TWI265316B - Method for calibrating the deviation of OECFs and apparatus thereof - Google Patents
Method for calibrating the deviation of OECFs and apparatus thereofInfo
- Publication number
- TWI265316B TWI265316B TW094111960A TW94111960A TWI265316B TW I265316 B TWI265316 B TW I265316B TW 094111960 A TW094111960 A TW 094111960A TW 94111960 A TW94111960 A TW 94111960A TW I265316 B TWI265316 B TW I265316B
- Authority
- TW
- Taiwan
- Prior art keywords
- image
- oecfs
- calibrating
- deviation
- characteristic value
- Prior art date
Links
- 230000003287 optical effect Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N17/00—Diagnosis, testing or measuring for television systems or their details
- H04N17/002—Diagnosis, testing or measuring for television systems or their details for television cameras
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14643—Photodiode arrays; MOS imagers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
Landscapes
- Engineering & Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
- General Health & Medical Sciences (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Control Of Indicators Other Than Cathode Ray Tubes (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Color Television Image Signal Generators (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing, Inspecting, Measuring Of Stereoscopic Televisions And Televisions (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094111960A TWI265316B (en) | 2005-04-15 | 2005-04-15 | Method for calibrating the deviation of OECFs and apparatus thereof |
US11/161,305 US7235770B2 (en) | 2005-04-15 | 2005-07-29 | Method for calibrating deviation of OECFs and apparatus thereof |
JP2005255871A JP2006300917A (ja) | 2005-04-15 | 2005-09-05 | 光電変換関数の偏差較正方法及び装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW094111960A TWI265316B (en) | 2005-04-15 | 2005-04-15 | Method for calibrating the deviation of OECFs and apparatus thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200636292A TW200636292A (en) | 2006-10-16 |
TWI265316B true TWI265316B (en) | 2006-11-01 |
Family
ID=37107611
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094111960A TWI265316B (en) | 2005-04-15 | 2005-04-15 | Method for calibrating the deviation of OECFs and apparatus thereof |
Country Status (3)
Country | Link |
---|---|
US (1) | US7235770B2 (zh) |
JP (1) | JP2006300917A (zh) |
TW (1) | TWI265316B (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7840067B2 (en) * | 2003-10-24 | 2010-11-23 | Arcsoft, Inc. | Color matching and color correction for images forming a panoramic image |
US20120212606A1 (en) * | 2011-02-20 | 2012-08-23 | Min-Hung Chien | Image processing method and image processing apparatus for dealing with pictures found by location information and angle information |
TWI683287B (zh) * | 2018-06-04 | 2020-01-21 | 財團法人國家實驗硏究院 | 膚色測定系統及方法、色彩描述檔產生方法以及影像擷取裝置 |
CN113844243B (zh) * | 2020-10-12 | 2023-06-16 | 友达光电股份有限公司 | 调光*** |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6768509B1 (en) * | 2000-06-12 | 2004-07-27 | Intel Corporation | Method and apparatus for determining points of interest on an image of a camera calibration object |
US6856713B2 (en) * | 2001-08-20 | 2005-02-15 | Polymicro Technologies, Llc | Optical component and method of making the same |
US7133148B2 (en) * | 2002-01-25 | 2006-11-07 | Hewlett-Packard Development Company, L.P. | Digital camera for image device calibration |
DE10233175A1 (de) * | 2002-07-22 | 2004-02-12 | Leica Microsystems Semiconductor Gmbh | Vorrichtung und Verfahren zum Kalibrieren eines opto-elektronischen Sensors und zur Vermessung von Strukturen auf einem Substrat |
-
2005
- 2005-04-15 TW TW094111960A patent/TWI265316B/zh not_active IP Right Cessation
- 2005-07-29 US US11/161,305 patent/US7235770B2/en not_active Expired - Fee Related
- 2005-09-05 JP JP2005255871A patent/JP2006300917A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
JP2006300917A (ja) | 2006-11-02 |
US7235770B2 (en) | 2007-06-26 |
US20060231735A1 (en) | 2006-10-19 |
TW200636292A (en) | 2006-10-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |