TWI267090B - Stage device - Google Patents

Stage device Download PDF

Info

Publication number
TWI267090B
TWI267090B TW094111230A TW94111230A TWI267090B TW I267090 B TWI267090 B TW I267090B TW 094111230 A TW094111230 A TW 094111230A TW 94111230 A TW94111230 A TW 94111230A TW I267090 B TWI267090 B TW I267090B
Authority
TW
Taiwan
Prior art keywords
stage
reaction force
driving
movable stage
portions
Prior art date
Application number
TW094111230A
Other languages
Chinese (zh)
Other versions
TW200600437A (en
Inventor
Yoshiyuki Tomita
Original Assignee
Sumitomo Heavy Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries filed Critical Sumitomo Heavy Industries
Publication of TW200600437A publication Critical patent/TW200600437A/en
Application granted granted Critical
Publication of TWI267090B publication Critical patent/TWI267090B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68792—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the construction of the shaft

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Machine Tool Units (AREA)
  • Details Of Measuring And Other Instruments (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

To eliminate the effect due to reaction force of driving force. A stage device 10 includes: a stationary base 14 fixed to a base 12; a substrate table 16 supported on the stationary base 14; a movable stage 18 transversely constructed so as to straddle the substrate table 16; a pair of linear motors 20A and 20B for driving both the end parts of the movable stage 18 with respect to the Y-direction; and a controller 23 for translationally driving the linear motors 20A and 20B. Slide mechanisms 35A and 35B are provided between the stationary base 14 and the lower ends of strut parts 34A2 and 34B2 of motor support parts 34A and 34B. When the linear motors 20A and 20B drive the movable stage 18 with respect to the Y-direction, the motor support parts 34A and 34B are moved with respect to the direction opposite to the traveling direction of the movable stage 18. Accordingly, there is no effect of the reaction force from the linear motors 20A and 20B, and the driving control of the movable stage 18 can be performed at high accuracy.

Description

1267090 (1) 九、發明說明 【發明所屬之技術領域】 本發明係有關一種載台裝置，特別是有關一種解除因 爲移動載台時產生的反作用力引起載台之動作精確度的降 ,—. -〆〆—.X--、… 低而構成的載台裝置。 【先前技術】 φ 例如，稱爲載台裝置的裝置，是以一定速度移動門型 的Y載台吸附在載置台上的基板之上方而構成（例如參照 專利文獻1)。 又，上述Y載台延伸於與移動方向（Y方向）垂直的方 向（X方向），以橫跨基板的方式，藉由一對的導引構件可 移動地支持兩端部，且藉由一對的直尺（位置檢測器）檢測 出移動位置。然後，Y載台的兩端藉由一對的線性馬達（ 驅動手段）在移動方向驅動。一對的線性馬達支持在固定 •於固定基座的支持部。 因此，在上述載台裝置中，藉由線性馬達的驅動力驅 動Y載台時，其反作用力傳達至支持線性馬達的支持部， 介以支持體退避至固定基座而構成。 〔專利文獻1〕日本特開平9-2 1 93 5 3號公報 【發明內容】 〔發明所欲解決之課題〕1267090 (1) IX. DESCRIPTION OF THE INVENTION [Technical Field] The present invention relates to a stage device, and more particularly to a reduction in the accuracy of the action of the stage caused by the reaction force generated when the stage is moved. -〆〆—.X--,... Low-profile stage device. [Prior Art] φ For example, a device called a stage device is configured such that a Y-stage in which a gate type is moved at a constant speed is adsorbed on a substrate on a mounting table (see, for example, Patent Document 1). Further, the Y stage extends in a direction (X direction) perpendicular to the moving direction (Y direction), and movably supports both end portions by a pair of guiding members so as to straddle the substrate, and The correct ruler (position detector) detects the moving position. Then, both ends of the Y stage are driven in the moving direction by a pair of linear motors (driving means). A pair of linear motors are supported on the support that is fixed to the fixed base. Therefore, in the above-described stage device, when the Y stage is driven by the driving force of the linear motor, the reaction force is transmitted to the support portion that supports the linear motor, and the support body is retracted to the fixed base. [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei 9-2 1 93 5 No. 3 SUMMARY OF THE INVENTION [Problems to be Solved by the Invention]

然而，在以往的載台裝置中，隨著基板的大型化之Y -4- (2) 1267090· 載台的大型化，以更高速移動Y載台時，需要更大的驅動 力，並且其反作用力亦增大，支持部因應反作用力而撓曲 動作。結果，支持體的振動收斂，而花費時間，並且產生 在線性馬達的線圈之上下方向相對向的上下軛的相對位置 偏移的問題。 因此，本發明的目的在於提供一種解決上述課題的載 台裝置。 〔用以解決課題之手段〕 申請專利範圍第1項的發明，是具有··固定在基板的 固定基座；可移動地設置於該固定基座的載台；對上述載 台施加驅動力之驅動手段；支持上述驅動手段之支持部； 以及以特定速度移動上述載台之方式，控制上述驅動手段 的控制手段之載台裝置，其特徵爲：在上述支持部的下端 及上述固定基座或上述基礎之間，設置用來吸收藉由上述 ® 驅動手段的驅動力使上述載台移動時的反作用力之反作用 力吸收手段。 申請專利範圍第2項之發明的上述反作用力吸收手段 ，是具有：使上述支持部因應來自上述驅動手段之反力， 在與上述載台反方向上滑動的方式，可移動地支持的滑動 機構。 申請專利範圍第3項之發明的上述滑動機構，是具有 :在上述支持部的移動方向上導引的導引部；以及可轉動 地設置於上述導引部的滾動構件。 -5- (3) 1267090 申請專利範圍第4項之發明的上述導引部，是具有在 上述支持部的移動後，恢復上述支持部的恢復手段° 〔發明之效果〕 根據本發明，由於在支持部的下端與固定基座之間’ 設置用來吸收藉由驅動手段的驅動力移動載台時的反作用 力之反作用力吸收手段，因此即使在驅動手段產生更大的 Φ 驅動力時，可吸收驅動力的反作用力，可防止反作用力成 爲外亂。因此，藉由驅動力的反作用力可防止阻撓支持部 ，並且即使以高速驅動載台時，不會受到反作用力的影響 ，可高精確度地控制。 【實施方式】 以下，與圖面一起說明本發明的一實施例。 ®〔實施例1〕 第1圖係應用本發明之載台裝置的實施例1的斜視圖 。第2圖係第1圖所示的載台裝置之正面圖。第3圖係放 大線性馬達20B及導引部30B的構成之正面圖。第4圖係 放大線性馬達20B及導引部30B的構成之平面圖。 如第1圖至第4圖所示，載台裝置1〇係起重機移動 型載台，具備有：固定在混凝土製的基板12上的固定基 座14;該固定基座14上所支持的基板載台16;以跨越基 板載置台16的上方之方式橫架的可動載台18;在Y方向 -6 - (4) 1267090 驅動可動載台1 8的兩端部之一對的線性馬達（驅動手段 ，一 -------------------—〜...... .......… )20 A、20 B ;檢測出可動載台18的兩端部之移動位置的直 尺22A、22B ;依據來自直尺22A、22B的位置檢測信號， 使線性馬達2 0 A、2 0 B並進驅動的控制裝置2 3。此外，在 第3圖、第4圖雖未圖示直尺22A，但是由於與直尺22B 爲相同構成，因此省略直尺22A的說明。 固定基座1 4以格子狀組合鐵骨之強固的構成，與基 ® 礎12相對，介以複數個固定構件（未圖示）而固定。又，在 固定基座14的上面設置有用來吸收振動的除振單元26, 在除振單元26的上部支持有機床工作台28。該機床工作 台2 8之熱膨脹率比鐵等金屬小，且由強度高的石材所構 成，X方向及Y方向的尺寸形成比基板載置台16大。 基板載置台16固定在機床工作台28上面，以穩定狀 態被支持。又，基板載置台1 6上面設置有用來吸附作爲 工作件的基板（例如液晶基板等）之真空吸附部（未圖示）。However, in the conventional stage apparatus, as the size of the Y-4-(2) 1267090· stage of the enlargement of the substrate is increased, the Y stage is moved at a higher speed, and a larger driving force is required, and The reaction force also increases, and the support portion flexes due to the reaction force. As a result, the vibration of the support converges, which takes time and causes a problem of the relative positional shift of the upper and lower yokes opposed to each other in the downward direction of the coil of the linear motor. Accordingly, it is an object of the present invention to provide a stage device that solves the above problems. [Means for Solving the Problem] The invention of claim 1 is a fixed base fixed to a substrate, a stage movably provided on the fixed base, and a driving force applied to the stage a driving means; a supporting portion for supporting the driving means; and a stage device for controlling the driving means of the driving means for moving the stage at a specific speed, wherein the lower end of the supporting portion and the fixed base or Between the above-mentioned foundations, a reaction force absorbing means for absorbing the reaction force when the stage is moved by the driving force of the above-mentioned driving means is provided. The reaction force absorbing means according to the invention of claim 2 is characterized in that the support portion is movably supported by the support portion so as to slide in a direction opposite to the stage in response to a reaction force from the driving means. The sliding mechanism of the invention of claim 3 is characterized in that: a guide portion that guides in a moving direction of the support portion; and a rolling member that is rotatably provided to the guide portion. -5- (3) 1267090 The guide portion of the invention of claim 4 is a recovery means for recovering the support portion after the movement of the support portion. [Effect of the invention] According to the present invention, The reaction force absorbing means for absorbing the reaction force when the stage is moved by the driving force of the driving means is provided between the lower end of the support portion and the fixed base, so that even when the driving means generates a larger Φ driving force, Absorbing the reaction force of the driving force prevents the reaction force from becoming a disturbance. Therefore, the reaction portion can be prevented from being blocked by the reaction force of the driving force, and even when the stage is driven at a high speed, it is not affected by the reaction force, and can be controlled with high precision. [Embodiment] Hereinafter, an embodiment of the present invention will be described together with the drawings. ® [Embodiment 1] Fig. 1 is a perspective view showing a first embodiment of a stage device to which the present invention is applied. Fig. 2 is a front elevational view of the stage device shown in Fig. 1. Fig. 3 is a front elevational view showing the configuration of the linear motor 20B and the guide portion 30B. Fig. 4 is a plan view showing the configuration of the linear motor 20B and the guide portion 30B. As shown in FIGS. 1 to 4, the stage device 1 is a crane-type mobile stage, and includes a fixed base 14 fixed to a concrete substrate 12; and a substrate supported on the fixed base 14. a stage 16; a movable stage 18 that traverses across the upper surface of the substrate stage 16; a linear motor that drives one of the opposite ends of the movable stage 18 in the Y direction -6 - (4) 1267090 (drive Means, one --------------------~...... ..........) 20 A, 20 B; detecting the movable stage The rulers 22A, 22B of the moving positions of the both end portions of the 18; the linear motors 2 0 A, 2 0 B are driven into the driving control device 23 in accordance with the position detection signals from the straight legs 22A, 22B. Further, although the ruler 22A is not shown in Figs. 3 and 4, since the ruler 22B has the same configuration, the description of the ruler 22A is omitted. The fixed base 14 has a strong structure in which the iron skeleton is combined in a lattice shape, and is fixed to the base 12 with a plurality of fixing members (not shown). Further, a vibration removing unit 26 for absorbing vibration is provided on the upper surface of the fixed base 14, and a machine tool table 28 is supported at the upper portion of the vibration removing unit 26. The machine tool table 28 has a thermal expansion rate smaller than that of a metal such as iron, and is made of a high-strength stone material, and the size in the X direction and the Y direction is larger than that of the substrate stage 16. The substrate stage 16 is fixed on the machine table 28 and is supported in a stable state. Further, a vacuum suction portion (not shown) for adsorbing a substrate (e.g., a liquid crystal substrate or the like) as a workpiece is provided on the upper surface of the substrate mounting table 16.

® 在機床工作台28的左右兩側立起有支持導引部30A 、3 0B的導引部支持部32A、32B。又，導引部30A、30B 以延伸於可動載台18的移動方向即Y方向之方式安裝， 成爲藉由空氣壓在低摩擦狀態下導引可動載台18的兩端 部之靜壓空氣軸承的構成。 再者’在導引支持部3 2 A、3 2 B的外側立起有用來支 持件性馬達20A、20b的馬達支持部34A、34B。該馬達支 持部3 4 A、3 4 B由與線性馬達2 0 A、2 0 B的軛平行延伸存 在的水平部34A1、34B1、以及延伸於比水平部34A1、 (5) 1267090 3 4B 1下方的複數條支柱部34A2、34B2所構成。 馬達支持部34A、34B的支柱部34A2、34B2的下端 與固定基座1 4之間，設置有用來吸收以線性馬達20A、 20B的驅動力移動可動載台18時的反作用力之滑動機構（ 反作用力吸收手段PSA、35B。該滑動機構35A、35B之 馬達支持部34A、34B因應來自線性馬達20A、20B的反 作用力，可移動地支持於在與可動載台1 8相反方向上滑 春動。 又，在導引支持部32A、32B與馬達支持部34A、34B 之間，設置有導引與線性馬達20A、20B及直尺22A、22B 連接的複數個刻度的撓曲不良之纜線對36A、3 6B。該纜 線對36A、3 6B，以載置在延伸於 Y方向的纜線支持部 3 7A、37B之方式設置，可動載台18跟隨在Y方向移動並 藉由移動撓曲部分，以不聯絡纜線之方式導引。 可動載台1 8從正面觀看形成所謂門型，具有：線性 • 馬達20A、20B所驅動的滑動部（可動部）18A、18B ;以連 結滑動部18A、18B間之方式橫架在與移動方向垂直的X 方向之橫樑1 8C。在橫樑1 8C的前端或後端，例如裝設有 在基板載置台16上所吸附的基板（未圖示）之表面均勻塗布 藥液之塗布噴嘴（未圖示）或檢查基板表面之感應器（未圖示 )等的工具。 又，在滑塊18A、18B的上方設置有使橫樑18C在Z 方向上升降的升降驅動部38A、38B。 在此，參照第3圖說明線性馬達20A、20B以及導引 (6) 1267090 部3 0A、30B之構成。此外’線性馬達2〇a、20B以及導 引部30A、30B之構成，由於分別是在左側與右側左右對 稱而配設之相同構成’因此以下，說明配置於右側的線性 馬達20B及導引部30B。 如第3圖及第4圖所示，線性馬達2〇b具有：從可動 部1 8 B突出至側方的線圈支持臂4 0 B ;安裝在線圈支持臂 40B的上下面之可動線圈42B;支持在馬達支持部34B的 # 上端之軛部44B ;固定在形成c字狀的軛部44B內側之永 久磁鐵46B。可動線圈42B以與永久磁鐵46B相對向的方 式配置，藉由驅動電壓的施加，產生與永久磁鐵46B相對 的Y方向之電磁力（驅動力）。 因而，線性馬達20B藉著從可動線圈42B產生與永久 磁鐵46B相對的電磁性反彈力或吸引力，使γ方向的驅動 力附加在可動載置台1 8而構成，藉由控制施加在可動線 圈42B的電壓，以一定速度在Y方向上使可動載台18移 I動，產生驅動力。 導引部30B係具有：延伸於Y方向的導引軌50B ;以 包圍導引軌50B的4邊之方式形成的滑塊1 8B ;在滑塊 18B與導引軌50B的上面50B-1之間噴射壓縮空氣，使滑 塊18B以浮動狀態支持於上方的第1靜壓空氣軸承52B ; 以及在滑塊18B與導引軌50B的右側面50B-2之間噴射壓 縮空氣，使可動部1 8 B以浮動狀態支持於側方的第2靜壓 空氣軸承54B。 滑塊1 8B在導引軌50B的上面50B-1、右側面50B-2 (7) 1267090 、下面5 0 B - 3、左側面5 0 B - 4，具有介以微小的間隙s相 對向的導引面18B-1〜18B-4。因而，從上述靜壓空氣軸承 5 2B及54B噴射於上述間隙S的壓縮空氣，以特定壓力按 押滑塊18B的導引面18B-1〜18B-4。藉此，由於滑塊ι8Β 與導引軌5 0B相對，介以微小的間隙S浮動支持，因此以 大致上沒有摩擦的非接觸狀態在Y方向移動。 檢測出可動載台18的移動位置之直尺22B是由：設 # 置於導引軌5 0B的右側面50B-2，延伸形成於Y方向的 被位置檢測板22a ;以及檢測出被位置檢測板22a的縫隙 數之感應器22b所構成。感應器22b由於安裝於滑塊18B ，因此輸出因應在特定間隔配置一行可動載台18的移動 量之縫隙數的脈衝數作爲檢測信號。 監視馬達20A、導引部30A亦成爲與上述監視馬達 2 0B、導引部30B相同的構成。因此，可動載台18 —邊藉 由導引部30A、30B導引設置於左右兩端的滑塊（可動部） ® ，一邊藉由監視馬達2 0 A、2 0 b的驅動力在Y方向上驅動 。藉此，可動載台18藉由監視馬達20A、20B的驅動力同 時驅動配置於兩端的滑塊1 8A、1 8B，可使滑塊1 8A、1 8B 並進，使橫樑1 8 C移動至朝向延伸於與移動方向垂直的X 方向的Y方向。 第5圖係滑動機構3 5 A、3 5 B的構成之縱剖面圖。第 6圖係滑動機構35 A、35B的構成之斜視圖。 如第5圖及第6圖所示，本實施例的滑塊機構3 5 A、 3 5B具有··導引馬達支持部34A、34B的移動方向之監視 -10- (8) 1267090 導引部60 ;以及可轉動地設置於監視導引部60之滾動構 件62。又，滾動構件62由以不銹鋼材形成球狀的複數個 鋼球所構成，可承受馬達支持部34A、3 4B的荷重。 監視導引部60具有：延伸形成於Y方向的導引軌64 :將導引軌64固定在固定基座14的固定構件66 ;以及以 與導引軌64嵌合的嵌合凹部70a之低摩擦滑動的滑動單 元70。滑動單元70與各支柱部34 A2、3 4B2之下端結合 φ ，可滑動地支持馬達支持部34A、34B。 導引軌64在左右側面設置有使滾動構件62滑動的滑 動溝72，在與滑動溝72相對向的嵌合凹部70a之內壁設 置有使滑動構件62滑動的滑動溝73。又，在滑動單元70 的內部設置有導引複數個滑動構件62的移動之圓筒狀的 套筒74。套筒74以兩端部與滑動溝72、73連通的方式形 成C字狀，複數個滾動構件62以可循環的方式構成。滑 動單元70沿著導引軌64移動，並且複數個滑動構件62 • 在套筒74與滑動溝72之間轉動，減輕滑動阻力。因此， 滑動單元70以極低的摩擦力可滑動導引軌64。 又，在監視導引部60的端部係設置有板彈簧（恢復手 段）76，該板彈簧是使導引軌64滑動的滑動單元70恢復 到移動前的位置。該板彈簧76之下部藉由締結構件78與 固定構件6 6的端面締結，上部藉由締結構件8 0與馬達支 持部3 4 A、3 4 B的端面締結。此外，作爲使已經移動的滑 塊單元70恢復的恢復手段，藉由線圈彈簧的彈力，使滑 塊單元70恢復的方法，或是使用藉由磁鐵的反彈力使滑 -11 - (9) 1267090 塊單元7 0恢復的方法等亦可。 因而，當監視馬達20A、20B在Y方向驅動可動馬達 18時，在馬達支持部34A、34B使反作用力作用，使滑動 單元70沿著導引軌64移動，使馬達支持部34A、34B移 動到與可動載台1 8的移動方向相反方向。藉此，監視馬 達20A、20B的反作用力被吸收作爲用來使馬達支持部 3 4A、3 4B及各滑動單元70的全質量移動的驅動力。此外 # ，馬達支持部34A、34B及各滑動單元70的全質量，由於 比監視馬達20A、20B所驅動的可動載台18之質量大很多 ，因此馬達支持部34A、34B的移動量僅些微。 如此，由於馬達支持部34A、34B及各滑動單元70以 吸收反作用力之方式動作，因此藉由反作用力減少馬達支 持部34A、34B的撓曲量，可大幅縮短收斂馬達支持部 34A、3 4B的振動的時間，並且可抑制固接在監視馬達 20A、20B的軛部44B的內側之上下的永久磁鐵46B之偏 •移。 藉此，在Y方向驅動可動載台1 8時，不會受到監視 馬達20A、20B的反作用力之影響，可高精密度地進行可 動載台1 8的驅動控制。 又，藉由監視馬達20A、20B的反作用力，使馬達支 持部34A、34B及各滑動單元70滑動之後，藉由板彈簧 76的彈簧力，使滑動單元70恢復到移動前的位置。 (10) 1267090 第7圖係本發明的載台裝置之實施例2的斜視圖。第 8圖係第7圖所示的載台裝置之正面圖。此外，在第7圖 及第8圖中，與上述實施例1相同的部分附加相同符號， 並省略其說明。 如第7圖及第8圖所示，載台裝置90在馬達支持部 94A、94B的支柱部94A2、94B2的下端與基礎12之間， 設置有用來吸收以監視馬達20A、20B的驅動力移動可動 # 載置台18時的反作用力的滑動機構95A、95B。該滑動機 構95A、95B因應來自監視馬達20A、20B的反作用力， 使馬達支持部94A、94b滑動至與可動載台18相反方向， 可移動地被支持著。 因而，在載台裝置90中，監視馬達20A、20B在γ 方向上驅動可動載台1 8時，使反作用力於馬達支持部 94A、94B作用，使滑動單元70沿著導引軌64移動，馬 達支持部94A、94B移動到與可動載台18的移動方向相反 ® 方向。藉此，監視馬達20A、20B之反作用力，被吸收作 爲使馬達支持部94A、94B及各滑動單元70的全質量的驅 動力。 在該實施例2中，支持部94A、94B由於沿著固定於 基礎1 2的導引軌64而滑動之構成，因此如實施例1般， 支柱部94A2、94B2之長度長於在固定基座14上滑動之長 度，支柱部94 A2、94 B2的質量變更大，可更有效吸收來 自監視馬達20A、20B的反作用力。 -13- (11) 1267090 〔產業上利用的可能性〕 此外，在上述實施例中，雖舉出藉由一對的監視馬達 20A、20B並進驅動可動載台1 8作爲一例，但不限定於此 ，驅動可動載台1 8之驅動手段2的數量當然不限於一對 〇 又，雖說明使用監視馬達的構成作爲上述實施例的驅 動手段，但當然也可以使用監視馬達以外的驅動手段（例 • 如以馬達驅動螺栓之方式等）。 【圖式簡單說明】 第1圖係應用本發明之移動體位置控制裝置的一實施 例之載台裝置的斜視圖。 桌2圖係第1圖所示的載台裝置之正面圖。 第3圖係放大線性馬達2〇B及導引部30B的構成之正 面圖。 ^ 第4圖係放大線性馬達20B及導引部30B的構成之平 面圖。 第5圖係滑動機構35A、3 5B的構成之縱剖面圖。 第6圖係滑動機構35A、35B的構成之斜視圖。 第7圖係本發明的載台裝置之實施例2的斜視圖。 第8圖係第7圖所示的載台裝置之正面圖。 【主要兀件符號說明】 1 〇、90 :載台裝置 -14- (12) 1267090 1 2 :基礎 14 :固定基座 1 6 :基板載置台 18 :可動載台 20A、20B :線性馬達 22A、22B :直尺The guide portion support portions 32A and 32B that support the guide portions 30A and 30B are raised on the right and left sides of the machine table 28. Further, the guide portions 30A and 30B are attached so as to extend in the Y direction which is the moving direction of the movable stage 18, and are the static air bearing which guides both ends of the movable stage 18 by the air pressure in the low friction state. Composition. Further, motor support portions 34A and 34B for supporting the component motors 20A and 20b are erected on the outside of the guide support portions 3 2 A and 3 2 B. The motor support portions 3 4 A, 3 4 B are extended by horizontal portions 34A1, 34B1 extending in parallel with the yokes of the linear motors 20A, 20B, and below the horizontal portions 34A1, (5) 1267090 3 4B 1 The plurality of pillar portions 34A2 and 34B2 are formed. A sliding mechanism for absorbing the reaction force when the movable stage 18 is moved by the driving force of the linear motors 20A and 20B is provided between the lower ends of the column portions 34A2 and 34B2 of the motor supporting portions 34A and 34B and the fixed base 14 (reaction) The force absorbing means PSA, 35B. The motor supporting portions 34A, 34B of the sliding mechanisms 35A, 35B are movably supported to slide in the opposite direction to the movable stage 18 in response to the reaction forces from the linear motors 20A, 20B. Further, between the guide support portions 32A and 32B and the motor support portions 34A and 34B, a cable pair 36A for guiding a plurality of scales that are connected to the linear motors 20A and 20B and the rulers 22A and 22B is provided. 3 6B. The cable pairs 36A and 36B are disposed so as to be placed on the cable supporting portions 3 7A and 37B extending in the Y direction, and the movable stage 18 is moved in the Y direction and moved by the flexing portion. The movable stage 18 is formed so as to form a so-called door type from the front, and has a linear portion • a sliding portion (movable portion) 18A, 18B driven by the motors 20A and 20B; and a connecting sliding portion 18A. The way between 18B is horizontal and mobile The beam 1 8C in the vertical X direction. At the front end or the rear end of the beam 18C, for example, a coating nozzle for uniformly coating the surface of the substrate (not shown) adsorbed on the substrate mounting table 16 is mounted (not A tool such as a sensor (not shown) on the surface of the substrate is inspected. Further, upper and lower lift driving units 38A and 38B for raising and lowering the beam 18C in the Z direction are provided above the sliders 18A and 18B. The configuration of the linear motors 20A and 20B and the guides (6) 1267090 portions 30A and 30B will be described with reference to Fig. 3. Further, the configurations of the linear motors 2a and 20B and the guide portions 30A and 30B are respectively on the left side. The right side is symmetrical and arranged in the same configuration. Therefore, the linear motor 20B and the guide portion 30B disposed on the right side will be described below. As shown in FIGS. 3 and 4, the linear motor 2〇b has: the movable portion 18 B protrudes to the side coil support arm 40B; the movable coil 42B attached to the upper and lower sides of the coil support arm 40B; the yoke portion 44B supported at the upper end of the motor support portion 34B; and the yoke portion formed in the c-shape Permanent magnet 46B on the inside of 44B. Movable coil 42B with permanent The iron 46B is disposed in a facing manner, and an electromagnetic force (driving force) in the Y direction opposite to the permanent magnet 46B is generated by the application of the driving voltage. Thus, the linear motor 20B is caused to be opposed to the permanent magnet 46B from the movable coil 42B. The electromagnetic repulsive force or the attraction force is formed by adding the driving force in the γ direction to the movable stage 18, and by controlling the voltage applied to the movable coil 42B, the movable stage 18 is moved in the Y direction at a constant speed. , generating driving force. The guide portion 30B has a guide rail 50B extending in the Y direction, a slider 18B formed to surround the four sides of the guide rail 50B, and an upper surface 50B-1 of the slider 18B and the guide rail 50B. The compressed air is injected to support the slider 18B in a floating state to the upper first static air bearing 52B; and the compressed air is injected between the slider 18B and the right side surface 50B-2 of the guide rail 50B to move the movable portion 1 8 B is supported in a floating state on the side of the second static air bearing 54B. The slider 18B is opposite to the upper surface 50B-1 of the guide rail 50B, the right side surface 50B-2 (7) 1267090, the lower surface 5 0 B - 3 , and the left side surface 5 0 B - 4 with a slight gap s therebetween. Guide faces 18B-1 to 18B-4. Therefore, the compressed air injected into the gap S from the static air bearings 5 2B and 54B presses the guide faces 18B-1 to 18B-4 of the slider 18B at a specific pressure. Thereby, since the slider ι8 相对 is opposed to the guide rail 50B and is supported by the minute gap S, it is moved in the Y direction in a non-contact state in which there is substantially no friction. The ruler 22B that detects the moving position of the movable stage 18 is set to: the right side surface 50B-2 of the guide rail 50B, the position detecting plate 22a extending in the Y direction; and the position detection detected The number of slits of the plate 22a is constituted by a sensor 22b. Since the sensor 22b is attached to the slider 18B, the number of pulses of the number of slits in which the movement amount of one row of the movable stage 18 is arranged at a specific interval is output as a detection signal. The monitor motor 20A and the guide portion 30A also have the same configuration as the above-described monitor motor 20B and the guide portion 30B. Therefore, the movable stage 18 guides the sliders (movable parts) ® provided at the left and right ends by the guide portions 30A and 30B, and monitors the driving force of the motors 2 0 A and 2 0 b in the Y direction. drive. Thereby, the movable stage 18 simultaneously drives the sliders 18A, 18B disposed at both ends by the driving force of the monitoring motors 20A, 20B, so that the sliders 1 8A, 1 8B can be moved in, and the beam 18 C can be moved to the orientation. Extending in the Y direction of the X direction perpendicular to the moving direction. Fig. 5 is a longitudinal sectional view showing the configuration of the sliding mechanism 3 5 A, 3 5 B. Fig. 6 is a perspective view showing the configuration of the slide mechanisms 35 A and 35B. As shown in Figs. 5 and 6, the slider mechanism 3 5 A, 3 5B of the present embodiment has the monitoring of the moving direction of the guide motor support portions 34A and 34B. -10- (8) 1267090 Guide portion 60; and a rolling member 62 rotatably disposed on the monitoring guide 60. Further, the rolling member 62 is composed of a plurality of steel balls formed in a spherical shape by a stainless steel material, and can withstand the load of the motor support portions 34A and 34B. The monitoring guide 60 has a guide rail 64 extending in the Y direction: a fixing member 66 that fixes the guide rail 64 to the fixed base 14; and a fitting recess 70a that is fitted to the guide rail 64 The sliding unit 70 that frictionally slides. The slide unit 70 is coupled to φ at the lower end of each of the column portions 34 A2, 3 4B2 to slidably support the motor support portions 34A and 34B. The guide rail 64 is provided with a sliding groove 72 for sliding the rolling member 62 on the right and left side surfaces, and a sliding groove 73 for sliding the sliding member 62 is provided on the inner wall of the fitting recess 70a facing the sliding groove 72. Further, a cylindrical sleeve 74 for guiding the movement of the plurality of sliding members 62 is provided inside the sliding unit 70. The sleeve 74 is formed in a C shape such that both end portions thereof communicate with the sliding grooves 72, 73, and the plurality of rolling members 62 are configured to be recyclable. The slide unit 70 moves along the guide rail 64, and a plurality of slide members 62 are rotated between the sleeve 74 and the slide groove 72 to reduce the sliding resistance. Therefore, the sliding unit 70 can slide the guide rail 64 with an extremely low frictional force. Further, at the end of the monitoring guide portion 60, a leaf spring (recovery means) 76 for returning the slide unit 70 for sliding the guide rail 64 to the position before the movement is provided. The lower portion of the leaf spring 76 is joined to the end surface of the fixing member 66 by the structural member 78, and the upper portion is joined to the end faces of the motor supporting portions 3 4 A, 3 4 B by the structural member 80. Further, as a recovery means for restoring the slider unit 70 that has moved, the slider unit 70 is restored by the elastic force of the coil spring, or the rebound force by the magnet is used to slide -11 - (9) 1267090 The method of recovering the block unit 70 or the like is also possible. Therefore, when the monitor motors 20A, 20B drive the movable motor 18 in the Y direction, the motor supporting portions 34A, 34B actuate the reaction force, move the slide unit 70 along the guide rail 64, and move the motor support portions 34A, 34B to The direction opposite to the moving direction of the movable stage 18. Thereby, the reaction forces of the monitoring motors 20A, 20B are absorbed as the driving force for moving the total mass of the motor supporting portions 34A, 34B and the respective sliding units 70. Further, the total mass of the motor support portions 34A and 34B and the respective slide units 70 is much larger than the mass of the movable stage 18 driven by the monitor motors 20A and 20B, so that the amount of movement of the motor support portions 34A and 34B is only slightly. In this manner, since the motor support portions 34A and 34B and the respective slide units 70 operate to absorb the reaction force, the amount of deflection of the motor support portions 34A and 34B is reduced by the reaction force, and the convergence motor support portions 34A and 34B can be greatly shortened. The time of the vibration is suppressed, and the shift of the permanent magnet 46B that is fixed to the inside of the yoke portion 44B of the monitor motors 20A, 20B can be suppressed. Thereby, when the movable stage 18 is driven in the Y direction, the drive control of the movable stage 18 can be performed with high precision without being affected by the reaction force of the monitoring motors 20A and 20B. Further, after the motor supporting portions 34A and 34B and the respective sliding units 70 are slid by the reaction forces of the monitoring motors 20A and 20B, the sliding unit 70 is returned to the position before the movement by the spring force of the leaf spring 76. (10) 1267090 Fig. 7 is a perspective view showing a second embodiment of the stage device of the present invention. Figure 8 is a front elevational view of the stage device shown in Figure 7. In the seventh and eighth aspects, the same portions as those in the first embodiment are denoted by the same reference numerals, and their description will be omitted. As shown in Figs. 7 and 8, the stage device 90 is provided with a driving force for absorbing the monitoring motors 20A and 20B between the lower ends of the column portions 94A2 and 94B2 of the motor supporting portions 94A and 94B and the foundation 12. The sliding mechanism 95A, 95B of the reaction force when the table 18 is placed. The slide mechanisms 95A and 95B are movably supported by the motor support portions 94A and 94b in a direction opposite to the movable stage 18 in response to the reaction force from the monitor motors 20A and 20B. Therefore, in the stage device 90, when the monitor motors 20A and 20B drive the movable stage 18 in the γ direction, the reaction force acts on the motor support portions 94A and 94B to move the slide unit 70 along the guide rail 64. The motor support portions 94A, 94B are moved in the opposite direction to the moving direction of the movable stage 18. Thereby, the reaction forces of the motors 20A, 20B are monitored and absorbed as the driving force for the full mass of the motor supporting portions 94A, 94B and the respective sliding units 70. In the second embodiment, since the support portions 94A, 94B are slid along the guide rails 64 fixed to the base 12, the length of the pillar portions 94A2, 94B2 is longer than that at the fixed base 14 as in the first embodiment. The length of the upper slide, the mass of the pillar portions 94 A2, 94 B2 is greatly changed, and the reaction force from the monitor motors 20A, 20B can be more effectively absorbed. -13- (11) 1267090 [Possibility of industrial use] In the above embodiment, the movable stage 18 is driven by the pair of monitoring motors 20A and 20B as an example, but the invention is not limited thereto. Therefore, the number of driving means 2 for driving the movable stage 18 is of course not limited to a pair of cymbals. Although the configuration using the monitoring motor will be described as the driving means of the above-described embodiment, it is of course possible to use a driving means other than the monitoring motor (for example) • If the motor is driven by a bolt, etc.). BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a perspective view showing a stage device to which an embodiment of a moving body position control device according to the present invention is applied. Table 2 is a front view of the stage device shown in Fig. 1. Fig. 3 is a front elevational view showing the configuration of the linear motor 2〇B and the guide portion 30B. ^ Fig. 4 is a plan view showing the configuration of the linear motor 20B and the guide portion 30B. Fig. 5 is a longitudinal sectional view showing the configuration of the slide mechanisms 35A and 35B. Fig. 6 is a perspective view showing the configuration of the slide mechanisms 35A and 35B. Fig. 7 is a perspective view showing a second embodiment of the stage device of the present invention. Figure 8 is a front elevational view of the stage device shown in Figure 7. [Description of main components] 1 〇, 90: Stage device-14- (12) 1267090 1 2 : Base 14: Fixed base 1 6 : Substrate mounting table 18 : Movable stage 20A, 20B : Linear motor 22A, 22B: Ruler

2 8 :機床工作台 30A、30B ：導弓[部 32A、32B :導引支持部 34A、34B、94A、94B ：馬達支持部 35A、35B、95A、95B ：滑動支持部 34A2、34B2、94A2、94B2:支柱部 4 0 A、4 0 B :線圈支持臂 42A、42B :可動線圈 44A、44B:軛部 4 6 A、4 6 B :永久磁鐵 60 :線性導引部 62 :滾動構件 6 6 :固定構件 70 :滑動單元 76 :板彈簧 -15-2 8 : Machine table 30A, 30B: guide bow [sections 32A, 32B: guide support portions 34A, 34B, 94A, 94B: motor support portions 35A, 35B, 95A, 95B: slide support portions 34A2, 34B2, 94A2 94B2: pillar portion 4 0 A, 4 0 B : coil support arm 42A, 42B: movable coil 44A, 44B: yoke portion 4 6 A, 4 6 B : permanent magnet 60 : linear guide portion 62 : rolling member 6 6 : Fixing member 70: sliding unit 76: leaf spring-15-

Claims (1)

(1) 1267090 十、申請專利範圍 1· 一種載台裝置，係具備有：固定在基板的固定基 座；可移動地設置於該固定基座的載台；對上述載台施加 驅動力之驅動手段；支持上述驅動手段之支持部；以及以 特定速度移動上述載台之方式，控制上述驅動手段的控制 手段之載台裝置，其特徵在於： 在上述支持部的下端及上述固定基座或上述基礎之間 • ’設置用來吸收藉由上述驅動手段的驅動力使上述載台移 動時的反作用力之反作用力吸收手段。 2 ·如申請專利範圍第1項之載台裝置，其中，上述 反作用力吸收手段係具有：使上述支持部因應來自上述驅 動手段之反力，在與上述載台反方向上滑動的方式，可移 動地支持的滑動機構。 3 ·如申請專利範圍第2項之載台裝置，其中’上述 滑動機構具有： ^ 在上述支持部的移動方向上導引的導引部；以及 可轉動地設置於上述導引部的滾動構件。 4.如申請專利範圍第3項之載台裝置，其中’上述 導引部具有在上述支持部的移動後，恢復上述支持部的恢 復手段。 -16-(1) 1267090 X. Patent Application No. 1. A stage device comprising: a fixed base fixed to a substrate; a stage movably disposed on the fixed base; and a driving force applied to the stage a support unit that supports the drive means; and a stage device that controls the control means of the drive means to move the stage at a specific speed, wherein the lower end of the support portion and the fixed base or the above Between the bases: 'The reaction force absorbing means for absorbing the reaction force when the above-described stage is moved by the driving force of the above-described driving means is provided. [2] The stage device according to claim 1, wherein the reaction force absorbing means is configured to move the support portion in a direction opposite to the stage in response to a reaction force from the driving means Ground-supported sliding mechanism. [3] The stage device of claim 2, wherein the sliding mechanism has: a guiding portion guided in a moving direction of the support portion; and a rolling member rotatably provided to the guiding portion . 4. The stage device of claim 3, wherein the said guiding portion has a recovery means for restoring the support portion after the movement of the support portion. -16-
TW094111230A 2004-05-20 2005-04-08 Stage device TWI267090B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004150711A JP2005331402A (en) 2004-05-20 2004-05-20 Stage device

Publications (2)

Publication Number Publication Date
TW200600437A TW200600437A (en) 2006-01-01
TWI267090B true TWI267090B (en) 2006-11-21

Family

ID=35476389

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094111230A TWI267090B (en) 2004-05-20 2005-04-08 Stage device

Country Status (4)

Country Link
JP (1) JP2005331402A (en)
KR (1) KR100591939B1 (en)
CN (1) CN100464401C (en)
TW (1) TWI267090B (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4927338B2 (en) 2005-02-21 2012-05-09 住友重機械工業株式会社 STAGE DEVICE, GANTRY TYPE STAGE DEVICE, AND STAGE DEVICE CONTROL METHOD
KR100842116B1 (en) * 2006-03-31 2008-06-30 (주)21하이테크 Apparatus for machining light-guide plate
KR101321454B1 (en) * 2006-05-02 2013-10-25 주식회사 케이씨텍 Transfer device of slit nozzle
JP4402078B2 (en) * 2006-06-19 2010-01-20 住友重機械工業株式会社 Stage equipment
EP1870202B1 (en) * 2006-06-23 2009-03-11 The Gleason Works Machine tool
JP4138858B2 (en) * 2007-12-12 2008-08-27 住友重機械工業株式会社 Stage equipment
KR101054915B1 (en) * 2008-12-05 2011-08-05 주식회사 디엠에스 Slit Coater
KR20100073540A (en) * 2008-12-23 2010-07-01 주식회사 탑 엔지니어링 Apparatus for offsetting reaction force and paste dispenser having the same
KR101022646B1 (en) 2009-08-31 2011-03-22 주식회사 져스텍 Linear motor system and reaction force compensation method thereof
KR101052491B1 (en) * 2009-12-18 2011-07-29 주식회사 탑 엔지니어링 Array test device
KR101703717B1 (en) * 2010-05-13 2017-02-08 주식회사 탑 엔지니어링 Apparatus for offsetting reaction force and paste dispenser having the same
JP5639815B2 (en) * 2010-08-17 2014-12-10 株式会社ミツトヨ Industrial machinery
CN102887341A (en) * 2011-07-22 2013-01-23 大银微***股份有限公司 Crossbeam pre-tensioning module of cantilever type platform
CN102929295B (en) * 2012-11-08 2015-04-15 中国地质大学（武汉） Automatic leveling control device based on single chip microcomputer (SCM)and levelling method
CN103389740B (en) * 2013-07-29 2016-03-23 中国传媒大学 A kind of control module of parallel type stereoscopic video cloud station
CN103971755B (en) * 2014-05-07 2016-05-11 马宁 A kind of fine setting shifting block type adjustable plate
KR102333209B1 (en) * 2015-04-28 2021-12-01 삼성디스플레이 주식회사 Substrate polishing apparatus
TWI616269B (en) * 2016-08-01 2018-03-01 Reaction force elimination platform device
CN106362817B (en) * 2016-10-31 2018-08-24 苏州昇特智能科技有限公司 A kind of objective table for placing nanofiber sample
JP6631745B1 (en) * 2018-12-14 2020-01-15 日立金属株式会社 Control method and control device for linear motor stage
KR102407790B1 (en) * 2020-11-05 2022-06-13 이노6 주식회사 Reaction force suppression system
CN114043260B (en) * 2022-01-13 2022-04-26 上海隐冠半导体技术有限公司 Displacement device
JP2024036288A (en) 2022-09-05 2024-03-15 住友化学株式会社 Polarizing plate

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3634483B2 (en) * 1996-02-13 2005-03-30 キヤノン株式会社 Stage apparatus, and exposure apparatus and device production method using the same
JP3548353B2 (en) * 1996-10-15 2004-07-28 キヤノン株式会社 Stage apparatus, exposure apparatus and device manufacturing method using the same
JPH11168064A (en) * 1997-09-22 1999-06-22 Nikon Corp Stage driving method, stage equipment, and aligner
WO2001027978A1 (en) * 1999-10-07 2001-04-19 Nikon Corporation Substrate, stage device, method of driving stage, exposure system and exposure method
JP2003243279A (en) * 2002-02-13 2003-08-29 Nikon Corp Drive device, stage device, exposure method and aligner
US6844635B2 (en) * 2002-05-24 2005-01-18 Dover Instrument Corporation Reaction force transfer system

Also Published As

Publication number Publication date
JP2005331402A (en) 2005-12-02
CN1700438A (en) 2005-11-23
CN100464401C (en) 2009-02-25
KR20060047978A (en) 2006-05-18
KR100591939B1 (en) 2006-06-20
TW200600437A (en) 2006-01-01

Similar Documents

Publication Publication Date Title
TWI267090B (en) Stage device
JP4782710B2 (en) Stage equipment
US5760564A (en) Dual guide beam stage mechanism with yaw control
KR101087529B1 (en) Stage device
WO2010081325A1 (en) Movable positioning test mechanism
CN104105941A (en) Coordinate measuring machine with constrained counterweight
JP2007325389A (en) Movable-magnet linear motor built-in slide device
JP3940277B2 (en) Stage equipment
TWI360133B (en)
US20060057861A1 (en) Movable operating device and method of controlling the movable operating device
JP2006519402A (en) Linear moving device for driving simulator
TWI260646B (en) X-Y axis stage device
JP2007232648A (en) Stage device
JP3732763B2 (en) Stage equipment
JP4335704B2 (en) XY stage device
TW200808489A (en) Stage device
US8019448B2 (en) Stage device
JPH11344585A (en) Biaxial moving device
JP2008090718A (en) Positioning device
JP2000002636A (en) Material testing machine
JP5200745B2 (en) Three-dimensional positioning device and atomic force microscope equipped with the same
US20100095798A1 (en) Planar moving apparatus
CN220040960U (en) Compact multi-axis precision motion platform
JP6254060B2 (en) Vertical movement stage for charged particle beam apparatus and charged particle beam apparatus
JPH11281554A (en) Material testing machine

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees