TWI512578B - Touch panel and conductive sheet - Google Patents

Description

觸控面板及導電片 Touch panel and conductive sheet

本發明是關於一種觸控面板及導電片，且是關於用於例如投射型靜電電容方式的觸控面板而較佳的觸控面板及導電片。 The present invention relates to a touch panel and a conductive sheet, and relates to a touch panel and a conductive sheet which are preferably used for a touch panel of, for example, a projected electrostatic capacitance type.

一般而言，靜電電容方式的觸控面板(touch panel)是捕捉人的指尖與導電膜之間的靜電電容的變化而檢測指尖位置的位置輸入裝置，作為該靜電電容方式的觸控面板，有表面型觸控面板與投射型觸控面板。表面型觸控面板的結構簡單，但無法同時偵測2點或2點以上接觸(multitouch，多點觸控)。另一方面，投射型觸控面板是如例如液晶顯示裝置的像素構成般多個電極排列為矩陣狀而構成，更具體而言，該投射型觸控面板是沿垂直方向排列的多個電極串聯連接的多個第一電極群沿水平方向排列，且沿水平方向排列的多個電極串聯連接的多個第二電極群沿垂直方向排列而構成，以多個第一電極群及多個第二電極群依序檢測電容變化，由此可檢測多點觸控。 In general, a capacitive touch panel is a position input device that detects a change in electrostatic capacitance between a fingertip and a conductive film of a person and detects a position of a fingertip as a capacitive touch panel. There are surface type touch panels and projection type touch panels. The surface type touch panel has a simple structure, but cannot detect 2 or more points (multitouch, multi-touch) at the same time. On the other hand, the projection type touch panel is configured such that a plurality of electrodes are arranged in a matrix as in a pixel configuration of a liquid crystal display device. More specifically, the projection type touch panel is a plurality of electrodes arranged in a vertical direction in series. The plurality of connected first electrode groups are arranged in a horizontal direction, and the plurality of second electrode groups connected in series in the horizontal direction are arranged in a vertical direction, and the plurality of first electrode groups and the plurality of second The electrode group sequentially detects the change in capacitance, thereby detecting multi-touch.

作為該投射型靜電電容方式的觸控面板的先前技術，可列舉例如國際公開第2010/013679號說明書中記載的觸控開關(touch switch)。該觸控開關安裝於顯示器(display)的正面，且包括：基板；多個第一電極，形成於上述基板的一面，以固定間隔排列；及多個第二電極，形成於上述基板的另一面，以固定間隔排列，與上述多個 第一電極一起形成格子狀，且上述第一電極與第二電極分別藉由多個導線而形成網狀，導線的方向相對於顯示器的黑矩陣(black matrix)而成為斜方向。進而，該觸控開關於上述一面上具有形成於第一電極彼此之間的第一輔助線，而於上述另一面上具有形成於第二電極彼此之間的第二輔助線，通過上述第一電極的導線、第一輔助線、第二電極的導線、及第二輔助線而形成線的間隔均等的1個格子形狀。又，形成於上述基板的一面上的第一電極的導線、第一輔助線、或其兩者，與形成於基板的另一面上的第二電極的導線、第二輔助線、或其兩者一起形成1條線狀。 As a prior art of the above-described projection type capacitive touch panel, for example, a touch switch described in the specification of International Publication No. 2010/013679 can be cited. The touch switch is mounted on a front surface of the display and includes: a substrate; a plurality of first electrodes formed on one side of the substrate and arranged at a fixed interval; and a plurality of second electrodes formed on the other side of the substrate , arranged at regular intervals, with multiple The first electrodes are formed in a lattice shape together, and the first electrode and the second electrode are each formed into a mesh shape by a plurality of wires, and the direction of the wires is oblique with respect to a black matrix of the display. Further, the touch switch has a first auxiliary line formed between the first electrodes on the one surface, and a second auxiliary line formed between the second electrodes on the other surface, by the first The wire of the electrode, the first auxiliary wire, the wire of the second electrode, and the second auxiliary wire form a lattice shape in which the intervals of the lines are equal. Further, a wire of the first electrode formed on one surface of the substrate, a first auxiliary line, or both, and a wire of the second electrode formed on the other surface of the substrate, a second auxiliary line, or both Together form one line.

且說，當於基板的一面上形成有第一電極及第一輔助線，且於基板的另一面上形成有第二電極及第二輔助線時，會因製造偏差(成膜不均)而導致格子形狀變得不均一，當偏移量為第一輔助線或第二輔助線的長度的1/2左右時，第一電極的沿著例如第一方向(或第二方向)的直線部分與第二電極的沿著第一方向的直線部分重疊，或者沿著第一方向延伸的第一輔助線與第二電極的沿著第一方向的直線部分重疊。反之，第二電極的沿著例如第一方向(或第二方向)的直線部分與第一電極的沿著第一方向的直線部分重疊，或者沿著第二方向延伸的第二輔助線與第一電極的沿著第一方向的直線部分重疊。如此一來，直線部分彼此重疊的部分的寬度變大(線變粗)，由此產生第一電極或第二電極的位置顯著而導致可視性(visibility)變差的問題。 In addition, when the first electrode and the first auxiliary line are formed on one surface of the substrate, and the second electrode and the second auxiliary line are formed on the other surface of the substrate, manufacturing variations (uneven film formation) may occur. The lattice shape becomes non-uniform, and when the offset amount is about 1/2 of the length of the first auxiliary line or the second auxiliary line, a straight line portion of the first electrode along, for example, the first direction (or the second direction) A straight line of the second electrode along the first direction partially overlaps, or a first auxiliary line extending along the first direction overlaps with a straight line of the second electrode along the first direction. Conversely, a straight portion of the second electrode along, for example, the first direction (or the second direction) overlaps with a straight portion of the first electrode along the first direction, or a second auxiliary line that extends along the second direction A straight line of an electrode along the first direction partially overlaps. As a result, the width of the portion where the straight portions overlap each other becomes large (the line becomes thick), thereby causing a problem that the position of the first electrode or the second electrode is conspicuous and the visibility is deteriorated.

本發明是考慮到上述問題而完成者，其目的在於提供一種觸控面板，該觸控面板可實現形成於基體上的導電圖案的低電阻化，並且也可提高可視性，也可應對例如投射型靜電電容方式的觸控面板的大尺寸化，且可抑制雲紋(moire)的產生。 The present invention has been made in view of the above problems, and an object thereof is to provide a touch panel which can achieve low resistance of a conductive pattern formed on a substrate, and can also improve visibility and can cope with, for example, projection. The size of the capacitive touch panel is large, and the generation of moiré can be suppressed.

又，本發明的另一目的在於提供一種導電片，該導電片可實現形成於基體上的導電圖案的低電阻化，並且也可提高可視性，且用於例如投射型靜電電容方式的觸控面板而較佳。 Further, another object of the present invention is to provide a conductive sheet which can achieve low resistance of a conductive pattern formed on a substrate, and can also improve visibility, and is used for, for example, a projected electrostatic capacitance type touch. The panel is preferred.

[1]第一本發明所涉及的觸控面板是一種具有導電片的觸控面板，其特徵在於，上述導電片包括：基體；第一導電部，形成於上述基體的一主面上；及第二導電部，形成於上述基體的另一主面上，且上述第一導電部包括2個或2個以上的第一導電圖案及第一輔助圖案，該些第一導電圖案分別沿第一方向延伸，且沿與上述第一方向正交的第二方向排列，包含多個格子，該第一輔助圖案包含排列於各第一導電圖案的周邊的多個第一輔助線，上述第二導電部包括2個或2個以上的第二導電圖案及第二輔助圖案，該些第二導電圖案分別沿第二方向延伸，且沿上述第一方向排列，包含多個格子，該第二輔助圖案包含排列於各第二導電圖案的周邊的多個第二輔助線，俯視時，上述第一導電部與上述第二導電部形成為上述第一導電圖案與上述第二導電圖案交叉配置的形態，且於將二等分上述第 一方向與上述第二方向的方向設為第三方向，將與該第三方向正交的方向設為第四方向時，從基準位置至少向上述第三方向偏移上述第一輔助線的線寬及上述第二輔助線的線寬中任一較短的線寬的1/2或1/2以上且100μm或100μm以下而配置。 [1] The touch panel of the first aspect of the present invention is a touch panel having a conductive sheet, wherein the conductive sheet comprises: a base; a first conductive portion formed on a main surface of the base; and The second conductive portion is formed on the other main surface of the substrate, and the first conductive portion includes two or more first conductive patterns and a first auxiliary pattern, and the first conductive patterns are respectively along the first And extending in a direction along a second direction orthogonal to the first direction, comprising a plurality of grids, the first auxiliary pattern comprising a plurality of first auxiliary lines arranged around a periphery of each of the first conductive patterns, the second conductive The portion includes two or more second conductive patterns and second auxiliary patterns, and the second conductive patterns respectively extend in the second direction and are arranged along the first direction, and include a plurality of lattices, the second auxiliary patterns a plurality of second auxiliary lines arranged in a periphery of each of the second conductive patterns, wherein the first conductive portion and the second conductive portion are formed such that the first conductive pattern and the second conductive pattern are arranged to intersect each other in plan view And will divide the above two When the direction of the first direction and the second direction is the third direction, and the direction orthogonal to the third direction is the fourth direction, the line of the first auxiliary line is offset from the reference position by at least the third direction. The width is wider than the line width of the second auxiliary line, which is 1/2 or more and 1/2 or more and 100 μm or less.

[2]於第一本發明，其特徵在於，上述第一導電部與上述第二導電部偏移50μm或50μm以下而配置。 [2] In the first aspect of the invention, the first conductive portion and the second conductive portion are disposed offset by 50 μm or less.

[3]於第一本發明，其特徵在於，上述第一導電部與上述第二導電部偏移30μm或30μm以下而配置。 [3] In the first aspect of the invention, the first conductive portion and the second conductive portion are disposed offset by 30 μm or less.

[4]於第一本發明，其特徵在於，上述基準位置表示上述第一輔助線的第一軸線與第二輔助線的第二軸線一致、且上述第一輔助線與上述第二輔助線不重疊、且上述第一輔助線的一端與上述第二輔助線的一端一致的位置。 [4] The first invention is characterized in that the reference position indicates that the first axis of the first auxiliary line coincides with the second axis of the second auxiliary line, and the first auxiliary line and the second auxiliary line are not And overlapping positions of one end of the first auxiliary line and one end of the second auxiliary line.

[5]於第一本發明，其特徵在於，於上述第一導電圖案與上述第二導電圖案之間形成有上述第一輔助圖案與上述第二輔助圖案對向而成的組合圖案，上述組合圖案具有上述第一輔助線與上述第二輔助線正交而不重疊的形態。 [5] In the first aspect of the invention, a combination pattern of the first auxiliary pattern and the second auxiliary pattern is formed between the first conductive pattern and the second conductive pattern, and the combination is The pattern has a form in which the first auxiliary line is orthogonal to the second auxiliary line and does not overlap.

[6]於第一本發明，其特徵在於，上述組合圖案中，上述第一輔助線的第一軸線與上述第二輔助線的第二軸線設為大致平行，上述第一軸線與上述第二軸線之間的距離為上述第一輔助線的線寬及上述第二輔助線的線寬中任一較短的線寬的1/2或1/2以上。 [6] In the first aspect of the invention, the first axis of the first auxiliary line and the second axis of the second auxiliary line are substantially parallel, and the first axis and the second The distance between the axes is 1/2 or 1/2 or more of the line width of the first auxiliary line and the line width of the second auxiliary line.

[7]於第一本發明，其特徵在於，上述第一軸線與上述第二軸線之間的距離為上述第一輔助線的線寬的1/2與上 述第二輔助線的線寬的1/2的合計。 [7] The first invention is characterized in that the distance between the first axis and the second axis is 1/2 and the line width of the first auxiliary line The total of 1/2 of the line width of the second auxiliary line is described.

[8]於第一本發明，其特徵在於，上述第一軸線與上述第二軸線之間的距離未達上述第一輔助線的線寬的1/2與上述第二輔助線的線寬的1/2的合計。 [8] In the first aspect of the invention, the distance between the first axis and the second axis is less than 1/2 of a line width of the first auxiliary line and a line width of the second auxiliary line 1/2 total.

[9]於第一本發明，其特徵在於，上述組合圖案具有上述第一輔助線與上述第二輔助線局部重疊的形態。 [9] In the first aspect of the invention, the combination pattern has a form in which the first auxiliary line and the second auxiliary line partially overlap each other.

[10]於第一本發明，其特徵在於，上述第一軸線與上述第二軸線之間的距離長於上述第一輔助線的線寬的1/2與上述第二輔助線的線寬的1/2的合計。 [10] In the first aspect of the invention, the distance between the first axis and the second axis is longer than 1/2 of a line width of the first auxiliary line and 1 line width of the second auxiliary line The total of /2.

[11]於第一本發明，其特徵在於，上述第一導電圖案由2個或2個以上第一大格子沿上述第一方向串聯連接而構成，上述第二導電圖案由2個或2個以上第二大格子沿上述第二方向串聯連接而構成，各上述第一大格子及各上述第二大格子分別由2個或2個以上小格子組合而構成，於上述第一大格子的邊的周圍形成有與上述第一大格子呈非連接的上述第一輔助圖案，且於上述第二大格子的邊的周圍形成有與上述第二大格子呈非連接的上述第二輔助圖案。 [11] The first invention is characterized in that the first conductive pattern is formed by connecting two or more first large lattices in series in the first direction, and the second conductive pattern is composed of two or two. The second large lattices are connected in series in the second direction, and each of the first large lattices and each of the second large lattices are composed of two or more small lattices, and are formed on the side of the first large lattice. The first auxiliary pattern that is not connected to the first large lattice is formed around the second auxiliary grid, and the second auxiliary pattern that is not connected to the second large lattice is formed around the side of the second large lattice.

[12]於第一本發明，其特徵在於，上述第一導電部與上述第二導電部偏移小格子的排列間距的1/2或1/2以下而配置。 [12] In the first aspect of the invention, the first conductive portion and the second conductive portion are arranged to be offset by 1/2 or 1/2 of an arrangement pitch of the small lattice.

[13]於第一本發明，其特徵在於，上述小格子的一邊的長度為50μm~500μm。 [13] In the first aspect of the invention, the length of one side of the small lattice is 50 μm to 500 μm.

[14]於第一本發明，其中上述第一大格子及上述第二 大格子的一邊的長度為3mm~10mm。 [14] The first invention, wherein the first large lattice and the second The length of one side of the large lattice is 3 mm to 10 mm.

[15]於第一本發明，其中上述第一導電部及上述第二導電部的線寬為1μm~30μm。 [15] In the first aspect of the invention, the first conductive portion and the second conductive portion have a line width of 1 μm to 30 μm.

[16]第二本發明所涉及的導電片的特徵在於包括：基體；第一導電部，形成於上述基體的一主面上；及第二導電部，形成於上述基體的另一主面上，且上述第一導電部包括2個或2個以上第一導電圖案及第一輔助圖案，該些第一導電圖案分別沿第一方向延伸，且沿與上述第一方向正交的第二方向排列，包含多個格子，該第一輔助圖案包含排列於各第一導電圖案的周邊的多個第一輔助線，上述第二導電部包括2個或2個以上第二導電圖案及第二輔助圖案，該些第二導電圖案分別沿第二方向延伸，且沿上述第一方向排列，包含多個格子，該第二輔助圖案包含排列於各第二導電圖案的周邊的多個第二輔助線，俯視時，上述第一導電部與上述第二導電部形成為上述第一導電圖案與上述第二導電圖案交叉配置的形態，且於將二等分上述第一方向與上述第二方向的方向設為第三方向，將與該第三方向正交的方向設為第四方向時，從基準位置至少向上述第三方向偏移上述第一輔助線的線寬及上述第二輔助線的線寬中任一較短的線寬的1/2或1/2以上且100μm或100μm以下而配置。 [16] The conductive sheet according to the second aspect of the present invention includes: a base; a first conductive portion formed on one main surface of the base; and a second conductive portion formed on the other main surface of the base And the first conductive portion includes two or more first conductive patterns and a first auxiliary pattern, the first conductive patterns respectively extending along the first direction and in a second direction orthogonal to the first direction The array includes a plurality of grids, the first auxiliary pattern includes a plurality of first auxiliary lines arranged around a periphery of each of the first conductive patterns, and the second conductive portion includes two or more second conductive patterns and a second auxiliary a pattern, the second conductive patterns respectively extending along the second direction and arranged along the first direction, comprising a plurality of lattices, the second auxiliary patterns comprising a plurality of second auxiliary lines arranged around the periphery of each of the second conductive patterns In a plan view, the first conductive portion and the second conductive portion are formed such that the first conductive pattern and the second conductive pattern intersect with each other, and the first direction and the second direction are equally divided into two a third direction, wherein when the direction orthogonal to the third direction is the fourth direction, the line width of the first auxiliary line and the line of the second auxiliary line are shifted from the reference position to the third direction at least Any of the shorter line widths is 1/2 or more and 1/2 or more and 100 μm or less.

如以上說明，根據本發明所涉及的觸控面板，可實現形成於基體上的導電圖案的低電阻化，並且也可提高可視性，亦可應對例如投射型靜電電容方式的觸控面板的大尺 寸化，而且可抑制雲紋的產生。 As described above, according to the touch panel of the present invention, the conductive pattern formed on the substrate can be reduced in resistance, and the visibility can be improved, and the touch panel of the projected electrostatic capacitance type can also be handled. ruler Inch, and can suppress the generation of moiré.

根據本發明所涉及的導電片，可實現形成於基體上的導電圖案的低電阻化，並且也可提高可視性，使用於例如投射型靜電電容方式的觸控面板而較佳。 According to the conductive sheet of the present invention, it is possible to reduce the resistance of the conductive pattern formed on the substrate and to improve the visibility, and it is preferably used for, for example, a projection type capacitive touch panel.

根據以下配合隨附圖式的較佳實施形態例的說明，使上述的目的、特徵及優點變得更加明顯。 The above objects, features and advantages will become more apparent from the following description of the preferred embodiments of the invention.

以下，參照圖1~圖8對本發明所涉及的導電片及靜電電容方式觸控面板的實施形態例進行說明。再者，本說明書中表示數值範圍的「~」以包含其前後記載的數值作為下限值及上限值的意思使用。 Hereinafter, an embodiment of the conductive sheet and the capacitive touch panel according to the present invention will be described with reference to FIGS. 1 to 8 . In addition, the "~" which shows the numerical range in this specification is used in the meaning which contains the numerical value of the before-mentioned and the upper-

本實施形態所涉及的積層導電片10如圖1及圖2A所示由第一導電片12A與第二導電片12B積層而構成。 The laminated electrically conductive sheet 10 according to the present embodiment is configured by laminating the first conductive sheet 12A and the second conductive sheet 12B as shown in FIGS. 1 and 2A.

第一導電片12A如圖1及圖3所示，包括形成於第一透明基體14A(參照圖2A)的一主面上的第一導電部16A。該第一導電部16A包括：2個或2個以上第一導電圖案18A，分別沿第一方向(x方向)延伸，且沿與第一方向正交的第二方向(y方向)排列，包含多個格子；及第一輔助圖案20A，排列於各第一導電圖案18A的周邊。 As shown in FIGS. 1 and 3, the first conductive sheet 12A includes a first conductive portion 16A formed on one main surface of the first transparent substrate 14A (see FIG. 2A). The first conductive portion 16A includes: two or more first conductive patterns 18A extending in a first direction (x direction) and arranged in a second direction (y direction) orthogonal to the first direction, including A plurality of lattices; and a first auxiliary pattern 20A are arranged around the periphery of each of the first conductive patterns 18A.

第一導電圖案18A由2個或2個以上第一大格子24A沿第一方向串聯連接而構成，各第一大格子24A分別由2個或2個以上小格子26組合而構成。又，於第一大格子24A的邊的周圍，形成有與第一大格子24A呈非連接的上述第一輔助圖案20A。 The first conductive pattern 18A is formed by connecting two or more first large lattices 24A in series in the first direction, and each of the first large lattices 24A is composed of two or more small squares 26 combined. Further, the first auxiliary pattern 20A that is not connected to the first large lattice 24A is formed around the side of the first large lattice 24A.

於鄰接的第一大格子24A之間，形成有使第一大格子24A電性連接的第一連接部28A。於將二等分第一方向與第二方向的方向設為第三方向(m方向)，將與第三方向正交的方向設為第四方向(n方向)時，第一連接部28A由配置著沿第四方向排列有r個(r為大於1的實數)小格子26的大小的中格子30所構成。於第一大格子24A的與第四方向正交的邊中與中格子30鄰接的部分，形成有缺欠小格子26的1個邊的第一缺欠部32A。於此，小格子26形成為最小的正方形狀。於圖3的示例中，中格子30具有沿第四方向排列3個小格子26的大小。 A first connecting portion 28A that electrically connects the first large lattice 24A is formed between the adjacent first large lattices 24A. When the direction in which the first direction and the second direction are halved is the third direction (m direction), and the direction orthogonal to the third direction is the fourth direction (n direction), the first connecting portion 28A is The intermediate lattice 30 having the size of r (r is a real number greater than 1) small lattice 26 arranged in the fourth direction is disposed. A first defect portion 32A having one side of the small lattice 26 is formed in a portion of the first large lattice 24A that is orthogonal to the fourth direction and adjacent to the intermediate lattice 30. Here, the small lattice 26 is formed in a minimum square shape. In the example of FIG. 3, the middle lattice 30 has a size in which three small lattices 26 are arranged in the fourth direction.

又，鄰接的第一導電圖案18A之間配置有使其等電性絕緣的第一絕緣部34A。 Further, a first insulating portion 34A that is electrically insulated from each other is disposed between the adjacent first conductive patterns 18A.

於此，第一輔助圖案20A包括：沿第一大格子24A的邊中與第三方向正交的邊而排列的多個第一輔助線36A(將第三方向設為軸線方向)；沿第一大格子24A的邊中與第四方向正交的邊而排列的多個第一輔助線36A(將第四方向設為軸線方向)；及於第一絕緣部34A中2個第一輔助線36A分別組成為L字狀的2個第一L字狀圖案38A相互對向配置而成的圖案。 Here, the first auxiliary pattern 20A includes: a plurality of first auxiliary lines 36A arranged along sides orthogonal to the third direction among the sides of the first large lattice 24A (the third direction is set to the axial direction); a plurality of first auxiliary lines 36A arranged in a side of a large lattice 24A orthogonal to the fourth direction (the fourth direction is an axial direction); and two first auxiliary lines in the first insulating portion 34A 36A is a pattern in which two first L-shaped patterns 38A having an L shape are arranged to face each other.

各第一輔助線36A的軸線方向的長度具有小格子26的沿著內周的1個邊的1/2的長度。又，各第一輔助線36A形成於自第一大格子24A僅離開規定距離(該例中為小格子26的沿著內周的1個邊的1/2的長度)的位置。 The length of each of the first auxiliary lines 36A in the axial direction has a length of 1/2 of one side of the inner circumference of the small lattices 26. Further, each of the first auxiliary lines 36A is formed at a position separated from the first large lattice 24A by a predetermined distance (in this example, the length of one side of the inner circumference of the small lattice 26).

以上述方式構成的第一導電片12A如圖1所示，存在 於各第一導電圖案18A的一端部側的第一大格子24A的開放端成為不存在第一連接部28A的形狀。存在於各第一導電圖案18A的另一端部側的第一大格子24A的端部經由第一端子40A電性連接於第一外部配線42A。 The first conductive sheet 12A constructed in the above manner is as shown in FIG. The open end of the first large lattice 24A on the one end side of each of the first conductive patterns 18A has a shape in which the first connecting portion 28A is not present. The end of the first large lattice 24A existing on the other end side of each of the first conductive patterns 18A is electrically connected to the first external wiring 42A via the first terminal 40A.

另一方面，第二導電片12B如圖1及圖4所示包括形成於第二透明基體14B(參照圖2A)的一主面上之第二導電部16B。該第二導電部16B包括：2個或2個以上第二導電圖案18B，分別沿第二方向(y方向)延伸，且沿第一方向(x方向)排列，包含多個格子；及第二輔助圖案20B，排列於各第二導電圖案18B的周邊。 On the other hand, the second conductive sheet 12B includes a second conductive portion 16B formed on one main surface of the second transparent substrate 14B (see FIG. 2A) as shown in FIGS. 1 and 4. The second conductive portion 16B includes: two or more second conductive patterns 18B extending in the second direction (y direction) and arranged along the first direction (x direction), including a plurality of lattices; and a second The auxiliary patterns 20B are arranged on the periphery of each of the second conductive patterns 18B.

第二導電圖案18B由2個或2個以上第二大格子24B沿第二方向串聯連接而構成，各第二大格子24B分別由2個或2個以上小格子26組合而構成。又，於第二大格子24B的邊的周圍形成有與第二大格子24B呈非連接的上述第二輔助圖案20B。 The second conductive pattern 18B is formed by connecting two or more second large lattices 24B in series in the second direction, and each of the second large lattices 24B is composed of two or more small lattices 26 combined. Further, the second auxiliary pattern 20B that is not connected to the second large lattice 24B is formed around the side of the second large lattice 24B.

於鄰接的第二大格子24B之間形成有電性連接第二大格子24B的第二連接部28B。第二連接部28B為由配置著沿第三方向排列有r個(r為大於1的實數)小格子26的大小的中格子30所構成。於第二大格子24B的與第三方向正交的邊中與中格子30鄰接的部分，形成有缺欠小格子26的1個邊的第二缺欠部32B。 A second connecting portion 28B electrically connected to the second large lattice 24B is formed between the adjacent second large lattices 24B. The second connecting portion 28B is constituted by an intermediate lattice 30 having a size in which r (r is a real number greater than 1) small lattices 26 are arranged in the third direction. A second defect portion 32B having one side of the small lattice 26 is formed in a portion of the second large lattice 24B that is adjacent to the intermediate lattice 30 among the sides orthogonal to the third direction.

又，鄰接的第二導電圖案18B之間配置有使其電性絕緣的第二絕緣部34B。 Further, a second insulating portion 34B electrically insulated from each other is disposed between the adjacent second conductive patterns 18B.

第二輔助圖案20B包括：沿第二大格子24B的邊中與 第四方向正交的邊而排列的多個第二輔助線36B(將第四方向設為軸線方向)；沿第二大格子24B的邊中與第三方向正交的邊而排列的多個第二輔助線36B(將第三方向設為軸線方向)；及於第二絕緣部34B中，2個第二輔助線36B分別組成為L字狀的2個第二L字狀圖案38B相互對向配置而成的圖案。 The second auxiliary pattern 20B includes: along the side of the second large lattice 24B a plurality of second auxiliary lines 36B arranged in the fourth direction orthogonal to each other (the fourth direction is the axial direction); and a plurality of sides arranged along the side orthogonal to the third direction among the sides of the second large lattice 24B The second auxiliary line 36B (the third direction is the axial direction); and in the second insulating portion 34B, the two second auxiliary lines 36B are respectively formed in an L-shaped two second L-shaped patterns 38B. A pattern that is configured to be oriented.

各第二輔助線36B的軸線方向的長度具有小格子26的沿著內周的1個邊的1/2的長度。又，各第二輔助線36B形成於自第二大格子24B僅離開規定距離(該例中為小格子26的沿著內周的1個邊的1/2的長度)的位置。 The length of each second auxiliary line 36B in the axial direction has a length of 1/2 of one side of the inner circumference of the small lattice 26. Further, each of the second auxiliary lines 36B is formed at a position away from the second large lattice 24B by a predetermined distance (in this example, the length of one side of the inner circumference of the small lattice 26).

以上述方式構成的第二導電片12B如圖1所示，存在於各第二導電圖案18B的一端部側的第二大格子24B的開放端成為不存在第二連接部28B的形狀。存在於各第二導電圖案18B的另一端部側的第二大格子24B的端部經由第二端子40B而電性連接於第二外部配線42B。 As shown in FIG. 1, the second conductive sheet 12B configured as described above has a shape in which the open end of the second large lattice 24B on the one end side of each of the second conductive patterns 18B does not have the second connecting portion 28B. The end of the second large lattice 24B existing on the other end side of each of the second conductive patterns 18B is electrically connected to the second external wiring 42B via the second terminal 40B.

第一大格子24A及第二大格子24B的一邊的長度較佳為3mm~10mm，更佳為4mm~6mm。若一邊的長度未達上述下限值，則檢測時的第一大格子24A及第二大格子24B的靜電電容減少，因而出現檢測不良的可能性提高。另一方面，若超過上述上限值，則存在位置檢測精度降低之顧慮。自相同的觀點考慮，構成第一大格子24A及第二大格子24B的小格子26的一邊的長度較佳為50μm以上，更佳為50μm~500μm，進而佳為150μm~300μm。於小格子26為上述範圍的情況下，亦可更好地確保透明性，於 安裝於顯示裝置的正面時，可無不適感地目視顯示。 The length of one side of the first large lattice 24A and the second large lattice 24B is preferably 3 mm to 10 mm, more preferably 4 mm to 6 mm. When the length of one side does not reach the above lower limit value, the electrostatic capacitances of the first large lattice 24A and the second large lattice 24B at the time of detection are reduced, and thus the possibility of detection failure is improved. On the other hand, if it exceeds the above upper limit value, there is a concern that the position detection accuracy is lowered. From the same viewpoint, the length of one side of the small lattice 26 constituting the first large lattice 24A and the second large lattice 24B is preferably 50 μm or more, more preferably 50 μm to 500 μm, and still more preferably 150 μm to 300 μm. In the case where the small lattice 26 is in the above range, transparency can be better ensured. When mounted on the front side of the display unit, it can be visually displayed without discomfort.

又，第一導電圖案18A(第一大格子24A、中格子30)的線寬、及第二導電圖案18B(第二大格子24B、中格子30)的線寬分別為1μm~30μm。 Moreover, the line width of the first conductive pattern 18A (the first large lattice 24A and the intermediate lattice 30) and the line width of the second conductive pattern 18B (the second large lattice 24B and the intermediate lattice 30) are each 1 μm to 30 μm.

第一輔助圖案20A(第一輔助線36A)及第二輔助圖案20B(第二輔助線36B)的線寬分別為1μm~30μm。該情況下，既可與第一導電圖案18A的線寬或第二導電圖案18B的線寬相同，亦可不同。但較佳為使第一導電圖案18A、第二導電圖案18B、第一輔助圖案20A及第二輔助圖案20B的各線寬相同。 The line widths of the first auxiliary pattern 20A (first auxiliary line 36A) and the second auxiliary pattern 20B (second auxiliary line 36B) are 1 μm to 30 μm, respectively. In this case, the line width of the first conductive pattern 18A or the line width of the second conductive pattern 18B may be the same or different. Preferably, the line widths of the first conductive pattern 18A, the second conductive pattern 18B, the first auxiliary pattern 20A, and the second auxiliary pattern 20B are the same.

而且，當例如於第二導電片12B上積層第一導電片12A而形成第一積層導電片10時，如圖5所示，第一導電圖案18A與第二導電圖案18B成為交叉配置的形態，具體而言，第一導電圖案18A的第一連接部28A與第二導電圖案18B的第二連接部28B將第一透明基體14A(參照圖2A)夾在中間而對向，且第一導電部16A的第一絕緣部34A與第二導電部16B的第二絕緣部34B將第一透明基體14A夾在中間而對向。 Further, when the first conductive sheet 10A is formed by laminating the first conductive sheet 12A on the second conductive sheet 12B, for example, as shown in FIG. 5, the first conductive pattern 18A and the second conductive pattern 18B are arranged in a crosswise manner. Specifically, the first connecting portion 28A of the first conductive pattern 18A and the second connecting portion 28B of the second conductive pattern 18B are opposed to each other by sandwiching the first transparent substrate 14A (refer to FIG. 2A ), and the first conductive portion The first insulating portion 34A of the 16A and the second insulating portion 34B of the second conductive portion 16B are opposed to each other with the first transparent substrate 14A interposed therebetween.

當俯視積層的第一導電片12A及第二導電片12B時，成為以填埋形成於第一導電片12A上的第一大格子24A之間的間隙的方式排列有第二導電片12B的第二大格子24B的形態。即，成為佈滿大格子的形態。此時，於第一大格子24A與第二大格子24B之間，形成有由第一輔助圖案20A與第二輔助圖案20B對向而成的組合圖案44。 When the first conductive sheet 12A and the second conductive sheet 12B are laminated in a plan view, the second conductive sheet 12B is arranged so as to fill a gap between the first large lattices 24A formed on the first conductive sheet 12A. The shape of the two big grid 24B. That is, it is a form that is covered with a large lattice. At this time, a combination pattern 44 in which the first auxiliary pattern 20A and the second auxiliary pattern 20B face each other is formed between the first large lattice 24A and the second large lattice 24B.

組合圖案44具有第一輔助線36A與第二輔助線36B正交而不重疊的形態。 The combined pattern 44 has a form in which the first auxiliary line 36A and the second auxiliary line 36B are orthogonal without overlapping.

即，組合圖案44中沿著第一大格子24A的邊而排列的第一輔助線36A與沿著第二大格子24B的邊而排列的第二輔助線36B的組合圖案如圖6A~圖6C所示，第一輔助線36A的第一軸線46A與第二輔助線36B的第二軸線46B設為大致平行，第一軸線46A與第二軸線46B之間的自平面觀察的距離ha成為第一輔助線36A的線寬Wa及第二輔助線36B的線寬Wb中任一較短的線寬的1/2或1/2以上且為100μm或100μm以下(或者小格子26的排列間距的1/2以下)。於此，小格子26的排列間距實質上與小格子26的一邊的長度相同。 That is, the combined pattern of the first auxiliary line 36A arranged along the side of the first large lattice 24A in the combined pattern 44 and the second auxiliary line 36B arranged along the side of the second large lattice 24B is as shown in FIGS. 6A to 6C. As shown, the first axis 46A of the first auxiliary line 36A and the second axis 46B of the second auxiliary line 36B are substantially parallel, and the distance ha between the first axis 46A and the second axis 46B as viewed from the plane becomes the first 1/2 or 1/2 or more of any shorter line width of the line width Wa of the auxiliary line 36A and the line width Wb of the second auxiliary line 36B and 100 μm or less (or 1 of the arrangement pitch of the small lattices 26) /2 or less). Here, the arrangement pitch of the small lattices 26 is substantially the same as the length of one side of the small lattices 26.

圖6A表示第一軸線46A與第二軸線46B之間的距離ha未達第一輔助線36A的線寬Wa的1/2與第二輔助線36B的線寬Wb的1/2的合計的情況，該情況下，第一輔助線36A與第二輔助線36B成為局部重疊的形態。圖6B表示第一軸線46A與第二軸線46B之間的距離ha為第一輔助線36A的線寬Wa的1/2與第二輔助線36B的線寬Wb的1/2的合計的情況。圖6C表示第一軸線46A與第二軸線46B之間的距離ha長於第一輔助線36A的線寬Wa的1/2與第二輔助線36B的線寬Wb的1/2的合計的情況。 6A shows a case where the distance ha between the first axis 46A and the second axis 46B does not reach 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B. In this case, the first auxiliary line 36A and the second auxiliary line 36B are partially overlapped. 6B shows a case where the distance ha between the first axis 46A and the second axis 46B is a total of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B. 6C shows a case where the distance ha between the first axis 46A and the second axis 46B is longer than the total of 1/2 of the line width Wa of the first auxiliary line 36A and 1/2 of the line width Wb of the second auxiliary line 36B.

組合圖案44中第一絕緣部34A的2個第一L字狀圖案38A中的各第一輔助線36A、與第二絕緣部34B的2個第二L字狀圖案38B中的各第二輔助線36B的組合圖案， 具有未以4個L字狀圖案(第一L字狀圖案38A、第一L字狀圖案38A、第二L字狀圖案38B及第二L字狀圖案38B)形成小格子26的形態。 Each of the first auxiliary line 36A of the two first L-shaped patterns 38A of the first insulating portion 34A and the second auxiliary of the two second L-shaped patterns 38B of the second insulating portion 34B in the combined pattern 44 The combined pattern of line 36B, The form in which the small lattices 26 are formed in the four L-shaped patterns (the first L-shaped pattern 38A, the first L-shaped pattern 38A, the second L-shaped pattern 38B, and the second L-shaped pattern 38B) is formed.

即，如圖7所示成為如下形態：2個第一L字狀圖案38A位於靠近一第二L字狀圖案38B的位置，另一第二L字狀圖案38B位於自該些一第二L字狀圖案38B及2個第一L字狀圖案38A離開之位置。其中，一第二L字狀圖案38B及2個第一L字狀圖案38A中，構成一第二L字狀圖案38B的2個第二輔助線36B中的一第二輔助線36B的第二軸線46B、與構成一第一L字狀圖案38A的2個第一輔助線36A中的一第一輔助線36A的第一軸線46A設為大致平行，該些第一軸線46A與第二軸線46B之間的距離ha成為第一輔助線36A的線寬Wa及第二輔助線36B的線寬Wb中任一較短的線寬的1/2或1/2以上，且為100μm或100μm以下(或者小格子26的排列間距的1/2以下)。 That is, as shown in FIG. 7, the two first L-shaped patterns 38A are located close to a second L-shaped pattern 38B, and the other second L-shaped patterns 38B are located from the second L-shaped patterns. The word pattern 38B and the two first L-shaped patterns 38A are separated from each other. The second L-shaped pattern 38B and the two first L-shaped patterns 38A constitute a second of the second auxiliary lines 36B of the two second auxiliary lines 36B of the second L-shaped pattern 38B. The axis 46B is substantially parallel to the first axis 46A of a first auxiliary line 36A of the two first auxiliary lines 36A constituting a first L-shaped pattern 38A, the first axis 46A and the second axis 46B. The distance ha between the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B is 1/2 or 1/2 or more of any shorter line width, and is 100 μm or less ( Or 1/2 or less of the arrangement pitch of the small lattices 26).

相同地，構成一第二L字狀圖案38B的2個第二輔助線36B中的另一第二輔助線36B的第二軸線46B、與構成另一第一L字狀圖案38A的2個第一輔助線36A中的一第一輔助線36A的第一軸線46A設為大致平行，該些第一軸線46A與第二軸線46B之間的距離ha成為第一輔助線36A的線寬Wa及第二輔助線36B的線寬Wb中任一較短的線寬的1/2或1/2以上，且為100μm或100μm以下(或者小格子26的排列間距的1/2以下)。而且，一第二L字狀圖案38B及2個第一L字狀圖案38A中的第二輔助線 36B及第一輔助線36A的位置關係與圖6A~圖6C相同。 Similarly, the second axis 46B of the other second auxiliary line 36B of the two second auxiliary lines 36B constituting the second L-shaped pattern 38B and the two first portions constituting the other first L-shaped pattern 38A The first axis 46A of a first auxiliary line 36A of an auxiliary line 36A is substantially parallel, and the distance ha between the first axis 46A and the second axis 46B becomes the line width Wa of the first auxiliary line 36A and the The line width Wb of the second auxiliary line 36B is 1/2 or 1/2 or more of any shorter line width, and is 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26). Moreover, a second L-shaped pattern 38B and a second auxiliary line of the two first L-shaped patterns 38A The positional relationship between 36B and the first auxiliary line 36A is the same as that of FIGS. 6A to 6C.

即，第一導電部16A與第二導電部16B自基準位置至少向第三方向僅偏移第一輔助線36A的線寬Wa及第二輔助線36B的線寬Wb中任一較短的線寬的1/2或1/2以上且100μm或100μm以下(或者小格子26的排列間距的1/2以下)而配置。尤其，本實施形態中，沿第三方向及第四方向分別僅偏移第一輔助線36A的線寬Wa及第二輔助線36B的線寬Wb中任一較短的線寬的1/2或1/2以上且100μm或100μm以下(或者小格子26的排列間距的1/2以下)而配置。 That is, the first conductive portion 16A and the second conductive portion 16B are shifted from the reference position by at least one of the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B in at least the third direction. The width is 1/2 or 1/2 or more and 100 μm or 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26). In particular, in the present embodiment, only the 1/2 of the line width Wa of the first auxiliary line 36A and the line width Wb of the second auxiliary line 36B are shifted by 1/2 in the third direction and the fourth direction. Or 1/2 or more and 100 μm or 100 μm or less (or 1/2 or less of the arrangement pitch of the small lattices 26).

於此，如圖8所示，基準位置為表示第一輔助線36A的第一軸線46A與第二輔助線36B的第二軸線46B一致、且第一輔助線36A與第二輔助線36B不重疊、且第一輔助線36A的一端與第二輔助線36B的一端一致的位置。 Here, as shown in FIG. 8, the reference position is such that the first axis 46A of the first auxiliary line 36A coincides with the second axis 46B of the second auxiliary line 36B, and the first auxiliary line 36A and the second auxiliary line 36B do not overlap. And a position at which one end of the first auxiliary line 36A coincides with one end of the second auxiliary line 36B.

如此，於本實施形態所涉及的積層導電片10中，亦如圖5所示，於第一大格子24A與第二大格子24B之間配置有第一輔助圖案20A與第二輔助圖案20B的組合圖案44，因而於與第一大格子24A或第二大格子24B之間不會配置有空白(寬度相當於小格子26的邊的長度，長度相當於第一大格子24A或第二大格子24B的邊的長度的空白)，從而第一大格子24A與第二大格子24B的邊界不會變得顯著。 As described above, in the multilayer electrically conductive sheet 10 according to the present embodiment, as shown in FIG. 5, the first auxiliary pattern 20A and the second auxiliary pattern 20B are disposed between the first large lattice 24A and the second large lattice 24B. The combination pattern 44 is such that no space is disposed between the first large lattice 24A or the second large lattice 24B (the width corresponds to the length of the side of the small lattice 26, and the length corresponds to the first large lattice 24A or the second large lattice. A blank of the length of the side of 24B), so that the boundary between the first large lattice 24A and the second large lattice 24B does not become conspicuous.

而且，於組合圖案44中，成為具有沿著小格子26的內周的1個邊的1/2的長度的第一輔助線36A與第二輔助 線36B局部重疊的形態，該重疊部分的長度與第一大格子24A或第二大格子24B的各邊的長度相比非常短，其長短為該第一大格子24A或第二大格子24B的各邊的長度的1/20或1/20以下。因此，第一輔助線36A與第二輔助線36B局部重疊的部分不會顯著，從而可視性幾乎不會變差。此情況於第一L字狀圖案38A與第二L字狀圖案38B的組合中亦相同，亦如圖7所示，於一第二L字狀圖案38B及2個第一L字狀圖案38A中，亦成為具有沿著小格子26的內周的1個邊的1/2的長度的第一輔助線36A與第二輔助線36B局部重疊的形態，該重疊部分的長度與第一大格子24A或第二大格子24B的各邊的長度相比非常短，其長短為該第一大格子24A或第二大格子24B的各邊的長度的1/20以下。因此，第一輔助線36A與第二輔助線36B局部重疊的部分不會顯著，從而可視性大致不會變差。 Further, in the combined pattern 44, the first auxiliary line 36A and the second auxiliary having a length of 1/2 of one side along the inner circumference of the small lattice 26 are formed. The line 36B is partially overlapped, and the length of the overlapping portion is very short compared to the length of each side of the first large lattice 24A or the second large lattice 24B, and the length thereof is the first large lattice 24A or the second large lattice 24B. The length of each side is 1/20 or 1/20 or less. Therefore, the portion where the first auxiliary line 36A partially overlaps with the second auxiliary line 36B is not conspicuous, and the visibility hardly deteriorates. This is also the same in the combination of the first L-shaped pattern 38A and the second L-shaped pattern 38B, as shown in FIG. 7, in a second L-shaped pattern 38B and two first L-shaped patterns 38A. In the meantime, the first auxiliary line 36A and the second auxiliary line 36B having a length of 1/2 of one side of the inner circumference of the small lattice 26 partially overlap each other, and the length of the overlapping portion and the first large lattice The length of each side of the 24A or the second large lattice 24B is very short, and the length thereof is 1/20 or less of the length of each side of the first large lattice 24A or the second large lattice 24B. Therefore, the portion where the first auxiliary line 36A partially overlaps with the second auxiliary line 36B is not conspicuous, and the visibility is not substantially deteriorated.

又，於第一大格子24A與第二大格子24B的各邊中，第一輔助線36A或第二輔助線36B正交重疊，但由於第一輔助線36A或第二輔助線36B的軸線方向的長度為沿著小格子26的內周的1個邊的1/2的長度，因此幾乎不顯著。 Further, among the sides of the first large lattice 24A and the second large lattice 24B, the first auxiliary line 36A or the second auxiliary line 36B are orthogonally overlapped, but due to the axial direction of the first auxiliary line 36A or the second auxiliary line 36B The length is 1/2 of the length of one side of the inner circumference of the small lattice 26, and thus is hardly noticeable.

又，雖然第一連接部28A的中格子30與第二連接部28B的中格子30正交重疊，但該情況下，第一導電部16A及第二導電部16B沿第三方向與第四方向偏移，因此小格子26的形狀於局部產生不均一的部分。然而，小格子26變得不均一之部分的數量，與於第一連接部28A的中格子30與第二連接部28B的中格子30正交重疊的部分的四方 形中存在的第一大格子24A的小格子26的數量、第二大格子24B的小格子26的數量相比而言較少(為5%左右)，因此小格子26的不均一幾乎不顯著。而且，於第一大格子24A及第二大格子24B中形成鄰接於中格子30的第一缺欠部32A及第二缺欠部32B，因此中格子30的直線部分不會與第一大格子24A的直線部分或第二大格子24B的直線部分重疊，從而可視性幾乎不會變差。 Further, although the middle lattice 30 of the first connecting portion 28A and the intermediate lattice 30 of the second connecting portion 28B are orthogonally overlapped, in this case, the first conductive portion 16A and the second conductive portion 16B are along the third direction and the fourth direction. Offset, so the shape of the small lattice 26 produces a non-uniform portion locally. However, the number of portions in which the small lattices 26 become uneven is the square of the portion orthogonal to the intermediate lattice 30 of the first connecting portion 28A and the intermediate lattice 30 of the second connecting portion 28B. The number of the small lattices 26 of the first large lattice 24A and the number of the small lattices 26 of the second large lattice 24B are relatively small (about 5%), so that the unevenness of the small lattices 26 is hardly significant. . Further, in the first large lattice 24A and the second large lattice 24B, the first cutout portion 32A and the second cutout portion 32B adjacent to the intermediate lattice 30 are formed, so that the straight portion of the intermediate lattice 30 does not overlap with the first large lattice 24A. The straight portions of the straight portion or the second large lattice 24B are partially overlapped, so that the visibility hardly deteriorates.

而且，於將該積層導電片10用作觸控面板的情況下，於第一導電片12A上形成保護層，將自第一導電片12A的多個第一導電圖案18A導出的第一外部配線42A與自第二導電片12B的多個第二導電圖案18B導出的第二外部配線42B，連接於例如控制掃描(scan)的IC(integrated circuit，積體電路)電路。此時較佳為，以使積層導電片10中偏離於液晶顯示裝置的顯示畫面的外周區域(邊緣區域)的面積變得極小的方式，使第一導電圖案18A與第一外部配線42A的各連接部呈直線狀排列的形態，且使第二導電圖案18B與第二外部配線42B的各連接部呈直線狀排列的形態。 Moreover, in the case where the laminated conductive sheet 10 is used as a touch panel, a protective layer is formed on the first conductive sheet 12A, and the first external wiring derived from the plurality of first conductive patterns 18A of the first conductive sheet 12A is formed. The second external wiring 42B derived from 42A and the plurality of second conductive patterns 18B of the second conductive sheet 12B is connected to, for example, an IC (integrated circuit) circuit that controls scanning. In this case, it is preferable that each of the first conductive pattern 18A and the first external wiring 42A is formed such that the area of the outer peripheral region (edge region) of the multilayer conductive sheet 10 deviated from the display screen of the liquid crystal display device is extremely small. The connection portions are arranged in a straight line, and the connection portions of the second conductive pattern 18B and the second external wiring 42B are linearly arranged.

因使指尖接觸於保護層上而導致與指尖對向的第一導電圖案18A與第二導電圖案18B之間的靜電電容發生變化。IC電路檢測該變化量，並基於該變化量而運算指尖的位置。於各個第一導電圖案18A/第二導電圖案18B之間進行該運算。因此，即便指尖同時接觸於2個以上位置，亦可檢測各指尖的位置。 The electrostatic capacitance between the first conductive pattern 18A and the second conductive pattern 18B that opposes the fingertip changes due to contact of the fingertip with the protective layer. The IC circuit detects the amount of change and calculates the position of the fingertip based on the amount of change. This operation is performed between each of the first conductive patterns 18A/second conductive patterns 18B. Therefore, even if the fingertip is in contact with two or more positions at the same time, the position of each fingertip can be detected.

如此，就積層導電片10而言，於將該積層導電片10應用於例如投射型靜電電容方式的觸控面板的情況下，因該積層導電片10的表面電阻較小，故而可加快響應速度，可促進觸控面板的大尺寸化。 As described above, in the case where the laminated conductive sheet 10 is applied to, for example, a projection type capacitive touch panel, the laminated conductive sheet 10 has a small surface resistance, so that the response speed can be increased. It can promote the large size of the touch panel.

而且，即便第一導電部16A與第二導電部16B偏移配置，亦會如上述般，第一導電片12A的第一大格子24A與第二導電片12B的第二大格子24B的邊界變得不顯著，也不會局部性地產生線變粗等的不良情況，從而整體上可視性良好。進而，由第一大格子24A與第二大格子24B鄰接配置而形成的多個規則的小格子26的排列，及由形成於第一大格子24A與第二大格子24B之間的第一輔助線36A與第二輔助線36B的偏移配置而形成的與上述小格子26的排列不同的排列混在一起，由此，成為多個空間頻率混在一起的形態，其結果，可抑制與液晶顯示裝置的像素排列的干涉，從而可有效地降低雲紋的產生。 Further, even if the first conductive portion 16A and the second conductive portion 16B are disposed offset, the boundary between the first large lattice 24A of the first conductive sheet 12A and the second large lattice 24B of the second conductive sheet 12B becomes as described above. It is not significant, and the defects such as thickening of the line are not locally generated, and the overall visibility is good. Further, an arrangement of a plurality of regular small lattices 26 formed by the first large lattice 24A and the second large lattice 24B adjacent to each other, and a first auxiliary formed between the first large lattice 24A and the second large lattice 24B The arrangement in which the line 36A and the second auxiliary line 36B are arranged in an offset manner and which is different from the arrangement of the small lattices 26 is mixed, whereby a plurality of spatial frequencies are mixed, and as a result, the liquid crystal display device can be suppressed. The interference of the pixel arrangement can effectively reduce the generation of moiré.

上述積層導電片10中，將小格子26的形狀設為正方形狀，除此之外，亦可設為多邊形狀。又，除將一邊的形狀設為直線狀以外，亦可將一邊的形狀設為彎曲形狀、圓弧狀。於設為圓弧狀的情況下，亦可例如將對向的2邊設為向外側凸出的圓弧狀，而將其他對向的2邊設為向內此凸出的圓弧狀。又，亦可將各邊的形狀設為向外側凸出的圓弧與向內側凸出的圓弧連續的波線形狀。當然，亦可將各邊的形狀設為正弦曲線。 In the laminated conductive sheet 10, the shape of the small lattice 26 is a square shape, and may be a polygonal shape. Further, in addition to the shape of one side, the shape of one side may be a curved shape or an arc shape. In the case of being formed in an arc shape, for example, the two opposite sides may be formed in an arc shape that protrudes outward, and the other two opposite sides may be formed in an arc shape that is convex inward. Further, the shape of each side may be a wave shape in which an arc projecting outward and a circular arc projecting inward are continuous. Of course, the shape of each side can also be set to a sinusoidal curve.

於上述的第一導電片12A及第二導電片12B中，將構 成第一連接部28A及第二連接部28B的中格子30的大小設為相當於3個小格子26的大小，除此以外，亦可設定為相當於1.5個、2個、2.5個小格子26的大小等各種組合。若中格子30過大，則難以配置第一大格子24A或第二大格子24B，無法檢測的交叉部的靜電電容變化變大，因而最大為相當於5個小格子26的大小為佳。 In the first conductive sheet 12A and the second conductive sheet 12B described above, The size of the middle lattice 30 in the first connecting portion 28A and the second connecting portion 28B is set to correspond to the size of the three small lattices 26, and may be set to be equivalent to 1.5, 2, or 2.5 small squares. Various combinations of 26 sizes. If the middle lattice 30 is too large, it is difficult to arrange the first large lattice 24A or the second large lattice 24B, and the change in electrostatic capacitance of the intersection portion that cannot be detected becomes large, so that the size corresponding to the five small lattices 26 is preferably at most.

又，小格子26的尺寸(1邊的長度或對角線的長度等)、或構成第一大格子24A的小格子26的個數、構成第二大格子24B的小格子26的個數，可根據適用的觸控面板的尺寸或分辨率(配線數)而適當設定。 Further, the size of the small lattice 26 (the length of one side or the length of the diagonal line, etc.), or the number of the small lattices 26 constituting the first large lattice 24A, and the number of the small lattices 26 constituting the second large lattice 24B, It can be set as appropriate according to the size or resolution (number of wirings) of the applicable touch panel.

上述積層導電片10中，如圖1及圖2A所示，設為於第一透明基體14A的一主面形成第一導電部16A且於第二透明基體14B的一主面形成第二導電部16B而進行積層，此外，亦可如圖2B所示，於第一透明基體14A的一主面形成第一導電部16A，且於第一透明基體14A的另一主面形成第二導電部16B。又，亦可於第一導電片12A與第二導電片12B之間不存在其他層，若第一導電圖案18A與第二導電圖案18B為絕緣狀態，則其等亦可對向配置。 As shown in FIG. 1 and FIG. 2A, the laminated conductive sheet 10 is formed with a first conductive portion 16A on one main surface of the first transparent substrate 14A and a second conductive portion on one main surface of the second transparent substrate 14B. 16B is laminated, and as shown in FIG. 2B, the first conductive portion 16A is formed on one main surface of the first transparent substrate 14A, and the second conductive portion 16B is formed on the other main surface of the first transparent substrate 14A. . Further, other layers may not exist between the first conductive sheet 12A and the second conductive sheet 12B. When the first conductive pattern 18A and the second conductive pattern 18B are insulated, they may be disposed opposite to each other.

其次，對製造第一導電片12A及第二導電片12B的方法進行說明。 Next, a method of manufacturing the first conductive sheet 12A and the second conductive sheet 12B will be described.

於製造第一導電片12A及第二導電片12B的情況下亦可例如於第一透明基體14A上及第二透明基體14B上曝光具有包含感光性鹵化銀的乳劑層的感光材料而實施顯影處理，藉此於曝光部形成金屬銀部及於未曝光部形成光透過 性部而形成第一導電部16A及第二導電部16B。再者，亦可進而於金屬銀部實施物理顯影及/或鍍敷處理而使金屬銀部承載導電性金屬。 In the case of manufacturing the first conductive sheet 12A and the second conductive sheet 12B, for example, a photosensitive material having an emulsion layer containing photosensitive silver halide may be exposed on the first transparent substrate 14A and the second transparent substrate 14B to perform development processing. Thereby forming a metallic silver portion in the exposed portion and forming light transmission through the unexposed portion. The first conductive portion 16A and the second conductive portion 16B are formed in the portion. Further, the metal silver portion may be subjected to physical development and/or plating treatment to carry the conductive metal.

或者，亦可對形成於第一透明基體14A及第二透明基體14B上的銅箔上的光阻(photoresist)膜進行曝光、顯影處理而形成抗蝕圖案(resist pattern)，並對自抗蝕圖案露出的銅箔進行蝕刻(etching)，藉此形成第一導電部16A及第二導電部16B。 Alternatively, the photoresist film formed on the copper foil on the first transparent substrate 14A and the second transparent substrate 14B may be exposed and developed to form a resist pattern, and the resist pattern may be formed. The copper foil exposed in the pattern is etched, thereby forming the first conductive portion 16A and the second conductive portion 16B.

或者，亦可於第一透明基體14A及第二透明基體14B上印刷包含金屬微粒子的漿料(paste)，並對漿料進行金屬鍍敷，藉此形成第一導電部16A及第二導電部16B。 Alternatively, a paste containing metal fine particles may be printed on the first transparent substrate 14A and the second transparent substrate 14B, and the slurry may be metal plated to form the first conductive portion 16A and the second conductive portion. 16B.

亦可於第一透明基體14A及第二透明基體14B上，藉由網版(screen)印刷版或凹版(gravure)印刷版而印刷形成第一導電部16A及第二導電部16B。 The first conductive portion 16A and the second conductive portion 16B may be printed on the first transparent substrate 14A and the second transparent substrate 14B by a screen printing plate or a gravure printing plate.

其次，以本實施形態所涉及的第一導電片12A及第二導電片12B使用尤佳態樣的鹵化銀照相感光材料的方法為中心進行敍述。 Next, the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment will be described focusing on a method of using a silver halide photographic light-sensitive material of a particularly preferable aspect.

就本實施形態所涉及的第一導電片12A及第二導電片12B的製造方法而言，根據感光材料與顯影處理的形態而包含以下的3種形態。 The method for producing the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment includes the following three aspects depending on the form of the photosensitive material and the development processing.

(1)對不包含物理顯影核的感光性鹵化銀黑白感光材料進行化學顯影或熱顯影，而使金屬銀部形成於該感光材料上的態樣。 (1) A chemical silver halide black-and-white photosensitive material not containing a physical development core is subjected to chemical development or thermal development to form a metal silver portion on the photosensitive material.

(2)對將物理顯影核包含於鹵化銀乳劑層中的感光 性鹵化銀黑白感光材料進行溶解物理顯影，而使金屬銀部形成於該感光材料上的態樣。 (2) Photosensitive for containing a physical development core in a silver halide emulsion layer The silver halide black-and-white photosensitive material is subjected to dissolution physical development to form a metal silver portion on the photosensitive material.

(3)使不包含物理顯影核的感光性鹵化銀黑白感光材料、與具有包含物理顯影核的非感光性層的顯像片(receiving sheet)重合而進行擴散轉印顯影，使金屬銀部形成於非感光性顯像片上的態樣。 (3) A photosensitive silver halide black-and-white photosensitive material not containing a physical developing core is superposed on a receiving sheet having a non-photosensitive layer containing a physical developing core to perform diffusion transfer development to form a metal silver portion. The appearance on non-photosensitive imaging.

上述(1)的態樣為一體型黑白顯影類型，於感光材料上形成光透過性導電膜。所獲得的顯影銀為化學顯影銀或熱顯影銀，於作為高比表面(high specific surface)的絲狀體(filament)方面而使得於後續的鍍敷或物理顯影過程中活性較高。 The aspect of the above (1) is an integrated black-and-white development type in which a light-transmitting conductive film is formed on a photosensitive material. The developed silver obtained is chemically developed silver or thermally developed silver, which is highly active in subsequent plating or physical development in terms of filament as a high specific surface.

上述(2)的態樣中，藉由於曝光部中物理顯影核相關的鹵化銀粒子溶解並沈積於顯影核上而於感光材料上形成光透過性導電性膜等透光性導電性膜。此形態亦為一體型黑白顯影類型。顯影作用為向物理顯影核上的析出，故而為高活性，但顯影銀為比表面小的球形。 In the aspect of the above (2), the light-transmitting conductive film such as a light-transmitting conductive film is formed on the photosensitive material by dissolving and depositing silver halide particles related to the physical development nuclei in the exposed portion on the developing core. This form is also an integrated black and white development type. The development is a precipitation to the physical development nucleus, so it is highly active, but the developed silver is spherical smaller than the surface.

上述(3)的態樣中，藉由於未曝光部中鹵化銀粒子溶解擴散並沈積於顯像片上的顯影核上而於顯像片上形成光透過性導電性膜等的透光性導電性膜。此態樣為所謂的分離類型(separate type)，且為自感光材料剝離顯像片而使用的態樣。 In the aspect of the above (3), the light-transmitting conductive film such as a light-transmitting conductive film is formed on the developing sheet by dissolving and diffusing the silver halide particles in the unexposed portion and depositing them on the developing core on the developing sheet. . This aspect is a so-called separate type and is an aspect used for peeling off a developing sheet from a photosensitive material.

任一態樣均可選擇負(negative)型顯影處理及反轉顯影處理的任一顯影(於擴散轉印方式的情況下，藉由使用直接正片(autopositive)型感光材料作為感光材料而可 進行負型顯影處理)。 Any of the negative development type development processing and the reverse development processing may be selected in any of the aspects (in the case of the diffusion transfer method, by using an autopositive type photosensitive material as a photosensitive material) Perform negative development processing).

於此所說之化學顯影、熱顯影、溶解物理顯影、擴散轉印顯影為業界通常使用的用語般的意味，於照相化學的普通教科書，例如菊地真一著「照相化學」(共立出版社，1955年刊發)，C.E.K.Mees編「The Theory of Photographic Processes，4thed.」(Mcmillan公司，1977年刊發)中有解說。本案為有關液體處理的發明，作為其他顯影方式，亦可參考應用熱顯影方式的技術。例如，可應用日本專利特開2004-184693號、日本專利特開2004-334077號、及日本專利特開2005-010752號的各公報、日本專利特願2004-244080號、日本專利特願2004-085655號的各說明書中所記載的技術。 The chemical development, thermal development, dissolved physical development, and diffusion transfer development referred to herein are the meanings commonly used in the industry. In general textbooks for photographic chemistry, such as Kikuchi, "Photography Chemistry" (Kyoritsu Press, 1955) (published annually), CEK Mees edited "The Theory of Photographic Processes, 4thed." (Mcmillan, published in 1977) has a commentary. This case is an invention relating to liquid treatment, and as another development method, reference may also be made to a technique using a thermal development method. For example, Japanese Patent Laid-Open No. 2004-184693, Japanese Patent Laid-Open No. 2004-334077, and Japanese Patent Laid-Open No. Hei No. 2005-010752, Japanese Patent Application No. 2004-244080, Japanese Patent Application No. 2004- The technique described in each specification of No. 085655.

於此，以下對本實施形態所涉及的第一導電片12A及第二導電片12B的各層構成進行詳細說明。 Here, the respective layer configurations of the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment will be described in detail below.

[第一透明基體14A、第二透明基體14B] [First transparent substrate 14A, second transparent substrate 14B]

作為第一透明基體14A及第二透明基體14B，可列舉塑膠薄膜(plastic film)、塑膠板、玻璃(glass)板等。 Examples of the first transparent substrate 14A and the second transparent substrate 14B include a plastic film, a plastic plate, and a glass plate.

作為上述塑膠薄膜及塑膠板的原料，可使用例如聚對苯二甲酸乙二酯(PET，polyethylene terephthalate)、聚萘二甲酸二乙酯(PEN，polyethylene naphthalate)等聚酯(polyester)類；聚乙烯(PE，polyethylene)、聚丙烯(PP，polypropylene)、聚苯乙烯(polystyrene)、EVA(ethylene vinyl acetate copolymer，乙烯-醋酸乙烯酯共聚物)等聚烯烴(polyolefin)類；乙烯基(vinyl)系樹脂；此外，聚碳 酸酯(PC，polycarbonate)、聚醯胺(polyamide)、聚醯亞胺(polyimide)、丙烯酸系(acryl)樹脂、三乙醯纖維素(TAC，triacetylcellulose)等。 As a raw material of the plastic film and the plastic sheet, for example, polyester such as polyethylene terephthalate (PET) or polyethylene naphthalate (PEN); Polyolefins such as ethylene (PE), polypropylene (PP), polystyrene, EVA (ethylene vinyl acetate copolymer); vinyl Resin; in addition, polycarbon An acid ester (PC), a polyamide, a polyimide, an acryl resin, a triacetyl cellulose (TAC), or the like.

作為第一透明基體14A及第二透明基體14B，較佳為PET(熔點：258℃)、PEN(熔點：269℃)、PE(熔點：135℃)、PP(熔點：163℃)、聚苯乙烯(熔點：230℃)、聚氯乙烯(polyvinyl chloride)(熔點：180℃)、聚偏二氯乙烯(polyvinylidene chloride)(熔點：212℃)或TAC(熔點：290℃)等熔點為約290℃或290℃以下的塑膠薄膜或塑膠板，尤其，自光透過性或加工性等觀點考慮較佳為PET。積層導電片10中所使用的第一導電片12A及第二導電片12B般的導電性薄膜需要透明性，因此第一透明基體14A及第二透明基體14B的透明度較高為佳。 The first transparent substrate 14A and the second transparent substrate 14B are preferably PET (melting point: 258 ° C), PEN (melting point: 269 ° C), PE (melting point: 135 ° C), PP (melting point: 163 ° C), polystyrene. Melting point of ethylene (melting point: 230 ° C), polyvinyl chloride (melting point: 180 ° C), polyvinylidene chloride (melting point: 212 ° C) or TAC (melting point: 290 ° C) is about 290 A plastic film or a plastic plate of ° C or less at 290 ° C is particularly preferably PET from the viewpoints of light transmittance or workability. The conductive film such as the first conductive sheet 12A and the second conductive sheet 12B used in the laminated conductive sheet 10 needs transparency, and therefore the transparency of the first transparent substrate 14A and the second transparent substrate 14B is preferably high.

[銀鹽(silver salt)乳劑層] [silver salt emulsion layer]

成為第一導電片12A的第一導電部16A(第一大格子24A、第一連接部28A、第一輔助圖案20A等)及第二導電片12B的第二導電部16B(第二大格子24B、第二連接部28B、第二輔助圖案20B等)的銀鹽乳劑層，除含有銀鹽與黏合劑(binder)之外，亦含有溶劑或染料等添加劑。 The first conductive portion 16A (the first large lattice 24A, the first connecting portion 28A, the first auxiliary pattern 20A, and the like) of the first conductive sheet 12A and the second conductive portion 16B of the second conductive sheet 12B (the second large lattice 24B) The silver salt emulsion layer of the second connecting portion 28B, the second auxiliary pattern 20B, and the like contains an additive such as a solvent or a dye in addition to the silver salt and the binder.

作為本實施形態中所使用的銀鹽，可列舉鹵化銀等無機銀鹽及醋酸銀等有機銀鹽。本實施形態中，較佳為使用作為光感測元件(sensor)的特性優異的鹵化銀。 Examples of the silver salt used in the present embodiment include inorganic silver salts such as silver halide and organic silver salts such as silver acetate. In the present embodiment, it is preferable to use silver halide which is excellent in characteristics as a photosensor.

就銀鹽乳劑層的塗佈銀量(銀鹽的塗佈量)而言，換算為銀則較佳為1~30g/m²，更佳為1~25g/m²，進而佳 為5~20g/m²。藉由使該塗佈銀量為上述範圍，可於形成積層導電片10的情況下獲得所需的表面電阻。 The amount of silver coated (the amount of silver salt applied) of the silver salt emulsion layer is preferably from 1 to 30 g/m ² , more preferably from 1 to 25 g/m ² , and more preferably from 5 to 5 in terms of silver. 20g/m ² . By setting the coated silver amount to the above range, the desired surface resistance can be obtained in the case where the laminated conductive sheet 10 is formed.

作為本實施形態中所使用的黏合劑，可列舉例如明膠(gelatin)、聚乙烯醇(PVA，polyvinyl alcohol)、聚乙烯吡咯烷酮(PVP，polyvinylpyrrolidone)、澱粉等多糖類、纖維素(cellulose)及其衍生物、聚氧化乙烯(polyethylene oxide)、聚乙烯胺(polyvinylamine)、聚葡萄胺糖(chitosan)、聚離胺酸(polylysine)、聚丙烯酸、聚海藻酸(polyalgin acid)、聚透明質酸(polyhyaluronic acid)、羧基纖維素(Carboxylcellulose)等。該些材料根據官能基的離子性而具有中性、陰離子性、陽離子性的性質。 Examples of the binder used in the present embodiment include gelatin, polyvinyl alcohol (PVA, polyvinyl alcohol), polyvinylpyrrolidone (PVP, polyvinylpyrrolidone), polysaccharides such as starch, and cellulose. Derivatives, polyethylene oxide, polyvinylamine, chitosan, polylysine, polyacrylic acid, polyalginic acid, polyhyaluronic acid Polyhyaluronic acid), carboxy cellulose (Carboxylcellulose), and the like. These materials have neutral, anionic, and cationic properties depending on the ionicity of the functional group.

本實施形態的銀鹽乳劑層中所含有的黏合劑的含量並無特別限定，可於能發揮分散性與密接性的範圍適當地決定。銀鹽乳劑層中的黏合劑的含量，以銀/黏合劑體積比記而較佳為1/4或1/4以上，更佳為1/2或1/2以上。銀/黏合劑體積比較佳為100/1或100/1以下，更佳為50/1或50/1以下。又，銀/黏合劑體積比進而佳為1/1~4/1。最佳為1/1~3/1。藉由使銀鹽乳劑層中的銀/黏合劑體積比為該範圍，即便於調整塗佈銀量的情況下亦可抑制電阻值的不均，從而可獲得具有均一表面電阻的積層導電片。再者，銀/黏合劑體積比可藉由將原料的鹵化銀量/黏合劑量(重量比)轉換為銀量/黏合劑量(重量比)，進而將銀量/黏合劑量(重量比)轉換為銀量/黏合劑量(體積比)而求出。 The content of the binder contained in the silver salt emulsion layer of the present embodiment is not particularly limited, and can be appropriately determined in a range in which dispersibility and adhesion can be exhibited. The content of the binder in the silver salt emulsion layer is preferably 1/4 or more, more preferably 1/2 or more, in terms of the silver/binder volume ratio. The silver/binder volume is preferably 100/1 or less, more preferably 50/1 or less. Further, the silver/binder volume ratio is preferably from 1/1 to 4/1. The best is 1/1~3/1. By setting the silver/binder volume ratio in the silver salt emulsion layer to this range, even when the amount of coated silver is adjusted, the unevenness of the resistance value can be suppressed, and a laminated conductive sheet having a uniform surface resistance can be obtained. Furthermore, the silver/binder volume ratio can be converted into a silver amount/binder amount (weight ratio) by converting the amount of silver halide/binder (weight ratio) of the raw material, thereby converting the amount of silver/binder (weight ratio) into The amount of silver/binder (volume ratio) was determined.

<溶劑> <solvent>

銀鹽乳劑層的形成中所使用的溶劑並無特別限定，可列舉例如水、有機溶劑(例如甲醇(methanol)等醇(alcohol)類、丙酮(acetone)等酮(ketone)類、甲醯胺(formamide)等醯胺(amide)類、二甲基亞碸(dimethyl sulfoxide)等亞碸(sulfoxide)類、醋酸乙酯(ethyl acetate)等酯(ester)類、醚(ether)類等)、離子性液體及該些的混合溶劑。 The solvent to be used for the formation of the silver salt emulsion layer is not particularly limited, and examples thereof include water and an organic solvent (for example, alcohol such as methanol, ketone such as acetone, and formamide. (amide) such as formamide, sulfoxides such as dimethyl sulfoxide, esters such as ethyl acetate, ethers, etc. An ionic liquid and a mixed solvent of these.

本實施形態的銀鹽乳劑層中所使用的溶劑的含量，相對於銀鹽乳劑層中所含的銀鹽、黏合劑等的合計質量而為30質量百分比~90質量百分比的範圍，較佳為50質量百分比~80質量百分比的範圍。 The content of the solvent to be used in the silver salt emulsion layer of the present embodiment is preferably in the range of 30% by mass to 90% by mass based on the total mass of the silver salt or the binder contained in the silver salt emulsion layer. 50% by mass to 80% by mass.

<其他添加劑> <Other additives>

關於本實施形態中所使用的各種添加劑並無特別限制，可較佳地使用周知的添加劑。 The various additives used in the present embodiment are not particularly limited, and known additives can be preferably used.

[其他層構成] [Other layer composition]

亦可於銀鹽乳劑層上設置未圖示的保護層。本實施形態中「保護層」是指包含明膠或高分子聚合物(polymer)的黏合劑的層，其形成於具有感光性的銀鹽乳劑層上以防止擦傷或表現改良力學特性的效果。該保護層的厚度較佳為0.5μm或0.5μm以下。保護層的塗佈方法及形成方法並無特別限定，可適當選擇周知的塗佈方法及形成方法。又，亦可於銀鹽乳劑層的下方設置例如底塗層。 A protective layer (not shown) may be provided on the silver salt emulsion layer. In the present embodiment, the "protective layer" means a layer containing a binder of gelatin or a polymer, which is formed on a photosensitive silver salt emulsion layer to prevent scratching or to exhibit an effect of improving mechanical properties. The thickness of the protective layer is preferably 0.5 μm or less. The coating method and the formation method of the protective layer are not particularly limited, and a well-known coating method and formation method can be appropriately selected. Further, for example, an undercoat layer may be provided under the silver salt emulsion layer.

其次，對第一導電片12A及第二導電片12B的製作方法的各步驟進行說明。 Next, each step of the method of manufacturing the first conductive sheet 12A and the second conductive sheet 12B will be described.

[曝光] [exposure]

本實施形態中，包含藉由印刷方式實施第一導電部16A及第二導電部16B的情況，但除印刷方式以外，可藉由曝光與顯影等而形成第一導電部16A及第二導電部16B。即，對設置於第一透明基體14A及第二透明基體14B上的具有含銀鹽層的感光材料或塗覆有光微影(photolithography)用光聚合物(photopolymer)的感光材料進行曝光。可使用電磁波進行曝光。作為電磁波，可列舉例如可見光線、紫外線等的光、X射線等放射線等。進而曝光中既可利用具有波長分佈的光源，亦可使用特定波長的光源。 In the present embodiment, the first conductive portion 16A and the second conductive portion 16B are formed by printing, but the first conductive portion 16A and the second conductive portion may be formed by exposure, development, or the like in addition to the printing method. 16B. That is, a photosensitive material having a silver salt-containing layer or a photosensitive material coated with a photopolymer for photolithography disposed on the first transparent substrate 14A and the second transparent substrate 14B is exposed. Electromagnetic waves can be used for exposure. Examples of the electromagnetic wave include light such as visible light and ultraviolet light, and radiation such as X-ray. Further, in the exposure, a light source having a wavelength distribution or a light source having a specific wavelength may be used.

就曝光方法而言，較佳為隔著玻璃遮罩(glass mask)的方法或利用雷射(laser)繪圖的圖案曝光方式。 As the exposure method, a method of glass masking or a pattern exposure by laser drawing is preferred.

[顯影處理] [development processing]

本實施形態中，於對乳劑層進行曝光之後，進而進行顯影處理。顯影處理可使用銀鹽照相軟片或影印紙、印刷製版用薄膜、光罩(photomask)用乳膠遮罩(emulsion mask)等中使用的通常的顯影處理的技術。顯影液並無特別限定，亦可使用PQ(phenidone-quinol，菲尼酮-對苯二酚)顯影液、MQ(metol-quinol，米吐爾-對苯二酚)顯影液、MAA(methacrylic acid，甲基丙烯酸)顯影液等，市售品中，可使用例如富士軟片公司調配物的CN-16、CR-56、CP45X、FD-3、PAPITOL、KODAK公司調配物的C-41、E-6、RA-4、D-19、D-72等顯影液或其套組(kit)中所包含的顯影液。又，亦可使用高反差顯影液(lith developer)。 In the present embodiment, after the emulsion layer is exposed, development processing is further performed. For the development treatment, a technique of a usual development treatment used in a silver salt photographic film or a photocopying paper, a film for printing plate making, a photomask, an emulsion mask, or the like can be used. The developer is not particularly limited, and a PQ (phenidone-quinol, phenidone-hydroquinone) developer, MQ (metol-quinol, mitre-hydroquinone) developer, MAA (methacrylic acid) may also be used. , a methacrylic acid) developer, etc., and commercially available products such as CN-16, CR-56, CP45X, FD-3, PAPITOL, and KODAK formulations of C-41, E-, can be used. 6. A developing solution contained in a developing solution such as RA-4, D-19, D-72 or a kit thereof. Further, a lith developer can also be used.

本發明中的顯影處理可包含以除去未曝光部分的銀鹽而穩定化為目的進行的固定處理。本發明中的固定處理可使用銀鹽照相軟片或影印紙、印刷製版用薄膜、光罩用乳膠遮罩等中所使用的固定處理的技術。 The development treatment in the present invention may include a fixing treatment for the purpose of stabilizing the silver salt in the unexposed portion. In the fixing treatment in the present invention, a technique of fixing treatment used in a silver salt photographic film or a photocopying paper, a film for printing plate making, a latex mask for a photomask, or the like can be used.

上述固定步驟中的固定溫度較佳為約20℃~約50℃，更佳為25℃~45℃。又，固定時間較佳為5秒~1分鐘，更佳為7秒~50秒。固定液的補充量相對於感光材料的處理量而較佳為600ml/m²或600ml/m²以下，更佳為500ml/m²或500ml/m²以下，尤其佳為300ml/m²或300ml/m²以下。 The fixing temperature in the above fixing step is preferably from about 20 ° C to about 50 ° C, more preferably from 25 ° C to 45 ° C. Further, the fixed time is preferably from 5 seconds to 1 minute, more preferably from 7 seconds to 50 seconds. Supplemental amount of fixative with respect to the photosensitive material and the processing amount is preferably 600ml / m ² or 600ml / m ² or less, more preferably 500ml / m ² or 500ml / m ² or less, particularly preferably 300ml / m ² or 300ml /m ² or less.

較佳為對實施了顯影、固定處理的感光材料實施水洗處理或穩定化處理。上述水洗處理或穩定化處理可於每1m²通常感光材料，水洗水量為20公升(liter)或20公升以下而進行，亦可以3公升或3公升以下的補充量(亦包含0，即貯水水洗)進行。 It is preferred to subject the photosensitive material subjected to the development and fixation treatment to a water washing treatment or a stabilization treatment. The water washing treatment or the stabilization treatment may be carried out for every 1 m ^{2 of the} usual photosensitive material, the amount of water washing water is 20 liters or less, or may be 3 liters or less, or the amount of supplementation of 3 liters or less (including 0, that is, water storage) )get on.

顯影處理後的曝光部中所含的金屬銀的質量，較佳為相對於曝光前的曝光部中所含的銀的質量而為50質量百分比或50質量百分比以上的含有率，更佳為80質量百分比或80質量百分比以上。若曝光部中所含的銀的質量相對於曝光前的曝光部中所含的銀的質量而為50質量百分比或50質量百分比以上，則可獲得較高的導電性，故而較佳。 The mass of the metallic silver contained in the exposed portion after the development treatment is preferably 50% by mass or 50% by mass or more based on the mass of the silver contained in the exposed portion before the exposure, and more preferably 80%. Percentage by mass or more than 80% by mass. When the mass of the silver contained in the exposed portion is 50% by mass or more and 50% by mass or more based on the mass of the silver contained in the exposed portion before the exposure, high conductivity can be obtained, which is preferable.

本實施形態中的顯影處理後的層次(gradation)並無特別限定，較佳為超過4.0。若顯影處理後的層次超過4.0，則可於保持較高的光透過性部的透光性的狀態下提高導電 性金屬部的導電性。作為使層次為4.0或4.0以上的方法，可列舉例如上述的銠離子(rhodium ion)、銥離子(iridium ion)的摻雜(dope)。 The gradation after the development treatment in the present embodiment is not particularly limited, but is preferably more than 4.0. When the level after the development treatment exceeds 4.0, the conductivity can be improved while maintaining the light transmittance of the high light transmissive portion. Conductivity of the metal part. Examples of the method of setting the layer to 4.0 or 4.0 include the above-described doping of rhodium ions and iridium ions.

經以上步驟而獲得導電片，所獲得的導電片的表面電阻較佳為100Ω(ohm，歐姆)/sq.或Ω/sq.以下，且較佳為處於0.1Ω/sq.~100Ω/sq.的範圍，更佳為處於1Ω/sq.~10Ω/sq.的範圍。藉由將表面電阻調整於該範圍，即便於面積為10cm×10cm或10cm×10cm以上的大型觸控面板亦可進行位置檢測。又，亦可進而對顯影處理後的導電片進行壓光(calender)處理，可藉由壓光處理而調整為所需的表面電阻。 The conductive sheet is obtained through the above steps, and the surface resistance of the obtained conductive sheet is preferably 100 Ω (ohm, ohm)/sq. or Ω/sq. or less, and preferably 0.1 Ω/sq. to 100 Ω/sq. The range is preferably in the range of 1 Ω/sq.~10 Ω/sq. By adjusting the surface resistance to this range, position detection can be performed even for a large touch panel having an area of 10 cm × 10 cm or 10 cm × 10 cm or more. Further, the conductive sheet after the development treatment may be subjected to calender treatment, and may be adjusted to a desired surface resistance by calendering.

[物理顯影及鍍敷處理] [Physical development and plating treatment]

本實施形態中，亦可以提高藉由上述曝光及顯影處理而形成的金屬銀部的導電性為目的，而進行用以使上述金屬銀部承載導電性金屬粒子的物理顯影及/或鍍敷處理。本發明中，既可僅以物理顯影或鍍敷處理中的任一處理使金屬性銀部承載導電性金屬粒子，亦可組合物理顯影與鍍敷處理而使金屬銀部承載導電性金屬粒子。再者，可將包含對金屬銀部實施物理顯影及/或鍍敷處理而得者稱作「導電性金屬部」。 In the present embodiment, for the purpose of improving the conductivity of the metallic silver portion formed by the exposure and development treatment, physical development and/or plating treatment for carrying the conductive metal particles on the metallic silver portion may be performed. . In the present invention, the metallic silver portion may be carried by the conductive metal particles only by any of the physical development or the plating treatment, or the metal silver portion may be carried by the physical development and the plating treatment. Further, a person who performs physical development and/or plating treatment on the metallic silver portion may be referred to as a "conductive metal portion".

本實施形態中的「物理顯影」可謂於金屬或金屬化合物的核上，以還原劑對銀離子等金屬離子進行還原而使金屬粒子析出的處理。該物理現象被利用於即時B & W軟片、即時幻燈片軟片(instant slide film)及印刷版製造等 中，本發明中可使用該技術。 The "physical development" in the present embodiment is a treatment in which metal ions such as silver ions are reduced by a reducing agent on a core of a metal or a metal compound to precipitate metal particles. This physical phenomenon is utilized in instant B & W films, instant slide films, and print plate manufacturing. This technique can be used in the present invention.

又，物理顯影既可與曝光後的顯影處理同時進行，亦可於顯影處理後另行進行。 Further, the physical development may be performed simultaneously with the development processing after the exposure, or separately after the development processing.

本實施形態中，鍍敷處理可使用非電解鍍敷(化學還原鍍敷或取代鍍敷)、電鍍、或非電解鍍敷與電鍍兩者。本實施形態中的非電解鍍敷可使用周知的非電解鍍敷技術，例如可使用印刷(print)配線板等中所使用的非電解鍍敷技術，非電解鍍敷較佳為非電解鍍銅。 In the present embodiment, electroless plating (chemical reduction plating or substitution plating), electroplating, or both electroless plating and electroplating may be used for the plating treatment. The electroless plating in the present embodiment can use a well-known electroless plating technique. For example, an electroless plating technique used in a printed wiring board or the like can be used, and electroless plating is preferably electroless copper plating. .

[氧化處理] [Oxidation treatment]

本實施形態中，較佳為對顯影處理後的金屬銀部、及藉由物理顯影及/或鍍敷處理而形成的導電性金屬部實施氧化處理。藉由進行氧化處理，於例如光透過性部上輕微沈積有金屬的情況下，可除去該金屬而使光透過性部的透過性為大致100%。 In the present embodiment, it is preferable that the metal silver portion after the development treatment and the conductive metal portion formed by the physical development and/or the plating treatment are subjected to an oxidation treatment. When the metal is slightly deposited on the light-transmitting portion by the oxidation treatment, the metal can be removed to make the light-transmitting portion have a permeability of approximately 100%.

[導電性金屬部] [Electrically conductive metal part]

本實施形態的導電性金屬部的線寬為1μm或1μm以上且30μm或30μm以下即可，較佳為1μm或1μm以上且15μm或15μm以下。更佳為5μm或5μm以上且10μm或10μm以下，最佳為5μm或5μm以上且9μm或9μm以下。於線寬未達上述下限值的情況下，導電性變得不充分，因而於用於觸控面板的情況下，檢測感度不充分。另一方面，若線寬超過上述上限值則因導電性金屬部所引起的雲紋變得顯著，或者在用於觸控面板時可視性變差。再者，藉由處於上述範圍而可改善導電性金屬部的雲紋，可 視性變得尤其好。線間隔較佳為30μm或30μm以上且500μm或500μm以下，更佳為50μm或50μm以上且400μm或400μm以下，最佳為100μm或100μm以上且350μm或350μm以下。又，導電性金屬部在接地(earth connection)等目的下，亦可具有線寬較30μm寬的部分。 The line width of the conductive metal portion of the present embodiment may be 1 μm or 1 μm or more and 30 μm or 30 μm or less, and preferably 1 μm or 1 μm or more and 15 μm or 15 μm or less. More preferably, it is 5 μm or more and 10 μm or less, preferably 5 μm or more and 9 μm or less. When the line width is less than the above lower limit value, the conductivity is insufficient. Therefore, when it is used for a touch panel, the detection sensitivity is insufficient. On the other hand, if the line width exceeds the above upper limit value, the moiré caused by the conductive metal portion becomes conspicuous, or the visibility is deteriorated when used for a touch panel. Furthermore, by being in the above range, the moiré of the conductive metal portion can be improved. Visuality has become especially good. The line interval is preferably 30 μm or more and 500 μm or less, more preferably 50 μm or more and 400 μm or less, and most preferably 100 μm or more and 350 μm or less. Further, the conductive metal portion may have a portion having a line width of 30 μm or more for the purpose of earth connection or the like.

本實施形態中的導電性金屬部自可見光透過率的方面考慮，開口率(透過率)較佳為85%或85%以上，更佳為90%或90%以上，最佳為95%或95%以上。開口率是指第一導電部16A及第二導電部16B的除導電部分以外的透光性部分於整體中所佔的比例，例如線寬15μm、間距300μm的正方形格子狀的開口率為90%。 The conductive metal portion in the present embodiment preferably has an aperture ratio (transmittance) of 85% or more, more preferably 90% or more, and most preferably 95% or 95, from the viewpoint of visible light transmittance. %the above. The aperture ratio is a ratio of the light-transmitting portions other than the conductive portion of the first conductive portion 16A and the second conductive portion 16B to the whole, for example, a square lattice-like aperture ratio of a line width of 15 μm and a pitch of 300 μm is 90%. .

[光透過性部] [Light Transmissive Department]

本實施形態中的「光透過性部」是指第一導電片12A及第二導電片12B中除導電性金屬部以外的具有透光性的部分。光透過性部的透過率如上所述，以除有助於第一透明基體14A及第二透明基體14B的光吸收及反射以外的於380nm~780nm的波長區域中的透過率的最小值表示的透過率為90%或90%以上，較佳為95%或95%以上，更佳為97%或97%以上，進而佳為98%或98%以上，最佳為99%或99%以上。 The "light-transmitting portion" in the present embodiment means a portion having light transmissivity other than the conductive metal portion of the first conductive sheet 12A and the second conductive sheet 12B. As described above, the transmittance of the light-transmitting portion is expressed by the minimum value of the transmittance in the wavelength region of 380 nm to 780 nm other than the light absorption and reflection of the first transparent substrate 14A and the second transparent substrate 14B. The transmittance is 90% or more, preferably 95% or more, more preferably 97% or more, more preferably 98% or more, and most preferably 99% or more.

[第一導電片12A及第二導電片12B] [First conductive sheet 12A and second conductive sheet 12B]

本實施形態所涉及的第一導電片12A及第二導電片12B中的第一透明基體14A及第二透明基體14B的厚度較佳為5μm~350μm，更佳為30μm~150μm。若該厚度為 5μm~350μm的範圍則可獲得所需的可見光的透過率，且亦容易處理。 The thickness of the first transparent substrate 14A and the second transparent substrate 14B in the first conductive sheet 12A and the second conductive sheet 12B according to the present embodiment is preferably 5 μm to 350 μm, and more preferably 30 μm to 150 μm. If the thickness is A range of 5 μm to 350 μm can obtain a desired transmittance of visible light, and is also easy to handle.

設置於第一透明基體14A及第二透明基體14B上的金屬銀部的厚度，可根據塗佈於第一透明基體14A及第二透明基體14B上的含銀鹽層用塗料的塗佈厚度而適當地決定。金屬銀部的厚度可自0.001mm~0.2mm中選擇，較佳為30μm或以下，更佳為20μm或20μm以下，進而佳為0.01μm~9μm，最佳為0.05μm~5μm。又，金屬銀部較佳為圖案狀。金屬銀部可為1層，亦可為2層或2層以上的疊層構成。於金屬銀部為圖案狀且為2層或2層以上的疊層構成的情況下，以可於不同的波長進行感光的方式賦予不同的感色性。由此，若改變曝光波長進行曝光，則可於各層形成不同的圖案。 The thickness of the metal silver portion provided on the first transparent substrate 14A and the second transparent substrate 14B may be based on the coating thickness of the coating material for the silver salt-containing layer applied to the first transparent substrate 14A and the second transparent substrate 14B. Determine it appropriately. The thickness of the metal silver portion may be selected from 0.001 mm to 0.2 mm, preferably 30 μm or less, more preferably 20 μm or less, further preferably 0.01 μm to 9 μm, and most preferably 0.05 μm to 5 μm. Further, the metal silver portion is preferably in the form of a pattern. The metal silver portion may be one layer or two or two layers or more. When the metal silver portion is in the form of a pattern and is formed of a laminate of two or more layers, different color sensitivities are imparted so that light can be applied at different wavelengths. Thus, when the exposure wavelength is changed and exposure is performed, different patterns can be formed in each layer.

就導電性金屬部的厚度而言，作為觸控面板的用途，越薄則顯示面板(panel)的視角越寬，因而厚度越薄越好，於提高可視性的方面亦要求薄膜化。自該觀點考慮，包含由導電性金屬部承載的導電性金屬層的厚度較佳為未達9μm，更佳為0.1μm或0.1μm以上且未達5μm，進而佳為0.1μm或0.1μm以上且未達3μm。 As for the thickness of the conductive metal portion, as the use of the touch panel is thinner, the wider the viewing angle of the display panel is, the thinner the thickness is, and the thinner the film is. From this viewpoint, the thickness of the conductive metal layer contained in the conductive metal portion is preferably less than 9 μm, more preferably 0.1 μm or more, and less than 5 μm, and further preferably 0.1 μm or more. Less than 3μm.

本實施形態中，可藉由控制上述的含銀鹽層的塗佈厚度而形成所需厚度的金屬銀部，進而可藉由物理顯影及/或鍍敷處理而自如地控制包含導電性金屬粒子的層的厚度，因此即便為具有未達5μm的厚度，較佳為具有未達3μm的厚度的第一導電片12A及第二導電片12B亦可容易 地形成。 In the present embodiment, the metal silver portion having a desired thickness can be formed by controlling the coating thickness of the silver-containing salt layer, and the conductive metal particles can be freely controlled by physical development and/or plating treatment. The thickness of the layer is such that even if it has a thickness of less than 5 μm, it is preferable that the first conductive sheet 12A and the second conductive sheet 12B having a thickness of less than 3 μm are easily used. Ground formation.

再者，本實施形態所涉及的第一導電片12A或第二導電片12B的製造方法中，並非必須進行鍍敷等步驟。本實施形態所涉及的第一導電片12A或第二導電片12B的製造方法中，可藉由調整銀鹽乳劑層的塗佈銀量、銀/黏合劑體積比而獲得所需的表面電阻。再者，亦可根據需要而進行壓光處理等。 Further, in the method of manufacturing the first conductive sheet 12A or the second conductive sheet 12B according to the present embodiment, it is not necessary to perform a step such as plating. In the method for producing the first conductive sheet 12A or the second conductive sheet 12B according to the present embodiment, the required surface resistance can be obtained by adjusting the amount of coated silver and the silver/binder volume ratio of the silver salt emulsion layer. Further, calendering treatment or the like may be performed as needed.

(顯影處理後的硬膜處理) (hard film treatment after development treatment)

對於銀鹽乳劑層進行顯影處理之後，較佳為浸漬於硬膜劑中進行硬膜處理。作為硬膜劑，可列舉例如戊二醛、己二醛、2,3-二羥基-1,4-二氧雜環己烷等二醛類及硼酸等日本專利特開平2-141279號公報中記載者。 After the development of the silver salt emulsion layer, it is preferably immersed in a hard coating agent for hard film treatment. Examples of the hard coat agent include dialdehydes such as glutaraldehyde, adipaldehyde, 2,3-dihydroxy-1,4-dioxane, and boric acid, and the like. Recorder.

再者，本發明可與下述表1及表2中記載的公開公報及國際公開說明書的技術適當組合而使用。省略「特開」、「號公報」、「號說明書」等的註記。 Furthermore, the present invention can be suitably used in combination with the techniques disclosed in Tables 1 and 2 below and the techniques of the international publications. The notes such as "special opening", "number bulletin", and "number manual" are omitted.

上述例中，表示了將2個或2個以上第一大格子24A沿第一方向串聯連接而構成第一導電圖案18A，且將2個或2個以上第二大格子24B沿第二方向串聯連接而構成第二導電圖案18B的例子，此外，亦可將包含ITO(indium tin oxide，氧化銦錫)膜的例如菱形的2個或2個以上透明電 極沿第一方向串聯連接而構成第一導電圖案18A，且將包含ITO膜的例如菱形的2個或2個以上透明電極沿第二方向串聯連接而構成第二導電圖案18B。 In the above example, two or more first large lattices 24A are connected in series in the first direction to form the first conductive pattern 18A, and two or more second large lattices 24B are connected in series in the second direction. An example in which the second conductive pattern 18B is connected to each other, and two or more transparent electrodes such as a diamond-shaped indium tin oxide film may be used. The poles are connected in series in the first direction to form the first conductive pattern 18A, and two or more transparent electrodes such as diamonds including an ITO film are connected in series in the second direction to form the second conductive pattern 18B.

於該情況下，由包含ITO膜的透明電極鄰接配置而成的多個規則的透明電極的排列，及由形成於透明電極之間的第一輔助線36A與第二輔助線36B的偏移配置而成的與上述透明電極的排列不同的排列混在一起，由此成為多個空間頻率混在一起的形態，其結果，可抑制與液晶顯示裝置的像素排列的干涉，從而可有效地降低雲紋的產生。 In this case, the arrangement of a plurality of regular transparent electrodes arranged adjacent to each other by the transparent electrode including the ITO film, and the offset arrangement of the first auxiliary line 36A and the second auxiliary line 36B formed between the transparent electrodes The arrangement in which the arrangement of the transparent electrodes is different is mixed, whereby a plurality of spatial frequencies are mixed, and as a result, interference with the pixel arrangement of the liquid crystal display device can be suppressed, and moiré can be effectively reduced. produce.

又，亦可對導電片賦予抗反射層或硬塗(hard coat)層等功能層。 Further, a functional layer such as an antireflection layer or a hard coat layer may be applied to the conductive sheet.

以下，列舉本發明的實例對本發明進行更具體的說明。再者，以下實例中所示的材料、使用量、比例、處理內容、處理順序等可於不脫離本發明的主旨的範圍內適當地變更。因此，本發明的範圍不應根據以下所示的具體例而限定性地進行解釋。 Hereinafter, the present invention will be more specifically described by way of examples of the invention. In addition, the materials, the amount of use, the ratio, the processing content, the processing order, and the like, which are shown in the following examples, may be appropriately changed within the scope of the gist of the invention. Therefore, the scope of the present invention should not be construed as being limited by the specific examples shown below.

該些實例中，評價比較例1~比較例3、實例1~實例20所涉及的觸控面板的雲紋及可視性。後述的表3中表示比較例1~比較例3、實例1~實例20的詳細內容及評價結果。 In these examples, the moiré and visibility of the touch panel according to Comparative Example 1 to Comparative Example 3 and Examples 1 to 20 were evaluated. Table 3 below describes the details and evaluation results of Comparative Example 1 to Comparative Example 3 and Examples 1 to 20.

[實例1] [Example 1]

(鹵化銀感光材料) (silver halide photosensitive material)

製備含有球當量直徑平均0.1μm的碘溴氯化銀粒子(I=0.2莫耳百分比，Br=40莫耳百分比)的乳劑，前述 碘溴氯化銀粒子相對於水介質(aqueous medium)中150g的Ag而包含10.0g明膠。 An emulsion containing silver iodobromochloride particles having an average spherical diameter of 0.1 μm (I = 0.2 mol%, Br = 40 mol%) was prepared. The silver iodobromochloride particles contained 10.0 g of gelatin with respect to 150 g of Ag in an aqueous medium.

又，於該乳劑中以使濃度成為10^-7(莫耳/莫耳銀)的方式添加K₃Rh₂Br₉及K₂IrCl₆，於溴化銀粒子中摻雜有Rh離子與Ir離子。於該乳劑中添加Na₂PdCl₄，進而使用氯金酸(chlorauric acid)與硫代硫酸鈉進行金硫增感(gold-sulfur sensitization)之後，與明膠硬膜劑一起以銀的塗佈量成為10g/m²的方式塗佈於第一透明基體14A及第二透明基體14B(於此均為聚對苯二甲酸乙二酯(PET))上。此時，Ag/明膠體積比設為2/1。 Further, K ₃ Rh ₂ Br ₉ and K ₂ IrCl ₆ are added to the emulsion so that the concentration becomes 10 ^-7 (mole/mole silver), and the silver bromide particles are doped with Rh ions and Ir ions. . After adding Na ₂ PdCl ₄ to the emulsion and further performing gold-sulfur sensitization using chloroauric acid and sodium thiosulfate, the amount of silver coated with the gelatin hardener is The method of 10 g/m ² was applied to the first transparent substrate 14A and the second transparent substrate 14B (here, polyethylene terephthalate (PET)). At this time, the Ag/gelatin volume ratio was set to 2/1.

於寬度30cm的PET支撐體上以25cm的寬度進行20m/分鐘的塗佈，以使塗佈的中央部殘留有24cm的方式將兩端均切掉3cm而獲得輥(roll)狀的鹵化銀感光材料。 On a PET support having a width of 30 cm, a coating of 20 m/min was performed at a width of 25 cm so that both ends of the coated portion were cut by 24 cm so that both ends were cut by 3 cm to obtain a roll-like silver halide photosensitive film. material.

(曝光) (exposure)

就曝光圖案而言，於積層導電片10的第一導電片12A以圖1及圖3所示的圖案，而於第二導電片12B以圖1及圖4所示的圖案對A4尺寸(210mm×297mm)的第一透明基體14A及第二透明基體14B進行曝光。曝光是隔著上述圖案的光罩而使用以高壓水銀燈(lamp)為光源的平行光進行曝光。 In the case of the exposure pattern, the first conductive sheet 12A of the laminated conductive sheet 10 is in the pattern shown in FIGS. 1 and 3, and the second conductive sheet 12B is in the pattern shown in FIGS. 1 and 4 in the A4 size (210 mm). The first transparent substrate 14A and the second transparent substrate 14B of ×297 mm are exposed. The exposure is performed by using parallel light having a high-pressure mercury lamp as a light source through a photomask of the above pattern.

(顯影處理) (development processing)

．顯影液1L調配物 . Developer 1L formulation

．固定液1L調配物 . Fixative 1L formulation

對使用上述處理劑已完成曝光的敏化材料(sensitized material)，使用富士軟片公司製自動顯影機FG-710PTS，以處理條件：顯影35℃ 30秒、固定34℃ 23秒、水洗流水(5L/min(分鐘))20秒進行處理。 For the sensitized material which had been exposed using the above treatment agent, an automatic developing machine FG-710PTS manufactured by Fujifilm Co., Ltd. was used to treat the conditions: development at 35 ° C for 30 seconds, fixation at 34 ° C for 23 seconds, and washing of water (5 L / Min (minutes)) 20 seconds for processing.

(觸控面板) (touch panel)

於第二導電片12B上積層第一導電片12A而獲得積層導電片之後，將積層導電片貼附於液晶顯示裝置的顯示畫面而構成實例1所涉及的觸控面板。該實例1中，亦如後述的表3所示，導電部(第一導電圖案18A、第一輔助圖案20A、第二導電圖案18B、第二輔助圖案20B)的線寬為5μm，小格子26的一邊的長度為50μm，大格子(第 一大格子24A及第二大格子24B)的一邊的長度為3mm，向第三方向及第四方向的偏移量(以下，記作偏移量)為2.5μm。 After the first conductive sheet 12A is laminated on the second conductive sheet 12B to obtain a laminated conductive sheet, the laminated conductive sheet is attached to the display screen of the liquid crystal display device to constitute the touch panel according to Example 1. In the first example, as shown in Table 3 to be described later, the line width of the conductive portion (the first conductive pattern 18A, the first auxiliary pattern 20A, the second conductive pattern 18B, and the second auxiliary pattern 20B) is 5 μm, and the small lattice 26 The length of one side is 50μm, large lattice (the first The length of one side of the large grid 24A and the second large grid 24B) is 3 mm, and the amount of shift in the third direction and the fourth direction (hereinafter referred to as an offset amount) is 2.5 μm.

[實例2~4] [Example 2~4]

實例2、實例3及實例4所涉及的觸控面板除使偏移量分別為5μm、10μm、25μm以外，與上述實例1相同地進行製作。 The touch panels according to Example 2, Example 3, and Example 4 were produced in the same manner as in Example 1 except that the offset amounts were 5 μm, 10 μm, and 25 μm, respectively.

[實例5] [Example 5]

實例5所涉及的觸控面板除使導電部的線寬為7μm、小格子26的一邊的長度為250μm、大格子(第一大格子24A及第二大格子24B)的一邊的長度為5mm、偏移量為50μm以外，與上述實例1相同地進行製作。 In the touch panel according to Example 5, the line width of the conductive portion is 7 μm, the length of one side of the small lattice 26 is 250 μm, and the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is 5 mm. The production was carried out in the same manner as in the above Example 1 except that the offset amount was 50 μm.

[實例6] [Example 6]

實例6所涉及的觸控面板除使導電部的線寬為8μm、小格子26的一邊的長度為250μm、大格子(第一大格子24A及第二大格子24B)的一邊的長度為5mm以外，與上述實例1相同地進行製作。 In the touch panel according to Example 6, except that the line width of the conductive portion is 8 μm, the length of one side of the small lattice 26 is 250 μm, and the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is 5 mm. The production was carried out in the same manner as in the above Example 1.

[實例7~實例12] [Example 7 to Example 12]

實例7、實例8、實例9、實例10、實例11及實例12所涉及的觸控面板除使偏移量分別為4μm、10μm、30μm、50μm、100μm、125μm以外，與上述實例6相同地進行製作。 The touch panels according to Example 7, Example 8, Example 9, Example 10, Example 11, and Example 12 were carried out in the same manner as in Example 6 except that the offset amounts were 4 μm, 10 μm, 30 μm, 50 μm, 100 μm, and 125 μm, respectively. Production.

[實例13] [Example 13]

實例13所涉及的觸控面板除使導電部的線寬為9 μm、偏移量為50μm以外，與上述實例7相同地進行製作。 The touch panel of the example 13 has a line width of 9 for the conductive portion. The fabrication was carried out in the same manner as in Example 7 except that the amount of shift was 50 μm.

[實例14] [Example 14]

實例14所涉及的觸控面板除使導電部的線寬為10μm、小格子26的一邊的長度為300μm、大格子(第一大格子24A及第二大格子24B)的一邊的長度為6mm以外，與上述實例1相同地進行製作。 In the touch panel according to Example 14, except that the line width of the conductive portion is 10 μm, the length of one side of the small lattice 26 is 300 μm, and the length of one side of the large lattice (the first large lattice 24A and the second large lattice 24B) is 6 mm. The production was carried out in the same manner as in the above Example 1.

[實例15~實例20] [Example 15 to Example 20]

實例15、實例16、實例17、實例18、實例19及實例20所涉及的觸控面板除使偏移量分別為4μm、10μm、30μm、50μm、100μm、150μm以外，與上述實例14相同地進行製作。 The touch panels according to Example 15, Example 16, Example 17, Example 18, Example 19, and Example 20 were carried out in the same manner as in Example 14 except that the offset amounts were 4 μm, 10 μm, 30 μm, 50 μm, 100 μm, and 150 μm, respectively. Production.

[比較例1~比較例3] [Comparative Example 1 to Comparative Example 3]

比較例1所涉及的觸控面板除使偏移量為0μm以外，與上述實例1相同地進行製作。 The touch panel according to Comparative Example 1 was produced in the same manner as in the above Example 1 except that the offset amount was 0 μm.

比較例2所涉及的觸控面板除使偏移量為0μm以外，與上述實例6相同地進行製作。 The touch panel according to Comparative Example 2 was produced in the same manner as in Example 6 except that the offset amount was 0 μm.

比較例3所涉及的觸控面板除使偏移量為0μm以外，與上述實例14相同地進行製作。 The touch panel according to Comparative Example 3 was produced in the same manner as in Example 14 except that the offset amount was 0 μm.

〔評價〕 〔Evaluation〕

(雲紋的評價) (evaluation of moiré)

將觸控面板設置於轉盤，驅動液晶顯示裝置而使之顯示白色。於該狀態下，使轉盤於偏角(bias angle)-20°~+20°之間旋轉而進行雲紋的目視觀察、評價。 The touch panel is placed on the turntable to drive the liquid crystal display device to display white. In this state, the turntable was rotated between bias angles of -20° to +20° to visually observe and evaluate the moiré.

自液晶顯示裝置的顯示畫面起以觀察距離1.5m進行雲紋的評價，將雲紋不顯著化的情況設為○，以無問題的水準(level)觀察到極少量的雲紋的情況設為△，且將雲紋顯著化的情況設為×。 From the display screen of the liquid crystal display device, the moiré was evaluated at an observation distance of 1.5 m, the case where the moiré was not noticeable was set to ○, and a case where a very small amount of moiré was observed at a level of no problem was set. △, and the case where the moiré is remarkable is set to ×.

(可視性的評價) (evaluation of visibility)

當於上述的雲紋的評價之前將觸控面板設置於轉盤並驅動液晶顯示裝置而使之顯示白色時，以肉眼確認於觸控面板的表面是否無線變粗或黑斑點。 When the touch panel is placed on the turntable and the liquid crystal display device is driven to display white before the evaluation of the moiré described above, it is visually confirmed whether the surface of the touch panel is wirelessly thick or black spots.

(評價結果) (Evaluation results)

實例12及實例20中，僅確認出少量的線變粗或黑斑點，整體上可視性良好。 In Example 12 and Example 20, only a small amount of lines were thickened or black spots, and the overall visibility was good.

就雲紋而言，於比較例1~比較例3中雲紋均顯著化。另一方面，實例1~實例20整體上評價良好，實例3~實例5、實例8~實例11、實例13、實例16~實例19中雲紋不顯著化。實例1、實例6、實例14中雲紋為以無問題的水準被觀察到有極少量的程度。實例2、實例7、實例12、實例15、實例20中雲紋為「△」與「○」之間的中間水準。 In terms of moiré, the moiré was remarkable in Comparative Example 1 to Comparative Example 3. On the other hand, Examples 1 to 20 were evaluated as a whole, and the moiré in Examples 3 to 5, Examples 8 to 11, 13, and 16 to 19 were not significant. The moiré in Example 1, Example 6, and Example 14 was observed to a very small extent at a level of no problem. In the example 2, the example 7, the example 12, the example 15, and the example 20, the moiré is an intermediate level between "△" and "○".

再者，即便如圖2B所示於第一透明基體14A的一主面形成第一導電部16A，且於第一透明基體14A的另一主 面形成第二導電部16B而與比較例1~比較例3及實例1~實例20相同地製作觸控面板的情況下，亦可成為與上述相同的評價結果。 Furthermore, even if the first conductive portion 16A is formed on one main surface of the first transparent substrate 14A as shown in FIG. 2B, and the other main body of the first transparent substrate 14A When the second conductive portion 16B is formed on the surface and the touch panel is produced in the same manner as in Comparative Example 1 to Comparative Example 3 and Examples 1 to 20, the same evaluation results as described above can be obtained.

本發明所涉及的觸控面板及導電片並不限定於上述實施形態，當然可在不脫離本發明的主旨的範圍內採用各種構成。 The touch panel and the conductive sheet according to the present invention are not limited to the above-described embodiments, and various configurations can be employed without departing from the scope of the invention.

10‧‧‧積層導電片 10‧‧‧Laminated conductive sheets

12A‧‧‧第一導電片 12A‧‧‧First conductive sheet

12B‧‧‧第二導電片 12B‧‧‧Second conductive sheet

14A‧‧‧第一透明基體 14A‧‧‧First transparent substrate

14B‧‧‧第二透明基體 14B‧‧‧Second transparent substrate

16A‧‧‧第一導電部 16A‧‧‧First Conductive Department

16B‧‧‧第二導電部 16B‧‧‧Second Conductive Department

18A‧‧‧第一導電圖案 18A‧‧‧First conductive pattern

18B‧‧‧第二導電圖案 18B‧‧‧Second conductive pattern

20A‧‧‧第一輔助圖案 20A‧‧‧First auxiliary pattern

20B‧‧‧第二輔助圖案 20B‧‧‧Second auxiliary pattern

24A‧‧‧第一大格子 24A‧‧‧The first large lattice

24B‧‧‧第二大格子 24B‧‧‧The second largest grid

26‧‧‧小格子 26‧‧‧Small lattice

28A‧‧‧第一連接部 28A‧‧‧First Connection

28B‧‧‧第二連接部 28B‧‧‧Second connection

30‧‧‧中格子 30‧‧‧ Medium lattice

32A‧‧‧第一缺欠部 32A‧‧‧First Deficit Department

32B‧‧‧第二缺欠部 32B‧‧‧The Second Deficit Department

34A‧‧‧第一絕緣部 34A‧‧‧First Insulation

34B‧‧‧第二絕緣部 34B‧‧‧Second insulation

36A‧‧‧第一輔助線 36A‧‧‧First Auxiliary Line

36B‧‧‧第二輔助線 36B‧‧‧second auxiliary line

38A‧‧‧第一L字狀圖案 38A‧‧‧First L-shaped pattern

38B‧‧‧第二L字狀圖案 38B‧‧‧Second L-shaped pattern

40A‧‧‧第一端子 40A‧‧‧First terminal

40B‧‧‧第二端子 40B‧‧‧second terminal

42A‧‧‧第一外部配線 42A‧‧‧First external wiring

42B‧‧‧第二外部配線 42B‧‧‧Second external wiring

44‧‧‧組合圖案 44‧‧‧Combination pattern

46A‧‧‧第一軸線 46A‧‧‧first axis

46B‧‧‧第二軸線 46B‧‧‧second axis

Wa、Wb‧‧‧線寬 Wa, Wb‧‧‧ line width

ha‧‧‧距離 Ha‧‧‧distance

圖1是表示省略積層導電片的一部分的分解立體圖。 Fig. 1 is an exploded perspective view showing a part of a laminated electrically conductive sheet.

圖2A是表示省略積層導電片的一例的一部分的剖面圖。 2A is a cross-sectional view showing a part of an example in which a laminated conductive sheet is omitted.

圖2B是表示省略積層導電片的另一例的一部分的剖面圖。 Fig. 2B is a cross-sectional view showing a part of another example in which the laminated conductive sheet is omitted.

圖3是表示積層導電片中形成於第一導電片上的第一導電部的圖案例的平面圖。 3 is a plan view showing an example of a pattern of a first conductive portion formed on a first conductive sheet in a laminated conductive sheet.

圖4是表示積層導電片中形成於第二導電片上的第二導電部的圖案例的平面圖。 4 is a plan view showing an example of a pattern of a second conductive portion formed on a second conductive sheet in a laminated conductive sheet.

圖5是表示將第一導電片與第二導電片加以組合而形成的積層導電片的例子的一部分省略的平面圖。 Fig. 5 is a partially omitted plan view showing an example of a laminated electrically conductive sheet formed by combining a first conductive sheet and a second conductive sheet.

圖6A~圖6C是表示組合圖案中，沿第一大格子的邊排列的第一輔助線與沿第二大格子的邊排列的第二輔助線的組合圖案的例子的說明圖。 6A to 6C are explanatory views showing an example of a combined pattern of a first auxiliary line arranged along the side of the first large lattice and a second auxiliary line arranged along the side of the second large lattice in the combined pattern.

圖7是表示組合圖案中，第一絕緣部的2個第一L字狀圖案中的各第一輔助線與第二絕緣部的2個第二L字狀圖案中的各第二輔助線的組合圖案的例子的說明圖。 7 is a view showing a second auxiliary line among two second L-shaped patterns of each of the first auxiliary line and the second insulating portion of the two first L-shaped patterns of the first insulating portion in the combined pattern; An explanatory diagram of an example of a combination pattern.

圖8是表示基準位置的例子的說明圖。 8 is an explanatory diagram showing an example of a reference position.

10‧‧‧積層導電片 10‧‧‧Laminated conductive sheets

24A‧‧‧第一大格子 24A‧‧‧The first large lattice

24B‧‧‧第二大格子 24B‧‧‧The second largest grid

44‧‧‧組合圖案 44‧‧‧Combination pattern

Claims (15)

一種觸控面板，具有積層導電片(10)，其特徵在於，上述積層導電片(10)包括：基體(14A)；第一導電部(16A)，形成於上述基體(14A)的一主面；以及第二導電部(16B)，形成於上述基體(14A)的另一主面，且上述第一導電部(16A)包括：2個或2個以上第一導電圖案(18A)，分別沿第一方向延伸，且沿與上述第一方向正交的第二方向排列，包含多個格子；以及第一輔助圖案(20A)，包含沿各第一導電圖案(18A)的周邊排列的多個第一輔助線(36A)，上述第二導電部(16B)包括：2個或2個以上第二導電圖案(18B)，分別沿第二方向延伸，且沿上述第一方向排列，包含多個格子；以及第二輔助圖案(20B)，包含沿各第二導電圖案(18B)的周邊排列的多個第二輔助線(36B)，俯視時，上述第一導電部(16A)與上述第二導電部(16B)形成為上述第一導電圖案(18A)與上述第二導電圖案(18B)交叉配置的形態，且於將二等分上述第一方向與上述第二方向的方向設為第三方向，將與該第三方向正交的方向設為第四方向時，自基準位置至少向上述第三 方向偏移上述第一輔助線(36A)的線寬(Wa)及上述第二輔助線(36B)的線寬(Wb)中任一較短的線寬的1/2或1/2以上且100μm或100μm以下而配置，上述基準位置表示上述第一輔助線(36A)的第一軸線(46A)與上述第二輔助線(36B)的第二軸線(46B)一致，且上述第一輔助線(36A)與上述第二輔助線(36B)不重疊，且上述第一輔助線(36A)的一端與上述第二輔助線(36B)的一端一致的位置。 A touch panel having a laminated conductive sheet (10), wherein the laminated conductive sheet (10) comprises: a base body (14A); and a first conductive portion (16A) formed on a main surface of the base body (14A) And a second conductive portion (16B) formed on the other main surface of the base body (14A), and the first conductive portion (16A) includes: two or more first conductive patterns (18A), respectively a first direction extending and arranged in a second direction orthogonal to the first direction, comprising a plurality of lattices; and a first auxiliary pattern (20A) comprising a plurality of arranged along a periphery of each of the first conductive patterns (18A) a first auxiliary line (36A), wherein the second conductive portion (16B) comprises: two or more second conductive patterns (18B) extending in the second direction and arranged along the first direction, comprising a plurality of a grid; and a second auxiliary pattern (20B) including a plurality of second auxiliary lines (36B) arranged along a periphery of each of the second conductive patterns (18B), the first conductive portion (16A) and the second portion being viewed from above The conductive portion (16B) is formed in a form in which the first conductive pattern (18A) and the second conductive pattern (18B) are arranged to intersect each other, and When a direction bisecting the first direction and the direction of the second direction is a third direction, orthogonal to the third direction is a fourth direction, at least from the reference position to the third The direction is shifted by 1/2 or more of the line width (Wa) of the first auxiliary line (36A) and the line width (Wb) of the second auxiliary line (36B) 100 μm or less, the reference position indicating that the first axis (46A) of the first auxiliary line (36A) coincides with the second axis (46B) of the second auxiliary line (36B), and the first auxiliary line (36A) does not overlap with the second auxiliary line (36B), and one end of the first auxiliary line (36A) coincides with one end of the second auxiliary line (36B). 如申請專利範圍第1項所述之觸控面板，其中上述第一導電部(16A)與上述第二導電部(16B)偏移50μm或50μm以下而配置。 The touch panel according to claim 1, wherein the first conductive portion (16A) and the second conductive portion (16B) are disposed offset by 50 μm or less. 如申請專利範圍第1項所述之觸控面板，其中上述第一導電部(16A)與上述第二導電部(16B)偏移30μm或30μm以下而配置。 The touch panel according to claim 1, wherein the first conductive portion (16A) and the second conductive portion (16B) are disposed offset by 30 μm or less. 如申請專利範圍第1項所述之觸控面板，其中於上述第一導電圖案(18A)與上述第二導電圖案(18B)之間，形成有上述第一輔助圖案(20A)與上述第二輔助圖案(20B)對向而成的組合圖案(44)，且上述組合圖案(44)具有上述第一輔助線(36A)與上述第二輔助線(36B)正交而不重疊的形態。 The touch panel of claim 1, wherein the first auxiliary pattern (20A) and the second layer are formed between the first conductive pattern (18A) and the second conductive pattern (18B) The auxiliary pattern (20B) is a combined pattern (44) that is opposed to each other, and the combination pattern (44) has a form in which the first auxiliary line (36A) and the second auxiliary line (36B) are orthogonal to each other without overlapping. 如申請專利範圍第4項所述之觸控面板，其中上述組合圖案(44)中，上述第一輔助線(36A)的第一軸線(46A)與上述第二輔助線(36B)的第二軸線(46B)設為大致平行，上述第一軸線(46A)與上述第二軸線(46B) 之間的距離(ha)為上述第一輔助線(36A)的線寬(Wa)及上述第二輔助線(36B)的線寬(Wb)中任一較短的線寬的1/2或1/2以上。 The touch panel of claim 4, wherein in the combination pattern (44), the first axis (46A) of the first auxiliary line (36A) and the second line of the second auxiliary line (36B) The axis (46B) is set to be substantially parallel, the first axis (46A) and the second axis (46B) The distance (ha) is 1/2 of the line width (Wa) of the first auxiliary line (36A) and the line width (Wb) of the second auxiliary line (36B) 1/2 or more. 如申請專利範圍第5項所述之觸控面板，其中上述第一軸線(46A)與上述第二軸線(46B)之間的距離(ha)為上述第一輔助線(36A)的線寬(Wa)的1/2與上述第二輔助線(36B)的線寬(Wb)的1/2的合計。 The touch panel of claim 5, wherein a distance (ha) between the first axis (46A) and the second axis (46B) is a line width of the first auxiliary line (36A) ( The sum of 1/2 of Wa) and 1/2 of the line width (Wb) of the second auxiliary line (36B). 如申請專利範圍第5項所述之觸控面板，其中上述第一軸線(46A)與上述第二軸線(46B)之間的距離(ha)未達上述第一輔助線(36A)的線寬(Wa)的1/2與上述第二輔助線(36B)的線寬(Wb)的1/2的合計。 The touch panel of claim 5, wherein a distance (ha) between the first axis (46A) and the second axis (46B) does not reach a line width of the first auxiliary line (36A) The sum of 1/2 of (Wa) and 1/2 of the line width (Wb) of the second auxiliary line (36B). 如申請專利範圍第5項所述之觸控面板，其中上述組合圖案(44)具有上述第一輔助線(36A)與上述第二輔助線(36B)局部重疊的形態。 The touch panel of claim 5, wherein the combination pattern (44) has a form in which the first auxiliary line (36A) and the second auxiliary line (36B) partially overlap. 如申請專利範圍第5項所述之觸控面板，其中上述第一軸線(46A)與上述第二軸線(46B)之間的距離(ha)長於上述第一輔助線(36A)的線寬(Wa)的1/2與上述第二輔助線(36B)的線寬(Wb)的1/2的合計。 The touch panel of claim 5, wherein a distance (ha) between the first axis (46A) and the second axis (46B) is longer than a line width of the first auxiliary line (36A) ( The sum of 1/2 of Wa) and 1/2 of the line width (Wb) of the second auxiliary line (36B). 如申請專利範圍第1項所述之觸控面板，其中上述第一導電圖案(18A)由2個或2個以上第一大格子(24A)沿上述第一方向串聯連接而構成，上述第二導電圖案(18B)由2個或2個以上第二大格子(24B)沿上述第二方向串聯連接而構成，各上述第一大格子(24A)及各上述第二大格子(24B) 分別由2個或2個以上小格子(26)組合而構成，於上述第一大格子(24A)的邊的周圍，形成有與上述第一大格子(24A)呈非連接的上述第一輔助圖案(20A)，於上述第二大格子(24B)的邊的周圍，形成有與上述第二大格子(24B)呈非連接的上述第二輔助圖案(20B)。 The touch panel of claim 1, wherein the first conductive pattern (18A) is formed by connecting two or more first large lattices (24A) in series in the first direction, and the second The conductive pattern (18B) is formed by connecting two or more second large lattices (24B) in series in the second direction, and each of the first large lattices (24A) and each of the second large lattices (24B) Each of the two or more small grids (26) is combined, and the first auxiliary portion that is disconnected from the first large lattice (24A) is formed around the side of the first large lattice (24A). In the pattern (20A), the second auxiliary pattern (20B) that is not connected to the second large lattice (24B) is formed around the side of the second large lattice (24B). 如申請專利範圍第10項所述之觸控面板，其中上述第一導電部(16A)與上述第二導電部(16B)偏移小格子(26)的排列間距的1/2或1/2以下而配置。 The touch panel of claim 10, wherein the first conductive portion (16A) and the second conductive portion (16B) are offset by 1/2 or 1/2 of the arrangement pitch of the small lattices (26). Configured below. 如申請專利範圍第10項所述之觸控面板，其中上述小格子(26)的一邊的長度為50μm~500μm。 The touch panel of claim 10, wherein one side of the small lattice (26) has a length of 50 μm to 500 μm. 如申請專利範圍第10項所述之觸控面板，其中上述第一大格子(24A)及上述第二大格子(24B)的一邊的長度為3mm~10mm。 The touch panel according to claim 10, wherein a length of one side of the first large lattice (24A) and the second large lattice (24B) is 3 mm to 10 mm. 如申請專利範圍第1項所述之觸控面板，其中上述第一導電部(16A)及上述第二導電部(16B)的線寬為1μm~30μm。 The touch panel of claim 1, wherein the first conductive portion (16A) and the second conductive portion (16B) have a line width of 1 μm to 30 μm. 一種導電片，其特徵在於包括：基體(14A)；第一導電部(16A)，形成於上述基體(14A)的一主面；以及第二導電部(16B)，形成於上述基體(14A)的另一主面，且 上述第一導電部(16A)包括：2個或2個以上第一導電圖案(18A)，分別沿第一方向延伸，且沿與上述第一方向正交的第二方向排列，包含多個格子；以及第一輔助圖案(20A)，包含沿各第一導電圖案(18A)的周邊排列的多個第一輔助線(36A)，上述第二導電部(16B)包括：2個或2個以上第二導電圖案(18B)，分別沿第二方向延伸，且沿上述第一方向排列，包含多個格子；以及第二輔助圖案(20B)，包含沿各第二導電圖案(18B)的周邊排列的多個第二輔助線(36B)，俯視時，上述第一導電部(16A)與上述第二導電部(16B)形成為上述第一導電圖案(18A)與上述第二導電圖案(18B)交叉配置的形態，且於將二等分上述第一方向與上述第二方向的方向設為第三方向，將與該第三方向正交的方向設為第四方向時，自基準位置至少向上述第三方向偏移上述第一輔助線(36A)的線寬(Wa)及上述第二輔助線(36B)的線寬(Wb)中任一較短的線寬的1/2或1/2以上且100μm或100μm以下而配置，上述基準位置表示上述第一輔助線(36A)的第一軸線(46A)與上述第二輔助線(36B)的第二軸線(46B)一致，且上述第一輔助線(36A)與上述第二輔助線(36B)不重疊，且上述第一輔助線(36A)的一端與上述第二輔助線(36B)的一端一致的位置。 A conductive sheet, comprising: a base body (14A); a first conductive portion (16A) formed on a main surface of the base body (14A); and a second conductive portion (16B) formed on the base body (14A) Another main face, and The first conductive portion (16A) includes: two or more first conductive patterns (18A) extending in the first direction and arranged in a second direction orthogonal to the first direction, comprising a plurality of lattices And a first auxiliary pattern (20A) including a plurality of first auxiliary lines (36A) arranged along a periphery of each of the first conductive patterns (18A), the second conductive portion (16B) comprising: two or more The second conductive patterns (18B) respectively extend in the second direction and are arranged along the first direction, and include a plurality of lattices; and the second auxiliary patterns (20B) are arranged along the periphery of each of the second conductive patterns (18B) a plurality of second auxiliary lines (36B), wherein the first conductive portion (16A) and the second conductive portion (16B) are formed as the first conductive pattern (18A) and the second conductive pattern (18B) in plan view In the form of the cross arrangement, when the direction in which the first direction and the second direction are halved is the third direction, and the direction orthogonal to the third direction is the fourth direction, at least from the reference position The third direction is offset from the line width (Wa) of the first auxiliary line (36A) and the second auxiliary line (36B) The line width (Wb) is 1/2 or more of 1/2 or more and 100 μm or less, and the reference position indicates the first axis (46A) of the first auxiliary line (36A). And the second auxiliary line (36B) does not overlap with the second auxiliary line (36B), and one end of the first auxiliary line (36A) A position that coincides with one end of the second auxiliary line (36B).