TWD215716S - Upper shield with showerhead for a process chamber - Google Patents
Upper shield with showerhead for a process chamber Download PDFInfo
- Publication number
- TWD215716S TWD215716S TW109305849F TW109305849F TWD215716S TW D215716 S TWD215716 S TW D215716S TW 109305849 F TW109305849 F TW 109305849F TW 109305849 F TW109305849 F TW 109305849F TW D215716 S TWD215716 S TW D215716S
- Authority
- TW
- Taiwan
- Prior art keywords
- upper shield
- showerhead
- design
- process chamber
- processing chamber
- Prior art date
Links
- 238000010586 diagram Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Images
Abstract
【物品用途】;本設計係關於用於處理腔室的具噴頭的上護罩的外觀設計。;【設計說明】;圖式所揭露之虛線部分,為本案不主張設計之部分。【Use of article】;This design is about the appearance design of the upper shield with nozzle used in the processing chamber. ;[Design Description];The dotted line portion disclosed in the drawing is the part of this case that does not require design.
Description
本設計係關於用於處理腔室的具噴頭的上護罩的外觀設計。 This design relates to the appearance design of the upper shield with spray head used in the processing chamber.
圖式所揭露之虛線部分,為本案不主張設計之部分。 The dotted line disclosed in the diagram is a part of this case that does not advocate design.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/732,229 USD973609S1 (en) | 2020-04-22 | 2020-04-22 | Upper shield with showerhead for a process chamber |
US29/732,229 | 2020-04-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD215716S true TWD215716S (en) | 2021-12-01 |
Family
ID=84568644
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109305849D01F TWD215717S (en) | 2020-04-22 | 2020-10-22 | Upper shield with showerhead for a process chamber |
TW109305849F TWD215716S (en) | 2020-04-22 | 2020-10-22 | Upper shield with showerhead for a process chamber |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109305849D01F TWD215717S (en) | 2020-04-22 | 2020-10-22 | Upper shield with showerhead for a process chamber |
Country Status (2)
Country | Link |
---|---|
US (1) | USD973609S1 (en) |
TW (2) | TWD215717S (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP1646504S (en) * | 2018-12-06 | 2019-11-25 | ||
JP1646505S (en) * | 2018-12-07 | 2019-11-25 |
Family Cites Families (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5401319A (en) | 1992-08-27 | 1995-03-28 | Applied Materials, Inc. | Lid and door for a vacuum chamber and pretreatment therefor |
US7147749B2 (en) | 2002-09-30 | 2006-12-12 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
JP4141234B2 (en) * | 2002-11-13 | 2008-08-27 | キヤノンアネルバ株式会社 | Plasma processing equipment |
USD557425S1 (en) * | 2005-08-25 | 2007-12-11 | Hitachi High-Technologies Corporation | Cover ring for a plasma processing apparatus |
US7981262B2 (en) | 2007-01-29 | 2011-07-19 | Applied Materials, Inc. | Process kit for substrate processing chamber |
JP2009088298A (en) * | 2007-09-29 | 2009-04-23 | Tokyo Electron Ltd | Plasma treatment apparatus and plasma treatment method |
USD642605S1 (en) * | 2010-04-02 | 2011-08-02 | Applied Materials, Inc. | Lid assembly for a substrate processing chamber |
USD703160S1 (en) * | 2011-01-27 | 2014-04-22 | Hitachi High-Technologies Corporation | Grounded electrode for a plasma processing apparatus |
US9245717B2 (en) | 2011-05-31 | 2016-01-26 | Lam Research Corporation | Gas distribution system for ceramic showerhead of plasma etch reactor |
US9121097B2 (en) | 2012-08-31 | 2015-09-01 | Novellus Systems, Inc. | Variable showerhead flow by varying internal baffle conductance |
USD734730S1 (en) * | 2012-12-27 | 2015-07-21 | Hitachi Kokusai Electric Inc. | Boat of substrate processing apparatus |
JP1537312S (en) * | 2014-11-20 | 2015-11-09 | ||
US9865437B2 (en) | 2014-12-30 | 2018-01-09 | Applied Materials, Inc. | High conductance process kit |
JP1551512S (en) * | 2015-06-12 | 2016-06-13 | ||
JP1546799S (en) * | 2015-06-12 | 2016-03-28 | ||
US10577689B2 (en) | 2016-09-23 | 2020-03-03 | Applied Materials, Inc. | Sputtering showerhead |
JP1584241S (en) * | 2017-01-31 | 2017-08-21 | ||
USD868124S1 (en) * | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
JP1625995S (en) | 2018-04-20 | 2019-03-04 | ||
JP1625994S (en) | 2018-04-20 | 2019-03-04 | ||
USD891382S1 (en) * | 2019-02-08 | 2020-07-28 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD942516S1 (en) * | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD913979S1 (en) * | 2019-08-28 | 2021-03-23 | Applied Materials, Inc. | Inner shield for a substrate processing chamber |
USD941371S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD941372S1 (en) * | 2020-03-20 | 2022-01-18 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
US20210335581A1 (en) * | 2020-04-22 | 2021-10-28 | Applied Materials, Inc. | Preclean chamber upper shield with showerhead |
USD940765S1 (en) * | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US20220223367A1 (en) * | 2021-01-12 | 2022-07-14 | Applied Materials, Inc. | Reduced substrate process chamber cavity volume |
-
2020
- 2020-04-22 US US29/732,229 patent/USD973609S1/en active Active
- 2020-10-22 TW TW109305849D01F patent/TWD215717S/en unknown
- 2020-10-22 TW TW109305849F patent/TWD215716S/en unknown
Also Published As
Publication number | Publication date |
---|---|
USD973609S1 (en) | 2022-12-27 |
TWD215717S (en) | 2021-12-01 |
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