1362972 九、發明說明： 【發明所屬之技術領域】 本發明涉及狹縫塗敷裝置的藥液預處理裝置，特別涉 及一種經過結構改良’將預處理裝置中的清洗液喷灑部分 • 及乾燥部分構成模組，從而用簡單的結構方便去除藥液 • 之、具有藥液預處理裝置的狹縫塗敷裝置。其中所述清洗 液的喷灑部分及乾無部分用於向所述起動報（priming roller)喷灑清洗液並將其乾燥，所述起動輥用於承接由所 • 述狹縫塗敷裝置的喷頭吐出的藥液。 1 【先前技術】 平板顯不元件用的基板上的功能性薄膜通常在基板的 製程中透過常規的光刻（photolithography )製程形成預定 圖案。 所述光刻製程則是於基板的薄膜上塗敷預定厚度的感 光液後，對所述感光液（光刻膠）進行曝光、顯影及蝕刻 等一系列步驟，從而對所述基板的薄膜上形成預定的電路 鲁圖案的製程。 在所述光刻製程中，尤其重要的是在塗敷步驟中對基 板上的薄膜形成均勻厚度的感光層。這是由於，如果出現 感光層的厚度比標準值厚或者薄等情況，就會導致不均勻 • 的蝕刻。 .· 作爲如此在基板上塗敷感光液的步驟，已有報導的是 利用旋塗機（spin e〇ater ) #旋塗方式和利用狹縫塗敷機 (slitcoater)的非旋轉塗敷方式（咖心心⑽ 5 1362972 在上述兩種塗敷方式中，所述旋塗方式會根據作業條 件（如轉速及溶劑蒸發等）導致不規則的表面塗層（如形 成波紋），因此最近主要應用的是利用狹縫塗敷裝置的非 旋轉塗敷方式。 所述非旋轉塗敷方式是，透過狭缝塗敷裝置的狹縫喷 頭喷灑感光液的同時，在基板薄膜上形成預定厚度的光刻 用的感光層（或光刻層）。 而且，在這種非旋轉塗敷方式令，透過狹縫塗敷裝置 向基板表面噴灑藥液時，在前後兩個基板的塗敷作業之間 的等待時間内，由於喷頭的喷口與空氣接觸，會導致藥液 濃度的增加。如果在這一狀態下進行下一個基板的塗敷作 業’由於高濃度藥液，會出現縱向條紋或者塗層斷開的現 象。 由於這種原因，設置藥液預處理裝置以防止上述現象 的出現。這種藥液預處理裝置通常包括：用於存儲清洗液 的清洗槽；設置在所述清洗槽的内侧，用於承接由喷頭的 噴口吐出的藥液的起動輥；用於向起動輥的表面喷灑清洗 液的噴淋頭；用於喷灑循環液的喷淋頭；用於噴出乾燥氣 體的噴氣嘴；以及用於去除殘留在所述起動輥表面上藥液 的擠壓式刮板（squeeze )。 當所述藥液預處理裝置的起動輥旋轉時，依次執行溶 劑的喷灑、溶劑的噴淋（shower )、溶劑的漂洗（rinse ) ' 起動輥的乾燥等步驟。 然而，由於上述現有的藥液預處理裝置分別設置有用 6 1362972 :執行溶劑的喷麗、噴淋、漂洗、乾燥等步驟的 八 “結構複雜’發生錯誤動作的頻率較高。 β刀， 而且，該藥液預處理裝置的結構變得複雜 動輥的清洗效率。 降低對起 【發明内容】 其目的在於提 ’該裝置中用 ，從而用簡單1362972 IX. INSTRUCTIONS OF THE INVENTION: TECHNICAL FIELD The present invention relates to a chemical liquid pretreatment apparatus for a slit coating apparatus, and more particularly to a structural improvement "spraying portion of a cleaning liquid in a pretreatment apparatus" and a drying section A slit coating device having a chemical liquid pretreatment device that constitutes a module and is easy to remove a chemical liquid with a simple structure. Wherein the spray portion and the dry portion of the cleaning liquid are used to spray and dry the cleaning liquid to the priming roller for receiving the slit coating device The liquid medicine spit out from the nozzle. 1 [Prior Art] A functional film on a substrate for a flat panel display element is usually formed into a predetermined pattern by a conventional photolithography process in the process of the substrate. The lithography process is a step of exposing, developing, and etching the photosensitive liquid (photoresist) after applying a predetermined thickness of the photosensitive liquid on the film of the substrate, thereby forming a film on the substrate. The process of the predetermined circuit pattern. In the photolithography process, it is especially important to form a photosensitive layer of uniform thickness on the film on the substrate in the coating step. This is because if the thickness of the photosensitive layer is thicker or thinner than the standard value, uneven etching is caused. As a step of applying the photosensitive liquid on the substrate as described above, it has been reported to use a spin coater (spin e〇ater) #rotary coating method and a non-rotation coating method using a slit coater (coffee) Heart (10) 5 1362972 In the above two coating methods, the spin coating method will cause irregular surface coating (such as corrugation) according to working conditions (such as rotation speed and solvent evaporation), so the main application is recently Non-rotation coating method of the slit coating device. The non-rotation coating method is to form a predetermined thickness of lithography on the substrate film while the photosensitive liquid is sprayed through the slit nozzle of the slit coating device. Photosensitive layer (or photolithographic layer). Moreover, in this non-rotation coating method, when the chemical solution is sprayed onto the surface of the substrate through the slit coating device, the waiting time between the application operations of the front and rear substrates is performed. Since the nozzle of the nozzle is in contact with the air, the concentration of the liquid is increased. If the next substrate is applied in this state, the longitudinal stripes or the coating may be broken due to the high concentration of the liquid. For this reason, a chemical pretreatment device is provided to prevent the occurrence of the above phenomenon. The chemical pretreatment device generally includes: a cleaning tank for storing the cleaning liquid; and is disposed inside the cleaning tank, a starter roller for receiving a liquid medicine discharged from a nozzle of a nozzle; a shower head for spraying a cleaning liquid to a surface of the starter roller; a shower head for spraying the circulating fluid; and an air nozzle for spraying the dry gas And a squeeze squeegee for removing the chemical liquid remaining on the surface of the priming roller. When the priming roller of the chemical liquid pretreatment device rotates, solvent spraying and solvent spraying are sequentially performed. (shower), rinsing of the solvent (drying of the starter roller, etc.) However, since the above-mentioned conventional chemical liquid pretreatment apparatus is separately provided with 6 1362972: performing the steps of spraying, spraying, rinsing, drying, etc. of the solvent Eight "complex structure" has a high frequency of erroneous actions. The β knife, and the structure of the chemical liquid pretreatment device becomes complicated with the cleaning efficiency of the moving roller. Characterized by lifting 'of the apparatus, so that a simple
本發明是爲了解決上述問題而提出的， 供種具有藥液預處理裝置的狹缝塗敷裝置 於喷灑溶劑及乾燥的功能部分被構成爲模組 的結構提高清洗效率。 本發明的另一個目的是提供一種具有藥液預處理裝置 的狹縫塗敷裝置，該裝置在起動輥的邊緣形成一流體通 道，並經由所述流體通道使清洗液或者空氣流過，從而方 便地去除塗敷在起動輥上的藥液。 爲了實現上述目的，本發明較佳的技術方案包括：工 作臺；輸送機構，用於在所述工作臺上輸送基板；狹縫喷 頭’設置在所述工作臺的一側，且可上下移動，其内部設 有用於裝填藥液的腔室；藥液預處理裝置，包括一起動輥 用以承接由所述狹縫喷頭吐出的藥液，且與所述起動報外 周面鄰接設置有流體通道，並透過所述流體通道注入清洗 液或者空氣使之與所述起動輥表面接觸，從而去除殘留在 所述起動輥外周面上的藥液；及移動機構，可移動地安裝 在所述工作臺上，用於移動所述藥液預處理裝置。 本發明由於在起動輥的邊緣形成一流體通道，並經由 所述流體通道使清洗液或空氣流過，因此可方便地去除塗 7 1362972 敷在所述起動輥上的藥液。 另外’本發明透過把對起動輥喷灑清洗液並予以乾燥 的結構部分模組化，簡化了結構，由此提高了清洗效率， 減少了錯誤動作的發生頻率。 【實施方式】 下面結合附圖，詳細說明本發明狹缝塗敷裝置的—個 較佳實施例。 圖1是本發明具有藥液預處理裝置的狹縫塗敷裝置一 個貫施例的整體結構示意圖，圖2是用於顯示圖1中的藥 液預處理裝置靠近狹縫塗敷裝置狀態的側面示意圖。 如圖中所示’在工作臺2的上方設置有輸送機構4, 該機構用於把基板G向一側移動。 所述輸送機構4可以使用常規的氣浮式輸送台6,其 可用空氣壓力將所述基板G浮上後在此狀態下輸送。 即，雖然圖中未顯示，所述輸送台6具有常規的氣浮 式輸送結構，其用托架C固定基板G的狀態下用空氣壓力 支持所述基板G的底面，並在此狀態下輸送基板。 除上述結構之外’所述輸送機構4還可以構成爲諸如 像輕同式輸送機那樣的輸送結構’該結構可以在輥筒上於 载基板G的狀態下將其輸送（未圖示）。 而且，在所述工作臺2的一側設置有狹縫喷頭丨〇。所 述狹縫喷頭10在透過所述輸送台6輸送的基板〇的薄膜 上塗敷感光液’以形成光刻用的感光層（以下簡稱“感光 層”。 8 1362972 所述狹縫噴頭1〇具有常規狹縫式（slit type)噴頭的 外觀，具有矩形噴口 N。 所述狹縫喷頭10設置在所述工作臺2的上方，並與所 述基板G的輸送方向交又。所述狹縫喷頭1〇同常規的感 光液供應裝置T相連，並由該裝置獲得感光液後用常規的 方法將感光液塗敷於所述基板G的薄膜上。 另外，所述狹縫喷頭10安裝於第一支撐架12上並可 上下移動。即所述狹縫噴頭可移動地設置在第一支撑 架12的第一轨道rl上。此時，所述狭縫喷頭10包括直線 運動塊（未圖示，以下簡稱LM塊）與驅動源（未圖示）， 並以LM方式結合在所述第一執道H上。 因此’當需要塗敷藥液或者將在後面敘述的藥液預處 理裝置14靠近時，所述狹縫喷頭10可以沿著第一軌道rl 往下移動。 與上述狹縫喷頭1〇相鄰的位置上設置有能夠移動的藥 液預處理裝置14。 即’所述藥液預處理裝置14可透過移動機構17在工 作臺2上移動。 所述移動機構17包括：設置在工作臺2上的第二軌道 Γ2;用於支持所述藥液預處理裝置14的第二支撐架16; 在所述第一支樓架16的下方可移動地設置在所述第二軌 的LM塊L，用於驅動所述lM塊L移動的驅動源 (未圖示）。 因此 ^所述驅動源驅動時，所述LM塊L可沿所述 9 1362972 第二軌道Γ2前進或後退’從而帶動所述藥液預處理裝置μ 移動。 如圖3及圖4所示，所述藥液預處理裝置14具 槽20,並於所述清洗槽20的内部設有用來存健溶劑= 間。 二 另外，所述清洗槽20的内部設置有可旋轉的起 R。所述起動輥R的上方部分稍微突出所述清洗槽2〇 端，從而讓狭縫喷頭10的喷口 Ν在執行塗敷作胃業之:亡 易於把剩下的藥液W噴到所述起動輥厌的外表面上、。别可 所述起動輥R透過逆時針旋轉，執行清洗步驟以去卜 其外表面上粘附的藥液》 $ 首先，臨近所起_ R $位置上設置有用來喷麗产 洗液的清洗液嗔灑單it 25。其中所述清洗液最好包括: 劑。此外，所述清洗液喷灌單元25可構成爲模組化結^ 並與清洗槽20相結合，從而簡化結構，易於維修或更換 所述清洗液喷灌單元25包括：第一本體24，設置在 臨近所述起動觀汉的位置上，並與所述起動輕^成第〜 流體通道Ll;清洗液供應端26’設置在所述第—本體24 j方’向所述第—流體通道L1供應溶劑；第—真空端 :置在所述第—本體24下方，透過真空壓力吸收流過所 V第一流體通道的清洗液及藥液。 〃體來說，所述第一本體24的一側面28爲曲面，发 與所述起動輥R的外周面相鄰設置。 、 因 9 繁 本體24的一側面28與起動輥R的外周面 1362972 之間構成一個具有預定長度的第一流體通道L1。 而且，所述第一本體24的一側設有與所述清洗液供應 端26相連而喷灑溶劑的喷孔hi ;與所述第一真空端28相 連而提供真空壓的吸孔h2。 因此，透過所述清洗液供應端26流入的溶劑，由所述 嗔孔hi噴灑到起動輥R的外周面，而喷灑到起動輥R上 的溶劑則透過所述第一流體通道L1沿所述起動輥R的外 周面流動後，被所述吸孔h2所吸收，並離開所述起動輥R。 在此過程中，噴灑到起動輥R上的溶劑同藥液混合， 並透過所述吸孔h2的吸力，可以很方便地脫離所述起動 輥R 〇 此時’由於所述第一流體通道L1沿所述起動輥R的 外周面具有一定的縱向長度，溶劑寸獲得充裕的時間來沿 著所述第一流體通道L1同藥液混合，因此可以提高清洗 效率。 透過如上過程’可以有效地去除殘留在起動輥R外周 面上的藥液。 所述清洗液喷灑單元25的下方可進一步設置有刮板 32’所述到板32直接與起動輥r的外周面接觸，從而去 除藥液。 即，所述到板32由具有一定彈力的材料製成，並處於 其端部與起動輥R的外周面接觸的狀態。 因此，所述刮板32可透過機械方式去除所述起動輥R 外周面上的藥液或溶劑。 11 1362972 - 所述刮板3 2苛以如前所述那樣設置在清洗液喷灑單元 25的下方，或者根據工藝類塑，可以不設置所述刮板32。 另一方面，所述刮板32的鄰接位置上連接有第一排氣 端34和溢出瑞36。所述第一排氣端34同所述清洗槽2〇 肉部的存儲空間22相連，用於向外界排出所述存儲空間22 内的溶劑蒸汽。 而且，當所述存儲空間22内的溶劑超出預定水位時， 超出部分的溶劑就可從溢出細1 3 6排出’從而防止溶劑溢 • 出清洗槽20的上方。 此外，所述清洗槽20的一側設置有起泡端40，所述 起泡端40與氣體供應單元（未圖示）相連。因此，當溶 - 劑存儲在所述清洗槽20内時，可透過所述起泡端40注入 - 空氣，並借此在溶劑中産生泡沫，提高清洗效果。 而且，所述清洗槽20的底部連接有排出端42，由此 在需要時，可將清洗槽20内的溶劑向外排出。 魯 另一方面，所述清洗槽2 0的另一側設有漂洗單元4 5， 用來清除殘留在起動輥R上的藥液。所述漂洗單元45包 每：用於供應溶劑的供應端50 ;與所述溶劑供應端5〇相 連、用於對起動輥R喷灑溶劑的喷嘴48。 - 據此’當所述起動輥R經過所述漂洗區域時，從所述 嘴嘴48噴出溶劑’去除所述起動輥R上的藥液。所述供 ， 應螭50的上方可設置有第二排氣端44，由此將清洗槽2〇 内的溶劑蒸汽向外排出。 所述漂洗單元45上方設有乾燥單元5丨，從而乾燥起 12 1362972 動報R以完成預處理步驟。 所述乾燥單疋51被構成爲模組，從而簡化了結構，方 便了維修或更換工作。 即’所述乾燥單元51包括：第二本體Μ，設置在同 所述起動輥R臨近的位詈 ㈣位置上並與所述起動輥R構成第二 2，虱體供應端56,設置在所述第二本體“的 ^方，向所述第二流體通道^供應空氣；第二真空端”， 二^所述第二本體52的下方，透過真空壓力吸收流過 所迷第二流體通道L2的空氣，並乾燥所述起動親r。 具體來說’所述第二本體52的一側面54爲曲面，苴 與所述起動輥R的外周面相鄰設置。 I* 、f T所述第—本體52與起動輥R之間形成第二流 ^ 供所述空氣沿所述起動輥R的外周面流動。 參 浐5ΓΓ、’所述第二本體52的一側設置有與所述氣體供應 I目連、用於嗔射空氣的喷氣孔⑴以及與所述第二 真空端58相連、用於提供真空麼的吸氣孔h4。 、’'"過所述氣體供應端56流入的空氣透過喷氣孔 噴射到起_ R料周面，並沿所述第二流體通道U ^動的過程中乾燥所述起動輥R的外周面。 所、^^ A所述第二流體通道L2流動的空氣被形成在 乳孔h4周圍的真空環境所吸收。透過如上過程， 所述起動輥R的外周面得以乾燥。 由於所述第二流體通道L2沿所述起動輕R的 °八有夂的縱向長度’空氣可獲得充裕的時間來沿 13 1362972 斤述第二流體通道L2流動的同時盥所 面接網m L j吁與所述起動輥R的外周 接觸，因此可以提高乾燥效率。 而且’所述氣體供應端56盘笛-吉r 模袓并也墙 ，、第一真空端58被構成爲 吴、，且，並與第二本體52相結合 換工作。 從而方便了維修或者更 下面參照附圖，詳細說明本發明裝 操作過程。 J衩住貫施例的 软如圖1至圖5所示，首先，沿所述第二軌道r2，將可 +動地設置在工作I 2 一側的藥液預處理裝置朝狭縫 I頭10方向移動。當所述藥液預處理裝置14到達喷頭1〇 下方時，將所述狹縫喷頭10沿所述第一軌道rl往下移動。 當所述狹缝喷頭10的喷口 N靠近所述起動輥汉上端 時，透過喷口 N，把初始量的藥液喷到起動輥r上。务藥 液塗敷到起動輥R上時，所述起動輥R開始旋轉，並初步 經過清洗液喷灑單元25。 在此過程中，經由清洗液喷·Μ25的清洗液供應端 26流入的溶劑，可透過噴孔Μ嘴麗到所述起動輥r的外 周面上。 而且，喷灑到起動輥R的外周面上的溶劑沿所述第一 流體通道U在所述起動輥R的外周面上流動後，被所述 吸孔h2所吸收，並離開所述起動輥R。 在此過程令，喷麓到起動輥11上的溶劑和藥液混合後， 透過所述吸孔h2的吸力’可以方便地脫離所述起動輥r。 透過如上過程，去除殘留在起動輥尺的外周面上的藥 1362972 液0 經過所述清洗液喷灑單元25後，所述起動輥R接著 經過到板32區域，其中所述到板32處於其端部與起動輥 R的外周面彈性接觸的狀態。 因此’在所述起動輥R的旋轉過程中，所述刮板32 可通過機械方式去除殘留在起動輥r的外周面上的藥液與 溶劑。 經過到板32後，所述起動輥R接著經過清洗槽2〇的 存儲空間22 ’在此過程中，其通過儲存在存儲空間22内 的溶劑得到漂洗。 此時，存儲空間22内的溶劑可以是經過所述溶劑喷灑 單元25與刮板32後流下的溶劑，也可以是在先前的藥液 預處理步驟中經由所述漂洗單元45的漂洗過程所留下的 溶劑。 另外，在所述起動輥R經過所述清洗槽2〇的存儲空 間22的過程中，可以根據需要向所述起泡端4〇注入空氣， 並借此在溶劑中産生泡沫。 如此在溶劑中産生泡沫，可以提高溶劑的流動性， 而提高清洗效果。 進 所述起動輥R經過清洗槽2〇的存儲空間22後， 經過過漂洗單元45。在所述漂洗單元45中，由供 所提供的溶劑通過噴嘴、並以_定的壓力喷渡到所： 輥R上。 ％動 ，所述起動輥上 因此，透過喷灑到起動輥R上的溶劑 15 1362972 的樂液得到清除。 广：漂洗單元45後，所述起動輥… 兀5卜並在此過程中，其外周面得到乾燥。迅乾雇早 即’經由與所述乾燥單元51的第二本體U 的氣體供應端56所、、$ 丨相連 親汉_^ 所流入的空氣’透過喷氣孔^噴到起動 =此二透過所述噴氣孔h3嘴到起_ r 1 …在沿所述第二流體通道L2流動的 動輥R的外周面。 孔知起 、而且’沿所述第二流體通道L2流動的空氣被形成在 所述吸孔h4周圍的真空環境所吸收。透過如上過程 述起動輥R的外周面得到乾燥。 經過如上所述的藥液虎. 4 ]辨履預處理過程後，所述藥液預處理 裝置14回到原位，並在需要時重複以上過程。 【圖式簡單說明】 圖丨是本發明具有藥液預處理裝置的狹縫塗敷裝置一 個實施例的整體結構示意圖。 圖2是用於顯示圖1中的藥液預處理裝置靠近狭縫塗 敷裝置狀態的側面示意圖。 圖3是用於顯示狭，縫喷頭时口正對置在圖】中的藥 液預處理裝置狀態的側面剖視圖。 圖4是形成在圖i中的藥液預處理裝置内側的流體通 道的結構示意圖。 16 1362972SUMMARY OF THE INVENTION The present invention has been made to solve the above problems, and a slit coating apparatus for a chemical liquid pretreatment apparatus is configured as a module structure in which a solvent is sprayed and a functional portion to be dried is used to improve cleaning efficiency. Another object of the present invention is to provide a slit coating device having a chemical liquid pretreatment device which forms a fluid passage at the edge of the starter roller and through which the cleaning liquid or air flows, thereby facilitating The liquid medicine applied to the starter roller is removed. In order to achieve the above object, a preferred technical solution of the present invention includes: a workbench; a transport mechanism for transporting a substrate on the workbench; and a slit sprayer disposed on one side of the workbench and movable up and down a chamber for filling the liquid medicine is provided therein; the chemical liquid pretreatment device includes a movable roller for receiving the liquid medicine discharged by the slit nozzle, and a fluid is disposed adjacent to the outer peripheral surface of the starter a passage through which the cleaning liquid or air is injected to contact the surface of the starter roller to remove the chemical liquid remaining on the outer circumferential surface of the starter roller; and a moving mechanism movably mounted in the work On the stage, for moving the liquid chemical pretreatment device. According to the present invention, since a fluid passage is formed at the edge of the starter roller and the cleaning liquid or air flows through the fluid passage, the chemical solution applied to the starter roller can be easily removed. Further, the present invention simplifies the structure by modularizing the structure in which the cleaning liquid is sprayed on the starter roller and dried, thereby improving the cleaning efficiency and reducing the frequency of occurrence of erroneous actions. [Embodiment] A preferred embodiment of the slit coating apparatus of the present invention will be described in detail below with reference to the accompanying drawings. 1 is a schematic view showing the entire structure of a slit coating apparatus having a chemical liquid pretreatment apparatus according to the present invention, and FIG. 2 is a side view showing a state in which the chemical liquid pretreatment apparatus of FIG. 1 is close to the slit coating apparatus. schematic diagram. As shown in the figure, a transport mechanism 4 for moving the substrate G to one side is provided above the table 2. The conveying mechanism 4 can use a conventional air floating type conveying table 6, which can be transported in this state by floating the substrate G with air pressure. That is, although not shown in the drawings, the transport table 6 has a conventional air-floating transport structure that supports the bottom surface of the substrate G with air pressure in a state where the substrate G is fixed by the carrier C, and is transported in this state. Substrate. In addition to the above structure, the conveying mechanism 4 may be configured as a conveying structure such as a light-weight conveyor. The structure may be conveyed on a roller in a state of the carrier substrate G (not shown). Further, a slit nozzle 设置 is provided on one side of the table 2. The slit head 10 applies a photosensitive liquid ' on a film of a substrate 输送 conveyed through the transfer table 6 to form a photosensitive layer for lithography (hereinafter referred to as a “photosensitive layer”. 8 1362972 The appearance of a conventional slit type nozzle has a rectangular nozzle N. The slit nozzle 10 is disposed above the table 2 and intersects with the conveying direction of the substrate G. The slit nozzle 1 is connected to a conventional photosensitive liquid supply device T, and a photosensitive liquid is obtained by the device, and the photosensitive liquid is applied to the film of the substrate G by a conventional method. Mounted on the first support frame 12 and movable up and down. That is, the slit nozzle is movably disposed on the first rail rl of the first support frame 12. At this time, the slit nozzle 10 includes a linear motion block. (not shown, hereinafter referred to as LM block) and a drive source (not shown), and are coupled to the first track H by the LM method. Therefore, when it is necessary to apply a chemical solution or a chemical liquid which will be described later When the pretreatment device 14 is close, the slit nozzle 10 can be along the first The trajector rl moves downward. A movable chemical pretreatment device 14 is disposed at a position adjacent to the slit nozzle 1A. That is, the chemical pretreatment device 14 can pass through the moving mechanism 17 at the table 2 The moving mechanism 17 includes: a second rail 2 disposed on the table 2; a second support frame 16 for supporting the liquid chemical pretreatment device 14; in the first rack 16 The LM block L movably disposed at the second rail is used to drive a driving source (not shown) of the movement of the 1M block L. Therefore, when the driving source is driven, the LM block L may be along The 9 1362972 second track Γ 2 advances or retreats ′ to drive the liquid chemical pretreatment device μ to move. As shown in FIG. 3 and FIG. 4 , the liquid chemical pretreatment device 14 has a groove 20 and is used for the cleaning. The inside of the tank 20 is provided for storing the solvent = between. In addition, the inside of the washing tank 20 is provided with a rotatable R. The upper portion of the starter roller R slightly protrudes from the end of the washing tank 2, thereby Let the spout of the slit nozzle 10 be applied to the stomach for application: it is easy to spray the remaining liquid W to On the outer surface of the starter roller, the starter roller R is rotated counterclockwise, and the cleaning step is performed to remove the liquid adhered on the outer surface of the starter. $ First, set near the _R$ position There is a cleaning liquid showering unit 25 for spraying the liquid washing liquid. The cleaning liquid preferably includes: a cleaning agent. Further, the cleaning liquid sprinkling unit 25 can be configured as a modular structure and is associated with the cleaning tank 20 Combining, thereby simplifying the structure, easy to repair or replace the cleaning liquid sprinkling unit 25 includes: a first body 24 disposed at a position adjacent to the starting point, and lightly forming the first fluid passage L1 with the starting; The cleaning liquid supply end 26' is disposed on the first body 24 j' to supply the solvent to the first fluid passage L1; the first vacuum end is disposed below the first body 24, and is permeable to the vacuum pressure. V The cleaning fluid and the chemical solution of the first fluid passage. In the body, a side surface 28 of the first body 24 is a curved surface and is disposed adjacent to the outer peripheral surface of the starter roller R. A first fluid passage L1 having a predetermined length is formed between a side surface 28 of the body 24 and the outer peripheral surface 1362972 of the starter roller R. Further, one side of the first body 24 is provided with an injection hole hi which is connected to the cleaning liquid supply end 26 to spray a solvent, and a suction hole h2 which is connected to the first vacuum end 28 to provide a vacuum pressure. Therefore, the solvent flowing in through the cleaning liquid supply end 26 is sprayed from the boring hole hi to the outer circumferential surface of the priming roller R, and the solvent sprayed onto the priming roller R passes through the first fluid passage L1. After the outer peripheral surface of the starter roller R flows, it is absorbed by the suction hole h2 and leaves the starter roll R. During this process, the solvent sprayed onto the priming roll R is mixed with the medicinal liquid, and the suction force of the suction hole h2 can be easily detached from the priming roller R 〇 at this time due to the first fluid passage L1 The outer peripheral surface of the starter roller R has a certain longitudinal length, and the solvent is allowed to have a sufficient time to be mixed with the chemical liquid along the first fluid passage L1, so that the cleaning efficiency can be improved. The liquid remaining on the outer peripheral surface of the starter roll R can be effectively removed by the above process. The cleaning liquid spraying unit 25 may be further provided with a squeegee 32' to the plate 32 directly contacting the outer peripheral surface of the priming roller r to remove the chemical liquid. That is, the to-plate 32 is made of a material having a certain elastic force, and is in a state where its end portion is in contact with the outer peripheral surface of the starter roller R. Therefore, the squeegee 32 can mechanically remove the chemical liquid or solvent on the outer peripheral surface of the starter roller R. 11 1362972 - The squeegee 3 2 is disposed below the cleaning liquid spray unit 25 as previously described, or may be provided without the squeegee 32 depending on the process. On the other hand, the first exhaust end 34 and the overflow hopper 36 are connected to the abutting position of the squeegee 32. The first exhaust end 34 is connected to the storage space 22 of the meat portion of the washing tank 2 for discharging solvent vapor in the storage space 22 to the outside. Moreover, when the solvent in the storage space 22 exceeds the predetermined water level, the excess portion of the solvent can be discharged from the overflow fine 136 to prevent the solvent from overflowing above the cleaning tank 20. Further, one side of the washing tank 20 is provided with a bubble end 40 which is connected to a gas supply unit (not shown). Therefore, when the solvent is stored in the cleaning tank 20, air can be injected through the bubble end 40, and thereby foam is generated in the solvent to improve the cleaning effect. Further, the bottom of the washing tank 20 is connected to the discharge end 42, whereby the solvent in the washing tank 20 can be discharged outward as needed. On the other hand, the other side of the washing tank 20 is provided with a rinsing unit 45 for removing the chemical liquid remaining on the priming roll R. The rinsing unit 45 includes a supply end 50 for supplying a solvent, and a nozzle 48 for supplying a solvent to the start roll R in connection with the solvent supply end 5?. - According to this, when the priming roller R passes through the rinsing region, the solvent is ejected from the nozzle 48 to remove the medicinal liquid on the priming roller R. A second exhaust end 44 may be disposed above the supply port 50 to thereby discharge the solvent vapor in the cleaning tank 2''. A drying unit 5 is disposed above the rinsing unit 45 to dry the 12 1362972 motion report R to complete the pretreatment step. The drying unit 51 is constructed as a module, thereby simplifying the structure and facilitating maintenance or replacement work. That is, the drying unit 51 includes: a second body Μ disposed at a position 四 (four) adjacent to the priming roller R and constituting a second 2 with the priming roller R, and a corpus supply end 56 disposed at the a second body "the air is supplied to the second fluid passage 2; a second vacuum end", and the lower portion of the second body 52 passes through the second fluid passage L2 through vacuum pressure absorption. The air and dry the starting pro-r. Specifically, a side surface 54 of the second body 52 is a curved surface, and is disposed adjacent to the outer peripheral surface of the starter roller R. A second flow is formed between the first body 52 and the starter roller R of I*, fT, and the air flows along the outer peripheral surface of the starter roller R. The side of the second body 52 is provided with a gas injection hole (1) connected to the gas supply I for blowing air and connected to the second vacuum end 58 for providing a vacuum. The suction hole h4. , ''" the air flowing in through the gas supply end 56 is sprayed through the gas injection hole to the circumferential surface of the material, and the outer peripheral surface of the starter roller R is dried during the movement of the second fluid passage U . The air flowing through the second fluid passage L2 is absorbed by the vacuum environment formed around the milk hole h4. Through the above process, the outer peripheral surface of the starter roller R is dried. Since the second fluid passage L2 is along the longitudinal length of the starting light R, the air can obtain ample time to flow along the first fluid passage L2 along 13 1362972. It is called in contact with the outer circumference of the starter roller R, so that the drying efficiency can be improved. Further, the gas supply end 56 is also a wall, and the first vacuum end 58 is constructed as Wu, and is combined with the second body 52 for work. Thus, the maintenance process or the operation of the present invention will be described in detail with reference to the accompanying drawings. As shown in FIG. 1 to FIG. 5, first, along the second rail r2, the liquid chemical pretreatment device that can be disposed on the working I 2 side is moved toward the slit I. Move in 10 directions. When the chemical pretreatment device 14 reaches below the head 1 ,, the slit nozzle 10 is moved down along the first rail rl. When the spout N of the slit head 10 approaches the upper end of the starter roller, an initial amount of the chemical liquid is sprayed onto the starter roller r through the spout N. When the liquid is applied to the starter roller R, the starter roller R starts to rotate and initially passes through the cleaning liquid spray unit 25. In this process, the solvent flowing in through the cleaning liquid supply end 26 of the cleaning liquid spray port 25 can be passed through the nozzle hole to the outer peripheral surface of the starter roller r. Further, the solvent sprayed onto the outer peripheral surface of the starter roller R flows along the first fluid passage U on the outer peripheral surface of the starter roller R, is absorbed by the suction hole h2, and leaves the starter roller. R. In this process, the solvent sneezing onto the starter roller 11 and the chemical solution are mixed, and the suction force transmitted through the suction hole h2 can be easily released from the starter roller r. Through the above process, the medicine 1362972 remaining on the outer peripheral surface of the starter roller is removed. After the liquid 0 passes through the cleaning liquid spray unit 25, the starter roller R then passes to the region of the plate 32, wherein the plate 32 is in its A state in which the end portion is in elastic contact with the outer peripheral surface of the starter roller R. Therefore, the scraper 32 can mechanically remove the chemical liquid and the solvent remaining on the outer peripheral surface of the starter roller r during the rotation of the starter roller R. After passing to the plate 32, the starter roll R then passes through the storage space 22' of the cleaning tank 2's, during which it is rinsed by the solvent stored in the storage space 22. At this time, the solvent in the storage space 22 may be a solvent that flows down after passing through the solvent spraying unit 25 and the squeegee 32, or may be a rinsing process via the rinsing unit 45 in the previous chemical liquid pretreatment step. The solvent left behind. Further, during the passage of the starter roller R through the storage space 22 of the cleaning tank 2, air may be injected into the bubbler end 4 as needed, thereby generating foam in the solvent. By foaming in the solvent as described above, the fluidity of the solvent can be improved, and the cleaning effect can be improved. After the starter roller R passes through the storage space 22 of the cleaning tank 2, it passes through the rinsing unit 45. In the rinsing unit 45, the supplied solvent is passed through a nozzle and sprayed onto the roller R at a predetermined pressure. %, on the starter roller, therefore, the liquid of the solvent 15 1362972 sprayed onto the starter roll R is removed. Wide: After the rinsing unit 45, the starting roller is 兀5 and during this process, its outer peripheral surface is dried. Quickly hired immediately, 'via the gas supply end 56 of the second body U of the drying unit 51, the air flowing into the _ _ _ ^ is injected through the air blast hole to the start = the second transmission The gas injection hole h3 is at the outer peripheral surface of the moving roller R flowing along the second fluid passage L2. The hole is known, and the air flowing along the second fluid passage L2 is absorbed by the vacuum environment formed around the suction hole h4. The outer peripheral surface of the starter roll R is dried as described above. After the pretreatment process as described above, the liquid chemical pretreatment device 14 is returned to the original position, and the above process is repeated as needed. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 丨 is a schematic view showing the entire structure of an embodiment of a slit coating apparatus having a chemical liquid pretreatment apparatus according to the present invention. Fig. 2 is a side view showing the state in which the chemical liquid pretreatment apparatus of Fig. 1 is close to the slit coating apparatus. Fig. 3 is a side cross-sectional view showing the state of the liquid chemical pretreatment apparatus in which the mouth is directly opposed to the slit when the slit nozzle is used. Figure 4 is a schematic view showing the structure of a fluid passage formed inside the chemical liquid pretreatment apparatus of Figure i. 16 1362972
【主要元件符號說明】 2 工作臺 2 第一本體側面 4 輸送機構 h 噴孔 G 基板 h 吸孔 6 輸送台 3 到板 C 托架 3 第一排氣端 10 狹縫喷頭 3 溢出端 N 喷口 2 存儲空間 T 感光液供應 4 起泡端 12 第一支撐架 4 排出端 rl 第一軌道 4 漂洗單元 14 藥液預處理 5 溶劑供應端 17 移動機構 4 噴嘴 r2 第二軌道 4 第二排氣端 16 第二支撐荦 5 乾燥單元 L LM塊 L 第二流體通道 20 清洗槽 5 第二本體 R 起動輥 5 氣體供應端 25 清洗液喷灑 5 第二真空端 LI 第一流體通 5 第二本體側面 24 第一本體 h 噴氣孔 26 清洗液供應 h - 吸氣孔 28 第一真空端 17[Main component symbol description] 2 Workbench 2 First body side 4 Transport mechanism h Injection hole G Substrate h Suction hole 6 Conveying table 3 to plate C Bracket 3 First exhaust end 10 Slit nozzle 3 Overflow end N Nozzle 2 Storage space T Photosensitive liquid supply 4 Foaming end 12 First support frame 4 Discharge end rl First track 4 Rinsing unit 14 Chemical liquid pretreatment 5 Solvent supply end 17 Moving mechanism 4 Nozzle r2 Second track 4 Second exhaust end 16 second support 荦 5 drying unit L LM block L second fluid channel 20 cleaning tank 5 second body R starter roller 5 gas supply end 25 cleaning liquid spray 5 second vacuum end LI first fluid passage 5 second body side 24 first body h air vent 26 cleaning fluid supply h - suction hole 28 first vacuum end 17