TWI257528B

TWI257528B - Positive resist composition

Info

Publication number: TWI257528B
Application number: TW089126726A
Authority: TW
Inventors: Kunihiko Kodama; Kenichiro Sato; Toshiaki Aoai
Original assignee: Fuji Photo Film Co Ltd
Priority date: 1999-12-16
Filing date: 2000-12-14
Publication date: 2006-07-01
Also published as: KR20010062443A; KR100733851B1

Abstract

Provided is a positive resist composition having excellent sensitivity and resolution, and even it is in course of heat treatment after exposure with time, a pattern profile having excellent resolution and little density dependency can be obtained by using a far-ultraviolet light, especially ArF excimer laser light used in microphotofabrication. A positive resist composition comprises a specifically structured photoacid generator having repeating units of at least two different structures, and a polymer having acid-decomposable groups.

Description

1257528 A71257528 A7

五、發明說明（1 ) 經濟部智慧財產局員工消費合作社印製 [技術領域] 本發明係有關一種製造超LSI或高容量微晶片等之超微光刻術工程或其他光阻應用工程中所使用的遠紫外線作爲曝光光源所得的正型阻體組成物，就別的觀點而言係有關使用含有準分子雷射光之遠紫外線範圍、尤其是 220nm以下之波長光以形成高精細化圖樣所得的正型阻體組成物。 [先前技術] 近年來，爲更提高積體回路之集積度，超LSI等之半導體基板製造中必須使其由半微米以下線寬所成的超微細圖樣加工。爲滿足該必要性時，使光刻術中所使用曝光裝置之使用波長更爲短菠化，且目前亦檢討遠紫外線中短波長之準分子雷射光（XeCl、KrF、ArF等）。該波長範圍中形成光刻術之圖樣所使用者係爲化學增幅系阻體。一般而言，化學增幅系阻體可分爲2成分系、2.5成分系、3成分系等3大類。2成分系保組合藉由光分解產生酸之化合物（以下稱爲光酸發生劑）與黏合劑樹脂。該黏合劑樹脂係爲藉由酸作用分解、在分子內具有使樹脂於鹼顯像液中溶解性增加的基（酸分解性基）之樹脂。2 . 5成分系係於2成分系中另含有具酸分解性基之低分子化合物。3成分系係爲含有光酸發生劑與鹼可溶性樹脂與上述低分子化合物者。上述化學增幅系阻體適合作爲紫外線或遠紫外線照射本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） --裝--- I (請先閱讀背面之注意事^填寫本頁) 1: I ·V. INSTRUCTIONS INSTRUCTIONS (1) Printing by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives [Technical Field] The present invention relates to an ultra-lithography engineering or other photoresist application engineering for manufacturing ultra-LSI or high-capacity microchips and the like. The positive-type resist composition obtained by using the far-ultraviolet light as an exposure light source is, in other respects, related to the use of light having a range of far ultraviolet rays containing excimer laser light, especially a wavelength of 220 nm or less, to form a high-definition pattern. Positive resist composition. [Prior Art] In recent years, in order to further increase the integration degree of the integrated circuit, it is necessary to process an ultrafine pattern formed by a line width of not more than half micron in the manufacture of a semiconductor substrate such as a super LSI. In order to satisfy this necessity, the wavelength of use of the exposure apparatus used in photolithography is made shorter, and short-wavelength excimer laser light (XeCl, KrF, ArF, etc.) in far ultraviolet rays is also currently reviewed. The user who forms the pattern of lithography in this wavelength range is a chemically amplified damper. In general, chemically amplified inhibitors can be classified into three major categories: a two-component system, a two-component system, and a three-component system. The two components are a combination of a compound which generates an acid by photolysis (hereinafter referred to as a photoacid generator) and a binder resin. The binder resin is a resin which is decomposed by an acid action and has a group (acid-decomposable group) which increases the solubility of the resin in the alkali developing solution in the molecule. 2. The 5 component is a low molecular compound having an acid-decomposable group in the two-component system. The component 3 is a photoacid generator and an alkali-soluble resin and the above-mentioned low molecular compound. The above chemical amplification system is suitable for UV or far ultraviolet irradiation. This paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 public) - Packing - I (please read the note on the back first) Page) 1: I ·

I257528 A7I257528 A7

五、發明說明（2 ) 用光阻劑，惟其中必須另具有對應於使用上述之要求特性。V. INSTRUCTIONS (2) A photoresist is used, but it must have another characteristic corresponding to the use of the above.

ArF光源用光阻劑組成物係提案有以具有乾式蝕刻耐性爲目的之導入脂環式烴部位的樹脂，惟脂環式烴部位導入之缺點係使系內變成極爲疏水性’故使習知作爲阻體顯像液廣爲使用的四甲銨氰化物（以下稱爲TMAH)水溶液之顯像極爲困難，且在顯像中會自基板剝離等現象產生。對應於該阻體之疏水化’檢討於顯像液中混入異丙醇等之有機溶劑等予以對應，雖可見其效果惟必須解決阻體膜膨脹或工程複雜等問題產生。阻體改良之方法，大多藉由導入親水基以彌補疏水之各脂環式烴部位的政策。於日本特開平10-10739號公報中揭示，含有使在主鏈中具有原菠烯環等脂環式構造之單聚物、馬來酸酐、具有羧基之單聚物聚合所得的聚合物之能量感受性阻體材料。特開平1〇_ 1 1 1 5696號公報中揭示，含有在主鏈中具有脂環式架構之樹脂與感放射線性酸發生劑之感放射線性樹脂組成物。經濟部智慧財產局員工消費合作社印製遠紫外線曝光用正型光阻劑組成物所使用的含酸分解性基之樹脂，一般係在分子內同時含有脂肪族環狀烴基。因此，樹脂爲疏水性，此係問題存在之起因。爲改良此點進行檢討上述各種方法，以上述之技術仍有很多不充分之處（尤其是有關顯像性）企求改善。在ArF曝光用化學增幅系光阻體中，進行檢討各種含上述酸分解性基之樹脂，惟仍有需改善之處。換言之’ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）五、發明說明（3 ) 對波長193nm之放射而言要求具充分的感度及解像力。另外，於曝光後直至加熱前即使經過長時間，仍可得優異的解像力及圖樣外型，即要求工程容許性大的化學增幅系光阻體。另外，有關疏密相關性之問題亦有需改善之處。最近儀器之傾向係爲包含各種圖樣，故對阻體而言要求具各種性能，其一係爲疏密相關性。換言之，儀器中線密集部分與相反的線相比，空間廣的圖樣、另存在孤立線。因此，具有提高各種線之再現性予以解像係極爲重要。然而’使各種線再現不容易藉由光學因素，而目前藉由阻體之解決方法亦不明確。尤其於上述含有脂環式基之阻體系中孤立圖樣與密集圖樣之性能差顯著，企求予以改善。 [發明之揭示] 本發明之目的係爲提高使用還紫外線、尤其是Ai*F準分子雷射光之上述微刻應用工程原有的性能之技術課題 ’具體而言，係提供一種於感度及解像力優異、且即使曝光後直至後加熱之經過相當長時間仍可得優異的解像力及圖樣外型、工程容許性優異的正型阻體組成物。本發明人等再三深入硏究正型化學增幅系之阻體組成物的構成材料結果，發現藉由使用特定光酸發生劑之組合與特定的酸分解性樹脂，達成本發明之目的，遂而完成本發明。換言之’上述目的可藉由下述構成予以達成。本紙張尺度適用中國國家標準（CNS)A4規格（210In the photoresist composition for ArF light source, a resin introduced into the alicyclic hydrocarbon moiety for the purpose of dry etching resistance has been proposed, but the disadvantage of introduction of the alicyclic hydrocarbon moiety is that the interior becomes extremely hydrophobic. The development of an aqueous solution of tetramethylammonium cyanide (hereinafter referred to as TMAH) which is widely used as a barrier developer is extremely difficult, and it may cause peeling from the substrate during development. Corresponding to the hydrophobization of the resisting body, the organic solvent such as isopropyl alcohol is mixed in the developing liquid, and the effect is obtained, but the effect of the expansion of the resistive film or the complicated engineering must be solved. The method of improving the barrier is to compensate for the hydrophobic alicyclic hydrocarbon moiety by introducing a hydrophilic group. Japanese Laid-Open Patent Publication No. Hei 10-10739 discloses the energy of a polymer obtained by polymerizing a monomer having an alicyclic structure such as a raw ribene ring in a main chain, maleic anhydride, or a monomer having a carboxyl group. Receptive barrier material. Japanese Laid-Open Patent Publication No. Hei No. 1 1 1 5696 discloses a radiation-sensitive resin composition containing a resin having a alicyclic structure in a main chain and a radiation-sensitive acid generator. Printed by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumers' Cooperatives. The acid-decomposable group-containing resin used in the composition of the positive-type photoresist for extreme ultraviolet exposure generally contains an aliphatic cyclic hydrocarbon group in the molecule. Therefore, the resin is hydrophobic, and this is the cause of the problem. In order to improve this point, the above various methods are reviewed, and there are still many inadequacies (especially regarding development) in the above-mentioned technologies. In the chemically amplified photoresist of ArF exposure, various resins containing the above acid-decomposable groups were examined, but there is still room for improvement. In other words, the paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). V. Description of the invention (3) It is required to have sufficient sensitivity and resolution for radiation with a wavelength of 193 nm. Further, even after a long period of time after exposure until heating, an excellent resolution and pattern appearance, that is, a chemically amplified photoresist having a large engineering tolerance, can be obtained. In addition, there are also areas for improvement regarding the relevance of sparseness. Recently, the tendency of the instrument is to include various patterns, so that various properties are required for the barrier body, and one of them is density-related. In other words, the dense line of the instrument has a wide-space pattern and an isolated line compared to the opposite line. Therefore, it is extremely important to improve the reproducibility of various lines and to solve the image. However, it is not easy to reproduce various lines by optical factors, and the current solution by means of a resist is not clear. In particular, the performance of the isolated pattern and the dense pattern in the above-mentioned alicyclic-based resist system is remarkable, and it is intended to be improved. [Disclosure of the Invention] The object of the present invention is to improve the technical problem of using the original performance of the above-mentioned micro-inscription application engineering of ultraviolet rays, especially Ai*F excimer laser light. Specifically, it provides a sensitivity and resolution. It is excellent, and even after a long period of time after exposure to post-heating, a positive resist composition having excellent resolution, pattern appearance, and engineering admissibility can be obtained. The inventors of the present invention have further intensively studied the constituent materials of the resist composition of the positive chemical amplification system, and found that the object of the present invention is achieved by using a combination of specific photoacid generators and a specific acid-decomposable resin. The present invention has been completed. In other words, the above object can be achieved by the following constitution. This paper scale applies to the Chinese National Standard (CNS) A4 specification (210

X 297公釐） 1257528 A7 _B7 五、發明說明（5 )X 297 mm) 1257528 A7 _B7 V. Description of invention (5)

!?〇1 —(-ch2—C!?〇1 —(-ch2—C

經濟部智慧財產局員工消費合作社印製於上述一般式（I’）、（Π’）中， R()1係各爲獨立的氫原子或碳數1〜4之烷基；R〇2係表示碳數1〜4之院基； W係表示單鍵或單獨選自伸院基、醚基、硫醚基、羰基、酯基所成群之基或2種以上組合之基；The Ministry of Economic Affairs Intellectual Property Office employee consumption cooperative is printed in the above general formula (I'), (Π'), each of R()1 is an independent hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R〇2 system a group representing a carbon number of 1 to 4; W means a single bond or a group selected from the group consisting of a stretching group, an ether group, a thioether group, a carbonyl group, an ester group, or a combination of two or more kinds;

Lc中Ra、Rb、Rc、Rd、Re、Rf係各表不獨立的氫原子本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（In the Lc, Ra, Rb, Rc, Rd, Re, and Rf are independent hydrogen atoms. The paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). 1257528 A7 B7 V. Description of the invention (

R 25 (I) (II)R 25 (I) (II)

R 35 經濟部智慧財產局員工消費合作社印製 (III) (其中，hxRn係爲相同或不同的氫原子、直鏈狀、支鏈狀或環狀烷基、直鏈狀、支鏈狀或環狀烷氧基、羥基、鹵素原子、或- S-R38 ; R38係表示直鏈狀、支鏈狀或環狀烷基或芳基；Ri〜R15、R16〜R27、R28〜R37中有2個以上鍵結形成含有1種或2種以上之單鍵、碳、、硫、及氮的環） (5 )如（2 )記載的正型阻體組成物，其中，上述一般式 (11π )所示之重覆構造單位係爲下述一般式（11、A )或％ -10- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）氧 1257528 五、發明說明（f 般式（I I ^ B )所示之重覆構造單位R 35 Printed by the Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative (III) (where hxRn is the same or different hydrogen atom, linear, branched or cyclic alkyl, linear, branched or cyclic Alkoxy, hydroxy, halogen atom, or -S-R38; R38 represents a linear, branched or cyclic alkyl or aryl group; two of Ri~R15, R16~R27, R28~R37 The above bond forms a ring containing one or more kinds of single bonds, carbon, sulfur, and nitrogen. (5) The positive resist composition according to (2), wherein the general formula (11π) The repeating structural unit shown is the following general formula (11, A) or % -10- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) Oxygen 1257528 V. Invention description (f Repeated structural unit shown by formula (II ^ B )

1616

、16 15 經濟部智慧財產局員工消費合作社印製 (其中’ ^13〜^16係各表示獨立的氫原子、鹵素原子、氰基、-COOH、-〇〇〇IT5(R，5係與上述同義）、藉由酸作用之基、-C( = 〇)-X-A-R’17、或可具取代基之烷基或環狀烴基；而且，R|13〜R’16中至少2個鍵結形成環；其中 X及A係各與上述同義；R’ 17係爲-COOH、-COOR· 5、-CN、羥基、可具取代基之烷氧基、-〇0-關-^6、-(：0-關-3〇2-R’6(R’5、『6係各與上述同義）或上述-Y基； η係爲0或1 ) (6)如（1)或（2)記載的正型阻體組成物，其中，另含有含氮鹼性化合物。 (7 )如（1 )或（2 )記載的正型阻體組成物，其中，含有氟系及/或矽系界面活性劑。 (8)如（1)或（2)記載的正型阻體組成物，其中，以波長 220nm以下之活性光線或放射線照射。 [發明之實施形態] 於下述中，說明有關本發明之正型阻體組成物中所使用的化合物及該組成物之使用方法等。 -11- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1 ---- (請先閱讀背面之注意事:填寫本頁) f 經濟部智慧財產局員工消費合作社印製 1257528 A7 __— _ B7____ 五、發明說明（1()) [1 ](A)藉由活性光線或放射線照射產生酸之光酸發生劑本發明中係爲數種選自陽離子部分以碘鐃或銃所構成，陰離子部分以RFS03_(其中，^係爲碳數1〜10之氟取代的烷基）所示陰離子構成之磺酸鹽的光酸發生劑。以RF所示之氟取代的烷基可以爲直鏈、支鏈、環狀。較佳的RF係以CF3(CF2)y表示，y爲0〜9之整數的氟取代直鏈狀烷基。本發明係爲於上述數種光酸發生劑中存在有至少一對上述RF之碳數差爲2〜8、較佳者爲3〜7之光酸發生劑。例如使用RF之碳數各爲3、4、5之3種光酸發生劑時，滿足存在一對RF之碳數差爲2〜8之光酸發生劑的上述條件。另外，使用RF之碳數各爲2、6、8之3種光酸發生劑時，存在有3對滿足上述條件。上述數種光酸發生劑中形成對之光酸發生劑的比例以 50〜100莫耳％較佳、更佳者爲70〜100莫耳％。本發明之正型阻體組成物係藉由同時含有滿足上述條件之數種光酸發生劑、詳言之爲下述之（B)特定樹脂（B-1)或聚合物（B-2)，於使用ArF準分子雷射光之微光阻應用工程中可得具有優異感度及解像力、於曝光後至加熱之經時中仍具有優異的解像力及圖樣外型的結果。較佳的形態中，於至少一對陰離子之RF的碳數差爲2 〜8之光酸發生劑中可之碳數相對大的光酸發生劑之可係爲碳數4〜10直鏈狀氟取代烷基（以下該光酸發生劑簡稱爲「光酸發生劑A1」）、且RF之碳數相對小的光酸發生 -12- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --裝--------訂---------· (請先閱讀背面之注意事:填寫本頁) 镛 1257528 經濟部智慧財產局員工消費合作社印製 A7 B7_ 五、發明說明（11 ) 劑之RF爲碳數1〜5直鏈狀氟取代的烷基（以下該光酸發生劑簡稱爲「光酸發生劑A2」）。此外，光酸發生劑A 1與光酸發生劑A2之莫耳比（A1 / A2 ) 以90/10〜10/90較佳、更佳者爲80 / 20〜20/ 80。光酸發生劑之陽離子部分係以上述一般式（I )〜（111 ) 所示者較佳。於一般式（I)〜（III)中，1〜Ιί38之直鏈狀、支鏈狀烷基例如可具取代基之甲基、乙基、丙基、正丁基、第 2 -丁基、第3 -丁基之碳數1〜4個者。環狀院基例如可具取代基之環丙基、環戊基、環己基之碳數3〜8個者。 R37之直鏈狀、支鏈狀烷氧基例如有甲氧基、乙氧基、羥基乙氧基、丙氧基、正丁氧基、異丁氧基、第 2 -丁氧基、第3 -丁氧基之碳數1〜4個者。環狀烷氧基爲環戊氧基、例如環戊氧基、環己氧基。16 15 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed (where '^13~^16 series each represents an independent hydrogen atom, a halogen atom, a cyano group, -COOH, -〇〇〇IT5 (R, 5 series and above) Synonymous), an acid-based group, -C(= 〇)-XA-R'17, or a substitutable alkyl group or a cyclic hydrocarbon group; and, at least two bonds of R|13 to R'16 The knot forms a ring; wherein X and A are each synonymous with the above; R' 17 is -COOH, -COOR·5, -CN, hydroxy, alkoxy having a substituent, -〇0-off-^6, -(:0-off-3〇2-R'6 (R'5, "6-series are synonymous with the above" or the above -Y base; η is 0 or 1) (6) as (1) or (2) And a positive-type resist composition according to (1) or (2), which contains a fluorine-based and/or a lanthanide-based compound. (8) The positive resist composition according to (1) or (2), which is irradiated with active light or radiation having a wavelength of 220 nm or less. [Embodiment of the Invention] a compound used in the positive resist composition of the present invention and the How to use the composition, etc. -11- The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1 ---- (Please read the back note: fill out this page) f Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed 1257528 A7 ___ _ B7____ V. INSTRUCTIONS (1()) [1] (A) Photoacid generators which generate acid by active light or radiation. Several types of the present invention are used in the present invention. a photoacid generator selected from the group consisting of iodonium or ruthenium, and an anion moiety of a sulfonate composed of an anion represented by RFS03_ (wherein, an alkyl group substituted with a fluorine having 1 to 10 carbon atoms). The fluorine-substituted alkyl group shown may be linear, branched or cyclic. Preferred RF is represented by CF3(CF2)y, and y is a fluorine-substituted linear alkyl group of an integer of 0-9. A photoacid generator having at least one pair of the RF having a carbon number difference of 2 to 8, preferably 3 to 7 in the plurality of photoacid generators. For example, the carbon number of each of RF is 3, In the case of three kinds of photoacid generators of 4 and 5, the above conditions satisfying the existence of a pair of photoacid generators having a carbon number difference of 2 to 8 are satisfied. When the number of carbon atoms of the RF is 2, 6, or 8 of the photoacid generators, there are three pairs satisfying the above conditions. The ratio of the photoacid generators formed in the above plurality of photoacid generators is 50 to 100. The ear % is preferably more preferably 70 to 100 mol %. The positive type resist composition of the present invention contains a plurality of photoacid generators satisfying the above conditions, in particular, the following (B Specific resin (B-1) or polymer (B-2), which has excellent sensitivity and resolution in the application of micro-resistance using ArF excimer laser light, and still has a longitude after exposure to heating. Excellent resolution and results of the appearance of the pattern. In a preferred embodiment, the photoacid generator having a relatively large carbon number in the photoacid generator having a carbon number difference of 2 to 8 of at least one pair of anions may be a linear number of 4 to 10 carbon atoms. Fluorine-substituted alkyl group (hereinafter, the photoacid generator is abbreviated as "photoacid generator A1"), and photo-acid generation with relatively small carbon number is -12- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) -------------------------· (Please read the note on the back: fill out this page) 镛1257528 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative Printing A7 B7_ V. INSTRUCTION DESCRIPTION (11) The RF of the agent is an alkyl group having a carbon number of 1 to 5 linear fluorine substitution (hereinafter, the photoacid generator is simply referred to as "photoacid generator A2"). Further, the molar ratio (A1 / A2) of the photoacid generator A 1 to the photoacid generator A 2 is preferably 90/10 to 10/90, more preferably 80 / 20 to 20/80. The cationic portion of the photoacid generator is preferably those represented by the above general formulas (I) to (111). In the general formulae (I) to (III), a linear or branched alkyl group of 1 to Ιί38 may be, for example, a methyl group, an ethyl group, a propyl group, a n-butyl group or a second-butyl group which may have a substituent. The number of carbons of the 3rd - butyl group is 1 to 4. The cyclic building group may have, for example, a cyclopropyl group, a cyclopentyl group or a cyclohexyl group having 3 to 8 carbon atoms. The linear or branched alkoxy group of R37 is, for example, a methoxy group, an ethoxy group, a hydroxyethoxy group, a propoxy group, a n-butoxy group, an isobutoxy group, a 2-butoxy group, or a third group. - The number of carbons of the butoxy group is 1 to 4. The cyclic alkoxy group is a cyclopentyloxy group such as a cyclopentyloxy group or a cyclohexyloxy group.

Ri〜R37之鹵素原子例如有氟原子、氯原子、溴原子、碘原子。 R38之芳基例如有苯基、甲苯基、甲氧基苯基、萘基之可具取代基之碳數6〜14個者。此等較佳的取代基係以碳數1〜4個之烷氧基、鹵素原子（氟原子、氯原子、碘原子）、碳數6〜10個之芳基、碳數2〜6個之烯基 '氰基、羥基、羧基、烷氧基羰基、硝基等。、R16〜R27、R28〜R37中有2個以上鍵結形成含有1種或2種以上之單鍵、碳、氧、硫、及氮之環，例 -13- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） ϋ ϋ a^i 1 i·— n ϋ· 訂--------- (請先閱讀背面之注意事項再填寫本頁) 1257528 A7 B7五、發明說明（12 )如呋喃環、二氫呋喃環、吡喃環、三氫吡喃環、噻吩環、吡咯環等。本發明可使用的光酸發生劑A1之具體例（A1 -1 )〜（A1 -64)係如下述。 IB— n ϋ tat 1 ϋ 一口、I I ϋ I ϋ· «1 ϋ I (請先閱讀背面之注意事<^填寫本頁) 1 t 經濟部智慧財產局員工消費合作社印製 -14- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（0The halogen atom of Ri to R37 may, for example, be a fluorine atom, a chlorine atom, a bromine atom or an iodine atom. The aryl group of R38 is, for example, a phenyl group, a tolyl group, a methoxyphenyl group or a naphthyl group having 6 to 14 carbon atoms which may have a substituent. These preferred substituents are an alkoxy group having 1 to 4 carbon atoms, a halogen atom (a fluorine atom, a chlorine atom, an iodine atom), an aryl group having 6 to 10 carbon atoms, and a carbon number of 2 to 6 Alkenyl 'cyano, hydroxy, carboxy, alkoxycarbonyl, nitro, and the like. Two or more of R16 to R27 and R28 to R37 are bonded to each other to form a ring containing one or more kinds of single bonds, carbon, oxygen, sulfur, and nitrogen. Example-13- This paper scale applies to Chinese national standards ( CNS)A4 specification (210 X 297 public) ϋ ϋ a^i 1 i·- n ϋ· order--------- (please read the notes on the back and fill out this page) 1257528 A7 B7 , invention description (12) such as furan ring, dihydrofuran ring, pyran ring, trihydropyran ring, thiophene ring, pyrrole ring and the like. Specific examples (A1 -1 ) to (A1 - 64) of the photoacid generator A1 which can be used in the present invention are as follows. IB— n ϋ tat 1 ϋ one, II ϋ I ϋ· «1 ϋ I (please read the note on the back first) <^fill this page) 1 t Ministry of Economic Affairs Intellectual Property Bureau Employees Consumption Cooperative Printed-14- This paper The scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (0

S十 CF3(CF2)3S03一 (A1-1) s+ CF3(CF2)7S〇3 (A1 - 3)S 十 CF3(CF2)3S03 - (A1-1) s+ CF3(CF2)7S〇3 (A1 - 3)

S十 CF3(CF2)3SO; 3 (A1 - 5)S 十 CF3(CF2)3SO; 3 (A1 - 5)

Cl (A1-9) t-Bu CF3(CF2)5S〇3 (A1 - 2) S+ CF3(CF2)9S〇3 (A1 - 4) S+CF3(CF2)5S〇3Cl (A1-9) t-Bu CF3(CF2)5S〇3 (A1 - 2) S+ CF3(CF2)9S〇3 (A1 - 4) S+CF3(CF2)5S〇3

3 (A1-6)3 (A1-6)

t-Bu 裝---- (請先閱讀背面之注意事項#填寫本頁) 11111111 經濟部智慧財產局員工消費合作社印製t-Bu 装---- (Please read the notes on the back #fill this page) 11111111 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

S+ CF3(CF2)3S〇3S+ CF3(CF2)3S〇3

CF3(CF2)7S〇3 t-Bu (A1-11) t-Bu (A1-12) -15- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（l + Q-κCF3(CF2)7S〇3 t-Bu (A1-11) t-Bu (A1-12) -15- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of the invention (l + Q-κ

t-But-Bu

t-Bu CF3(CF2)3S〇3t-Bu CF3(CF2)3S〇3

CF 3(CF2)7S〇3 (A1-13)CF 3(CF2)7S〇3 (A1-13)

cf3(cf2)3so3一Cf3(cf2)3so3 one

Or (A1 -14)Or (A1 -14)

(請先閱讀背面之注意事項却填寫本頁) 1 裝(Please read the notes on the back and fill in this page) 1

H^COH^CO

ClCl

(A1-17) 、~Qr(A1-17), ~Qr

ClCl

(A1-18) 訂---- 經濟部智慧財產局員工消費合作社印製(A1-18) Order---- Printed by the Consumers' Cooperative of the Intellectual Property Office of the Ministry of Economic Affairs

H3C〇， H.COH3C〇, H.CO

H3COH3CO

-16- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）-16- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm)

1257528 A7 B7 五、發明說明（（r1257528 A7 B7 V. Description of invention ((r

Et〇Et〇

CF3(CF2)3S〇3 EtOCF3(CF2)3S〇3 EtO

S CF3(CF2)7S〇3 (A1-21) (A1 - 22)S CF3(CF2)7S〇3 (A1-21) (A1 - 22)

vJ卞vJ卞

CF3(CF2)5S〇3 (A1-24)CF3(CF2)5S〇3 (A1-24)

S々 CF3(CF2)3S〇3S々 CF3(CF2)3S〇3

(A1 - 25)(A1 - 25)

<Q>- S S/+ CF3(CF2)7S〇3<Q>- S S/+ CF3(CF2)7S〇3

(A1 - 26) -·裝------ (請先閱讀背面之注意事填寫本頁) 1 訂--------- t 經濟部智慧財產局員工消費合作社印制衣(A1 - 26) -·装------ (Please read the note on the back to fill out this page) 1 Order --------- t Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed Clothes

-17- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（+-17- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention description (+

經濟部智慧財產局員工消費合作社印製 ^1 -------^訂---------. (請先閱讀背面之注意事_填寫本頁)Printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Staff and Consumer Cooperatives ^1 -------^定---------. (Please read the notes on the back _ fill out this page)

H3C〇H〇^S( CF3(CF2)7S03~ h3coH3C〇H〇^S( CF3(CF2)7S03~ h3co

(A1-31)(A1-31)

s 2 CF3(CF2)3S03一 (A1-33)s 2 CF3(CF2)3S03 one (A1-33)

S 2 CF3(CF2)5S03一 (A1-34)S 2 CF3(CF2)5S03 one (A1-34)

S 2 CF^CF+SC^ (A1-35) *18·S 2 CF^CF+SC^ (A1-35) *18·

I 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（αI This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (α

s 2 CF3(CF2)gS03· (A1-36)s 2 CF3(CF2)gS03· (A1-36)

S 2 CF3(CF2)3S03一 (A1-37) 裝------ (請先閱讀背面之注意事填寫本頁)S 2 CF3(CF2)3S03 one (A1-37) Packing ------ (Please read the note on the back to fill out this page)

II

ClCl

S 2 CF3(CF2)7S03一 (A1 - 38) 訂--------- Φ 經濟部智慧財產局員工消費合作社印製S 2 CF3(CF2)7S03- (A1 - 38) Order--------- Φ Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

S 2 CF3(CF2)3S03^ (A1-39) »19· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7S 2 CF3(CF2)3S03^ (A1-39) »19· This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7

五、發明說明（CIV. Description of the invention (CI

S 2 CF3(CF2)5S〇3一S 2 CF3(CF2)5S〇3

S 2 CF3(CF2)3S〇fS 2 CF3(CF2)3S〇f

_S 2 CF3(CF2)9S〇3- (請先閱讀背面之注意事:填寫本頁) t-裝填寫士 f 經濟部智慧財產局員工消費合作社印製_S 2 CF3(CF2)9S〇3- (Please read the note on the back: fill out this page) t-装填填士 f Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

S 2 CF3(CF2)3S〇：f »20— 本紙張尺度適用中國國家標準（CNS)A4規格（210 χ 297公釐） 1257528 A7 B7 五、發明說明（βS 2 CF3(CF2)3S〇:f »20— This paper scale applies to China National Standard (CNS) A4 specification (210 297 297 mm) 1257528 A7 B7 V. Invention description (β

0(CH2)20H0(CH2)20H

s 2 CF3(CF2)7S03- /Ο)： CF3(CF2)3S〇3 (A1 - 45)s 2 CF3(CF2)7S03- /Ο): CF3(CF2)3S〇3 (A1 - 45)

+0)r+0)r

CF3(CF2)5S〇3 2 (A1-46)CF3(CF2)5S〇3 2 (A1-46)

CF3(CF2)9S〇3 2 (A1-48)CF3(CF2)9S〇3 2 (A1-48)

CF3(CF2)5SOJ 2 (A1-50) (請先閱讀背面之注意事項再填寫本頁) 裝 ----訂--- 經濟部智慧財產局員工消費合作社印製 I 十cf3(cf2)7so3- (A1-51) l+ CF3(CF2)3S〇3 (A1—53) 0)rCF3(CF2)5SOJ 2 (A1-50) (Please read the note on the back and fill out this page) Pack----Order--- Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Print I Ten cf3(cf2)7so3 - (A1-51) l+ CF3(CF2)3S〇3 (A1—53) 0)r

CF3(CF2)9S〇3 (A1-52) CF3(CF2)7S〇3 (A1-54) 1 〇 - C8H17 CF3(CF2)3S〇; (A1-55) CF3(CF2)7S〇3 (A1-56) .21· 1 $紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（/)CF3(CF2)9S〇3 (A1-52) CF3(CF2)7S〇3 (A1-54) 1 〇- C8H17 CF3(CF2)3S〇; (A1-55) CF3(CF2)7S〇3 (A1- 56) .21· 1 $ Paper scale applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention description (/)

MeOMeO

l+ CF3(CF2)3SO; ( MeQ~^^^)r ·+ CF3(CF2)7S〇J (A1-57) (A1 - 58) .-ον. C|-<U^ I CF3(CF2)3S〇3 (A1 - 59)l+ CF3(CF2)3SO; ( MeQ~^^^)r ·+ CF3(CF2)7S〇J (A1-57) (A1 - 58) .-ον. C|-<U^ I CF3(CF2) 3S〇3 (A1 - 59)

I CF3(CF2)7S〇3 (A1 - 60)I CF3(CF2)7S〇3 (A1 - 60)

CF 3(CF 2)3^^3 (A1-61) CF3(CF2)5S〇3 (A1 - 62) 經濟部智慧財產局員工消費合作社印製 NHC〇C8H17 CF3(CF2)3S〇3 (A1 - 63) Οτ(~Ότ NHCOC8H17 CF3(CF2)9S〇3 (A1~64) 本發明可使用的光酸發生劑A 2之具體例（A 2 - 1 ) (A 2 - 5 8 )如下所示。本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（yCF 3(CF 2)3^^3 (A1-61) CF3(CF2)5S〇3 (A1 - 62) Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed NHC〇C8H17 CF3(CF2)3S〇3 (A1 - 63) Οτ(~Ότ NHCOC8H17 CF3(CF2)9S〇3 (A1 to 64) Specific examples (A 2 - 1 ) (A 2 - 5 8 ) of the photoacid generator A 2 which can be used in the present invention are shown below. This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). 1257528 A7 B7 V. Description of invention (y

S CF3SOJS CF3SOJ

(A2-1) S CF3CF2SO3 (A2 - 2)(A2-1) S CF3CF2SO3 (A2 - 2)

S+ CF3(CF2)2S〇3 (A2 - 3)S+ CF3(CF2)2S〇3 (A2 - 3)

3 (A2-5) S cf3so3 S 十 CF3(CF2)2SO; (A2 - 7) Cl3 (A2-5) S cf3so3 S X CF3(CF2)2SO; (A2 - 7) Cl

CF 3SO3CF 3SO3

cf3(cf2)3s〇3 (A2-4) S+CF3CF2S〇3 3 (A2 - 6)Cf3(cf2)3s〇3 (A2-4) S+CF3CF2S〇3 3 (A2 - 6)

S CF3(CF2)3S〇3 3 (A2 - 8) ClS CF3(CF2)3S〇3 3 (A2 - 8) Cl

CF3(CF2)3S〇3 (請先閱讀背面之注意事裝—— 填寫本頁) ·CF3(CF2)3S〇3 (Please read the note on the back first - fill out this page)

Cl (A2-9)Cl (A2-9)

Cl (A2-10) 經濟部智慧財產局員工消費合作社印製Cl (A2-10) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

t-But-Bu

CF3SO3 t-Bu (A2-11) t-BuCF3SO3 t-Bu (A2-11) t-Bu

-23- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明)-23- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention)

OKOK

t-But-Bu

t-Bu CF 3SO3t-Bu CF 3SO3

<Q>-S/+ CF3(CF2)3S〇3 b (A2-13) (A2 -14)<Q>-S/+ CF3(CF2)3S〇3 b (A2-13) (A2 -14)

Et〇 -〇)：s+ CF3S03 (A2 -15)Et〇 -〇):s+ CF3S03 (A2 -15)

EtO ，S+CF3(CF2)3S〇一3EtO, S+CF3(CF2)3S〇一3

S+ cf3so3—S+ cf3so3—

(A2 -16)(A2 -16)

(A2-17) Me〇(A2-17) Me〇

Me〇Me〇

·ϋ ϋ ϋ n ϋ I 一 δ、I ·1 I i n ϋ I -^1 I (請先閱讀背面之注意事^^:填寫本頁) 1 經濟部智慧財產局員工消費合作社印製·ϋ ϋ ϋ n ϋ I δ, I ·1 I i n ϋ I -^1 I (Please read the note on the back first ^^: fill this page) 1 Printed by the Intellectual Property Office of the Ministry of Economic Affairs

HOHO

-24- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）-24- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm)

1257528 A7 B7 五、發明說明（ο1257528 A7 B7 V. Description of invention (ο

〇~s~〇~s\+ cf3s〇3〇~s~〇~s\+ cf3s〇3

(A2-23)(A2-23)

S —S + cf3(cf2)3so3 (請先閱讀背面之注意事項^填寫本頁) 裝 (A2-24) CF3SO3S —S + cf3(cf2)3so3 (Please read the notes on the back ^fill this page) Install (A2-24) CF3SO3

s+ cf3(cf2)3so3- 3 (A2-26) (A2 - 25)s+ cf3(cf2)3so3- 3 (A2-26) (A2 - 25)

S 2 CF3S〇3~S 2 CF3S〇3~

I I I I · I II I I I · I I

經濟部智慧財產局員工消費合作社印製 (A2-27)Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative (A2-27)

S 2 CF3CF2S03一 -25- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明)S 2 CF3CF2S03 -25- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention)

S 2 CF3(CF2)2S〇3 (A2-29)S 2 CF3(CF2)2S〇3 (A2-29)

S 2 CF3(CF2)3S〇3 (A2-30)S 2 CF3(CF2)3S〇3 (A2-30)

S 2 CF3SO3 wr裝--------訂---- (請先閱讀背面之注意事項再填寫本頁)S 2 CF3SO3 wr------------- (Please read the note on the back and fill out this page)

# 經濟部智慧財產局員工消費合作社印製#部部, Intellectual Property Bureau, Staff Consumer Cooperative, Printed

S 2 CF3(CF2)3S〇； -26- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（S 2 CF3(CF2)3S〇; -26- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (

S 2 CF3S03一S 2 CF3S03

S 2 CF3CF2S〇3一 •S 2CF3S〇3一 ---------訂·--- (請先閱讀背面之注意事項4<填寫本頁) 1S 2 CF3CF2S〇3一 •S 2CF3S〇3一 ---------Book·-- (Please read the back note 4<fill this page) 1

CI 經濟部智慧財產局員工消費合作社印製CI Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed

CICI

SS

S 2 CF3(CF2)3S〇3— "27* 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 經濟部智慧財產局員工消費合作社印製S 2 CF3(CF2)3S〇3—"27* This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

1257528 A7 B7 經濟部智慧財產局員工消費合作社印製1257528 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

1257528 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（28) 其中，光酸發生劑A1係以CF3(CF2)3S03H、產生 CF3(CF2)3S03H之化合物較佳，光酸發生劑A2係以 CF3S03H、產生CF3(CF2)3S03H之化合物較佳。光酸發生劑A1與A2之較佳組合（光酸發生劑A1/A2、以產生之酸表示）係爲 cf3(cf2)3so3h/cf3so3h、cf3(cf2)7so3h/cf3s〇3h 、cf3(cf2)7so3h/cf3(cf2)3so3h 。 (A)光酸發生劑之添加量以組成物中之固成份爲基準、通常使用0.001〜40重量％較佳者爲0.01〜20重量％、更佳者爲0. 1〜5重量％。若光酸發生劑之添加量小於0.001 重量％時感度降低，而若大於40重量％時阻體之光吸收過高、外型不佳、且工程（尤其是烘烤）範圍狹窄，故不爲企求。本發明之正型阻體組成物可倂用除上述特定的化合物外之光酸發生劑。可倂用的光酸發生劑係可使用光陽離子聚合之光起始劑、光游離基聚合之光起始劑、色素類之光消色劑、光變色劑、或微阻體等所使用的習知光（ 400〜200ιιιώ之紫外線、尤以g線、h線、I線、KrF準分子雷射光）、ArF準分子雷射光、電子線、X線、分子線或離子束以產生酸之化合物及適當地選擇此等混合物。而且，倂用其他所得的光酸發生劑例如二偶氮鐵鹽、銨鹽、磷鏺鹽、碘鏺鹽、毓鹽、硒鏺鹽、砷鏺鹽、有機鹵素化合物、有機金屬/有機鹵化物、具有鄰-硝基苯甲基型保護基之光發生劑、胺基磺酸酯等典型的光分解而 -30- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） r-裝--------訂--- (請先閱讀背面之注意事項再填寫本頁)1257528 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed A7 B7 V. Invention description (28) Among them, photoacid generator A1 is CF3(CF2)3S03H, CF3(CF2)3S03H is preferred, photoacid generator A2 is preferably a compound having CF3S03H and producing CF3(CF2)3S03H. A preferred combination of photoacid generators A1 and A2 (photoacid generator A1/A2, expressed as acid) is cf3(cf2)3so3h/cf3so3h, cf3(cf2)7so3h/cf3s〇3h, cf3(cf2) 7so3h/cf3(cf2)3so3h. The amount of the photo-acid generator is from 0.01 to 20% by weight, preferably from 0.01 to 20% by weight, more preferably from 0.1 to 5% by weight, based on the solids of the composition. If the amount of the photoacid generator added is less than 0.001% by weight, the sensitivity is lowered, and if it is more than 40% by weight, the light absorption of the resist is too high, the appearance is poor, and the engineering (especially baking) is narrow, so it is not seek. The positive resist composition of the present invention can be used as a photoacid generator other than the above specific compound. The photoacid generator which can be used may be a photo-cationic polymerization photoinitiator, a photo-radical polymerization photoinitiator, a dye-based photochromic agent, a photochromic agent, or a micro-resistance. Xizhiguang (400~200ιιιώ ultraviolet, especially g-line, h-line, I-line, KrF excimer laser), ArF excimer laser, electron beam, X-ray, molecular line or ion beam to produce acid compounds and appropriate These mixtures are selected. Further, other photoacid generators such as diazo iron salt, ammonium salt, phosphonium salt, iodonium salt, phosphonium salt, selenium salt, arsenic antimony salt, organohalogen compound, organometallic/organic halide are used. Typical photodegradation of photo-generating agents such as o-nitrobenzyl protected groups, amino sulfonates, etc. -30- This paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) R-装--------book--- (please read the notes on the back and fill out this page)

I 1257528 A7 B7 五、發明說明（ 29 產生磺酸之化合物、二偶氮酮楓、二偶氮二颯化合物等。而且，此等藉由光產生酸之基、或使化合物導入聚合物之主鏈或側鏈之化合物。此外，亦可使用 V.N.R.Pillai，Synthesis，（1)，1(1980) 、A.Abad et al，Tetrahedron Lett. ,( 47 ) 4555 ( 1 97 1 )、 D.H.R.Barton et al，J.Chem.Soc.，（C)，329( 1 970 )、美國專利第3，799，778號、歐洲專利第126，712號所記載的藉由光產生酸之化合物。於上述藉由活性光線或放射線照射分解產生酸之化合物中，尤爲有效者例如下述一般式（PAG3)、一般式 (PAG4)、一*般式（Ρ Α 之化合物I 1257528 A7 B7 V. DESCRIPTION OF THE INVENTION (29 A compound which produces a sulfonic acid, a diazoxanthene, a diazobisindene compound, etc. Moreover, these are the bases which generate an acid by light, or introduce a compound into a polymer. a compound of a chain or a side chain. Alternatively, VNRPillai, Synthesis, (1), 1 (1980), A. Abad et al, Tetrahedron Lett., (47) 4555 (1 97 1 ), DHR Barton et al. a compound which generates an acid by light as described in J. Chem. Soc., (C), 329 (1 970), U.S. Patent No. 3,799,778, and European Patent No. 126,712. Among the compounds which are decomposed by active light or radiation to produce an acid, such as the following general formula (PAG3), general formula (PAG4), and a general formula (Ρ Α compound)

Ar,Ar,

R 丨203R 丨203

Θ ΘI Z R204-S0 ΖΘΘ ΘI Z R204-S0 ΖΘ

Ar2 (PAG3) R脏 (PAG4) i裝--------訂--- I (請先閱讀背面之注意事:填寫本頁) 經濟部智慧財產局員工消費合作社印製 R206-SOrO-Ν (PAG6) 〇 Μ R-S·Ar2 (PAG3) R dirty (PAG4) i-------- set--- I (please read the note on the back: fill out this page) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed R206-SOrO -Ν (PAG6) 〇Μ RS·

I ΟI Ο

s—R 0 O O (PAG7) 於一般式（PAG3)、（PAG4)中， Ar1、Ar2係表示相同或不同的經取代或未經取代的芳基，較佳的取代基例如有烷基、鹵化烷基、環烷基、芳基' 烷氧基、硝基、羧基、烷氧基羰基、羥基、硫醇基及鹵素原子。） -31- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 " ^^^ ----- 五、發明說明（3°) R2。3、R2〇4、R2〇5中係爲相或不同的經取代或未取代的烷基、芳基。較佳者爲碳數6〜14之芳基、碳數丨〜8 之院基及此等之取代衍生物。較佳的取代基對芳:基而言爲碳數1〜8之烷氧基、硝基、羧基、羥基及g素原子，對烷基而言爲碳數1〜8之烷氧基、羧基、烷氧基鑛基。 Z-係表示對陰離子，例如8?，、八仆6-、？1^_、31^6-、SiF6_、C104_、可經取代的鏈烷基磺酸、過氟鏈院基磺酸、可經取代的苯磺酸、萘磺酸、蒽磺酸、樟腦擴酸等，惟本發明不受此等所限制。較佳者爲鏈院基磺酸、過氟鏈烷基磺酸、經烷基取代的苯磺酸、五氟苯磺酸。而且R2Q3、R2G4、R2{)5中2個及Ar2、Ar1可各爲單鍵或經由取代基鍵結。一般式（PAG6)、（PAG7)中，r2Q6係各表示經取代或未取代的烷基、芳基。A係表示經取代或未經取代的伸烷基、伸烯基、伸芳基。R係表示直鏈狀、支鏈狀或環狀烷基、或可經取代的芳基。此等之具體例如下述所示之化合物，惟不受此等所限制。 I丨ri#裝 (請先閱讀背面之注意事項再填寫本頁) 訂，丨經濟部智慧財產局員工消費合作社印製本紙張尺度適用中國國家標準(CNS)A4規格（210 X 297公釐"7 [257528 A7 B7 五、發明說明（々丨）s—R 0 OO (PAG7) In the general formula (PAG3), (PAG4), Ar1 and Ar2 represent the same or different substituted or unsubstituted aryl groups, and preferred substituents are, for example, an alkyl group or a halogenated group. An alkyl group, a cycloalkyl group, an aryl 'alkoxy group, a nitro group, a carboxyl group, an alkoxycarbonyl group, a hydroxyl group, a thiol group, and a halogen atom. ) -31- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 " ^^^ ----- V. Description of invention (3°) R2. 3, R2〇 4. R2〇5 is a phase or a different substituted or unsubstituted alkyl or aryl group. Preferred are aryl groups having 6 to 14 carbon atoms, and a substituent having a carbon number of 丨8 and these substituted derivatives. A preferred substituent is an alkoxy group having 1 to 8 carbon atoms, a nitro group, a carboxyl group, a hydroxyl group and a g atom, and a carboxyl group having 1 to 8 carbon atoms and a carboxyl group for the alkyl group. , alkoxy ore base. The Z-line represents a pair of anions, such as 8?, and 8 servants 6-,? 1^_, 31^6-, SiF6_, C104_, substituted alkane sulfonic acid, perfluoro chain sulfonic acid, substituted benzenesulfonic acid, naphthalenesulfonic acid, sulfonic acid, camphor acid Etc., however, the invention is not limited by these. Preferred are chain-based sulfonic acids, perfluoroalkanosulfonic acids, alkyl-substituted benzenesulfonic acids, and pentafluorobenzenesulfonic acid. Further, two of R2Q3, R2G4, and R2{)5, and Ar2 and Ar1 may each be a single bond or bonded via a substituent. In the general formula (PAG6) and (PAG7), each of r2Q6 represents a substituted or unsubstituted alkyl or aryl group. The A group represents a substituted or unsubstituted alkylene group, an alkenyl group, and an extended aryl group. R is a linear, branched or cyclic alkyl group or a substituted aryl group. These are, for example, the compounds shown below, but are not limited thereto. I丨ri# loading (please read the note on the back and then fill out this page). Order, 丨 Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperative, Print this paper scale, apply Chinese National Standard (CNS) A4 specification (210 X 297 mm &quot ;7 [257528 A7 B7 V. Description of invention (々丨)

SO3 (PAG3-2) F F ΘSO3 (PAG3-2) F F Θ

3 (PAG4-1) S〇3 〇 %裝---- (請先閱讀背面之注意事填寫本頁) 1 α3 (PAG4-1) S〇3 〇 %装---- (Please read the note on the back to fill out this page) 1 α

•S Θ•S Θ

Θ 訂---Θ Order ---

(PAG4-2) F F α(PAG4-2) F F α

S Θ F~\\ //-S03 (PAG4-3)S Θ F~\\ //-S03 (PAG4-3)

Θ 1 經濟部智慧財產局員工消費合作社印製 -33- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（32 ) OBuΘ 1 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing -33- This paper scale applies Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention description (32 ) OBu

(PAG6-1) Ο (PAG6-2)(PAG6-1) Ο (PAG6-2)

N—Ο — S〇2 一 CF3N—Ο — S〇2 a CF3

q (PAG6-3) (PAG7-!)〇 6 〇Η^> ο ιι 〇 (PAG7-2) 經濟部智慧財產局員工消費合作社印製 S· Itq (PAG6-3) (PAG7-!)〇 6 〇Η^> ο ιι 〇 (PAG7-2) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed S· It

〇"s"〇 N2 〇"s"〇、_ (FAG7-3) (PAG7-4) (PAG7-5) -34- (請先閱讀背面之注意事項再填寫本頁)〇"s"〇 N2 〇"s"〇, _ (FAG7-3) (PAG7-4) (PAG7-5) -34- (Please read the notes on the back and fill out this page)

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（）於本發明中倂用的光酸發生劑以上述式（PAG7 )所示者較佳。此等倂用所得的光酸發生劑以組成物中之固成分爲基準，使用5重量％以下、較佳者爲2重量％以下。 [2](B)具有碳數6個以上之脂環式烴構造、藉由酸作用增加對鹼顯像液之溶解速度的樹脂 (B)之樹脂環所含有的碳數6以上之脂環式烴構造可包含樹脂之主鏈及/或側鏈。碳數6以上之脂環式烴構造係以有橋式脂環式烴構造較佳。此等具體構造例如與下述一般式（11 π )之Z的脂環式烴架構具體例相同者。 (Β)之樹脂係以下述樹脂（Β-1)或（Β-2)較佳。 [2 - 1 ]( Β )藉由酸作用增加對顯像液之溶解速度的樹脂 (Β-1)(以下亦稱爲「酸分解性樹脂」）表示酸分解性樹脂之重覆單位之一般式（I ’）及（I I ’）中，RQ1、RQ2、Ra〜Rf之碳數1〜4之烷基例如有甲基、乙基、丙基、異丙基、正丁基、異丁基、第2-丁基等。酸分解性樹脂之重覆單位之一般式（I厂）中，W之伸烷基係爲與下述一般式（ΠΙ’-a)〜（ΙΙΙ’-d)之X、ZQ、Ru 、R13所示之伸烷基相同的基。而且，如上述一般式（Π’）之Ra〜Rf中任一個爲單鍵或碳數1〜4之伸烷基、與W鍵結。一般式（I I ’）所示之重覆構造單位的具體例（a 1 )〜 (a20)如下述。 -35- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）裝--------訂--- (請先閱讀背面之注意事項再填寫本頁) 1257528 A7 B7 五、發明說明（ΗThis paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm). 1257528 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed A7 B7 V. Invention Description () The photoacid generator used in the present invention is The above formula (PAG7) is preferred. The photoacid generator obtained by such use is used in an amount of 5% by weight or less, preferably 2% by weight or less based on the solid content of the composition. [2] (B) an alicyclic ring having a carbon number of 6 or more and having an alicyclic hydrocarbon structure having a carbon number of 6 or more and a resin ring of a resin (B) which increases the dissolution rate of the alkali developing solution by an acid action The hydrocarbon structure can comprise a backbone and/or a side chain of the resin. The alicyclic hydrocarbon structure having a carbon number of 6 or more is preferably a bridged alicyclic hydrocarbon structure. These specific structures are, for example, the same as the specific example of the alicyclic hydrocarbon structure of the following general formula (11 π ). The resin of (Β) is preferably the following resin (Β-1) or (Β-2). [2 - 1 ] ( Β ) Resin (Β-1) (hereinafter also referred to as "acid-decomposable resin") which increases the rate of dissolution of the developing solution by the action of acid means the general unit of the repeating unit of the acid-decomposable resin In the formulae (I ') and (II '), the alkyl group having 1 to 4 carbon atoms of RQ1, RQ2 and Ra to Rf is, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a n-butyl group or an isobutyl group. , 2-butyl and the like. In the general formula (I plant) of the repeating unit of the acid-decomposable resin, the alkyl group of W is X, ZQ, Ru, R13 of the following general formula (ΠΙ'-a)~(ΙΙΙ'-d) The same alkyl groups are shown. Further, any one of Ra to Rf of the above general formula (Π') is a single bond or an alkylene group having a carbon number of 1 to 4, and is bonded to W. Specific examples (a 1 ) to (a20) of the repeating structural unit represented by the general formula (I I ') are as follows. -35- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). Pack------ (Please read the note on the back and fill in this page) 1257528 A7 B7 V. Description of the invention (Η

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 _B7 , 35 五、發明說明（）This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 _B7 , 35 V. Invention description ()

經濟部智慧財產局員工消費合作社印製 (a17) (a1B) (a19) (a20) 酸分解性樹脂可含有下述一般式（1 Π ’ _ a )〜（1 1 1 ’ - d ) 所示重覆構造單位。 7 3 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 36 五、發明說明（Printed by the Consumer Intellectual Property Office of the Ministry of Economic Affairs (a17) (a1B) (a19) (a20) The acid-decomposable resin may contain the following general formula (1 Π ' _ a ) to (1 1 1 ' - d ) Repeat the construction unit. 7 3 This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 36 V. Description of invention (

I CH〇-C-I CH〇-C-

COOH CH〇 —C* R3 I I I x—o—C—C一Cl· I I R6 ^ c 一c — 〇 I I R9 R10COOH CH〇—C* R3 I I I x—o—C—C—Cl· I I R6 ^ c —c — 〇 I I R9 R10

R ch2-cR ch2-c

Z0—Ru—A—R 12 ^1 --------訂---- (請先閱讀背面之注意事項再填寫本頁) CH，一C· (111½ 經濟部智慧財產局員工消費合作社印製 coo—r13— S02—〇—r14 上述一般式（ΙΙΙ’-a)〜（ΙΠ’-d)中，Z0—Ru—A—R 12 ^1 --------Book---- (Please read the notes on the back and fill in this page) CH, 一C· (1111⁄2 Ministry of Economic Affairs Intellectual Property Bureau staff consumption The cooperative prints coo-r13-S02-〇-r14 in the above general formula (ΙΙΙ'-a)~(ΙΠ'-d),

Ri係表示氣原子或甲基。 R3〜R1Q係各表示獨立的氫原子或可具取代基之烷基。 R係表示氫原子或、可具取代基之烷基、環狀院基、芳基或芳烷基。 m係表示1〜10之整數。 X係表示單鍵、可具取代基之伸烷基、可具取代基之環狀伸烷基、可具取代基之伸芳基、醚基硫醚基、羰基 -38- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） I257528 B7 五、發明說明（37 ) 、酯基、醯胺基、碾醯胺基、胺基甲酸酯基、尿素基、或組合此等之不會藉由酸作用之2價基。 Z係表示單鍵、醚基、酯基、醯胺基、伸烷基、或組合此等之2價基。 Rn係表示伸烷基、伸芳基、或組合此等之2價基。 R12係表示可具取代基之烷基、可具取代基之環狀烷基、可具取代基之芳基或可具取代基之芳烷基。係表示伸烷基、伸芳基、或組合此等之2價基。 R14係表示氫原子、可具取代基、或不具取代基之烷基、可具取代基環狀烷基、可具取代基之烯基、可具取代基之芳基或可具取代基之芳烷基。 A係表示下述所示之任一種官能基。 —^ 一 NH 一 S〇2 - 〇 —NH—C—NH—SO 〇 2 請先閱讀背面經濟部智慧財產局員工消費合作社印製 0—C —NH—SO 〇 'S02—NH—S02- '2 —S02—NH—ΟΙ! 0 一S〇2 一NH一C—NH— II 〇 —S02—NH—c —0- II 〇於上述一般式（III ’ - a)〜（III’- d)中，1^。3〜1?10、、R12、R14之烷基爲直鏈狀' 支鏈狀、且可具取代基。直鏈狀或支鏈狀之烷基係以碳數1〜1 2較佳、更佳者; 碳數1〜10者，具體例如甲基、乙基、丙基、異丙基正丁基、異丁基、第2-丁基、第3-丁基、戊基、己基 -39- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）之Ri is a gas atom or a methyl group. Each of R3 to R1Q represents an independent hydrogen atom or an alkyl group which may have a substituent. R is a hydrogen atom or an alkyl group which may have a substituent, a cyclic group, an aryl group or an aralkyl group. The m system represents an integer of 1 to 10. X is a single bond, a substituted alkyl group, a cyclic alkyl group which may have a substituent, a substituted aryl group, an ether thioether group, a carbonyl group - 38- National Standard (CNS) A4 Specification (210 X 297 mm) I257528 B7 V. Description of Invention (37), Ester, Amidino, Triton, Amino, Urea, or a combination It does not rely on the divalent group of acid. The Z system represents a single bond, an ether group, an ester group, a decyl group, an alkylene group, or a valent group in combination. Rn means an alkyl group, an aryl group, or a combination of these two valent groups. R12 represents an alkyl group which may have a substituent, a cyclic alkyl group which may have a substituent, an aryl group which may have a substituent or an aralkyl group which may have a substituent. It means an alkyl group, an aryl group, or a combination of these two valent groups. R14 represents a hydrogen atom, a substituent which may have a substituent, or an unsubstituted group, a cyclic alkyl group which may have a substituent, an alkenyl group which may have a substituent, an aryl group which may have a substituent or a aryl group which may have a substituent alkyl. The A system represents any one of the functional groups shown below. —^ 一NH一S〇2 - 〇—NH—C—NH—SO 〇2 Please read the back of the Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperative, Print 0—C—NH—SO 〇'S02—NH—S02- ' 2 —S02—NH—ΟΙ! 0—S〇2—NH—C—NH—II 〇—S02—NH—c —0— II 〇 in the above general formula (III ' - a) ~ (III'- d) Medium, 1^. The alkyl group of 3 to 1?10, and R12 and R14 is linear in a branched form and may have a substituent. The linear or branched alkyl group is preferably a carbon number of 1 to 12, more preferably a carbon number of 1 to 10, specifically, for example, a methyl group, an ethyl group, a propyl group or an isopropyl n-butyl group. Isobutyl, 2-butyl, 3-butyl, pentyl, hexyl-39- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

經濟部智慧財產局員工消費合作社印製 1257528 A7 -—____Β7__ 五、發明說明（38) 庚基、辛基、壬基、癸基。 R、R12、R14之環狀烷基例如爲碳數3〜30者，具體例如環丙基、環戊基、環己基、金剛烷基、原菠烷基、冰片基、三環癸烷基、二環戊烷基、原菠烷基環氧基、盏基、異盏基、新盏基、十環十二烯基、類固醇殘基等。 R、R12、R14之芳基例如爲碳數6〜30者、可具取代基。具體例如苯基、甲苯基、萘基等。 R、R12、R14之芳烷基例如爲碳數7〜30者、可具取代基。具體例如苯甲基、苯乙基、枯基等。 R14之烯基例如爲碳數2〜6之烯基，具體例如乙烯基、丙烯基、烯丙基、丁烯基、戊烯基、己烯基、環戊烯基、環己烯基、3-羰基環己烯基、3-羰基環戊烯基、3-羰基茚基。此等中環狀烯基亦可含有氧原子。連結基X係爲單獨選自可具取代基之伸烷基、環狀伸烷基、伸芳基、或醚基、硫醚基、羰基、酯基、醯胺基、碾醯胺基、胺基甲酸酯基、尿素基所成群者、或組合至少2個以上此等之基、不會藉由酸分解的2價基。 Z係表示單鍵、醚基、酯基、醯胺基、伸烷基、或組含此等之2價基。 h i係表示單鍵、伸烷基、伸芳基、或組合此等之2價基。 X、Rn、R13中伸芳基例如碳數6〜10者、可具取代基。具體例如伸苯基、伸甲苯基、伸萘基等。 X之環狀伸烷基例如上述之環狀烷基爲2價者。 -40- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）裝--------訂---- (請先閱讀背面之注咅？事項再填寫本頁) 參 391257528 A7 五、發明說明（ X、Z 〇、R!!、R} 3之伸院基可例如下述式所示之基 -[C(Rf)(Rg)]r- 上述中Rf、Rg係表示氫原子、烷基、取代烷基、鹵素原子、羥基、烷氧基，兩者可相同或不同。院基係以甲基、乙基、丙基、異丙基、丁基等之低級烷基較佳，更佳者爲選自甲基、乙基、丙基、異丙基。取代烷基之取代基例如有羥基、鹵素原子、烷氧基。烷氧基例如有甲氧基、乙氧基、丙氧基、丁氧基等碳數1〜4者。鹵素原子例如有氯原子、溴原子、氟原子、碘原子等。R係爲1 〜10之整數。連結基X之具體例如下述，惟本發明之內容不受此等所限制。Printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Staff and Consumers Co., Ltd. 1257528 A7 -_____Β7__ V. Description of invention (38) Heptyl, octyl, sulfhydryl and sulfhydryl. The cyclic alkyl group of R, R12 or R14 is, for example, a carbon number of 3 to 30, and specifically, for example, a cyclopropyl group, a cyclopentyl group, a cyclohexyl group, an adamantyl group, a raw spinyl group, a borneol group, a tricyclodecyl group, Dicyclopentanyl, pyridylalkyl epoxy, fluorenyl, isodecyl, neodecyl, decacyclododecyl, steroid residues, and the like. The aryl group of R, R12 or R14 is, for example, a carbon number of 6 to 30, and may have a substituent. Specific examples are phenyl, tolyl, naphthyl and the like. The aralkyl group of R, R12 or R14 is, for example, a carbon number of 7 to 30, and may have a substituent. Specifically, for example, benzyl, phenethyl, cumyl and the like. The alkenyl group of R14 is, for example, an alkenyl group having 2 to 6 carbon atoms, and specifically, for example, a vinyl group, a propenyl group, an allyl group, a butenyl group, a pentenyl group, a hexenyl group, a cyclopentenyl group, a cyclohexenyl group, and 3 a carbonylcyclohexenyl group, a 3-carbonylcyclopentenyl group, a 3-carbonyl fluorenyl group. These cyclic alkenyl groups may also contain an oxygen atom. The linking group X is an alkyl group selected from a substitutable group, a cyclic alkyl group, an extended aryl group, or an ether group, a thioether group, a carbonyl group, an ester group, a decylamino group, a guanylamine group, an amine group. A group of a carbamate group or a urea group, or a combination of at least two or more of these groups, and a divalent group which is not decomposed by an acid. The Z system represents a single bond, an ether group, an ester group, a decylamino group, an alkylene group, or a valent group containing these. The h i represents a single bond, an alkylene group, an extended aryl group, or a combination of these two valent groups. The aryl group in X, Rn or R13, for example, having a carbon number of 6 to 10, may have a substituent. Specific examples include a phenyl group, a tolyl group, a naphthyl group, and the like. The cyclic alkyl group of X, for example, the above cyclic alkyl group is a divalent one. -40- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). Pack------- (Please read the note on the back? Reference 391257528 A7 V. Inventive Note (X, Z 〇, R!!, R} 3 can be expressed as the base - [C(Rf)(Rg)]r- Rg means a hydrogen atom, an alkyl group, a substituted alkyl group, a halogen atom, a hydroxyl group or an alkoxy group, and the two may be the same or different. The group is a methyl group, an ethyl group, a propyl group, an isopropyl group or a butyl group. The lower alkyl group is preferably a group selected from the group consisting of a methyl group, an ethyl group, a propyl group and an isopropyl group. The substituent of the substituted alkyl group is, for example, a hydroxyl group, a halogen atom or an alkoxy group. The alkoxy group has, for example, a methoxy group. And a carbon number of 1 to 4, such as an ethoxy group, a propoxy group, and a butoxy group. The halogen atom is, for example, a chlorine atom, a bromine atom, a fluorine atom or an iodine atom. R is an integer of 1 to 10. The details are, for example, the following, but the content of the present invention is not limited by these.

經濟部智慧財產局員工消費合作社印製Ministry of Economic Affairs, Intellectual Property Bureau, employee consumption cooperative, printing

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（ 4-0 —C— II 0 〇 —c—och2ch2- 〇 ch3 —c-och2ch-ο •c—och2ch2-c— II IIο ο Ό一ΝΗ IIο 一 CH2CH2 —〇一 C _ CH2CH2一 C~* 〇〇 0 — 〇ch2ch2· 〇 Ο •C-OCH: II Λo φ>ί- 〇 -C-〇CH2CH2~〇—c — 〇 o / K 一 c\、This paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). 1257528 A7 B7 V. Description of invention (4-0—C—II 0 〇—c—och2ch2- 〇ch3 —c-och2ch-ο • C—och2ch2-c—II IIο ο Ό一ΝΗ IIο 一 CH2CH2 —〇一 C _ CH2CH2一 C~* 〇〇0 — 〇ch2ch2· 〇Ο •C-OCH: II Λo φ> ί- 〇-C-〇 CH2CH2~〇-c — 〇o / K a c\,

rnh S〇2— NH—C II 〇 —a w •c-och2ch2~nh-c— 〇 o 經濟部智慧財產局員工消費合作社印製 OCH2CH2-NH— c — NH— CH2CH2-o II 〇 —〇CH2CH2 - NH - C— NH— CH2CH2— C— Π II 〇 n II 〇 • c~ och2ch2- nh- c-o— ch2ch2~c— 丨丨 II II ο Ο n -42- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁)Rnh S〇2— NH—C II 〇—aw •c-och2ch2~nh-c— 〇o Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed OCH2CH2-NH— c — NH— CH2CH2-o II 〇—〇CH2CH2 - NH - C— NH— CH2CH2— C— Π II 〇n II 〇• c~ och2ch2- nh- co— ch2ch2~c— 丨丨II II ο Ο n -42- This paper scale applies to China National Standard (CNS) A4 Specifications (210 X 297 mm) (Please read the notes on the back and fill out this page)

A7A7

1257528 五、發明說明（）上述烷基、環狀烷基、烯基、芳基、芳烷基、伸烷基、環狀伸院基、伸芳基之另外取代基例如有殘基、醯氧基、氰基、院基、取代院基、鹵素原子、經基、院氧基、乙醯基醯胺基、烷氧基羰基、醯基。其中，烷基例如有甲基、乙基、丙基、異丙基、丁基、環丙基、ί哀丁基、ί哀戊基等低級院基。取代院基之取代基例如有羥基、鹵素原子、烷氧基。烷氧基例如有甲氧基、乙氧基、丙氧基、丁氧基等碳數1〜4者。醯氧基例如有乙醯氧基等。鹵素原子例如有氯原子、溴原子、氟原子、碘原子等。於下述中一般式（11 I · -b )之側鏈構造的具體例除X外、側鏈構造如下所示、惟不受此等所限制。經濟部智慧財產局員工消費合作社印製本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 42 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（ —〇一 CH2CH2 一〇一 CH2CH2一〇H —0- CH2CH2— 〇— CH2CH2— 〇~ CH31257528 V. INSTRUCTIONS () The above alkyl, cyclic alkyl, alkenyl, aryl, aralkyl, alkylene, cyclic extended, and extended aryl groups have, for example, residues, oxime A cyano group, a cyano group, a substituted group, a halogen atom, a thiol group, an alkoxy group, an alkoxycarbonyl group, an anthracenyl group. Among them, the alkyl group is, for example, a lower-grade hospital base such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a cyclopropyl group, a butyl butyl group, or a succinyl group. The substituent for the substituent is, for example, a hydroxyl group, a halogen atom or an alkoxy group. The alkoxy group has, for example, a carbon number of 1 to 4 such as a methoxy group, an ethoxy group, a propoxy group or a butoxy group. The decyloxy group is, for example, an ethoxylated group or the like. The halogen atom is, for example, a chlorine atom, a bromine atom, a fluorine atom, an iodine atom or the like. Specific examples of the side chain structure of the general formula (11 I · -b) described below except for X, and the side chain structure are as follows, but are not limited thereto. Ministry of Economic Affairs, Intellectual Property Bureau, Staff and Consumer Cooperatives, Printed Paper Scale Applicable to China National Standard (CNS) A4 Specification (210 X 297 mm) 1257528 42 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed A7 B7 V. Invention Description (—〇 CH2CH2 - CH2CH2 - H - 0 - CH2CH2 - 〇 - CH2CH2 - 〇 ~ CH3

_ 0一 CH2CH2 —〇—CH2CH2 —〇 CH2CH3 —〇一CH2CH2— O — CH2CH2— 0— CH2CH2— OH 一〇— CH2CH2"" 〇~ CH2CH2一〇— CH2CH2一 0 — ch3 一〇— CH2CH2— 〇— CH2CH2 一 0— CH2CH2~0 一 CH2CH3 —o-ch2ch — o-ch2ch — o—ch3 ch3 ch3 —o- chch2— o- chch2 一 o—ch3_ 0 -CH2CH2 - 〇 - CH2CH2 - 〇 CH2CH3 - 〇 CH2CH2 - O - CH2CH2 - 0 - CH2CH2 - OH 〇 - CH2CH2 "" 〇~ CH2CH2 〇 - CH2CH2 - 0 - ch3 〇 - CH2CH2 - 〇 - CH2CH2 - 0 - CH2CH2~0 - CH2CH3 - o - ch2ch - o - ch2ch - o - ch3 ch3 ch3 - o - chch2 - o - chch2 - o - ch3

I I ch3 ch3 —o- ch2ch— o- ch2ch— o- ch2ch— o- ch3 ch3 ch3 ch3 -o- CH2CH2^ 0- CH2CH2-j^ 〇~ CH3 一 ο— CH2CH21 〇一 ch2ch2^-〇——ch3 於下述中係表不一^般式（III’ - c)所不之重覆構造單位的單聚物之具體例，惟不受等所限制。 -44- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁)II ch3 ch3 —o- ch2ch— o- ch2ch— o- ch2ch— o- ch3 ch3 ch3 ch3 -o- CH2CH2^ 0- CH2CH2-j^ 〇~ CH3 ο—CH2CH21 〇一ch2ch2^-〇——ch3 The following examples are specific examples of the monomer of the repeating structural unit which are not in the general formula (III'-c), but are not limited thereto. -44- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) (please read the notes on the back and fill out this page)

:257528 A7 B7 五、發明說明（y:257528 A7 B7 V. Description of invention (y

CH^CH 〇 ch3 0 一 NH - S02CH^CH 〇 ch3 0 one NH - S02

(1) ch2=c I (2) NH—S〇2 - CH3 0(1) ch2=c I (2) NH—S〇2 - CH3 0

CH2=CH ^C~NH — S〇2—CH3 (3) ch3 ch2=c ^c-nh-so2CH2=CH ^C~NH — S〇2—CH3 (3) ch3 ch2=c ^c-nh-so2

O CH3 CH2=C 〇 0 ^c-nh-so2-^ ⑸ (請先閱讀背面之注意事項再填寫本頁) II 〇 ch3 CH-? ^C-〇一CH2CH2~〇一 p- CH2CH2-斤一 NH—SO 之一 CH3 (6) 〇 ch3 CH-? ◦一 CH2CH2CH2— S〇2—NH—S〇2 — CH3 (7) 訂---- 經濟部智慧財產局員工消費合作社印製，45‘ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明（料） CH, CH2=? ⑻ 々C—〇一 CH2CH2GH2 一 S〇2 一 NH 一 S02 一 CH (CH3)2 0 ch3 ch2=c 々C一 Ο一 CH2CH2CH2一 S〇2一 NH一 S〇2O CH3 CH2=C 〇0 ^c-nh-so2-^ (5) (Please read the notes on the back and fill out this page) II 〇ch3 CH-? ^C-〇一CH2CH2~〇一p- CH2CH2-斤一One of NH-SO CH3 (6) 〇ch3 CH-? ◦一CH2CH2CH2—S〇2—NH—S〇2 — CH3 (7) Order---- Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative, 45' This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) [257528 A7 B7 V. Description of invention (material) CH, CH2=? (8) 々C—〇一CH2CH2GH2 〇S〇2 One NH-S02 One CH (CH3)2 0 ch3 ch2=c 々C-ΟCH2CH2CH2-S〇2-NH-S〇2

(9) 〇 ch3(9) 〇 ch3

CH2=C // c- ◦一 CH2CH2 一 S02 — NH — S〇2— CH3 (10) (請先閱讀背面之注意事項再填寫本頁) 〇 CH3 \/ CH2=? — CH2CH2— S〇2— NH— S〇2CH2=C // c- ◦一CH2CH2 一 S02 — NH — S〇2— CH3 (10) (Please read the notes on the back and fill out this page) 〇CH3 \/ CH2=? — CH2CH2 — S〇2— NH—S〇2

(11) 經濟部智慧財產局員工消費合作社印製 CH3 ch2=cI 〇— CH2CH2~· NH ——C一 N H —· S〇2— CH3 0 O CH3 ch2=cI 〇一 CH2CH2 一 NH ——c- N H— S〇2~ CH2(CH2)6CH3 (12) (13)(11) Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed CH3 ch2=cI 〇—CH2CH2~· NH ——C—NH —· S〇2—CH3 0 O CH3 ch2=cI 〇一CH2CH2—NH ——c- NH—S〇2~ CH2(CH2)6CH3 (12) (13)

I ϋ ϋ .1-— ϋ an n I 一一口、1 n ϋ n n ·1 I CH3 ch2=c // 〇 I! 〇 I C*— O— CH2CH2 — NH— C—NH— S02 〇I ϋ ϋ .1-— ϋ an n I One port, 1 n ϋ n n ·1 I CH3 ch2=c // 〇 I! 〇 I C*— O— CH2CH2 — NH— C—NH— S02 〇

-46- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (14)-46- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) (14)

1257528 A7 _B7___ 五、發明說明（K ) ch3 CH2=〒 (15) c—〇—CH2CH2—O— C~-NH 一S〇2-CH] c/ 0 ch31257528 A7 _B7___ V. Description of invention (K) ch3 CH2=〒 (15) c—〇—CH2CH2—O—C~-NH—S〇2-CH] c/ 0 ch3

CH2=C ^c—NH—S〇2 0〆 ch3CH2=C ^c—NH—S〇2 0〆 ch3

CH2=C 々C_ 〇一 CH2GH2CH2一 S〇2一 NH 一 S〇2 〇〆一 (H) 於下述中係表示一般式（111 d)所示之瓜搜構造屮位夕單聚物的具體例，惟不受此$所限制。 • n I ϋ I 4 I 1L f. I · ϋ n ϋ (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 4 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明（μ ) ch3 I ch2=c ch3 C 一〇一 CH2CH2CH2 — S02 — 0 — CH — (：Η20(：Ηί (1) 〇 CH, ch9=c CH, 〇一〇一 CH2CH2CH2 — S02 — 0 — CH — ch3 ⑵ ch3 ch2=c CH, 〇々C - 0 — CH2CH2CH 广 S02 - 0 - CH—CH2C1 ⑶ CH, ch2=c 〇/y ch3 I ch2=c C 一 0 — ch2ch2ch2 — S02 - 0CH2=C 々C_ 〇CH2GH2CH2-S〇2-NH-S〇2 〇〆1(H) In the following, the specific formula (111 d) is shown as the specific structure of the 夕单单单单单For example, it is not limited by this $. • n I ϋ I 4 I 1L f. I · ϋ n ϋ (Please read the notes on the back and fill out this page.) Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperatives, Printed 4 Paper Sizes Applicable to China National Standard (CNS) A4 Specification (210 X 297 mm) [257528 A7 B7 V. Invention description (μ) ch3 I ch2=c ch3 C 〇一CH2CH2CH2 — S02 — 0 — CH — (:Η20(:Ηί (1) 〇CH, ch9 =c CH, 〇〇 CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH CH Ch2=c C_0 — ch2ch2ch2 — S02 - 0

⑷ 裝--------訂---- (請先閱讀背面之注意事項再填寫本頁)(4) Pack--------Book---- (Please read the notes on the back and fill out this page)

〇 c - 0—CH2CH2CH2—SO广 0〇 c - 0—CH2CH2CH2—SO wide 0

⑸ 經濟部智慧財產局員工消費合作社印製(5) Printed by the Consumers' Cooperative of the Intellectual Property Office of the Ministry of Economic Affairs

2 Η C 〇2 Η C 〇

2 Η 1 ο ! 2 Sι 2 Η 2 Η 2 Η 1 3 〇 Η一 C —— C——C2 Η 1 ο ! 2 Sι 2 Η 2 Η 2 Η 1 3 〇 Η C —— C——C

3 f 3 Η - Η C —— CIC3 f 3 Η - Η C —— CIC

3 CH (5 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（47 ) CH3 ch2=c ch3c=o C - Ο - CH2CH2CH2 - S02 - 0 - CH2 ~ C ~ COOC(CH3)T (7)ο I ch3 ch3 ] ch2=c CH, 〇々C - 0 — CH2CH2 — S02 - 0 - CH - CH2OCH3 ⑻ cm ch2=c3 CH (5 paper scale applicable to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention description (47 ) CH3 ch2=c ch3c=o C - Ο - CH2CH2CH2 - S02 - 0 - CH2 ~ C ~ COOC(CH3)T (7)ο I ch3 ch3 ] ch2=c CH, 〇々C - 0 — CH2CH2 — S02 - 0 - CH - CH2OCH3 (8) cm ch2=c

I ch3 0々 CH I ch2=c c 一〇一 CH2CH2—s 〇2—〇一 ch—ch3 ⑼ 裝--- (請先閱讀背面之注意事項再填寫本頁) 〇 I 严 C - 0 — CH2CH2 - S〇2 - 〇一 0Η— CH2C1 (10) · ΟΗ〇 = 〇々I ch3 0々CH I ch2=cc 一〇一CH2CH2—s 〇2—〇一ch—ch3 (9) Pack--- (Please read the notes on the back and fill out this page) 〇I 严 C - 0 — CH2CH2 - S〇2 - 〇一0Η—CH2C1 (10) · ΟΗ〇= 〇々

ch3 (11) ch2=c 經濟部智慧財產局員工消費合作社印製〇 // CH,Ch3 (11) ch2=c Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing 〇 // CH,

ch2=cI 0 // oo—CH2CH2—S02—〇Ch2=cI 0 // oo—CH2CH2—S02—〇

〇 (12)〇 (12)

HO CH, c -〇一 CH2CH2CH2—S〇2—0 …HO CH, c -〇 a CH2CH2CH2—S〇2—0 ...

(13) -49- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7B7 五、發明說明（48 )(13) -49- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7B7 V. Description of invention (48)

CH2=C CH,CH2=C CH,

0 CH〇 I CH〇=C - 0 - ch2ch2ch2 - so2 ♦ ch2—c - ch3 (14)0 CH〇 I CH〇=C - 0 - ch2ch2ch2 - so2 ♦ ch2—c - ch3 (14)

OH 〇々c - o—ch2ch2ch2 - so2 - oOH 〇々c - o-ch2ch2ch2 - so2 - o

0 (15)0 (15)

CH. I . CH2=C (16) 〇CH. I . CH2=C (16) 〇

〇〇

I CH〇= C ch3 (17) 裝--------訂----- (請先閱讀背面之注意事項再填寫本頁)I CH〇= C ch3 (17) Pack--------Book----- (Please read the notes on the back and fill out this page)

# 經濟部智慧財產局員工消費合作社印製々C - 0 - ch2ch2ch2 — so2 - 〇 - CH — CH2OCH3 〇 CH, I CU2=C Cl I —〇一 CH2CH2CH2 — S〇2 — 0# 经济部智慧物局Employee consumption cooperative Print 々C - 0 - ch2ch2ch2 — so2 - 〇 - CH — CH2OCH3 〇 CH, I CU2=C Cl I —〇一 CH2CH2CH2 — S〇2 — 0

_50- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (18) (19) 1257528 A7 -----------B7 _________ 五、發明說明（49 ) 於一般式（I 11 ’ - b )中R3〜R, Q係以氫原子、甲基較佳。R係以氫原子、碳數1〜4之院基較佳。Μ係以1〜6較佳。於一般式（11厂-c )中R!!係以單鍵、伸甲基、伸乙基、伸丙基、伸丁基等之伸院基較佳，R! i係以甲基、乙基％碳數1〜10之院基、ί哀丙基、環己基、掉腦殘基等之環狀烷基、萘基、萘基甲基較佳。Ζ係以單鍵、醚鍵、酯鍵、碳數1〜6之伸烷基、或組合此等較佳，更佳者爲單鍵、酯鍵。於一般式（IIP-d)中R13係以碳數1〜4之伸烷基較佳。R14係以可具取代基之甲基、乙基、丙基、異丙基、丁基、新戊基、辛基等碳數1〜8之烷基、環己基、金剛烷基、原菠烷基、冰片基、異冰片基、荖基、嗎啉基、 4 -羰基環己基、可具取代基之苯基、甲苯醯基、莱基、萘基、樟腦殘基較佳。此等之另外的取代基係以氟原子等之鹵素原子、碳數1〜4之烷氧基等較佳。於一般式（III’-a)〜（III1-d)中，以一般式（III’-b) 及一般式（111 ’ - d )所示之重覆構造單位較佳。 [2 - 2 ] ( B )至少一個上述一般式（I a ")及一般式（1 b ")所示之重覆構造單位與具有上述一般式（II")所示之重覆構造單位、且藉由酸作用增加對鹼顯像液之溶解速度的樹脂（B-2)(以下簡稱爲「本發明之樹脂」）於上述一般式（I a")中，IT i、R ’ 2係各表示獨立的氫原子、氰基、羥基、-COOH、-COOR’6、-C0-NH-S02-Rf6 -51- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ------f—fl ^ (請先閱讀背面之注咅？事項再填寫本頁) ή^τ· 經濟部智慧財產局員工消費合作社印製 1257528 A7_50- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) (18) (19) 1257528 A7 -----------B7 _________ V. Description of invention (49) In the general formula (I 11 ' - b ), R3 to R and Q are preferably a hydrogen atom or a methyl group. R is preferably a hydrogen atom or a courtyard having a carbon number of 1 to 4. The tether is preferably 1 to 6. In the general formula (11-c), R!! is preferably a single bond, a methyl group, an ethyl group, a propyl group, a butyl group, etc., R! i is a methyl group, a A cyclic alkyl group, a naphthyl group or a naphthylmethyl group having a base number of from 1 to 10, a propyl group, a cyclohexyl group, a brain-reducing group or the like is preferred. The oxime is preferably a single bond, an ether bond, an ester bond, an alkyl group having 1 to 6 carbon atoms, or a combination thereof, and more preferably a single bond or an ester bond. In the general formula (IIP-d), R13 is preferably an alkylene group having 1 to 4 carbon atoms. R14 is an alkyl group having a carbon number of 1 to 8 such as a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, a neopentyl group or an octyl group which may have a substituent, a cyclohexyl group, an adamantyl group, and a raw spinel. The base, the borneol group, the isobornyl group, the fluorenyl group, the morpholinyl group, the 4-carbonylcyclohexyl group, the phenyl group which may have a substituent, the tolyl group, the lenyl group, the naphthyl group, and the camphor residue are preferred. These other substituents are preferably a halogen atom such as a fluorine atom or an alkoxy group having 1 to 4 carbon atoms. In the general formulae (III'-a) to (III1-d), the repeating structural unit represented by the general formula (III'-b) and the general formula (111'-d) is preferable. [2 - 2 ] (B) At least one of the above-mentioned general formula (I a ") and the general formula (1 b ") as shown in the above-mentioned general formula (II") The resin (B-2) (hereinafter simply referred to as "the resin of the present invention") which increases the dissolution rate of the alkali developing solution by the action of an acid is in the above general formula (I a "), IT i, R ' The 2 series each represent an independent hydrogen atom, a cyano group, a hydroxyl group, -COOH, -COOR'6, -C0-NH-S02-Rf6 -51-. The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297厘) ------f-fl ^ (Please read the note on the back first? Then fill out this page) ή^τ· Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1257528 A7

、可經取代的烷基、烷氧基或環狀烴基、或下述-Y基；其中’以5係表示可經取代的烷基、環狀烴基或下述-Υ 基；R’6係表示可經取代的烷基或環狀烴基；上述-Y基中，r’21〜r，3()係各表示獨立的氫原子或可具取代基之烷基，a、b係爲1或2。 X係表示氧原子、硫原子、-NH-、-NHS02-或-NHS02NH-;其中， A係表示單鍵或2價連結基；於式（lb")中，Z2係表示-0-或-N(R’3)_ ;其中，R，3 係表示氫原子、羥基或- 〇S02-R，4 ; R'4係表示烷基、鹵化烷基、環烷基或樟腦殘基；上述R、、R，4、R，5、R，6、R，21〜R’3〇之烷基爲碳數 1〜10個之直鏈狀或支鏈狀烷基較佳、更佳者爲碳數1〜 6之直鏈狀或支鏈狀烷基，最佳者爲甲基、乙基、丙基、異丙基、正丁基、異丁基、第2-丁基、第3-丁基。上述R · i、R ’ 2、R ’ 5、R ' 6之環狀烴基例如環丙基、環戊基、環己基、金剛烷基、2 -甲基-2 -金剛烷基、原菠烷基、冰片基、三環癸烷基、二環戊烷基、原菠烷基環氧基、盏基、異盏基、新盖基、十環十二烷基等。上述R、、R’2之烷氧基例如甲氧基、乙氧基、丙氧基、丁氧基等碳數1〜4個者。上述R’4之鹵化烷基例如有三氟甲基、九氟丁基、十五氟辛基、三氯化甲基等。上述R’4之環烷基例如環戊基、環己基、環辛基等。 -52- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ▼裝 (請先閱讀背面之注意事項再填寫本頁) ----訂i ·_ 經濟部智慧財產局員工消費合作社印製經濟部智慧財產局員工消費合作社印製 1257528 A7 --------—-—取___ 五、發明說明（51) 上述烷基、環狀烴基、烷氧基之另外的取代基例如有烴基、鹵素原子、羧基、烷氧基、醯基、氰基、醯氧基等。鹵素原子例如有氯原子、溴原子、氟原子、碘原子等。烷氧基例如有甲氧基、乙氧基、丙氧基、丁氧基等碳數1〜4個者，醯基例如有甲醯基、乙醯基等，醯氧基例如有乙醯氧基等。上述一般式（I a ")及（I b ")之2價連結基例如單獨選自伸院基、取代伸院基、醚基、硫醚基、凝基、酯基、醢胺基、碾醯胺基、胺基甲酸酯基、尿素基所成群或組合 2個以上之基。上述A之伸烷基、取代伸烷基例如以下述式所示之基。 -[C(Ra)(Rb)]r- 上述中Ra、Rb係表示氫原子、烷基、取代烷基、鹵素原子、羥基、烷氧基、兩者可相同或不同。烷基係以甲基、乙基、丙基、異丙基、丁基等之低級烷基較佳，更佳者爲選自甲基、乙基、丙基、異丙基。取代烷基之取代基例如有羥基、鹵素原子、烷氧基。烷氧基例如有甲氧基、乙氧基、丙氧基、丁氧基等碳數丨〜4者。鹵素原子例如有氯原子、溴原子、氟原子、碘原子等。R係爲 1〜10之整數。上述一般式（I a")所示之重覆構造單位之具體例如下述之[I -1 ]〜[I - 65 ]，惟本發明不受此等具體例所限制。 -53- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）装--------訂---- (請先閱讀背面之注意事項再填寫本頁)a substitutable alkyl group, an alkoxy group or a cyclic hydrocarbon group, or a -Y group; wherein 'the ring system represents a substitutable alkyl group, a cyclic hydrocarbon group or the following - fluorenyl group; R'6 system The alkyl group or the cyclic hydrocarbon group which may be substituted; wherein the above -Y group, r'21~r, 3() each represents an independent hydrogen atom or an alkyl group which may have a substituent, and a and b are 1 or 2. X is an oxygen atom, a sulfur atom, -NH-, -NHS02- or -NHS02NH-; wherein A represents a single bond or a divalent linking group; in the formula (lb"), Z2 represents -0- or - N(R'3)_; wherein R, 3 represents a hydrogen atom, a hydroxyl group or -〇S02-R,4; R'4 represents an alkyl group, a halogenated alkyl group, a cycloalkyl group or a camphor residue; The alkyl group of R, 4, R, 5, R, 6, R, 21 to R'3〇 is a linear or branched alkyl group having 1 to 10 carbon atoms, more preferably carbon. a straight or branched alkyl group of 1 to 6, preferably methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, 2-butyl, 3-butyl base. The above cyclic hydrocarbon group of R · i, R ' 2, R ' 5, R ' 6 such as cyclopropyl, cyclopentyl, cyclohexyl, adamantyl, 2-methyl-2-adamantyl, ortho-parylene Base, borneol, tricyclodecyl, dicyclopentanyl, ortho-alkyloxy, fluorenyl, isodecyl, neocapryl, decacyclododecyl, and the like. The alkoxy group of the above R and R'2 has a carbon number of 1 to 4 such as a methoxy group, an ethoxy group, a propoxy group or a butoxy group. The halogenated alkyl group of the above R'4 may, for example, be a trifluoromethyl group, a nonafluorobutyl group, a pentafluorooctyl group or a trimethyl chloride group. The above cycloalkyl group of R'4 is, for example, a cyclopentyl group, a cyclohexyl group, a cyclooctyl group or the like. -52- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) ▼ Install (please read the note on the back and fill out this page) ----Book i · _ Ministry of Economic Affairs Intellectual Property Bureau Employees' Consumer Cooperatives Printed Economy Ministry Intellectual Property Bureau Staff Consumer Cooperatives Printed 1257528 A7 -------------------- Take ___ V. Description of Invention (51) The above alkyl, cyclic hydrocarbon, alkoxy Further examples of the substituent include a hydrocarbon group, a halogen atom, a carboxyl group, an alkoxy group, a decyl group, a cyano group, a decyloxy group and the like. The halogen atom is, for example, a chlorine atom, a bromine atom, a fluorine atom or an iodine atom. The alkoxy group has, for example, a methoxy group, an ethoxy group, a propoxy group, a butoxy group or the like having 1 to 4 carbon atoms, and the fluorenyl group is, for example, a fluorenyl group or an ethyl fluorenyl group. Base. The above-mentioned general formula (I a ") and (I b ") of the divalent linking group are, for example, individually selected from the group consisting of a stretching base, a substituted stretching group, an ether group, a thioether group, a condensing group, an ester group, an anthranyl group. And the guanidine amino group, the urethane group, the urea group are grouped or a combination of two or more groups. The alkylene group and the substituted alkylene group of the above A are, for example, a group represented by the following formula. -[C(Ra)(Rb)]r- In the above, Ra and Rb represent a hydrogen atom, an alkyl group, a substituted alkyl group, a halogen atom, a hydroxyl group or an alkoxy group, and the two may be the same or different. The alkyl group is preferably a lower alkyl group such as a methyl group, an ethyl group, a propyl group, an isopropyl group or a butyl group, and more preferably a methyl group, an ethyl group, a propyl group or an isopropyl group. The substituent of the substituted alkyl group is, for example, a hydroxyl group, a halogen atom or an alkoxy group. The alkoxy group has, for example, a carbon number of 甲~4 such as a methoxy group, an ethoxy group, a propoxy group or a butoxy group. The halogen atom has, for example, a chlorine atom, a bromine atom, a fluorine atom, an iodine atom or the like. R is an integer of 1 to 10. Specific examples of the repeating structural unit represented by the above general formula (I a ") are, for example, the following [I -1 ] to [I - 65 ], but the present invention is not limited by these specific examples. -53- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). Pack------- (Please read the notes on the back and fill out this page)

# _I£1257528 A7 五、發明說明（P )# _I£1257528 A7 V. Description of invention (P)

"^CH- 〇=< r° m 0 OH c(ch3)3 卞^CH. -CH^ r° [i-3] s OH"^CH- 〇=< r° m 0 OH c(ch3)3 卞^CH. -CH^ r° [i-3] s OH

c(ch3)3 0=[ Γ0【1-5] 0 OH t H3C - CH 經濟部智慧財產局員工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁)c(ch3)3 0=[ Γ0【1-5] 0 OH t H3C - CH Printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs (please read the notes on the back and fill out this page)

OCH2CH3 〇=γ γ-0 [μ?]OCH2CH3 〇=γ γ-0 [μ?]

〇 OH〇 OH

II

H3C - CH OCH2CH(CH3)2 ^ch-ch"^H3C - CH OCH2CH(CH3)2 ^ch-ch"^

0=f， T=〇 [1-9] 0 OH h3coh2c - c(ch3)20=f, T=〇 [1-9] 0 OH h3coh2c - c(ch3)2

T=〇 [1-2] 〇 OHT=〇 [1-2] 〇 OH

I H3CH2C-C(CH3)2 τ=〇 a-4]I H3CH2C-C(CH3)2 τ=〇 a-4]

0 OH ch2 1 och3 ^ch-ch"^ 0==f 1=° ⑽0 OH ch2 1 och3 ^ch-ch"^ 0==f 1=° (10)

0 OH h3c-ch och2ch2ch2ch3 ^ch-ch"^ 0=f T=〇 [1-8]0 OH h3c-ch och2ch2ch2ch3 ^ch-ch"^ 0=f T=〇 [1-8]

0 OH v、〇 0=^ Γ0 [MO] 0 m \ | C(CH3)3 S〇2 ch3 -54- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 經濟部智慧財產局員工消費合作社印製 (請先閱讀背面之注意事項再填寫本頁)0 OH v, 〇0=^ Γ0 [MO] 0 m \ | C(CH3)3 S〇2 ch3 -54- The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 Printed by the Consumers' Cooperative of the Intellectual Property Office of the Ministry of Economic Affairs (please read the notes on the back and fill out this page)

五、發明說明（0)V. Description of invention (0)

〇 I〇 I

r°刚 NH C(CH3)3 so2R° just NH C(CH3)3 so2

0=f Γ0 [M3] 〇 NH C(CH3)3 S02 NH ch30==f 〇 C(CH3)30=f Γ0 [M3] 〇 NH C(CH3)3 S02 NH ch30==f 〇 C(CH3)3

7=° p-15]〇、 CH2CH2OH7=° p-15]〇, CH2CH2OH

[1-12] 0 0=f 0 I H3OCH och2ch3 r° NH S02 I z CH〇 [1-14] 〇 C(CH3)3[1-12] 0 0=f 0 I H3OCH och2ch3 r° NH S02 I z CH〇 [1-14] 〇 C(CH3)3

Γ0 [1-16]〇、 CH2CH2COOHΓ0 [1-16]〇, CH2CH2COOH

卞"CH-CH冲 0=Y f=0 [1-17] 0 0、 CiCU^ CH2CH2OCH2CH2COOH /CH-CH 7 0=f 7=0 [M8] 0 (λ c(ch3)3 ch2ch2conhso2ch3 ^XH.CH 冲 'po [1-19] 〇 HNi(CH3)3、叫叫⑺⑽卞"CH-CH rush 0=Y f=0 [1-17] 0 0, CiCU^ CH2CH2OCH2CH2COOH /CH-CH 7 0=f 7=0 [M8] 0 (λ c(ch3)3 ch2ch2conhso2ch3 ^XH. CH 冲 'po [1-19] 〇HNi(CH3)3, called (7)(10)

卞^CH-CH冲〇={ 1=° [1-20] 〇 HN 0(CH3)3、™〇H ‘55· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明 V yCH-CH 7 0=f Y=0 [1-21]〇〇、 i(CH3)3 CH2CH2CN 0=( y=0 [l-23] i(CH3)3 〇^H2CH2CO〇jQ"K 冲 \ /CH-CH 7 0=f γ=0 [I-25] ο a .〇 v CH-CH ； 0=^ Y〇 [!-22]〇〇、 i(CH3)3 CH2CH2COOCH3 \ /CH_CH j 0=J y=〇 [I-24] 〇 0、 .0 C(CH3)3卞^CH-CH 〇〇={ 1=° [1-20] 〇HN 0(CH3)3, TM〇H '55· This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. INSTRUCTION DESCRIPTION V yCH-CH 7 0=f Y=0 [1-21]〇〇, i(CH3)3 CH2CH2CN 0=( y=0 [l-23] i(CH3)3 〇^ H2CH2CO〇jQ"K 冲\ /CH-CH 7 0=f γ=0 [I-25] ο a .〇v CH-CH ; 0=^ Y〇[!-22]〇〇, i(CH3)3 CH2CH2COOCH3 \ /CH_CH j 0=J y=〇[I-24] 〇0, .0 C(CH3)3

〇 t 冲 v yCH-CH ;0=f ^=0 [Ι·26] C(CH3)3 h3c〇 t 冲 v yCH-CH ;0=f ^=0 [Ι·26] C(CH3)3 h3c

〇 H3c ^CH-CH 0=[ γ=ο◦ Vl 汁 C(CH3)3 〇=f y=〇 [1-27]〇 H3c ^CH-CH 0=[ γ=ο◦ Vl juice C(CH3)3 〇=f y=〇 [1-27]

[1-28] 經濟部智慧財產局員工消費合作社印製 [卜 29][1-28] Printed by the Consumers' Cooperative of the Intellectual Property Office of the Ministry of Economic Affairs [卜29]

Λ \ /CH-CH0=^ γ=〇〇 [1-30] C(CH3)3Λ \ /CH-CH0=^ γ=〇〇 [1-30] C(CH3)3

[1-32] C〇〇H -56« (請先閱讀背面之注意事項再填寫本頁)[1-32] C〇〇H -56« (Please read the notes on the back and fill out this page)

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明（rr \ /CH_CH 1 γ=ο OH 〇CH3 [1-33]This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) [257528 A7 B7 V. Inventive Note (rr \ /CH_CH 1 γ=ο OH 〇CH3 [1-33]

0=f OH0=f OH

Y° [1-34] OCH2CH2OH t 冲 v ^CH-CH ' ri 〇==f y^o 【丨，35] OH OCH2CH2CN "K 冲 v yCH-CH j 〇=f y=0 [1-37] oh aY° [1-34] OCH2CH2OH t rush v ^CH-CH ' ri 〇==fy^o [丨,35] OH OCH2CH2CN "K 冲v yCH-CH j 〇=fy=0 [1-37] oh a

、CH - CH '0=f OH, CH - CH '0=f OH

Y〇 [1-36] OCH2CH2COOHY〇 [1-36] OCH2CH2COOH

〇=[ γ=ο OH 0，〇=[ γ=ο OH 0,

2 3 〇H NISIC2 3 〇H NISIC

391391

\ /CH-CH ;0=f γ=0 OCH3 〇，\ /CH-CH ;0=f γ=0 OCH3 〇,

O 〇 [1-38] [1-40] (請先閱讀背面之注意事項再填寫本頁) 訂---- v /CH_CH ' 0=[ Y=0 〇 a nc-h2ch2cO 〇 [1-38] [1-40] (Please read the notes on the back and fill out this page) Order---- v /CH_CH ' 0=[ Y=0 〇 a nc-h2ch2c

0^0 \ /CH-CH } [1-41] 0=f γ=0 M2] och3 〇ch2ch2cn 經濟部智慧財產局員工消費合作社印製0^0 \ /CH-CH } [1-41] 0=f γ=0 M2] och3 〇ch2ch2cn Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative

XX

OH H3]OH H3]

[I-44] 輸57· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（b[I-44] Loss 57· This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention description (b

[1-45] ^CH - CH 十 0=f f=0 OH 0[1-45] ^CH - CH 十 0=f f=0 OH 0

〇=f 7=0 [1-47] OH OH〇=f 7=0 [1-47] OH OH

0=f OH f=0 [1-48] NHS02CH3 0==f r° [1-49] 0 0 c(ch3)3 c(ch3)30=f OH f=0 [1-48] NHS02CH3 0==f r° [1-49] 0 0 c(ch3)3 c(ch3)3

〇 C(CH3)3 r° [1-51] XCH2 och3 0=f 〇 C(CH^3 r° °x CH - CH3 1 J OCH2CH3 [1-52] 經濟部智慧財產局員工消費合作社印製 [1-53]〇C(CH3)3 r° [1-51] XCH2 och3 0=f 〇C(CH^3 r° °x CH - CH3 1 J OCH2CH3 [1-52] Printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs [ 1-53]

[1-55] HC-CH3 ( OCH2CH3 〇ch2ch3 卞^CH-CH冲 0=^ y=0 0 0 1 1 ch2 ch2 I I ^ OCHo OCHo [1-54] .58- (請先閱讀背面之注意事項再填寫本頁)[1-55] HC-CH3 ( OCH2CH3 〇ch2ch3 卞^CH-CH rush 0=^ y=0 0 0 1 1 ch2 ch2 II ^ OCHo OCHo [1-54] .58- (Please read the notes on the back first) Fill in this page again)

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） :257528 A7 B7 五、發明說明（衫） •CH—^ 七CH_ 0==f γ=0 [1-56] 0=f ]=0 〇〇〇 s 1 1 C(CH3)3 c(ch3)3 [1-57] 1CH- 0==f 〇 [1-58] j 0=f 0 CH.OCH,This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm): 257528 A7 B7 V. Invention description (shirt) • CH—^ Seven CH_ 0==f γ=0 [1-56] 0= f ]=0 〇〇〇s 1 1 C(CH3)3 c(ch3)3 [1-57] 1CH- 0==f 〇[1-58] j 0=f 0 CH.OCH,

[1-59] CH - CH3 ! OCH2CH3 『裝 (請先閱讀背面之注意事項再填寫本頁)[1-59] CH - CH3 ! OCH2CH3 "Installation (please read the notes on the back and fill out this page)

"^CH- 〇 rs. / •CH冲 r° 〇 1 C(CH3)3 [1-60] °m Γ° _ C(CH3)3"^CH- 〇 rs. / •CH冲 r° 〇 1 C(CH3)3 [1-60] °m Γ° _ C(CH3)3

..

卞^CH-CH冲 p=0 〇 c(ch3)3 [1-62]卞^CH-CH冲 p=0 〇 c(ch3)3 [1-62]

"^CH-CH 冲〇=Υ γ=〇 0 0 [1-63] C(CH3)3 _ 經濟部智慧財產局員工消費合作社印製"^CH-CH 冲〇=Υ γ=〇 0 0 [1-63] C(CH3)3 _ Printed by the Consumer Intellectual Property Office of the Ministry of Economic Affairs

C(CH3)3 [1-64]C(CH3)3 [1-64]

r° 0 [1-65] 1 ch2〇ch3 -59- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 ___B7___ 五、發弓說明（W ) 上述一般式（Ib〃）所示之重覆構造單位的具體例例如下述 [-1 ]〜[- 7 ]，惟本發明不受此等具體例所限制。 C——C\\ οR° 0 [1-65] 1 ch2〇ch3 -59- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 ___B7___ V. Bow description (W) The above general formula (Ib Specific examples of the repeating structural unit shown by 〃) are, for example, the following [-1] to [- 7 ], but the present invention is not limited by these specific examples. C——C\\ ο

κ II C——C 〇κ II C——C 〇

C——C N— ΗC——C N— Η

C——C 〇 U 2- οC——C 〇 U 2- ο

ο—C C— Η Ν——〇ο—C C— Η Ν——〇

C οC ο

1J 3 I 裝---- (請先閱讀背面之注意事項再填寫本頁)1J 3 I Pack---- (Please read the notes on the back and fill out this page)

訂----Order----

C——C ο—C——C ο-

CC

4 I4 I

Η3 NIC ο # 經濟部智慧財產局員工消費合作社印製 ο € 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（Η3 NIC ο # Ministry of Economic Affairs Intellectual Property Bureau Employees Consumption Cooperative Printed ο € This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (

ΟΟ

N Ο 0 — S02—CFa CH— [Γ>7] 0^C^MxC^0 o — so2N Ο 0 — S02—CFa CH— [Γ>7] 0^C^MxC^0 o — so2

-------i If 裝------ (請先閱讀背面之注意事項再填寫本頁) 上述一般式（II")中’ R'n、R’12係各表示獨立的氫原子、氰基、鹵素原子、或可具取代基之烷基。z係表示含有鍵結的2個碳原子（C-C)、形成可具取代基之脂環式構造的原子團。上述R’u、R’ 12之鹵素原子例如有氯原子、溴原子、氟原子、碘原子等。上述R’n、R’12之烷基爲碳數1〜10個之直鏈狀或支鏈狀烷基較佳、更佳者爲碳數1〜6之直鏈狀或支鏈狀烷基，最佳者爲甲基、乙基、丙基、異丙基、正丁基、異丁基、第2-丁基、第3·丁基。上述R'n、R'12之烷基中另外的取代基例如有羥基、鹵素原子、羧基、院氧基、醯基、氰基、醯氧基等。鹵 -61- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）訂-1 經濟部智慧財產局員工消費合作社印製 1257528 A7-------i If ------ (Please read the notes on the back and fill out this page) The above general formula (II") 'R'n, R'12 are independent A hydrogen atom, a cyano group, a halogen atom, or an alkyl group which may have a substituent. The z series represents an atomic group having two carbon atoms (C-C) having a bond and forming an alicyclic structure having a substituent. The halogen atom of the above R'u and R' 12 may, for example, be a chlorine atom, a bromine atom, a fluorine atom or an iodine atom. The alkyl group of R'n and R'12 is preferably a linear or branched alkyl group having 1 to 10 carbon atoms, more preferably a linear or branched alkyl group having 1 to 6 carbon atoms. The most preferred are methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, 2-butyl, and butyl. Examples of the other substituent in the alkyl group of R'n and R'12 include a hydroxyl group, a halogen atom, a carboxyl group, an anthraceneoxy group, a mercapto group, a cyano group, a decyloxy group and the like. Halogen -61- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm). Order-1 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed 1257528 A7

五、發明說明（）經濟部智慧財產局員工消費合作社印製素原子例如有氯原子、溴原子、氟原子、碘原子等。烷氧基例如有甲氧基、乙氧基、丙氧基、丁氧基等碳數1〜 4個者，醯基例如有甲醯基、乙醯基等，醯氧基例如有乙醯氧基等。上述一般式（I I ")之Z的爲形成脂環式構造之原子團係爲在樹脂中形成可具取代基之脂環式烴的重覆構造單位之原子團，其中以形成有橋式脂環式烴之重覆單位的有橋式脂環式構造之原子團較佳。所形成的脂環式烴的架構例如有以下述構造所示者等。本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（^ 經濟部智慧財產局員工消費合作社印製V. INSTRUCTIONS () The Ministry of Economic Affairs, Intellectual Property Office, Staff Consumer Cooperatives, etc. Printed atoms include, for example, chlorine atoms, bromine atoms, fluorine atoms, and iodine atoms. The alkoxy group has, for example, a methoxy group, an ethoxy group, a propoxy group, a butoxy group or the like having 1 to 4 carbon atoms, and the fluorenyl group is, for example, a fluorenyl group or an ethyl fluorenyl group. Base. The atomic group of the above formula (II "), which forms an alicyclic structure, is an atomic group of a repeating structural unit in which a alicyclic hydrocarbon which may have a substituent is formed in a resin, wherein a bridged alicyclic ring is formed. The atomic group of the bridged alicyclic structure of the repeating unit of the hydrocarbon is preferred. The structure of the alicyclic hydrocarbon to be formed is, for example, as shown in the following configuration. This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention Description (^ Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative

(請先閱讀背面之注意事項再填寫本頁)(Please read the notes on the back and fill out this page)

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（ 62 (30) (31) (28) (29)This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention ( 62 (30) (31) (28) (29)

(34) (35) (36)(34) (35) (36)

ό o (38) (39)ό o (38) (39)

(43) 裝---- (請先閱讀背面之注意事項再填寫本頁)(43) Pack---- (Please read the notes on the back and fill out this page)

訂· (40) (4i)Order · (40) (4i)

CG ZL7 (42)CG ZL7 (42)

(46) ·% 經濟部智慧財產局員工消費合作社印製 (44) (45) (47) 較佳約有橋式脂環式烴之架構例如於上述構造中之（5 ) 、（6)、（7)、（9)、（10)、（13)、（14)、（15)、（23)、 (28) 、（36) 、（37) 、（42) 、（47)。上述脂環式烴之架構中亦可具有取代基。該取代基例 -64- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 經濟部智慧財產局員工消費合作社印製， A7 B7 五、發明說明（63) 如上述一般式（11 " - A)或（11，，- B)中之R1 13〜RI 16。於具有上述有橋式脂環式烴基之重覆單位中，以上述一般式（II"-A)或（II”-B)所示之重覆單位更佳。上述一般式（II"-A)或中^13〜尺’16各爲獨立的氫原子、鹵素原子、氰基、-COOH、-COOR’5(Rf5係表示可具有取代基之烷基、環狀烴基或與一般式（la")相同的-Y基）、藉由酸作用分解的基、-C( = 0)-X-A-R，17 、或可具取代基之烷基或環狀烴基。η係表示〇或1。X係表示氧原子、硫原子、-ΝΗ-、-關302或-腿302題-。R，17 係表示-COOH、COORS、_CN-羥基、可具取代基之烷氧基、-CO-NH-R’6、-C0-NH-S02-R，6(R，5、R’6 係與上述同義）或上述一般式（la")之-Y基。A係表示單鍵或2價連結基。於本發明之樹脂中酸分解性基亦包含上述-C- ( = 0) -X-A-R、-C( = 0)-X-A-R’2，亦包含一般式（IIM)中之 Z的取代基。酸分解性基之構造係以= 所示。 (其中，R〇例如有第3-丁基、第3-醯基等3級烷基、異冰片基、1·乙氧基乙基、1-丁氧基乙基、丨_異丁氧基乙基、l-ί哀氧基乙基等院氧基乙基、1-甲氧基甲基、1-乙氧基甲基等烷氧基甲基、3 -羰基烷基、四氫吡喃基、四氫呋喃基、三烷基矽烷酯基、3-羰基環己基酯基、2-甲基 -2-金鋼烷基、甲羥基內酯殘基、2-( r - 丁腈氧基羰基） -2-丙基等，Xi係與上述X同義） -65- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）裝------ (請先閱讀背面之注意事項再填寫本頁)(46) ·% Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperatives Printed (44) (45) (47) Preferably, the structure of bridged alicyclic hydrocarbons is, for example, in the above configuration (5), (6), (7), (9), (10), (13), (14), (15), (23), (28), (36), (37), (42), (47). The structure of the above alicyclic hydrocarbon may also have a substituent. The Substitute -64- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). 1257528 Printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs, A7 B7 V. Invention Description (63) R1 13 to RI 16 in the formula (11 " - A) or (11, - B). In the repeating unit having the above-described bridged alicyclic hydrocarbon group, the repeating unit represented by the above general formula (II"-A) or (II"-B) is more preferable. The above general formula (II"-A Or a ^13~foot'16 each is an independent hydrogen atom, a halogen atom, a cyano group, -COOH, -COOR'5 (Rf5 represents an alkyl group which may have a substituent, a cyclic hydrocarbon group or a general formula (la&quot ;) the same -Y group), a group decomposed by acid action, -C(=0)-XAR,17, or an alkyl group or a cyclic hydrocarbon group which may have a substituent. The η system represents 〇 or 1. X system Represents an oxygen atom, a sulfur atom, -ΝΗ-, - off 302 or - leg 302. - R, 17 represents -COOH, COORS, _CN-hydroxy, alkoxy having a substituent, -CO-NH-R '6, -C0-NH-S02-R, 6 (R, 5, R'6 is synonymous with the above) or the -Y group of the above general formula (la"). A represents a single bond or a divalent linking group. The acid-decomposable group in the resin of the present invention also contains the above -C-(=0)-XAR, -C(=0)-XA-R'2, and also includes a substituent of Z in the general formula (IIM). The structure of the acid-decomposable group is represented by = (wherein R〇 has, for example, a 3-butyl group, a 3-inch group) Tertiary alkyl, isobornyl, ethoxyethyl, 1-butoxyethyl, oxime-isobutoxyethyl, 1-methoxyethyl , alkoxymethyl group such as 1-methoxymethyl, 1-ethoxymethyl, 3-carbonylalkyl, tetrahydropyranyl, tetrahydrofuranyl, trialkyldecyl ester, 3-carbonylcyclohexyl Ester group, 2-methyl-2-gold steel alkyl group, methylhydroxy lactone residue, 2-(r-butyronitrileoxycarbonyl)-2-propyl group, etc., Xi is synonymous with X above) -65- This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm). ------ (Please read the notes on the back and fill out this page)

. 經濟部智慧財產局員工消費合作社印製 1257528 A7 -______Β7____ 五、發明說明（64) 上述r’13〜r’16之鹵素原子例如有氯原子、溴原子、氟原子、碘原子。上述R\3〜『16之烷基係爲碳數1〜10個之直鏈狀或支鏈狀院基較佳、更佳者爲碳數1〜6個直鏈狀或支鏈狀烷基、最佳者爲甲基、乙基、丙基、異丙基、正丁基、異丁基、第2-丁基、第3-丁基。上述IT13〜R’16之環狀烴基例如有環狀烷基、有橋式烴，環丙基、環戊基、環己基、金鋼烷基、2-甲基- 2-金鋼fet;基、原疲院基、冰片基、異冰片基、二環癸基、二環戊基、原菠烷基環氧基、盖基、異盏基、新盖基、四環十二烷基等。上述R’13〜R’16中至少2個鍵結形成環例如有環戊烯、環己烯、環庚烯、環辛烯等碳數5〜1 2之環。上述R’172烷氧基例如有甲氧基、乙氧基、丙氧基、丁氧基等碳數1〜4個者。上述烷基、環狀烴基、烷氧基之取代基例如有羥基、鹵素原子、羧基、烷氧基、醯基、氰基、醯氧基等。鹵素原子例如有氯原子、溴原子、氟原子、碘原子等。烷氧基例如有甲氧基、乙氧基、丙氧基、丁氧基等碳數 4個者，醯基例如有甲醯基、乙醯基等，醯氧基例如有乙酿氧基寺。上述A之2價連結基例如有與上述一般式（1^)之A的2 價連結基相同、可單獨選自單鍵、伸烷基、取代伸烷基、醚基、硫醚基、羰基、酯基、醯胺基、磺醯胺基、胺 -66- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）裝------ (請先閱讀背面之注意事項再填寫本頁). Ministry of Economic Affairs, Intellectual Property Office, Staff and Consumers Co., Ltd. Printed 1257528 A7 -______Β7____ V. Inventive Note (64) The halogen atom of the above r'13 to r'16 is, for example, a chlorine atom, a bromine atom, a fluorine atom or an iodine atom. The alkyl group of R\3 to "16" is preferably a linear or branched group having 1 to 10 carbon atoms, more preferably 1 to 6 linear or branched alkyl groups having a carbon number of 1 to 6 The most preferred are methyl, ethyl, propyl, isopropyl, n-butyl, isobutyl, 2-butyl, 3-butyl. The cyclic hydrocarbon group of the above IT13 to R'16 is, for example, a cyclic alkyl group, a bridged hydrocarbon, a cyclopropyl group, a cyclopentyl group, a cyclohexyl group, a gold steel alkyl group, a 2-methyl-2-metal steel fet; , the original fatigue base, borneol base, isobornyl, bicyclononyl, dicyclopentyl, raw spine alkyl epoxy, capped, isodecyl, neocapped, tetracyclododecyl and the like. The ring-forming ring of at least two of R'13 to R'16 is, for example, a ring having a carbon number of 5 to 12 such as cyclopentene, cyclohexene, cycloheptene or cyclooctene. The above R'172 alkoxy group has, for example, a carbon number of 1 to 4 such as a methoxy group, an ethoxy group, a propoxy group or a butoxy group. The substituent of the alkyl group, the cyclic hydrocarbon group or the alkoxy group may, for example, be a hydroxyl group, a halogen atom, a carboxyl group, an alkoxy group, a decyl group, a cyano group or a decyloxy group. The halogen atom has, for example, a chlorine atom, a bromine atom, a fluorine atom, an iodine atom or the like. The alkoxy group has, for example, a methoxy group, an ethoxy group, a propoxy group, a butoxy group or the like having 4 carbon atoms, and the fluorenyl group is, for example, a fluorenyl group or an ethyl fluorenyl group. . The divalent linking group of the above A is, for example, the same as the divalent linking group of the above general formula (1), and may be independently selected from a single bond, an alkylene group, a substituted alkyl group, an ether group, a thioether group, or a carbonyl group. , ester group, decylamine, sulfonamide, amine-66- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). ------ (Please read the back of the note first) Please fill out this page again)

· 1257528 A7 ---------B7___ 65 ' " " ^ 五、發明說明（）基甲酸酯基、尿素基所成群者、或組合2種以上之基。上述A之伸烷基、取代的伸烷基例如與上述一般式（I a π ) 之Α的2價連結基相同。本發明之樹脂中藉由酸作用分解的基可含有至少一種一般式（I a ")所示之重覆單位、一般式（I b ")所示之重覆單位、一般式（11 ")所示之重覆單位、以及下述共聚合成分之重覆單位的重覆單位。上述一般式（ΙΙΠ-Α)或一般式（II"-B)之R’13〜R，16t 各種取代基係爲上述一般式（11π )中爲形成之脂環式構造的原子團或爲形成有橋式脂環式構造之原子團Ζ的取代基所成者。上述一般式（II"- Α)或一般式（II"- Β)所示重覆單位的具體例如下述之（11 -1 )〜（11 - 1 6 6 )，惟本發明不受此等請先閱讀背面之注意事項再填寫本頁 1257528 A7 B7· 1257528 A7 ---------B7___ 65 ' "" ^ V. INSTRUCTIONS () Group of carbamate groups, urea groups, or a combination of two or more groups. The alkylene group and the substituted alkylene group of the above A are, for example, the same as the divalent linking group of the above formula (I a π ). The group decomposed by the acid action in the resin of the present invention may contain at least one repeating unit represented by the general formula (I a "), a repeating unit represented by the general formula (I b "), and a general formula (11). The repeat unit shown in ") and the repeat unit of the repeat unit of the following copolymerization component. R'13~R, 16t of the above general formula (ΙΙΠ-Α) or the general formula (II"-B) is an atomic group of the alicyclic structure formed in the above general formula (11π) or formed The substituent of the atomic group of the bridged alicyclic structure. The specific unit of the above general formula (II "- Α) or the general formula (II "- Β) is, for example, the following (11 -1 ) to (11 - 1 6 6 ), but the present invention is not subject to such Please read the notes on the back and fill out this page 1257528 A7 B7

[II-l] 0 0[II-l] 0 0

0 00 0

CiI-2]CiI-2]

[II-3] 0 0 H CH2OCH2CH3[II-3] 0 0 H CH2OCH2CH3

[II-4] «0 0 0 H CH(CH3)OCH2CH3[II-4] «0 0 0 H CH(CH3)OCH2CH3

[II-5] ^=0 0 0 H CH(CH3)OCH2CH(CH3)2[II-5] ^=0 0 0 H CH(CH3)OCH2CH(CH3)2

[II-6][II-6]

[II-7][II-7]

[II-8] 裝--------訂---- (請先閱讀背面之注意事項再填寫本頁)[II-8] Pack--------Book---- (Please read the notes on the back and fill out this page)

0 0、0 0,

[II-10] 〇〇、[II-10] 〇〇,

〇 xh2och2ch3〇 xh2och2ch3

〇、(:H(CH3)OCH2CH3 -68- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（k〇 , (:H(CH3)OCH2CH3 -68- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (k

[11 一11] y=〇 [Π-12] 0 0 0 0 NCH2CH2C C(CH3)3 HOH2CH2C C(CH3)3[11-11] y=〇 [Π-12] 0 0 0 0 NCH2CH2C C(CH3)3 HOH2CH2C C(CH3)3

[11-13][11-13]

〔II-14] 0 0 hoh2ch2c ch2och2ch3 h3ch2coh2ch2c ch2och2ch3[II-14] 0 0 hoh2ch2c ch2och2ch3 h3ch2coh2ch2c ch2och2ch3

[11-15][11-15]

[11-16] 0 0 0 0 hooch2ch2coh2ch2c ch2och2ch3[11-16] 0 0 0 0 hooch2ch2coh2ch2c ch2och2ch3

NHONHO

NHO 裝--------訂--- (請先閱讀背面之注意事項再填寫本頁)NHO Pack--------Book--- (Please read the notes on the back and fill out this page)

hooch2c 經濟部智慧財產局員工消費合作社印製 [II-17] 〇Hooch2c Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing [II-17] 〇

[11-20] h3c~o2s—hn-oc-h2ch2c c(ch3)3 h3co2s ch2och2ch3 -69- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（w[11-20] h3c~o2s-hn-oc-h2ch2c c(ch3)3 h3co2s ch2och2ch3 -69- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention Description (w

[II-21][II-21]

[11-22][11-22]

〇[II-25] 〇0 〇 [H-23] η π〇[II-25] 〇0 〇 [H-23] η π

裝---- (請先閱讀背面之注意事項再填寫本頁)Pack---- (Please read the notes on the back and fill out this page)

C(CH3)3C(CH3)3

— — — — — — — —— — — — — — — —

0气产0 [11-27] 〇0 I ch2〇ch2ch30 gas production 0 [11-27] 〇0 I ch2〇ch2ch3

0=\ /==0 〇〇 [11-28] CH(CH3)〇CH2CH(CH3)2 經濟部智慧財產局員工消費合作社印製0=\ /==0 〇〇 [11-28] CH(CH3)〇CH2CH(CH3)2 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs

-7G- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（呤）-7G- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (呤)

[II-31][II-31]

[11-32] 0 0 I[11-32] 0 0 I

ΗΗ

[11-33][11-33]

八0 〇 0、〔II-34] 0 0八0 〇 0, 〔II-34] 0 0

0 ο [II-38] / CH2CH2OCH2CH30 ο [II-38] / CH2CH2OCH2CH3

[11-40] 0 ^Τ-γΟίίΝ[11-40] 0 ^Τ-γΟίίΝ

CH(CH3)C00H 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明（)CH(CH3)C00H This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) [257528 A7 B7 V. Invention description ()

[11-41] 0 0[11-41] 0 0

[11-42] 0 0[11-42] 0 0

[11-43] 0 0 H CH2OCH2CH3[11-43] 0 0 H CH2OCH2CH3

[II-44] 0 0 I裝---- (請先閱讀背面之注意事項再填寫本頁)[II-44] 0 0 I---- (Please read the notes on the back and fill out this page)

[II-45][II-45]

_ NH〇 ()-0257 C(CH3)3 0 0 H CH(CH3)OCH2CH(CH3)2 ^^1 經濟部智慧財產局員工消費合作社印製_ NH〇 ()-0257 C(CH3)3 0 0 H CH(CH3)OCH2CH(CH3)2 ^^1 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

[II-47][II-47]

〇〇 [11-48] 0 ο ch2och2ch3〇〇 [11-48] 0 ο ch2och2ch3

〇 cr 72· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ch2och2ch3 〇 1257528 A7 B7 五、發明說明（？/〇 cr 72· This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ch2och2ch3 〇 1257528 A7 B7 V. Invention description (?/

0 00 0

[11-50J 〔11-49][11-50J [11-49]

0 0 nch2ch2c C(CH3)30 0 nch2ch2c C(CH3)3

[II-52] 0 0 HOH2CH2C C(CH3)3 (請先閱讀背面之注意事項再填寫本頁)[II-52] 0 0 HOH2CH2C C(CH3)3 (Please read the notes on the back and fill out this page)

裝Loading

[11-53][11-53]

ο ο hoh2ch2c ch2och2ch3 h3ch2coh2ch2c ch2och2ch3 ----訂i % 經濟部智慧財產局員工消費合作社印製ο ο hoh2ch2c ch2och2ch3 h3ch2coh2ch2c ch2och2ch3 ----Book i % Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed

[II-55] 0 0 hooch2c ch2och2ch3[II-55] 0 0 hooch2c ch2och2ch3

[II-56] 0 0 NCH2CH2C CH(CH3)OCH2CH3 73- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（π[II-56] 0 0 NCH2CH2C CH(CH3)OCH2CH3 73- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention description (π

[11-57] ΝΗ 0[11-57] ΝΗ 0

HOOC(H3C)HC CH(CH3)OCH2CH3 H3C02SHN0CH2C C(CH3)3HOOC(H3C)HC CH(CH3)OCH2CH3 H3C02SHN0CH2C C(CH3)3

hoh2ch2cooch2c ch2och2ch3Hoh2ch2cooch2c ch2och2ch3

[11-60][11-60]

[11-61][11-61]

0 0 CH2OCH2CH3 ------.--_l- 裝--------訂-丨 (請先閱讀背面之注音？事項再填寫本頁) % 經濟部智慧財產局員工消費合作社印製0 0 CH2OCH2CH3 ------.--_l- Pack--------Book-丨(Please read the phonetic on the back? Please fill out this page) % Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative system

74- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公f ) [257528 A7 B7 五、發明說明（〇)74- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 public f) [257528 A7 B7 V. Invention description (〇)

[11-66] ，〇0[11-66] , 〇0

[11-67] CH(CH3)OCH2CH{CH3)2[11-67] CH(CH3)OCH2CH{CH3)2

0 0 I CH2OCH2CH30 0 I CH2OCH2CH3

[11-68][11-68]

[II-69] 0 0 -裝--------訂---- (請先閱讀背面之注意事項再填寫本頁)[II-69] 0 0 -装--------Book---- (Please read the notes on the back and fill out this page)

cor 〇〇 I CH2〇CH3Cor 〇〇 I CH2〇CH3

CH(CH3)OCH2CH3 ·#! 經濟部智慧財產局員工消費合作社印製CH(CH3)OCH2CH3 ·#! Printed by the Intellectual Property Office of the Ministry of Economic Affairs

H00CH00C

• 75« 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明（糾• 75« This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) [257528 A7 B7 V. Invention Description

[II-71][II-71]

[II-72][II-72]

0 0 IΗ0 0 IΗ

[II-73][II-73]

[II-74] 0。。、[II-74] 0. . ,

0 0 經濟部智慧財產局員工消費合作社印製0 0 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

76- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） Λ ι_ϋ tmmm 1 I Ml ϋ« —B*i 一 0, I .1 I ^1. (請先閱讀背面之注意事項再填寫本頁)76- The paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) Λ ι_ϋ tmmm 1 I Ml ϋ« —B*i a 0, I .1 I ^1. (Please read the back note first) Please fill out this page again)

257528 A7 B7 五、發明說明（#257528 A7 B7 V. Invention Description (#

[11-79] \[11-79] \

[11-80] ΌΗΝ[11-80] ΌΗΝ

CHXOOH S02CH3 C(CH3)3 [II-81]CHXOOH S02CH3 C(CH3)3 [II-81]

[II-83] Ο ι ch2och2ch3 -裝---- (請先閱讀背面之注意事項再填寫本頁)[II-83] ι ι ch2och2ch3 - Pack---- (Please read the notes on the back and fill out this page)

〇 I〇 I

[II-86] 〇、訂--- CH(CH3)OCH2CH3 CH(CH3)OCH2CH(CH3)2 r°) 經濟部智慧財產局員工消費合作社印製[II-86] 〇, 订--- CH(CH3)OCH2CH3 CH(CH3)OCH2CH(CH3)2 r°) Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs

〇〇

[11-88][11-88]

_ 77 — 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） :257528 A7 B7 五、發明說明（)_ 77 — This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm): 257528 A7 B7 V. Invention Description ()

〇 0 [11-95]〇 0 [11-95]

COOCH,COOCH,

〇[11 -96] ~ ν〇[ΙΙ^97]? ? H CH2CH2OH〇[11 -96] ~ ν〇[ΙΙ^97]? ? H CH2CH2OH

〇經濟部智慧財產局員工消費合作社印製印 Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative

〇、 XH2CH2OCH。。 [II-98]〇, XH2CH2OCH. . [II-98]

78- --------tr--------- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）78- --------tr--------- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm)

I :257528 A7 B7 五、發明說明I : 257528 A7 B7 V. Description of invention

[11-103][11-103]

[II-104] 0. HN、[II-104] 0. HN,

XH2CH2OCH2CH2OHXH2CH2OCH2CH2OH

CHoCOOHCHoCOOH

ΗΝ·ΗΝ·

[11-106][11-106]

XH(CH3)COOHXH(CH3)COOH

[II-110] HN、 [II-108][II-110] HN, [II-108]

HN,HN,

[11-109] 、ch(ch3)coo~<^^[11-109] , ch(ch3)coo~<^^

HNHN

[II-111] (請先閱讀背面之注意事項再填寫本頁) #t —訂---- #[II-111] (Please read the notes on the back and fill out this page) #t —订---- #

'CH2COOCH2CH2CN 、'CH2COOCH2CH2CN,

CH2COOCH2CH2OH 經濟部智慧財產局員工消費合作社印製CH2COOCH2CH2OH Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing

HN. CH2COOCH2CH2OCH2CH3 79, 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明（7，）HN. CH2COOCH2CH2OCH2CH3 79, This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) [257528 A7 B7 V. Invention description (7,)

CH2OCH2CH3CH2OCH2CH3

[II-117][II-117]

〔II-118] , ? 〇、A CH(CH3)OCH2CH3 CH(CH3)OCH2CH(CH3)2[II-118] , ? A, A CH(CH3)OCH2CH3 CH(CH3)OCH2CH(CH3)2

[II-120] 〇[II-120] 〇

[II-121] 0 --------訂---- (請先閱讀背面之注意事項再填寫本頁)[II-121] 0 --------Book---- (Please read the notes on the back and fill out this page)

[11-124] 〇[11-124] 〇

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明)This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) [257528 A7 B7 V. Description of invention)

[11-125][11-125]

0H0H

[Π-Ι26][Π-Ι26]

COOHCOOH

[II-130] 〇 ch2ch2cn[II-130] 〇 ch2ch2cn

s〇2ch3S〇2ch3

------------裝--------訂--- (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製------------Installation--------Book--- (Please read the notes on the back and fill out this page) Printed by the Intellectual Property Office of the Ministry of Economic Affairs

[II-133][II-133]

[II-134] 〇 CH2CH2OCH2CH3[II-134] 〇 CH2CH2OCH2CH3

〇 I CH.COOH 81 一本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） :257528 A7 B7 五、發明說明（&〇 I CH.COOH 81 One paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm): 257528 A7 B7 V. Inventions (&

[11-135][11-135]

ο ι ch2ch2och2ch2oh ch2coohο ι ch2ch2och2ch2oh ch2cooh

CH(CH3)C00HCH(CH3)C00H

[II-138] [II-141] HN[II-138] [II-141] HN

[II-139] 〇 0¾[II-139] 〇 03⁄4

〇〇

[II-142] ------!丨#裝 (請先閱讀背面之注意事項再填寫本頁) 1_1 1 -IBi ϋ n 1 一 ^ I i H 11 11 ϋ . CH(CH3)C00* .0 〇〜 CHoCOO· 經濟部智慧財產局員工消費合作社印製 ο[II-142] ------!丨#装 (Please read the notes on the back and fill out this page) 1_1 1 -IBi ϋ n 1 一 ^ I i H 11 11 ϋ . CH(CH3)C00* .0 〇~ CHoCOO· Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative ο

[II-143] HN[II-143] HN

[11-144] HN[11-144] HN

CH2COOCH2CH2CNCH2COOCH2CH2CN

CH(CH3)COOCH2CH2OH -82- 本紙張尺度適用中國國家標準（CNS)A4規格（210 χ 297公釐） 1257528 A7 B7 五、發明說明（CH(CH3)COOCH2CH2OH -82- This paper scale applies to China National Standard (CNS) A4 specification (210 297 297 mm) 1257528 A7 B7 V. Description of invention (

ΗΝΗΝ

CH2COOCH2CH2OH CH2COOCH2CH2OCH2CH3 [II-147] [II-148] [11-149]CH2COOCH2CH2OH CH2COOCH2CH2OCH2CH3 [II-147] [II-148] [11-149]

CNCN

ClCl

[II-149] h3c cn[II-149] h3c cn

[11-150] HO[11-150] HO

[11-151] CONH〇[11-151] CONH〇

[11-152][11-152]

h3c conh2 [II一153] ^ Ί [II-154] C0NHC(CH3)2CH2S03H 〇C〇CH3 >裝--------訂---- (請先閱讀背面之注意事項再填寫本頁)H3c conh2 [II-153] ^ Ί [II-154] C0NHC(CH3)2CH2S03H 〇C〇CH3 >装--------Book---- (Please read the notes on the back and fill in this page)

[II-155][II-155]

〔11-156][11-156]

[11-157] 經濟部智慧財產局員工消費合作社印制衣[11-157] Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumption Cooperative, Printed Clothes

[11-160] 83· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）[11-160] 83· This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm)

Cl CONH, 1257528 A7 B7 i、發明說明（ 82Cl CONH, 1257528 A7 B7 i, description of the invention (82

[II-161] CONH,[II-161] CONH,

[II-162J conhc(ch3)2ch2so3h[II-162J conhc(ch3)2ch2so3h

[II-163] OCOCH,[II-163] OCOCH,

[11-164][11-164]

[11-165][11-165]

[11-166] 本發明之樹脂係含有至少1種一般式（la π)及一般式 (lb”）所示之重覆單位中任一種構造單位、以及一般式 (11")(含有一般式（11" - A )、一般式（11" - B))所示之重覆單位外，以調節乾式蝕刻耐性或標準顯像液適性、基板密接性、阻體外型、以及阻體之一般必要要件的解像力、耐熱性、感度等爲目的時，可含有各種單體之重覆單位的共聚物。較佳的共聚物成分例如有下述一般式（1 V ' )、（ V ·)所示之重覆單位。 -------裝--------訂_| (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製[11-166] The resin of the present invention contains at least one structural unit represented by at least one of the general formula (la π) and the general formula (lb"), and a general formula (11 ") (including a general formula) (11" - A), general formula (11 " - B)), in addition to repeating units, to adjust the dry etching resistance or standard imaging liquid suitability, substrate adhesion, external resistance type, and general resistance of the body For the purpose of resolution, heat resistance, sensitivity, etc., the copolymer may be a repeating unit of various monomers. Preferred copolymer components are, for example, the following general formulas (1 V ' ) and (V ·). Repeat the unit. -------Install--------Book_| (Please read the note on the back and fill out this page) Printed by the Intellectual Property Office of the Ministry of Economic Affairs

CT 丫、0CT 丫, 0

[V，] 〇’’丫、’0 (其中，Z 係表示-NH-、-N(R、0)-，R、係爲與上述相同的（取代）烷基 -84- -N( -〇S〇2R，5Q)-， (取代）環狀烴基）本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7___ 五、發明說明（83) 上述一般式（I V Μ、（ V )所示之重覆單位的具體例如下述之（IV，- 9)〜（IV’ -16)、（V’ - 9)〜（V’ -16)，惟本發明不受此等具體例所限制。 -裝---- (請先閱讀背面之注意事項再填寫本頁)[V,] 〇''丫, '0 (wherein Z is -NH-, -N(R, 0)-, and R is the same (substituted) alkyl-84--N (-) 〇S〇2R,5Q)-, (substituted) cyclic hydrocarbon group) This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7___ V. Description of invention (83) The above general formula (IV) Specific examples of the repeating unit represented by Μ and (V) are, for example, the following (IV, - 9) to (IV' - 16), (V' - 9) to (V' - 16), but the present invention is not Limitations of these specific examples. - Packing---- (Please read the notes on the back and fill out this page)

訂· I % 經濟部智慧財產局員工消費合作社印製 -85- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明（η )Order · I % Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed -85- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) [257528 A7 B7 V. Invention Description (η)

Η 0S02CH3Η 0S02CH3

[IV，-14] oso2cf3 oso2ch2ch2ch2ch3[IV,-14] oso2cf3 oso2ch2ch2ch2ch3

[IV，-15][IV, -15]

0S02-CF2(CF2)6CF3 -裝---- (請先閱讀背面之注意事項再填寫本頁)0S02-CF2(CF2)6CF3 - Packing---- (Please read the notes on the back and fill out this page)

〇’〇0〇’〇0

HH

[v'-n] 0S09CH, 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（ 85[v'-n] 0S09CH, This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (85

(ν’ ι‘π -〇(ν’ ι‘π -〇

0S02~CF2(CF2)6CF3 經濟部智慧財產局員工消費合作社印製樹脂（B)中，以完全不具芳香環及碳-碳多鍵者最佳。藉此可增加對220nm以下波長光之透的性、且提高圖樣外型。 (B)成分之酸分解性樹脂（B-1)或本發明之樹脂（B-2) 係除上述重覆構造單位外、以調整乾式蝕刻耐性或標準顯像液適性、基板密接性、阻體外型、以及阻體之一般必要特性之解像力、耐熱性、感度等爲目的時，可含有各種重覆構造單位。其他重覆構造單位係以含有羥基、羰基之脂環式烴基的（甲基）丙烯酸酯較佳。更佳者爲3-羥基-1-金剛烷基 (甲基）丙烯酸酯、3，5-二羥基-1-金剛烷基（甲基）丙烯 -8 7 _ · ϋ iui .^1 ϋ ί n ·ϋ 一-0、 ϋ ϋ ·.1 I n ϋ I I (請先閱讀背面之注咅Μ事項再填寫本頁)0S02~CF2(CF2)6CF3 Printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs. In the resin (B), it is best to have no aromatic ring and carbon-carbon multiple bond at all. Thereby, the transparency of light having a wavelength of 220 nm or less can be increased, and the appearance of the pattern can be improved. The acid-decomposable resin (B-1) of the component (B) or the resin (B-2) of the present invention is adjusted in accordance with the above-mentioned repeated structural unit to adjust dry etching resistance or standard developing solution suitability, substrate adhesion, and resistance. When the external type and the general necessary characteristics of the barrier are required for resolution, heat resistance, sensitivity, etc., various rectifying structural units may be contained. The other repeating structural unit is preferably a (meth) acrylate having an alicyclic hydrocarbon group having a hydroxyl group or a carbonyl group. More preferably, it is 3-hydroxy-1-adamantyl (meth) acrylate, 3,5-dihydroxy-1-adamantyl (meth) propylene-8 7 _ · ϋ iui .^1 ϋ ί n ·ϋ一-0, ϋ ϋ ·.1 I n ϋ II (Please read the notes on the back and fill out this page)

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） !257528 A7 B7 經濟部智慧財產局員工消費合作社印製 i、發明說明（86) 酸酯。藉此可微調整上述樹脂所要求的性能，尤其是 (1 )對塗覆溶劑之解性、 (2 )製膜性（玻璃轉移點） (3)鹼顯像性、 (4 )膜邊緣（親疏水性、鹼可溶性基選擇）、 (5)對未曝光部基板之密接性、 (6 )乾式鈾刻耐性。該共聚合單體例如有丙烯酸酯類、甲基丙烯酸酯類、丙烯酸醯胺類、甲基丙烯酸醯胺類、烯丙基化合物、乙烯醚類、乙烯酯類等具一個選自加成聚合性不飽和鍵之化合物等。具體而言例如，丙烯酸酯類（烷基之碳數爲1〜1 0之丙烯酸烷酯）：丙烯酸甲酯、丙烯酸乙酯、丙烯酸丙酯、丙烯酸戊酯、丙烯酸環己酯、丙烯酸乙基己酯、丙烯酸辛酯、丙烯酸-第五辛酯、丙烯酸氯化乙酯、丙烯酸2-羥基乙酯、丙烯酸2,2-二甲基羥基丙酯、丙烯酸5-羥基苯甲酯、單丙烯酸三羥甲基丙烷酯、單丙烯酸季戊四醇酯、丙烯酸苯甲酯、丙烯酸甲氧基苯甲酯、丙烯酸芴酯、丙烯酸四氫芴酯等。甲基丙烯酸酯類（烷基之碳數爲1〜1 0之甲基丙烯酸烷酯）·· 甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸丙酯 -88- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁)This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) !257528 A7 B7 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing i, invention description (86) acid ester. Thereby, the properties required for the above resins can be finely adjusted, in particular (1) solubility to the coating solvent, (2) film forming property (glass transfer point), (3) alkali developability, and (4) film edge ( (hydrophobic, alkali-soluble base selection), (5) adhesion to the unexposed substrate, and (6) dry uranium tolerance. The copolymerizable monomer is, for example, an acrylate, a methacrylate, an decyl amide, a decyl methacrylate, an allyl compound, a vinyl ether or a vinyl ester, and the like is one selected from the group consisting of addition polymerization. A compound such as an unsaturated bond. Specifically, for example, acrylates (alkyl acrylates having an alkyl group number of 1 to 10): methyl acrylate, ethyl acrylate, propyl acrylate, amyl acrylate, cyclohexyl acrylate, ethyl acrylate Ester, octyl acrylate, acrylic acid-fifth octyl ester, ethyl acrylate, 2-hydroxyethyl acrylate, 2,2-dimethylhydroxypropyl acrylate, 5-hydroxybenzyl acrylate, trishydroxy methacrylate Methylpropane ester, pentaerythritol monoacrylate, benzyl acrylate, methoxybenzyl acrylate, decyl acrylate, tetrahydrofurfuryl acrylate, and the like. Methacrylates (alkyl methacrylates with a carbon number of 1 to 10) · Methyl methacrylate, ethyl methacrylate, propyl methacrylate-88- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) (Please read the notes on the back and fill out this page)

裝 · # 1257528 A7Clothing · # 1257528 A7

經濟部智慧財產局員工消費合作社印製五、發明說明（87 ) 、甲基丙烯酸異丙酯、甲基丙烯酸醯酯、甲基丙烯酸己酯、甲基丙烯酸環己酯、甲基丙烯酸苯甲酯、甲基丙烯酸氯化苯甲酯、甲基丙烯酸辛酯、甲基丙烯酸2 -羥基乙酯、甲基丙烯酸4 -羥基丁酯、甲基丙烯酸5 -羥基苯甲酯、甲基丙烯酸2，2 -二甲基-3-羥基丙酯、單甲基丙烯酸三羥甲基丙烷酯、單甲基丙烯酸季戊四醇酯、甲基丙烯酸芴酯、甲基丙烯酸四氫芴酯等。丙烯酸醯胺類：丙烯酸醯胺、N-烷基丙烯酸醯胺（烷基爲碳數1〜1〇者 ’如甲基、乙基、丙基、丁基、第3-丁基、庚基、辛基、環己基、羥基乙基等）、N，N-二烷基丙烯酸醯胺（烷基爲碳數1〜10者，例如甲基、乙基、丁基、異丁基、乙基己基、環己基等）、N-羥基乙基-N-甲基丙烯酸醯胺、N-2-乙烯基醯胺基乙基乙醯基丙烯酸醯胺等。甲基丙烯酸醯胺類：甲基丙烯酸醯胺、N-烷基甲基丙烯酸醯胺（烷基爲碳數 1〜10者，如甲基、乙基、第3 -丁基、乙基己基、羥基乙基、環己基等）、N，N-二烷基甲基丙烯酸醯胺（烷基爲乙基、丙基、丁基等）、N-羥基乙基-N-甲基甲基丙烯酸醯胺等。烯丙基化合物：烯丙酯類例如醋酸烯丙酯、己酸烯丙酯、己酸烯丙酯、月桂酸烯丙酯、棕櫚酸烯丙酯、硬酯酸烯丙酯、苯甲酸烯丙酯、乙醯醋酸烯丙酯、乳酸烯丙酯等）、烯丙氧 -89- 本紙張尺度_巾關家標準（CNS)A4規格（21〇 X 297公f ) 一裝---- (請先閱讀背面之注意事項再填寫本頁)Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives, Printing, V. Inventions (87), isopropyl methacrylate, decyl methacrylate, hexyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate , benzyl methacrylate, octyl methacrylate, 2-hydroxyethyl methacrylate, 4-hydroxybutyl methacrylate, 5-hydroxybenzyl methacrylate, methacrylic acid 2,2 - dimethyl-3-hydroxypropyl ester, trimethylolpropane monomethacrylate, pentaerythritol monomethacrylate, decyl methacrylate, tetrahydrofurfuryl methacrylate, and the like. Ammonium acrylates: decylamine acrylate, N-alkyl decyl amide (alkyl group is 1 to 1 carbon number) such as methyl, ethyl, propyl, butyl, 3-butyl, heptyl, Octyl, cyclohexyl, hydroxyethyl, etc.), N,N-dialkyl decyl acrylate (alkyl group having a carbon number of 1 to 10, such as methyl, ethyl, butyl, isobutyl, ethylhexyl , cyclohexyl, etc.), N-hydroxyethyl-N-methyl methacrylate, N-2-vinylnonylaminoethyl decyl decylamine, and the like. Ammonium methacrylates: decylamine methacrylate, decylamine N-alkyl methacrylate (alkyl group is a carbon number of 1 to 10, such as methyl, ethyl, -3-butyl, ethylhexyl, Hydroxyethyl, cyclohexyl, etc.), N,N-dialkylammonium methacrylate (alkyl is ethyl, propyl, butyl, etc.), N-hydroxyethyl-N-methylmethacrylate Amines, etc. Allyl compound: allyl esters such as allyl acetate, allyl hexanoate, allyl hexanoate, allyl laurate, allyl palmitate, allyl stearyl, allyl benzoate Ester, allyl acetate, allyl lactate, etc.), allylic oxygen-89- The paper size _ towel Guanjia standard (CNS) A4 specification (21〇X 297 public f) One---- ( Please read the notes on the back and fill out this page.)

1257528 經濟部智慧財產局員工消費合作社印製 A7 B7 88 五、發明說明（) 基乙醇等。乙烯醚類：烷基乙醯醚例如己基乙烯醚、辛基乙烯醚、癸基乙烯醚、乙基己基乙烯醚、甲氧基乙基乙烯醚、乙氧基乙基乙烯醚、氯化乙基乙烯醚、1-甲基-2,2 -二甲基丙基乙烯醚、2 -乙基丁基乙烯醚、羥基乙基乙烯醚、二乙二醇乙烯醚、二甲基胺基乙基乙烯醚、二乙基胺基乙基乙烯醚、丁基胺基乙基乙烯醚、苯甲基乙烯醚、四氫芴基乙烯醚等。乙烯酯類：丁酸乙烯酯、異丁酸乙烯酯、三甲基乙酸乙烯酯、二乙基乙酸乙烯酯、癸酸乙烯酯、己酸乙烯酯、氯化乙酸乙烯酯、二氯化乙酸乙烯酯、甲氧基乙酸乙烯酯、丁氧基乙酸乙烯酯、乙醯基乙酸乙烯酯、乳酸乙烯酯、/3 -苯基丁酸乙烯酯、環己基羧酸乙烯酯等。衣康酸二烷酯類：衣康酸二甲酯、衣康酸二乙酯、衣康酸二丁酯等。其他的檸檬酸、衣康酸、馬來酸酐、馬來醯亞胺、丙烯腈、甲基丙烯腈、馬來腈等。其他只要是可與上述各種重覆構造單位之單體共聚合的加成聚合性不飽和化合物，即可予以共聚合。於酸分解性樹脂（B -1 )中各重覆構造單位之含有莫耳比，就爲調節阻體之乾式蝕刻耐性或標準顯像液適性、基板密接性、阻體外型、以及一般阻體之必要要件的解 -90- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） W裝--------訂i (請先閱讀背面之注咅？事項再填寫本頁)1257528 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed A7 B7 88 V. Invention description () base ethanol. Vinyl ethers: alkyl ethyl ethers such as hexyl vinyl ether, octyl vinyl ether, mercapto vinyl ether, ethylhexyl vinyl ether, methoxy ethyl vinyl ether, ethoxyethyl vinyl ether, ethyl chloride Vinyl ether, 1-methyl-2,2-dimethylpropyl vinyl ether, 2-ethylbutyl vinyl ether, hydroxyethyl vinyl ether, diethylene glycol vinyl ether, dimethylaminoethyl ethylene Ether, diethylaminoethyl vinyl ether, butylaminoethyl vinyl ether, benzyl vinyl ether, tetrahydrofurfuryl vinyl ether, and the like. Vinyl esters: vinyl butyrate, vinyl isobutyrate, trimethyl vinyl acetate, diethyl vinyl acetate, vinyl phthalate, vinyl hexanoate, vinyl acetate, vinyl acetate Ester, methoxyvinyl acetate, butoxy vinyl acetate, ethylene glycol acetate, vinyl lactate, vinyl 3-triphenylbutyrate, vinyl cyclohexylcarboxylate, and the like. Diacontanic acid esters: dimethyl itaconate, diethyl itaconate, dibutyl itaconate, and the like. Other citric acid, itaconic acid, maleic anhydride, maleimide, acrylonitrile, methacrylonitrile, maleonitrile, and the like. Others may be copolymerized as long as they are copolymerizable unsaturated compounds which are copolymerizable with the monomers of the above various repeating structural units. The molar ratio of each of the repeating structural units in the acid-decomposable resin (B-1) is the dry etching resistance or standard developing solution suitability, substrate adhesion, external resistance type, and general resistance of the resist. Solution to the necessary requirements -90- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) W-------------- i (please read the back note first? Fill in this page)

# 1257528 A7 B7_____ 五、發明說明（89) 像力、耐熱性、感度等而言予以適當地設定。酸分解性樹脂中（Β-1)之一般式（I Μ所示重覆構造單位的含量，於全部重覆構造單位中以30〜80莫耳％較佳、更佳者爲32〜75莫耳％、最佳者爲35〜70莫耳％。此外，酸分解性樹脂（Β-1 )中，一般式（1厂）所示重覆構造單位的含量，於全部重覆構造單位中以30〜70莫耳％較佳、更佳者爲32〜68莫耳％、最佳者爲35〜65莫耳％〇酸分解性樹脂（Β-1 )中一般式（111、a )〜（111 · - d )所示重覆構造單位的含量，於全部重覆構造單位中以0〜 20莫耳仍較佳、更佳者爲0〜18莫耳％、最佳者爲〇〜16 吴耳％。而且，另由上述所成的共聚合成分之單體爲基準，重覆構造單位之樹脂（B-1 )中含量係視其所企求的阻體性能予以適當地設定，惟一般而言對一般式（I·)及一般式 (Π ’）所示重覆構造單位所合計的總莫耳數而言以99莫耳％以下較佳、更佳者爲90莫耳％以下、最佳者爲80莫耳％以下。另外，於酸分解性樹脂（B -1 )中，藉由酸作用分解的基含有一般式（I’）及/或一般式（II，）所示重覆構造單位 ’以及共聚合成分之單體爲基準的重覆構造單位中任一‘ 種皆可，含有藉由酸作用分解的基之重覆構造單位的含量對樹脂之全部重覆構造單位而言爲10〜90莫耳％、較佳者爲20〜80莫耳％、更佳者爲30〜70莫耳％以下。 -91- 本紙張尺度適用中國國家標準（CNS)A4規格mo X 297公釐) ------H丨分裝 (請先閱讀背面之注意事項再填寫本頁) · # 經濟部智慧財產局員工消費合作社印製 1257528 A7 B7 90 五、發明說明（）上述之酸分解性樹脂（B - 1 )的分子量，重量平均（Mw : GPC法之聚苯乙儲換算値）以1，〇〇〇〜1，00〇，〇〇〇較佳、更佳者爲1,500〜500, 000、最佳者爲2,〇〇〇〜200,000、尤佳者爲2,500〜100,000，愈大時可提高耐熱性、惟會降低顯像性，故視此等之平衡而定調整於較佳的範圍。本發明所使用的酸分解性樹脂可藉由常法（例如游離基聚合）予以合成。本發明正型阻體組成物中，酸分解性樹脂（B - 1 )之阻體組成物全體中的配合量，在全部固成分中以40〜99. 99 重量％較佳、更佳者爲50〜99.97重量％。於下述中，係爲（B )成分之酸分解性樹脂（B -1 )的重覆構造單位之組合的較佳具體例、樹脂1〜樹脂1 6。 I C 裝--------訂---------. (請先閱讀背面之注音？事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 -92- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） [257528 A7 B7 五、發明說明（91 ) ch3 ch2-c-o=c 〇 H3CH2C-^^| c# 1257528 A7 B7_____ V. INSTRUCTIONS (89) Appropriately set for image power, heat resistance, sensitivity, etc. In the acid-decomposable resin, the general formula of (Β-1) (I Μ indicates the content of the repeating structural unit, preferably 30 to 80 mol% in all the repeating structural units, and more preferably 32 to 75 mol. In the case of the acid-decomposable resin (Β-1), the content of the repeating structural unit shown by the general formula (factory 1) is in all the repeating structural units. 30 to 70 mol% is better, more preferably 32 to 68 mol%, and the best is 35 to 65 mol%. The general formula (111, a) ~ in the tannic acid decomposable resin (Β-1) The content of the repeated structural unit shown in 111 · - d ) is preferably 0 to 20 mol in all the repeating structural units, more preferably 0 to 18 mol %, and most preferably 〇 16 16 Further, based on the monomer of the copolymerization component formed above, the content of the resin (B-1) in the structural unit of the repeat is appropriately set depending on the desired performance of the barrier, but generally It is preferable that the total number of moles of the total number of the structural units represented by the general formula (I.) and the general formula (Π ') is 99% by mole or less, and more preferably 90% by mole or less. Further, in the acid-decomposable resin (B-1), the group decomposed by the acid action contains a repeat of the general formula (I') and/or the general formula (II). The structure unit 'and any of the repeating structural units based on the monomer of the copolymerization component may be used, and the content of the repeating structural unit containing the base decomposed by the acid action is for all the repeating structural units of the resin. It is 10 to 90% by mole, preferably 20 to 80% by mole, and more preferably 30 to 70% by mole. -91- This paper scale is applicable to China National Standard (CNS) A4 specification mo X 297厘) ------H丨分装 (Please read the notes on the back and fill out this page) · # 经济部Intelligent Property Bureau Staff Consumer Cooperatives Print 1257528 A7 B7 90 V. Invention Description () The above acid The molecular weight of the decomposable resin (B-1), the weight average (Mw: GPC method of polyphenylene storage 値) is 1, 〇〇〇~1,00 〇, 〇〇〇 is better, and more preferably 1,500~ 500, 000, the best is 2, 〇〇〇~200,000, and the better is 2,500~100,000. The larger the temperature, the better the heat resistance. It will reduce the imaging performance, so it is adjusted to the better range depending on the balance of these. The acid-decomposable resin used in the present invention can be synthesized by a usual method (e.g., radical polymerization). In the positive resist composition of the present invention, the total amount of the hindrance composition of the acid-decomposable resin (B-1) is preferably 40 to 99.9% by weight, more preferably 40% by weight of the total solid content. 50 to 99.97 wt%. In the following, a preferred specific example of the combination of the repeating structural units of the acid-decomposable resin (B-1) of the component (B), and the resin 1 to the resin 16 are used. IC Pack--------Book---------. (Please read the phonetic on the back? Please fill out this page again) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed -92- Paper The scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) [257528 A7 B7 V. Inventions (91) ch3 ch2-co=c 〇H3CH2C-^^| c

匕曰 ch3 ch2-c-匕曰 ch3 ch2-c-

H2 C 〇=c oH2 C 〇=c o

H3CH2C Η _ I c— cl C— 〇| C—CI t II 0 2 匕曰月樹H3CH2C Η _ I c— cl C— 〇| C—CI t II 0 2 匕曰月树

H3CH3C

CC

匕曰月樹 CH3 —ch2-c—— Io=c 丄樹脂4匕曰 month tree CH3 —ch2-c—— Io=c 丄 Resin 4

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -裝--------訂----- (請先閱讀背面之注意事項再填寫本頁)This paper scale is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) - Packing -------- Order----- (Please read the notes on the back and fill out this page)

1257528 A7 B7 五、發明說明（p) CH3 CH〇一C— I o=c I 〇 CH3 CHp-C-* I 〇=c I 〇1257528 A7 B7 V. INSTRUCTIONS (p) CH3 CH〇一 C— I o=c I 〇 CH3 CHp-C-* I 〇=c I 〇

CH3 ch2—c—- 〇=c OH 樹脂5CH3 ch2—c—-〇=c OH resin 5

〇 •ch2—ο ι o=c I 〇 H3CH2C-^| CH3 _ch2—c—— Io=c I 〇 I h3c—c—c~o I II ch3 o〇 •ch2—ο ι o=c I 〇 H3CH2C-^| CH3 _ch2—c—— Io=c I 〇 I h3c—c—c~o I II ch3 o

樹脂6 ch3 CHq 1 ch2—C—— 1 1 ——ch2-c—— —榭脂7 o=c I o=c 1 〇=c 1 〇 1 H3C© 0八〇Resin 6 ch3 CHq 1 ch2—C—— 1 1 —ch2-c————Rouge 7 o=c I o=c 1 〇=c 1 〇 1 H3C© 0 gossip

(請先閱讀背面之注意事項再填寫本頁) #裝訂----- 經濟部智慧財產局員工消費合作社印制衣 H3CH2C-(Please read the notes on the back and fill out this page) #装订----- Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperatives, Printing and Printing Clothing H3CH2C-

CH2~C—CH2~C—

樹脂8 •94· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（％ )Resin 8 •94· This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (%)

9 匕II ΠΜ^樹 2 Hc o H3c——c—cl〇 H2c o H3 c9 匕II ΠΜ^Tree 2 Hc o H3c——c-cl〇 H2c o H3 c

CICIO HPc oCICIO HPc o

2C H 3C H2C H 3C H

ο 匕曰月榭 3 Η Η c—C'丨c丨〇 ------!#裝 (請先閱讀背面之注意事項再填寫本頁)ο 匕曰月榭 3 Η Η c—C'丨c丨〇 ------!#装 (Please read the notes on the back and fill out this page)

Η3Η3

Η2- οΗ2- ο

H31 Η CICICIO 榭脂11 經濟部智慧財產局員工消費合作社印制衣H31 Η CICICIO Rouge 11 Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed Clothing

樹脂12 -*95 — 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）Resin 12 -*95 — This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)

H 257528 A7 B7 五、發明說明（料） ch3 —ch2-c—o=c Iο CHa ch2-c— o=c I o 樹脂13 h3ch2c-^| ch3 ch3 ch2—co*c ch3 ch •ch2—c—ch2-c 3 o=c I I o o HaC-^txd h3c4-〇 h3c o=c I SO3 榭脂14H 257528 A7 B7 V. Description of invention (material) ch3 —ch2-c—o=c Iο CHa ch2-c— o=c I o Resin 13 h3ch2c-^| ch3 ch3 ch2—co*c ch3 ch •ch2—c —ch2-c 3 o=c II oo HaC-^txd h3c4-〇h3c o=c I SO3 Rouge 14

OCH, -裝--------訂--- (請先閱讀背面之注意事項再填寫本頁)OCH, - Pack -------- Order --- (Please read the notes on the back and fill out this page)

ch3Ch3

CH 3 ch3 ch2—cCH 3 ch3 ch2—c

ch2-c—CH2—c·o=c o=c 樹脂15 經濟部智慧財產局員工消費合作社印製 /o10ch2-c—CH2—c·o=c o=c Resin 15 Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative /o10

II

nhch3 、οτ0~ΟΗNhch3, οτ0~ΟΗ

樹脂1 6 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） _96. 、發明說明（95) 本發明之樹脂（B-2)中，一般式（la")及/或一般式 (I b ")所示重覆構造單位、以及一般式（丨〗"）（含一般式 (I I " - A )、一般式（11 ” - B ))所示重覆構造單位的含量，就所企求的阻體之乾式蝕刻耐性、感度、圖樣之破裂防止性、基板密接性、阻體外型、以及一般阻體之必要要件的解像力、耐熱性等而言予以適當地設定。一般而言 ’本發明樹脂（B-2)之一般式（la”）及/或一般式（Ib”）所示重覆構造單位、以及一般式（11，）所示重覆單位的含量各爲於樹脂之全部重覆單位中25莫耳％以上、較佳者爲3 0莫耳％以上、更佳者爲3 5莫耳％以上。此外，於本發明之樹脂（B - 2 )中自上述較佳的共聚合單體衍生的重覆單位（一般式（IV，）或一般式（v，））之樹脂中含量係視其所企求的阻體性能予以適當地設定，惟一般而言對一般式（la")及/或一般式（11}")所示重覆構造單位以及一般式（丨b ")所示重覆構造單位合計的總莫耳數而言以99莫耳％以下較佳、更佳者爲90莫耳％以下、最佳者爲8 0莫耳％以下。另外’上述另以共聚合成分之單體爲基準的重覆構造單位之樹脂（B - 2 )中含量亦視企求企求的阻體性能予以適當地設定，惟一般而言對一般式（Ia")及/或一般式 (I b ")所示重覆單位以及一般式（π ")所示重覆單位合計的總莫耳數而言以99莫耳％以下較佳、更佳者爲90莫耳％以下、最佳者爲80莫耳％以下。以該共聚合成分之單體爲基準的重覆構造單位量若大經濟部智慧財產局員工消費合作社印製 I257528 A7 ------------------- 五、發明說明（96 ) 於99莫耳％時，無法得到充分的本發明效果故不爲企求。另外’本發明樹脂（B_2)中藉由酸作用分解之基含有般式（I a ")及/或一般式（丨b ")所示重覆構造構造單位、一般式（II")所示重覆構造單位，以及共聚合成分之單體爲基準的重覆構造單位中任一種皆可，含有藉由酸作用分解的基之重覆構造單位的含量對樹脂之全部重覆構造單位而言8〜60莫耳％、以10〜55莫耳％較佳、更佳者爲12〜50莫耳％。本發明之樹脂（B - 2 )可使一般式（11")所示重覆構造單位之單體及馬來酸酐、與使用共聚合成分時使該共聚合成分之單體共聚合、且在聚合觸媒存在下共聚合、使所得的共聚物之馬來酸酐的重覆單位在鹼性或酸性條件下與醇類開環酯化、或加水分解、且使後生成的羧酸部位藉由所企求的取代基變換方法予以合成。本發明樹脂（B-2)的重量平均分子量藉由GPC法之聚苯乙烯換算値以1,000〜200,000較佳。若重量平均分子量小於1，000時，由於耐熱性或乾式蝕刻耐性惡化故不爲企求。而若大於200,000時，由於顯像性不佳、黏度極高故製膜性不佳，而產生不爲企求的結果。本發明遠紫外線曝光用正型光阻劑組成物中，本發明全部的樹脂（B-2)之組成物全體中的配合量，在全部阻體固成分中以40〜99.99重量仍較佳、更佳者爲50〜 99.97 重量％。於下述中係爲（B)成分之發明樹脂（B-2)的重覆構造單位之較佳組合具體例、樹脂21〜樹脂33。 -98- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁)Resin 16 This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) _96. Inventive Note (95) In the resin (B-2) of the present invention, the general formula (la") and/or The repeated structure of the general formula (I b ") and the general structure (丨 ") (including the general formula (II " - A ), general formula (11 ′ - B)) The content of the unit is appropriately set in terms of the dry etching resistance, the sensitivity, the rupture prevention of the pattern, the substrate adhesion, the external resistance type, and the resolution and heat resistance of the necessary components of the general resist. In general, the content of the repeating unit shown by the general formula (la") and/or the general formula (Ib") of the resin (B-2) of the present invention and the repeating unit represented by the general formula (11). Each of the repeating units of the resin is 25 mol% or more, preferably 30 mol% or more, and more preferably 35 mol% or more. Further, the resin (B-2) of the present invention. a repeating unit derived from the above preferred copolymerized monomer (general formula (IV) or general formula (v,) The content of the resin is appropriately set depending on the desired resistance properties of the resin, but generally, for the general structural formula (la") and/or the general formula (11}"), the repeated structural unit and the general formula (总b ") The total number of moles of the total number of repeating structural units is preferably 99% by mole or less, more preferably 90% by mole or less, and most preferably 80% by mole or less. 'The content of the resin (B - 2 ) in the above-mentioned reconstituted structural unit based on the monomer of the copolymerization component is also appropriately set depending on the desired barrier property, but generally speaking, it is general (Ia") And / or the general formula (I b ") shown in the repeat unit and the total number of moles of the repeating unit shown by the general formula (π ") is preferably 99 mol% or less, more preferably 90% or less, and the best is 80% or less. The unit of the reconstituted structure based on the monomer of the copolymerization component is printed by the Ministry of Economic Affairs, Intellectual Property Office, and the employee consumption cooperative. I257528 A7 ---- --------------- V. Description of the invention (96) At 99% of the time, sufficient effect of the invention cannot be obtained. Further, the base of the resin (B_2) of the present invention which is decomposed by an acid action contains a repeating structural unit represented by the general formula (I a ") and/or the general formula (丨b "), and is generally Any of the repeating structural units represented by the formula (II") and the repeating structural unit based on the monomer of the copolymerized component, and the content of the repeating structural unit containing the base decomposed by the acid action on the resin The total repeating structural unit is 8 to 60 mol%, preferably 10 to 55 mol%, more preferably 12 to 50 mol%. The resin (B-2) of the present invention can copolymerize a monomer and a maleic anhydride in a repeating structural unit represented by the general formula (11 "), and a monomer which copolymerizes the copolymerized component when a copolymerized component is used, and Copolymerization in the presence of a polymerization catalyst, the repeated unit of maleic anhydride of the obtained copolymer is subjected to ring-opening esterification with an alcohol under alkaline or acidic conditions, or hydrolyzed, and the carboxylic acid moiety formed thereafter is obtained by The desired substituent transformation method is synthesized. The weight average molecular weight of the resin (B-2) of the present invention is preferably from 1,000 to 200,000 in terms of polystyrene conversion by the GPC method. When the weight average molecular weight is less than 1,000, heat resistance or dry etching resistance is deteriorated, which is not desirable. On the other hand, when it is more than 200,000, the film formation property is poor due to poor developability and high viscosity, and an undesired result is produced. In the positive-type photoresist composition for the far-ultraviolet light exposure of the present invention, the total amount of the components of the entire resin (B-2) of the present invention is preferably 40 to 99.99 by weight in the entire solid content of the resist. More preferably, it is 50 to 99.97% by weight. In the following, a preferred combination of the reconstituted structure of the inventive resin (B-2) of the component (B) is a resin 21 to a resin 33. -98- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm). Packing -------- Order --------- (Please read the notes on the back first. Fill in this page)

[257528 A7 B7 五、發明說明（9?) ch3[257528 A7 B7 V. Description of invention (9?) ch3

II 〇樹脂21 ch3coo-c—cooII 〇 Resin 21 ch3coo-c-coo

ο 〇樹脂22 經濟部智慧財產局員工消費合作社印製ο 树脂 Resin 22 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs

樹脂23 -99- (請先閱讀背面之注意事項再填寫本頁)Resin 23 -99- (Please read the notes on the back and fill out this page)

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention Description

樹脂24 (請先閱讀背面之注意事項再填寫本頁)Resin 24 (please read the notes on the back and fill out this page)

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樹脂25 ----訂----- 經濟部智慧財產局員工消費合作社印製Resin 25 ----Book----- Printed by the Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative

〇，、C/ -100- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 Α7 Β7 五、發明說明（竹〇,,C/ -100- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 Α7 Β7 V. Invention Description (Bamboo

0 0 樹脂270 0 Resin 27

樹脂28 ------卜丨一#裝 (請先閱讀背面之注意事項再填寫本頁) · 60 30 〇〇 ο ΟΗ 重Μ平均分子量：Β 1 0 0分散度1· 9 樹脂29 經濟部智慧財產局員工消費合作社印製Resin 28 ------ 丨丨 # # (Please read the note on the back and fill out this page) · 60 30 〇〇ο ΟΗ Heavy average molecular weight: Β 1 0 0 Dispersity 1· 9 Resin 29 Economy Ministry of Intellectual Property Bureau employee consumption cooperative printing

Ο 重量平均分子Μ : 7 3 0 0分散度2· -101- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）樹脂30 1257528 A7 五、發明說明（ 10(重量 Weight average molecular weight: 7 3 0 0 Dispersity 2· -101- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) Resin 30 1257528 A7 V. Invention description (10(

WM3WM3

WBB3 2 βWBB3 2 β

f%o A)+ 重说分子量7卿分«度2.0 經濟部智慧財產局員工消費合作社印製 [3 ]氟系及/或矽系界面活性劑本發明遠紫外線曝光用正型阻體組成物係以含有氟系及/或矽系界面活性劑較佳。氟系及/或矽系界面活性劑係爲至少一種氟系界面活性劑、矽系界面活性劑、及含有氟原子與矽原子兩者之界面活性劑。本發明之正型阻體組成物係藉由含有與上述界面活性有性，使用250nm以下、尤其是220nm以下之曝光光源時，可得感度、解像力、基板密接性、耐乾式飩刻性優異、且很少會有顯像缺點與殘渣之阻體圖樣。此等界面活性劑例如有特開昭62 - 36663號、特開昭 6 1 - 226746 號、特開昭 6 1 - 226745 號、特開昭 62 - 1 709 50 -102- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注音3事項再填寫本頁)F%o A)+ Re-speaking molecular weight 7 qingfen «degree 2.0 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing [3] fluorine-based and / or lanthanide surfactants The positive ultraviolet-ray exposure positive-type resist composition of the present invention It is preferred to contain a fluorine-based and/or lanthanoid surfactant. The fluorine-based and/or lanthanoid surfactant is at least one fluorine-based surfactant, a lanthanoid surfactant, and a surfactant containing both a fluorine atom and a ruthenium atom. The positive type resist composition of the present invention is excellent in sensitivity, resolution, substrate adhesion, and dry etching resistance by using an exposure light source having a compatibility with the above-described interface and using 250 nm or less, particularly 220 nm or less. And there are very few image defects and residue resistance patterns. Such surfactants include, for example, JP-A-62-36663, JP-A-61-226746, JP-A-61-226745, and JP-A-62-107-102-102- Standard (CNS) A4 specification (210 X 297 mm) (Please read the phonetic 3 on the back and fill out this page)

A7A7

I257528 五、發明說明（1〇1) 號、特開昭63 - 34540號、特開平7 - 230 1 65號、特開平8-62834號、特開平9 - 54432號、特開平9 - 5988號記載的界面活性劑，亦可直接使用下述市售的界面活性劑。可使用的市售界面活性劑例如有耶夫頓部（譯音）EF30 1 、EF303 (新秋田化成（股）製）、夫蘿拉頓（譯音）FC430、 431(住友史里耶姆（股）製）、梅卡法克（譯音）F171、F173 、F176、F189、F08(大日本油墨（股）製）、撒夫龍（譯音） S- 382、SC101、102、103、104、105、106(旭玻璃（股）製）等氟系界面活性劑或矽系界面活性劑。聚矽氧烷聚合物KP-341(信越化學工業（股）製）亦可使用作爲矽系界面活性劑。界面活性劑之配合量以本發明之組成物中固成分爲基準，通常爲0.001重量％〜2重量％、較佳者爲〇·〇1重量％〜1重量％。此等界面活性劑可單獨一種使用或2種以上組合使用。上述其他的界面活性劑之具體例如聚環氧乙烷月桂醚、聚環氧乙烷硬脂醚、聚環氧乙烷十六烷醚、聚環氧乙烷油酸醚等之聚環氧乙烷烷醚類，聚環氧乙烷辛基苯酚醚、聚環氧乙烷壬基苯酚醚等之聚環氧乙烷烷基芳香醚類，聚環氧乙烷·聚環氧丙烷嵌段共聚物類，山梨糖醇單月桂酸酯、山梨糖醇單棕櫚酸酯、山梨糖醇單硬脂酸酯、山梨糖醇單油酸酯、山梨糖醇三油酸酯、山梨糖醇三硬脂酯等之山梨糖醇脂肪酸酯類’聚環氧乙院山梨糖醇單月桂酸酯、聚環氧乙烷山梨糖醇單棕櫚酸酯、聚環 -103- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）裝--------訂--------· (請先閱讀背面之注意事項再填寫本頁)I257528 V. Description of invention (1〇1), special opening 63-34540, special Kaiping 7-230 1 65, special Kaiping 8-62834, special Kaiping 9-54432, and special Kaiping 9-5988 For the surfactant, the following commercially available surfactants can also be used directly. Commercially available surfactants which can be used are, for example, Yevton Department EF30 1 , EF303 (New Akita Chemicals Co., Ltd.), Flora (trans) FC430, 431 (Sumitomo Sriyem) System, Mekafak (transliteration) F171, F173, F176, F189, F08 (Daily Ink (share) system), Safron (transliteration) S-382, SC101, 102, 103, 104, 105, 106 A fluorine-based surfactant or a quinone-based surfactant such as (made of Asahi Glass Co., Ltd.). The polyoxyalkylene polymer KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.) can also be used as a lanthanide surfactant. The amount of the surfactant to be added is preferably 0.001% by weight to 2% by weight based on the solid content of the composition of the present invention, preferably 〇·〇1% by weight to 1% by weight. These surfactants may be used alone or in combination of two or more. Specific examples of the above other surfactants such as polyethylene oxide lauryl ether, polyethylene oxide stearyl ether, polyethylene oxide hexadecane ether, polyethylene oxide oleate, etc. Polyethylene oxide alkyl aromatic ethers such as alkylene ethers, polyethylene oxide octylphenol ether, polyethylene oxide nonylphenol ether, polyethylene oxide/polypropylene oxide block copolymerization Species, sorbitol monolaurate, sorbitol monopalmitate, sorbitol monostearate, sorbitol monooleate, sorbitol trioleate, sorbitol tristearate Sorbitol fatty acid esters such as esters, polyepoxyethylene sorbitan monolaurate, polyethylene oxide sorbitol monopalmitate, polycyclo-103- This paper scale applies to Chinese national standards (CNS) )A4 size (210 X 297 mm) Packing -------- set--------· (Please read the notes on the back and fill out this page)

經濟部智慧財產局員工消費合作社印製 1257528 A7 B7 102 五、發明說明（) 氧乙烷山梨糖醇單硬脂酸酯、聚環氧乙烷山梨糖醇三油酸酯、聚環氧乙烷山梨糖醇三硬脂酸酯等之聚環氧乙烷山梨糖醇脂肪酸酯類等非離子系界面活性劑。 (請先閱讀背面之注意事項再填寫本頁) 此等界面活性劑之配合量對1 〇〇重量份本發明之組成物中固成分而言通常爲2重量份以下、較佳者爲1重量份以下。此等之界面活性劑可單獨添加，亦可以幾種組合添加。 [4 ]有機鹼性化合物本發明可使用的較佳有機鹼性化合物物係爲比苯酚具較強鹼性的化合物。其中，以含氮鹼性化合物較佳。其中以含有下述（A)〜（E)所示構造之含氮鹼性化合物較佳。藉由使用含氮鹼性化合物，可使自曝光至後加熱之經時性能變化小。 R251 r2so_n_r2S2 (a) 經濟部智慧財產局員工消費合作社印製 (其中，R25Q、R251、R252係爲獨立的氫原子、碳數 1〜6之烷基、碳數1〜6之醯基烷基、碳數1〜6之羥基烷基或碳數6〜20之經取代或未取代之芳基，其中，R251 與R252可互相鍵結以形成環。） -104- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） 1257528 A7 五、發明說明（补 :N- (B) •N=0 (c) (D)Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1257528 A7 B7 102 V. Invention Description () Oxyethane sorbitan monostearate, polyethylene oxide sorbitol trioleate, polyethylene oxide A nonionic surfactant such as a polyethylene oxide sorbitol fatty acid ester such as sorbitol tristearate. (Please read the precautions on the back side and fill out this page.) The amount of these surfactants is usually 2 parts by weight or less, preferably 1 part by weight, based on 1 part by weight of the solid content of the composition of the present invention. The following. These surfactants may be added singly or in combination of several. [4] Organic Basic Compound The preferred organic basic compound which can be used in the present invention is a compound which is more basic than phenol. Among them, a nitrogen-containing basic compound is preferred. Among them, a nitrogen-containing basic compound having a structure represented by the following (A) to (E) is preferred. By using a nitrogen-containing basic compound, the change in the temporal properties from exposure to post-heating can be made small. R251 r2so_n_r2S2 (a) Printed by the Consumers' Cooperative of the Ministry of Economic Affairs and Intellectual Property Office (wherein R25Q, R251, and R252 are independent hydrogen atoms, alkyl groups having 1 to 6 carbon atoms, and mercaptoalkyl groups having 1 to 6 carbon atoms, a hydroxyalkyl group having 1 to 6 carbon atoms or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, wherein R251 and R252 may be bonded to each other to form a ring.) -104- The paper scale is applicable to the Chinese national standard ( CNS) A4 specification (210 X 297 public) 1257528 A7 V. Invention description (Supplement: N- (B) • N=0 (c) (D)

R 253 (E) 經濟部智慧財產局員工消費合作社印製 (其中，R253、R254、R2”及R 2 5 6係表示相同或不同的碳數1〜6之烷基）較佳的具體例如經取代或未取代的脈、經取代或未取代的胺基吡啶、經取代或未取代的胺基烷基吡啶、經取代或未取代的胺基吡咯烷、經取代或未取代的咪唑、經取代或未取代的吡唑、經取代或未取代的吡嗪、經取代或未取代的喀啶、經取代或未取代的嘌呤、經取^或未取代的咪唑啉、經取代或未取代的肚哩琳、經取代或未取代的哌啶、經取代或未取代的嗎啉、經取代或未取代的胺基嗎㈣。較佳之耳又代基有醜、胺基院基、院其胺基、胺基芳基、芳基胺基、院基、院氧基、醯基、酿氧基、芳基、芳氧基、硝基、羥基、氰基。更佳的化合物例如有脈、1，丨_二甲基脈、丨，丨^^-四 -105- 卜紙張尺度翻巾關家標準（CNS)A4規格R 253 (E) Printed by the Intellectual Property Office of the Intellectual Property Office of the Ministry of Economic Affairs (wherein R253, R254, R2" and R 2 5 6 are the same or different alkyl groups having 1 to 6 carbon atoms). Substituted or unsubstituted azole, substituted or unsubstituted aminopyridine, substituted or unsubstituted aminoalkylpyridine, substituted or unsubstituted aminopyrrolidine, substituted or unsubstituted imidazole, substituted Or unsubstituted pyrazole, substituted or unsubstituted pyrazine, substituted or unsubstituted pyridine, substituted or unsubstituted anthracene, substituted or unsubstituted imidazoline, substituted or unsubstituted belly Is a substituted or unsubstituted piperidine, a substituted or unsubstituted morpholine, a substituted or unsubstituted amino group (IV). Preferably, the ear has an ugly, amine-based, amine group. Aminoaryl, arylamine, aryl, alkoxy, fluorenyl, ethoxy, aryl, aryloxy, nitro, hydroxy, cyano. More preferred compounds such as veins, 1,丨_Dimethyl vein, 丨, 丨^^-four-105- Bu paper scale Sweeping home standard (CNS) A4 specifications

裝 m mmKm k— n ----^---- (請先閱讀背面之注意事項再填寫本頁)Install m mmKm k— n ----^---- (Please read the notes on the back and fill out this page)

1257528 經濟部智慧財產局員工消費合作社印製 A7 B7 104 五、發明說明（）甲基脈、2-胺基吡啶、3-胺基吡啶、4-胺基吡啶、2-甲基胺基吡啶、4 -二甲基胺基吡啶、2 -二乙基胺基吡啶、 2 -(胺基甲基）吡啶、2 -胺基-3 -甲基吡啶、2 -胺基-4 -甲基吡啶、2 -胺基-5 -甲基吡啶、2 -胺基-6 -甲基吡啶、3 -胺基乙基吡啶、4-胺基乙基吡啶、3-胺基吡咯烷、哌嗪、女基乙基）派曉、N-(2-fe：基乙基）喊B定、4 -胺基 -2，2，6，6 -四甲基哌啶、4 -吡喃基哌啶、2 -亞胺基哌啶、 1- (2-胺基乙基）吡咯烷、吡唑、3-胺基-5-甲基吡唑、 5 -胺基-3 -甲基-卜對-三吡唑、吡嗪、2 -(胺基甲基）-5 -甲基吡嗪、嘧啶、2，4 -二胺基嘧啶、4，6 -二羥基嘧啶、 2- 吡唑啉、3-吡唑啉、N-胺基嗎啉、N-(2-胺基乙基）嗎啉、，5 -二偶氮二環[4.3·0]-5 -壬烯、1,8 -二偶氮二環 [5.4·0]-7 -十一烯、2,4,5 -三苯基咪唑啉、三（正丁基）胺、三（正辛基）胺、Ν-苯基二乙醇胺、Ν-羥基乙基吡啶、2，6-二異丙基苯胺、Ν-環己基嗎啉基乙基硫尿素、Ν-羥基乙基嗎啉等，惟不受此等所限制。其中，更佳的化合物爲1，5 -二偶氮二環[4 . 3 . 0 ] - 5 -壬傭、1，8 - —^偶氣—^fe[5.4.0]-7 -十一'嫌、2,4.5 -二苯基咪唑啉、三（正丁基）胺、三（正辛基）胺、N-苯基二乙醇胺、N-羥基乙基吡啶、2,6-二異丙基苯胺、N-環己基嗎啉基乙基硫尿素、N-羥基乙基嗎啉。此等之有機鹼性化合物可單獨使用或2種以上組合使用。有機鹼性化合物之使用量對組成物之固成分而言通常爲0.001〜10重量份、較佳者爲0.01〜5重量份。若小 -106- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） l·· ^--------^--- (請先閱讀背面之注意事項再填寫本頁) % 1257528 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（巧於0 · 00 1重量份時無法得到有機鹼性化合物之添加效果。另外，大於1 0重量份時會有感度降低且非曝光部之顯像性惡化的傾向。 [5 ]其他的添加物、正型阻體組成物調製法、使用法等本發明之正型阻體組成物中可添加酸分解性溶解阻止劑。藉此，可提高對比性與解像力、且圖樣外型矩形化。酸分解性溶解阻止劑例如含有酸分解性基、且藉由酸分解、且可增加對鹼顯像液之溶解性的化合物，就阻體膜之曝光吸收降低而言以不含芳香族基者較佳、更佳者爲具有單環或多環之環狀烴構造的化合物。藉此，可提高乾式蝕刻耐性。單環或多環之環狀烴構造之具體例如單環之環鏈烷構造、金剛烷構造、原菠烷構造、類固醇構造，較佳者爲金剛烷構造、類固醇構造。酸分解性溶解阻止劑中所含有的酸分解性基係以酸使羧酸脫離的基保護的基較佳，該酸分解性基例如有第3-丁酯、第3-醯酯等3級烷酯基、1 -烷氧基乙酯、2 -四氫吡喃酯等支鏈狀或環狀縮醛酯基等較佳者爲3級烷酯基。本發明之正型阻體組成物中酸分解性溶解阻止劑之使用量，以組成物之固成分爲基準通常爲1〜30重量％、較佳者爲5〜20重量％。本發明之正型阻體組成物中視其所需另可含有酸分解性溶解阻止化合物、染料、可塑劑、除上述外之界面活性劑、光增感劑、及對顯像液而言促進溶解性之化合物等。 -107- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ▼裝--------訂---------^^^1. (請先閱讀背面之注意事項再填寫本頁)1257528 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperatives Printed A7 B7 104 V. INSTRUCTIONS () Methyl mai, 2-aminopyridine, 3-aminopyridine, 4-aminopyridine, 2-methylaminopyridine, 4-dimethylaminopyridine, 2-diethylaminopyridine, 2-(aminomethyl)pyridine, 2-amino-3-methylpyridine, 2-amino-4-methylpyridine, 2-amino-5-methylpyridine, 2-amino-6-methylpyridine, 3-aminoethylpyridine, 4-aminoethylpyridine, 3-aminopyrrolidine, piperazine, women's base Ethyl), N-(2-fe:ylethyl), B, 4-amino-2,2,6,6-tetramethylpiperidine, 4-pyranylpiperidine, 2- Iminopiperidine, 1-(2-aminoethyl)pyrrolidine, pyrazole, 3-amino-5-methylpyrazole, 5-amino-3-methyl-bu-p-pyrazole , pyrazine, 2-(aminomethyl)-5-methylpyrazine, pyrimidine, 2,4-diaminopyrimidine, 4,6-dihydroxypyrimidine, 2-pyrazoline, 3-pyrazoline , N-aminomorpholine, N-(2-aminoethyl)morpholine, 5-diazobicyclo[4.3.0]-5-decene, 1,8-diazobicyclo[ 5.4·0]-7-undecene, 2,4,5-triphenylimidazole , tri(n-butyl)amine, tris(n-octyl)amine, fluorene-phenyldiethanolamine, hydrazine-hydroxyethylpyridine, 2,6-diisopropylaniline, fluorene-cyclohexylmorpholinoethyl Sulfur urea, hydrazine-hydroxyethylmorpholine, etc., are not limited by these. Among them, the more preferable compound is 1,5-diazobicyclo[4 . 3 . 0 ] - 5 -壬, 1,8 -^^--^fe[5.4.0]-7 -11 'Abs, 2,4.5-diphenylimidazoline, tri(n-butyl)amine, tris(n-octyl)amine, N-phenyldiethanolamine, N-hydroxyethylpyridine, 2,6-diisopropyl Aniline, N-cyclohexylmorpholinoethylthiourea, N-hydroxyethylmorpholine. These organic basic compounds may be used singly or in combination of two or more. The amount of the organic basic compound to be used is usually 0.001 to 10 parts by weight, preferably 0.01 to 5 parts by weight, based on the solid content of the composition. If the small -106- paper size applies to the Chinese National Standard (CNS) A4 specifications (210 X 297 mm) l·· ^--------^--- (please read the notes on the back and fill in This page) % 1257528 Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printed A7 B7 V. Invention description (In addition to 0 · 00 1 part by weight, the organic alkaline compound can not be added. In addition, more than 10 parts by weight will There is a tendency that the sensitivity is lowered and the developability of the non-exposed portion is deteriorated. [5] Acid addition property can be added to the positive resist composition of the present invention such as other additives, a positive resist composition preparation method, and a use method. The dissolution inhibitor is used, whereby the contrast and the resolution are improved, and the pattern is rectangular in shape. The acid-decomposable dissolution inhibitor contains, for example, an acid-decomposable group, and is decomposed by an acid, and can increase the dissolution of the alkali imaging solution. The compound is preferably a compound having no aromatic group and more preferably a compound having a monocyclic or polycyclic cyclic hydrocarbon structure in terms of reduction in exposure absorption of the film, thereby improving dry etching resistance. Specific examples of monocyclic or polycyclic cyclic hydrocarbon structures The monocyclic cycloalkane structure, the adamantane structure, the raw spinane structure, and the steroid structure are preferably an adamantane structure or a steroid structure. The acid-decomposable base contained in the acid-decomposable dissolution inhibitor is an acid-based carboxy group. Preferably, the acid-decomposable group is an acid-decomposable group, and the acid-decomposable group is, for example, a 3-alkyl ester group such as a 3-butyl ester or a 3-decyl ester, a 1-alkoxyethyl ester or a 2-tetrahydropyranyl ester. The branched-chain or cyclic acetal ester group is preferably a 3-stage alkyl ester group. The amount of the acid-decomposable dissolution inhibitor used in the positive-type resist composition of the present invention is based on the solid content of the composition. It is usually 1 to 30% by weight, preferably 5 to 20% by weight. The positive resist composition of the present invention may further contain an acid-decomposable dissolution preventing compound, a dye, a plasticizer, and the like, as needed. Surfactant, photo sensitizer, and compounds that promote solubility to the developer. -107- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) ▼装--- -----Book---------^^^1. (Please read the notes on the back and fill out this page)

1257528 A7 ___B7 _ 五、發明說明（ ------」丨丨#裝 (請先閱讀背面之注意事項再填寫本頁) 本發明感光性組成物係使上述各成分溶解於溶劑中、塗覆於載體上。此處所使用的溶劑係以二氯化乙烯、環己醯、環戊酮、2 -庚酮、r -丁內酯、甲基乙酮、乙二醇單甲醚、乙二醇單***、2 -甲氧基乙基乙酸酯、乙二醇單***乙酸酯、丙二醇單甲醚、丙二醇單甲醚乙酸酯、甲苯、醋酸乙酯、乳酸甲酯、乳酸乙酯、甲氧基丙酸甲酯、乙氧基丙酸乙酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸丙酯、N，N-二甲基甲醯胺、二甲基亞碾、N-甲基吡咯烷酮、四氫呋喃等較佳，此等可單獨使用或混合使用。於上述之中較佳的溶劑例如有2 -庚酮、r - 丁內酯、乙二醇單甲醚、乙二醇單***、丙二醇單甲醚、丙二醇單甲酗乙酸酯、乳酸甲酯、乳酸乙酯、甲氧基丙酸甲酯、乙氧基丙酸乙酯、N -甲基吡咯烷酮、四氫呋喃。將本發明之正型阻體組成物塗覆於基板上，以形成薄膜。該塗膜之膜厚以0.2〜1 . 2 // m較佳。於本發明中視其所需可使用市售的無機或有機反射防止膜。反射防止膜可使用鈦、二氧化鈦、氮化鈦、氧化鉻、經濟部智慧財產局員工消費合作社印製碳、α —矽等之無機膜型、與由吸光劑與聚合物材料所成的有機膜型。前者必須使用膜形成之真空蒸熔裝置、CVD 裝置、濺射裝置等之設備。有機反射防止膜例如有特公平7 - 696 1 1號記載的由二苯胺衍生物與甲醛改性蜜腹樹脂之縮合物、鹼可溶性樹脂、吸光劑所成者，或美國專利5294680號記載的馬來酸酐共聚物與二胺型吸光劑之反應物，特開平6 - 1 1 863 1號記載的含有樹脂黏合劑與羥 -108- 本紙張尺度適用中國國家標準（CNS)A4規格（210 χ 297公釐） 1257528 A7 五、發明說明（經濟部智慧財產局員工消費合作社印製甲基蜜胺系熱交聯劑者，特開平6 - 1 1 8656號公報中記載的在同一分子中具有羧酸基與環氧基與吸光基之丙烯酸樹脂型反射防止膜，特開平8 - 87 11 5號公報中記載的由羥甲基蜜胺與二苯甲酮系吸光劑所成者，特開平8 -1 79 509號公報中記載的聚乙二醇樹脂中添加低分子吸光劑者等。而且，有機反射防止膜亦可使用部紐瓦塞恩斯（譯音）公司製DUV30系列、或DUV-40系列、西部雷（譯音）公司製 AC-2 、 AC-3 等。使上述阻體液於製造精密積體回路元件時所使用的基板（例如矽/二氧化矽被覆）上（視其所需在設置有上述反射防止膜之基板上）藉由旋轉器、滾筒等適當塗覆方法予以塗覆後，通過所定的光罩予以曝光，準行烘烤、藉由顯像製得良好阻體圖樣。此處，曝光光係以1 5 0 n m〜 250nm之波長的光較佳、更佳者爲220nm以下。具體而言，例如有KrF準分子雷射（ 248nm)、ArF準分子雷射（193 nm)、F2準分子雷射（157nm)、X光線、電子束等。顯像液可使用氫氧化鈉、氫氧化鉀、碳酸鈉、矽酸鈉、甲基砂酸鈉、銨水等無機鹼類，乙胺、正丙胺等一級胺，二乙胺、二正丙胺等二級胺，三乙胺、甲基二乙胺等三級胺，二甲基乙醇胺、三乙醇胺等醇胺類，四甲銨氫氧化物、四乙銨氫氧化物等四級銨鹽，吡咯、哌啶等環狀胺類等之鹼性水溶液。此外，在上述鹼性水溶液中可適量添加醇類、界面活 (請先閱讀背面之注意事項再填寫本頁)1257528 A7 ___B7 _ V. INSTRUCTIONS ( ------ 丨丨装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装装Covered on a carrier. The solvent used here is ethylene dichloride, cyclohexanone, cyclopentanone, 2-heptanone, r-butyrolactone, methyl ethyl ketone, ethylene glycol monomethyl ether, ethylene Alcohol monoethyl ether, 2-methoxyethyl acetate, ethylene glycol monoethyl ether acetate, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, toluene, ethyl acetate, methyl lactate, ethyl lactate Methyl methoxypropionate, ethyl ethoxypropionate, methyl pyruvate, ethyl pyruvate, propyl pyruvate, N,N-dimethylformamide, dimethyl sub-milling, N Methylpyrrolidone, tetrahydrofuran, etc. are preferred, and these may be used singly or in combination. Preferred solvents among the above are, for example, 2-heptanone, r-butyrolactone, ethylene glycol monomethyl ether, ethylene glycol. Monoethyl ether, propylene glycol monomethyl ether, propylene glycol monomethyl hydrazide acetate, methyl lactate, ethyl lactate, methyl methoxypropionate, ethoxypropyl propionate Ester, N-methylpyrrolidone, tetrahydrofuran. The positive resist composition of the present invention is applied to a substrate to form a film. The film thickness of the coating film is 0.2 to 1. 2 // m is preferred. In the invention, a commercially available inorganic or organic anti-reflection film can be used as needed. The anti-reflection film can be made of titanium, titanium dioxide, titanium nitride, or chromium oxide, and the Ministry of Economic Affairs, the Intellectual Property Office, the Consumer Cooperative, which prints carbon, α-矽, etc. An inorganic film type and an organic film type formed by a light absorbing agent and a polymer material. The former must use a vacuum vapor deposition device, a CVD device, a sputtering device, etc. formed of a film. The organic reflection preventing film has a special fairness, for example. a condensate of a diphenylamine derivative and a formaldehyde-modified benzin resin, an alkali-soluble resin, or a light absorbing agent, as described in No. 696, No. 1, No. 1, or a maleic anhydride copolymer and a diamine type light absorbing agent described in U.S. Patent No. 5,294,680. The reactants, the resin-containing adhesive and the hydroxy-108- described in JP-A-6-1 863 1 apply to the Chinese National Standard (CNS) A4 specification (210 297 297 mm). 1257528 A7 V. Description of the invention ( through The Ministry of Intellectual Property's employee consumption cooperatives prints a methyl melamine-based thermal cross-linking agent, and an acrylic resin having a carboxylic acid group and an epoxy group and a light-absorbing group in the same molecule as described in Japanese Laid-Open Patent Publication No. Hei 6- 1 18656 The type of the anti-reflection film described in Japanese Laid-Open Patent Publication No. Hei 08-87-11, the disclosure of which is incorporated herein by reference. A low-molecular light-absorbing agent is added to the alcohol resin, etc. Further, the organic anti-reflection film may be a DUV30 series manufactured by Newcastle, or a DUV-40 series, and AC-2 manufactured by Western Ray. , AC-3, etc. The substrate body (for example, ruthenium/ruthenium dioxide coating) used for manufacturing the precision integrated circuit element (depending on the substrate on which the anti-reflection film is provided) is suitably made of a rotator, a roller, or the like. After the coating method is applied, it is exposed through a predetermined mask, and is baked, and a good resist pattern is obtained by development. Here, the exposure light is preferably a light having a wavelength of from 150 nm to 250 nm, more preferably 220 nm or less. Specifically, there are, for example, a KrF excimer laser (248 nm), an ArF excimer laser (193 nm), an F2 excimer laser (157 nm), an X-ray, an electron beam, and the like. As the developing solution, inorganic bases such as sodium hydroxide, potassium hydroxide, sodium carbonate, sodium citrate, sodium methyl sulfate, ammonium water, primary amines such as ethylamine and n-propylamine, diethylamine, di-n-propylamine, etc. may be used. Tertiary amines, tertiary amines such as triethylamine and methyldiethylamine, alcohol amines such as dimethylethanolamine and triethanolamine, tetra-ammonium salts such as tetramethylammonium hydroxide and tetraethylammonium hydroxide, pyrrole An alkaline aqueous solution such as a cyclic amine such as piperidine. In addition, an appropriate amount of alcohol can be added to the above alkaline aqueous solution, and the interface is live (please read the back of the back sheet and fill out this page)

裝 J^T· -109- 1257528 A7 B7 五、發明說明（經濟部智慧財產局員工消費合作社印製性劑。 [實施例] 於下述中藉由實施力更詳地說明本發明，惟本發明不受下述實施例所限制。 [(A)成分之光酸發生劑之合成] 光酸發生劑A1或光酸發生劑A2之毓鹽例如使芳基溴化鎂等芳基格利雅試藥與經取代或未經取代的苯基亞碾反應，使所得的三芳基毓鹵化物與對應的磺酸予以鹽交換的方法，或使經取代或未經取代的苯基亞楓與對應的芳香族化含物使用甲烷磺酸/五氧化二磷或氯化鋁等酸觸媒予以縮合、鹽交換的方法，使二芳基碘鐵鹽與二芳基硫化物使用醋酸銅等觸媒予以縮合、鹽交換的方法等合成。另外，光酸發生劑A1或光酸發生劑A2之碘鏺鹽可藉由使用過碘酸鹽使芳香族化合物反應、使所得的碘鐵鹽與對應的磺酸予以鹽交換合成。而且，鹽交換所使用的磺酸、或磺酸鹽可直接使用市售的磺酸，或使用藉由磺酸鹵化物之加水分解所得者。於下述中，係爲（A )成分之光酸發生劑之合成例的2例，以下述表3、表4所使用的其他光酸發生劑亦可以相同的方法、或上述一般的方法予以合成者、或市售品。下述之光酸發生劑係使用綠化學（股）製品。三苯基毓過氟-正-丁烷磺酸酯：（A1-1)、（A2-4) 三苯基毓三氟甲烷磺酸酯：（A2 - 1 ) -110- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） _裝------ (請先閱讀背面之注意事項再填寫本頁)J^T· -109- 1257528 A7 B7 V. Description of Invention (Industrial Property of the Ministry of Economic Affairs, Intellectual Property Office, Employees' Consumer Cooperatives. [Examples] The present invention will be described in more detail by the following, but only The invention is not limited by the following examples. [Synthesis of photoacid generator of component (A)] The phosphonium salt of photoacid generator A1 or photoacid generator A2, for example, an aryl Grignard test such as arylmagnesium bromide a method in which a drug is subjected to a sub-milling reaction with a substituted or unsubstituted phenyl group to cause salt exchange of the resulting triarylsulfonium halide with a corresponding sulfonic acid, or a substituted or unsubstituted phenyl sulfoxide and corresponding The aromatic content is a method of condensing and salt-exchange using an acid catalyst such as methanesulfonic acid/phosphorus pentoxide or aluminum chloride, and the diaryl iron iodide salt and the diaryl sulfide are treated with a catalyst such as copper acetate. The iodine salt of the photoacid generator A1 or the photoacid generator A2 can be reacted with an aromatic compound by using a periodate to obtain the obtained iron iodide salt and the corresponding sulfonate. The acid is salt exchanged and synthesized. Moreover, the sulfonic acid used in the salt exchange, or The sulfonate may be a commercially available sulfonic acid or a hydrolyzed product of a sulfonic acid halide. In the following, 2 examples of the synthesis of the photoacid generator of the component (A) are as follows. Other photoacid generators used in Tables 3 and 4 may be synthesized by the same method or the above-described general method, or a commercially available product. The photoacid generator described below is a green chemical product. Triphenylsulfonium perfluoro-n-butanesulfonate: (A1-1), (A2-4) Triphenylsulfonium trifluoromethanesulfonate: (A2 - 1 ) -110- This paper scale applies to China National Standard (CNS) A4 Specification (210 X 297 mm) _Installation ------ (Please read the notes on the back and fill out this page)

. % 經濟部智慧財產局員工消費合作社印製 1257528 A7 __B7___ 1 no 五、發明說明（）雙（第3-丁基苯基碘鏺）過氟-正-丁烷磺酸酯：（A1_9) (合成例1) (三苯基鑾過氟-正-辛烷磺酸鹽：（Α1-3)) 使5Og二苯基亞楓溶解於800ml苯中，於其中加入200g 氯化鋁予以回流24小時。使反應液慢慢地注入2L水中，於其中加入400ml濃鹽酸、在70°C下加熱10分鐘。使該水溶液以500ml醋酸乙酯洗淨、且於過濾後加入400ml水中溶解有200g碘化銨者。使析出的粉體過濾、水洗後、以醋酸乙酯洗淨、乾燥，製得70g三苯基毓碘化物。使17. 6g三苯基毓碘化物溶解於l〇〇〇ml甲醇中，於該溶液中加入1 2 . 5g氧化銀。在室溫下攪拌4小時。使反應液過濾，且於中加入25g過氟-正-辛烷磺酸之甲醇溶液。使反應液濃縮、將所析出的油狀物溶解於醋酸乙酯中，水洗、乾燥、濃縮、製得20 . 5g目的物 (合成例2) (三（第3-丁基苯基）毓過氟-正-丁烷（Al-5)、（A2-8)之合成）使二（第3-丁基苯基）硫化物（80mmol)、二（第3-丁基苯基）碘鏺過氟-正-丁烷磺酸酯（20mmol )、苯甲酸銅 (4 mm ο 1 )之混合物，在氮氣氣流下、1 3 0 °C攪拌4小時。使反應液放冷、且於其中加入l〇〇ml甲醇以除去析出物。使過濾液濃縮、於其中加入200ml醚後使粉體析出，使其過濾、以醚洗淨、乾燥、製得目的物。 [(B)成分之酸分解性樹脂（B-1)之合成] -111- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注咅？事項再填寫本頁)% Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1257528 A7 __B7___ 1 no V. Description of Invention () Bis(3-Butylphenyliodonium) Perfluoro-n-butanesulfonate: (A1_9) ( Synthesis Example 1) (Triphenylphosphonium perfluoro-n-octanesulfonate: (Α1-3)) 5Og of diphenylsulfin was dissolved in 800 ml of benzene, and 200 g of aluminum chloride was added thereto and refluxed for 24 hours. . The reaction solution was slowly poured into 2 L of water, and 400 ml of concentrated hydrochloric acid was added thereto, and the mixture was heated at 70 ° C for 10 minutes. The aqueous solution was washed with 500 ml of ethyl acetate, and after filtration, 200 g of ammonium iodide was dissolved in 400 ml of water. The precipitated powder was filtered, washed with water, washed with ethyl acetate, and dried to obtain 70 g of triphenylsulfonium iodide. 17. g of triphenylsulfonium iodide was dissolved in 1 ml of methanol, and 12. 5 g of silver oxide was added to the solution. Stir at room temperature for 4 hours. The reaction solution was filtered, and 25 g of a solution of perfluoro-n-octanesulfonic acid in methanol was added thereto. The reaction liquid was concentrated, and the precipitated oil was dissolved in ethyl acetate, washed with water, dried, and concentrated to give 2,5 g of the object (synthesis example 2) (tris(3-butylphenyl)) Synthesis of fluoro-n-butane (Al-5), (A2-8)) bis (tert-butylphenyl) sulfide (80 mmol), di(tert-butylphenyl) iodonium A mixture of fluoro-n-butanesulfonate (20 mmol) and copper benzoate (4 mm ο 1 ) was stirred at 130 ° C for 4 hours under a stream of nitrogen. The reaction solution was allowed to cool, and 10 ml of methanol was added thereto to remove precipitates. The filtrate was concentrated, and 200 ml of ether was added thereto, and the powder was precipitated, filtered, washed with ether, and dried to obtain the object. [Synthesis of acid-decomposable resin (B-1) of component (B)] -111- This paper size applies to China National Standard (CNS) A4 specification (210 X 297 mm) (Please read the note on the back first? Fill in this page again)

1257528 A7 B7 i、發明說明（ ο). 經濟部智慧財產局員工消費合作社印製 (合成例3) <上述樹脂1之合成> 以40 / 60之比例（莫耳比）加入2 -乙基-金剛烷基甲基丙烯酸酯、丁內酯甲基丙烯酸酯，溶解於四氫呋喃中，且調製成1 00m 1固成分濃度20%之濃液。在該溶液中加入對全部單聚物莫耳數而言爲2莫耳％之游離基聚合起始劑V-65 (商品名、合光純藥製），使其在氮氣氣氛下以2小時滴入10ml加熱至55t之四氫呋喃。於滴烷後，使反應液加熱、攪拌6小時。反應終了後，使反應液冷卻至室溫、且在3L蒸餾水中結晶、析出、回收白色粉體。自C13NMR求取的樹脂組成，以莫耳比爲41/59(2-乙基 -2-金剛烷基甲基丙烯酸酯/丁內酯甲基丙烯酸酯）。而且，藉由GPC測定求取的聚苯乙烯換算的重量平均分子量爲1 2700。 (合成例4〜1 7 ) <上述樹脂2〜16之合成〉以與合成例3相同的操作，合成樹脂2〜16。樹脂之組成比、重量分子量、分散度如表1所示。表1之重覆構造單位1、2、3係表示上述各樹脂之構造單位自左順序的構造單位。 -112- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） _裝------ (請先閱讀背面之注音？事項再填寫本頁)1257528 A7 B7 i, invention description ( ο). Printed by the Ministry of Economic Affairs, Intellectual Property Office, Staff Cooperatives (Synthesis Example 3) <Synthesis of the above resin 1> Add 2 - B at a ratio of 40 / 60 (Morby) Base-adamantyl methacrylate, butyrolactone methacrylate, dissolved in tetrahydrofuran, and prepared into a dope of 100% solid concentration of 20%. To the solution, a free radical polymerization initiator V-65 (trade name, manufactured by Heguang Pure Chemical Co., Ltd.) having a molar content of 2 mol% of all the monomers was added, and it was dropped in a nitrogen atmosphere for 2 hours. 10 ml of tetrahydrofuran heated to 55 t was added. After the dropwise addition, the reaction mixture was heated and stirred for 6 hours. After the completion of the reaction, the reaction liquid was cooled to room temperature, and crystallized, precipitated, and recovered in 3 L of distilled water. The composition of the resin as determined from C13 NMR was 41/59 (2-ethyl-2-adamantyl methacrylate/butyrolactone methacrylate) in a molar ratio. Further, the weight average molecular weight in terms of polystyrene determined by GPC measurement was 1,2,700. (Synthesis Examples 4 to 17) <Synthesis of the above resins 2 to 16> Resins 2 to 16 were synthesized in the same manner as in Synthesis Example 3. The composition ratio, weight molecular weight, and dispersity of the resin are shown in Table 1. The repeating structure of Table 1 The units 1, 2, and 3 indicate the structural unit of the above-described respective resin structural units from the left. -112- This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) _装------ (Please read the phonetic on the back? Please fill out this page)

% 1257528% 1257528

表發明說明 (A)成分樹脂重覆構位ι(莫逆0、重覆構鍊位2(莫耳％)Table Description of Invention (A) Component Resin Repetitive structure ι (Mo-Reverse 0, Repetitive Chain Position 2 (Mole%)

經濟部智慧財產局員工消費合作社印製 [(B)成分之本發明樹脂（Β-2)之合成] (合成例18) 〈上述樹脂（21 )之合成〉藉由3-羰基-1，1-二甲基丁醇之甲基丙烯酸酯與環戊二烯反應所得的下述構造的四環十二烯衍生物（1 _ 1 )與馬來酸酐等莫耳之混合物溶解於四氫呋喃中，調製成固成分50%溶液。將其置於3 口燒瓶中，再於氮氣氣流、 60 °C下加熱。在反應溫度安定時加入5莫耳％和光純藥公司製游離基起始劑V-60以開始反應。加熱6小時後，使反應生成物以四氫呋喃稀釋2倍後，投入大量的己烷中、析出白色粉體。使析出的粉體過濾取出、乾燥，製得目的物之上述樹脂（21)。 -113· 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ------------ (請先閱讀背面之注意事項再填寫本頁) ·Printing by the Intellectual Property Office of the Ministry of Economic Affairs, the Consumer Cooperative of the Ministry of Economic Affairs [Synthesis of the resin of the invention (Β-2) of the component (B)] (Synthesis Example 18) <Synthesis of the above resin (21)> by 3-carbonyl-1,1 a mixture of a tetracyclododecene derivative (1 _ 1 ) of the following structure obtained by reacting dimethyl acrylate with dimethyl pentoxide and cyclopentadiene in a tetrahydrofuran A 50% solution of the solid component. It was placed in a 3-necked flask and heated under a nitrogen stream at 60 °C. At a reaction temperature, 5 mol% and a free radical initiator V-60 manufactured by Wako Pure Chemical Industries, Ltd. were added to start the reaction. After heating for 6 hours, the reaction product was diluted twice with tetrahydrofuran, and then a large amount of hexane was added to precipitate a white powder. The precipitated powder was taken out by filtration and dried to obtain the above-mentioned resin (21) of the object. -113· This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 mm) ------------ (Please read the notes on the back and fill out this page)

1257528 合成例19〜27 <上述樹脂（22)〜（33)之合成> 以與合成例18相同的方法合成上述樹脂（22)〜（33)。上述樹脂（21)〜（28 )之各重覆構造單位的莫耳比例、重量平均分子量、分散度如表2所示。而且，樹脂（29) 〜（33 )之莫耳比例與重量平均分子量及分散度係如上述。表2 樹脂四環十一锦單位之莫耳比例馬來酸酐、馬來酸酯之莫耳比重量平均分子量分散度 (Mw/Mn) 左右左丨右 21 50 50 6800 2.0 22 50 ~~ 50 6500 1.9 23 34 16 50 5700 1.8 24 36 14 50 6700 1.9 25 50 28 22 6600 1.8 26 38 12 50 5900 πΓδ 27 50 50 9200 2.0 28 50 ' 50 11000 2.2 [溶解阻止劑之合成] 以烤箱乾燥、以氫氣取代的施任克管中塡充（預先在 60°C之真空管下乾燥一晚）膽酸第3-丁酯（2.07g、4.457 毫莫耳）、（自CaH2蒸餾的）N-甲基嗎啉（l」ml、10毫莫 -114- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公H) -------一卜裝 (請先閱讀背面之注意事項再填寫本頁) ----訂i 經濟部智慧財產局員工消費合作社印製 1131257528 A7 五、發明說明（耳）及氯化伸甲基（8ml )。使該混合物冷卻至0°C後，再使蒸餾完的二氯化戊基 (0.552g、4.3 24毫莫耳、97莫耳％)使用氣密注入器慢慢地添加。添加終了後，鹽開始沉澱。使所得的發料攪拌，且在30分鐘內昇溫至室溫，在於4(rc下加溫3〇分鐘。然後，使該混合物注入含有氯化伸甲基（40ml)與水 (40ml)之分液漏斗中。使有機層以稀醋酸銨水溶液洗淨 4次，再予以濃縮、製得固形物。使該固形物自二噁烷凍結乾燥、製得粉末。使該粉末分散於水（100ml)田，攪拌1小時。過濾以使粉末再回收，再於真空中乾燥。收量爲1.5g(收率爲64% )。使該法重覆使用四氫呋喃（THF)時，收量爲1 . 7g (收率爲74%)。所得的寡聚物之構造如下述所示。以該寡聚物作爲溶解阻止劑A。 f請先閱讀背面之注意事項再填寫本頁) --------訂--------- 經濟部智慧財產局員工消費合作社印製 -115- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（uh 經濟部智慧財產局員工消費合作社印製1257528 Synthesis Examples 19 to 27 <Synthesis of the above resins (22) to (33)> The above resins (22) to (33) were synthesized in the same manner as in Synthesis Example 18. Table 2 shows the molar ratio, weight average molecular weight, and dispersity of each of the repeating structural units of the resins (21) to (28). Further, the molar ratio of the resins (29) to (33) and the weight average molecular weight and the degree of dispersion are as described above. Table 2 Molar ratio of resin tetracyclic eleven jin unit molar ratio of maleic anhydride and maleate to weight average molecular weight dispersion (Mw/Mn) left and right left and right 21 50 50 6800 2.0 22 50 ~~ 50 6500 1.9 23 34 16 50 5700 1.8 24 36 14 50 6700 1.9 25 50 28 22 6600 1.8 26 38 12 50 5900 πΓδ 27 50 50 9200 2.0 28 50 ' 50 11000 2.2 [Synthesis of dissolution inhibitor] Dry in oven, replace with hydrogen Filling in a Schlenk tube (previously dried overnight under a vacuum tube at 60 ° C) 3-butyrate (2.07 g, 4.457 mM), N-methylmorpholine (distilled from CaH2) (l"ml, 10mm-114- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 public H) ------- a pack (please read the notes on the back and fill in This page] ----Book i Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1131257528 A7 V. Description of the invention (ear) and chlorinated methyl group (8ml). Allow the mixture to cool to 0 ° C, then make Distilled pentyl dichloride (0.552 g, 4.3 24 mmol, 97 mol%) was slowly added using a gas-tight injector. Thereafter, the salt began to precipitate. The resulting hair was stirred and warmed to room temperature over 30 minutes, at 4 (rc) for 3 Torr. Then, the mixture was poured into a solution containing methyl chloride (40 ml) and The organic layer was washed four times with a dilute aqueous solution of ammonium acetate, and concentrated to obtain a solid. The solid was freeze-dried from dioxane to obtain a powder. Disperse in water (100 ml) field, stir for 1 hour, filter to re-recover the powder, and dry in vacuum, the yield is 1.5 g (yield is 64%). When the method is repeated using tetrahydrofuran (THF), The yield was 1.7 g (yield was 74%). The structure of the obtained oligomer was as follows. The oligomer was used as the dissolution inhibitor A. fPlease read the back note and fill out this page. --------Set--------- Ministry of Economic Affairs Intellectual Property Bureau employee consumption cooperative printing -115- This paper scale applies China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Description of invention (uh Printed by the Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumer Cooperative

-116« ▼裝--------訂---- (請先閱讀背面之注意事項再填寫本頁)-116« ▼装--------Book---- (Please read the notes on the back and fill out this page)

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 經濟部智慧財產局員工消費合作社印製 A7 B7 _ 五、發明說明（1 以第3-丁基膽酸酯末端密封的寡聚物（第3_丁基膽酸酯-co-戊二酸酯）（其中，tBu係表示第3-丁基取代基， Y係表示氫或膽酸第3 - 丁酯之羥基中任一個以戊二酸酯基鍵結的膽酸t - B u - c 〇 -戊二酸酯寡聚物）分子中單位Μ之個數約爲5〜20。如上述縮合反應可以多環式化合物上任意的ΟΗ基引起。因此，上述構造係爲說明反應生成物所示者，不表示所得生成物之實際構造。 [實施例1〜20、比較例1〜5] (正型阻體組成物溶液之調製）表3所示之各種成分係使用下述所示之量。以上述合成例所合成的表3中所示之樹脂：2.0g 光酸發生劑A1 : 如表3所記載光酸發生劑A2 : 如表3所記載有機鹼性化合物（胺）： 0.00 1 g 界面活性劑： 0.004g 使各例之組成物以固成分濃度爲1 4重量％溶解於丙二醇單甲醯乙酸酯後，以0 . 1 // m之微過濾器過濾，且調製成實施例1〜20、比較例1〜5之正型阻體組成物溶液。而且，添加溶解阻止劑（溶解阻止劑A或膽酸第3 - 丁酯）時之添加重爲0.5g。 [實施例2 1〜42、比較例6〜1 0 ] (正型阻體組成物溶液之調製）表4所示之各種成分係使用下述所示之量。以上述合成例所合成的表4中所示之樹脂：2 . 0g -117- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --------------------訂---------_ (請先閱讀背面之注音？事項再填寫本頁) I257528 經濟部智慧財產局員工消費合作社印製 A7 ----------- ^ 116 1、發明說明（）光酸發生劑A1 : 如表4所記載光酸發生劑A2 : 如表4所記載有機鹼性化合物（胺）： O.OOlg 界面活性劑： 0.004g 使各例之組成物以固成分濃度爲1 4重量％溶解於丙二醇單甲醚乙酸酯後，以〇 · 1 # m之微膜過濾器過濾，且調製成實施例21〜39、比較例6〜10之正型阻體組成物溶液。而且，添加溶解阻止劑（溶解阻止劑A或膽酸第；^丁酯）時之添加量爲〇.5g。使用的有機鹼性化合物（胺）、界面活性劑係如下述。胺 (1 ) : 1，5 -二偶氮二環[4 · 3 · 0 ] - 5 -壬烷） (2) : 2,4,5-三苯基咪唑啉 (3 ):三-正-丁胺 (4 ) : N -羥基乙基吡啶界面活性劑 W - 1 :梅卡法克（譯音F176(大日本油墨（股）製）（氟系） W-2 :梅卡法克（譯音）R08(大日本油墨（股）製）（氟系及聚矽氧烷系） W-3 :聚矽氧烷聚合物-KP-341(信越化學工業（股）製} W-4 :聚環氧乙烷壬基苯醚 (評估試驗）使所得的正形阻體組成物溶液利用旋轉塗覆器& 矽晶圓上，在1 40°C下乾燥90秒、作成約0 . 5 // m之$ _ -118- (請先閱讀背面之注意事項再填寫本頁} --------訂---------^^^1 ·This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm). 1257528 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed A7 B7 _ V. Invention Description (1) Sealed with 3-butylcholate end Oligomer (3rd-butyl cholate-co-glutarate) (wherein tBu represents a 3-butyl substituent and Y represents a hydrogen or a hydroxyl group of a 3-butylic acid ester) Any one of the t-B u - c 〇-glutaric acid oligomers bound with a glutarate group) has a number of units of about 5 to 20 in the molecule. The condensation reaction may be a polycyclic ring as described above. The above structure is indicated by the reaction product, and does not indicate the actual structure of the obtained product. [Examples 1 to 20, Comparative Examples 1 to 5] (Positive type composition) Preparation of the solution) The various components shown in Table 3 were used in the amounts shown below. The resin shown in Table 3 synthesized in the above Synthesis Example: 2.0 g of photoacid generator A1: Light as shown in Table 3 Acid generator A2 : Organic basic compound (amine) as shown in Table 3: 0.00 1 g Surfactant: 0.004 g Each case The composition was dissolved in propylene glycol monomethyl hydrazide acetate at a solid concentration of 14% by weight, filtered through a microfilter of 0.1 μm, and prepared into Examples 1 to 20 and Comparative Examples 1 to 5. The positive resist composition solution was added, and the addition weight was 0.5 g when a dissolution inhibitor (dissolution inhibitor A or tributyl cholate) was added. [Example 2 1 to 42, Comparative Example 6 to 1 0] (Preparation of positive resist composition solution) The components shown in Table 4 were used in the amounts shown below. The resins shown in Table 4 synthesized in the above Synthesis Examples: 2.0 g -117- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) -------------------- Order ---------_ (Please read the phonetic transcription on the back? Please fill out this page again.) I257528 Ministry of Economic Affairs Intellectual Property Office Staff Consumer Cooperative Printed A7 ----------- ^ 116 1. Invention Description () Photoacid generator A1 : Photoacid generator A2 as shown in Table 4: Organic basic compound (amine) as shown in Table 4: O.OOlg Surfactant: 0.004 g The composition of each example was dissolved at a solid concentration of 14% by weight. Propylene glycol monomethyl After the acetate was filtered, it was filtered through a micromembrane filter of 〇·1 #m, and prepared into a positive resist composition solution of Examples 21 to 39 and Comparative Examples 6 to 10. Further, a dissolution inhibitor was added (dissolution prevention) The amount of the agent A or the acid of the cholesteric acid is 〇.5g. The organic basic compound (amine) and the surfactant used are as follows. Amine (1) : 1,5 -diazo Ring [4 · 3 · 0 ] - 5 -decane) (2) : 2,4,5-triphenylimidazoline (3 ): tri-n-butylamine (4 ) : N-hydroxyethylpyridine interface Active agent W - 1 : Mekafak (transliteration F176 (made by Dainippon Ink)) (Fluorine) W-2 : Mekafak (transliteration) R08 (made by Dainippon Ink (share)) And polyoxyalkylene series) W-3 : polyoxyalkylene polymer-KP-341 (manufactured by Shin-Etsu Chemical Co., Ltd.) W-4: polyethylene oxide nonylphenyl ether (evaluation test) The positive resist composition solution is dried on a wafer using a spin coater & 矽 90 90 90 90 90 90 90 90 90 90 90 90 90 90 90 90 约约约约约 ( ( ( ( ( ( ( ( ( ( ( ( Please fill in this page again } --------Book ---------^^^1 ·

1257528 A7 B7 五、發明說明（7) 光阻膜，然後於其上以ArF準分子雷射（193nm)曝光。使曝光後之加熱處理在140°C下進行90秒，以2. 38%四甲銨氫氧化物水溶液顯像、以蒸餾水洗淨、製得阻體圖樣外型。 (感度）：可使0 · 1 8 // m之線與空間（1 : 1 )光罩圖樣再現之曝光量予以定義。 [解像力]:於曝光後直接進行加熱、顯像處理時之0 . 1 8 // m之線與間隙（1 : 1 )光罩圖樣再現之曝光量的臨界解像力作爲解像1，於曝光後經過2小時後進行加熱、顯像處理，與上述相同曝光量之臨界解像力作爲解像力2。 [疏密相關性]:在線寬0. 18//m之線與間隙（密圖樣）與孤立線圖樣（疏圖樣）中，求取可各容許0.18//mi： 10%之容許的焦點深度重疊範圍。該範圍愈大時疏密相關性愈佳。上述評估結果如表3、表4所示。 (請先閱讀背面之注意事項再填寫本頁) ---- 訂----- 經濟部智慧財產局員工消費合作社印製 -119- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 B7 五、發明說明（"Ο1257528 A7 B7 V. INSTRUCTIONS (7) The photoresist film is then exposed to an ArF excimer laser (193 nm). The heat treatment after the exposure was carried out at 140 ° C for 90 seconds, developed with a 2.38% tetramethylammonium hydroxide aqueous solution, and washed with distilled water to obtain a resist pattern appearance. (Sensitivity): The exposure amount of the 0·1 8 // m line and space (1:1) reticle pattern can be defined. [Resolving power]: The direct resolution of the exposure amount of the reticle pattern reproduced as 0. 1 8 // m line and gap (1 : 1 ) as the resolution 1 after exposure After 2 hours, heating and development processing were performed, and the critical resolution of the same exposure amount as described above was taken as the resolution 2 . [Dense and dense correlation]: In the line width and gap (dense pattern) of the line width of 0. 18//m and the isolated line pattern (sparse pattern), the allowable depth of focus of 0.18//mi: 10% can be obtained. Overlap range. The larger the range, the better the density correlation. The above evaluation results are shown in Tables 3 and 4. (Please read the notes on the back and fill out this page) ---- Order----- Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Print-119- This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 B7 V. Invention Description ("Ο

表3 實施例樹脂光酸發生劑胺界面活性劑感度解像力疏密相關性 A1 (添加量g) A2 (添加量g) 1 2 1 1 Al-l(O.Ol) A2-l(0.01) ⑴ W-1 7 0.12 0.12 1.0 2 2 Al-3(0.01) A2-4(0.01) (2) W-2 13 0.13 0.13 0.8 3 3 Al-5(0.02) A2-5(0.02) (3) W-3 8 0.12 0.12 0.8 4 4 Al-7(0.02) A2-4(0.01) ⑷ W-4 15 0.12 0.12 1.0 5 5 Al-3(0.01) A2-3(0.03) ⑴ W_1 10 0.13 0.13 0.8 6 6 Al-21(0.01) A2-15(0.02) (2) W-2 8 0.14 0.14 1.0 7 7 Al-49(0.03) A2-43(0.01) (3) W-3 15 0.12 0.12 0.8 8 8 Al-43(0.01) A2-l(0.01) (4) W-4 12 0.13 0.13 1.0 9 9 Al-1(0.03) A2-l(0.01) (3) W-2 7 0.12 0.12 1.0 10 10 Al-5(0.02) A2-5(0.04) (4) W-2 6 0.12 0.12 1.0 11 11 Al-ll(0.02) A2-11(0.02) (1) W-1 8 0.12 0.12 1.0 12 12 Al-5_) A2-l(0.04) (2) W-2 7 0.12 0.12 1.0 13 13 Al-2(0.03) A2-4(0.02) (3) W-3 13 0.13 0.13 1.0 14 14 Al-8(0.02) A2-l(0.02) (4) W-4 14 0.13 0.13 0.8 15 15 A1-54(0.02) A2-47(0.00^ (3) W-2 13 0.14 0.14 0.8 16 3 Α1-4(0·01) A2-4(0.02) ⑷ W-2 12 0.13 0.13 0.8 17*1 5 Al-3(0.01) A2-4(0.01) (2) W-3 14 0.13 0.13 0.8 18*2 10 Al-5(0.02) A2-5(0.02) (3) W-3 13 0.12 0.12 0.8 19*3 1 Al-7(0.02) A2-4(0.01) ⑷ W-4 5 0.12 0.12 1.0 20 16 Al-l(O.Ol) A2-l(0.01) ⑴ W-1 7 0.12 0.12 1.0 比較例 1 2 Al-3(0.01) - ⑺ W-2 31 0.15 0.18 0.4 2 2 - A2_l(0.02) (2) W-2 8 0.16 0.19 0.2 3 1 Al-l(O.Ol) - ⑴ W-1 23 0.14 0.16 0.4 4 1 Al-4(0.01) A2-l(0.01) (1) W-1 27 0.17 0.18 0.3 5 2 A2-2(0.01) A2-K0.01) ⑺ W-2 15 0.16 0.18 0.1 *1 :含有作爲添加劑之膽酸第3-丁酯 *2 ··含有作爲添加劑之溶解阻止劑A n —si ϋ -i n i-i 一I I I Hr mu I ^^1 I (請先閱讀背面之注意事項再填寫本頁)Table 3 Example Resin Photoacid Generator Amine Surfactant Sensitivity Resolution Solubility Correlation A1 (addition amount g) A2 (addition amount g) 1 2 1 1 Al-l(O.Ol) A2-l(0.01) (1) W-1 7 0.12 0.12 1.0 2 2 Al-3(0.01) A2-4(0.01) (2) W-2 13 0.13 0.13 0.8 3 3 Al-5(0.02) A2-5(0.02) (3) W- 3 8 0.12 0.12 0.8 4 4 Al-7(0.02) A2-4(0.01) (4) W-4 15 0.12 0.12 1.0 5 5 Al-3(0.01) A2-3(0.03) (1) W_1 10 0.13 0.13 0.8 6 6 Al -21(0.01) A2-15(0.02) (2) W-2 8 0.14 0.14 1.0 7 7 Al-49(0.03) A2-43(0.01) (3) W-3 15 0.12 0.12 0.8 8 8 Al-43 (0.01) A2-l(0.01) (4) W-4 12 0.13 0.13 1.0 9 9 Al-1(0.03) A2-l(0.01) (3) W-2 7 0.12 0.12 1.0 10 10 Al-5(0.02 A2-5(0.04) (4) W-2 6 0.12 0.12 1.0 11 11 Al-ll(0.02) A2-11(0.02) (1) W-1 8 0.12 0.12 1.0 12 12 Al-5_) A2-l (0.04) (2) W-2 7 0.12 0.12 1.0 13 13 Al-2(0.03) A2-4(0.02) (3) W-3 13 0.13 0.13 1.0 14 14 Al-8(0.02) A2-l(0.02 (4) W-4 14 0.13 0.13 0.8 15 15 A1-54(0.02) A2-47(0.00^ (3) W-2 13 0.14 0.14 0.8 16 3 Α1-4(0·01) A2-4(0.02 (4) W-2 12 0.13 0.13 0.8 17*1 5 Al-3(0.01) A2-4(0 .01) (2) W-3 14 0.13 0.13 0.8 18*2 10 Al-5(0.02) A2-5(0.02) (3) W-3 13 0.12 0.12 0.8 19*3 1 Al-7(0.02) A2 -4(0.01) (4) W-4 5 0.12 0.12 1.0 20 16 Al-l(O.Ol) A2-l(0.01) (1) W-1 7 0.12 0.12 1.0 Comparative Example 1 2 Al-3(0.01) - (7) W -2 31 0.15 0.18 0.4 2 2 - A2_l(0.02) (2) W-2 8 0.16 0.19 0.2 3 1 Al-l(O.Ol) - (1) W-1 23 0.14 0.16 0.4 4 1 Al-4(0.01) A2-l(0.01) (1) W-1 27 0.17 0.18 0.3 5 2 A2-2(0.01) A2-K0.01) (7) W-2 15 0.16 0.18 0.1 *1 : Contains cholic acid as an additive. Butyl ester*2 ·· Contains the dissolution inhibitor as an additive A n —si ϋ -in ii —III Hr mu I ^^1 I (Please read the back note first and then fill out this page)

經濟部智慧財產局員工消費合作社印制衣Ministry of Economic Affairs, Intellectual Property Bureau, Staff Consumption Cooperative, Printed Clothes

*3 :含有 0.01gPAG-A —120 — 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 1257528 A7 _B7五、發明說明（"9) 經濟部智慧財產局員工消費合作社印製*3 : Contains 0.01gPAG-A —120 — This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) 1257528 A7 _B7 V. Invention Description ("9) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumption Cooperative Printed

表4 實施例樹脂光酸發生劑胺界面活性劑感度解像力疏密相關性 A1 (添加量g) Α2 (添加量g) 1 2 21 21 Al-l(O.Ol) A2_l(0.01) ⑴ W-1 8 0.12 0.12 1.0 22 22 Α1·3_) Α2-4(0.01) (2) W-2 15 0.13 0.13 0.8 23 23 Al-5(0.02) Α2-5(0.02) (3) W-3 8 0.12 0.12 1.0 24 24 Al-7(0.02) Α2-4(0.01) (4) W-4 17 0.13 0.13 0.8 25 25 Α1-3(0.01) Α2-3(0.03) ⑴ W-1 14 0.14 0.14 0.6 26 26 Α1-21(0,01) Α2-15(0.02) (2) W-2 9 0.12 0.12 1.0 27 27 Α1·49(0.03) Α2-43(0.01) (3) W-3 19 0.14 0.14 0.6 28 28 Α1-43(0.01) Α2-1(0.01) (4) W-4 15 0.13 0.13 0.8 29 27 Α1-1(0.03) Α2-1(0.01) (3) W-2 7 0.12 0.12 1.0 30 28 Α1-5(0·02) Α2-5(0.04) (4) W-2 7 0.12 0.12 1.0 31 21 AM 1(0.02) Α2-11(0.02) ⑴ W-1 9 0.12 0.12 1.0 32 22 Α1·5(0·01) Α2·1(0·04) (2) W-2 8 0.12 0.12 1.0 33 23 Α1-2(0.03) Α2-4(0.02) (3) W-3 15 0.14 0.14 0.6 34 24 Α1-8(0·02) Α2-Κ0.02) (4) W-4 19 0.14 0.14 0.6 35 25 Α1-54(0.02) Α2-47(〇. 005 (3) W-2 17 0.15 0.15 0.6 36 26 Α1-4(0.01) Α2-4(0.02) (4) W-2 16 0.14 0.14 0.6 37*1 27 Α1-3(0.01) Α2-4(0.01) (2) W-2 19 0.14 0.14 0.6 38*2 29 Α1-5(0.02) Α2-5(0.02) (3) W-3 15 0.13 0.13 0.8 39*3 30 Α1-7(0.02) Α2·4(0·01) (4) W-4 6 0.12 0.12 0.8 40 31 ΑΜ(Ο.ΟΙ) Α2-1(0.01) ⑴ W-1 8 0.12 0.12 1.0 41 32 Α1-3(0.01) Α2-4(0.01) (2) W-2 15 0.13 0.13 0.8 42 33 Α1·5(0.02) Α2-5(0.02) (3) W-3 8 0.12 0.12 0.8 比較例 6 22 Α1-3(0,02) - (2) W-2 35 0.15 0.18 0.4 7 22 - Α2-1(0.02) (2) W-2 9 0.17 0.20 0.1 8 21 ΑΙ-Ι(Ο.ΟΙ) - ⑴ W-1 25 0.14 0.17 0.4 9 21 Α1-4(0.01) Α2-1(0.01) ⑴ W-1 28 0.16 0.18 0.4 10 22 Α2-2(0.01) Α2-1(0.01) (2) W-2 15 0.17 0.20 0.1 *1 :含有作爲添加劑之膽酸第3-丁酯 *2 :含有作爲添加劑之溶解阻止劑A *3 :含有 O.OlgPAG-A -121 — (請先閱讀背面之注意事項再填寫本頁)Table 4 Example Resin photoacid generator amine surfactant surfactant sensitivity resolution correlation A1 (addition amount g) Α 2 (addition amount g) 1 2 21 21 Al-l (O.Ol) A2_l (0.01) (1) W- 1 8 0.12 0.12 1.0 22 22 Α1·3_) Α2-4(0.01) (2) W-2 15 0.13 0.13 0.8 23 23 Al-5(0.02) Α2-5(0.02) (3) W-3 8 0.12 0.12 1.0 24 24 Al-7(0.02) Α2-4(0.01) (4) W-4 17 0.13 0.13 0.8 25 25 Α1-3(0.01) Α2-3(0.03) (1) W-1 14 0.14 0.14 0.6 26 26 Α1 -21(0,01) Α2-15(0.02) (2) W-2 9 0.12 0.12 1.0 27 27 Α1·49(0.03) Α2-43(0.01) (3) W-3 19 0.14 0.14 0.6 28 28 Α1 -43(0.01) Α2-1(0.01) (4) W-4 15 0.13 0.13 0.8 29 27 Α1-1(0.03) Α2-1(0.01) (3) W-2 7 0.12 0.12 1.0 30 28 Α1-5 (0·02) Α2-5(0.04) (4) W-2 7 0.12 0.12 1.0 31 21 AM 1(0.02) Α2-11(0.02) (1) W-1 9 0.12 0.12 1.0 32 22 Α1·5(0· 01) Α2·1(0·04) (2) W-2 8 0.12 0.12 1.0 33 23 Α1-2(0.03) Α2-4(0.02) (3) W-3 15 0.14 0.14 0.6 34 24 Α1-8( 0·02) Α2-Κ0.02) (4) W-4 19 0.14 0.14 0.6 35 25 Α1-54(0.02) Α2-47(〇. 005 (3) W-2 17 0.15 0.15 0.6 36 26 Α1-4 (0.01) Α2-4(0 .02) (4) W-2 16 0.14 0.14 0.6 37*1 27 Α1-3(0.01) Α2-4(0.01) (2) W-2 19 0.14 0.14 0.6 38*2 29 Α1-5(0.02) Α2 -5(0.02) (3) W-3 15 0.13 0.13 0.8 39*3 30 Α1-7(0.02) Α2·4(0·01) (4) W-4 6 0.12 0.12 0.8 40 31 ΑΜ(Ο.ΟΙ Α2-1(0.01) (1) W-1 8 0.12 0.12 1.0 41 32 Α1-3(0.01) Α2-4(0.01) (2) W-2 15 0.13 0.13 0.8 42 33 Α1·5(0.02) Α2-5 (0.02) (3) W-3 8 0.12 0.12 0.8 Comparative Example 6 22 Α1-3(0,02) - (2) W-2 35 0.15 0.18 0.4 7 22 - Α2-1(0.02) (2) W- 2 9 0.17 0.20 0.1 8 21 ΑΙ-Ι(Ο.ΟΙ) - (1) W-1 25 0.14 0.17 0.4 9 21 Α1-4(0.01) Α2-1(0.01) (1) W-1 28 0.16 0.18 0.4 10 22 Α2- 2(0.01) Α2-1(0.01) (2) W-2 15 0.17 0.20 0.1 *1 : Containing cholic acid as an additive 3-butyl ester *2 : Containing a dissolution inhibitor as an additive A *3 : Containing O .OlgPAG-A -121 — (Please read the notes on the back and fill out this page)

本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）經濟部智慧財產局員工消費合作社印製 1257528 A7 ___B7__ ^ 120 五、發明說明（）由表3，表4可知下述之結果。本發明之正型阻體組成物（實施例之組成物）係爲對波長193nm之曝光而言具有充分的感度及解像力，且自曝光至加熱中幾乎沒有因經時之性能變化。另外，僅使用1種光酸發生劑A1或A2之比餃例1〜3、比較例6〜8時，會有自曝光至加熱之經睁性能變化情形、疏密相關性大。而且，亦有感度不佳情形（比較例1、 3、6、8) 〇倂用光酸發生劑A1與A2者之陰離子部分的氟取代烷基之碳數差爲9、超出本發明之特定範圍的比較例4、比較例9時，上述特性皆不佳。倂用2種光酸發生劑A2、且陰離子部分之氟取代烷基的碳數差爲1、小於本發明特定範圍之比較例5、比較例 1 0時，解像力不佳、自曝光至加熱中會有經時性能變化、疏密相關性大。 (發明之效果] 本發明之正型阻體組成物，尤其適用於170〜220nm之遠紫外線光波長範圍之光，具有優異的感度及解像力、自曝光至加熱中幾乎完全沒有經時之性能變化、工程容許性優異。而且，所形成的阻體圖樣的疏密相關性小。 -122- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --------------------訂·— (請先閱讀背面之注意事項再填寫本頁)This paper scale applies to China National Standard (CNS) A4 specification (210 X 297 mm) Ministry of Economic Affairs Intellectual Property Bureau Staff Consumer Cooperative Printed 1257528 A7 ___B7__ ^ 120 V. Description of Invention () Table 3, Table 4 shows the following result. The positive resist composition (composition of the examples) of the present invention has sufficient sensitivity and resolution for exposure at a wavelength of 193 nm, and hardly changes in performance from exposure to heating. Further, when only one of the photoacid generators A1 or A2 was used, the blending examples 1 to 3 and the comparative examples 6 to 8 showed a change in the warp performance from exposure to heating, and the density correlation was large. Further, in the case where the sensitivity is not good (Comparative Examples 1, 3, 6, and 8), the carbon number difference of the fluorine-substituted alkyl group of the anion portion of the photoacid generators A1 and A2 is 9, which is beyond the specificity of the present invention. In Comparative Example 4 and Comparative Example 9 of the range, the above characteristics were not good. When the two kinds of photoacid generator A2 are used, and the carbon number difference of the fluorine-substituted alkyl group of the anion portion is 1, the comparative example 5 and the comparative example 10 which are smaller than the specific range of the present invention have poor resolution, self-exposure to heating. There will be a change in performance over time and a large correlation between density and density. (Effect of the Invention) The positive resist composition of the present invention is particularly suitable for light having a wavelength range of ultraviolet light of 170 to 220 nm, and has excellent sensitivity and resolution, and almost no change in performance from exposure to heating. Excellent engineering tolerance. Moreover, the density of the formed resist pattern is small. -122- This paper scale applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ------- -------------Books - (Please read the notes on the back and fill out this page)

Claims

-1257528 J --1257528 J -

六、申請專利範圍第89 1 267 26號「正型阻體組成物」專利案 ( 2005年8月31日修正）六、申請專利範圍： 1 . 一種正型阻體組成物，其特徵爲含有 (A) 以組成物中之固成分爲基準，0 . 01〜20重量％的數種選自陽離子部分以碘鐵或毓所構成、陰離子部分以RFS03•(式中1^係爲碳數1〜10之氟取代的烷基）所示陰離子構成的磺酸鹽、藉由活性光線或放射線照射產生酸之光酸發生劑，以及 (B) 以組成物中之固成分爲基準，40〜99.99重量％的含有下述一般式（I’）所示之重覆構造單位30〜70莫耳％及一般式（II')所示之重覆構造單位30〜70莫耳％、且藉由酸作用增加對鹼顯像液之溶解速度的樹脂 (B-1)’或具有任一種下述一般式（la")及一般式 (lb")所示之重覆構造單位25〜50莫耳％與下述一般式（Π”-Α)或一般式（Π”-Β)所示之重覆構造單位 25〜50莫耳％、且藉由酸作用增加對鹼顯像液之溶解速度的樹脂（B - 2 )，且在上述（A)數種光酸發生劑中存在有陰離子部分之RF的碳數差在2〜8範圍內的至少一對光酸發生劑 -1 - 1257528 t、申請專利範圍VI. Patent Application No. 89 1 267 26 "Positive Type Resistor Composition" Patent Case (Amended on August 31, 2005) VI. Patent Application Range: 1. A positive type resist composition, characterized by (A) Based on the solid content in the composition, 0.01 to 20% by weight of several selected from the cation portion is composed of iron iodide or ruthenium, and the anion portion is RFS03• (wherein 1^ is the carbon number 1 a sulfonate composed of an anion represented by ～10, a photoacid generator which generates an acid by active light or radiation, and (B) a solid component in the composition, 40 to 99.99 The weight % contains 30 to 70 mol% of the repeating structural unit represented by the following general formula (I') and 30 to 70 mol% of the repeating structural unit represented by the general formula (II'), and is made up of acid Resin (B-1)' which acts to increase the dissolution rate of the alkali imaging solution or has a repeating structural unit of any of the following general formulas (la") and general formula (lb") 25 to 50 mol% 25 to 50 mol% of the repeating structural unit shown by the following general formula (Π"-Α) or general formula (Π"-Β), and a resin (B - 2 ) which increases the dissolution rate of the alkali developing solution by an acid action, and the carbon number difference of the RF having an anion portion in the above-mentioned (A) photoacid generators is in the range of 2 to 8 At least one pair of photoacid generator-1 - 1257528 t, patent application scope

R01R01

上述一般式（I’）、（II1)中：係各爲獨立的氫原子或碳數1〜4之烷基；心2 係表示碳數1〜4之烷基； W係表示單鍵或單獨選自碳數1〜4之伸烷基、酯基所成群之基或其2種以上組合之基； Lc中Ra、Rb、Rc、Rd、Re、Rf係各獨立表示氫原子或碳數1〜4之烷基；惟Ra〜Rf中任一個係表示單鍵或碳數1〜4之伸烷基、且與W鍵結；m、η係各 -2- 1257528 六、申請專利範圍獨立表示0〜3之整數、且m + n爲2〜6之整數；In the above general formulas (I') and (II1): each is an independent hydrogen atom or an alkyl group having 1 to 4 carbon atoms; the core 2 is an alkyl group having 1 to 4 carbon atoms; and W is a single bond or a single molecule. a group selected from the group consisting of an alkyl group having 1 to 4 carbon atoms, a group in which an ester group is grouped, or a combination of two or more thereof; and Ra, Rb, Rc, Rd, Re, and Rf in Lc each independently represent a hydrogen atom or a carbon number. Any of 1 to 4 alkyl groups; but any of Ra to Rf represents a single bond or an alkylene group having a carbon number of 1 to 4, and is bonded to W; m, η is each -2- 12, 575, 528. An integer representing 0 to 3, and m + n is an integer of 2 to 6;

R，1 R，2 (la")R,1 R,2 (la")

式（I a")中： R、、IT2係各獨立表示碳數1〜6之烷基或下述-Y 基； X係表示氧原子； Α係表示單鍵或2價連結基； -Y基： -3- 1257528 六、申請專利範圍In the formula (I a "): R, and IT2 each independently represent an alkyl group having 1 to 6 carbon atoms or the following -Y group; X represents an oxygen atom; lanthanide represents a single bond or a divalent linking group; -Y Base: -3- 1257528 VI. Application for patent scope

(-Y基中，R，21〜R’3〇係各獨立表示氫原子或碳數 1〜6之烷基：a、b係1或2) 式（I b ”）中： Z2係表示-0-; 一般式（I I，，- A )、（ I I " · B )中·· R，13〜R·16 係各獨立表示氫原子、-〔0011、-C〇OR'5(R，5係碳數1〜4之烷基或上述-Y基）、-C( = 0)-X-A-R，17或烷基；而且，R’u〜R’16中至少2個鍵結形成環；其中X及A係各與上述同義；R ’ 17係爲- C00H、-C00R'5、經基、碳數1〜4之院氧基、（R、係與上述同義）或上述-Y基； η係0或1。 2 . —種正型阻體組成物，其特徵爲含有 (Α)以組成物中之固成分爲基準’ 〇·〇1〜20重量％的數種選自陽離子部分以碘鐵或毓所構成、陰離子部分以RFS〇r(式中RF係爲碳數1〜之氟取代的烷基）所示陰離子構成的磺酸鹽、藉由活性光線或放射線照射產生酸之光酸發生劑’以及 (B)以組成物中之固成分爲基準，40〜99 ·99重量％的一4一 1257528 六、申請專利範圍含有下述一般式（1〃）所示之重覆構造單位30〜70莫耳％及一般式（II')所示之重覆構造單位30〜70莫耳％、且藉由酸作用增加對鹼顯像液之溶解速度的樹脂 (B - 1 )，且在上述（A)數種光酸發生劑中存在有陰離子部分之RF的碳數差在2〜8範圍內的至少一對光酸發生劑(In the -Y group, R, 21 to R'3 are each independently represented by a hydrogen atom or an alkyl group having 1 to 6 carbon atoms: a, b is 1 or 2) in the formula (I b "): Z2 is represented by - 0-; General formula (II,, - A ), ( II " · B ) · · R, 13~R·16 each independently represent a hydrogen atom, -[0011, -C〇OR'5(R, 5 is an alkyl group having 1 to 4 carbon atoms or the above -Y group), -C(=0)-XAR, 17 or an alkyl group; and at least 2 of R'u~R'16 are bonded to form a ring; X and A are each synonymous with the above; R '17 is -C00H, -C00R'5, a meridinine, a carbon number of 1 to 4, (R, is synonymous with the above) or the above -Y group; 0 or 1. 2 . A positive type resist composition characterized by containing (Α) based on the solid content in the composition, 〇·〇1~20% by weight of several selected from the cationic part to iodine a sulfonate composed of iron or ruthenium and having an anion moiety represented by an anion represented by RFS〇r (wherein the RF system is a fluorine-substituted alkyl group having a carbon number of 1 to 1), and photoacid generated by irradiation of active light or radiation The generating agent 'and (B) are based on the solid content in the composition, 40 to 99 · 99% by weight of a 4 1257528 6. The scope of the patent application includes 30~70 mol% of the repeating structural unit shown in the following general formula (1〃) and 30~70 mol% of the repeating structural unit shown by the general formula (II'), and a resin (B - 1 ) which increases the dissolution rate of the alkali developing solution by an acid action, and the carbon number difference of the RF having an anion portion in the above-mentioned (A) photoacid generators is in the range of 2 to 8 At least one pair of photoacid generators

上述一般式（1〃）、（II’）中： r〇i係各爲獨立的氫原子或碳數1〜4之烷基； w係表示單鍵或單獨選自碳數1〜4之伸烷基、酯基 -5- 1257528 六、申請專利範圍所成群之基或其2種以上組合之基； Lc中Ra、Rb、Rc、Rd、Re、Rf係各獨立表示氫原子或碳數1〜4之院基；惟Ra〜Rf中任一個係表示單鍵或碳數1〜4之伸烷基、且與W鍵結；m、n係各獨立表示0〜3之整數、且m + n爲2〜6之整數。 3 .如申請專利範圍第1項之正型阻體組成物，其中（B)成分爲含有由3 -羥基-1-金剛烷基（甲基）丙烯酸酯、3，5 -二羥基-1 -金剛烷基（甲基）丙烯酸酯所選出的重覆構造單位之樹脂。 4 ·如申請專利範圍第1或2項之正型阻體組成物，其中，於陰離子部分之RF的碳數差爲2〜8之一對光酸發生劑中， RF之碳數相對大的光酸發生劑係爲選自陰離子部分的RF爲碳數4〜1 0之直鏈狀經氟取代的烷基之光酸發生劑所成群者， RF之碳數相對小的光酸發生劑係爲選自陰離子部分的RF爲碳數1〜5之直鏈狀經氟取代的烷基之光酸發生劑所成群者。 5 .如申請專利範圍第1或2項之正型阻體組成物，其中，光酸發生劑之陽離子部分係爲下述一般式（I)、 (I I )或（I II )所示者， _ 6 - 、1257528 六、申請專利範圍In the above general formulas (1〃) and (II'): r〇i is each an independent hydrogen atom or an alkyl group having 1 to 4 carbon atoms; w is a single bond or a single one selected from carbon numbers 1 to 4. Alkyl group, ester group-5- 1257528 6. Groups in the group of patent application or a combination of two or more thereof; in each case, Ra, Rb, Rc, Rd, Re, and Rf in Lc each independently represent a hydrogen atom or a carbon number. a hospital base of 1 to 4; however, any one of Ra to Rf represents a single bond or an alkyl group having a carbon number of 1 to 4, and is bonded to W; m and n each independently represent an integer of 0 to 3, and m + n is an integer from 2 to 6. 3. The positive-type resist composition of claim 1, wherein the component (B) is composed of 3-hydroxy-1-adamantyl (meth) acrylate, 3,5-dihydroxy-1 - The resin of the repeating structural unit selected by adamantyl (meth) acrylate. 4. The positive-type resist composition according to claim 1 or 2, wherein the difference in the carbon number of the RF in the anion portion is 2 to 8; in the photoacid generator, the carbon number of the RF is relatively large. The photoacid generator is a group of photoacid generators having a carbon number of from 4 to 10 carbon atoms selected from the anion portion and having a relatively low carbon number. It is a group of a photoacid generator in which the RF selected from the anion moiety is a linear fluoro-substituted alkyl group having 1 to 5 carbon atoms. 5. The positive-type resist composition according to claim 1 or 2, wherein the cationic portion of the photo-acid generator is represented by the following general formula (I), (II) or (I II ), _ 6 - , 1257528 VI. Application for patent scope

其中，係爲相同或不同的氫原子、支鏈狀或環狀烷基、直鏈狀、支鏈狀或環、羥基、鹵素原子、或- S-R38基；R38係表、支鏈狀或環狀烷基或芳基；Κ〜κ15、r16- -7- 直鏈狀、狀烷氧基示直鏈狀、R27、R28 1257528 六、申請專刺範圍〜R37中有2個以上鍵結形成含有1種或2種以上之單鍵、碳、氧、硫及氮之環。 6 .如申請專利範圍第1或2項之正型阻體組成物，其更含有含氮鹼性化合物。 7 .如申請專利範圍第1或2項之正型阻體組成物，其中含有氟系及/或矽系界面活性劑。 8 .如申請專利範圍第1或2項之正型阻體組成物，其中以波長220nm以下之活性光線或放射線照射。Wherein, they are the same or different hydrogen atoms, branched or cyclic alkyl groups, linear, branched or cyclic, hydroxyl, halogen atoms, or -S-R38 groups; R38 is tabular, branched or Cyclic alkyl or aryl; Κ~κ15, r16- -7- linear, alkoxy linear, R27, R28 1257528 6. Application for specific thorn range ~ R37 with more than 2 bonds A ring containing one or more than one single bond, carbon, oxygen, sulfur, and nitrogen. 6. A positive-type resist composition according to claim 1 or 2, which further contains a nitrogen-containing basic compound. A positive-type resist composition according to claim 1 or 2, which contains a fluorine-based and/or a lanthanide-based surfactant. 8. The positive-type resist composition according to claim 1 or 2, wherein the active light or radiation having a wavelength of 220 nm or less is irradiated.