1354814 九、發明說明： 【發明所屬之技術領域】 本發明係關於一種彩色濾光基板之製造方法，尤指一 種適用於用隔離層保護周緣電極端子之彩色濾光基板之製 造方法。 【先前技術】 Φ 請參閱圖1(a)至1(c)’習知之液晶顯示裝置多以真空注 入液晶工法將液晶101填充入框膠102、第一基板1〇3、以及 10 第二基板104所構成之空槽中。由於真空注入液晶工法是利 • 用空槽之毛細管現象將液晶101經由框膠102之開口 1〇6注 入空槽中，待液晶1 〇 1填滿空槽之後，以封止劑丨〇5封閉開 口 106 ’再照射紫外線（UV)硬化封止劑105，藉此使液晶ιοί 夹置於第一基板103與第二基板104之間。因此，不論是扭 15 轉向列型（twisted nematic mode，TN mode)、平面控制型 • (in-plane switching mode, IPS mode) ' 光學補償彎曲排列型 (optically compensation bend mode, OCB mode)、或垂直排 • 列型（vertically aligned mode，VA mode)之液晶顯示裝置， . 只要採用真空注入液晶工法之液晶顯示裝置，在封止完畢 2〇 之液晶顯示裝置的框膠102外就會有多餘的液晶填充於第 一基板103以及第二基板104之間》所以，封止完畢之液晶 顯示裝置還需要以洗劑將框膠102外的液晶清除。 目前，常用於清洗已封止完畢之液晶顯示裝置之洗劑 為直鍵型脂肪族二醇的洗劑（Kao社的LC-841)。然而，洗劑 5 1354814 的兩個醇基常會和液晶顯示裝置基板上的透明電極層，例 如氧化銦錫（ITO)或氧化銦鋅（IZ0)，產生強大的氫鍵結合 (hydrogen bonding)，使洗劑殘留在液晶顯示裝置之基板 上。以垂直排列型之液晶顯示裝置為例（參閱圖2)，彩色濾 5 光片2〇1在框膠202外的透明電極層203和洗劑204產生氫鍵 結合，造成洗劑204殘留在透明電極層203上，此框膠2〇2外 的透明電極層203 —般作為液晶顯示裝置向外電性連接之 丨端子。因此，殘留的洗劑204經靜電電解或接觸空氣氧化為 有機酸後，就會腐蝕端子造成立即性或經時性斷路。 10 此外，液晶顯示裝置整個洗淨過程中，大約要花整個 洗淨時間的六分之五的時間在清除洗劑上，真正用來清洗 液晶的時間只佔整個洗淨時間的六分之一。換句話說，液 晶顯不裝置的洗淨過程消耗大部分的電力、純水、與時間 在洗劑的清除上’浪費报多時間和資源。 15 因此，曾有人揭露一種液晶顯示器及其製造方法，其 係利用真空引入的方式，使高_度封膠37滲入液晶顯示裝 置框膠34外第一基板36和第二基板33之間的間隙，以全面 緊密覆蓋整個端子部32(參閱圖3) ^藉此，保護液晶顯示器 的端子部32，避免端子腐蝕。然而，此方法需要額外的材 2〇料（高黏度封膠37)以及額外的製程（真空引入方式）才能達 成。 另外，也有揭露另一種液晶顯示裝置，其係藉由注入 有機黏膠46於液晶顯示器外緣（框膠43外）的間隙，使第一基 板41和第二基板42的電極41a和42a與外界隔絕（參閱圖4)。 1354814 藉此，防止透明電極413的消溶現象及抵抗濕氣。然而，此 方法同樣需要額外的材料（有機黏膠46)、以及額外的製程 (例如塗佈液狀有機黏膠46，再加熱硬化）才能達成。 因此，如何降低液晶顯示器端子腐蝕的發生，並且不 5會增加額外的材料以及製程，實為目前亟待解決之課題。 【發明内容】 為解決上述問題，本發明於彩色濾光基板之周緣形成 一隔離層以保護透明電極層所形成的電極端子，藉此避免 10洗劑和透明電極層（例如1το層）接觸而形成氫鍵結合，進而 造成電極端子腐蚀。並且，該隔離層可與顯示裝置之間隔 物（spacer)或垂直配向型顯示裝置之凸塊（bump)同時形成， 故可避免增加額外的材料或製程。 本發明提供-種彩色據光基板之製造方法，其步驟包 15括：提供一基板，該基板上包含一遮光層、-渡光層及一 透明電極層；塗佈-第-光阻層於該基板上；以及圖案化 該第一光阻層，以同時形成複數間隔物與一隔離層。 在本發明之製造方法中，該些間隔物是用以支樓顯示 2置之兩相對基板之間的間隙。該些間隔物之位置不限 扣疋，較佳係位於該遮光層上方。該隔離層係位於該基板之 周緣，以保護位於該基板周緣之電極端子。 在本發明之製造方法中，由於該隔離層與該㈣㈣ 係同時形成，·故該隔離層的高度與材料均會和該些間隔物 1354814[Technical Field] The present invention relates to a method of manufacturing a color filter substrate, and more particularly to a method of fabricating a color filter substrate suitable for protecting a peripheral electrode terminal with an isolation layer. [Prior Art] Φ Referring to Figures 1(a) to 1(c), conventional liquid crystal display devices are filled with a liquid crystal 101 into a sealant 102, a first substrate 1〇3, and a 10 second substrate by a vacuum injection liquid crystal method. 104 is formed in the empty slot. Since the vacuum injection liquid crystal method is used, the liquid crystal 101 is injected into the empty space through the opening 1〇6 of the sealant 102 by the capillary phenomenon of the empty groove, and after the liquid crystal 1 〇1 fills the empty groove, it is sealed with the sealing agent 丨〇5. The opening 106' is further irradiated with an ultraviolet (UV) hardening sealant 105, whereby the liquid crystal is sandwiched between the first substrate 103 and the second substrate 104. Therefore, whether it is a twisted nematic mode (TN mode), an in-plane switching mode (IPS mode), an optically compensated bend mode (OCB mode), or a vertical A liquid crystal display device with a vertically aligned mode (VA mode), as long as a liquid crystal display device using a vacuum injection liquid crystal method is used, there is excess liquid crystal outside the sealant 102 of the liquid crystal display device that has been sealed for 2 inches. Filled between the first substrate 103 and the second substrate 104. Therefore, the liquid crystal display device that has been sealed needs to remove the liquid crystal outside the sealant 102 with a lotion. At present, the lotion which is commonly used for cleaning a liquid crystal display device which has been sealed is a lotion of a direct-bond type aliphatic diol (LC-841 of Kao Corporation). However, the two alcohol groups of the lotion 5 1354814 often form a strong hydrogen bonding with a transparent electrode layer on the liquid crystal display device substrate, such as indium tin oxide (ITO) or indium zinc oxide (IZ0). The lotion remains on the substrate of the liquid crystal display device. Taking a liquid crystal display device of a vertical alignment type as an example (refer to FIG. 2), the color filter 5 〇1 generates a hydrogen bond between the transparent electrode layer 203 outside the sealant 202 and the lotion 204, causing the lotion 204 to remain transparent. On the electrode layer 203, the transparent electrode layer 203 outside the mask 2 is generally used as a terminal for electrically connecting the liquid crystal display device to the outside. Therefore, after the residual lotion 204 is oxidized to an organic acid by electrostatic electrolysis or contact with air, the terminal is corroded to cause an immediate or time-dependent disconnection. 10 In addition, during the entire cleaning process of the liquid crystal display device, it takes about five-fifths of the entire cleaning time to remove the lotion. The time for actually cleaning the liquid crystal is only one-sixth of the total cleaning time. . In other words, the cleaning process of the liquid crystal display device consumes most of the electricity, pure water, and time spent on the cleaning of the lotion, wasting more time and resources. Therefore, a liquid crystal display and a method of manufacturing the same have been disclosed in which a high-degree sealant 37 is infiltrated into a gap between the first substrate 36 and the second substrate 33 outside the sealant 34 of the liquid crystal display device by means of vacuum introduction. To completely cover the entire terminal portion 32 (see FIG. 3) ^ Thereby, the terminal portion 32 of the liquid crystal display is protected to avoid terminal corrosion. However, this method requires additional material 2 (high viscosity seal 37) and an additional process (vacuum introduction) to achieve. In addition, another liquid crystal display device is disclosed in which the electrodes 41a and 42a of the first substrate 41 and the second substrate 42 are externally connected to each other by injecting the organic adhesive 46 to the outer edge of the liquid crystal display (outside the sealant 43). Isolated (see Figure 4). 1354814 Thereby, the dissolution of the transparent electrode 413 and the prevention of moisture are prevented. However, this method also requires additional materials (organic adhesive 46), as well as additional processes (such as coating liquid organic adhesive 46, followed by heat hardening). Therefore, how to reduce the occurrence of corrosion of the liquid crystal display terminal, and not to add additional materials and processes, is currently an urgent problem to be solved. SUMMARY OF THE INVENTION In order to solve the above problems, the present invention forms an isolation layer on the periphery of the color filter substrate to protect the electrode terminals formed by the transparent electrode layer, thereby avoiding contact between the 10 lotion and the transparent electrode layer (for example, 1το layer). Hydrogen bonding is formed, which in turn causes corrosion of the electrode terminals. Moreover, the spacer layer can be formed simultaneously with a spacer of the display device or a bump of the vertical alignment type display device, thereby avoiding the addition of additional materials or processes. The invention provides a method for manufacturing a color light-based substrate, wherein the step package 15 comprises: providing a substrate comprising a light shielding layer, a light-passing layer and a transparent electrode layer; and coating-the first photoresist layer On the substrate; and patterning the first photoresist layer to simultaneously form a plurality of spacers and an isolation layer. In the manufacturing method of the present invention, the spacers are used to display a gap between two opposing substrates of the branch. The spacers are not limited to the position of the spacers, and are preferably located above the light shielding layer. The spacer layer is located on the periphery of the substrate to protect the electrode terminals located at the periphery of the substrate. In the manufacturing method of the present invention, since the spacer layer is formed simultaneously with the (four) (four) system, the height and material of the spacer layer and the spacers are 1354814.
在本發明之製造方法中，該濾光層之位置不限定，較 佳為該濾光層與該遮光層位於該基板上，且該透明電極層 覆蓋於該遮光層、該濾光層以及部分之該基板上。 在本發明之製造方法中，於塗佈該第一光阻層之前， 可選擇性的包括：於該基板上方塗佈一第二光阻層，再圖 案化該第二光阻層’使該第二光阻層形成複數位於該透明 電極層上方之凸塊，且該凸塊之高度小於該隔離層。此凸 塊之位置不限^，較佳為位於透明電極上方，更佳為位於 該據光層上方。 ίο 在本發明之製造方法中，該隔離層所形成之圖案不限 定，較佳為形成一圍繞於該基板之周緣的密閉圖案。並且， 該隔離層可填滿或不填滿圍 '繞於該基板之周緣，較佳為填 滿該基板之周緣。該隔離層之材料可為任何感光性材料， 較佳為疏水性之感光材料。 15In the manufacturing method of the present invention, the position of the filter layer is not limited. Preferably, the filter layer and the light shielding layer are located on the substrate, and the transparent electrode layer covers the light shielding layer, the filter layer and a portion thereof. On the substrate. In the manufacturing method of the present invention, before the coating the first photoresist layer, the method further includes: coating a second photoresist layer over the substrate, and then patterning the second photoresist layer The second photoresist layer forms a plurality of bumps above the transparent electrode layer, and the bump has a height smaller than the isolation layer. The position of the bump is not limited to ^, preferably above the transparent electrode, and more preferably above the light layer. In the manufacturing method of the present invention, the pattern formed by the spacer layer is not limited, and it is preferable to form a hermetic pattern surrounding the periphery of the substrate. Also, the spacer layer may be filled or not filled around the periphery of the substrate, preferably filling the periphery of the substrate. The material of the spacer layer may be any photosensitive material, preferably a hydrophobic photosensitive material. 15
20 在本發明之製造方法中，該透明電極之材料不限定， 較佳為氧化銦錫或氧化銦辞。 丌*丨田本發月之製把方法中’由於該些間隔物與該隔離層 =用微影印刷製程（lithGg响pr。叫同時形成，因此 法不需要額外的的材料以及製程來形成該 本發明之製造方法所形成之彩色请 - 矽邑濾先基板可適用於任 了採用真工注入液晶工法之液晶 刑τ 日日顯不裝置，例如扭轉向列 i、平面控制型、光學補償f曲# 液晶顯示裝置。 ㈣排列型、或垂直排列型之 8 1354814 此外，本發明提供另—種適用於垂直排列型顯示裝置 之彩色渡光基板之製造方法，其步驟包括：提供一基板， 該基板上包含一遮光層、—遽光層及一透明電極層；塗佈 -第-光阻層於該基板上；以及圖案化該第—光阻層，以 5 同時形成複數凸塊與一隔離層。 在本發明之製造方法中，該些凸塊是用以改變液晶分 子之傾斜角I，使填充於液晶顯示裝置内之液晶分子產生 不同的預傾角，幫助液晶顯示裝置呈現廣視角。該些凸塊 之位置不限定，較佳係位於該渡光層上方。該隔離層係位 H)於!亥基板之周緣，以⑯護位於該基板周緣之電極端子。 在本發明之製造方法中，由於該隔離層與該些凸塊係 同時形成，故該隔離層的高度與材料均會和該些凸塊相同。 在本發明之製造方法中，該濾光層之位置不限定，較 佳f該遮光層與該濾'光層位於該基板上，且該透明電極層 15覆蓋於該遮光層、該濾光層以及部分之該基板上。 ^在本發明之製造方法中，於圖案化該第一光阻層之 後，更包括：於該基板上方塗佈一第二光阻層，再圖案化 s第光阻層，使該第一光阻層形成複數位於該遮光層上 方之間隔物，且該些間隔物之高度大於該隔離層。 〜|本發明之製造方法中，該隔離層所形成之圖案不限 疋’s較佳為形成一圍繞於該基板之周緣的密閉圖案。並且， 該隔離層可填滿或不填滿圍繞於該基板之周緣，較佳為填 禹§乂基板之周緣。該隔離層之材料可為任何感光性材料， 車乂佳為疏水性之感光材料。 9 1354814 在本發明之製造方法φ _ oD _ ,4 . v ^ 該透明電極之材料不限定， 較佳為氧化剑錫或氧化鋼鋅。 在本發明之製造方法中，由於該隔離層與該些凸塊可 利用微影印刷製程同時形成，因此本發明之製造方法不需 要額外的的材料以及製程來形成該隔離層。 【實施方式】 • 纟發明之實施例中該等圖式均為簡化之示意圖。惟該 等圖示僅顯示與本發明有關之元件，其所顯示支元件非為 ίο實際實施時之態樣，其實際實施時之元件數目、形狀等比 . 例為一選擇性之設計’且其元件佈局型態可能更複雜。 實施例1 首先，请參閱圖5 ’為本發明一較佳實施例之液晶顯示 裝置剖面不意圖。如圖5所示，本實施例之液晶顯示裝置主 15要包括一第一基板50卜一第二基板502、一框膠503、一隔 • 離層504以及一液晶層505。此框膠503係夾置於第一基板 501與第二基板502之間，且形成一密閉圖案，用以容置液 . bb層505。此液晶層505，係夹置於第一基板5〇1與第二基板 502之間。至於隔離層504則設置於第一基板5〇1之周緣並且 20 位於該框膠503外，以保護位於第一基板501周緣之透明電 極層511(即電極端子）。 本實施例之隔離層504係形成於第一基板501，並與複 數間隔物506同時形成。請參閱圖6(a)至圖6(c)為第一基板 501之製造方法剖面示意圖。請參閱圖6(a)，首先，提供一 1354814 第一基板501 ’此第一基板5〇1之表面包括有一紅色濾光層 5〇7、一藍色濾光層508、一綠色濾光層5〇9、一遮光層51曰〇 以及-透明電極層5U。該遮光層為黑色，丨材料為鉻或是 樹脂，用以遮蔽漏光。該透明電極層511係位於濾光層、 .5 508、5〇9以及遮光層51〇表面，用以作為液晶顯示裝置的共 同電極。並且該透明電極層511向外延伸至第一基板5〇1周 緣，用以作為液晶顯示裝置的電極端子。在本實施例中， 丨 該透明電極層511之材料為氧化銦錫（IT〇)。 接著，如圖6(b)所示，在透明電極層511上塗佈一第一 1〇光阻層（圖中未示），再對該第一光阻層進行曝光顯影以圖案 化該第一光阻層，使該第一光阻層形成複數凸塊512，用以 幫助液晶顯示裝置呈現廣視角。在本實施例中，該些凸塊 分別位濾光層507 ' 508以及509之上方。 然後，於第一基板501上全面性塗佈一第二光阻層（圖 15中未不）’再對該第二光阻層進行曝光與顯影以圖案化該第 二光阻層，使該第二光阻層形成複數間隔物5〇6以及一隔離 層504，其結構如圖6(c)所示。請參閱圖6(匀，在本實施例 中°亥些間隔物506位於遮光層51 〇上方，以避免影響液晶 顯不裝置之亮度。該隔離層504位於第一基板5〇ι之周緣， 2〇並且填滿該第一基板501之周緣而形成一密閉圖案，藉此保 濩位於第—基板周緣的透明電極511 ^在本實施例中， s二門隔物506與該隔離層504之材料相同。本實施例之該 些間隔物506與該隔離層504之材料均為感光性樹脂，此材 1354814 料可為聚甲基丙烯酸甲酯（p〇ly(methyl methacrylate))或紛 搭樹脂”&乂〇13(〇。該些凸塊512之材料為感光性樹脂。 本實施例之該些間隔物506以及該隔離層504的高度相 同而且材料相同。該間隔物5〇6是用以支禮第一基板5〇 1和 5 第二基板502之間的間隙“並且，由於間隔物506和第一基 板501之間還層疊有透明電極層511、遽光層507、508、509 以及遮光層510，因此’在本實施例中，隔離層5〇4的高度 會小於第一基板501和第二基板502之間的間隙高度。此間 隙高度約等於框膠503的高度。 10 本實施例之第二基板502為主動式陣列基板，其包括有 複數薄膜電晶體514。將該第二基板502與該第一基板501組 立之後，以真空注入液晶工法（參閱圖1(a)至l(c))將液晶填 充於第一基板501和第二基板502之間並封止完畢，形成_ 液晶層505。最後，以洗劑去除殘留於框膠503外的液晶， 15 即可得到如圖5所示之液晶顯示裝置。本實施例採用之洗劑 516為直鏈型脂肪族二醇的洗劑（1^〇社的1^_841)。 ► 因此，如圖5所示，洗劑516和透明電極層511之間隔著 隔離層504，使洗劑5 16和透明電極層511無法產生氫鍵結 合。而且，由於洗劑516為親水性材料，而隔離層5〇4為疏 20 水性材料，使得洗劑516無法附著於第一基板501，且更容 易被清洗乾淨。 因此’藉由形成隔離層5 04 ’本實施例之液晶顯示裝置 可避免殘留的洗劑516經靜電電解或接觸空氣氧化為有機 酸後’腐姓透明導電層5 11造成立即性或經常性斷路。並 12 1354814 且，可減少液晶顯示裝置之整個洗淨過程中，清除洗劑5i6 的電力、純水、與時間。再者，本實施例之隔離層5〇4是在 形成間隔物506時一併形成，因此不需要增加額外的材料或 製程來形成隔離層504。 一 5 本實施例之液晶顯示裝置為VA型之液晶顯示裝置，但 此實施例僅為說明之用，並非限定於此。 實施例2 本實施例之液晶顯示裝置以及形成方法與實施例ι大 致相同，除了隔離層是與凸塊同時形成，且隔離層與凸塊 10 的材料和高度均相同。In the manufacturing method of the present invention, the material of the transparent electrode is not limited, and is preferably indium tin oxide or indium oxide.丌 丨 丨 本 本 本 之 之 ' ' 由于 由于 由于 本 本 本 本 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于 由于The color formed by the manufacturing method - the first substrate can be applied to the liquid crystal of the liquid crystal method, such as twisted nematic, planar control, optical compensation f song# Liquid crystal display device. (4) Alignment type or vertical alignment type 8 1354814 Further, the present invention provides another method for manufacturing a color light-emitting substrate suitable for a vertical alignment type display device, the method comprising: providing a substrate on the substrate And comprising a light shielding layer, a light-emitting layer and a transparent electrode layer; coating a first-photoresist layer on the substrate; and patterning the first photoresist layer to form a plurality of bumps and an isolation layer at the same time. In the manufacturing method of the present invention, the bumps are used to change the tilt angle I of the liquid crystal molecules, so that the liquid crystal molecules filled in the liquid crystal display device generate different pretilt angles to help the liquid crystal display. Set presenting a wide viewing angle. The plurality of positions bumps is not limited, the preferred system located above the crossing light emitting layer. The isolation system level layer H) in! Circumferential Hai substrate edge, to ⑯ protect the electrode terminals of the peripheral edge of the substrate. In the manufacturing method of the present invention, since the spacer layer is formed simultaneously with the bumps, the height and material of the spacer layer are the same as those of the bumps. In the manufacturing method of the present invention, the position of the filter layer is not limited. Preferably, the light shielding layer and the filter 'light layer are on the substrate, and the transparent electrode layer 15 covers the light shielding layer and the filter layer. And a portion of the substrate. In the manufacturing method of the present invention, after patterning the first photoresist layer, the method further comprises: coating a second photoresist layer over the substrate, and patterning the s photoresist layer to make the first light The resist layer forms a plurality of spacers located above the light shielding layer, and the spacers have a height greater than the isolation layer. In the manufacturing method of the present invention, the pattern formed by the spacer layer is not limited to 疋's, and preferably forms a hermetic pattern surrounding the periphery of the substrate. Moreover, the spacer layer may or may not fill the periphery of the substrate, preferably the periphery of the substrate. The material of the isolation layer can be any photosensitive material, and the rut is preferably a hydrophobic photosensitive material. 9 1354814 The manufacturing method of the present invention φ _ oD _ , 4 . v ^ The material of the transparent electrode is not limited, and is preferably oxidized sage tin or oxidized steel zinc. In the manufacturing method of the present invention, since the spacer layer and the bumps can be simultaneously formed by the lithography process, the manufacturing method of the present invention does not require additional materials and processes to form the spacer layer. [Embodiment] The drawings are simplified in the embodiment of the invention. However, the illustrations only show the components related to the present invention, and the displayed components are not in the actual implementation, and the number and shape of the components in actual implementation are as an alternative design. The component layout type may be more complicated. Embodiment 1 First, please refer to Fig. 5' for a cross-sectional view of a liquid crystal display device according to a preferred embodiment of the present invention. As shown in FIG. 5, the liquid crystal display device main body 15 of the present embodiment includes a first substrate 50, a second substrate 502, a sealant 503, a spacer layer 504, and a liquid crystal layer 505. The sealant 503 is interposed between the first substrate 501 and the second substrate 502, and forms a sealed pattern for accommodating the liquid bb layer 505. The liquid crystal layer 505 is sandwiched between the first substrate 5〇1 and the second substrate 502. The spacer layer 504 is disposed on the periphery of the first substrate 5〇1 and 20 outside the sealant 503 to protect the transparent electrode layer 511 (i.e., the electrode terminal) located at the periphery of the first substrate 501. The isolation layer 504 of this embodiment is formed on the first substrate 501 and formed simultaneously with the plurality of spacers 506. 6(a) to 6(c) are schematic cross-sectional views showing a manufacturing method of the first substrate 501. Referring to FIG. 6( a ), firstly, a 1354814 first substrate 501 ′ is provided. The surface of the first substrate 5 〇 1 includes a red filter layer 5 〇 7 , a blue filter layer 508 , and a green filter layer . 5〇9, a light shielding layer 51曰〇 and a transparent electrode layer 5U. The light shielding layer is black, and the enamel material is chrome or resin to shield light leakage. The transparent electrode layer 511 is located on the surface of the filter layer, .5 508, 5〇9, and the light shielding layer 51, and serves as a common electrode of the liquid crystal display device. Further, the transparent electrode layer 511 extends outward to the periphery of the first substrate 5〇1 to serve as an electrode terminal of the liquid crystal display device. In this embodiment, the material of the transparent electrode layer 511 is indium tin oxide (IT〇). Next, as shown in FIG. 6(b), a first photoresist layer (not shown) is coated on the transparent electrode layer 511, and the first photoresist layer is exposed and developed to pattern the first photoresist layer. A photoresist layer is formed on the first photoresist layer to form a plurality of bumps 512 for helping the liquid crystal display device to exhibit a wide viewing angle. In this embodiment, the bumps are positioned above the filter layers 507' 508 and 509, respectively. Then, a second photoresist layer (not shown in FIG. 15) is uniformly coated on the first substrate 501. The second photoresist layer is exposed and developed to pattern the second photoresist layer. The second photoresist layer forms a plurality of spacers 5〇6 and an isolation layer 504, and its structure is as shown in FIG. 6(c). Please refer to FIG. 6 (evenly, in the present embodiment, the spacers 506 are located above the light shielding layer 51 , to avoid affecting the brightness of the liquid crystal display device. The isolation layer 504 is located on the periphery of the first substrate 5〇, 2 And sealing the periphery of the first substrate 501 to form a hermetic pattern, thereby protecting the transparent electrode 511 located at the periphery of the first substrate. In this embodiment, the material of the second spacer 506 is the same as the material of the isolation layer 504. The spacers 506 and the spacer layer 504 of the embodiment are all photosensitive resins, and the material 1354814 can be poly(methyl methacrylate) or versatile resin.乂〇13(〇. The material of the bumps 512 is a photosensitive resin. The spacers 506 and the spacer layer 504 of the embodiment have the same height and the same material. The spacers 5〇6 are used for supporting a gap between the first substrate 5〇1 and the second substrate 502. “And, since the spacer 506 and the first substrate 501 are further laminated with a transparent electrode layer 511, a light-emitting layer 507, 508, 509, and a light shielding layer 510, thus 'in this embodiment, the height of the isolation layer 5〇4 The height of the gap between the first substrate 501 and the second substrate 502 is smaller than the height of the sealant 503. The second substrate 502 of the embodiment is an active array substrate including a plurality of thin film transistors. 514. After the second substrate 502 is assembled with the first substrate 501, the liquid crystal is filled between the first substrate 501 and the second substrate 502 by a vacuum injection liquid crystal method (refer to FIGS. 1(a) to 1(c)). And sealing is completed, forming a liquid crystal layer 505. Finally, the liquid crystal remaining outside the sealant 503 is removed by a lotion, and a liquid crystal display device as shown in Fig. 5 is obtained. The lotion 516 used in this embodiment is straight. A lotion of a chain type aliphatic diol (1^_841 of 1^〇). Therefore, as shown in Fig. 5, the lotion 516 and the transparent electrode layer 511 are separated by a spacer layer 504, so that the lotion 5 16 and The transparent electrode layer 511 cannot produce hydrogen bonding. Moreover, since the lotion 516 is a hydrophilic material and the separator 5〇4 is a water-repellent material, the lotion 516 cannot adhere to the first substrate 501, and is more easily cleaned. Clean. Therefore 'by forming the isolation layer 5 04 'the liquid crystal of this embodiment The display device can prevent the residual detergent 516 from being electrostatically electrolyzed or exposed to air to be oxidized into an organic acid, causing immediate or frequent disconnection of the transparent conductive layer 5 11 and 12 1354814, and can reduce the entire cleaning of the liquid crystal display device. During the process, the power, pure water, and time of the lotion 5i6 are removed. Further, the spacer layer 5〇4 of the present embodiment is formed at the same time when the spacer 506 is formed, so that no additional material or process is required to form. The spacer layer 504. A liquid crystal display device of the present embodiment is a VA type liquid crystal display device, but this embodiment is for illustrative purposes only and is not limited thereto. Embodiment 2 The liquid crystal display device and the forming method of this embodiment are substantially the same as those of the embodiment ι except that the spacer layer is formed simultaneously with the bump, and the material and height of the spacer layer and the bump 10 are the same.
首先，請參閱圖7，為本發明實施例2之液晶顯示裝置 剖面示意圖。如圖7所示，本實施例之液晶顯示裝置主要包 括一第一基板801、一第二基板802、一框膠8〇3、一隔離層 804、以及一液晶層805。此框膠8〇3係夹置於第一基板 與第二基板802之間，且形成一密閉圖案，用以容置液晶。 此液晶層805，係夾置於第一基板8〇1與第二基板8〇2之間。 而隔離層804,則設置於第一基板8〇1之周緣並且位於該框 膠803外，以保護位於第一基板8〇1周緣之透明電極層 811 (即電極端子）。 本實施例之隔離層804係形成於第一基板8〇1，並與複 數凸塊812同時形成。圖8(a)至圖8(c)為第一基板8〇1之製造 方法剖面示意圖《請參閱圖8(a)，首先，提供一第一基板 8(Π，此第一基板801之表面包括有一紅色濾光層8〇7、一藍 色濾光層808、一綠色濾光層809、一遮光層81〇、以及一透 13 1354814 明電極層811。該遮光層為黑色，其材料為鉻或是樹脂，用 以遮蔽漏光。該透明電極層811係位於濾光層8〇7、8〇8、8〇9 以及遮光層810表面，用以作為液晶顯示裝置的共同電極並 向外延伸形成液晶顯示裝置的電極端子。在本實施例中， 5 該透明電極層811之材料為氧化銦錫（〖το)。 接著，在透明電極層811全面性塗佈一第一光阻層（圖 中未不）’再對該第一光阻層進行曝光與顯影以圖案化該第 光阻層，使該第一光阻層形成複數凸塊8丨2以及一隔離層 8〇4，其結構如圖8(b)所示。在本實施例中，該些凸塊812 10與該隔離層804之材料相同。本實施例之該些凸塊8〗2與該 隔離層804之材料均為感光性樹脂，此材料可為聚甲基丙烯 酸甲酯（Poly(methyl methacrylate))或酚醛樹脂（Nav〇lac)。 在本實施例中，由於凸塊812以及隔離層8〇4係同時形 成，因此兩者的高度相同。在本實施例中，凸塊812位於濾 15光層807、以及809上方，用以幫助液晶顯示裝置呈現廣 視角。隔離層804填滿第一基板80丨之周緣而形成一密閉圖 案’用以保護位於第一基板8〇1周緣的透明電極8U。 隨之，如圖8(c)所示，於第一基板801上塗佈一第二光 阻層（圖中未示）’再對該第二光阻層進行曝光與顯影以圖案 20 化畫該第二光阻層，使該第二光阻層形成形成複數間隔物 806 ’用以支撐第一基板801和第二基板802之間的間隙。此 間隔物可為非光阻型間隔物，例如si〇2或者是光阻型間隔 物。在本實施例中，間隔物8〇6為光阻型間隔物，其材料為 1354814First, please refer to FIG. 7, which is a cross-sectional view showing a liquid crystal display device according to Embodiment 2 of the present invention. As shown in FIG. 7, the liquid crystal display device of the present embodiment mainly includes a first substrate 801, a second substrate 802, a mask adhesive 8.3, an isolation layer 804, and a liquid crystal layer 805. The frame glue 8〇3 is sandwiched between the first substrate and the second substrate 802, and forms a sealed pattern for accommodating the liquid crystal. The liquid crystal layer 805 is sandwiched between the first substrate 8〇1 and the second substrate 8〇2. The isolation layer 804 is disposed on the periphery of the first substrate 8〇1 and outside the sealant 803 to protect the transparent electrode layer 811 (ie, the electrode terminal) located on the periphery of the first substrate 8〇1. The isolation layer 804 of this embodiment is formed on the first substrate 8〇1 and formed simultaneously with the plurality of bumps 812. 8(a) to 8(c) are schematic cross-sectional views showing a manufacturing method of the first substrate 8〇1. Referring to FIG. 8(a), first, a first substrate 8 is provided (Π, the surface of the first substrate 801) The invention comprises a red filter layer 8〇7, a blue filter layer 808, a green filter layer 809, a light shielding layer 81〇, and a 13 1354814 bright electrode layer 811. The light shielding layer is black and the material thereof is Chromium or resin for shielding light leakage. The transparent electrode layer 811 is located on the surfaces of the filter layers 8〇7, 8〇8, 8〇9 and the light shielding layer 810, and serves as a common electrode of the liquid crystal display device and extends outward. The electrode terminal of the liquid crystal display device is formed. In the embodiment, the material of the transparent electrode layer 811 is indium tin oxide (〖το). Next, a first photoresist layer is uniformly coated on the transparent electrode layer 811 (Fig. And not exposing and developing the first photoresist layer to pattern the first photoresist layer, so that the first photoresist layer forms a plurality of bumps 8丨2 and an isolation layer 8〇4, and the structure thereof As shown in Fig. 8(b), in the embodiment, the bumps 812 10 are the same as the material of the isolation layer 804. This embodiment The material of the bumps 8 and 2 and the spacer layer 804 are photosensitive resins, and the material may be poly(methyl methacrylate) or phenolic resin (Nav〇lac). The bumps 812 and the isolation layer 8〇4 are simultaneously formed, so the heights of the two are the same. In this embodiment, the bumps 812 are located above the filter 15 layers 807 and 809 to help the liquid crystal display device to be presented. The viewing angle 804 fills the periphery of the first substrate 80丨 to form a sealed pattern 'to protect the transparent electrode 8U located on the periphery of the first substrate 8〇1. Accordingly, as shown in FIG. 8(c), Applying a second photoresist layer (not shown) on the first substrate 801, and then exposing and developing the second photoresist layer to pattern the second photoresist layer to make the second photoresist The layer is formed to form a plurality of spacers 806' for supporting a gap between the first substrate 801 and the second substrate 802. The spacer may be a non-photoresist type spacer such as si〇2 or a photoresist type spacer. In this embodiment, the spacer 8〇6 is a photoresist type spacer, and the material thereof is 1354814.
10 15 20 感光性樹脂。並且，在本實施例中，隔離層8〇4的高度會小 於框膠803的高度。 本實施例之第二基板與實施例丨相同，在此不再贅述。 將該第二基板8〇2與該第一基板80 1組立之後，以真空注入 液晶工法（參閱圖Ua)至1(c))將液晶填充於第一基板801和 第二基板802之間並封止完畢，形成一液晶層8〇5。最後， 以洗劑去除殘留於框膠803外的液晶，即可得到，就會形成 如圖7所示之液晶顯示裝置。本實施例採用之洗劑為為直鏈 型脂肪族二醇的洗劑（Kao社的LC-841) 〇 因此，如圖7所示，洗劑816和透明電極層811之間隔著 隔離層804 ’使洗劑816和透明電極層81丨無法產生氫鍵結 合。而且，由於洗劑816為親水性材料，而隔離層8〇4為疏 水性材料，使得洗劑816無法附著於第一基板8〇1，而更^ 易被清洗乾淨。 因此，藉由形成隔離層804,本實施例之液晶顯示裝置 可避免殘留的洗劑816經靜電電解或接觸空氣氧化為有機 酸後’腐蝕透明導電層811造成立即性或經時性斷路。、、 且’可減少液晶顯示裝置整個洗淨過程中清除洗劑的$ 力、純水、與時間。再者，本實施例之隔離層8〇4是在形成 凸塊812時一併形成，因此不需要增加額外的材料或製程來 形成隔離層804。 上述實施例僅係為了方便說明而舉例而已 主張之權利範圍自應以申請專利範圍所述為準 於上述實施例。 本發明所 而非僅限 15 1354814 【圖式簡單說明】 圖1係習知之真空注入液晶工法示意圖。 圖2係習知之液晶顯示裝置剖視示意圖。 5圖3係習知之液晶顯示裝置剖視示意圖。 圖4係習知之液晶顯示裝置剖視示意圖。 圖5係本發明一較佳實施例之液晶顯示裝置剖視示意圖。 圖6係本發明一較佳實施例之液晶顯示裝置用第一基板之 製造方法剖視示意圖。 〇圖7係本發明另—較佳實施例之液晶_示裝置别視示意圖。 圖8係本發明另一較佳實施例之液晶顯示裝置用第一基板 之製造方法剖視示意圖。 【主要元件符號說明】 15 端子部32 第二基板33、42、104、502、802 框膠34、43、102、202、503、803 第一基板36、41、103、501、801 高黏度封膠37 有機黏膠46 封止劑105 彩色濾光片201 洗劑 204、516、816 電極 41a、42a 液晶101 開口 106 透明電極層203、511、811 隔離層504、804 16 1354814 液晶層505、805 紅色濾光層507、807 綠色濾光層509、809 凸塊 512、812 間隔物506、806 藍色濾光層508、808 遮光層510、810 薄膜電晶體51410 15 20 Photosensitive resin. Also, in the present embodiment, the height of the spacer layer 8〇4 is smaller than the height of the sealant 803. The second substrate of this embodiment is the same as the embodiment, and will not be further described herein. After the second substrate 8〇2 is assembled with the first substrate 801, the liquid crystal is filled between the first substrate 801 and the second substrate 802 by a vacuum injection liquid crystal method (see FIGS. Ua) to 1(c). After the sealing is completed, a liquid crystal layer 8〇5 is formed. Finally, the liquid crystal remaining outside the sealant 803 is removed by a lotion, and a liquid crystal display device as shown in Fig. 7 is formed. The lotion used in this embodiment is a lotion for a linear aliphatic diol (LC-841 of Kao Corporation). Therefore, as shown in FIG. 7, the lotion 816 and the transparent electrode layer 811 are separated by an isolation layer 804. 'The detergent 816 and the transparent electrode layer 81 are not capable of hydrogen bonding. Moreover, since the lotion 816 is a hydrophilic material and the release layer 8〇4 is a hydrophobic material, the lotion 816 cannot be attached to the first substrate 8〇1, and is more easily cleaned. Therefore, by forming the spacer layer 804, the liquid crystal display device of the present embodiment can prevent the residual lotion 816 from being subjected to electrostatic electrolysis or contact with air to be oxidized to an organic acid, causing immediate or time-dependent disconnection of the transparent conductive layer 811. , and can reduce the amount of force, pure water, and time to remove the lotion during the entire cleaning process of the liquid crystal display device. Furthermore, the spacer layer 8〇4 of the present embodiment is formed collectively when the bumps 812 are formed, so that no additional material or process is required to form the spacer layer 804. The above-described embodiments are merely exemplified for the convenience of the description, and the claims are intended to be within the scope of the claims. The present invention is not limited to 15 1354814. BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a schematic view of a conventional vacuum injection liquid crystal method. 2 is a schematic cross-sectional view showing a conventional liquid crystal display device. 5 is a schematic cross-sectional view of a conventional liquid crystal display device. 4 is a schematic cross-sectional view showing a conventional liquid crystal display device. Figure 5 is a cross-sectional view showing a liquid crystal display device in accordance with a preferred embodiment of the present invention. Figure 6 is a cross-sectional view showing a method of manufacturing a first substrate for a liquid crystal display device according to a preferred embodiment of the present invention. 7 is a schematic view of a liquid crystal display device according to another preferred embodiment of the present invention. Figure 8 is a cross-sectional view showing a method of manufacturing a first substrate for a liquid crystal display device according to another preferred embodiment of the present invention. [Main component symbol description] 15 terminal portion 32 second substrate 33, 42, 104, 502, 802 frame glue 34, 43, 102, 202, 503, 803 first substrate 36, 41, 103, 501, 801 high viscosity seal Glue 37 Organic Adhesive 46 Sealant 105 Color Filter 201 Lotion 204, 516, 816 Electrode 41a, 42a Liquid Crystal 101 Opening 106 Transparent Electrode Layer 203, 511, 811 Isolation Layer 504, 804 16 1354814 Liquid Crystal Layer 505, 805 Red filter layer 507, 807 green filter layer 509, 809 bump 512, 812 spacer 506, 806 blue filter layer 508, 808 light shielding layer 510, 810 thin film transistor 514
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