TWI320514B - Negative photosensitive composition and lithography process thereof - Google Patents

Negative photosensitive composition and lithography process thereof

Info

Publication number
TWI320514B
TWI320514B TW95110684A TW95110684A TWI320514B TW I320514 B TWI320514 B TW I320514B TW 95110684 A TW95110684 A TW 95110684A TW 95110684 A TW95110684 A TW 95110684A TW I320514 B TWI320514 B TW I320514B
Authority
TW
Taiwan
Prior art keywords
photosensitive composition
lithography process
negative photosensitive
negative
lithography
Prior art date
Application number
TW95110684A
Other languages
Chinese (zh)
Other versions
TW200736833A (en
Inventor
Jeng Yu Tsai
Jyh Long Jeng
Jinn Shing King
Original Assignee
Ind Tech Res Inst
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ind Tech Res Inst filed Critical Ind Tech Res Inst
Priority to TW95110684A priority Critical patent/TWI320514B/en
Publication of TW200736833A publication Critical patent/TW200736833A/en
Application granted granted Critical
Publication of TWI320514B publication Critical patent/TWI320514B/en

Links

TW95110684A 2006-03-28 2006-03-28 Negative photosensitive composition and lithography process thereof TWI320514B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW95110684A TWI320514B (en) 2006-03-28 2006-03-28 Negative photosensitive composition and lithography process thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW95110684A TWI320514B (en) 2006-03-28 2006-03-28 Negative photosensitive composition and lithography process thereof

Publications (2)

Publication Number Publication Date
TW200736833A TW200736833A (en) 2007-10-01
TWI320514B true TWI320514B (en) 2010-02-11

Family

ID=45073751

Family Applications (1)

Application Number Title Priority Date Filing Date
TW95110684A TWI320514B (en) 2006-03-28 2006-03-28 Negative photosensitive composition and lithography process thereof

Country Status (1)

Country Link
TW (1) TWI320514B (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9285680B2 (en) 2014-07-16 2016-03-15 Taiflex Scientific Co., Ltd. Photosensitive polyimide composition, base agent thereof, method of making the base agent, and solder-resistant polyimide thin film made from the composition
CN107203099A (en) * 2016-03-18 2017-09-26 台湾积体电路制造股份有限公司 Semiconductor devices and its manufacture method
TWI725496B (en) * 2018-12-21 2021-04-21 南韓商Ｌｇ化學股份有限公司 Cross-linking agent compound, photosensitive composition comprising the same, and photosensitive material using the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113867104A (en) * 2021-09-01 2021-12-31 安徽光智科技有限公司 Preparation method of photoresist structure for Lift-off

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9285680B2 (en) 2014-07-16 2016-03-15 Taiflex Scientific Co., Ltd. Photosensitive polyimide composition, base agent thereof, method of making the base agent, and solder-resistant polyimide thin film made from the composition
CN107203099A (en) * 2016-03-18 2017-09-26 台湾积体电路制造股份有限公司 Semiconductor devices and its manufacture method
TWI725496B (en) * 2018-12-21 2021-04-21 南韓商Ｌｇ化學股份有限公司 Cross-linking agent compound, photosensitive composition comprising the same, and photosensitive material using the same
US11754921B2 (en) 2018-12-21 2023-09-12 Lg Chem, Ltd. Crosslinking agent compound, photosensitive composition comprising the same, and photosensitive material using the same

Also Published As

Publication number Publication date
TW200736833A (en) 2007-10-01

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