TW583342B - Method for recovering cerium from chromium etchant - Google Patents
Method for recovering cerium from chromium etchant Download PDFInfo
- Publication number
- TW583342B TW583342B TW91119760A TW91119760A TW583342B TW 583342 B TW583342 B TW 583342B TW 91119760 A TW91119760 A TW 91119760A TW 91119760 A TW91119760 A TW 91119760A TW 583342 B TW583342 B TW 583342B
- Authority
- TW
- Taiwan
- Prior art keywords
- chromium
- cerium
- organic acid
- valence
- valenced
- Prior art date
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
Landscapes
- Manufacture And Refinement Of Metals (AREA)
- Removal Of Specific Substances (AREA)
- Treatment Of Water By Oxidation Or Reduction (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
- Inorganic Compounds Of Heavy Metals (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002207360A JP3749204B2 (ja) | 2002-07-16 | 2002-07-16 | クロムエッチング液からのセリウムの回収方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW583342B true TW583342B (en) | 2004-04-11 |
Family
ID=31931846
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW91119760A TW583342B (en) | 2002-07-16 | 2002-08-30 | Method for recovering cerium from chromium etchant |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP3749204B2 (ja) |
TW (1) | TW583342B (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100431113C (zh) * | 2005-01-07 | 2008-11-05 | 友达光电股份有限公司 | 蚀刻液回收***与方法 |
US10959589B2 (en) | 2016-05-09 | 2021-03-30 | Lg Electronics Inc. | Cleaner holder |
US11363928B2 (en) | 2016-05-09 | 2022-06-21 | Lg Electronics Inc. | Cleaner holder |
US11399676B2 (en) | 2016-05-09 | 2022-08-02 | Lg Electronics Inc. | Cleaner holder |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6761255B2 (ja) * | 2016-02-15 | 2020-09-23 | 関東化学株式会社 | エッチング液およびエッチング液により加工されたフォトマスク |
-
2002
- 2002-07-16 JP JP2002207360A patent/JP3749204B2/ja not_active Expired - Fee Related
- 2002-08-30 TW TW91119760A patent/TW583342B/zh not_active IP Right Cessation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100431113C (zh) * | 2005-01-07 | 2008-11-05 | 友达光电股份有限公司 | 蚀刻液回收***与方法 |
US10959589B2 (en) | 2016-05-09 | 2021-03-30 | Lg Electronics Inc. | Cleaner holder |
US11363928B2 (en) | 2016-05-09 | 2022-06-21 | Lg Electronics Inc. | Cleaner holder |
US11399676B2 (en) | 2016-05-09 | 2022-08-02 | Lg Electronics Inc. | Cleaner holder |
US11839348B2 (en) | 2016-05-09 | 2023-12-12 | Lg Electronics Inc. | Cleaner holder |
Also Published As
Publication number | Publication date |
---|---|
JP2004052006A (ja) | 2004-02-19 |
JP3749204B2 (ja) | 2006-02-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |