TWI496909B - Articles coated with anti-fingerprint coating and mathod for making the articles - Google Patents

Articles coated with anti-fingerprint coating and mathod for making the articles Download PDF

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TWI496909B
TWI496909B TW099142479A TW99142479A TWI496909B TW I496909 B TWI496909 B TW I496909B TW 099142479 A TW099142479 A TW 099142479A TW 99142479 A TW99142479 A TW 99142479A TW I496909 B TWI496909 B TW I496909B
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fingerprint coating
substrate
aluminum
layer
ion
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TW099142479A
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TW201224178A (en
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Hsin Pei Chang
wen rong Chen
Huan Wu Chiang
Cheng Shi Chen
Juan Zhang
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Hon Hai Prec Ind Co Ltd
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具有抗指紋塗層的被覆件及其製造方法 Covering member with anti-fingerprint coating and manufacturing method thereof

本發明涉及一種具有抗指紋塗層的被覆件及其製造方法。 The present invention relates to a coated member having an anti-fingerprint coating and a method of manufacturing the same.

隨著3C電子產品的使用越來越頻繁，消費者對產品的外觀亦有了越來越高的要求。除了要求其色彩美觀、手感舒適，還要求其表面具有較好的耐磨性、抗刮傷性、以及抗指紋性。 With the increasing use of 3C electronic products, consumers are increasingly demanding the appearance of their products. In addition to requiring a beautiful color and a comfortable hand, it is also required to have a good abrasion resistance, scratch resistance, and anti-fingerprint property.

為了提高金屬表面的抗指紋性，美國專利US006736908公開了一種抗指紋化的金屬表面處理液。該表面處理液含有特殊有機樹脂，可溶性釩化物，以及可溶性金屬化合物，其含有Zn、Ti、Mo、W、Mn及Ce中至少一種金屬元素，經此處理液處理的金屬表面具有良好的抗指紋性。然，所述特殊的有機樹脂成分結構複雜，難以製造，且易對環境造成污染。因此，開發一種能實現抗指紋效果且易於製造、無環境污染的抗指紋塗層實為必要。 In order to improve the anti-fingerprint property of metal surfaces, U.S. Patent No. 006,736,908 discloses an anti-fingerprinted metal surface treatment liquid. The surface treatment liquid contains a special organic resin, a soluble vanadium compound, and a soluble metal compound containing at least one metal element of Zn, Ti, Mo, W, Mn and Ce, and the metal surface treated by the treatment liquid has good anti-fingerprint Sex. However, the special organic resin component has a complicated structure, is difficult to manufacture, and is easily polluted to the environment. Therefore, it is necessary to develop an anti-fingerprint coating that can achieve anti-fingerprint effect and is easy to manufacture and free from environmental pollution.

有鑒於此，有必要提供一種環保的、易於製造的具有抗指紋塗層的被覆件。 In view of this, it is necessary to provide an environmentally friendly, easy-to-manufacture coated article having an anti-fingerprint coating.

另外，還有必要提供一種上述被覆件的製造方法。 In addition, it is also necessary to provide a method of manufacturing the above-described covering member.

一種具有抗指紋塗層的被覆件，包括基體及形成於該基體上的抗 指紋塗層，該抗指紋塗層包括依次形成於基體上的三氧化二鋁層及氮氧化鋁層，所述氮氧化鋁層中還含有氟離子、硼離子和氮離子中的一種或幾種，所述氟離子、硼離子及氮離子中的一種或幾種離子藉由離子注入的方式注入到氮氧化鋁層中形成。 A coated member having an anti-fingerprint coating, comprising a substrate and an anti-reflection formed on the substrate a fingerprint coating comprising an aluminum oxide layer and an aluminum oxynitride layer sequentially formed on the substrate, the aluminum oxynitride layer further comprising one or more of a fluoride ion, a boron ion and a nitrogen ion One or more of the fluoride ion, the boron ion, and the nitrogen ion are implanted into the aluminum oxynitride layer by ion implantation.

一種具有抗指紋塗層的被覆件的製造方法，包括以下步驟：提供一基體；採用一真空鍍膜機，於基體上形成抗指紋塗層，形成該抗指紋塗層包括如下步驟：以氧氣為反應氣體，以鋁靶為靶材，於所述基體上磁控濺射形成三氧化二鋁層；以氧氣及氮氣為反應氣體，以鋁靶為靶材，於所述三氧化二鋁層上磁控濺射形成氮氧化鋁層；採用四氟化碳、乙硼烷及氮氣中的一種或幾種為氣源，藉由離子注入技術於所述氮氧化鋁層表面注入氟離子、硼離子及氮離子中的一種或幾種。 A method for manufacturing a coated member having an anti-fingerprint coating comprises the steps of: providing a substrate; forming a anti-fingerprint coating on the substrate by using a vacuum coating machine, and forming the anti-fingerprint coating comprises the following steps: reacting with oxygen a gas, with an aluminum target as a target, magnetron sputtering on the substrate to form an aluminum oxide layer; oxygen and nitrogen as reaction gases, an aluminum target as a target, and magnetic on the aluminum oxide layer Controlling sputtering to form an aluminum oxynitride layer; using one or more of carbon tetrafluoride, diborane and nitrogen as a gas source, injecting fluoride ions and boron ions into the surface of the aluminum oxynitride layer by ion implantation technique One or more of nitrogen ions.

所述三氧化二鋁層及氮氧化鋁層的形成，在一定程度上降低了所述被覆件的表面能。更重要的，於所述氮氧化鋁層表面注入氟離子、硼離子及氮離子中的一種或幾種，可提高所述氮氧化鋁層的表面熵值，即增加所述氮氧化鋁層表面原子的混亂程度，如此可降低所述氮氧化鋁層的表面能，從而使被覆件具有良好的抗指紋效果。所述被覆件的製造方法不需要使用特殊的有機樹脂，亦不需經酸或鹼處理，對環境及人體健康無害；且該方法簡單易行。 The formation of the aluminum oxide layer and the aluminum oxynitride layer reduces the surface energy of the coated member to some extent. More importantly, injecting one or more of fluorine ions, boron ions and nitrogen ions on the surface of the aluminum oxynitride layer can increase the surface entropy of the aluminum oxynitride layer, that is, increase the surface of the aluminum oxynitride layer. The degree of disorder of the atom can reduce the surface energy of the aluminum oxynitride layer, so that the coated member has a good anti-fingerprint effect. The method for manufacturing the coated member does not need to use a special organic resin, and does not need to be treated by acid or alkali, and is harmless to the environment and human health; and the method is simple and easy.

10‧‧‧基體 10‧‧‧ base

20‧‧‧顏色層 20‧‧‧ color layer

30‧‧‧抗指紋塗層 30‧‧‧Anti-fingerprint coating

31‧‧‧三氧化二鋁層 31‧‧‧Aluminum oxide layer

33‧‧‧氮氧化鋁層 33‧‧‧aluminum oxide layer

100‧‧‧被覆件 100‧‧‧Cladding

圖1為本發明較佳實施例的被覆件的剖視圖。 BRIEF DESCRIPTION OF THE DRAWINGS Figure 1 is a cross-sectional view of a coated member in accordance with a preferred embodiment of the present invention.

為了使本發明的目的、技術方案及優點更加清楚明白，以下結合附圖與實施例對本發明進行進一步詳細說明。 The present invention will be further described in detail below with reference to the accompanying drawings and embodiments.

請參閱圖1，本發明一較佳實施例的具有抗指紋塗層的被覆件100包括基體10及形成於該基體10上的透明的抗指紋塗層30。 Referring to FIG. 1, a coated article 100 having an anti-fingerprint coating according to a preferred embodiment of the present invention includes a substrate 10 and a transparent anti-fingerprint coating 30 formed on the substrate 10.

所述基體10可由金屬材料或非金屬材料製成。該金屬材料可包括不銹鋼、鋁、鋁合金、銅、銅合金、鎂合金等。該非金屬材料可包括塑膠、陶瓷、玻璃、聚合物等。該被覆件100可為3C電子產品的殼體、傢俱、廚房用具或其他裝潢件。 The base 10 may be made of a metallic material or a non-metallic material. The metal material may include stainless steel, aluminum, aluminum alloy, copper, copper alloy, magnesium alloy, or the like. The non-metallic material may include plastic, ceramic, glass, polymer, and the like. The cover 100 can be a housing, furniture, kitchen appliance or other decorative piece of a 3C electronic product.

所述抗指紋塗層30包括依次形成於該基體10上的三氧化二鋁(Al2O3)層31及氮氧化鋁層(AlON)33。所述Al2O3層31、AlON層33可分別藉由磁控濺射鍍膜法形成。該Al2O3層31的厚度為200~300nm，AlON層33的厚度為200~300nm。 The anti-fingerprint coating layer 30 includes an aluminum oxide (Al 2 O 3 ) layer 31 and an aluminum oxynitride layer (AlON) 33 which are sequentially formed on the substrate 10. The Al 2 O 3 layer 31 and the AlON layer 33 can be formed by magnetron sputtering coating, respectively. The Al 2 O 3 layer 31 has a thickness of 200 to 300 nm, and the AlON layer 33 has a thickness of 200 to 300 nm.

所述AlON層33中還含有氟離子、硼離子及氮離子中的一種或幾種。上述離子可藉由離子注入的方式注入到AlON層33中形成。 The AlON layer 33 further contains one or more of fluorine ions, boron ions, and nitrogen ions. The above ions can be formed by being implanted into the AlON layer 33 by ion implantation.

相較於塗覆抗指紋塗料或溶液的方式，所述的抗指紋塗層30以磁控濺射及離子注入的方式形成，環保且易於製造。 The anti-fingerprint coating 30 is formed by magnetron sputtering and ion implantation in a manner similar to the manner in which an anti-fingerprint coating or solution is applied, which is environmentally friendly and easy to manufacture.

可以理解的，在沉積該抗指紋塗層30之前還可於基體10上鍍覆一顏色層20，以增強該被覆件100的美觀性。所述抗指紋塗層30形成於該顏色層20上。 It can be understood that a color layer 20 can be plated on the substrate 10 before depositing the anti-fingerprint coating 30 to enhance the aesthetics of the covering member 100. The anti-fingerprint coating 30 is formed on the color layer 20.

本發明一較佳實施例的製造所述被覆件100的方法主要包括如下 步驟：提供一基體10，將基體10放入盛裝有乙醇或丙酮溶液的超聲波清洗器中進行震動清洗，以除去基體10表面的雜質和油污等。清洗完畢後烘乾備用。 The method for manufacturing the covering member 100 according to a preferred embodiment of the present invention mainly includes the following Step: A substrate 10 is provided, and the substrate 10 is placed in an ultrasonic cleaner containing an ethanol or acetone solution for vibration cleaning to remove impurities, oil, and the like on the surface of the substrate 10. After cleaning, dry and set aside.

對經上述處理後的基體10的表面進行電漿清洗，進一步去除基體10表面的油污，以改善基體10表面與後續塗層的結合力。該電漿清洗的具體操作及工藝參數為：採用一真空鍍膜機(圖未示)，將基體10放入該鍍膜機的鍍膜室內，於基體10上施加-500~-800V的偏壓，對該鍍膜室進行抽真空處理至真空度為8.0×10-3Pa，以500~800sccm的流量向鍍膜室通入純度為99.999%的氬氣，對基體10表面進行電漿清洗，清洗時間為5~10min。 The surface of the substrate 10 subjected to the above treatment is subjected to plasma cleaning to further remove the oil stain on the surface of the substrate 10 to improve the bonding force between the surface of the substrate 10 and the subsequent coating. The specific operation and process parameters of the plasma cleaning are: using a vacuum coating machine (not shown), the substrate 10 is placed in the coating chamber of the coating machine, and a bias voltage of -500 to -800 V is applied to the substrate 10, The coating chamber is evacuated to a vacuum of 8.0×10 −3 Pa, and a argon gas having a purity of 99.999% is introduced into the coating chamber at a flow rate of 500 to 800 sccm, and the surface of the substrate 10 is plasma-cleaned for 5 times. ~10min.

所述真空鍍膜機除可用以進行電漿清洗外，還可用以多弧電漿鍍膜、磁控濺射鍍膜以及離子注入等表面處理。 In addition to being used for plasma cleaning, the vacuum coating machine can also be used for surface treatment such as multi-arc plasma coating, magnetron sputtering coating, and ion implantation.

採用磁控濺射的方式在鋁或鋁合金基體10表面依次形成Al2O3層31及AlON層33，其具體操作方法及工藝參數為：在所述電漿清洗完成後，調節氬氣(工作氣體)流量至100~300sccm，並向鍍膜室內通入流量為100~300sccm的反應氣體氧氣，加熱所述鍍膜室至50~180℃(即濺射溫度為50~180℃)；開啟已置於所述真空鍍膜機中的鋁靶的電源，並設定其功率為2~5kw，於基體10上施加-70~-180V的偏壓，沉積Al2O3層31。沉積該Al2O3層31的時間為20~60min。 The Al 2 O 3 layer 31 and the AlON layer 33 are sequentially formed on the surface of the aluminum or aluminum alloy substrate 10 by magnetron sputtering. The specific operation method and process parameters are: after the plasma cleaning is completed, the argon gas is adjusted ( Working gas) flow rate to 100~300sccm, and a reaction gas oxygen with a flow rate of 100~300sccm is introduced into the coating chamber, and the coating chamber is heated to 50-180 ° C (ie, the sputtering temperature is 50-180 ° C); The power source of the aluminum target in the vacuum coater is set to have a power of 2 to 5 kw, and a bias of -70 to -180 V is applied to the substrate 10 to deposit an Al 2 O 3 layer 31. The time for depositing the Al 2 O 3 layer 31 is 20 to 60 min.

保持所述氬氣的流量、濺射溫度、鋁靶的電源功率及施加於基體10上的偏壓不變，並向鍍膜室內通入流量為50~150sccm的反應氣 體氧氣，於Al2O3層31上沉積AlON層33。沉積該AlON層33的時間為20~60min。 Maintaining the flow rate of the argon gas, the sputtering temperature, the power of the aluminum target, and the bias voltage applied to the substrate 10, and introducing a reaction gas oxygen having a flow rate of 50 to 150 sccm into the coating chamber, in the Al 2 O 3 An AlON layer 33 is deposited on layer 31. The time for depositing the AlON layer 33 is 20 to 60 minutes.

完成所述AlON層33的沉積後，於該AlON層33表面注入離子，該離子選自氟離子、硼離子及氮離子中的一種或幾種。 After the deposition of the AlON layer 33 is completed, ions are implanted into the surface of the AlON layer 33, and the ions are selected from one or more of fluorine ions, boron ions, and nitrogen ions.

所述的離子注入過程為：開啟所述鍍膜機的離子源，所述離子源將含有所需注入離子的氣體進行電離，並經高壓電場加速成具有幾萬甚至幾百萬電子伏特能量的離子束，射入所述AlON層33的表面，與所述AlON層33表層中及其表面的原子或分子發生一系列的物理、化學反應，最終停留在所述AlON層33表層及表面。 The ion implantation process is: opening an ion source of the coating machine, the ion source ionizing a gas containing the desired implanted ions, and accelerating to an ion having an energy of tens of thousands or even millions of electron volts by a high voltage electric field The beam is incident on the surface of the AlON layer 33, and undergoes a series of physical and chemical reactions with atoms or molecules in the surface layer of the AlON layer 33 and the surface thereof, and finally stays on the surface layer and surface of the AlON layer 33.

本實施例中注入所述氟離子的參數為：鍍膜室的本底真空度為1×10-4Pa，氣源為純度為99.99%的四氟化碳氣體(CF44)，離子源電壓為30~100kV，工作氣壓為0.1~0.5Pa，離子束流強度為1~5mA，控制氟離子注入劑量在1×1016ions/cm2(離子數/平方釐米)到1×1018ions/cm2之間。 The parameters for injecting the fluoride ion in this embodiment are: the background vacuum degree of the coating chamber is 1×10 -4 Pa, and the gas source is a carbon tetrafluoride gas (CF 4 4) having a purity of 99.99%, and the ion source voltage. It is 30~100kV, the working pressure is 0.1~0.5Pa, the ion beam intensity is 1~5mA, and the fluoride ion implantation dose is controlled at 1×10 16 ions/cm 2 (ion number/cm 2 ) to 1×10 18 ions/ Between cm 2 .

注入所述硼離子的參數為：鍍膜室的本底真空度為1×10-4Pa，氣源為純度為99.99%的乙硼烷(B2H6)，離子源電壓為30~100kV，工作氣壓為0.1~0.5Pa，離子束流強度為1~5mA，控制硼離子的劑量在1×1016ions/cm2到1×1018ions/cm2之間。 The parameters for injecting the boron ions are: the background vacuum of the coating chamber is 1×10 -4 Pa, the gas source is diborane (B 2 H 6 ) with a purity of 99.99%, and the ion source voltage is 30-100 kV. The working gas pressure is 0.1 to 0.5 Pa, the ion beam current intensity is 1 to 5 mA, and the dose for controlling the boron ions is between 1 × 10 16 ions/cm 2 and 1 × 10 18 ions/cm 2 .

注入所述氮離子的參數為：鍍膜室的本底真空度為1×10-4Pa，氮氣的純度為99.99%，離子源電壓為30~100kV，工作氣壓為0.1~0.5Pa，離子束流強度為1~5mA，控制氮離子的劑量在1×1016ions/cm2到1×1018ions/cm2之間。 The parameters for injecting the nitrogen ions are: the background vacuum of the coating chamber is 1×10 -4 Pa, the purity of the nitrogen is 99.99%, the ion source voltage is 30-100 kV, the working pressure is 0.1-0.5 Pa, and the ion beam current The intensity is 1 to 5 mA, and the dose of nitrogen ions is controlled to be between 1 x 10 16 ions/cm 2 and 1 x 10 18 ions/cm 2 .

可以理解的，在沉積該抗指紋塗層30之前還可於基體10表面鍍覆 一顏色層20，以增強該被覆件100的美觀性。 It can be understood that the surface of the substrate 10 can be plated before depositing the anti-fingerprint coating 30. A color layer 20 is provided to enhance the aesthetics of the cover member 100.

所述Al2O3層31及AlON層33的形成，在一定程度上降低了所述被覆件100的表面能。更重要的，於所述AlON層33表面注入氟離子、硼離子及氮離子中的一種或幾種，可提高所述AlON層33的表面熵值，即增加所述AlON層33表面原子的混亂程度，如此可降低所述AlON層33的表面能，從而使被覆件100具有良好的抗指紋效果。所述被覆件100的製造方法不需要使用特殊的有機樹脂，亦不需經酸或鹼處理，對環境及人體健康無害；且該方法簡單易行。 The formation of the Al 2 O 3 layer 31 and the AlON layer 33 reduces the surface energy of the covering member 100 to some extent. More importantly, injecting one or more of fluorine ions, boron ions and nitrogen ions into the surface of the AlON layer 33 can increase the surface entropy of the AlON layer 33, that is, increase the disorder of the surface atoms of the AlON layer 33. To the extent that the surface energy of the AlON layer 33 is lowered, the coated member 100 has a good anti-fingerprint effect. The manufacturing method of the covering member 100 does not need to use a special organic resin, and does not need to be treated by acid or alkali, and is harmless to the environment and human health; and the method is simple and easy.

綜上所述，本發明符合發明專利要件，爰依法提出專利申請。惟，以上所述者僅為本發明之較佳實施方式，舉凡熟悉本案技藝之人士，於爰依本發明精神所作之等效修飾或變化，皆應涵蓋於以下之申請專利範圍內。 In summary, the present invention complies with the requirements of the invention patent and submits a patent application according to law. The above description is only the preferred embodiment of the present invention, and equivalent modifications or variations made by those skilled in the art will be covered by the following claims.

10‧‧‧基體 10‧‧‧ base

20‧‧‧顏色層 20‧‧‧ color layer

30‧‧‧抗指紋塗層 30‧‧‧Anti-fingerprint coating

31‧‧‧三氧化二鋁層 31‧‧‧Aluminum oxide layer

33‧‧‧氮氧化鋁層 33‧‧‧aluminum oxide layer

100‧‧‧被覆件 100‧‧‧Cladding

Claims (9)

一種具有抗指紋塗層的被覆件，包括基體及形成於該基體上的抗指紋塗層，其改良在於：該抗指紋塗層包括依次形成於基體上的三氧化二鋁層及氮氧化鋁層，所述氮氧化鋁層中還含有氟離子、硼離子和氮離子中的一種或幾種，所述氟離子、硼離子及氮離子中的一種或幾種離子藉由離子注入的方式注入到氮氧化鋁層中形成。 A coated member having an anti-fingerprint coating, comprising a substrate and an anti-fingerprint coating formed on the substrate, wherein the anti-fingerprint coating comprises an aluminum oxide layer and an aluminum oxynitride layer sequentially formed on the substrate The aluminum oxynitride layer further contains one or more of a fluoride ion, a boron ion, and a nitrogen ion, and one or more of the fluoride ion, the boron ion, and the nitrogen ion are injected by ion implantation. Formed in the aluminum oxynitride layer. 如申請專利範圍第1項所述之具有抗指紋塗層的被覆件，其中所述三氧化二鋁層、氮氧化鋁層分別藉由磁控濺射鍍膜法形成。 The coated article having an anti-fingerprint coating according to claim 1, wherein the aluminum oxide layer and the aluminum oxynitride layer are respectively formed by magnetron sputtering coating. 如申請專利範圍第1項所述之具有抗指紋塗層的被覆件，其中所述三氧化二鋁層的厚度為200~300nm，所述氮氧化鋁層的厚度為200~300nm。 The coated article having an anti-fingerprint coating according to claim 1, wherein the aluminum oxide layer has a thickness of 200 to 300 nm, and the aluminum oxynitride layer has a thickness of 200 to 300 nm. 如申請專利範圍第1項所述之具有抗指紋塗層的被覆件，其中所述被覆件還包括形成於基體與抗指紋塗層之間的顏色層。 The coated article having an anti-fingerprint coating according to claim 1, wherein the covering member further comprises a color layer formed between the substrate and the anti-fingerprint coating. 一種具有抗指紋塗層的被覆件的製造方法，包括以下步驟：提供一基體；採用一真空鍍膜機，於基體上形成抗指紋塗層，形成該抗指紋塗層包括如下步驟：以氧氣為反應氣體，以鋁靶為靶材，於所述基體上磁控濺射形成三氧化二鋁層；以氧氣及氮氣為反應氣體，以鋁靶為靶材，於所述三氧化二鋁層上磁控濺射形成氮氧化鋁層；採用四氟化碳、乙硼烷及氮氣中的一種或幾種為氣源，藉由離子注入技術於所述氮氧化鋁層表面注入氟離子、硼離子及氮離子中的一種或幾種。 A method for manufacturing a coated member having an anti-fingerprint coating comprises the steps of: providing a substrate; forming a anti-fingerprint coating on the substrate by using a vacuum coating machine, and forming the anti-fingerprint coating comprises the following steps: reacting with oxygen a gas, with an aluminum target as a target, magnetron sputtering on the substrate to form an aluminum oxide layer; oxygen and nitrogen as reaction gases, an aluminum target as a target, and magnetic on the aluminum oxide layer Controlling sputtering to form an aluminum oxynitride layer; using one or more of carbon tetrafluoride, diborane and nitrogen as a gas source, injecting fluoride ions and boron ions into the surface of the aluminum oxynitride layer by ion implantation technique One or more of nitrogen ions. 如申請專利範圍第5項所述之具有抗指紋塗層的被覆件的製造方法，其中形成所述三氧化二鋁層的工藝參數為：設置氧氣的流量為100~300sccm，以氬氣為工作氣體，其流量為100~300sccm，設置鋁靶的電源功率為2~5kw，對基體施加-70~-180V的偏壓，濺射溫度為50~180℃，濺射時間為20~60min。 The method for manufacturing a coated article having an anti-fingerprint coating according to claim 5, wherein the process parameter for forming the aluminum oxide layer is: setting a flow rate of oxygen to 100 to 300 sccm, working with argon gas. The flow rate of the gas is 100~300sccm, the power supply of the aluminum target is 2~5kw, the bias of -70~-180V is applied to the substrate, the sputtering temperature is 50~180°C, and the sputtering time is 20~60min. 如申請專利範圍第5項所述之具有抗指紋塗層的被覆件的製造方法，其中形成所述氮氧化鋁層的工藝參數為：設置氧氣及氮氣的流量分別為100~300sccm、50~150sccm，以氬氣為工作氣體，其流量為100~300sccm，設置鋁靶的電源功率為2~5kw，對基體施加-70~-180V的偏壓，濺射溫度為50~180℃，濺射時間為20~60min。 The method for manufacturing a coated article having an anti-fingerprint coating according to claim 5, wherein the process parameter for forming the aluminum oxynitride layer is: setting a flow rate of oxygen and nitrogen to be 100 to 300 sccm and 50 to 150 sccm, respectively. Using argon as the working gas, the flow rate is 100~300sccm, the power supply of the aluminum target is 2~5kw, the bias of -70~-180V is applied to the substrate, the sputtering temperature is 50~180°C, the sputtering time It is 20~60min. 如申請專利範圍第5項所述之具有抗指紋塗層的被覆件的製造方法，其中於所述氮氧化鋁層表面注入離子的工藝參數為：鍍膜室的本底真空度為1×10-4Pa，離子源電壓為30~100kV，工作氣壓為0.1~0.5Pa，離子束流強度為1~5mA，控制離子注入劑量為1×1016ions/cm2到1×1018ions/cm2。 The method for manufacturing a coated article having an anti-fingerprint coating according to claim 5, wherein the process parameter of implanting ions on the surface of the aluminum oxynitride layer is: the background vacuum degree of the coating chamber is 1×10 − 4 Pa, ion source voltage is 30~100kV, working pressure is 0.1~0.5Pa, ion beam current is 1~5mA, and controlled ion implantation dose is 1×10 16 ions/cm 2 to 1×10 18 ions/cm 2 . 如申請專利範圍第5項所述之具有抗指紋塗層的被覆件的製造方法，其中所述製造方法還包括在沉積該抗指紋塗層之前於該基體上鍍覆顏色層的步驟。 A method of manufacturing a coated article having an anti-fingerprint coating according to claim 5, wherein the manufacturing method further comprises the step of plating a color layer on the substrate before depositing the anti-fingerprint coating.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200603181A (en) * 2004-04-15 2006-01-16 Teijin Ltd Transparent gas barrier multilayer film
TW200711844A (en) * 2005-07-20 2007-04-01 3M Innovative Properties Co Moisture barrier coatings
TW201006668A (en) * 2008-04-29 2010-02-16 Agency Science Tech & Res Inorganic graded barrier film and methods for their manufacture

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200603181A (en) * 2004-04-15 2006-01-16 Teijin Ltd Transparent gas barrier multilayer film
TW200711844A (en) * 2005-07-20 2007-04-01 3M Innovative Properties Co Moisture barrier coatings
TW201006668A (en) * 2008-04-29 2010-02-16 Agency Science Tech & Res Inorganic graded barrier film and methods for their manufacture

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