TWI494456B - - Google Patents
Info
- Publication number
- TWI494456B TWI494456B TW101151260A TW101151260A TWI494456B TW I494456 B TWI494456 B TW I494456B TW 101151260 A TW101151260 A TW 101151260A TW 101151260 A TW101151260 A TW 101151260A TW I494456 B TWI494456 B TW I494456B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210199548.4A CN103510064B (zh) | 2012-06-15 | 2012-06-15 | 真空处理装置及控制制程颗粒沉积路径的方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201350604A TW201350604A (zh) | 2013-12-16 |
| TWI494456B true TWI494456B (zh) | 2015-08-01 |
Family
ID=49893483
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101151260A TW201350604A (zh) | 2012-06-15 | 2012-12-28 | 真空處理裝置及控制製程顆粒沉積路徑的方法 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN103510064B (zh) |
| TW (1) | TW201350604A (zh) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5762748A (en) * | 1992-08-27 | 1998-06-09 | Applied Materials, Inc | Lid and door for a vacuum chamber and pretreatment therefor |
| WO2009090779A1 (ja) * | 2008-01-15 | 2009-07-23 | Haru Miyake | 超音波殺菌装置 |
| CN101085446B (zh) * | 2006-06-09 | 2010-11-10 | K.C.科技股份有限公司 | 预涂辊子清洗单元及清洗方法和基板涂敷装置 |
| CN101192014B (zh) * | 2006-11-28 | 2010-11-24 | 夏普株式会社 | 电子照相感光体 |
| US8133815B2 (en) * | 2007-05-29 | 2012-03-13 | Sumitomo Electric Industries, Ltd. | Method of polishing compound semiconductor substrate, compound semiconductor substrate, method of manufacturing compound semiconductor epitaxial substrate, and compound semiconductor epitaxial substrate |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0544037A (ja) * | 1991-08-07 | 1993-02-23 | Kawasaki Steel Corp | 気相成長装置及びそれを用いた半導体装置の製造方法 |
| US6200412B1 (en) * | 1996-02-16 | 2001-03-13 | Novellus Systems, Inc. | Chemical vapor deposition system including dedicated cleaning gas injection |
| JP4231417B2 (ja) * | 2004-01-07 | 2009-02-25 | パナソニック株式会社 | 基板処理装置及びそのクリーニング方法 |
-
2012
- 2012-06-15 CN CN201210199548.4A patent/CN103510064B/zh active Active
- 2012-12-28 TW TW101151260A patent/TW201350604A/zh unknown
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5762748A (en) * | 1992-08-27 | 1998-06-09 | Applied Materials, Inc | Lid and door for a vacuum chamber and pretreatment therefor |
| CN101085446B (zh) * | 2006-06-09 | 2010-11-10 | K.C.科技股份有限公司 | 预涂辊子清洗单元及清洗方法和基板涂敷装置 |
| CN101192014B (zh) * | 2006-11-28 | 2010-11-24 | 夏普株式会社 | 电子照相感光体 |
| US8133815B2 (en) * | 2007-05-29 | 2012-03-13 | Sumitomo Electric Industries, Ltd. | Method of polishing compound semiconductor substrate, compound semiconductor substrate, method of manufacturing compound semiconductor epitaxial substrate, and compound semiconductor epitaxial substrate |
| WO2009090779A1 (ja) * | 2008-01-15 | 2009-07-23 | Haru Miyake | 超音波殺菌装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201350604A (zh) | 2013-12-16 |
| CN103510064A (zh) | 2014-01-15 |
| CN103510064B (zh) | 2016-06-29 |