TWD196950S - Part of electric furnace for substrate processing equipment - Google Patents
Part of electric furnace for substrate processing equipmentInfo
- Publication number
- TWD196950S TWD196950S TW107302982F TW107302982F TWD196950S TW D196950 S TWD196950 S TW D196950S TW 107302982 F TW107302982 F TW 107302982F TW 107302982 F TW107302982 F TW 107302982F TW D196950 S TWD196950 S TW D196950S
- Authority
- TW
- Taiwan
- Prior art keywords
- design
- electric furnace
- substrate processing
- processing equipment
- article
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 4
- 238000001816 cooling Methods 0.000 abstract 2
- 239000003245 coal Substances 0.000 abstract 1
- 239000003507 refrigerant Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是基板處理裝置用電氣爐,為一種使用在供處理半導體之類的基板的基板處理裝置,可將收容在本體內部的反應管進行昇溫的電氣爐。;【設計說明】;本設計中,用來將冷卻本體內部的氣體冷煤流通到複數個流路的閥元件,是形成突出於本體側面,圖面中以實線所示的部分,是閥元件和用來供給氣體冷煤之裝置的連接部。;圖式中所揭露之虛線部分,為本案不主張設計之部分;圖式中一點鏈線所圍繞者,係界定本案所欲主張之範圍,該一點鏈線本身為本案不主張設計之部分。[Use of the article] The article of this design is an electric furnace for a substrate processing device. It is an electric furnace that is used in a substrate processing device for processing substrates such as semiconductors and can heat the reaction tube housed inside the body. ;[Design Description];In this design, the valve element used to circulate the gas refrigerant inside the cooling body to a plurality of flow paths is formed to protrude from the side of the body, and the part shown by the solid line in the figure is Connection between the valve element and the device for supplying gaseous cooling coal. ; The dotted line portion disclosed in the drawing is a part of the case that does not claim design; the one-point chain line in the drawing is surrounded by a dotted line that defines the scope of the claim, and the one-point chain line itself is a part of the case that does not claim design.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2018-4005F JP1620676S (en) | 2018-02-27 | 2018-02-27 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD196950S true TWD196950S (en) | 2019-04-11 |
Family
ID=64650736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107302982F TWD196950S (en) | 2018-02-27 | 2018-05-28 | Part of electric furnace for substrate processing equipment |
Country Status (3)
Country | Link |
---|---|
US (1) | USD860419S1 (en) |
JP (1) | JP1620676S (en) |
TW (1) | TWD196950S (en) |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD383525S (en) * | 1995-11-21 | 1997-09-09 | Purcell Steven J | Insulated water heater for hydrotherapy baths, spas, and skid packs |
US20130192522A1 (en) * | 2010-12-30 | 2013-08-01 | Poole Ventura, Inc. | Thermal diffusion chamber with convection compressor |
US20110249960A1 (en) * | 2011-01-28 | 2011-10-13 | Poole Ventura, Inc. | Heat Source Door For A Thermal Diffusion Chamber |
JP5702657B2 (en) * | 2011-04-18 | 2015-04-15 | 東京エレクトロン株式会社 | Heat treatment equipment |
US9171746B2 (en) * | 2011-09-06 | 2015-10-27 | Arsalan Emami | Heater elements with enhanced cooling |
US9167630B2 (en) * | 2011-10-17 | 2015-10-20 | David E. Seitz | Tankless water heater |
WO2014098943A1 (en) * | 2012-12-21 | 2014-06-26 | Eemax, Inc. | Next generation bare wire water heater |
US10132525B2 (en) * | 2013-03-15 | 2018-11-20 | Peter Klein | High thermal transfer flow-through heat exchanger |
USD753590S1 (en) * | 2014-03-12 | 2016-04-12 | Mitsubishi Electric Corporation | Turbine generator |
USD754066S1 (en) * | 2014-03-12 | 2016-04-19 | Mitsubishi Electric Corporation | Turbine generator |
USD790048S1 (en) * | 2015-05-15 | 2017-06-20 | Arsalan Emami | Industrial heater |
JP1568553S (en) * | 2016-02-12 | 2017-02-06 | ||
JP1568552S (en) * | 2016-02-12 | 2017-02-06 | ||
CA3026662C (en) * | 2016-06-13 | 2023-01-24 | Warren Engine Company, Inc. | Energy recovery system |
EP3494351B1 (en) * | 2016-08-05 | 2021-06-02 | Sandvik Thermal Process, Inc. | Thermal process device with non-uniform insulation |
JP1582475S (en) | 2016-10-14 | 2017-07-31 | ||
JP6918146B2 (en) * | 2017-05-19 | 2021-08-11 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | A device that collects liquid and solid emissions and later reacts them into gaseous emissions. |
-
2018
- 2018-02-27 JP JPD2018-4005F patent/JP1620676S/ja active Active
- 2018-05-28 TW TW107302982F patent/TWD196950S/en unknown
- 2018-07-12 US US29/656,364 patent/USD860419S1/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP1620676S (en) | 2018-12-17 |
USD860419S1 (en) | 2019-09-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWD187001S (en) | Top-mounted heater for substrate processing equipment | |
WO2019036145A3 (en) | High pressure and high temperature anneal chamber | |
IN2012DN01366A (en) | ||
CL2016002366A1 (en) | A refrigeration device for containers. | |
TWD189312S (en) | Sealing material for semiconductor manufacturing equipment | |
MY179444A (en) | Internal pipeline cooler | |
TWD203444S (en) | Gas introduction tube for substrate processing device | |
TWD177997S (en) | Heat insulator for substrate processing equipment | |
ATE476538T1 (en) | EPITAXIAL REACTOR WITH DEVICE FOR INTRODUCING REACTION GASES | |
WO2016196929A3 (en) | Micro-hoses for integrated circuit and device level cooling | |
TW201713201A (en) | Thermal dissipation module | |
TWD177999S (en) | Heat insulator for substrate processing equipment | |
TWD186999S (en) | Part of the air flow regulator for the heating machine of the substrate processing equipment | |
TWD196950S (en) | Part of electric furnace for substrate processing equipment | |
TWD197467S (en) | Gas introduction tube for substrate processing equipment | |
TWD177996S (en) | Heat insulator for substrate processing equipment | |
TWD183003S (en) | Part of the gas supply nozzle for substrate processing equipment | |
TWD183008S (en) | Heater for substrate processing equipment | |
TWD200031S (en) | Electric furnace for substrate processing equipment | |
TWD183009S (en) | Part of the heater for substrate processing equipment | |
TWD187805S (en) | Part of the substrate processing component | |
TWD225634S (en) | Part of the cover of heat-insulating components for semiconductor manufacturing equipment | |
SG10201810902WA (en) | Dual auxiliary dopant inlets on epi chamber | |
WO2009142911A3 (en) | Robust outlet plumbing for high power flow remote plasma source | |
TWD183005S (en) | Thermal insulation component outer cover of semiconductor manufacturing equipment |