TWI344862B - Nozzle device for applying two fluids - Google Patents

Nozzle device for applying two fluids Download PDF

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Publication number
TWI344862B
TWI344862B TW094124706A TW94124706A TWI344862B TW I344862 B TWI344862 B TW I344862B TW 094124706 A TW094124706 A TW 094124706A TW 94124706 A TW94124706 A TW 94124706A TW I344862 B TWI344862 B TW I344862B
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Taiwan
Prior art keywords
nozzle
nozzle head
substrate
gas
mixed fluid
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TW094124706A
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Chinese (zh)
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TW200607571A (en
Inventor
Akinori Iso
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Shibaura Mechatronics Corp
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/14Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means with multiple outlet openings; with strainers in or outside the outlet opening
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/04Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B05B7/0416Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02Cleaning by the force of jets or sprays

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  • Nozzles (AREA)

Description

九、發明說明: 【發明所屬之技彳軒領域】 技術領域 本發明係關係一種將加壓後之液體與氣體混合且噴射 之雙流體噴射噴嘴裝置。IX. Description of the Invention: [Technical Field] The present invention relates to a two-fluid injection nozzle device that mixes and ejects a pressurized liquid and a gas.

【4椅 J 背景技術 於半導體裝置或液晶顯示裝置等之製造過程中,有一 種於半導體晶圓或玻璃基板等基板上形成電路圖之微影術 製程。该微影術製程係眾所週知般地於前述基板上塗布抗 蝕劑,再隔著已形成電路圖之遮光罩以光照射該抗蝕劑。 接著,除去抗蝕劑未照射到光的部分(或照射到光的部 分),對除去之部分進行蝕刻,並藉由重覆多數回前述一連 串的程序,即可於前述基板上形成電路圖。 前述一連串程序中,一旦前述基板遭受污染,便無法 精密地形成電路圖,此產生不良品。因此,在各程序 中形成電關時’ f使用處理賴前述基板進行處理,使 其保持無殘留抗蝕劑或塵埃等微粒之潔淨狀態。即,進行 除去附著於基板上微粒之處理。 迄今’除去附著於前述基板上之微粒時,係將處理液 加壓至献壓力後的嘴向基㈣射。㈣上形成有狹縫 狀之贺射孔’且處理液由該噴射孔擴散成就向基板喷射。 然而’若僅加壓、從噴射孔噴射處理液,施加在基板 上之衝擊力較弱,且除去_於基板上微粒之效率亦低。 1344862 因此,為了提高附著於基板上微粒之除去率,可使用 雙流體噴射喷嘴裝置◎該雙流體喷射噴嘴裝置供給以噴嘴 加壓後之處理液與加壓氣體作為混合流體’以提高施加在 基板上之衝擊力。 5 相較於僅喷射處理液至基板之情況,雙流體噴射喷嘴 裝置可給予基板較大之衝擊力。在第6圖中,曲線χ為僅將 處理液以O.IMPa之壓力從形成狹縫狀噴射孔之喷嘴噴射出 時,處理液施加在基板上之衝擊力的測定值;曲線γ則為將 處理液與氣體混合之後從形成狹縫狀喷射孔之喷嘴喷射出 10 時,施加在基板上之衝擊力的測定值。其中,處理液及氣 體之壓力各為0.1 IMPa,且由噴嘴前端至基板之上面的高度 為 100mm。 同圖中’縱車由表示衝擊力[gf],橫軸表示以喷嘴中心為 0向直徑方向外側之距離[mm]。 15 【發明内容】 發明之揭示 發明欲解決之課題 如曲線Y所示,若噴射混合處理液與氣體之混合流體, 則相較於如曲線X所示地僅喷射處理液,可於基板施加較大 20 之衝擊力。然而,由於僅將混合流體由形成於噴嘴上之狹 缝狀噴射孔噴射出,並無法大幅增大施加在基板上之衝擊 力,故無法大幅改善微粒之除去率。 為增大施加在基板上之衝擊力,可考慮增加處理液與 氣體的混合壓。但,假設將混合流體之壓力增加至0.3Mpa 6 1344862 以上時,由實驗可確認由噴射孔噴射出後擴散成扇狀之流 體,其擴散方向之兩端部會霧化成較中央部粒徑為小之霧 狀。 因此,擴散成扇狀(於基板板面上則為直線狀)而喷射之 5 處理液施加在基板之衝擊力在處理液之擴散方向兩端部明 顯地降低,故無法均一地洗滌擴散方向全體,並生成洗滌 污潰。又,洗滌不均所生成的範圍達到沿擴散方向洗滌範 圍的2〜3成。 # 又,亦可使喷射孔形成橫截面為圓形之直孔。但,直 10 孔會使喷射出之混合流體擴散角度較小。因此,由於對應 於直孔中心之部分施加在基板上之衝擊力較其他部分大甚 多,故難以平均地除去基板上的塵埃。而且,由於從直孔 喷射出來之混合流體之噴射區域為圓形、非直線狀,因此 難以對基板全面均一地進行洗滌處理。 15 本發明提供一種雙流體喷射噴嘴裝置,其係可藉由喷 嘴所喷射出之混合流體於基板上施加較大的衝擊力,同時 ® 也可使喷射成扇狀之混合流體之擴散方向兩端部不致霧化 者。 解決課題之手段 20 本發明係一種雙流體噴射喷嘴裝置,係具有噴嘴頭, 且該喷嘴頭於前端面上開口形成可將加壓後之液體及氣體 混合並噴射之喷射孔者,其特徵在於: 於前述噴嘴頭上,形成有多數呈不同角度傾斜之前述 噴射孔,且多數前述噴射孔以前述噴嘴頭之軸線為中心於 7 徑向上對稱且呈一列。 發明效果 本發明中之噴射孔以噴嘴頭之軸線為中心對稱且傾 斜,故各喷射孔所噴出之混合流體可沿喷嘴頭之徑向擴散 成扇狀,且即使不將混合流體之壓力提高至會霧化之狀 態,也可在擴散方向之大致全長上増大施加在基板上之衝 擊力。 【實施方式】 較佳實施例之詳細說明 以下參照圖面說明本發明之一種實施型態。 第1圖為本發明之雙流體喷射噴嘴裝置之正視圖,且第 2圖為縱截面圖,而該雙流體噴射喷嘴裝置具有噴嘴本體 1。喷嘴本體1上形成有與噴嘴本體丨之軸線同軸且於其上端 面開口之第1螺孔2,又’於嗔嘴本體1上,形成有其軸線垂 直於第1嫘孔2之轴線且於噴嘴本體丨之外周面上開口的第2 螺孔3。第2螺孔3與第丨螺孔2互相連通。 前述第1螺孔2之前端部與混合室5之—端相連通,而該 混合室5之另—蠕於前述喷嘴本體丨之前端面開口。喷嘴本 體1之前端㈣成有-圓形凹狀之嵌人部6,且該嵌入部6與 後述構造之噴嘴頭7之鳄部8相卡合。於該嵌入部祕有鳄部 8之上述嗔例7’H由·於前述噴嘴本則前端部之帽罩 9,可利^嘴本體1前端部減前稍部8,使前述喷嘴頭 7可裳卸,it錢料⑧與前述喷嘴讀—致而安 裝固定。 前述第1螺孔2中螺接有氣體用埠12,且該氣體用埠12 形成有沿前述第1螺孔2之軸方向貫通之通氣管路u。該氣 體用埠12之通氣官路11連接可供給加壓至預定壓力之氣體 的未圖示氣體供給管。 前述第2螺孔3中螺接有液體用埠14,且該液體用埠14 形成有沿前述第2螺孔3之軸方向貫通之通液管路13。該液 體用埠14之通液管路13連接可供給加壓至預定歷力之純水 作為供給之液體的未圖示純水供給管。 位於而述氣體用痒12之前述第1螺孔2内之前端部的直 L較刖述第1螺孔2小,且於該小徑部之外周面與第1螺孔2 之内周面間形成有環狀之導入管路15,而該導入管路15可 將前述液體用埠14所供給之純水導入前述混合室5。 如第3圖及第4圖所示,前述噴嘴頭7具有有底圓筒狀之 圓筒部18,且該圓筒部18之開口上端設有前述鍔部8。前述 圓筒部18係由鑽孔加工所形成,因此圓筒部18之前端壁19 之内底面形成圓錐狀之凹部19b。 如述圓筒部18之前端壁19上,相對於噴嘴頭7之軸線0 對徑向對稱地且一直線地分別依預定之角度傾斜鑽設有一 對第1喷射孔21、一對第2喷射孔22。 如第4圖所示,一對第1喷射孔21由喷嘴頭7軸線〇之中 心C位置開始相對該轴線0傾斜如圖示α之15度角;第2喷射 孔22同木;ν地由轴線〇之中心c位置相對軸線〇傾斜如圖示β 之25度角。 又’第1喷射孔21之傾斜角度不限定為15度,只要在10 〜15度之範圍内即可,而實驗結果之最佳角度為15度。第2 贺射孔22之傾斜角度不限定為25度,只要在2〇〜25度之範 圍内即可,而實驗結果之最佳角度為25度。 第卜第2喷射孔21、22為直孔,且相對軸線〇傾斜預定 之角度。又,喷嘴頭7之前端壁19之外面,即前端面19a, 為一垂直於該喷嘴頭7軸線〇之平面。 因此,如第3圖所示,第卜第2噴射孔21、22於喷嘴頭 7之前端面19a上之開口形狀為分別沿喷嘴頭7徑向之細長 形第1橢圓形21a及第2橢圓形22a。 第2喷射孔22之傾斜角度β較第i噴射孔21之傾斜角度以 大,因此第2喷射孔22之開口形狀之第2橢圓形22a,為長軸 較第1噴射孔21之開口形狀之第1橢圓形21a為長之橢圓形。 如此所構成之雙流體混合喷嘴裝置中,由氣體用埠12 供給炱噴嘴本體1之預定壓力氣體,以及由液體用埠14供給 至喷鳴本體1之預疋壓力液體,於混合室5中混合後流入喷 嘴頭7之圓筒狀18内,且在此混合後分別由貫穿設置於圓筒 部18么前端壁19之一對第1噴射孔21及第2噴射孔22向未圖 示之基板噴射。 妒第3圖所示,由於各噴射孔21、22對噴嘴頭7之軸線〇 傾斜預定之角度,故噴射孔21、22於噴嘴頭7前端面之開口 形成為第1、第2糖圓形21a、22a。 国此,混合流體由各噴射孔21、22向傾斜方向噴射時, 同時也會沿著第1、第2橢圓形21a、22a之長軺方向,亦即 各噴射孔21、22配置成一列之喷嘴頭7的徑向呈扇狀地展 1344862 開。 從一個噴射孔噴射出之混合流體呈扇狀展開時,由於 展開方向兩端部之混合流體容易擴散,故其較中央部施加 在基板上之衝擊力會大幅減弱。但,從各噴射孔21、22噴 5射出之混合流體展開.成扇狀喷射時,從相鄰的噴射孔21、 22噴射出來之混合流體,其各噴射區域之展開方向之兩端 部會彼此重合。 因此,雖然展開成扇狀會使展開方向之兩端部較中央 部施加在基板上之衝擊力弱,但相鄰之噴射區域的兩端部 10 互相重合可增強施加在基板上之衝擊力。 第6圖中’曲線Z表示從本發明之噴嘴頭7的第1、第2 噴射孔21、22噴射之混合流體施加在基板上衝擊力之測定 值。供給至喷嘴頭7之處理液與氣體之壓力皆為〇11MPa, 且由0^嘴剛至基板之上面之南度為100mm,而這此條件 15 與曲線Y時相同。 結果,可確認其結果是施加在基板上之衝擊力相較於 曲線Y之情形’最大可增加約3倍。曲線Z上形成有施加在 基板上之衝擊力較強的4個山形曲線m,而各山形曲線瓜對 應於形成於喷嘴頭7上之第1、第2喷射孔21、22的中心,且 20由於從相鄰之喷射孔21、22噴射出之混合流體展開方向之 兩端部互相重合,可防止3個谷形曲線η部分的衝擊力變得 極小。 因此,在噴嘴頭7之第卜第2噴射孔21、22的配置方向, 即噴嘴頭7之徑向上,可使施加在基板上之衝擊力平均化。 11 且,即使氣體與液體之供給壓力與曲線¥所示之實驗同樣為 O.llMPa,也可大幅提高以往施加在基板上之衝擊力。亦 即’即使秘混合流體之壓力提高至會驗體霧化之3應 以上之高壓,也可增強施加在基板上之衝擊力。 此外’考察使用本發明之構成之嘴嘴頭7的情形,混合 流體從習知之直孔喷射時,其混合流體無法擴散成扇狀, 故施加在基板上之衝擊力會局部性地增強、難以平均化。 但是,本發明之第1、第2的4個噴射孔21、22分別以相 對於喷嘴頭7之軸線〇對稱的角度傾斜,因此噴嘴頭7之前端 面19a上可沿著其彳望方向開設細長之第1、第2橢圓形21 a、 22a開口。 因此,從各喷射孔21、22開口端面之第i、第2橢圓形 21a、22a噴射之混合流體,與直孔之情形相較,可沿著橢 圓形21a、22a之長軸方向更容易擴散成扇形。 若混合流體向第1、第2橢圓形21a、22a之長軸方向擴 政喷射,則與從直孔噴射時相較,施加在基板上之衝擊力 將向擴散方向分散’並且從相鄰之喷射孔噴射出之混合流 體擴散成扇狀之噴射區域的兩端部亦將互相重合,故透過 該重合部分可增強施加在基板上之衝擊力。 即’若擴散成扇狀之噴射區域只有一個,則其喷射區 域之兩端部施加在基板上之衝擊力便會降低。但,藉由相 鄰噴射區域之端部重合,對應喷射區域端部的部分施加在 基板上之衝擊力可以增大。 其結果是,混合流體施加在基板上之衝擊力成為噴射 1344862 孔的開口形狀為圓形直孔與開口形狀為直線狀缝孔兩者之 中間的狀態,故可如第6圖之曲線Z所示,使衝擊力較大、 且較為平均。 下述之[第1表]顯示使用本發明之喷嘴頭7,測定由第 5 1、第2噴射孔喷射出之混合流體的粒徑及平均流速之實驗 結果1〜3。[第1表]中之測定位置A〜C如第5圖所示。即, 測定位置A為噴嘴頭軸線之下方,C為擴散成扇狀之混合流 體擴散方向的端部,B為A和C的中間位置。又,Η為由喷嘴 • 頭7噴射出之混合流體之喷射面S(基板的上面)到喷嘴頭7之 10 下端面的高。 實驗1〜實驗3中,供給至噴嘴頭7之純水壓力值與氣體 厪力值大致相同,而改變純水流量與氣體流量的同時,針 對前述高度Η為100mm及150mm之情況分別測量於Α〜C的 位置處之混合流體之粒子徑及平均流速。 15 13 1344862 第1表 純水量 L/min 純水 壓力 MPa 氣體量 L(normal) /min 氣體 壓力 MPa Η mm 測定 位置 平均 粒子徑 μιη 平均 流速 m/sec 實 驗 1 1.5 0.11 150 0.13 100 A 40 26 B 36 26 C 44 28 150 A 38 18 B 39 18 C 43 23 實 驗 2 3 0.11 70 0.11 100 A 155 21 B 158 21 C 157 21 150 A 146 14 B 122 14 C 145 17 實 驗 3 2 0.10 100 0.11 100 A 133 26 B 140 24 C 140 25 150 A 113 16 B 110 16 C 108 17[4 Chair J] In the manufacturing process of a semiconductor device or a liquid crystal display device, there is a lithography process for forming a circuit pattern on a substrate such as a semiconductor wafer or a glass substrate. The lithography process is generally known to apply a resist to the substrate, and to illuminate the resist with light through a hood having formed a circuit pattern. Next, the portion where the resist is not irradiated with light (or a portion irradiated with light) is removed, the removed portion is etched, and a circuit pattern is formed on the substrate by repeating a plurality of the above-described series of procedures. In the above-described series of procedures, once the substrate is contaminated, the circuit pattern cannot be formed accurately, which causes defective products. Therefore, when the electrical switching is formed in each of the programs, the processing is performed by using the substrate, and the particles are kept clean without particles such as residual resist or dust. That is, the process of removing the particles adhering to the substrate is performed. Heretofore, when the fine particles adhering to the substrate are removed, the treatment liquid is pressurized to the mouth after the pressure is applied to the base (four). (4) A slit-shaped HE hole ' is formed thereon and the processing liquid is diffused from the ejection hole to eject the substrate. However, if the treatment liquid is merely pressurized and sprayed from the injection holes, the impact force applied to the substrate is weak, and the efficiency of removing the particles on the substrate is also low. 1344862 Therefore, in order to increase the removal rate of the particles adhering to the substrate, a two-fluid ejection nozzle device can be used. The two-fluid ejection nozzle device supplies the treatment liquid pressurized with the nozzle and the pressurized gas as a mixed fluid to improve application to the substrate. The impact on the top. 5 The two-fluid spray nozzle device can give the substrate a large impact force compared to the case where only the treatment liquid is sprayed onto the substrate. In Fig. 6, the curve χ is a measured value of the impact force applied to the substrate by the treatment liquid when the treatment liquid is ejected from the nozzle forming the slit-shaped injection hole at a pressure of 0.1 MPa; the curve γ is When the treatment liquid is mixed with the gas and then ejected 10 from the nozzle forming the slit-shaped injection hole, the measured value of the impact force applied to the substrate is measured. The pressure of the treatment liquid and the gas are each 0.1 IMPa, and the height from the tip end of the nozzle to the upper surface of the substrate is 100 mm. In the same figure, the vertical vehicle indicates the impact force [gf], and the horizontal axis indicates the distance [mm] from the center of the nozzle to the outer side in the diameter direction. [Explanation] Disclosure of the Invention The problem to be solved by the invention is as shown by the curve Y. When the mixed fluid of the mixed treatment liquid and the gas is sprayed, only the treatment liquid is sprayed as shown by the curve X, and the substrate can be applied to the substrate. The impact of the big 20. However, since only the mixed fluid is ejected from the slit-like injection holes formed in the nozzle, the impact force applied to the substrate cannot be greatly increased, so that the removal rate of the fine particles cannot be greatly improved. In order to increase the impact force applied to the substrate, it is conceivable to increase the mixing pressure of the treatment liquid and the gas. However, assuming that the pressure of the mixed fluid is increased to 0.3 MPa 6 1344862 or more, it is confirmed by experiments that the fluid which is diffused into a fan shape after being ejected from the injection hole is atomized at both ends in the diffusion direction to have a particle diameter of the central portion. Small misty. Therefore, the diffusion is fan-shaped (straight on the substrate plate surface), and the impact force applied to the substrate by the sprayed 5 treatment liquid is remarkably lowered at both end portions in the diffusion direction of the treatment liquid, so that the diffusion direction cannot be uniformly washed. And generate wash stains. Further, the range of washing unevenness is 2 to 3% of the washing range in the diffusion direction. # Further, the injection hole may be formed into a straight hole having a circular cross section. However, straight holes will cause the sprayed mixed fluid to diffuse at a smaller angle. Therefore, since the impact force applied to the substrate on the portion corresponding to the center of the straight hole is much larger than that of the other portions, it is difficult to remove the dust on the substrate evenly. Further, since the ejection region of the mixed fluid ejected from the straight holes is circular or non-linear, it is difficult to uniformly wash the substrate uniformly. The present invention provides a two-fluid jet nozzle device which can apply a large impact force to a substrate by a mixed fluid sprayed from a nozzle, and at the same time, can also spray both ends of the mixed fluid which are fan-shaped. The Ministry does not atomize. Means for Solving the Problem The present invention is a two-fluid jet nozzle device having a nozzle head, and the nozzle head is formed on the front end surface to form a spray hole capable of mixing and ejecting the pressurized liquid and gas, and is characterized in that The nozzle head is formed with a plurality of the injection holes inclined at different angles, and most of the injection holes are symmetrically arranged in a row in the radial direction of the nozzle head. Advantageous Effects of Invention In the present invention, the injection holes are symmetric and inclined around the axis of the nozzle head, so that the mixed fluid sprayed from each of the injection holes can be fanned in the radial direction of the nozzle head, and the pressure of the mixed fluid is not increased even if In the state of being atomized, the impact force applied to the substrate can be increased over substantially the entire length of the diffusion direction. DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, an embodiment of the present invention will be described with reference to the drawings. 1 is a front view of a two-fluid injection nozzle device of the present invention, and FIG. 2 is a longitudinal sectional view, and the two-fluid injection nozzle device has a nozzle body 1. The nozzle body 1 is formed with a first screw hole 2 coaxial with the axis of the nozzle body 且 and open at an upper end surface thereof, and is formed on the nozzle body 1 with an axis perpendicular to the axis of the first bore 2 and The second screw hole 3 that is open on the outer peripheral surface of the nozzle body 丨. The second screw hole 3 and the second screw hole 2 communicate with each other. The front end of the first screw hole 2 communicates with the end of the mixing chamber 5, and the other of the mixing chamber 5 is open to the front end of the nozzle body. The front end (four) of the nozzle body 1 is formed with a concave-shaped concave portion 6, and the fitting portion 6 is engaged with the crocodile portion 8 of the nozzle head 7 of a later-described configuration. In the embedding portion, the above-mentioned example 7'H of the crocodile portion 8 is provided by the cap 9 at the front end portion of the nozzle body, and the front end portion of the nozzle body 1 is reduced by the front portion 8 so that the nozzle head 7 can be worn. Unloading, it money material 8 and the aforementioned nozzle reading - so that the installation is fixed. A gas enthalpy 12 is screwed into the first screw hole 2, and the gas enthalpy 12 is formed with a vent line u that penetrates in the axial direction of the first screw hole 2. This gas is connected to a gas supply pipe (not shown) which can supply a gas pressurized to a predetermined pressure by the ventilating path 11 of the crucible 12. A liquid crucible 14 is screwed into the second screw hole 3, and the liquid crucible 14 is formed with a liquid passage 13 penetrating in the axial direction of the second screw hole 3. The liquid is connected to a liquid supply line 13 of the crucible 14 to supply a pure water supply pipe (not shown) which can supply pure water pressurized to a predetermined history as a liquid to be supplied. The straight line L at the front end portion of the first screw hole 2 in the gas itch 12 is smaller than the first screw hole 2, and the outer circumferential surface of the small diameter portion and the inner circumferential surface of the first screw hole 2 An annular introduction line 15 is formed therebetween, and the introduction line 15 can introduce the pure water supplied from the liquid with the crucible 14 into the mixing chamber 5. As shown in Figs. 3 and 4, the nozzle head 7 has a cylindrical portion 18 having a bottomed cylindrical shape, and the above-mentioned crotch portion 8 is provided at the upper end of the opening of the cylindrical portion 18. Since the cylindrical portion 18 is formed by drilling, the inner bottom surface of the front end wall 19 of the cylindrical portion 18 forms a conical recess 19b. As shown in the front end wall 19 of the cylindrical portion 18, a pair of first injection holes 21 and a pair of second injection holes are obliquely drilled at a predetermined angle with respect to the axis 0 of the nozzle head 7 at a predetermined angle in a radial direction. twenty two. As shown in Fig. 4, the pair of first injection holes 21 are inclined from the center C position of the axis of the nozzle head 7 with respect to the axis 0 by an angle of 15 degrees as shown in the figure; the second injection hole 22 is the same as the wood; The position of the center c from the axis 〇 is inclined with respect to the axis 〇 as shown by a 25 degree angle of β. Further, the inclination angle of the first injection hole 21 is not limited to 15 degrees, and it is only required to be in the range of 10 to 15 degrees, and the optimum angle of the experimental result is 15 degrees. The inclination angle of the second side hole 22 is not limited to 25 degrees, as long as it is within a range of 2 〇 to 25 degrees, and the optimum angle of the experimental result is 25 degrees. The second and second injection holes 21, 22 are straight holes and are inclined at a predetermined angle with respect to the axis 〇. Further, the outer surface of the front end wall 19 of the nozzle head 7, i.e., the front end surface 19a, is a plane perpendicular to the axis of the nozzle head 7. Therefore, as shown in Fig. 3, the opening shape of the second injection holes 21, 22 on the front end surface 19a of the nozzle head 7 is an elongated first elliptical shape 21a and a second ellipse which are respectively radially along the nozzle head 7. 22a. Since the inclination angle β of the second injection hole 22 is larger than the inclination angle of the i-th injection hole 21, the second ellipse 22a of the opening shape of the second injection hole 22 has a longer axis than the opening shape of the first injection hole 21. The first elliptical shape 21a is a long elliptical shape. In the two-fluid mixing nozzle device configured as described above, the predetermined pressure gas supplied from the gas crucible 12 to the nozzle body 1 and the pre-pressure liquid supplied from the liquid crucible 14 to the nozzle body 1 are mixed in the mixing chamber 5. After that, it flows into the cylindrical shape 18 of the nozzle head 7, and after mixing, the first injection hole 21 and the second injection hole 22 are respectively inserted into the substrate (not shown) through one of the front end walls 19 of the cylindrical portion 18. injection. As shown in Fig. 3, since the injection holes 21 and 22 are inclined at a predetermined angle with respect to the axis 〇 of the nozzle head 7, the openings of the injection holes 21 and 22 at the front end surface of the nozzle head 7 are formed into first and second sugar circles. 21a, 22a. In the case where the mixed fluid is ejected in the oblique direction by the respective injection holes 21 and 22, the respective injection holes 21 and 22 are arranged in a row along the longitudinal direction of the first and second elliptical shapes 21a and 22a. The nozzle head 7 is fanned in a radial direction 1344862. When the mixed fluid ejected from one injection hole is fan-shaped, the mixed fluid at both ends in the unfolding direction is easily diffused, so that the impact force exerted on the substrate from the center portion is greatly weakened. However, the mixed fluid sprayed from each of the injection holes 21, 22 is unfolded. When the fan is sprayed, the mixed fluid ejected from the adjacent injection holes 21, 22 has both ends of the respective injection regions in the unfolding direction. Coincide with each other. Therefore, although the fan-like shape is developed, the impact force exerted on the substrate by the both end portions in the unfolding direction is weak, but the both end portions 10 of the adjacent ejection regions overlap each other to enhance the impact force applied to the substrate. In Fig. 6, the curve Z indicates the measured value of the impact force applied to the substrate by the mixed fluid sprayed from the first and second injection holes 21, 22 of the nozzle head 7 of the present invention. The pressure of the treatment liquid and the gas supplied to the nozzle head 7 was 〇11 MPa, and the south degree from the 0^ nozzle to the upper surface of the substrate was 100 mm, and this condition 15 was the same as that of the curve Y. As a result, it was confirmed that the result was that the impact force applied to the substrate was increased by about 3 times as compared with the case of the curve Y. Four mountain-shaped curves m having a strong impact force applied to the substrate are formed on the curve Z, and each of the mountain-shaped curved melons corresponds to the center of the first and second injection holes 21, 22 formed on the nozzle head 7, and 20 Since both end portions of the mixed fluid ejection direction ejected from the adjacent injection holes 21, 22 are overlapped with each other, the impact force of the three valley-shaped n portions can be prevented from being extremely small. Therefore, in the arrangement direction of the second injection holes 21, 22 of the nozzle head 7, that is, in the radial direction of the nozzle head 7, the impact force applied to the substrate can be averaged. 11 Moreover, even if the supply pressure of the gas and the liquid is the same as the experiment shown by the curve ¥ O.11 MPa, the impact force previously applied to the substrate can be greatly improved. That is, the impact force applied to the substrate can be enhanced even if the pressure of the secret mixed fluid is increased to a high pressure of 3 or more of the atomization of the test body. Further, in the case where the nozzle head 7 of the present invention is used, when the mixed fluid is ejected from a conventional straight hole, the mixed fluid cannot be diffused into a fan shape, so that the impact force applied to the substrate is locally enhanced and difficult. Averaging. However, the first and second injection holes 21 and 22 of the present invention are inclined at an angle symmetrical with respect to the axis of the nozzle head 7, respectively, so that the front end surface 19a of the nozzle head 7 can be elongated along the viewing direction thereof. The first and second elliptical shapes 21a and 22a are open. Therefore, the mixed fluid ejected from the i-th and second elliptical shapes 21a and 22a of the opening end faces of the respective injection holes 21 and 22 can be more easily diffused along the long axis direction of the elliptical shapes 21a and 22a as compared with the case of the straight holes. Fanned. When the mixed fluid is expanded and injected toward the long axis direction of the first and second elliptical shapes 21a and 22a, the impact force applied to the substrate will be dispersed toward the diffusion direction as compared with when ejected from the straight hole, and adjacent from the adjacent one. Both end portions of the ejection region in which the mixed fluid jetted from the ejection holes are diffused into a fan shape are also overlapped with each other, so that the impact force applied to the substrate can be enhanced by the overlapping portion. That is, if there is only one ejection region that is fanned into a fan shape, the impact force applied to the substrate at both end portions of the ejection region is lowered. However, by overlapping the ends of the adjacent ejection regions, the impact force exerted on the substrate by the portion corresponding to the end of the ejection region can be increased. As a result, the impact force exerted on the substrate by the mixed fluid becomes a state in which the opening shape of the hole of the injection 1344862 is the middle of both the circular straight hole and the open shape being the linear slit hole, so that it can be as shown by the curve Z of FIG. It shows that the impact force is larger and more average. The following [Table 1] shows the results of experiments 1 to 3 in which the particle diameter and the average flow velocity of the mixed fluid ejected from the fifth and second injection holes were measured using the nozzle head 7 of the present invention. The measurement positions A to C in [Table 1] are as shown in Fig. 5. That is, the measurement position A is below the nozzle head axis, C is the end portion in the fan-shaped mixed fluid diffusion direction, and B is the intermediate position between A and C. Further, Η is the height of the ejection surface S (the upper surface of the substrate) of the mixed fluid ejected from the nozzle/head 7 to the lower end surface of the nozzle head 7. In Experiments 1 to 3, the pure water pressure value supplied to the nozzle head 7 was substantially the same as the gas pressure value, and the pure water flow rate and the gas flow rate were changed, and the height Η was measured at 100 mm and 150 mm, respectively. The particle diameter and average flow velocity of the mixed fluid at the position of ~C. 15 13 1344862 Table 1 Pure water quantity L/min Pure water pressure MPa Gas quantity L (normal) /min Gas pressure MPa Η mm Determination position average particle diameter μιη Average flow rate m/sec Experiment 1 1.5 0.11 150 0.13 100 A 40 26 B 36 26 C 44 28 150 A 38 18 B 39 18 C 43 23 Experiment 2 3 0.11 70 0.11 100 A 155 21 B 158 21 C 157 21 150 A 146 14 B 122 14 C 145 17 Experiment 3 2 0.10 100 0.11 100 A 133 26 B 140 24 C 140 25 150 A 113 16 B 110 16 C 108 17

觀察實驗結果所示之粒子徑可知:改變純水流量及氣 體流量之比率,可變化粒徑大小,即,比較實驗1和實驗2, 5 純水量相對氣體量之比率較大之實驗2,其粒子徑較大;同 樣地比較實驗2和實驗3可知,純水量相對氣體量之比率為 大之實驗2,其粒子徑仍較大。 又,實驗1〜3中,可確認各測定位置A〜C上之粒子徑 大小大致在預定範圍内。因此,基板上各測定位置A〜C可 10 被大致同粒徑之混合流體所洗滌,故噴嘴頭7所噴射出之混 合流體可無分布不均地洗滌該噴射區域。 觀察表中之平均流速可確認,例如,氣體量相對純水 14 量的比率較實驗2來得大之實驗i,其混合流速的平均流速 車父大。混合流體之平均流速越快,施加在基板上之衝擊也 越大。 因此,若以貫驗1所示之條件從噴嘴頭7噴射混合流 體,則施加在基板上的衝擊很大,故適合進行除去附著於 基板之微粒之處理。若以實驗2所示之條件由噴嘴頭7噴射 混合流體,施加在基板上之衝擊較實驗丨小,故適合進行基 板漂洗處理。 只驗3之混合流體之平均流速係實驗與實驗2之中間 值,故可適用於除去微粒子及漂洗處理之任一者。 即,本發明之喷嘴頭7可依供給之純水量、氣體量之比 率變化,改變噴射於基板之混合流體之平均流速。換言之, 可因應欲對基板進行何種處理,而改變混合流體對基板之 衝擊力。 本發明不限定為上述之實施型態,例如形成於噴嘴頭 之喷射孔個數不限定為4個,2個或6個或6個以上的偶數個 皆可,只要複數的噴射孔相對噴嘴頭的軸線以左右對稱之 傾斜角度傾斜,且於沿噴嘴頭之徑向形成在一直線上即可。 【圖式簡單説明】 【第1圖】顯示本發明之一種實施型態之雙流體混合喷 嘴裝置的正視圖。 【第2圖】顯示雙流體混合噴嘴裝置之截面圖。 【第3圖】顯示噴嘴頭前端面之平面圖。 【第4圖】放大顯示喷嘴頭之縱截面圖。 1344862 【第5圖】顯示進行[第1表]之實驗時之測定位置的說明 圖。 【第6圖】由習知噴嘴頭及本發明之噴嘴頭所喷射出的 混合流體施加在基板上之衝擊力的測定值圖。 5 【主要元件符號說明】 1...噴嘴本體 14...液體用埠 2...第1螺孔 15…導入管路 3...第2螺孔 18...圓筒部 5...混合室 19...前端壁 6...被入部 19a...前端面 7...喷嘴頭 19b...凹部 8...鍔部 21...第1噴射孔 9...帽罩 21a...第1橢圓形 11...通氣管路 22…第2喷射孔 12...氣體用槔 22a...第2橢圓形 13...通液管路 16Observing the particle diameter shown in the experimental results, it can be known that changing the ratio of the pure water flow rate and the gas flow rate can change the particle size, that is, the experiment 2 and the experiment 2, 5 the ratio of the pure water amount to the gas amount is large, and the experiment 2 The particle diameter is large; similarly, in Experiment 2 and Experiment 3, it is known that the ratio of the amount of pure water to the amount of gas is large, and the particle diameter is still large. Further, in Experiments 1 to 3, it was confirmed that the particle diameters at the respective measurement positions A to C were substantially within a predetermined range. Therefore, each of the measurement positions A to C on the substrate can be washed by the mixed fluid of substantially the same particle size, so that the mixed fluid ejected from the nozzle head 7 can wash the ejection region without uneven distribution. The average flow rate in the observation table can be confirmed, for example, that the ratio of the amount of gas to the amount of pure water 14 is larger than that of Experiment 2, and the average flow velocity of the mixed flow rate is larger than that of the vehicle. The faster the average flow rate of the mixed fluid, the greater the impact applied to the substrate. Therefore, if the mixed fluid is ejected from the nozzle head 7 under the conditions shown in the test 1, the impact applied to the substrate is large, so that it is suitable to remove the particles adhering to the substrate. If the mixed fluid is ejected from the nozzle head 7 under the conditions shown in Experiment 2, the impact applied to the substrate is smaller than that of the experiment, so that the substrate rinsing treatment is suitable. The average flow rate of the mixed fluid of only 3 is the intermediate value between the experiment and the experiment 2, so it can be applied to any of the removal of the fine particles and the rinsing treatment. That is, the nozzle head 7 of the present invention can vary the average flow rate of the mixed fluid sprayed on the substrate in accordance with the ratio of the amount of pure water supplied and the amount of gas supplied. In other words, the impact of the mixed fluid on the substrate can be changed depending on what kind of treatment is to be performed on the substrate. The present invention is not limited to the above-described embodiment. For example, the number of injection holes formed in the nozzle head is not limited to four, and two or six or six or more even numbers may be used as long as the plurality of injection holes are opposed to the nozzle head. The axis of the axis is inclined at an oblique angle of left and right symmetry, and is formed in a straight line along the radial direction of the nozzle head. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] A front view showing a two-fluid mixing nozzle device of an embodiment of the present invention. [Fig. 2] A cross-sectional view showing a two-fluid mixing nozzle device. [Fig. 3] A plan view showing the front end surface of the nozzle head. [Fig. 4] A longitudinal sectional view showing the nozzle head in an enlarged manner. 1344862 [Fig. 5] A diagram showing the measurement position at the time of performing the experiment of [Table 1]. Fig. 6 is a graph showing the measured value of the impact force applied to the substrate by the conventional nozzle head and the nozzle head of the present invention. 5 [Description of main component symbols] 1...nozzle body 14...liquid 埠2...first screw hole 15...introduction pipe 3...second screw hole 18...cylindrical portion 5. .. mixing chamber 19...front end wall 6...inlet portion 19a...front end surface 7...nozzle head 19b...recessed portion 8...ankle portion 21...first injection hole 9... Cap cover 21a...first elliptical shape 11...ventilation line 22...second injection hole 12...gas enthalpy 22a...second elliptical shape 13...liquid passage line 16

Claims (1)

第94124706號申請案申請專利範圍修正頁 〇7 7 8 '卜 r正 '、 *)·, 、申請專利範圍: 1. 一種雙流體喷射喷嘴裝置,係具有喷嘴頭,且該喷嘴頭 於前端面上開口形成可將加壓後之液體及氣體混合並 喷射之喷射孔者, 且,於前述喷嘴頭上,形成有多數呈不同角度傾斜 之前述喷射孔,且多數前述喷射孔以前述噴嘴頭之軸線 為中心於徑向上對稱且呈一列。 2. 如申請專利範圍第1項之雙流體喷射喷嘴裝置,其中前 述喷射孔沿徑向呈細長橢圓形地開設於前述喷嘴頭之 前端面上。 3. 如申請專利範圍第1項之雙流體喷射喷嘴裝置,更具有 軸線與前述噴嘴頭一致之噴嘴本體,且可裝卸地安裝前 述喷嘴頭於喷嘴本體上, 且該噴嘴本體形成有:連通前述噴嘴頭之混合室; 沿著前述喷嘴本體之軸線方向形成且供給前述氣體至 前述混合室之氣體供給管路;及由前述噴嘴本體之圓周 方向供給前述液體至前述混合室之液體供給管路。 17Application No. 94124706, Application for Patent Scope Amendment 〇7 7 8 'Buzhen', *)·, Patent Application Range: 1. A two-fluid spray nozzle device having a nozzle head with a nozzle head at the front end face The upper opening forms an injection hole capable of mixing and ejecting the pressurized liquid and the gas, and the nozzle head is formed with a plurality of the injection holes inclined at different angles, and most of the injection holes are formed by the axis of the nozzle head It is symmetrical in the radial direction and is in a row. 2. The two-fluid ejection nozzle device of claim 1, wherein the injection hole is formed in an elongated elliptical shape in a radial direction on a front end surface of the nozzle head. 3. The dual fluid ejection nozzle device of claim 1, further comprising a nozzle body having an axis aligned with the nozzle head, and detachably mounting the nozzle head on the nozzle body, wherein the nozzle body is formed to: communicate with the foregoing a mixing chamber of the nozzle head; a gas supply line formed along the axial direction of the nozzle body and supplying the gas to the mixing chamber; and a liquid supply line for supplying the liquid to the mixing chamber in a circumferential direction of the nozzle body. 17
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