TWI453260B - Pigment dispersed composition for black matrix and photoresist including the same - Google Patents
Pigment dispersed composition for black matrix and photoresist including the same Download PDFInfo
- Publication number
- TWI453260B TWI453260B TW096145337A TW96145337A TWI453260B TW I453260 B TWI453260 B TW I453260B TW 096145337 A TW096145337 A TW 096145337A TW 96145337 A TW96145337 A TW 96145337A TW I453260 B TWI453260 B TW I453260B
- Authority
- TW
- Taiwan
- Prior art keywords
- black matrix
- pigment
- acid
- pigment dispersion
- group
- Prior art date
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- 239000000049 pigment Substances 0.000 title claims description 116
- 239000000203 mixture Substances 0.000 title claims description 80
- 239000011159 matrix material Substances 0.000 title claims description 74
- 229920002120 photoresistant polymer Polymers 0.000 title description 22
- 239000006185 dispersion Substances 0.000 claims description 61
- 239000002253 acid Substances 0.000 claims description 54
- 239000002270 dispersing agent Substances 0.000 claims description 36
- 239000006229 carbon black Substances 0.000 claims description 30
- 229920005989 resin Polymers 0.000 claims description 28
- 239000011347 resin Substances 0.000 claims description 28
- 229920000642 polymer Polymers 0.000 claims description 26
- 238000010521 absorption reaction Methods 0.000 claims description 21
- 150000001875 compounds Chemical class 0.000 claims description 19
- 229920000728 polyester Polymers 0.000 claims description 13
- 239000002904 solvent Substances 0.000 claims description 12
- 239000003999 initiator Substances 0.000 claims description 9
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 7
- 229920006026 co-polymeric resin Polymers 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 5
- 239000004417 polycarbonate Substances 0.000 claims description 5
- 229920000515 polycarbonate Polymers 0.000 claims description 5
- 229920000570 polyether Polymers 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 4
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 claims description 4
- 125000000542 sulfonic acid group Chemical group 0.000 claims description 4
- 239000003795 chemical substances by application Substances 0.000 claims description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 3
- MZZSDCJQCLYLLL-UHFFFAOYSA-N Secalonsaeure A Natural products COC(=O)C12OC3C(CC1=C(O)CC(C)C2O)C(=CC=C3c4ccc(O)c5C(=O)C6=C(O)CC(C)C(O)C6(Oc45)C(=O)OC)O MZZSDCJQCLYLLL-UHFFFAOYSA-N 0.000 claims 1
- 239000003960 organic solvent Substances 0.000 description 28
- -1 ether ester Chemical class 0.000 description 22
- 239000003921 oil Substances 0.000 description 19
- 235000019198 oils Nutrition 0.000 description 19
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 15
- 238000011161 development Methods 0.000 description 13
- 239000000178 monomer Substances 0.000 description 13
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 12
- 239000011248 coating agent Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 11
- 125000003277 amino group Chemical group 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 8
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 7
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 7
- 150000002148 esters Chemical group 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 6
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 5
- 125000000524 functional group Chemical group 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 5
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 4
- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 4
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 4
- SOGAXMICEFXMKE-UHFFFAOYSA-N Butylmethacrylate Chemical compound CCCCOC(=O)C(C)=C SOGAXMICEFXMKE-UHFFFAOYSA-N 0.000 description 4
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 4
- 239000004793 Polystyrene Substances 0.000 description 4
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 4
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000009835 boiling Methods 0.000 description 4
- 229920001577 copolymer Polymers 0.000 description 4
- XLLIQLLCWZCATF-UHFFFAOYSA-N ethylene glycol monomethyl ether acetate Natural products COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 150000002576 ketones Chemical class 0.000 description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 4
- LPEKGGXMPWTOCB-UHFFFAOYSA-N methyl 2-hydroxypropionate Chemical compound COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 4
- 238000002156 mixing Methods 0.000 description 4
- 229920001228 polyisocyanate Polymers 0.000 description 4
- 239000005056 polyisocyanate Substances 0.000 description 4
- 229920002223 polystyrene Polymers 0.000 description 4
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 4
- 239000007787 solid Substances 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 3
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- DIQMPQMYFZXDAX-UHFFFAOYSA-N Pentyl formate Chemical compound CCCCCOC=O DIQMPQMYFZXDAX-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000002585 base Substances 0.000 description 3
- 150000001718 carbodiimides Chemical class 0.000 description 3
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 3
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 3
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 2
- FRASJONUBLZVQX-UHFFFAOYSA-N 1,4-naphthoquinone Chemical compound C1=CC=C2C(=O)C=CC(=O)C2=C1 FRASJONUBLZVQX-UHFFFAOYSA-N 0.000 description 2
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 2
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- VBICKXHEKHSIBG-UHFFFAOYSA-N 1-monostearoylglycerol Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC(O)CO VBICKXHEKHSIBG-UHFFFAOYSA-N 0.000 description 2
- QRIMLDXJAPZHJE-UHFFFAOYSA-N 2,3-dihydroxypropyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(O)CO QRIMLDXJAPZHJE-UHFFFAOYSA-N 0.000 description 2
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 2
- LEJBBGNFPAFPKQ-UHFFFAOYSA-N 2-(2-prop-2-enoyloxyethoxy)ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOC(=O)C=C LEJBBGNFPAFPKQ-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- XFCMNSHQOZQILR-UHFFFAOYSA-N 2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOC(=O)C(C)=C XFCMNSHQOZQILR-UHFFFAOYSA-N 0.000 description 2
- HCLJOFJIQIJXHS-UHFFFAOYSA-N 2-[2-[2-(2-prop-2-enoyloxyethoxy)ethoxy]ethoxy]ethyl prop-2-enoate Chemical compound C=CC(=O)OCCOCCOCCOCCOC(=O)C=C HCLJOFJIQIJXHS-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 2
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 2
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 2
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 2
- IEAJQNJSHYCMEK-UHFFFAOYSA-N 5-methoxy-2,5-dimethylhexanoic acid Chemical compound COC(C)(C)CCC(C)C(O)=O IEAJQNJSHYCMEK-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 2
- DCXXMTOCNZCJGO-UHFFFAOYSA-N Glycerol trioctadecanoate Natural products CCCCCCCCCCCCCCCCCC(=O)OCC(OC(=O)CCCCCCCCCCCCCCCCC)COC(=O)CCCCCCCCCCCCCCCCC DCXXMTOCNZCJGO-UHFFFAOYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 2
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- FPIPGXGPPPQFEQ-OVSJKPMPSA-N all-trans-retinol Chemical compound OC\C=C(/C)\C=C\C=C(/C)\C=C\C1=C(C)CCCC1(C)C FPIPGXGPPPQFEQ-OVSJKPMPSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 2
- 239000011324 bead Substances 0.000 description 2
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 2
- 229940018557 citraconic acid Drugs 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 125000004386 diacrylate group Chemical group 0.000 description 2
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 2
- CKSRFHWWBKRUKA-UHFFFAOYSA-N ethyl 2-ethoxyacetate Chemical compound CCOCC(=O)OCC CKSRFHWWBKRUKA-UHFFFAOYSA-N 0.000 description 2
- GFUIDHWFLMPAGY-UHFFFAOYSA-N ethyl 2-hydroxy-2-methylpropanoate Chemical compound CCOC(=O)C(C)(C)O GFUIDHWFLMPAGY-UHFFFAOYSA-N 0.000 description 2
- BHXIWUJLHYHGSJ-UHFFFAOYSA-N ethyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OCC BHXIWUJLHYHGSJ-UHFFFAOYSA-N 0.000 description 2
- 125000004494 ethyl ester group Chemical group 0.000 description 2
- VYSYZMNJHYOXGN-UHFFFAOYSA-N ethyl n-aminocarbamate Chemical compound CCOC(=O)NN VYSYZMNJHYOXGN-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 235000021388 linseed oil Nutrition 0.000 description 2
- 239000000944 linseed oil Substances 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 229920000083 poly(allylamine) Polymers 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920000768 polyamine Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 2
- QTECDUFMBMSHKR-UHFFFAOYSA-N prop-2-enyl prop-2-enoate Chemical compound C=CCOC(=O)C=C QTECDUFMBMSHKR-UHFFFAOYSA-N 0.000 description 2
- 238000010526 radical polymerization reaction Methods 0.000 description 2
- 239000013049 sediment Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- PSGCQDPCAWOCSH-UHFFFAOYSA-N (4,7,7-trimethyl-3-bicyclo[2.2.1]heptanyl) prop-2-enoate Chemical compound C1CC2(C)C(OC(=O)C=C)CC1C2(C)C PSGCQDPCAWOCSH-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- DKEGCUDAFWNSSO-UHFFFAOYSA-N 1,8-dibromooctane Chemical compound BrCCCCCCCCBr DKEGCUDAFWNSSO-UHFFFAOYSA-N 0.000 description 1
- QZOPRMWFYVGPAI-UHFFFAOYSA-N 1-chloroindole Chemical compound C1=CC=C2N(Cl)C=CC2=C1 QZOPRMWFYVGPAI-UHFFFAOYSA-N 0.000 description 1
- OSSNTDFYBPYIEC-UHFFFAOYSA-N 1-ethenylimidazole Chemical compound C=CN1C=CN=C1 OSSNTDFYBPYIEC-UHFFFAOYSA-N 0.000 description 1
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 1
- BGJQNPIOBWKQAW-UHFFFAOYSA-N 1-tert-butylanthracene-9,10-dione Chemical compound O=C1C2=CC=CC=C2C(=O)C2=C1C=CC=C2C(C)(C)C BGJQNPIOBWKQAW-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical group C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- GZBSIABKXVPBFY-UHFFFAOYSA-N 2,2-bis(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)CO GZBSIABKXVPBFY-UHFFFAOYSA-N 0.000 description 1
- PIZHFBODNLEQBL-UHFFFAOYSA-N 2,2-diethoxy-1-phenylethanone Chemical compound CCOC(OCC)C(=O)C1=CC=CC=C1 PIZHFBODNLEQBL-UHFFFAOYSA-N 0.000 description 1
- OWPUOLBODXJOKH-UHFFFAOYSA-N 2,3-dihydroxypropyl prop-2-enoate Chemical compound OCC(O)COC(=O)C=C OWPUOLBODXJOKH-UHFFFAOYSA-N 0.000 description 1
- JKNCOURZONDCGV-UHFFFAOYSA-N 2-(dimethylamino)ethyl 2-methylprop-2-enoate Chemical compound CN(C)CCOC(=O)C(C)=C JKNCOURZONDCGV-UHFFFAOYSA-N 0.000 description 1
- DPBJAVGHACCNRL-UHFFFAOYSA-N 2-(dimethylamino)ethyl prop-2-enoate Chemical compound CN(C)CCOC(=O)C=C DPBJAVGHACCNRL-UHFFFAOYSA-N 0.000 description 1
- GOXQRTZXKQZDDN-UHFFFAOYSA-N 2-Ethylhexyl acrylate Chemical compound CCCCC(CC)COC(=O)C=C GOXQRTZXKQZDDN-UHFFFAOYSA-N 0.000 description 1
- COBPKKZHLDDMTB-UHFFFAOYSA-N 2-[2-(2-butoxyethoxy)ethoxy]ethanol Chemical compound CCCCOCCOCCOCCO COBPKKZHLDDMTB-UHFFFAOYSA-N 0.000 description 1
- LTHJXDSHSVNJKG-UHFFFAOYSA-N 2-[2-[2-[2-(2-methylprop-2-enoyloxy)ethoxy]ethoxy]ethoxy]ethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCOCCOCCOCCOC(=O)C(C)=C LTHJXDSHSVNJKG-UHFFFAOYSA-N 0.000 description 1
- LSRXVFLSSBNNJC-UHFFFAOYSA-N 2-[2-[2-[2-[2-(2-phenoxyethoxy)ethoxy]ethoxy]ethoxy]ethoxy]ethanol Chemical compound OCCOCCOCCOCCOCCOCCOC1=CC=CC=C1 LSRXVFLSSBNNJC-UHFFFAOYSA-N 0.000 description 1
- FDSUVTROAWLVJA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol;prop-2-enoic acid Chemical compound OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OC(=O)C=C.OCC(CO)(CO)COCC(CO)(CO)CO FDSUVTROAWLVJA-UHFFFAOYSA-N 0.000 description 1
- PTJDGKYFJYEAOK-UHFFFAOYSA-N 2-butoxyethyl prop-2-enoate Chemical compound CCCCOCCOC(=O)C=C PTJDGKYFJYEAOK-UHFFFAOYSA-N 0.000 description 1
- ZCDADJXRUCOCJE-UHFFFAOYSA-N 2-chlorothioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(Cl)=CC=C3SC2=C1 ZCDADJXRUCOCJE-UHFFFAOYSA-N 0.000 description 1
- WROUWQQRXUBECT-UHFFFAOYSA-N 2-ethylacrylic acid Chemical compound CCC(=C)C(O)=O WROUWQQRXUBECT-UHFFFAOYSA-N 0.000 description 1
- WDQMWEYDKDCEHT-UHFFFAOYSA-N 2-ethylhexyl 2-methylprop-2-enoate Chemical compound CCCCC(CC)COC(=O)C(C)=C WDQMWEYDKDCEHT-UHFFFAOYSA-N 0.000 description 1
- 125000000954 2-hydroxyethyl group Chemical group [H]C([*])([H])C([H])([H])O[H] 0.000 description 1
- BQZJOQXSCSZQPS-UHFFFAOYSA-N 2-methoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OC)C(=O)C1=CC=CC=C1 BQZJOQXSCSZQPS-UHFFFAOYSA-N 0.000 description 1
- XBGVQVDENOPZGD-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-ol Chemical compound C1=CC(SC)=CC=C1C(O)C(C)(C)N1CCOCC1 XBGVQVDENOPZGD-UHFFFAOYSA-N 0.000 description 1
- BPAMXFRUKPLDNS-UHFFFAOYSA-N 2-methyl-3-sulfoprop-2-enoic acid Chemical compound OC(=O)C(C)=CS(O)(=O)=O BPAMXFRUKPLDNS-UHFFFAOYSA-N 0.000 description 1
- KLLLJCACIRKBDT-UHFFFAOYSA-N 2-phenyl-1H-indole Chemical compound N1C2=CC=CC=C2C=C1C1=CC=CC=C1 KLLLJCACIRKBDT-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- XPFCZYUVICHKDS-UHFFFAOYSA-N 3-methylbutane-1,3-diol Chemical compound CC(C)(O)CCO XPFCZYUVICHKDS-UHFFFAOYSA-N 0.000 description 1
- FQMIAEWUVYWVNB-UHFFFAOYSA-N 3-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OC(C)CCOC(=O)C=C FQMIAEWUVYWVNB-UHFFFAOYSA-N 0.000 description 1
- XOJWAAUYNWGQAU-UHFFFAOYSA-N 4-(2-methylprop-2-enoyloxy)butyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCOC(=O)C(C)=C XOJWAAUYNWGQAU-UHFFFAOYSA-N 0.000 description 1
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 description 1
- JHWGFJBTMHEZME-UHFFFAOYSA-N 4-prop-2-enoyloxybutyl prop-2-enoate Chemical compound C=CC(=O)OCCCCOC(=O)C=C JHWGFJBTMHEZME-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- MHZGKXUYDGKKIU-UHFFFAOYSA-N Decylamine Chemical compound CCCCCCCCCCN MHZGKXUYDGKKIU-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000006845 Michael addition reaction Methods 0.000 description 1
- GQWNECFJGBQMBO-UHFFFAOYSA-N Molindone hydrochloride Chemical compound Cl.O=C1C=2C(CC)=C(C)NC=2CCC1CN1CCOCC1 GQWNECFJGBQMBO-UHFFFAOYSA-N 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical group OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229920002873 Polyethylenimine Polymers 0.000 description 1
- 244000028419 Styrax benzoin Species 0.000 description 1
- 235000000126 Styrax benzoin Nutrition 0.000 description 1
- 235000008411 Sumatra benzointree Nutrition 0.000 description 1
- DAKWPKUUDNSNPN-UHFFFAOYSA-N Trimethylolpropane triacrylate Chemical compound C=CC(=O)OCC(CC)(COC(=O)C=C)COC(=O)C=C DAKWPKUUDNSNPN-UHFFFAOYSA-N 0.000 description 1
- OKKRPWIIYQTPQF-UHFFFAOYSA-N Trimethylolpropane trimethacrylate Chemical compound CC(=C)C(=O)OCC(CC)(COC(=O)C(C)=C)COC(=O)C(C)=C OKKRPWIIYQTPQF-UHFFFAOYSA-N 0.000 description 1
- BDAHDQGVJHDLHQ-UHFFFAOYSA-N [2-(1-hydroxycyclohexyl)phenyl]-phenylmethanone Chemical compound C=1C=CC=C(C(=O)C=2C=CC=CC=2)C=1C1(O)CCCCC1 BDAHDQGVJHDLHQ-UHFFFAOYSA-N 0.000 description 1
- JUDXBRVLWDGRBC-UHFFFAOYSA-N [2-(hydroxymethyl)-3-(2-methylprop-2-enoyloxy)-2-(2-methylprop-2-enoyloxymethyl)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)(COC(=O)C(C)=C)COC(=O)C(C)=C JUDXBRVLWDGRBC-UHFFFAOYSA-N 0.000 description 1
- HVVWZTWDBSEWIH-UHFFFAOYSA-N [2-(hydroxymethyl)-3-prop-2-enoyloxy-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(CO)(COC(=O)C=C)COC(=O)C=C HVVWZTWDBSEWIH-UHFFFAOYSA-N 0.000 description 1
- UKMBKKFLJMFCSA-UHFFFAOYSA-N [3-hydroxy-2-(2-methylprop-2-enoyloxy)propyl] 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(CO)OC(=O)C(C)=C UKMBKKFLJMFCSA-UHFFFAOYSA-N 0.000 description 1
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 1
- ARNIZPSLPHFDED-UHFFFAOYSA-N [4-(dimethylamino)phenyl]-(4-methoxyphenyl)methanone Chemical compound C1=CC(OC)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 ARNIZPSLPHFDED-UHFFFAOYSA-N 0.000 description 1
- FHLPGTXWCFQMIU-UHFFFAOYSA-N [4-[2-(4-prop-2-enoyloxyphenyl)propan-2-yl]phenyl] prop-2-enoate Chemical compound C=1C=C(OC(=O)C=C)C=CC=1C(C)(C)C1=CC=C(OC(=O)C=C)C=C1 FHLPGTXWCFQMIU-UHFFFAOYSA-N 0.000 description 1
- KJJDOVCMEMMAQN-UHFFFAOYSA-N [P].C(C)OC(C(=C)C)=O Chemical compound [P].C(C)OC(C(=C)C)=O KJJDOVCMEMMAQN-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000002947 alkylene group Chemical group 0.000 description 1
- 235000019169 all-trans-retinol Nutrition 0.000 description 1
- 239000011717 all-trans-retinol Substances 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000003863 ammonium salts Chemical group 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 235000006708 antioxidants Nutrition 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 239000007900 aqueous suspension Substances 0.000 description 1
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 description 1
- TXVHTIQJNYSSKO-UHFFFAOYSA-N benzo[e]pyrene Chemical compound C1=CC=C2C3=CC=CC=C3C3=CC=CC4=CC=C1C2=C34 TXVHTIQJNYSSKO-UHFFFAOYSA-N 0.000 description 1
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 1
- 229960002130 benzoin Drugs 0.000 description 1
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 1
- 239000012965 benzophenone Substances 0.000 description 1
- QUZSUMLPWDHKCJ-UHFFFAOYSA-N bisphenol A dimethacrylate Chemical compound C1=CC(OC(=O)C(=C)C)=CC=C1C(C)(C)C1=CC=C(OC(=O)C(C)=C)C=C1 QUZSUMLPWDHKCJ-UHFFFAOYSA-N 0.000 description 1
- 229920001400 block copolymer Polymers 0.000 description 1
- 235000019437 butane-1,3-diol Nutrition 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- STVZJERGLQHEKB-UHFFFAOYSA-N ethylene glycol dimethacrylate Chemical compound CC(=C)C(=O)OCCOC(=O)C(C)=C STVZJERGLQHEKB-UHFFFAOYSA-N 0.000 description 1
- WHRIKZCFRVTHJH-UHFFFAOYSA-N ethylhydrazine Chemical compound CCNN WHRIKZCFRVTHJH-UHFFFAOYSA-N 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 235000019382 gum benzoic Nutrition 0.000 description 1
- OTTZHAVKAVGASB-UHFFFAOYSA-N hept-2-ene Chemical group CCCCC=CC OTTZHAVKAVGASB-UHFFFAOYSA-N 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000000879 imine group Chemical group 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- CDOSHBSSFJOMGT-UHFFFAOYSA-N linalool Chemical compound CC(C)=CCCC(C)(O)C=C CDOSHBSSFJOMGT-UHFFFAOYSA-N 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- HSDFKDZBJMDHFF-UHFFFAOYSA-N methyl 3-ethoxypropanoate Chemical compound CCOCCC(=O)OC HSDFKDZBJMDHFF-UHFFFAOYSA-N 0.000 description 1
- 239000011268 mixed slurry Substances 0.000 description 1
- KMBPCQSCMCEPMU-UHFFFAOYSA-N n'-(3-aminopropyl)-n'-methylpropane-1,3-diamine Chemical compound NCCCN(C)CCCN KMBPCQSCMCEPMU-UHFFFAOYSA-N 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001610 polycaprolactone Chemical group 0.000 description 1
- 239000004632 polycaprolactone Chemical group 0.000 description 1
- 125000003367 polycyclic group Chemical group 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- AMLFJZRZIOZGPW-UHFFFAOYSA-N prop-1-en-1-amine Chemical group CC=CN AMLFJZRZIOZGPW-UHFFFAOYSA-N 0.000 description 1
- NHARPDSAXCBDDR-UHFFFAOYSA-N propyl 2-methylprop-2-enoate Chemical compound CCCOC(=O)C(C)=C NHARPDSAXCBDDR-UHFFFAOYSA-N 0.000 description 1
- PNXMTCDJUBJHQJ-UHFFFAOYSA-N propyl prop-2-enoate Chemical compound CCCOC(=O)C=C PNXMTCDJUBJHQJ-UHFFFAOYSA-N 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 210000002700 urine Anatomy 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09C—TREATMENT OF INORGANIC MATERIALS, OTHER THAN FIBROUS FILLERS, TO ENHANCE THEIR PIGMENTING OR FILLING PROPERTIES ; PREPARATION OF CARBON BLACK ; PREPARATION OF INORGANIC MATERIALS WHICH ARE NO SINGLE CHEMICAL COMPOUNDS AND WHICH ARE MAINLY USED AS PIGMENTS OR FILLERS
- C09C1/00—Treatment of specific inorganic materials other than fibrous fillers; Preparation of carbon black
- C09C1/44—Carbon
- C09C1/48—Carbon black
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D17/00—Pigment pastes, e.g. for mixing in paints
- C09D17/002—Pigment pastes, e.g. for mixing in paints in organic medium
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/19—Oil-absorption capacity, e.g. DBP values
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/60—Optical properties, e.g. expressed in CIELAB-values
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Pigments, Carbon Blacks, Or Wood Stains (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
Description
本發明係有關於一種使用在液晶面板黑矩陣形成之黑矩陣用顏料分散組成物以及含有此黑矩陣用顏料分散組成物之黑矩陣用顏料分散光阻組成物。The present invention relates to a pigment dispersion composition for a black matrix formed using a black matrix of a liquid crystal panel, and a pigment dispersion resist composition for a black matrix containing the pigment dispersion composition for a black matrix.
液晶顯示方式多使用於電腦、彩色電視、手機及攝影機等之影像顯示元件上。液晶影像顯示元件係利用形成有各色畫素之彩色濾光片及具有光閘作用之液晶，來將影像於畫面上。The liquid crystal display mode is mostly used on image display elements such as computers, color televisions, mobile phones, and video cameras. The liquid crystal image display element uses a color filter in which respective color pixels are formed and a liquid crystal having a shutter function to image the image on the screen.
其次，彩色濾光片通常是先在玻璃、塑膠片等透明基板的表面上，形成具有條狀(strip)或馬賽克狀(mosaic)等之開口部的黑色矩陣(黑矩陣，black matrix)，接著，再依序於開口部上形成紅、綠、藍等3種以上不同顏色之畫素，而完成者。Next, the color filter is usually formed on a surface of a transparent substrate such as a glass or a plastic sheet to form a black matrix (black matrix) having a strip or a mosaic or the like. Then, three or more different color pixels of red, green, and blue are formed on the opening in order, and are completed.
在此處，黑矩陣的功能是控制各顏色間的混合及藉由防止漏光而達到提升對比的效果。因此，基於高遮光性的要求，過去薄膜皆使用遮光性高之鉻等蒸鍍膜。然而，由於其形成步驟複雜且價格高等理由，近來已改為使用含有顏料及感光性樹脂之顯影成像法(Photolithography，顏料法)。Here, the function of the black matrix is to control the mixing between the colors and to achieve the effect of improving the contrast by preventing light leakage. Therefore, in the past, the film has been used as a vapor deposition film such as chromium having a high light-shielding property. However, development imaging methods (photolithography) containing a pigment and a photosensitive resin have recently been used instead due to the complicated formation steps and high cost.
上述的顏料法，係將碳黑等之黑色顏料或數種顏料以調成黑色之方式來組合使用之。In the above pigment method, a black pigment such as carbon black or a plurality of pigments are used in combination to form a black color.
進而，為了得到高遮光性，勢必要大大提高顏料本身的含量，然而當顏料濃度愈高時，顯影性、解析度、密著性、穩定性等之其他必要特性會降低，而對遮光性之提高造成限制。另一方面，就形成彩色濾光片之皮膜而言，亦被要求薄膜化，在顏料必須以高濃度來因應的狀況下，更加助長導致了分散穩定性及流動性降低之結果。Further, in order to obtain high light-shielding property, it is necessary to greatly increase the content of the pigment itself. However, when the pigment concentration is higher, other necessary characteristics such as developability, resolution, adhesion, stability, and the like are lowered, and the light-shielding property is lowered. Increase the restrictions. On the other hand, in the case of forming a film of a color filter, film formation is required, and in the case where the pigment must be applied at a high concentration, the dispersion stability and fluidity are further promoted.
因此，為了解決上述問題，遂有以下方案被提出：使用了比表面積110m2 /g以下、pH為2~9之碳黑，以及由具有鹼性官能基之聚酯或聚醚所構成的高分子分散劑而組成之感光性樹脂(例如，特開平10－082908號公報)；使用了平均一次粒子徑20~30nm、DBP吸油量140ml/100 g以下、pH為2.5~4之碳黑，以及胺值1~100mgKOH/g的有機化合物系分散劑所組成之碳黑分散液(例如，特開2004－292672號公報)。如上所述般的顏料分散物，具有即使是在高顏料濃度下，分散穩定性、流動性皆非常良好之特徵。Therefore, in order to solve the above problems, the following scheme has been proposed: a carbon black having a specific surface area of 110 m 2 /g or less, a pH of 2 to 9, and a polyester composed of a polyester or a polyether having a basic functional group are used. A photosensitive resin composed of a molecular dispersing agent (for example, JP-A-10-082908); carbon black having an average primary particle diameter of 20 to 30 nm, a DBP oil absorption of 140 ml/100 g or less, and a pH of 2.5 to 4, and A carbon black dispersion liquid composed of an organic compound-based dispersant having an amine value of 1 to 100 mgKOH/g (for example, JP-A-2004-292672). The pigment dispersion as described above has a feature that dispersion stability and fluidity are excellent even at a high pigment concentration.
然而，近來在彩色液晶顯示裝置中，色彩鮮明度與銷售量的增加幅度成正比關係，故市場對於提升色彩鮮明度之期待也非常地強烈。因此，對於肇因於彩色濾光片或黑矩陣圖案之形成不良，而導致了色漏等會損及色彩鮮明度之成因，已變成非常重大的研究課題。However, recently, in color liquid crystal display devices, the color sharpness is directly proportional to the increase in sales volume, so the market is also very strong in anticipation for improving color vividness. Therefore, it has become a very important research topic for the formation of color filters or black matrix patterns, which causes color leakage and the like to cause color sharpness.
就以顯影成像法來形成黑矩陣而言，首先，係將黑矩陣用光阻組成物塗佈於基板上。之後，再藉由具有既定圖案之光罩以紫外線進行曝光，並使曝光部的塗膜硬化。接著，利用顯影液去除未曝光部份之塗膜，就形成出如同上述既定圖案之黑矩陣。此時，為了得到良好的圖案，就必須要求光阻組成物具有良好的圖案再現性。例如，在顯影終了時，必須達到在未曝光部份中沒有顯影殘渣，曝光部具有足夠的細線再現性，以及能形成出銳利的邊緣之圖案等。In order to form a black matrix by a development imaging method, first, a black matrix photoresist composition is applied onto a substrate. Thereafter, the film is exposed to ultraviolet light by a mask having a predetermined pattern, and the coating film of the exposed portion is cured. Next, the coating film of the unexposed portion is removed by the developer to form a black matrix like the predetermined pattern described above. At this time, in order to obtain a good pattern, it is necessary to require the photoresist composition to have good pattern reproducibility. For example, at the end of development, it is necessary to achieve no development residue in the unexposed portion, the exposed portion has sufficient fine line reproducibility, and a pattern which can form a sharp edge or the like.
然而，作為黑矩陣，不只遮光性很高，對於紫外線之遮光性也高。因此，在曝光部份中，即使塗膜表面已硬化，靠近基板之邊緣仍會因紫外線無法到達，而呈現未硬化前的原狀態。然後，未硬化的殘餘部分就會被顯影液慢慢地侵蝕而變細，最終導致曝光部份也被全部去除，而產生黑矩陣消失之現象。However, as a black matrix, not only the light-shielding property is high, but also the light-shielding property with respect to ultraviolet rays is high. Therefore, in the exposed portion, even if the surface of the coating film is hardened, the edge near the substrate is still unreachable by the ultraviolet rays, and the original state before the hardening is exhibited. Then, the unhardened residual portion is gradually eroded and thinned by the developer, and finally the exposed portion is also completely removed, and the black matrix disappears.
從完全地去除如上所述般的未曝光部，到曝光部變細而無法得到符合當作黑矩陣之規定機能間的時間長度，稱為『顯影寬容度(margin)』(Development Latitude)。此顯影寬容度較少者，由於未曝光部份去除後，馬上會造成曝光部變細或消失，因此很難弄清楚停止顯影的時機點。特別是前述的已高顏料濃度化之光阻組成物，因其在曝光部中之未硬化比例容易變高，所以無法取得足夠的顯影寬容度。因此，會產生未曝光部無法完全地被去除，曝光部變細而無法得到符合規定之機能等在工程管理層面而言非常大的問題。The "exposure Latitude" is called "developing latitude" from the fact that the unexposed portion as described above is completely removed, and the exposure portion is thinned so that the length of time between the functions defined as the black matrix cannot be obtained. In this case where the development latitude is small, since the exposed portion is thinned or disappeared immediately after the unexposed portion is removed, it is difficult to ascertain the timing of stopping the development. In particular, the above-described photoresist composition having a high pigment concentration tends to be high in the unhardened ratio in the exposed portion, so that sufficient development latitude cannot be obtained. Therefore, there is a problem in that the unexposed portion cannot be completely removed, and the exposure portion is thinned, and it is impossible to obtain a function that meets the prescribed performance, which is extremely large at the engineering management level.
在此處，本發明之課題係提供一種遮光性良好、且顯影寬容度大的黑矩陣用顏料分散組成物及含有此黑矩陣用顏料分散組成物之黑矩陣用顏料分散光阻組成物。An object of the present invention is to provide a pigment dispersion composition for a black matrix having good light-shielding properties and a large development latitude, and a pigment dispersion resist composition for a black matrix containing the pigment dispersion composition for a black matrix.
本發明者等，經過反覆研究之結果，發現藉由使用吸油量為10~150ml/100g、pH值範圍大於9之碳黑，就可解決上述之課題，本發明於是完成。As a result of repeated studies, the inventors of the present invention have found that the above problems can be solved by using carbon black having an oil absorption of 10 to 150 ml/100 g and a pH range of more than 9, and the present invention is completed.
亦即，本發明(1)係有關於一種黑矩陣用顏料分散組成物，其特徵在於：令吸油量為10~150ml/100g、pH值範圍大於9之碳黑，分散於溶劑中。That is, the present invention (1) relates to a pigment dispersion composition for a black matrix, which is characterized in that carbon black having an oil absorption amount of 10 to 150 ml/100 g and a pH range of more than 9 is dispersed in a solvent.
又，本發明(2)係有關於：如上述(1)中所述之黑矩陣用顏料分散組成物，其中上述碳黑的吸油量為10~70ml/100g。Further, the present invention (2) is the pigment dispersion composition for a black matrix according to the above (1), wherein the carbon black has an oil absorption of 10 to 70 ml/100 g.
又，本發明(3)係有關於：如上述(1)或(2)中所述之黑矩陣用顏料分散組成物，其中為了令上述碳黑分散，更包括有：含鹼性基顏料分散劑。Further, the present invention (3) relates to the pigment dispersion composition for a black matrix according to the above (1) or (2), wherein, in order to disperse the carbon black, it further comprises: dispersion of a basic-based pigment Agent.
又，本發明(4)係有關於：如上述(3)中所述之黑矩陣用顏料分散組成物，其中為了令上述碳黑分散，更包括有：擇自於由含酸基顏料衍生物、含酸基色素衍生物、含酸基色素中間體及含酸基樹脂所構成之族群中至少1種物質。Further, the present invention (4) relates to the pigment dispersion composition for a black matrix as described in the above (3), wherein, in order to disperse the carbon black, it further comprises: selecting an acid-based pigment derivative At least one of a group consisting of an acid-based dye derivative, an acid-based dye intermediate, and an acid-containing resin.
又，本發明(5)係有關於：如上述(3)或(4)中所述之黑矩陣用顏料分散組成物，其中上述含鹼性基顏料分散劑係擇自於：由含鹼性基尿烷系高分子顏料分散劑、含鹼性基聚酯系高分子顏料分散劑及含鹼性基丙烯系高分子顏料分散劑所構成之族群中至少1種物質。Further, the present invention (5) is the pigment dispersion composition for a black matrix according to the above (3) or (4), wherein the basic-based pigment dispersant is selected from the group consisting of alkaline At least one of a group consisting of a urethane-based polymer pigment dispersant, a basic-based polyester-based polymer pigment dispersant, and a basic propylene-based polymer pigment dispersant.
又，本發明(6)係有關於：如上述(5)中所述之黑矩陣用顏料分散組成物，其中上述含鹼性基尿烷系高分子顏料分散劑係具有：擇自於由聚酯鏈、聚醚鏈及聚碳酸酯鏈所構成之族群中至少1種物質。Further, the present invention (6) is the pigment dispersion composition for a black matrix according to the above (5), wherein the basic urethane-containing polymer pigment dispersant contains: At least one of the group consisting of an ester chain, a polyether chain, and a polycarbonate chain.
又，本發明(7)係有關於：如上述(4)~(6)中所述之任一黑矩陣用顏料分散組成物，其中上述含酸基顏料衍生物係為具有磺酸基之酞菁(Phthalocyanine)衍生物。Further, the present invention (7) is the pigment dispersion composition for any of the above-mentioned (4) to (6), wherein the acid-based pigment derivative is a sulfonic acid group. Phthalocyanine derivative.
又，本發明(8)係有關於：如上述(4)~(6)中所述之任一黑矩陣用顏料分散組成物，其中上述含酸基樹脂係為酸值10~300mgKOH/g之含酸基共聚合物樹脂。The present invention (8), wherein the acid-containing resin is an acid value of 10 to 300 mgKOH/g, as described in any one of the above (4) to (6). An acid group-containing copolymer resin.
又，本發明(9)係有關於一種黑矩陣用顏料分散光阻組成物，包括：如上述(1)~(8)中所述之任一黑矩陣用顏料分散組成物、鹼可溶性樹脂、光聚合性化合物、以及光聚合引發劑。Further, the present invention (9) relates to a pigment dispersion resist composition for a black matrix, comprising: a pigment dispersion composition for a black matrix as described in the above (1) to (8), an alkali-soluble resin, A photopolymerizable compound and a photopolymerization initiator.
以下，就本發明之黑矩陣用顏料分散組成物以及含有此黑矩陣用顏料分散組成物之黑矩陣用顏料分散光阻組成物進行詳細的說明。Hereinafter, the pigment dispersion composition for a black matrix of the present invention and the pigment dispersion resist composition for a black matrix containing the pigment dispersion composition for a black matrix will be described in detail.
首先，針對本發明之黑矩陣用顏料分散組成物來進行說明。First, the pigment dispersion composition for a black matrix of the present invention will be described.
以構成本發明的黑矩陣用顏料分散組成物之碳黑而言，可使用吸油量為10~150ml/100g、pH值範圍大於9之碳黑。As the carbon black constituting the pigment dispersion composition for a black matrix of the present invention, carbon black having an oil absorption of 10 to 150 ml/100 g and a pH range of more than 9 can be used.
吸油量若從對於溶劑的分散性之觀點來看，必須在10~150ml/100g的範圍內，並以在10~70ml/100g的範圍內較佳、30~60ml/100g的範圍內更佳。The oil absorption amount is preferably in the range of 10 to 150 ml/100 g from the viewpoint of dispersibility to the solvent, and more preferably in the range of 10 to 70 ml/100 g, and more preferably 30 to 60 ml/100 g.
在此處，本發明所謂的吸油量，係指將碳黑與亞麻仁油混合後，於其混合漿料中，相對於100克碳黑開始出現流動性時之亞麻仁油ml數(德國工業品標準規格DIN53601)。又，pH值範圍必須大於9，並以在9.1~12的pH值範圍內為較佳。若pH值範圍在9以下，則顯影寬容度就會降低，故較不佳。Here, the so-called oil absorption amount in the present invention refers to the number of linseed oil in the mixed slurry after the carbon black and the linseed oil are mixed, and the fluidity starts to occur with respect to 100 g of carbon black (German industry) Product standard specification DIN53601). Further, the pH range must be greater than 9, and preferably in the pH range of 9.1 to 12. If the pH is in the range of 9 or less, the development latitude is lowered, which is not preferable.
pH值之測定，係先將碳黑1g加入在已去除掉碳酸的蒸餾水(pH為7.0)20ml中，並以磁力攪拌器進行混合而調製出水性懸浮液，再使用玻璃電極於25℃下完成測量(德國工業品標準規格DIN ISO 787/9)。The pH value was determined by first adding 1 g of carbon black to 20 ml of distilled water (pH 7.0) from which carbonic acid had been removed, and mixing it with a magnetic stirrer to prepare an aqueous suspension, which was then completed at 25 ° C using a glass electrode. Measurement (German Industrial Standard Specification DIN ISO 787/9).
以具體的碳黑之例而言，例如：CABOT公司製的ELFTEX8；DEGUSSA公司製的PRINTEX3、25、30、35、40、55、60、75、85、95、200、300等。Examples of the specific carbon black include, for example, ELFTEX8 manufactured by CABOT Co., Ltd.; PRINTEX 3, 25, 30, 35, 40, 55, 60, 75, 85, 95, 200, 300, and the like manufactured by DEGUSSA.
以構成本發明的黑矩陣用顏料分散組成物之溶劑而言，係以可使習知以來所使用的顏料穩定地分散、且能溶解後述之含鹼性基顏料分散劑及含酸基樹脂者為佳，其中更佳者係為：在常壓(1.013*102 kPa)下之沸點為100~250℃之酯系有機溶劑、醚系有機溶劑、醚酯系有機溶劑、酮系有機溶劑、芳香族碳氫化合物系有機溶劑及含氮系有機溶劑等。The solvent constituting the pigment dispersion composition for a black matrix of the present invention is such that the pigment used in the prior art can be stably dispersed and the base-based pigment-dispersing agent and the acid-containing resin described later can be dissolved. Preferably, the preferred one is an ester organic solvent having a boiling point of 100 to 250 ° C under normal pressure (1.013*10 2 kPa), an ether organic solvent, an ether ester organic solvent, a ketone organic solvent, The aromatic hydrocarbon is an organic solvent, a nitrogen-containing organic solvent, or the like.
以上述般的溶劑來說，具體而言可舉例如：乙二醇一甲醚、乙二醇一***、乙二醇一異丙醚、乙二醇一丁醚、二乙二醇一甲醚、二乙二醇一***、丙二醇一甲醚、丙二醇一***、丙二醇一丁醚、二乙二醇二***、二乙二醇二甲醚、二乙二醇甲***等之醚系有機溶劑類；乙二醇一甲醚乙酸酯、乙二醇一***乙酸酯、乙二醇一丁醚乙酸酯、丙二醇一甲醚乙酸酯、丙二醇一***乙酸酯等之醚酯系有機溶劑類；甲基異丁基甲酮、環己酮、2－庚烷、δ－丁內醯胺等之酮系有機溶劑類；2－羥基丙酸甲酯、2－羥基丙酸乙酯、2－羥基－2－甲基丙酸乙酯、3－甲基－3－甲氧基丁基丙酸酯、3－甲氧基丙酸甲酯、3－甲氧基丙酸乙酯、3－乙氧基丙酸甲酯、3－乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸酯、甲酸正戊酯等之酯系有機溶劑類；N－甲基吡咯烷酮(N－methyl pyrrolidone)、N,N－二甲基甲醯胺、N,N－二甲基乙醯胺等之含氮系有機溶劑類等等。上述等有機溶劑可單獨使用或混合兩種以上來使用之。Specific examples of the solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, and diethylene glycol monomethyl ether. Ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ether, etc. Ethyl esters of ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc. Solvents; ketone organic solvents such as methyl isobutyl ketone, cyclohexanone, 2-heptane, δ-butyrolactam; methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, 2- Ethyl hydroxy-2-methylpropionate, 3-methyl-3-methoxybutylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-B An ester-based organic solvent such as methyl oxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, hydroxyacetate or n-amyl formate; N-methylpyrrolidone (N-methyl) Pyrro A nitrogen-containing organic solvent such as lidone), N,N-dimethylformamide, N,N-dimethylacetamide or the like. The above organic solvents may be used singly or in combination of two or more.
就構成本發明的黑矩陣用顏料分散組成物之含鹼性基顏料分散劑而言，可使用例如：陰離子性界面活性劑、含鹼性基聚酯系顏料分散劑、含鹼性基丙烯系顏料分散劑、含鹼性基尿烷系顏料分散劑、含鹼性基碳化二亞胺系顏料分散劑等。For the basic-based pigment dispersant constituting the pigment dispersion composition for a black matrix of the present invention, for example, an anionic surfactant, a basic-based polyester-based pigment dispersant, and a basic-based propylene-based compound can be used. A pigment dispersant, a basic urethane-based pigment dispersant, a basic carbodiimide-based pigment dispersant, and the like.
上述等之含鹼性基顏料分散劑可單獨使用，或者，亦可組合兩種以上使用之。其中，若從可得到良好的顏料分散性之觀點而言，則係以含鹼性基高分子顏料分散劑為較佳。The above-mentioned basic-based pigment-dispersing agents may be used singly or in combination of two or more. Among them, from the viewpoint of obtaining good pigment dispersibility, a basic-based polymer pigment dispersant is preferred.
以含鹼性基高分子顏料分散劑之具體例來說，可舉例如下：(1)由聚胺化合物(例如，聚烯丙胺、聚乙烯胺、聚乙烯聚亞胺等之聚(低級烷撐胺)等)之胺基及/或亞胺基，以及擇自從具有游離的羧基之聚酯、聚烯胺和聚酯醯胺等所構成之族群中至少1種物質所得出的反應生成物(特開2001－59906號公報)；(2)由聚(低級)烷撐亞胺、甲基亞氨基雙丙基胺等之低分子氨基化合物，以及具有游離的羧基之聚酯所得出的反應生成物(特開昭54－37082號公報、特開平01－311177號公報)；(3)於聚異氰酸酯化合物的異氰酸酯基中，依序加入下述物質進行反應所得到的反應生成物(特開平02－612號公報)：具有1個甲氧基聚乙二醇等之醇類或己內酯聚酯等之氫氧基的聚酯類，具有2~3個異氰酸酯基反應性官能基之化合物，具有異氰酸酯基反應性官能基及第3級氨基之脂肪族或雜環碳氫化合物；(4)於具有醇性氫氧基之丙烯酸酯的聚合物中，加入聚異氰酸酯化合物及具有氨基之碳氫化合物所反應得到的生成物；(5)於低分子氨基化合物中，進行聚醚鏈加成反應所得到的反應生成物；(6)於具有聚異氰酸酯基之化合物中，令具有氨基之化合物進行反應所得到的反應生成物(特開平04－210220號公報)；(7)於聚環氧基化合物中，加入具有游離的羧基之直鏈狀聚合物及具有1個2級氨基之有機胺化合物進行反應所得到的反應生成物(特開平09－87537號公報)；(8)由在片末端具有可跟氨基反應的官能基之聚碳酸酯化合物跟聚胺化合物所得出的反應生成物(特開平09－194585號公報)；(9)由擇自甲基甲基丙烯酸酯、乙基甲基丙烯酸酯、丙基甲基丙烯酸酯、丁基甲基丙烯酸酯、硬脂醯甲基丙烯酸酯、苄基甲基丙烯酸酯、甲基丙烯酸酯、乙基丙烯酸酯、丙基丙烯酸酯、丁基丙烯酸酯、硬脂醯丙烯酸酯、苄基丙烯酸酯等之甲基丙烯酸酯或丙烯酸酯中至少1種物質，丙烯醯胺、甲基丙烯醯胺、N－甲撐醯胺、乙烯基咪唑(vinyl imidazole)、乙烯基吡啶(vinyl pyridine)、具有氨基和聚已內酯骨幹之單體等的含鹼性基聚合單體中至少1種物質，以及苯乙烯、苯乙烯衍生物、其他聚合性單體中至少1種物質，所共同反應得到的共聚合物(特開平01－164429號公報)；(10)含鹼性基碳化二亞胺系顏料分散劑(國際公開WO 04/000950號公報)；(11)由具有3級氨基、4級銨鹽基等鹼性基之嵌塊，以及不具有官能基的嵌塊所構成之嵌塊共聚合物(參照特開2005－55814號之記載)；(12)於聚烯丙基胺中，令聚碳酸酯化合物進行麥可加成(Michael addition)反應所得到之顏料分散劑(特開平09－194585號公報)；(13)分別具有至少1個聚丁二烯鏈和鹼性含氮基之碳化二亞胺系化合物(特開2006－257243號公報)；(14)分別具有至少1個於分子內具有醯胺基的側鏈和鹼性含氮基之碳化二亞胺系化合物(特開2006－176657號公報)等等。Specific examples of the basic polymer-containing polymeric pigment dispersing agent can be exemplified as follows: (1) Polyamine (for example, polyallylamine, polyvinylamine, polyethyleneimine, etc.) (lower alkylene) An amine group and/or an imine group of an amine) or the like, and a reaction product obtained from at least one substance selected from the group consisting of a polyester having a free carboxyl group, a polyenamine, and a polyester decylamine ( JP-A-2001-59906); (2) Reaction formation of a low molecular weight amino compound such as poly(lower) alkyleneimine or methyliminobispropylamine, and a polyester having a free carboxyl group (3) In the isocyanate group of the polyisocyanate compound, the reaction product obtained by the following reaction is added to the isocyanate group of the polyisocyanate compound (Executive 02) Japanese Patent Publication No. 612: a polyester having a hydroxyl group such as an alcohol such as methoxypolyethylene glycol or a caprolactone polyester, and a compound having 2 to 3 isocyanate-reactive functional groups. An aliphatic or heterocyclic hydrocarbon having an isocyanate-reactive functional group and a third-order amino group; 4) a polymer obtained by reacting a polyisocyanate compound and a hydrocarbon having an amino group in a polymer having an acrylate having an alcoholic hydroxyl group; (5) performing a polyether chain addition in a low molecular amino compound (6) a reaction product obtained by reacting a compound having an amino group in a compound having a polyisocyanate group (JP-A-2004-210220); (7) in a polycyclic ring In the oxy compound, a reaction product obtained by reacting a linear polymer having a free carboxyl group and an organic amine compound having one quaternary amino group (JP-A-09-87537); (8) a reaction product of a polycarbonate compound having a functional group reactive with an amino group at the end of the sheet and a polyamine compound (JP-A-09-194585); (9) selected from methyl methacrylate and ethyl Methacrylate, propyl methacrylate, butyl methacrylate, stearin methacrylate, benzyl methacrylate, methacrylate, ethacrylate, propyl acrylate, butyl propylene At least one of methacrylate or acrylate of ester, stearin acrylate, benzyl acrylate, etc., acrylamide, methacrylamide, N-methylamine, vinyl imidazole At least one of a basic group-containing polymerizable monomer such as vinyl pyridine, a monomer having an amino group and a polycaprolactone backbone, and styrene, a styrene derivative, and other polymerizable monomers a copolymer obtained by co-reacting at least one substance (JP-A No. 01-164429); (10) a basic-based carbodiimide-based pigment dispersant (International Publication WO 04/000950); (11) a block copolymer composed of a block having a basic group such as a 3-stage amino group, a 4-stage ammonium salt group, and a block having no functional group (refer to JP-A-2005-55814); (12) A pigment dispersant obtained by subjecting a polycarbonate compound to a Michael addition reaction in a polyallylamine (Japanese Patent Laid-Open Publication No. Hei 09-194585); (13) having at least one Polybutadiene chain and basic nitrogen-containing carbodiimide compound (JP-2006-257243) Publication); (14) each having at least one carbodiimide-based side chain and a compound having a basic nitrogen-containing groups of the acyl group in the molecule (Laid-Open Patent Publication No. 2006-176657) and the like.
在上述等之含鹼性基高分子顏料分散劑中，係以含鹼性基尿烷系高分子顏料分散劑、含鹼性基聚酯系高分子顏料分散劑、含鹼性基丙烯系高分子顏料分散劑為較佳，並以含氨基尿烷系高分子顏料分散劑、含氨基聚酯系高分子顏料分散劑、含氨基丙烯系高分子顏料分散劑更佳。尤其，又以含鹼性基尿烷系高分子顏料分散劑為特佳，尤其以由擇自於從聚酯鏈、聚醚鏈及聚碳酸酯鏈所構成的族群中至少1種物質之含鹼性基(氨基)尿烷系高分子顏料分散劑為最佳。In the above-mentioned basic polymer-based polymer pigment dispersant, a basic urethane-based polymer pigment dispersant, a basic-based polyester-based polymer pigment dispersant, and a basic propylene-containing polymer are used. The molecular pigment dispersant is more preferable, and the aminourethane-based polymer pigment dispersant, the amino group-containing polymer pigment dispersant, and the amino group-containing polymer pigment dispersant are more preferable. In particular, it is particularly preferable to use a basic urethane-based polymer pigment dispersant, in particular, at least one substance selected from the group consisting of a polyester chain, a polyether chain, and a polycarbonate chain. A basic (amino) urethane-based polymer pigment dispersant is preferred.
含鹼性基分散劑之使用量，係以相對於碳黑100質量份而言，為1~200質量份較佳、1~60質量份更佳。The amount of the basic-based dispersant to be used is preferably from 1 to 200 parts by mass, more preferably from 1 to 60 parts by mass, per 100 parts by mass of the carbon black.
進而，在本發明之黑矩陣用顏料分散組成物中，為了讓碳黑之分散性更提高，亦可進一步包括：擇自於由含酸基顏料衍生物、含酸基色素衍生物、含酸基色素中間體及含酸基樹脂所構成之族群中至少1種物質。Further, in the pigment dispersion composition for a black matrix of the present invention, in order to further improve the dispersibility of the carbon black, it may further comprise: selecting an acid-based pigment derivative, an acid group-containing pigment derivative, and an acid-containing At least one of the group consisting of a base pigment intermediate and an acid group-containing resin.
首先，以含酸基顏料衍生物、含酸基色素衍生物而言，可舉例如：具有酸基之酞菁系顏料衍生物、具有酸基之蒽醌(anthraquinone)系顏料衍生物、具有酸基之萘系顏料衍生物等。其中，若從碳黑之分散性的觀點來看，係以具有磺酸基之酞菁系顏料衍生物為較佳。First, the acid-based pigment derivative and the acid group-containing dye derivative may, for example, be a phthalocyanine-based pigment derivative having an acid group, an anthraquinone-based pigment derivative having an acid group, and having an acid. A naphthalene pigment derivative or the like. Among them, a phthalocyanine-based pigment derivative having a sulfonic acid group is preferred from the viewpoint of dispersibility of carbon black.
含酸基顏料衍生物、含酸基色素衍生物及含酸基色素中間體之使用量，係相對於碳黑100質量份而言為0~20質量份，並以0.5~10質量份為較佳。The amount of the acid-based pigment derivative, the acid-containing dye derivative, and the acid-based dye intermediate is 0 to 20 parts by mass based on 100 parts by mass of the carbon black, and is 0.5 to 10 parts by mass. good.
其次，以含酸基樹脂而言，可使用含酸基共聚合物樹脂、含酸基聚酯樹脂及含酸基尿烷樹脂等。Next, as the acid group-containing resin, an acid group-containing copolymer resin, an acid group-containing polyester resin, an acid-containing urethane resin, or the like can be used.
以上述含酸基樹脂之酸基而言，可舉例如：羧基、磺酸基、磷酸基等。The acid group of the acid group-containing resin may, for example, be a carboxyl group, a sulfonic acid group or a phosphoric acid group.
在上述含酸基樹脂中，較佳者為由含有至少1種具酸基單體之單體成份進行自由基聚合所得到之酸值10~300mgKOH/g(較佳為20~300mgKOH/g)、重量平均分子量1,000~100,000之含酸基共聚合物樹脂(特別是含酸基丙烯系共聚合物樹脂)。In the above acid-containing resin, an acid value of 10 to 300 mgKOH/g (preferably 20 to 300 mgKOH/g) obtained by radical polymerization of a monomer component containing at least one acid group-containing monomer is preferred. An acid group-containing copolymer resin having a weight average molecular weight of 1,000 to 100,000 (particularly an acid group-containing propylene-based copolymer resin).
具體而言，可使用擇自於由下列物質所構成之族群中至少1種之單體成份來進行自由基聚合所得到的含酸基共聚合物樹脂：丙烯酸、甲基丙烯酸、衣康酸(itaconic acid)、馬來酸(maleic acid)、馬來酸酐、馬來酸一烷基酯、檸康酸(citraconic acid)、檸康酸酐、檸康酸一烷基酯、磺基甲基丙烯酸酯、丁基丙烯基氨基磺酸、磷基乙基甲基丙烯酸酯等之含酸基不飽和單體成份；苯乙烯、甲基苯乙烯、2－羥基乙基丙烯酸酯、2－羥基乙基甲基丙烯酸酯、烯丙基丙烯酸酯、烯丙基甲基丙烯酸酯、苄基丙烯酸酯、苄基甲基丙烯酸酯、甲基甲基丙烯酸酯、聚苯乙烯巨單體、聚甲基甲基丙烯酸酯巨單體等。Specifically, an acid group-containing copolymer resin obtained by radical polymerization of at least one monomer component selected from the group consisting of acrylic acid, methacrylic acid, and itaconic acid can be used. Itaconic acid), maleic acid, maleic anhydride, monoalkyl maleate, citraconic acid, citraconic anhydride, monoalkyl citrate, sulfomethacrylate Acid-containing unsaturated monomer component such as butyl propylenesulfamic acid, phosphorus ethyl methacrylate, etc.; styrene, methyl styrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl group Acrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl methacrylate, methyl methacrylate, polystyrene macromonomer, polymethyl methacrylate Ester macromonomers, etc.
另外，在本發明中，上述含酸基樹脂之重量平均分子量係為基於GPC所得到之聚苯乙烯換算的重量平均分子量。在本發明中，係使用Water 2690(Waters公司製)作為GPC裝置、PLgel 5 μ MIXED－D(Polymer Laboratories公司製)作為柱管(column)。Further, in the present invention, the weight average molecular weight of the acid group-containing resin is a weight average molecular weight in terms of polystyrene obtained by GPC. In the present invention, Water 2690 (manufactured by Waters Co., Ltd.) was used as a GPC apparatus, and PLgel 5 μ MIXED-D (manufactured by Polymer Laboratories Co., Ltd.) was used as a column.
含酸基樹脂之使用量，係以相對於碳黑100質量份而言為0~100質量份，並以為0.5~60質量份較佳。The amount of the acid-containing resin to be used is preferably from 0 to 100 parts by mass, and preferably from 0.5 to 60 parts by mass, per 100 parts by mass of the carbon black.
本發明之黑矩陣用顏料分散組成物，乃為包括碳黑、含鹼性基顏料分散劑及溶劑的混合物，必要時還可對應加入：擇自於由含酸基顏料衍生物、含酸基色素衍生物、含酸基色素中間體及含酸基樹脂所構成之族群中至少1種物質。黑矩陣用顏料分散組成物，可利用輥輾機(roller miller)、混練機(kneader)、高速攪拌機、珠磨機(beads miller)、球磨機(ball miller)、砂磨機(sand miller)、超音波分散機或高壓分散裝置等，來將上述等之混合物進行分散處理而得到。The pigment dispersion composition for a black matrix of the present invention is a mixture comprising carbon black, a base-based pigment dispersant and a solvent, and if necessary, may be added: from an acid-based pigment derivative and an acid group. At least one of a group consisting of a pigment derivative, an acid-based dye intermediate, and an acid-containing resin. The black matrix pigment dispersion composition can be used by a roller miller, a kneader, a high speed mixer, a beads miller, a ball miller, a sand miller, and a super A sonic wave disperser, a high-pressure dispersing device, or the like is obtained by dispersing the above-mentioned mixture.
本發明的黑矩陣用顏料分散組成物中之碳黑的含有量，係以3~70質量%為較佳，10~50質量%為更佳。若碳黑的含有量未達前述範圍，則黑矩陣形成完了時之遮光性會有降低的傾向，另一方面，若超過前述範圍時，則顏料的分散就會變得很困難。The content of the carbon black in the pigment dispersion composition for a black matrix of the present invention is preferably from 3 to 70% by mass, more preferably from 10 to 50% by mass. When the content of the carbon black is less than the above range, the light-shielding property tends to be lowered when the black matrix is formed. On the other hand, when it exceeds the above range, the dispersion of the pigment becomes difficult.
其次，就本發明之黑矩陣用顏料分散光阻組成物來進行說明。Next, the pigment dispersion resist composition for a black matrix of the present invention will be described.
本發明之黑矩陣用顏料分散光阻組成物，主要係於上述黑矩陣用顏料組成物中加入皮膜形成樹脂、光聚合性化合物、光聚合引發劑及溶劑而構成，必要時亦可對應再適當加入聚合禁止劑等各種添加物來得出。The pigment dispersion resist composition for a black matrix of the present invention is mainly composed of a film forming resin, a photopolymerizable compound, a photopolymerization initiator and a solvent in the pigment composition for a black matrix, and may be appropriately used if necessary. It is obtained by adding various additives such as a polymerization inhibitor.
以構成本發明的黑矩陣用顏料分散光阻組成物之皮膜形成樹脂而言，例如，係以使用可跟擇自從下列物質所構成之族群中至少1種進行反應而得到的共聚合物之具有羧基的鹼可溶性樹脂為較佳：丙烯酸、甲基丙烯酸、衣康酸、馬來酸、馬來酸酐、馬來酸一烷基酯、檸康酸、檸康酸酐、檸康酸一烷基酯等之含羧基不飽和單體；苯乙烯、2－羥基乙基丙烯酸酯、2－羥基乙基甲基丙烯酸酯、烯丙基丙烯酸酯、烯丙基甲基丙烯酸酯、苄基丙烯酸酯、苄基甲基丙烯酸酯、丙三醇一丙烯酸酯、丙三醇甲基丙烯酸酯、具有二環戊二烯骨幹之單(甲基)丙烯酸酯、N－苯基馬來醯亞胺、聚苯乙烯巨單體以及聚甲基甲基丙烯酸酯巨單體等。上述等物質可單獨使用或混合兩種以上併用之。皮膜形成樹脂若從皮膜形成性、鹼顯影性的觀點來看，係以酸值20~300mgKOH/g、重量平均分子量1,000~200,000為較佳。皮膜形成樹脂亦可對應被需求的機能，單獨或適當的組合2種以上來使用之。重量平均分子量則為聚苯乙烯換算之重量平均分子量，可同前述含酸基樹脂之情況來進行測定。The film-forming resin constituting the pigment-dispersed photoresist composition for a black matrix of the present invention has, for example, a copolymer obtained by reacting at least one selected from the group consisting of the following substances. An alkali-soluble resin of a carboxyl group is preferred: acrylic acid, methacrylic acid, itaconic acid, maleic acid, maleic anhydride, monoalkyl maleate, citraconic acid, citraconic anhydride, monoalkyl citrate And other carboxyl-containing unsaturated monomers; styrene, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, allyl acrylate, allyl methacrylate, benzyl acrylate, benzyl Methyl methacrylate, glycerol monoacrylate, glycerol methacrylate, mono (meth) acrylate with dicyclopentadiene backbone, N-phenyl maleimide, polystyrene Giant monomer and polymethyl methacrylate macromonomer. These or the like may be used alone or in combination of two or more. The film-forming resin preferably has an acid value of 20 to 300 mgKOH/g and a weight average molecular weight of 1,000 to 200,000 from the viewpoint of film formability and alkali developability. The film-forming resin may be used alone or in combination of two or more kinds depending on the desired function. The weight average molecular weight is a weight average molecular weight in terms of polystyrene, and can be measured in the same manner as the above acid group-containing resin.
黑矩陣用顏料分散光阻組成物中之皮膜形成樹脂含有量，若以黑矩陣用顏料分散光阻組成物中其固形成份中的皮膜形成樹脂跟前述含酸基樹脂之合計量的質量%來表現的話，係以達到5~50質量%的範圍為較佳。The film forming resin content in the pigment dispersion resist composition of the black matrix is a mass percentage of the total amount of the film forming resin and the acid group-containing resin in the solid component in the pigment dispersion composition of the black matrix. In the case of performance, it is preferably in the range of 5 to 50% by mass.
以構成本發明的黑矩陣用顏料分散光阻組成物之光聚合性化合物而言，可舉例如：具有光聚合性不飽和鍵之單體、寡聚物(oligomer)等。The photopolymerizable compound constituting the pigment dispersion resist composition for a black matrix of the present invention may, for example, be a monomer having a photopolymerizable unsaturated bond, an oligomer or the like.
具體來說，在分子內具有1個光聚合性不飽和鍵之單體，可使用例如：甲基甲基丙烯酸酯、丁基甲基丙烯酸酯、2－乙基己基甲基丙烯酸酯、甲基丙烯酸酯、丁基丙烯酸酯、2－乙基己基丙烯酸酯等之烷基甲基丙烯酸酯或丙烯酸酯；苄基甲基丙烯酸酯、苄基丙烯酸酯等之芳烷基甲基丙烯酸酯或丙烯酸酯；丁氧基乙基甲基丙烯酸酯、丁氧基乙基丙烯酸酯等之芳氧基烷基甲基丙烯酸酯或丙烯酸酯；N,N－二甲基氨基乙基甲基丙烯酸酯、N,N－二甲基氨基乙基丙烯酸酯等之氨基烷基甲基丙烯酸酯或丙烯酸酯；二乙二醇一***、三乙二醇一丁醚、二丙烯乙二醇一甲醚等之聚烷烯基乙二醇一烷醚的甲基丙烯酸酯或丙烯酸酯；六乙二醇一苯醚等之聚烷烯基乙二醇一芳醚的甲基丙烯酸酯或丙烯酸酯；異冰片基(isobornyl)甲基丙烯酸酯或丙烯酸酯；丙三醇甲基丙烯酸酯或丙烯酸酯；2－羥基乙基甲基丙烯酸酯或丙烯酸酯等等。Specifically, a monomer having one photopolymerizable unsaturated bond in the molecule, for example, methyl methacrylate, butyl methacrylate, 2-ethylhexyl methacrylate, methacrylate can be used. An alkyl methacrylate or acrylate such as butyl acrylate or 2-ethylhexyl acrylate; an aralkyl methacrylate or acrylate such as benzyl methacrylate or benzyl acrylate; An aryloxyalkyl methacrylate or acrylate such as oxyethyl methacrylate or butoxyethyl acrylate; N,N-dimethylaminoethyl methacrylate, N,N- Aminoalkyl methacrylate or acrylate such as dimethylaminoethyl acrylate; polyalkenyl group such as diethylene glycol monoethyl ether, triethylene glycol monobutyl ether or dipropylene glycol monomethyl ether a methacrylate or acrylate of a glycol monoalkyl ether; a methacrylate or acrylate of a polyalkenyl glycol monoaryl ether such as hexaethylene glycol monophenyl ether; isobornyl Acrylate or acrylate; glycerol methacrylate or propylene Ester; 2-hydroxyethyl methacrylate or acrylate and the like.
在分子內具有2個以上光聚合性不飽和鍵之單體，可使用例如：雙苯酚A二甲基丙烯酸酯、1,4－丁二醇二甲基丙烯酸酯、1,3－丁二醇二甲基丙烯酸酯、二乙二醇二甲基丙烯酸酯、丙三醇二甲基丙烯酸酯、異戊二醇二甲基丙烯酸酯、聚乙二醇二甲基丙烯酸酯、聚丙二醇二甲基丙烯酸酯、四乙二醇二甲基丙烯酸酯、三羥甲基丙烷三甲基丙烯酸酯、季戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯、二季戊四醇四甲基丙烯酸酯、二季戊四醇六甲基丙烯酸酯、二季戊四醇五甲基丙烯酸酯、雙苯酚A二丙烯酸酯、1,4－丁二醇二丙烯酸酯、1,3－丁二醇二丙烯酸酯、二乙二醇二丙烯酸酯、丙三醇二丙烯酸酯、異戊二醇二丙烯酸酯、聚乙二醇二丙烯酸酯、聚丙二醇二丙烯酸酯、四乙二醇二丙烯酸酯、三羥甲基丙烷三丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、二季戊四醇四丙烯酸酯、二季戊四醇六丙烯酸酯、二季戊四醇五丙烯酸酯等。A monomer having two or more photopolymerizable unsaturated bonds in the molecule, for example, bisphenol A dimethacrylate, 1,4-butanediol dimethacrylate, and 1,3-butanediol can be used. Dimethacrylate, diethylene glycol dimethacrylate, glycerol dimethacrylate, isoprene glycol dimethacrylate, polyethylene glycol dimethacrylate, polypropylene glycol dimethyl Acrylate, tetraethylene glycol dimethacrylate, trimethylolpropane trimethacrylate, pentaerythritol trimethacrylate, pentaerythritol tetramethacrylate, dipentaerythritol tetramethacrylate, dipentaerythritol hexamethyl Acrylate, dipentaerythritol pentamethacrylate, bisphenol A diacrylate, 1,4-butanediol diacrylate, 1,3-butylene glycol diacrylate, diethylene glycol diacrylate, C Triol diacrylate, isoprene glycol diacrylate, polyethylene glycol diacrylate, polypropylene glycol diacrylate, tetraethylene glycol diacrylate, trimethylolpropane triacrylate, pentaerythritol triacrylate, Pentaerythritol tetraacrylic acid , Dipentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate.
就具有上述光聚合性不飽和鍵之寡聚物來說，可使用能使上述單體適當聚合而得到聚合物者。上述等之光聚合性化合物，可單獨使用或組合兩種以上來使用之。As the oligomer having the above photopolymerizable unsaturated bond, those obtained by appropriately polymerizing the above monomers to obtain a polymer can be used. The photopolymerizable compound described above may be used singly or in combination of two or more.
在本發明中，上述光聚合性化合物之使用量，係以基於本發明的黑矩陣用顏料分散光阻組成物中之全固形成份而言，為3~50質量%的範圍較佳。In the present invention, the amount of the photopolymerizable compound used is preferably in the range of 3 to 50% by mass based on the total solid content of the pigment dispersion resist composition for a black matrix of the present invention.
以構成本發明的黑矩陣用顏料分散光阻組成物之光聚合引發劑而言，並未予以特別限定。可使用例如：二苯甲酮、N,N’－四乙基－4,4’－二氨基二苯甲酮、4－甲氧基－4’－二甲基氨基二苯甲酮、苯偶醯(benzil)、2,2－二乙氧基苯乙酮、苯偶因(benzoin)、苯偶因甲醚、苯偶因異丁醚、苄基二甲縮酮、α－羥基異丁苯酮、噻噸酮(thioxanthone)、2－氯噻噸酮、1－羥基環己基苯酮、第三丁基蒽醌(t－butyl anthraquinone)、1－氯蒽醌、2,3－二氯蒽醌、3－氯－2－甲基蒽醌、2－乙基蒽醌、1,4－萘醌(1,4－naphthoquinone)、1,2－苯并蒽醌、1,4－二甲基蒽醌、2－苯基蒽醌、三嗪(triazine)系光聚合引發劑、肟酯(oxime ester)系光聚合引發劑。上述等之光聚合引發劑可單獨使用或混合兩種以上併用之。The photopolymerization initiator constituting the pigment dispersion resist composition for a black matrix of the present invention is not particularly limited. For example, benzophenone, N,N'-tetraethyl-4,4'-diaminobenzophenone, 4-methoxy-4'-dimethylaminobenzophenone, benzoate can be used. Benzil, 2,2-diethoxyacetophenone, benzoin, benzoin methyl ether, benzoin isobutyl ether, benzyl dimethyl ketal, α-hydroxyisobutylbenzene Ketone, thioxanthone, 2-chlorothioxanthone, 1-hydroxycyclohexyl benzophenone, t-butyl anthraquinone, 1-chloroindole, 2,3-dichloropurine醌, 3-chloro-2-methyl hydrazine, 2-ethyl hydrazine, 1,4-naphthoquinone, 1,2-benzopyrene, 1,4-dimethyl An anthracene, a 2-phenylindole, a triazine-based photopolymerization initiator, and an oxime ester-based photopolymerization initiator. The above photopolymerization initiators may be used singly or in combination of two or more.
在本發明中，上述光聚合引發劑之使用量，係以基於本發明的黑矩陣用顏料分散光阻組成物中之全固形成份而言，為1~20質量%的範圍較佳。In the present invention, the amount of the photopolymerization initiator to be used is preferably in the range of 1 to 20% by mass based on the total solid content of the pigment dispersion resist composition for a black matrix of the present invention.
以構成本發明的黑矩陣用顏料分散光阻組成物之溶劑而言，可使用同前述所舉例之溶劑。特別又以使用在常壓(1.013×102 kPa)下之沸點為100~250℃之酯系有機溶劑、醚系有機溶劑、醚酯系有機溶劑、酮系有機溶劑、芳香族碳氫化合物系有機溶劑及含氮系有機溶劑等較佳。若含有較多量之沸點超過250℃的有機溶劑時，則已塗佈成形的塗膜在施行預烘烤之際，就會發生有機溶劑無法充分地蒸發而殘留於乾燥塗膜內之情況，導致乾燥塗膜之耐熱性降低。又，若含有較多量之沸點未達100℃的有機溶劑時，要進行均勻地塗佈而沒有斑紋產生是很困難的事，因而會導致有無法得到表面平滑性優良的塗膜之情況。The solvent exemplified above may be used as the solvent constituting the pigment dispersion resist composition for a black matrix of the present invention. In particular, an ester-based organic solvent, an ether-based organic solvent, an ether ester-based organic solvent, a ketone-based organic solvent, or an aromatic hydrocarbon system having a boiling point of 100 to 250 ° C under normal pressure (1.013 × 10 2 kPa) is used. An organic solvent, a nitrogen-containing organic solvent, or the like is preferred. When a large amount of the organic solvent having a boiling point of more than 250 ° C is contained, when the coated coating film is pre-baked, the organic solvent does not sufficiently evaporate and remains in the dried coating film, resulting in a situation in which the organic solvent does not sufficiently evaporate. The heat resistance of the dried coating film is lowered. Further, when a large amount of an organic solvent having a boiling point of less than 100 ° C is contained, it is difficult to uniformly apply it without generation of streaks, and thus a coating film having excellent surface smoothness may not be obtained.
以上述般的溶劑來說，具體而言可舉例如：乙二醇一甲醚、乙二醇一***、乙二醇一異丙醚、乙二醇一丁醚、二乙二醇一甲醚、二乙二醇一***、丙二醇一甲醚、丙二醇一***、丙二醇一丁醚、二乙二醇二***、二乙二醇二甲醚、二乙二醇甲***等之醚系有機溶劑類；乙二醇一甲醚乙酸酯、乙二醇一***乙酸酯、乙二醇一丁醚乙酸酯、丙二醇一甲醚乙酸酯、丙二醇一***乙酸酯等之醚酯系有機溶劑類；甲基異丁基甲酮、環己酮、2－庚烷、δ－丁內醯胺等之酮系有機溶劑類；2－羥基丙酸甲酯、2－羥基丙酸乙酯、2－羥基－2－甲基丙酸乙酯、3－甲基－3－甲氧基丁基丙酸酯、3－甲氧基丙酸甲酯、3－甲氧基丙酸乙酯、3－乙氧基丙酸甲酯、3－乙氧基丙酸乙酯、乙氧基乙酸乙酯、羥基乙酸酯、甲酸正戊酯等之酯系有機溶劑類；N－甲基吡咯烷酮、N,N－二甲基甲醯胺、N,N－二甲基乙醯胺等之含氮系有機溶劑類等等。上述等有機溶劑可單獨使用或混合兩種以上來使用之。Specific examples of the solvent include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monoisopropyl ether, ethylene glycol monobutyl ether, and diethylene glycol monomethyl ether. Ether, ethylene glycol monoethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol methyl ether, etc. Ethyl esters of ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, etc. Solvents; ketone organic solvents such as methyl isobutyl ketone, cyclohexanone, 2-heptane, δ-butyrolactam; methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, 2- Ethyl hydroxy-2-methylpropionate, 3-methyl-3-methoxybutylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3-B An ester-based organic solvent such as methyl oxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, hydroxyacetate or n-amyl formate; N-methylpyrrolidone, N, N -dimethyl A Amides, N, N- dimethylacetamide, etc. nitrogen-containing organic solvents and the like. The above organic solvents may be used singly or in combination of two or more.
上述等之有機溶劑中，若從溶解性、分散性、塗佈性等觀點來看，又以下述者較佳：二乙二醇二***、二乙二醇甲***、乙二醇一甲醚乙酸酯、丙二醇一甲醚乙酸酯、丙二醇一***乙酸酯、環己酮、2－庚烷、2－羥基丙酸乙酯、3－甲基－3－甲氧基丁基丙酸酯、3－甲氧基丙酸乙酯、3－乙氧基丙酸甲酯、甲酸正戊酯等。其中更以丙二醇一甲醚乙酸酯為特佳。Among the above-mentioned organic solvents, from the viewpoints of solubility, dispersibility, coating properties and the like, it is preferred to use diethylene glycol diethyl ether, diethylene glycol methyl ethyl ether, ethylene glycol monomethyl ether. Acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, cyclohexanone, 2-heptane, ethyl 2-hydroxypropionate, 3-methyl-3-methoxybutylpropionic acid Ester, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, n-amyl formate, and the like. Among them, propylene glycol monomethyl ether acetate is particularly preferred.
更進一步，上述等之有機溶劑若從上述顏料分散劑、含酸基樹脂、皮膜形成樹脂的溶解性、顏料分散性、塗佈性等觀點來看，係以在上述黑矩陣用顏料分散光阻組成物所使用的全部有機溶劑中，含有達50質量%以上較佳、70質量%以上更佳。Furthermore, the above-mentioned organic solvent is dispersed in the above-mentioned black matrix pigment from the viewpoints of solubility of the pigment dispersant, the acid group-containing resin, and the film-forming resin, the pigment dispersibility, and the coating property. The total organic solvent used in the composition is preferably 50% by mass or more, more preferably 70% by mass or more.
本發明之黑矩陣用顏料分散光阻組成物，於必要時亦可對應適當使用前述物質以外之其他光聚合性化合物、熱聚合禁止劑、抗氧化劑等各種添加劑。In the pigment dispersion film composition for a black matrix of the present invention, various additives such as a photopolymerizable compound, a thermal polymerization inhibiting agent, and an antioxidant other than the above materials may be used as appropriate.
另外，黑矩陣用顏料分散光阻組成物中之碳黑，係以佔黑矩陣用顏料分散光阻組成物其固形成份中質量%的30~80質量%為較佳。Further, the carbon black in the pigment dispersion composition of the black matrix is preferably 30 to 80% by mass based on the mass% of the solid content of the pigment dispersion resist composition for the black matrix.
最後，就使用以上之構成材料來製造本發明之黑矩陣用顏料分散光阻組成物的方法進行說明。Finally, a method of producing the pigment-dispersed photoresist composition for a black matrix of the present invention using the above constituent materials will be described.
以下所述本發明之黑矩陣用顏料分散光阻組成物的製造方法，僅係本發明之較佳實施例的一例，並非用以限定本發明。例如，亦可在黑矩陣用顏料分散組成物中，加入光聚合性化合物、光聚合引發劑、皮膜形成用樹脂，甚至必要時可再對應加入有機溶劑、其他添加劑，再使用攪拌裝置等進行攪拌混合之方法等等。The method for producing the pigment dispersion resist composition for a black matrix of the present invention described below is merely an example of a preferred embodiment of the present invention and is not intended to limit the present invention. For example, a photopolymerizable compound, a photopolymerization initiator, or a resin for forming a film may be added to the pigment dispersion composition for a black matrix, and if necessary, an organic solvent or other additives may be added in combination, and stirring may be carried out using a stirring device or the like. The method of mixing and so on.
以下，雖利用實施例來對本發明進行具體的說明，然而在不脫離本發明之主要意旨及適用範圍的情況下，皆屬本發明之保護範圍內。另外，若未特別說明，則本實施例中所指的『份』及『%』，乃分別表示『質量份』及『質量%』。In the following, the present invention is specifically described by the examples, and the scope of the present invention is intended to be within the scope of the invention. In addition, unless otherwise indicated, the "parts" and "%" referred to in the present embodiment mean "mass parts" and "% by mass", respectively.
以如表1所示之組成(表1中之各材料的使用量為質量%)，將各種材料進行混合，以珠磨機混練一畫夜，而調製出實施例1~12、比較例1~3的黑矩陣用顏料分散組成物。The composition shown in Table 1 (the amount of each material used in Table 1 is % by mass), various materials were mixed, and the beads were milled for one night to prepare Examples 1 to 12 and Comparative Example 1 The black matrix of ~3 is a pigment dispersion composition.
使用高速攪拌機，將實施例1~12、比較例1~3的各黑矩陣用顏料分散組成物及其他材料，以如表1所示之組成(表1中之各材料的使用量為質量%)混合均勻後，利用孔徑3 μm的過濾器進行過濾，即可得到實施例1~12、比較例1~3的各黑矩陣用顏料分散光阻組成物。The pigment dispersion composition of each of the black matrix samples of Examples 1 to 12 and Comparative Examples 1 to 3 and other materials were used in a high-speed mixer to have a composition as shown in Table 1 (the amount of each material used in Table 1 was % by mass). After uniformly mixing, the mixture was filtered through a filter having a pore size of 3 μm to obtain pigment-dispersed photoresist compositions for the black matrix of Examples 1 to 12 and Comparative Examples 1 to 3.
(分散穩定性)將實施例1~12、比較例1~3的各黑矩陣用顏料分散組成物，以及實施例1~12、比較例1~3的各黑矩陣用顏料分散光阻組成物，分別取樣裝入玻璃瓶中密封之，於室溫下保存7天後，將其狀態依據下述評價基準進行評價。(Dispersion stability) The pigment dispersion composition of each of the black matrix samples of Examples 1 to 12 and Comparative Examples 1 to 3, and the pigment dispersion resist compositions for the black matrix of Examples 1 to 12 and Comparative Examples 1 to 3 They were separately sampled and sealed in a glass bottle, and stored at room temperature for 7 days, and then the state was evaluated according to the following evaluation criteria.
A：無增粘及沉澱物B：有輕輕晃動就會恢復原狀程度之增粘及沉澱物C：有大力搖晃也不會恢復原狀程度之增粘及沉澱物A: No thickening and sediment B: Viscosity and sedimentation with a slight sway to restore the original state. C: Viscosity and sediment with a strong shake and will not return to the original state.
(光阻圖案之顯影性)使用光阻塗佈機，將實施例1~12、比較例1~3的各黑矩陣用顏料分散光阻組成物以令其形成1 μm膜厚的方式塗佈於玻璃基板上，並於100℃下預烘烤3分鐘。之後，使用可得到硬化部份與未硬化部份面積比為20：80之線寬25 μm的格子狀圖案之光罩，利用高壓水銀燈，以UV累積光量400mJ/cm2 完成曝光。使用0.05%氫氧化鉀水溶液令所得到的塗膜顯影，並從可除去未曝光部份的光阻組成物的時間，依據下述評價基準來評價顯影性。(Developability of Photoresist Pattern) The pigment dispersion resist composition for each black matrix of Examples 1 to 12 and Comparative Examples 1 to 3 was applied so as to form a film thickness of 1 μm using a photoresist coater. On a glass substrate, prebaking at 100 ° C for 3 minutes. Thereafter, a mask having a lattice pattern of a line width of 25 μm having a hardened portion and an uncured portion area ratio of 20:80 was used, and exposure was completed with a UV cumulative light amount of 400 mJ/cm 2 using a high pressure mercury lamp. The obtained coating film was developed using a 0.05% aqueous potassium hydroxide solution, and the developability was evaluated in accordance with the following evaluation criteria from the time when the photoresist composition of the unexposed portion was removed.
A：可在30秒以內完全地去除者B：超過30秒但可在60秒以內完全地去除者C：超過60秒亦無法完全地去除者A: Can be completely removed within 30 seconds. B: More than 30 seconds but can be completely removed within 60 seconds. C: Over 60 seconds can not be completely removed.
(光阻圖案之顯影寬容度)使用光阻塗佈機，將實施例1~12、比較例1~3的各黑矩陣用顏料分散光阻組成物以令其形成1 μm膜厚的方式塗佈於玻璃基板上，並於100℃下預烘烤3分鐘。之後，使用可得到硬化部份與未硬化部份面積比為20：80之線寬25 μm的格子狀圖案之光罩，利用高壓水銀燈，以UV累積光量400mJ/cm2 完成曝光。將所得到的塗膜使用0.05%氫氧化鉀水溶液進行顯影，並測量從已去除完未曝光部份的光阻組成物時、到除去硬化部份的光阻組成物之時間，再依據下述評價基準來評價顯影寬容度。(Development latitude of the photoresist pattern) The pigment dispersion resist compositions of the black matrix samples of Examples 1 to 12 and Comparative Examples 1 to 3 were coated in such a manner as to form a film thickness of 1 μm using a photoresist coater. The cloth was placed on a glass substrate and prebaked at 100 ° C for 3 minutes. Thereafter, a mask having a lattice pattern of a line width of 25 μm having a hardened portion and an uncured portion area ratio of 20:80 was used, and exposure was completed with a UV cumulative light amount of 400 mJ/cm 2 using a high pressure mercury lamp. The obtained coating film was developed using a 0.05% potassium hydroxide aqueous solution, and the time from when the photoresist composition of the unexposed portion was removed to when the photoresist composition of the hardened portion was removed was measured, and then according to the following The evaluation criteria were used to evaluate the development latitude.
A：從已去除完未曝光部份的光阻組成物時、到除去硬化部份的光阻組成物之時間為60秒以上B：從已去除完未曝光部份的光阻組成物時、到除去硬化部份的光阻組成物之時間為30秒以上，但不到60秒C：從已去除完未曝光部份的光阻組成物時、到除去硬化部份的光阻組成物之時間不到30秒A: The time from when the photoresist composition of the unexposed portion has been removed to when the photoresist composition of the hardened portion is removed is 60 seconds or more B: When the photoresist composition of the unexposed portion has been removed, The time until the photoresist composition of the hardened portion is removed is 30 seconds or more, but less than 60 seconds C: from the photoresist composition from which the unexposed portion has been removed, to the photoresist composition from which the hardened portion is removed Less than 30 seconds
以上所得到的結果如表1中所示。The results obtained above are shown in Table 1.
從表1的結果可明白得知，使用了吸油量為10~150ml/100g、pH值範圍大於9之碳黑的實施例1~12，比起使用了吸油量為10~150ml/100g、pH值範圍在9以下之碳黑的比較例1~2而言，其顯影寬容度明顯變大。It can be understood from the results of Table 1 that Examples 1 to 12 using carbon black having an oil absorption of 10 to 150 ml/100 g and a pH range of more than 9 are used in comparison with the oil absorption of 10 to 150 ml/100 g and pH. In Comparative Examples 1 to 2 in which carbon black having a value of 9 or less, the development latitude was remarkably large.
本發明係提供一種黑矩陣用顏料分散組成物，藉由使用吸油量為10~150ml/100g、pH值範圍大於9之碳黑，得出遮光性良好、且顯影寬容度大的黑矩陣用顏料分散光阻組成物。The present invention provides a pigment dispersion composition for a black matrix, which is obtained by using a carbon black having an oil absorption of 10 to 150 ml/100 g and a pH range of more than 9, and a black matrix pigment having good light shielding property and large development latitude. Disperse the photoresist composition.
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| KR101034208B1 (en) * | 2010-12-27 | 2011-05-12 | 나노윈도우필름 주식회사 | Carbon black dispersion composition, method of fabricating the same, and method of fabricating a color film using the method |
| JP5983198B2 (en) * | 2011-09-09 | 2016-08-31 | 東洋インキＳｃホールディングス株式会社 | Optical pressure-sensitive adhesive, optical pressure-sensitive adhesive sheet, and laminate |
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| JP6113466B2 (en) * | 2012-11-19 | 2017-04-12 | サカタインクス株式会社 | Black matrix pigment dispersion composition and black matrix pigment dispersion resist composition containing the same |
| KR101709698B1 (en) | 2013-09-02 | 2017-02-23 | 제일모직 주식회사 | Black photosensitive resin composition and light blocking layer using the same |
| CN103923498B (en) * | 2014-04-10 | 2016-06-22 | 京东方科技集团股份有限公司 | Form the compositions of black matrix, black matrix, display base plate and method of modifying |
| JP6184902B2 (en) * | 2014-05-30 | 2017-08-23 | 花王株式会社 | Carbon black dispersion |
| JP6543453B2 (en) * | 2014-10-14 | 2019-07-10 | サカタインクス株式会社 | Pigment dispersion composition for black matrix |
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