TWI417938B - Wafer/photovoltaic panel cutting waste handling process and equipment - Google Patents
Wafer/photovoltaic panel cutting waste handling process and equipment Download PDFInfo
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本發明是有關於一種處理矽晶板切割廢棄物的製程及裝置。The invention relates to a process and a device for processing a waste plate cutting waste.
半導體產業(Semiconductor Industry)及太陽能光電板產業(Silicon Solar Cell & Photovoltaic Industry)正蓬勃發展，而在半導體晶片以及太陽能板的生產過程中，為了將矽晶板切割成符合需要的尺寸，製造商通常會使用到矽晶板切割製程(wafer cutting process)。雖然，矽晶板切割製程有很多種，但是技術最成熟也廣為大多數製造商所採用的是一種名為軸線鋸切(wire sawing)的一種專利的矽晶板切割製程。The semiconductor industry and the solar cell industry (Silicon Solar Cell & Photovoltaic Industry) are booming, and in the production of semiconductor wafers and solar panels, in order to cut the crystal plates into the required size, manufacturers usually A wafer cutting process will be used. Although there are many kinds of twin-plate cutting processes, the most mature technology and widely used by most manufacturers is a patented twin-plate cutting process called wire sawing.
所謂軸線鋸切是一種運用俗名為金鋼砂的碳化矽做為切割研磨料的一種切割技術；作業時，切割機台上配置一組能夠不斷的自動調整張力(tension)且多條並行的不銹鋼軸線機構(stainless steel wire mechanism)不斷的迴轉運行，而其運行速度達到每秒10-15公尺(10-15m/sec)而能與矽晶板被切割面維持一種持續施壓的密接；同時，機台上向著不銹鋼軸線面對矽晶板一側的一種高速噴嘴則不間斷的噴射出一種預先調配好的水溶性切割液(Aqueous cutting fluid或稱為cutting slurry)噴在不銹鋼軸線上，而切割液的主要成份則包含俗稱金鋼砂的碳化矽(Silicon Carbide)、聚乙二醇(Polyethylene Glycol簡稱PEG)、切削油(Cutting oil)、以及冷卻水等成份。由於切割液中所含的碳化矽是一種硬度極高的研磨料(abrasive)，因此，噴在軸線鋸上面對矽晶板的施壓面時，會使軸線鋸在高速運行中對矽晶板產生蝕刻及鋸切作用，而切割液中的聚乙二醇與水則作為冷卻劑及清洗劑以便將鋸屑即矽粉及雜質不斷的排出軸線鋸以及矽晶板的接觸面將鋸切面洗淨，切削油則提供潤滑功能，使得鋸切過程能順利行進而不產生跳動以使切割面保持平整，整個切割製程於焉能夠順利進行。The so-called axial sawing is a kind of cutting technology that uses the carbonized bismuth known as gold steel sand as the cutting abrasive. During the operation, the cutting machine is equipped with a set of automatic tension adjustment and multiple parallel stainless steel. The stainless steel wire mechanism continually rotates and runs at a speed of 10-15 meters (10-15 m/sec) per second to maintain a continuous pressure contact with the cut surface of the twin plate; A high-speed nozzle on the machine table facing the stainless steel axis facing the side of the twine plate continuously ejects a pre-formed water-soluble cutting fluid (Aqueous cutting) The fluid or cutting slurry is sprayed on the stainless steel axis, and the main component of the cutting fluid contains Silicon Carbide, Polyethylene Glycol (PEG), Cutting Oil (commonly known as gold steel sand). And cooling water and other ingredients. Since the niobium carbide contained in the cutting fluid is an extremely abrasive abrasive, when the pressure is applied to the pressing surface of the twine plate on the axis saw, the axial saw will be twinned at high speed. The plate is etched and sawed, and the polyethylene glycol and water in the cutting liquid act as a coolant and a cleaning agent to continuously discharge the sawdust, that is, the powder and impurities, from the axis saw and the contact surface of the crystal plate to wash the saw surface. The net, cutting oil provides lubrication so that the sawing process can travel smoothly without bounce to keep the cutting surface flat, and the entire cutting process can be carried out smoothly.
而於切割作業中，使用過的切割液則會與被切下的矽粉以及雜質混合且不斷的排出至機台外部成為一種漿狀的廢棄物，一般稱為矽晶板切割廢棄物(PV-Panel or wafer cutting waste)；此種廢棄物係一種有害工業廢棄物，如未進行處理而隨意棄置，將會對環境造成危害。In the cutting operation, the used cutting liquid is mixed with the cut tantalum powder and impurities and continuously discharged to the outside of the machine to become a kind of slurry waste, which is generally called crystal plate cutting waste (PV). -Panel or wafer cutting waste); such waste is a hazardous industrial waste that, if left untreated, will cause environmental hazards.
雖然，之前有業者嘗試使用焚化法或深井注入法處理此種廢棄物，但其成效不彰；例如，採用焚化法時，由於矽晶板切割廢棄物本身熱值很低，焚化前必須在廢棄物中添加足夠的燃料油以提高其熱值再進行焚化，再則，由於廢棄物中的固體廢棄物所含的碳 化矽在焚化後會形成一層黏膜滲透入焚化爐爐壁，容易造成爐壁結構毀損，因此，由於高昂的處理費以及容易毀損焚化爐的問題使得焚化法目前已極少被採用。而在深井注入法方面，主要是利用廢棄的礦坑，將廢棄物注入其中儲藏，但由於此種方式如不慎引起滲漏將會產生污染地下水的問題，因此除了之前日本有些許案例外，其他國家很少採用。Although some practitioners have tried to use the incineration method or deep well injection method to treat such wastes, their effectiveness is not good. For example, when using the incineration method, since the calcined sheet cutting waste itself has a low calorific value, it must be discarded before incineration. Add enough fuel oil to increase its calorific value and then incinerate it, and then, the carbon contained in the solid waste in the waste After incineration, phlegm will form a layer of mucous membrane penetrating into the wall of the incinerator, which will easily cause damage to the structure of the furnace wall. Therefore, the incineration method has been rarely adopted due to the high treatment cost and the problem of easily damaging the incinerator. In the deep well injection method, the waste is mainly used to inject waste into the storage. However, if this method causes leakage, it will cause pollution of groundwater. Therefore, in addition to some cases in Japan before, other The country rarely uses it.
除了焚化法、深井注入法之外，德國廠商也有採用框板式過濾機(Chamber filter press)，或以Hydro-cyclone(旋流式固液分離機)先將廢棄物過濾之後，再進一步對固體物進行選別(Sorting)，之後，再將廢棄物中的碳化矽(SiC)、聚乙二醇(PEG)，以及矽粉(Si)分別加以回收，以便再度將碳化矽、聚乙二醇再度調製成切割矽晶片製程所須的切割液供製程再利用，這是比較先進的做法。In addition to incineration and deep well injection methods, German manufacturers also use a Chamber filter press or a Hydro-cyclone to filter the waste before further solids. After sorting, the waste silicon carbide (SiC), polyethylene glycol (PEG), and tantalum powder (Si) are separately recovered to re-modulate tantalum carbide and polyethylene glycol. It is a relatively advanced practice to cut the cutting fluid required for the process of cutting the wafer to be reused.
但是由於使用這種製程所使用的設備其造價很高，因此其服務費用也非常高昂。因此，除了德國及德商在中國大陸設廠的部份外，其他國家的工廠則很少採用這種處理技術或服務。However, because the equipment used in this process is expensive, its service costs are also very high. Therefore, except for the German and German companies that set up factories in mainland China, factories in other countries rarely use this treatment technology or service.
根據統計，目前提供矽晶板切割所需的切割液(Cutting fluid)，至2008年6月份為止，每年的總需求量約為20萬噸(200,000MT)，工廠使用回收的切割液的總量則不足8萬噸，換言之，未經處理的切割廢棄物則有12萬噸。而至2010年為止，全球總需求 量約為57萬噸，而預估使用回收的切割液的總量約為23萬噸，亦即，未經處理的廢棄物將會高達34萬噸，而在2011年，估計全球全球總需求量將會超過69萬噸，未經處理的廢棄物將會高達46萬噸，這個數字真是令人觸目心驚。According to statistics, the cutting fluid required for the cutting of the crystal plate is currently available. As of June 2008, the total annual demand is about 200,000 tons (200,000 MT), and the total amount of the cutting fluid recovered by the factory is used. Less than 80,000 tons, in other words, 120,000 tons of untreated cutting waste. And by 2010, global demand The amount is about 570,000 tons, and the total amount of cutting fluid that is estimated to be recycled is about 230,000 tons, that is, untreated waste will be as high as 340,000 tons. In 2011, the global total demand is estimated. The amount will exceed 690,000 tons, and untreated waste will be as high as 460,000 tons. This figure is really shocking.
目前，市面上所能提供的處理技術有限，另一方面，由於矽晶板的生產價值極高，廠商獲利豐厚，因此，多數的矽晶板生產工廠對矽晶板切割廢棄物需要立即進行處理的議題也多予以忽略；因此，選擇工廠的一個角落暫時堆置就成了主要的解決方案，致使此一問題越來越嚴重，而已到需要全面檢討的時刻。At present, the processing technology available on the market is limited. On the other hand, due to the high production value of the crystal plate, the manufacturers are profitable. Therefore, most of the crystal plate production plants need to immediately cut the waste of the crystal plate. The issues dealt with are also ignored; therefore, the temporary stacking of a corner of the factory has become the main solution, making this problem more and more serious, and it has reached a time when a comprehensive review is needed.
本發明之目的，旨在提供一種能夠進行資源回收再利用，且可避免二次污染的處理矽晶板切割廢棄物的製程及裝置。It is an object of the present invention to provide a process and apparatus for processing a crystal-plate cutting waste that can be recycled and reused, and which can avoid secondary pollution.
根據本發明所提出之一種處理矽晶板切割廢棄物的製程，包含以下步驟：(A)：固液分離製程，將廢棄物中的固體與液體先進行分離，以分離出固體廢棄物與液體廢棄物。According to the present invention, a process for treating a waste plate cutting waste comprises the following steps: (A): a solid-liquid separation process for separating solids and liquids in the waste to separate solid waste and liquid Waste.
(B)：廢水分離製程，接續(A)，以薄膜蒸發方式將液體廢棄物的中的廢水分離出來。(B): The wastewater separation process is continued (A), and the wastewater in the liquid waste is separated by thin film evaporation.
(C)：聚乙二醇回收製程，接續前述(B)，將已分離出廢水的液體廢棄物，再以薄膜蒸發方式分離出聚 乙二醇。(C): Polyethylene glycol recovery process, followed by the above (B), the liquid waste from which the wastewater has been separated, and then separated by a thin film evaporation method Ethylene glycol.
(D)：廢油回收製程，其接續前述(C)，將分離出聚乙二醇的殘餘液體廢棄物，以分子蒸餾方式析出其中的廢油(回收油)成份，再加以包裝出售，而殘存的廢油渣則加以焚化。(D): The waste oil recovery process, which continues the above (C), separates the residual liquid waste of polyethylene glycol, and separates the waste oil (recycled oil) component by molecular distillation, and then packages and sells it. The remaining waste oil residue is incinerated.
依照上述，本發明所提出的處理矽晶板切割廢棄物的製程，在前述(A)中，分離出的固體廢棄物進入一固體廢棄物處理製程，透過乾燥、浮選、及選別等技術，將所有固體廢棄物包含碳化矽(SiC)、矽粉(Si)、雜質等物質進行完整的分離，以便再進行加工再利用，或以固形化技術進行固化。According to the above, the process for treating the waste cutting of the crystal plate proposed by the present invention, in the above (A), the separated solid waste enters a solid waste treatment process, through drying, flotation, and sorting techniques, All solid wastes, including tantalum carbide (SiC), tantalum powder (Si), impurities, etc., are completely separated for further processing and re-use, or solidified by solidification techniques.
依照上述，本發明所提出之處理矽晶板切割廢棄物的製程，在前述(B)中，分離後的廢水送入廢水處理廠進行處理。According to the above, the process for treating the slab-cutting waste proposed by the present invention, in the above (B), the separated wastewater is sent to a wastewater treatment plant for treatment.
依照上述，本發明所提出之處理矽晶板切割廢棄物的製程，在前述(C)中，將分離後的聚乙二醇溶液加以包裝及出售。According to the above, the process for treating the slab-cutting waste proposed by the present invention, in the above (C), the separated polyethylene glycol solution is packaged and sold.
依照上述，本發明所提出之處理矽晶板切割廢棄物的製程，在前述(D)中，將分離出的廢油回收，裝桶後出售，而由製程排出的殘存廢油渣則加以焚化。According to the above, the process for treating the waste cutting of the crystal plate proposed by the present invention, in the above (D), recovering the separated waste oil, selling it in a barrel, and incinerating the residual waste oil discharged from the process. .
依照上述本發明所提出之處理矽晶板切割廢棄物的製程，在前述(A)中，此固液分離製程包含重力 式與旋流式固液分離，以及碟盤式離心分離。According to the above process of the present invention for treating a crystal plate cutting waste, in the above (A), the solid-liquid separation process includes gravity Type and cyclone solid-liquid separation, as well as disc-type centrifugal separation.
根據本發明所提出之一種處理矽晶板切割廢棄物的製程，包含一固液分離單元、一個第一薄膜蒸發單元、一個第二薄膜蒸發單元及一分子蒸餾單元。該固液分離單元的功能，係將廢棄物中的液體廢棄物與固體廢棄物作分離。該第一薄膜蒸發單元的功能，係將固液分離單元中所分離出的液體廢棄物，經過薄膜蒸發器將液體廢棄物中的廢水分離出來。該第二薄膜蒸發單元的功能，係將由第一薄膜蒸發單元中已分離出廢水的液體廢棄物，經過薄膜蒸發器分離出聚乙二醇。該分子蒸餾單元的功能，係將由第二薄膜蒸發單元中已分離出聚乙二醇的殘餘液體廢棄物，經過分子蒸餾器析出廢油，且排出殘餘的廢油渣。A process for treating a crystal plate cutting waste according to the present invention comprises a solid-liquid separation unit, a first thin film evaporation unit, a second thin film evaporation unit and a molecular distillation unit. The function of the solid-liquid separation unit is to separate the liquid waste in the waste from the solid waste. The function of the first thin film evaporation unit is to separate the liquid waste separated from the liquid waste by the liquid waste separated by the solid-liquid separation unit. The function of the second thin film evaporation unit is to separate the polyethylene waste which has separated the waste water from the first thin film evaporation unit and separate the polyethylene glycol through the thin film evaporator. The function of the molecular distillation unit is to remove the residual liquid waste of polyethylene glycol from the second thin film evaporation unit, precipitate the waste oil through the molecular distiller, and discharge the residual waste oil residue.
依照上述，本發明所提出之處理矽晶板切割廢棄物的裝置，其中該固液分離單元包含一重力式固液分離機、一旋流式固液分離機、一碟盤式離心分離機、二個調合槽及數個泵浦。According to the above, the apparatus for processing a silicon wafer cutting waste according to the present invention, wherein the solid-liquid separation unit comprises a gravity solid-liquid separator, a cyclone solid-liquid separator, a disc-disc centrifugal separator, Two mixing slots and several pumps.
依照上述，本發明所提出之處理矽晶板切割廢棄物的裝置，其中該第一薄膜蒸發單元包含一原料槽、一調合槽、一預熱器、一薄膜蒸發器、一冷凝器、二只物料暫存槽、一廢水儲槽、一導熱油爐、一導熱油膨脹槽及數個泵浦。According to the above, the apparatus for processing a silicon wafer cutting waste according to the present invention, wherein the first thin film evaporation unit comprises a raw material tank, a mixing tank, a preheater, a thin film evaporator, a condenser, and two Material storage tank, a waste water storage tank, a heat transfer oil furnace, a heat transfer oil expansion tank and several pumps.
依照上述，本發明所提出之處理矽晶板切割廢棄物的裝置，其中該第二薄膜蒸發單元包含一預熱器、 一薄膜蒸發器、一冷凝器、二只物料暫存槽、一聚乙二醇儲槽、一導熱油爐、一導熱油膨脹槽及數個泵浦。According to the above, the apparatus for processing a silicon wafer cutting waste according to the present invention, wherein the second thin film evaporation unit comprises a preheater, A thin film evaporator, a condenser, two material temporary storage tanks, a polyethylene glycol storage tank, a heat transfer oil furnace, a heat transfer oil expansion tank and a plurality of pumps.
依照上述，本發明所提出之處理矽晶板切割廢棄物的裝置，其中該分子蒸餾單元包含一預熱器、一刮板式分子蒸餾器、一冷井、二只暫存槽、一真空緩衝槽、一氣液分離器、一導熱油爐、一導熱油膨脹槽、一廢油渣儲槽及數個泵浦。According to the above, the apparatus for processing a silicon wafer cutting waste according to the present invention, wherein the molecular distillation unit comprises a preheater, a scraper molecular distiller, a cold well, two temporary storage tanks, and a vacuum buffer tank. A gas-liquid separator, a heat-conducting oil furnace, a heat-conducting oil expansion tank, a waste oil slag storage tank and a plurality of pumps.
依照上述，本發明所提出之處理矽晶板切割廢棄物的裝置，其中更包含一冷卻單元，用以提供冷卻水供各單元製程作冷卻(熱交換)之用途。該冷卻單元包含一冷卻水循環單元與一冰水機組；而該冷卻水循環單元則包含一冷卻水塔與數個冷卻水循環泵。According to the above, the apparatus for processing a silicon wafer cutting waste according to the present invention further comprises a cooling unit for providing cooling water for each unit process for cooling (heat exchange). The cooling unit comprises a cooling water circulation unit and a chiller unit; and the cooling water circulation unit comprises a cooling water tower and a plurality of cooling water circulation pumps.
如上所述，針對目前市面並無足夠的供應市場需要的妥善方法，能對矽晶板切割所產生的廢棄物進行完整的處理，達成資源完全回收的目的，以致於矽晶板切割所產生的廢棄物之積存量越來越多。本發明提出一種經濟且容易操作的方法，可供廠商運用，以便將這些廢棄物進行完整的處理，達到資源完全回收的目標。As mentioned above, there is no adequate method for the supply market in the market, and the waste generated by the cutting of the crystal plate can be completely processed to achieve the purpose of complete recycling of the resources, so that the crystal plate is cut. The accumulation of waste is increasing. The present invention proposes an economical and easy-to-operate method that can be used by manufacturers to carry out complete processing of these wastes to achieve the goal of complete resource recovery.
本發明之主要方法是先將廢棄物調合，再送入重力式固液分離機將廢棄物中的固體廢棄物以及液體廢棄物先進行固液分離，以脫除其中比重最大的碳化矽(金鋼砂)以及無機物，然後再將其中仍然含有相當比例固體廢棄物的漿狀廢棄物送入旋流式固液分離 機，以去除其中比重較大的矽粉及雜質，然後經二次調合後，再將殘餘的廢棄物泵入碟盤式高速離心分離機進行固液分離，將殘留的固體廢棄物自漿狀的廢棄物中脫除，完成固液分離程序。The main method of the invention is to first mix the wastes and then send them to the gravity solid-liquid separator to separate the solid waste and the liquid waste in the waste by solid-liquid separation to remove the carbonized strontium (Golden Steel) with the largest specific gravity. Sand) and inorganic matter, and then the slurry waste still containing a considerable proportion of solid waste into the cyclone solid-liquid separation Machine to remove the bismuth powder and impurities with a large specific gravity, and then after the second blending, the residual waste is pumped into a disc-type high-speed centrifugal separator for solid-liquid separation, and the residual solid waste is self-slurry. The waste is removed and the solid-liquid separation process is completed.
完成固液分離程序後，所收集的固體廢棄物，再利用乾燥、浮選、及選別等技術，將所有固體廢棄物包含碳化矽、矽粉、雜質等物質進行完整的分離，以便再進行加工再利用，或以固形化技術進行固化；有關固體廢棄物的乾燥、浮選、及選別等相關技術、或者以固形化技術將固體廢棄物固形化方面，目前坊間已有許多成熟的技術可資運用，且亦非本項發明的所要論述的重點，因此不在此贅述。After the completion of the solid-liquid separation process, the collected solid wastes are then subjected to drying, flotation, and sorting techniques to completely separate all solid wastes including niobium carbide, tantalum powder, and impurities for further processing. Reuse, or solidification technology for solidification; related technologies such as drying, flotation, and sorting of solid waste, or solidification of solid waste by solidification technology, there are many mature technologies available in the market. It is not the focus of the present invention, and therefore will not be described here.
而完成固液分離後的液體廢棄物方面，則是使用泵浦將之泵入一個由二組薄膜蒸發器、一組分子蒸餾器、以及相關週邊設備所組成的連續性真空蒸餾製程單元進行處理，而依據不同物質沸騰溫度之高低順序，將液體廢棄物中的廢水、聚乙二醇、以及廢油分別蒸餾出來；分離後的廢水則送入廢水處理廠進行處理，聚乙二醇溶液、回收油(廢油)則進行包裝加以出售，殘餘小量的廢油渣則加以焚化，達到針對矽晶板切割廢棄物完整處理的目標。The liquid waste after the solid-liquid separation is pumped into a continuous vacuum distillation process unit consisting of two sets of thin film evaporators, a group of molecular distillers, and related peripheral equipment. According to the order of boiling temperature of different substances, the wastewater, polyethylene glycol, and waste oil in the liquid waste are separately distilled; the separated wastewater is sent to a wastewater treatment plant for treatment, polyethylene glycol solution, The recovered oil (waste oil) is packaged and sold, and a small amount of waste oil residue is incinerated to achieve the goal of complete treatment of the cutting waste of the crystal plate.
參閱第1圖，本發明處理矽晶板切割廢棄物的製 程，該方法包含以下流程：(A)：如流程10，係一固液分離製程，係將廢棄物中的固體與液體進行分離處理，分離出的液體廢棄物泵入流程11之液體廢棄物處理製程，分離出的固體廢棄物則進入流程12之固體廢棄物處理製程，透過乾燥、浮選、及選別等技術，將所有固體廢棄物包含碳化矽、矽粉、雜質等物質進行完整分離，以便進行加工再利用，或以固形化技術進行固化。Referring to Figure 1, the present invention processes the production of silicon wafer cutting waste. The method comprises the following steps: (A): as in Process 10, a solid-liquid separation process for separating solids and liquids in waste, and separating the liquid waste into liquid waste of Process 11 The treatment process, the separated solid waste enters the solid waste treatment process of Process 12, and completely separates all solid wastes including cerium carbide, strontium powder, impurities, etc. through drying, flotation, and sorting techniques. For processing and reuse, or solidification technology for curing.
(B)：如流程13，係一廢水分離製程，係將固液分離後的液體廢棄物使用泵浦將之泵入第一組薄膜蒸發器，將液體廢棄物中的廢水131蒸餾出來。分離後的廢水131則送入廢水處理廠進行處理。(B): According to the process 13, a wastewater separation process is carried out by pumping the liquid waste after solid-liquid separation into a first group of thin film evaporators, and distilling the waste water 131 in the liquid waste. The separated wastewater 131 is sent to a wastewater treatment plant for treatment.
(C)：如流程14，係一聚乙二醇回收製程，其接續前述(B)，將分離出廢水131的液體廢棄物，由第二組薄膜蒸發器以薄膜蒸發方式分離出液體廢棄物中的聚乙二醇141。分離後之聚乙二醇141溶液則加以包裝出售。(C): If the process is a polyethylene glycol recovery process, which is followed by the above (B), the liquid waste of the waste water 131 is separated, and the second group of thin film evaporators separates the liquid waste by thin film evaporation. Polyethylene glycol 141. The separated polyethylene glycol 141 solution is packaged for sale.
(D)：如流程15，係一廢油回收製程，其接續前述(C)，將分離出聚乙二醇141的殘餘液體廢棄物，以分子蒸餾方式析出其中的廢油151(回收油)成份，再加以包裝出售，而殘存的廢油渣則加以焚化。(D): If the process is a waste oil recovery process, which is followed by the above (C), the residual liquid waste of the polyethylene glycol 141 is separated, and the waste oil 151 (recycled oil) is separated by molecular distillation. The ingredients are then packaged for sale, and the remaining waste oil slag is incinerated.
參閱第2圖，本發明處理矽晶板切割廢棄物的裝置，包含一固液分離單元100、一個第一薄膜蒸發單元200、一個第二薄膜蒸發單元300、一分子蒸餾單 元400及一冷卻單元600。Referring to FIG. 2, the apparatus for processing a silicon wafer cutting waste according to the present invention comprises a solid-liquid separation unit 100, a first thin film evaporation unit 200, a second thin film evaporation unit 300, and a molecular distillation list. Element 400 and a cooling unit 600.
參照第2圖與第3圖，該固液分離單元100包含一重力式固液分離機110、一旋流式固液分離機120、一碟盤式離心分離機130、二只調合槽140、150及三組泵浦510、511、512。Referring to FIGS. 2 and 3 , the solid-liquid separation unit 100 includes a gravity type solid-liquid separator 110 , a swirling type solid-liquid separator 120 , a disc-type centrifugal separator 130 , and two mixing tanks 140 . 150 and three sets of pumps 510, 511, 512.
於作業時，先導入切割矽晶板所產生之漿狀廢棄物進入調合槽140，啟動調合槽140之攪拌機，讓廢棄物於槽中攪拌均勻，此時，持續由外部送入廢棄物，直至調合槽中的液位達到預設之高液位為止；調合槽140達到預設之高液位時，泵浦512啟動，將廢棄物送入重力式固液分離機(Solid Separator)110進行初步之固液分離；同時，由於廢棄物中比重最大的碳化矽(SiC金鋼砂)以及大多數的矽粉(Si)會落入重力式固液分離機110底部，而廢油、水、少量矽粉、雜質、以及聚乙二醇的混合物則懸浮至重力式固液分離機表層，再經由末端之堰板流入重力式固液分離機暫存槽中，於暫存槽內之液位達到高液位時，泵浦522啟動，將漿狀廢棄物送至旋流式固液分離機120，此時，殘留於漿狀廢棄物中比重較重的矽粉以及部份雜質會由旋流式固液分離機120下方的出口排出，落入下方預先設置之暫存槽等待進一步處理；而比重較輕的廢水、聚乙二醇、廢油、雜質、以及少量的矽粉等混合物則被送入後端的調合槽150進行調合，且於調合槽150液位抵達預設之高液位時，泵浦510啟動， 將殘存的廢棄物送入碟盤式固液分離機200進行最後階段的機械式固液分離製程；進入碟盤式固液分離機200的廢棄物則被分成兩股，比重稍重的殘餘固體廢棄物由碟盤式固液分離機200下方出口排入預設之儲槽中，準備委外處理，而比重較輕的廢水、聚乙二醇、以及廢油等混合物則由上方出口排出，再進入次一階段(第一薄膜蒸發單元200)之液體廢棄物處理製程單元。During the operation, the slurry waste generated by cutting the crystal plate is first introduced into the mixing tank 140, and the mixer of the mixing tank 140 is started to make the waste evenly stirred in the tank. At this time, the waste is continuously sent from the outside until the waste is sent to the outside. When the liquid level in the mixing tank reaches the preset high liquid level; when the mixing tank 140 reaches the preset high liquid level, the pump 512 is started, and the waste is sent to the gravity solid-liquid separator (Solid Separator) 110 for preliminary Solid-liquid separation; at the same time, due to the largest specific gravity of the waste, strontium carbide (SiC gold sand) and most of the tantalum powder (Si) will fall into the bottom of the gravity solid-liquid separator 110, while waste oil, water, a small amount The mixture of bismuth powder, impurities, and polyethylene glycol is suspended to the surface of the gravity solid-liquid separator, and then flows into the gravity solid-liquid separator temporary storage tank through the end slab, and the liquid level in the temporary storage tank is reached. At the high liquid level, the pump 522 is started, and the slurry waste is sent to the cyclone type solid-liquid separator 120. At this time, the fine powder and some impurities remaining in the slurry waste are swirled. The outlet below the solid-liquid separator 120 is discharged, and falls below the pre-pre The set temporary storage tank is awaiting further processing; and a mixture of lighter-weight wastewater, polyethylene glycol, waste oil, impurities, and a small amount of tantalum powder is sent to the rear-end blending tank 150 for blending, and in the blending tank 150 When the liquid level reaches the preset high level, the pump 510 starts. The remaining waste is sent to the disc-type solid-liquid separator 200 for the final stage of the mechanical solid-liquid separation process; the waste entering the disc-type solid-liquid separator 200 is divided into two, and the residual solids having a heavier specific gravity are discarded. The material is discharged into the preset storage tank from the lower outlet of the disc type solid-liquid separator 200, and is prepared for external treatment, and the mixture of waste water, polyethylene glycol, and waste oil which are relatively light in weight is discharged from the upper outlet, and then The liquid waste treatment process unit that enters the next stage (first thin film evaporation unit 200).
參照第2圖與第4圖，該第一薄膜蒸發單元200包含一原料槽210、一調合槽220、一預熱器230、一薄膜蒸發器240、一冷凝器250、二只物料暫存槽260與261、一廢水儲槽270、一導熱油爐280、一導熱油膨脹槽290及六組泵浦513、514、515、516、517、518。Referring to FIG. 2 and FIG. 4 , the first thin film evaporation unit 200 includes a raw material tank 210 , a blending tank 220 , a preheater 230 , a thin film evaporator 240 , a condenser 250 , and two material temporary storage tanks . 260 and 261, a waste water storage tank 270, a heat transfer oil furnace 280, a heat transfer oil expansion tank 290, and six sets of pumps 513, 514, 515, 516, 517, 518.
參照第2圖與第5圖，該第二薄膜蒸發單元300包含一預熱器310、一薄膜蒸發器320、一冷凝器330、二只物料暫存槽340與350、一聚乙二醇儲槽360、一導熱油爐370、一導熱油膨脹槽380、一組真空泵519、以及三組泵浦520、521、522。Referring to FIGS. 2 and 5, the second thin film evaporation unit 300 includes a preheater 310, a thin film evaporator 320, a condenser 330, two material temporary storage slots 340 and 350, and a polyethylene glycol storage. The tank 360, a heat transfer oil furnace 370, a heat transfer oil expansion tank 380, a set of vacuum pumps 519, and three sets of pumps 520, 521, 522.
參照第2圖與第7圖，該冷卻單元600，用以對各單元作熱交換處理。而該冷卻單元600包含一冷卻水循環單元610及一冰水機組620。該冷卻水循環單元610則包含一冷卻水塔611與三組冷卻水循環泵612、613、614。Referring to Figures 2 and 7, the cooling unit 600 is configured to perform heat exchange processing for each unit. The cooling unit 600 includes a cooling water circulation unit 610 and a chiller unit 620. The cooling water circulation unit 610 includes a cooling water tower 611 and three sets of cooling water circulation pumps 612, 613, and 614.
作業時，先啟動冷卻單元610，讓冷卻水進入第一薄膜蒸發單元200中需使用冷卻水之冷凝器250，第二薄膜蒸發單元300中需使用冷卻水之冷凝器330，以及分子蒸餾單元400中需使用冷卻水之分子蒸餾器420之內置冷凝器，還有冰水機組620之冷卻迴路再迴流至冷卻水塔611。During operation, the cooling unit 610 is first activated, the cooling water is introduced into the first thin film evaporation unit 200, the condenser 250 for cooling water is used, the second thin film evaporation unit 300 is required to use the cooling water condenser 330, and the molecular distillation unit 400 is used. The built-in condenser of the molecular distiller 420 of cooling water is used, and the cooling circuit of the chiller 620 is returned to the cooling water tower 611.
於冰水機組620方面，則先依65%之比例於清水中加入聚乙二醇調配成冷凍冰水之原水，再以冰水機組內建之循環泵將冷凍冰水之原水泵入冰水機組中，再送入分子蒸餾單元400中需用冰水之冷井430進流管，以及分子蒸餾器420之軸封冷卻水進流管，再回到冰水機組620中形成循環流。之後，再啟動冰水機組620之冷凍機組，讓循環之冰水溫度逐漸下降至攝氏-10℃以下為止。In the case of the chiller 620, the raw water of frozen ice water is firstly added to the clean water by adding 65% of the water, and the raw water of the frozen ice water is pumped into the ice water by the circulating pump built by the ice water unit. In the unit, it is sent to the cold water well 430 inlet pipe of the molecular distillation unit 400, and the shaft of the molecular distiller 420 is sealed with the cooling water inlet pipe, and then returned to the ice water unit 620 to form a circulating flow. After that, the refrigeration unit of the chiller 620 is restarted, and the circulating ice water temperature is gradually lowered to below -10 ° C.
於冷卻單元600啟動完成之後，再啟動泵浦518，開始將導熱油經由導熱油進料管送入導熱油管線中，先經由導熱油爐280，再經由其中之一的出流管線進入薄膜蒸發器240之外殼夾層以及預熱器230之換熱管路再回到泵浦518之入口，同時導熱油也經由出流管之其它分流管進入導熱油膨脹槽290，再回流至泵浦518之入口，導熱油之循環開始之後，則開始啟動導熱油爐280，讓循環流動之導熱油逐漸升溫至攝氏140℃以上，並設定好導熱油爐280讓其對導熱油之加熱保持穩定。After the startup of the cooling unit 600 is completed, the pump 518 is restarted, and the heat transfer oil is started to be sent to the heat transfer oil line through the heat transfer oil feed pipe, first through the heat transfer oil furnace 280, and then through one of the outlet lines to enter the film evaporation. The outer casing of the heater 240 and the heat exchange line of the preheater 230 are returned to the inlet of the pump 518, and the heat transfer oil also enters the heat transfer oil expansion tank 290 via the other splitter of the outlet pipe, and is returned to the inlet of the pump 518. After the start of the cycle of the heat transfer oil, the heat transfer oil furnace 280 is started to gradually heat the heat transfer oil circulating to above 140 ° C, and the heat transfer oil furnace 280 is set to keep the heat of the heat transfer oil stable.
啟動冷卻水及導熱油之循環完成之後，再啟動配置於第二薄膜蒸發單元300屬於製程共用之真空泵浦519(第5圖)，開始抽取第一薄膜蒸發單元200中相連管路中之空氣，讓進料管路、預熱器230、薄膜蒸發器240、物料暫存槽260及261中的氣體壓力下降至100 mbar(0.1bar)以下，形成真空蒸餾之環境。After the cycle of starting the cooling water and the heat transfer oil is completed, the vacuum pump 519 (FIG. 5), which is disposed in the second thin film evaporation unit 300 and is shared by the process, is started, and the air in the connected pipe in the first thin film evaporation unit 200 is started to be extracted. The gas pressure in the feed line, preheater 230, thin film evaporator 240, material storage tanks 260 and 261 is lowered to below 100 mbar (0.1 bar) to form a vacuum distillation environment.
此時，開始啟動泵浦513，將液體廢棄物持續注入調合槽220，同時啟動攪拌器先進行攪拌，於調合槽220內之液體廢棄物到達預設之高液位時，泵浦514自動啟動，將液體廢棄物泵入製程中，先經過預熱器230讓液體廢棄物之溫度升高至攝氏95℃以上，然後再進入薄膜蒸發器240內層之缸壁內，此時，薄膜蒸發器240內建之刮籠不斷的旋轉，進入薄膜蒸發器240內層缸壁內之液體廢棄物則不斷的被塗抹在缸壁上形成一層厚度約4~5μ (4-5/1000mm)之薄膜，而由於薄膜蒸發器240外殼之夾層有溫度高達攝氏140℃之導熱油通過，因此，液體廢棄物於薄膜蒸發器240內層之缸壁內所形成之薄膜其溫度可以持續維持在攝氏95℃以上；而此時，由於薄膜蒸發器240內層之缸壁內之氣壓只有100 mBar (0.1 bar)，因此，雖然液體廢棄物所形成之薄膜中水份之溫度尚不及攝氏100℃，但於此攝氏95℃時則已全部蒸發，水蒸汽循著出口管線進入冷凝器250之物料管線內而與進入冷凝器250冷凝管路中之冷凝水進行熱交換，水 蒸汽被冷凝下來成為廢水，再落入物料暫存槽261中暫時儲存。At this time, the pump 513 is started to be started, and the liquid waste is continuously injected into the blending tank 220, and the stirrer is started to be stirred first. When the liquid waste in the blending tank 220 reaches the preset high liquid level, the pump 514 is automatically started. Pumping the liquid waste into the process, first passing the preheater 230 to raise the temperature of the liquid waste to above 95 ° C, and then entering the inner wall of the thin film evaporator 240, at this time, the thin film evaporator The 240 built-in scraper cage is continuously rotated, and the liquid waste entering the inner cylinder wall of the thin film evaporator 240 is continuously applied to the cylinder wall to form a film having a thickness of about 4 to 5 μ (4-5/1000 mm). Since the heat transfer oil having a temperature of up to 140 ° C is passed through the interlayer of the thin film evaporator 240, the temperature of the film formed by the liquid waste in the inner wall of the thin film evaporator 240 can be maintained at 95 ° C or higher. At this time, since the gas pressure in the inner wall of the thin film evaporator 240 is only 100 mBar (0.1 bar), although the temperature of the water in the film formed by the liquid waste is not as high as 100 ° C, At 95 ° C Have been evaporated, the water vapor outlet line follow the entry of heat exchange with the water entering the condenser 250 is condensed in the condenser, the condenser material path line 250, the water The steam is condensed to become waste water, and then falls into the material storage tank 261 for temporary storage.
上述過程持續進行，而累積於物料暫存槽261之廢水則在液位到達預設之高液位時，製程之自動控制設備則自動啟動泵浦516，將廢水送入廢水儲槽270直到物料暫存槽261之液位到達低液位時泵浦516才停止運轉。而廢水儲槽270之液位到達高液位時，製程之自動控制設備則自動啟動泵浦517，將廢水送入預設之廢水處理廠進行處理直至廢水儲槽270之液位到達低液位時為止。The above process continues, and the waste water accumulated in the material temporary storage tank 261 automatically starts the pump 516 when the liquid level reaches the preset high liquid level, and the waste water is sent to the waste water storage tank 270 until the material is discharged. When the liquid level of the temporary storage tank 261 reaches the low liquid level, the pump 516 stops operating. When the liquid level of the wastewater storage tank 270 reaches a high liquid level, the automatic control device of the process automatically starts the pump 517, and the wastewater is sent to a preset wastewater treatment plant for treatment until the liquid level of the wastewater storage tank 270 reaches a low liquid level. So far.
液體廢棄物中蒸餾溫度高於攝氏95℃者包括聚乙二醇以及切削油，由於此一階段之蒸餾溫度無法將其分餾出來，因此，此一聚乙二醇以及廢切削油的混合廢液則循管線落入物料暫存槽260之中累積，等待進入次一階段的製程(第二薄膜蒸發單元300之聚乙二醇回收製程)進行處理。When the distillation temperature in liquid waste is higher than 95 ° C, including polyethylene glycol and cutting oil, the distillation temperature of this stage cannot be fractionated, so this mixed waste liquid of polyethylene glycol and waste cutting oil Then, the pipeline falls into the material temporary storage tank 260 and waits for the next stage of the process (the polyethylene glycol recovery process of the second thin film evaporation unit 300) for processing.
實際作業時，先確認前一製程200已完成啟動且持續運轉。之後，再啟動泵浦522，開始將導熱油經由導熱油進料管送入導熱油管線中先經由導熱油爐370，再經由其中之一的出流管線進入薄膜蒸發器320之外殼夾層以及預熱器310之換熱管路再回到泵浦522之入口，同時導熱油也經由出流管之其它分流管進入導熱油膨脹槽380，再回流至泵浦522之入口，導熱油之循環開始之後，則開始啟動導熱油爐370， 讓循環流動之導熱油逐漸升溫至攝氏200℃以上，一方面，設定好導熱油爐370讓其對導熱油之加熱溫度保持穩定。In actual operation, first confirm that the previous process 200 has completed startup and continues to operate. Thereafter, the pump 522 is restarted, and the heat transfer oil is started to be sent to the heat transfer oil line via the heat transfer oil feed pipe, first through the heat transfer oil furnace 370, and then through one of the outlet lines to enter the outer casing of the thin film evaporator 320 and pre The heat exchange line of the heat exchanger 310 is returned to the inlet of the pump 522, and the heat transfer oil also enters the heat transfer oil expansion tank 380 through the other splitter tubes of the outlet pipe, and then flows back to the inlet of the pump 522, after the start of the heat transfer oil cycle , then start the heat conduction oil furnace 370, The circulating heat transfer oil is gradually heated to above 200 ° C. On the one hand, the heat transfer oil furnace 370 is set to keep the heating temperature of the heat transfer oil stable.
啟動導熱油之循環完成後，確認製程中共用之真空泵浦519已啟動並已開始抽取第二薄膜蒸發單元300中相連管路之空氣，讓進料管路、預熱器310、薄膜蒸發器320、物料暫存槽340及350中的氣體壓力下降至100 mbar(0.1bar)以下，形成真空蒸餾之環境。After the cycle of starting the heat transfer oil is completed, it is confirmed that the vacuum pump 519 shared in the process has been started and the air of the connected pipe in the second thin film evaporation unit 300 has been extracted, and the feed line, the preheater 310, and the thin film evaporator 320 are started. The gas pressure in the material storage tanks 340 and 350 drops below 100 mbar (0.1 bar) to form a vacuum distillation environment.
配置於第一薄膜蒸發單元200之泵浦515將聚乙二醇及廢切削油混合之液體廢棄物持續泵入第二薄膜蒸發製程單元，先經過預熱器310讓液體廢棄物之溫度升高至攝氏160℃以上，然後進入薄膜蒸發器320內層之缸壁內，此時，薄膜蒸發器320內建之刮籠不斷的旋轉，將進入薄膜蒸發器320內層缸壁內之聚乙二醇及廢切削油混合物不斷的塗抹在缸壁上形成一層厚度約4~5μ (4-5/1000mm)之薄膜，而由於薄膜蒸發器320外殼之夾層有溫度高達攝氏200℃之導熱油通過，因此，聚乙二醇及廢切削油混合物於薄膜蒸發器內層之缸壁內所形成之薄膜其溫度可以維持在攝氏160℃以上，而此時，由於薄膜蒸發器240內層之缸壁內之氣壓只有100 mBar (0.1 bar)，因此，雖然液體廢棄物所形成之薄膜中的聚乙二醇之溫度尚未達到其沸點攝氏195~198℃，但在100 mBar氣壓下， 於攝氏160℃時則已全部蒸發，聚乙二醇蒸汽則循著出口管線進入冷凝器330之物料管線內而與進入冷凝器330冷凝管路中之冷凝水進行熱交換，聚乙二醇蒸汽被冷凝下來成為液體之聚乙二醇再落入物料暫存槽350之中暫存。The pump 515 disposed in the first thin film evaporation unit 200 continuously pumps the liquid waste mixed with the polyethylene glycol and the waste cutting oil into the second thin film evaporation process unit, and first passes through the preheater 310 to raise the temperature of the liquid waste. Up to 160 ° C above Celsius, and then enter the inner wall of the thin film evaporator 320, at this time, the built-in scraper cage of the thin film evaporator 320 will continuously rotate into the inner wall of the thin film evaporator 320. The alcohol and waste cutting oil mixture is continuously applied to the cylinder wall to form a film having a thickness of about 4 to 5 μ (4-5/1000 mm), and since the interlayer of the thin film evaporator 320 has a temperature of up to 200 ° C, the heat transfer oil passes. Therefore, the temperature of the film formed by the polyethylene glycol and the waste cutting oil mixture in the cylinder wall of the inner layer of the thin film evaporator can be maintained above 160 ° C, and at this time, due to the inner wall of the thin film evaporator 240 The pressure is only 100 mBar (0.1 bar), so although the temperature of the polyethylene glycol in the film formed by the liquid waste has not reached the boiling point of 195 to 198 ° C, but at 100 mBar, At 160 ° C, it has completely evaporated, and the polyethylene glycol vapor enters the material line of the condenser 330 along the outlet line to exchange heat with the condensed water entering the condenser 330 condenser line, and the polyethylene glycol vapor The polyethylene glycol which is condensed into a liquid then falls into the material storage tank 350 for temporary storage.
上述過程持續進行，而累積於物料暫存槽350之液體聚乙二醇則是在物料暫存槽350中之液位到達預設之高液位時，製程之自動控制設備則自動啟動泵浦520，將液體聚乙二醇送入聚乙二醇儲槽360中等待包裝及出售。The above process continues, and the liquid polyethylene glycol accumulated in the material temporary storage tank 350 is automatically activated when the liquid level in the material temporary storage tank 350 reaches a preset high liquid level. 520, the liquid polyethylene glycol is sent to the polyethylene glycol storage tank 360 for packaging and sale.
於聚乙二醇被蒸餾分離之後，殘餘之廢液則為廢切削油以及少量的廢油渣的混合液，此一未蒸發之廢液則循管線落入物料暫存槽340之中累積，等待進入次一階段的製程(分子蒸餾單元400之廢油回收製程)進行處理。After the polyethylene glycol is separated by distillation, the residual waste liquid is a mixture of waste cutting oil and a small amount of waste oil residue, and the unvaporized waste liquid is accumulated in the material temporary storage tank 340 according to the pipeline. The process of waiting for the next stage (the waste oil recovery process of the molecular distillation unit 400) is processed.
參照第2圖與第6圖，該分子蒸餾單元400包含一預熱器410、一刮板式分子蒸餾器(Wiper Type Molecular Still Evaporator)420、一冷井430、二只物料暫存槽440與450、一真空緩衝槽460、一氣液分離器470、一導熱油爐480、一導熱油膨脹槽490、一回收油槽491、一廢油渣儲槽492及五組泵浦523、524、526、527，以及一組真空泵525。作業前，先確定冷卻水塔611及三組冷卻水循環泵612、613、614已正常啟動；並已將冷卻水送入分子蒸餾器420 內建之冷凝器再回到冷卻水塔611中完成循環；且冰水機組620也已啟動並將冰水送至冷井430之冷凝迴路以及分子蒸餾器420之機械軸封形成冰水之冷卻回路，再回到冰水機組之冰水槽中形成循環迴路。Referring to FIGS. 2 and 6 , the molecular distillation unit 400 includes a preheater 410 , a Wiper Type Molecular Still Evaporator 420 , a cold well 430 , and two material temporary storage slots 440 and 450 . a vacuum buffer tank 460, a gas-liquid separator 470, a heat transfer oil furnace 480, a heat transfer oil expansion tank 490, a recovery oil tank 491, a waste oil sump tank 492, and five groups of pumps 523, 524, 526, 527 And a set of vacuum pumps 525. Before the operation, it is determined that the cooling water tower 611 and the three sets of cooling water circulation pumps 612, 613, 614 have been normally started; and the cooling water has been sent to the molecular distiller 420. The built-in condenser is returned to the cooling water tower 611 to complete the cycle; and the ice water unit 620 has also started and sent the ice water to the condensation circuit of the cold well 430 and the mechanical shaft seal of the molecular still 420 to form a cooling circuit for the ice water. Then, return to the ice water tank of the ice water unit to form a circulation loop.
作業時，開始啟動泵浦527，讓導熱油流經膨脹槽490後進入需要間接加熱之預熱器410以及分子蒸餾器420之夾層，然後再回到導熱加油爐480，完成自體循環；然後，設定導熱油工作溫度至攝氏240℃，再啟動導熱油加熱爐480，讓導熱油逐漸加熱並升溫至攝氏240℃。During operation, the pump 527 is started to be started, and the heat transfer oil flows through the expansion tank 490 to enter the interlayer of the preheater 410 and the molecular distiller 420, which are indirectly heated, and then returns to the heat transfer oil furnace 480 to complete the autogenous circulation; Set the heat transfer oil working temperature to 240 ° C, and then start the heat transfer oil heating furnace 480, let the heat transfer oil gradually heat and raise the temperature to 240 ° C.
啟動真空泵浦525，讓真空泵浦525經由管線對系統之進料管路進行抽氣，讓整個進料管路、分子蒸餾器420內部、物料暫存槽440及450、以及真空緩衝槽460等進出料迴路之管線壓力降至40Pa以下。抽除真空過程之氣體則經由氣液分離器470進入真空泵浦525，再經由真空泵浦525排氣口排入大氣中。The vacuum pump 525 is activated, and the vacuum pump 525 pumps the feed line of the system via the pipeline, and allows the entire feed line, the interior of the molecular distiller 420, the material storage tanks 440 and 450, and the vacuum buffer tank 460 to enter and exit. The line pressure of the material loop drops below 40Pa. The gas from which the vacuum process is evacuated enters the vacuum pump 525 via the gas-liquid separator 470, and is discharged into the atmosphere via the vacuum pump 525 exhaust port.
緣經由系統之自動控制，前一製程(第二薄膜蒸發單元300)之物料暫存槽340到達高液位時，泵浦521開始啟動，並將槽內的物料送入預熱器410之後先升高溫度至攝氏195℃以上，再進入分子蒸餾器420之缸體內壁(Cylinder wall)，同時內建於分子蒸餾器420的刮板(Wiper)則持續的旋轉，將物料均勻地塗抹沾附在分子蒸餾器420之缸體內壁形成厚度約4~5/1000 mm(4~5μ)的薄膜；由於在分子蒸餾器420 之缸體內壁及外殼之間的夾層有溫度約攝氏240℃的導熱油通過，因此在形成油膜過程中沾附在分子蒸餾器420缸體內壁之油膜溫度仍能保持在攝氏195℃以上；同時，由於進料及出料管線內的工作壓力是在40Pa以下的負壓環境，使得物料油膜內之廢油在工作溫度達到攝氏195℃時即開始蒸發，油分子則開始飛行而在觸及分子蒸餾器420的內置冷凝器時即被冷凝下來而沿管線進入物料暫存槽450，而在物料暫存槽450之液位達到預設之高液位時，泵浦523則自動啟動將回收油送入回收油槽491中準備出售。未能於此一製程中蒸發之廢油渣則由於其比重較重，分子自由程較短無法觸及分子蒸餾器之內建冷凝器，因此在飛行至半途中即墜落至分子蒸餾器內之下方，經收料板集中後被導至下方之物料暫存槽440中，等槽中液位到達高液位時，泵浦524自行啟動，將廢油渣泵入廢油渣儲槽492，而於槽中液位達高液位時，再以泵浦526將廢油渣撥出，送至廠外進行焚化。By the automatic control of the system, when the material temporary storage tank 340 of the previous process (the second thin film evaporation unit 300) reaches the high liquid level, the pump 521 starts to start, and the material in the tank is sent to the preheater 410. Increasing the temperature to above 195 ° C, and then entering the cylinder wall of the molecular distiller 420, while the squeegee (Wiper) built in the molecular distiller 420 is continuously rotated to uniformly spread the material. A film having a thickness of about 4 to 5/1000 mm (4 to 5 μ) is formed on the inner wall of the cylinder of the molecular still 420; since it is in the molecular distiller 420 The interlayer between the inner wall of the cylinder and the outer casing has a heat transfer oil having a temperature of about 240 ° C. Therefore, the temperature of the oil film adhered to the inner wall of the cylinder of the molecular distiller 420 during the formation of the oil film can be maintained at 195 ° C or higher; Because the working pressure in the feed and discharge lines is under negative pressure of 40 Pa, the waste oil in the oil film begins to evaporate when the working temperature reaches 195 ° C, and the oil molecules begin to fly while touching the molecular distillation. The built-in condenser of the device 420 is condensed and enters the material temporary storage tank 450 along the pipeline, and when the liquid level of the material temporary storage tank 450 reaches a preset high liquid level, the pump 523 automatically starts to recover the oil. It is ready for sale in the recovery oil tank 491. The waste oil slag that has not been evaporated in this process has a heavier specific gravity and a shorter molecular free path cannot reach the built-in condenser of the molecular distiller. Therefore, it falls below the molecular distiller in the middle of flight. After the collection plate is concentrated, it is led to the material temporary storage tank 440 below. When the liquid level in the equal tank reaches the high liquid level, the pump 524 starts up by itself, and the waste oil residue is pumped into the waste oil storage tank 492, and When the liquid level in the tank reaches a high liquid level, the waste oil slag is pumped out by the pump 526 and sent to the outside of the plant for incineration.
另外，於送入分子蒸餾製程之廢切削油含有極少部份分子質量極輕之分子，其分子自由程很大，在分子蒸餾製程中無法完全被分子蒸餾器420內建冷凝器冷凝下來而逸出分子蒸餾器一直飛入冷井430的內部遮罩內，由於這些薄霧狀的油分子其溫度高達攝氏195℃以上，因此必須使用極低溫之冰水與內建於冷井430內的冷凝器進行熱交換，才能將這些分子量很 輕的油分子冷凝下來，落進入真空緩衝槽460中。因此，冰水機組620必須持續的泵送冰水進入冷中430中的冷凝器管路中與這些未能於分子蒸餾器中被冷凝下來的質量很輕的油分子進行熱交換，以便將這些逸出分子蒸餾器的油分子冷凝下來。In addition, the waste cutting oil fed to the molecular distillation process contains very few molecules with extremely low molecular weight, and its molecular free path is large, and it cannot be completely condensed by the built-in condenser of the molecular distiller 420 in the molecular distillation process. The molecular distiller has been flown into the internal mask of the cold well 430. Since the temperature of these misty oil molecules is above 195 ° C, it is necessary to use extremely low temperature ice water and condensation built into the cold well 430. Heat exchange to get these molecular weights very The light oil molecules condense and fall into the vacuum buffer tank 460. Therefore, the chiller unit 620 must continuously pump ice water into the condenser line in the cold 430 to exchange heat with these very light-weight oil molecules that are not condensed in the molecular distiller to The oil molecules that escape the molecular distiller condense.
於常壓中，切削油的蒸餾溫度約為攝氏200℃~250℃，但由於在分子蒸餾器420中的工作壓力在40Pa以下，因此在工作溫度到達攝氏195℃時，廢切削油即已開始蒸發。這樣的設計其目的是要儘量使用高真空進行低溫蒸餾的特性，避免回收的切削油曝露在高溫環境下而影響其品質。In normal pressure, the distillation temperature of the cutting oil is about 200 ° C to 250 ° C, but since the working pressure in the molecular distiller 420 is below 40 Pa, the waste cutting oil is already started when the working temperature reaches 195 ° C. evaporation. The purpose of such a design is to use high vacuum for cryogenic distillation as much as possible to prevent the recovered cutting oil from being exposed to high temperatures and affecting its quality.
惟以上所述者，僅為本發明之一種較佳實施例而已，當不能以此限定本發明實施之範圍；換言之，大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾，皆仍屬本發明專利涵蓋之範圍內。However, the above description is only a preferred embodiment of the present invention, and the scope of the present invention is not limited thereto; in other words, the simple equivalent change of the patent application scope and the description of the invention is Modifications are still within the scope of the invention.
10‧‧‧流程10‧‧‧ Process
11‧‧‧流程11‧‧‧ Process
12‧‧‧流程12‧‧‧ Process
13‧‧‧流程13‧‧‧ Process
131‧‧‧廢水131‧‧‧ Wastewater
14‧‧‧流程14‧‧‧ Process
141‧‧‧聚乙二醇141‧‧ ‧ polyethylene glycol
15‧‧‧流程15‧‧‧ Process
151‧‧‧回收油(廢油)151‧‧‧Recycled oil (waste oil)
100‧‧‧固液分離單元100‧‧‧ solid-liquid separation unit
110‧‧‧重力式固液分離機110‧‧‧Gravity solid-liquid separator
120‧‧‧旋流式固液分離機120‧‧‧Swirl solid-liquid separator
130‧‧‧碟盤式離心分離機130‧‧‧disc centrifugal separator
140‧‧‧調合槽140‧‧‧ blending slot
150‧‧‧調合槽150‧‧‧ blending slot
200‧‧‧第一薄膜蒸發單元200‧‧‧First Thin Film Evaporation Unit
210‧‧‧原料槽210‧‧‧Material tank
220‧‧‧調合槽220‧‧‧ blending slot
230‧‧‧預熱器230‧‧‧Preheater
240‧‧‧薄膜蒸發器240‧‧‧ Thin film evaporator
250‧‧‧冷凝器250‧‧‧Condenser
260‧‧‧物料暫存槽260‧‧‧ material storage slot
261‧‧‧物料暫存槽261‧‧‧ material storage slot
270‧‧‧廢水儲槽270‧‧‧ Wastewater storage tank
280‧‧‧導熱油爐280‧‧‧heating oil furnace
290‧‧‧導熱油膨脹槽290‧‧‧heat transfer oil expansion tank
300‧‧‧第二薄膜蒸發單元300‧‧‧Second thin film evaporation unit
310‧‧‧預熱器310‧‧‧Preheater
320‧‧‧薄膜蒸發器320‧‧‧ Thin film evaporator
330‧‧‧冷凝器330‧‧‧Condenser
340‧‧‧物料暫存槽340‧‧‧ material storage slot
350‧‧‧物料暫存槽350‧‧‧ material storage slot
360‧‧‧聚乙二醇儲槽360‧‧‧polyethylene glycol storage tank
370‧‧‧導熱油爐370‧‧‧heating oil furnace
380‧‧‧導熱油膨脹槽380‧‧‧heat transfer oil expansion tank
400‧‧‧分子蒸餾單元400‧‧‧Molecular distillation unit
410‧‧‧預熱器410‧‧‧Preheater
420‧‧‧分子蒸餾器420‧‧‧Molecular still
430‧‧‧冷井430‧‧‧ cold wells
440‧‧‧物料暫存槽440‧‧‧ material storage slot
450‧‧‧物料暫存槽450‧‧‧ material storage slot
460‧‧‧真空緩衝槽460‧‧‧vacuum buffer tank
470‧‧‧氣液分離器470‧‧‧ gas-liquid separator
480‧‧‧導熱油爐480‧‧‧heating oil furnace
490‧‧‧導熱油膨脹槽490‧‧‧heat transfer oil expansion tank
491‧‧‧回收油儲槽491‧‧‧Recycled oil storage tank
492‧‧‧廢油渣儲槽492‧‧‧Waste oil storage tank
510~518‧‧‧泵浦510~518‧‧‧ pump
520~524‧‧‧泵浦520~524‧‧‧ pump
519/525‧‧‧真空泵519/525‧‧‧vacuum pump
600‧‧‧冷卻單元600‧‧‧cooling unit
610‧‧‧冷卻水循環單元610‧‧‧Cooling water circulation unit
611‧‧‧冷卻水塔611‧‧‧Cooling tower
612‧‧‧冷卻水循環泵612‧‧‧Cooling water circulation pump
613‧‧‧冷卻水循環泵613‧‧‧Cooling water circulation pump
614‧‧‧冷卻水循環泵614‧‧‧Cooling water circulation pump
620‧‧‧冰水機組620‧‧‧Ice water unit
第1圖係本發明之處理矽晶板切割廢棄物的製程的方塊流程圖。BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a block flow diagram showing the process of treating a crystal plate cutting waste of the present invention.
第2圖係本發明之處理矽晶板切割廢棄物的裝置的方塊圖。Figure 2 is a block diagram of the apparatus for treating a crystal plate cutting waste of the present invention.
第3圖係說明第2圖中之固液分離單元的裝置流程圖。Fig. 3 is a flow chart showing the apparatus of the solid-liquid separation unit in Fig. 2.
第4圖係說明第2圖中之第一薄膜蒸發單元的裝置流程圖。Fig. 4 is a flow chart showing the apparatus of the first thin film evaporation unit in Fig. 2.
第5圖係說明第2圖中之第二薄膜蒸發單元的裝置流程圖。Figure 5 is a flow chart showing the apparatus of the second thin film evaporation unit in Fig. 2.
第6圖係說明第2圖中之分子蒸餾單元的裝置流程圖。Fig. 6 is a flow chart showing the apparatus of the molecular distillation unit in Fig. 2.
第7圖係說明第2圖中之冷卻單元的裝置流程圖。Fig. 7 is a flow chart showing the arrangement of the cooling unit in Fig. 2.
10‧‧‧流程10‧‧‧ Process
11‧‧‧流程11‧‧‧ Process
12‧‧‧流程12‧‧‧ Process
13‧‧‧流程13‧‧‧ Process
131‧‧‧廢水131‧‧‧ Wastewater
14‧‧‧流程14‧‧‧ Process
141‧‧‧聚乙二醇141‧‧ ‧ polyethylene glycol
15‧‧‧流程15‧‧‧ Process
151‧‧‧廢油151‧‧‧Waste oil
Claims (11)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW97136162A TWI417938B (en) | 2008-09-19 | 2008-09-19 | Wafer/photovoltaic panel cutting waste handling process and equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW97136162A TWI417938B (en) | 2008-09-19 | 2008-09-19 | Wafer/photovoltaic panel cutting waste handling process and equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201013745A TW201013745A (en) | 2010-04-01 |
| TWI417938B true TWI417938B (en) | 2013-12-01 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW97136162A TWI417938B (en) | 2008-09-19 | 2008-09-19 | Wafer/photovoltaic panel cutting waste handling process and equipment |
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| Country | Link |
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| TW (1) | TWI417938B (en) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| SG11201706012RA (en) * | 2015-01-27 | 2017-09-28 | Metallkraft As | Non-chemical method and system for recovering silicon carbide particles and glycol from a slurry |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6319409B1 (en) * | 1998-09-11 | 2001-11-20 | Fuji Jukogyo Kabushiki Kaisha | Process for treating waste water containing cutting oil |
| EP0968801B1 (en) * | 1998-07-01 | 2003-01-22 | Memc Electronic Materials S.P.A. | A method for separating and regenerating polyethylene glycol and silicon carbide abrasive material to enable re-use thereof |
| TW524776B (en) * | 2000-09-21 | 2003-03-21 | Takahashi Kinzoku Kk | Method and apparatus for re-cycling water soluble cutting oil |
| TWI267398B (en) * | 2006-02-08 | 2006-12-01 | Tzong-Yu Su | Processing method for cutting fluid |
| TW200827305A (en) * | 2006-12-29 | 2008-07-01 | Chung-Wen Lan | The recycling method of silicon sludge after slicing |
-
2008
- 2008-09-19 TW TW97136162A patent/TWI417938B/en not_active IP Right Cessation
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0968801B1 (en) * | 1998-07-01 | 2003-01-22 | Memc Electronic Materials S.P.A. | A method for separating and regenerating polyethylene glycol and silicon carbide abrasive material to enable re-use thereof |
| US6319409B1 (en) * | 1998-09-11 | 2001-11-20 | Fuji Jukogyo Kabushiki Kaisha | Process for treating waste water containing cutting oil |
| TW524776B (en) * | 2000-09-21 | 2003-03-21 | Takahashi Kinzoku Kk | Method and apparatus for re-cycling water soluble cutting oil |
| TWI267398B (en) * | 2006-02-08 | 2006-12-01 | Tzong-Yu Su | Processing method for cutting fluid |
| TW200827305A (en) * | 2006-12-29 | 2008-07-01 | Chung-Wen Lan | The recycling method of silicon sludge after slicing |
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| TW201013745A (en) | 2010-04-01 |
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