TWI239283B - Blank body forming device and forming process thereof - Google Patents

Blank body forming device and forming process thereof Download PDF

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Publication number
TWI239283B
TWI239283B TW92112439A TW92112439A TWI239283B TW I239283 B TWI239283 B TW I239283B TW 92112439 A TW92112439 A TW 92112439A TW 92112439 A TW92112439 A TW 92112439A TW I239283 B TWI239283 B TW I239283B
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mold
patent application
scope
body forming
item
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TW92112439A
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TW200424048A (en
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Chin-Shan Lin
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Semiconductor Industry Consult
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Abstract

A blank body forming device, includes: a vacuum chamber, a pressure supplier, a slurry material injector, a vacuuming machine and a heater. The vacuum chamber is of a predetermined vacuum level for placing a mold. The pressure supplier is connected to the vacuum chamber for supplying a predetermined pressure so as to inject a slurry material into the mold. The vacuuming machine is connected to the vacuum chamber for maintaining the vacuum chamber at the vacuum level. The heater is connected to t he vacuum chamber, for heating the slurry material after the slurry material is injected into the mold, so as to turn the slurry material into a blank body. This invention is effective in reducing the lead time for forming the blank body, while enhancing the quality so as to effectively reduce the manufacturing cost of the blank body.

Description

1239283 五、發明說明(1) 一、發明所屬之技術領域 本發明係關於一種胚體成型裝置及其製程,特別是 關於將一種真空加熱輔助胚體成型裝置及其製程,其成 品應用於光電、半導體製程設備中的精密陶瓷物件。 二、先前 應用 隨著光電 大。由於 型精密物 (A 1 2〇 a) 化氧化鍅 氮化硼( 屬氮化物 $夕合金、 歐美 時,係採 加以成型 設計更是 統上係以 注漿應用 時效 後才能固 污染 技術 於光電、半導體製程設備中的精密陶瓷物件, 、半導體設備的大型化,體積也變得愈來愈 需具有耐熱、抗腐蝕、高絕緣等特性,這些大 件的材料組成包括·組成9 0%以上氧化在呂 精密陶曼、3mole%〜8mole%氧化紀部分安定 精密陶瓷、氮化鋁(A1N)、氮化矽(S i 3N 4)、 B N)碳化石夕(S i C)、一般金屬氧化物、一般金 、一般金屬碳化物、金、銀、紹-鈦合金、铭_ 銀和金、紹、铭合金、组、鉻金屬等等。 曰大多數生產者於生產上述大型精密陶瓷物件 用冷均壓(Cold Isostatic Press, CIP)製程 。然而C I P製程設備成本高,模具費用高與模具 複雜與要求嚴格。除了上述冷均壓製程外,傳 注漿製程做為製作陶瓷物件的技術,但是傳統 在大型精密陶瓷材料製程仍然有以下之限制: 較差:大型物件於傳統注漿成型時,需要數曰 化成生胚。 控制困難:使用石膏模作為注漿模具會造成物1239283 V. Description of the invention (1) 1. The technical field to which the invention belongs The present invention relates to an embryo body forming device and a process therefor, and more particularly to a vacuum heating assisted embryo body forming device and a process therefor. Precision ceramic objects in semiconductor process equipment. Second, previous applications Due to the type of precision (A 1 2a) boron nitride boron nitride (belonging to Nitride alloy, Europe and the United States, it is used in the design of molding design, it is based on the application of aging in the grouting technology. , Precision ceramic objects in semiconductor manufacturing equipment, Large-scale semiconductor equipment, and the volume has also become more and more necessary to have heat resistance, corrosion resistance, high insulation and other characteristics. The material composition of these large pieces includes a composition of more than 90% oxidation In Lujing Taoman, 3mole% ~ 8mole% oxidized part stabilized precision ceramics, aluminum nitride (A1N), silicon nitride (S i 3N 4), BN) carbide carbide (S i C), general metal oxides , General gold, general metal carbide, gold, silver, Shao-titanium alloy, Ming _ silver and gold, Shao, Ming alloy, group, chromium metal and so on. That is to say, most manufacturers use the Cold Isostatic Press (CIP) process to produce the large-scale precision ceramic objects. However, the cost of CIP process equipment is high, the mold cost is high, and the mold is complex and strict. In addition to the cold homogeneous pressing process described above, the transfer grouting process is used as a technique for making ceramic objects, but the traditional large-scale precision ceramic material manufacturing process still has the following limitations: Poor: When large objects are formed by traditional grouting, they need to be transformed into raw materials. Embryo. Difficult to control: using plaster mold as grouting mold can cause

第4頁 1239283 五、發明說明(2) 件被鈣(Ca) 增長而增加。 物件胚體 成注漿的製程 得壁内較厚的 裂縫,並且對 後物件發生不 石貧模壽 數次以後,尺 與廢棄,均是 為了改善 便應運而生。 製程於時效與 應用高壓注漿 成,如面領土 加以調配組成 體強化劑。在 使得原料固化 而,此製程方 材是有問題的 胚體強化劑組 為原料無法固 除此之外 於強度較低, 及硫(S)所污染,且污染量會隨注漿時間 密度 ,因 區域 大型 均勻 命與 寸精 大型 傳統 然而 分佈 時, 、钟 〇上 南壓 ,於 法用 ,因 成, 化, ,傳 使用 分佈 而造 在固 物件 的收 管理 準度 精密 注漿 傳統 不均 因為 長石 述的 注漿 成型 於純 為, 即使 致使 統用 數次 不均勻 成漿料 化後可 之胚體 縮進而 之缺點 變差。 陶瓷生 製程的 高壓注 等缺點 陶瓷材 、鈉長 配方使 成型後 與退模 度要求 這些高 完成成 得無法 於形成 以後, :由 中粉 能形 密度 造成 :石 因此 產時 缺點 漿製 ,但 料之 石 、 得胚 ,胚 時可 南之 純度 型動 得到 物件 尺寸 於需 末偏 成胚 分佈 龜裂 膏模 使用 所必 ,傳 程雖 由於 胚體 粘土 體得 體就 以很 光電 原料 作後 完整 胚體 精準 要較長 析。此 體中空 不均, 等不良 強度較 壽命短 須面對 統高壓 改善了 傳統之 為一般 、球土 到一種 具有生 順利達 、半導 中,沒 將無法 物件生 之石膏 度變差 的時 一現 、空 使得 的結 低, 及其 的問 注漿 傳統 陶瓷 礦物 、石夕 自然 胚強 成。 體製 有自 脫模 胚雛 模具 ,因 間完 象使 洞、 燒結 果。 使用 管理 題。 製程 注漿 材料 組 砂等 的胚 度、 缺 程耗 然的 ,因 型 〇 ,由 次使Page 4 1239283 V. Description of the invention (2) The item is increased by the increase of calcium (Ca). The process of grouting the object's embryo body resulted in thicker cracks in the wall, and after a number of times, the object was not depleted, and the ruler and discarded were born to improve the situation. The process is aging and the application of high pressure grouting, such as the surface area to mix the composition of the strengthening agent. When the raw material is solidified, the process square material is a problematic embryo body strengthening agent group, and the raw material cannot be solidified. In addition, the raw material cannot be solidified, and the strength is low, and sulfur (S) is polluted, and the amount of pollution will vary with the grouting time density. Due to the large-scale uniformity of the area and the large-scale traditional tradition, however, when the clock and the south are pressed, the method is used, due to the formation, transformation, and transmission of the distribution of the solid objects. Because the grouting described by feldspar is pure, the shortcomings of the embryo body shrinkable even after it is used for several times to make the slurry uniform can be worsened. Disadvantages such as high-pressure injection of ceramic raw materials, such as ceramic materials and sodium long formula, make these high requirements after molding and the degree of mold release can not be completed after formation,: caused by the energy density of medium powder: stone therefore has disadvantages in pulp during production, but The material stone, the embryo is obtained, and the purity can be obtained during the embryo. The size of the object is necessary for the embryo to be distributed. The crack paste mold is necessary for use. Embryo body accuracy is longer. The body is uneven, and the bad strength is shorter than the life. It has to be faced with the high pressure. The tradition is improved. The ball is a kind of smooth and semiconductive, which does not reduce the degree of gypsum that cannot be produced. The existing and empty knots are low, and the traditional ceramic minerals and natural stone embryos are strongly formed by grouting. The system has a self-releasing embryo mold, which causes holes and sintered fruits due to incompleteness. Use management questions. The degree of embryonicity and absence of sand in the grouting material group of the process are conspicuous, due to the type 〇

第5頁 五、發明說明(3) 用壽命相當短,進而 J時:f面對的問題,另:膏料管理與廢棄等生 :成型較複雜的物件,^加璧成型。然而此-作法無 寸,需要預留一些空馬為使物件較接近所需精密尺 達到接近物件尺;二ya 積,待成型完畢以後在預加工 因此,為粉末成型無法做到。 習 新大型精密陶瓷物彳t: +導體新製程之所需,必須有 知技術的缺點。 之胚體成型裝置與製程,以解決 、發. 本 ,用 本 之胚 製作光 問題。 本 機 以置放 以提供 具中。 體維持 程 件 明内容 發明之 以解決 發明之 體成型 電、半 發明係 腔體、 一加熱 一模具 一預定 該真空 於該真 的,在於提供一種胚體成 〇胚體成型技術所產生之缺 另一目的,在於提供一種大型 裝置與製程,以解決習知高壓 導體新製程所需之精密陶瓷物 ❿ 型裝置與製 點。 精密陶究物 注漿製程於 件所衍生的 一種胚體成型裝置及其製程,該裝置包含 一壓力供給器、一漿料注入器 器。該真空腔體,具有一預定 。該壓力供給器,連接至該真 壓力以挾持該模具,再注入一 機,連接至該真空腔體,用以 空度。該加熱器,連接在至真 、一抽真空 真空度,用 空腔體,用 漿料至該模 使該真空腔 空腔體壁Page 5 V. Explanation of the invention (3) The service life is quite short, and then J time: the problems faced by f, and the other: paste management and waste, etc .: molding more complex objects, and adding molding. However, this method is inexhaustible, and some empty horses need to be reserved in order to make the object closer to the required precision ruler to reach the object ruler; two ya product, which will be pre-processed after molding is completed. Therefore, powder molding cannot be achieved. The new large-scale precision ceramics 彳 t: + required for the new process of conductors must have known technical disadvantages. The embryo body forming device and process are used to solve the problem of making light. The unit is placed to provide the tool. The content of the body maintenance process is to solve the invention of the body forming electric, semi-inventive cavity, a heating, a mold, and the vacuum is supposed to be true, which is to provide a defect of the embryo body forming technology. Another object is to provide a large-scale device and manufacturing process, to solve the need for the precise ceramic material 导体 -type device and manufacturing point required for the conventional new manufacturing process of high-voltage conductors. A precision ceramic grouting process is derived from an embryonic body forming device and its manufacturing process. The device includes a pressure feeder and a slurry injector. The vacuum cavity has a predetermined value. The pressure supply device is connected to the true pressure to hold the mold, and is then injected into a machine and connected to the vacuum cavity for vacancy. The heater is connected to a vacuum, a vacuum degree, a cavity body, and a slurry to the mold to make the vacuum cavity cavity wall

第6頁 1239283 五、發明說明(4) 内,用以於該漿料注入該模具後,對該漿料、模具進行 一加熱程序,使溶劑迅速排出,以使該漿料形成一胚 · 體。其中,該模具係為多孔性模具,可直放或平放於該 真空腔體中。 因此,本發明是以真空加熱輔助高壓注漿成型技術 為基本,再輔以多孔性模具材料開發技術,使胚體得以 在高品質的要求下順利生產。以本發明之裝置及製程投 入生產時,勢必節省下所需投入的資金,降低開發時 程、減低資產成本積壓。 關於本發明之優點與精神可以藉由以下的發明詳述 及所附.圖式得到進一步的瞭解。 四、實施方式 請參閱圖一及圖二,圖一係本發明胚體成型裝置1 〇 之上視圖,圖二係圖一中胚體成型裝置1 〇之側視圖。本 發明之胚體成型裝置包含一真空腔體12、一壓力供給器 1 4、一抽真空機1 6以及一加熱器1 8。本發明胚體成型裝 置1 0係用以製作一具有外型尺寸之胚體,其適用之材料 範圍包含任何粉末性質材料,此等粉末性質材料在加工 成型前係先經由溶劑加以混合、研磨或分散,進而形成 一種漿料(含有固體含量之溶液)。 _ 真空腔體1 2係用以置放一模具(一個或多個組成, 圖中未顯示),最佳之實施例係於真空腔體中置入一多 孔性模具,其孔徑尺寸大小為0 · 5微米(// m)〜8微米Page 6 12392283 5. In the description of the invention (4), after the slurry is injected into the mold, a heating process is performed on the slurry and the mold to quickly discharge the solvent so that the slurry forms an embryo and a body. . The mold is a porous mold, which can be placed in the vacuum cavity directly or flat. Therefore, the present invention is based on vacuum heating assisted high-pressure grouting molding technology, and then supplemented with porous mold material development technology, so that the embryo body can be smoothly produced under the requirements of high quality. When the device and process of the present invention are put into production, it is bound to save the required investment capital, reduce the development time, and reduce the backlog of asset costs. The advantages and spirit of the present invention can be further understood through the following detailed description of the invention and the accompanying drawings. 4. Embodiments Please refer to FIG. 1 and FIG. 2. FIG. 1 is a top view of the embryonic body forming device 10 of the present invention, and FIG. The embryonic body forming apparatus of the present invention includes a vacuum cavity 12, a pressure feeder 14, a vacuum pump 16 and a heater 18. The embryonic body forming device 10 of the present invention is used to produce an embryonic body with an external size. The applicable material range includes any powdery material. These powdery materials are mixed, ground or processed by a solvent before processing and forming. Disperse to form a slurry (a solution containing a solid content). _ The vacuum cavity 12 is used to place a mold (one or more components, not shown in the figure). The best embodiment is to place a porous mold in the vacuum cavity, and its pore size is 0 · 5 microns (// m) ~ 8 microns

第7頁 1239283 五、發明說明 (# m)、 則可為平 1 4,用以 體之漿料 施範圍係 如圖 機1 6,用 空度的最 :torr) 料注入該 形成一·胚 孔性模具 持該預定 度以取出 將溫度控 熱方式則 在本 形成光電 件,其主 3 m ο 1 e% -(AIN) (SiC), 碳化物、 鋁、鋁合 (5) 氣孔率(或稱開孔率)為1 0%〜5 0°/◦、堆疊方式 放或直放。真空腔體1 2係連接至壓力供給器 提供一預定壓力挾持模具,得以注入欲形成胚 至多孔性模具中。本發明之預定壓力的最佳實 設定為 0. 5kg /cm 2 〜60kg /cm 2。 一及圖二所示,真空腔體12並連接至一抽真空 以使真空腔體1 2維持於一真空度。本發明之真 佳實施範圍係設定為2 0 0托(torr)〜lx 1 0 _2托 。加熱器1 8係連接至真空腔體1 2,用以於該漿 模具後,對該漿料進行一加熱程序以使該漿料 體。該加熱程序係包含以下步驟:1.加熱該多 内之漿料至一預定溫度;2.於一預定時間内維 溫度;3.於該預定時間過後,降溫至一卸模溫 該胚體。加熱器1 8可藉由可程式溫度加熱控制 制於2 0°C〜1 8 0°C的範圍内,至於加熱器1 8的加 有電熱器加熱、微波加熱、紅外線加熱等。 發明之另一較佳具體實施例中,本發明係用以 、半導體製程設備中使用的大型精密陶瓷物 要材質為:9 0 mo 1 e%以上氧化鋁(A 1 20 a)、 -8 m ο 1 e%氧化記部分安定化氧化錯、氮化I呂 >氮化矽(Si3N4)、氮化硼(BN)、碳化矽 > 一般金屬氧化物、一般金屬氮化物、一般金屬 金、銀、铭-鈦合金、Is -$夕合金、銀和金、 金、组、鉻等。Page 7 12392283 V. Description of the invention (# m), it can be flat 1 4 and the application range of the slurry is as shown in Fig. 16 with the highest degree of emptyness: torr) The material is injected to form a embryo. The porous mold holds the predetermined degree to take out the temperature control method to form a photovoltaic element. The main part is 3 m ο 1 e%-(AIN) (SiC), carbide, aluminum, aluminum alloy (5) porosity ( (Or aperture ratio) is 10% ~ 50 ° / ◦, stacked or placed straight. The vacuum cavity 12 is connected to a pressure feeder, and a predetermined pressure is provided to hold the mold, so that the embryo to be formed into the porous mold can be injected. The optimum actual setting of the predetermined pressure of the present invention is 0.5 kg / cm 2 to 60 kg / cm 2. As shown in Figs. 1 and 2, the vacuum chamber 12 is connected to a vacuum so that the vacuum chamber 12 is maintained at a vacuum degree. The practical implementation range of the present invention is set to 200 torr to lx 1 0 _2 torr. The heater 18 is connected to the vacuum cavity 12 for performing a heating process on the slurry after the slurry mold to make the slurry. The heating procedure includes the following steps: 1. heating the slurry in the chamber to a predetermined temperature; 2. maintaining the temperature within a predetermined time; 3. cooling down to a mold temperature after the predetermined time has elapsed. The heater 18 can be controlled in the range of 20 ° C to 180 ° C by programmable temperature heating control. As for the heater 18, electric heater heating, microwave heating, infrared heating, etc. are added. In another preferred embodiment of the invention, the present invention is used for large precision ceramics used in semiconductor manufacturing equipment. The material is: 90 m 1 e% alumina (A 1 20 a), -8 m ο 1 e% Oxidation Partially Stabilized Oxidation Oxidation, Nitriding Ill > Silicon Nitride (Si3N4), Boron Nitride (BN), Silicon Carbide > General Metal Oxide, General Metal Nitride, General Metal Gold, Silver, Ming-titanium alloy, Is- $ x alloy, silver and gold, gold, group, chromium, etc.

第8頁 1239283 五、發明說明(6) 綜合以上所述,本發明之胚體成型裝置係將漿料經 由壓力供給器加壓輸送至多孔性模具之内,經由預定壓 力(注漿壓力)、真空腔體之真空度(爐壓)、加熱器 加熱之相輔控制以形成一胚體。本發明並經由多孔性模 具與加壓注入漿料而使漿料固液分離的方式,以及模具 整體置於真空環境下,可有效增加漿料注入模具内時之 均勾度、溶劑液體之排出速度與溶液之揮發。本發明中 更利用加熱之方式以增加液體之排放。因此大型物件於 本裝置中成型時,只需要數分鐘至數小時後就可以固化 成胚體並具有強度,更利於卸除模具。 如此本發明既可在較短的時間完成胚體的製程,不 會造成漿料中粉末偏析、形成胚體中空、空洞、裂縫等 問題,並且對大型物件之胚體密度分佈非常均勻。有效 解決了石膏模因強度較低所須面對的問題。並在一般精 密物件於成型時,由於本專利控制漿料之壓力,使漿料 充滿於模具中,再加上壓力供給器的漿料加壓、模具置 放於真空腔體内、與加熱輔助等系統化之製程操作,使 得溶劑蒸發速率加快,使得製程時間縮短,因此可得較 佳之精密物件的胚體,達到接近物件成品尺寸,進而降 低物件加工時效與成本。 請參閱圖三,圖三係本發明之胚體成型製程之流程 圖。綜合以上所述,應用本發明以形成胚體之製程可詳 細分為下列步驟: 步驟3 0 :開始。Page 8 12392283 5. Description of the invention (6) In summary, the embryonic body forming device of the present invention pressurizes and conveys the slurry into the porous mold through a pressure feeder, and passes the predetermined pressure (grouting pressure), The vacuum degree (furnace pressure) of the vacuum cavity and the heating of the heater are controlled to form an embryo. According to the present invention, the slurry is solid-liquid separated through a porous mold and a pressure injection slurry, and the entire mold is placed in a vacuum environment, which can effectively increase the uniformity of the slurry when the slurry is injected into the mold and the discharge of the solvent liquid. Speed and volatility of the solution. In the present invention, heating is used to increase the discharge of liquid. Therefore, when a large object is formed in the device, it only takes a few minutes to several hours to solidify into an embryo and has strength, which is more conducive to removing the mold. In this way, the invention can complete the process of embryo body in a short time, it will not cause the problem of powder segregation in the slurry, the formation of hollow, voids and cracks in the embryo body, and the density distribution of embryo bodies in large objects is very uniform. Effectively solves the problems that the plaster mold must have a low strength. And when general precision objects are formed, the patent controls the pressure of the slurry to fill the slurry in the mold, plus the pressure of the slurry from the pressure feeder, the mold is placed in the vacuum cavity, and the heating aid Such systematic process operations can accelerate the solvent evaporation rate and shorten the process time. Therefore, a better embryo body can be obtained, which can reach the size of the finished product, thereby reducing the processing time and cost of the object. Please refer to FIG. 3, which is a flowchart of the embryo body forming process of the present invention. To sum up, the process of applying the present invention to form an embryonic body can be subdivided into the following steps in detail: Step 30: Start.

第9頁 1239283 五、發明說明 (7) 步 驟 32 堆 疊 模 具 〇 步 驟 34 將 模 具 置 入 真 空 腔 體 12° 步 驟 36 加 壓 注 入 漿 料 〇 步 驟 38 抽 真 空 使 真 空 腔 體 12内維 持 於 一 真空 度。 步 驟 40 加 熱 升 溫 至 一 預 定 溫 度。 步 驟 42 維 持 真 空 腔 體 1 2於 該 預定 溫 度 〇 步 驟 44 降 溫 至 一 卸 模 溫 度 〇 步 驟 46 破 除 真 空 0 步 驟 48 降 壓 將 模 具 與 胚 體 取 出真 空 腔 體 12° 步 驟 50 卸 除 模 具 取 出 胚 體 〇 步 •驟 52 結 束 〇 請 參 閱圖四 5 圖 四 係 本 發 明 胚 體成 型 製 程 之一 具體 實施例之示意圖。接下來以具體之製程條件描述本發明 胚體成型製程之一具體實施例。圖四中之橫軸為時間 軸,縱軸則根據不同之標線具有不同之單位,標線曱為 模具所承受之壓力,標線乙為真空腔體内部之真空度, 標線丙為真空腔體之溫度。 首先係先疊合模具,此時模具承受之壓力慢慢升 高,直到疊合完畢後承受之壓力為1 0 0噸(土 5% )。模具 疊合後放入真空腔體1 2,並將真空腔體各個腔門關閉後 開始抽真空,使真空腔體内之真空度由7 6 0托降至4 5托。 待真空腔體1 2抽真空至真空度為4 5托時,開始注入漿 料,待漿料注入完畢後,加熱器1 8開始加熱,使整體真 空腔體1 2由常溫2 5°C升溫至1 8 0°C。Page 9 12392283 V. Description of the invention (7) Step 32 Stack the molds. Step 34 Place the molds into the vacuum cavity 12 °. Step 36 Inject the slurry under pressure. Step 38 Evacuate the vacuum cavity 12 to maintain a vacuum. . Step 40 Heat up to a predetermined temperature. Step 42 Maintain the vacuum cavity 1 2 at the predetermined temperature. Step 44 Reduce the temperature to a mold release temperature. Step 46 Break the vacuum. 0 Step 48 Remove the mold and embryo from the vacuum cavity by reducing the pressure. 12 Step 50 Remove the mold and remove the embryo. 〇Step • Step 52 End 〇 Please refer to Figure 4-5 Figure 4 is a schematic diagram of a specific embodiment of the embryonic body forming process of the present invention. Next, a specific embodiment of the embryo body forming process of the present invention will be described with specific process conditions. The horizontal axis in Figure 4 is the time axis, and the vertical axis has different units according to different standard lines. The standard line 曱 is the pressure on the mold. The standard line B is the degree of vacuum inside the vacuum cavity. The standard line C is the vacuum. The temperature of the cavity. The first step is to superimpose the mold first. At this time, the pressure on the mold is gradually increased until the pressure is 100 tons (soil 5%). After the molds are stacked, they are placed in the vacuum cavity 12 and the vacuum chambers are closed after the doors of the vacuum cavity are closed, so as to reduce the vacuum in the vacuum cavity from 760 Torr to 45 Torr. When the vacuum chamber 12 is evacuated to a vacuum degree of 45 Torr, the slurry injection is started. After the slurry injection is completed, the heater 18 is started to heat, so that the overall vacuum chamber 12 is heated from the normal temperature 2 5 ° C. To 18 0 ° C.

第10頁 1239283 五、發明說明(8) 接著於一預定時間内維持1 8 0°C後,開始進行第一階 段的穩定降溫,帶溫度降至1 2 0°C後開始破真空。待壓力 回到常壓7 6 0托時,將所有腔門打開。並於所有腔門開啟 後進行第二階段降溫,降溫至5 0°C。接著並取出模具與 胚體,並進行卸模以取出完整之胚體。 經由以上本發明之詳述,可將本發明之優點整理如 下: (a) 時效佳:大型物件於本製程成型時,只需要數分鐘 至數小時後就可以固化成胚體並具有強度。 (b) 物件無污染情形:使用多孔性模具作為注漿之模具 不會造·成物件被其他物質所污染。 (c) 物件胚體密度分佈均勻:由於有真空狀態的輔助, 又加高壓注漿,能在較短的時間完成注漿的製程,不會 造成漿料中粉末偏析、形成胚體中空、空洞、裂縫等問 題,並且對大物件之胚體密度分佈非常均勻,使得升溫 後物件收縮平均的結果。 (d) 改善石膏模壽命與管理之缺點:石膏模強度較低, 使用數次以後,尺寸精準度變差,其使用壽命短及其管 理與廢棄時均是重大的生產所必須面對的問題。 (e) 胚體可固化利於退模:本製程要求純度高之光電、 半導體製程耗材的高純度原料中,沒有自然的胚體強化 劑組成,而本發明中,將所需高壓注漿之模具置於一密 閉真空腔體内,並在腔體内安置加熱器,並利用程式控 制方式加熱,如此與高壓注漿得同時進行本新製程,致Page 10 1239283 V. Description of the invention (8) After maintaining 180 ° C for a predetermined period of time, the first stage of stable temperature reduction is started, and the vacuum is broken after the belt temperature drops to 120 ° C. Wait until the pressure returns to 7600 Torr, open all chamber doors. After all the chamber doors are opened, the second stage temperature is lowered to 50 ° C. Next, the mold and the embryo body are removed, and the mold is removed to remove the complete embryo body. Based on the above detailed description of the present invention, the advantages of the present invention can be summarized as follows: (a) Good aging: when large objects are formed in this process, it only takes a few minutes to several hours to solidify into an embryo and has strength. (b) Objects are not polluted: Porous molds are used as grouting molds, and the objects will not be contaminated by other substances. (c) Uniform density distribution of the object body: Thanks to the assistance of the vacuum state and high-pressure grouting, the grouting process can be completed in a short time without causing segregation of powder in the slurry, forming hollow and hollow bodies. , Cracks, etc., and the density distribution of the embryos of large objects is very uniform, making the objects shrink evenly after heating. (d) Disadvantages of improving the life and management of gypsum molds: The strength of gypsum molds is low. After several uses, the dimensional accuracy deteriorates. The short life of the gypsum mold and its management and disposal are major issues that must be faced in production . (e) The embryo body can be cured to facilitate demoulding: The high-purity raw materials of the optoelectronics and semiconductor process supplies required by this process do not have a natural embryo body enhancer, and in the present invention, the required high-pressure grouting mold It is placed in a closed vacuum cavity, and a heater is placed in the cavity, and it is heated by program control. In this way, the new process is performed at the same time as high-pressure grouting.

第11頁 I23928^_ 五、發明說明(9) 1=二雛Λ之/G%、以上氧化铭(Al2〇3)、3m〇ie%〜 化矽sT:部,安定化氧化锆、氮化㉟(A1N)、氮 屬氧4)、氮化删(BN)碳化石夕(Sic)、—妒i 銀、、一般金屬氮化物、一般金屬碳化物、金、又、 辱料Ϊ二V銘_石夕、銀和金、鋁、鋁合金、钽、路等蓉 固ϊ t ί中之之有機黏結劑與原料隨著加熱之控ί Ϊ I 於凡成成型動作後將順利卸模。 s“),胚物件燒結後近似成品物件、(near net I收缩不_·,一為^精密燒/物件於成型時,因為物件較容易 工,常di ;件=;=密尺寸,需要精密加 劑蒸發速率加U j t明控制毁料之壓力,與溶 物件胚體,達到接】==7間縮短,因此可得較佳之 I時效與成本。近物件成°°尺寸,進而降低物件加工 I楚描= ί = 例之詳述,係希望能更加清 |佳具體實施例來對!二=神而並非以上述所揭露的較 1目的是希望能範,加以限制。相反地,1: 丨所欲申請之專利範圍的i G具相等性的安排於本發明 第12頁 1239283 圖式簡單說明 五、 圖示簡單說明 圖一係本發明胚體成型裝置之上視圖。 圖二係圖一中胚體成型裝置之側視圖。 圖三係本發明之胚體成型製程之流程圖。 圖四係本發明胚體成型製程之一具體實施例之示意 圖。 六、 圖示標號說明Page 11 I23928 ^ _ V. Description of the invention (9) 1 = 2% / G% of the two young Λ, the above oxide name (Al203), 3mie% ~ silicon sT: part, stabilized zirconia, nitride ㉟ (A1N), Nitrogen 4), Nitrided (BN) Carbide (Sic), —Silver, Silver, General Metal Nitride, General Metal Carbide, Gold, and, Disgrace _Shi Xi, silver and gold, aluminum, aluminum alloy, tantalum, road and other organic solid binders and raw materials t ί the control of heating with heating Ϊ I I will be released from the mold after the molding action. s "), the finished product is similar to the finished product after sintering, (near net I does not shrink _ ·, one is ^ precision firing / when molding the object, because the object is easier to work, often di; pieces =; = dense size, need precision Adding agent evaporation rate plus U jt to control the pressure of destroying the material, it can shorten the contact time with the object body of the dissolved object == 7, so you can get better I timeliness and cost. The size of the near object is °°, which reduces the processing of the object. I Chu description = ί = The detailed description of the example is to hope for a clearer and better embodiment! The second = God instead of the above-disclosed more than one purpose is to hope to limit the range. On the contrary, 1:丨 The arrangement of i G with the patent scope to be applied for is arranged on the 12th page of the present invention. 1239283 Brief description of the drawings 5. Brief description of the drawings Figure 1 is a top view of the embryonic body forming device of the present invention. Side view of a mesoform forming device. Fig. 3 is a flowchart of the embryo body forming process of the present invention. Fig. 4 is a schematic diagram of a specific embodiment of the embryo body forming process of the present invention.

第13頁 10 胚 體 成 型 裝 置 之 側 視 圖 12: 真 空 腔 體 14 壓 力 供 給 器 16: 抽 真 空 機 18 加 熱 器 甲 模 具 所 承 受 之 壓 力 標 線 乙 真 空 腔 體 内 部 之 真 空 度標線 丙 真 空 腔 體 之 溫 度 標 線Page 13 10 Side view of the green body forming device 12: Vacuum cavity 14 Pressure feeder 16: Vacuum extractor 18 Pressure mark on the heater A mold B Vacuum mark inside the vacuum cavity C Vacuum cavity Temperature marking

Claims (1)

1239283 六、申請專利範圍 1、 一種胚體成型裝置,包含: 一真空腔體,具有一預定真空度,用以置放一模 具; 一壓力供給器,連接至該真空腔體,用以提供一 預定壓力挾持該模具,以注入一漿料至該模具 中; Φ 一抽真空機,連接至該真空腔體,用以使該真空 腔體維持於該真空度;以及 一加熱器,連接至真空腔體,用以於該漿料注入 該模具後,對該漿料進行一加熱程序以使該漿 料形成一胚體。 2、 如申請專利範圍第1項所述之胚體成型裝置,其中該 模具為多孔性模具。 3、 如申請專利範圍第2項所述之胚體成型裝置,其中該 多孔性模具之孔徑尺寸範圍為〇. 5微米m)到8微 米(// m)之間。 4、 如申請專利範圍第2項所述之胚體成型裝置,其中該 ❿ 多孔性模具之氣孔率的範圍為1 〇%到5 0% 。 5、 如申請專利範圍第1項所述之胚體成型裝置,其中該 模具係平放於該真空腔體中。1239283 VI. Scope of patent application 1. An embryonic body forming device includes: a vacuum cavity having a predetermined vacuum degree for placing a mold; a pressure feeder connected to the vacuum cavity for providing a The mold is held by a predetermined pressure to inject a slurry into the mold; Φ a vacuum machine is connected to the vacuum cavity to maintain the vacuum cavity at the vacuum degree; and a heater is connected to the vacuum The cavity is used to perform a heating process on the slurry after the slurry is injected into the mold, so that the slurry forms an embryo. 2. The embryonic body forming device according to item 1 of the scope of the patent application, wherein the mold is a porous mold. 3. The embryonic body forming device according to item 2 of the scope of the patent application, wherein the pore size of the porous mold ranges from 0.5 micrometers (m) to 8 micrometers (// m). 4. The embryonic body forming device according to item 2 of the scope of the patent application, wherein the porosity of the ❿ porous mold ranges from 10% to 50%. 5. The embryonic body forming device according to item 1 of the scope of the patent application, wherein the mold is placed flat in the vacuum cavity. 第14頁 1239283 六、申請專利範圍 6、 如申請專利範圍第1項所述之胚體成型裝置,其中該 模具係直放於該真空腔體中。 7、 如申請專利範圍第1項所述之胚體成型裝置,其中該 預定壓力之範圍為0.5kg/cm1 2到60 kg/cm2。 8、 如申請專利範圍第1項所述之胚體成型裝置,其中該 真空度之範圍為2 0 0托(torr)到lx 10 _2托 (torr) 〇 9、 如申請專利範圍第1項所述之胚體成型裝置,其中該 加熱程序係包含下列步驟: 加熱該漿料至一預定溫度; 於一預定時間内維持該預定溫度;以及 於該預定時間過後,降溫至一卸模溫度以取出該 胚體。 1 0、如申請專利範圍第1項所述之胚體成型裝置,其中該 加熱器之加熱方式係選自由電加熱、微波加熱以及 紅外線加熱所組成群組中之一種。Page 14 1239283 6. Scope of patent application 6. The embryonic body forming device described in item 1 of the scope of patent application, wherein the mold is placed directly in the vacuum cavity. 7. The embryonic body forming device according to item 1 of the scope of the patent application, wherein the predetermined pressure ranges from 0.5 kg / cm1 2 to 60 kg / cm2. 8. The embryonic body forming device as described in item 1 of the scope of patent application, wherein the range of the vacuum degree is from 200 torr (torr) to lx 10 _2 torr (torr). The embryonic body forming device described above, wherein the heating procedure comprises the following steps: heating the slurry to a predetermined temperature; maintaining the predetermined temperature for a predetermined time; and after the predetermined time has elapsed, lowering the temperature to a mold release temperature to take out The embryoid body. 10. The embryonic body forming device according to item 1 of the scope of the patent application, wherein the heating method of the heater is one selected from the group consisting of electric heating, microwave heating, and infrared heating. 第15頁 1 1、如申請專利範圍第1項所述之胚體成型裝置,其中該 2 加熱器係將該真空腔體的溫度控制於2 0°C到1 8 0°C的 1239283 六、申請專利範圍 範圍内。 12、一種胚體成型製程,包含: 置放一模具; 提供一預定壓力挾持該模具,以注入一漿料至該 模具中; 使該真空腔體維持於一真空度;以及 對該漿料進行一加熱程序以使該漿料形成一胚 體。 1 3、如申請專利範圍第1 2項所述之胚體成型製程,其中 該模具為多孔性模具。 1 4、如申請專利範圍第1 3項所述之胚體成型製程,其中 該多孔性模具之孔徑尺寸範圍為0. 5微米(// m)到8 微米(// m)之間。 1 5、如申請專利範圍第1 3項所述之胚體成型製程,其中 該多孔性模具之氣孔率的範圍為1 0%到5 0% 。 1 6、如申請專利範圍第1 2項所述之胚體成型製程,其中 該預定壓力之範圍為0.5kg/cm2到60 kg/cm2。 1 7、如申請專利範圍第1 2項所述之胚體成型製程,其中Page 15 1 1. The embryonic body forming device as described in item 1 of the scope of the patent application, wherein the 2 heaters control the temperature of the vacuum cavity at 20 ° C to 180 ° C 1239283 6. Within the scope of patent application. 12. An embryonic body forming process, comprising: placing a mold; providing a predetermined pressure to hold the mold to inject a slurry into the mold; maintaining the vacuum cavity at a vacuum degree; and performing the slurry A heating process causes the slurry to form an embryonic body. 13 3. The embryonic body forming process as described in item 12 of the scope of patent application, wherein the mold is a porous mold. 14. The embryonic body forming process according to item 13 of the scope of the patent application, wherein the pore size of the porous mold ranges from 0.5 micrometer (// m) to 8 micrometers (// m). 15. The embryonic body forming process according to item 13 of the scope of patent application, wherein the porosity of the porous mold ranges from 10% to 50%. 16. The embryonic body forming process according to item 12 of the scope of patent application, wherein the predetermined pressure ranges from 0.5 kg / cm2 to 60 kg / cm2. 17. The embryo body forming process as described in item 12 of the patent application scope, wherein 第16頁 1239283__ 六、申請專利範圍 該真空度之範圍為20 0托(t 〇 r r)到lx 1 0 _2托 (torr) 〇 1 8、如申請專利範圍第1 2項所述之胚體成型製程,其中 該加熱程序係包含下列步驟: 加熱該漿料至一預定溫度; 於一預定時間内維持該預定溫度;以及 於該預定時間過後,降溫至一卸模溫度以取出該 胚體。 1 9、如申請專利範圍第1 2項所述之胚體成型製程,其中 該漿料的溫度係控制於2 0°C到1 8 0°C的範圍内。Page 161239283__ VI. Patent application scope The vacuum range is 200 torr (t rr) to lx 1 0 _2 torr (torr) 〇 8, the embryo body molding as described in item 12 of the patent application scope In the manufacturing process, the heating process includes the following steps: heating the slurry to a predetermined temperature; maintaining the predetermined temperature for a predetermined time; and after the predetermined time elapses, lowering the temperature to a mold release temperature to remove the embryo body. 19. The embryonic body forming process according to item 12 of the scope of patent application, wherein the temperature of the slurry is controlled within a range of 20 ° C to 180 ° C. 第17頁Page 17
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TWI395662B (en) * 2009-11-25 2013-05-11 Univ Lunghwa Sci & Technology Method of forming shell mold and high strength ceramic or metal-ceramic composite prototype using such shell mold

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CN116922546B (en) * 2023-09-18 2023-12-29 成都永益泵业股份有限公司 Method for manufacturing molded part by using zirconia and pump flow passage component

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TWI395662B (en) * 2009-11-25 2013-05-11 Univ Lunghwa Sci & Technology Method of forming shell mold and high strength ceramic or metal-ceramic composite prototype using such shell mold

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