TWD174342S - 排氣處理裝置用內筒之部分 - Google Patents
排氣處理裝置用內筒之部分Info
- Publication number
- TWD174342S TWD174342S TW104303356F TW104303356F TWD174342S TW D174342 S TWD174342 S TW D174342S TW 104303356 F TW104303356 F TW 104303356F TW 104303356 F TW104303356 F TW 104303356F TW D174342 S TWD174342 S TW D174342S
- Authority
- TW
- Taiwan
- Prior art keywords
- treatment device
- design
- exhaust gas
- inner cylinder
- item
- Prior art date
Links
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 abstract 1
- 239000000919 ceramic Substances 0.000 abstract 1
- 238000002485 combustion reaction Methods 0.000 abstract 1
- 239000004973 liquid crystal related substance Substances 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是排氣處理裝置用內筒。;【設計說明】;本物品是由氧化鋁材質之類的陶瓷所製成,如「使用狀態參考圖」所示,係在半導體、液晶、太陽能電池製造工序、或其他工序中作為排氣分解處理的排氣處理裝置中,本物品是形成燃燒室的內壁的零件,並做定期的更換使用。;圖式所揭露之實線部分,為本案主張設計之部分,虛線部分為本案不主張設計之部分。;後視圖、左側視圖、右視圖與前視圖對稱,均省略之。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2014-28699F JP1534915S (zh) | 2014-12-22 | 2014-12-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD174342S true TWD174342S (zh) | 2016-03-11 |
Family
ID=54258352
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104303356F TWD174342S (zh) | 2014-12-22 | 2015-06-22 | 排氣處理裝置用內筒之部分 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP1534915S (zh) |
TW (1) | TWD174342S (zh) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD1038901S1 (en) | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
-
2014
- 2014-12-22 JP JPD2014-28699F patent/JP1534915S/ja active Active
-
2015
- 2015-06-22 TW TW104303356F patent/TWD174342S/zh unknown
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD858468S1 (en) | 2018-03-16 | 2019-09-03 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD859333S1 (en) | 2018-03-16 | 2019-09-10 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD937329S1 (en) | 2020-03-23 | 2021-11-30 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD998575S1 (en) | 2020-04-07 | 2023-09-12 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1009816S1 (en) | 2021-08-29 | 2024-01-02 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
USD997111S1 (en) | 2021-12-15 | 2023-08-29 | Applied Materials, Inc. | Collimator for use in a physical vapor deposition (PVD) chamber |
USD1038901S1 (en) | 2022-01-12 | 2024-08-13 | Applied Materials, Inc. | Collimator for a physical vapor deposition chamber |
Also Published As
Publication number | Publication date |
---|---|
JP1534915S (zh) | 2015-10-13 |
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