TWI610132B

TWI610132B - Photosensitive resin composition for black matrix and uses thereof

Info

Publication number: TWI610132B
Application number: TW104132249A
Authority: TW
Inventors: 蔡宇傑; 廖豪偉
Original assignee: 奇美實業股份有限公司
Priority date: 2015-09-30
Filing date: 2015-09-30
Publication date: 2018-01-01
Also published as: CN106569388A; CN106569388B; TW201712430A

Abstract

本發明係有關一種黑色矩陣用之感光性樹脂組成物，及使用該黑色矩陣所形成之彩色濾光片及液晶顯示元件。上述感光性樹脂組成物包含鹼可溶性樹脂(A)、具有乙烯性不飽和基的化合物(B)、光起始劑(C)、溶劑(D)、黑色顏料(E)及矽烷化合物(F)。根據本發明之感光性樹脂組成物所形成之黑色矩陣具有高精細度圖案的直線性佳之優點。 The present invention relates to a photosensitive resin composition for a black matrix, and a color filter and a liquid crystal display element formed using the black matrix. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) having an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a black pigment (E), and a silane compound (F). . The black matrix formed by the photosensitive resin composition of the present invention has the advantage that the high-definition pattern has good linearity.

Description

黑色矩陣用之感光性樹脂組成物及其應用 Photosensitive resin composition for black matrix and application thereof

本發明係有關一種黑色矩陣用感光性樹脂組成物及使用該黑色矩陣所形成之彩色濾光片及液晶顯示元件。特別是提供一種高精細度圖案的直線性佳的黑色矩陣用之感光性樹脂組成物及使用該黑色矩陣所形成之彩色濾光片及液晶顯示元件。 The present invention relates to a photosensitive resin composition for a black matrix, a color filter formed using the black matrix, and a liquid crystal display element. In particular, it provides a photosensitive resin composition for a black matrix with excellent linearity of a high-definition pattern, and a color filter and a liquid crystal display element formed using the black matrix.

近年來，隨著液晶顯示器之各種技術的蓬勃發展，且為了提高液晶顯示器的對比度及顯示品質，通常會設置黑色矩陣(black matrix)於液晶顯示器中之彩色濾光片的條紋(stripe)及點(dot)間之間隙中。該黑色矩陣可防止畫素間之漏光(light leakage)所引起的對比度(contrast ratio)下降及色純度(color purity)下降等之缺陷。 In recent years, with the vigorous development of various technologies of liquid crystal displays, and in order to improve the contrast and display quality of liquid crystal displays, a black matrix is usually provided in the stripes and dots of the color filters in the liquid crystal display. (dot). The black matrix can prevent defects such as a decrease in contrast ratio and a decrease in color purity caused by light leakage between pixels.

一般而言，黑色矩陣可為具有鉻或氧化鉻等之蒸鍍膜。然而，以前述之蒸鍍膜製作黑色矩陣時，其具有製程複雜且材料昂貴等之缺點。為了解決此問題，黑色矩陣係藉由光平版印刷(photo lithographic)技術形成。 In general, the black matrix can be a vapor-deposited film having chromium, chromium oxide, or the like. However, when the black matrix is fabricated by using the aforementioned vapor-deposited film, it has the disadvantages of complicated manufacturing process and expensive materials. To solve this problem, the black matrix is formed by photo lithographic technology.

日本專利特開第2006-259716號公報揭示一種黑色矩陣用之感光性樹脂組成物。該感光性樹脂組成物包含高使用量的黑色顏料、鹼可溶性樹脂、光聚合起始劑、具有二官能基的反應性單體及有機溶劑。該具有二官能基的反應性單體可改善化合物之間的反應，而可形成精細的圖案(fine pattern)。因此，所製得之感光性樹脂組成物具有良好之遮光性及感度。 Japanese Patent Laid-Open No. 2006-259716 discloses a photosensitive resin composition for a black matrix. This photosensitive resin composition contains a high-use amount of a black pigment, an alkali-soluble resin, a photopolymerization initiator, a reactive monomer having a difunctional group, and an organic solvent. The difunctional reactive monomer can improve the reaction between compounds, and Fine patterns can be formed. Therefore, the obtained photosensitive resin composition has good light-shielding property and sensitivity.

其次，日本專利特開第2008-268854號公報揭示一種黑色矩陣用的感光性樹脂組成物。該感光性樹脂組成物包含具有羧酸基及具有不飽和基的鹼可溶性樹脂、具有乙烯性不飽和基之光聚合單體、光聚合起始劑及高使用量的黑色顏料。上述具有羧酸基及具有不飽和基的鹼可溶性樹脂可改善感光性樹脂組成物之解析度。 Secondly, Japanese Patent Laid-Open No. 2008-268854 discloses a black A photosensitive resin composition for a color matrix. This photosensitive resin composition contains an alkali-soluble resin having a carboxylic acid group and an unsaturated group, a photopolymerizable monomer having an ethylenically unsaturated group, a photopolymerization initiator, and a high-use black pigment. The aforementioned alkali-soluble resin having a carboxylic acid group and an unsaturated group can improve the resolution of the photosensitive resin composition.

雖然現有技術中提高了黑色顏料使用量之感光性樹脂組成物能夠增加遮光性等，然而，上述各前案之感光性樹脂組成物所形成之黑色矩陣仍具有高精細度圖案的直線性不佳之缺陷，而降低黑色矩陣的效能。 Although the photosensitive resin group has increased the amount of black pigment in the prior art The finished product can increase the light-shielding property, etc. However, the black matrix formed by the photosensitive resin composition of each of the previous cases still has the defect of poor linearity of the high-definition pattern, which reduces the efficiency of the black matrix.

因此，如何改善黑色矩陣用之感光性樹脂組成物之高精細度圖案的直線性不佳的缺陷，以達到目前業界的要求，為本發明所屬技術領域中努力研究之目標。 Therefore, how to improve the precision of the photosensitive resin composition for black matrix The defect of poor linearity of the fineness pattern in order to meet the current industry requirements is the goal of hard research in the technical field to which the present invention belongs.

本發明利用提供特殊鹼可溶性樹脂及特殊矽烷化合物之成分，而得到高精細度圖案的直線性之黑色矩陣用之感光性樹脂組成物。 The present invention uses a component that provides a special alkali-soluble resin and a special silane compound to obtain a high-definition pattern of a linear black photosensitive resin composition.

因此，本發明提供一種感光性樹脂組成物，包含：鹼可溶性樹脂(A)；具有乙烯性不飽和基之化合物(B)；光起始劑(C)；溶劑(D)；黑色顏料(E)；及矽烷化合物(F)；其中：該鹼可溶性樹脂(A)，包含一具有不飽和基之樹脂(A-1)，其中該具有不飽和基之樹脂(A-1)係由一混合物聚合形成，且該混合物包含具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)；及該矽烷化合物(F)包含一第一矽烷化合物(F-1)，其中該第一矽烷化合物(F-1)分子內具有至少一個下式(F-I)所示之結構：

Therefore, the present invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); and a black pigment (E ); And a silane compound (F); wherein: the alkali-soluble resin (A) comprises a resin (A-1) having an unsaturated group, wherein the resin (A-1) having an unsaturated group is composed of a mixture Formed by polymerization, and the mixture comprises an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group; And the silane compound (F) includes a first silane compound (F-1), wherein the first silane compound (F-1) has at least one structure represented by the following formula (FI) in the molecule:

Z₁表示丙烯基(acryl group)或(甲基)丙烯基((meth)acryl group)；Z₂表示氫原子、或中間可夾入由氧原子、硫原子、氮原子所選出的雜原子或羰基碳之可有取代基的1價烴基；L表示中間可夾入由氧原子、硫原子、氮原子所選出的雜原子或羰基碳之可有取代基的2價烴基；及W表示中間可夾入由氧原子、硫原子、氮原子所選出的雜原子或羰基碳之可有取代基的2價烴基。 Z ₁ represents an acryl group or (meth) acryl group; Z ₂ represents a hydrogen atom, or a hetero atom selected from an oxygen atom, a sulfur atom, and a nitrogen atom, or A monovalent hydrocarbon group which may have a substituent on the carbonyl carbon; L represents a divalent hydrocarbon group which may have a hetero atom selected from an oxygen atom, a sulfur atom, and a nitrogen atom or a substituent which may be substituted on the carbonyl carbon; and W represents an intermediate A divalent hydrocarbon group having a substituent selected from an oxygen atom, a sulfur atom, and a nitrogen atom, or a carbonyl carbon which may have a substituent.

本發明亦提供一種黑色矩陣，其係藉由前述之感光性樹脂組成物經預烤處理、曝光處理、顯影處理及後烤處理所形成。 The present invention also provides a black matrix formed by the aforementioned photosensitive resin composition through a pre-baking process, an exposure process, a developing process, and a post-baking process.

本發明又提供一種彩色濾光片，係包含前述之黑色矩陣。 The present invention also provides a color filter, which includes the aforementioned black matrix.

本發明再提供一種液晶顯示元件，係包含前述之彩色濾光片。 The present invention further provides a liquid crystal display device, which includes the aforementioned color filter.

本發明提供一種感光性樹脂組成物，包含：鹼可溶性樹脂(A)；具有乙烯性不飽和基之化合物(B)；光起始劑(C)；溶劑(D)；黑色顏料(E)；及矽烷化合物(F)；其中：該鹼可溶性樹脂(A)，包含一具有不飽和基之樹脂(A-1)，其中該具有不飽和基之樹脂(A-1)係由一混合物聚合形成，且該混合物包含具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)；及該矽烷化合物(F)包含一第一矽烷化合物(F-1)，其中該第一矽烷化合物(F-1)分子內具有至少一個下式(F-I)所示之結構：

The invention provides a photosensitive resin composition comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); a black pigment (E); And silane compound (F); wherein: the alkali-soluble resin (A) comprises a resin (A-1) having an unsaturated group, wherein the resin (A-1) having an unsaturated group is formed by polymerizing a mixture; And the mixture includes an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group; and the The silane compound (F) includes a first silane compound (F-1), wherein the first silane compound (F-1) has at least one structure represented by the following formula (FI) in the molecule:

根據本發明之鹼可溶性樹脂(A)包含一具有不飽和基之樹脂(A-1)。該鹼可溶性樹脂(A)可選擇性地包含其他鹼可溶性樹脂(A-2)。 The alkali-soluble resin (A) according to the present invention contains an unsaturated group Resin (A-1). The alkali-soluble resin (A) may optionally contain other alkali-soluble resins (A-2).

該具有不飽和基之樹脂(A-1)係由一混合物聚合形成。該混合物包含具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)。再者，該混合物可選擇性地包含羧酸酐化合物(a-1-3)及具有環氧基之化合物(a-1-4)。 The unsaturated resin (A-1) is formed by polymerizing a mixture. The mixture includes an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group. Furthermore, the mixture may optionally include a carboxylic anhydride compound (a-1-3) and a compound (a-1-4) having an epoxy group.

該具有至少二個環氧基之環氧化合物(a-1-1)包含具有如下式(a-I)所示之結構的化合物、具有如下式(a-II)所示之結構的化合物及上述化合物之組合：

The epoxy compound (a-1-1) having at least two epoxy groups includes a compound having a structure represented by the following formula (aI), a compound having a structure represented by the following formula (a-II), and the aforementioned compound Combination:

於式(a-I)中，A₁至A₄分別獨立地代表氫原子、鹵素原子、碳數為1至5之烷基、碳數為1至5之烷氧基、碳數為6至12之芳香基或碳數為6至12之芳烷基。 In the formula (aI), A ₁ to A ₄ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, and an alkyl group having 6 to 12 carbon atoms. Aryl or aralkyl having 6 to 12 carbons.

該具有如式(a-I)所示之結構的化合物可包含具有環氧基之雙酚茀型化合物，其中該具有環氧基之雙酚茀型化合物可由雙酚茀型化合物(bisphenol fluorene)與鹵化環氧丙烷(epihalohydrin)反應而得。 The compound having a structure represented by formula (aI) may include a bisphenol fluorene type compound having an epoxy group, wherein the bisphenol fluorene type compound having an epoxy group may be bisphenol fluorene type and halogenated It is obtained by the reaction of epihalohydrin.

前述之雙酚茀型化合物之具體例可包含但不限於9,9-雙(4-羥基苯基)茀[9,9-bis(4-hydroxyphenyl)fluorine]、9,9-雙(4-羥基-3-甲基苯基)茀[9,9-bis(4-hydroxy-3-methylphenyl)fluorine]、9,9-雙(4-羥基-3-氯苯基)茀[9,9-bis(4-hydroxy-3-chlorophenyl)fluorine]、9,9-雙(4-羥基-3-溴苯基)茀[9,9-bis(4-hydroxy-3-bromophenyl)fluorine]、9,9-雙(4-羥基-3-氟苯基)茀[9,9-bis(4-hydroxy-3-fluorophenyl)fluorine]、9,9-雙(4-羥基-3-甲氧基苯基)茀[9,9-bis(4-hydroxy-3-methoxyphenyl)fluorine]、9,9-雙(4-羥基-3,5-二甲基苯基)茀[9,9-bis(4-hydroxy-3,5-dimethylphenyl)fluorine]、9,9-雙(4-羥基-3,5-二氯苯基)茀[9,9-bis(4-hydroxy-3,5-dichlorophenyl)fluorine]、9,9-雙(4-羥基-3,5-二溴苯基)茀[9,9-bis(4-hydroxy-3,5-dibromophenyl)fluorine]、雙酚茀型化合物之類似化合物，或上述化合物之任意組合。 Specific examples of the aforementioned bisphenol hydrazone compound may include, but are not limited to, 9,9-bis (4-hydroxyphenyl) fluorene [9,9-bis (4-hydroxyphenyl) fluorine], 9,9-bis (4- Hydroxy-3-methylphenyl) fluorene [9,9-bis (4-hydroxy-3-methylphenyl) fluorine], 9,9-bis (4-hydroxy-3-chlorophenyl) fluorene [9,9- bis (4-hydroxy-3-chlorophenyl) fluorine), 9,9-bis (4-hydroxy Methyl-3-bromophenyl) fluorene [9,9-bis (4-hydroxy-3-bromophenyl) fluorine], 9,9-bis (4-hydroxy-3-fluorophenyl) fluorene [9,9-bis (4-hydroxy-3-fluorophenyl) fluorine], 9,9-bis (4-hydroxy-3-methoxyphenyl) fluorene [9,9-bis (4-hydroxy-3-methoxyphenyl) fluorine], 9 , 9-bis (4-hydroxy-3,5-dimethylphenyl) fluorene [9,9-bis (4-hydroxy-3,5-dimethylphenyl) fluorine], 9,9-bis (4-hydroxy- 3,5-dichlorophenyl) fluorene [9,9-bis (4-hydroxy-3,5-dichlorophenyl) fluorine], 9,9-bis (4-hydroxy-3,5-dibromophenyl) fluorene [9,9-bis (4-hydroxy-3,5-dibromophenyl) fluorine], analogous compounds of bisphenol hydrazone type compounds, or any combination of the above.

前述鹵化環氧丙烷(epihalohydrin)之具體例可包含但不限於3-氯-1,2-環氧丙烷(epichlorohydrin)、3-溴-1,2-環氧丙烷(epibromohydrin)、鹵化環氧丙烷之類似化合物，或上述化合物之任意組合。 Specific examples of the aforementioned halogenated propylene oxide (epihalohydrin) may include, but not It is limited to similar compounds such as 3-chloro-1,2-propylene oxide (epichlorohydrin), 3-bromo-1,2-propylene oxide (epibromohydrin), halogenated propylene oxide, or any combination thereof.

該具有環氧基之雙酚茀型化合物的具體例可包含但不限於：(1)新日鐵化學製造之商品，例如：型號為ESF-300之產品或類似產品；(2)大阪瓦斯製造之商品，例如：型號為PG-100或EG-210之產品，或者類似產品；(3)S.M.S Technology Co.製造之商品，例如：型號為SMS-F9PhPG、SMS-F9CrG或SMS-F914PG之產品，或者類似產品。 Specific examples of the bisphenol amidine compound having an epoxy group may include, but are not limited to, In: (1) Products manufactured by Nippon Steel Chemical, such as: ESF-300 or similar products; (2) Products manufactured by Osaka Gas, such as: PG-100 or EG-210, or Similar products; (3) Products manufactured by SMS Technology Co., for example: products of model SMS-F9PhPG, SMS-F9CrG or SMS-F914PG, or similar products.

於式(a-II)中，A₅至A₁₈分別獨立地代表氫原子、鹵素原子、碳數為1至8之烷基或碳數為6至15之芳香基；且u代表0至10之整數。 In the formula (a-II), A ₅ to A ₁₈ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or an aromatic group having 6 to 15 carbon atoms; and u represents 0 to 10 Integer.

具有如式(a-II)所示之結構的化合物可在鹼金屬氫氧化物的存在下，使具有如下式(a-II-1)所示之結構的化合物與鹵化環氧丙烷進行反應而得：

The compound having the structure represented by the formula (a-II) can be reacted with a halogenated propylene oxide by reacting the compound having the structure represented by the following formula (a-II-1) with an alkali metal hydroxide. Got:

於式(a-II-1)中，A₅至A₁₈及u之定義如前所述，在此不另贅述。 In the formula (a-II-1), the definitions of A ₅ to A ₁₈ and u are as described above, and are not repeated here.

具有如式(a-II)所示之結構的化合物之合成方法係先在酸觸媒存在下，對具有如下式(a-II-3)所示之結構的化合物及酚(phenol)類化合物進行縮合反應，以形成具有如式(a-II-1)所示之結構的化合物：

A method for synthesizing a compound having a structure represented by the formula (a-II) is to firstly perform a compound having the structure represented by the following formula (a-II-3) and a phenol compound in the presence of an acid catalyst. A condensation reaction is performed to form a compound having a structure represented by formula (a-II-1):

於式(a-II-3)中，A₁₉及A₂₀分別獨立地代表氫原子、鹵素原子、碳數為1至8的烷基或碳數為6至15的芳香基；U₁及U₂分別獨立地代表鹵素原子、碳數為1至6的烷基或碳數為1至6的烷氧基。上述之烷基較佳為甲基、乙基或第三丁基，且烷氧基較佳為甲氧基或乙氧基。 In formula (a-II-3), A ₁₉ and A ₂₀ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbons, or an aromatic group having 6 to 15 carbon atoms; U ₁ and U ₂ each independently represents a halogen atom, an alkyl group having 1 to 6 carbon atoms, or an alkoxy group having 1 to 6 carbon atoms. The aforementioned alkyl group is preferably a methyl group, an ethyl group, or a third butyl group, and the alkoxy group is preferably a methoxy group or an ethoxy group.

前述酚類化合物之具體例可包含但不限於酚(phenol)、甲酚(cresol)、乙酚(ethylphenol)、n-丙酚(n-propylphenol)、異丁酚(isobutylphenol)、t-丁酚(t-butylphenol)、辛酚(octylphenol)、壬基苯酚(nonylphenol)、茬酚(xylenol)、甲基丁基苯酚(methylbutylphenol)、二第三丁基酚(di-t-butylphenol)、乙烯苯酚(vinylphenol)、丙烯苯酚(propenylphenol)、乙炔苯酚(ethinylphenol)、環戊苯酚(cyclopentylphenol)、環己基酚(cyclohexylphenol)、環己基甲酚(cyclohexylcresol)或酚類化合物之類似化合物。該酚類化合物可單獨一種或混合複數種使用。 Specific examples of the phenolic compound may include, but are not limited to, phenol, cresol, ethylphenol, n-propylphenol, isobutylphenol, and t-butylphenol (t-butylphenol), octylphenol, nonylphenol, xylenol, methylbutylphenol, Di-t-butylphenol, vinylphenol, propenylphenol, ethinylphenol, cyclopentylphenol, cyclohexylphenol, cyclohexylcresol (cyclohexylcresol) or phenolic compounds. These phenolic compounds may be used alone or in combination.

基於前述具有如式(a-II-3)所示之結構的化合物之使用量為1莫耳，該酚類化合物之使用量為0.5莫耳至20莫耳，且較佳為2莫耳至15莫耳。 Based on the amount of the aforementioned compound having a structure represented by the formula (a-II-3) The amount of the phenolic compound is 1 mol to 20 mol, and preferably 2 mol to 15 mol.

上述酸觸媒之具體例可包含但不限於鹽酸、硫酸、對甲苯磺酸(p-toluenesulfonic acid)、草酸(oxalic acid)、三氟化硼(boron trifluoride)、無水氯化鋁(aluminium chloride anhydrous)、氯化鋅(zinc chloride)或酸觸媒之類似物。該酸觸媒可單獨一種或混合複數種使用。 Specific examples of the above acid catalyst may include, but are not limited to, hydrochloric acid, sulfuric acid, p-formyl P-toluenesulfonic acid, oxalic acid, boron trifluoride, aluminum chloride anhydrous, zinc chloride or the like. The acid catalyst may be used alone or in combination.

該酸觸媒較佳可為對甲苯磺酸、硫酸、鹽酸或上述化合物之任意組合。 The acid catalyst may preferably be p-toluenesulfonic acid, sulfuric acid, hydrochloric acid, or a combination thereof. Any combination of things.

該酸觸媒之使用量並無特別之限制。基於前述具有如式 (II-1-1)所示之結構的化合物之使用量為100重量百分比，該酸觸媒之使用量為0.1重量百分比至30重量百分比。 The amount of the acid catalyst used is not particularly limited. Based on the foregoing The amount of the compound having the structure shown in (II-1-1) is 100% by weight, and the amount of the acid catalyst is 0.1 to 30% by weight.

前述之縮合反應可在無溶劑或有機溶劑之存在下進行，其中該有機溶劑之具體例可為甲苯(toluene)、二甲苯(xylene)、甲基異丁基酮(methyl isobutyl ketone)或其類似物。該有機溶劑可為單獨一種或混合複數種使用。 The aforementioned condensation reaction can be performed in the absence of a solvent or an organic solvent. Specific examples of the organic solvent may be toluene, xylene, methyl isobutyl ketone, or the like. The organic solvents may be used alone or in combination.

基於前述具有如式(a-II-3)所示之結構的化合物及酚類化合物之總使用量為100重量百分比，該有機溶劑之使用量為50重量百分比至300重量百分比，較佳為100重量百分比至250重量百分比。 Based on the aforementioned compound having a structure represented by the formula (a-II-3) and phenolification The total amount of the compound used is 100% by weight, and the amount of the organic solvent used is 50% to 300% by weight, preferably 100% to 250% by weight.

該縮合反應之反應溫度可為40℃至180℃，且反應時間可為1小時至8小時。 The reaction temperature of the condensation reaction may be 40 ° C to 180 ° C, and the reaction time It can be from 1 hour to 8 hours.

在完成該縮合反應後，可選擇性地進行中和處理或水洗處理。 After completion of the condensation reaction, a neutralization treatment or water washing can be optionally performed deal with.

上述之中和處理係將反應後之溶液的pH值調整為3至 7，較佳為5至7。 The above neutralization treatment is to adjust the pH value of the solution after the reaction to 3 to 7, preferably 5 to 7.

上述之水洗處理可利用中和劑來進行。該中和劑可為鹼性物質，且中和劑之具體例可包含但不限於氨(ammonia)、磷酸二氫鈉(sodium dihydrogen phosphate)；氫氧化鈉(sodium hydroxide)或氫氧化鉀(potassium hydroxide)等之鹼金屬氫氧化物；氫氧化鈣(calcium hydroxide)或氫氧化鎂(magnesium hydroxide)等之鹼土類金屬氫氧化物；二伸乙三胺(diethylene triamine)、三伸乙四胺(triethylenetetramine)、苯胺(aniline)或苯二胺(phenylene diamine)等之有機胺或上述化合物之任意組合。該中和劑可單獨一種或混合複數種使用。 The above-mentioned water washing treatment can be performed using a neutralizing agent. The neutralizing agent may be a base Specific examples of neutral substances and neutralizers may include, but are not limited to, alkali metal hydrogen such as ammonia, sodium dihydrogen phosphate, sodium hydroxide, or potassium hydroxide. Oxides; calcium hydroxide or magnesium hydroxide, alkaline earth metal hydroxides; diethylene triamine, triethylenetetramine, aniline Or organic amines such as phenylene diamine or any combination of the above compounds. These neutralizing agents can be used individually or in mixture of multiple types.

該水洗處理可採用習知之方法進行。例如：將含有中和劑之水溶液加至反應後之溶液中，並反覆進行萃取。經中和處理或水洗處理後，溶液中未反應之酚類化合物及溶劑可藉由減壓加熱處理去除，並進行濃縮，以獲得具有如式(a-II-1)所示之結構的化合物。 This water washing treatment can be performed by a conventional method. Example: will contain neutralization An aqueous solution of the agent was added to the solution after the reaction, and extraction was performed repeatedly. After the neutralization treatment or the water washing treatment, unreacted phenolic compounds and solvents in the solution can be removed by heating under reduced pressure and concentrated to obtain a compound having a structure represented by the formula (a-II-1) .

當縮合反應完成後，加入過量之鹵化環氧丙烷，以使鹵化環氧丙烷與具有如式(a-II-1)所示之結構的化合物進行脫鹵化氫反應(dehydrohalogenation)，而可製得具有如式(a-II)所示之結構的化合物。 When the condensation reaction is completed, an excess of halogenated propylene oxide is added to make the halogen The propylene oxide is dehydrohalogenated with a compound having a structure represented by the formula (a-II-1) to obtain a compound having a structure represented by the formula (a-II).

前述鹵化環氧丙烷之具體例可包含但不限於3-氯-1,2-環氧丙烷、3-溴-1,2-環氧丙烷或上述化合物之組合。 Specific examples of the aforementioned halogenated propylene oxide may include, but are not limited to, 3-chloro-1,2-cyclo Oxypropane, 3-bromo-1,2-propylene oxide or a combination thereof.

當進行前述之脫鹵化氫反應前，氫氧化鈉或氫氧化鉀等之鹼金屬氫氧化合物可預先添加或於反應過程中加至反應溶液中。該脫鹵化氫反應之反應溫度可為20℃至120℃，且反應時間可為1小時至10小時。 Before carrying out the aforementioned dehalogenation reaction, sodium hydroxide or potassium hydroxide, etc. The alkali metal hydroxide may be added in advance or added to the reaction solution during the reaction. The The reaction temperature of the dehydrohalogenation reaction may be 20 ° C to 120 ° C, and the reaction time may be 1 hour to 10 hours.

在一實施例中，前述之鹼金屬氫氧化合物可為水溶液。在此實施例中，當鹼金屬氫氧化合物水溶液連續加至脫鹵化氫反應之反應系統中，同時可於減壓或常壓下，連續蒸餾出水及鹵化環氧丙烷，以分離並去除水，且鹵化環氧丙烷可連續地回流至反應系統中。 In one embodiment, the aforementioned alkali metal hydroxide may be an aqueous solution. In this embodiment, when the aqueous alkali metal hydroxide solution is continuously added to the reaction system for the dehydrohalogenation reaction, at the same time, water and halogenated propylene oxide can be continuously distilled under reduced pressure or normal pressure to separate and remove water. And the halogenated propylene oxide can be continuously refluxed into the reaction system.

當進行脫鹵化氫反應前，氯化四甲銨(tetramethyl ammonium chloride)、溴化四甲銨(tetramethyl ammonium bromide)、三甲基苄基氯化銨(trimethyl benzyl ammonium chloride)等之四級銨鹽可添加至反應系統中，以作為觸媒，並在50℃至150℃反應1小時至5小時後，將鹼金屬氫氧化物或其水溶液加至反應系統中。然後，於20℃至120℃反應1小時至10小時，以進行脫鹵化氫反應。 Tetramethylammonium chloride (tetramethyl ammonium chloride) Ammonium chloride, tetramethyl ammonium bromide, trimethyl benzyl ammonium chloride and other quaternary ammonium salts can be added to the reaction system as a catalyst, and at 50 After the reaction at 1 ° C to 150 ° C for 1 hour to 5 hours, an alkali metal hydroxide or an aqueous solution thereof is added to the reaction system. Then, a reaction is performed at 20 ° C to 120 ° C for 1 hour to 10 hours to perform a dehydrohalogenation reaction.

基於前述具有如式(a-II-1)所示之結構的化合物中之羥基總當量數為1當量，該鹵化環氧丙烷之使用量為1當量至20當量，且較佳為2當量至10當量。基於前述具有如式(a-II-1)所示之結構的化合物中之羥基總當量數為1當量，脫鹵化氫反應中之鹼金屬氫氧化物的使用量為0.5當量至15當量，且較佳為0.9當量至11當量。 Based on the hydroxyl group in the aforementioned compound having a structure represented by the formula (a-II-1) The total number of equivalents is 1 equivalent, and the amount of the halogenated propylene oxide used is 1 to 20 equivalents, and preferably 2 to 10 equivalents. The total number of hydroxyl equivalents in the compound having the structure represented by the formula (a-II-1) is 1 equivalent, and the amount of alkali metal hydroxide used in the dehydrohalogenation reaction is 0.5 to 15 equivalents, and It is preferably 0.9 equivalent to 11 equivalent.

為了使上述脫鹵化氫反應順利進行，甲醇或乙醇等之醇類化合物可添加至反應系統中。此外，二甲碸(dimethyl sulfone)或二甲亞碸(dimethyl sulfoxide)等之非質子性(aprotic)的極性溶媒亦可加至反應系統中。 In order to make the above dehalogenation reaction proceed smoothly, alcohols such as methanol or ethanol Compounds can be added to the reaction system. In addition, aprotic polar solvents such as dimethyl sulfone or dimethyl sulfoxide can also be added to the reaction system.

當使用醇類化合物時，基於上述的鹵化環氧丙烷的總使用量為100重量百分比，醇類化合物之使用量為2重量百分比至20重量百分比，且較佳為4重量百分比至15重量百分比。當使用非質子性的極性溶媒時，基於鹵化環氧丙烷的總使用量為100重量百分比，非質子性的極性溶媒的使用量為5重量百分比至100重量百分比，且較佳為 10重量百分比至90重量百分比。 When using alcohol compounds, the total amount of halogenated propylene oxide based on the above The amount is 100% by weight, and the amount of the alcohol compound is 2 to 20% by weight, and preferably 4 to 15% by weight. When an aprotic polar solvent is used, the total amount of the halogenated propylene oxide used is 100% by weight, and the amount of the aprotic polar solvent is 5 to 100% by weight, and is preferably 10 weight percent to 90 weight percent.

當前述之脫鹵化氫反應後，反應系統可選擇性地進行水洗處理。然後，於溫度為110℃至250℃且壓力為1.3kPa(10mmHg)以下之環境中，去除鹵化環氧丙烷、醇類化合物及非質子性的極性溶媒。 After the aforementioned dehalogenation reaction, the reaction system can selectively carry water Wash treatment. Then, the halogenated propylene oxide, alcohol compounds, and aprotic polar solvent are removed in an environment at a temperature of 110 ° C to 250 ° C and a pressure of 1.3 kPa (10 mmHg) or less.

為了避免所形成之環氧樹脂具有加水分解性之鹵素，進行脫鹵化氫反應後之溶液可加入甲苯、甲基異丁基酮(methyl isobutyl ketone)等之溶劑及氫氧化鈉或氫氧化鉀等之鹼金屬氫氧化物水溶液，並再次進行脫鹵化氫反應。在前述之脫鹵化氫反應中，基於前述具有如式(II-1)所示之結構的化合物中之羥基總當量數為1當量，鹼金屬氫氧化合物之使用量為0.01莫耳至0.3莫耳，且較佳為0.05莫耳至0.2莫耳。此外，該脫鹵化氫反應之反應溫度可為50℃至120℃，且反應時間可為0.5小時至2小時。 In order to avoid the formation of epoxy resin with hydrolyzable halogen, After the dehydrohalogenation reaction, a solvent such as toluene, methyl isobutyl ketone, etc., and an alkali metal hydroxide aqueous solution such as sodium hydroxide or potassium hydroxide may be added, and the dehydrohalogenation reaction may be performed again. . In the foregoing dehydrohalogenation reaction, based on the total number of hydroxyl equivalents in the compound having the structure represented by the formula (II-1) is 1 equivalent, and the amount of the alkali metal hydroxide used is 0.01 mol to 0.3 mol. Ears, and preferably from 0.05 moles to 0.2 moles. In addition, the reaction temperature of the dehydrohalogenation reaction may be 50 ° C to 120 ° C, and the reaction time may be 0.5 hours to 2 hours.

當脫鹵化氫反應完成後，反應溶液中之鹽類可藉由過濾及水洗等步驟去除，且甲苯、甲基異丁基酮等之溶劑可藉由加熱減壓之方式餾除，以形成具有如式(a-II)所示之結構的化合物。該具有如式(a-II)所示之結構的化合物之具體例可包含但不限於日本化藥製造之商品，其型號為NC-3000、NC-3000H、NC-3000S及NC-3000P等。 After the dehalogenation reaction is completed, the salts in the reaction solution can be filtered. And water washing steps, and solvents such as toluene and methyl isobutyl ketone can be distilled off by heating and reducing pressure to form a compound having a structure represented by formula (a-II). Specific examples of the compound having a structure represented by the formula (a-II) may include, but are not limited to, products manufactured by Nippon Kayaku, and their models are NC-3000, NC-3000H, NC-3000S, NC-3000P, and the like.

該具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)可選自於由下述(1)至(3)所組成之一族群：(1)丙烯酸、甲基丙烯酸、2-甲基丙烯醯氧乙基丁二酸(2-methacryloyloxyethylbutanedioic acid)、2-甲基丙烯醯氧丁基丁二酸、2-甲基丙烯醯氧乙基己二酸、2-甲基丙烯醯氧丁基己二酸、2-甲基丙烯醯氧乙基六氫鄰苯二甲酸、2-甲基丙烯醯氧乙基馬來酸、2-甲基丙烯醯氧丙基馬來酸、2-甲基丙烯醯氧丁基馬來酸、2-甲基丙烯醯氧丙基丁二酸、2-甲基丙烯醯氧丙基己二酸、2-甲基丙烯醯氧丙基四氫鄰苯二甲酸、2-甲基丙烯醯氧丙基鄰苯二甲酸、2-甲基丙烯醯氧丁基鄰苯二甲酸或2-甲基丙烯醯氧丁基氫鄰苯二甲酸等之化合物；(2)由具有羥基之(甲基)丙烯酸酯與二元羧酸化合物反應而得的化合物，其中該二元羧酸化合物之具體例可包含己二酸、丁二酸、馬來酸或鄰苯二甲酸等之化合物；(3)由具有羥基之(甲基)丙烯酸酯與下述之羧酸酐化合物(a-1-3；請參照後述內容，在此不另贅述)反應而得的半酯化合物，其中該具有羥基的(甲基)丙烯酸酯之具體例可包含2-羥基乙基丙烯酸酯[(2-hydroxyethyl)acrylate]、2-羥基乙基甲基丙烯酸酯[(2-hydroxyethyl)methacrylate]、2-羥基丙基丙烯酸酯[(2-hydroxypropyl)acrylate]、2-羥基丙基甲基丙烯酸酯[(2-hydroxypropyl)methacrylate]、4-羥基丁基丙烯酸酯[(4-hydroxybutyl)acrylate]、4-羥基丁基甲基丙烯酸酯[(4-hydroxybutyl)methacrylate]或季戊四醇三甲基丙烯酸酯等之化合物。 The reaction of at least one carboxylic acid group and at least one ethylenically unsaturated group The compound (a-1-2) may be selected from the group consisting of (1) to (3): (1) acrylic acid, methacrylic acid, 2-methacrylic acid oxyethyl succinic acid (2-methacryloyloxyethylbutanedioic acid), 2-methacryloyloxyethylbutanedioic acid, 2-methacryloyloxybutanedioic acid, 2-methacryloyloxyethyl adipic acid, 2-methacrylic acid Acrylic acid ethyl hexahydrophthalic acid, 2-methacrylic acid oxyethyl maleic acid, 2-methacrylic acid oxypropyl maleic acid, 2-methacrylic acid oxybutyl maleic acid , 2-methacrylic acid oxysuccinic acid, 2-methacrylic acid oxypropyl adipic acid, 2-methacrylic acid Hydrophthalic acid, 2-methacrylic acid oxypropyl phthalic acid, 2-methacrylic acid oxybutyl phthalic acid, 2-methacrylic acid oxybutyl phthalic acid, etc. Compound; (2) a compound obtained by reacting a (meth) acrylate having a hydroxyl group with a dicarboxylic acid compound, wherein specific examples of the dicarboxylic acid compound may include adipic acid, succinic acid, and maleic acid Or phthalic acid compounds; (3) It is obtained by reacting a (meth) acrylic acid ester having a hydroxyl group with the following carboxylic acid anhydride compound (a-1-3; please refer to the following content, and will not repeat it here). Specific examples of the (meth) acrylate having a hydroxyl group may include 2-hydroxyethyl acrylate [(2-hydroxyethyl) acrylate], 2-hydroxyethyl methacrylate [(2- hydroxyethyl) methacrylate], 2-hydroxypropyl acrylate [(2-hydroxypropyl) acrylate], 2-hydroxypropyl methacrylate [(2-hydroxypropyl) methacrylate], 4-hydroxybutyl acrylate [(4- hydroxybutyl) acrylate], 4- (hydroxybutyl) methacrylate, or pentaerythritol trimethacrylate Of compound.

該羧酸酐化合物(a-1-3)可選自於二元羧酸酐化合物、四元羧酸酐化合物或上述化合物之任意組合。 The carboxylic acid anhydride compound (a-1-3) may be selected from a dicarboxylic acid anhydride compound, a tetracarboxylic acid anhydride compound, or any combination thereof.

前述之二元羧酸酐化合物可包含但不限於丁二酸酐(butanedioic anhydride)、順丁烯二酸酐(maleic anhydride)、衣康酸酐(Itaconic anhydride)、鄰苯二甲酸酐(phthalic anhydride)、四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride)、六氫鄰苯二甲酸酐(hexahydrophthalic anhydride)、甲基四氫鄰苯二甲酸酐、甲基六氫鄰苯二甲酸酐、甲基橋亞甲基四氫鄰苯二甲酸酐(methyl endo-methylene tetrahydro phthalic anhydride)、氯茵酸酐(chlorendic anhydride)、戊二酸酐或偏三苯甲酸酐(1,3-dioxoisobenzofuran-5-carboxylic anhydride)等之二元羧酸酐化合物 The aforementioned dicarboxylic acid anhydride compound may include, but is not limited to, butanedioic anhydride, maleic anhydride, itaconic anhydride, phthalic anhydride, tetrahydro Phthalic anhydride (tetrahydrophthalic anhydride), hexahydrophthalic anhydride, methyltetrahydrophthalic anhydride, methylhexahydrophthalic anhydride, methyl bridge methylenetetrahydro Dicarboxylic acid anhydrides such as methyl endo-methylene tetrahydro phthalic anhydride, chlorendic anhydride, glutaric anhydride, or trimellitic anhydride (1,3-dioxoisobenzofuran-5-carboxylic anhydride) Compound

前述之四元羧酸酐化合物可包含但不限於二苯甲酮四甲酸二酐(benzophenone tetracarboxylic dianhydride；BTDA)、雙苯四甲酸二酐或雙苯醚四甲酸二酐等之四元羧酸酐化合物。 The aforementioned tetracarboxylic carboxylic anhydride compound may include, but is not limited to, benzophenone tetramethyl Tetracarboxylic carboxylic anhydride compounds such as benzophenone tetracarboxylic dianhydride (BTDA), diphenyltetracarboxylic dianhydride or bisphenyl ether tetracarboxylic dianhydride.

該具有環氧基之化合物(a-1-4)之具體例可包含但不限於甲基丙烯酸環氧丙酯、3,4-環氧基環己基甲基丙烯酸酯、具有不飽和基的縮水甘油醚化合物、具有環氧基的不飽和化合物或上述化合物的組合。 Specific examples of the compound (a-1-4) having an epoxy group may include, but are not limited to Glycidyl methacrylate, 3,4-epoxycyclohexyl methacrylate, a glycidyl ether compound having an unsaturated group, an unsaturated compound having an epoxy group, or a combination thereof.

前述具有不飽和基的縮水甘油醚化合物之具體例包含但不限於長瀨化成工業股份有限公司製造之商品，其型號為Denacol EX-111、Denacol EX-121、Denacol EX-141、Denacol EX-145、Denacol EX-146、Denacol EX-171及Denacol EX-192。 Specific examples of the glycidyl ether compound having an unsaturated group include: Not limited to products manufactured by Nagase Chemical Industry Co., Ltd. Models are Denacol EX-111, Denacol EX-121, Denacol EX-141, Denacol EX-145, Denacol EX-146, Denacol EX-171, and Denacol EX-192 .

該具有不飽和基之樹脂(A-1)可由具有如式(a-I)所示之結構的具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)進行反應，以形成具有羥基的反應產物。然後，將所製得之反應產物與羧酸酐化合物(a-1-3)進行反應，以製得本發明具有不飽和基之樹脂(A-1)。基於前述具有羥基之反應產物的羥基總當量數為1當量，該羧酸酐化合物(a-1-3)之酸酐基的當量數為0.4當量至1當量，且較佳為0.75當量至1當量。當使用多個羧酸酐化合物(a-1-3)時，此些羧酸酐化合物(a-1-3)可依序添加或同時添加至反應中。當羧酸酐化合物(a-1-3)包含二元羧酸酐化合物及四元羧酸酐化合物時，二元羧酸酐化合物及四元羧酸酐化合物之莫耳比例為1/99至90/10，較佳為5/95至80/20。上述反應的操作溫度範圍為50℃至130℃。 The resin (A-1) having an unsaturated group can be represented by the following formula (a-I) An epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group are reacted to form a compound having The reaction product of a hydroxyl group. Then, the prepared reaction product is reacted with a carboxylic anhydride compound (a-1-3) to obtain a resin (A-1) having an unsaturated group according to the present invention. The total number of hydroxyl equivalents based on the aforementioned reaction product having a hydroxyl group is 1 equivalent, and the number of equivalents of the acid anhydride group of the carboxylic anhydride compound (a-1-3) is 0.4 equivalent to 1 equivalent, and preferably 0.75 equivalent to 1 equivalent. When a plurality of carboxylic anhydride compounds (a-1-3) are used, these carboxylic anhydride compounds (a-1-3) may be added sequentially or simultaneously to the reaction. When the carboxylic acid anhydride compound (a-1-3) includes a dicarboxylic acid anhydride compound and a tetracarboxylic acid anhydride compound, the molar ratio of the dicarboxylic acid anhydride compound and the tetracarboxylic acid anhydride compound is 1/99 to 90/10, It is preferably 5/95 to 80/20. The operating temperature of the above reaction ranges from 50 ° C to 130 ° C.

該具有不飽和基之樹脂(A-1)可由具有如式(a-II)所示之結構的具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)進行反應，以形成具有羥基的反應產物。然後，將所製得之反應產物與羧酸酐化合物(a-1-3) 及/或具有環氧基之化合物(a-1-4)進行反應，以製得本發明具有不飽和基之樹脂(A-1)。基於具有如式(a-II)所示之結構的具有至少二個環氧基之環氧化合物(a-1-1)中的環氧基之總當量數為1當量，該具有至少一個羧酸基及至少一個乙烯性不飽和基之化合物(a-1-2)的酸價當量數為0.8當量至1.5當量，且較佳為0.9當量至1.1當量。基於前述具有羥基之反應產物的羥基總量為100莫耳百分比，該羧酸酐化合物(a-1-3)之使用量為10莫耳百分比至100莫耳百分比，較佳為20莫耳百分比至100莫耳百分比，且更佳為30莫耳百分比至100莫耳百分比。 The resin (A-1) having an unsaturated group may be represented by the following formula (a-II) An epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group are reacted to form a compound having The reaction product of a hydroxyl group. Then, the obtained reaction product and a carboxylic anhydride compound (a-1-3) And / or the compound (a-1-4) having an epoxy group is reacted to obtain the resin (A-1) having an unsaturated group according to the present invention. Based on the total number of equivalents of the epoxy groups in the epoxy compound (a-1-1) having at least two epoxy groups having a structure represented by the formula (a-II) is 1 equivalent, the compound having at least one carboxyl group The number of acid equivalents of the acid group and the at least one ethylenically unsaturated compound (a-1-2) is 0.8 to 1.5 equivalents, and preferably 0.9 to 1.1 equivalents. The total amount of hydroxyl groups based on the aforementioned reaction product having hydroxyl groups is 100 mole percent, and the amount of the carboxylic anhydride compound (a-1-3) used is 10 mole percent to 100 mole percent, preferably 20 mole percent to 100 mole percent, and more preferably 30 mole percent to 100 mole percent.

當製備前述具有不飽和基之樹脂(A-1)時，為了加速反應速率，鹼性化合物一般會添加至反應溶液中，以作為反應觸媒。該反應觸媒之具體例可包含但不限於三苯基膦(triphenyl phosphine)、三苯基銻(triphenyl stibine)、三乙胺(triethylamine)、三乙醇胺(triethanolamine)、氯化四甲基銨(tetramethylammonium chloride)或氯化苄基三乙基銨(benzyltriethylammonium chloride)等之化合物。前述之反應觸媒可單獨一種或混合複數種使用。 When preparing the aforementioned resin (A-1) having an unsaturated group, in order to accelerate the reaction At the reaction rate, basic compounds are generally added to the reaction solution as a reaction catalyst. Specific examples of the reaction catalyst may include, but are not limited to, triphenyl phosphine, triphenyl stibine, triethylamine, triethanolamine, and tetramethylammonium chloride ( tetramethylammonium chloride) or benzyltriethylammonium chloride. The aforementioned reaction catalysts can be used singly or in combination.

基於前述具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)的總使用量為100重量份，該反應觸媒之使用量為0.01重量份至10重量份，且較佳為0.3重量份至5重量份。 Based on the aforementioned epoxy compound (a-1-1) having at least two epoxy groups and having The total use amount of the compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is 100 parts by weight, and the use amount of the reaction catalyst is 0.01 to 10 parts by weight. It is preferably 0.3 to 5 parts by weight.

其次，為了控制前述具有不飽和基之樹脂(A-1)的聚合度，阻聚劑(inhibitor)可加至反應溶液中。該阻聚劑之具體例可包含但不限於甲氧基酚(methoxyphenol)、甲基氫醌(methylhydroquinohe)、氫醌(hydroquinone)、2,6-二第三丁基對甲酚(2,6-di-t-butyl-p-cresol)或吩噻嗪(phenothiazine)等之化合物。該阻聚劑可單獨一種或混合複數種使用。 Next, in order to control the polymerization of the aforementioned resin (A-1) having an unsaturated group In addition, an inhibitor can be added to the reaction solution. Specific examples of the polymerization inhibitor may include, but are not limited to, methoxyphenol, methylhydroquinohe, hydroquinone, and 2,6-di-tert-butyl-p-cresol (2,6 -di-t-butyl-p-cresol) or phenothiazine. These polymerization inhibitors can be used singly or in combination.

基於前述具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)的總使用量為100重量份，該阻聚劑之使用量為0.01重量份至10重量份，且較佳為0.1重量份至5重量份。 Based on the aforementioned epoxy compound (a-1-1) having at least two epoxy groups and having The total amount of the compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group is 100 parts by weight, and the amount of the polymerization inhibitor is 0.01 to 10 parts by weight, and It is preferably from 0.1 to 5 parts by weight.

此外，當製備前述具有不飽和基之樹脂(A-1)時，聚合反應溶劑可加至反應溶液中。該聚合反應溶劑之具體例可包含但不限於乙醇、丙醇、異丙醇、丁醇、異丁醇、2-丁醇、己醇或乙二醇等之醇類化合物；甲乙酮或環己酮等之酮類化合物；甲苯或二甲苯等之芳香族烴類化合物；賽珞素或丁基賽珞素(butyl cellosolve)等之賽珞素(cellosolve)化合物；卡必妥或丁基卡必妥等之卡必妥化合物；丙二醇單甲醚等之丙二醇烷基醚類化合物；二丙二醇單甲醚[di(propylene glycol)methyl ether]等之多丙二醇烷基醚[poly(propylene glycol)alkyl ether]化合物；醋酸乙酯、醋酸丁酯、乙二醇***醋酸酯(ethylene glycol monoethyl ether acetate)或丙二醇甲醚醋酸酯(propylene glycol methyl ether acetate)等之醋酸酯化合物；乳酸乙酯(ethyl lactate)或乳酸丁酯(butyl lactate)等之乳酸烷酯(alkyl lactate)化合物；或者二烷基二醇醚化合物。該聚合反應溶劑可單獨一種或混合複數種使用。 In addition, when the aforementioned resin (A-1) having an unsaturated group is prepared, polymerization The reaction solvent may be added to the reaction solution. Specific examples of the polymerization reaction solvent may include, but are not limited to, alcohol compounds such as ethanol, propanol, isopropanol, butanol, isobutanol, 2-butanol, hexanol, or ethylene glycol; methyl ethyl ketone or cyclohexanone Ketone compounds such as toluene; aromatic hydrocarbon compounds such as toluene or xylene; cellosolve compounds such as cystein or butyl cellosolve; carbitol or butyl carbitol Carbitol compounds such as propylene glycol; propylene glycol alkyl ether compounds such as propylene glycol monomethyl ether; poly (propylene glycol) alkyl ether] such as dipropylene glycol monomethyl ether [di (propylene glycol) methyl ether] Compounds; acetate compounds such as ethyl acetate, butyl acetate, ethylene glycol monoethyl ether acetate or propylene glycol methyl ether acetate; ethyl lactate or Alkyl lactate compounds such as butyl lactate; or dialkyl glycol ether compounds. This polymerization reaction solvent can be used individually or in mixture of multiple types.

本發明所製得具有不飽和基之樹脂(A-1)的酸價為50 mgKOH/g至150mgKOH/g。 The resin (A-1) having an unsaturated group prepared by the present invention has an acid value of 50 mgKOH / g to 150 mgKOH / g.

上述具有不飽和基之樹脂(A-1)藉由膠體滲透層析儀(Gel Permeation Chromatography,GPC)測定之聚苯乙烯換算的重量平均分子量較佳為800至8,000，更佳為1,000至6,000。 The above resin (A-1) having an unsaturated group is passed through a gel permeation chromatography (Gel The polystyrene-equivalent weight average molecular weight measured by Permeation Chromatography (GPC) is preferably 800 to 8,000, and more preferably 1,000 to 6,000.

基於鹼可溶性樹脂(A)之使用量為100重量份，該具有不飽和基之樹脂(A-1)的使用量為30重量份至100重量份，較佳為40重量份至100重量份，且更佳為50重量份至100重量份。 Based on the used amount of the alkali-soluble resin (A) being 100 parts by weight, the The saturated resin (A-1) is used in an amount of 30 to 100 parts by weight, preferably 40 to 100 parts by weight, and more preferably 50 to 100 parts by weight.

當本發明之鹼可溶性樹脂(A)不包含具有不飽和基之樹脂(A-1)時，該感光性樹脂組成物所形成之黑色矩陣具有高精細度圖案的直線性不佳之缺陷。 When the alkali-soluble resin (A) of the present invention does not contain a tree having an unsaturated group In the case of grease (A-1), the black matrix formed by the photosensitive resin composition has a high-resolution image The linearity of the case is poor.

前述之其他鹼可溶性樹脂(A-2)可包含但不限於具有羧酸基或羥基之樹脂。該其他鹼可溶性樹脂(A-2)之具體例可為前述具有不飽和基之樹脂(A-1)以外的丙烯酸樹脂、胺基甲酸酯(urethane)樹脂、酚醛清漆樹脂(novolac)等之鹼可溶性樹脂。 The aforementioned other alkali-soluble resin (A-2) may include, but is not limited to, having a carboxylic acid Acid or hydroxyl resin. Specific examples of the other alkali-soluble resin (A-2) include acrylic resins other than the unsaturated resin (A-1), urethane resins, novolac resins, and the like. Alkali soluble resin.

上述其他鹼可溶性樹脂(A-2)藉由膠體滲透層析儀(Gel Permeation Chromatography,GPC)測定之聚苯乙烯換算的重量平均分子量較佳為3,000至30,000，更佳為5,000至25,000。 The other alkali-soluble resins (A-2) described above were passed through a gel permeation chromatography (Gel The polystyrene-equivalent weight average molecular weight measured by Permeation Chromatography (GPC) is preferably 3,000 to 30,000, more preferably 5,000 to 25,000.

基於鹼可溶性樹脂(A)之使用量為100重量份，其他鹼可溶性樹脂(A-2)之使用量為0重量份至70重量份，較佳為0重量份至40重量份，且更佳為0重量份至50重量份。 Based on 100 parts by weight of alkali-soluble resin (A), other alkali may be The use amount of the soluble resin (A-2) is 0 to 70 parts by weight, preferably 0 to 40 parts by weight, and more preferably 0 to 50 parts by weight.

根據本發明之具有乙烯性不飽和基之化合物(B)可包含具有一個乙烯性不飽和基之化合物(B-1)或具有二個以上(包含二個)之乙烯性不飽和基的化合物(B-2)。 The compound (B) having an ethylenically unsaturated group according to the present invention may contain The compound (B-1) having one ethylenically unsaturated group or the compound (B-2) having two or more ethylenically unsaturated groups.

該具有一個乙烯性不飽和基之化合物(B-1)的具體例可包含但不限於(甲基)丙烯醯胺[(meth)acrylamide]、(甲基)丙烯醯嗎啉、(甲基)丙烯酸-7-胺基-3,7-二甲基辛酯、異丁氧基甲基(甲基)丙烯醯胺、(甲基)丙烯酸異冰片基氧乙酯、(甲基)丙烯酸異冰片酯、(甲基)丙烯酸-2-乙基己酯、乙基二乙二醇(甲基)丙烯酸酯、第三辛基(甲基)丙烯醯胺、二丙酮(甲基)丙烯醯胺、(甲基)丙烯酸二甲基胺基乙酯、(甲基)丙烯酸十二烷基酯、(甲基)丙烯酸二環戊烯氧基乙酯、(甲基)丙烯酸二環戊烯酯、N,N-二甲基(甲基)丙烯醯胺、(甲基)丙烯酸四氯苯酯、(甲基)丙烯酸-2-四氯苯氧基乙酯、(甲基)丙烯酸四氫糠酯[tetrahydrofurfuryl(meth)acrylate]、(甲基)丙烯酸四溴苯酯、(甲基)丙烯酸-2-四溴苯氧基乙酯、(甲基)丙烯酸-2-三氯苯氧基乙酯、(甲基)丙烯酸三溴苯酯、(甲基)丙烯酸-2-三溴苯氧基乙酯、2-羥基-(甲基)丙烯酸乙酯、2-羥基-(甲基)丙烯酸丙酯、乙烯基己內醯胺、氮-乙烯基吡咯烷酮、(甲基)丙烯酸苯氧基乙酯、(甲基)丙烯酸五氯苯酯、(甲基)丙烯酸五溴苯酯、聚單(甲基)丙烯酸乙二酯、聚單(甲基)丙烯酸丙二酯或(甲基)丙烯酸冰片酯等之化合物。該具有一個乙烯性不飽和基之化合物(B-1)可單獨一種或混合複數種使用。 Specific examples of the compound (B-1) having one ethylenically unsaturated group may be Including but not limited to (meth) acrylamide, (meth) acryl morpholine, (meth) acrylic acid 7-amino-3,7-dimethyloctyl ester, isobutyl Oxymethyl (meth) acrylamide, isobornyl oxyethyl (meth) acrylate, isobornyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, ethyldiethyl Glycol (meth) acrylate, third octyl (meth) acrylamide, diacetone (meth) acrylamide, dimethylaminoethyl (meth) acrylate, decyl (meth) acrylate Dialkyl esters, dicyclopentenyloxyethyl (meth) acrylate, dicyclopentenyl (meth) acrylate, N, N-dimethyl (meth) acrylamide, (meth) acrylic acid Tetrachlorophenyl ester, 2-tetrachlorophenoxyethyl (meth) acrylate, tetrahydrofurfuryl (meth) acrylate, tetrabromophenyl (meth) acrylate, (formyl) (Propyl) -2-tetrabromophenoxyethyl acrylate, 2-trichlorophenoxyethyl (meth) acrylate, tribromophenyl (meth) acrylate, 2-tribromo (meth) acrylate Phenoxyethyl, 2-hydroxy- (meth) propylene Ethyl acetate, 2-hydroxy- (meth) acrylate, vinyl caprolactam, nitrogen-vinyl pyrrolidone, phenoxyethyl (meth) acrylate, pentachlorophenyl (meth) acrylate, Compounds such as pentabromophenyl (meth) acrylate, polyethylene (meth) acrylate, polypropylene (meth) acrylate, or bornyl (meth) acrylate. The compound (B-1) having one ethylenically unsaturated group may be used alone or in combination.

該具有二個以上(包含二個)之乙烯性不飽和基的化合物 (B-2)之具體例可包含但不限於乙二醇二(甲基)丙烯酸酯、二(甲基)丙烯酸二環戊烯酯、三乙二醇二(甲基)丙烯酸酯、四乙二醇二(甲基)丙烯酸酯、三(2-羥基乙基)異氰酸二(甲基)丙烯酸酯、三(2-羥基乙基)異氰酸三(甲基)丙烯酸酯、己內酯改質的三(2-羥基乙基)異氰酸三(甲基)丙烯酸酯、三(甲基)丙烯酸三羥甲基丙酯、環氧乙烷(ethylene oxide；EO)改質的三(甲基)丙烯酸三羥甲基丙酯、環氧丙烷(propylene oxide；PO)改質的三(甲基)丙烯酸三羥甲基丙酯、三丙二醇二(甲基)丙烯酸酯、新戊二醇二(甲基)丙烯酸酯、1,4-丁二醇二(甲基)丙烯酸酯、1,6-己二醇二(甲基)丙烯酸酯、季戊四醇三(甲基)丙烯酸酯、季戊四醇四(甲基)丙烯酸酯、聚酯二(甲基)丙烯酸酯、聚乙二醇二(甲基)丙烯酸酯、二季戊四醇六(甲基)丙烯酸酯、二季戊四醇五(甲基)丙烯酸酯、二季戊四醇四(甲基)丙烯酸酯、己內酯改質的二季戊四醇六(甲基)丙烯酸酯、己內酯改質的二季戊四醇五(甲基)丙烯酸酯、四(甲基)丙烯酸二三羥甲基丙酯[di(trimethylolpropane)tetra(meth)acrylate]、經環氧乙烷改質的雙酚A二(甲基)丙烯酸酯、經環氧丙烷改質的雙酚A二(甲基)丙烯酸酯、經環氧乙烷改質的氫化雙酚A二(甲基)丙烯酸酯、經環氧丙烷改質的氫化雙酚A二(甲基)丙烯酸酯、經環氧丙烷改質的甘油三(甲基)丙烯酸酯、經環氧乙烷改質的雙酚F二(甲基)丙烯酸酯、酚醛清漆聚縮水甘油醚(甲基)丙烯酸酯或上述化合物之任意組合。該具有二個以上(包含二個)之乙烯性不飽和基的化合物可單獨一種或混合複數種使用。 The compound having two or more ethylenically unsaturated groups Specific examples of (B-2) may include, but are not limited to, ethylene glycol di (meth) acrylate, dicyclopentene di (meth) acrylate, triethylene glycol di (meth) acrylate, tetraethyl Glycol di (meth) acrylate, tris (2-hydroxyethyl) isocyanate di (meth) acrylate, tris (2-hydroxyethyl) isocyanate tri (meth) acrylate, caprolactone Ester modified tris (2-hydroxyethyl) isocyanate tris (meth) acrylate, tris (meth) acrylate trimethylol propyl, ethylene oxide (EO) modified three Trimethylol propyl (meth) acrylate, propylene oxide (PO) modified trimethylol propyl (meth) acrylate, tripropylene glycol di (meth) acrylate, neopentyl Alcohol di (meth) acrylate, 1,4-butanediol di (meth) acrylate, 1,6-hexanediol di (meth) acrylate, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (Meth) acrylate, polyester di (meth) acrylate, polyethylene glycol di (meth) acrylate, dipentaerythritol hexa (meth) acrylate, dipentaerythritol penta (meth) acrylate, di Pentaerythritol tetra (meth) acrylate, Lactone modified dipentaerythritol hexa (meth) acrylate, caprolactone modified dipentaerythritol penta (meth) acrylate, di (trimethylolpropane) tetra (meth) acrylate (meth) acrylate], Bisphenol A di (meth) acrylate modified by ethylene oxide, Bisphenol A di (meth) acrylate modified by propylene oxide, Modified by ethylene oxide Hydrogenated bisphenol A di (meth) acrylate, propylene oxide-modified hydrogenated bisphenol A di (meth) acrylate, propylene oxide-modified glycerol tri (meth) acrylate, Ethylene oxide modified bisphenol F di (meth) acrylate, novolak polyglycidyl ether (meth) acrylate, or any combination of the above compounds. The compound having two or more ethylenically unsaturated groups may be used alone or in combination Plural uses.

該具有具有乙烯性不飽和基之化合物(B)的具體例可包含但不限於三丙烯酸三羥甲基丙酯、經環氧乙烷改質的三丙烯酸三羥甲基丙酯、經環氧丙烷改質的三丙烯酸三羥甲基丙酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇五丙烯酸酯、二季戊四醇四丙烯酸酯、己內酯改質的二季戊四醇六丙烯酸酯、四丙烯酸二三羥甲基丙酯、經環氧丙烷改質的甘油三丙烯酸酯或上述化合物之任意組合。 Specific examples of the compound (B) having an ethylenically unsaturated group may include Contains, but is not limited to, trimethylolpropyl triacrylate, trimethylolpropyl triacrylate modified with ethylene oxide, trimethylolpropyl triacrylate modified with propylene oxide, pentaerythritol triacrylate , Pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexaacrylate, ditrimethylolpropane tetraacrylate, propylene oxide Modified glycerol triacrylate or any combination of the above.

該具有乙烯性不飽和基之化合物(B)較佳可為三丙烯酸三羥甲基丙酯、二季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯或上述化合物之任意組合。 The compound (B) having an ethylenically unsaturated group is preferably triacrylic acid. Trimethylolpropyl, dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, or any combination of the foregoing compounds.

基於鹼可溶性樹脂(A)之使用量為100重量份，該具有乙烯性不飽和基之化合物(B)的使用量為10重量份至100重量份，較佳為12重量份至90重量份，且更佳為15重量份至80重量份。 Based on 100 parts by weight of the alkali-soluble resin (A), the The ethylenically unsaturated compound (B) is used in an amount of 10 to 100 parts by weight, preferably 12 to 90 parts by weight, and more preferably 15 to 80 parts by weight.

根據本發明之光起始劑(C)包含一具有式(C-I)所示結構之光起始劑(C-1)：

The photoinitiator (C) according to the present invention includes a photoinitiator (C-1) having a structure represented by the formula (CI):

其中，R₁、R₂、R₃、R₄、R₅、R₆、R₇及R₈彼此獨立地為氫、C₁-C₂₀烷基、

、COR₁₆、OR₁₇、鹵素、NO₂或

，或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇ 或R₇及R₈彼此獨立地為經

取代之C₂-C₁₀烯基或R₁ 及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為-(CH₂)_P-Y-(CH₂)_q-；或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為

但條件為R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇ 及R₈中至少一對係

R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、苯基、CN、OH、SH、C₁-C₄-烷氧基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、CN、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、CN、OR₁₇、SR₁₈、SOR₁₈、SO₂R₁₈或NR₁₉R₂₀，其中該等取代基OR₁₇、SR₁₈或NR₁₉R₂₀視情況經由基團R₁₇、R₁₈、R₁₉及/或R₂₀與萘基環中一個碳原子形成5員或6員環；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為

、COR₁₆或 NO₂；Y係O、S、NR₂₆或直接鍵；p係整數0、1、2或3；q係整數1、2或3；X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、COOR₁₇、OR₁₇、SR₁₈、CONR₁₉R₂₀、NR₁₉R₂₀、 PO(OC_kH_2k+1)₂或

或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、SO、SO₂、NR₂₆或CO，或係C₂-C₁₂烯基，其未經間雜或間雜有一或多個O、CO或NR₂₆，其中經間雜之C₂-C₂₀烷基及未經間雜或經間雜之C₂-C₁₂烯基未經取代或經一或多個鹵素取代；或R₁₃係C₄-C₈環烯基、C₂-C₁₂炔基或未經間雜或間雜有一或多個O、S、CO或NR₂₆之C₃-C₁₀環烷基；或R₁₃係苯基或萘基，其各未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀、

、COR₁₆、CN、 NO₂、鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O、S、CO或NR₂₆之C₂-C₂₀烷基；或其各經C₃-C₁₀環烷基或間雜有一或多個O、S、CO或NR₂₆之C₃-C₁₀環烷基取代； k係整數1至10；R₁₄係氫、C₃-C₈環烷基、C₂-C₅烯基、C₁-C₂₀烷氧基或C₁-C₂₀烷基，其未經取代或經一或多個鹵素、苯基、C₁-C₂₀烷基苯基或CN取代；或R₁₄係苯基或萘基，其各未經取代或經一或多個以下基團取代：C₁-C₆烷基、C₁-C₄鹵代烷基、鹵素、CN、OR₁₇、SR₁₈及/或NR₁₉R₂₀；或R₁₄係C₃-C₂₀雜芳基、C₁-C₈烷氧基、苄氧基或苯氧基，該苄氧基及苯氧基未經取代或經一或多個C₁-C₆烷基、C₁-C₄鹵代烷基及/或鹵素取代；R₁₅係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀、PO(OC_kH_2k+1)₂、SO-C₁-C₁₀烷基、 SO₂-C₁-C₁₀烷基、間雜有一或多個O、S或NR₂₆之C₂-C₂₀烷基；或其各經C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係氫、C₂-C₁₂烯基、未經間雜或間雜有一或多個O、CO或NR₂₆之C₃-C₈環烷基；或R₁₅係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OR₁₇、SR₁₈、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、NR₁₉R₂₀、COOR₁₇、 CONR₁₉R₂₀、PO(OC_kH_2k+1)₂、

、苯基；或該C₁-C₂₀烷基經苯基取代，該苯基經鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、OR₁₇、SR₁₈或NR₁₉R₂₀取代；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O、SO或SO₂，且該經間雜之C₂-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、OR₁₇、COOR₁₇、CONR₁₉R₂₀、苯基或經OR₁₇、SR₁₈或NR₁₉R₂₀取代之苯基；或R₁₅係C₂-C₂₀烷醯基或苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係未經取代或經一或多個OR₁₇取代之萘甲醯基或係C₃-C₁₄雜芳基羰基；或R₁₅係C₂-C₁₂烷氧基羰基，其未經間雜或間雜有一或多個O且該經間雜或未經間雜之C₂-C₁₂烷氧基羰基未經取代或經一或多個羥基取代；或R₁₅係苯氧基羰基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、C₁-C₄鹵代烷基、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係CN、CONR₁₉R₂₀、NO₂、C₁-C₄鹵代烷基、S(O)_m-C₁-C₆烷基、未經取代或經C₁-C₁₂烷基或SO₂-C₁-C₆烷基取代之S(O)_m-苯基；或R₁₅係SO₂O-苯基，其未經取代或經C₁-C₁₂烷基取代；或係二苯基膦醯基或二(C₁-C₄烷氧基)-膦醯基；m係1或2；R'₁₄具有針對R₁₄所給出含義中之一者；R'₁₅具有針對R₁₅所給出含義中之一者；X₁係O、S、SO或SO₂；X₂係O、CO、S或直接鍵；R₁₆係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O、S或NR₂₆之C₁-C₂₀烷基；或其各經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係氫、C₁-C₂₀烷基，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₁₆係C₂-C₁₂烷基，其間雜有一或多個O、S或NR₂₆；或R₁₆係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、 C₂-C₁₂烯基或C₃-C₈環烷基；或R₁₆係經SR₁₈取代之苯基，其中基團R₁₈表示鍵結至其中附接有COR₁₆之咔唑部分之苯基或萘基環的直接鍵；n係1至20；R₁₇係氫、苯基-C₁-C₃烷基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、OCO)-(C₂-C₄)烯基、O(CO)-苯基、(CO)OH、(CO)O(C₁-C₄烷基)、C₃-C₂₀環烷基、SO₂-(C₁-C₄鹵代烷基)、O(C₁-C₄鹵代烷基)或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O、S或NR₂₆；或R₁₇係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₁-C₈烷醯基、C₂-C₁₂烯基、C₃-C₆烯醯基或未經間雜或間雜有一或多個O、S、CO或NR₂₆之C₃-C₂₀環烷基；或R₁₇係C₁-C₈烷基-C₃-C₁₀環烷基，其未經間雜或間雜有一或多個O；或R₁₇係苯甲醯基，其未經取代或經一或多個C₁-C₆烷基、鹵素、OH或C₁-C₃烷氧基取代；或R₁₇係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、OH、C₁-C₁₂烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基-胺基或

或R₁₇形成鍵結至其上具有基團

或

之苯基或萘基環之一個碳原子之直接鍵或R₁₈係氫、C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基，其中C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基未經間雜或間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₂-C₄)烯基、O(CO)-(C₁-C₄烷基)、O(CO)-苯基或(CO)OR₁₇；或R₁₈係C₂-C₂₀烷基，其間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係(CH₂CH₂O)_nH、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₈烷醯基或C₃-C₆烯醯基；或R₁₈係苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、OH、C₁-C₄烷氧基或C₁-C₄烷基硫基；或R₁₈係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₁₂烷基、C₁-C₄鹵代烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基胺基、(CO)O(C₁-C₈烷基)、(CO)-C₁-C₈烷基、(CO)N(C₁-C₈烷基)₂或

R₁₉及R₂₀彼此獨立地為氫、C₁-C₂₀烷基、C₂-C₄羥基烷基、C₂-C₁₀烷氧基烷基、C₂-C₅烯基、C₃-C₂₀環烷基、苯基-C₁-C₃烷基、C₁-C₈烷醯基、C₁-C₈烷醯基氧基、C₃-C₁₂烯醯基、SO₂-(C₁-C₄鹵代烷基)或苯甲醯基；或R₁₉及R₂₀係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、C₁-C₁₂烷基、苯甲醯基或C₁-C₁₂烷氧基；或R₁₉及R₂₀與其所附接之N原子一起形成未經間雜或間雜有O、S或NR₁₇之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₂₀烷氧基、=O、OR₁₇、SR₁₈、NR₂₁R₂₂、(CO)R₂₃、 NO₂、鹵素、C₁-C₄-鹵代烷基、CN、苯基、

或 C₃-C₂₀環烷基，該C₃-C₂₀環烷基未經間雜或間雜有一或多個O、S、CO或NR₁₇；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、=O、OR₁₇、SR₁₈、NR₂₁R₂₂、 (CO)R₂₃、

、鹵素、NO₂、CN、苯基或C₃-C₂₀環烷基，該C₃-C₂₀環烷基未經間雜或間雜有一或多個O、S、CO或NR₁₇；R₂₁及R₂₂彼此獨立地為氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₃-C₁₀環烷基或苯基；或R₂₁及R₂₂與其所附接之N原子一起形成未經間雜或間雜有O、S或NR₂₆之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未稠合或該5員或6員飽和或不飽和環係與苯環稠合；R₂₃係氫、OH、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O、CO或NR₂₆之C₂-C₂₀烷基、未經間雜或間雜有O、S、CO或NR₂₆之C₃-C₂₀環烷基，或R₂₃係苯基、萘基、苯基-C₁-C₄烷基、OR₁₇、SR₁₈或NR₂₁R₂₂；R₂₄係(CO)OR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₄具有針對R₁₉及R₂₀所給出含義中之一者；R₂₅係COOR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₅具有針對R₁₇所給出含義中之一者；R₂₆係氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O或CO之C₂-C₂₀烷基；或係苯基-C₁-C₄烷基、未經間雜或間雜有一或多個O或CO之C₃-C₈環烷基；或係(CO)R₁₉；或係苯基，其未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈、NR₁₉R₂₀或

但條件為在該分子中存在至少一個基團

或

Among them, R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ -C ₂₀ alkyl,

, COR ₁₆ , OR ₁₇ , halogen, NO ₂ or

, Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independent of each other.

Substituted C ₂ -C ₁₀ alkenyl or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ independently of one another are -(CH ₂ ) _P -Y- (CH ₂ ) _q- ; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ independently of each other is

Provided that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, benzene Group, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ each other Independently unsubstituted phenyl or phenyl substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Optionally a 5- or 6-membered ring with a carbon atom in the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other as

, COR ₁₆ or NO ₂ ; Y is O, S, NR ₂₆ or direct bond; p is integer 0, 1, 2 or 3; q is integer 1, 2 or 3; X is CO or direct bond; R ₁₃ is C _1- C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ or

Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, SO, SO ₂ , NR ₂₆ or CO, or C ₂ -C ₁₂ alkenyl group, which is not interspersed with or A plurality of O, CO or NR ₂₆ in which an interspersed C ₂ -C ₂₀ alkyl group and an unsaturated or interspersed C ₂ -C ₁₂ alkenyl group are unsubstituted or substituted with one or more halogens; or R ₁₃ Is C ₄ -C ₈ cycloalkenyl, C ₂ -C ₁₂ alkynyl or C ₃ -C ₁₀ cycloalkyl without one or more O, S, CO or NR ₂₆ ; or R ₁₃ is benzene Or naphthyl, each unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ ,

_{_{, COR 16, CN, NO 2}} , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, S, CO or NR C ₂₆ of ₂ -C ₂₀ alkyl group; or via their respective C ₃ -C ₁₀ cycloalkyl, or interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; based integer k 1 to 10; R ₁₄ type hydrogen, C ₃ -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy, or C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted by one or more halogen, phenyl, C _1- C ₂₀ alkylphenyl or CN substituted; or R ₁₄ is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkane Group, halogen, CN, OR ₁₇ , SR ₁₈ and / or NR ₁₉ R ₂₀ ; or R ₁₄ is a C ₃ -C ₂₀ heteroaryl group, C ₁ -C ₈ alkoxy group, benzyloxy group or phenoxy group, the Benzyloxy and phenoxy are unsubstituted or substituted with one or more C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl and / or halogen; R ₁₅ is C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ 、 PO (OC _k H _{2k + 1} ) ₂ , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, C ₂ -C ₂₀ alkyl interspersed with one or more O, S or NR ₂₆ ; or each via C ₁ -C ₂₀ alkyl substitution, the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl , C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₈ cycloalkyl without one or more O, CO or NR ₂₆ ; or R ₁₅ is C ₁ -C ₂₀ alkyl, which is unsubstituted or unsubstituted Or more of the following groups substituted: halogen, OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ hetero Aryloxycarbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ ,

, Phenyl; or the C ₁ -C ₂₀ alkyl group is substituted with a phenyl group, the phenyl group is halogen, C ₁ -C ₂₀ alkyl group, C ₁ -C ₄ haloalkyl group, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Substituted; or R ₁₅ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, SO or SO ₂ , and the interspersed C ₂ -C ₂₀ alkyl group is unsubstituted or via one or more of the following groups Group substitution: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted with OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is a C ₂ -C ₂₀ alkylfluorenyl or benzyl Fluorenyl, which is unsubstituted or substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is unsubstituted or A naphthylmethyl group substituted with one or more OR ₁₇ or a C ₃ -C ₁₄ heteroarylcarbonyl group; or R ₁₅ is a C ₂ -C ₁₂ alkoxycarbonyl group, which is not interspersed or interspersed with one or more O And the C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted by one or more hydroxyl groups; or R ₁₅ is a phenoxycarbonyl group which is unsubstituted or substituted by one or more of the following Group substitution: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, phenyl, OR ₁₇ , S R ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S (O) _m -C ₁ -C ₆ alkyl, unsubstituted or C _1- C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl substituted S (O) _m -phenyl; or R ₁₅ is SO ₂ O-phenyl, either unsubstituted or C ₁ -C ₁₂ Alkyl substitution; or diphenylphosphinofluorenyl or bis (C ₁ -C ₄ alkoxy) -phosphinofluorenyl; m is 1 or 2; R _'14 has one of the meanings given for R ₁₄ ; R _'15 has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO or SO ₂ ; X ₂ is O, CO, S or a direct bond; R ₁₆ is C ₆ -C ₂₀ aromatic Or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl with one or more O, S or NR ₂₆ interspersed; or each of them substituted with one or more C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl Is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, phenyl , OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₁₆ is C ₂ -C ₁₂ alkyl, with one or more intervening in between O, S or NR ₂₆ ; or R ₁₆ series (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ Alkenyl or C ₃ -C ₈ cycloalkyl; or R ₁₆ is a phenyl substituted with SR ₁₈ , where the group R ₁₈ represents a phenyl or naphthyl ring bonded to the carbazole moiety to which COR ₁₆ is attached N is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), OCO)-(C ₂ -C ₄ ) alkenyl, O (CO) -phenyl, (CO) OH, (CO) O (C ₁ -C ₄ alkyl), C ₃ -C ₂₀ Cycloalkyl, SO _2- (C ₁ -C ₄ haloalkyl), O (C ₁ -C ₄ haloalkyl) or a C ₃ -C ₂₀ cycloalkyl group interspersed with one or more O; or R ₁₇ is a C ₂ -C ₂₀ alkyl group interspersed with one or more O, S or NR ₂₆ ; or R ₁₇ series (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₁ -C ₈ alkyl, C ₂ -C ₁₂ Alkenyl, C ₃ -C ₆ alkenyl or C ₃ -C ₂₀ cycloalkyl without one or more O, S, CO or NR ₂₆ ; or R ₁₇ is C ₁ -C ₈ alkyl -C ₃ -C ₁₀ cycloalkyl, which has one or more O unsubstituted or interspersed; or R ₁₇ is benzamyl, which is unsubstituted or has one or more C ₁ -C ₆ alkyl, halogen , OH or C ₁ -C ₃ alkoxy substitution; or R ₁₇ is phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl-C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, Phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amino or

Or R ₁₇ forms a bond to

or

A direct bond to a carbon atom of a phenyl or naphthyl ring or R ₁₈ hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl, or phenyl-C ₁ -C ₃ alkyl, where C _2- C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl without one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ Is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ ( CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl Or (CO) OR ₁₇ ; or R ₁₈ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ (CH ₂ CH ₂ O) _n H , (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₈ alkylfluorenyl or C ₃ -C ₆ alkenyl; or R ₁₈ benzamyl, It is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy, or C ₁ -C ₄ alkylthio; or R ₁₈ series phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following radicals: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ Substituted alkyl, C ₁ -C ₁₂ alkoxy, CN, NO _2, phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO) O (C ₁ -C ₈ alkyl), (CO) -C ₁ -C ₈ alkyl, (CO) N (C ₁ -C ₈ alkyl) ₂ or

R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C _3- C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl, SO _2- ( C ₁ -C ₄ haloalkyl) or benzamidine; or R ₁₉ and R ₂₀ are phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or has one or more of the following groups Substitution: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzamidine or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ with The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring that is not interspersed or interspersed with O, S, or NR ₁₇ , and the 5- or 6-membered saturated or unsaturated ring is unsubstituted or Or more of the following groups substituted: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ , NO ₂ , halogen, C ₁ -C ₄ -haloalkyl, CN, phenyl,

Or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl has one or more O, S, CO, or NR ₁₇ without interspersed or interspersed; or R ₁₉ and R ₂₀ with the N atom to which they are attached Together form a heteroaromatic ring system that is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ ,

, Halogen, NO ₂ , CN, phenyl, or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl has one or more O, S, CO, or NR ₁₇ uninterspersed or interspersed; R ₂₁ and R _{22 is} independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R ₂₂ together with the N atom to which they are attached Forms a 5- or 6-membered saturated or unsaturated ring without interspersed or interspersed O, S, or NR ₂₆ , and the 5- or 6-membered saturated or unsaturated ring is not fused or the 5- or 6-membered saturated or unsaturated ring saturated ring system is fused with a benzene ring; R ₂₃ type hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, cO or NR C ₂₆ alkoxy of ₂ -C ₂₀ , C ₃ -C ₂₀ cycloalkyl without meta or hetero, O, S, CO or NR ₂₆ , or R ₂₃ phenyl, naphthyl, phenyl-C ₁ -C ₄ alkyl, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ is (CO) OR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₄ has one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ is COOR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₅ has one of the meanings given for R ₁₇ ; R ₂₆ is hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl ,between C ₂ -C ₂₀ alkyl with one or more O or CO; or phenyl-C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkane without one or more O or CO Or (CO) R ₁₉ ; or phenyl, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or

Provided that at least one group is present in the molecule

or

該具有式(C-I)所示結構之光起始劑(C-1)之特徵在於其在咔唑部分上包含一或多個成環(annelated)不飽和環。換言之，R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈中至少一對係

The photoinitiator (C-1) having a structure represented by the formula (CI) is characterized in that it contains one or more annelated unsaturated rings on a carbazole moiety. In other words, at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R _7, or R ₇ and R ₈

在一實施例中，該具有式(C-I)所示結構之光起始劑(C-1)，該C₁-C₂₀烷基係直鏈或支鏈且係(例如)C₁-C₁₈-、C₁-C₄-、C₁-C₁₂-、C₁-C₈-、C₁-C₈-或C₁-C₄烷基或C₄-C₁₂-或C₄-C₈烷基。實例係甲基、乙基、丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、戊基、己基、庚基、2,4,4-三甲基戊基、2-乙基己基、辛基、壬基、癸基、十二基、十四基、十五基、十六基、十八基及二十基。C₁-C₆烷基具有與上文針對C₁-C₂₀烷基所給出相同之含義且具有最高相應C原子數。 In one embodiment, the photo-initiator (C-1) having a structure represented by formula (CI), the C ₁ -C ₂₀ alkyl is linear or branched and is, for example, C ₁ -C ₁₈ -, C ₁ -C _4- , C ₁ -C _12- , C ₁ -C _8- , C ₁ -C ₈ -or C ₁ -C ₄ alkyl or C ₄ -C ₁₂ -or C ₄ -C ₈ alkyl. Examples are methyl, ethyl, propyl, isopropyl, n-butyl, second butyl, isobutyl, third butyl, pentyl, hexyl, heptyl, 2,4,4-trimethyl Amyl, 2-ethylhexyl, octyl, nonyl, decyl, dodecyl, tetradecyl, pentadecyl, hexadecyl, octadecyl and icosyl. C ₁ -C ₆ alkyl has the same meaning as given above for C ₁ -C ₂₀ alkyl and has the highest corresponding number of C atoms.

該含有一或多個C-C多重鍵之未經取代或經取代之C₁-C₂₀烷基係指如下文所解釋之烯基。 Which contain one or more CC multiple bonds of a substituted or non-substituted alkyl group of C ₁ -C ₂₀ alkenyl group refers to the message as explained below.

該C₁-C₄鹵代烷基係如下文所定義經鹵素取代之如上文所定義C₁-C₄烷基。烷基基團係(例如)單-或多鹵化，直至所有H-原子替換為鹵素。其係(例如)C_nH_xHal_y，其中x+y=2n+1且Hal係鹵素，較佳為F。具體實例係氯甲基、三氯甲基、三氟甲基或2-溴丙基，尤其為三氟甲基或三氯甲基。C₂-C₄羥基烷基意指經一或兩個O原子取代之C₂-C₄烷基。烷基基團係直鏈或支鏈。實例係2-羥基乙基、1-羥基乙基、1-羥基丙基、2-羥基丙基、3-羥基丙基、1-羥基丁基、4-羥基丁基、2-羥基丁基、3-羥基丁基、2,3-二羥基丙基或2,4-二羥基丁基。 C₂-C₁₀烷氧基烷基係間雜有一個O原子之C₂-C₁₀烷基。C₂-C₁₀烷基具有與上文針對C₁-C₂₀烷基所給出相同之含義且具有最高相應C原子數。實例係甲氧基甲基、甲氧基乙基、甲氧基丙基、乙氧基甲基、乙氧基乙基、乙氧基丙基、丙氧基甲基、丙氧基乙基、丙氧基丙基。 The C ₁ -C ₄ haloalkyl group as defined below, based substituted with halogen or as hereinbefore defined C ₁ -C ₄ alkyl. Alkyl groups are, for example, mono- or polyhalogenated until all H-atoms are replaced with halogen. It is, for example, C _n H _x Hal _y , where x + y = 2n + 1 and Hal is halogen, preferably F. Specific examples are chloromethyl, trichloromethyl, trifluoromethyl or 2-bromopropyl, especially trifluoromethyl or trichloromethyl. C ₂ -C ₄ hydroxyalkyl means C ₂ -C ₄ alkyl substituted with one or two O atoms. Alkyl groups are straight or branched. Examples are 2-hydroxyethyl, 1-hydroxyethyl, 1-hydroxypropyl, 2-hydroxypropyl, 3-hydroxypropyl, 1-hydroxybutyl, 4-hydroxybutyl, 2-hydroxybutyl, 3-hydroxybutyl, 2,3-dihydroxypropyl or 2,4-dihydroxybutyl. C ₂ -C ₁₀ alkoxyalkyl lines interrupted by O atoms of a C ₂ -C ₁₀ alkyl. C ₂ -C ₁₀ alkyl has the same meaning as given above for C ₁ -C ₂₀ alkyl and has the highest corresponding number of C atoms. Examples are methoxymethyl, methoxyethyl, methoxypropyl, ethoxymethyl, ethoxyethyl, ethoxypropyl, propoxymethyl, propoxyethyl, Propoxypropyl.

該間雜有一或多個O、S、NR₂₆或CO之C₂-C₂₀烷基經O、S、NR₂₆或CO間雜(例如)1至9次、1至5次、1至3次或1次或2次。若存在一個以上間雜基團，則其為相同種類或不同。該兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。該等烷基係直鏈或支鏈。舉例而言，將存在以下結構單元：-CH₂-CH₂-O-CH₂CH₃、-[CH₂CH₂O]_y-CH₃(其中y=1至9)、-(CH₂-CH₂O)₇-CH₂CH₃、-CH₂-CH(CH₃)-O-CH₂-CH₂CH₃、-CH₂-CH(CH₃)-O-CH₂-CH₃、-CH₂-CH₂-S-CH₂CH₃、-CH₂-CH(CH₃)-NR₂₆-CH₂-CH₃、-CH₂-CH₂-COO-CH₂CH₃或-CH₂-CH(CH₃)-OCO-CH₂-CH₂CH₃。 The interrupted by one or more O, S, NR ₂₆ or CO of C ₂ -C ₂₀ alkyl is O, S, NR ₂₆ or CO interrupted (e.g.) 1-9 times, 1-5 times, 1-3 times or 1 or 2 times. If more than one meta group is present, they are the same kind or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, ethylidene). These alkyl groups are straight or branched. For example, the following structural units will exist: -CH ₂ -CH ₂ -O-CH ₂ CH ₃ ,-[CH ₂ CH ₂ O] _y -CH ₃ (where y = 1 to 9),-(CH _2- CH ₂ O) ₇ -CH ₂ CH ₃ , -CH ₂ -CH (CH ₃ ) -O-CH ₂ -CH ₂ CH ₃ , -CH ₂ -CH (CH ₃ ) -O-CH ₂ -CH ₃ ,- CH ₂ -CH ₂ -S-CH ₂ CH ₃ , -CH ₂ -CH (CH ₃ ) -NR ₂₆ -CH ₂ -CH ₃ , -CH ₂ -CH ₂ -COO-CH ₂ CH ₃ or -CH _2- CH (CH ₃ ) -OCO-CH ₂ -CH ₂ CH ₃ .

該C₃-C₁₀環烷基、C₃-C₁₀環烷基及C₃-C₈環烷基在本申請案上下文中應理解為至少包含一個環之烷基。其係(例如)環丙基、環丁基、環戊基、環己基、環辛基、戊基環戊基及環己基。C₃-C₁₀環烷基在本發明上下文中亦意欲涵蓋二環，換言之，橋聯環，例如

、

、

及相應環。其他實例係諸如

、

(例如

)或

等結構、以及橋聯或稠合環系統，舉例而言，該術語亦意欲涵蓋

等。 The C ₃ -C ₁₀ cycloalkyl, C ₃ -C ₁₀ cycloalkyl and C ₃ -C ₈ cycloalkyl are to be understood in the context of this application as alkyl groups containing at least one ring. It is, for example, cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclooctyl, pentylcyclopentyl and cyclohexyl. C ₃ -C ₁₀ cycloalkyl is also intended to encompass bicyclics in the context of the present invention, in other words, bridged rings such as

,

And the corresponding ring. Other examples are such as

,

(E.g

)or

Isostructure, and bridged or fused ring systems, the term is also intended to cover, for example

Wait.

該間雜有O、S、CO、NR₂₆之C₃-C₂₀環烷基具有上文給出之含義，其中烷基中至少一個CH₂-基團替換為O、S、CO或 NR₂₆。實例係諸如

(例如

或

等結構。 The C ₃ -C ₂₀ cycloalkyl group interspersed with O, S, CO, and NR ₂₆ has the meaning given above, wherein at least one CH ₂ -group in the alkyl group is replaced with O, S, CO, or NR ₂₆ . Examples are such as

(E.g

or

And other structures.

該C₁-C₈烷基-C₃-C₁₀環烷基係經一或多個具有最多8個碳原子之烷基取代的如上文所定義之C₃-C₁₀環烷基。實例係

等。 The C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl is a C ₃ -C ₁₀ cycloalkyl group, as defined above, substituted with one or more alkyl groups having up to 8 carbon atoms. Instance system

Wait.

該間雜有一或多個O之C₁-C₈烷基-C₃-C₁₀環烷基係經一或多個具有最多8個碳原子之烷基取代的如上文所定義之O間雜C₃- C₁₀環烷基。實例係

等。 The interrupted by one or more O of C ₁ -C ₈ alkyl -C ₃ -C ₁₀ cycloalkyl substituted with one or more alkyl system having up to 8 carbon atoms as defined above substituted with the C ₃ O stray -C ₁₀ cycloalkyl. Instance system

Wait.

該C₁-C₁₂烷氧基係經一個O原子取代之C₁-C₁₂烷基。C₁-C₁₂烷基具有與上文針對C₁-C₂₀烷基所給出相同之含義且具有最高相應C原子數。該C₁-C₄烷氧基係直鏈或支鏈，例如甲氧基、乙氧基、丙氧基、異丙氧基、正丁氧基、第二丁氧基、異丁氧基或第三丁氧基。C₁-C₈烷氧基及C₁-C₄-烷氧基具有與上文所述相同之含義且具有最高相應C原子數。 The C ₁ -C ₁₂ alkoxy substituted with the system via a O atom C ₁ -C ₁₂ alkyl. C ₁ -C ₁₂ alkyl has the same meaning as given above for C ₁ -C ₂₀ alkyl and has the highest corresponding number of C atoms. The C ₁ -C ₄ alkoxy is linear or branched, such as methoxy, ethoxy, propoxy, isopropoxy, n-butoxy, second butoxy, isobutoxy or Third butoxy. C ₁ -C ₈ alkoxy and C ₁ -C ₄ -alkoxy have the same meaning as described above and have the highest corresponding number of C atoms.

該C₁-C₁₂烷基硫基係經一個S原子取代之C₁-C₁₂烷基。C₁-C₂₀烷基具有與上文針對C₁-C₂₀烷基所給出相同之含義且具有最高相應C原子數。該C₁-C₄烷基硫基係直鏈或支鏈，例如甲基硫基、乙基硫基、丙基硫基、異丙基硫基、正丁基硫基、第二丁基硫基、異丁基硫基、第三丁基硫基。 The C ₁ -C ₁₂ substituted alkylthio system S atom of a C ₁ -C ₁₂ alkyl. C ₁ -C ₂₀ alkyl has the same meaning as given above for C ₁ -C ₂₀ alkyl and has the highest corresponding number of C atoms. The C ₁ -C ₄ alkylthio group is linear or branched, such as methylthio, ethylthio, propylthio, isopropylthio, n-butylthio, and second butylthio. Group, isobutylthio group, third butylthio group.

該苯基-C₁-C₃烷基係(例如)苄基、苯基乙基、α-甲基苄基或α,α-二甲基-苄基，尤其為苄基。 The phenyl-C ₁ -C ₃ alkyl system is, for example, benzyl, phenylethyl, α-methylbenzyl or α, α-dimethyl-benzyl, especially benzyl.

該苯基-C₁-C₃烷氧基係(例如)苄氧基、苯基乙氧基、α-甲基苄氧基或α,α-二甲基苄氧基，尤其為苄氧基。 The phenyl-C ₁ -C ₃ alkoxy group is, for example, benzyloxy, phenylethoxy, α-methylbenzyloxy or α, α-dimethylbenzyloxy, especially benzyloxy .

該C₂-C₁₂烯基係單-或多不飽和且係(例如)C₂-C₁₀-、C₂-C₈-、C₂-C₅-烯基，例如乙烯基、烯丙基、甲基烯丙基、1,1-二甲基烯丙基、1-丁烯基、3-丁烯基、2-丁烯基、1,3-戊二烯基、5-己烯基、7-辛烯基或十二烯基，尤其為烯丙基。C₂-C₅烯基具有與上文針對C₂-C₁₂烯基所給出相同之含義且具有最高相應C原子數。 The C ₂ -C ₁₂ alkenyl is mono- or polyunsaturated and is, for example, C ₂ -C _10- , C ₂ -C _8- , C ₂ -C ₅ -alkenyl, such as vinyl, allyl , Methylallyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl , 7-octenyl or dodecenyl, especially allyl. C ₂ -C ₅ alkenyl has the same meaning as given above for C ₂ -C ₁₂ alkenyl and has the highest corresponding number of C atoms.

該間雜有一或多個O、CO或NR₂₆之C₂-C₁₂烯基經O、S、NR₂₆或CO間雜(例如)1至9次、1至5次、1至3次或1次或2次。若存在一個以上間雜基團，則其為相同種類或不同。該兩個O原子由至少一個亞甲基、較佳至少兩個亞甲基(即伸乙基)隔開。該烯基係直鏈或支鏈且如上文所定義。舉例而言，可形成以下結構單元：-CH=CH-O-CH₂CH₃、-CH=CH-O-CH=CH₂等。 The interspersed one or more C ₂ -C ₁₂ alkenyl groups of O, CO or NR ₂₆ are interspersed with O, S, NR ₂₆ or CO (for example) 1 to 9 times, 1 to 5 times, 1 to 3 times or 1 time. Or 2 times. If more than one meta group is present, they are the same kind or different. The two O atoms are separated by at least one methylene group, preferably at least two methylene groups (ie, ethylidene). The alkenyl is straight or branched and is as defined above. For example, the following structural units may be formed: -CH = CH-O-CH ₂ CH ₃ , -CH = CH-O-CH = CH ₂ and the like.

該C₄-C₈環烯基具有一或多個雙鍵且係(例如)C₄-C₆-環烯基或C₆-C₈-環烯基。實例係環丁烯基、環戊烯基、環己烯基或環辛烯基，尤其為環戊烯基及環己烯基，較佳為環己烯基。 The C ₄ -C ₈ cycloalkenyl group having one or more double bonds and lines (e.g.) C ₄ -C ₆ - cycloalkenyl or C ₆ -C ₈ - cycloalkenyl. Examples are cyclobutenyl, cyclopentenyl, cyclohexenyl or cyclooctenyl, especially cyclopentenyl and cyclohexenyl, and preferably cyclohexenyl.

該C₃-C₆烯氧基係單或多不飽和且具有上文針對烯基所給出含義中之一者，且附接氧基具有最高相應C原子數。實例係烯丙氧基、甲基烯丙氧基、丁烯氧基、戊烯氧基、1,3-戊二烯氧基、5-己烯氧基。 The C ₃ -C ₆ alkenyloxy is mono- or polyunsaturated and has one of the meanings given above for alkenyl, and the attached oxygen has the highest corresponding number of C atoms. Examples are allyloxy, methallyloxy, butenyloxy, pentenyloxy, 1,3-pentadienyloxy, 5-hexenyloxy.

該C₂-C₁₂炔基係單或多不飽和直鏈或支鏈且係(例如)C₂-C₈-、C₂-C₆-或C₂-C₄炔基。實例係乙炔基、丙炔基、丁炔基、1- 丁炔基、3-丁炔基、2-丁炔基、戊炔基己炔基、2-己炔基、5-己炔基、辛炔基等。 The C ₂ -C ₁₂ alkynyl is a mono- or polyunsaturated straight or branched chain and is, for example, a C ₂ -C _8- , C ₂ -C ₆ -or C ₂ -C ₄ alkynyl. Examples are ethynyl, propynyl, butynyl, 1-butynyl, 3-butynyl, 2-butynyl, pentynylhexynyl, 2-hexynyl, 5-hexynyl, Octynyl and others.

該C₂-C₂₀烷醯基係直鏈或支鏈且係(例如)C₂-C₁₈-、 C₂-C₁₄-、C₂-C₁₂-、C₂-C₈-、C₂-C₆-或C₂-C₄烷醯基或C₄-C₁₂-或C₄-C₈烷醯基。實例係乙醯基、丙醯基、丁醯基、異丁醯基、戊醯基、己醯基、庚醯基、辛醯基、壬醯基、癸醯基、十二醯基、十四醯基、十五醯基、十六醯基、十八醯基、二十醯基，較佳為乙醯基。C₁-C₈烷醯基具有與上文針對C₂-C₂₀烷醯基所給出相同之含義且具有最高相應C原子數。 The C ₂ -C ₂₀ alkylfluorenyl is linear or branched and is, for example, C ₂ -C _18- , C ₂ -C _14- , C ₂ -C _12- , C ₂ -C _8- , C ₂ -C ₆ -or C ₂ -C ₄ alkylfluorenyl or C ₄ -C ₁₂ -or C ₄ -C ₈ alkylfluorenyl. Examples are ethenyl, propionyl, butyryl, isobutyryl, pentyl, hexyl, heptyl, octyl, nonyl, decyl, dodecyl, tetradecyl, pentadecyl Base, hexadecyl, octadecyl, and icosyl, preferably ethenyl. C ₁ -C ₈ alkylfluorenyl has the same meaning as given above for C ₂ -C ₂₀ alkylfluorenyl and has the highest corresponding number of C atoms.

該C₂-C₁₂烷氧基羰基係直鏈或支鏈且係(例如)甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基、異丁氧基羰基、1,1-二甲基丙氧基羰基、戊氧基羰基、己氧基羰基、庚氧基羰基、辛氧基羰基、壬氧基羰基、癸氧基羰基或十二氧基羰基，尤其為甲氧基羰基、乙氧基羰基、丙氧基羰基、正丁氧基羰基或異丁氧基羰基，較佳為甲氧基羰基。 The C ₂ -C ₁₂ alkoxycarbonyl is linear or branched and is, for example, a methoxycarbonyl, ethoxycarbonyl, propoxycarbonyl, n-butoxycarbonyl, isobutoxycarbonyl, 1, 1-dimethylpropoxycarbonyl, pentoxycarbonyl, hexyloxycarbonyl, heptyloxycarbonyl, octyloxycarbonyl, nonoxycarbonyl, decoxycarbonyl or dodecyloxycarbonyl, especially methoxy A carbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, an n-butoxycarbonyl group, or an isobutoxycarbonyl group is preferred, and a methoxycarbonyl group is preferred.

該間雜有一或多個O之C₂-C₁₂烷氧基羰基係直鏈或支鏈。兩個O原子由至少兩個亞甲基(即伸乙基)隔開。該經間雜之烷氧基羰基未經取代或經一或多個羥基取代。該C₆-C₂₀芳氧基羰基係(例如)苯基氧基羰基[=苯基-O-(CO)-]、萘氧基羰基、蒽氧基羰基等。C₅-C₂₀雜芳氧基羰基係C₅-C₂₀雜芳基-O-CO-。 The C ₂ -C ₁₂ alkoxycarbonyl group having one or more O atoms is linear or branched. The two O atoms are separated by at least two methylene (ie, ethylene). The meta heteroalkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups. The C ₆ -C ₂₀ aryloxycarbonyl group is, for example, a phenyloxycarbonyl group [= phenyl-O- (CO)-], a naphthyloxycarbonyl group, an anthryloxycarbonyl group, and the like. C ₅ -C ₂₀ heteroaryloxycarbonyl is C ₅ -C ₂₀ heteroaryl-O-CO-.

該C₃-C₁₀環烷基羰基係C₃-C₁₀環烷基-CO-，其中環烷基具有上文所示含義中之一者且具有最高相應C原子數。該間雜有一或多個O、S、CO、NR₂₆之C₂-C₁₀環烷基羰基係指經間雜環烷基-CO-，其中經間雜環烷基係如上文所述所定義。 The C ₃ -C ₁₀ cycloalkylcarbonyl group is C ₃ -C ₁₀ cycloalkyl-CO-, wherein the cycloalkyl group has one of the meanings shown above and has the highest corresponding number of C atoms. The C ₂ -C ₁₀ cycloalkylcarbonyl group interspersed with one or more O, S, CO, and NR ₂₆ refers to a metacycloalkyl-CO- group, wherein the metacycloalkyl group is as defined above.

該C₃-C₁₀環烷氧基羰基係C₃-C₁₀環烷基-O-(CO)-，其中環烷基具有上文所示含義中之一者且具有最高相應C原子數。間雜有一或多個O、S、CO、NR₂₆之C₃-C₁₀環烷氧基羰基係指經間雜環烷基-O-(CO)-，其中經間雜環烷基係如上文所述所定義。 The C ₃ -C ₁₀ cycloalkoxycarbonyl group is C ₃ -C ₁₀ cycloalkyl-O- (CO)-, wherein the cycloalkyl group has one of the meanings shown above and has the highest corresponding number of C atoms. The C ₃ -C ₁₀ cycloalkoxycarbonyl group interspersed with one or more O, S, CO, NR ₂₆ refers to metacycloalkyl-O- (CO)-, wherein the metacycloalkyl group is as described above As defined.

該C₁-C₂₀烷基苯基係指經一或多個烷基取代之苯基，其中C原子之總和最多為20。 The C ₁ -C ₂₀ alkylphenyl group refers to a phenyl group substituted with one or more alkyl groups, wherein the total of C atoms is at most 20.

該C₆-C₂₀芳基係(例如)苯基、萘基、蒽基、菲基、芘基、

基、并四苯基、聯伸三苯基等，尤其為苯基或萘基，較佳為苯基。萘基係1-萘基或2-萘基。 The C ₆ -C ₂₀ aryl system is, for example, phenyl, naphthyl, anthracenyl, phenanthryl, fluorenyl,

Phenyl, tetracrylphenyl, triphenylene, etc., especially phenyl or naphthyl, preferably phenyl. Naphthyl is 1-naphthyl or 2-naphthyl.

在本發明上下文中，該C₃-C₂₀雜芳基意欲包含單環或多環系統，例如稠合環系統。實例係噻吩基、苯并[b]噻吩基、萘并[2,3-b]噻吩基、噻蒽基、呋喃基、二苯并呋喃基、

唏基、呫噸基、噻噸基、啡噁噻基、吡咯基、咪唑基、吡唑基、吡嗪基、嘧啶基、噠嗪基、中氮茚基、異吲哚基、吲哚基、吲唑基、嘌呤基、喹嗪基、異喹啉基、喹啉基、酞嗪基、萘啶基、喹噁啉基、喹唑啉基、

啉基、喋啶基、咔唑基、β-哢啉基、菲啶基、吖啶基、萘嵌間二氮苯基、菲咯啉基、吩嗪基、異噻唑基、吩噻嗪基、異噁唑基、呋呫基、吩噁基、7-菲基、蒽醌-2-基(=9,10-二側氧基-9,10-二氫蒽-2-基)、3-苯并[b]噻吩基、5-苯并[b]噻吩基、2-苯并[b]噻吩基、4-二苯并呋喃基、4,7-二苯并呋喃基、4-甲基-7-二苯并呋喃基、2-呫噸基、8-甲基-2-呫噸基、3-呫噸基、2-啡噁噻基、2,7-啡噁噻基、2-吡咯基、3-吡咯基、5-甲基-3-吡咯基、2-咪唑基、4-咪唑基、5-咪唑基、2-甲基-4-咪唑基、2-乙基-4-咪唑基、2-乙基-5-咪唑基、1H-四唑-5-基、3-吡唑基、1-甲基-3-吡唑基、1-丙基-4-吡唑基、2-吡嗪基、5,6-二甲基-2-吡嗪基、2-中氮茚基、2-甲基-3-異吲哚基、2-甲基-1-異吲哚基、1-甲基-2-吲哚基、1-甲基-3-吲哚基、1,5-二甲基-2-吲哚基、1-甲基-3-吲唑基、2,7-二甲基-8-嘌呤基、2-甲氧基-7-甲基-8-嘌呤基、2-喹嗪基、3-異喹啉基、6-異喹啉基、7-異喹啉基、3-甲氧基-6-異喹啉基、2-喹啉基、 6-喹啉基、7-喹啉基、2-甲氧基-3-喹啉基、2-甲氧基-6-喹啉基、6-酞嗪基、7-酞嗪基、1-甲氧基-6-酞嗪基、1,4-二甲氧基-6-酞嗪基、1,8-萘啶-2-基、2-喹噁啉基、6-喹噁啉基、2,3-二甲基-6-喹噁啉基、2,3-二甲氧基-6-喹噁啉基、2-喹唑啉基、7-喹唑啉基、2-二甲基胺基-6-喹唑啉基、3-

啉基、6-

啉基、7-

啉基、3-甲氧基-7-

啉基、2-喋啶基、6-喋啶基、7-喋啶基、6,7-二甲氧基-2-喋啶基、2-咔唑基、3-咔唑基、9-甲基-2-咔唑基、9-甲基-3-咔唑基、β-哢啉-3-基、1-甲基-β-哢啉-3-基、1-甲基-β-哢啉-6-基、3-菲啶基、2-吖啶基、3-吖啶基、2-萘嵌間二氮苯基、1-甲基-5-萘嵌間二氮苯基、5-菲咯啉基、6-菲咯啉基、1-吩嗪基、2-吩嗪基、3-異噻唑基、4-異噻唑基、5-異噻唑基、2-吩噻嗪基、3-吩噻嗪基、10-甲基-3-吩噻嗪基、3-異噁唑基、4-異噁唑基、5-異噁唑基、4-甲基-3-呋呫基、2-吩噁基、10-甲基-2-吩噁基等。 In the context of the present invention, the C ₃ -C ₂₀ heteroaryl is intended to include a monocyclic or polycyclic system, such as a fused ring system. Examples are thienyl, benzo [b] thienyl, naphtho [2,3-b] thienyl, thienyl, furanyl, dibenzofuranyl,

Fluorenyl, xanthenyl, thioxanthenyl, phenoxathiol, pyrrolyl, imidazolyl, pyrazolyl, pyrazinyl, pyrimidinyl, pyridazinyl, midindenyl, isoindolyl, indolyl , Indazolyl, purinyl, quinazinyl, isoquinolinyl, quinolinyl, phthalazinyl, naphthyridinyl, quinoxalinyl, quinazolinyl,

Porphyrinyl, pyridinyl, carbazolyl, β-pyridinyl, phenanthridyl, acridinyl, naphthylazine, phenanthroline, phenazinyl, isothiazolyl, phenothiazinyl , Isoxazolyl, furfuryl, phenoxal, 7-phenanthryl, anthraquinone-2-yl (= 9,10-dioxo-9,10-dihydroanthracen-2-yl), 3 -Benzo [b] thienyl, 5-benzo [b] thienyl, 2-benzo [b] thienyl, 4-dibenzofuryl, 4,7-dibenzofuryl, 4-methyl -7-dibenzofuranyl, 2-xanthenyl, 8-methyl-2-xanthenyl, 3-xanthenyl, 2-phenoxanthenyl, 2,7-phenoxanthenyl, 2 -Pyrrolyl, 3-pyrrolyl, 5-methyl-3-pyrrolyl, 2-imidazolyl, 4-imidazolyl, 5-imidazolyl, 2-methyl-4-imidazolyl, 2-ethyl-4 -Imidazolyl, 2-ethyl-5-imidazolyl, 1H-tetrazol-5-yl, 3-pyrazolyl, 1-methyl-3-pyrazolyl, 1-propyl-4-pyrazolyl , 2-pyrazinyl, 5,6-dimethyl-2-pyrazinyl, 2-indolizinyl, 2-methyl-3-isoindolyl, 2-methyl-1-isoindole , 1-methyl-2-indolyl, 1-methyl-3-indolyl, 1,5-dimethyl-2-indolyl, 1-methyl-3-indazolyl, 2 , 7-dimethyl-8-purinyl, 2-methoxy-7-methyl-8-purine , 2-quinazinyl, 3-isoquinolinyl, 6-isoquinolinyl, 7-isoquinolinyl, 3-methoxy-6-isoquinolinyl, 2-quinolinyl, 6- Quinolinyl, 7-quinolinyl, 2-methoxy-3-quinolinyl, 2-methoxy-6-quinolinyl, 6-phthalazinyl, 7-phthalazinyl, 1-methoxy 6-phthalazinyl, 1,4-dimethoxy-6-phthalazinyl, 1,8-naphthyridin-2-yl, 2-quinoxaline, 6-quinoxaline, 2, 3-dimethyl-6-quinoxaline group, 2,3-dimethoxy-6-quinoxaline group, 2-quinazolinyl group, 7-quinazolinyl group, 2-dimethylamino group -6-quinazolinyl, 3-

Phenyl, 6-

Phenyl, 7-

Phenyl, 3-methoxy-7-

Phenyl, 2-pyridinyl, 6-pyridinyl, 7-pyridinyl, 6,7-dimethoxy-2-pyridinyl, 2-carbazolyl, 3-carbazolyl, 9- Methyl-2-carbazolyl, 9-methyl-3-carbazolyl, β-fluorin-3-yl, 1-methyl-β-fluorin-3-yl, 1-methyl-β- Perylene-6-yl, 3-phenanthridyl, 2-acridyl, 3-acridyl, 2-naphthylazine, 1-methyl-5-naphthylazine, 5-phenanthroline, 6-phenanthroline, 1-phenazinyl, 2-phenazinyl, 3-isothiazolyl, 4-isothiazolyl, 5-isothiazolyl, 2-phenthiazinyl , 3-phenothiazinyl, 10-methyl-3-phenothiazinyl, 3-isooxazolyl, 4-isooxazolyl, 5-isooxazolyl, 4-methyl-3-furanyl Group, 2-phenoxa group, 10-methyl-2-phenoxa group and the like.

該C₃-C₂₀雜芳基尤其為噻吩基、苯并[b]噻吩基、噻蒽基、噻噸基、1-甲基-2-吲哚基或1-甲基-3-吲哚基；尤其為噻吩基。 The C ₃ -C ₂₀ heteroaryl group is especially thienyl, benzo [b] thienyl, thiathranyl, thioxanthenyl, 1-methyl-2-indolyl or 1-methyl-3-indole Radical; especially thienyl.

該C₄-C₂₀雜芳基羰基係經由CO基團連接至分子其餘部分之如上文所定義C₃-C₂₀雜芳基。 The C ₄ -C ₂₀ heteroarylcarbonyl group is a C ₃ -C ₂₀ heteroaryl group, as defined above, attached to the rest of the molecule via a CO group.

該經取代之芳基(苯基、萘基、C₆-C₂₀芳基或C₅-C₂₀雜芳基)係分別經1至7次、1至6次或1至4次、尤其1次、2次或3次取代。顯而易見，所定義芳基不能具有比芳基環處之自由位置為多之取代基。 The substituted aryl (phenyl, naphthyl, C ₆ -C ₂₀ aryl or C ₅ -C ₂₀ heteroaryl) is 1 to 7 times, 1 to 6 times or 1 to 4 times, especially 1 Substitutions, 2 or 3 substitutions. Obviously, the defined aryl group cannot have more substituents than there are free positions at the aryl ring.

該苯基環上之取代基較佳在苯基環上之位置4中或呈3,4-、3,4,5-、2,6-、2,4-或2,4,6-組態。 The substituent on the phenyl ring is preferably in position 4 on the phenyl ring or in the 3,4-, 3,4,5-, 2,6-, 2,4-, or 2,4,6-group. state.

該間雜1次或多次之經間雜基團間雜(例如)1至19次、1至15次、1至12次、1至9次、1至7次、1至5次、1至4次、1至3次或1次或2次(顯而易見，間雜原子數取決於擬間雜之C原子數)。經1次或多次取代之經取代基團具有(例如)1至7個、1至5個、1至4個、1至3個或1個或2個相同或不同取代基。 This interstitial is interspersed one or more times with interstitial groups (for example) 1 to 19 times, 1 to 15 times, 1 to 12 times, 1 to 9 times, 1 to 7 times, 1 to 5 times, 1 to 4 times , 1 to 3 times or 1 or 2 times (obviously, the number of inter-hetero atoms depends on the number of C atoms to be inter-hetero-hetero). After 1 A substituted group that is substituted one or more times has, for example, 1 to 7, 1 to 5, 1 to 4, 1 to 3, or 1 or 2 of the same or different substituents.

該經一或多個所定義取代基取代之基團意欲具有一個取代基或多個如所給出相同或不同定義之取代基。鹵素係氟、氯、溴及碘，尤其為氟、氯及溴，較佳為氟及氯。若R₁及R₂、R₂及R₃、R₃及 R₄或R₅及Re、R₆及R₇、R₇及R₈彼此獨立地共同為

；則形成(例如)以下結構(Ia)-I(i)：

亦或(例如) 諸如(Id)-(Ih)等結構：

The group substituted with one or more defined substituents is intended to have one substituent or multiple substituents with the same or different definitions as given. Halogen is fluorine, chlorine, bromine and iodine, especially fluorine, chlorine and bromine, and fluorine and chlorine are preferred. If R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ or R ₅ and Re, R ₆ and R ₇ , R ₇ and R ₈ are independently common to each other as

; Then, for example, the following structures (Ia) -I (i) are formed:

Or, for example, structures such as (Id)-(Ih):

較佳者係結構(Ia)。 The better one is structure (Ia).

該具有式(C-I)所示結構之光起始劑(C-1)之特徵在於至少一個苯基環與咔唑部分稠合以形成「萘基」環。亦即上述結構中之一者係以式(C-I)所示結構給出。 The photoinitiator (C-1) having a structure represented by the formula (C-I) is characterized in that at least one phenyl ring is fused with a carbazole moiety to form a "naphthyl" ring. That is, one of the above structures is given by the structure shown by formula (C-I).

若R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為-(CH₂)_P-Y-(CH₂)_q-，則形成(例如)諸如

等結構。 If R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R _7, or R ₇ and R ₈ independently of each other are-(CH ₂ ) _P -Y- (CH ₂ ) _q- , then forming (for example) such as

And other structures.

若苯基或萘基環上之取代基OR₁₇、SR₁₈、SOR₁₈、SO₂R₁₈或NR₁₉R₂₀經由基團R₁₇、R₁₈、R₁₉及/或R₂₀與萘基環之一個碳原子形成5員或6員環，則獲得包含3個或更多個環(包括萘基環)之結構。 If the substituents OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ on the phenyl or naphthyl ring are via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ and the naphthyl ring When a carbon atom forms a 5-membered or 6-membered ring, a structure including 3 or more rings (including a naphthyl ring) is obtained.

實例係

等。 Instance system

Wait.

若R₁₇形成鍵結至其上具有基團

或

之苯基或萘基環之一個碳原子之直接鍵，則形成(例如)諸如

等結構。 If R ₁₇ forms a bond to a group

or

A direct bond to a carbon atom of a phenyl or naphthyl ring forms, for example, such as

And other structures.

若R₁₆係經SR₁₈取代之苯基，其中基團R₁₉表示鍵結至其中附接有COR₁₆基團之咔唑部分之苯基或萘基環的直接鍵，則形成 (例如)諸如

等結構。亦即，若R₁₆係經SR₁₈取代之苯基，其中基團R₁₈表示鍵結至其中附接有COR₁₆基團之咔唑部分之苯基或萘基環的直接鍵，則噻噸基部分與咔唑部分之一個苯基或萘基環一起形成。 If R ₁₆ is a phenyl substituted with SR ₁₈ , where the group R ₁₉ represents a direct bond to a phenyl or naphthyl ring bonded to the carbazole moiety to which the COR ₁₆ group is attached, then, for example, such as

And other structures. That is, if R ₁₆ is a phenyl substituted with SR ₁₈ , where the group R ₁₈ represents a direct bond to a phenyl or naphthyl ring bonded to a carbazole moiety having a COR ₁₆ group attached thereto, then thioxanthene The base moiety is formed with a phenyl or naphthyl ring of the carbazole moiety.

若R₁₉及R₂₀與其所附接之N原子一起形成視情況間雜有O、S或NR₁₇之5員或6員飽和或不飽和環，則形成飽和或不飽和環，例如氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉。較佳地，若R₁₉及R₂₀與其所附接之N原子一起形成視情況間雜有O、S或NR₁₇之5員或6員飽和或不飽和環，則形成未經間雜或間雜有O或NR₁₇、尤其O之5員或6員飽和環。 If R ₁₉ and R ₂₀ together with the N atom to which they are attached form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR ₁₇ , then a saturated or unsaturated ring is formed, such as aziridine, Pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine. Preferably, R ₁₉ and R ₂₀ when appended thereto together with the N atom to which optionally is interrupted by O, S or NR 5, or 6 of ₁₇ membered saturated or unsaturated ring, is formed without interrupted or is interrupted by O Or NR ₁₇ , especially O's 5 or 6 member saturated ring.

若R₂₁及R₂₂與其所附接之N原子一起形成視情況間雜有 O、S或NR₂₆之5員或6員飽和或不飽和環，且苯環視情況與該飽和或不飽和環稠合，則形成飽和或不飽和環，例如氮丙啶、吡咯、噻唑、吡咯啶、噁唑、吡啶、1,3-二嗪、1,2-二嗪、六氫吡啶或嗎啉或相應成環環(例如

)等。 If R ₂₁ and R _{22 together} with the attached N atom form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR ₂₆ , and the benzene ring is fused with the saturated or unsaturated ring as appropriate , Then form a saturated or unsaturated ring, such as aziridine, pyrrole, thiazole, pyrrolidine, oxazole, pyridine, 1,3-diazine, 1,2-diazine, hexahydropyridine or morpholine or the corresponding ring Ring (e.g.

)Wait.

若R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，則該環系統意欲包含一個以上環(例如2個或3個環)以及來自相同種類或不同種類之一個或一個以上雜原子。適宜雜原子係(例如)N、S、O或P、尤其N、S或O。實例係咔唑、吲哚、異吲哚、吲唑、嘌呤、異喹啉、喹啉、哢啉、吩噻嗪等。 If R ₁₉ and R ₂₀ together with the N atom to which they are attached form a heteroaromatic ring system, the ring system is intended to include more than one ring (e.g., 2 or 3 rings) and one or one from the same species or different species Above heteroatoms. Suitable heteroatom systems are, for example, N, S, O or P, especially N, S or O. Examples are carbazole, indole, isoindole, indazole, purine, isoquinoline, quinoline, oxoline, phenothiazine, and the like.

術語「及/或」或「或/及」在本發明上下文中意欲表達不僅可存在所定義替代物(取代基)中之一者，而且可存在總共若干所定義替代物(取代基)，即不同替代物(取代基)之混合物。 The term "and / or" or "or / and" is intended to mean in the context of the present invention Not only may one of the defined substitutes (substituents) exist, but also a total of several defined substitutes (substituents), that is, a mixture of different substitutes (substituents).

術語「至少」意欲定義一者或一者以上，例如一者或兩者或三者、較佳一者或兩者。 The term "at least" is intended to define one or more, such as one or two One or three, preferably one or both.

術語「視情況經取代」意指其提及之基團未經取代或經取代。 The term `` optionally substituted '' means that the group to which it refers is unsubstituted or substituted To replace.

術語「視情況經間雜」意指其提及之基團未經雜或經間雜。 The term `` as the case may be '' means that the group to which it refers is not miscellaneous.

在整個本說明書及下文之申請專利範圍中，除非上下文另有要求，否則詞語「包含(comprise)」或變體(例如，「comprises」或「comprising」)應理解為暗指包括所述整數或步驟或整數群組或步驟群組，但並不排除任一其他整數或步驟或整數群組或步驟群組。術語「(甲基)丙烯酸酯」在本申請案上下文中意欲指丙烯酸酯以及相應甲基丙烯酸酯。 Throughout this specification and the patentable scope below, unless the context Otherwise required, otherwise the word "comprise" or variants (e.g. "comprises" or "comprising") should be understood as implying that the integer or step or group of integers or group of steps is included, but not excluded Any other integer or step or group of integers or group of steps. The term "(meth) acrylate" in the context of this application is intended to mean acrylate and corresponding Methacrylate.

本發明上下文中用於本發明化合物之文字中所示較佳者意欲指所有申請專利範圍類別，亦即亦指針對組合物、用途、方法、彩色濾光片等之申請專利範圍。 The preferred ones shown in the text used for the compounds of the present invention in the context of the present invention are intended to refer to all categories of patent application scope, that is, to the patent application scope of compositions, uses, methods, color filters, and the like.

該具有式(C-I)所示結構之光起始劑(C-1)係藉由文獻中所述方法來製備，例如藉由在以下條件下使相應肟與醯鹵、尤其氯化物或酸酐反應：在惰性溶劑(例如第三丁基甲基醚、四氫呋喃(THF)或二甲基甲醯胺)中，在鹼(例如三乙胺或吡啶)存在時，或在鹼性溶劑(例如吡啶)中。在下文中作為實例，闡述式Ia化合物之製備，其中R₇係肟酯基團且X係直接鍵係[自適當肟開始實施化合物(Ib)-(Ih)之反應]：

The photoinitiator (C-1) having a structure represented by the formula (CI) is prepared by a method described in the literature, for example, by reacting a corresponding oxime with a halogen, especially a chloride or an acid anhydride under the following conditions : In an inert solvent (such as third butyl methyl ether, tetrahydrofuran (THF) or dimethylformamide), in the presence of a base (such as triethylamine or pyridine), or in a basic solvent (such as pyridine). In the following, as an example, the preparation of a compound of formula Ia is illustrated, in which R ₇ is an oxime ester group and X is a direct bond system [the reaction of compounds (Ib)-(Ih) is carried out starting from an appropriate oxime]:

R₁、R₂、R₅、R₆、R₈、R₁₃、R₁₄及R₁₅係如上文所定義，Hal意指鹵素原子、尤其Cl。 R ₁ , R ₂ , R ₅ , R ₆ , R ₈ , R ₁₃ , R ₁₄ and R ₁₅ are as defined above, and Hal means a halogen atom, especially Cl.

R₁₄較佳為甲基。 R _{14 is} preferably methyl.

此等反應為彼等熟習此項技術者所熟知，且通常在-15℃至+50℃、較佳0至25℃之溫度下實施。 These reactions are well known to those skilled in the art and are usually carried out at a temperature of -15 ° C to + 50 ° C, preferably 0 to 25 ° C.

當X係CO時，相應肟係藉由用亞硝酸烷基酯(例如亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯)將亞甲基亞硝化來合成。然後，酯化係在與上文所述相同之條件下實施：

When X is CO, the corresponding oxime is obtained by dividing the methylene methylene group with Nitrification to synthesize. The esterification is then carried out under the same conditions as described above:

因此，本發明之標的亦係藉由在鹼或鹼之混合物存在下使相應肟化合物與式(a)之醯鹵或式(b)之酸酐反應來製備如上文所定義該具有式(C-I)所示結構之光起始劑(C-1)之方法。 Therefore, the object of the present invention is also to prepare the formula (CI) having the formula (CI) as defined above by reacting the corresponding oxime compound with a halogen halide of formula (a) or an acid anhydride of formula (b) in the presence of a base or a mixture of bases. Method of photoinitiator (C-1) of the structure shown.

其中Hal係鹵素、尤其Cl，且R₁₄係如上文所定義。 Wherein Hal is halogen, especially Cl, and R ₁₄ is as defined above.

所需作為起始材料之肟可藉由標準化學教材(例如J.March,Advanced Organic Chemistry，第4版，Wiley Interscience，1992)或專著(例如S.R.Sandler & W.Karo,Organic functional group preparations，第3卷，Academic Press)中所述多種方法來獲得。 The oxime required as a starting material can be obtained through standard chemistry textbooks (such as J. March, Advanced Organic Chemistry, 4th Edition, Wiley Interscience, 1992) or monographs (such as SRSandler & W. Karo, Organic functional group preparations, Section 3, Academic Press).

最便利的一種方法係(例如)在極性溶劑(例如二甲基乙醯胺(DMA)、DMA水溶液、乙醇或乙醇水溶液)中使醛或酮與羥胺或其鹽反應。在此情形下，添加諸如乙酸鈉或吡啶等鹼來控制反應混合物之pH。眾所周知，反應速度具有pH依賴性，且可在開始時或在反應期間連續地添加鹼。亦可使用諸如吡啶等鹼性溶劑作為鹼及/或溶劑或共溶劑。反應溫度通常為室溫至混合物之回流溫度，一般為約20℃至120℃。 One of the most convenient methods is, for example, reacting an aldehyde or ketone with hydroxylamine or a salt thereof in a polar solvent such as dimethylacetamide (DMA), aqueous DMA, ethanol or aqueous ethanol. In this case, a base such as sodium acetate or pyridine is added to control the pH of the reaction mixture. It is well known that the reaction rate is pH-dependent, and the base can be added continuously at the beginning or during the reaction. It is also possible to use a basic solvent such as pyridine as the base and / or solvent or co-solvent. The reaction temperature is usually from room temperature to the reflux temperature of the mixture, and is generally about 20 ° C to 120 ° C.

相應酮中間體係(例如)藉由文獻(例如標準化學教材，例如J.March,Advanced Organic Chemistry，第4版，Wiley Interscience，1992)中所述方法來製備。另外，連續弗裏德-克拉夫茨反應(Friedel-Crafts reaction)可有效用於合成中間體。此等反應為彼等熟習此項技術者所熟知。 The corresponding ketone intermediates are prepared, for example, by methods described in the literature (e.g. standard chemistry textbooks, e.g. J. March, Advanced Organic Chemistry, 4th edition, Wiley Interscience, 1992). In addition, the continuous Friedel-Crafts reaction can be effectively used for the synthesis of intermediates. These reactions are It is well known to those skilled in the art.

肟之另一便利合成係用亞硝酸或亞硝酸烷基酯將「活性」亞甲基亞硝化。鹼性條件(如(例如)Organic Syntheses coll.第VI卷(J.Wiley & Sons,New York,1988)，第199頁及第840頁中所述)與酸性條件(如)例如)Organic Synthesis coll.第V卷，第32頁及第373頁，coll.第III卷，第191頁及第513頁，coll.第II卷，第202頁、第204頁及第363頁中所述)二者適於製備在本發明中用作起始材料之肟。一般自亞硝酸鈉產生亞硝酸。亞硝酸烷基酯可為(例如)亞硝酸甲酯、亞硝酸乙酯、亞硝酸丙酯、亞硝酸丁酯或亞硝酸異戊酯。 Another convenient synthesis of oximes is the use of nitrous acid or alkyl nitrite to "active" methylene nitrite. Basic conditions (e.g., as described in Organic Syntheses coll., Volume VI (J. Wiley & Sons, New York, 1988), pages 199 and 840) and acidic conditions (e.g., for example) Organic Synthesis coll (Vol. V, pages 32 and 373, coll. Vol. III, pages 191 and 513, coll. Vol. II, pages 202, 204 and 363) Suitable for the preparation of oximes used as starting materials in the present invention. Nitrite is generally produced from sodium nitrite. The alkyl nitrite may be, for example, methyl nitrite, ethyl nitrite, propyl nitrite, butyl nitrite, or isoamyl nitrite.

本發明另一實施例係具有游離式(IA)所示結構之光起始劑(C-1)：

Another embodiment of the present invention is a light initiator (C-1) having a structure represented by the free formula (IA):

、COR₁₆、OR₁₇、鹵素、NO₂或

, COR ₁₆ , OR ₁₇ , halogen, NO ₂ or

或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地為經

取代之C₂-C₁₀烯基；或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為-(CH₂)_P-Y-(CH₂)_q-；或R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為

，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、苯基、CN、OH、SH、C₁-C₄-烷氧基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、CN、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、CN、OR₁₇、SR₁₈、SOR₁₈、SO₂R₁₈或NR₁₉R₂₀，其中該等取代基OR₁₇、SR₁₈或NR₁₉R₂₀視情況經由基團R₁₇、R₁₈、R₁₉及/或R₂₀與萘基環中一個碳原子形成5員或6員環；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為

或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、SO、SO₂、NR₂₆或CO，或係C₂-C₁₂烯基，其未經間雜或間雜有一或多個O、CO或NR₂₆，其中經間雜之C₂-C₂₀烷基及未經間雜或經間雜之C₂-C₁₂烯基未經取代或經一或多個鹵素取代；或R₁₃係C₄-C₈環烯基、C₂-C₁₂炔基或C₃-C₁₀環烷基，其未經間雜或間雜有一或多個O、S、CO或NR₂₆；或R₁₃係苯基或萘基，其各未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀、

、COR₁₆、CN、NO₂、鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O、S、CO或NR₂₆；或其各經C₃-C₁₀環烷基或間雜有一或多個O、S、CO或NR₂₆之C₃-C₁₀環烷基取代；k係整數1至10；R₁₅係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀、PO(OC_kH_2k+1)₂、SO-C₁-C₁₀烷基、SO₂-C₁-C₁₀烷基、間雜有一或多個O、S或NR₂₆之C₂-C₂₀烷基；或其各經C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係氫、C₂-C₁₂烯基、C₃-C₈環烷基，其未經間雜或間雜有一或多個O、CO或NR₂₆；或R₁₅係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OR₁₇、SR₁₈、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、NR₁₉R₂₀、COOR₁₇、 CONR₁₉R₂₀、PO(OC_kH_2k+1)₂、

、苯基；或該C₁-C₂₀烷基經苯基取代，該苯基經鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、OR₁₇、SR₁₈或NR₁₉R₂₀取代；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O、SO或SO₂，且該經間雜之C₂-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、OR₁₇、COOR₁₇、CONR₁₉R₂₀、苯基或經OR₁₇、SR₁₈或NR₁₉R₂₀取代之苯基；或R₁₅係C₂-C₂₀烷醯基或苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係未經取代或經一或多個OR₁₇取代之萘甲醯基或係C₃-C₁₄雜芳基羰基；或R₁₅係C₂-C₁₂烷氧基羰基，其未經間雜或間雜有一或多個O且該經間雜或未經間雜之C₂-C₁₂烷氧基羰基未經取代或經一或多個羥基取代；或R₁₅係苯氧基羰基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、C₁-C₄鹵代烷基、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係CN、CONR₁₉R₂₀、NO₂、C₁-C₄鹵代烷基、S(O)_m-C₁-C₆烷基、未經取代或經C₁-C₁₂烷基或SO₂-C₁-C₆烷基取代之S(O)_m-苯基；或R₁₅係SO₂O-苯基，其未經取代或經C₁-C₁₂烷基取代；或係二苯基膦醯基或二(C₁-C₄烷氧基)-膦醯基；m係1或2；R'₁₅具有針對R₁₅所給出含義中之一者；X₁係O、S、SO或SO₂；X₂係O、CO、S或直接鍵；R₁₆係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其每一者未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O、S或NR₂₆之C₁-C₂₀烷基；或其每一者經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、 CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係氫、未經取代或經一或多個以下基團取代之C₁-C₂₀烷基：鹵素、苯基、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₁₆係間雜有一或多個O、S或NR₂₆之C₂-C₁₂烷基；或R₁₆係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₁₂烯基或C₃-C₈環烷基；或R₁₆係經SR₁₈取代之苯基，其中基團R₁₈表示鍵結至其中附接有COR₁₆基團之咔唑部分之苯基或萘基環的直接鍵；n係1至20；R₁₇係氫、苯基-C₁-C₃烷基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄)烯基、O(CO)-苯基、(CO)OH、(CO)O(C₁-C₄烷基)、SO₂-(C₁-C₄鹵代烷基)、O(C₁-C₄鹵代烷基)、C₃-C₂₀環烷基或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O、S或NR₂₆；或R₁₇係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₁-C₈烷醯基、C₂-C₁₂烯基、C₃-C₆烯醯基或C₃-C₂₀環烷基，其未經間雜或間雜有一或多個O、S、CO或NR₂₆；或R₁₇係C₁-C₈烷基-C₃-C₁₀環烷基，其未經間雜或間雜有一或多個O；或R₁₇係苯甲醯基，其未經取代或經一或多個C₁-C₆烷基、鹵素、OH或C₁-C₃烷氧基取代；或R₁₇係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、OH、C₁-C₁₂烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、 N(C₁-C₁₂烷基)₂、二苯基-胺基或

或R₁₇形成鍵結至其上具有基團

或

之苯基或萘基環之一個碳原子之直接鍵；R₁₈係氫、C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基，其中C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基未經間雜或間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₂-C₄)烯基、O(CO)-(C₁-C₄烷基)、O(CO)-苯基或(CO)OR₁₇；或R₁₈係C₂-C₂₀烷基，其間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係(CH₂CH₂O)_nH、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₈烷醯基或C₃-C₆烯醯基；或R₁₈係苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、OH、C₁-C₄烷氧基或C₁-C₄烷基硫基；或R₁₈係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₁₂烷基、C₁-C₄鹵代烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基胺基、(CO)O(C₁-C₈烷基)、(CO)-C₁-C₈烷基、(CO)N(C₁-C₈烷基)₂或

R₁₉及R₂₀彼此獨立地為氫、C₁-C₂₀烷基、C₂-C₄羥基烷基、 C₂-C₁₀烷氧基烷基、C_2-C₅烯基、C₃-C₂₀環烷基、苯基-C₁-C₃烷基、SO₂-(C₁-C₄鹵代烷基)、C₁-C₈烷醯基、C₁-C₈烷醯基氧基、C₃-C₁₂烯醯基或苯甲醯基；或R₁₉及R₂₀係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、C₁-C₁₂烷基、苯甲醯基或C₁-C₁₂烷氧基；或R₁₉及R₂₀與其所附接之N原子一起形成未經間雜或間雜有O、S或NR₁₇之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₂₀烷氧基、=O、OR₁₇、SR₁₈、NR₂₁R₂₂、(CO)R₂₃、 NO₂、鹵素、C₁-C₄-鹵代烷基、CN、苯基、

或C₃-C₂₀ 環烷基，該C₃-C₂₀環烷基未經間雜或間雜有一或多個O、S、CO或NR₁₇；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、=O、OR₁₇、SR₁₈、 NR₂₁R₂₂、(CO)R₂₃、

、鹵素、NO₂、CN、苯基或C₃- C₂₀環烷基，該C₃-C₂₀環烷基未經間雜或間雜有一或多個O、S、CO或NR₁₇；R₂₁及R₂₂彼此獨立地為氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₃-C₁₀環烷基或苯基；或R₂₁及R₂₂與其所附接之N原子一起形成未經間雜或間雜有O、S或NR₂₆之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環未稠合或該5員或6員飽和或不飽和環係與苯環稠合；R₂₃係氫、OH、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O、CO或NR₂₆之C₂-C₂₀烷基、未經間雜或間雜有O、S、CO或 NR₂₆之C₃-C₂₀環烷基，或R₂₃係苯基、萘基、苯基-C₁-C₄烷基、OR₁₇、SR₁₈或NR₂₁R₂₂；R₂₄係(CO)OR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₄具有針對R₁₉及R₂₀所給出含義中之一者；R₂₅係COOR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₅具有針對R₁₇所給出含義中之一者；R₂₆係氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O或CO；或係苯基-C₁-C₄烷基、C₃-C₈環烷基，其未經間雜或間雜有一或多個O或CO；或係(CO)R₁₉；或係苯基，其未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈、 NR₁₉R₂₀或

但條件為在該分子中存在至少一個基團

或

Or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ are independent of each other.

Substituted C ₂ -C ₁₀ alkenyl; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R _7, or R ₇ and R ₈ are independently common with each other Is-(CH ₂ ) _P -Y- (CH ₂ ) _q- ; or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ And R ₈ independently of each other are

, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, Phenyl, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ Independently of each other are unsubstituted phenyl or phenyl substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forms a 5- or 6-membered ring with one carbon atom in the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independent of each other for

Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, SO, SO ₂ , NR ₂₆ or CO, or a C ₂ -C ₁₂ alkenyl group, which is not interspersed with or A plurality of O, CO or NR ₂₆ in which an interspersed C ₂ -C ₂₀ alkyl group and an unsaturated or interspersed C ₂ -C ₁₂ alkenyl group are unsubstituted or substituted with one or more halogens; or R ₁₃ Is a C ₄ -C ₈ cycloalkenyl, C ₂ -C ₁₂ alkynyl, or C ₃ -C ₁₀ cycloalkyl group, which is unsaturated or interspersed with one or more O, S, CO or NR ₂₆ ; or R ₁₃ series Phenyl or naphthyl, each unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ ,

, COR ₁₆ , CN, NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, interspersed with one or more O, S, CO or NR ₂₆ ; each warp or C ₃ -C ₁₀ or cycloalkyl interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; K-based integer from 1 to 10; R ₁₅ lines C ₆ - C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, interspersed with one or more O, S or C ₂ -C ₂₀ alkyl group of NR ₂₆ ; or each C ₁ -C ₂₀ alkyl group substituted, the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₈ cycloalkyl, which is not interspersed or interspersed with one or more O, CO or NR ₂₆ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is not Substituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ ,

, Phenyl; or the C ₁ -C ₂₀ alkyl group is substituted with a phenyl group, the phenyl group is halogen, C ₁ -C ₂₀ alkyl group, C ₁ -C ₄ haloalkyl group, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Substituted; or R ₁₅ is a C ₂ -C ₂₀ alkyl group, in which one or more O, SO, or SO ₂ is interspersed, and the interspersed C ₂ -C ₂₀ alkyl group is unsubstituted or substituted by one or more of the following groups Group substitution: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted with OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is a C ₂ -C ₂₀ alkylfluorenyl or benzyl Fluorenyl, which is unsubstituted or substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is unsubstituted or A naphthylmethyl group substituted with one or more OR ₁₇ or a C ₃ -C ₁₄ heteroarylcarbonyl group; or R ₁₅ is a C ₂ -C ₁₂ alkoxycarbonyl group, which is not interspersed or has one or more O And the C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R ₁₅ is a phenoxycarbonyl group which is unsubstituted or substituted with one or more Group substitution: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S (O) _m -C ₁ -C ₆ alkyl, unsubstituted or C ₁ -C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl substituted S (O) _m -phenyl; or R ₁₅ is SO ₂ O-phenyl, which is unsubstituted or substituted by C ₁ -C ₁₂ Group substitution; or is diphenylphosphinofluorenyl or bis (C ₁ -C ₄ alkoxy) -phosphinofluorenyl; m is 1 or 2; R _'15 has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO or SO ₂ ; X ₂ is O, CO, S or a direct bond; R ₁₆ is C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each of which is not Substituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or interspersed with one or more O, S or C ₁ -C ₂₀ alkyl of NR ₂₆ ; or each of them is substituted by one or more C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted by one or more of the following Substitution: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryl butoxycarbonyl, oR _17, SR ₁₈ or NR ₁₉ R _20; or R ₁₆ lines , Unsubstituted or substituted with one or more of the following radicals C ₁ -C ₂₀ alkyl group: halogen, phenyl, OH, SH, CN, C 3 -C 6 alkenyloxy, OCH _₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl, (CO) OH or (CO) O ( (C ₁ -C ₄ alkyl); or R ₁₆ is a C ₂ -C ₁₂ alkyl mixed with one or more O, S or NR ₂₆ ; or R ₁₆ is (CH ₂ CH ₂ O) _{n + 1} H, ( CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl; or R ₁₆ is phenyl substituted with SR ₁₈ , Where the group R ₁₈ represents a direct bond to a phenyl or naphthyl ring bonded to the carbazole moiety to which the COR ₁₆ group is attached; n is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ ) alkenyl, O ( CO) -phenyl, (CO) OH, (CO) O (C ₁ -C ₄ alkyl), SO _2- (C ₁ -C ₄ haloalkyl), O (C ₁ -C ₄ haloalkyl), C or ₃ -C ₂₀ cycloalkyl interrupted by one or more of C ₃ -C ₂₀ O Alkyl group; R _17, or C ₂ -C ₂₀ alkyl-based, have therebetween one or more heteroatoms O, S or NR _26; or R ₁₇ lines _{_{_{(CH 2 CH 2 O) n}}} + 1 H, (CH 2 CH 2 O ) _n (CO)-(C ₁ -C ₈ alkyl), C ₁ -C ₈ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl or C ₃ -C ₂₀ cycloalkyl , Which is not interspersed or interspersed with one or more O, S, CO or NR ₂₆ ; or R ₁₇ is a C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl, which is unstrained or interspersed with one or more O; or R ₁₇ is benzamyl, which is unsubstituted or substituted with one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; or R ₁₇ is phenyl , Naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl-C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenyl Amino-amino

Or R ₁₇ forms a bond to

or

Direct bond of one carbon atom of phenyl or naphthyl ring; R ₁₈ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl, where C _2- C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl without one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ Is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ ( CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl Or (CO) OR ₁₇ ; or R ₁₈ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ (CH ₂ CH ₂ O) _n H , (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₈ alkylfluorenyl or C ₃ -C ₆ alkenyl; or R ₁₈ benzamyl, It is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy, or C ₁ -C ₄ alkylthio; or R ₁₈ series phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following radicals: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ Substituted alkyl, C ₁ -C ₁₂ alkoxy, CN, NO _2, phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO) O (C ₁ -C ₈ alkyl), (CO) -C ₁ -C ₈ alkyl, (CO) N (C ₁ -C ₈ alkyl) ₂ or

R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C _3- C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, SO _2- (C ₁ -C ₄ haloalkyl), C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl or benzamidine; or R ₁₉ and R ₂₀ are phenyl, naphthyl, or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or has one or more of the following groups Substitution: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzamyl or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ with The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring that is not interspersed or interspersed with O, S, or NR ₁₇ , and the 5- or 6-membered saturated or unsaturated ring is unsubstituted or Or more of the following groups substituted: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ , NO ₂ , halogen, C ₁ -C ₄ -haloalkyl, CN, phenyl,

Or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl has one or more O, S, CO, or NR ₁₇ without interspersed or interspersed; or R ₁₉ and R ₂₀ with the N atom attached to it Together form a heteroaromatic ring system that is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ ,

, Halogen, NO ₂ , CN, phenyl, or C ₃ -C ₂₀ cycloalkyl, the C ₃ -C ₂₀ cycloalkyl has one or more O, S, CO, or NR ₁₇ uninterspersed or interspersed; R ₂₁ and R _{22 is} independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R ₂₂ together with the N atom to which they are attached Forms a 5- or 6-membered saturated or unsaturated ring without interspersed or interspersed O, S, or NR ₂₆ , and the 5- or 6-membered saturated or unsaturated ring is not fused or the 5- or 6-membered saturated or unsaturated ring saturated ring system is fused with a benzene ring; R ₂₃ type hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, cO or NR C ₂₆ alkoxy of ₂ -C ₂₀ , C ₃ -C ₂₀ cycloalkyl without meta or hetero, O, S, CO or NR ₂₆ , or R ₂₃ phenyl, naphthyl, phenyl-C ₁ -C ₄ alkyl, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ is (CO) OR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₄ has one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ is COOR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₅ has one of the meanings given for R ₁₇ ; R ₂₆ is hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl , C ₂ -C ₂₀ alkyl, with one or more O or CO interspersed between them; or phenyl-C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkyl, without interspersed or interspersed with one or more O Or CO; or (CO) R ₁₉ ; or phenyl, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or

Provided that at least one group is present in the molecule

or

針對式(IA)所示結構之光起始劑(C-1)所定義基團之較佳者對應於如針對如下文所給出式(C-I)所示結構之光起始劑(C-1)給出者，只是每一所定義肟酯基團(例如

)皆替換為相應游離肟基團

The preferred group defined for the photoinitiator (C-1) of the structure represented by formula (IA) corresponds to the photoinitiator (C- 1) given, just for each defined oxime ester group (e.g.

) Are replaced by the corresponding free oxime group

每一肟酯基團可以兩種構型(Z)或(E)存在。可藉由習用方法來分離異構體，但亦可使用異構體混合物作為(例如)光起始物質。因此，本發明亦係關於式(C-I)所示結構之光起始劑(C-1)之構型異構體之混合物。 Each oxime ester group can exist in two configurations (Z) or (E). Isomers can be separated by conventional methods, but it is also possible to use a mixture of isomers as, for example, a photoinitiator. Therefore, the present invention also relates to a mixture of configurational isomers of the photoinitiator (C-1) of the structure represented by the formula (C-I).

較佳者係如上文所定義之式(C-I)所示結構之光起始劑(C-1)，其中，R₁、R₂、R₃、R₄、R₅、R₆、R₇及R₈彼此獨立地為氫、C₁-C₂₀烷基、

、COR₁₆或NO₂，或R₁及R₂、R₂及 R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為

X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OR₁₇、SR₁₈、COOR₁₇、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、NR₂₆或CO；或R₁₃係苯基或萘基，此二者未經取代或經一或多個

或COR₁₆取代； R₁₄係C₁-C₂₀烷基、苯基或C₁-C₈烷氧基；R₁₅係苯基、萘基、C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈或C₂-C₂₀烷基，其間雜有一或多個O或S；或其各經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₄-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈、NR₁₉R₂₀或PO(OC_kH_2k+1)₂；或R₁₅係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、C₃-C₈環烷基、C₃-C₂₀雜芳基、NR₁₉R₂₀、COOR₁₇、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；R'₁₄具有針對R₁₄所給出含義中之一者；R'₁₅具有針對R₁₅所給出含義中之一者；R₁₆係苯基，其未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O、S或NR₂₆之C₂-C₂₀烷基，或R₁₆係苯基，其經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₄-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係C₁-C₂₀烷基，其未經取代或經以下基團取代：鹵素、苯基、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)或(CO)O(C₁-C₄烷基)；R₁₇係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(C₁-C₄烷基)、(CO)O(C₁-C₄烷基)、C₃-C₂₀環烷基或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O；R₁₈係經(CO)OR₁₇取代之甲基；R₁₉及R₂₀彼此獨立地為氫、苯基、C₁-C₂₀烷基、C₁-C₈烷醯基或C₁-C₈烷醯基氧基；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經

取代；但條件為在該分子中存在至少一個基團

或

(C-1)，其中R₁、R₂、R₅、R₆、R₇及R₈彼此獨立地為氫、

The preferred one is the photoinitiator (C-1) of the structure shown by the formula (CI) as defined above, wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R _{8 is} independently hydrogen, C ₁ -C ₂₀ alkyl,

, COR ₁₆ or NO ₂ , or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈ independently of one another are

X is CO or a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group with one or more O, S, NR ₂₆ or CO interposed therebetween; or R ₁₃ is phenyl or naphthyl, both Unsubstituted or one or more

Or COR ₁₆ substitution; R ₁₄ is C ₁ -C ₂₀ alkyl, phenyl or C ₁ -C ₈ alkoxy; R ₁₅ is phenyl, naphthyl, C ₃ -C ₂₀ heteroaryl, each without Substituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or C ₂ -C ₂₀ alkyl, interspersed with one or more O or S; or They are each substituted with one or more C ₁ -C ₂₀ alkyl groups, the C ₁ -C ₂₀ alkyl group being unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ Or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ Cycloalkyl, C ₃ -C ₂₀ heteroaryl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; R _'14 has one of the meanings given for R ₁₄ One; R _'15 has one of the meanings given for R ₁₅ ; R ₁₆ is phenyl, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ Or interspersed with one or more O, S or NR ₂₆ C ₂ -C ₂₀ alkyl, or R ₁₆ is phenyl, which is substituted with one or more C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl Group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with : Halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ (Alkyl) or (CO) O (C ₁ -C ₄ alkyl); R ₁₇ is C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (C ₁ -C ₄ alkyl), (CO) O (C ₁ -C ₄ alkyl), C ₃ -C ₂₀ cycloalkyl or interspersed Or a C ₃ -C ₂₀ cycloalkyl group of O; or R ₁₇ is a C ₂ -C ₂₀ alkyl group with one or more O interposed therebetween; R ₁₈ is a methyl group substituted with (CO) OR ₁₇ ; R ₁₉ and R ₂₀ independently of one another hydrogen, phenyl, C ₁ -C ₂₀ alkyl, C ₁ -C ₈ alkanoyl group or a C ₁ -C ₈ alkanoyl-yloxy ; Or R ₁₉ and R ₂₀ appended thereto the N atom to form a heteroaromatic ring system with the ring system is unsubstituted or

Substitution; provided that at least one group is present in the molecule

or

(C-1), wherein R ₁ , R ₂ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen,

必須重視如上文所定義之式(C-I)所示結構之光起始劑 COR₁₆或NO₂，R₃及R₄一起為

R₉、R₁₀、R₁₁及R₁₂係氫； X係直接鍵；R₁₃係C₁-C₂₀烷基；R₁₄係C₁-C₂₀烷基；R₁₅係C₁-C₂₀烷基或苯基，其經一或多個OR₁₇或C₁-C₂₀烷基取代；R₁₆係苯基，其經一或多個C₁-C₂₀烷基或OR₁₇取代；且R₁₇係未經取代或經一或多個鹵素取代之C₁-C₂₀烷基或係間雜有一或多個O之C₂-C₂₀烷基；但條件為在該分子中存在至少一個基團

Attention must be paid to the photoinitiator COR ₁₆ or NO _{2 having the} structure shown in the formula (CI) defined above. R ₃ and R ₄ together are

R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are hydrogen; X is a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl; R ₁₄ is C ₁ -C ₂₀ alkyl; R ₁₅ is C ₁ -C ₂₀ alkyl Or phenyl, which is substituted with one or more OR ₁₇ or C ₁ -C ₂₀ alkyl; R ₁₆ is phenyl, which is substituted with one or more C ₁ -C ₂₀ alkyl or OR ₁₇ ; and R ₁₇ based unsubstituted or substituted with one or more of halogen or C ₁ -C ₂₀ alkyl interrupted by one or more lines of C ₂ -C ₂₀ O-alkyl; with the proviso that there is in the molecule at least one group

本發明之標的進一步係如上文所定義之式(C-I)所示結構之光起始劑(C-1)，其中，R₁、R₂、R₃、R₄、R₅、R₆、R₇及R₈彼此獨立地為氫，或R₁及R₂、R₃及R₄或R₅及R₆彼此獨立地共同為

但條件為R₁及R₂、R₃及R₄或R₅及R₆中至少一對為

或R₂係

、COR₁₆、NO₂或

或R₇係

或COR₁₆； R₉、R₁₁及R₁₂係氫；R₁₀係氫、OR₁₇或COR₁₆；X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、OR₁₇、SR₁₈或PO(OC_kH_2k+1)₂；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O；或R₁₃係苯基；k係整數2；R₁₄係C₁-C₂₀烷基或噻吩基；R₁₅係苯基或萘基，其各未經取代或經一或多個OR₁₇或C₁-C₂₀烷基取代；或R₁₅係噻吩基、氫、C₁-C₂₀烷基，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、C₃-C₈環烷基、NR₁₉R₂₀或COOR₁₇；或R₁₅係C₂-C₂₀烷基，其間雜有SO₂；R₁₆係苯基或萘基，其各未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀或C₁-C₂₀烷基；或R₁₆係噻吩基；R₁₇係氫、C₁-C₈烷醯基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團：鹵素、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄)烯基或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O；R₁₈係C₃-C₂₀環烷基、C₁-C₂₀烷基，其未經取代或經一或多個OH、O(CO)-(C₂-C₄)烯基或(CO)OR₁₇取代；或R₁₈係苯基，其未經取代或經一或多個鹵素取代；R₁₉及R₂₀彼此獨立地為C₁-C₈烷醯基或C₁-C₈烷醯基氧基；或R₁₉及R₂₀與其所附接之N原子一起形成間雜有O之5員或6員飽和環；但條件為在該分子中存在至少一個基團

The subject matter of the present invention is further a photoinitiator (C-1) having a structure shown by the formula (CI) as defined above, wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, or R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ are independently common to each other as

Provided that at least one of R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ is

Or R ₂ series

, COR ₁₆ , NO ₂ or

Or R ₇ series

Or COR ₁₆ ; R ₉ , R ₁₁ and R ₁₂ are hydrogen; R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ ; X is CO or a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl, which is unsubstituted or One or more of the following groups are substituted: halogen, R ₁₇ , OR ₁₇ , SR ₁₈ or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group with one or more O in between ; Or R ₁₃ is phenyl; k is an integer 2; R ₁₄ is C ₁ -C ₂₀ alkyl or thienyl; R ₁₅ is phenyl or naphthyl, each of which is unsubstituted or via one or more OR ₁₇ or C ₁ -C ₂₀ alkyl substitution; or R ₁₅ is thienyl, hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ is a C ₂ -C ₂₀ alkyl with SO ₂ interposed therebetween; R ₁₆ is phenyl or naphthyl, each Unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is thienyl; R ₁₇ is hydrogen, C ₁ -C ₈ Alkyl, C ₁ -C ₂₀ alkyl, unsubstituted or via one or more of the following groups: halogen, O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄₎ alkenyl or interrupted by one or C ₃ -C ₂₀ cycloalkyl of multiple O; or R ₁₇ is C ₂ -C ₂₀ alkyl with one or more O interposed therebetween; R ₁₈ is C ₃ -C ₂₀ cycloalkyl, C ₁ -C ₂₀ Alkyl, which is unsubstituted or substituted with one or more OH, O (CO)-(C ₂ -C ₄ ) alkenyl, or (CO) OR ₁₇ ; or R ₁₈ is phenyl, which is unsubstituted or substituted One or more halogen substitutions; R ₁₉ and R ₂₀ are independently C ₁ -C ₈ alkylfluorenyl or C ₁ -C ₈ alkylfluorenyloxy; or R ₁₉ and R ₂₀ together with the N atom to which they are attached Forms a 5- or 6-membered saturated ring mixed with O; provided that at least one group is present in the molecule

本發明化合物之實例係如上文所定義之式(Ia)-(Ig)化合物。式(Ia)、(Ib)、(Ic)、尤其式(Ia)或(Ic)、或式(Ia)、(Ic)或(Id)、尤其式(Ia)之化合物令人關注。 Examples of compounds of the invention are compounds of formula (Ia)-(Ig) as defined above. Formula (Ia), (Ib), (Ic), especially formula (Ia) or (Ic), or formula (Ia), (Ic) or (Id), especially The compounds of formula (Ia) are of interest.

舉例而言，R₁、R₂、R₃、R₄、R₅、R₆、R₇及R₈彼此獨立地為氫、

或COR₁₆，或R₁及R₂、R₂及R₃、R₃及R₄或 R₅及R₆、R₆及R₇、R₇及R₈彼此獨立地共同為

For example, R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are independently hydrogen,

Or COR ₁₆ or R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ or R ₅ and R ₆ , R ₆ and R ₇ , R ₇ and R ₈ independently of one another are

舉例而言，R₃及R₄或R₁及R₂共同為

或R₃及 R₄及R₅及R₆共同為

；R₃及R₄尤其共同為

For example, R ₃ and R ₄ or R ₁ and R ₂ together are

Or R ₃ and R ₄ and R ₅ and R ₆ together are

; R ₃ and R _{4 are} particularly common

舉例而言，R₁、R₅、R₆及R₈係氫。或COR₁₆、尤其為

For example, R ₁ , R ₅ , R ₆ and R ₈ are hydrogen. Or COR ₁₆ , especially

R₇尤其為氫、

或COR₁₆。或R₇係

R _{7 is} especially hydrogen,

Or COR ₁₆ . Or R ₇ series

R₂尤其為

，COR₁₆或

或R₂與R₁一起為

。R₂尤其為COR₁₆。 R _{2 is} especially

, COR ₁₆ or

Or R ₂ together with R ₁ is

. R _{2 is} especially COR ₁₆ .

X較佳為直接鍵。 X is preferably a direct bond.

舉例而言，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、OR₁₇或SR₁₈；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、OR₁₇、SR₁₈或NR₁₉R₂₀，其中取代基OR₁₇、SR₁₈或NR₁₉R₂₀視情況經由基團R₁₇、R₁₈、R₁₉及/或R₂₀與萘基環之一個碳原子形成 5員或6員環；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為

或 COR₁₆。 For example, R ₉ , R ₁₀ , R _11, and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups: C _1- C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forms a 5- or 6-membered ring with one carbon atom of the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ And R ₁₂ are independent of each other

Or COR ₁₆ .

具體而言，舉例而言，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、OR₁₇或SR₁₈；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為

或COR₁₆。 Specifically, for example, R ₉ , R ₁₀ , R _11, and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or one substituted with one or more of the following groups Phenyl: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other

Or COR ₁₆ .

舉例而言，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基、未經取代之苯基或經一或多個C₁-C₆烷基取代之苯基；或 R₉、R₁₀、R₁₁及R₁₂彼此獨立地為

或COR₁₆。 For example, R ₉ , R ₁₀ , R _11, and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or one substituted with one or more C ₁ -C ₆ alkyl. Phenyl; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently

Or COR ₁₆ .

在另一實施例中，舉例而言，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、OR₁₇或SR₁₈；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、OR₁₇、SR₁₈或NR₁₉R₂₀，其中取代基OR₁₇、SR₁₈或NR₁₉R₂₀視情況經由基團R₁₇、R₁₈、R₁₉及/或R₂₀與萘基環之一個碳原子形成5員或6員環。 In another embodiment, for example, R ₉ , R ₁₀ , R _11, and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or via one or more of the following groups Group substituted phenyl: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently halogen, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ Wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally form a 5- or 6-membered ring with one carbon atom of the naphthyl ring via the groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ .

此外，舉例而言，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、OR₁₇或SR₁₈，或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、OR₁₇、SR₁₈、NR₁₉R₂₀或COR₁₆。 In addition, for example, R ₉ , R ₁₀ , R _11, and R ₁₂ are each independently hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups : C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ , or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or COR ₁₆ .

或舉例而言，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基、未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、OR₁₇或SR₁₈，或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、OR₁₇、COR₁₆或NR₁₉R₂₀。 Or, for example, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, unsubstituted phenyl, or phenyl substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OR ₁₇ or SR ₁₈ , or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are each independently halogen, OR ₁₇ , COR ₁₆ or NR ₁₉ R ₂₀ .

較佳地，R₉、R₁₁及R₁₂係氫且R₁₀係氫、OR₁₇或COR₁₆。 Preferably, R ₉ , R ₁₁ and R ₁₂ are hydrogen and R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ .

R₁₃係(例如)C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、COOR₁₇或CONR₁₉R₂₀；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、SO、SO₂、NR₂₆或CO，或係C₂-C₁₂烯基，其視情況間雜有一或多個O、CO或NR₂₆，或R₁₃係C₃-C₁₀環烷基，其視情況間雜有一或多個O、S、CO、NR₂₆，或R₁₃係苯基或萘基，此二者未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、 NR₁₉R₂₀、

、COR₁₆、NO₂、鹵素、C₁-C₂₀烷基、C₁- C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O；或係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、COOR₁₇、OR₁₇、SR₁₈、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；或係C₂-C₂₀烷基，其間雜有一或多個O。 R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ or CONR ₁₉ R ₂₀ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group , Interspersed with one or more O, S, SO, SO ₂ , NR ₂₆ or CO, or C ₂ -C ₁₂ alkenyl, optionally interspersed with one or more O, CO or NR ₂₆ , or R ₁₃ series C ₃ -C ₁₀ cycloalkyl, optionally mixed with one or more O, S, CO, NR ₂₆ , or R ₁₃ phenyl or naphthyl, both of which are unsubstituted or have one or more of the following groups Group substitution: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ ,

, COR ₁₆ , NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl with one or more O interposed therebetween; or C ₁ -C ₂₀ alkyl , Which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; or C ₂ -C ₂₀ alkyl with one or more O interposed therebetween.

此外，R₁₃係(例如)C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、COOR₁₇、OR₁₇、SR₁₈、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；或係C₂-C₂₀烷基，其間雜有一或多個O；或係C₂-C₁₂烯基、C₃-C₁₀環烷基；或R₁₃係苯基或萘基，此二者未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀、

、COR₁₆、NO₂、鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O。 In addition, R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , COOR ₁₇ , OR ₁₇ , SR ₁₈ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; or a C ₂ -C ₂₀ alkyl group with one or more O interposed therebetween; or a C ₂ -C ₁₂ alkenyl group, a C ₃ -C ₁₀ cycloalkyl group; or R ₁₃ based phenyl or naphthyl, both of which unsubstituted or substituted with one or more of the following _{_{groups: oR 17, SR 18, NR}} 19 R 20,

, COR ₁₆ , NO ₂ , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, with one or more O interposed therebetween.

在另一實施例中，R₁₃係(例如)C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、OR₁₇、SR₁₈或PO(OC_kH_2k+1)₂；或係C₂-C₂₀烷基，其間雜有一或多個O；或係C₂-C₁₂烯基、C₃-C₁₀環烷基、苯基或萘基。 In another embodiment, R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR _18, or PO (OC _k H _{2k + 1} ) ₂ ; or C ₂ -C ₂₀ alkyl with one or more O interposed therebetween; or C ₂ -C ₁₂ alkenyl, C ₃ -C ₁₀ cycloalkyl, phenyl or naphthyl .

或R₁₃係(例如)C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、R₁₇、OR₁₇、SR₁₈或PO(OC_kH2_k+1)₂；或係C₂-C₂₀烷基，其間雜有一或多個O；或係苯基、C₂-C₁₂烯基或C₃-C₁₀環烷基。 Or R ₁₃ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR _18, or PO (OC _k H2 _{k + 1} ) ₂ ; or a C ₂ -C ₂₀ alkyl group with one or more O interposed therebetween; or a phenyl group, a C ₂ -C ₁₂ alkenyl group or a C ₃ -C ₁₀ cycloalkyl group.

或R₁₃係(例如)C₁-C₂₀烷基、苯基、C₂-C₁₂烯基或C₃-C₁₀環烷基。 Or R ₁₃ is, for example, C ₁ -C ₂₀ alkyl, phenyl, C ₂ -C ₁₂ alkenyl or C ₃ -C ₁₀ cycloalkyl.

或R₁₃係(例如)C₁-C₂₀烷基、C₂-C₁₂烯基或C₃-C₁₀環烷基。 Or R ₁₃ is, for example, C ₁ -C ₂₀ alkyl, C ₂ -C ₁₂ alkenyl, or C ₃ -C ₁₀ cycloalkyl.

較佳地，R₁₃係C₁-C₂₀烷基，尤其為C₁-C₈烷基，例如2-乙基己基。 Preferably, R ₁₃ is a C ₁ -C ₂₀ alkyl group, especially a C ₁ -C ₈ alkyl group, such as 2-ethylhexyl.

R₁₄係(例如)氫、C₃-C₈環烷基、C₂-C₅烯基、C₁-C₂₀烷氧基或C₁-C₂₀烷基，其未經取代或經一或多個鹵素或苯基取代；或R₁₄係苯基或萘基，此二者未經取代或經一或多個以下基團取代：C₁-C₆烷基、C₁-C₄鹵代烷基、鹵素、OR₁₇、SR₁₈及/或NR₁₉R₂₀；或R₁₄係C₃-C₅雜芳基，例如噻吩基，或係C₁-C₈烷氧基、苄氧基或苯氧基。 R ₁₄ is, for example, hydrogen, C ₃ -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy, or C ₁ -C ₂₀ alkyl, which are unsubstituted or Multiple halogen or phenyl substitution; or R ₁₄ is phenyl or naphthyl, both of which are unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl , Halogen, OR ₁₇ , SR ₁₈ and / or NR ₁₉ R ₂₀ ; or R ₁₄ is a C ₃ -C ₅ heteroaryl group, such as thienyl, or C ₁ -C ₈ alkoxy, benzyloxy or phenoxy base.

或R₁₄係(例如)C₁-C₂₀烷基，其未經取代或經一或多個鹵素或苯基取代；或R₁₄係C₃-C₅雜芳基(例如噻吩基)或係未經取代或經取代一或多個以下基團取代之苯基：C₁-C₆烷基、C₁-C₄鹵代烷基、鹵素、OR₁₇、SR₁₈及/或NR₁₉R₂₀；或R₁₄係C₁-C₈烷氧基、苄氧基或苯氧基。 Or R ₁₄ is, for example, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more halogen or phenyl groups; or R ₁₄ is a C ₃ -C ₅ heteroaryl group (for example, thienyl) or Phenyl, unsubstituted or substituted with one or more of the following: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl, halogen, OR ₁₇ , SR ₁₈ and / or NR ₁₉ R ₂₀ ; or R ₁₄ is C ₁ -C ₈ alkoxy, benzyloxy or phenoxy.

在另一實施例中，R₁₄表示C₁-C₂₀烷基，其未經取代或經苯基取代；或R₁₄係苯基，其未經取代或經一或多個C₁-C₆烷基取代。 In another embodiment, R ₁₄ represents C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with phenyl; or R ₁₄ is phenyl, which is unsubstituted or substituted with one or more C ₁ -C ₆ Alkyl substituted.

較佳地，R₁₄係C₁-C₂₀烷基、C₃-C₅雜芳基(例如噻吩基)，或係苯基，尤其為C₁-C₂₀烷基或噻吩基，尤其為C₁-C₈烷基。 Preferably, R ₁₄ is C ₁ -C ₂₀ alkyl, C ₃ -C ₅ heteroaryl (such as thienyl), or is phenyl, especially C ₁ -C ₂₀ alkyl or thienyl, especially C _1- C ₈ alkyl.

R₁₅係(例如)C₆-C₂₀芳基或C₅-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀、C₁-C₂₀烷基；或R₁₅係氫、C₃-C₈環烷基，該C₃-C₈環烷基視情況間雜有一或多個O、CO或NR₂₆；或R₁₅係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OR₁₇、C₃-C₈環烷基、C₅-C₂₀雜芳基、C₈-C₂₀苯氧基羰基、C₅-C₂₀雜芳氧基-羰基、NR₁₉R₂₀、COOR₁₇、CONR₁₉R₂₀、PO(OC_kH_2k+1)₂、

、苯基或經以下基團取代之苯基：鹵素、C₁-C₂₀烷基、C₁- C₄鹵代烷基、OR₁₇或NR₁₉R₂₀；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O、S或SO₂，或R₁₅係C₂-C₂₀烷醯基、苯甲醯基、C₂-C₁₂烷氧基羰基、苯氧基羰基、CONR₁₉R₂₀、NO₂或C₁-C₄鹵代烷基。 R ₁₅ is, for example, a C ₆ -C ₂₀ aryl group or a C ₅ -C ₂₀ heteroaryl group, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkane Group, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ , C ₁ -C ₂₀ alkyl group; or R ₁₅ series hydrogen, C ₃ -C ₈ cycloalkyl group, the C ₃ -C ₈ cycloalkyl group Optionally mixed with one or more O, CO or NR ₂₆ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , C ₃ -C ₈ -cycloalkyl, C ₅ -C ₂₀ heteroaryl, C ₈ -C ₂₀ phenoxycarbonyl, C ₅ -C ₂₀ heteroaryloxy-carbonyl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ ,

, Phenyl or phenyl substituted with: halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, OR ₁₇ or NR ₁₉ R ₂₀ ; or R ₁₅ is C ₂ -C ₂₀ alkyl , Interspersed with one or more O, S or SO ₂ , or R ₁₅ is C ₂ -C ₂₀ alkylfluorenyl, benzamidine, C ₂ -C ₁₂ alkoxycarbonyl, phenoxycarbonyl, CONR ₁₉ R ₂₀ , NO ₂ or C ₁ -C ₄ haloalkyl.

此外，R₁₅係(例如)氫、C₆-C₂₀芳基，尤其為苯基或萘基，其各未經取代或經C₁-C₁₂烷基取代；或係C₃-C₅雜芳基，例如噻吩基；或係C₃-C₈環烷基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OR₁₇、SR₁₇、C₃-C₈-環烷基、NR₁₉R₂₀或COOR₁₇；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O或SO₂。 In addition, R ₁₅ is, for example, hydrogen, C ₆ -C ₂₀ aryl, especially phenyl or naphthyl, each of which is unsubstituted or substituted with C ₁ -C ₁₂ alkyl; or is C ₃ -C ₅ hetero Aryl, such as thienyl; or C ₃ -C ₈ cycloalkyl, C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₇ , C _3- C ₈ - cycloalkyl, NR ₁₉ R ₂₀ or COOR _17; R _15, or C ₂ -C ₂₀ alkyl-based, have therebetween one or more heteroatoms O or SO _2.

該具有式(C-I)所示結構之光起始劑(C-1)令人關注，其中R₁₅係(例如)氫、苯基、萘基，其各未經取代或經C₁-C₈烷基取代；或R₁₅係噻吩基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OR₁₇、SR₁₇、C₃-C₈-環烷基、NR₁₉R₂₀或COOR₁₇；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O或SO₂。 The photoinitiator (C-1) having a structure represented by formula (CI) is of interest, in which R ₁₅ is (for example) hydrogen, phenyl, or naphthyl, each of which is unsubstituted or is C ₁ -C ₈ Alkyl substitution; or R ₁₅ is thienyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₇ , C ₃ -C ₈ -cycloalkyl, NR ₁₉ R ₂₀ or COOR _17; R _15, or C ₂ -C ₂₀ alkyl-based, have therebetween one or more heteroatoms O or SO _2.

R₁₅尤其為(例如)C₃-C₈環烷基或C₁-C₂₀烷基，尤其為C₁-C₂₀烷基，尤其為C₁-C₁₂烷基。 R ₁₅ is, for example, a C ₃ -C ₈ cycloalkyl group or a C ₁ -C ₂₀ alkyl group, especially a C ₁ -C ₂₀ alkyl group, especially a C ₁ -C ₁₂ alkyl group.

R'₁₄及R'₁₅之較佳者分別係如上文針對R₁₄及R₁₅所給出者。 R _'14 and R' ₁₅ are the preferred lines are as described above for R ₁₄ and R ₁₅ are given.

X₁係(例如)O、S或SO，例如O或S，尤其為O。 X ₁ is, for example, O, S or SO, such as O or S, especially O.

R₁₆係(例如)C₆-C₂₀芳基(尤其苯基或萘基、尤其苯基)或C₅-C₂₀雜芳基(尤其噻吩基)，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-G₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O之C₁-C₂₀烷基；或其各經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₅-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₅-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係氫、C₁-C₂₀烷基，該C₁-C₂₀烷基未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、C₃-C₆烯氧基、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₁₆係C₂-C₁₂烷基，其間雜有一或多個O；或係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₁₂烯基或C₃-C₈環烷基，且n係1至20，例如1至12或1至8，尤其為1或2。 R ₁₆ is, for example, a C ₆ -C ₂₀ aryl group (especially phenyl or naphthyl group, especially phenyl group) or a C ₅ -C ₂₀ heteroaryl group (especially thienyl group), each of which is unsubstituted or substituted by one or more Substituted with the following groups: phenyl, halogen, C ₁ -G ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl interspersed with one or more O; Or each of them is substituted with one or more C ₁ -C ₂₀ alkyl groups, the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , benzene Group, C ₃ -C ₈ cycloalkyl, C ₅ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₅ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, phenyl, OH, SH, C _3- C ₆ alkenyloxy, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₁₆ is a C ₂ -C ₁₂ alkyl group with one or more O interposed therebetween; or (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkane And n is 1 to 20, such as 1 to 12 or 1 to 8, especially 1 or 2.

此外，R₁₆係(例如)苯基或萘基，尤其為苯基、噻吩基或咔唑，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈、NR₁₉R₂₀或C₁-C₂₀烷基；或R₁₆係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、C₃-C₆烯氧基、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₁₆係C₂-C₁₂烷基，其間雜有一或多個O；或係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₁₂烯基或C₃-C₈環烷基，且n係1至20，例如1至12或1至8，尤其為1或2。 In addition, R ₁₆ is, for example, phenyl or naphthyl, especially phenyl, thienyl, or carbazole, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C _4- haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: Halogen, phenyl, OH, SH, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl) , O (CO) -phenyl, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₁₆ is a C ₂ -C ₁₂ alkyl group with one or more O interposed therebetween; or (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl And n is 1 to 20, such as 1 to 12 or 1 to 8, especially 1 or 2.

此外，R₁₆係(例如)苯基或萘基，尤其為苯基，其各未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈、NR₁₉R₂₀或C₁-C₂₀烷基；或R₁₆係C₃-C₅雜芳基，尤其為噻吩基。 In addition, R ₁₆ is, for example, phenyl or naphthyl, especially phenyl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is C ₃ -C ₅ heteroaryl, especially thienyl.

R₁₆尤其為(例如)苯基，其未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀或C₁-C₂₀烷基，或R₁₆係噻吩基。 R ₁₆ is, for example, phenyl, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl, or R ₁₆ is thienyl .

較佳地，R₁₆係(例如)苯基或萘基，其各未經取代或經一或多個C₁-C₂₀烷基取代。 Preferably, R ₁₆ is, for example, phenyl or naphthyl, each of which is unsubstituted or substituted with one or more C ₁ -C ₂₀ alkyl.

R₁₆尤其為苯基，其經一或多個C₁-C₂₀烷基取代。 R _{16 is} especially phenyl, which is substituted with one or more C ₁ -C ₂₀ alkyl.

R₁₇係(例如)氫、苯基-C₁-C₃烷基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、OH、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄)烯基、O(CO)-苯基、(CO)OH、(CO)O(C₁-C₄烷基)、C₃-C₂₀環烷基或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O；係(CH₂CH₂O)_n+1H、(GH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₁-C₈烷醯基、C₂-C₁₂烯基、C₃-C₆烯醯基或C₃-C₂₀環烷基，其視情況間雜有一或多個O；或R₁₇係苯甲醯基，其未經取代或經一或多個C₁-C₆烷基、鹵素、OH或C₁-C₃烷氧基取代；或R₁₇係苯基、萘基或C5-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、OH、C₁-C₁₂烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基-胺基或

R ₁₇ is, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OH, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO) -benzene group, (CO) OH, (CO ) O (C 1 -C 4 alkyl), C ₃ -C ₂₀ cycloalkyl interrupted by one or more O or of C ₃ -C ₂₀ cycloalkyl; or R ₁₇ lines C ₂ -C ₂₀ alkyl, with one or more O interposed therebetween; (CH ₂ CH ₂ O) _{n + 1} H, (GH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl) , C ₁ -C ₈ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl, or C ₃ -C ₂₀ cycloalkyl, optionally mixed with one or more O; or R ₁₇ series Benzamidine, which is unsubstituted or substituted with one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; or R ₁₇ is phenyl, naphthyl or C5-C ₂₀ heteroaryl groups, each unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl- C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amino or

在另一實施例中，R₁₇係(例如)氫、苯基-C₁-C₃烷基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄烯基)或間雜有一或多個O之C₂-C₂₀烷基；或係C₁-C₈烷醯基、C₂-C₁₂烯基、C₃-C₆烯醯基、間雜有一或多個O之C₂-C₂₀烷基、視情況間雜有一或多個O之C₃-C₂₀環烷基；或係苯甲醯基，其未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、OH或C₁-C₃烷氧基；或係苯基或萘基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₁₂烷基或C₁-C₁₂烷氧基。 In another embodiment, R ₁₇ is, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen , O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl), or C ₂ -C ₂₀ alkyl interspersed with one or more O; or C ₁ -C ₈ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl, C ₂ -C ₂₀ alkyl interspersed with one or more O, optionally C ₃ interspersed with one or more O -C ₂₀ cycloalkyl; or a benzoyl group based, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; Or is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: halogen, C ₁ -C ₁₂ alkyl, or C ₁ -C ₁₂ alkoxy.

R₁₇亦為(例如)氫、苯基-C₁-C₃烷基、C₁-C₈烷醯基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：鹵素、C₃-C₂₀環烷基、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄烯基)或間雜有一或多個O之C₂-C₂₀烷基，或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O。 R ₁₇ is also, for example, hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkyl, C ₁ -C ₂₀ alkyl, which is unsubstituted or via one or more of the following groups Substitution: halogen, C ₃ -C ₂₀ cycloalkyl, O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ alkenyl) or one or more O C ₂ -C ₂₀ alkyl, or R ₁₇ is C ₂ -C ₂₀ alkyl, with one or more O interposed therebetween.

R₁₇尤其為氫、C₁-C₈烷醯基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄烯基)或間雜有一或多個O之C₂-C₂₀烷基，或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O。 R _{17 is} especially hydrogen, C ₁ -C ₈ alkyl, C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted with one or more of the following groups: O (CO)-(C ₁ -C ₄ alkyl ), O (CO)-(C ₂ -C ₄ alkenyl), or C ₂ -C ₂₀ alkyl with one or more O interspersed, or R ₁₇ C ₂ -C ₂₀ alkyl with one or more interspersed between A O.

R₁₈係(例如)C₃-C₂₀環烷基，其未經間雜或間雜有一或多個O；或R₁₈係C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OH、O(CO)-(C₂-C₄)烯基、O(CO)-(C₁-C₄烷基)或(CO)OR₁₇；或R₁₈係C₂-C₂₀烷基，其間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係C₂-C₈烷醯基或C₃-C₆烯醯基、苯甲醯基；或R₁₈係苯基、萘基或C₃-C₂₀雜芳基，其各未經取代或經一或多個以下基團取代：鹵素、C₁-C₁₂烷基、C₁-C₄鹵代烷基、C₁-C₁₂烷氧基或NO₂。 R ₁₈ is, for example, a C ₃ -C ₂₀ cycloalkyl group, which is unsaturated or has one or more O; or R ₁₈ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or after one or more Group substitution: OH, O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO)-(C ₁ -C ₄ alkyl) or (CO) OR ₁₇ ; or R ₁₈ is C ₂ -C ₂₀ alkyl with one or more O, S, CO, NR ₂₆ or COOR ₁₇ interposed therebetween; or R ₁₈ is a C ₂ -C ₈ alkylfluorenyl or C ₃ -C ₆ alkenyl, benzamidine; or R ₁₈ is phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each unsubstituted or substituted with one or more of the following groups: halogen, C ₁ -C ₁₂ alkyl, C ₁ -C ₄ haloalkane Radical, C ₁ -C ₁₂ alkoxy or NO ₂ .

在另一實施例中，R₁₈係(例如)C₃-C₂₀環烷基、C₁-C₂₀烷基，其未經取代或經一或多個以下基團取代：OH、O(CO)-(C₂-C₄)烯基、O(CO)-(C₁-C₄烷基)或(CO)OR₁₇；或R₁₈係苯基或萘基，其各未經取代或經一或多個鹵素或C₁-C₁₂烷基、尤其鹵素取代。 In another embodiment, R ₁₈ is, for example, a C ₃ -C ₂₀ cycloalkyl group, a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, O (CO )-(C ₂ -C ₄ ) alkenyl, O (CO)-(C ₁ -C ₄ alkyl) or (CO) OR ₁₇ ; or R ₁₈ is phenyl or naphthyl, each of which is unsubstituted or One or more halogen or C ₁ -C ₁₂ alkyl, especially halogen substitution.

R₁₈係(例如)C₁-C₂₀烷基、C₂-C₁₂烯基、C₃-C₂₀環烷基、苯基-C₁-C₃烷基、C₂-C₈烷醯基、苯甲醯基、苯基或萘基。 R _18- based (for example) C ₁ -C ₂₀ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₂ -C ₈ alkyl , Benzamidine, phenyl or naphthyl.

舉例而言，R₁₈係C₁-C₂₀烷基，其經一或多個以下基團取代：OH、O(CO)-(C₂-C₄)烯基、O(CO)-(C₁-C₄烷基)或(CO)OR₁₇，或R₁₈係苯基，其經一或多個鹵素取代。 For example, R ₁₈ is a C ₁ -C ₂₀ alkyl group, which is substituted with one or more of the following groups: OH, O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO)-(C _1- C ₄ alkyl) or (CO) OR ₁₇ , or R ₁₈ is phenyl, which is substituted with one or more halogens.

較佳地，R₁₈係C₁-C₈烷基，其如上文所定義經取代。 Preferably, R ₁₈ is C ₁ -C ₈ alkyl, which is substituted as defined above.

舉例而言，R₁₉及R₂₀彼此獨立地為氫、C₁-C₂₀烷基、C₂-C₄羥基烷基、C₃-C₂₀環烷基、苯基-C₁-C₃烷基、苯基或萘基、C₁-C₈烷醯基、C₁-C₈烷醯基氧基、C₃-C₁₂烯醯基或苯甲醯基；或R₁₉及R₂₀與其所附接之N原子一起形成視情況間雜有O、S或NR₁₇之5員或6 員飽和或不飽和環；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，該環系統未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₄鹵代烷基、或

For example, R ₁₉ and R ₂₀ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl Phenyl, or naphthyl, C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl or benzamyl; or R ₁₉ and R ₂₀ The attached N atoms together form a 5- or 6-membered saturated or unsaturated ring optionally mixed with O, S or NR ₁₇ ; or R ₁₉ and R _{20 together} with the attached N atom form a heteroaromatic ring system, The ring system is unsubstituted or substituted with one or more of the following: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, or

此外，舉例而言，R₁₉及R₂₀彼此獨立地為氫、C₁-C₂₀烷基、C₂-C₄羥基烷基、C₃-C₂₀環烷基、苯基-C₁-C₃烷基、C₁-C₈烷醯基、C₁-C₈烷醯基氧基、C₃-C₁₂烯醯基或苯甲醯基；或R₁₉及R₂₀與其所附接之N原子一起形成視情況間雜有O或NR₁₇之5員或6員飽和環；或R₁₉及R₂₀與其所附接之N原子一起形成咔唑環。 In addition, for example, R ₁₉ and R ₂₀ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl or benzamyl; or R ₁₉ and R ₂₀ with the N to which it is attached Atoms together form a 5- or 6-membered saturated ring optionally mixed with O or NR ₁₇ ; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a carbazole ring.

舉例而言，R₁₉及R₂₀彼此獨立地為氫、C₁-C₂₀烷基、C₂-C₄羥基烷基、C₃-C₂₀環烷基、苯基-C₁-C₃烷基、C₁-C₈烷醯基、C₁-C₈烷醯基氧基、C₃-C₁₂烯醯基或苯甲醯基；或R₁₉及R₂₀與其所附接之N原子一起形成視情況間雜有O或NR₁₇之5員或6員飽和環。 For example, R ₁₉ and R ₂₀ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₃ -C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl , C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl or benzamyl; or R ₁₉ and R ₂₀ together with the N atom to which they are attached A 5 or 6 member saturated ring with O or NR ₁₇ interspersed as appropriate.

較佳地，R₁₉及R₂₀彼此獨立地為C₁-C₈烷醯基、C₁-C₈烷醯基氧基；或R₁₉及R₂₀與其所附接之N原子一起形成嗎啉環。 Preferably, R ₁₉ and R ₂₀ are independently of each other C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a morpholine ring.

舉例而言，R₂₁及R₂₂彼此獨立地為氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₃-C₁₀環烷基或苯基；或R₂₁及R₂₂與其所附接之N原子一起形成嗎啉環。R₂₁及R₂₂尤其彼此獨立地為氫或C₁-C₂₀烷基。 For example, R ₂₁ and R ₂₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl or phenyl; or R ₂₁ and R ₂₂ and The attached N atoms together form a morpholine ring. R ₂₁ and R ₂₂ are, independently of one another, hydrogen or C ₁ -C ₂₀ alkyl.

R₂₃係(例如)氫、OH、苯基或C₁-C₂₀烷基。R₂₃尤其為氫、OH或C₁-C₄烷基。 R ₂₃ is, for example, hydrogen, OH, phenyl or C ₁ -C ₂₀ alkyl. R _{23 is} especially hydrogen, OH or C ₁ -C ₄ alkyl.

R₂₄之較佳者係如針對R₁₉及R₂₀所給出。R₂₅之較佳者係如針對R₁₇所給出。 The better of R ₂₄ is as given for R ₁₉ and R ₂₀ . The better of R ₂₅ is as given for R ₁₇ .

R₂₆係(例如)氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O或CO；或係苯基-C₁-C₄烷基、C₃-C₈環烷基，其視情況間雜有一或多個O或CO；或係(CO)R₁₉或苯基，其未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈、NR₁₉R₂₀。 R ₂₆ is, for example, hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, interposed with one or more O or CO; or phenyl-C _1- C ₄ alkyl, C ₃ -C ₈ cycloalkyl, optionally mixed with one or more O or CO; or (CO) R ₁₉ or phenyl, unsubstituted or through one or more of the following groups Substitution: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ .

或R₂₆表示(例如)氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基；係苯基-C₁-C₄烷基、C₃-C₈環烷基、(CO)R₁₉或苯基，其未經取代或經一或多個C₁-C₂₀烷基取代。此外，R₂₆係(例如)氫或C₁-C₂₀烷基、尤其為C₁-C₄烷基。 Or R ₂₆ is (e.g.) hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl; phenyl-based -C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkyl, (CO) R ₁₉ or phenyl, which is unsubstituted or substituted with one or more C ₁ -C ₂₀ alkyl. Furthermore, R ₂₆ is, for example, hydrogen or C ₁ -C ₂₀ alkyl, especially C ₁ -C ₄ alkyl.

本發明該具有式(C-I)所示結構之光起始劑(C-1)之實例如下所示：

Examples of the photoinitiator (C-1) having the structure represented by the formula (CI) in the present invention are as follows:

該具有式(C-I)所示結構之光起始劑(C-1)用於使包含至少一種烯系不飽和光可聚合化合物之組合物光聚合之用途。 The use of the photoinitiator (C-1) having a structure represented by the formula (C-I) for photopolymerizing a composition containing at least one ethylenically unsaturated photopolymerizable compound.

於本發明之具體例中，基於該鹼可溶性樹脂(A)之使用量總和為100重量份，該具有式(C-I)所示結構之光起始劑(C-1)之使用量為5重量份至50重量份，較佳為8重量份至45重量份，更佳為10重量份至40重量份。當使用該具有式(C-I)所示結構之光起始劑(C-1)時，該感光性樹脂組成物所形成之黑色矩陣具有高精細度圖案的直線性佳之優點。 In a specific example of the present invention, based on the total amount of the alkali-soluble resin (A) used being 100 parts by weight, the amount of the photoinitiator (C-1) having the structure represented by formula (CI) is 5 weight Parts to 50 parts by weight, preferably 8 parts by weight to 45 parts by weight, and more preferably 10 parts by weight to 40 parts by weight. When the photoinitiator (C-1) having the structure represented by the formula (C-I) is used, the black matrix formed by the photosensitive resin composition has the advantage of having a high linearity of a high-definition pattern.

該光起始劑(C)可進一步包含其它光起始劑(C-2)。該光起始劑(C-2)之具體例可包含但不限於O-醯基肟化合物、三氮雜苯化合物、苯乙烷酮化合物、二咪唑化合物、二苯甲酮化合物、α-二酮化合物、酮醇化合物、酮醇醚化合物、醯膦氧化物、醌類化合物、含鹵素化合物、過氧化物或上述化合物之任意組合。 The photoinitiator (C) may further include other photoinitiators (C-2).该光 The light Specific examples of the initiator (C-2) may include, but are not limited to, O-fluorenyl oxime compounds, triazabenzene compounds, acetophenone compounds, diimidazole compounds, benzophenone compounds, and α-diketone compounds. Ketone alcohol compound, keto alcohol ether compound, phosphonium oxide, quinone compound, halogen-containing compound, peroxide, or any combination of the foregoing compounds.

上述O-醯基肟化合物之具體例可包含但不限於1-[4-(苯基硫代)苯基]-庚烷-1,2-二酮2-(O-苯醯基肟)、1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟)、1-[4-(苯醯基)苯基]-庚烷-1,2-二酮-2-(O-苯醯基肟)、1-[9-乙基-6-(2-甲基苯醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)、1-[9-乙基-6-(3-甲基苯醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)、1-(9-乙基-6-苯醯基-9H-咔唑-3-取代基)-乙烷酮-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫吡喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫呋喃基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫吡喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫呋喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-[9-乙基-6-(2-甲基-5-四氫吡喃基甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)、乙烷酮-1-{9-乙基-6-[2-甲基-4-(2,2-二甲基-1,3-二氧雜戊環基)苯醯基]-9H-咔唑-3-取代基}-1-(O-乙醯基肟)、乙烷酮-1-{9-乙基-6-[2-甲基-4-(2,2-二甲基-1,3-二氧雜戊環基)甲氧基苯醯基]-9H-咔唑-3-取代基}-1-(O-乙醯基肟)等之化合物，或者上述化合物之任意組合。 Specific examples of the O-fluorenyl oxime compound may include, but are not limited to, 1- [4- (phenylthio) phenyl] -heptane-1,2-dione 2- (O-phenylfluorenyl oxime), 1- [4- (phenylthio) phenyl] -octane-1,2-dione-2- (O-phenylfluorenyloxime), 1- [4- (phenylfluorenyl) phenyl]- Heptane-1,2-dione-2- (O-phenylfluorenyl oxime), 1- [9-ethyl-6- (2-methylphenylfluorenyl) -9H-carbazole-3-substituent ] -Ethyl ketone-1- (O-acetamidoxime), 1- [9-ethyl-6- (3-methylphenylfluorenyl) -9H-carbazole-3-substituent] -ethane Keto-1- (O-ethylammonium oxime), 1- (9-ethyl-6-phenylfluorenyl-9H-carbazole-3-substituent) -ethanone-1- (O-ethylamyl Oxime), acetone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofurylphenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-acetamidine Oxime), acetone-1- [9-ethyl-6- (2-methyl-5-tetrahydropyranylphenylfluorenyl) -9H-carbazole-3-substituent] -1- ( O-acetamidoxime), acetone-1- [9-ethyl-6- (2-methyl-5-tetrahydrofurylphenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-ethylammonium oxime), ethyl ketone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofurylmethoxyphenylfluorenyl) -9H-carbazole-3-substituent ] -1- (O-acetylamoxime), acetone-1- [9-ethyl-6- (2-methyl-4-tetrahydropyranylmethoxy) Phenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-ethylfluorenyloxime), acetone-1- [9-ethyl-6- (2-methyl-5-tetrahydrofuran) Methoxyphenylbenzyl) -9H-carbazole-3-substituent] -1- (O-ethylfluorenyloxime), acetone-1- [9-ethyl-6- (2-methyl -5-tetrahydropyranylmethoxyphenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-ethylfluorenyloxime), acetone-1- {9-ethyl- 6- [2-methyl-4- (2,2-dimethyl-1,3-dioxolyl) phenylfluorenyl] -9H-carbazole-3-substituent} -1- (O -Ethynyl oxime), acetone-1- {9-ethyl-6- [2-methyl-4- (2,2-dimethyl-1,3-dioxolane) methyl Compounds such as oxyphenylfluorenyl] -9H-carbazole-3-substituent} -1- (O-acetamidooxime), or any combination thereof.

較佳地，該O-醯基肟化合物可為1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟)，其可為汽巴精化有限公司製造之商品，且型號為OXE-01；1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)，其可為汽巴精化有限公司製造之商品，且型號為OXE-02；乙烷酮-1-[9-乙基-6-(2-甲基-4-四氫呋喃甲氧基苯醯基)-9H-咔唑-3-取代基]-1-(O-乙醯基肟)；乙烷酮-1-{9-乙基-6-[2-甲基-4-(2,2-二甲基-1,3-二氧雜戊環基)甲氧基苯醯基]-9H-咔唑-3-取代基}-1-(O-乙醯基肟)或上述化合物之任意組合。該O-醯基肟化合物可單獨一種或混合複數種使用。 Preferably, the O-fluorenyl oxime compound may be 1- [4- (phenylthio) phenyl] -octane-1,2-dione-2- (O-phenylfluorenyl oxime). Can be a manufacturer of Ciba Refining Co., Ltd. Product, and the model is OXE-01; 1- [9-ethyl-6- (2-methylbenzyl) -9H-carbazole-3-substituent] -ethanone-1- (O- Acetyl oxime), which can be a product manufactured by Ciba Refining Co., Ltd. and the model number is OXE-02; acetone-1- [9-ethyl-6- (2-methyl-4-tetrahydrofuranmethyl) Oxyphenylfluorenyl) -9H-carbazole-3-substituent] -1- (O-ethylfluorenyloxime); acetone-1- {9-ethyl-6- [2-methyl-4 -(2,2-dimethyl-1,3-dioxapentyl) methoxyphenylfluorenyl] -9H-carbazole-3-substituent} -1- (O-ethanyloxime) Or any combination of the above compounds. These O-fluorenyl oxime compounds may be used alone or in combination.

上述三氮雜苯化合物之具體例可包含但不限於乙烯基-鹵代甲基-s-三氮雜苯化合物、2-(萘并-1-取代基)-4,6-雙-鹵代甲基-s-三氮雜苯化合物、4-(對-胺基苯基)-2,6-二-鹵代甲基-s-三氮雜苯化合物等之化合物，或者上述化合物之任意組合。 Specific examples of the above-mentioned triazabenzene compound may include, but are not limited to, vinyl-halomethyl-s-triazabenzene compound, 2- (naphtho-1-substituted) -4,6-bis-halo Methyl-s-triazabenzene compound, 4- (p-aminophenyl) -2,6-di-halomethyl-s-triazabenzene compound, etc., or any combination thereof .

前述乙烯基-鹵代甲基-s-三氮雜苯化合物之具體例可包含但不限於2,4-雙(三氯甲基)-6-對-甲氧基苯乙烯基-s-三氮雜苯、2,4-雙(三氯甲基)-3-(1-對-二甲基胺基苯基-1,3-丁二烯基)-s-三氮雜苯或2-三氯甲基-3-胺基-6-對-甲氧基苯乙烯基-s-三氮雜苯等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned vinyl-halomethyl-s-triazabenzene compound may include, but are not limited to, 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-tri Azabenzene, 2,4-bis (trichloromethyl) -3- (1-p-dimethylaminophenyl-1,3-butadienyl) -s-triazabenzene or 2- Compounds such as trichloromethyl-3-amino-6-p-methoxystyryl-s-triazabenzene, or any combination thereof.

前述2-(萘并-1-取代基)-4,6-雙-鹵代甲基-s-三氮雜苯化合物之具體例可包含但不限於2-(萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(4-甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(4-乙氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(4-丁氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-[4-(2-甲氧基乙基)-萘并-1-取代基]-4,6-雙-三氯甲基-s-三氮雜苯、2-[4-(2-乙氧基乙基)-萘并-1-取代基]-4,6-雙-三氯甲基-s-三氮雜苯、2-[4-(2-丁氧基乙基)-萘并-1-取代基]-4,6-雙-三氯甲基-s-三氮雜苯、2-(2-甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(6-甲氧基-5-甲基-萘并-2-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(6-甲氧基-萘并-2-取代基)- 4,6-雙-三氯甲基-s-三氮雜苯、2-(5-甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(4,7-二甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯、2-(6-乙氧基-萘并-2-取代基)-4,6-雙-三氯甲基-s-三氮雜苯或2-(4,5-二甲氧基-萘并-1-取代基)-4,6-雙-三氯甲基-s-三氮雜苯等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned 2- (naphtho-1-substituted) -4,6-bis-halomethyl-s-triazabenzene compound may include, but are not limited to, 2- (naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- (4-methoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s- Triazabenzene, 2- (4-ethoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- (4-butoxy- Naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- [4- (2-methoxyethyl) -naphtho-1-substituted] -4,6-bis-trichloromethyl-s-triazabenzene, 2- [4- (2-ethoxyethyl) -naphtho-1-substituent] -4,6-bis-tri Chloromethyl-s-triazabenzene, 2- [4- (2-butoxyethyl) -naphtho-1-substituent] -4,6-bis-trichloromethyl-s-triazine Heterobenzene, 2- (2-methoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- (6-methoxy-5- (Methyl-naphtho-2-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- (6-methoxy-naphtho-2-substituted)- 4,6-bis-trichloromethyl-s-triazabenzene, 2- (5-methoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-tri Azabenzene, 2- (4,7-dimethoxy-naphtho-1-substituted) -4,6-bis-trichloromethyl-s-triazabenzene, 2- (6-ethoxy -Naphtho-2-naphtho) -4,6-bis-trichloromethyl-s-triazabenzene or 2- (4,5-dimethoxy-naphtho-1-substituted)- Compounds such as 4,6-bis-trichloromethyl-s-triazabenzene, or any combination thereof.

前述4-(對-胺基苯基)-2,6-二-鹵代甲基-s-三氮雜苯化合物之具體例可包含但不限於4-[對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-甲基-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-甲基-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-[對-N,N-二(苯基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(對-N-氯乙基羰基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-[對-N-(對-甲氧基苯基)羰基胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-溴-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氯-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氟-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-溴-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氯-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氟-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-溴-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氯-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[鄰-氟-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-溴-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氯-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-[間-氟-對-N,N-二(氯乙基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-溴-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氯-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氟-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-溴-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氯-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氟-對-N-乙氧基羰基甲基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-溴-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氯-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(間-氟-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-溴-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氯-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯、4-(鄰-氟-對-N-氯乙基胺基苯基)-2,6-二(三氯甲基)-s-三氮雜苯或2,4-雙(三氯甲基)-6-{3-溴-4-[N,N-雙(乙氧基羰基甲基)胺基]苯基}-1,3,5-三氮雜苯等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned 4- (p-aminophenyl) -2,6-di-halomethyl-s-triazabenzene compound may include, but are not limited to, 4- [p-N, N-bis (ethyl Oxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [o-methyl-p-N, N-bis (ethoxy) Carbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [p-N, N-bis (chloroethyl) aminophenyl]- 2,6-bis (trichloromethyl) -s-triazabenzene, 4- [o-methyl-p-N, N-bis (chloroethyl) aminophenyl] -2,6-di (Trichloromethyl) -s-triazabenzene, 4- (p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4 -(P-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [p-N, N-bis (phenyl ) Aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (p-N-chloroethylcarbonylaminophenyl) -2,6-bis (tri (Chloromethyl) -s-triazabenzene, 4- [p-N- (p-methoxyphenyl) carbonylaminophenyl] -2,6-bis (trichloromethyl) -s-tri Azabenzene, 4- [m-N, N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [ M-bromo-p-N, N-bis (ethoxycarbonylmethyl) amino Group] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [m-chloro-p-N, N-bis (ethoxycarbonylmethyl) aminophenyl]- 2,6-bis (trichloromethyl) -s-triazabenzene, 4- [m-fluoro-p-N, N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6 -Bis (trichloromethyl) -s-triazabenzene, 4- [o-bromo-p-N, N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis ( Trichloromethyl) -s-triazabenzene, 4- [o-chloro-p-N, N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl) ) -S-triazabenzene, 4- [o-fluoro-p-N, N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl)- s-triazabenzene, 4- [o-bromo-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene , 4- [o-chloro-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [o- Fluoro-p-N, N-bis (chloroethyl) amino Phenyl] -2,6-bis (trichloromethyl) -s-triazabenzene, 4- [m-bromo-p-N, N-bis (chloroethyl) aminophenyl] -2, 6-bis (trichloromethyl) -s-triazabenzene, 4- [m-chloro-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloro (Methyl) -s-triazabenzene, 4- [m-fluoro-p-N, N-bis (chloroethyl) aminophenyl] -2,6-bis (trichloromethyl) -s- Triazabenzene, 4- (m-bromo-p-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- ( M-chloro-p-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (m-fluoro-p-N- (Ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-bromo-p-N-ethoxycarbonylmethylamino) Phenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-chloro-p-N-ethoxycarbonylmethylaminophenyl) -2,6- Bis (trichloromethyl) -s-triazabenzene, 4- (o-fluoro-p-N-ethoxycarbonylmethylaminophenyl) -2,6-bis (trichloromethyl)- s-triazabenzene, 4- (m-bromo-p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (m -Chloro-p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazine Heterobenzene, 4- (m-fluoro-p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-bromo-p- -N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-chloro-p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) -s-triazabenzene, 4- (o-fluoro-p-N-chloroethylaminophenyl) -2,6-bis (trichloromethyl) ) -s-triazabenzene or 2,4-bis (trichloromethyl) -6- {3-bromo-4- [N, N-bis (ethoxycarbonylmethyl) amino] phenyl} Compounds such as -1,3,5-triazabenzene, or any combination thereof.

上述三氮雜苯化合物較佳可為4-[間-溴-對-N,N-二(乙氧基羰基甲基)胺基苯基]-2,6-二(三氯甲基)-s-三氮雜苯、2,4-雙(三氯甲基)-6-對-甲氧基苯乙烯基-s-三氮雜苯或上述化合物之組合。該三氮雜苯化合物可單獨一種或混合複數種使用。 The above triazabenzene compound is preferably 4- [m-bromo-p-N, N-bis (ethoxycarbonylmethyl) aminophenyl] -2,6-bis (trichloromethyl)- s-triazabenzene, 2,4-bis (trichloromethyl) -6-p-methoxystyryl-s-triazabenzene or a combination thereof. These triazabenzene compounds may be used alone or in combination.

上述苯乙烷酮化合物之具體例可包含但不限於對二甲胺苯乙烷酮、α,α’-二甲氧基氧化偶氮苯乙烷酮、2,2’-二甲基-2-苯基苯乙烷酮、對-甲氧基苯乙烷酮、2-苄基-2-N,N-二甲胺-1-(4-嗎啉代苯基)-1-丁酮或2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮等之化合物，或者上述化合物之任意組合。該苯乙烷酮化合物較佳可為2-甲基-1-[4-(甲硫基)苯基]-2-嗎福啉代-1-丙酮、2-苄基-2-N,N-二甲胺-1-(4-嗎啉代苯基)-1-丁酮。上述之苯乙烷酮化合物可單獨一種或混合複數種使用。 Specific examples of the above acetophenone compounds may include, but are not limited to, p-dimethylamine acetophenone, α, α'-dimethoxyoxy azoacetophenone, 2,2'-dimethyl-2 -Phenylacetophenone, p-methoxyacetophenone, 2-benzyl-2-N, N-dimethylamine-1- (4-morpholinophenyl) -1-butanone or Compound of 2-methyl-1- (4-methylthiophenyl) -2-morpholino-1-acetone, etc. Or any combination of the above. The acetophenone compound may preferably be 2-methyl-1- [4- (methylthio) phenyl] -2-morpholinolin-1-acetone, 2-benzyl-2-N, N -Dimethylamine-1- (4-morpholinophenyl) -1-butanone. These acetophenone compounds may be used alone or in combination.

上述二咪唑化合物之具體例可包含但不限於2,2’-雙(鄰-氯苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-氟苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-甲基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(鄰-乙基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(對-甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(2,2’,4,4’-四甲氧基苯基)-4,4’,5,5’-四苯基二咪唑、2,2’-雙(2-氯苯基)-4,4’,5,5’-四苯基二咪唑或2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑等之化合物，或者上述化合物之任意組合。上述二咪唑化合物可單獨一種或混合複數種使用。該二咪唑化合物較佳可為2,2’-雙(2,4-二氯苯基)-4,4’,5,5’-四苯基二咪唑。 Specific examples of the above diimidazole compound may include, but are not limited to, 2,2'-bis (o-chlorophenyl) -4,4 ', 5,5'-tetraphenyldiimidazole, 2,2'-bis (ortho -Fluorophenyl) -4,4 ', 5,5'-tetraphenyldiimidazole, 2,2'-bis (o-methylphenyl) -4,4', 5,5'-tetraphenyl Diimidazole, 2,2'-bis (o-methoxyphenyl) -4,4 ', 5,5'-tetraphenyldiimidazole, 2,2'-bis (o-ethylphenyl)- 4,4 ', 5,5'-tetraphenyldiimidazole, 2,2'-bis (p-methoxyphenyl) -4,4', 5,5'-tetraphenyldiimidazole, 2, 2'-bis (2,2 ', 4,4'-tetramethoxyphenyl) -4,4', 5,5'-tetraphenyldiimidazole, 2,2'-bis (2-chlorobenzene ) -4,4 ', 5,5'-tetraphenyldiimidazole or 2,2'-bis (2,4-dichlorophenyl) -4,4', 5,5'-tetraphenyldiamine A compound such as imidazole, or any combination thereof. These diimidazole compounds may be used alone or in combination. The diimidazole compound may preferably be 2,2'-bis (2,4-dichlorophenyl) -4,4 ', 5,5'-tetraphenyldiimidazole.

上述二苯甲酮化合物之具體例可包含噻噸酮、2,4-二乙基噻噸酮、噻噸酮-4-碸、二苯甲酮、4,4’-雙(二甲胺)二苯甲酮或4,4’-雙(二乙胺)二苯甲酮等之化合物，或者上述化合物之任意組合。該二苯甲酮化合物可單獨一種或混合複數種使用。該二苯甲酮化合物較佳可為4,4’-雙(二乙胺)二苯甲酮。 Specific examples of the benzophenone compound may include thioxanthone, 2,4-diethylthioxanthone, thioxanthone-4-hydrazone, benzophenone, 4,4'-bis (dimethylamine) Compounds such as benzophenone or 4,4'-bis (diethylamine) benzophenone, or any combination thereof. These benzophenone compounds may be used alone or in combination. The benzophenone compound is preferably 4,4'-bis (diethylamine) benzophenone.

上述α-二酮化合物之具體例可包含但不限於苯偶醯或乙醯基等。 Specific examples of the α-diketone compound may include, but are not limited to, benzodiazone, acetamido, and the like.

上述酮醇化合物之具體例可包含但不限於二苯乙醇酮。 A specific example of the keto alcohol compound may include, but is not limited to, benzophenone.

上述酮醇醚化合物之具體例可包含但不限於二苯乙醇酮甲醚、二苯乙醇酮***或二苯乙醇酮異丙醚等之化合物，或者上述化合物之任意組合。 Specific examples of the ketol ether compound may include, but are not limited to, benzophenone methyl ether, benzophenone ethyl ether, benzophenone isopropyl ether, and the like, or any combination of the above compounds.

上述醯膦氧化物之具體例可包含但不限於2,4,6-三甲基苯醯二苯基膦氧化物或雙-(2,6-二甲氧基苯醯)-2,4,4-三甲基苯基膦氧化物等之化合物，或者上述化合物之任意組合。 Specific examples of the above phosphonium phosphine oxide may include, but are not limited to, 2,4,6-trimethyl Compounds such as phenylphosphonium diphenylphosphine oxide or bis- (2,6-dimethoxyphenylphosphonium) -2,4,4-trimethylphenylphosphine oxide, or any combination thereof.

上述醌類化合物之具體例可包含蒽醌或1,4-萘醌等之化合物，或者上述化合物之任意組合。 Specific examples of the quinone compound may include compounds such as anthraquinone, 1,4-naphthoquinone, and the like, or any combination thereof.

上述含鹵素類化合物之具體例可包含苯醯甲基氯、三溴甲基苯碸或三(三氯甲基)-s-三氮雜苯等之化合物，或者上述化合物之任意組合。 Specific examples of the halogen-containing compound may include compounds such as benzamidine chloride, tribromomethyl benzamidine, and tris (trichloromethyl) -s-triazabenzene, or any combination of the foregoing compounds.

上述過氧化物之具體例可包含但不限於二-第三丁基過氧化物等之化合物。 Specific examples of the peroxide may include, but are not limited to, compounds such as di-third butyl peroxide.

較佳地，該光起始劑(C-2)可為1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)、1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟)、2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮或上述化合物之任意組合。 Preferably, the photoinitiator (C-2) may be 1- [9-ethyl-6- (2-methylbenzylidene) -9H-carbazole-3-substituent] -ethane Keto-1- (O-ethylfluorenyloxime), 1- [4- (phenylthio) phenyl] -octane-1,2-dione-2- (O-phenylfluorenyloxime), 2 -Methyl-1- (4-methylthiophenyl) -2-morpholino-1-acetone or any combination thereof.

基於鹼可溶性樹脂(A)之使用量為100重量份，該光起始劑(C)的使用量為5重量份至50重量份，較佳為8重量份至45重量份，且更佳為10重量份至40重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the photoinitiator (C) is 5 to 50 parts by weight, preferably 8 to 45 parts by weight, and more preferably 10 to 40 parts by weight.

本發明之溶劑(D)可溶解前述之鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)及光起始劑(C)，但又不與後述之黑色顏料(E)及矽烷化合物(F)產生反應，且較佳具有適當之揮發性。 The solvent (D) of the present invention can dissolve the aforementioned alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, and the photoinitiator (C), but is not compatible with the black pigment (E) and The silane compound (F) reacts and preferably has appropriate volatility.

該溶劑(D)之具體例可包含但不限於烷基二醇單烷醚化合物、烷基二醇單烷醚醋酸酯化合物、二乙二醇烷基醚、其他醚類化合物、酮類化合物、乳酸烷酯化合物、其他酯類化合物、芳香族烴類化合物、羧酸胺化合物或上述化合物之任意組合。上述之溶劑(D)可單獨一種或混合複數種使用。 Specific examples of the solvent (D) may include, but are not limited to, alkyl glycol monoalkyl ether compounds, alkyl glycol monoalkyl ether acetate compounds, diethylene glycol alkyl ethers, other ether compounds, ketone compounds, Alkyl lactate compounds, other ester compounds, aromatic hydrocarbon compounds, carboxylic acid amine compounds, or any combination thereof. The above-mentioned solvents (D) can be used singly or in combination.

前述烷基二醇單烷醚化合物之具體例可包含但不限於乙二醇單甲醚、乙二醇單***、二乙二醇單***、二乙二醇單正丙醚、二乙二醇單正丁醚、三乙二醇單甲醚、三乙二醇單***、丙二醇單甲醚、丙二醇單***、二丙二醇單甲醚、二丙二醇單***、二丙二醇單正丙醚、二丙二醇單正丁醚、三丙二醇單甲醚或三丙二醇單***等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned alkyl glycol monoalkyl ether compound may include, but are not limited to, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-propyl ether, Diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono-n-propyl ether Compounds such as dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether, or tripropylene glycol monoethyl ether, or any combination thereof.

前述烷基二醇單烷醚醋酸酯化合物之具體例可包含但不限於乙二醇甲醚醋酸酯、乙二醇***醋酸酯、丙二醇甲醚醋酸酯或丙二醇***醋酸酯等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned alkyl glycol monoalkyl ether acetate compound may include, but are not limited to, compounds such as ethylene glycol methyl ether acetate, ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate, or propylene glycol ethyl ether acetate, or the foregoing Any combination of compounds.

前述二乙二醇烷基醚之具體例可包含但不限於二乙二醇二甲醚、二乙二醇甲***或二乙二醇二***等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned diethylene glycol alkyl ether may include, but are not limited to, compounds such as diethylene glycol dimethyl ether, diethylene glycol methyl ether, or diethylene glycol diethyl ether, or any combination of the foregoing compounds.

前述其他醚類化合物之具體例可包含但不限於四氫呋喃等之化合物。 Specific examples of the other ether compounds may include, but are not limited to, compounds such as tetrahydrofuran.

前述酮類化合物之具體例可包含但不限於甲乙酮、環己酮、2-庚酮、3-庚酮或二丙酮醇等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned ketone compounds may include, but are not limited to, compounds such as methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, and diacetone alcohol, or any combination of the foregoing compounds.

前述乳酸烷酯化合物之具體例可包含但不限於乳酸甲酯或乳酸乙酯等之化合物，或者上述化合物之任意組合。 Specific examples of the aforementioned alkyl lactate compound may include, but are not limited to, compounds such as methyl lactate or ethyl lactate, or any combination of the aforementioned compounds.

前述其他酯類化合物之具體例可包含但不限於2-羥基-2-甲基丙酸甲酯、2-羥基-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基醋酸乙酯、羥基醋酸乙酯、2-羥基-3-甲基丁酸甲酯、3-甲基-3-甲氧基丁基醋酸酯、3-甲基-3-甲氧基丁基丙酸酯、醋酸乙酯、醋酸正丙酯、醋酸異丙酯、醋酸正丁酯、醋酸異丁酯、醋酸正戊酯、醋酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯醋酸甲酯、乙醯醋酸乙酯或2-氧基丁酸乙酯等之化合物，或者上述化合物之任意組合。 Specific examples of the other ester compounds may include, but are not limited to, methyl 2-hydroxy-2-methylpropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, 3 -Ethyl methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl glycolate, 2-hydroxy-3-methylbutane Methyl ester, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-propyl acetate, isopropyl acetate, acetic acid N-butyl ester, isobutyl acetate, n-amyl acetate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, pyruvate Compounds such as methyl ester, ethyl pyruvate, n-propyl pyruvate, methyl ethyl acetate, ethyl ethyl acetate or ethyl 2-oxybutyrate, or any combination thereof.

前述芳香族烴類化合物之具體例可包含但不限於甲苯或二甲苯等之化合物，或者上述化合物之任意組合。 Specific examples of the aromatic hydrocarbon compound may include, but are not limited to, compounds such as toluene, xylene, and the like, or any combination thereof.

前述羧酸胺化合物之具體例可為N-甲基吡咯烷酮、N,N-二甲基甲醯胺或N,N-二甲基乙醯胺等之化合物，或上述化合物之任意組合。 Specific examples of the carboxylic acid amine compound may be compounds such as N-methylpyrrolidone, N, N-dimethylformamide, N, N-dimethylacetamide, or any combination thereof.

較佳地，該溶劑(D)可為丙二醇甲醚醋酸酯或3-乙氧基丙酸乙酯。 Preferably, the solvent (D) may be propylene glycol methyl ether acetate or ethyl 3-ethoxypropionate.

基於鹼可溶性樹脂(A)之使用量為100重量份，該溶劑(D)之使用量為300重量份至3000重量份，較佳為350重量份至2500重量份，且更佳為400重量份至2000重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the solvent (D) is 300 parts by weight to 3000 parts by weight, preferably 350 parts by weight to 2500 parts by weight, and more preferably 400 parts by weight To 2000 parts by weight.

本發明之黑色顏料(E)較佳可為具有耐熱性、耐光性及耐溶劑性之黑色顏料。 The black pigment (E) of the present invention is preferably a black pigment having heat resistance, light resistance, and solvent resistance.

該黑色顏料(E)之具體例可包含但不限於二萘嵌苯黑(perylene black)、花青黑(cyanine black)或苯胺黑(aniline black)等之黑色有機顏料；由紅、藍、綠、紫、黃色、花青(cyanine)或洋紅(magenta)等之顏料中，選擇兩種或兩種以上的顏料進行混合，以形成接近黑色之混色有機顏料；碳黑(carbon black)、氧化鉻、氧化鐵、鈦黑(titanium black)或石墨等之遮光材。 Specific examples of the black pigment (E) may include, but are not limited to, black organic pigments such as perylene black, cyanine black, or aniline black; red, blue, and green , Purple, yellow, cyanine, or magenta pigments, select two or more pigments to mix to form a black-colored mixed organic pigment; carbon black (chrome black) , Iron oxide, titanium black (titanium black) or graphite and other shading materials.

上述碳黑之具體例可包含但不限於C.I.Pigment black 7，或者三菱化學公司所製造之商品，其型號為MA100、MA230、MA8、#970、#1000、#2350或#2650。該黑色顏料(E)可單獨一種或混合複數種使用。 Specific examples of the carbon black may include, but are not limited to, C.I. Pigment black 7, or a product manufactured by Mitsubishi Chemical Corporation, and its model is MA100, MA230, MA8, # 970, # 1000, # 2350, or # 2650. The black pigment (E) may be used alone or in combination.

較佳地，黑色顏料(E)可為碳黑，或者前述型號為MA100或MA230之商品。 Preferably, the black pigment (E) may be carbon black, or the aforementioned product is MA100 or MA230.

基於鹼可溶性樹脂(A)之使用量為100重量份，該黑色顏料(E)之使用量為50重量份至500重量份，較佳為60重量份至450重量份，且更佳為70重量份至400重量份。 Based on the used amount of the alkali-soluble resin (A) being 100 parts by weight, the used amount of the black pigment (E) is 50 to 500 parts by weight, preferably 60 to 450 parts by weight Parts, and more preferably 70 parts by weight to 400 parts by weight.

本發明之矽烷化合物(F)包含一第一矽烷化合物(F-1)。 The silane compound (F) of the present invention includes a first silane compound (F-1).

根據本發明之第一矽烷化合物(F-1)主要是以含有尿素鍵結的2價有機基連結具有不飽和基的有機官能基與水解性基所鍵結的矽原子者，則沒有特別的限制，較佳為單體。作為具有不飽和基的有機官能基，可例示乙烯基、丙烯基(acryl)、甲基丙烯基等，更佳為丙烯基、甲基丙烯基。作為鍵結於矽原子的水解性基，可例示甲氧基、乙氧基、丙氧基、丁氧基等之烷氧基、氯、溴等的鹵素原子、乙醯氧基等，較佳為烷氧基，更佳為碳原子數1至4之烷氧基，特佳為甲氧基、乙氧基。 The first silane compound (F-1) according to the present invention is not particularly one in which a silicon atom bonded to an organic functional group having an unsaturated group and a hydrolyzable group is mainly connected by a divalent organic group containing a urea bond. The limitation is preferably a monomer. Examples of the organic functional group having an unsaturated group include a vinyl group, an acryl group, a methacryl group, and the like, and more preferably a propenyl group and a methacryl group. Examples of the hydrolyzable group bonded to a silicon atom include an alkoxy group such as a methoxy group, an ethoxy group, a propoxy group, and a butoxy group; a halogen atom such as chlorine and bromine; and an ethoxy group. Is an alkoxy group, more preferably an alkoxy group having 1 to 4 carbon atoms, and particularly preferably a methoxy group and an ethoxy group.

具有不飽和基的有機官能基與含有尿素鍵結的2價有機基之連結構造，較佳為下述式(F-I)所示者：

The connection structure between an organic functional group having an unsaturated group and a divalent organic group containing a urea bond is preferably one represented by the following formula (FI):

上述構造中，Z₂、L、W中的取代基例如是由鹵素原子、烷基、全氟烷基、聚醚基、全氟聚醚基、水解性矽烷基、(甲基)丙烯基、環氧基、胺基、巰基所組成族群所選出的1種等，其中較佳為烷基、水解性矽烷基、(甲基)丙烯基。 In the above structure, the substituents in Z ₂ , L, and W are, for example, a halogen atom, an alkyl group, a perfluoroalkyl group, a polyether group, a perfluoropolyether group, a hydrolyzable silane group, a (meth) propenyl group, One selected from the group consisting of an epoxy group, an amino group, and a mercapto group. Among them, an alkyl group, a hydrolyzable silyl group, and a (meth) propenyl group are preferred.

作為Z₂的1價烴基，較佳為碳原子數1至20，特佳為1至10者，可舉出烷基、烯基、芳基、環烷基等。又，作為L及W的2價烴基，較佳為碳原子數1至20，特佳為1至10者，可舉出伸烷基、伸芳基等 The monovalent hydrocarbon group of Z ₂ is preferably from 1 to 20 carbon atoms, particularly preferably from 1 to 10, and examples thereof include an alkyl group, an alkenyl group, an aryl group, and a cycloalkyl group. The divalent hydrocarbon groups of L and W are preferably 1 to 20 carbon atoms, particularly preferably 1 to 10, and examples thereof include alkylene and aryl.

該第一矽烷化合物(F-1)之較佳具體例可為下述式(1)至(3)所示結構：

A preferred specific example of the first silane compound (F-1) may be a structure represented by the following formulae (1) to (3):

式(1)中，Q表示水解性基，Z₃獨立地表示非取代或取代的碳原子數1至4之烷基，s表示1至3之整數；M表示非取代或取代的碳原子數1至6之伸烷基，Z₄表示氫原子、或非取代或取代的碳原子數1至8之烷基，Z₅表示下式(i)或式(ii)所示結構之基：

In the formula (1), Q represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, and s represents an integer of 1 to 3; M represents an unsubstituted or substituted carbon atom number An alkylene group of 1 to 6, Z ₄ represents a hydrogen atom, or an unsubstituted or substituted alkyl group having 1 to 8 carbon atoms, and Z ₅ represents a group of a structure represented by the following formula (i) or (ii):

式中，Z₆及Z₇各自獨立地表示氫原子或甲基，t表示1至4；

In the formula, Z ₆ and Z ₇ each independently represent a hydrogen atom or a methyl group, and t represents 1 to 4;

式(2)中，Q表示水解性基，Z₃獨立地表示非取代或取代的碳原子數1至4之烷基，s表示1至3之整數；M表示非取代或取代的碳原子數1至6之伸烷基；Z₈、Z₉任一方表示前述式(i)或式(ii)所示結構之基，另一方則表示前述式(i)或式(ii)所示結構之基、氫原子、或非取代或取代的碳原子數1至8之烷基；

In the formula (2), Q represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, and s represents an integer of 1 to 3; M represents an unsubstituted or substituted carbon atom number. An alkylene group of 1 to 6; either of Z ₈ and Z ₉ represents a base of the structure represented by the aforementioned formula (i) or formula (ii), and the other represents a base of the structure represented by the aforementioned formula (i) or formula (ii) Radical, hydrogen atom, or unsubstituted or substituted alkyl group having 1 to 8 carbon atoms;

式(3)中，Q獨立地表示水解性基，Z₃獨立地表示非取代或取代的碳原子數1至4之烷基，s表示1至3之整數；M表示非取代或取代的碳原子數1至6之伸烷基，Z₁₀表示上式(i)或式(ii)所示結構之基。 In formula (3), Q independently represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, and s represents an integer of 1 to 3; M represents an unsubstituted or substituted carbon For an alkylene group having 1 to 6 atoms, Z ₁₀ represents a group of the structure represented by the above formula (i) or (ii).

上述式(1)至(3)中，Q表示水解性基，可例示甲氧基、乙氧基、丙氧基、丁氧基等的烷氧基、氯、溴等的鹵素原子、乙醯氧基等，較佳為烷氧基，更佳為碳原子數1至4的烷氧基，特佳為甲氧基、乙氧基。又，Z₃獨立地表示非取代或取代的碳原子數1至4之烷基，具體地可例示甲基、乙基、正丙基、異丙基、正丁基、異丁基等。s表示1至3之整數，較佳為2或3。 In the formulae (1) to (3), Q represents a hydrolyzable group, and examples thereof include alkoxy groups such as methoxy, ethoxy, propoxy, and butoxy, halogen atoms such as chlorine and bromine, and acetamidine. An oxy group and the like are preferably an alkoxy group, more preferably an alkoxy group having 1 to 4 carbon atoms, and particularly preferably a methoxy group and an ethoxy group. In addition, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, and specific examples include methyl, ethyl, n-propyl, isopropyl, n-butyl, and isobutyl. s represents an integer of 1 to 3, preferably 2 or 3.

上述式(1)中的Z₄獨立地表示氫原子、非取代或取代的碳原子數1至8之烷基，具體地可例示氫原子、甲基、乙基、丙基、異丙基、丁基、異丁基、第三丁基、戊基、己基、環己基、辛基等。 Z ₄ in the formula (1) independently represents a hydrogen atom, an unsubstituted or substituted alkyl group having 1 to 8 carbon atoms, and specifically, a hydrogen atom, a methyl group, an ethyl group, a propyl group, an isopropyl group, Butyl, isobutyl, third butyl, pentyl, hexyl, cyclohexyl, octyl and the like.

又，上述式(1)至(3)中，M例如是亞甲基、伸乙基、伸丙基、1-甲基-伸丙基、2-甲基-伸丙基、3-甲基-伸丙基、伸丁基等，惟不受此處例示者所限定。 Further, in the formulae (1) to (3), M is, for example, methylene, ethylene, propyl, 1-methyl-propyl, 2-methyl-propyl, or 3-methyl -Propylene, butylene, etc., but not limited to those exemplified here.

本發明的在1分子中具有不飽和基與尿素鍵結的矽烷化合物之具體例，係下式(4)至(12)所示，其中，Me表示甲基。 Specific examples of the silane compound having an unsaturated group and urea bond in one molecule of the present invention are represented by the following formulas (4) to (12), where Me represents a methyl group.

又，以上述式的甲氧基當作乙氧基的化合物亦可同樣地例示。 In addition, compounds having a methoxy group of the above formula as an ethoxy group can be similarly exemplified.

本發明第一矽烷化合物(F-1)係可藉由使含有1級胺基及/或2級胺基和水解性基的矽烷化合物與具有光聚合性基的異氰酸酯化合物反應而得。 The first silane compound (F-1) of the present invention can be obtained by reacting a silane compound containing a primary amine group and / or a secondary amine group and a hydrolyzable group with a photopolymerizable isocyanate compound.

於本發明第一矽烷化合物(F-1)之製造時，按照需要亦可使用溶劑，溶劑只要是與原料的胺基矽烷及異氰酸酯化合物沒有反應性，則沒有特別的限定，具體地可舉出戊烷、己烷、庚烷、癸烷等的脂肪族烴系溶劑、二乙基醚、四氫呋喃、1,4-二噁烷等的醚系溶劑、甲醯胺、二甲基甲醯胺、N-甲基吡咯烷酮等的醯胺系溶劑、苯、甲苯、二甲苯等的芳香族烴系溶劑等。 In the production of the first silane compound (F-1) of the present invention, a solvent may be used as required. The solvent is not particularly limited as long as it is non-reactive with the amine silane and isocyanate compound of the raw materials. Specific examples include Aliphatic hydrocarbon solvents such as pentane, hexane, heptane, decane, ether solvents such as diethyl ether, tetrahydrofuran, 1,4-dioxane, formamidine, dimethylformamide, Amidamine-based solvents such as N-methylpyrrolidone, and aromatic hydrocarbon-based solvents such as benzene, toluene, and xylene.

於本發明第一矽烷化合物(F-1)製造時，反應係放熱反應，若成為不宜的高溫，則有發生副反應之虞。因此在製造時，較佳為反應溫度為-10至150℃，尤佳為0至100℃，更佳為5至50℃的範圍。比-10℃低時，除了反應速度變慢，生產性會降低，亦必須特殊的製造設備來維持極低溫，而不符合現實。另一方面，比150℃高時，有發生從聚合性官能基而來之聚合反應等的副反應之虞。 During the production of the first silane compound (F-1) of the present invention, the reaction system is an exothermic reaction, and if it becomes an unsuitable high temperature, a side reaction may occur. Therefore, in the production, the reaction temperature is preferably -10 to 150 ° C, more preferably 0 to 100 ° C, and still more preferably 5 to 50 ° C. When it is lower than -10 ° C, in addition to the slower reaction speed and lower productivity, special manufacturing equipment is required to maintain extremely low temperatures, which is not in line with reality. On the other hand, when it is higher than 150 ° C, there is a possibility that a side reaction such as a polymerization reaction from a polymerizable functional group may occur.

本發明第一矽烷化合物(F-1)之製造時所需要的反應時間，只要是可藉由如上述的放熱反應來溫度管理，而且放熱反應結束，則沒有特別的限定，較佳為10分鐘至24小時，更佳為1小時至10小時左右。 Reaction time required for production of the first silane compound (F-1) of the present invention As long as the temperature can be controlled by the exothermic reaction as described above and the exothermic reaction is completed, it is not particularly limited, but is preferably 10 minutes to 24 hours, and more preferably about 1 hour to 10 hours.

作為本發明第一矽烷化合物(F-1)之製造時所需要的原料之含有1級胺基及/或2級胺基與水解性基的矽烷化合物，並沒有特別的限定，具體地可舉出α-胺基甲基三甲氧基矽烷、α-胺基甲基甲基二甲氧基矽烷、α-胺基甲基二甲基甲氧基矽烷、α-胺基甲基三乙氧基矽烷、α-胺基甲基甲基二乙氧基矽烷、α-胺基甲基二甲基乙氧基矽烷、γ-胺基丙基三甲氧基矽烷、γ-胺基丙基甲基二甲氧基矽烷、γ-胺基丙基二甲基甲氧基矽烷、γ-胺基丙基三乙氧基矽烷、γ-胺基丙基甲基二乙氧基矽烷、γ-胺基丙基二甲基乙氧基矽烷、N-2(胺基乙基)α-胺基甲基三甲氧基矽烷、N-2(胺基乙基)α-胺基甲基甲基二甲氧基矽烷、N-2(胺基乙基)α-胺基甲基二甲基甲氧基矽烷、N-2(胺基乙基)α-胺基甲基三乙氧基矽烷、N-2(胺基乙基)α-胺基甲基甲基二乙氧基矽烷、N-2(胺基乙基)α-胺基甲基二甲基乙氧基矽烷、雙-(三甲氧基矽烷基丙基)胺、雙-(甲基二甲氧基矽烷基丙基)胺、雙-(二甲基甲氧基矽烷基丙基)胺、雙-(三乙氧基矽烷基丙基)胺、雙-(甲基二乙氧基矽烷基丙基)胺、雙-(二甲基乙氧基矽烷基丙基)胺等。 The silane compound containing a primary amine group and / or a secondary amine group and a hydrolyzable group as a raw material required for the production of the first silane compound (F-1) of the present invention is not particularly limited, and specific examples thereof Α-aminomethyltrimethoxysilane, α-aminomethylmethyldimethoxysilane, α-aminomethyldimethylmethoxysilane, α-aminomethyltriethoxy Silane, α-aminomethylmethyldiethoxysilane, α-aminomethyldimethylethoxysilane, γ-aminopropyltrimethoxysilane, γ-aminopropylmethyldisiloxane Methoxysilane, γ-aminopropyldimethylmethoxysilane, γ-aminopropyltriethoxysilane, γ-aminopropylmethyldiethoxysilane, γ-aminopropyl Dimethylethoxysilane, N-2 (aminoethyl) α-aminomethyltrimethoxysilane, N-2 (aminoethyl) α-aminomethylmethyldimethoxy Silane, N-2 (aminoethyl) α-aminomethyldimethylmethoxysilane, N-2 (aminoethyl) α-aminomethyltriethoxysilane, N-2 ( Aminoethyl) α-aminomethylmethyldiethoxysilane, N-2 (aminoethyl) α-aminomethyldimethylethoxy Silane, bis- (trimethoxysilylpropyl) amine, bis- (methyldimethoxysilylpropyl) amine, bis- (dimethylmethoxysilylpropyl) amine, bis- ( Triethoxysilylpropyl) amine, bis- (methyldiethoxysilylpropyl) amine, bis- (dimethylethoxysilylpropyl) amine, and the like.

作為本發明第一矽烷化合物(F-1)之製造時所需要的原料之具有光聚合性基的異氰酸酯化合物，只要是具有上述官能基，則沒有特別的限定，作為市售容易取得者，可舉出(甲基)丙烯醯氧基乙基異氰酸酯、乙二醇-異氰酸基乙基醚單(甲基)丙烯酸酯、雙-1,1-((甲基)丙烯醯氧基甲基)乙基異氰酸酯等。 The isocyanate compound having a photopolymerizable group as a raw material required for the production of the first silane compound (F-1) of the present invention is not particularly limited as long as it has the above-mentioned functional group. As a commercially available one, it may be Examples include (meth) acryloxyethyl isocyanate, ethylene glycol-isocyanatoethyl ether mono (meth) acrylate, and bis-1,1-((meth) acryloxymethyl) ) Ethyl isocyanate and the like.

於製造本發明第一矽烷化合物(F-1)時，含有1級胺基及/或2級胺基和水解性基的矽烷化合物、與具有光聚合性基的異氰酸酯化合物之配合比係沒有特別的限定，但從反應性、生產性之點來看，對於1莫耳的含有1級胺基及/或2級胺基和水解性基的矽烷化合物，較佳為使0.5至3莫耳、尤其0.8至2.5莫耳的範圍之具有光聚合性基的異氰酸酯化合物。若具有光聚合性基的異氰酸酯化合物之配合量過少，則含有1級胺基及/或2級胺基和水解性基的矽烷化合物係大量殘留，雖然不會對矽烷的諸物性造成影響，但是除了純度降低，亦發生缺乏生產性等的缺點。相反地若過多，則彼等有發生聚合而膠化之虞。 In the production of the first silane compound (F-1) of the present invention, the mixing ratio of the silane compound containing a primary amine group and / or a secondary amine group and a hydrolyzable group to an isocyanate compound having a photopolymerizable group is not particularly limited. Limit, but from the point of reactivity and productivity It is considered that for 1 mol of a silane compound containing a primary amine group and / or a secondary amine group and a hydrolyzable group, it is preferable to have a photopolymerizable property in a range of 0.5 to 3 mol, especially 0.8 to 2.5 mol. Isocyanate compound. If the amount of the isocyanate compound having a photopolymerizable group is too small, a large amount of the silane compound containing the primary amine group and / or the secondary amine group and the hydrolyzable group remains. Although the physical properties of the silane are not affected, In addition to the decrease in purity, there are also disadvantages such as lack of productivity. Conversely, if too much, they may be polymerized and gelled.

藉由胺基與異氰酸酯基的反應來形成尿素鍵結，而得到本發明第一矽烷化合物(F-1)。再者，如此所得之矽烷化合物係適用作為矽烷偶合劑。 The urea bond is formed by the reaction of the amine group and the isocyanate group, and the first silane compound (F-1) of the present invention is obtained. The silane compound thus obtained is suitable as a silane coupling agent.

基於鹼可溶性樹脂(A)之使用量為100重量份，該第一矽烷化合物(F-1)之使用量為3重量份至30重量份，較佳為4重量份至25重量份，且更佳為5重量份至20重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the first silane compound (F-1) is 3 to 30 parts by weight, preferably 4 to 25 parts by weight, and more It is preferably 5 parts by weight to 20 parts by weight.

當未使用第一矽烷化合物(F-1)時，該感光性樹脂組成物所形成之黑色矩陣具有高精細度圖案的直線性不佳之缺陷。 When the first silane compound (F-1) is not used, the black matrix formed by the photosensitive resin composition has a defect of poor linearity of a high-definition pattern.

當本發明之第一矽烷化合物(F-1)之使用量介於上述範圍時，該感光性樹脂組成物所形成之黑色矩陣具有高精細度圖案的直線性佳之優點。 When the amount of the first silane compound (F-1) used in the present invention is within the above range, the black matrix formed by the photosensitive resin composition has the advantage of having a high linearity of a high-definition pattern.

根據本發明之矽烷化合物(F)可另包含一具有式(F-II)所示結構之第二矽烷化合物(F-2)：

The silane compound (F) according to the present invention may further include a second silane compound (F-2) having a structure represented by the formula (F-II):

於式(F-II)中，T₁表示碳數為1至6之亞烷基；及T₂表示甲基、乙基或丙基。 In the formula (F-II), T ₁ represents an alkylene group having 1 to 6 carbon atoms; and T ₂ represents a methyl group, an ethyl group, or a propyl group.

該第二矽烷化合物(F-2)之具體例可為三(三甲氧基甲矽烷基甲基)異氰脲酸酯、三(三乙氧基甲矽烷基甲基)異氰脲酸酯、三(2-三甲氧基甲矽烷基乙基)異氰脲酸酯、三(2-三乙氧基甲矽烷基乙基)異氰脲酸酯、[二(2-三甲氧基甲矽烷基乙基)-(3-三乙氧基甲矽烷基丙基)]異氰脲酸酯、[三甲氧基甲矽烷基甲基-(2-三甲氧基甲矽烷基乙基)-(3-三甲氧基甲矽烷基丙基)]異氰脲酸酯、三(3-三甲氧基矽烷基丙基)異氰脲酸酯(下述式(F-II-1)所示結構)、三(3-三乙氧基矽烷基丙基)異氰脲酸酯(下述式(F-II-2)所示結構)或三(3-三丙氧基矽烷基丙基)異氰脲酸酯(下述式(F-II-3)所示結構)等。 A specific example of the second silane compound (F-2) may be tris (trimethoxysilyl) Alkylmethyl) isocyanurate, tris (triethoxysilylmethyl) isocyanurate, tris (2-trimethoxysilylethyl) isocyanurate, tris ( 2-triethoxysilylethyl) isocyanurate, [bis (2-trimethoxysilylethyl)-(3-triethoxysilylpropyl)] isocyanurate Acid ester, [trimethoxysilylmethyl- (2-trimethoxysilylethyl)-(3-trimethoxysilylpropyl)] isocyanurate, tris (3-trimethyl Oxysilylpropyl) isocyanurate (structure represented by the following formula (F-II-1)), tris (3-triethoxysilylpropyl) isocyanurate (formula (Structure represented by (F-II-2)) or tris (3-tripropoxysilylpropyl) isocyanurate (structure represented by the following formula (F-II-3)) and the like.

基於鹼可溶性樹脂(A)之使用量為100重量份，該第二矽烷化合物(F-2)之使用量為1重量份至10重量份，較佳為1重量份至8重量份，且更佳為1重量份至5重量份。 Based on the use amount of the alkali-soluble resin (A) being 100 parts by weight, the use amount of the second silane compound (F-2) is 1 to 10 parts by weight, preferably 1 to 8 parts by weight, and more It is preferably 1 part by weight to 5 parts by weight.

當使用第二矽烷化合物(F-2)時，該感光性樹脂組成物所形成之黑色矩陣具有高精細度圖案的直線性佳之優點。 When the second silane compound (F-2) is used, the photosensitive resin composition The formed black matrix has the advantage of good linearity of the high-definition pattern.

基於鹼可溶性樹脂(A)之使用量為100重量份，該矽烷化合物(F)之使用量為4重量份至40重量份，較佳為5重量份至33重量份，且更佳為6重量份至25重量份。 Based on 100 parts by weight of the alkali-soluble resin (A), the silane compound (F) is used in an amount of 4 to 40 parts by weight, preferably 5 to 33 parts by weight, and more preferably 6 parts by weight Parts to 25 parts by weight.

在不影響本發明功效之前提下，本發明的黑色矩陣用感光性樹脂組成物可進一步選擇性地添加添加劑(G)。該添加劑(G)之具體例可包含界面活性劑、填充劑、密著促進劑、抗氧化劑、防凝集劑或前述鹼可溶性樹脂(A)以外之其他能增加各種性質(例如機械性質)的聚合物。 Before the effects of the present invention are not affected, the photosensitive resin composition for a black matrix of the present invention can be further optionally added with an additive (G). Specific examples of the additive (G) may include a surfactant, a filler, an adhesion promoter, an antioxidant, an anti-aggregation agent, or a polymerization agent that can increase various properties (for example, mechanical properties) other than the alkali-soluble resin (A). Thing.

前述界面活性劑之具體例可包含陽離子型界面活性劑、陰離子型界面活性劑、非離子型界面活性劑、兩性界面活性劑、聚矽氧烷界面活性劑、氟素界面活性劑或上述界面活性劑之任意組合。 Specific examples of the aforementioned surfactant may include a cationic surfactant, an anionic surfactant, a nonionic surfactant, an amphoteric surfactant, a polysiloxane surfactant, a fluorine surfactant, or the above-mentioned surfactant. Any combination of agents.

該界面活性劑之具體例可包含但不限於聚乙氧基十二烷基醚、聚乙氧基硬酯醯醚或聚乙氧基油醚等之聚乙氧基烷基醚類；聚乙氧基辛基苯基醚或聚乙氧基壬基苯基醚等之聚乙氧基烷基苯基醚類；聚乙二醇二月桂酸酯或聚乙二醇二硬酸酯等之聚乙二醇二酯類；山梨糖醇酐脂肪酸酯化合物；脂肪酸改質的聚酯化合物；三級胺改質的聚胺基甲酸酯化合物；或者市售之商品。其中，該市售商品可為信越化學工業公司製造之產品，且其型號為KP；道康寧東麗股份有限公司(Dow Corning Toray Co.,Ltd.)製造之產品，且其型號為SF-8427；共榮社油脂化學工業製造之產品，且其型號為Polyflow；得克姆股份有限公司(Tochem Products Co.,Ltd.)製造之產品，且其型號為F-Top；大日本印墨化學工業製造之產品，且其型號為Megafac；住友3M製造之產品，且其型號為Fluorade；或者旭硝子公司製造之產品，且其型號為Asahi Guard或Surflon。該界面活性劑可單獨一種或混合複數種使用。 Specific examples of the surfactant may include, but are not limited to, polyethoxyalkyl ethers such as polyethoxydodecyl ether, polyethoxystearyl ether, or polyethoxy oleyl ether; and polyethylene Polyethoxyalkylphenyl ethers, such as oxyoctylphenyl ether or polyethoxynonylphenyl ether; Polyethylene glycol dilaurate or polyethylene glycol distearate Ethylene glycol diesters; sorbitan fatty acid ester compounds; fatty acid modified polyester compounds; tertiary amine modified polyurethane compounds; or commercially available products. Among them, the commercial product can be a product manufactured by Shin-Etsu Chemical Industry Co., Ltd. and its model is KP; a product manufactured by Dow Corning Toray Co., Ltd. and its model is SF-8427; Products manufactured by Kyoeisha Oil Chemical Industry, and its model is Polyflow; products manufactured by Tochem Products Co., Ltd., and its model is F-Top; manufactured by Dainippon Ink Chemical Industry Products manufactured by Megafac; Sumitomo 3M products manufactured by Fluorade; or Asahi Glass Company manufactured by Asahi Guard or Surflon. These surfactants can be used singly or in combination.

前述填充劑之具體例可包含玻璃或鋁等。 Specific examples of the filler may include glass, aluminum, and the like.

前述密著促進劑之具體例可包含乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、乙烯基三(2-甲氧基乙氧基)矽烷、N-(2-胺基乙基)-3-胺基丙基甲基二甲氧基矽烷、N-(2-胺基乙基)-3-胺基丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷(信越化學製造之商品，且其型號為KBM-403)、3-環氧丙氧基丙基甲基二乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、3-氯丙基甲基二甲氧基矽烷、3-氯丙基三甲氧基矽烷、3-甲基丙醯氧基丙基三甲氧基矽烷或3-巰丙基三甲氧基矽烷等之化合物，或者上述化合物之任意組合。 Specific examples of the adhesion promoter may include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri (2-methoxyethoxy) silane, and N- (2-aminoethyl) -3-aminopropylmethyldimethoxysilane, N- (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3- Glycidoxypropyltrimethoxysilane (a product of Shin-Etsu Chemical Co., Ltd. and its model number is KBM-403), 3-glycidoxypropylmethyldiethoxysilane, 2- (3,4 -Epoxycyclohexyl) ethyltrimethoxysilane, 3-chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methylpropoxypropyltrimethoxysilane Or a compound such as 3-mercaptopropyltrimethoxysilane, or any combination thereof.

前述抗氧化劑之具體例可包含2,2-硫代雙(4-甲基-6-第三丁基苯酚)、2,6-二-第三丁基苯酚或上述化合物之任意組合。 Specific examples of the antioxidant may include 2,2-thiobis (4-methyl-6-tert-butylphenol), 2,6-di-tert-butylphenol, or any combination thereof.

前述防凝集劑之具體例可包含聚丙烯酸鈉等之化合物。 Specific examples of the anti-coagulation agent may include compounds such as sodium polyacrylate.

基於前述鹼可溶性樹脂(A)之使用量為100重量份，該添加劑(G)中之填充劑、密著促進劑、抗氧化劑、防凝集劑或鹼可溶性樹脂(A)以外之聚合物的使用量係不超過10重量份，且較佳係不超過6重量份。 Based on 100 parts by weight of the aforementioned alkali-soluble resin (A), the use of fillers, adhesion promoters, antioxidants, anti-coagulants, or polymers other than alkali-soluble resin (A) in the additive (G) The amount is not more than 10 parts by weight, and preferably not more than 6 parts by weight.

黑色矩陣用之感光性樹脂組成物的製備係將前述之鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)、黑色顏料(E)及矽烷化合物(F)放置於攪拌器中攪拌，使其均勻混合成溶液狀態，必要時亦可添加添加劑(G)，予以均勻混合後，即可獲得溶液狀態之黑色矩陣用之感光性樹脂組成物。 The photosensitive resin composition for the black matrix is prepared by mixing the aforementioned alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, the photoinitiator (C), the solvent (D), and the black pigment ( E) and the silane compound (F) are placed in a stirrer to make them uniformly mixed into a solution state. If necessary, an additive (G) can also be added. After uniform mixing, the photosensitivity for the black matrix in the solution state can be obtained. Resin composition.

其次，黑色矩陣用之感光性樹脂組成物的製備方法並沒有特別之限制。黑色顏料(E)可直接加至由鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、溶劑(D)及矽烷化合物(F)所組成的混合物中，而可分散形成前述溶液狀態之感光性樹脂組成物。或者，先將部份之黑色顏料(E)加至由部份鹼可溶性樹脂(A)及部份溶劑(D)所組成之混合物中，以形成顏料分散液。然後，將其餘之鹼可溶性樹脂(A)、具有乙烯性不飽和基之化合物(B)、光起始劑(C)、其餘之溶劑(D)、剩餘之黑色顏料及矽烷化合物(F)加至前述之顏料分散液中，以製得溶液狀態之感光性樹脂組成物。 Second, the method for preparing the photosensitive resin composition for the black matrix is not particularly limited. The black pigment (E) can be directly added to the composition consisting of an alkali-soluble resin (A), an ethylenically unsaturated compound (B), a photoinitiator (C), a solvent (D), and a silane compound (F). A photosensitive resin composition that can be dispersed in a mixture to form the aforementioned solution Thing. Alternatively, a part of the black pigment (E) is first added to a mixture consisting of a part of the alkali-soluble resin (A) and a part of the solvent (D) to form a pigment dispersion. Then, the remaining alkali-soluble resin (A), the compound (B) having an ethylenically unsaturated group, the photoinitiator (C), the remaining solvent (D), the remaining black pigment, and the silane compound (F) were added. Into the aforementioned pigment dispersion, a photosensitive resin composition in a solution state is obtained.

其次，上述黑色顏料(E)的分散步驟可藉由珠磨機(beads mill)或輥磨機(roll mill)等之混合器來進行。 Next, the above-mentioned dispersion process of the black pigment (E) can be performed by a mixer such as a beads mill or a roll mill.

本發明亦提供一種黑色矩陣，其係由前述之感光樹脂組成物經一預烤處理、一曝光處理、一顯影處理及一後烤處理所形成。 The invention also provides a black matrix, which is formed by the aforementioned photosensitive resin composition through a pre-baking process, an exposure process, a developing process, and a post-baking process.

黑色矩陣係將上述的黑色矩陣用感光樹脂組成物塗佈在基板上，並依序進行預烤處理、曝光處理、顯影處理及後烤處理後即可製得。當所製得之黑色矩陣的膜厚為1μm時，光學密度範圍可為3.0以上，較佳為3.2至5.5，且更佳為3.5至5.5。以下詳述本發明之黑色矩陣的製備方法。 The black matrix is obtained by coating the above-mentioned photosensitive resin composition for a black matrix on a substrate, and sequentially performing a pre-baking process, an exposure process, a development process, and a post-baking process. When the film thickness of the obtained black matrix is 1 μm, the optical density range may be 3.0 or more, preferably 3.2 to 5.5, and more preferably 3.5 to 5.5. The method for preparing the black matrix of the present invention is described in detail below.

首先，藉由旋轉塗佈(spin coating)或流延塗佈(cast coating)等之塗佈方式，將溶液狀態的黑色矩陣用之感光性樹脂組成物均勻地塗佈在基板上，以形成塗膜。上述基板之具體例可包含用於液晶顯示裝置等之無鹼玻璃、鈉鈣玻璃、硬質玻璃(派勒斯玻璃)、石英玻璃及於前述之玻璃上附著透明導電膜者；或者用於固體攝影裝置等之光電變換裝置基板(例如：矽基板)等。 First, a photosensitive resin composition for a black matrix in a solution state is uniformly coated on a substrate by a coating method such as spin coating or cast coating to form a coating. membrane. Specific examples of the above substrate may include alkali-free glass, soda-lime glass, hard glass (Pales glass), quartz glass, and a transparent conductive film adhered to the aforementioned glass for liquid crystal display devices or the like; or for solid-state photography Photoelectric conversion device substrates (such as silicon substrates) of devices.

形成塗膜之後，以減壓乾燥之方式去除大部份之溶劑。然後，以預烤(pre-bake)之方式去除剩餘之溶劑，以形成預烤塗膜。根據各成分之種類及比例的不同，前述之減壓乾燥及預烤的條件係隨之改變。減壓乾燥一般係在小於200mmHg之壓力下進行1秒至20秒，且預烤係在70℃至110℃對塗膜加熱處理1分鐘至15分鐘。 After the coating film is formed, most of the solvent is removed by drying under reduced pressure. Then, the remaining solvent is removed in a pre-bake manner to form a pre-bake coating film. According to the different types and proportions of the ingredients, the aforementioned conditions for reduced-pressure drying and pre-baking change accordingly. Drying under reduced pressure is generally performed at a pressure of less than 200 mmHg for 1 second to 20 seconds, and the pre-baking system heat-treats the coating film at 70 ° C to 110 ° C for 1 minute to 15 minutes.

接著，以具有特定圖案之光罩對前述之預烤塗膜進行曝光處理。曝光處理所使用之光線可為g線、h線或i線等之紫外光，且紫外光之照射裝置可為(超)高壓水銀燈或金屬鹵素燈。 Next, the aforementioned pre-baked coating film is exposed with a mask having a specific pattern. Light processing. The light used for the exposure processing may be ultraviolet light such as g-line, h-line, or i-line, and the ultraviolet light irradiation device may be (ultra-high pressure) mercury lamp or metal halide lamp.

進行曝光處理後，將前述曝光後之預烤塗膜浸漬於21℃至25℃之顯影液(developing solution)中，以去除上述未經曝光之部分的預烤塗膜，而可在基板上形成特定的圖案。 After the exposure process, the pre-baking coating film after the exposure is immersed in a developing solution at 21 ° C to 25 ° C to remove the pre-baking coating film of the unexposed part, and it can be formed on a substrate. Specific patterns.

前述之顯影液可為氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸氫鈉、碳酸鉀、碳酸氫鉀、矽酸鈉、甲基矽酸鈉、氨水、乙胺、二乙胺、二甲基乙醇胺、氫氧化四甲胺、氫氧化四乙胺、膽鹼、吡咯、哌啶或1,8-二氮雜二環-[5,4,0]-7-十一烯等之鹼性化合物。該顯影液之濃度一般為0.001重量百分比至10重量百分比，較佳為0.005重量百分比至5重量百分比，且更佳為0.01重量百分比至1重量百分比。 The aforementioned developing solution may be sodium hydroxide, potassium hydroxide, sodium carbonate, sodium bicarbonate, potassium carbonate, potassium bicarbonate, sodium silicate, sodium methyl silicate, ammonia, ethylamine, diethylamine, dimethyl Basic compounds such as ethanolamine, tetramethylamine hydroxide, tetraethylamine hydroxide, choline, pyrrole, piperidine, or 1,8-diazabicyclo- [5,4,0] -7-undecene . The concentration of the developing solution is generally 0.001 to 10 weight percent, preferably 0.005 to 5 weight percent, and more preferably 0.01 to 1 weight percent.

進行顯影處理後，將具有特定圖案之基板以水洗淨，並利用壓縮空氣或壓縮氮氣風乾上述之基板。然後，以熱板或烘箱等加熱裝置進行後烤處理，即可於基板上形成黑色矩陣。後烤處理之溫度一般為150℃至250℃。當加熱裝置係使用熱板時，其加熱時間為5分鐘至60分鐘；當加熱裝置係使用烘箱時，其加熱時間為15分鐘至150分鐘。 After the development process, the substrate having a specific pattern is washed with water, and the above substrate is air-dried with compressed air or compressed nitrogen. Then, a post-baking process is performed with a heating device such as a hot plate or an oven to form a black matrix on the substrate. The post-baking temperature is generally 150 ° C to 250 ° C. When the heating device is a hot plate, the heating time is 5 minutes to 60 minutes; when the heating device is an oven, the heating time is 15 minutes to 150 minutes.

本發明之彩色濾光片之製備係先藉由旋轉塗佈、流延塗佈或輥式塗佈等塗布方式，將溶液狀態之彩色濾光片用的感光性樹脂組成物均勻地塗佈在前述具有黑色矩陣之基板上，以形成塗膜。 The color filter of the present invention is prepared by firstly applying a photosensitive resin composition for a color filter in a solution state by a coating method such as spin coating, cast coating, or roll coating. A coating film is formed on the aforementioned substrate having a black matrix.

形成塗膜後，藉由減壓乾燥去除大部份之溶劑，且以預烤之方式去除剩餘之溶劑，以形成預烤塗膜。其中，根據各成分之種類或比例的不同，減壓乾燥及預烤之條件係隨之改變。減壓乾燥一般係在0mmHg至200mmHg之壓力下進行1秒至60秒，且預烤係在70℃至 110℃下對塗膜加熱處理1分鐘至15分鐘。 After the coating film is formed, most of the solvent is removed by drying under reduced pressure, and the remaining solvent is removed by pre-baking to form a pre-baking coating film. Among them, the conditions for reduced-pressure drying and pre-baking vary according to the type or ratio of each component. Drying under reduced pressure is generally performed at a pressure of 0mmHg to 200mmHg for 1 second to 60 seconds, and the pre-baking system is at 70 ° C to The coating film is heat-treated at 110 ° C for 1 minute to 15 minutes.

然後，以具有特定圖案之光罩對前述之預烤塗膜進行曝光處理。曝光處理所使用之光線可為g線、h線或i線等之紫外光，且紫外光之照射裝置可為(超)高壓水銀燈或金屬鹵素燈。 Then, the aforementioned pre-baked coating film is exposed with a photomask having a specific pattern. The light used for the exposure processing may be ultraviolet light such as g-line, h-line, or i-line, and the ultraviolet light irradiation device may be (ultra-high pressure) mercury lamp or metal halide lamp.

進行顯影處理後，將具有特定圖案之基板以水洗淨，並利用壓縮空氣或壓縮氮氣風乾上述之基板。然後，以熱板或烘箱等加熱裝置進行後烤處理。後烤處理之條件如前所述，在此不另贅述。重複上述之步驟，以形成紅、綠、藍等畫素著色層於基板上。 After the development process, the substrate having a specific pattern is washed with water, and the above substrate is air-dried with compressed air or compressed nitrogen. Then, post-baking treatment is performed with a heating device such as a hot plate or an oven. The conditions of the post-bake treatment are as described above, and are not repeated here. Repeat the above steps to form red, green and blue pixel color layers on the substrate.

接著，於220℃至250℃之真空環境下，利用濺鍍之方式形成ITO保護膜(蒸鍍膜)於前述畫素著色層之表面上。必要時，對ITO保護膜進行蝕刻與佈線，並在ITO保護膜表面塗佈液晶配向膜(液晶配向膜用聚醯亞胺)，而可形成具有畫素層的彩色濾光片。 Next, in a vacuum environment of 220 ° C. to 250 ° C., an ITO protective film (evaporated film) is formed on the surface of the pixel-colored layer by sputtering. If necessary, the ITO protective film is etched and wired, and a liquid crystal alignment film (polyimide for liquid crystal alignment film) is coated on the surface of the ITO protective film to form a color filter having a pixel layer.

將上述所製得之彩色濾光片及設有薄膜電晶體(thin film transistor；TFT)之基板作對向配置，並且在上述兩者之間設置間隙(晶胞間隔；cell gap)。然後，以黏著劑貼合彩色濾光片與上述基板的周圍部分並且留下注入孔。接著，在基板表面以及黏著劑所分隔出的間隙內由注入孔注入液晶，並封住注入孔，以形成液晶層。之後，將偏光板設置在彩色濾光片中接觸液晶層的另一側與基板中接觸液晶層的另一側，而可製成液晶顯示器。 The color filter and the substrate provided with a thin film transistor (TFT) are arranged opposite to each other, and a gap (cell gap) is provided between the two. Then, the color filter and a peripheral portion of the substrate are bonded with an adhesive, and an injection hole is left. Then, liquid crystal is injected through the injection hole in the gap between the substrate surface and the adhesive, and the injection hole is sealed to form a liquid crystal layer. After that, the polarizing plate is disposed on the other side of the color filter that contacts the liquid crystal layer and the other side of the substrate that contacts the liquid crystal layer, so that a liquid crystal display can be manufactured.

上述之液晶可為液晶化合物或液晶組成物，此處並未特別限定，惟可使用任何一種液晶化合物及液晶組成物。 The above liquid crystal may be a liquid crystal compound or a liquid crystal composition, which is not particularly limited here, but any liquid crystal compound and liquid crystal composition may be used.

再者，彩色濾光片中所使用的液晶配向膜是用來限制液晶分子的配向，且其沒有特別的限制，舉凡無機物或有機物任一者均可，並且本發明並不限於此。 In addition, the liquid crystal alignment film used in the color filter is used to limit the alignment of liquid crystal molecules, and there is no particular limitation thereon, and any inorganic or organic substance may be used, and the present invention is not limited thereto.

以下利用數個實施方式以說明本發明之應用，然其並非用以限定本發明，本發明技術領域中具有通常知識者，在不脫離本發明之精神和範圍內，當可作各種之更動與潤飾。 The following uses several embodiments to explain the application of the present invention, but it is not intended to limit the present invention. Those with ordinary knowledge in the technical field of the present invention can make various changes and modifications without departing from the spirit and scope of the present invention. Retouch.

製備鹼可溶性樹脂(A) Preparation of alkali soluble resin (A)

合成例A-1-1 Synthesis Example A-1-1

首先，將100重量份的茀環氧化合物(新日鐵化學公司製造之產品，其型號為ESF-300，且其環氧當量為231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚及130重量份的丙二醇甲醚醋酸酯以連續添加之方式加至500毫升的四口燒瓶中。反應物之入料速度控制在25重量份/分鐘，且在100℃至110℃下進行反應。反應15小時後，即可獲得固成分濃度為50重量百分比的淡黃色透明混合液。 First, 100 parts by weight of a rhenium epoxy compound (product manufactured by Nippon Steel Chemical Co., Ltd. is ESF-300 and its epoxy equivalent is 231), 30 parts by weight of acrylic acid, and 0.3 parts by weight of benzyl chloride Triethylammonium, 0.1 parts by weight of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were added to a 500-ml four-necked flask in a continuous manner. The feed rate of the reactants was controlled at 25 parts by weight / minute, and the reaction was performed at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixed solution having a solid content concentration of 50% by weight was obtained.

接著，將100重量份之上述淡黃色透明混合液加至25重量份的乙二醇***醋酸酯中，並同時添加6重量份的四氫鄰苯二甲酸酐及13重量份的二苯甲酮四甲酸二酐。然後，於110℃至115℃進行反應。反應2小時後，即可製得具有不飽和基之樹脂A-1-1，且其酸價為98.0mgKOH/g。 Next, 100 parts by weight of the above pale yellow transparent mixed solution was added to 25 parts by weight of ethylene glycol ether acetate, and 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of benzophenone were added simultaneously. Tetracarboxylic dianhydride. Then, the reaction was performed at 110 ° C to 115 ° C. After 2 hours of reaction, a resin A-1-1 having an unsaturated group was obtained, and its acid value was 98.0 mgKOH / g.

合成例A-1-2 Synthesis Example A-1-2

首先，將100重量份的茀環氧化合物(新日鐵化學公司製造之產品，其型號為ESF-300，且其環氧當量為231)、30重量份的丙烯酸、0.3重量份的氯化苄基三乙基銨、0.1重量份的2,6-二第三丁基對甲酚及130重量份的丙二醇甲醚醋酸酯以連續添加之方式加入500毫升的四口燒瓶中。反應物之入料速度控制在25重量份/分鐘，且在 100℃至110℃下進行反應。反應15小時後，即可獲得固成分濃度為50重量百分比之淡黃色透明混合液。 First, 100 parts by weight of a rhenium epoxy compound (product manufactured by Nippon Steel Chemical Co., Ltd. is ESF-300 and its epoxy equivalent is 231), 30 parts by weight of acrylic acid, and 0.3 parts by weight of benzyl chloride Triethylammonium, 0.1 parts by weight of 2,6-di-tert-butyl-p-cresol, and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500-ml four-necked flask. The feed rate of the reactants is controlled at 25 parts by weight / minute, and The reaction is performed at 100 ° C to 110 ° C. After 15 hours of reaction, a pale yellow transparent mixed solution with a solid content concentration of 50% by weight was obtained.

接著，將100重量份的上述所得的淡黃色透明混合液溶於25重量份的乙二醇***醋酸酯中，並添加13重量份的二苯甲酮四甲酸二酐。然後，於110℃至115℃進行反應。反應2小時後，添加6重量份的四氫鄰苯二甲酸酐，並於90℃至95℃下反應4小時，即可製得具有不飽和基之樹脂A-1-2，且其酸價為99.0mgKOH/g。 Next, 100 parts by weight of the light yellow transparent mixed solution obtained above was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 13 parts by weight of benzophenonetetracarboxylic dianhydride was added. Then, the reaction was performed at 110 ° C to 115 ° C. After 2 hours of reaction, 6 parts by weight of tetrahydrophthalic anhydride was added, and the reaction was performed at 90 ° C to 95 ° C for 4 hours to obtain an unsaturated resin A-1-2, and its acid value It was 99.0 mgKOH / g.

合成例A-1-3 Synthesis Example A-1-3

首先，將400重量份的環氧化合物(日本化藥股份有限公司製造之產品，其型號為NC-3000，且其環氧當量為288)、102重量份的丙烯酸、0.3重量份的甲氧基酚(methoxyphenol)、5重量份的三苯基膦及264重量份的丙二醇甲醚醋酸酯置於反應瓶中。於95℃下進行反應，經過9小時後，即可獲得酸價為2.2mgKOH/g的中間產物。接著，加入151重量份的四氫鄰苯二甲酸酐(tetrahydrophthalic anhydride)。然後，在95℃下反應4小時，即可製得具有不飽和基之樹脂A-1-3，其酸價為102mgKOH/g，且其重量平均分子量為3200。 First, 400 parts by weight of an epoxy compound (product manufactured by Nippon Kayaku Co., Ltd. is NC-3000 and its epoxy equivalent is 288), 102 parts by weight of acrylic acid, and 0.3 parts by weight of methoxy Phenol (methoxyphenol), 5 parts by weight of triphenylphosphine, and 264 parts by weight of propylene glycol methyl ether acetate were placed in a reaction bottle. The reaction was performed at 95 ° C. After 9 hours, an intermediate product having an acid value of 2.2 mgKOH / g was obtained. Next, 151 parts by weight of tetrahydrophthalic anhydride was added. Then, the reaction was performed at 95 ° C for 4 hours to obtain a resin A-1-3 having an unsaturated group, which had an acid value of 102 mgKOH / g and a weight average molecular weight of 3200.

合成例A-2-1 Synthesis Example A-2-1

首先，將1重量份的2,2’-偶氮雙異丁腈、240重量份的丙二醇甲醚醋酸酯、20重量份的甲基丙烯酸、15重量份的苯乙烯、35重量份的甲基丙烯酸苯甲酯、10重量份的甘油單甲基丙烯酸酯及20重量份的N-苯基馬來醯亞胺加至具有攪拌器的圓底燒瓶中。然後，在圓底燒瓶上架設冷凝器，並使圓底燒瓶內部充滿氮氣。接著，緩慢攪拌並升溫至80℃，以使各反應物均勻混合並進行聚合反應。反應4小時後，升溫至100℃，並添加0.5重量份的2,2’-偶氮二異丁腈進行反應。反應1小時後，即可製得其它鹼可溶性樹脂A-2-1。 First, 1 part by weight of 2,2'-azobisisobutyronitrile, 240 parts by weight of propylene glycol methyl ether acetate, 20 parts by weight of methacrylic acid, 15 parts by weight of styrene, and 35 parts by weight of methyl Benzyl acrylate, 10 parts by weight of glycerol monomethacrylate, and 20 parts by weight of N-phenylmaleimide were added to a round bottom flask with a stirrer. Then, a condenser was set on the round bottom flask, and the inside of the round bottom flask was filled with nitrogen. Next, slowly stir and raise the temperature to 80 ° C., so that the reactants are uniformly mixed and a polymerization reaction is performed. After 4 hours of reaction, the temperature was raised to 100 ° C, and 0.5 part by weight of 2,2'-azobisisobutyronitrile was added for reaction. After 1 hour of reaction, other alkali-soluble resins A-2-1 can be obtained.

合成例A-2-2 Synthesis Example A-2-2

首先，將2重量份的2,2’-偶氮雙異丁腈、300重量份的二丙二醇單甲醚、15重量份的甲基丙烯酸、15重量份的2-羥基丙烯酸乙酯及70重量份的甲基丙烯酸苯甲酯加至具有攪拌器的圓底燒瓶中。然後，在圓底燒瓶上架設冷凝器，並使圓底燒瓶內部充滿氮氣。接著，緩慢攪拌並升溫至80℃，以使各反應物均勻混合並進行聚合反應。反應3小時後，升溫至100℃，並添加0.5重量份的2,2’-偶氮二異丁腈進行反應。反應1小時後，即可製得其他鹼可溶性樹脂A-2-2。 First, 2 parts by weight of 2,2'-azobisisobutyronitrile, 300 parts by weight of dipropylene glycol monomethyl ether, 15 parts by weight of methacrylic acid, 15 parts by weight of ethyl 2-hydroxyacrylate, and 70 parts by weight Parts of benzyl methacrylate were added to a round bottom flask with a stirrer. Then, a condenser was set on the round bottom flask, and the inside of the round bottom flask was filled with nitrogen. Next, slowly stir and raise the temperature to 80 ° C., so that the reactants are uniformly mixed and a polymerization reaction is performed. After the reaction for 3 hours, the temperature was raised to 100 ° C, and 0.5 part by weight of 2,2'-azobisisobutyronitrile was added for reaction. After 1 hour of reaction, other alkali-soluble resin A-2-2 can be obtained.

製備感光性樹脂組成物 Preparation of photosensitive resin composition

以下係根據表1及2製備實施例1至10及比較例1至5之感光性樹脂組成物。 Hereinafter, the photosensitive resin compositions of Examples 1 to 10 and Comparative Examples 1 to 5 were prepared according to Tables 1 and 2.

實施例1：將100重量份前述之鹼可溶性樹脂A-1-1、10重量份的二季戊四醇六丙烯酸酯(以下簡稱為B-1)、5重量份的如表1所示之C-1-1光起始劑、50重量份的MA100(三菱化學製造之產品，以下簡稱為E-1)、1重量份的如表1所示之F-1-1矽烷化合物及2重量份的如表1所示之F-2-1矽烷化合物加至300重量份的丙二醇甲醚醋酸酯(以下簡稱為D-1)中，並以搖動式攪拌器(shaking type stirrer)攪拌均勻後，即可製得實施例1之感光性樹脂組成物。所得之感光性樹脂組成物以下述評價方式進行評價，所得結果如表1所示。 Example 1: 100 parts by weight of the aforementioned alkali-soluble resin A-1-1, 10 parts by weight of dipentaerythritol hexaacrylate (hereinafter referred to as B-1), and 5 parts by weight of C-1 shown in Table 1 -1 photoinitiator, 50 parts by weight of MA100 (product manufactured by Mitsubishi Chemical, hereinafter referred to as E-1), 1 part by weight of the F-1-1 silane compound shown in Table 1, and 2 parts by weight of such as The F-2-1 silane compound shown in Table 1 is added to 300 parts by weight of propylene glycol methyl ether acetate (hereinafter abbreviated as D-1), and the mixture is stirred with a shaking type stirrer. The photosensitive resin composition of Example 1 was obtained. The obtained photosensitive resin composition was evaluated by the following evaluation method, and the obtained results are shown in Table 1.

實施例2至10及比較例1至5係使用與實施例1之感光性樹脂組成物的製作方法相同之製備方法，不同之處在於實施例2至9及比較例1至7係改變感光性樹脂組成物中原料的種類及使用量，且其配方及評價結果分別如表1及表2所示，在此不另贅述。 Examples 2 to 10 and Comparative Examples 1 to 5 use the same production method as that of the photosensitive resin composition of Example 1, except that Examples 2 to 9 and Comparative Examples 1 to 7 change the sensitivity. The types and amounts of raw materials in the resin composition, and their formulations and evaluation results are shown in Tables 1 and 2, respectively, and are not repeated here.

表1及表2中： In Tables 1 and 2:

B-1 二季戊四醇六丙烯酸酯(dipentaerythritol hexaacrylate) B-1 dipentaerythritol hexaacrylate

B-2 二季戊四醇五丙烯酸酯(dipentaerythritol pentaacrylate)B-3 環氧乙烷改質的二季戊四醇六丙烯酸酯 B-2 dipentaerythritol pentaacrylate B-3 ethylene oxide modified dipentaerythritol hexaacrylate

(ethylene oxide(EO)-modified dipentaerythritol hexaacrylate) (ethylene oxide (EO) -modified dipentaerythritol hexaacrylate)

C-2-1 1-[9-乙基-6-(2-甲基苯甲醯基)-9H-咔唑-3-取代基]-乙烷酮-1-(O-乙醯基肟)(Ciba Specialty Chemicals製造之商品，型號為OXE-02) C-2-1 1- [9-ethyl-6- (2-methylbenzylidene) -9H-carbazole-3-substituent] -ethanone-1- (O-acetamidooxime ) (Product made by Ciba Specialty Chemicals, model number is OXE-02)

C-2-2 1-[4-(苯基硫代)苯基]-辛烷-1,2-二酮-2-(O-苯醯基肟)(Ciba Specialty Chemicals製造之商品，型號為OXE-01) C-2-2 1- [4- (phenylthio) phenyl] -octane-1,2-dione-2- (O-phenylhydrazine oxime) (Ciba Specialty Chemicals product, model No. OXE-01)

C-2-3 2-甲基-1-(4-甲基硫代苯基)-2-嗎啉代-1-丙酮(Ciba Specialty Chemicals製造之商品，型號為IRGACURE 907) C-2-3 2-methyl-1- (4-methylthiophenyl) -2-morpholino-1-acetone (commercial product of Ciba Specialty Chemicals, model number: IRGACURE 907)

D-1 丙二醇單甲基醚醋酸酯 D-1 Propylene glycol monomethyl ether acetate

D-2 3-乙氧基丙酸乙酯 D-2 ethyl 3-ethoxypropionate

E-1 MA100(三菱化學製造) E-1 MA100 (manufactured by Mitsubishi Chemical)

E-2 MA230(三菱化學製造) E-2 MA230 (manufactured by Mitsubishi Chemical)

F-1-1 式(4) F-1-1 Formula (4)

F-1-2 式(6) F-1-2 formula (6)

F-1-3 式(8) F-1-3 formula (8)

F-1-4 式(10) F-1-4 type (10)

F-1-5 式(12) F-1-5 formula (12)

F-2-1 式(F-II-1) F-2-1 formula (F-II-1)

F-2-2 式(F-II-2) F-2-2 (F-II-2)

F-2-3 式(F-II-3)

F-2-3 type (F-II-3)

評價方式：高精細度圖案的直線性 Evaluation method: linearity of high-definition pattern

將上述各實施例及比較例的感光性樹脂組成物以旋轉塗佈的方式塗佈在長寬均為100毫米的玻璃基板上。然後，於約100毫米汞柱(mmHg)的壓力下進行減壓乾燥約30秒鐘。接著，將上述的玻璃基板置於80℃下預烤3分鐘，以形成膜厚為2.5微米的預烤塗膜。之後，隔著具有25微米[間距(pitch)50微米]的條狀圖案的光罩，使用曝光機(Canon製造，型號為PLA-501F)以300毫焦/平方公分(mJ/cm²)的紫外光照射上述的預烤塗膜。使用紫外光照射後，將預烤塗膜浸漬於23℃的顯影液2分鐘。之後，以純水洗淨上述預烤塗膜，並以200℃對預烤塗膜進行後烤80分鐘，即可在玻璃基板上形成膜厚為2.0微米的感光性樹脂層。 The photosensitive resin composition of each said Example and the comparative example was spin-coated on the glass substrate of 100 mm in length and width. Then, it is dried under reduced pressure for about 30 seconds under a pressure of about 100 millimeters of mercury (mmHg). Next, the glass substrate was pre-baked at 80 ° C. for 3 minutes to form a pre-baked coating film having a film thickness of 2.5 μm. Thereafter, an exposure machine (manufactured by Canon, model PLA-501F) was used at a rate of 300 mJ / cm ² (mJ / cm ² ) through a photomask having a stripe pattern of 25 μm [pitch 50 μm]. Ultraviolet light was irradiated to the above-mentioned pre-baked coating film. After irradiation with ultraviolet light, the pre-bake coating film was immersed in a developing solution at 23 ° C. for 2 minutes. Thereafter, the pre-baked coating film was washed with pure water, and the pre-baked coating film was post-baked at 200 ° C. for 80 minutes to form a photosensitive resin layer having a thickness of 2.0 μm on the glass substrate.

利用光學顯微鏡對上述方法所形成的條狀圖案進行觀察，並依據下列基準評價高精細度的圖案直線性。 The strip pattern formed by the above method was observed with an optical microscope, and the linearity of the pattern with high fineness was evaluated according to the following criteria.

※：95%以上的高精細度圖案的直線性良好。 ※: More than 95% of high-definition patterns have good linearity.

◎：90%以上，小於95%的高精細度圖案的直線性良好。：: 90% or more and less than 95% of the high-definition pattern has good linearity.

○：80%以上，小於90%的高精細度圖案的直線性良好。 ○: 80% or more and less than 90% of the high-definition pattern has good linearity.

△：70%以上，小於80%的高精細度圖案的直線性良好。 △: 70% or more and less than 80% of the high-definition pattern has good linearity.

×：小於70%的高精細度圖案的直線性良好。 ×: The linearity of the high-definition pattern of less than 70% is good.

上述實施例僅為說明本發明之原理及其功效，而非限制本發明。習於此技術之人士對上述實施例所做之修改及變化仍不違背本發明之精神。本發明之權利範圍應如後述之申請專利範圍所列。 The above embodiments are only for explaining the principle of the present invention and its effects, but not for limiting the present invention. Modifications and changes made by those skilled in the art to the above embodiments still do not violate the spirit of the present invention. The scope of rights of the present invention should be listed in the scope of patent application described later.

Claims

一種黑色矩陣用之感光性樹脂組成物，包含：鹼可溶性樹脂(A)；具有乙烯性不飽和基之化合物(B)；光起始劑(C)；溶劑(D)；黑色顏料(E)；及矽烷化合物(F)；其中：該鹼可溶性樹脂(A)，包含一具有不飽和基之樹脂(A-1)，其中該具有不飽和基之樹脂(A-1)係由一混合物聚合形成，且該混合物包含具有至少二個環氧基之環氧化合物(a-1-1)及具有至少一個羧酸基與至少一個乙烯性不飽和基之化合物(a-1-2)；及該矽烷化合物(F)包含一第一矽烷化合物(F-1)，其中該第一矽烷化合物(F-1)分子內具有至少一個下式(F-I)所示之結構：

Z₁表示丙烯基(acryl group)或(甲基)丙烯基((meth)acryl group)；Z₂表示氫原子、或中間可夾入由氧原子、硫原子、氮原子所選出的雜原子或羰基碳之可有取代基的1價烴基；L表示中間可夾入由氧原子、硫原子、氮原子所選出的雜原子或羰基碳之可有取代基的2價烴基；及 W表示中間可夾入由氧原子、硫原子、氮原子所選出的雜原子或羰基碳之可有取代基的2價烴基；及基於該鹼可溶性樹脂(A)之使用量為100重量份，該第一矽烷化合物(F-1)之使用量為3重量份至30重量份。 A photosensitive resin composition for a black matrix, comprising: an alkali-soluble resin (A); a compound (B) having an ethylenically unsaturated group; a photoinitiator (C); a solvent (D); a black pigment (E) ; And a silane compound (F); wherein: the alkali-soluble resin (A) comprises a resin (A-1) having an unsaturated group, wherein the resin (A-1) having an unsaturated group is polymerized from a mixture Is formed, and the mixture includes an epoxy compound (a-1-1) having at least two epoxy groups and a compound (a-1-2) having at least one carboxylic acid group and at least one ethylenically unsaturated group; and The silane compound (F) includes a first silane compound (F-1), wherein the first silane compound (F-1) has at least one structure represented by the following formula (FI) in the molecule:

Z ₁ represents an acryl group or (meth) acryl group; Z ₂ represents a hydrogen atom, or a hetero atom selected from an oxygen atom, a sulfur atom, and a nitrogen atom, or A monovalent hydrocarbon group which may have a substituent on the carbonyl carbon; L represents a divalent hydrocarbon group which may have a hetero atom selected from an oxygen atom, a sulfur atom, and a nitrogen atom or a substituent which may be substituted on the carbonyl carbon; and W represents an intermediate A divalent hydrocarbon group in which a hetero atom selected from an oxygen atom, a sulfur atom, a nitrogen atom, or a carbonyl carbon may have a substituent; and based on the used amount of the alkali-soluble resin (A), 100 parts by weight, the first silane The compound (F-1) is used in an amount of 3 to 30 parts by weight.

根據請求項1之黑色矩陣用之感光性樹脂組成物，其中該具有至少二個環氧基之環氧化合物(a-1-1)包含具有如下式(a-I)所示之結構的化合物或如下式(a-II)所示之結構的化合物或上述化合物之組合：

於式(a-I)及式(a-II)中，A₁至A₄分別獨立地表示氫原子、鹵素原子、碳數為1至5之烷基、碳數為1至5之烷氧基、碳數為6至12之芳香基或碳數為6至12之芳烷基；A₅至A₁₈分別獨立地表示氫原子、鹵素原子、碳數為1至8之烷基或碳數為6至15之芳香基；及該u表示0至10之整數。 The photosensitive resin composition for a black matrix according to claim 1, wherein the epoxy compound (a-1-1) having at least two epoxy groups includes a compound having a structure represented by the following formula (aI) or the following A compound of the structure represented by formula (a-II) or a combination of the above compounds:

In the formula (aI) and the formula (a-II), A ₁ to A ₄ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 5 carbon atoms, an alkoxy group having 1 to 5 carbon atoms, Aromatic groups having 6 to 12 carbon atoms or aralkyl groups having 6 to 12 carbon atoms; A ₅ to A ₁₈ each independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms or a carbon number of 6 To 15; and u represents an integer from 0 to 10.

根據請求項1之黑色矩陣用之感光性樹脂組成物，基於該鹼可溶性樹脂(A)之使用量為100重量份，該具有不飽和基之樹脂(A-1)之使用量為30重量份至100重量份；該具有乙烯性不飽和基之化合物(B)之使用量為10重量份至100重量份；該光起始劑(C)之使用量為5重量份至50重量份，該溶劑(D)之使用量為300重量份至3000重量份；該黑色顏料(E)之使用量為50重量份至500重量份；及該矽烷化合物(F)之使用量為4重量份至40重量份。 The photosensitive resin composition for a black matrix according to claim 1, based on the amount of the alkali-soluble resin (A) used is 100 parts by weight, and the amount of the unsaturated resin (A-1) used is 30 parts by weight To 100 parts by weight; the ethylenically unsaturated group The use amount of the compound (B) is 10 parts by weight to 100 parts by weight; the use amount of the photoinitiator (C) is 5 parts by weight to 50 parts by weight, and the use amount of the solvent (D) is 300 parts by weight to 3000 parts by weight; the use amount of the black pigment (E) is 50 to 500 parts by weight; and the use amount of the silane compound (F) is 4 to 40 parts by weight.

根據請求項1之黑色矩陣用之感光性樹脂組成物，其中該光起始劑(C)包含一具有式(C-I)所示結構之光起始劑(C-1)：

、COR₁₆、OR₁₇、鹵素、NO₂或

；但條件為R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇ 及R₈中之至少一對係

，R₉、R₁₀、R₁₁及R₁₂彼此獨立地為氫、C₁-C₂₀烷基，該C₁-C₂₀烷基係未經取代或經一或多個以下基團取代：鹵素、苯基、CN、OH、SH、C₁-C₄-烷氧基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為未經取代之苯基或經一或多個以下基團取代之苯基：C₁-C₆烷基、鹵素、CN、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為鹵素、CN、OR₁₇、SR₁₈、SOR₁₈、SO₂R₁₈或NR₁₉R₂₀，其中該等取代基OR₁₇、SR₁₈或NR₁₉R₂₀視情況經由該等基團R₁₇、R₁₈、R₁₉及/或R₂₀與萘基環中一個碳原子形成5員或6員環；或R₉、R₁₀、R₁₁及R₁₂彼此獨立地為

、COR₁₆或NO₂；Y係O、S、NR₂₆或直接鍵；p係整數0、1、2或3；q係整數1、2或3；X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：鹵素、R₁₇、COOR₁₇、OR₁₇、SR₁₈、CONR₁₉R₂₀、 NR₁₉R₂₀、PO(OC_kH_2k+1)₂或

；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、SO、SO₂、NR₂₆或CO，或係C₂-C₁₂烯基，其係未經間雜或間雜有一或多個O、CO或NR₂₆，其中該經間雜之C₂-C₂₀烷基及該未經間雜或經間雜之C₂-C₁₂烯基係未經取代或經一或多個鹵素取代；或R₁₃係C₄-C₈環烯基、C₂-C₁₂炔基或未經間雜或間雜有一或多個O、S、CO或NR₂₆之C₃-C₁₀環烷基；或R₁₃係苯基或萘基，其各為未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀、

、COR₁₆、CN、NO₂、鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O、S、CO或NR₂₆之C₂-C₂₀烷基；或其各經C₃-C₁₀環烷基或間雜有一或多個O、S、CO或NR₂₆之C₃-C₁₀環烷基取代；k係整數1至10；R₁₄係氫、C₃-C₈環烷基、C₂-C₅烯基、C₁-C₂₀烷氧基或C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：鹵素、苯基、C₁-C₂₀烷基苯基或CN；或R₁₄係苯基或萘基，其各未經取代或經一或多個以下基團取代：C₁-C₆烷基、C₁-C₄鹵代烷基、鹵素、CN、OR₁₇、SR₁₈及/或NR₁₉R₂₀；或R₁₄係C₃-C₂₀雜芳基、C₁-C₈烷氧基、苄氧基或苯氧基，該苄氧基及苯氧基係未經取代或經一或多個以下基團取代：C₁-C₆烷基、C₁-C₄鹵代烷基及/或鹵素；R₁₅係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其各係未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀、PO(OC_kH_2k+1)₂、SO-C₁-C₁₀烷基、SO₂-C₁-C₁₀烷基、間雜有一或多個O、S或NR₂₆之C₂-C₂₀烷基；或其各經C₁-C₂₀烷基取代，該C₁-C₂₀烷基係未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係氫、C₂-C₁₂烯基、未經間雜或間雜有一或多個O、CO或NR₂₆之C₃-C₈環烷基；或R₁₅係C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：鹵素、OR₁₇、SR₁₈、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、NR₁₉R₂₀、COOR₁₇、 CONR₁₉R₂₀、PO(OC_kH_2k+1)₂、

、

、苯基；或該C₁-C₂₀烷基係經苯基取代，該苯基係經鹵素、C₁-C₂₀烷基、C₁-C₄鹵代烷基、OR₁₇、SR₁₈或NR₁₉R₂₀取代；或R₁₅係C₂-C₂₀烷基，其間雜有一或多個O、SO或SO₂，且該經間雜之C₂-C₂₀烷基係未經取代或經一或多個以下基團取代：鹵素、OR₁₇、COOR₁₇、CONR₁₉R₂₀、苯基或經OR₁₇、SR₁₈或NR₁₉R₂₀取代之苯基；或R₁₅係C₂-C₂₀烷醯基或苯甲醯基，其係未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係未經取代或經一或多個OR₁₇取代之萘甲醯基或係C₃-C₁₄雜芳基羰基；或R₁₅係C₂-C₁₂烷氧基羰基，其係未經間雜或間雜有一或多個O且該經間雜或未經間雜之C₂-C₁₂烷氧基羰基係未經取代或經一或多個羥基取代；或R₁₅係苯氧基羰基，其係未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、C₁-C₄鹵代烷基、苯基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₅係CN、CONR₁₉R₂₀、NO₂、C₁-C₄鹵代烷基、S(O)_m-C₁-C₆烷基、未經取代或經C₁-C₁₂烷基或SO₂-C₁-C₆烷基取代之S(O)_m-苯基；或R₁₅係SO₂O-苯基，其係未經取代或經C₁-C₁₂烷基取代；或係二苯基膦醯基或二(C₁-C₄烷氧基)-膦醯基；m 係1或2；R'₁₄具有針對R₁₄所給出含義中之一者； R'₁₅具有針對R₁₅所給出含義中之一者；X₁ 係O、S、SO或SO₂；X₂ 係O、CO、S或直接鍵；R₁₆係C₆-C₂₀芳基或C₃-C₂₀雜芳基，其各係未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、CN、NO₂、OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O、S或NR₂₆之C₁-C₂₀烷基；或其各經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基係未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₃-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係氫、C₁-C₂₀烷基，該C₁-C₂₀烷基係未經取代或經一或多個以下基團取代：鹵素、苯基、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-苯基、(CO)OH或(CO)O(C₁-C₄烷基)；或R₁₆係C₂-C₁₂烷基，其間雜有一或多個O、S或NR₂₆；或R₁₆係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂-C₁₂烯基或C₃-C₈環烷基；或R₁₆係經SR₁₈取代之苯基，其中該基團R₁₈表示鍵結至該COR₁₆基團所附接之該咔唑部分之該苯基或萘基環的直接鍵；n係1至20；R₁₇係氫、苯基-C₁-C₃烷基、C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：鹵素、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄)烯基、O(CO)-苯基、(CO)OH、(CO)O(C₁-C₄烷基)、C₃-C₂₀環烷基、SO₂-(C₁-C₄鹵代烷基)、O(C₁-C₄鹵代烷基)或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O、S或NR₂₆；或R₁₇係(CH₂CH₂O)_n+1H、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₁-C₈烷醯基、C₂-C₁₂烯基、C₃-C₆烯醯基或未經間雜或間雜有一或多個O、S、CO或NR₂₆之C₃-C₂₀環烷基；或R₁₇係C₁-C₈烷基-C₃-C₁₀環烷基，其係未經間雜或間雜有一或多個O；或R₁₇係苯甲醯基，其係未經取代或經一或多個C₁-C₆烷基、鹵素、OH或C₁-C₃烷氧基取代；或R₁₇係苯基、萘基或C₃-C₂₀雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、OH、C₁-C₁₂烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基-胺基或

或R₁₇形成鍵結至該基團

或

所處之苯基或萘基環之其中一個碳原子的直接鍵；R₁₈係氫、C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基，其中該C₂-C₁₂烯基、C₃-C₂₀環烷基或苯基-C₁-C₃烷基係未經間雜或間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂CN、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₂-C₄)烯基、O(CO)-(C₁-C₄烷基)、O(CO)-苯基或(CO)OR₁₇；或R₁₈係C₂-C₂₀烷基，其間雜有一或多個O、S、CO、NR₂₆或COOR₁₇；或R₁₈係(CH₂CH₂O)_nH、(CH₂CH₂O)_n(CO)-(C₁-C₈烷基)、C₂- C₈烷醯基或C₃-C₆烯醯基；或R₁₈係苯甲醯基，其係未經取代或經一或多個以下基團取代：C₁-C₆烷基、鹵素、OH、C₁-C₄烷氧基或C₁-C₄烷基硫基；或R₁₈係苯基、萘基或C₃-C₂₀雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、C₁-C₁₂烷基、C₁-C₄鹵代烷基、C₁-C₁₂烷氧基、CN、NO₂、苯基-C₁-C₃烷氧基、苯氧基、C₁-C₁₂烷基硫基、苯基硫基、N(C₁-C₁₂烷基)₂、二苯基胺基、(CO)O(C₁-C₈烷基)、(CO)-C₁-C₈烷基、(CO)N(C₁-C₈烷基)₂或

R₁₉及R₂₀彼此獨立地為氫、C₁-C₂₀烷基、C₂-C₄羥基烷基、C₂-C₁₀烷氧基烷基、C₂-C₅烯基、C₃-C₂₀環烷基、苯基-C₁-C₃烷基、C₁-C₈烷醯基、C₁-C₈烷醯基氧基、C₃-C₁₂烯醯基、SO₂-(C₁-C₄鹵代烷基)或苯甲醯基；或R₁₉及R₂₀係苯基、萘基或C₃-C₂₀雜芳基，其各係未經取代或經一或多個以下基團取代：鹵素、C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、C₁-C₁₂烷基、苯甲醯基或C₁-C₁₂烷氧基；或R₁₉及R₂₀與其所附接之N原子一起形成未經間雜或間雜有O、S或NR₁₇之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環係未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、C₁-C₂₀烷氧基、=O、OR₁₇、SR₁₈、NR₂₁R₂₂、(CO)R₂₃、 NO₂、鹵素、C₁-C₄-鹵代烷基、CN、苯基、

或未經間雜或間雜有一或多個O、S、CO或NR₁₇之C₃-C₂₀環烷基；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，該環系統係未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、 C₁-C₄鹵代烷基、C₁-C₂₀烷氧基、=O、OR₁₇、SR₁₈、 NR₂₁R₂₂、(CO)R₂₃、

、鹵素、NO₂、CN、苯基或未經間雜或間雜有一或多個O、S、CO或NR₁₇之C₃-C₂₀環烷基；R₂₁及R₂₂彼此獨立地為氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₃-C₁₀環烷基或苯基；或R₂₁及R₂₂與其所附接之N原子一起形成未經間雜或間雜有O、S或NR26之5員或6員飽和或不飽和環，且該5員或6員飽和或不飽和環係未稠合或該5員或6員飽和或不飽和環與苯環稠合；R₂₃係氫、OH、C₁-C₂₀烷基、C₁-C₄鹵代烷基、間雜有一或多個O、CO或NR₂₆之C₂-C₂₀烷基、未經間雜或間雜有O、S、CO或NR₂₆之C₃-C₂₀環烷基，或R₂₃係苯基、萘基、苯基-C₁-C₄烷基、OR₁₇、SR₁₈或NR₂₁R₂₂；R₂₄係(CO)OR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₄具有針對R₁₉及R₂₀所給出含義中之一者；R₂₅係COOR₁₇、CONR₁₉R₂₀、(CO)R₁₇；或R₂₅具有針對R₁₇所給出含義中之一者；R₂₆係氫、C₁-C₂₀烷基、C₁-C₄鹵代烷基、C₂-C₂₀烷基，其間雜有一或多個O或CO；或係苯基-C₁-C₄烷基、C₃-C₈環烷基，其係未經間雜或間雜有一或多個O或CO；或係(CO)R₁₉；或係苯基，其係未經取代或經一或多個以下基團取代：C₁-C₂₀烷基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈、NR₁₉R₂₀或

但條件為在該分子中存在至少一個基團

或

The photosensitive resin composition for a black matrix according to claim 1, wherein the photoinitiator (C) includes a photoinitiator (C-1) having a structure represented by the formula (CI):

, COR ₁₆ , OR ₁₇ , halogen, NO ₂ or

; Provided that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

, R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen , Phenyl, CN, OH, SH, C ₁ -C ₄ -alkoxy, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₉ , R ₁₀ , R ₁₁ and R _{12 is} independently unsubstituted phenyl or phenyl substituted with one or more of the following: C ₁ -C ₆ alkyl, halogen, CN, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ are independently of each other halogen, CN, OR ₁₇ , SR ₁₈ , SOR ₁₈ , SO ₂ R ₁₈ or NR ₁₉ R ₂₀ , wherein the substituents OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ optionally forms a 5- or 6-membered ring with one carbon atom in the naphthyl ring via these groups R ₁₇ , R ₁₈ , R ₁₉ and / or R ₂₀ ; or R ₉ , R ₁₀ , R ₁₁ and R ₁₂ Independent of each other

; Or R ₁₃ is a C ₂ -C ₂₀ alkyl group, interspersed with one or more O, S, SO, SO ₂ , NR ₂₆ or CO, or a C ₂ -C ₁₂ alkenyl group, which is not interspersed or interspersed One or more O, CO or NR ₂₆ wherein the interspersed C ₂ -C ₂₀ alkyl and the unsaturated or interspersed C ₂ -C ₁₂ alkenyl are unsubstituted or substituted by one or more halogens Substitution; or R ₁₃ is C ₄ -C ₈ cycloalkenyl, C ₂ -C ₁₂ alkynyl or C ₃ -C ₁₀ cycloalkyl without one or more O, S, CO or NR ₂₆ ; Or R ₁₃ is phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ ,

_{_{, COR 16, CN, NO 2}} , halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, interrupted by one or more O, S, CO or NR C ₂₆ of ₂ -C ₂₀ alkyl group; or via their respective C ₃ -C ₁₀ cycloalkyl, or interrupted by one or more O, S, CO or NR ₂₆ of the C ₃ -C ₁₀ cycloalkyl; based integer k 1 to 10; R ₁₄ type hydrogen, C ₃ -C ₈ cycloalkyl, C ₂ -C ₅ alkenyl, C ₁ -C ₂₀ alkoxy, or C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted with one or more of the following groups: halogen, Phenyl, C ₁ -C ₂₀ alkylphenyl or CN; or R ₁₄ phenyl or naphthyl, each of which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, C _1- C ₄ haloalkyl, halogen, CN, OR ₁₇ , SR ₁₈ and / or NR ₁₉ R ₂₀ ; or R ₁₄ is C ₃ -C ₂₀ heteroaryl, C ₁ -C ₈ alkoxy, benzyloxy or Phenoxy, the benzyloxy and phenoxy are unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, C ₁ -C ₄ haloalkyl and / or halogen; R ₁₅ series C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , S R ₁₈ , NR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ , SO-C ₁ -C ₁₀ alkyl, SO ₂ -C ₁ -C ₁₀ alkyl, interspersed with one or more O, S or NR C ₂ -C ₂₀ alkyl of ₂₆ ; or each substituted by C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₈ cycloalkyl without one or more O, CO or NR ₂₆ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl Group, C ₆ -C ₂₀ aryloxycarbonyl group, C ₃ -C ₂₀ heteroaryloxycarbonyl group, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ , PO (OC _k H _{2k + 1} ) ₂ ,

,

, Phenyl; or the C ₁ -C ₂₀ alkyl is substituted with phenyl, the phenyl is substituted with halogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R _{20 is} substituted; or R ₁₅ is a C ₂ -C ₂₀ alkyl group with one or more O, SO or SO ₂ interspersed therebetween, and the interspersed C ₂ -C ₂₀ alkyl group is unsubstituted or one or more Substitution of: halogen, OR ₁₇ , COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl or phenyl substituted with OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is a C ₂ -C ₂₀ alkylfluorenyl Or benzamidine, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ Unsubstituted or substituted with one or more OR ₁₇ or naphthylmethyl or C ₃ -C ₁₄ heteroarylcarbonyl; or R ₁₅ is C ₂ -C ₁₂ alkoxycarbonyl, which is unsubstituted or unsubstituted One or more O and the interspersed or unsaturated C ₂ -C ₁₂ alkoxycarbonyl group is unsubstituted or substituted with one or more hydroxyl groups; or R ₁₅ is phenoxycarbonyl group, which is unsubstituted Or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, C ₁ -C ₄ haloalkyl, Phenyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₅ is CN, CONR ₁₉ R ₂₀ , NO ₂ , C ₁ -C ₄ haloalkyl, S (O) _m -C ₁ -C ₆ alkyl, unsubstituted or C ₁ -C ₁₂ alkyl or SO ₂ -C ₁ -C ₆ alkyl group substituted with the S (O) _m - group; or R ₁₅ SO ₂ O- based phenyl, which is unsubstituted Department or by C ₁ -C ₁₂ substituted alkyl; or based diphenylphosphino acyl or di (C ₁ -C ₄ alkoxy) - phosphino acyl; m lines 1 or 2; R _'14 R ₁₄ having the targeted Give one of the meanings; R _'15 has one of the meanings given for R ₁₅ ; X ₁ is O, S, SO, or SO ₂ ; X ₂ is O, CO, S, or a direct bond; R ₁₆ C ₆ -C ₂₀ aryl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, CN, NO ₂ , OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl groups with one or more O, S or NR ₂₆ interspersed; or each of them is substituted with one or more C ₁ -C ₂₀ alkyl groups The C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₃ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or Or more of the following groups substituted: halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl ), O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl, (CO) OH or (CO) O (C ₁ -C ₄ alkyl); or R ₁₆ is C ₂ -C ₁₂ alkyl with one or more O, S or NR ₂₆ interspersed between them; or R ₁₆ series (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₂ -C ₁₂ alkenyl or C ₃ -C ₈ cycloalkyl; or R ₁₆ is a phenyl substituted with SR ₁₈ , wherein the group R ₁₈ represents a bond to the COR ₁₆ group A direct bond of the phenyl or naphthyl ring of the carbazole moiety to which the group is attached; n is 1 to 20; R ₁₇ is hydrogen, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₂₀ alkyl , Which is unsubstituted or substituted with one or more of the following groups: halogen, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN, OCH ₂ CH ₂ (CO) O (C _1- C ₄ alkyl), O (CO)-(C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO) -phenyl, (CO) OH , (CO) O (C ₁ -C ₄ alkyl), C ₃ -C ₂₀ Cycloalkyl, SO _2- (C ₁ -C ₄ haloalkyl), O (C ₁ -C ₄ haloalkyl), or C ₃ -C ₂₀ cycloalkyl interspersed with one or more O; or R ₁₇ is C ₂ -C ₂₀ alkyl with one or more O, S or NR ₂₆ interspersed between them; or R ₁₇ series (CH ₂ CH ₂ O) _{n + 1} H, (CH ₂ CH ₂ O) _n (CO)-(C ₁ -C ₈ alkyl), C ₁ -C ₈ alkyl, C ₂ -C ₁₂ alkenyl, C ₃ -C ₆ alkenyl, or one or more O, S, CO or NR ₂₆ C ₃ -C ₂₀ cycloalkyl; or R ₁₇ is C ₁ -C ₈ alkyl-C ₃ -C ₁₀ cycloalkyl, which has one or more Os without interspersed or interspersed; or R ₁₇ is benzyl Fluorenyl, which is unsubstituted or substituted with one or more C ₁ -C ₆ alkyl, halogen, OH or C ₁ -C ₃ alkoxy; or R ₁₇ is phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl groups, each of which is unsubstituted or substituted with one or more of the following groups: halogen, OH, C ₁ -C ₁₂ alkyl, C ₁ -C ₁₂ alkoxy, CN, NO ₂ , phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenyl-amino or

Or R ₁₇ forms a bond to the group

or

Direct bond to one of the carbon atoms of the phenyl or naphthyl ring; R ₁₈ is hydrogen, C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl , Wherein the C ₂ -C ₁₂ alkenyl, C ₃ -C ₂₀ cycloalkyl or phenyl-C ₁ -C ₃ alkyl is one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ CN , OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO)-(C ₂ -C ₄ ) alkenyl, O (CO)-(C ₁ -C ₄ alkyl), O (CO) -phenyl or (CO) OR ₁₇ ; or R ₁₈ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, CO, NR ₂₆ or COOR ₁₇ ; or R ₁₈ is (CH ₂ _{_{CH 2 O) n H, (}} CH 2 CH 2 O) n (CO) - (C 1 -C 8 alkyl), C ₂ - C ₈ alkanoyl group or C ₃ -C ₆ alkenyl acyl; or R ₁₈ Is benzamidine, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₆ alkyl, halogen, OH, C ₁ -C ₄ alkoxy, or C ₁ -C ₄ alkyl group; or R ₁₈ lines phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, which is unsubstituted or departments with one or more of the following radicals: halogen C ₁ -C ₁₂ alkyl, C ₁ _{-C. 4} haloalkyl, C ₁ -C ₁₂ alkoxy, CN, NO _2, phenyl -C ₁ -C ₃ alkoxy, phenoxy, C ₁ -C ₁₂ alkylthio, phenylthio, N (C ₁ -C ₁₂ alkyl) ₂ , diphenylamino, (CO) O (C ₁ -C ₈ alkyl), (CO) -C _1- C ₈ alkyl, (CO) N (C ₁ -C ₈ alkyl) ₂ or

R ₁₉ and R ₂₀ are each independently hydrogen, C ₁ -C ₂₀ alkyl, C ₂ -C ₄ hydroxyalkyl, C ₂ -C ₁₀ alkoxyalkyl, C ₂ -C ₅ alkenyl, C _3- C ₂₀ cycloalkyl, phenyl-C ₁ -C ₃ alkyl, C ₁ -C ₈ alkylfluorenyl, C ₁ -C ₈ alkylfluorenyloxy, C ₃ -C ₁₂ alkenyl, SO _2- ( C ₁ -C ₄ haloalkyl) or benzamidine; or R ₁₉ and R ₂₀ are phenyl, naphthyl or C ₃ -C ₂₀ heteroaryl, each of which is unsubstituted or substituted with one or more of the following Group substitution: halogen, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, C ₁ -C ₁₂ alkyl, benzamidine or C ₁ -C ₁₂ alkoxy; or R ₁₉ and R ₂₀ With its attached N atom to form a 5- or 6-membered saturated or unsaturated ring which is not interspersed or interspersed with O, S or NR ₁₇ , and the 5- or 6-membered saturated or unsaturated ring system is unsubstituted or Substituted by one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ , NO ₂ , Halogen, C ₁ -C ₄ -haloalkyl, CN, phenyl,

Or C ₃ -C ₂₀ cycloalkyl without one or more O, S, CO or NR ₁₇ ; or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a heteroaromatic ring system, the The ring system is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₁ -C ₂₀ alkoxy, = O, OR ₁₇ , SR ₁₈ , NR ₂₁ R ₂₂ , (CO) R ₂₃ ,

, Halogen, NO ₂ , CN, phenyl or C ₃ -C ₂₀ cycloalkyl without one or more O, S, CO or NR ₁₇ ; R ₂₁ and R ₂₂ are independently hydrogen, C _1- C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₃ -C ₁₀ cycloalkyl, or phenyl; or R ₂₁ and R ₂₂ together with the N atom to which they are attached are uninterspersed or interspersed with O, 5- or 6-membered saturated or unsaturated ring of S or NR26, and the 5- or 6-membered saturated or unsaturated ring system is not fused or the 5- or 6-membered saturated or unsaturated ring is fused with a benzene ring; R _23- series hydrogen, OH, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl interspersed with one or more O, CO or NR ₂₆ , unsaturated or interspersed O, C ₃ -C ₂₀ cycloalkyl of S, CO or NR ₂₆ , or R ₂₃ is phenyl, naphthyl, phenyl-C ₁ -C ₄ alkyl, OR ₁₇ , SR ₁₈ or NR ₂₁ R ₂₂ ; R ₂₄ Is (CO) OR ₁₇ , CONR ₁₉ R ₂₀ , (CO) R ₁₇ ; or R ₂₄ has one of the meanings given for R ₁₉ and R ₂₀ ; R ₂₅ is COOR ₁₇ , CONR ₁₉ R ₂₀ , (CO ) R _17; or R ₂₅ R ₁₇ Suo for having one of the meanings given by; R ₂₆ type hydrogen, C ₁ -C ₂₀ alkyl, C ₁ -C ₄ haloalkyl, C ₂ -C ₂₀ alkyl, therebetween One or more O or CO; or a phenyl-based -C ₁ -C ₄ alkyl, C ₃ -C ₈ cycloalkyl, which is based not interrupted or is interrupted by one or more O or CO; or tie (CO) R ₁₉ ; or is phenyl, which is unsubstituted or substituted with one or more of the following groups: C ₁ -C ₂₀ alkyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or

Provided that at least one group is present in the molecule

or

根據請求項4之黑色矩陣用之感光性樹脂組成物，其中該光起始劑(C)包含一具有式(C-I)所示結構之光起始劑(C-1)，其中，R₁、R₂、R₃、R₄、R₅、R₆、R₇及R₈彼此獨立地為氫、C₁-C₂₀烷基、

、COR₁₆或NO₂，或R₁及R₂、R₂及R₃、R₃及 R₄、R₅及R₆、R₆及R₇或R₇及R₈彼此獨立地共同為

；但條件為R₁及R₂、R₂及R₃、R₃及R₄、R₅及R₆、R₆及R₇或R₇ 及R₈中至少一對係

；X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：鹵素、OR₁₇、SR₁₈、COOR₁₇、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O、S、NR₂₆或CO；或R₁₃係苯基或萘基，此二者係未經取代或經一或多個

或COR₁₆取代；R₁₄係C₁-C₂₀烷基、苯基或C₁-C₈烷氧基；R₁₅係苯基、萘基、C₃-C₂₀雜芳基，其各係未經取代或經一或多個以下基團取代：苯基、鹵素、C₁-C₄鹵代烷基、OR₁₇、SR₁₈或C₂-C₂₀烷基，其間雜有一或多個O或S；或其各經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基係未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₄-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈、NR₁₉R₂₀或PO(OC_kH_2k+1)₂；或R₁₅係C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、C₃-C₈環烷基、C₃-C₂₀雜芳基、NR₁₉R₂₀、COOR₁₇、CONR₁₉R₂₀或PO(OC_kH_2k+1)₂；R'₁₄具有針對R₁₄所給出含義中之一者；R'₁₅具有針對R₁₅所給出含義中之一者；R₁₆係苯基，其係未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀或間雜有一或多個O、S或NR₂₆之C₂-C₂₀烷基，或R₁₆係苯基，其係經一或多個C₁-C₂₀烷基取代，該C₁-C₂₀烷基係未經取代或經一或多個以下基團取代：鹵素、COOR₁₇、CONR₁₉R₂₀、苯基、C₃-C₈環烷基、C₃-C₂₀雜芳基、C₆-C₂₀芳氧基羰基、C₄-C₂₀雜芳氧基羰基、OR₁₇、SR₁₈或NR₁₉R₂₀；或R₁₆係C₁-C₂₀烷基，其係未經取代或經以下基團取代：鹵素、苯基、OH、SH、CN、C₃-C₆烯氧基、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(CO)-(C₁-C₄烷基)或(CO)O(C₁-C₄烷基)；R₁₇係C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：鹵素、OCH₂CH₂(CO)O(C₁-C₄烷基)、O(C₁-C₄烷基)、(CO)O(C₁-C₄烷基)、C₃-C₂₀環烷基或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O；R₁₈係經(CO)OR₁₇取代之甲基；R₁₉及R₂₀彼此獨立地為氫、苯基、C₁-C₂₀烷基、C₁-C₈烷醯基或C₁-C₈烷醯基氧基；或R₁₉及R₂₀與其所附接之N原子一起形成雜芳香族環系統，該環系統係未經取代或經

取代；但條件為在該分子中存在至少一個基團

或

The photosensitive resin composition for a black matrix according to claim 4, wherein the photoinitiator (C) includes a photoinitiator (C-1) having a structure represented by formula (CI), wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, C ₁ -C ₂₀ alkyl,

But provided that at least one of R ₁ and R ₂ , R ₂ and R ₃ , R ₃ and R ₄ , R ₅ and R ₆ , R ₆ and R ₇ or R ₇ and R ₈

; X is CO or a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl, which is unsubstituted or substituted with one or more of the following groups: halogen, OR ₁₇ , SR ₁₈ , COOR ₁₇ , CONR ₁₉ R ₂₀ Or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group, which is interspersed with one or more O, S, NR ₂₆ or CO; or R ₁₃ is phenyl or naphthyl, and Both are unsubstituted or passed through one or more

Or COR ₁₆ substitution; R ₁₄ is C ₁ -C ₂₀ alkyl, phenyl or C ₁ -C ₈ alkoxy; R ₁₅ is phenyl, naphthyl, C ₃ -C ₂₀ heteroaryl, each of which is Substituted or substituted with one or more of the following groups: phenyl, halogen, C ₁ -C ₄ haloalkyl, OR ₁₇ , SR ₁₈ or C ₂ -C ₂₀ alkyl, interspersed with one or more O or S; Or each of them is substituted with one or more C ₁ -C ₂₀ alkyl groups, and the C ₁ -C ₂₀ alkyl group is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , Phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, C ₆ -C ₂₀ aryloxycarbonyl, C ₄ -C ₂₀ heteroaryloxycarbonyl, OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₅ is a C ₁ -C ₂₀ alkyl group, which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl, NR ₁₉ R ₂₀ , COOR ₁₇ , CONR ₁₉ R ₂₀ or PO (OC _k H _{2k + 1} ) ₂ ; R _'14 has the value given for R ₁₄ one of those meanings; R _'15 has the meanings for R ₁₅ Suo one of those given; R ₁₆ lines phenyl, which is unsubstituted or substituted with one line or more of the following groups: oR _17, SR ₁₈ NR ₁₉ R ₂₀ or interrupted by one or more O, S or NR ₂₆ of C ₂ -C ₂₀ alkyl, phenyl or R ₁₆ lines, which lines with one or more C ₁ -C ₂₀ substituted alkyl, said C _1- C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, COOR ₁₇ , CONR ₁₉ R ₂₀ , phenyl, C ₃ -C ₈ cycloalkyl, C ₃ -C ₂₀ heteroaryl Group, C ₆ -C ₂₀ aryloxycarbonyl group, C ₄ -C ₂₀ heteroaryloxycarbonyl group, OR ₁₇ , SR ₁₈ or NR ₁₉ R ₂₀ ; or R ₁₆ is C ₁ -C ₂₀ alkyl group, which is not Substituted or substituted by: halogen, phenyl, OH, SH, CN, C ₃ -C ₆ alkenyloxy, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (CO) -(C ₁ -C ₄ alkyl) or (CO) O (C ₁ -C ₄ alkyl); R ₁₇ is C ₁ -C ₂₀ alkyl, which is unsubstituted or via one or more of the following groups Substitution: halogen, OCH ₂ CH ₂ (CO) O (C ₁ -C ₄ alkyl), O (C ₁ -C ₄ alkyl), (CO) O (C ₁ -C ₄ alkyl), C _3- C ₂₀ cycloalkyl or C ₃ -C ₂₀ cycloalkyl mixed with one or more O; or R ₁₇ is a C ₂ -C ₂₀ alkyl mixed with one or more O; R ₁₈ is (CO) OR the _{17-substituted} methyl; R ₁₉ and R ₂₀ independently of one another hydrogen, phenyl, C ₁ -C ₂₀ alkyl, C ₁ -C ₈ alkanoyl group C ₁ -C ₈ alkoxy group, acyl; or R ₁₉ and R ₂₀ appended thereto the N atom to form a heteroaromatic ring system with the ring system is unsubstituted or system

Substitution; provided that at least one group is present in the molecule

or

根據請求項4之黑色矩陣用之感光性樹脂組成物，其中該光起始劑(C)包含一具有式(C-I)所示結構之光起始劑(C-1)，其中，R₁、R₂、R₃、R₄、R₅、R₆、R₇及R₈彼此獨立地為氫，或R₁及R₂、 R₃及R₄或R₅及R₆彼此獨立地共同為

；但條件為R₁及R₂、R₃及R₄或R₅及R₆中至少一對為

或R₂係

、COR₁₆、NO₂或

；或R₇係

或COR₁₆；R₉、R₁₁及R₁₂係氫；R₁₀係氫、OR₁₇或COR₁₆；X係CO或直接鍵；R₁₃係C₁-C₂₀烷基，其係未經取代或經一或多個以下基團取代：鹵素、R₁₇、OR₁₇、SR₁₈或PO(OC_kH_2k+1)₂；或R₁₃係C₂-C₂₀烷基，其間雜有一或多個O；或R₁₃係苯基；k係整數2；R₁₄係C₁-C₂₀烷基或噻吩基；R₁₅係苯基或萘基，其各係未經取代或經一或多個OR₁₇或C₁-C₂₀烷基取代；或R₁₅係噻吩基、氫、C₁-C₂₀烷基，該C₁-C₂₀烷基係未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、C₃-C₈環烷基、NR₁₉R₂₀或COOR₁₇；或R₁₅係C₂-C₂₀烷基，其間雜有SO₂； R₁₆係苯基或萘基，其各係未經取代或經一或多個以下基團取代：OR₁₇、SR₁₈、NR₁₉R₂₀或C₁-C₂₀烷基；或R₁₆係噻吩基；R₁₇係氫、C₁-C₈烷醯基、C₁-C₂₀烷基，該C₁-C₂₀烷基係未經取代或經一或多個以下基團取代：鹵素、O(CO)-(C₁-C₄烷基)、O(CO)-(C₂-C₄)烯基或間雜有一或多個O之C₃-C₂₀環烷基；或R₁₇係C₂-C₂₀烷基，其間雜有一或多個O；R₁₈係C₃-C₂₀環烷基、C₁-C₂₀烷基，其係未經取代或經一或多個OH、O(CO)-(C₂-C₄)烯基或(CO)OR₁₇取代；或R₁₈係苯基，其係未經取代或經一或多個鹵素取代；R₁₉及R₂₀彼此獨立地為C₁-C₈烷醯基或C₁-C₈烷醯基氧基；或R₁₉及R₂₀與其所附接之N原子一起形成間雜有O之5員或6員飽和環；但條件為在該分子中存在至少一個基團

。 The photosensitive resin composition for a black matrix according to claim 4, wherein the photoinitiator (C) includes a photoinitiator (C-1) having a structure represented by formula (CI), wherein R ₁ , R ₂ , R ₃ , R ₄ , R ₅ , R ₆ , R ₇ and R ₈ are each independently hydrogen, or R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ are independently common to each other as

; Provided that at least one of R ₁ and R ₂ , R ₃ and R ₄ or R ₅ and R ₆ is

Or R ₂ series

, COR ₁₆ , NO ₂ or

; Or R ₇ series

Or COR ₁₆ ; R ₉ , R ₁₁ and R ₁₂ are hydrogen; R ₁₀ is hydrogen, OR ₁₇ or COR ₁₆ ; X is CO or a direct bond; R ₁₃ is C ₁ -C ₂₀ alkyl, which is unsubstituted or Substituted by one or more of the following groups: halogen, R ₁₇ , OR ₁₇ , SR ₁₈ or PO (OC _k H _{2k + 1} ) ₂ ; or R ₁₃ is a C ₂ -C ₂₀ alkyl group with one or more intervening O; or R ₁₃ is phenyl; k is integer 2; R ₁₄ is C ₁ -C ₂₀ alkyl or thienyl; R ₁₅ is phenyl or naphthyl, each of which is unsubstituted or undergoes one or more OR ₁₇ or C ₁ -C ₂₀ alkyl substitution; or R ₁₅ is thienyl, hydrogen, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups : OR ₁₇ , SR ₁₈ , C ₃ -C ₈ cycloalkyl, NR ₁₉ R ₂₀ or COOR ₁₇ ; or R ₁₅ is C ₂ -C ₂₀ alkyl with SO ₂ interposed therebetween; R ₁₆ is phenyl or naphthyl , Each of which is unsubstituted or substituted with one or more of the following groups: OR ₁₇ , SR ₁₈ , NR ₁₉ R ₂₀ or C ₁ -C ₂₀ alkyl; or R ₁₆ is thienyl; R ₁₇ is hydrogen, C _1- C ₈ alkyl, C ₁ -C ₂₀ alkyl, the C ₁ -C ₂₀ alkyl is unsubstituted or substituted with one or more of the following groups: halogen, O (CO)-(C _1- C ₄ alkyl), O (CO)- (C ₂ -C ₄ ) alkenyl or C ₃ -C ₂₀ cycloalkyl with one or more O interspersed; or R ₁₇ is C ₂ -C ₂₀ alkyl with one or more O interspersed between them; R ₁₈ is C ₃ -C ₂₀ cycloalkyl, C ₁ -C ₂₀ alkyl, which are unsubstituted or substituted with one or more OH, O (CO)-(C ₂ -C ₄ ) alkenyl or (CO) OR ₁₇ ; Or R ₁₈ is phenyl, which is unsubstituted or substituted with one or more halogens; R ₁₉ and R ₂₀ are independently C ₁ -C ₈ alkylfluorenyl or C ₁ -C ₈ alkylfluorenyloxy ; Or R ₁₉ and R ₂₀ together with the N atom to which they are attached form a 5- or 6-membered saturated ring with O in between; provided that at least one group is present in the molecule

.

根據請求項4至6任何一項之黑色矩陣用之感光性樹脂組成物，其中，基於該鹼可溶性樹脂(A)之使用量為100重量份，該具有式(C-I)所示結構之光起始劑(C-1)之使用量為5重量份至50重量份。 The photosensitive resin composition for a black matrix according to any one of claims 4 to 6, wherein the amount of the alkali-soluble resin (A) is 100 parts by weight, and the light having the structure represented by the formula (CI) The amount of the initiator (C-1) used is 5 to 50 parts by weight.

根據請求項1之黑色矩陣用之感光性樹脂組成物，其中該第一矽烷化合物(F-1)具有下式(1)所示之結構：

Q表示水解性基，Z₃獨立地表示非取代或取代的碳原子數1至4之烷基，s表示1至3之整數；M表示非取代或取代的碳原子數1至 6之伸烷基，Z₄表示氫原子、或非取代或取代的碳原子數1至8之烷基，Z₅表示下式(i)或式(ii)所示結構之基：

式中，Z₆及Z₇各自獨立地表示氫原子或甲基，t表示1至4。 The photosensitive resin composition for a black matrix according to claim 1, wherein the first silane compound (F-1) has a structure represented by the following formula (1):

Q represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; M represents an unsubstituted or substituted alkylene group having 1 to 6 carbon atoms Z ₄ represents a hydrogen atom or an unsubstituted or substituted alkyl group having 1 to 8 carbon atoms, and Z ₅ represents a group of a structure represented by the following formula (i) or (ii):

In the formula, Z ₆ and Z ₇ each independently represent a hydrogen atom or a methyl group, and t represents 1 to 4.

根據請求項1之黑色矩陣用之感光性樹脂組成物，其中該第一矽烷化合物(F-1)具有下式(2)所示之結構：

Q表示水解性基，Z₃獨立地表示非取代或取代的碳原子數1至4之烷基，s表示1至3之整數；M表示非取代或取代的碳原子數1至6之伸烷基；Z₈、Z₉任一方表示式(i)或式(ii)所示結構之基，另一方則表示式(i)或式(ii)所示結構之基、氫原子、或非取代或取代的碳原子數1至8之烷基；

式中，Z₆及Z₇各自獨立地表示氫原子或甲基，t表示1至4。 The photosensitive resin composition for a black matrix according to claim 1, wherein the first silane compound (F-1) has a structure represented by the following formula (2):

Q represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; M represents an unsubstituted or substituted alkylene group having 1 to 6 carbon atoms Base; either Z ₈ or Z ₉ represents a base of a structure represented by formula (i) or formula (ii), and the other represents a base of a structure represented by formula (i) or formula (ii), a hydrogen atom, or an unsubstituted group Or substituted alkyl having 1 to 8 carbon atoms;

根據請求項1之黑色矩陣用之感光性樹脂組成物，其中該第一矽烷化合物(F-1)具有下式(3)所示之結構：

Q獨立地表示水解性基，Z₃獨立地表示非取代或取代的碳原子數1至4之烷基，s表示1至3之整數；M表示非取代或取代的碳原子數1至6之伸烷基，Z₁₀表示式(i)或式(ii)所示結構之基：

式中，Z₆及Z₇各自獨立地表示氫原子或甲基，t表示1至4。 The photosensitive resin composition for a black matrix according to claim 1, wherein the first silane compound (F-1) has a structure represented by the following formula (3):

Q independently represents a hydrolyzable group, Z ₃ independently represents an unsubstituted or substituted alkyl group having 1 to 4 carbon atoms, s represents an integer of 1 to 3; M represents an unsubstituted or substituted carbon atom of 1 to 6 Alkyl, Z ₁₀ represents a group of the structure represented by formula (i) or formula (ii):

根據請求項1之黑色矩陣用之感光性樹脂組成物，其中該矽烷化合物(F)包含一具有式(F-II)所示結構之第二矽烷化合物(F-2)：

於式(F-II)中，T₁表示碳數為1至6之亞烷基；及T₂表示甲基、乙基或丙基。 The photosensitive resin composition for a black matrix according to claim 1, wherein the silane compound (F) includes a second silane compound (F-2) having a structure represented by the formula (F-II):

In the formula (F-II), T ₁ represents an alkylene group having 1 to 6 carbon atoms; and T ₂ represents a methyl group, an ethyl group, or a propyl group.

根據請求項11之黑色矩陣用之感光性樹脂組成物，其中，基於該鹼可溶性樹脂(A)之使用量為100重量份，該具有式(F-II)所示結構之第二矽烷化合物(F-2)之使用量為1重量份至10重量份。 The photosensitive resin composition for a black matrix according to claim 11, wherein the second silane compound having a structure represented by the formula (F-II) (based on the use amount of the alkali-soluble resin (A) is 100 parts by weight) ( F-2) is used in an amount of 1 to 10 parts by weight.

一種黑色矩陣，其係由根據請求項1至12任何一項之黑色矩陣用之感光性樹脂組成物經一預烤處理、一曝光處理、一顯影處理及一後烤處理所形成。 A black matrix is formed of a photosensitive resin composition for a black matrix according to any one of claims 1 to 12 through a pre-baking process, an exposure process, a developing process, and a post-baking process.

一種彩色濾光片，係包含根據請求項13之黑色矩陣。 A color filter includes a black matrix according to claim 13.

一種液晶顯示器，係包含根據請求項14之彩色濾光片。 A liquid crystal display includes a color filter according to claim 14.