TWD205953S - Cushion (3) - Google Patents
Cushion (3) Download PDFInfo
- Publication number
- TWD205953S TWD205953S TW108303219F TW108303219F TWD205953S TW D205953 S TWD205953 S TW D205953S TW 108303219 F TW108303219 F TW 108303219F TW 108303219 F TW108303219 F TW 108303219F TW D205953 S TWD205953 S TW D205953S
- Authority
- TW
- Taiwan
- Prior art keywords
- view
- item
- design
- cushion
- sectional
- Prior art date
Links
- 238000005498 polishing Methods 0.000 abstract description 2
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Abstract
【物品用途】;本設計物品，係一種組裝在拋光機上的緩衝墊。;【設計說明】;後視圖、左視圖及右視圖與前視圖相同，故省略後視圖、左視圖及右視圖。;A-A端面剖視放大圖是俯視圖中沿著A-A剖線所取得之剖視放大圖，用於說明本設計之局部結構。[Use of item]; This designed item is a buffer pad assembled on a polishing machine. ;[Design Description];The rear view, left view and right view are the same as the front view, so the rear view, left view and right view are omitted. ;The A-A end section enlarged view is an enlarged cross-sectional view taken along the A-A section line in the top view and is used to illustrate the partial structure of this design.
Description
本設計物品，係一種組裝在拋光機上的緩衝墊。This design item is a cushion pad assembled on a polishing machine.
後視圖、左視圖及右視圖與前視圖相同，故省略後視圖、左視圖及右視圖。The rear view, left view, and right view are the same as the front view, so the rear view, left view, and right view are omitted.
A-A端面剖視放大圖是俯視圖中沿著A-A剖線所取得之剖視放大圖，用於說明本設計之局部結構。The enlarged cross-sectional view of the end face A-A is an enlarged cross-sectional view taken along the A-A section line in the top view, and is used to illustrate the partial structure of the design.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW108303219F TWD205953S (en) | 2019-05-30 | 2019-05-30 | Cushion (3) |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| TW108303219F TWD205953S (en) | 2019-05-30 | 2019-05-30 | Cushion (3) |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD205953S true TWD205953S (en) | 2020-07-21 |
Family
ID=88981654
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108303219F TWD205953S (en) | 2019-05-30 | 2019-05-30 | Cushion (3) |
Country Status (1)
| Country | Link |
|---|---|
| TW (1) | TWD205953S (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD194953S (en) | 2017-06-29 | 2018-12-21 | 日商荏原製作所股份有限公司 | Elastic film for semiconductor surface polishing |
| TWD194954S (en) | 2017-06-29 | 2018-12-21 | 日商荏原製作所股份有限公司 | Elastic film for semiconductor surface polishing |
-
2019
- 2019-05-30 TW TW108303219F patent/TWD205953S/en unknown
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWD194953S (en) | 2017-06-29 | 2018-12-21 | 日商荏原製作所股份有限公司 | Elastic film for semiconductor surface polishing |
| TWD194954S (en) | 2017-06-29 | 2018-12-21 | 日商荏原製作所股份有限公司 | Elastic film for semiconductor surface polishing |
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