TWI477616B - Articles and mathod for making the same - Google Patents
Articles and mathod for making the same Download PDFInfo
- Publication number
- TWI477616B TWI477616B TW100100108A TW100100108A TWI477616B TW I477616 B TWI477616 B TW I477616B TW 100100108 A TW100100108 A TW 100100108A TW 100100108 A TW100100108 A TW 100100108A TW I477616 B TWI477616 B TW I477616B
- Authority
- TW
- Taiwan
- Prior art keywords
- layer
- chromium
- target
- substrate
- flow rate
- Prior art date
Links
Landscapes
- Physical Vapour Deposition (AREA)
Description
本發明涉及一種被覆件及其製造方法。The present invention relates to a coated member and a method of manufacturing the same.
習知的鎂或鎂合金、鋁或鋁合金等低熔點材料的成型模具的材質通常為不銹鋼。然而，在高溫氧化性環境中，不銹鋼基體表面易形成疏鬆的氧化鉻（Cr2 O3 ）層；當溫度逐漸升高，Cr2 O3 層變得不穩定並開始分解，使得不銹鋼基體內部的Fe、Ni等金屬離子向Cr2 O3 層擴散，引起Cr2 O3 層出現裂紋、剝落等氧化失效現象，大大降低了不銹鋼基體的高溫抗氧化性。A molding die of a conventional low-melting material such as magnesium or a magnesium alloy, aluminum or aluminum alloy is usually made of stainless steel. However, in the high temperature oxidizing environment, the surface of the stainless steel substrate is liable to form a loose layer of chromium oxide (Cr 2 O 3 ); when the temperature is gradually increased, the Cr 2 O 3 layer becomes unstable and begins to decompose, making the interior of the stainless steel substrate The metal ions such as Fe and Ni diffuse into the Cr 2 O 3 layer, causing cracking and spalling of the Cr 2 O 3 layer, which greatly reduces the high temperature oxidation resistance of the stainless steel substrate.
此外，所述Cr2 O3 層的形成將使成型模具表面變得粗糙，如此將影響成型產品的外觀、降低成型產品的良率，同時亦會縮短成型模具的使用壽命。In addition, the formation of the Cr 2 O 3 layer will roughen the surface of the molding die, which will affect the appearance of the molded product, lower the yield of the molded product, and also shorten the service life of the molding die.
有鑒於此，有必要提供一種能較好的解決上述問題的被覆件。In view of this, it is necessary to provide a covering member that can better solve the above problems.
另外，還提供上述被覆件的製造方法。Further, a method of manufacturing the above-described covering member is also provided.
一種被覆件，包括基體、依次形成於基體上的鉻層、氮氧化鉻層及氮化鈦層。A coated member includes a substrate, a chromium layer sequentially formed on the substrate, a chromium oxynitride layer, and a titanium nitride layer.
一種被覆件的製造方法，包括以下步驟：A method of manufacturing a coated member, comprising the steps of:
提供基體；Providing a substrate;
以鉻靶為靶材，於基體上磁控濺射鉻層；Using a chromium target as a target, magnetron sputtering a chromium layer on the substrate;
以鉻靶為靶材，以氮氣及氧氣為反應氣體，於鉻層上磁控濺射氮氧化鉻層；Using a chromium target as a target, using nitrogen and oxygen as reaction gases, magnetron sputtering a chromium oxynitride layer on the chromium layer;
以鈦靶為靶材，以氮氣為反應氣體，於氮氧化鉻層上磁控濺射氮化鈦層。A titanium target was used as a target, and a titanium nitride layer was magnetron-sputtered on the chromium oxynitride layer using nitrogen as a reaction gas.
本發明被覆件的製造方法，在基體上藉由磁控濺射鍍膜法依次形成鉻層、氮氧化鉻層及氮化鈦層。由於在高溫氧化性條件下，所述鉻層及CrON層均可有效防止基體發生氧化，如此可有效提高所述基體的高溫抗氧化性；所述TiN層的形成可防止CrON層被刮傷，從而使所述被覆件具有良好的耐磨性。In the method for producing a coated article of the present invention, a chromium layer, a chromium oxynitride layer and a titanium nitride layer are sequentially formed on the substrate by a magnetron sputtering coating method. Since the chromium layer and the CrON layer can effectively prevent oxidation of the substrate under high temperature oxidation conditions, the high temperature oxidation resistance of the substrate can be effectively improved; the formation of the TiN layer can prevent the CrON layer from being scratched. Thereby the coated member has good wear resistance.
此外，當被覆件為用於成型鎂、鎂合金、鋁或鋁合金等低熔點材料的成型模具時，所述被覆件高溫抗氧化性的提高，可提高成型產品的良率，還可延長被覆件的使用壽命。Further, when the covering member is a molding die for molding a low melting point material such as magnesium, a magnesium alloy, aluminum or an aluminum alloy, the high temperature oxidation resistance of the coated member is improved, the yield of the molded product can be improved, and the coating can be extended. The service life of the piece.
請參閱圖1，本發明一較佳實施例的被覆件10包括基體11、依次形成於基體11上的鉻層13、氮氧化鉻（CrON）層15及氮化鈦（TiN）層17。Referring to FIG. 1, a covering member 10 according to a preferred embodiment of the present invention includes a base 11, a chromium layer 13 sequentially formed on the base 11, a chromium oxynitride (CrON) layer 15, and a titanium nitride (TiN) layer 17.
所述基體11的材質為不銹鋼、模具鋼或高速鋼等。The material of the base 11 is stainless steel, die steel or high speed steel.
所述被覆件10可為用於成型鎂、鎂合金、鋁或鋁合金等低熔點材料的成型模具。The covering member 10 may be a molding die for molding a low melting point material such as magnesium, magnesium alloy, aluminum or aluminum alloy.
所述鉻層13、CrON層15及TiN層17可分別藉由磁控濺射鍍膜法形成。The chromium layer 13, the CrON layer 15, and the TiN layer 17 can be formed by magnetron sputtering coating, respectively.
所述鉻層13的厚度為100~200nm。The chromium layer 13 has a thickness of 100 to 200 nm.
所述CrON層15的厚度為0.5~1μm。所述CrON層15中鉻元素的質量百分含量為40%~60%，氧元素的質量百分含量為30%~50%，氮元素的質量百分含量為5%~15%。The CrON layer 15 has a thickness of 0.5 to 1 μm. The content of chromium in the CrON layer 15 is 40% to 60%, the mass percentage of oxygen is 30% to 50%, and the mass percentage of nitrogen is 5% to 15%.
所述TiN層17的厚度為0.4~1.2μm。The TiN layer 17 has a thickness of 0.4 to 1.2 μm.
請一併參閱圖2所示，本發明一較佳實施例的被覆件10的製造方法主要包括如下步驟：As shown in FIG. 2, the manufacturing method of the covering member 10 according to a preferred embodiment of the present invention mainly includes the following steps:
提供一基體11。該基體11可以藉由沖壓成型得到。A substrate 11 is provided. The base 11 can be obtained by press forming.
對該基體11進行預處理。該預處理可包括常規的對基體11進行化學除油、除蠟、酸洗、超聲波清洗及烘乾等步驟。The substrate 11 is pretreated. The pretreatment may include conventional steps of chemical degreasing, wax removal, pickling, ultrasonic cleaning, and drying of the substrate 11.
提供一鍍膜機100，將所述基體11置於該鍍膜機100內，採用磁控濺射鍍膜法依次於基體11上形成鉻層13、CrON層15及TiN層17。A coating machine 100 is provided, and the substrate 11 is placed in the coating machine 100, and a chromium layer 13, a CrON layer 15, and a TiN layer 17 are sequentially formed on the substrate 11 by magnetron sputtering.
如圖2所示，該鍍膜機100包括一鍍膜室20及連接在鍍膜室20的一真空泵30，真空泵30用以對鍍膜室20抽真空。該鍍膜室20內設有轉架（未圖示）、二第一靶材22及二第二靶材23。轉架帶動基體11沿圓形軌跡21作公轉，且基體11在沿軌跡21公轉時亦自轉。二第一靶材22與二第二靶材23關於軌跡21的中心對稱設置，且二第一靶材22相對地設置在軌跡21的內外側，二第二靶材23相對地設置在軌跡21的內外側。每一第一靶材22及每一第二靶材23的兩端均設有氣源通道24，氣體經該氣源通道24進入所述鍍膜室20中。當基體11穿過二第一靶材22之間時，可鍍上第一靶材22表面濺射出的粒子；同理，當基體11穿過二第二靶材23之間時，可鍍上第二靶材23表面濺射出的粒子。本實例中，所述第一靶材22為鉻靶，所述第二靶材23為鈦靶。As shown in FIG. 2, the coater 100 includes a coating chamber 20 and a vacuum pump 30 connected to the coating chamber 20. The vacuum pump 30 is used to evacuate the coating chamber 20. A rotating frame (not shown), two first targets 22, and two second targets 23 are provided in the coating chamber 20. The turret drives the base body 11 to revolve along the circular trajectory 21, and the base body 11 also rotates when revolving along the trajectory 21. The two first targets 22 and the two second targets 23 are symmetrically disposed with respect to the center of the track 21, and the two first targets 22 are oppositely disposed on the inner and outer sides of the track 21, and the second targets 23 are oppositely disposed on the track 21 Inside and outside. A gas source passage 24 is disposed at each end of each of the first target 22 and each of the second targets 23, and the gas enters the coating chamber 20 through the gas source passage 24. When the substrate 11 passes between the two first targets 22, particles sputtered on the surface of the first target 22 may be plated; similarly, when the substrate 11 passes between the second targets 23, it may be plated. Particles sputtered on the surface of the second target 23. In the present example, the first target 22 is a chromium target and the second target 23 is a titanium target.
於該基體11的表面磁控濺射鉻層13。形成所述鉻層13的具體操作方法及工藝參數為：對該鍍膜室20進行抽真空處理至本底真空度為8.0×10-3 Pa，以氬氣為工作氣體，向鍍膜室20內通入流量為100~200sccm的氬氣，於基體11上施加-100~-300V的偏壓，加熱該鍍膜室20至100~150℃（即鍍膜溫度為100~150℃），開啟第一靶材22的電源，設置其功率為5~10kW，沉積該鉻層13。沉積該鉻層13的時間為5~15min。The chromium layer 13 is magnetron sputtered on the surface of the substrate 11. The specific operation method and process parameters for forming the chromium layer 13 are: vacuuming the coating chamber 20 to a background vacuum of 8.0×10 −3 Pa, and using argon as a working gas, passing through the coating chamber 20 The argon gas having a flow rate of 100 to 200 sccm is applied with a bias of -100 to -300 V on the substrate 11, and the coating chamber is heated to a temperature of 20 to 150 ° C (that is, a coating temperature of 100 to 150 ° C) to open the first target. The power source of 22 is set to have a power of 5 to 10 kW, and the chromium layer 13 is deposited. The time for depositing the chromium layer 13 is 5 to 15 minutes.
所述鉻層13中的Cr原子在高溫氧化環境下可與O原子結合形成Cr2 O3 保護膜，因而可有效防止基體11發生氧化而失效。The Cr atoms in the chromium layer 13 can be combined with O atoms to form a Cr 2 O 3 protective film in a high-temperature oxidation environment, thereby effectively preventing oxidation of the substrate 11 and failing.
於該鉻層13上形成CrON層15。形成該CrON層15的具體操作方法及工藝參數為：保持氬氣流量、鍍膜溫度、第一靶材22的電源功率及施加於基體11的偏壓不變，以氮氣及氧氣為反應氣體，設置氮氣的流量為10~100sccm、氧氣的流量為10~100sccm，沉積該CrON層15。沉積該CrON層15的時間為30~60min，沉積完畢後關閉所述第一靶材22的電源。A CrON layer 15 is formed on the chromium layer 13. The specific operation method and process parameters for forming the CrON layer 15 are: maintaining the argon flow rate, the coating temperature, the power of the first target 22, and the bias voltage applied to the substrate 11, and setting the nitrogen gas and the oxygen gas as the reaction gas. The flow rate of nitrogen is 10 to 100 sccm, and the flow rate of oxygen is 10 to 100 sccm, and the CrON layer 15 is deposited. The time for depositing the CrON layer 15 is 30 to 60 minutes, and the power of the first target 22 is turned off after the deposition is completed.
所述的CrON層15在其形成過程中可形成Cr-O及Cr-N兩相化合物，該兩相化合物同時形成可相互抑制各相晶粒的生長，從而可降低各相晶粒的尺寸，增強該CrON層15的緻密性而達到阻礙氧氣向CrON層15內部擴散的作用，可進一步防止基體11發生氧化。The CrON layer 15 can form a Cr-O and a Cr-N two-phase compound during the formation thereof, and the two-phase compound can simultaneously inhibit the growth of crystal grains of each phase, thereby reducing the size of crystal grains of each phase. The denseness of the CrON layer 15 is enhanced to prevent the diffusion of oxygen into the interior of the CrON layer 15, and the oxidation of the substrate 11 can be further prevented.
於該CrON層15上形成TiN層17。形成該TiN層17的具體操作方法及工藝參數為：保持氬氣流量、鍍膜溫度及施加於基體11的偏壓不變，以氮氣為反應氣體，設置氮氣的流量為60~120sccm，開啟所述第二靶材23的電源，設置其功率為8~10kW，沉積該TiN層17。沉積該TiN層17的時間為30~90min。A TiN layer 17 is formed on the CrON layer 15. The specific operation method and process parameters for forming the TiN layer 17 are: maintaining the argon flow rate, the coating temperature, and the bias voltage applied to the substrate 11 unchanged, using nitrogen as the reaction gas, and setting the flow rate of the nitrogen gas to 60 to 120 sccm to open the The power source of the second target 23 is set to have a power of 8 to 10 kW, and the TiN layer 17 is deposited. The time for depositing the TiN layer 17 is 30 to 90 minutes.
所述TiN層17具有高熔點、高硬度及優異的耐磨性能，因此該TiN層17能夠對CrON層15進行保護，防止CrON層15被刮傷。The TiN layer 17 has a high melting point, high hardness, and excellent wear resistance, so that the TiN layer 17 can protect the CrON layer 15 from being scratched by the CrON layer 15.
關閉負偏壓及靶材的電源，停止通入氬氣及氧氣，待所述TiN層17冷卻後，向鍍膜內通入空氣，打開鍍膜室門，取出被覆件10。The power supply of the negative bias and the target is turned off, and the argon gas and the oxygen gas are stopped. After the TiN layer 17 is cooled, air is introduced into the coating film, the coating chamber door is opened, and the covering member 10 is taken out.
本發明較佳實施例被覆件10的製造方法在基體11上藉由磁控濺射鍍膜法依次形成鉻層13、CrON層15及TiN層17。由於在高溫氧化性條件下，所述鉻層13及CrON層15均可有效防止基體11發生氧化，如此可有效提高所述基體11的高溫抗氧化性；所述TiN層17的形成可防止CrON層15被刮傷，從而使所述被覆件10具有良好的耐磨性。In the manufacturing method of the coated member 10 of the preferred embodiment of the present invention, the chromium layer 13, the CrON layer 15, and the TiN layer 17 are sequentially formed on the substrate 11 by magnetron sputtering. Since the chromium layer 13 and the CrON layer 15 can effectively prevent oxidation of the substrate 11 under high temperature oxidizing conditions, the high temperature oxidation resistance of the substrate 11 can be effectively improved; the formation of the TiN layer 17 can prevent CrON. The layer 15 is scratched so that the covering member 10 has good wear resistance.
此外，當被覆件10為用於成型鎂、鎂合金、鋁或鋁合金等低熔點材料的成型模具時，所述被覆件10高溫抗氧化性的提高，可提高成型產品的良率，還可延長被覆件10的使用壽命。In addition, when the covering member 10 is a molding die for molding a low melting point material such as magnesium, magnesium alloy, aluminum or aluminum alloy, the high temperature oxidation resistance of the covering member 10 can improve the yield of the molded product, and Extend the service life of the covering member 10.
下面藉由實施例來對本發明進行具體說明。The invention will now be specifically described by way of examples.
實施例1Example 1
（1）磁控濺射形成鉻層13(1) Magnetron sputtering to form a chromium layer 13
所述鍍膜室20的本底真空度為8×10-3 Pa，氬氣流量為150sccm，施加於基體11上的偏壓為-200V，設置鍍膜溫度為120℃，設置第一靶材22的電源功率為8kW，沉積該鉻層13時間為5min。The coating chamber 20 has a background vacuum of 8×10 −3 Pa, an argon flow rate of 150 sccm, a bias voltage applied to the substrate 11 of −200 V, and a plating temperature of 120° C., and the first target 22 is disposed. The power of the power is 8 kW, and the time for depositing the chrome layer 13 is 5 minutes.
（2）磁控濺射形成CrON層15(2) Magnetron sputtering to form CrON layer 15
保持氬氣流量、鍍膜溫度、第一靶材22的電源功率及施加於基體11的偏壓不變，設置氮氣的流量為30sccm、氧氣的流量為40sccm，沉積該CrON層15的時間為40min。The argon flow rate, the coating temperature, the power of the first target 22, and the bias voltage applied to the substrate 11 were maintained, and the flow rate of nitrogen gas was set to 30 sccm, the flow rate of oxygen gas was 40 sccm, and the time for depositing the CrON layer 15 was 40 min.
（3）磁控濺射形成TiN層17(3) Magnetron sputtering to form TiN layer 17
保持氬氣流量、鍍膜溫度及施加於基體11的偏壓不變，設置氮氣的流量為60sccm，所述第二靶材23的電源功率為8kW，沉積該TiN層17的時間為60min。The flow rate of the argon gas, the coating temperature, and the bias voltage applied to the substrate 11 were kept constant, the flow rate of the nitrogen gas was set to 60 sccm, the power source of the second target 23 was 8 kW, and the time for depositing the TiN layer 17 was 60 min.
實施例2Example 2
（1）磁控濺射形成鉻層13(1) Magnetron sputtering to form a chromium layer 13
所述鍍膜室20的本底真空度為8×10-3 Pa，氬氣流量為150sccm，施加於基體11上的偏壓為-200V，設置鍍膜溫度為120℃，設置第一靶材22的電源功率為5kW，沉積該鉻層13時間為10min。The coating chamber 20 has a background vacuum of 8×10 −3 Pa, an argon flow rate of 150 sccm, a bias voltage applied to the substrate 11 of −200 V, and a plating temperature of 120° C., and the first target 22 is disposed. The power supply was 5 kW, and the chrome layer 13 was deposited for 10 minutes.
（2）磁控濺射形成CrON層15(2) Magnetron sputtering to form CrON layer 15
保持氬氣流量、鍍膜溫度、第一靶材22的電源功率及施加於基體11的偏壓不變，設置氮氣的流量為60sccm、氧氣的流量為80sccm，沉積該CrON層15的時間為60min。The argon flow rate, the coating temperature, the power of the first target 22, and the bias voltage applied to the substrate 11 were maintained, and the flow rate of nitrogen gas was set to 60 sccm, the flow rate of oxygen gas was 80 sccm, and the time for depositing the CrON layer 15 was 60 min.
（3）磁控濺射形成TiN層17(3) Magnetron sputtering to form TiN layer 17
保持氬氣流量、鍍膜溫度及施加於基體11的偏壓不變，設置氮氣的流量為100sccm，所述第二靶材23的電源功率為8kW，沉積該TiN層17的時間為30min。The flow rate of the argon gas, the coating temperature, and the bias voltage applied to the substrate 11 were maintained, the flow rate of the nitrogen gas was set to 100 sccm, the power source of the second target 23 was 8 kW, and the time for depositing the TiN layer 17 was 30 min.
性能測試Performance Testing
將上述製得的被覆件10進行電磁遮罩效能測試、百格測試、鹽霧測試和高溫高濕測試，具體測試方法及結果如下：The coated member 10 prepared above is subjected to an electromagnetic masking effectiveness test, a hundred-square test, a salt spray test, and a high-temperature and high-humidity test. The specific test methods and results are as follows:
（1）高溫抗氧化測試(1) High temperature oxidation test
採用管式熱處理爐，以10℃/min的升溫速率升溫至800℃，並800℃下保溫10h，然後冷卻該熱處理爐。The tube heat treatment furnace was used, and the temperature was raised to 800 ° C at a heating rate of 10 ° C / min, and the temperature was maintained at 800 ° C for 10 hours, and then the heat treatment furnace was cooled.
測試表明，由本發明實施例1及2所製得的被覆件10經800℃熱處理10h後未見發生氧化、脫落等不良。可見，由本發明實施例方法所製得的被覆件10具有良好的高溫抗氧化性。Tests have shown that the coated member 10 obtained in the first and second embodiments of the present invention has not been oxidized or peeled off after being heat-treated at 800 ° C for 10 hours. It can be seen that the coated member 10 obtained by the method of the embodiment of the present invention has good high temperature oxidation resistance.
（2）耐磨性測試(2) Abrasion resistance test
採用5700型線性耐磨性測試儀，在載荷為1kg力的作用下，以2英寸的滑行長度、25循環/分鐘的循環速度摩擦被覆件10的表面。The surface of the covering member 10 was rubbed with a load of 1 kg using a 5700 type linear abrasion resistance tester at a cycle speed of 2 inches and a cycle speed of 25 cycles/minute.
結果表明，由本發明實施例1和2所製得的被覆件10在20個循環後均沒有露出基材。可見，該被覆件10具有較好的耐磨性。The results showed that the coated members 10 obtained in the inventive examples 1 and 2 did not expose the substrate after 20 cycles. It can be seen that the covering member 10 has better wear resistance.
10．．．被覆件10. . . Covered piece
11．．．基體11. . . Matrix
13．．．鉻層13. . . Chrome layer
15．．．氮氧化鉻層15. . . Chromium oxynitride layer
17．．．氮化鈦層17. . . Titanium nitride layer
100．．．鍍膜機100. . . Coating machine
20．．．鍍膜室20. . . Coating chamber
30．．．真空泵30. . . Vacuum pump
21．．．軌跡twenty one. . . Trajectory
22．．．第一靶材twenty two. . . First target
23．．．第二靶材twenty three. . . Second target
24．．．氣源通道twenty four. . . Air source channel
圖1為本發明較佳實施例的被覆件的剖視圖；Figure 1 is a cross-sectional view of a coated member in accordance with a preferred embodiment of the present invention;
圖2為製造圖1中鍍膜件所用真空鍍膜機的示意圖。Figure 2 is a schematic view of a vacuum coater used to manufacture the coated member of Figure 1.
10．．．被覆件10. . . Covered piece
11．．．基體11. . . Matrix
13．．．鉻層13. . . Chrome layer
15．．．氮氧化鉻層15. . . Chromium oxynitride layer
17．．．氮化鈦層17. . . Titanium nitride layer
Claims (10)
提供基體；
以鉻靶為靶材，於基體上磁控濺射鉻層；
以鉻靶為靶材，以氮氣及氧氣為反應氣體，於鉻層上磁控濺射氮氧化鉻層；
以鈦靶為靶材，以氮氣為反應氣體，於氮氧化鉻層上磁控濺射氮化鈦層。A method of manufacturing a coated member, comprising the steps of:
Providing a substrate;
Using a chromium target as a target, magnetron sputtering a chromium layer on the substrate;
Using a chromium target as a target, using nitrogen and oxygen as reaction gases, magnetron sputtering a chromium oxynitride layer on the chromium layer;
A titanium target was used as a target, and a titanium nitride layer was magnetron-sputtered on the chromium oxynitride layer using nitrogen as a reaction gas.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100100108A TWI477616B (en) | 2011-01-04 | 2011-01-04 | Articles and mathod for making the same |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW100100108A TWI477616B (en) | 2011-01-04 | 2011-01-04 | Articles and mathod for making the same |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201229261A TW201229261A (en) | 2012-07-16 |
| TWI477616B true TWI477616B (en) | 2015-03-21 |
Family
ID=46933875
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW100100108A TWI477616B (en) | 2011-01-04 | 2011-01-04 | Articles and mathod for making the same |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWI477616B (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5552180A (en) * | 1991-11-29 | 1996-09-03 | Ppg Industries, Inc. | Multilayer heat processable vacuum coatings with metallic properties |
| US20060139783A1 (en) * | 2003-02-14 | 2006-06-29 | Daniel Decroupet | Glazing panel carrying a coating stack |
-
2011
- 2011-01-04 TW TW100100108A patent/TWI477616B/en not_active IP Right Cessation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5552180A (en) * | 1991-11-29 | 1996-09-03 | Ppg Industries, Inc. | Multilayer heat processable vacuum coatings with metallic properties |
| US20010044032A1 (en) * | 1991-11-29 | 2001-11-22 | Finley James J. | Multilayer heat processable vacuum coatings with metallic properties |
| US20060139783A1 (en) * | 2003-02-14 | 2006-06-29 | Daniel Decroupet | Glazing panel carrying a coating stack |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201229261A (en) | 2012-07-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TW201438884A (en) | A coated article with hard coating | |
| US8637148B2 (en) | Coated article and method of making the same | |
| CN102560350A (en) | Coated part and manufacturing method thereof | |
| CN102534481A (en) | Coated piece and manufacturing method thereof | |
| JP3697221B2 (en) | High wear and hardness coating with excellent high temperature oxidation resistance | |
| TWI477616B (en) | Articles and mathod for making the same | |
| TWI503431B (en) | Articles and method for making the same | |
| CN108220875B (en) | Self-assembled Ti-Al nitride multilayer coating cutter and preparation method thereof | |
| CN109487214A (en) | A kind of magnesium-alloy surface coating method and Corrosion-resistant magnesia alloy prepared therefrom | |
| TWI496916B (en) | Articles and method for making the same | |
| TWI471450B (en) | Coated article and method for making the same | |
| CN102409302A (en) | Coating, coated part with coating and preparation method of coated part | |
| TWI493060B (en) | Silvery white film structure and method manufacturing same | |
| TWI471440B (en) | Housing and method for making the same | |
| JP4392888B2 (en) | Manufacturing method of hard coating with excellent corrosion resistance | |
| CN109913798A (en) | Case-hardened graphite jig and its case-hardened method | |
| TW201240826A (en) | Coating and method for manufacturing the coating | |
| TW201311915A (en) | Coated article and method for making the same | |
| TWI490351B (en) | Coated article and method for making the same | |
| TWI490359B (en) | Process for coating on ferrousalloy and coated articles made by same | |
| TW201305360A (en) | Coated article and method for making the same | |
| TWI493072B (en) | Housing and method for making the same | |
| CN104141110B (en) | A kind of preparation technology of the multilamellar mixing nano reinforcement layer of metal surface deposition ferrum+vanadium+titanium+titanium nitride | |
| CN104120395B (en) | A kind of technique of the hybrid multilayer nano reinforcement layer at iron surface deposition ferrum+chromium+molybdenum+titanium+titanium nitride | |
| CN102560341B (en) | Coated piece and manufacturing method thereof |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MM4A | Annulment or lapse of patent due to non-payment of fees |