X direction set in the longitudinal direction, and a roller supporting portion 402 that supports the peeling roller 401 in a freely rotatable manner about a rotation axis in the X direction.

剝離輥401形成為利用由彈性材料例如橡膠製成之表面層覆蓋由例如鐵、不鏽鋼、鋁合金或黃銅等金屬材料所形成之帶芯棒之表面之構造，其表面具有彈性。輥支持部402將剝離輥401自由旋轉地軸支，剝離輥401繞著旋轉軸而自由旋轉。 The peeling roller 401 is formed to cover the surface of a cored bar formed of a metal material such as iron, stainless steel, aluminum alloy, or brass with a surface layer made of an elastic material such as rubber, and its surface has elasticity. The roller support part 402 pivots the peeling roller 401 so that it can rotate freely, and the peeling roller 401 rotates freely about a rotation axis.

各輥組件40藉由適當之固定構件例如螺桿46而固定於上部角鋼45。上部角鋼45係垂直於X方向之截面形狀為大致L字型且於X方向上延伸之構件。於上部角鋼45，設置有複數個具有將Y方向設定為長度方向之橢圓形截面之貫通孔451，於各貫通孔451分別插通有螺桿46。相對於1個輥組件40，與輥支持部402之X方向兩端部對應而設置有2個貫通孔451。 Each roller assembly 40 is fixed to the upper angle steel 45 by a suitable fixing member such as a screw 46. The upper angle steel 45 is a member whose cross-sectional shape perpendicular to the X direction is substantially L-shaped and extends in the X direction. A plurality of through-holes 451 having an elliptical cross section in which the Y direction is set to the longitudinal direction are provided in the upper angle steel 45, and a screw 46 is inserted into each of the through-holes 451. Two through holes 451 are provided for one roller unit 40 in correspondence with both ends in the X direction of the roller support portion 402.

各輥組件40分別藉由2個螺桿46而固定於上部角鋼45。如圖3B所示，於上部角鋼45下部設置有被加工成鉛垂平面之定位用基準面452。藉由使輥支持部402之(+Y)側端面碰觸定位用基準面452，而使各輥組件40之位置對齊。貫通孔451為長孔，故而各輥組件40於上部 角鋼45上之安裝位置可於Y方向及繞著Z軸而於特定範圍內調整。又，視需要而將另行準備之墊片(間隔件)403夾於上部角鋼45與輥支持部402之間，藉此調整輥組件40之Z方向位置。 Each roller assembly 40 is fixed to the upper angle steel 45 by two screws 46, respectively. As shown in FIG. 3B, a positioning reference surface 452 processed into a vertical plane is provided below the upper angle steel 45. The (+ Y) side end surface of the roller support portion 402 is brought into contact with the positioning reference surface 452 to align the positions of the roller assemblies 40. The through hole 451 is a long hole, so each roller assembly 40 is at the top The installation position on the angle steel 45 can be adjusted in a specific range in the Y direction and around the Z axis. In addition, if necessary, a separately prepared spacer (spacer) 403 is sandwiched between the upper angle steel 45 and the roller support portion 402 to adjust the position of the roller assembly 40 in the Z direction.

各輥組件40為相同構造，藉由採用上述構造，可藉由調整作業而修正因加工尺寸之差異而引起之錯位。於將輥組件40組裝至上部角鋼45上時，使用該等位置調整功能，以各剝離輥401之旋轉軸相互一致之方式預先進行調整。 Each of the roller assemblies 40 has the same structure, and by adopting the above-mentioned structure, it is possible to correct a misalignment caused by a difference in the processing size by an adjustment operation. When assembling the roller assembly 40 to the upper angle steel 45, the position adjustment functions are used to adjust in advance so that the rotation axes of the peeling rollers 401 coincide with each other.

於該例中，3套輥組件40均具有相同之構造，且剝離輥401之尺寸即直徑及X方向長度相等。又，複數個剝離輥401之旋轉軸相互一致。然而，如下所述，亦可使用尺寸及旋轉軸互不相同之複數個剝離輥。 In this example, the three sets of roller assemblies 40 all have the same structure, and the size of the peeling roller 401, that is, the diameter and the length in the X direction are equal. The rotation axes of the plurality of peeling rollers 401 coincide with each other. However, as described below, a plurality of peeling rollers having different sizes and rotation axes may be used.

返回至圖2繼續進行說明。若上部角鋼45利用升降機構44而向下方即向(-Z)方向下降，則剝離輥401之下表面抵接於載置於載置台30上之工件之上表面。另一方面，於上部角鋼45利用升降機構44而就位於上方即(+Z)方向之位置之狀態下，形成為剝離輥401自工件之上表面向上方遠離之狀態。 Returning to FIG. 2, the explanation is continued. When the upper angle steel 45 is lowered by the lifting mechanism 44 in the (-Z) direction, the lower surface of the peeling roller 401 abuts on the upper surface of the workpiece placed on the mounting table 30. On the other hand, in a state where the upper angle steel 45 is located at a position above (that is, in the (+ Z) direction) by the lifting mechanism 44, the peeling roller 401 is formed away from the upper surface of the workpiece.

輥單元4可利用安裝於主框架11上之馬達353而於Y方向上移動。更具體而言，下部角鋼43連結於作為將馬達353之旋轉運動轉換為直線運動之轉換機構之例如滾珠螺桿機構354。若馬達353旋轉，則下部角鋼43沿導軌351、352於Y方向上移動，藉此輥單元4於Y方向上移動。伴隨輥單元4之移動之剝離輥401之可動範圍於(-Y)方向上被設定為至水平台部31之(-Y)側端部附近為止，於(+Y)方向上被設定為至較水平台部31之(+Y)側端部靠外側即進而向(+Y)側行進所到達之位置為止。 The roller unit 4 can be moved in the Y direction by a motor 353 mounted on the main frame 11. More specifically, the lower angle steel 43 is connected to, for example, a ball screw mechanism 354 that is a conversion mechanism that converts the rotational motion of the motor 353 into a linear motion. When the motor 353 rotates, the lower angle steel 43 moves along the guide rails 351 and 352 in the Y direction, whereby the roller unit 4 moves in the Y direction. The movable range of the peeling roller 401 accompanying the movement of the roller unit 4 is set in the (-Y) direction to the vicinity of the (-Y) side end portion of the water stage portion 31 and is set to (+ Y) It is positioned further to the outside than the (+ Y) side end of the water platform portion 31, that is, to a position reached by traveling toward the (+ Y) side.

其次對第2吸附單元52之構成進行說明。再者，第1至第4吸附單元51~54均具有相同之構造，此處，以第2吸附單元52之構造為代表 而進行說明。第2吸附單元52具有於X方向上延設且固定於支持框架50之樑構件521。於樑構件521，於X方向上位置互不相同地安裝有朝向鉛垂下方即向(-Z)方向延伸之1對柱構件522、523。於柱構件522、523經由未圖示之導軌而自由升降地安裝有板構件524，板構件524係藉由包含馬達及轉換機構(例如滾珠螺桿機構)之升降機構525而升降驅動。 Next, the configuration of the second adsorption unit 52 will be described. The first to fourth adsorption units 51 to 54 have the same structure. Here, the structure of the second adsorption unit 52 is representative. Explain. The second suction unit 52 includes a beam member 521 extending in the X direction and fixed to the support frame 50. On the beam member 521, a pair of pillar members 522 and 523 extending downward (that is, in the (-Z) direction) perpendicular to the vertical direction are mounted at positions different from each other in the X direction. A plate member 524 is mounted on the column members 522 and 523 so as to be vertically movable via a guide rail (not shown). The plate member 524 is driven by a lifting mechanism 525 including a motor and a conversion mechanism (such as a ball screw mechanism).

於板構件524之下部安裝有於X方向上延伸之方棒狀之墊支持構件526。於墊支持構件526之下表面沿X方向以相等間隔排列有複數個吸附墊527。於圖2中，表示使第2吸附單元52移動至較實際之位置靠上方之狀態，於利用升降機構525使板構件524向下方移動時，吸附墊527可下降至極近接於水平台部31之上表面310之位置。於在載置台30上載置有工件之狀態下，吸附墊527抵接於工件之上表面。對各吸附墊527賦予來自下述負壓供給部74之負壓，而吸附保持工件之上表面。 A square rod-shaped pad support member 526 extending in the X direction is attached to the lower portion of the plate member 524. A plurality of suction pads 527 are arranged on the lower surface of the pad support member 526 at equal intervals in the X direction. In FIG. 2, the second adsorption unit 52 is moved to a position higher than the actual position. When the plate member 524 is moved downward by the lifting mechanism 525, the adsorption pad 527 can be lowered to a position close to the water platform portion 31. The position of the upper surface 310. In a state where a workpiece is placed on the mounting table 30, the suction pad 527 abuts on the upper surface of the workpiece. Each suction pad 527 is provided with a negative pressure from a negative pressure supply unit 74 described below, and suction-holds the upper surface of the workpiece.

載置台30之水平台部31與楔形台部32係分開形成，可分離。楔形台部32可利用省略了圖示之水平移動機構而相對於水平台部31沿水平方向進行接近、遠離移動。藉由楔形台部32密接於水平台部31之側面，水平台部31與楔形台部32一體地作為載置台30發揮功能。 The water platform portion 31 and the wedge-shaped platform portion 32 of the mounting table 30 are formed separately and can be separated. The wedge-shaped table section 32 can be moved closer to and away from the water table section 31 in the horizontal direction by using a horizontal moving mechanism (not shown). Since the wedge-shaped platform portion 32 is in close contact with the side surface of the water platform portion 31, the water platform portion 31 and the wedge-shaped platform portion 32 integrally function as the mounting platform 30.

於水平台部31之上表面310，除上述吸附槽311、312以外，亦設置有形狀互不相同之開口313、314。更具體而言，於水平台部31之上表面310中吸附槽311與吸附槽312之間之平坦部分之複數個位置，分散配置有具有橢圓形狀之複數個第1開口313。又，於水平台部31之上表面310之中央部之相互遠離之4個位置，設置有大致圓形之第2開口314。第1開口313及第2開口314均於水平台部31之上表面310不與吸附槽311、312連接。為實現該構成，吸附槽311於第2開口314之周圍切斷開。於該等開口313、314之內部配設有提昇機構。 In addition to the adsorption grooves 311 and 312 described above, the upper surface 310 of the water platform portion 31 is also provided with openings 313 and 314 having different shapes from each other. More specifically, a plurality of first openings 313 having an elliptical shape are dispersedly disposed at a plurality of positions on a flat portion between the adsorption groove 311 and the adsorption groove 312 in the upper surface 310 of the water table portion 31. Further, at the four positions away from each other in the central portion of the upper surface 310 of the water table portion 31, a substantially circular second opening 314 is provided. Both the first opening 313 and the second opening 314 are not connected to the adsorption grooves 311 and 312 on the upper surface 310 of the water table portion 31. In order to realize this structure, the adsorption tank 311 is cut off around the second opening 314. A lifting mechanism is provided inside the openings 313 and 314.

圖4A至圖4C係表示提昇機構之構成例之剖視圖。此處，以配設於第2開口314之提昇機構36為例對其構造進行說明。然而，藉由適當地變更頂起銷之形狀，可對配設於第1開口313之提昇機構亦應用相同之構造。提昇機構36具備頂起銷361、外殼362及驅動部363。頂起銷361插通於設置於水平台部31之第2開口314。外殼362安裝於水平台部31之底面，驅動部363設置於外殼362，使頂起銷361升降。作為驅動部363，可使用氣缸、螺線管、壓電致動器等各種致動器。 4A to 4C are cross-sectional views illustrating a configuration example of a lifting mechanism. Here, the structure of the lifting mechanism 36 provided in the second opening 314 will be described as an example. However, by appropriately changing the shape of the jack pin, the same structure can be applied to the lifting mechanism provided in the first opening 313. The lifting mechanism 36 includes a jacking pin 361, a housing 362, and a driving portion 363. The jacking pin 361 is inserted through the second opening 314 provided in the water table portion 31. The casing 362 is mounted on the bottom surface of the water table portion 31, and the driving portion 363 is disposed on the casing 362 to raise and lower the jacking pin 361. As the drive unit 363, various actuators such as a cylinder, a solenoid, and a piezoelectric actuator can be used.

根據來自控制單元70之控制指令，驅動部363作動，藉此，頂起銷361於圖4A所示之退避位置與圖4B所示之突出位置之間升降移動。退避位置係如圖4A所示頂起銷361之上端退避至較載置台上表面310靠下方之位置。突出位置係如圖4B所示頂起銷361之上端向較載置台上表面310靠上部突出之位置。如圖4C所示，藉由使複數個頂起銷361就位於突出位置，可於使工件WK(下述)離開載置台上表面310之狀態下支持工件WK。若以複數個頂起銷361之上端位於相同高度之方式使頂起銷361就位，則可呈水平姿勢支持工件WK。為更確實地保持工件，各頂起銷361亦可具有吸附保持功能。 In accordance with a control command from the control unit 70, the driving unit 363 is operated, whereby the jacking pin 361 moves up and down between the retracted position shown in FIG. 4A and the protruding position shown in FIG. 4B. The retreat position is a position where the upper end of the jacking pin 361 is retracted to a position lower than the upper surface 310 of the mounting table as shown in FIG. 4A. The protruding position is a position where the upper end of the jacking pin 361 protrudes from the upper surface 310 of the mounting table upward as shown in FIG. 4B. As shown in FIG. 4C, by placing the plurality of jack pins 361 at the protruding positions, the workpiece WK can be supported while the workpiece WK (described below) is separated from the upper surface 310 of the mounting table. If the jacks 361 are positioned in such a way that the upper ends of the jacks 361 are at the same height, the workpiece WK can be supported in a horizontal posture. In order to more reliably hold the workpiece, each of the jack pins 361 may have a suction holding function.

圖5係表示該剝離裝置之電氣構成之方塊圖。裝置各部係由控制單元70控制。控制單元70具備：CPU(Central Processing Unit，中央處理單元)701，其負責裝置整體之動作；馬達控制部702，其對設置於各部之馬達類機構進行控制；閥控制部703，其對設置於各部之閥類機構進行控制；負壓控制部704，其對供給至各部之負壓進行控制；以及使用者介面(UI)部705，其具有受理來自使用者之操作輸入及將裝置之狀態報告給使用者之功能。 Fig. 5 is a block diagram showing the electrical configuration of the peeling device. Each part of the apparatus is controlled by a control unit 70. The control unit 70 includes a CPU (Central Processing Unit) 701, which is responsible for the overall operation of the device; a motor control unit 702, which controls motor-type mechanisms provided in each unit; and a valve control unit 703, which is provided in The valve mechanism of each part controls; the negative pressure control part 704 controls the negative pressure supplied to each part; and the user interface (UI) part 705, which has the function of receiving operation input from the user and reporting the status of the device Features for users.

馬達控制部702對設置於載置台區塊3之馬達353及升降機構335、44、365、水平移動機構以及分別設置於上部吸附區塊5之各吸附單元51~54之升降機構525等馬達群進行驅動控制。再者，此處， 作為各可動部之驅動源，代表性地記載有馬達，但並不限定於此，亦可根據其用途而將例如氣缸、螺線管、壓電元件等各種致動器作為驅動源使用。負壓控制部704對由負壓供給部74產生並視需要而供給至裝置各部之負壓之大小進行控制。再者，於可利用工廠公用電力等自外部供給之負壓之情形時，該剝離裝置亦可不具備負壓供給部。 The motor control unit 702 controls motor groups such as a motor 353 provided on the mounting table block 3, lifting mechanisms 335, 44, 365, a horizontal moving mechanism, and a lifting mechanism 525 provided on each of the adsorption units 51 to 54 in the upper adsorption block 5. Perform drive control. Moreover, here, Although a motor is typically described as a drive source of each movable part, it is not limited to this, and various actuators, such as a cylinder, a solenoid, a piezoelectric element, etc. can be used as a drive source according to the use. The negative pressure control section 704 controls the magnitude of the negative pressure generated by the negative pressure supply section 74 and supplied to each section of the apparatus as necessary. Furthermore, when a negative pressure supplied from the outside such as utility power or the like can be used, the peeling device may not include a negative pressure supply unit.

閥控制部703對閥群V3、閥群V5等進行控制；該閥群V3設置於自負壓供給部74連接至設置於水平台部31之吸附槽311、312之配管路徑上，用以對該等吸附槽個別地供給特定之負壓；閥群V5設置於自負壓供給部74連接至各吸附單元51~54之吸附墊517等之配管路徑上，用以對各吸附墊517等供給特定之負壓。 The valve control section 703 controls the valve group V3, the valve group V5, and the like; the valve group V3 is provided on a piping path connected to the suction tanks 311 and 312 provided on the water platform section 31 from the self-negative pressure supply section 74, and These adsorption tanks individually supply a specific negative pressure; the valve group V5 is provided on a piping path connected to the adsorption pads 517 and the like from the negative pressure supply unit 74 to each of the adsorption units 51 to 54 to supply the respective adsorption pads 517 and the like Specific negative pressure.

其次，對以上述方式構成之剝離裝置1之動作進行說明。利用該剝離裝置1而執行之剝離動作與上述專利文獻1(日本專利特開2014-189350號公報)中所記載之剝離裝置之剝離動作基本相同。因此，省略有關該剝離裝置1之剝離動作之詳細說明，此處，簡單地對各部於剝離動作中之舉動進行說明。 Next, the operation of the peeling device 1 configured as described above will be described. The peeling operation performed by the peeling device 1 is basically the same as the peeling operation of the peeling device described in the aforementioned Patent Document 1 (Japanese Patent Laid-Open No. 2014-189350). Therefore, a detailed description of the peeling operation of the peeling device 1 is omitted, and here, the behavior of each part in the peeling operation will be briefly described.

圖6A至圖6D係表示各部於剝離動作之過程中之動作之圖。此處，橡皮布BL作為利用圖案形成材料而形成有預先特定之圖案等之圖案擔載體，基板SB作為供該圖案等轉印之被轉印體，橡皮布BL與基板SB經由圖案貼合而成者成為作為剝離對象物之工件WK。對將橡皮布BL及基板SB自該工件WK剝離之動作進行說明。CPU701執行特定之控制程序，且控制單元70控制裝置各部，藉此執行剝離動作。 6A to 6D are diagrams showing operations of each part in the process of peeling operation. Here, the blanket BL serves as a pattern carrier formed with a predetermined pattern or the like using a pattern forming material, the substrate SB serves as a transfer target to which the pattern or the like is transferred, and the blanket BL and the substrate SB are bonded via the pattern. The successful person becomes the workpiece WK which is the object of peeling. The operation of peeling the blanket BL and the substrate SB from the workpiece WK will be described. The CPU 701 executes a specific control program, and the control unit 70 controls each part of the device, thereby performing a stripping operation.

首先，自外部向剝離裝置1搬入工件WK並將工件WK載置於載置台30之特定位置。此時，藉由使配設於開口313、314之頂起銷定位於向較載置台上表面310靠上方突出之突出位置，可容易地交接來自外部之搬送裝置之工件WK。頂起銷於接收至工件WK之後下降至退避位置，藉此工件WK被載置於載置台上表面310。 First, the workpiece WK is carried into the peeling device 1 from the outside, and the workpiece WK is placed on a specific position of the mounting table 30. At this time, by positioning the jack pins provided in the openings 313 and 314 at the protruding positions protruding upward from the upper surface 310 of the mounting table, the workpiece WK from the external transfer device can be easily transferred. The jacking pin is lowered to the retracted position after receiving the workpiece WK, whereby the workpiece WK is placed on the upper surface 310 of the mounting table.

於工件WK剛被搬入之後之初始狀態下，藉由吸附槽311、312中之一者或兩者而吸附保持工件WK。初始剝離單元33之按壓構件331、輥單元4之剝離輥401、第1至第4吸附單元51~54之吸附墊517~547均遠離工件WK。各吸附單元51~54係以不會對於Y方向上移行之輥單元4造成干涉之方式，隔開充足之間隙而配置於吸附墊517~547與基板SB之間。又剝離輥401位於較第1吸附單元51之吸附墊517略靠(+Y)側之位置，且處於自工件WK遠離之狀態。自該狀態執行剝離動作。 In the initial state immediately after the workpiece WK is carried in, the workpiece WK is sucked and held by one or both of the suction grooves 311 and 312. The pressing member 331 of the initial peeling unit 33, the peeling roller 401 of the roller unit 4, and the adsorption pads 517 to 547 of the first to fourth adsorption units 51 to 54 are all far from the workpiece WK. Each of the adsorption units 51 to 54 is disposed between the adsorption pads 517 to 547 and the substrate SB with a sufficient gap so as not to interfere with the roller unit 4 traveling in the Y direction. In addition, the peeling roller 401 is located on the (+ Y) side slightly from the suction pad 517 of the first suction unit 51, and is in a state far from the workpiece WK. A peeling operation is performed from this state.

於剝離動作中，首先第1吸附單元51下降，吸附墊517抵接於基板SB之(-Y)側端部上表面並利用負壓而吸附保持基板SB。又，剝離輥401下降並抵接於基板SB之上表面。自該狀態，如圖6A所示，按壓構件331下降而往下按壓橡皮布BL之端部。橡皮布BL之端部向楔形台部32之上方突出，且於其下表面與楔形載置台32之上表面320之間存在間隙。因此，藉由按壓構件331向下方按壓橡皮布BL之端部，橡皮布BL之端部沿楔形台部32之楔形面向下方彎曲。其結果，利用第1吸附單元51而吸附保持之基板SB之端部與橡皮布BL之間分離而開始剝離。 In the peeling operation, first, the first suction unit 51 is lowered, and the suction pad 517 abuts on the upper surface of the (-Y) side end portion of the substrate SB, and sucks and holds the substrate SB by a negative pressure. In addition, the peeling roller 401 descends and comes into contact with the upper surface of the substrate SB. From this state, as shown in FIG. 6A, the pressing member 331 is lowered and the end portion of the blanket BL is pressed down. An end portion of the blanket BL protrudes above the wedge-shaped table portion 32, and there is a gap between the lower surface thereof and the upper surface 320 of the wedge-shaped mounting table 32. Therefore, the end of the blanket BL is pressed downward by the pressing member 331, and the end of the blanket BL is bent downward along the wedge-shaped surface of the wedge-shaped base portion 32. As a result, the end portion of the substrate SB which is sucked and held by the first suction unit 51 is separated from the blanket BL and starts to peel off.

繼而，如圖6B所示，第1吸附單元51開始上升，並且剝離輥401一面抵接於基板SB表面而轉動，一面向(+Y)方向移動。藉此，基板SB與橡皮布BL之剝離朝著(+Y)方向推進。由於已使剝離輥401抵接，故剝離不會超出剝離輥401抵接於基板SB之區域而推進。藉由使剝離輥401一面抵接於基板SB、一面以固定速度向(+Y)方向移動，可使剝離之推進速度維持固定。 Then, as shown in FIG. 6B, the first adsorption unit 51 starts to rise, and the peeling roller 401 rotates while abutting against the surface of the substrate SB, and moves toward the (+ Y) direction. Thereby, the peeling of the substrate SB and the blanket BL advances in the (+ Y) direction. Since the peeling roller 401 is brought into contact, the peeling does not advance beyond the area where the peeling roller 401 abuts on the substrate SB. By moving the peeling roller 401 into contact with the substrate SB while moving in the (+ Y) direction at a constant speed, the advancement speed of the peeling can be maintained constant.

對於剝離輥401藉由之後之基板SB，吸附單元52、53、54依序下降，抵接於自橡皮布BL剝離之後之基板SB並保持該基板SB。具體而言，如圖6C所示，一旦剝離輥401藉由第2吸附單元52之正下方位置，該第2吸附單元52就開始下降而朝著基板SB推進。若吸附墊527 抵接於基板SB上表面，則利用自負壓供給部74供給之負壓，第2吸附單元52開始吸附保持基板SB。 With regard to the substrate SB after the peeling roller 401, the adsorption units 52, 53, 54 are sequentially lowered, and they abut the substrate SB after being peeled from the blanket BL, and hold the substrate SB. Specifically, as shown in FIG. 6C, once the peeling roller 401 passes the position directly below the second adsorption unit 52, the second adsorption unit 52 starts to descend and advances toward the substrate SB. If adsorption pad 527 When it comes into contact with the upper surface of the substrate SB, the second suction unit 52 starts to suck and hold the substrate SB by the negative pressure supplied from the negative pressure supply unit 74.

第2吸附單元52一旦開始吸附保持基板SB便轉而上升。於此以後，基板SB就由第1吸附單元51及第2吸附單元52保持。藉此，正於自橡皮布BL進行剝離之基板SB更確實地得至保持，可防止基板SB向下撓曲而與橡皮布BL再接觸、或自吸附墊517脫落等問題。又，若將基板SB與橡皮布BL已經剝離之剝離區域和尚未剝離之未剝離區域之交界線稱為「剝離交界線」，則藉由恰當地保持剝離交界線附近之基板SB與橡皮布BL之角度，亦可獲得使剝離良好地推進之效果。 Once the second adsorption unit 52 starts to adsorb and hold the substrate SB, it turns up. After that, the substrate SB is held by the first adsorption unit 51 and the second adsorption unit 52. Thereby, the substrate SB being peeled off from the blanket BL can be more surely held, and problems such as the substrate SB being bent downward and being brought into contact with the blanket BL or falling off from the suction pad 517 can be prevented. In addition, if the boundary between the peeled area where the substrate SB and the blanket BL has been peeled off and the non-peeled area which has not been peeled off is referred to as a "peel boundary", the substrate SB and the blanket BL near the peel boundary are properly maintained. From this angle, the effect of promoting the peeling can be obtained.

其他吸附單元53、54亦同樣地，一旦剝離輥401藉由該吸附單元之下方，該吸附單元就開始下降，於吸附墊抵接於基板SB之時間點開始吸附保持並上升，藉此將基板SB向上方提拉。各吸附單元於上升至距離載置台30特定之高度之時間點停止。 The other adsorption units 53 and 54 are the same. Once the peeling roller 401 passes below the adsorption unit, the adsorption unit starts to descend, and starts to be adsorbed and held up when the adsorption pad abuts the substrate SB, thereby holding the substrate. SB pulled up. Each adsorption unit is stopped at a time point when it rises to a specific height from the mounting table 30.

剝離推進方向之最下游側即最靠(+Y)側之吸附單元54保持基板SB並上升至特定位置，藉此，如圖6D所示，基板SB與橡皮布BL完全分離，從而完成剝離。剝離輥401及按壓構件331退避至與基板SB、橡皮布BL均分離之位置，藉此可搬出已相互分離之基板SB與橡皮布BL。此時頂起銷再次就位於突出位置，藉此殘留於載置台30上之橡皮布BL以離開載置台上表面310之狀態得至支持。藉此，易於實施橡皮布BL向外部之搬送裝置之交接。以此方式搬出基板SB及橡皮布BL，完成剝離動作。 The adsorption unit 54, which is the most downstream (+ Y) side of the peeling advancement direction, holds the substrate SB and rises to a specific position, whereby the substrate SB is completely separated from the blanket BL as shown in FIG. 6D, thereby completing the peeling. The peeling roller 401 and the pressing member 331 are retracted to a position separated from both the substrate SB and the blanket BL, so that the substrate SB and the blanket BL that have been separated from each other can be carried out. At this time, the jacking pin is located at the protruding position again, whereby the blanket BL remaining on the mounting table 30 is supported in a state of being separated from the upper surface 310 of the mounting table. This makes it easy to transfer the blanket BL to an external transfer device. In this way, the substrate SB and the blanket BL are carried out, and the peeling operation is completed.

圖7係表示輥單元與工件之抵接狀態之圖。若於在載置台30上載置有工件WK之狀態下輥單元4下降，則3個剝離輥401分別抵接於基板SB之上表面而形成抵接夾持部。如圖7所示，自(-X)側往(+X)側依序給形成於3個剝離輥401與基板SB上表面之間之3個抵接夾持部標上符號N1、N2、N3。各抵接夾持部N1、N2、N3於X方向上相互隔開。 即，X方向上之抵接夾持部N1、N2間之間隙G12、抵接夾持部N2、N3間之間隙G23均大於0。 Fig. 7 is a view showing a contact state between a roller unit and a workpiece. When the roller unit 4 is lowered in a state where the workpiece WK is placed on the mounting table 30, the three peeling rollers 401 abut on the upper surface of the substrate SB to form a contact nip. As shown in FIG. 7, from the (-X) side to the (+ X) side, the three abutment nips formed between the three peeling rollers 401 and the upper surface of the substrate SB are marked with symbols N1, N2, and N2. N3. The abutting and clamping portions N1, N2, and N3 are spaced apart from each other in the X direction. That is, the gap G12 between the abutting and clamping portions N1 and N2 and the gap G23 between the abutting and clamping portions N2 and N3 in the X direction are all larger than 0.

又，於Y方向上，如圖中虛線所示，於X方向上延伸之抵接夾持部N1~N3之(-Y)側端部之位置相同。伴隨輥單元4之移動，抵接夾持部N1~N3向(+Y)方向移動，抵接夾持部N1~N3之(-Y)側端部相當於該移動方向上之後端部。基板SB自橡皮布BL之剝離係朝著(+Y)方向而推進，故而抵接夾持部N1~N3之(-Y)側端部亦可稱為剝離推進方向上之後端部。 In the Y direction, as shown by the dotted lines in the figure, the positions of the (-Y) side end portions of the abutting and clamping portions N1 to N3 extending in the X direction are the same. With the movement of the roller unit 4, the abutting nips N1 to N3 move in the (+ Y) direction, and the (-Y) side end portion of the abutting nips N1 to N3 corresponds to the rear end portion in the moving direction. The peeling of the substrate SB from the blanket BL is advanced in the (+ Y) direction. Therefore, the (-Y) side end portion abutting against the clamping portions N1 to N3 may also be referred to as the rear end portion in the peeling advance direction.

於較抵接夾持部N1~N3之後端部靠剝離推進方向上之上游側即(-Y)側，藉由利用吸附單元51等而實施之提拉，形成為基板SB已被剝離而離開橡皮布BL之狀態。另一方面，於較抵接夾持部N1~N3之後端部靠下游側即(+Y)側，藉由剝離輥401而對剝離之推進加以限制，形成為基板SB與橡皮布BL依然密接之狀態。因此，抵接夾持部N1~N3之後端部碰到已剝離之區域與未剝離之區域之交界。 The end portion is closer to the upstream side (-Y) in the peeling advancing direction than the abutting portions N1 to N3, and the substrate SB has been peeled and separated by pulling by the suction unit 51 or the like. The state of the blanket BL. On the other hand, the end is closer to the downstream side than the abutting nips N1 to N3, that is, the (+ Y) side. The advancement of peeling is restricted by the peeling roller 401, and the substrate SB and the blanket BL are still in close contact Of the state. Therefore, after abutting the clamping portions N1 to N3, the ends touch the boundary between the peeled area and the unpeeled area.

3個抵接夾持部N1~N3之後端部之Y方向位置相同，一面保持該關係，一面使抵接夾持部N1~N3向(+Y)方向移動。藉此，已剝離區域與未剝離區域之間之剝離交界線始終呈於X方向上延伸之一條直線之狀態向(+Y)方向推進。藉此，可減小因剝離之推進速度局部變動而引起之應力集中之影響，從而使剝離良好地推進。為防止剝離交界線之紊亂，較佳為於構造上可行之範圍內縮窄抵接夾持部間之間隙G12、G23。藉由本申請之發明者之實驗而確認至：例如於基板SB係如玻璃基板般剛性相對較高之基板之情形時，即便剝離輥間之間隙設定為10毫米左右，剝離品質亦無問題。 The positions of the Y-direction ends of the three abutting and clamping portions N1 to N3 are the same. While maintaining the relationship, the abutting and clamping portions N1 to N3 are moved in the (+ Y) direction. Thereby, the peeling boundary line between the peeled area and the non-peeled area always advances in the (+ Y) direction in a state of a straight line extending in the X direction. Thereby, it is possible to reduce the effect of the stress concentration caused by the local variation in the advancement speed of the peeling, and to advance the peeling well. In order to prevent the disorder of the peeling boundary line, it is preferable to narrow the gaps G12 and G23 between the abutting and clamping portions within a structurally feasible range. Experiments by the inventors of the present application confirmed that, for example, when the substrate SB is a relatively rigid substrate such as a glass substrate, even if the gap between the peeling rollers is set to about 10 mm, there is no problem in peeling quality.

自形成一條直線狀之剝離交界線之觀點而言，理想為藉由單個輥構件自基板SB之(-X)側端部至(+X)側端部進行按壓。然而，自實現基板尺寸之大型化方面而言，該設定未必容易。 From the viewpoint of forming a linear peeling boundary line, it is desirable to press from the (-X) side end to the (+ X) side end of the substrate SB by a single roll member. However, in terms of realizing an increase in the size of the substrate, this setting is not necessarily easy.

圖8A至圖8C係將剝離輥為單個之情形與複數個之情形加以比較之圖。於將剝離輥設定為單個構件之情形時，如圖8A所示，輥構件R之長度必須至少較X方向上之基板SB之長度長。近年來，亦存在輥構件R之長度為1米以上之情形，以此種長度很難尺寸精度較佳地製造具有充足強度之輥構件。雖然亦可考慮擴大輥徑，但如此無法於抵接夾持部附近使吸附墊517等抵接於基板SB，故而有剝離之品質發生問題之虞。又，伴隨輥質量之增加，需要使周圍構件高剛性化、大型化，故而亦會造成製造成本增大。 8A to 8C are diagrams comparing a case where a single peeling roller is used and a case where a plurality of peeling rollers are used. When the peeling roller is set as a single member, as shown in FIG. 8A, the length of the roller member R must be at least longer than the length of the substrate SB in the X direction. In recent years, there is also a case where the length of the roller member R is 1 meter or more. With such a length, it is difficult to manufacture a roller member having sufficient strength with good dimensional accuracy. Although the roll diameter may be considered to be enlarged, the suction pad 517 and the like cannot be brought into contact with the substrate SB in the vicinity of the contact nip, so that there is a possibility that the quality of peeling may be a problem. In addition, with the increase in the quality of the rolls, it is necessary to increase the rigidity and size of the surrounding members, which also increases the manufacturing cost.

又，有時如圖8B所示，於長條之輥構件R按壓至基板SB時，輥構件R撓曲，即便於靠近軸承之端部附近對基板SB作用有充足之按壓力，亦不會特別於中央部分施加有充足之按壓力。此種不均勻之按壓可能會成為剝離不良之原因。雖然亦可藉由使支承輥抵接於輥構件R而抑制撓曲，但尤其是於輥表面包含彈性材料之情形時，有因表面層之彈性變形而無法充分地獲得支承之效果之情況。 In addition, as shown in FIG. 8B, when the long roller member R is pressed against the substrate SB, the roller member R is deflected, and even if a sufficient pressing force acts on the substrate SB near the end portion near the bearing, it may not In particular, a sufficient pressing force is applied to the central part. Such uneven pressing may be a cause of poor peeling. Although the deflection can also be suppressed by abutting the support roller against the roller member R, especially when the surface of the roller contains an elastic material, the effect of supporting cannot be sufficiently obtained due to the elastic deformation of the surface layer.

鑒於此種問題，於該實施形態之輥單元4中，如圖8C所示，將剝離輥401於X方向上分割為複數個，於使該等之位置對齊之後使該等一體地移動。藉由如此設定，既獲得了與單個輥構件相同之剝離限制效果，又實現了上述單個輥之問題點之解決。即，藉由縮短各剝離輥401之X方向長度，可形成抑制尺寸之差異又不易產生撓曲之構造。 In view of such a problem, in the roller unit 4 of this embodiment, as shown in FIG. 8C, the peeling roller 401 is divided into a plurality of pieces in the X direction, and the positions of these are aligned to move them together. With this setting, the same peeling restriction effect as that of the single roll member is obtained, and the problem of the single roll is solved. That is, by shortening the X-direction length of each peeling roller 401, it is possible to form a structure that suppresses a difference in size and is less prone to deflection.

又，即便各個剝離輥401較短，於藉由單個支軸而支持該等之構造中，有時依然會因支軸之撓曲而導致按壓力之不均勻。於該實施形態中，各剝離輥401分別獨立地支持於輥支持部402。藉此，可抑制各剝離輥401之兩端位置之變動，從而使對基板SB之按壓力更均勻。 Moreover, even if each peeling roller 401 is short, in a structure which supports these by a single support shaft, there is still a case where the pressing force is uneven due to the deflection of the support shaft. In this embodiment, each peeling roller 401 is independently supported by the roller support part 402. Thereby, variation in the positions of both ends of each peeling roller 401 can be suppressed, and the pressing force on the substrate SB can be made more uniform.

進而，藉由分割剝離輥，有可避開設置於載置台之開口部而按壓基板SB之效果。即，於該實施形態中，如圖8C所示，剝離輥401之尺寸與開口314之位置之關係係以相鄰之2個剝離輥間之間隙部位於設 置於載置台上表面310之開口314上方之方式設定。 Furthermore, by dividing the peeling roller, there is an effect that the substrate SB can be pressed while avoiding openings placed on the mounting table. That is, in this embodiment, as shown in FIG. 8C, the relationship between the size of the peeling roller 401 and the position of the opening 314 is such that the gap between two adjacent peeling rollers is located The method is set above the opening 314 on the upper surface 310 of the mounting table.

若工件WK大型化，則難以於將工件WK搬入至載置台30及自載置台30搬出工件WK時使工件WK維持為水平姿勢。於該實施形態中，使頂起銷自分散配置於載置台上表面310之開口313、314突出而自下方支持工件WK。藉由如此設定，而抑制工件WK之撓曲以保持水平姿勢。然而，於剝離輥所造成之按壓之點上，載置台較佳為儘可能平坦且無開口。 When the workpiece WK is enlarged, it is difficult to maintain the workpiece WK in a horizontal posture when the workpiece WK is carried in and out of the mounting table 30. In this embodiment, the jack pins are protruded from the openings 313 and 314 disposed on the upper surface 310 of the mounting table to support the workpiece WK from below. With this setting, the deflection of the workpiece WK is suppressed to maintain the horizontal posture. However, at the point of pressing by the peeling roller, the mounting table is preferably as flat as possible without openings.

圖9A及圖9B係表示載置台上之開口部與剝離輥之位置關係之圖。如圖9A所示，於剝離輥係單個輥構件R之情形時，或者雖然剝離輥被分割為複數個但有1個輥構件R配置於開口314之上部時，由輥構件R按壓之工件WK(基板SB及橡皮布BL)於開口314之位置被按入至開口314之內部。此時，尤其是於相當於開口314之周緣部之位置，於基板SB及橡皮布BL發生應力集中，因此有基板SB或橡皮布BL受到損傷之虞。又，當於基板SB與橡皮布BL之間擔載有圖案等時，有於該位置導致圖案等之斷裂之虞。 9A and 9B are diagrams showing the positional relationship between the opening on the mounting table and the peeling roller. As shown in FIG. 9A, when the peeling roller is a single roller member R, or when the peeling roller is divided into a plurality, but one roller member R is disposed above the opening 314, the workpiece WK pressed by the roller member R (Substrate SB and blanket BL) is pushed into the opening 314 at the position of the opening 314. At this time, particularly at the position corresponding to the peripheral edge portion of the opening 314, stress concentration occurs on the substrate SB and the blanket BL, so the substrate SB or the blanket BL may be damaged. When a pattern or the like is carried between the substrate SB and the blanket BL, the pattern or the like may be broken at this position.

於該實施形態中，如圖9B所示，2個剝離輥401間之間隙部位於水平台部31之開口314之上方。又，剝離輥401間之間隔G12(或G23)大於開口314之直徑(更嚴格而言為X方向上之開口寬度)Dx。故而，避免了於開口314或其周緣部之上方工件WK被剝離輥401按壓，從而不會發生如上所述之應力集中。 In this embodiment, as shown in FIG. 9B, the gap portion between the two peeling rollers 401 is located above the opening 314 of the water table portion 31. The interval G12 (or G23) between the peeling rollers 401 is larger than the diameter of the opening 314 (more strictly speaking, the opening width in the X direction) Dx. Therefore, the workpiece WK above the opening 314 or its peripheral portion is prevented from being pressed by the peeling roller 401, so that the stress concentration as described above does not occur.

如上文所述，自剝離之品質之觀點而言，理想為載置台上之開口及剝離輥間之間隙儘可能小。因此，較佳為於可確保足以支持工件之強度之範圍內，儘可能使頂起銷細化，且縮小開口。又，較佳為使剝離輥間之間隙亦儘可能小。 As described above, from the standpoint of the quality of peeling, the gap between the opening on the mounting table and the peeling roller is preferably as small as possible. Therefore, it is preferable to make the jacking pin as thin as possible and to narrow the opening within a range that can secure sufficient strength to support the workpiece. In addition, it is preferable to make the gap between the peeling rollers as small as possible.

圖10係表示載置台與工件之位置關係之圖。於基板SB與橡皮布BL密接而形成之工件WK中，橡皮布BL具有大於基板SB之平面尺 寸。故而，基板SB之整面與橡皮布BL對向。與此相對地，橡皮布BL之中央部分與基板SB對向，但周緣部成為不與基板SB對向之餘白部分。於基板SB之表面區域中除周緣部以外之中央部分，設定供圖案等有效地轉印、作為器件而發揮功能之有效區域AR。 FIG. 10 is a diagram showing a positional relationship between a mounting table and a workpiece. In the workpiece WK in which the substrate SB and the blanket BL are in close contact, the blanket BL has a flat surface larger than that of the substrate SB. Inch. Therefore, the entire surface of the substrate SB faces the blanket BL. In contrast, the central portion of the blanket BL faces the substrate SB, but the peripheral portion becomes a margin portion that does not face the substrate SB. In the central portion of the surface area of the substrate SB other than the peripheral portion, an effective area AR is provided for effectively transferring a pattern or the like and functioning as a device.

工件WK係以基板SB之有效區域AR之整體位於水平台部31之上表面310之方式載置於載置台30上。另一方面，於較有效區域AR靠外側，基板SB之(-Y)側端部就位於向較載置台30之水平面與楔形面之交界之脊線部E略靠(-Y)側突出之位置。 The workpiece WK is placed on the mounting table 30 so that the entire effective area AR of the substrate SB is located on the upper surface 310 of the water table portion 31. On the other hand, at the outside of the more effective area AR, the (-Y) side end portion of the substrate SB is located slightly toward the (-Y) side of the ridge line portion E which is closer to the boundary between the horizontal plane and the wedge surface of the mounting table 30 position.

於圖中，標有點之區域R1表示藉由吸附槽311而吸附橡皮布BL之區域。藉由吸附槽311而吸附之區域R1覆蓋有效區域AR整體。又，區域R2表示藉由吸附槽312而吸附橡皮布BL之區域。吸附槽312於較有效區域AR靠外側吸附橡皮布BL。因此，例如於僅藉由吸附槽312而吸附橡皮布BL之態樣中，避免了有效區域AR內之圖案等受到吸附之影響。 In the figure, a region R1 marked with a dot indicates a region where the blanket BL is adsorbed by the adsorption groove 311. The region R1 adsorbed by the adsorption groove 311 covers the entire effective region AR. The region R2 indicates a region where the blanket BL is adsorbed by the adsorption groove 312. The suction tank 312 sucks the blanket BL on the outside of the more effective area AR. Therefore, for example, in a state where the blanket BL is adsorbed only by the adsorption groove 312, the pattern and the like in the effective area AR are prevented from being affected by the adsorption.

區域R3表示於剝離開始時初始剝離單元33之按壓構件331抵接於基板SB之區域。於該區域R3，橡皮布BL藉由按壓構件331而被往下方即(-Z)方向按壓。藉此，於基板SB與橡皮布BL之間開始剝離。 The region R3 indicates a region where the pressing member 331 of the initial peeling unit 33 abuts the substrate SB at the start of peeling. In this region R3, the blanket BL is pressed downward, that is, in the (-Z) direction by the pressing member 331. Thereby, peeling starts between the substrate SB and the blanket BL.

區域R4表示基板SB上表面中藉由吸附單元51之吸附墊517而被吸附之區域。基板SB於該區域R4由吸附單元51吸附保持，且被往上方即(+Z)方向提拉，藉此基板SB離開橡皮布BL而使剝離推進。 The region R4 indicates a region on the upper surface of the substrate SB that is adsorbed by the adsorption pad 517 of the adsorption unit 51. The substrate SB is sucked and held by the adsorption unit 51 in this region R4, and is pulled upward, that is, in the (+ Z) direction, whereby the substrate SB is separated from the blanket BL and the peeling is advanced.

區域R5表示載置台上之開口314之開口位置。開口314為以頂起銷361支持工件WK之中央部，而設置於基板SB之有效區域AR中。故而，存在若於開口314之上方工件WK受到剝離輥401之按壓，則圖案損傷之情形。於該實施形態中，與開口314對應之區域R5設定於間隙部分，該間隙部分係於形成於3個剝離輥401與基板SB之間之抵接夾持部N1、N2、N3之間於X方向產生。換言之，於基板SB之有效區域 AR中與3個剝離輥401均不抵接之部分之下方，設置開口314。 The region R5 indicates the opening position of the opening 314 on the mounting table. The opening 314 is provided in the effective area AR of the substrate SB to support the central portion of the work WK with the jack pin 361. Therefore, if the workpiece WK above the opening 314 is pressed by the peeling roller 401, the pattern may be damaged. In this embodiment, a region R5 corresponding to the opening 314 is set at a gap portion, and the gap portion is formed between the abutting nip portions N1, N2, N3 formed between the three peeling rollers 401 and the substrate SB at X Direction. In other words, in the effective area of the substrate SB An opening 314 is provided below the portion of the AR that is not in contact with the three peeling rollers 401.

於該例中，於X方向及Y方向上位置不同地各設置有2個共計4個與開口314對應之區域R5。於X方向上位置不同之2個區域R5分散配置於抵接夾持部N1、N2之間之間隙部分及抵接夾持部N2、N3之間之間隙部分。又，於Y方向上位置不同之2個區域R5於X方向上處於相同位置，且均位於與抵接夾持部之間隙部分碰觸之位置。藉由形成此種配置，而避免4個區域R5全部受到剝離輥401之按壓。藉此，可防止於開口314處之圖案斷裂等。 In this example, two regions R5 corresponding to the openings 314 are respectively provided in two positions different in the X direction and the Y direction. The two regions R5 having different positions in the X direction are dispersedly disposed in a gap portion between the abutting and clamping portions N1 and N2 and a gap portion between the abutting and clamping portions N2 and N3. In addition, the two regions R5 having different positions in the Y direction are located at the same position in the X direction, and both of them are located in contact with the gap portion of the abutting and clamping portion. By forming such an arrangement, it is possible to prevent all of the four regions R5 from being pressed by the peeling roller 401. Thereby, the pattern at the opening 314 can be prevented from being broken.

另一方面，自使剝離良好地推進之觀點而言，理想為自基板SB之(-X)側端部至(+X)側端部儘可能連續地形成抵接夾持部。因此，於X方向上之開口314之位置，僅設置用以避開開口314之最小限度之間隙，而對於除此以外之區域則形成連續之抵接夾持部。即，於考慮具有與開口314之X方向長度大致相同之寬度、包含開口314之位置而於Y方向上延伸之虛擬之帶狀區域時，較佳為剝離輥401逐一抵接於藉由帶狀區域劃分基板SB上表面而形成之部分區域之各者。各剝離輥401之X方向長度更佳為儘可能接近對應之部分區域之寬度。 On the other hand, from the viewpoint of advancing the peeling well, it is desirable to form the abutment nip as continuously as possible from the (-X) side end portion to the (+ X) side end portion of the substrate SB. Therefore, at the position of the opening 314 in the X direction, only a minimum gap to avoid the opening 314 is provided, and continuous abutting and clamping portions are formed for the other areas. That is, when considering a virtual belt-shaped region having a width substantially the same as the length in the X direction of the opening 314 and including the position of the opening 314 and extending in the Y direction, it is preferable that the peeling roller 401 abuts one by one through the belt. Each of the partial regions formed by dividing the upper surface of the substrate SB into regions. The X-direction length of each peeling roller 401 is more preferably as close as possible to the width of a corresponding partial region.

如圖10所示，於該例中，基板SB上表面中包含與開口314對應之區域R5之細帶狀區域以外之區域使藉由3個剝離輥401而形成之抵接夾持部N1~N3中之任一者通過，並受到剝離輥401之按壓。藉由於1個帶狀區域設置複數個開口314，可於不增加基板SB中不受剝離輥401按壓之區域之面積之條件下，增加頂起銷之配設數量。 As shown in FIG. 10, in this example, in the upper surface of the substrate SB, the area other than the thin band-shaped area including the area R5 corresponding to the opening 314 is such that the abutting nip portion N1 formed by the three peeling rollers 401 Any of N3 passes and is pressed by the peeling roller 401. Since the plurality of openings 314 are provided in one strip-shaped area, the number of jack pins can be increased without increasing the area of the area in the substrate SB that is not pressed by the peeling roller 401.

又，區域R6表示配設於載置台上之開口313之頂起銷所抵接之橡皮布BL之下表面區域。該頂起銷於工件WK中基板SB與橡皮布BL重合之區域且較有效區域AR靠外側之區域，抵接於橡皮布BL之下表面。藉此，可防止於藉由該頂起銷進行支持時，對有效區域AR內之圖案等施加按壓力。又，利用基板SB之剛性與橡皮布BL之剛性支持 工件WK，故而即便為大型且自重較大之工件WK亦可確實地加以支持。 The region R6 indicates a region on the lower surface of the blanket BL abutted by the jack pins of the openings 313 provided on the mounting table. The jacking pin is located in an area where the substrate SB and the blanket BL overlap in the workpiece WK and an area outside the effective area AR, and abuts the lower surface of the blanket BL. Accordingly, it is possible to prevent a pressing force from being applied to a pattern or the like in the effective area AR when supported by the jack pin. In addition, the rigidity of the substrate SB and the rigidity of the blanket BL are supported. The workpiece WK can be reliably supported even with a large workpiece WK having a large weight.

如此，於該實施形態中，自既避免於開口314處之按壓又於基板SB之儘可能大之範圍內藉由剝離輥401進行按壓而使剝離良好推進之觀點、及配設複數個頂起銷361而保持工件WK之水平姿勢之觀點，以兼顧該等之方式，確定各部之配置及尺寸。 Thus, in this embodiment, from the viewpoint of not only pressing at the opening 314 but also pressing the peeling roller 401 within the widest possible range of the substrate SB to advance the peeling well, and providing a plurality of jacks From the viewpoint of maintaining the horizontal posture of the work WK by the pins 361, the arrangement and size of each part are determined in a manner that takes account of these.

如上所述，於該實施形態中，橡皮布BL與基板SB貼合而形成之工件WK藉由載置台30而吸附保持橡皮布BL。而且，為使該等相互剝離，吸附單元51等一面保持基板SB，一面向上方即離開橡皮布BL之方向移動。此時，剝離輥401抵接於基板SB，並連動於吸附單元51等之移動，向剝離方向即(+Y)方向移動，藉此限制剝離之推進。 As described above, in this embodiment, the work WK formed by bonding the blanket BL and the substrate SB is held by the mounting table 30 to hold the blanket BL. Further, in order to peel these away from each other, the suction unit 51 and the like move while moving upward in a direction away from the blanket BL while holding the substrate SB. At this time, the peeling roller 401 is in contact with the substrate SB, and moves in the peeling direction (ie, the (+ Y) direction) in conjunction with the movement of the adsorption unit 51 or the like, thereby restricting the advancement of peeling.

剝離輥401於正交於剝離方向之X方向上排列有複數個，且該等一體地於剝離方向上移動。藉此，一面使已剝離區域與未剝離區域之交界之剝離交界線維持直線狀一面沿剝離方向推進剝離。藉由如此構成，可抑制因剝離之推進速度局部變動而引起之剝離不良。於將剝離輥設定為單個輥構件之情形時，存在因輥之撓曲而導致按壓力不均勻之問題、或輥之製造成本增大之問題。藉由分割為複數個剝離輥401，可避免此種問題。 A plurality of peeling rollers 401 are arranged in the X direction orthogonal to the peeling direction, and these move integrally in the peeling direction. Thereby, peeling advances in the peeling direction while maintaining the peeling boundary line at the boundary between the peeled area and the unpeeled area. With such a configuration, it is possible to suppress a peeling failure caused by a local variation in the advancing speed of peeling. When the peeling roller is set as a single roller member, there is a problem that the pressing force is uneven due to the deflection of the roller, or that the manufacturing cost of the roller is increased. Such a problem can be avoided by being divided into a plurality of peeling rollers 401.

又，為於載置台30附近呈水平姿勢保持工件WK，於該實施形態中，頂起銷361自載置台上表面310突出而自下表面支持工件WK。為配設頂起銷361，於載置台上表面310設置有開口314。該開口314設置於載置台上表面310中與藉由複數個剝離輥401而形成之抵接夾持部N1~N3間之間隙部分對應之位置。從而，不會於開口314之上方藉由剝離輥401而按壓工件WK。其結果，防止於開口314之位置工件WK上發生應力集中而引起剝離不良。 Further, in order to hold the workpiece WK in a horizontal posture near the mounting table 30, in this embodiment, the jacking pins 361 protrude from the upper surface 310 of the mounting table and support the workpiece WK from the lower surface. In order to provide a jacking pin 361, an opening 314 is provided on the upper surface 310 of the mounting table. The opening 314 is provided at a position on the upper surface 310 of the mounting table corresponding to a gap portion between the abutting nips N1 to N3 formed by the plurality of peeling rollers 401. Therefore, the workpiece WK is not pressed by the peeling roller 401 above the opening 314. As a result, stress concentration on the workpiece WK at the position of the opening 314 is prevented from causing peeling failure.

如以上所說明般，於該實施形態中，橡皮布BL及基板SB分別相 當於本發明之「第1板狀體」及「第2板狀體」。又，於上述實施形態中，載置台30作為本發明之「保持器件」而發揮功能，水平台部31之上表面310相當於本發明之「保持面」。又，第2開口314相當於本發明之「開口部」。又，於上述實施形態中，頂起銷361作為本發明之「支持構件」而發揮功能，吸附單元51~54分別作為本發明之「剝離器件」而發揮功能。 As described above, in this embodiment, the blanket BL and the substrate SB are respectively It is equivalent to the "first plate-shaped body" and the "second plate-shaped body" of the present invention. In the above-mentioned embodiment, the mounting table 30 functions as the "holding device" of the present invention, and the upper surface 310 of the water table portion 31 corresponds to the "holding surface" of the present invention. The second opening 314 corresponds to the "opening" of the present invention. In the above embodiment, the jacking pin 361 functions as the "supporting member" of the present invention, and the suction units 51 to 54 function as the "peeling device" of the present invention, respectively.

又，輥單元4作為本發明之「限制器件」而發揮功能，剝離輥401作為本發明之「輥構件」而發揮功能。又，輥支持部402及上部角鋼45分別作為本發明之「支持框架」及「基底構件」而發揮功能，該等構件一體地作為本發明之「支持部」而發揮功能。又，馬達353及滾珠螺桿機構354成為一體作為本發明之「移動機構」而發揮功能。 In addition, the roller unit 4 functions as a "restriction device" of the present invention, and the peeling roller 401 functions as a "roller member" of the present invention. The roller support portion 402 and the upper angle steel 45 function as the "support frame" and "base member" of the present invention, respectively, and these members function integrally as the "support portion" of the present invention. In addition, the motor 353 and the ball screw mechanism 354 are integrated to function as the "moving mechanism" of the present invention.

再者，本發明並不限定於上述實施形態，只要不脫離其主旨，便可除上述以外進行各種變更。例如，上述實施形態之剝離裝置1具備4組吸附單元51~54作為本發明之「剝離器件」，但剝離器件之配設數量任意，例如亦可如下文般只有1個。 The present invention is not limited to the above-mentioned embodiments, and various changes can be made in addition to the above without departing from the gist thereof. For example, the peeling device 1 of the above embodiment includes four sets of adsorption units 51 to 54 as the "peeling devices" of the present invention, but the number of the peeling devices is arbitrary, and for example, there may be only one as described below.

圖11係表示剝離裝置之變化例之主要部分之圖。於該變化例中，自上述實施形態之剝離裝置1中省去第2~第4吸附單元52~54，而僅設置有1個吸附單元51作為「剝離器件」。除該點以外之各部之構成與上述實施形態相同，省略詳細之說明。於該變化例中，吸附單元51保持形成工件WK之基板SB之(-Y)側端部，連動於吸附單元51之上升，剝離輥4(01向(+Y)方向移動，藉此推進剝離。以此方式，於只有1個剝離器件之構成中，亦可應用上述載置台30及輥單元4，而獲得與上述實施形態相同之效果。 FIG. 11 is a diagram showing a main part of a modified example of the peeling device. In this modification, the second to fourth adsorption units 52 to 54 are omitted from the peeling device 1 of the above embodiment, and only one adsorption unit 51 is provided as a "peeling device". The configuration of each part other than this point is the same as that of the above-mentioned embodiment, and detailed description is omitted. In this modification, the suction unit 51 holds the (-Y) side end of the substrate SB forming the workpiece WK, and in conjunction with the lifting of the suction unit 51, the peeling roller 4 (01 moves in the (+ Y) direction, thereby promoting the peeling In this way, in a configuration having only one peeling device, the mounting table 30 and the roller unit 4 described above can also be applied, and the same effect as that of the above embodiment can be obtained.

又，於上述實施形態中，3組輥組件40具有相同構造，3個剝離輥401具有相同尺寸。然而，複數個剝離輥亦可長度不同，又，亦可如下文所例示般，剝離輥之直徑不同。 In the above embodiment, the three sets of roller units 40 have the same structure, and the three peeling rollers 401 have the same size. However, the plurality of peeling rollers may have different lengths, and the diameters of the peeling rollers may be different as exemplified below.

圖12A及圖12B係表示輥徑不同之剝離輥之組合例之圖。於圖12A所示之例中，自(-X)側往(+X)側排列有3個剝離輥461、462、463。其中中央之剝離輥462之直徑較其他剝離輥461、463大，且軸向(X方向)長度較其他剝離輥461、463短。藉由使中央之剝離輥462之旋轉軸(二點鏈線所示)之位置與其他剝離輥461、463之旋轉軸(單點鏈線所示)之位置於Z方向上不同，可使剝離輥461、462、463均抵接於基板。 12A and 12B are diagrams showing a combination example of peeling rollers having different roller diameters. In the example shown in FIG. 12A, three peeling rollers 461, 462, and 463 are arranged from the (-X) side to the (+ X) side. The diameter of the peeling roller 462 in the center is larger than that of the other peeling rollers 461 and 463, and the length in the axial direction (X direction) is shorter than that of the other peeling rollers 461 and 463. By making the position of the rotation axis (shown by the two-point chain line) of the central peeling roller 462 different from the position of the rotation axis (shown by the one-point chain line) of the other peeling rollers 461 and 463 in the Z direction, the peeling can be performed. The rollers 461, 462, and 463 are all in contact with the substrate.

如圖12B所示，剝離輥461、462、463分別與基板SB抵接而形成之抵接夾持部N61、N62、N63需要使作為剝離方向之(+Y)方向上之後端部即該抵接夾持部之(-Y)側端部之Y方向位置如虛線所示相互對齊。如上文所述，抵接夾持部之後端部係已剝離區域與未剝離區域之交界，若於複數個剝離輥所形成之抵接夾持部中後端部之位置對齊則即可使剝離交界線成為X方向之一條直線。抵接夾持部之前端部處於未剝離區域，無需於抵接夾持部間使其位置對齊。藉由使中央之剝離輥462之旋轉軸之位置與其他剝離輥461、463之旋轉軸之位置於Y方向上不同，可實現此種位置關係。 As shown in FIG. 12B, the abutting nips N61, N62, and N63 formed by the peeling rollers 461, 462, and 463 abutting the substrate SB, respectively, need to be the rear end in the (+ Y) direction which is the peeling direction. The positions in the Y direction of the (-Y) side end portions of the clamping portion are aligned with each other as shown by the dotted lines. As mentioned above, the end of the abutting nip is the boundary between the peeled area and the unpeeled area. If the positions of the abutting nips formed by the plurality of peeling rollers are aligned, the peeling can be achieved. The boundary line becomes a straight line in the X direction. The front end portion of the abutting clamping portion is in an unpeeled area, and there is no need to align the positions between the abutting clamping portions. This positional relationship can be achieved by making the position of the rotation axis of the center peeling roller 462 different from the position of the rotation axis of the other peeling rollers 461 and 463 in the Y direction.

如此地，複數個剝離輥只要所形成之抵接夾持部之位置於軸向上分散，且剝離方向上之抵接夾持部後端部之位置對齊即可，而無需具有相同之形狀。於如上述實施形態般將所有輥構件設定為相同形狀之情形時，相較於製造不同形狀之輥構件之情形，可實現製造成本之降低。另一方面，於需要使抵接夾持部之大小不同時，只要對各剝離輥之尺寸或位置加以調整，而使抵接夾持部成為上述位置關係即可。 In this way, the plurality of peeling rollers may be dispersed in the axial direction as long as the positions of the abutting nip portions formed are aligned, and the positions of the abutting nip portions in the peeling direction are aligned without having the same shape. In the case where all the roller members are set to the same shape as in the above embodiment, the manufacturing cost can be reduced compared to a case where roller members having different shapes are manufactured. On the other hand, when it is necessary to make the size of the abutting nip different, it is only necessary to adjust the size or position of each peeling roller so that the abutting nip has the above-mentioned positional relationship.

又，於上述實施形態中，3組輥組件40全部可調整相對於上部角鋼45之位置。然而，亦可預先確定好複數個剝離輥中1個剝離輥之位置。其理由在於：藉由將該剝離輥之位置作為基準而進行其他剝離輥之位置調整，可獲得與上述相同之位置關係。 In addition, in the above-mentioned embodiment, the position of the three sets of roller assemblies 40 with respect to the upper angle steel 45 can be adjusted. However, the position of one of the plurality of peeling rollers may be determined in advance. The reason is that by using the position of the peeling roller as a reference and adjusting the position of other peeling rollers, the same positional relationship as described above can be obtained.

又，上述實施形態具備3個剝離輥401，但剝離輥之個數並不限定於此。關於頂起銷之根數亦相同。 Moreover, although the said embodiment has three peeling rollers 401, the number of peeling rollers is not limited to this. The same applies to the number of jack pins.

以上，如例示具體之實施形態而說明般，於本發明中，亦能以複數個輥構件之直徑相同，且各自之旋轉軸一致之方式配置。藉由使複數個輥構件之直徑相同，可實現構件之製造成本之降低。於輥構件之直徑相同之情形時，藉由使各自之旋轉軸一致，可使抵接夾持部之位置對齊，又可使於各抵接夾持部間之抵接壓一致。 As mentioned above, as the specific embodiment is illustrated and explained, in the present invention, it can also be arranged in such a manner that the diameters of a plurality of roller members are the same and their respective rotation axes are consistent. By making the diameters of the plurality of roller members the same, the manufacturing cost of the members can be reduced. When the diameters of the roller members are the same, the positions of the abutting nips can be aligned by making the respective rotation axes consistent, and the abutting pressure between the abutting nips can be made uniform.

又，支持部亦可具有個別地支持各個輥構件之複數個支持框架、及一體地保持複數個支持框架之基底構件。藉由針對每個輥構件而個別地設置支持框架，可容易地實施支持部之組裝及調整之作業。又，藉由將支持框架安裝於共用之基底構件上，可於維持抵接夾持部間之相對位置關係之狀態下，伴隨基底構件之移動而使各抵接夾持部移動。 In addition, the support unit may have a plurality of support frames that individually support the roller members, and a base member that integrally holds the plurality of support frames. By providing a support frame individually for each roll member, the assembly and adjustment of a support part can be performed easily. In addition, by mounting the support frame on a common base member, each of the abutting and clamping portions can be moved in accordance with the movement of the base member while maintaining the relative positional relationship between the abutting and clamping portions.

於該情形時，至少1個支持框架較佳為可調整相對於基底構件之安裝位置。藉由如此構成，可進行利用複數個輥構件而形成之複數個抵接夾持部間之位置對準，從而可更適當地進行藉由輥構件而實施之剝離之推進管理。 In this case, the at least one supporting frame is preferably adjustable in its mounting position relative to the base member. With this configuration, the position alignment between the plurality of abutting nips formed by the plurality of roller members can be performed, and the advancement management of peeling by the roller members can be performed more appropriately.

又，各個支持框架亦可旋轉自由地支持一輥構件之軸向上之兩端部。於此種構成中，各輥構件之兩端位置穩定，故而可縮小於抵接夾持部之抵接壓之差異。 In addition, each support frame can also support both end portions of one roller member in the axial direction freely. In this configuration, the positions of both ends of each roller member are stable, so the difference in abutting pressure between the abutting nips can be reduced.

又，剝離器件亦可為於剝離方向上於較輥構件靠上游側保持第2板狀體之器件。於一面抵接於第2板狀體一面於剝離方向上移動之輥構件之上游側，藉由剝離器件而使第2板狀體離開第1板狀體，藉此可使第1板狀體與第2板狀體之剝離沿剝離方向單向地推進。於該情形時，剝離器件尤其亦能以保持第2板狀體之剝離方向上之上游側端部而使該第2板狀體離開第1板狀體之方式構成。 The peeling device may be a device that holds the second plate-like body on the upstream side of the roller member in the peeling direction. The first plate-shaped body can be separated from the first plate-shaped body by peeling the device on the upstream side of the roller member that is in contact with the second plate-shaped body while moving in the peeling direction. The peeling from the second plate-shaped body is advanced unidirectionally in the peeling direction. In this case, the peeling device can be particularly configured so that the second plate-shaped body is separated from the first plate-shaped body while maintaining the upstream side end portion in the peeling direction of the second plate-shaped body.

又，亦能以如下方式構成：於保持器件之保持面，設置有於軸向上位置不同之複數個開口部，且相對於第2板狀體之與第1板狀體為相反側之主面中藉由虛擬地使開口部於剝離方向上延長所成之帶狀區域而劃分之複數個部分區域之各者，輥構件逐一抵接。藉由於軸向上位置不同地設置複數個開口部而配設支持構件，可更穩定地支持第1板狀體。於該情形時，只要於軸向上於2個開口部之間配置1個輥構件，即可於開口部間之區域形成無間隙地連續之抵接夾持部。 In addition, it may be configured as follows: a plurality of openings having different positions in the axial direction are provided on the holding surface of the holding device, and the main surface on the opposite side to the first plate-shaped body with respect to the second plate-shaped body is provided. In each of the plurality of partial regions divided by virtually extending the opening-shaped strip-shaped region in the peeling direction, the roller members abut one by one. By providing a plurality of openings at different positions in the axial direction and arranging the supporting member, the first plate-shaped body can be more stably supported. In this case, as long as one roller member is arranged between the two openings in the axial direction, a continuous abutting nip can be formed in the area between the openings without gaps.

又，於保持面，亦可設置有於軸向上位置相同且於剝離方向上位置不同之複數個開口部。藉由於剝離方向上位置不同地設置複數個開口部，可更穩定地支持第1板狀體。於該情形時，若複數個開口部之軸向位置相同，則可使用以避開該等開口部之抵接夾持部間之軸向間隙位置相同。 Furthermore, a plurality of openings may be provided on the holding surface at the same position in the axial direction and different in the position in the peeling direction. By providing a plurality of openings at different positions in the peeling direction, the first plate-shaped body can be more stably supported. In this case, if the axial positions of the plurality of openings are the same, they can be used to avoid the same position of the axial gap between the abutting and clamping portions of the openings.

又，本發明對於各輥構件之表面包含彈性材料之情形尤其合適。於表面具有彈性層之輥構件中，若形成為長條狀，則特別難以形成抵接壓均勻之抵接夾持部。藉由應用本發明而設置複數個輥構件，可形成抵接壓均勻之抵接夾持部而使剝離良好地推進。 The present invention is particularly suitable when the surface of each roller member contains an elastic material. In a roller member having an elastic layer on the surface, if it is formed in a long shape, it is particularly difficult to form a contact nip with uniform contact pressure. By applying a plurality of roller members by applying the present invention, it is possible to form an abutting nip with a uniform abutting pressure and to advance the peeling well.

[產業上之可利用性] [Industrial availability]

本發明可較佳地應用於使相互貼合之2片板狀體剝離之剝離處理，特別地，亦可應付板狀體之尺寸之大型化。 The present invention can be preferably applied to a peeling treatment for peeling off two pieces of plate-shaped bodies that are adhered to each other, and in particular, it can also cope with an increase in the size of the plate-shaped bodies.

Claims (10)

一種剝離裝置，其係使主面彼此貼合之第1板狀體與第2板狀體剝離者，且具備：保持器件，其上表面為大致水平之保持面，且於上述保持面設置有開口部，且該保持器件保持與上述第2板狀體為相反側之面向下而載置於上述保持面之上述第1板狀體；支持構件，其於上端部自上述開口部突出至較上述保持面靠上方之突出位置與上述上端部退避至上述開口部內較上述保持面靠下方之退避位置之間移動，且於上述突出位置使上述第1板狀體離開上述保持面並自下方對其加以支持；剝離器件，其保持上述第2板狀體並使其於離開上述第1狀體之方向上移動，使上述第2板狀體自藉由上述保持器件而保持之上述第1板狀體剝離；以及限制器件，其抵接於上述第2板狀體中與上述第1板狀體為相反側之面，限制藉由上述剝離器件對上述第2板狀體所進行的剝離之推進；上述限制器件具有：複數個輥構件，其等各自抵接於上述第2板狀體而於與上述第2板狀體之間形成抵接夾持部；支持部，其以使上述複數個輥構件之各者可繞著沿平行於上述保持面之軸向之旋轉軸自由旋轉的方式個別地支持上述複數個輥構件之各者；以及移動機構，其使上述支持部於平行於上述保持面且與上述軸向正交之剝離方向上移動；且上述輥構件之各者所形成之上述抵接夾持部於上述軸向上相互隔開，上述抵接夾持部之上述剝離方向上之後端部之位置於上述剝離方向上彼此相同，上述開口部設置於與於上述軸向上相鄰之2個上述抵接夾持部間之間隙部對應之位置。A peeling device which peels off a first plate-shaped body and a second plate-shaped body whose main surfaces are adhered to each other, and includes a holding device whose upper surface is a substantially horizontal holding surface, and the holding surface is provided with the holding surface. An opening portion, and the holding device holds the first plate-shaped body placed on the holding surface with the side opposite to the second plate-shaped body facing downward, and a supporting member that protrudes from the opening portion to the upper end portion relatively The protruding position above the holding surface and the retracted position where the upper end portion is retracted into the opening portion below the holding surface are moved, and the first plate-shaped body is separated from the holding surface at the protruding position and faces from below It supports; the device is peeled off, which holds the second plate-like body and moves it in a direction away from the first body, so that the second plate-like body holds the first plate by the holding device Peeling of the body; and a restricting device that abuts on a surface of the second plate-like body opposite to the first plate-like body, and restricts the peeling of the second plate-like body by the peeling device. Advance; above The manufacturing device includes a plurality of roller members, each of which abuts against the second plate-shaped body to form an abutting nip between the second plate-shaped body and a support portion, so that the plurality of roller members are in contact with each other. Each of the plurality of roller members can individually support each of the plurality of roller members around a rotation axis parallel to an axial direction parallel to the holding surface; and a moving mechanism that causes the support portion to be parallel to the holding surface and Moving in a peeling direction orthogonal to the axial direction; and the abutting and clamping portions formed by each of the roller members are spaced apart from each other in the axial direction, and rear ends of the abutting and clamping portions in the peeling direction. The positions are the same as each other in the peeling direction, and the opening portion is provided at a position corresponding to a gap portion between the two abutting and clamping portions adjacent to each other in the axial direction. 如請求項1之剝離裝置，其中上述複數個輥構件之直徑相同，且各自之旋轉軸一致。For example, in the peeling device of claim 1, the diameters of the plurality of roller members are the same, and their respective rotation axes are the same. 如請求項1之剝離裝置，其中上述支持部具有個別地支持各個上述輥構件之複數個支持框架及一體地保持上述複數個支持框架之基底構件。According to the peeling device of claim 1, wherein the support portion has a plurality of support frames that individually support each of the roller members and a base member that integrally holds the plurality of support frames. 如請求項3之剝離裝置，其中至少1個上述支持框架可調整相對於上述基底構件之安裝位置。If the peeling device of item 3 is requested, at least one of the support frames can be adjusted relative to the mounting position of the base member. 如請求項3之剝離裝置，其中各個上述支持框架旋轉自由地支持一上述輥構件之上述軸向上之兩端部。The peeling device according to claim 3, wherein each of the support frames rotatably supports both ends of the roller member in the axial direction. 如請求項1至5中任一項之剝離裝置，其中上述剝離器件於上述剝離方向上於較上述輥構件靠上游側保持上述第2板狀體。The peeling device according to any one of claims 1 to 5, wherein the peeling device holds the second plate-like body on the upstream side from the roller member in the peeling direction. 如請求項6之剝離裝置，其中上述剝離器件保持上述第2板狀體之上述剝離方向上之上游側端部而使上述第2板狀體離開上述第1板狀體。The peeling device according to claim 6, wherein the peeling device holds the upstream end portion in the peeling direction of the second plate-like body and separates the second plate-like body from the first plate-like body. 如請求項1至5中任一項之剝離裝置，其中於上述保持面，設置有於上述軸向上位置不同之複數個上述開口部，且對於上述第2板狀體之與上述第1板狀體為相反側之主面中藉由使上述開口部虛擬地於上述剝離方向上延長所成之帶狀區域而劃分之複數個部分區域之各者，上述輥構件一對一地進行抵接。The peeling device according to any one of claims 1 to 5, wherein the holding surface is provided with a plurality of the openings at positions different from the positions in the axial direction, and the second plate-shaped body is different from the first plate-shaped body. Each of the main surfaces on the opposite side is divided into a plurality of partial regions by extending the opening portion virtually in the strip direction in the peeling direction, and the roller members abut one by one. 如請求項1至5中任一項之剝離裝置，其中於上述保持面，設置有於上述軸向上位置相同且於上述剝離方向上位置不同之複數個開口部。The peeling device according to any one of claims 1 to 5, wherein the holding surface is provided with a plurality of openings having the same position in the axial direction and different positions in the peeling direction. 如請求項1至5中任一項之剝離裝置，其中各個上述輥構件之表面由彈性材料形成。The peeling device according to any one of claims 1 to 5, wherein a surface of each of the above-mentioned roller members is formed of an elastic material.