TWI531443B - A method for manufacturing an elastic film for a grinding head and a manufacturing apparatus - Google Patents
A method for manufacturing an elastic film for a grinding head and a manufacturing apparatus Download PDFInfo
- Publication number
- TWI531443B TWI531443B TW103112517A TW103112517A TWI531443B TW I531443 B TWI531443 B TW I531443B TW 103112517 A TW103112517 A TW 103112517A TW 103112517 A TW103112517 A TW 103112517A TW I531443 B TWI531443 B TW I531443B
- Authority
- TW
- Taiwan
- Prior art keywords
- elastic film
- hot pressing
- mold
- heating
- different
- Prior art date
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Description
本發明是有關於一種製造方法與製造設備，特別是指一種用於研磨頭之彈性膜的製造方法與製造設備。 The present invention relates to a manufacturing method and manufacturing apparatus, and more particularly to a manufacturing method and manufacturing apparatus for an elastic film for a polishing head.
於半導體裝置的製程中，化學機械研磨(Chemical Mechanical Polishing；CMP)是一種平整化基材的常用技術，其係用於移除過多的沉積材料、不被預期的表面形貌，及表面缺陷，以提供一個平坦的基材表面。使用時，乃利用一個研磨裝置來執行化學機械研磨，其主要是將一個如半導體晶圓之基板的待研磨工件，放在該研磨裝置中，同時並施加具有如二氧化矽等研磨顆粒的研磨液，以便研磨該待研磨工件。 In the manufacturing process of semiconductor devices, Chemical Mechanical Polishing (CMP) is a common technique for planarizing substrates, which is used to remove excessive deposition materials, unpredictable surface topography, and surface defects. To provide a flat substrate surface. In use, a mechanical polishing is performed by using a grinding device, which mainly places a workpiece to be polished, such as a substrate of a semiconductor wafer, in the polishing device, and simultaneously applies grinding with abrasive particles such as cerium oxide. Liquid to grind the workpiece to be ground.
參閱圖1及圖2，一種現有的研磨裝置1，適用於研磨一個待研磨工件10，並包含一個基座單元11、一個研磨單元12、一個供液單元13，及一個供壓單元14。該基座單元11包括一個可被驅動旋轉的拋光台111，及一個安裝在該拋光台111頂部的拋光墊112。該研磨單元12包括一個可被驅動旋轉的研磨頭121，及一個設置在該研磨頭121之底部且位在該待研磨工件10上方的彈性膜122。該 彈性膜122具有一個對應位於該研磨頭121下方的底壁123、一個由該底壁123周緣往上延伸且結合於該研磨頭121的周壁124，及數個分別與該周壁124同心間隔地由該底壁123往上延伸且結合於該研磨頭121的環壁125。該底壁123、該周壁124、該環壁125與該研磨頭121共同界定出數個內外間隔的壓力空間126。該供液單元13包括一個將研磨液噴灑至該拋光墊112上的噴嘴131。該供壓單元14包括一個連接至該等壓力空間126且用於供應氣體或液體等流體的壓力供應源141，及數個分別控制該壓力供應源141供應至該等壓力空間126之流體壓力的壓力調節器142。 Referring to Figures 1 and 2, a conventional grinding apparatus 1 is suitable for grinding a workpiece 10 to be ground and comprising a base unit 11, a grinding unit 12, a liquid supply unit 13, and a pressure supply unit 14. The base unit 11 includes a polishing table 111 that can be driven to rotate, and a polishing pad 112 mounted on the top of the polishing table 111. The polishing unit 12 includes a polishing head 121 that can be driven to rotate, and an elastic film 122 disposed at the bottom of the polishing head 121 and positioned above the workpiece 10 to be polished. The The elastic film 122 has a bottom wall 123 corresponding to the underside of the polishing head 121, a peripheral wall 124 extending upward from the periphery of the bottom wall 123 and coupled to the polishing head 121, and a plurality of concentrically spaced apart from the peripheral wall 124, respectively. The bottom wall 123 extends upward and is coupled to the annular wall 125 of the polishing head 121. The bottom wall 123, the peripheral wall 124, and the ring wall 125 together with the polishing head 121 define a plurality of pressure spaces 126 spaced inside and outside. The liquid supply unit 13 includes a nozzle 131 that sprays the polishing liquid onto the polishing pad 112. The pressure supply unit 14 includes a pressure supply source 141 connected to the pressure spaces 126 for supplying a fluid such as a gas or a liquid, and a plurality of fluid pressures respectively controlling the pressure of the pressure supply source 141 supplied to the pressure spaces 126. Pressure regulator 142.
當該研磨裝置1研磨該待研磨工件10時，利用該研磨單元12將該待研磨工件10壓抵在該基座單元11上，並驅動該拋光台111及該研磨頭121相對轉動，同時經由該噴嘴131噴灑研磨液，即能研磨介於該彈性膜122與該拋光墊112之間的該待研磨工件10。 When the polishing apparatus 1 grinds the workpiece 10 to be polished, the workpiece 10 to be polished is pressed against the base unit 11 by the grinding unit 12, and the polishing table 111 and the polishing head 121 are driven to rotate relative to each other while being The nozzle 131 sprays the slurry, that is, the workpiece 10 to be polished between the elastic film 122 and the polishing pad 112.
然而，由於有的半導體製程需要在該待研磨工件10上研磨出預定非平滑的表面，故而業者便依據製程需求，分別調整該等壓力調節器142，用於分別控制供應至該等壓力空間126之流體，使得該等壓力空間126分別處於不同壓力下，如此一來，變形能力均一之該底壁123，便會因為受到該等不同壓力，使得各部位產生不同的形變，進而帶動該待研磨工件10研磨出預設的凹凸表面。 However, since some semiconductor processes require grinding a predetermined non-smooth surface on the workpiece 10 to be polished, the pressure adjustment device 142 is separately adjusted according to the process requirements for separately controlling the supply to the pressure spaces 126. The fluids are placed at different pressures, so that the deformation wall is uniform in the bottom wall 123, and the different pressures are applied to cause different deformations of the respective parts, thereby driving the to-be-polished. The workpiece 10 is ground to a predetermined concave and convex surface.
須說明的是，上述研磨裝置1為了令該等壓力空間126處於不同壓力，除了需要增設該等壓力調節器142 ，而增加設備成本以外，還需要通過技術人員費事地調控該等壓力調節器142，使用上較為浪費人力工時。 It should be noted that the above-mentioned grinding device 1 needs to add the pressure regulators 142 in order to make the pressure spaces 126 at different pressures. In addition to increasing the cost of equipment, it is also necessary to control the pressure regulators 142 by technicians, which is wasteful of man-hours.
因此，本發明之目的，即在提供一種可節省人力工時且具有非均勻變形能力的用於研磨頭之彈性膜的製造方法與製造設備。 Accordingly, it is an object of the present invention to provide a method and apparatus for manufacturing an elastic film for a polishing head which can save manpower and have a non-uniform deformation ability.
於是，本發明用於研磨頭之彈性膜的製造設備，適用於將一塑料熱壓成一彈性膜，該塑料在不同溫度下加熱後會產生不同的強度，該彈性膜包含一個底壁，該底壁具有數個強度不同而使得彼此的變形能力不同的彈膜部，而該製造設備包含：一個第一模具、一個與該第一模具相配合而共同界定出一個將該塑料熱壓成該彈性膜的熱壓空間的第二模具，以及一個加熱單元。該第二模具包括數個分別可熱壓該塑料以分別形成該等彈膜部的熱壓部，該加熱單元可對該等熱壓部加熱以使該等熱壓部的溫度不同。 Therefore, the apparatus for manufacturing an elastic film of the polishing head of the present invention is suitable for hot pressing a plastic into an elastic film which, when heated at different temperatures, produces different strengths, the elastic film comprising a bottom wall, the bottom The wall has a plurality of elastic portions having different strengths to make each other different in deformability, and the manufacturing apparatus includes: a first mold, and a first mold cooperates to define a hot pressing of the plastic into the elastic a second mold for the hot pressing space of the membrane, and a heating unit. The second mold includes a plurality of hot pressing portions that respectively heat the plastic to respectively form the elastic film portions, and the heating unit may heat the hot pressing portions to make the temperatures of the hot pressing portions different.
本發明用於研磨頭之彈性膜的製造方法，是利用一個製造設備將一塑料熱壓成一彈性膜，該塑料在不同溫度下加熱後會產生不同的強度，該彈性膜包含一個底壁，該底壁具有數個強度不同而使得彼此的變形能力不同的彈膜部，而該製造方法包含：一放料步驟，將該塑料放置於該製造設備的一個第一模具與一個第二模具所界定的一個熱壓空間內；及一熱壓步驟，透過該製造設備的第一模具與第二模具 熱壓該塑料以製得該彈性膜，在此同時，透過該第二模具的數個帶有不同溫度的熱壓部熱壓該塑料，以分別形成該等彈膜部。 The manufacturing method of the elastic film for the polishing head of the present invention is to heat-press a plastic into an elastic film by using a manufacturing device, and the plastic generates different strength after being heated at different temperatures, and the elastic film comprises a bottom wall. The bottom wall has a plurality of elastic portions different in strength and different in deformability from each other, and the manufacturing method comprises: a discharging step of placing the plastic in a first mold and a second mold of the manufacturing apparatus a hot pressing space; and a hot pressing step through the first mold and the second mold of the manufacturing apparatus The plastic is heat-pressed to obtain the elastic film, and at the same time, the plastic is heat-pressed through a plurality of hot pressing portions of the second mold having different temperatures to form the elastic film portions, respectively.
本發明之功效在於：本發明透過該第二模具的帶有不同溫度的熱壓部熱壓該塑料，同時配合該塑料在不同溫度下加熱後會產生不同的強度之特性，進而可製得具有非均勻變形能力的彈性膜，使該彈性膜的彈膜部的變形能力不同。如此一來，該供壓單元僅需供應相同的流體壓力即可，所以可以省略數個壓力調節器的設置，不但可以節省設備成本以外，還可以縮減人力工時，能具有較佳的適用性。 The invention has the following effects: the invention heat-presses the plastic through the hot pressing portion of the second mold with different temperatures, and at the same time, the plastic is heated at different temperatures to produce different strength characteristics, thereby obtaining The elastic film having a non-uniform deformability has different deformability of the elastic film portion of the elastic film. In this way, the pressure supply unit only needs to supply the same fluid pressure, so that the arrangement of several pressure regulators can be omitted, which not only saves the equipment cost, but also reduces the man-hours and can have better applicability. .
2‧‧‧彈性膜 2‧‧‧elastic film
21‧‧‧底壁 21‧‧‧ bottom wall
211‧‧‧彈膜部 211‧‧‧The film section
22‧‧‧外環壁 22‧‧‧ outer ring wall
23‧‧‧內環壁 23‧‧‧ Inner Ring Wall
24‧‧‧彈性空間 24‧‧‧Flexible space
3‧‧‧研磨頭 3‧‧‧ polishing head
4‧‧‧待研磨工件 4‧‧‧ workpieces to be ground
5‧‧‧製造設備 5‧‧‧Manufacture equipment
51‧‧‧第一模具 51‧‧‧First mould
52‧‧‧第二模具 52‧‧‧Second mold
521‧‧‧座體部 521‧‧‧ body
522‧‧‧熱壓部 522‧‧‧Hot pressure department
5221‧‧‧第一熱壓部 5221‧‧‧First hot pressing department
5222‧‧‧第二熱壓部 5222‧‧‧Second hot pressing department
5223‧‧‧第三熱壓部 5223‧‧‧The third hot pressing department
523‧‧‧貼靠面 523‧‧‧Snap surface
53‧‧‧熱壓空間 53‧‧‧Hot pressure space
531‧‧‧主模穴 531‧‧‧ main cavity
532‧‧‧第一間隙 532‧‧‧First gap
533‧‧‧第二間隙 533‧‧‧Second gap
54‧‧‧加熱單元 54‧‧‧heating unit
541‧‧‧加熱件 541‧‧‧heating parts
542‧‧‧導熱件 542‧‧‧ Thermal Conductive Parts
543‧‧‧導熱本體 543‧‧‧thermal body
543’‧‧‧導熱本體 543’‧‧‧thermal body
544‧‧‧導熱空間 544‧‧‧heat conduction space
6‧‧‧塑料 6‧‧‧ plastic
71‧‧‧放料步驟 71‧‧‧Dropping steps
72‧‧‧熱壓步驟 72‧‧‧ hot pressing step
73‧‧‧取物步驟 73‧‧‧Getting steps
本發明之其他的特徵及功效，將於參照圖式的實施方式中清楚地呈現，其中：圖1是一種現有研磨裝置的一側視示意圖；圖2是圖1之研磨裝置的一局部剖面側視圖；圖3是本發明所製得之彈性膜的一使用示意圖；圖4是該彈性膜之一剖視示意圖；圖5是本發明的製造方法的較佳實施例的一步驟流程方塊圖；圖6是一側視剖視示意圖，顯示該製造方法所使用的製造設備的第一實施態樣；圖7是一立體分解示意圖，顯示該製造設備的第一實施態樣的一個第一模具與一個第二模具的對應關係； 圖8是一步驟流程示意圖，說明該製造方法使用該製造設備的第一實施態樣的製造過程；圖9是一側視剖視示意圖，顯示該製造方法所使用的製造設備的第二實施態樣；圖10是該製造設備的第二實施態樣所製得之彈性膜之一剖視示意圖；圖11是一側視剖視示意圖，顯示該製造方法所使用的製造設備的第三實施態樣；圖12是一側視剖視示意圖，顯示該製造方法所使用的製造設備的第四實施態樣；圖13是一側視剖視示意圖，顯示該製造方法所使用的製造設備的第五實施態樣；及圖14是一立體示意圖，主要顯示該製造設備的第四實施態樣的一個加熱單元。 Other features and advantages of the present invention will be apparent from the following description of the drawings, wherein: Figure 1 is a side elevational view of a conventional polishing apparatus; Figure 2 is a partial cross-sectional side of the polishing apparatus of Figure 1. Figure 3 is a schematic view showing the use of the elastic film produced by the present invention; Figure 4 is a schematic cross-sectional view of the elastic film; Figure 5 is a block diagram of a preferred embodiment of the manufacturing method of the present invention; Figure 6 is a side elevational cross-sectional view showing a first embodiment of the manufacturing apparatus used in the manufacturing method; Figure 7 is a perspective exploded view showing a first mold of the first embodiment of the manufacturing apparatus a correspondence relationship of a second mold; Figure 8 is a flow chart showing the steps of the manufacturing process using the first embodiment of the manufacturing apparatus; Figure 9 is a side cross-sectional view showing the second embodiment of the manufacturing apparatus used in the manufacturing method. Figure 10 is a schematic cross-sectional view showing one embodiment of the elastic film produced by the second embodiment of the manufacturing apparatus; Figure 11 is a side elevational cross-sectional view showing the third embodiment of the manufacturing apparatus used in the manufacturing method Figure 12 is a side elevational cross-sectional view showing a fourth embodiment of the manufacturing apparatus used in the manufacturing method; and Figure 13 is a side cross-sectional view showing the fifth manufacturing apparatus used in the manufacturing method Embodiments; and FIG. 14 is a perspective view schematically showing a heating unit of a fourth embodiment of the manufacturing apparatus.
在本發明被詳細描述之前，應當注意在以下的說明內容中，類似的元件是以相同的編號來表示。 Before the present invention is described in detail, it should be noted that in the following description, similar elements are denoted by the same reference numerals.
參閱圖3、4，本發明所製得之彈性膜2，適用於安裝在一個研磨頭3的底部，並位在一個如半導體晶圓之基板的待研磨工件4上方，由於該研磨頭3的構造及其與該彈性膜2間的結合關係並非本發明重點，所以在此不再說明。 Referring to Figures 3 and 4, the elastic film 2 produced by the present invention is suitable for being mounted on the bottom of a polishing head 3 and positioned above a workpiece 4 to be polished, such as a substrate of a semiconductor wafer, due to the polishing head 3 The configuration and its bonding relationship with the elastic film 2 are not the focus of the present invention, and therefore will not be described here.
該彈性膜2包含一個對應位於該研磨頭3下方且呈圓形的底壁21、一個由該底壁21周緣往上延伸的外環 壁22，及數個分別與該外環壁22同心間隔地由該底壁21往上延伸的內環壁23。該外環壁22與該等內環壁23皆呈中空環狀，且依序由外而內地同心間隔設置，並結合於該研磨頭3之底部。當然，該等內環壁23的數量亦可以增減，例如該彈性膜2亦可以僅包含一個內環壁23，故實施上不以本實施例為限。 The elastic film 2 comprises a bottom wall 21 corresponding to a circular shape below the polishing head 3, and an outer ring extending upward from the periphery of the bottom wall 21. The wall 22 has a plurality of inner ring walls 23 extending upwardly from the bottom wall 21 concentrically from the outer ring wall 22. The outer ring wall 22 and the inner ring walls 23 are both hollow and annularly spaced from the outside to the inside, and are coupled to the bottom of the polishing head 3. Of course, the number of the inner ring walls 23 can also be increased or decreased. For example, the elastic film 2 can also include only one inner ring wall 23, so the implementation is not limited to the embodiment.
該底壁21、該外環壁22、該內環壁23與該研磨頭3相配合界定出數個內外間隔的彈性空間24。該等彈性空間24分別與一個供壓單元(圖未示)連通，可被通入氣體或液體等流體而處於相同壓力。該底壁21是由同一橡塑膠材料製成且厚度均一，並具有數個分別界限出該等彈性空間24之底側的彈膜部211。該等彈膜部211的強度不同而使得彼此的變形能力不同，需要注意的是，在圖中係以網點示意該等彈膜部211的強度彼此不同，至於網點的多寡並不代表實際的強度大小。 The bottom wall 21, the outer ring wall 22, and the inner ring wall 23 cooperate with the polishing head 3 to define a plurality of elastic spaces 24 spaced inside and outside. The elastic spaces 24 are respectively connected to a pressure supply unit (not shown), and can be supplied with the same pressure by a fluid such as a gas or a liquid. The bottom wall 21 is made of the same rubber and plastic material and has a uniform thickness, and has a plurality of elastic film portions 211 that respectively define the bottom sides of the elastic spaces 24. The strengths of the elastic film portions 211 are different, so that the deformation capacities of the elastic film portions 211 are different from each other. It should be noted that the strengths of the elastic film portions 211 are different from each other in the figure, and the number of dots does not represent the actual strength. size.
參閱圖4、5、6，本發明製造方法的一個較佳實施例，是利用一個製造設備5將一塑料6(見圖8)熱壓成一彈性膜2。 Referring to Figures 4, 5 and 6, a preferred embodiment of the manufacturing method of the present invention utilizes a manufacturing apparatus 5 to heat-press a plastic 6 (see Figure 8) into an elastic film 2.
參閱圖4、6、7，該製造設備5的一個第一實施態樣包含：一個第一模具51、一個的第二模具52，以及一個加熱單元54。 Referring to Figures 4, 6, and 7, a first embodiment of the manufacturing apparatus 5 includes a first mold 51, a second mold 52, and a heating unit 54.
該第二模具52與該第一模具51相配合而共同界定出一個將該塑料6(見圖8)熱壓成該彈性膜2的熱壓空間53，該第二模具52包括一個座體部521，以及數個分別 安裝於該座體部521上且容置於該熱壓空間53內的熱壓部522。該等熱壓部522同心間隔設置，每一個熱壓部522皆具有朝向該第一模具51的貼靠面523，位於中央的熱壓部522的貼靠面523大致呈圓形，其餘的熱壓部522的貼靠面523則大致成圓環形。 The second mold 52 cooperates with the first mold 51 to jointly define a hot pressing space 53 for hot pressing the plastic 6 (see FIG. 8) into the elastic film 2. The second mold 52 includes a seat portion. 521, and several separate The hot pressing portion 522 is mounted on the seat portion 521 and accommodated in the hot pressing space 53. The hot pressing portions 522 are disposed at a concentric interval. Each of the hot pressing portions 522 has an abutting surface 523 facing the first mold 51. The abutting surface 523 of the central hot pressing portion 522 is substantially circular. The abutting surface 523 of the pressing portion 522 is substantially circular.
該熱壓空間53具有一個位於該第二模具52與該等貼靠面523之間的主模穴531、及一個位於該第一模具51與最外側之熱壓部522之間的第一間隙532，以及數個位於該等熱壓部522之間的第二間隙533。 The hot pressing space 53 has a main cavity 531 between the second die 52 and the abutting faces 523, and a first gap between the first die 51 and the outermost hot pressing portion 522. 532, and a plurality of second gaps 533 between the hot pressing portions 522.
該加熱單元54可對該等熱壓部522加熱以使該等熱壓部522的溫度不同，該加熱單元54包括數個與該第二模具52間隔而分別對該等熱壓部522加熱的加熱件541。該等加熱件541分別皆為圓環狀且同心間隔設置而位在同一平面上，該等加熱件541的加熱溫度不同以使該等熱壓部522的溫度不同。 The heating unit 54 can heat the hot pressing portions 522 to make the temperature of the hot pressing portions 522 different. The heating unit 54 includes a plurality of heating elements 522 spaced apart from the second mold 52 to heat the respective hot pressing portions 522. Heating member 541. The heating elements 541 are respectively annular and concentrically spaced apart on the same plane. The heating temperatures of the heating elements 541 are different to make the temperatures of the hot pressing portions 522 different.
參閱圖4、5、6、8，該製造方法包含： Referring to Figures 4, 5, 6, and 8, the manufacturing method includes:
(一)放料步驟71：將該塑料6放置於該製造設備5的第一模具51與第二模具52所界定的熱壓空間53內。其中，該塑料6可以是橡膠，並在不同溫度下加熱後會產生不同的強度。 (1) Discharging Step 71: The plastic 6 is placed in the hot pressing space 53 defined by the first mold 51 and the second mold 52 of the manufacturing apparatus 5. Among them, the plastic 6 can be rubber and will have different strength after being heated at different temperatures.
(二)熱壓步驟72：透過該第一模具51與該第二模具52熱壓該塑料6，使位於該主模穴531內的塑料6熱壓形成該彈性膜2的底壁21，使位於該第一間隙532內的塑料6熱壓形成該彈性膜2的外環壁22，使位於該等第 二間隙533內的塑料6熱壓形成該彈性膜2的內環壁23，即可以製得該彈性膜2。 (2) hot pressing step 72: hot pressing the plastic 6 through the first mold 51 and the second mold 52, and hot pressing the plastic 6 located in the main cavity 531 to form the bottom wall 21 of the elastic film 2, so that The plastic 6 located in the first gap 532 is hot pressed to form the outer ring wall 22 of the elastic film 2, so that the The plastic 6 in the second gap 533 is hot pressed to form the inner ring wall 23 of the elastic film 2, that is, the elastic film 2 can be obtained.
在此同時，利用該塑料6在不同溫度下加熱後會產生不同的強度之特性，透過該第二模具52的數個帶有不同溫度的熱壓部522熱壓該塑料6，進而分別形成強度不同的該等彈膜部211，並且該等熱壓部522貼靠面523貼靠對應之彈膜部211。 At the same time, the plastic 6 is heated at different temperatures to produce different strength characteristics, and the plurality of hot pressing portions 522 having different temperatures are pressed through the second mold 52 to heat the plastic 6 to form strength. The elastic film portions 211 are different from each other, and the pressing surfaces 523 of the hot pressing portions 522 abut against the corresponding elastic film portions 211.
(三)取物步驟73：熱壓完畢後，可令該第一模具51與該第二模具52相互遠離，即可將該彈性膜2取下。 (3) Picking step 73: After the hot pressing is completed, the first mold 51 and the second mold 52 can be separated from each other, and the elastic film 2 can be removed.
以下則透過實驗證明，本實施例透過該等加熱件541的加熱溫度不同而使該等熱壓部522帶有不同溫度，透過不同溫度的熱壓部522熱壓該塑料6，同時配合該塑料6在不同溫度下加熱後會產生不同的強度之特性，進而可製得具有非均勻變形能力的彈性膜2，使該彈性膜2的彈膜部211的變形能力不同。 In the following, it is proved by experiments that the hot pressing portions 522 have different temperatures through different heating temperatures of the heating members 541, and the plastics 6 are hot-pressed through the hot pressing portions 522 of different temperatures while being matched with the plastics. 6 When heated at different temperatures, different strength characteristics are produced, and the elastic film 2 having non-uniform deformability can be obtained, so that the deformability of the elastic film portion 211 of the elastic film 2 is different.
將實驗所測得之數據整理在表1中。其中，抗拉強度的實驗是透過SMD-1000電動推拉力機(SMD-1000 digital control motorized test stand)測量拉斷各實驗例時的拉力值。 The data measured by the experiment were organized in Table 1. Among them, the tensile strength test was conducted by measuring the tensile force of each experimental example by SMD-1000 digital control motorized test stand.
參閱圖4、6、7與表1，在該製造設備5的第一實施態樣中，該第二模具52的熱壓部522的數量為三個且分別由外而內同心間隔設置，而該加熱單元54的加熱件541的數量也對應地為三個，該等加熱件541分別對該等熱 壓部522加熱，對應地，所製得之彈性膜2的彈膜部211的數量也為三個。以下為了方便說明，將該等加熱件541由外而內分別命名為第一加熱件541、第二加熱件541與第三加熱件541，同時將該等彈膜部211由外而內分別命名為第一彈膜部211、第二彈膜部211與第三彈膜部211。 Referring to FIGS. 4, 6, 7, and Table 1, in the first embodiment of the manufacturing apparatus 5, the number of hot pressing portions 522 of the second mold 52 is three and is respectively disposed from the outside and the inside concentric intervals, and The number of the heating elements 541 of the heating unit 54 is also correspondingly three, and the heating elements 541 respectively heat the same The pressing portion 522 is heated, and correspondingly, the number of the elastic film portions 211 of the elastic film 2 produced is also three. Hereinafter, for convenience of description, the heating members 541 are respectively named from the outside to the first heating member 541, the second heating member 541, and the third heating member 541, and the elastic film portions 211 are named separately from the outside. The first elastic film portion 211, the second elastic film portion 211, and the third elastic film portion 211.
由實驗例1~4可知，該第一加熱件541的溫度最高，該第二加熱件541的溫度次之，該第三加熱件541的溫度最低，藉此讓該等加熱件541所加熱的熱壓部522帶有不同的溫度。利用該塑料6在不同溫度下加熱後會產生不同的機械強度之特性，在本實施例中，當該塑料6接受的熱能越多其強度越高。因此，所製得之彈性膜2的第一彈膜部211的抗拉強度最高，第二彈膜部211的抗拉強度次之，第三彈膜部211的抗拉強度最低。 It can be seen from Experimental Examples 1 to 4 that the temperature of the first heating member 541 is the highest, the temperature of the second heating member 541 is second, and the temperature of the third heating member 541 is the lowest, thereby heating the heating members 541. The hot pressing portion 522 has a different temperature. The plastic 6 is heated at different temperatures to produce different mechanical strength characteristics. In this embodiment, the more heat the plastic 6 receives, the higher its strength. Therefore, the tensile strength of the first elastic film portion 211 of the elastic film 2 produced is the highest, the tensile strength of the second elastic film portion 211 is second, and the tensile strength of the third elastic film portion 211 is the lowest.
由實驗例5、6可知，該第二加熱件541的溫度 最高，該第一加熱件541的溫度次之，該第三加熱件541的溫度最低，所製得之彈性膜2的第二彈膜部211的抗拉強度最高，第一彈膜部211的抗拉強度次之，第三彈膜部211的抗拉強度最低。 It can be seen from Experimental Examples 5 and 6 that the temperature of the second heating member 541 is The highest temperature of the first heating element 541 is the second, the temperature of the third heating element 541 is the lowest, and the tensile strength of the second elastic film portion 211 of the elastic film 2 is the highest, and the first elastic film portion 211 is The tensile strength is second, and the third elastic film portion 211 has the lowest tensile strength.
由實驗例7可知，該第三加熱件541的溫度最高，該第一加熱件541的溫度次之，該第二加熱件541的溫度最低，所製得之彈性膜2的第三彈膜部211的抗拉強度最高，第一彈膜部211的抗拉強度次之，第二彈膜部211的抗拉強度最低。 It can be seen from the experimental example 7 that the temperature of the third heating member 541 is the highest, the temperature of the first heating member 541 is second, and the temperature of the second heating member 541 is the lowest, and the third elastic portion of the elastic film 2 is obtained. The tensile strength of 211 is the highest, the tensile strength of the first elastic film portion 211 is second, and the tensile strength of the second elastic film portion 211 is the lowest.
參閱圖3、4、6，由以上說明可知，本發明透過該加熱單元54可對該等熱壓部522加熱以使該等熱壓部522的溫度不同，藉此在熱壓該塑料6時可形成強度不同該等彈膜部211。由於該等彈膜部211彼此的變形能力不同，並當受到相同的流體壓力時，該等彈膜部211的彎撓變形弧度彼此相異。具體來說，抗拉強度越高的彈膜部211越不易變形，其彎撓變形弧度較小；抗拉強度越低的彈膜部211越容易變形，其彎撓變形弧度較大。如此一來，使用時即能帶動該待研磨工件4研磨出預設的凹凸表面。 Referring to Figures 3, 4 and 6, it can be seen from the above description that the present invention can heat the hot pressing portions 522 through the heating unit 54 to make the temperatures of the hot pressing portions 522 different, thereby heating the plastic 6 by heat. The elastic film portions 211 having different strengths can be formed. Since the deforming abilities of the elastic film portions 211 are different from each other and when subjected to the same fluid pressure, the bending deformation curvatures of the elastic film portions 211 are different from each other. Specifically, the elastic portion 211 having a higher tensile strength is less likely to be deformed, and the bending deformation curvature is small; the lower the tensile strength, the more easily the elastic portion 211 is deformed, and the bending deformation curvature is large. In this way, the workpiece to be polished 4 can be driven to grind out a predetermined concave and convex surface when in use.
由此可知，本發明所製得之彈性膜2，在設計上主要是令該等彈膜部211的強度不同，而使得彼此的變形能力不同，如此一來，該供壓單元僅需供應相同的流體壓力即可，所以可以省略數個壓力調節器(圖未示)的設置，不但可以節省設備成本以外，還可以縮減人力工時，能具有較佳的適用性。 It can be seen that the elastic film 2 produced by the present invention is mainly designed such that the strengths of the elastic film portions 211 are different, so that the deformation capacities of the elastic film portions 211 are different, and thus the pressure supply unit only needs to supply the same. The fluid pressure is sufficient, so that the arrangement of several pressure regulators (not shown) can be omitted, which not only saves equipment costs, but also reduces man-hours and has better applicability.
參閱圖9、10，本發明製造方法所使用的製造設備5的第二實施態樣，與該第一實施態樣大致相同，兩者之間的差別在於：所製造出的彈性膜2的結構不同。 Referring to Figures 9 and 10, a second embodiment of the manufacturing apparatus 5 used in the manufacturing method of the present invention is substantially the same as the first embodiment, and the difference between the two is that the structure of the elastic film 2 is manufactured. different.
該彈性膜2僅包含一個內環壁23，此時該等彈性空間24的數量即為兩個，而該底壁21的彈膜部211的數量也僅為兩個。對應地，該第二模具52僅需要兩個熱壓部522，而該熱壓空間53僅具有一個用於形成該內環壁23的第二間隙533。同時，該加熱單元54也僅需要兩個分別可對該兩個熱壓部522加熱的加熱件541即可。 The elastic film 2 includes only one inner ring wall 23, and the number of the elastic spaces 24 is two, and the number of the elastic film portions 211 of the bottom wall 21 is only two. Correspondingly, the second mold 52 requires only two hot pressing portions 522, and the hot pressing space 53 has only one second gap 533 for forming the inner ring wall 23. At the same time, the heating unit 54 only needs two heating elements 541 which can respectively heat the two hot pressing portions 522.
參閱圖9、10與表2，以下則透過實驗證明本實施例的功效。以下為了方便說明，將該等加熱件541由外而內分別命名為第一加熱件541與第二加熱件541，同時將該等彈膜部211由外而內分別命名為第一彈膜部211與第二彈膜部211。 Referring to Figures 9, 10 and Table 2, the efficacy of this embodiment is demonstrated by experiments below. Hereinafter, for convenience of description, the heating members 541 are respectively named as the first heating member 541 and the second heating member 541, and the elastic film portions 211 are respectively named as the first elastic film portion from the outside to the inside. 211 and the second elastic film portion 211.
由實驗例8、9可知，該第一加熱件541的溫度較高，該第二加熱件541的溫度較低，所製得之彈性膜2 的第一彈膜部211的抗拉強度較高，第二彈膜部211的抗拉強度較低。由實驗例10、11可知，該第二加熱件541的溫度較高，該第二加熱件541的溫度較低，所製得之彈性膜2的第二彈膜部211的抗拉強度較高，第一彈膜部211的抗拉強度較低。 It can be seen from Experimental Examples 8 and 9 that the temperature of the first heating member 541 is high, the temperature of the second heating member 541 is low, and the elastic film 2 is obtained. The first elastic film portion 211 has a high tensile strength, and the second elastic film portion 211 has a low tensile strength. It can be seen from Experimental Examples 10 and 11 that the temperature of the second heating member 541 is high, the temperature of the second heating member 541 is low, and the tensile strength of the second elastic film portion 211 of the elastic film 2 is high. The first elastic film portion 211 has a low tensile strength.
參閱圖11，本發明製造方法所使用的製造設備5的第三實施態樣，與該第一實施態樣大致相同，該等加熱件541分別皆為圓環狀且同心間隔設置而位在同一平面上，該等加熱件541的加熱溫度不同以使該等熱壓部522的溫度不同。兩者之間的差別在於：該等加熱件541與該第二模具52的座體部521結合安裝，藉此避免該等加熱件541的熱能散失，以提升熱能的使用效率。 Referring to Fig. 11, a third embodiment of the manufacturing apparatus 5 used in the manufacturing method of the present invention is substantially the same as the first embodiment, and the heating members 541 are respectively annular and concentrically spaced and positioned in the same In the plane, the heating temperatures of the heating members 541 are different to make the temperatures of the hot pressing portions 522 different. The difference between the two is that the heating members 541 are mounted in combination with the seat portion 521 of the second mold 52, thereby avoiding the loss of heat energy of the heating members 541 to improve the efficiency of use of thermal energy.
參閱圖12，本發明製造方法所使用的製造設備5的第四實施態樣，與該第二實施態樣大致相同，該等加熱件541是結合安裝於該第二模具52的座體部521內。兩者之間的差別在於：該等加熱件541的加熱溫度相同，但該等加熱件541不位在同一平面上。 Referring to Fig. 12, a fourth embodiment of the manufacturing apparatus 5 used in the manufacturing method of the present invention is substantially the same as the second embodiment. The heating members 541 are coupled to the seat portion 521 of the second mold 52. Inside. The difference between the two is that the heating temperatures of the heating members 541 are the same, but the heating members 541 are not located on the same plane.
當兩相對應的加熱件541與熱壓部522之間的距離越大時，該熱壓部522所收集到的熱能越少而溫度較低。反之，當兩相對應的加熱件541與熱壓部522之間的距離越小時，該熱壓部522所收集到的熱能越高而溫度較高。本實施態樣透過前述設計，同樣可使該等熱壓部522帶有不同溫度而達成本發明之目的。 When the distance between the corresponding heating member 541 and the hot pressing portion 522 is larger, the hot energy collected by the hot pressing portion 522 is less and the temperature is lower. On the contrary, when the distance between the corresponding heating member 541 and the hot pressing portion 522 is smaller, the heat energy collected by the hot pressing portion 522 is higher and the temperature is higher. According to the foregoing design, the hot pressing portion 522 can also have different temperatures to achieve the object of the present invention.
參閱圖13、14，本發明製造方法所使用的製造 設備5的第五實施態樣，與該第一實施態樣大致相同，兩者之間的差別在於：該第二模具52的座體部521與熱壓部是一體成形設置。以下為了方便說明，將該等熱壓部由外而內分別命名為第一熱壓部5221、第二熱壓部5222與第三熱壓部5223。 Referring to Figures 13 and 14, the manufacturing method used in the manufacturing method of the present invention The fifth embodiment of the apparatus 5 is substantially the same as the first embodiment, and the difference between the two is that the seat portion 521 of the second mold 52 and the hot pressing portion are integrally formed. Hereinafter, for convenience of explanation, the hot pressing portions are referred to as a first hot pressing portion 5221, a second hot pressing portion 5222, and a third hot pressing portion 5223, respectively.
該加熱單元54包括一個加熱件541，以及一個連接於該加熱件541與該第二模具52之間的導熱件542。該導熱件542具有數個同心間隔設置的導熱本體543、543’，以及一個導熱空間544。該導熱本體543為圓柱體，而該導熱本體543’則為圓環體並間隔環繞該導熱本體543，該導熱空間544則是由該等導熱本體543、543’、該加熱件541與該第二模具52共同圈圍而成。 The heating unit 54 includes a heating member 541 and a heat conducting member 542 connected between the heating member 541 and the second mold 52. The heat conducting member 542 has a plurality of concentrically spaced thermally conductive bodies 543, 543' and a thermally conductive space 544. The heat conducting body 543 is a cylinder, and the heat conducting body 543' is a circular body and is spaced around the heat conducting body 543. The heat conducting space 544 is formed by the heat conducting bodies 543, 543', the heating element 541 and the first The two molds 52 are formed by a common circle.
在本實施態樣中，該導熱件542用於將該加熱件541的熱能朝該第二模具52傳遞，透過該等導熱本體543以熱傳導方式導熱而該導熱空間544以熱輻射方式導熱，進而使該第一熱壓部5221、該第二熱壓部5222與該第三熱壓部5223的溫度不同。 In this embodiment, the heat conducting member 542 is configured to transfer the thermal energy of the heating member 541 toward the second mold 52, and the heat conducting body 543 is thermally conductive through the heat conducting body 543, and the heat conducting space 544 is thermally radiated. The temperature of the first hot pressing portion 5221, the second hot pressing portion 5222, and the third hot pressing portion 5223 is different.
在使用上，該等導熱本體543、543’雖以熱傳導方式導熱，但由於該導熱本體543與該第三熱壓部5223的距離較短，而該導熱本體543’與該第一熱壓部5221的距離較長，因此該第三熱壓部5223所接收到的熱能較多，使得該第三熱壓部5223的溫度能高於該第一熱壓部5221的溫度。另一方面，由於該導熱空間544以熱輻射方式導熱，其導熱效率較熱傳導差，因此該第二熱壓部5222所接收到 的熱能最少，使得該第二熱壓部5222的溫度最低。本實施態樣透過前述設計，同樣可使該等熱壓部帶有不同溫度而達成本發明之目的。此外，在實施上，該導熱件542的導熱本體543與導熱空間544的數量不需特別限制，可依需求調整而為一個或數個。 In use, the heat conducting bodies 543, 543' are thermally conductive, but because the distance between the heat conducting body 543 and the third hot pressing portion 5223 is short, the heat conducting body 543' and the first hot pressing portion The distance of the second heat pressing portion 5223 is relatively high, so that the temperature of the third hot pressing portion 5223 can be higher than the temperature of the first hot pressing portion 5221. On the other hand, since the heat conducting space 544 is thermally conductive by heat radiation, its heat conduction efficiency is inferior to that of heat conduction, and thus the second hot pressing portion 5222 receives The heat energy is the least, so that the temperature of the second hot pressing portion 5222 is the lowest. In the present embodiment, through the foregoing design, the hot pressing portions can also have different temperatures to achieve the object of the present invention. In addition, in practice, the number of the heat conducting body 543 and the heat conducting space 544 of the heat conducting member 542 is not particularly limited, and may be adjusted to one or several according to requirements.
綜上所述，本發明透過該第二模具的帶有不同溫度的熱壓部熱壓該塑料，同時配合該塑料在不同溫度下加熱後會產生不同的強度之特性，進而可製得具有非均勻變形能力的彈性膜，而使該彈性膜的彈膜部的變形能力不同。如此一來，該供壓單元僅需供應相同的流體壓力即可，所以可以省略數個壓力調節器(圖未示)的設置，不但可以節省設備成本以外，還可以縮減人力工時，能具有較佳的適用性，故確實能達成本發明之目的。 In summary, the present invention heat-presses the plastic through the hot stamping portion of the second mold with different temperatures, and at the same time, the plastic is heated at different temperatures to produce different strength characteristics, thereby producing a non- An elastic film having a uniform deformability, and the deformability of the elastic film portion of the elastic film is different. In this way, the pressure supply unit only needs to supply the same fluid pressure, so that the arrangement of several pressure regulators (not shown) can be omitted, which not only saves equipment cost, but also reduces manpower and can have With good applicability, it is indeed possible to achieve the object of the present invention.
惟以上所述者，僅為本發明之較佳實施例而已，當不能以此限定本發明實施之範圍，即大凡依本發明申請專利範圍及專利說明書內容所作之簡單的等效變化與修飾，皆仍屬本發明專利涵蓋之範圍內。 The above is only the preferred embodiment of the present invention, and the scope of the present invention is not limited thereto, that is, the simple equivalent changes and modifications made by the patent application scope and patent specification content of the present invention, All remain within the scope of the invention patent.
2‧‧‧彈性膜 2‧‧‧elastic film
5‧‧‧製造設備 5‧‧‧Manufacture equipment
51‧‧‧第一模具 51‧‧‧First mould
52‧‧‧第二模具 52‧‧‧Second mold
522‧‧‧熱壓部 522‧‧‧Hot pressure department
53‧‧‧熱壓空間 53‧‧‧Hot pressure space
54‧‧‧加熱單元 54‧‧‧heating unit
541‧‧‧加熱件 541‧‧‧heating parts
6‧‧‧塑料 6‧‧‧ plastic
Claims (9)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103112517A TWI531443B (en) | 2014-04-03 | 2014-04-03 | A method for manufacturing an elastic film for a grinding head and a manufacturing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW103112517A TWI531443B (en) | 2014-04-03 | 2014-04-03 | A method for manufacturing an elastic film for a grinding head and a manufacturing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201538273A TW201538273A (en) | 2015-10-16 |
| TWI531443B true TWI531443B (en) | 2016-05-01 |
Family
ID=54851141
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103112517A TWI531443B (en) | 2014-04-03 | 2014-04-03 | A method for manufacturing an elastic film for a grinding head and a manufacturing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI531443B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109623630A (en) * | 2017-09-27 | 2019-04-16 | 台湾积体电路制造股份有限公司 | Chemical-mechanical planarization film |
-
2014
- 2014-04-03 TW TW103112517A patent/TWI531443B/en active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109623630A (en) * | 2017-09-27 | 2019-04-16 | 台湾积体电路制造股份有限公司 | Chemical-mechanical planarization film |
| TWI749262B (en) * | 2017-09-27 | 2021-12-11 | 台灣積體電路製造股份有限公司 | Chemical mechanical planarization (cmp) tool and method of forming cmp membrane |
| CN109623630B (en) * | 2017-09-27 | 2022-01-04 | 台湾积体电路制造股份有限公司 | Chemical mechanical planarization tool and method for forming chemical mechanical planarization film |
| US11267099B2 (en) | 2017-09-27 | 2022-03-08 | Taiwan Semiconductor Manufacturing Company, Ltd. | Chemical mechanical planarization membrane |
| US11850702B2 (en) | 2017-09-27 | 2023-12-26 | Taiwan Semiconductor Manufacturing Company, Ltd. | Chemical mechanical planarization membrane |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201538273A (en) | 2015-10-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US11407083B2 (en) | Polishing head, chemical-mechanical polishing system and method for polishing substrate | |
| CN102725831A (en) | Apparatus and method for temperature control during polishing | |
| US10118273B2 (en) | Polishing head, CMP apparatus having polishing head, and semiconductor integrated circuit manufacturing method using CMP apparatus | |
| TWM465659U (en) | Chemical mechanical polishing conditioner | |
| US10293460B2 (en) | Method of producing polishing head and polishing apparatus | |
| JP2005526383A5 (en) | ||
| TWI530361B (en) | Chemical mechanical polishing conditioner and associated methods | |
| JP2018026453A5 (en) | ||
| TWI568538B (en) | Chemical mechanical polishing conditioner and manufacturing method thereof | |
| US20110162786A1 (en) | Methods and apparatus for forming a slurry polishing pad | |
| TWI531443B (en) | A method for manufacturing an elastic film for a grinding head and a manufacturing apparatus | |
| KR101484706B1 (en) | Manufacturing method of pad conditioner | |
| KR101320461B1 (en) | Polishing head of chemical mechanical polishing apparatus | |
| CN104551926A (en) | Hard optical material polishing die combined structure and manufacturing method | |
| TW201343326A (en) | Conditioner disk used in chemical mechanical polishing process and method for making the same | |
| TWI676525B (en) | Elastic film for grinding head | |
| TWI749262B (en) | Chemical mechanical planarization (cmp) tool and method of forming cmp membrane | |
| KR20160057585A (en) | Device for bonding wafer of wafer flattening apparatus and method for flattening wafer | |
| TWM485495U (en) | Polishing pad with non-uniforming deflection ability | |
| KR102183616B1 (en) | Chemical mechanical planarization membrane | |
| TWM551548U (en) | Elastic membrane for polishing head | |
| TWI641448B (en) | Elastic film for grinding head | |
| JP2016119406A (en) | Substrate processing apparatus | |
| JP4671725B2 (en) | Manufacturing method of mold for molding | |
| US9616550B2 (en) | Grinding tool and method of manufacturing the same |