TWI405001B - Manufacturing methods of liquid crystal on silicon display panel and its substrate - Google Patents
Manufacturing methods of liquid crystal on silicon display panel and its substrate Download PDFInfo
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本發明是有關於一種液晶顯示面板的製作方法以及其基板的製作方法，且特別是有關於一種矽基液晶顯示面板的製作方法以及其基板的製作方法。The present invention relates to a method of fabricating a liquid crystal display panel and a method of fabricating the same, and more particularly to a method of fabricating a germanium-based liquid crystal display panel and a method of fabricating the same.
提到液晶顯示器，人們就會聯想到筆記型電腦或個人電腦用的液晶顯示器。矽基液晶(liquid crystal on silicon，LCoS)顯示器為一種新型的液晶顯示器，其為結合半導體超大型積體電路(very-large-scale integration，VLSI)技術和液晶顯示技術的高科技產品。When it comes to liquid crystal displays, people think of LCD monitors for notebook computers or personal computers. Liquid crystal on silicon (LCoS) displays are a new type of liquid crystal display, which is a high-tech product combining semiconductor-very-large-scale integration (VLSI) technology and liquid crystal display technology.
矽基液晶顯示器中的矽基板可利用常規的互補式金氧半(complementary metal-oxide-semiconductor，CMOS)技術批量生產，並可隨半導體工藝的發展進一步微型化，且可提高分辨率。因此，矽基液晶顯示器具備低功耗、微型尺寸、超輕重量等特點，故矽基液晶顯示器便於隨身攜帶，且其功耗遠低於主動式矩陣液晶顯示器(active-matrix liquid crystal display，AMLCD)，而生產成本可望與陰極射線管(cathode ray tube，CRT)相比擬。The germanium substrate in the germanium-based liquid crystal display can be mass-produced by conventional complementary metal-oxide-semiconductor (CMOS) technology, and can be further miniaturized with the development of semiconductor processes, and the resolution can be improved. Therefore, the 矽-based liquid crystal display has the characteristics of low power consumption, micro size, ultra-light weight, etc., so the 矽-based liquid crystal display is easy to carry around, and its power consumption is much lower than that of an active-matrix liquid crystal display (AMLCD). ), and the production cost is expected to be comparable to that of a cathode ray tube (CRT).
習知的矽基液晶顯示器的液晶材料是配置在單晶矽基材上的配向膜(一般為二氧化矽層)與玻璃基材之間，並藉由同樣配置在配向膜與玻璃基材之間的膠框來將液晶材料固定在膠框、單晶矽基材與玻璃基材之間。然而，由於二氧化矽層的結構較為鬆散，因此，外界環境中的水氣易進入二氧化矽層中用以配向的部分(亦即二氧化矽層之與液晶接觸的部分)造成邊界不穩定現象而影響可靠度。此外，由於二氧化矽層與膠框容易因二者的材料表面化學特性而導致兩者的接著性不佳，以致於矽基液晶顯示器的可靠度下降。The liquid crystal material of the conventional germanium-based liquid crystal display is disposed between the alignment film (generally a ceria layer) disposed on the single crystal germanium substrate and the glass substrate, and is disposed on the alignment film and the glass substrate by the same arrangement. The plastic frame is used to fix the liquid crystal material between the plastic frame, the single crystal germanium substrate and the glass substrate. However, since the structure of the cerium oxide layer is relatively loose, the moisture in the external environment easily enters the portion of the cerium oxide layer for alignment (that is, the portion of the cerium oxide layer which is in contact with the liquid crystal) causes boundary instability. Phenomenon affects reliability. In addition, since the ruthenium dioxide layer and the plastic frame are liable to be poor in adhesion due to the chemical properties of the surface of the two materials, the reliability of the bismuth-based liquid crystal display is lowered.
本發明提供一種矽基液晶顯示面板之基板的製作方法，可提升基板與後續形成的框膠的接著性。The invention provides a method for manufacturing a substrate of a ruthenium-based liquid crystal display panel, which can improve the adhesion of the substrate and the subsequently formed sealant.
本發明提供一種矽基液晶顯示面板的製作方法，可提升矽基液晶顯示面板阻隔外界環境中的水氣的能力。The invention provides a method for fabricating a germanium-based liquid crystal display panel, which can improve the ability of the germanium-based liquid crystal display panel to block moisture in an external environment.
本發明提出一種矽基液晶顯示面板之基板的製作方法如下所述。首先，提供一基材。接著，於基材上形成一配向層。然後，提供一透明板與一罩幕層，透明板具有相對的一第一表面與一第二表面，且透明板包括至少一凸起，凸起突出於第一表面，罩幕層配置於第二表面上並具有至少一開口以暴露出部分表面。之後，將透明板與罩幕層配置於配向層上方，並使凸起朝向配向層。接著，以罩幕層為罩幕對配向層進行一準分子雷射製程，以使準分子雷射透過開口而照射並熔融配向層之位於開口下方的部分。然後，在配向層之位於開口下方的部分處於熔融態時，使透明板朝向配向層移動，並使凸起貫穿配向層之位於開口下方的部分。之後，移除透明板與罩幕層。The present invention provides a method of fabricating a substrate of a samarium-based liquid crystal display panel as follows. First, a substrate is provided. Next, an alignment layer is formed on the substrate. Then, a transparent plate and a cover layer are provided. The transparent plate has a first surface and a second surface opposite to each other, and the transparent plate includes at least one protrusion protruding from the first surface, and the cover layer is disposed on the first layer The two surfaces have at least one opening to expose a portion of the surface. Thereafter, the transparent plate and the mask layer are disposed above the alignment layer with the protrusions facing the alignment layer. Next, a quasi-molecular laser process is performed on the alignment layer by using the mask layer as a mask to cause the excimer laser to pass through the opening to illuminate and melt the portion of the alignment layer below the opening. Then, when the portion of the alignment layer below the opening is in a molten state, the transparent plate is moved toward the alignment layer, and the protrusion is passed through a portion of the alignment layer below the opening. After that, remove the transparent plate and the mask layer.
在本發明之一實施例中，在進行準分子雷射製程時，更包括使準分子雷射透過開口而照射並熔融基材之位於開口下方的部分，並且，在使凸起貫穿配向層之位於開口下方的部分時，更包括使凸起***基材中。In an embodiment of the present invention, when the excimer laser process is performed, the excimer laser is further irradiated through the opening to illuminate and melt the portion of the substrate below the opening, and the protrusion is penetrated through the alignment layer. When the portion is located below the opening, it further includes inserting the protrusion into the substrate.
在本發明之一實施例中，開口位於凸起上方。In an embodiment of the invention, the opening is located above the projection.
在本發明之一實施例中，基材的材質為單晶矽或玻璃。In an embodiment of the invention, the substrate is made of single crystal germanium or glass.
在本發明之一實施例中，凸起之突出於第一表面的高度大於配向層的厚度。In an embodiment of the invention, the height of the protrusion protruding from the first surface is greater than the thickness of the alignment layer.
在本發明之一實施例中，配向層的材質包括二氧化矽。In an embodiment of the invention, the material of the alignment layer comprises cerium oxide.
在本發明之一實施例中，凸起為一環狀凸起。In an embodiment of the invention, the projection is an annular projection.
在本發明之一實施例中，開口為一環狀開口。In an embodiment of the invention, the opening is an annular opening.
本發明提出一種矽基液晶顯示面板的製作方法如下所述。首先，提供一基材。接著，於基材上形成一配向層。然後，提供一透明板與一罩幕層，透明板具有相對的一第一表面與一第二表面，且透明板包括至少一凸起，凸起突出於第一表面，罩幕層配置於第二表面上並具有至少一開口以暴露出部分表面。之後，將透明板與罩幕層配置於配向層上方，並使凸起朝向配向層。接著，以罩幕層為罩幕對配向層進行一準分子雷射製程，以使準分子雷射透過開口而照射並熔融配向層之位於開口下方的部分。然後，在配向層之位於開口下方的部分處於熔融態時，使透明板朝向配向層移動，並使凸起貫穿配向層之位於開口下方的部分，以形成一貫穿配向層的凹槽。之後，移除透明板與罩幕層。接著，於凹槽中形成一膠框，膠框與基材構成一容置凹槽。之後，於基材上配置一對向基材，其中膠框位於基材與對向基材之間，且對向基材覆蓋容置凹槽。然後，於容置凹槽中形成一液晶層。The invention provides a method for fabricating a germanium-based liquid crystal display panel as follows. First, a substrate is provided. Next, an alignment layer is formed on the substrate. Then, a transparent plate and a cover layer are provided. The transparent plate has a first surface and a second surface opposite to each other, and the transparent plate includes at least one protrusion protruding from the first surface, and the cover layer is disposed on the first layer The two surfaces have at least one opening to expose a portion of the surface. Thereafter, the transparent plate and the mask layer are disposed above the alignment layer with the protrusions facing the alignment layer. Next, a quasi-molecular laser process is performed on the alignment layer by using the mask layer as a mask to cause the excimer laser to pass through the opening to illuminate and melt the portion of the alignment layer below the opening. Then, when the portion of the alignment layer below the opening is in a molten state, the transparent plate is moved toward the alignment layer, and the protrusion is penetrated through a portion of the alignment layer below the opening to form a groove penetrating the alignment layer. After that, remove the transparent plate and the mask layer. Then, a plastic frame is formed in the groove, and the plastic frame and the substrate form a receiving groove. Thereafter, a pair of substrates is disposed on the substrate, wherein the frame is located between the substrate and the opposite substrate, and the opposing substrate covers the receiving grooves. Then, a liquid crystal layer is formed in the accommodating recess.
在本發明之一實施例中，開口位於凸起上方。In an embodiment of the invention, the opening is located above the projection.
基於上述，本發明是以準分子雷射技術熔融部分的配向層(與基材)，之後，再於配向層(與基材)之熔融的部分上形成貫穿配向層的凹槽。因此，形成在凹槽中的膠框可將配向層分隔成彼此獨立的二部分，以避免因外界環境中的水氣由配向層之位於膠框外的部分進入配向層之位於膠框內的部分，產生邊界不穩定現象而影響可靠度的問題。Based on the above, the present invention melts a portion of the alignment layer (and the substrate) by excimer laser technology, and then forms a groove penetrating the alignment layer on the molten portion of the alignment layer (and the substrate). Therefore, the plastic frame formed in the groove can separate the alignment layer into two parts independent of each other, so as to prevent the moisture in the external environment from entering the alignment layer of the alignment layer in the plastic frame by the portion of the alignment layer located outside the plastic frame. In part, problems arise that create boundary instability and affect reliability.
為讓本發明之上述特徵和優點能更明顯易懂，下文特舉實施例，並配合所附圖式作詳細說明如下。The above described features and advantages of the present invention will be more apparent from the following description.
圖1A～圖1D繪示本發明一實施例之矽基液晶顯示面板的製程剖面圖。圖2繪示圖1C之基板的一種變化。圖3繪示圖1D之矽基液晶顯示面板的一種變化。1A-1D are cross-sectional views showing a process of a germanium-based liquid crystal display panel according to an embodiment of the invention. Figure 2 illustrates a variation of the substrate of Figure 1C. FIG. 3 illustrates a variation of the bismuth-based liquid crystal display panel of FIG. 1D.
首先，請參照圖1A，提供一基材110，其中基材110的材質例如為單晶矽或是玻璃。接著，在基材110上例如以蒸鍍的方式形成一配向層120，其中配向層120的材質例如為二氧化矽或是其他適於作為配向層的材質。First, referring to FIG. 1A, a substrate 110 is provided, wherein the material of the substrate 110 is, for example, single crystal germanium or glass. Next, an alignment layer 120 is formed on the substrate 110 by evaporation, for example, the material of the alignment layer 120 is, for example, cerium oxide or other material suitable as an alignment layer.
然後，提供一透明板130與一罩幕層140，其中透明板130具有相對的一第一表面132與一第二表面134。透明板130包括一凸起136，凸起136突出於第一表面132。罩幕層140配置於第二表面134上並具有一開口142以暴露出部分第二表面134，且開口142位於凸起136上方。Then, a transparent plate 130 and a mask layer 140 are provided, wherein the transparent plate 130 has a first surface 132 and a second surface 134 opposite to each other. The transparent plate 130 includes a protrusion 136 that protrudes from the first surface 132. The mask layer 140 is disposed on the second surface 134 and has an opening 142 to expose a portion of the second surface 134, and the opening 142 is located above the protrusion 136.
在本實施例中，凸起136之突出於第一表面132的高度H大於配向層120的厚度T。在本實施例中，凸起136大致上為一環狀凸起，且開口142的形狀可對應凸起136的形狀而大致上為一環狀開口。透明板130的材質例如為石英等透明且可被準分子雷射所穿透的材質，而罩幕層140的材質例如為金屬等可阻擋準分子雷射的材質(如鉻、銅、黃銅、不銹鋼)。In the present embodiment, the height H of the protrusion 136 protruding from the first surface 132 is greater than the thickness T of the alignment layer 120. In the present embodiment, the protrusion 136 is substantially an annular protrusion, and the shape of the opening 142 may be substantially an annular opening corresponding to the shape of the protrusion 136. The material of the transparent plate 130 is, for example, a material transparent to quartz and penetrated by a excimer laser, and the material of the mask layer 140 is, for example, a metal-blocking excimer laser material (such as chrome, copper, brass). ,stainless steel).
之後，將透明板130與罩幕層140配置於配向層120上方，並使凸起136朝向配向層120。接著，以罩幕層140為罩幕對配向層120進行一準分子雷射製程，以使準分子雷射L透過開口142而照射並熔融配向層120之位於開口142下方的部分P1以及基材110之位於開口142下方的部分P2。Thereafter, the transparent plate 130 and the mask layer 140 are disposed above the alignment layer 120 with the protrusions 136 facing the alignment layer 120. Next, a quasi-molecular laser process is performed on the alignment layer 120 with the mask layer 140 as a mask, so that the excimer laser L passes through the opening 142 to illuminate and melt the portion P1 of the alignment layer 120 under the opening 142 and the substrate. The portion P2 of the 110 is located below the opening 142.
然後，請參照圖1B，在配向層120之位於開口142下方的部分P1以及基材110之位於開口142下方的部分P2處於熔融態時，使透明板130朝向配向層120移動，以使凸起136貫穿配向層120之位於開口142下方的部分P1並***基材110中，而形成一貫穿配向層120並朝向基材110凹陷的凹槽R。在本實施例中，凹槽R可將配向層120分割成彼此獨立的一第一部分122與一第二部分124，其中第二部分124環繞第一部份122。之後，請參照圖1C，移除透明板130與罩幕層140。此時，已初步完成本實施例之基板S。Then, referring to FIG. 1B, when the portion P1 of the alignment layer 120 under the opening 142 and the portion P2 of the substrate 110 below the opening 142 are in a molten state, the transparent plate 130 is moved toward the alignment layer 120 to make the protrusion. 136 penetrates the portion P1 of the alignment layer 120 under the opening 142 and is inserted into the substrate 110 to form a recess R that penetrates the alignment layer 120 and is recessed toward the substrate 110. In the present embodiment, the groove R can divide the alignment layer 120 into a first portion 122 and a second portion 124 that are independent of each other, wherein the second portion 124 surrounds the first portion 122. Thereafter, referring to FIG. 1C, the transparent plate 130 and the mask layer 140 are removed. At this time, the substrate S of this embodiment has been initially completed.
值得注意的是，在其他實施例中，可藉由調整準分子雷射L的能量而使其僅熔融配向層120(而不熔融基材110或是降低熔融基材110的程度)。如此一來，在之後的製程中可使凸起136僅貫穿配向層120而不***基材110中，從而形成如圖2所繪示的基板200，其中基板200的凹槽R1僅貫穿配向層120。It should be noted that in other embodiments, only the alignment layer 120 may be melted by adjusting the energy of the excimer laser L (without melting the substrate 110 or reducing the extent of the molten substrate 110). In this way, in the subsequent process, the protrusions 136 can be penetrated only through the alignment layer 120 without being inserted into the substrate 110, thereby forming the substrate 200 as shown in FIG. 2, wherein the groove R1 of the substrate 200 only penetrates the alignment layer. 120.
接著，請參照圖1D，於凹槽R中形成一膠框150，膠框150與基材110構成一容置凹槽C。膠框150分隔配向層120的第一部分122與第二部分124，其中第一部分122位於容置凹槽C內，而第二部分124位於容置凹槽C外。Next, referring to FIG. 1D, a plastic frame 150 is formed in the recess R, and the plastic frame 150 and the substrate 110 form a receiving recess C. The plastic frame 150 separates the first portion 122 and the second portion 124 of the alignment layer 120, wherein the first portion 122 is located in the receiving recess C and the second portion 124 is located outside the receiving recess C.
之後，於基材110上配置一對向基材160，其中膠框150位於基材110與對向基材160之間，且對向基材160覆蓋容置凹槽C。對向基材160上可選擇性地配置有一配向層170，且膠框150位於配向層170上。然後，於容置凹槽C中形成一液晶層180，液晶層180可位於配向層170與配向層120的第一部分122之間。Thereafter, a pair of substrates 160 are disposed on the substrate 110, wherein the frame 150 is located between the substrate 110 and the opposite substrate 160, and the opposite substrate 160 covers the receiving grooves C. An alignment layer 170 is selectively disposed on the opposite substrate 160, and the plastic frame 150 is located on the alignment layer 170. Then, a liquid crystal layer 180 is formed in the receiving recess C, and the liquid crystal layer 180 may be located between the alignment layer 170 and the first portion 122 of the alignment layer 120.
由前述可知，本實施例是以準分子雷射技術熔融部分配向層120與部分基材110，之後，再以透明板130的凸起136***配向層120與基材110之熔融的部分以形成凹槽R。如此一來，形成在凹槽R中的膠框150可分隔配向層120的第一部分122與第二部分124，以避免外界環境中的水氣經由第二部分124進入第一部分122中。此外，由於本實施例之膠框150直接與基材110連接，故可與基材110穩固地接合，從而提升本實施例之矽基液晶顯示面板的可靠度。另外，由於準分子雷射具有低波長且高能量的特性，因此，其可於極短的時間內熔融預設區域中的配向層120(與基材110)，而不影響預設區域周邊的配向層120(與基材110)。It can be seen from the foregoing that the present embodiment melts the partial alignment layer 120 and a portion of the substrate 110 by excimer laser technology, and then inserts the fused portion of the alignment layer 120 and the substrate 110 with the protrusions 136 of the transparent plate 130 to form a portion. Groove R. As such, the bezel 150 formed in the recess R can separate the first portion 122 and the second portion 124 of the alignment layer 120 to prevent moisture in the external environment from entering the first portion 122 via the second portion 124. In addition, since the plastic frame 150 of the present embodiment is directly connected to the substrate 110, it can be firmly bonded to the substrate 110, thereby improving the reliability of the bismuth-based liquid crystal display panel of the embodiment. In addition, since the excimer laser has low wavelength and high energy characteristics, it can melt the alignment layer 120 (with the substrate 110) in the predetermined region in a very short time without affecting the periphery of the preset region. Alignment layer 120 (with substrate 110).
在本實施例中，形成液晶層180的方法包括在基材110上配置對向基材160之後，於容置凹槽C中注入一液晶材料，且注入液晶材料的方式例如為透過膠框150的一開口(未繪示)注入液晶材料，前述開口與容置凹槽C連通。在其他實施例中，形成液晶層180的方法包括在基材110上配置對向基材160之前，於容置凹槽C中滴入一液晶材料，之後再蓋上對向基材160，以將液晶材料固定在容置凹槽C中。In this embodiment, the method of forming the liquid crystal layer 180 includes: after the opposite substrate 160 is disposed on the substrate 110, a liquid crystal material is injected into the receiving recess C, and the liquid crystal material is injected into the liquid crystal material, for example, through the plastic frame 150. An opening (not shown) is injected into the liquid crystal material, and the opening is in communication with the receiving groove C. In other embodiments, the method of forming the liquid crystal layer 180 includes dropping a liquid crystal material into the accommodating recess C before arranging the opposite substrate 160 on the substrate 110, and then covering the opposite substrate 160 to The liquid crystal material is fixed in the accommodating recess C.
值得注意的是，在本實施例中，基材110的材質可為單晶矽或玻璃其中之一，而對向基材160的材質可為單晶矽或玻璃其中之另一。換言之，本實施例之準分子雷射製程可在單晶矽基材或是玻璃基材上進行。It should be noted that in the embodiment, the material of the substrate 110 may be one of single crystal germanium or glass, and the material of the opposite substrate 160 may be one of single crystal germanium or glass. In other words, the excimer laser process of the present embodiment can be performed on a single crystal germanium substrate or a glass substrate.
因此，在其他實施例中，如圖3所示，準分子雷射製程可既在基材110a上進行，亦在對向基材160a上進行，因此，膠框150a可同時填入一貫穿配向層120a並朝向基材110a凹陷的凹槽R2以及一貫穿配向層170a並朝向對向基材160a凹陷的凹槽R3之中。Therefore, in other embodiments, as shown in FIG. 3, the excimer laser process can be performed on both the substrate 110a and the opposite substrate 160a. Therefore, the frame 150a can be simultaneously filled with a through alignment. The layer 120a is recessed toward the substrate 110a by a groove R2 and a groove R3 penetrating the alignment layer 170a and recessed toward the opposite substrate 160a.
如此一來，膠框150a可直接與基材110a以及對向基材160a連接，而可穩固地連接基材110a與對向基材160a，且可避免外界環境中的水氣進入配向層120a、170a(亦即配向層120a、170a之與液晶層180接觸的部分)。In this way, the plastic frame 150a can be directly connected to the substrate 110a and the opposite substrate 160a, and the substrate 110a and the opposite substrate 160a can be firmly connected, and the moisture in the external environment can be prevented from entering the alignment layer 120a. 170a (i.e., the portion of the alignment layers 120a, 170a that is in contact with the liquid crystal layer 180).
綜上所述，本發明是以準分子雷射技術熔融部分的配向層(與基材)，之後，再於配向層(與基材)之熔融的部分上形成貫穿配向層的凹槽。因此，形成在凹槽中的膠框可將配向層分隔成彼此獨立的二部分，以避免因外界環境中的水氣由配向層之位於膠框外的部分進入配向層之位於膠框內的部分。此外，由於本發明之膠框是直接與基材連接，故可與基材穩固地接合，從而提升本發明之矽基液晶顯示面板的可靠度。另外，由於準分子雷射具有低波長且高能量的特性，因此，其可於極短的時間內熔融預設區域中的配向層，而不影響預設區域周邊的配向層。In summary, the present invention fuses a portion of the alignment layer (and the substrate) by excimer laser technology, and then forms a groove penetrating the alignment layer on the molten portion of the alignment layer (and the substrate). Therefore, the plastic frame formed in the groove can separate the alignment layer into two parts independent of each other, so as to prevent the moisture in the external environment from entering the alignment layer of the alignment layer in the plastic frame by the portion of the alignment layer located outside the plastic frame. section. In addition, since the plastic frame of the present invention is directly connected to the substrate, it can be firmly bonded to the substrate, thereby improving the reliability of the fluorene-based liquid crystal display panel of the present invention. In addition, since the excimer laser has a low wavelength and high energy characteristics, it can melt the alignment layer in the preset region in a very short time without affecting the alignment layer around the preset region.
雖然本發明已以實施例揭露如上，然其並非用以限定本發明，任何所屬技術領域中具有通常知識者，在不脫離本發明之精神和範圍內，當可作些許之更動與潤飾，故本發明之保護範圍當視後附之申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the invention, and any one of ordinary skill in the art can make some modifications and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.
110、110a．．．基材110, 110a. . . Substrate
120、120a、170、170a．．．配向層120, 120a, 170, 170a. . . Alignment layer
122．．．第一部分122. . . first part
124．．．第二部分124. . . the second part
130．．．透明板130. . . cant see thing
132．．．第一表面132. . . First surface
134．．．第二表面134. . . Second surface
136．．．凸起136. . . Bulge
140．．．罩幕層140. . . Mask layer
142．．．開口142. . . Opening
150、150a．．．膠框150, 150a. . . Plastic frame
160、160a．．．對向基材160, 160a. . . Opposite substrate
180．．．液晶層180. . . Liquid crystal layer
200、S．．．基板200, S. . . Substrate
C．．．容置凹槽C. . . Locating groove
H．．．高度H. . . height
L．．．準分子雷射L. . . Excimer laser
P1．．．配向層之位於開口下方的部分P1. . . The portion of the alignment layer below the opening
P2．．．基材之位於開口下方的部分P2. . . The portion of the substrate below the opening
R、R1、R2、R3．．．凹槽R, R1, R2, R3. . . Groove
T．．．厚度T. . . thickness
圖1A～圖1D繪示本發明一實施例之矽基液晶顯示面板的製程剖面圖。1A-1D are cross-sectional views showing a process of a germanium-based liquid crystal display panel according to an embodiment of the invention.
圖2繪示圖1C之基板的一種變化。Figure 2 illustrates a variation of the substrate of Figure 1C.
圖3繪示圖1D之矽基液晶顯示面板的一種變化。FIG. 3 illustrates a variation of the bismuth-based liquid crystal display panel of FIG. 1D.
110．．．基材110. . . Substrate
120、170．．．配向層120, 170. . . Alignment layer
122．．．第一部分122. . . first part
124．．．第二部分124. . . the second part
150．．．膠框150. . . Plastic frame
160．．．對向基材160. . . Opposite substrate
180．．．液晶層180. . . Liquid crystal layer
C．．．容置凹槽C. . . Locating groove
R．．．凹槽R. . . Groove
Claims (10)
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| TW200848922A (en) * | 2007-06-01 | 2008-12-16 | Univ Nat Cheng Kung | Nano-imprinting process |
| JP2009008868A (en) * | 2007-06-28 | 2009-01-15 | Citizen Finetech Miyota Co Ltd | Method for manufacturing liquid crystal display element, and liquid crystal display element |
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| TW200848922A (en) * | 2007-06-01 | 2008-12-16 | Univ Nat Cheng Kung | Nano-imprinting process |
| JP2009008868A (en) * | 2007-06-28 | 2009-01-15 | Citizen Finetech Miyota Co Ltd | Method for manufacturing liquid crystal display element, and liquid crystal display element |
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| TWI683159B (en) * | 2018-11-20 | 2020-01-21 | 友達光電股份有限公司 | Display panel |
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