TWI335461B - Method of repairing bright pixel defect of display device - Google Patents
Method of repairing bright pixel defect of display device Download PDFInfo
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- TWI335461B TWI335461B TW097122725A TW97122725A TWI335461B TW I335461 B TWI335461 B TW I335461B TW 097122725 A TW097122725 A TW 097122725A TW 97122725 A TW97122725 A TW 97122725A TW I335461 B TWI335461 B TW I335461B
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1306—Details
- G02F1/1309—Repairing; Testing
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
- G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133528—Polarisers
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Optical Filters (AREA)
Description
χ^5461 九、發明說明: 【發明所屬之技術領域】 本發明係與一種修復顯示裝置上之亮像素缺陷的方法 有關。詳言之,係與一種利用雷射來修復顯示裝置上之亮 像素缺陷的方法有關。 【先前技術】χ^5461 IX. Description of the Invention: [Technical Field of the Invention] The present invention relates to a method of repairing bright pixel defects on a display device. In particular, it relates to a method of using lasers to repair bright pixel defects on a display device. [Prior Art]
近年來,液晶顯示器因為低耗電、高可攜性、技術密 集以及具有高附加價值,已成為下一世代高科技顯示裝置 的焦點。主動陣列式液晶顯示器包括一用來切換施加到每 ''像素上之電位的切換元件,此切換元件因為解析度高和 可用於動作片的優點而受到高度關注。 參照第1圖,建構一液晶面板500 ’其中將一彩色濾 光片基板530(作為上方基板)和一薄膜電晶體(TFT)陣列基 板51〇(作為下方基板),彼此面對面黏合’並在基板間注 入液晶層520。利用切換已連接到數以千計之像素上的tFt 來驅動液晶面板5 0 0,經由位址線來選擇像素,以施加電 位到相對應的像素上。在此,彩色濾光片基板5 3 0包括破 填基板53 1、紅/綠/藍(Rgb)彩色濾光片532、形成在彩色 據光片532之間的黑色矩陣533、用於共用電極之銦錫氧 化物(ITO)膜535、和配向膜536。在玻璃頂部則附接有一 偏光板537。 執行一薄膜電晶體陣列基板製程、一彩色濾光片基板 製程、和一液晶胞製程,以製造出此液晶面板。 5 133*5461 上述之薄膜電晶體陣列基板製程是一種重複實施沉 積、光微影钱刻,以及在玻璃基板上蚀刻形成閘極線、資 料線、薄膜電晶體和像素電極的製程。 上述之彩色渡光片基板製程是一種用來製造RGB彩 色濾光片的製程,該些彩色濾光片是以一預定順序配置& 具有黑色矩陣的玻璃上,以實施彩色和形成共用電極所需 的銦錫氧化物(ITO)膜。In recent years, liquid crystal displays have become the focus of next generation high-tech display devices because of low power consumption, high portability, technical intensiveness, and high added value. Active array liquid crystal displays include a switching element for switching the potential applied to each ''pixel', which is highly regarded for its high resolution and advantages for action sheets. Referring to FIG. 1, a liquid crystal panel 500' is constructed in which a color filter substrate 530 (as an upper substrate) and a thin film transistor (TFT) array substrate 51 (as a lower substrate) are bonded to each other face-to-surface The liquid crystal layer 520 is injected therebetween. The liquid crystal panel 500 is driven by switching the tFt that has been connected to thousands of pixels, and the pixels are selected via the address lines to apply the potential to the corresponding pixels. Here, the color filter substrate 530 includes a broken substrate 53 1 , a red/green/blue (Rgb) color filter 532 , a black matrix 533 formed between the color light guide sheets 532 , and a common electrode. An indium tin oxide (ITO) film 535 and an alignment film 536. A polarizing plate 537 is attached to the top of the glass. A thin film transistor array substrate process, a color filter substrate process, and a liquid crystal cell process are performed to fabricate the liquid crystal panel. 5 133*5461 The above-described thin film transistor array substrate process is a process of repeatedly performing deposition, photolithography, and etching on a glass substrate to form a gate line, a material line, a thin film transistor, and a pixel electrode. The color wading substrate process described above is a process for fabricating RGB color filters arranged in a predetermined order on a glass having a black matrix to perform color and form a common electrode. A required indium tin oxide (ITO) film.
上述之液晶胞製程使一種用來接合薄膜電晶體陣列基 板和彩色濾光片基板的製程,使得薄膜電晶體陣列基板和 彩色濾光片基板之間可維持一定間隙,並在該間隙中注入 液晶*以形成液晶層 落填充(one drop filling,ODF)製程以均勻地施加液晶到 薄膜電晶體陣列基板上,之後再將此薄膜電晶逋陣列基板 與彩色濾光片基板彼此連接在一起。 在檢查這類液晶顯示器時,於液晶面板上顯示—測試 圖樣,以镇測是否有缺陷像素存在。當發現具有缺陷的像 素時,即實施-種可修復缺陷像素的製程。液晶缺陷可包 括點缺陷(spot defect)、線缺陷(Hne defec〇、和顯示不均 (display n〇nunif〇rmity)。點缺陷通常因為tft不佳、素 電極不佳或彩色遽光片連線不佳所致。線缺陷則肇因於線 間出現開放電路、線間出現短路、TFT因靜電而崩… 與驅動電路連接不良。顯示不均描冷签m ?疋 +均通常肇因於液晶胞 均、液晶配向不均、TFT分佈在 又个 在特疋位置或連線時間常數 太同0The liquid crystal cell process described above enables a process for bonding a thin film transistor array substrate and a color filter substrate such that a gap is maintained between the thin film transistor array substrate and the color filter substrate, and liquid crystal is injected into the gap. * To form a liquid crystal layer one drop filling (ODF) process to uniformly apply liquid crystal to the thin film transistor array substrate, and then connect the thin film transistor array substrate and the color filter substrate to each other. When inspecting such a liquid crystal display, a test pattern is displayed on the liquid crystal panel to test for the presence of defective pixels. When a defective pixel is found, a process for repairing defective pixels is implemented. Liquid crystal defects may include spot defects, line defects (Hne defec〇, and display unevenness (display n〇nunif〇rmity). Point defects are usually due to poor tft, poor element electrodes, or color splicing lines. The line defect is caused by the open circuit between the lines, the short circuit between the lines, the TFT collapse due to static electricity... The connection with the drive circuit is poor. The display of the uneven mark m?疋+ is usually caused by the liquid crystal Cell average, liquid crystal alignment unevenness, TFT distribution in another special position or connection time constant is too the same
1335461 點缺陷和線缺陷一般多因為連線不佳所致 藝中,當發現開放電路時,該開放電路連線僅 而當發現短路時,短路電路連線僅彼此分離。 除了上述缺陷外,包括灰塵、有機物、金 會在液晶面板製造期間被吸附到液晶面板上。 被吸附到靠近彩色濾光片附近的區域時,對應 片的像素會發出比其餘像素更明亮的光線,因 光現象(light-leakage phenomenon)» 目前正在 射來修復此亮像素缺陷的方法。 曰本專利申請案2006-7229號揭示了一種 配向膜,使配向膜受損,以減弱液晶配向性質 液晶所發出的光線,藉以排除漏光現象的技術 技術的問題在於無法完全排除液晶的配向性質 費大量的時間才能完成此種處理。 為了解決上述問題,韓國專利申請案1〇· 號提出了以飛秒(femtosecond)雷射來使缺陷像 法。 當使用飛秒雷射(femtosecond laser)時,可 陷像素黑化;但是,用來震盪產生飛秒雷射的 貴。 【發明内容】 因此’本發明目地在克服上述問題,因此 之一為提供一種修復一顯示裝置上之亮像素缺 。在習知技 彼此連接, 屬等雜質還 當這些雜質 至彩色濾光 此稱此為漏 研發使用雷 照射雷射至 並因此降低 。但是,此 ,且需要耗 2006-86569 素黑化的方 有效地使缺 設備相當昂 本發明目地 陷的方法, 1335461 其可利用雷射來有效地修復一顯示裝置上之亮像素缺陷。 依據本發明’上述和其他特點可利用提供一種修復一 包括有黑色矩陣(black matrices)之顯示器裝置的亮像素缺 陷的方法來完成,此方法包括:以雷射在具有一亮像素缺 陷的彩色濾光片上或是在彩色濾光片與玻璃之間形成一間 隙;及以雷射分解彩色遽光片周圍的黑色矩陣。 較佳是’當顯示器裝置上並沒有附接偏光板且彩色濾 光片是一紅光(R)區域時,即以波長在27〇〜55〇 nm的雷射 執行上述形成間隙的步驟。當顯示器裝置上並沒有附接偏 光板且彩色濾光片是一綠光(G)區域時,即以波長在 270〜4 80 nm或600〜7 5 0 nm的雷射執行上述形成間隙的步 驟。此外,當顯示器裝置上並沒有附接偏光板且彩色濾光 片是一藍光(B)區域時’即以波長在270〜390 nm或520〜750 nm的雷射執行上述形成間隙的步驟。 較佳是’當顯示器裝置上附接有偏光板且彩色濾光片 是一紅光(R)區域時’即以波長在4〇〇〜55〇 ηιη的雷射執行 上述形成間隙的步琢。當顯示器裝置上附接有偏光板且彩 色渡光片是一綠光(G)區域時,即以波長在4〇〇〜48〇 ηιη或 600〜750 nm的雷射執行上述形成間隙的步驟。此外,當顯 示器裝置上附接有偏光板且彩色濾光片是一藍光(B)區域 時,即以波長在520-750 nm的雷射執行上述形成間隙的 步驟。 較佳是’在執行該形成間隙的步驟時,雷射的脈衝期 間為100 ns或更小’且雷射具有介於約1 Hz至1 kHz間 1335461 的重複頻率。 較佳疋’在執行該形成間隙的步驟時,當顯示器沒有 覆蓋層(overcoat layer)時,雷射的脈衝期間為5〇 ns或更 小,且雷射具有介於約1 Hz至丨〇〇 Hz間的重複頻率,且 雷射功率約為1 0 mW或更小。 教佳是’此方法更包括在執行該形成間隙的步驟時, 調整雷射的強度。 較佳是’此方法更包括在執行該形成間隙的步驟時, 所用雷射具有一平坦頂部的形狀。 較佳疋,在執行該形成間隙的步称時’該間隙的厚度 相當於彩色濾光片厚度的20%〜90%。 較佳是’在執行該形成間隙的步驟時,以至少一種選 自以下的雷射來創造出雷射光:包括:镱(Ytterbium)雷射、 鈦·藍寶石雷射、Nd: YLF雷射、Nd:玻璃雷射、Nd:叙 酸聲(YV04)雷射、Nd : YAG雷射、纖維雷射和染料雷射。 較佳是,當黑色矩陣含有一金屬成分時,在分解黑色 矩陣的步驟中,雷射的脈衝期間為50ns或更少。 較佳是’當顯示器裝置上沒有附接偏光板時,是以波 長在270〜7 5 0 nm間的雷射來執行該分解黑色矩陣的步 称。相反的’當顯示器裝置上附接有偏光板時,則是以波 長在400-7 5 0 nm間的雷射來執行該分解黑色矩陣的步驟。 較佳是’以在該形成間隙的步驟中所使用的雷射來執 行該分解黑色矩陣的步驟。 較佳是’此方法更包括使已分解的黑色矩陣擴散進入 9 13354611335461 Point defects and line defects are generally caused by poor wiring. In the art, when an open circuit is found, the open circuit is connected only when a short circuit is found, and the short circuit connection is only separated from each other. In addition to the above defects, dust, organic matter, and gold are adsorbed onto the liquid crystal panel during the manufacture of the liquid crystal panel. When adsorbed to an area near the color filter, the pixels of the corresponding slice emit brighter light than the rest of the pixels, and the light-leakage phenomenon» is currently being shot to fix this bright pixel defect. The patent application No. 2006-7229 discloses an alignment film which damages the alignment film to weaken the light of the liquid crystal alignment property, and the technical technique of eliminating the light leakage phenomenon is that the alignment property of the liquid crystal cannot be completely excluded. A lot of time can be done to complete this process. In order to solve the above problem, Korean Patent Application No. 1 proposes to use a femtosecond laser to make a defect image. When a femtosecond laser is used, the pixel can be blackened; however, it is expensive to oscillate to produce a femtosecond laser. SUMMARY OF THE INVENTION Therefore, the present invention has been made in an effort to overcome the above problems, and thus one of them is to provide a repair of a bright pixel deficiency on a display device. In the conventional technology, the impurities are connected to each other, and these impurities are also used as color filters. This is called leak. R&D uses lightning to illuminate the laser and thus reduce it. However, this method, which requires the blackening of 2006-86569, effectively makes the lack of equipment quite obscure. The method of 1335461 can utilize laser to effectively repair bright pixel defects on a display device. The above and other features in accordance with the present invention can be accomplished by providing a method of repairing a bright pixel defect comprising a display device having black matrices, the method comprising: laser filtering a color filter having a bright pixel defect A gap is formed between the color filter and the glass on the light sheet; and the black matrix around the color light sheet is resolved by laser. Preferably, the step of forming the gap is performed when a polarizing plate is not attached to the display device and the color filter is a red (R) region, i.e., a laser having a wavelength of 27 〇 to 55 〇 nm. When the polarizing plate is not attached to the display device and the color filter is a green (G) region, the step of forming the gap is performed by a laser having a wavelength of 270 to 4 80 nm or 600 to 75 nm. . Further, when the polarizing plate is not attached to the display device and the color filter is a blue (B) region, the step of forming the gap is performed by a laser having a wavelength of 270 to 390 nm or 520 to 750 nm. Preferably, the step of forming the gap is performed by a laser having a wavelength of 4 〇〇 to 55 〇 η when a polarizing plate is attached to the display device and the color filter is a red (R) region. When the polarizing plate is attached to the display device and the color light-emitting sheet is a green (G) region, the step of forming the gap is performed by a laser having a wavelength of 4 〇〇 48 〇 ηη or 600 750 750 nm. Further, when a polarizing plate is attached to the display device and the color filter is a blue (B) region, the above-described step of forming a gap is performed with a laser having a wavelength of 520 to 750 nm. Preferably, 'the pulse period of the laser is 100 ns or less' when performing the step of forming the gap and the laser has a repetition frequency of 1335461 between about 1 Hz and 1 kHz. Preferably, when performing the step of forming a gap, when the display has no overcoat layer, the pulse period of the laser is 5 ns or less, and the laser has a range of about 1 Hz to 丨〇〇. The repetition frequency between Hz and the laser power is about 10 mW or less. The teaching method is that the method further includes adjusting the intensity of the laser when performing the step of forming the gap. Preferably, the method further comprises the step of performing the step of forming a gap, the laser used having a flat top shape. Preferably, when the step of forming the gap is performed, the thickness of the gap corresponds to 20% to 90% of the thickness of the color filter. Preferably, 'in performing the step of forming a gap, laser light is created with at least one laser selected from the group consisting of: Ytterbium laser, titanium sapphire laser, Nd: YLF laser, Nd : Glass laser, Nd: Y2 (XV04) laser, Nd: YAG laser, fiber laser and dye laser. Preferably, when the black matrix contains a metal component, the laser pulse period is 50 ns or less in the step of decomposing the black matrix. Preferably, when the polarizing plate is not attached to the display device, the step of decomposing the black matrix is performed by a laser having a wavelength between 270 and 75 nm. Conversely, when a polarizing plate is attached to the display device, the step of decomposing the black matrix is performed with a laser having a wavelength between 400 and 75 nm. Preferably, the step of decomposing the black matrix is performed by the laser used in the step of forming the gap. Preferably, the method further comprises diffusing the decomposed black matrix into 9 1335461
間隙中。在此狀況下,此擴散已分解黑色矩陣 括移動雷射使朝向彩色濾光片,以引導黑色矩 濾光片流動。較佳是使用原先用於分解矩陣步 或是與此雷射相同規格的雷射,來執行此擴散 矩陣的步驟。在此狀況下,以掃描式雷射照射 射式雷射照射法(a block shot type laser method)或多阻隔照射式雷射照射法(a multi type laser irradiation method)將雷射照射到 較佳是,在執行此形成間隙的步驟、分解 步驟與擴散已分解黑色矩陣的步驟時,彩色遽 度會下降。 【實施方式】 以下將參照附圖來說明本發明較佳實施方 參照第2A圖,在以雷射沿著箭碩以z形 描彩色濾光片時,將雷射完全照射在已確認具 陷的彩色濾光片532上,以於彩色濾光片532 間形成一間隙G (參見第1圖P當然,間隙G 色濾光片532的厚度方向上以及彩色遽光片 5 3 1之間。 接著,在第2B圖中,當以雷射婦推專色 雷射光照射在黑色矩陣533上來使其分解。已 矩陣533會被引入至間隙G中。 的步驟可包 陣朝向彩色 驟中的雷射 已分解黑色 法、阻隔照 irradiation block shot 彩色濾光片 黑色矩陣的 光片的透光 式。 方式前進掃 有亮像素缺 和玻璃531 可形成在彩 5 3 2與玻璃 矩陣時,使 分解的黑色 10 1335461In the gap. In this case, the diffusion has decomposed the black matrix including moving the laser toward the color filter to direct the black moment filter to flow. Preferably, the step of performing the diffusion matrix is performed using a laser that was originally used to decompose the matrix step or the same specifications as the laser. In this case, it is preferred to irradiate the laser with a block shot type laser method or a multi type laser irradiation method. When the step of forming the gap, the step of decomposing, and the step of diffusing the decomposed black matrix are performed, the color intensity is lowered. [Embodiment] Hereinafter, referring to the drawings, a preferred embodiment of the present invention will be described with reference to FIG. 2A. When a color filter is drawn in a z-shape along a laser, the laser is completely irradiated to the confirmed trap. On the color filter 532, a gap G is formed between the color filters 532 (see Fig. 1P, of course, in the thickness direction of the gap G color filter 532 and between the color pupil sheets 531. Next, in Fig. 2B, when the laser light is irradiated onto the black matrix 533 by the laser beam, it is decomposed. The matrix 533 is introduced into the gap G. The step of arranging toward the color ray is The light-dissipating type of the light film of the black matrix of the color filter is broken. The way forward is scanned with bright pixels and the glass 531 can be formed when the color is 5 3 2 and the glass matrix is decomposed. Black 10 1335461
最後,如第2C圖所示,在雷射以Z形方式 黑色矩陣與彩色濾光片時,使雷射可完全照射在 5 3 3與彩色濾光片5 3 2上,以加速分解黑色矩陣 黑色矩陣5 3 3擴散,結果使得該些已分解的黑色 可均勻地分布在間隙G中》 隨著黑色矩陣5 3 3被均勻地分佈在間隙G的 色濾光片5 3 2的透光度將下降。結果彩色濾光片 透光且變成會吸收從顯示器光源所產生的光(黑; 如此,可修復亮像素缺陷使得有缺陷的彩色濾光 像素。 與上述敘述不同的是,依據顯示器的特徵, 隙G所需的能量和分解黑色矩陣533所需的能量 時,就可在幾乎相同的時刻執行上述形成間隙的 解黑色矩陣的步驟》參照第3圖,雷射光是照射 陣533和彩色濾光片532上,其中雷射是依序掃 陣5 3 3和彩色濾光片5 3 2,以修復一亮像素缺陷 分解與擴散黑色矩陣5 3 3以及形成間隙G是依序 是同時,執行的。 同時,如前述,依據本發明,在修復亮像素 會需要欲用到可形成間隙G的雷射,可分解黑色 射與可擴散已分解之黑色矩陣進入間隙的雷射。 特別是,可形成間隙G的雷射必須能滿足製 例如彩色濾光片的種類、顯示器裝置是否附接有 顯示器裝置是否有覆蓋層等等。可滿足這些處理 前進掃描 黑色矩陣 5 3 3和使 矩陣533 同時,彩 532無法 fc單元)。 片變成暗 當形成間 幾乎相同 步驟與分 在黑色矩 描黑色矩 。亦即, ,但幾乎 缺陷時, 矩陣的雷 程條件, 偏光板、 條件得雷 11 1335461Finally, as shown in FIG. 2C, when the laser is in a Z-shaped black matrix and a color filter, the laser can be completely irradiated on the 533 and the color filter 523 to accelerate the decomposition of the black matrix. The black matrix 5 3 3 is diffused, with the result that the decomposed blacks can be uniformly distributed in the gap G.] The transmittance of the color filter 533 with the black matrix 533 being uniformly distributed in the gap G Will fall. As a result, the color filter transmits light and becomes absorbing light generated from the display source (black; thus, the defective pixel defect can be repaired to cause defective color filter pixels. Unlike the above description, depending on the characteristics of the display, the gap The energy required for G and the energy required to decompose the black matrix 533, the step of forming the gap-solving black matrix can be performed at almost the same time. Referring to FIG. 3, the laser light is an illumination array 533 and a color filter. On 532, the laser is sequentially swept 5 3 3 and the color filter 5 3 2 to repair a bright pixel defect decomposition and diffusion black matrix 5 3 3 and the formation of the gap G is sequentially performed simultaneously. Meanwhile, as described above, according to the present invention, it is necessary to use a laser which can form a gap G in repairing a bright pixel, and it is possible to decompose a black shot and a laser which can diffuse the decomposed black matrix into a gap. In particular, a gap can be formed. The laser of G must be able to satisfy, for example, the type of color filter, whether the display device is attached with a display device or not, and the like. Array 533 and 533 at the same time that the matrix, the color unit 532 can not fc). The film becomes dark when forming between the almost identical steps and points in the black moment to describe the black moment. That is, but almost flawed, the matrix of the mine conditions, polarizing plate, conditional thunder 11 1335461
射即可分舷® A 解黑色矩陣並使該已Shooting can be split by the side ® A to solve the black matrix and make the
隙中。因舲 刀解的黑色矩陣擴I 一般常見的雷射。 清此外,形成間隙用的1 以下,將詳細說明形成 #t 用的雷射的規格。 由射疋照射在諸如彩色瀘 會打斷組说# 慝光片之類的有機j ’成該膜層之有機物質間 it -||J M ife λ * 的福接,、-1» 果該 $ 被釗離並發射出自由基、群 果物(clusters)、電子^ 括内a中性原子、分子 々土離子與負離子的電莫 該有機膜層被黑化。 剝離(ablation)是一種因為有機物的耦接分子 使有機物質被分解成分子與離子的過程。但是,為 此種解離’需要吸收比有機物質能階更高的能量。 因此,在形成間隙時,需要照射一透光度低之 雷射(亦即,具有高吸收度的波長)到彩色濾光片上, 參照第4圖來選擇波長。舉例來說,當具有一 缺陷的彩色濾光片是一紅光(R)區域時,可看到紅光 具高吸收性的波長是550 nm或更小。當使用波長在 以上的雷射照射該紅光區域時,穿透度高,因此, 量的能量,結果將會嚴重破壞彩色濾光片下方的 層,包括覆蓋層' IT0層和配向層。如果彩色濾光 的膜層被破壞,液晶會跑到受損區域上方,結果產4 導致彩色濾光片更嚴重的缺陷β 同時,波長小於270nm的雷射無法寶透玻璃’ 射無法到達彩色濾光片。波長大於750 nm的雷射 進入間 射可為 上時, 機膜層 光子, ,使得 解離而 了達成 波長的 * 亮像素 區域中 5 5 0 nm 需要大 數種膜 片下方 .氣泡, 結果雷 可穿透 12 1335461 彩色濾光片,結果使得雷射無法在彩色濾光片上反應。 結論是,當需要形成間隙的彩色濾光片是一紅光(R) 區域時,較佳是照射一波長在270〜550 nm間的雷射到彩 色濾光片上,藉此可有效地在彩色濾光片上形成間隙,而 不會傷害彩色濾光片下方的膜層。In the gap. Because of the black matrix expansion of the knife solution, the common laser is common. In addition, 1 or less of the gap is formed, and the specification of the laser for forming #t will be described in detail. Irradiated by a sputum, such as a color 泸 will interrupt the group, say #慝光片, such as organic ', into the organic matter of the film, it -||JM ife λ *, the connection, -1» The organic film layer is blackened by being separated from and emitting free radicals, clusters, electrons, a neutral atom, molecular bauxite ions and negative ions. Ablation is a process in which organic molecules are decomposed into ions and ions by the coupling molecules of organic matter. However, for this dissociation, it is necessary to absorb higher energy than the energy level of organic matter. Therefore, when forming a gap, it is necessary to irradiate a laser having a low transmittance (i.e., a wavelength having a high absorbance) onto the color filter, and select a wavelength with reference to Fig. 4. For example, when a color filter having a defect is a red (R) region, it can be seen that the wavelength at which the red light is highly absorptive is 550 nm or less. When the red light region is irradiated with a laser having a wavelength above, the transmittance is high, and therefore, the amount of energy, as a result, severely damages the layer under the color filter, including the cover layer 'IT0 layer and the alignment layer. If the color filter layer is destroyed, the liquid crystal will run over the damaged area, resulting in a defect that causes the color filter to be more severe. At the same time, a laser with a wavelength less than 270 nm cannot pass through the glass. Light film. When a laser with a wavelength greater than 750 nm enters the interjection, the photonic layer of the organic film can be dissociated and the wavelength is reached. The bright pixel region of the 5 5 0 nm region requires a large number of diaphragms underneath. Bubbles, the result is Ray Penetrating the 12 1335461 color filter results in the laser not being able to react on the color filter. The conclusion is that when the color filter that needs to form a gap is a red (R) region, it is preferable to irradiate a laser having a wavelength between 270 and 550 nm onto the color filter, thereby effectively A gap is formed in the color filter without damaging the film layer under the color filter.
依此,當這類間隙被形成在彩色濾光片上時,需要照 射波長為低彩色濾光片穿透度的雷射。對紅光(R)區域,較 佳是照射如前述之波長在270〜550 nm間的雷射到彩色濾 光片上。對綠光(G)區域,較佳是照射波長在270〜480 nm 間或600〜700 nm間的雷射到彩色濾光片上。對藍光(b)區 域,則是照射一波長在270~3 90 nm間或520〜750 nm間的 雷射。 當顯示器裝置上附接有偏光板時、需要參考第5圖的 光穿透度圖,其示出一依據本發明之偏光板的光穿透度簡 圊。如第1圖所示’偏光板是附接在彩色濾光片頂端。用 來照射的雷射光必須可穿透此偏光板。Accordingly, when such a gap is formed on a color filter, it is necessary to irradiate a laser having a wavelength of low color filter transmittance. For the red (R) region, it is preferred to irradiate a laser having a wavelength between 270 and 550 nm as described above onto the color filter. For the green (G) region, it is preferred to irradiate a laser having a wavelength between 270 and 480 nm or between 600 and 700 nm to the color filter. For the blue (b) region, a laser with a wavelength between 270 and 3 90 nm or between 520 and 750 nm is illuminated. When a polarizing plate is attached to the display device, it is necessary to refer to the light transmittance map of Fig. 5, which shows the light transmittance of the polarizing plate according to the present invention. As shown in Fig. 1, the polarizing plate is attached to the top of the color filter. The laser light used to illuminate must pass through the polarizer.
從第5圖可知偏光板在可見光範圍中,其光穿透度約 為5 0%或以下,在紫外光範圍下,則不透光,且隨著波長 趨向近紅外光區域其光穿透度也隨之增加。為此,當需要 在附接有偏光板之面板上任一 RGB渡光片上形成間隙 時’較佳是使用波長在400 nm或以上之雷射光。 因此,需要從第4圖中所得波長中排除波長在400 nm 以下的範圍’才能形成間隙以便有效地修復附接有偏光板 之顯示器。結論,當所欲形成間隙之彩色濾光片是一紅光 13 1335461It can be seen from Fig. 5 that the polarizing plate has a light transmittance of about 50% or less in the visible light range, opaque in the ultraviolet light range, and light transmittance as the wavelength approaches the near-infrared light region. It also increases. For this reason, when it is necessary to form a gap on any of the RGB fluted sheets on the panel to which the polarizing plate is attached, it is preferable to use laser light having a wavelength of 400 nm or more. Therefore, it is necessary to exclude the wavelength in the range of 400 nm or less from the wavelengths obtained in Fig. 4 to form a gap in order to effectively repair the display to which the polarizing plate is attached. Conclusion, when the color filter that wants to form the gap is a red light 13 1335461
(R)區域時,可使用波長在400~500 nm間的 彩色濾光片。當具有一亮像素缺陷的彩色 (G)區域時,照射一波長在400~480 nm間 間的雷射來照射該彩色濾光片。而當具有一 彩色濾光片是一藍光(B)區域時,則可使用逆 nm間的雷射來照射該彩色濾光片。 第6A〜6C圖顯示照射雷射到彩色濾光 法。明確的說,第 6A圖顯示一掃描式雷射 6B圖顯示一阻隔照射式雷射照射方法,和J 阻隔照射式雷射照射方法。 在此,掃描式雷射照射方法是掃描一光 色濾光片532之一區域的一部分相對應的雷 可照射在該彩色濾光片5 3 2之整個區域上》 射照射方法則是立即將一光束形狀與一彩色 一區域的一部分相對應的雷射,照射在整個 多阻隔照射式雷射照射方法則結合了掃描式 與阻隔照射式雷射照射方法兩者。亦即,多 射照射方法是依據阻隔照射式雷射照射方法 同時,依據掃描式雷射照射方法繼續照射雷 同時,當以上述方法來照射雷射時,在 離期間,無論黑色矩陣是否擴散,彩色濾光 將下降。因此,彩色濾光片上的亮像素會變 果是彩色濾光片無法透光,反而轉變成會吸 源所產生的光(黑光單元)。如此,可修復彩 雷射來照射該 光片是一綠光 戈 600〜750 nm 亮像素缺陷的 ί長在520〜750 片上的各種方 照射方法,第 育6C圖顯示多 束形狀與一彩 射,使該雷射 阻隔照射式雷 濾光片532之 區域上一次。 雷射照射方法 阻隔照射式雷 來照射雷射, 射。 彩色濾光片剝 片的透光度都 成暗像素,結 收從顯示器光 色濾光片的亮 14 1335461 像素缺陷同時使黑色矩陣擴散。For the (R) region, a color filter with a wavelength between 400 and 500 nm can be used. When a color (G) region having a bright pixel defect is irradiated, a laser having a wavelength between 400 and 480 nm is irradiated to illuminate the color filter. When a color filter is a blue (B) region, the color filter can be illuminated using a laser between the inverse nm. Figures 6A to 6C show the irradiation of the laser to the color filter method. Specifically, Figure 6A shows a scanning laser 6B showing a barrier-illuminated laser irradiation method and a J-blocking laser irradiation method. Here, the scanning laser irradiation method is to scan a portion of a region of a light color filter 532 corresponding to a Ray to be irradiated on the entire area of the color filter 523. The radiation method is immediately A laser having a beam shape corresponding to a portion of a color-one region, the entire multi-barrier laser irradiation method is combined with both a scanning and a barrier-illuminated laser irradiation method. That is, the multi-emitter irradiation method is based on the barrier-illuminated laser irradiation method, and the irradiation of the laser is continued according to the scanning-type laser irradiation method. When the laser is irradiated by the above method, whether or not the black matrix is diffused during the separation period, The color filter will drop. Therefore, the bright pixels on the color filter will change as the color filter does not transmit light, but instead turns into light (black light unit) generated by the source. In this way, the repairable color laser can be used to illuminate the light sheet which is a green light-go 600~750 nm bright pixel defect ί long in 520~750 pieces on various side illumination methods, the first 6C picture shows multi-beam shape and a color shot The laser is blocked from the area of the illuminating lightning filter 532 once. Laser irradiation method Blocks the illuminating thunder to illuminate the laser and shoot. The transparency of the color filter strips is dark pixels, which are brightened by 14 135461 pixel defects from the display color filter while diffusing the black matrix.
參照第7圊,其示出照雷射數次以形成一間隙的過程。 詳言之,當第一次照射雷射時(S 1 ),使用Z-軸移動掃 描來找出對應至彩色濾光片 1 0%厚度之區域的焦點深度 (depth of focus, DOF),接著以XY-軸移動掃描來使彩色濾 光片黑化。當彩色濾光片的黑化程度已由電荷耦接裝置 (CCD)攝影機確認後,如果認定彩色濾光片上的間隙並不 足夠,則驅動Z-軸移動掃描,再次找出對應至彩色濾光片 2 0%厚度之區域的焦點深度(DOF),接著以XY-轴移動掃描 進行第二次雷射掃描(S2)。重複此步驟2〜4次,即可在彩 色濾光片上形成欲求程度的間隙。 可從Z -轴移動掃描器和掃描透鏡間的焦點距離,以及 2微米或更小範圍内的入射光直徑可計算出焦點深度 (D0P)。 [數學式1]Referring to Figure 7, it shows the process of lasering several times to form a gap. In detail, when the first laser is irradiated (S 1 ), the Z-axis movement scan is used to find the depth of focus (DOF) corresponding to the 10% thickness of the color filter, and then The color filter is blackened by moving the scan with the XY-axis. When the degree of blackening of the color filter has been confirmed by the charge coupled device (CCD) camera, if it is determined that the gap on the color filter is not sufficient, the Z-axis is scanned to scan and the corresponding color filter is found again. The depth of focus (DOF) of the region of the 0% thickness of the light sheet, followed by the second laser scan (S2) with the XY-axis movement scan. By repeating this step 2 to 4 times, a desired gap can be formed on the color filter. The focal depth (D0P) can be calculated by moving the focal length between the scanner and the scanning lens from the Z-axis and the incident light diameter in the range of 2 microns or less. [Math 1]
DOF = X/2{NAf [數學式2] NA = nsin Θ [數學式3] //# = 1/2_ [數學式4] //# = efl/φ 數學式5可從數學式3與數學式4兩者衍生而得。 [數學式5] 15 1335461 ΝΑ = φ/2(βΑ) 在以上的數學式中,ΝΑ代矣+ 有效的孔徑值(numerical aperature),λ代表雷射的波長 e·^代表有效的焦點長度。 可確認入射光束的直徑俞+ ’大’雷射波長愈短,DOF也 愈淺。也可確認透鏡的焦點長度 愈大,因此’ DOF將愈淺。 間隙的厚度較佳是小於碁+ ^ 、取大值的90%,較好是彩色滤 光片厚度的20%〜40%間。痞去DOF = X/2{NAf [Math 2] NA = nsin Θ [Math 3] //# = 1/2_ [Math 4] //# = efl/φ Math 5 can be from Math 3 and Math Formula 4 is derived from both. [Math 5] 15 1335461 ΝΑ = φ/2(βΑ) In the above mathematical formula, ΝΑ 矣 + effective aperture value (λ) represents the wavelength of the laser e·^ represents the effective focal length. It can be confirmed that the diameter of the incident beam is shorter than that of the 'large' laser, and the shallower the DOF. It is also possible to confirm that the focal length of the lens is larger, so the shallower the 'DOF will be. The thickness of the gap is preferably less than 碁 + ^, which is 90% of the large value, preferably between 20% and 40% of the thickness of the color filter. Go
可在彩色濾光片不同厚度 處形成多個間隙。 參照第8圖,圖上示出一 '、有覆蓋層(overcoat layer) 的顯示器,用以降低製造成本並簡化製程。 同時,一覆蓋層具有如笛Qra 第9圖所示的吸光性。可從第 9圖上看出,在紫外光(uv)益 圍以下幾乎沒有透光性,在 UV範圍内大約80%的光會 嘗破吸收,只有大約20%的光可 穿透。 因此,在沒有覆蓋層的顯 百J頌不器上形成間隙時,需要使A plurality of gaps can be formed at different thicknesses of the color filter. Referring to Figure 8, there is shown a 'overcoat layer' display to reduce manufacturing costs and simplify the process. At the same time, a cover layer has absorbance as shown in Fig. 9 of the flute Qra. It can be seen from Fig. 9 that there is almost no light transmission below the ultraviolet (uv) envelope, and about 80% of the light in the UV range will be absorbed and only about 20% of the light will penetrate. Therefore, when a gap is formed on the display device without the cover layer, it is necessary to make
愈短,孔徑值(ΝΑ)將 用的雷射規格,與在有覆篆思μ & 、有復盖層的顯示器上形成間隙時所使 用的雷射規格不同。這是因為從所照射之雷射上產生的能 量’會被覆蓋層吸收的緣故。因此,對沒有覆蓋層之顯示 器來說?透彩色遽光片的能量到達液經層,結果造成液 晶層受損。 為 可使用低能量雷射來避免液晶層受損,但是, 此時卻不會有任何反應發生。 因此在考慮上述問題時,必須滿足低能4雷射以及 16 1335461 能量施加時間短的條件。實驗結果顯示當使用雷射脈衝持 續50 ns或更短,且重複頻率在1 Hz至100 Hz之間,功 率10 mW或更小的雷射時,可獲得令人滿意的結果。 必須依據上述條件挑選雷射的規格,才用來形成間隙。 此外,也可使用上述用來形成間隙之雷射來分解黑色 矩陣和使已分解的黑色矩陣擴散進入間隙中。The shorter the aperture size (ΝΑ) will be, the different laser specifications will be used when forming a gap on a covered display with overlays. This is because the energy 'generated from the irradiated laser' is absorbed by the cover layer. So for a display without an overlay? The energy of the translucent calender reaches the liquid passage layer, resulting in damage to the liquid crystal layer. A low-energy laser can be used to avoid damage to the liquid crystal layer, but no reaction occurs at this time. Therefore, in considering the above problems, it is necessary to satisfy the conditions of low energy 4 laser and 16 1335461 energy application time. The experimental results show that satisfactory results can be obtained when a laser pulse of 50 ns or less is used, and a repetition frequency is between 1 Hz and 100 Hz, and a power of 10 mW or less is obtained. The specifications of the laser must be selected according to the above conditions before they are used to form the gap. Alternatively, the above-described laser for forming a gap can be used to decompose the black matrix and diffuse the decomposed black matrix into the gap.
但是,當黑色矩陣中含有諸如鈦之類的金屬成分時, 特別適合使用脈衝期間為5 0 ns或更小的雷射,來有效地 分解黑色矩陣。 從雷射震盪器發出的雷射為高斯式雷射光束,其能量 集中在中央區域。當雷射光束通過一光束成形器或一光束 均勻器之後,可使一特定範圍内的雷射光束強度被均一 化,結果可將雷射光束轉變成一放大尺寸的平坦頂部形 狀》此時,雷射照射區域也會隨著光束形狀的改變而改變。 此平坦頂部形狀也可變成一矩形平坦頂部300或是圓形平 坦頂部3 0 1。However, when a black matrix contains a metal component such as titanium, it is particularly suitable to use a laser having a pulse period of 50 ns or less to effectively decompose the black matrix. The laser emitted from the laser oscillator is a Gaussian laser beam whose energy is concentrated in the central region. When the laser beam passes through a beam shaper or a beam homogenizer, the intensity of the laser beam within a specific range can be uniformized, and as a result, the laser beam can be converted into a flat top shape of an enlarged size. The area of the shot illumination also changes as the shape of the beam changes. This flat top shape can also be changed to a rectangular flat top 300 or a circular flat top 3 0 1 .
也可使用光束成形器或光束均勻器來改變所照射的雷 射大小和強度。所照射的雷射面積愈小,所需用以將像素 完全黑化的時間就愈長。可均勻地轉變雷射光束的大小以 提高黑化的速度,藉此本發明可施用到生產線上以大量製 造產品。在構成液晶面板的有機膜層中,可利用Z轴移動 掃描,使被適當轉變成具有矩形平坦頂部3 00或是圓形平 坦頂部3 01的雷射強度,來形成間隙》 依據本發明,除了以上說明之外,可選擇性地使用雷 17 1335461 射來有效地修復一彩色濾光片的亮像素缺陷β 特別是’可在具有亮像素缺陷的彩色濾光片上形成間 隙’藉以有效地擴散黑色矩陣。 此外,當彩色濾光片被黑化且黑色矩陣被分解並在彩 色據光片缺陷區域擴散時,可有效地修復一顯示器裝置的 亮像素缺陷》A beam shaper or beam homogenizer can also be used to vary the size and intensity of the illuminated laser. The smaller the area of the laser that is illuminated, the longer it takes to completely blacken the pixel. The size of the laser beam can be uniformly converted to increase the speed of blackening, whereby the present invention can be applied to a production line to mass-produce a product. In the organic film layer constituting the liquid crystal panel, Z-axis movement scanning can be utilized to appropriately convert the laser intensity to have a rectangular flat top 300 or a circular flat top 301 to form a gap. According to the present invention, In addition to the above description, the Ray 17 1335461 can be selectively used to effectively repair the bright pixel defect β of a color filter, especially the 'gap can be formed on a color filter with bright pixel defects' to effectively spread Black matrix. In addition, when the color filter is blackened and the black matrix is decomposed and diffused in the defect area of the color film, the bright pixel defect of a display device can be effectively repaired.
此外,無論有無附接偏光板、有無覆蓋層以及無論彩 色濾光片的性質為何’都可有效地形成間隙。 雖然已參照特定實施例詳細敘述本發明精神,然而該 等實施例僅是用於說明本發明,而非限制本發明。須了解 熟悉此技術者可在不偏離本發明範圍及精神的情況下變化 或修改該實施例。 【圖式簡單說明】 第1圊示出含有雜質之液晶面板的部分示意圖:In addition, the gap can be effectively formed with or without the attachment of the polarizing plate, the presence or absence of the cover layer, and regardless of the nature of the color filter. The present invention has been described in detail with reference to the particular embodiments thereof. It is to be understood that those skilled in the art can change or modify the embodiment without departing from the scope and spirit of the invention. [Simple description of the drawing] Fig. 1 shows a partial schematic view of a liquid crystal panel containing impurities:
第2圖示出依據本發明一實施方式修復亮像素缺陷的 方法; 第3圖示出依據本發明一實施方式修復亮像素缺陷的 方法; 第4圖示出依據一彩色濾光片的波長’ 一彩色濾光片 的光穿透度圖; 第5圖示出依據一偏光板之波長,該偏光板的光穿透 度圖; 第6Α〜6C圖詳細說明用來形成間隙之各種雷射照射 18 1335461 方法; 第7圖示出一調整焦點距離並同時照射雷射的方法; 第8圖是沒有覆蓋層之液晶面板的截面圖; 第9圖是一覆蓋層的光吸收性圖; 第10圖是依據本發明之雷射光束形狀的簡圖。 【主要元件符號說明】2 is a view showing a method of repairing a bright pixel defect according to an embodiment of the present invention; FIG. 3 is a view showing a method of repairing a bright pixel defect according to an embodiment of the present invention; and FIG. 4 is a view showing a wavelength according to a color filter. a light transmittance diagram of a color filter; FIG. 5 shows a light transmittance diagram of the polarizing plate according to the wavelength of a polarizing plate; and FIGS. 6 to 6C detail various laser irradiations for forming a gap 18 1335461 Method; Figure 7 shows a method of adjusting the focal length and simultaneously irradiating the laser; Figure 8 is a cross-sectional view of the liquid crystal panel without the cover layer; Figure 9 is a light absorption diagram of a cover layer; The Figure is a simplified diagram of the shape of a laser beam in accordance with the present invention. [Main component symbol description]
300 矩 形 平 坦頂部 301 圓 形 平 坦 頂 部 500 液 晶 面 板 5 10 薄 膜 電 晶 體 陣列基板 520 液 晶 層 530 彩 色 滤 光 片 基板 53 1 玻 璃 基 板 532 彩 色 滤 光 片 533 里 色 矩 陣 535 銦 錫 氧 化 物 (ITO)膜 536 配 向 膜 537 偏 光 板300 Rectangular Flat Top 301 Round Flat Top 500 Liquid Crystal Panel 5 10 Thin Film Transistor Substrate 520 Liquid Crystal Layer 530 Color Filter Substrate 53 1 Glass Substrate 532 Color Filter 533 Medium Matrix 535 Indium Tin Oxide (ITO) Film 536 alignment film 537 polarizer
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KR101232136B1 (en) * | 2005-09-14 | 2013-02-12 | 엘지디스플레이 주식회사 | Method of repair an Liquid Crystal Cell, method of manufacturing Liquid Crystal Display Device using the same, and Liquid Crystal Display repaired using the same |
KR100780012B1 (en) | 2006-12-29 | 2007-11-27 | 참앤씨(주) | Method and apparatus for repairing liquid crystal display panel |
KR20080065748A (en) * | 2007-01-10 | 2008-07-15 | 참앤씨(주) | Method and apparatus for repairing liquid crystal display panel |
-
2008
- 2008-04-30 KR KR1020080040603A patent/KR100879012B1/en active IP Right Grant
- 2008-04-30 KR KR1020080040587A patent/KR100879011B1/en active IP Right Grant
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KR100879011B1 (en) | 2009-01-15 |
JP2011508895A (en) | 2011-03-17 |
TW200916886A (en) | 2009-04-16 |
JP2010530991A (en) | 2010-09-16 |
KR20080111384A (en) | 2008-12-23 |
TWI335462B (en) | 2011-01-01 |
CN101796453A (en) | 2010-08-04 |
TW200907466A (en) | 2009-02-16 |
JP5256564B2 (en) | 2013-08-07 |
KR100879012B1 (en) | 2009-01-15 |
KR20080111383A (en) | 2008-12-23 |
JP5245144B2 (en) | 2013-07-24 |
CN101779157B (en) | 2012-02-29 |
KR100879010B1 (en) | 2009-01-15 |
TW200912440A (en) | 2009-03-16 |
CN101707897A (en) | 2010-05-12 |
KR20080111385A (en) | 2008-12-23 |
CN101779157A (en) | 2010-07-14 |
TWI335451B (en) | 2011-01-01 |
JP2011504599A (en) | 2011-02-10 |
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