TWI487894B - - Google Patents
Info
- Publication number
- TWI487894B TWI487894B TW101151235A TW101151235A TWI487894B TW I487894 B TWI487894 B TW I487894B TW 101151235 A TW101151235 A TW 101151235A TW 101151235 A TW101151235 A TW 101151235A TW I487894 B TWI487894 B TW I487894B
- Authority
- TW
- Taiwan
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210317750.2A CN102820197B (zh) | 2012-08-31 | 2012-08-31 | 一种等离子处理*** |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201409017A TW201409017A (zh) | 2014-03-01 |
| TWI487894B true TWI487894B (zh) | 2015-06-11 |
Family
ID=47304248
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW101151235A TW201409017A (zh) | 2012-08-31 | 2012-12-28 | 一種等離子處理系統 |
Country Status (2)
| Country | Link |
|---|---|
| CN (1) | CN102820197B (zh) |
| TW (1) | TW201409017A (zh) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105161395A (zh) * | 2015-08-11 | 2015-12-16 | 上海华力微电子有限公司 | 等离子体刻蚀装置及等离子体刻蚀方法 |
| CN108966474A (zh) * | 2018-10-03 | 2018-12-07 | 张家港衡德新材料科技有限公司 | 一种大功率复合频率icp等离子发生器 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6181068B1 (en) * | 1998-05-15 | 2001-01-30 | Dae Won Paptin Form Co., Ltd. | Plasma generating apparatus |
| US6791692B2 (en) * | 2000-11-29 | 2004-09-14 | Lightwind Corporation | Method and device utilizing plasma source for real-time gas sampling |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4857136A (en) * | 1988-06-23 | 1989-08-15 | John Zajac | Reactor monitoring system and method |
| KR100257903B1 (ko) * | 1997-12-30 | 2000-08-01 | 윤종용 | 인시튜 모니터링가능한 플라즈마 식각장치, 그 인시튜 모니터링방법, 플라즈마 식각챔버내의 잔류물 제거를 위한 인시튜 세정방법 |
| FR2887072A1 (fr) * | 2005-06-08 | 2006-12-15 | Alcatel Sa | Systeme spectographique ameliore avec source plasma |
| CN101150909B (zh) * | 2006-09-22 | 2010-05-12 | 中微半导体设备(上海)有限公司 | 等离子体约束装置 |
| KR200456733Y1 (ko) * | 2009-08-24 | 2011-11-15 | (주)쎄미시스코 | 센서챔버의 가스배출장치 |
-
2012
- 2012-08-31 CN CN201210317750.2A patent/CN102820197B/zh active Active
- 2012-12-28 TW TW101151235A patent/TW201409017A/zh unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6181068B1 (en) * | 1998-05-15 | 2001-01-30 | Dae Won Paptin Form Co., Ltd. | Plasma generating apparatus |
| US6791692B2 (en) * | 2000-11-29 | 2004-09-14 | Lightwind Corporation | Method and device utilizing plasma source for real-time gas sampling |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201409017A (zh) | 2014-03-01 |
| CN102820197B (zh) | 2016-03-09 |
| CN102820197A (zh) | 2012-12-12 |