TWI442283B - Touch panel, touch display panel using the same and adhering method thereof - Google Patents
Touch panel, touch display panel using the same and adhering method thereof Download PDFInfo
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- TWI442283B TWI442283B TW100135350A TW100135350A TWI442283B TW I442283 B TWI442283 B TW I442283B TW 100135350 A TW100135350 A TW 100135350A TW 100135350 A TW100135350 A TW 100135350A TW I442283 B TWI442283 B TW I442283B
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Description
本發明是有關於一種觸控面板及應用其之觸控顯示面板與其貼合方法,且特別是有關於一種可減少溢膠量的觸控面板及應用其之觸控顯示面板與其貼合方法。The present invention relates to a touch panel and a touch display panel using the same, and more particularly to a touch panel capable of reducing the amount of glue overflowed and a touch display panel using the same and a method for attaching the same.
傳統觸控面板包括感應基板及保護蓋板(cover glass)。感應基板與保護蓋板透過液態光學膠膜進行貼合。The conventional touch panel includes an inductive substrate and a cover glass. The sensing substrate and the protective cover are adhered through the liquid optical film.
在貼合製程中,保護蓋板與感應基板之間無支撐物,因此保護蓋板與感應基板在貼合後未固化前,基板持續受到重力影響而導致二基板之間的間隙變異而無法達到理想狀態。In the bonding process, there is no support between the protective cover and the sensing substrate. Therefore, before the protective cover and the sensing substrate are uncured after bonding, the substrate is continuously affected by gravity, and the gap between the two substrates is variated and cannot be achieved. Ideal state.
實際上,位於保護蓋板與感應基板之間的液態光學膠會因為間隙的變小而導致過多的溢膠。In fact, the liquid optical glue located between the protective cover and the sensing substrate may cause excessive overflow due to the small gap.
本發明係有關於一種觸控面板及應用其之觸控顯示面板與其貼合方法,觸控面板在貼合過程中,可有效防止過多的溢膠。The present invention relates to a touch panel and a touch display panel using the same, and the touch panel can effectively prevent excessive glue overflow during the bonding process.
根據本發明一實施例,提出一種觸控面板。觸控面板包括一感應基板、一保護蓋板、一擋牆及一黏合膠。擋牆形成於感應基板與保護蓋板之間,擋牆具有開孔,擋牆圍繞一容置空間。黏合膠形成於容置空間內並黏合感應基板與保護蓋板。According to an embodiment of the invention, a touch panel is proposed. The touch panel includes a sensing substrate, a protective cover, a retaining wall and an adhesive. The retaining wall is formed between the sensing substrate and the protective cover, and the retaining wall has an opening, and the retaining wall surrounds an accommodating space. The adhesive is formed in the accommodating space and adheres to the sensing substrate and the protective cover.
根據本發明一實施例,提出一種觸控顯示面板。觸控顯示面板包括一觸控面板及一顯示面板。觸控面板包括一感應基板、一保護蓋板、一擋牆及一黏合膠。擋牆形成於感應基板與保護蓋板之間,擋牆具有開孔,擋牆圍繞一容置空間。黏合膠形成於容置空間內並黏合感應基板與保護蓋板。顯示面板對應觸控面板配置。According to an embodiment of the invention, a touch display panel is proposed. The touch display panel includes a touch panel and a display panel. The touch panel includes a sensing substrate, a protective cover, a retaining wall and an adhesive. The retaining wall is formed between the sensing substrate and the protective cover, and the retaining wall has an opening, and the retaining wall surrounds an accommodating space. The adhesive is formed in the accommodating space and adheres to the sensing substrate and the protective cover. The display panel corresponds to the touch panel configuration.
根據本發明一實施例,提出一種觸控顯示面板之貼合方法。貼合方法包括以下步驟。提供一保護蓋板;形成一擋牆於保護蓋板上,其中擋牆具有開孔,擋牆圍繞一容置空間;形成一呈液態之黏合膠於該容置空間內;對組保護蓋板與一感應基板,其中擋牆形成於感應基板與保護蓋板之間;以及,固化對組後之保護蓋板與感應基板,使擋牆及呈液態之黏合膠固化。According to an embodiment of the invention, a method for bonding a touch display panel is proposed. The fitting method includes the following steps. Providing a protective cover; forming a retaining wall on the protective cover, wherein the retaining wall has an opening, the retaining wall surrounds an accommodating space; forming a liquid adhesive in the accommodating space; And a sensing substrate, wherein the retaining wall is formed between the sensing substrate and the protective cover; and curing the protective cover and the sensing substrate behind the group to cure the retaining wall and the liquid adhesive.
為了對本發明之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式,作詳細說明如下:In order to provide a better understanding of the above and other aspects of the present invention, the following detailed description of the embodiments and the accompanying drawings
請參照第1A及1B圖,第1A圖繪示依照本發明一實施例之觸控面板俯視圖,第1B圖繪示第1A圖中沿方向1B-1B’的剖視圖。Referring to FIGS. 1A and 1B, FIG. 1A is a plan view of a touch panel according to an embodiment of the present invention, and FIG. 1B is a cross-sectional view taken along line 1B-1B' of FIG. 1A.
如第1A圖所示,觸控面板100包括感應基板110、保護蓋板(Cover Glass)120、擋牆(Dam)130及黏合膠140(黏合膠140繪示於第1B圖)。As shown in FIG. 1A, the touch panel 100 includes a sensing substrate 110, a cover glass 120, a barrier 130, and an adhesive 140 (the adhesive 140 is shown in FIG. 1B).
如第1A圖所示,擋牆130圍繞容置空間SP。黏合膠140形成於容置空間SP內並黏合感應基板110與保護蓋板120。該黏合膠140亦稱為光學黏合膠,具有與玻璃(或與該黏合膠相鄰之其它介質層)折射率相近之折射率,可降低對穿越該黏合膠之透射光的影響。As shown in FIG. 1A, the retaining wall 130 surrounds the accommodating space SP. The adhesive 140 is formed in the accommodating space SP and adheres to the sensing substrate 110 and the protective cover 120. The adhesive 140, also known as an optical adhesive, has a refractive index close to that of the glass (or other dielectric layer adjacent to the adhesive), which reduces the effect on transmitted light passing through the adhesive.
如第1B圖所示,擋牆130形成於感應基板110與保護蓋板120之間,擋牆130具有至少一開孔130a。本實施例中,各開孔130a連通容置空間SP與擋牆130之外部。較佳但非限定地,該些開孔130a均勻地分布於保護蓋板120之邊緣。As shown in FIG. 1B, the retaining wall 130 is formed between the sensing substrate 110 and the protective cover 120, and the retaining wall 130 has at least one opening 130a. In this embodiment, each of the openings 130a communicates with the outside of the accommodating space SP and the retaining wall 130. Preferably, but not limited to, the openings 130a are evenly distributed on the edge of the protective cover 120.
本實施例中,擋牆130係環狀擋牆,較佳地係封閉環狀(closed shape)擋牆。由於擋牆130呈封閉狀,其可產生甚佳阻擋黏合膠140的作用,以減少或避免黏合膠140溢膠。當開孔130a的寬度W愈小,對避免溢膠的效果愈大。一實施例中,寬度W介於約0.5至1.2釐米(mm)之間。In this embodiment, the retaining wall 130 is an annular retaining wall, preferably a closed shaped retaining wall. Since the retaining wall 130 is closed, it can produce a very good barrier to the adhesive 140 to reduce or prevent the adhesive 140 from overflowing. When the width W of the opening 130a is smaller, the effect of avoiding overflow is increased. In one embodiment, the width W is between about 0.5 and 1.2 centimeters (mm).
此外,容置空間SP內之氣體可經由開孔130a排放至觸控面板100之外,減少或避免氣體殘留在容置空間SP內,形成具有氣泡缺陷的不良品。In addition, the gas in the accommodating space SP can be discharged to the outside of the touch panel 100 through the opening 130a, and the gas is reduced or prevented from remaining in the accommodating space SP, thereby forming a defective product having bubble defects.
請參照第1C圖,其繪示第1A圖中沿方向1C-1C’的剖視圖(方向1C-1C’經過開孔)。黏合膠140之一部分(例如是餘膠)形成於開孔130a內,因此可減少或避免黏合膠140的餘膠溢出至擋牆130之外部。黏合膠140可不超過擋牆130之外側面130s;或者,黏合膠140可實質上對齊擋牆130之外側面130s,例如,黏合膠140之外側面140s面與外側面130s共面。或者,黏合膠140可略突出於擋牆130之外側面130s。由於黏合膠140受到擋牆130之阻擋,黏合膠140突出擋牆130之外側面130s的量可控制在可接受或預期範圍內。也就是說,即使黏合膠140突出擋牆130之外側面130s,也不需特別去除(例如以人為擦拭)突出之黏合膠140。Referring to Fig. 1C, a cross-sectional view (direction 1C-1C' through the opening) in the direction 1C-1C' in Fig. 1A is shown. A portion of the adhesive 140 (for example, a residual glue) is formed in the opening 130a, so that the residual glue of the adhesive 140 can be reduced or prevented from overflowing to the outside of the retaining wall 130. The adhesive 140 may not exceed the outer side 130s of the retaining wall 130. Alternatively, the adhesive 140 may substantially align with the outer side 130s of the retaining wall 130. For example, the outer side 140s of the adhesive 140 may be coplanar with the outer side 130s. Alternatively, the adhesive 140 may protrude slightly beyond the outer side 130s of the retaining wall 130. Since the adhesive 140 is blocked by the retaining wall 130, the amount of the adhesive 140 protruding from the outer side 130s of the retaining wall 130 can be controlled within an acceptable or expected range. That is, even if the adhesive 140 protrudes from the outer side 130s of the retaining wall 130, it is not necessary to particularly remove (for example, by artificially rubbing) the protruding adhesive 140.
擋牆130具有多種結構,以下係舉例說明。The retaining wall 130 has a variety of configurations, as exemplified below.
請回到第1B圖,擋牆130可包括子擋牆131及數個分離擋牆132。子擋牆131環繞容置空間SP。該些分離擋牆132分離地配置於子擋牆131上,相鄰二分離擋牆132與子擋牆131定義對應之開孔130a。Returning to FIG. 1B, the retaining wall 130 may include a sub-retaining wall 131 and a plurality of separate retaining walls 132. The sub-retaining wall 131 surrounds the accommodating space SP. The separation walls 132 are disposed separately on the sub-retaining wall 131, and the adjacent two separation walls 132 and the sub-retaining wall 131 define corresponding openings 130a.
此外,子擋牆131與分離擋牆132的高低差H1約介於50至200微米(μm)之間。例如,子擋牆131之上表面131u與分離擋牆132之上表面132u的間距介於50至200微米之間。Further, the height difference H1 between the sub-retaining wall 131 and the separation retaining wall 132 is between about 50 and 200 micrometers (μm). For example, the distance between the upper surface 131u of the sub-retaining wall 131 and the upper surface 132u of the separation retaining wall 132 is between 50 and 200 microns.
請參照第2圖,其繪示依照本發明另一實施例之擋牆的剖視圖。觸控面板200中,其擋牆230包括數個高擋牆232及數個低擋牆231。各低擋牆231連接相鄰二高擋牆232。其中,各低擋牆231與相鄰二高擋牆232定義對應之開孔130a。Referring to FIG. 2, a cross-sectional view of a retaining wall in accordance with another embodiment of the present invention is shown. In the touch panel 200, the retaining wall 230 includes a plurality of high retaining walls 232 and a plurality of low retaining walls 231. Each of the low barrier walls 231 is connected to the adjacent two high barrier walls 232. Each of the low barrier walls 231 defines an opening 130a corresponding to the adjacent two high barrier walls 232.
一實施例中,開孔130a之寬度W介於約0.5至1.2 mm之間,而高擋牆232的厚度H2介於約100至500 μm。In one embodiment, the width W of the opening 130a is between about 0.5 and 1.2 mm, and the thickness H2 of the high barrier 232 is between about 100 and 500 μm.
請參照第3圖,其繪示依照本發明又一實施例之擋牆的剖視圖。觸控面板300中,其擋牆330包括數個粒狀擋牆331,相鄰二粒狀擋牆331彼此連接且定義對應之開孔130a。Please refer to FIG. 3, which is a cross-sectional view of a retaining wall in accordance with yet another embodiment of the present invention. In the touch panel 300, the retaining wall 330 includes a plurality of granular retaining walls 331, and the adjacent two granular retaining walls 331 are connected to each other and define corresponding openings 130a.
如第3圖中局部3A’之放大圖所示,各粒狀擋牆331具有曲面側壁331s,粒狀擋牆331之曲面側壁331s與相鄰之粒狀擋牆331之曲面側壁331s係相對而定義對應之開孔130a。As shown in the enlarged view of the portion 3A' in FIG. 3, each of the granular retaining walls 331 has curved side walls 331s, and the curved side walls 331s of the granular retaining walls 331 are opposite to the curved side walls 331s of the adjacent granular retaining walls 331. A corresponding opening 130a is defined.
本發明之擋牆的結構並不受上述實施例中所限制,只要是呈且具有至少一與外部相通之開孔的擋牆皆屬於本發明實施例之擋牆。The structure of the retaining wall of the present invention is not limited by the above embodiments, as long as the retaining wall having at least one opening communicating with the outside belongs to the retaining wall of the embodiment of the present invention.
請參照第4圖,其繪示依照本發明一實施例之觸控顯示面板的剖視圖。觸控顯示面板400包括顯示面板410、外框420及上述觸控面板100。一實施例中,觸控面板100可以用觸控面板200或300取代。顯示面板410對應觸控面板100配置。外框420圍繞顯示面板410及觸控面板100,以保護顯示面板410及觸控面板100。Please refer to FIG. 4, which is a cross-sectional view of a touch display panel according to an embodiment of the invention. The touch display panel 400 includes a display panel 410 , an outer frame 420 , and the touch panel 100 described above. In one embodiment, the touch panel 100 can be replaced with a touch panel 200 or 300. The display panel 410 is configured corresponding to the touch panel 100. The outer frame 420 surrounds the display panel 410 and the touch panel 100 to protect the display panel 410 and the touch panel 100.
請參照第5至8圖,其繪示第1圖之觸控面板之貼合方法的過程圖。Please refer to FIG. 5 to FIG. 8 , which are process diagrams of the bonding method of the touch panel of FIG. 1 .
如第5圖所示,提供保護蓋板120。於本步驟之前,可包括形成遮光層121於保護蓋板120之步驟,遮光層121形成於保護蓋板120之邊緣。此外,遮光層121例如是黑色矩陣。As shown in Fig. 5, a protective cover 120 is provided. Before the step, the step of forming the light shielding layer 121 on the protective cover 120 may be included, and the light shielding layer 121 is formed on the edge of the protective cover 120. Further, the light shielding layer 121 is, for example, a black matrix.
如第6A至7B圖所示,形成擋牆130(擋牆130繪示於第7A圖)於保護蓋板120上。其中,擋牆130具有至少一開孔130a,擋牆130圍繞容置空間SP,各開孔130a連通容置空間SP與擋牆130之外部。擋牆130例如是對應遮光層121之區域形成。As shown in FIGS. 6A to 7B, a retaining wall 130 (the retaining wall 130 is shown in FIG. 7A) is formed on the protective cover 120. The retaining wall 130 has at least one opening 130a. The retaining wall 130 surrounds the accommodating space SP, and each of the openings 130a communicates with the accommodating space SP and the outside of the retaining wall 130. The retaining wall 130 is formed, for example, in a region corresponding to the light shielding layer 121.
本實施例中,擋牆130包括子擋牆131及數個分離擋 牆132,其可分為二步驟形成,如下說明。In this embodiment, the retaining wall 130 includes a sub-retaining wall 131 and a plurality of separate blocks. Wall 132, which can be formed in two steps, is explained below.
如第6A及6B圖所示,第6B圖繪示第6A圖中沿方向6B-6B’的剖視圖。形成子擋牆131,其中子擋牆131環繞容置空間SP。As shown in Figs. 6A and 6B, Fig. 6B is a cross-sectional view taken along line 6B-6B' in Fig. 6A. The sub-retaining wall 131 is formed, wherein the sub-retaining wall 131 surrounds the accommodating space SP.
本步驟中,形成子擋牆131的方式例如是以噴嘴T1完成,噴嘴T1沿環狀路徑移動,並持續地擠出擋牆材料,以形成子擋牆131。噴嘴T1例如是塗佈頭(dispenser)。In this step, the manner in which the sub-retaining wall 131 is formed is, for example, completed by the nozzle T1, and the nozzle T1 is moved along the annular path, and the retaining wall material is continuously extruded to form the sub-retaining wall 131. The nozzle T1 is, for example, a dispenser.
此外,噴嘴T1的出膠量與出膠壓力、塗佈速度及噴嘴口徑成正比。透過控制噴嘴T1的出膠量與噴嘴T1的位移速度中至少一者可決定擋牆130的厚度,例如,噴嘴T1的出膠量愈大,則子擋牆131的厚度愈大;或者,噴嘴T1的位移速度愈慢,則子擋牆131的厚度愈大。In addition, the amount of glue discharged from the nozzle T1 is proportional to the dispensing pressure, the coating speed, and the nozzle diameter. The thickness of the retaining wall 130 can be determined by controlling at least one of the amount of glue discharged from the nozzle T1 and the displacement speed of the nozzle T1. For example, the larger the amount of the nozzle T1 is, the larger the thickness of the sub-retaining wall 131 is; or, the nozzle T1 The slower the displacement speed, the greater the thickness of the sub-retaining wall 131.
如第7A及7B圖所示,第7B圖繪示第7A圖中沿方向7B-7B’的剖視圖。形成數個分離擋牆132,其中分離擋牆132係分離地形成於子擋牆131上,相鄰二分離擋牆132與子擋牆131定義對應之開孔130a。As shown in Figs. 7A and 7B, Fig. 7B is a cross-sectional view taken along line 7B-7B' in Fig. 7A. A plurality of separating retaining walls 132 are formed, wherein the separating retaining walls 132 are separately formed on the sub-retaining wall 131, and the adjacent two separating retaining walls 132 and the sub-retaining wall 131 define corresponding openings 130a.
本步驟中,噴嘴T1沿環狀路徑移動,並斷續地擠出擋牆材料,以形成該些分離擋牆132。In this step, the nozzle T1 moves along the annular path and intermittently extrudes the retaining wall material to form the separate retaining walls 132.
如上所述,藉由分別形成二檔牆,可獲得具有高低差結構(子擋牆131及分離擋牆132)之擋牆130。As described above, the retaining wall 130 having the high and low difference structure (the sub-retaining wall 131 and the separating retaining wall 132) can be obtained by separately forming the second-order wall.
一實施例中,於形成擋牆130之步驟中,可一邊形成擋牆130,一邊預固化(pre-cure)形成後之擋牆130,以降低擋牆130的流動性,使其外型不易改變。例如,形成子擋牆131之一部分後,可隨即預固化子擋牆131之該部分,以降低子擋牆131之該部分的流動性。又例如,形成分離擋牆132之一部分後,可隨即預固化分離擋牆132之該部分,以降低分離擋牆132之該部分的流動性。此外,預固化的方式例如是照射紫外光(UV光)。In an embodiment, in the step of forming the retaining wall 130, the retaining wall 130 may be formed while pre-curing the rear retaining wall 130 to reduce the fluidity of the retaining wall 130, making the outer shape difficult to be formed. change. For example, after forming a portion of the sub-retaining wall 131, the portion of the sub-retaining wall 131 can be pre-cured to reduce the fluidity of the portion of the sub-retaining wall 131. As another example, after forming a portion of the split retaining wall 132, the portion of the split retaining wall 132 can be pre-cured to reduce the flow of the portion of the split retaining wall 132. Further, the pre-curing method is, for example, irradiation of ultraviolet light (UV light).
子擋牆131之擋牆材料及分離擋牆132之擋牆材料可相同或不同,本實施例之子擋牆131之擋牆材料及分離擋牆132之擋牆材料係以相同為例說明。擋牆材料在常溫下的黏度可甚高,然而,擋牆材料在噴嘴T1內經過加熱後,可降低擋牆材料的黏度,使其具備適當的流動性。一實施例中,擋牆材料在常溫下的黏度例如是100000厘泊(cps),而擋牆材料在噴嘴T1內經過加熱後其黏度可降低至5000 cps。此外,擋牆材料例如是透光擋牆材料。The retaining wall material of the sub-retaining wall 131 and the retaining wall material of the separating retaining wall 132 may be the same or different. The retaining wall material of the sub-retaining wall 131 and the retaining wall material of the separating retaining wall 132 of the present embodiment are described by way of example. The retaining wall material can have a very high viscosity at normal temperature. However, after the retaining wall material is heated in the nozzle T1, the viscosity of the retaining wall material can be reduced to have proper fluidity. In one embodiment, the viscosity of the retaining wall material at room temperature is, for example, 100,000 centipoise (cps), and the viscosity of the retaining wall material after heating in the nozzle T1 can be reduced to 5000 cps. Further, the retaining wall material is, for example, a light-transmitting retaining wall material.
如第8圖所示,形成一呈液態之黏合膠140於容置空間SP內。黏合膠140具有流動性,在黏合膠140形成於容置空間SP內後,其可往四周流動而佈滿容置空間SP。黏合膠140例如是透光黏合膠。黏合膠140的可黏度介於1000至4000厘泊之間。As shown in Fig. 8, a liquid adhesive 140 is formed in the accommodating space SP. The adhesive 140 has fluidity. After the adhesive 140 is formed in the accommodating space SP, it can flow to the periphery to fill the accommodating space SP. The adhesive 140 is, for example, a light-transmitting adhesive. The adhesive 140 has a viscosity of between 1000 and 4000 centipoise.
如第8圖所示,對組保護蓋板120與感應基板110,其中擋牆130形成於感應基板110與保護蓋板120之間。As shown in FIG. 8 , the group protection cover 120 and the sensing substrate 110 are formed, wherein the barrier wall 130 is formed between the sensing substrate 110 and the protective cover 120.
然後,固化對組後之保護蓋板120與感應基板110,使擋牆130及呈液態之黏合膠140完全固化。固化的方式例如是照射紫外光。黏合膠140固化後成為透明黏合膠。Then, the protective cover 120 and the sensing substrate 110 after the pair are cured to completely cure the retaining wall 130 and the liquid adhesive 140. The method of curing is, for example, irradiation with ultraviolet light. After the adhesive 140 is cured, it becomes a transparent adhesive.
請參照第9A至9C圖,其繪示第3圖之觸控面板之貼合方法的過程圖。以下係就擋牆230的步驟(第9A至9C圖)進行說明,第3圖之觸控面板之貼合方法的其它步驟係相似於第1圖之觸控面板之貼合方法的對應步驟,容此不再贅述。Please refer to FIG. 9A to FIG. 9C , which are process diagrams of the bonding method of the touch panel of FIG. 3 . The following is a description of the steps of the retaining wall 230 ( FIGS. 9A to 9C ). The other steps of the bonding method of the touch panel of FIG. 3 are similar to the corresponding steps of the bonding method of the touch panel of FIG. 1 . I will not repeat them here.
如第9A圖所示,噴嘴T1形成高擋牆232。例如,噴嘴T1沿環狀路徑移動,並持續地擠出擋牆材料,以形成高擋牆232。高擋牆232的厚度H3與噴嘴T1的高度成正比,例如,噴嘴T1高度愈高,則高擋牆232的厚度H3愈厚。As shown in Fig. 9A, the nozzle T1 forms a high retaining wall 232. For example, the nozzle T1 moves along an annular path and continuously extrudes the retaining wall material to form a high retaining wall 232. The thickness H3 of the high retaining wall 232 is proportional to the height of the nozzle T1. For example, the higher the height of the nozzle T1, the thicker the thickness H3 of the high retaining wall 232.
如第9B圖所示,降低噴嘴T1之高度,以形成低擋牆231,其中低擋牆231連接於高擋牆232。在此過程中,噴嘴T1沿環狀路徑移動,並持續地擠出擋牆材料,以形成低擋牆231。As shown in FIG. 9B, the height of the nozzle T1 is lowered to form a low retaining wall 231, wherein the low retaining wall 231 is connected to the high retaining wall 232. During this process, the nozzle T1 moves along the annular path and continuously extrudes the retaining wall material to form the low retaining wall 231.
如第9C圖所示,提高噴嘴T1之高度,以形成另一高擋牆232,另一高擋牆232連接於低擋牆231。其中,高擋牆232、低擋牆231與另一高擋牆232定義對應之開孔130a。As shown in FIG. 9C, the height of the nozzle T1 is raised to form another high retaining wall 232, and the other high retaining wall 232 is connected to the low retaining wall 231. The high retaining wall 232 and the low retaining wall 231 define another corresponding opening 130a.
形成擋牆230之過程中,噴嘴T1可持續地擠出擋牆材料而不中斷。During the formation of the retaining wall 230, the nozzle T1 can continuously extrude the retaining wall material without interruption.
透過控制噴嘴T1的出膠量與噴嘴T1的位移速度中至少一者可決定擋牆230的厚度。噴嘴T1在形成高擋牆232的出膠量與形成低擋牆231的出膠量可相同(出膠量不隨時間改變)或不同。當噴嘴T1之出膠量相同時,高擋牆232的體積與低擋牆231的體積實質上相等,然此非用限制本發明。當噴嘴T1之出膠量可變(例如隨時間或位置改變)時,高擋牆232的體積與低擋牆231的體積可不相等;或者,任二高擋牆232的體積可不相等;或者,任二低擋牆231的體積可不相等。進一步地說,當噴嘴T1之出膠量可變時,可形成二不同厚度之高擋牆232,或可形成二不同厚度之低擋牆231。The thickness of the retaining wall 230 can be determined by controlling at least one of the amount of glue discharged from the nozzle T1 and the displacement speed of the nozzle T1. The amount of glue that the nozzle T1 forms in the high retaining wall 232 may be the same as the amount of glue that forms the low retaining wall 231 (the amount of glue does not change with time) or different. When the amount of glue of the nozzle T1 is the same, the volume of the high retaining wall 232 is substantially equal to the volume of the low retaining wall 231, but the present invention is not limited. When the amount of glue of the nozzle T1 is variable (for example, changes with time or position), the volume of the high retaining wall 232 may not be equal to the volume of the low retaining wall 231; or the volume of any of the two high retaining walls 232 may be unequal; or The volume of any two low barrier walls 231 may not be equal. Further, when the amount of glue of the nozzle T1 is variable, the high retaining wall 232 of two different thicknesses may be formed, or the low retaining wall 231 of two different thicknesses may be formed.
一實施例中,可透過控制噴嘴T1的位移速度來控制低擋牆231及高擋牆232的厚度。例如,當噴嘴T1的位移速度愈慢時,則擋牆(低擋牆231及/或高擋牆232)的厚度愈大。In one embodiment, the thickness of the low barrier 231 and the high barrier 232 can be controlled by controlling the displacement speed of the nozzle T1. For example, when the displacement speed of the nozzle T1 is slower, the thickness of the retaining wall (the low retaining wall 231 and/or the high retaining wall 232) is larger.
然後,重複上述第9A至9C圖之過程,便可形成第3圖之擋牆230。Then, the process of Figs. 9A to 9C described above is repeated to form the retaining wall 230 of Fig. 3.
如上所述,在形成擋牆230之過程中,藉由調整噴嘴T1的高低位置可獲得具有高低差結構(高擋牆232與低擋牆231)之擋牆230。As described above, in the process of forming the retaining wall 230, the retaining wall 230 having the high and low difference structure (the high retaining wall 232 and the low retaining wall 231) can be obtained by adjusting the height position of the nozzle T1.
請參照第10圖,其繪示第5圖之觸控面板之貼合方法的過程圖。以下係就擋牆330的步驟(第10圖)進行說明,第3圖之觸控面板之貼合方法的其它步驟係相似於第1圖之觸控面板之貼合方法的對應步驟,容此不再贅述。Please refer to FIG. 10 , which is a process diagram of a method for bonding a touch panel of FIG. 5 . The following is a description of the step (FIG. 10) of the retaining wall 330. The other steps of the bonding method of the touch panel of FIG. 3 are similar to the corresponding steps of the bonding method of the touch panel of FIG. 1 . No longer.
如第10圖所示,形成數個粒狀擋牆331。例如,噴嘴T2以噴射方式噴出擋牆材料,以形成粒狀擋牆331。其中相鄰二粒狀擋牆331彼此連接且定義對應之開孔130a。透過噴射方式,可快速形成具有粒狀擋牆331之擋牆330。此外,噴嘴T2例如是噴射嘴(jet)。As shown in Fig. 10, a plurality of granular retaining walls 331 are formed. For example, the nozzle T2 sprays the retaining wall material in a spray manner to form a granular retaining wall 331. The adjacent two granular retaining walls 331 are connected to each other and define corresponding openings 130a. The retaining wall 330 having the granular retaining wall 331 can be quickly formed by the spraying method. Further, the nozzle T2 is, for example, a jet.
本實施例中,擋牆材料在噴嘴T2內經過加熱後可降低其黏度,然後再由噴嘴T2噴射出呈粒狀的擋牆331。並且,藉由噴嘴T2的移動,可形成擋牆330。一實施例中,由噴嘴T2噴射出的擋牆材料,其黏度可介於5000至10000 cps之間,亦即,擋牆材料可在噴嘴T2內加熱,使其黏度降低至5000至10000 cps後再噴射出。In this embodiment, the retaining wall material is heated to reduce its viscosity after being heated in the nozzle T2, and then the granular retaining wall 331 is ejected by the nozzle T2. Further, the retaining wall 330 can be formed by the movement of the nozzle T2. In one embodiment, the retaining wall material ejected by the nozzle T2 may have a viscosity of between 5,000 and 10,000 cps, that is, the retaining wall material may be heated in the nozzle T2 to reduce the viscosity to 5000 to 10000 cps. Spray again.
一實施例中,形成數個粒狀擋牆331亦可採用上述噴嘴T1完成。In one embodiment, the formation of a plurality of granular retaining walls 331 can also be accomplished using the nozzle T1 described above.
本發明上述實施例之觸控面板及應用其之觸控顯示面板與其貼合方法,觸控面板之擋牆具有至少一開孔,其可容納黏合膠的多餘部分,以減少或避免溢膠。此外,容置空間內之氣體可經由開孔排放至觸控面板之外,減少或避免氣體殘留在容置空間內。In the touch panel and the touch display panel using the same, the retaining wall of the touch panel has at least one opening, which can accommodate the excess portion of the adhesive to reduce or avoid overflow. In addition, the gas in the accommodating space can be discharged to the outside of the touch panel through the opening, thereby reducing or avoiding gas remaining in the accommodating space.
綜上所述,雖然本發明已以實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。In conclusion, the present invention has been disclosed in the above embodiments, but it is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.
100、200、300‧‧‧觸控面板100, 200, 300‧‧‧ touch panels
110‧‧‧感應基板110‧‧‧Induction substrate
120‧‧‧保護蓋板120‧‧‧Protection cover
121‧‧‧遮光層121‧‧‧Lighting layer
130、230、330‧‧‧擋牆130, 230, 330‧‧ ‧ retaining wall
130a‧‧‧開孔130a‧‧‧Opening
131‧‧‧子擋牆131‧‧‧Sub-retaining wall
131u、132u‧‧‧上表面131u, 132u‧‧‧ upper surface
130s、140s‧‧‧外側面130s, 140s‧‧‧ outside side
132‧‧‧分離擋牆132‧‧‧Separate retaining wall
140‧‧‧黏合膠140‧‧‧Adhesive
231‧‧‧低擋牆231‧‧‧low barrier
232‧‧‧高擋牆232‧‧‧High Retaining Wall
331‧‧‧粒狀擋牆331‧‧‧Grained retaining wall
331s‧‧‧曲面側壁331s‧‧‧ curved side wall
400‧‧‧觸控顯示面板400‧‧‧Touch display panel
410‧‧‧顯示面板410‧‧‧ display panel
420‧‧‧外框420‧‧‧Front frame
H1‧‧‧高低差H1‧‧‧ height difference
H2、H3‧‧‧厚度H2, H3‧‧‧ thickness
SP‧‧‧容置空間SP‧‧‧ accommodating space
T1、T2‧‧‧噴嘴T1, T2‧‧‧ nozzle
W‧‧‧寬度W‧‧‧Width
第1A圖繪示依照本發明一實施例之觸控面板俯視圖。FIG. 1A is a top view of a touch panel according to an embodiment of the invention.
第1B圖繪示第1A圖中沿方向1B-1B’的剖視圖。Fig. 1B is a cross-sectional view taken along line 1B-1B' in Fig. 1A.
第1C圖繪示第1A圖中沿方向1C-1C’的剖視圖。Fig. 1C is a cross-sectional view taken along line 1C-1C' in Fig. 1A.
第2圖繪示依照本發明另一實施例之擋牆的剖視圖。2 is a cross-sectional view of a retaining wall in accordance with another embodiment of the present invention.
第3圖繪示依照本發明又一實施例之擋牆的剖視圖。3 is a cross-sectional view of a retaining wall in accordance with yet another embodiment of the present invention.
第4圖繪示依照本發明一實施例之觸控顯示面板的剖視圖。4 is a cross-sectional view of a touch display panel in accordance with an embodiment of the invention.
第5至8圖繪示第1圖之觸控面板之貼合方法的過程圖。5 to 8 are process diagrams showing a method of bonding the touch panel of FIG. 1 .
第9A至9C圖繪示第3圖之觸控面板之貼合方法的過程圖。9A to 9C are process diagrams showing a method of bonding the touch panel of FIG. 3.
第10圖繪示第5圖之觸控面板之貼合方法的過程圖。FIG. 10 is a process diagram of a method of bonding a touch panel of FIG. 5.
100...觸控面板100. . . Touch panel
110...感應基板110. . . Induction substrate
120...保護蓋板120. . . Protective cover
130...擋牆130. . . Retaining wall
130a...開孔130a. . . Opening
131...子擋牆131. . . Sub-retaining wall
131u、132u...上表面131u, 132u. . . Upper surface
132...分離擋牆132. . . Separation retaining wall
140...黏合膠140. . . Adhesive
H1...高低差H1. . . Height difference
SP...容置空間SP. . . Housing space
W...寬度W. . . width
Claims (6)
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TWI721738B (en) * | 2019-12-25 | 2021-03-11 | 大陸商業成科技(成都)有限公司 | Display device and touch display device |
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TWI494811B (en) * | 2013-06-06 | 2015-08-01 | Cando Corp | Touch display and method for making touch display thereof |
CN103336599B (en) * | 2013-06-13 | 2016-07-13 | 业成光电(深圳)有限公司 | Touching display screen |
CN103336604B (en) * | 2013-06-14 | 2016-12-28 | 业成光电(深圳)有限公司 | touch module |
CN103336606B (en) * | 2013-06-14 | 2016-03-02 | 业成光电(深圳)有限公司 | touch module |
TWI543037B (en) * | 2013-08-01 | 2016-07-21 | 仁寶電腦工業股份有限公司 | Touch module and assembling method thereof |
TWI614797B (en) * | 2017-02-02 | 2018-02-11 | 恆顥科技股份有限公司 | Electronic device and manufacturing method thereof |
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TWI721738B (en) * | 2019-12-25 | 2021-03-11 | 大陸商業成科技(成都)有限公司 | Display device and touch display device |
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