583135 A7 ____B7 ___ 五、發明說明（I ) 發明領域 本發明有關於化學組成物的輸送系統及方法’尤其有 關於用於包括用於晶圓拋光之CMP泥漿的電子特性化學組 成物之化學輸送系統。 發明背景 用於半導體製造的製程化學品通常以所請的化學輸送 系統從大型容器輸送至使用者工作站。像是氮氣的高壓惰 性氣體已經普遍用於將化學組歲物從化學品容器驅送至使 用者工作站。相較於具有泵浦的輸送系統，使用高壓惰性 氣體來化學輸送的系統具有從更遠距離處輸送的優點’同 時亦具有平順及較少脈衝輸送的好處，因而避免雜質從輸 送系統的成分中流出。 雖然此種化學輸送方法的優點已經被了解，並且該方 法已經廣泛地被實現，但是當某些半導體製程的化學組成 物以此種輸送方式被輸送時會產生若干顧慮與問題。例如 ，像是氮氣的惰性氣體在壓縮製程中將會立刻溶解於這些 製程化學品中的某些之中，並且最後在晶圓上形成乾點。 這些乾點變成製造上的瑕疵並且嚴重地降低半導體製造上 的生產良率。爲了避免與消除氣體溶解於化學組成物的問 題，一種帶有被安裝於壓力容器中之氣囊的新式輸送系統 已被發明出來。以此方法和裝置，高壓氮氣被塡充於該氣 囊之中，用以加壓氣囊外部的化學組成物。因爲化學組成 物與氮氣之間並沒有直接的接觸，而避免了氮氣溶入化學 品的問題。再者，化學組成物不會因爲化學蒸發而改·變其、 __3_ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) · 訂---------線！ A7 583135 __ B7___ 五、發明說明（^ ) 成分。 當使用與一種惰性氣體（像是用於拋光晶圓表面的泥 漿組成物）的直接篆觸來輸送水性的化學組成物時’當高 壓的惰性氣體直接與該化學組成物相接觸時’在該組成物 表面處之化學成分中的水與其它化學化合物以及容器表面 上的化合殘餘物將會快速地流失於惰性氣體之中。追是因 爲惰性氣體一般非常地乾且純。在化學組成物中像是水之 化合物的數量將因爲蒸發而有命改變。當該化學組成物被 使用在半導體製造製程時，這種化學組成物中的改變會使 得該化學組成物不適當地運作。當水被蒸發而進入惰性氣 體時，可能會形成具有較少水份與較小揮發性之較大濃度 化合物的乾薄膜或乾殘餘。在泥漿組成物的情況中’此種 乾薄膜或乾殘餘將形成大塊的凝結顆粒。這些凝結顆粒最 後會與化學組成物被輸送到使用者工作站’並且會在晶圓 表面上產生刮痕。此問題可藉著使用上述氣囊技術來防止 氮氣與化學組成物的直接接觸而被解決。以此技術’一個 與該化學組成物相容之薄而柔軟的材料必須小心地被選擇 以供該氣囊使用。 爲了克服水蒸發進入惰性氣體的缺點，像是描述於美 國第6,〇76,541號專利中者，一種加濕器在氮氣進入加壓 容器來加壓化學組成物之前先行增加氮氣的溼度。當被加 濕的氮氣與化學組成物接觸時，在氮氣與該化學組成物中 水的質傳將會顯著減少或完全消除。因而，在該壓力容器 中，將沒有或非常少的乾殘餘或乾薄膜形成。但是，{其仍、、 _____ 4 本紙張尺度適用中國國家標準（CNS)A4i格（21〇 X 297公爱） ----------------------訂---------I 一 (請先閱讀背面之注意事項再填寫本頁) A7 583135 _____Β7_ 五、發明說明（丨） 然有一些缺點。首先，在靠近該壓力容器的地方需要更多 的空間來容納一加濕器。這可能是一個嚴重的問題’因爲 在半導體製造設施中，空間經常是非常有限的。額外佔去 空間的設備並非經常被容許的’並且並非經常有可用的空 間。其次，增加濕度的氮氣在系統的運作中會產生某些問 題。由於增加濕度的氮氣流經一個相當長的管線進入壓力 容器中，因爲物理情況的改變，在該氮氣中的濕氣可能被 凝結在該管線之中。此凝結物％能阻塞閥門並使得該閥門 失效。該凝結物亦可能進一步地被帶入該壓力容器當中而 稀釋該化學成分。因爲該化學組成物的組成必須精確地控 制以符合使用者的規範，以此種稀釋而改變化學的組成是 不允許的。再者，像是在化學組成物中的過氧化氫的某些 化學成分即使是已經被加濕了仍會蒸發於高純度惰性氣體 中。因此，當該化學組成物以此種方式被輸送時，化學組 成將會被改變，雖然對於某些情況來說，在化學組成物中 此種改變可能不是一個嚴重的問題。 因此，如果化學輸送系統與方法能被設計來減少或避 免上述的問題，將會是有利的並且在化學輸送技術中是一 項進步。 發明槪述 依據本發明，係提出新穎和簡明的裝置與方法，用以 Μ/ 少或消除在以壓力容器輸送液態化學組成物期間乾殘餘 胃薄膜的問題，以及相關於已經熟知之加濕系統的問 題。此處所使用的名詞“系統，，和“裝置，，係可相互《交換. -；-- —____5_ 本紙張尺度適用標準（CNS)A4規格（21〇 X 297公釐） --------訂---------線—- (請先閱讀背面之注意事項再填寫本頁) A7 583135 ___J7_ 五、發明說明（4 ) 地使用。 此處所使用的名詞“液態的化學組成物”係表示： 一種在壓力、重力或兩者存在之狀況下流動的流體； 可以是牛頓或非牛頓流體； 可以是水性、非水性或兩者之混合； 可以是成分（液態、固態和氣態）的一種組合物。 較佳地，可從本發明獲益的液態化學組成物大體上爲 水性的牛頓流體，其具有內容知的一種組合物，其在某些 實施例中係包括一種或多種有機化合物，像是可反應的稀 釋液、不可反應的稀釋液 '溶劑、共同溶劑、聯合作用劑 和其類似物，以及硏磨物質（例如，散佈在各別顆粒之中 或各別顆粒的黏聚物）。化學-機械的平面化泥漿與化學 -機械的拋光泥漿爲二種較佳的液態化學組成物。合適的 有機溶劑可包括是：有機酒精、酮、酸與類似物，例如異 丙基酒精。 本發明的一第一樣態係爲一種用於輸送液態化學組成 物的裝置。第一裝置實施例包括有： a ) —個壓力容器，其包括用於一種液態化學組成物 的一個入口與一個出口、以及一個蒸汽空間，該壓力容器 適用於容納該液態化學組成物，該液態化學組成物具有一 個在其中的可蒸發部分（較佳地爲一個水的主要部分）； b)用於與在該壓力容器中之該液態化學組成物的至 少α卩份相接觸（較佳地起泡）之一種乾的、較佳爲高純 度惰性氣體的裝置，用以從該化學組成物將該可蒸發雒分583135 A7 ____B7 ___ V. Description of the Invention (I) Field of the Invention The present invention relates to a system and method for conveying chemical composition ', and more particularly to a chemical conveyance system for chemical composition including electronic characteristics of CMP slurry for wafer polishing . BACKGROUND OF THE INVENTION Process chemicals used in semiconductor manufacturing are usually transported from large containers to user workstations in the requested chemical transport system. High-pressure inert gases such as nitrogen have been commonly used to drive chemical items from chemical containers to user workstations. Compared to pumped delivery systems, systems that use high-pressure inert gas for chemical delivery have the advantage of being transported from a greater distance. At the same time, it also has the advantage of smooth and less pulsed delivery, thus avoiding impurities from the components of the delivery system Outflow. Although the advantages of this chemical transport method have been understood, and the method has been widely implemented, there are several concerns and problems that arise when certain semiconductor process chemical compounds are transported in this manner. For example, an inert gas such as nitrogen will immediately dissolve in some of these process chemicals during the compression process and eventually form a dry spot on the wafer. These dry spots become manufacturing defects and severely reduce production yields in semiconductor manufacturing. In order to avoid and eliminate the problem of gas dissolving in chemical composition, a new type of conveying system with a balloon installed in a pressure vessel has been invented. With this method and device, high-pressure nitrogen gas is filled into the air bag to pressurize the chemical composition outside the air bag. Because there is no direct contact between chemical composition and nitrogen, the problem of nitrogen dissolving into chemicals is avoided. In addition, the chemical composition will not change or change due to chemical evaporation. __3_ This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page) · Order --------- line! A7 583135 __ B7___ 5. Description of the Invention (^) Ingredients. When direct contact with an inert gas, such as a slurry composition used to polish the surface of a wafer, is used to transport an aqueous chemical composition 'when a high-pressure inert gas is in direct contact with the chemical composition' Water and other chemical compounds in the chemical composition on the surface of the composition and the chemical residue on the surface of the container will be quickly lost to the inert gas. This is because the inert gas is generally very dry and pure. The amount of chemical compounds like water in a chemical composition will be fatally changed by evaporation. When the chemical composition is used in a semiconductor manufacturing process, such a change in the chemical composition may cause the chemical composition to operate improperly. When water is evaporated and enters an inert gas, a dry film or dry residue of a larger concentration of a compound with less moisture and less volatility may form. In the case of a mud composition ', such a dry film or dry residue will form large agglomerated particles. These coagulated particles are finally transported with the chemical composition to the user station ' and scratches are created on the wafer surface. This problem can be solved by using the above-mentioned balloon technology to prevent direct contact of nitrogen with chemical composition. With this technique ', a thin and soft material compatible with the chemical composition must be carefully selected for use with the balloon. To overcome the disadvantages of water evaporation into inert gases, as described in U.S. Patent No. 6,007,541, a humidifier increases the humidity of nitrogen before it enters a pressure vessel to pressurize the chemical composition. When the humidified nitrogen comes into contact with the chemical composition, the mass transfer of water between the nitrogen and the chemical composition is significantly reduced or completely eliminated. Thus, in this pressure vessel, there will be no or very little dry residue or dry film formed. However, {its still ,, _____ 4 This paper size is applicable to China National Standard (CNS) A4i grid (21〇X 297 public love) --------------------- -Order --------- I I (Please read the notes on the back before filling in this page) A7 583135 _____ Β7_ 5. Description of the invention (丨) There are some disadvantages. First, more space is needed near the pressure vessel to house a humidifier. This can be a serious issue ’because space is often very limited in semiconductor manufacturing facilities. Equipment that takes up additional space is not often allowed ' and does not often have available space. Second, the increased humidity of nitrogen can cause some problems in the operation of the system. Since the humidity-increasing nitrogen flows into a pressure vessel through a relatively long pipeline, the moisture in the nitrogen may be condensed in the pipeline due to changes in physical conditions. This condensate% can block the valve and render the valve ineffective. The condensate may be further taken into the pressure vessel to dilute the chemical composition. Because the composition of the chemical composition must be precisely controlled to meet the user's specifications, changing the chemical composition with such dilution is not allowed. Furthermore, certain chemical components, such as hydrogen peroxide in chemical compositions, will evaporate in a high-purity inert gas even after they have been humidified. Therefore, when the chemical composition is transported in this manner, the chemical composition will be changed, although in some cases, such a change in the chemical composition may not be a serious problem. Therefore, it would be advantageous if chemical delivery systems and methods could be designed to reduce or avoid the problems described above, and would be an advance in chemical delivery technology. SUMMARY OF THE INVENTION According to the present invention, a novel and concise device and method are proposed to reduce or eliminate the problem of dry residual gastric film during the delivery of liquid chemical composition in a pressure vessel, and related to the well-known humidification system The problem. The terms "system," and "device," as used herein, are interchangeable with each other.-; --- ____5_ This paper applies the standard (CNS) A4 specification (21〇X 297 mm) ------ --Order --------- Line --- (Please read the precautions on the back before filling in this page) A7 583135 ___J7_ 5. Description of the invention (4) Use it. As used herein, the term "liquid chemical composition" means: a fluid that flows under pressure, gravity, or both; it can be Newtonian or non-Newtonian; it can be aqueous, non-aqueous, or a mixture of both ; A composition that can be ingredients (liquid, solid, and gaseous). Preferably, the liquid chemical composition that can benefit from the present invention is a substantially aqueous Newtonian fluid, having a composition known in the art, which in some embodiments includes one or more organic compounds, such as Reactive diluents, non-reactive diluents' solvents, co-solvents, co-agents, and the like, and honing materials (eg, interspersed among individual particles or agglomerates of individual particles). Chemical-mechanical planarization slurry and chemical-mechanical polishing slurry are two preferred liquid chemical compositions. Suitable organic solvents may include: organic alcohols, ketones, acids and the like, such as isopropyl alcohol. A first aspect of the present invention is a device for conveying a liquid chemical composition. The first device embodiment includes: a) a pressure vessel including an inlet and an outlet for a liquid chemical composition, and a steam space, the pressure vessel is adapted to contain the liquid chemical composition, the liquid The chemical composition has an evaporable portion therein (preferably a major portion of water); b) for contact with at least α 卩 of the liquid chemical composition in the pressure vessel (preferably A dry, preferably high-purity, inert gas device for separating the evaporable tritium from the chemical composition
V _____6 本紙張尺度適用中關家標準（CNS)A4規格（21G X 297公爱) '---- (請先閱讀背面之注意事項再填寫本頁) -· 訂---------線 583135 A7 ___ B7 _ 五、發明說明（< ) 的至少一部份轉換成惰性氣體，用以在該蒸發空間中形成 一種潮濕的惰性氣體；以及 C )用於使用該潮濕、高純度的惰性氣體將該化學組 成物加壓而驅出該容器的裝置。 在此實施例中的較佳裝置係爲那些其中該入口和出口 爲一 T字連接裝置的一個腳，而該T字剩餘的一個腳則被 連接到該壓力容器。亦較佳的裝置係爲其中該乾的、較佳 爲高純度的惰性氣體係適用於由一惰性氣體入口管線而 噴入該壓容器中靠近容器底部處，該惰性氣體入口管線具 有一出口端，較佳地，該惰性氣體入口的出口端具有一個 接附於其上的噴灑裝置。 此處所使用的名詞“乾的”係表示該惰性氣體較佳地 具有小於1 0 %相對濕度（R Η)的濕氣含量，更佳地小 於1%RΗ。此處使用的“高純度”在當用於惰性氣體時 係表示該惰性氣體具有小於十萬分之一（1 0 P P m )的 整體不純度（無機化合物與有機化合物），更較佳地係小 於5ppm。此處使用的“超高純度”當用於惰性氣體時 係表示該惰性氣體具有小於十億分之一的整體不純度（ 無機化合物與有機化合物）。一較佳乾的惰性氣體係參照 半導體設備和材料國際（S EM I )標準C 3 · 2 9 — 9 6，氮氣標準，整體氣態，品質99.9995%(1999)，其係被 加入本文作爲參考。名詞“潮濕的（w e t ) ”係表示一 種氣態的組成物，其具有從以水蒸氣、有機蒸氣、無機蒸 氣以及其組合所組成的群體中所選取的成分。 ' \_·τ'， 乂 7 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ----------------------訂---------線 —一 (請先閱讀背面之注意事項再填寫本頁) 583135 A7 五、發明說明（b ) 用於輸送液態化學組成物之本發明的第二裝置實_ 係包括： a )〜個壓力容器，其包括一個第一隔間與〜個第二 隔間’該第一隔間與該第二隔間係·以一個區隔元件分隔； b)該第一隔間被連接到一個用於加濕組成物的人Q 管路與一個容許該加濕組成物被輸送廢棄的廢棄管路，胃 區隔元件的功能係用以在該第一隔間中建立加濕組成物白勺 一液體位準，該第一隔間亦具备一乾的、較佳爲高純度惰 氣入口管路，其具有一個末端，該末端被定位（較佳地適 合於浸沒於要被輸送以廢棄的液態化學組成物中）以提_ 在該第一隔間中該惰氣與該加濕組成物的接觸而形成—種 濕惰氣’該第一隔間更具有一個用於該濕惰氣之出口； C )用於濕惰氣的出口被一個濕惰氣管路連接到該第 二隔間； d )該第二隔間被連接到用於液態化學組成物的一個( 入口管路與一個出口管路以及一個蒸氣空間，該蒸氣空間 係經由該濕惰氣管路被連接到該第一隔間。 第二實施例的較佳裝置係其中該管路係用於監測液態 化學組成物在第二隔間內位準之機構的部分。亦較佳的裝 置是其中該濕惰氣管路包括一個用於將液態滴液從濕惰氣 移除的機構，此種機構係選擇於濾網、網目、細霧消除器 、聯合器、吸附材料、吸收材料、分子篩、沸石、過濾器 、熱交換器、凝結器、低溫冷卻器以及其類似者。 用於輸送液態化學組成物的第三裝置實施例係包括‘7、 請先閱讀背面之注意事項再填寫本頁) 訂--------線I; 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 583135 A7 ___ B7_____ 五、發明說明（Ί ) a ) —個壓力容器，其包括一個第一隔間與一個第二 隔間，該第一隔間與該第二隔間係以一個區隔元件分隔； b) 該第一隔間被連接到一個用於將一加濕組成物噴 灑於該第一隔間中的入口管路與一個用於允許該加濕組成 物被輸送以廢棄的廢棄管路，該入口管路係終止於一將該 加濕組成物噴灑於該第一隔間的機構中，該區隔元件的功 能係用以在該第一隔間中建立加濕組成物的一位準，該第 一隔間亦被連結到一用於一乾Λ、較佳爲高純度惰氣的氣 體入口管路，該氣體入口管路具有一終端，該終端被定位 (較佳地高於將被輸送以廢棄之液態化學組成物被噴灑部 分的位準上方）以允許在該第一隔間中惰氣與加濕組成物 之間的接觸，用以形成一濕惰氣，該第一隔間更具有一個 用於該濕惰氣的出口； c) 用於濕惰氣的出口被一濕惰氣管路到該第二隔間 j d) 該第二隔間具有用於液態化學組成物的一個入口 管路與一個出口管路以及一個蒸氣空間，該蒸氣空間經由 該濕惰氣管路被連接到該第一隔間。 本發明用於輸送液態化學組成物的第四裝置實施例包 括： a ) —個壓力容器，其包括一個第一隔間與一個第二 隔間，該第一隔間與該第二隔間係以一個區隔元件分隔； b)該第一隔間被連接到一個將加濕組成物噴灑於一 個以殼體形成之容室中的入口管路與一個用於允許該伽 1黑、 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ---------------------訂·-------I I 一 (請先閱讀背面之注意事項再填寫本頁) 583135 A7 _ —____B7_ 五、發明說明（^ ) 組成物被輸送以廢棄的廢棄管路，該入口管路終止於一個 甩於將該加濕組成物噴灑於該容室中的機構，（該區隔元 件的功能較佳地係用以建立在該容室中該加濕組成物的位 準），該殼體亦被連接到一個用於一乾的、且較佳爲高純 度惰氣的氣體入口管路，該氣體入口管路與殼體適合於允 許在該容室中該惰氣與該加濕組成物之間的接觸，該殼體 更具有用於允許該濕惰氣移動至該第一隔間中的機構； C)該區隔元件具有用於夫許該濕惰氣從該第一隔間 通過到該第二隔間的機構； d)該第二隔間被連接到用於液態化學組成物的一個 入口管路與一個出口管路以及一個蒸氣空間，該蒸氣空間 係以流體的方式經由容許在該區隔元件中流通的機構而被 連接到該第一隔間。 一第五裝置實施例係該第四實施例的一個稍微的修改 ，並包括以下的特徵：該殼體具有一個或更多個機構，用 於容許該加濕裝置在接觸乾的惰氣之後，橫向通過該殼體 而掉入該第二隔間之中。較佳地，容許該加濕組成物橫向 通過殼體的裝置係被座落於從含有該殼體底部、該罩框側 壁或該二者之群組中所選擇的位置處。 在包括於本發明範疇中將被瞭解的是，在該第一隔間 中可以存在有複數個殼體，每一個殻體具有一個氣體入口 管路與一用於噴灑該加濕組成物於每個殼體中的管路。 本發明的一第二樣態包括輸送液態化學組成物的方法 。第一較佳方法的實施例係包括： ' ' ^， 一_ ___10_ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ----------------------訂---------線 — j (請先閱讀背面之注意事項再填寫本頁) 583135 A7 _____B7_ 五、發明說明（彳） a )以一種包括一可蒸發成分的液態化學組成物（較 佳地包括濕氣）注入一個壓力容器中，該壓力容器具有一 蒸氣空間並適用於容納該液態化學組成物； b) 以在該壓力容器中之液態化學組成物的至少一部V _____6 This paper size applies the Zhongguanjia Standard (CNS) A4 specification (21G X 297 public love) '---- (Please read the precautions on the back before filling out this page)-· Order ------- --Line 583135 A7 ___ B7 _ 5. At least a part of the invention description (&) is converted into an inert gas to form a humid inert gas in the evaporation space; and C) is used to use the humid, high A device that pressurizes the chemical composition with a purity inert gas to drive the chemical composition out of the container. The preferred devices in this embodiment are those in which the inlet and outlet are one leg of a T-shaped connection device, and the remaining leg of the T-shape is connected to the pressure vessel. A more preferred device is one in which the dry, preferably high-purity inert gas system is adapted to be sprayed into the pressure vessel from an inert gas inlet line near the bottom of the container, the inert gas inlet line having an outlet end Preferably, the outlet end of the inert gas inlet has a spraying device attached thereto. The term "dry" as used herein means that the inert gas preferably has a moisture content of less than 10% relative humidity (RR), more preferably less than 1% RΗ. As used herein, "high purity" when used for an inert gas means that the inert gas has an overall impurity (inorganic and organic compounds) of less than one hundred thousandth (10 PP m), and more preferably Less than 5ppm. "Ultra-high purity" as used herein when used with an inert gas means that the inert gas has an overall impurity (inorganic and organic compounds) of less than one billionth. A better dry inert gas system is referred to the International Standard for Semiconductor Equipment and Materials (S EM I) C 3 · 2 9 — 96, nitrogen standard, overall gaseous state, quality 99.9995% (1999), which is incorporated herein by reference. The term "wet" means a gaseous composition having components selected from the group consisting of water vapor, organic vapor, inorganic vapor, and combinations thereof. '\ _ · Τ' ， 乂 7 This paper size is applicable to Chinese National Standard (CNS) A4 (210 X 297 mm) ---------------------- Order --------- Line-First (Please read the precautions on the back before filling out this page) 583135 A7 5. Description of the invention (b) The second device of the present invention for conveying liquid chemical composition _ Department includes: a) ~ pressure vessels, including a first compartment and ~ second compartment 'the first compartment and the second compartment are separated by a partition element; b) the first A compartment is connected to a human Q pipe for humidifying the composition and an abandoned pipe allowing the humidifying composition to be transported and discarded. The function of the gastric compartment element is to be used in the first compartment. A liquid level is established for the humidified composition, and the first compartment is also provided with a dry, preferably high-purity, inert gas inlet line, which has a tip that is positioned (preferably suitable for immersion in To be transported with the discarded liquid chemical composition) to improve the formation of the inert gas in contact with the humidified composition in the first compartment-a kind of wet inert gas, the first compartment is more Having an outlet for the wet inert gas; C) an outlet for the wet inert gas is connected to the second compartment by a wet inert gas pipeline; d) the second compartment is connected to the liquid chemical composition An (inlet pipe and an outlet pipe) and a steam space, the steam space is connected to the first compartment via the wet inert gas pipe. The preferred device of the second embodiment is in which the pipe is used for Part of the mechanism for monitoring the level of the liquid chemical composition in the second compartment. Also preferred is a device in which the wet inert gas pipeline includes a mechanism for removing liquid drips from the wet inert gas, such The mechanism is selected from filters, meshes, fine mist eliminators, combiners, adsorption materials, absorbing materials, molecular sieves, zeolites, filters, heat exchangers, condensers, cryogenic coolers and the like. Used to transport liquid chemistry The third device embodiment of the composition includes' 7. Please read the precautions on the back before filling out this page) Order -------- Line I; This paper size applies to China National Standard (CNS) A4 specifications ( 210 X 297 mm) 583135 A7 ___ B7_ ____ 5. Description of the invention (Ί) a)-a pressure vessel including a first compartment and a second compartment, the first compartment and the second compartment are separated by a partition element; b) The first compartment is connected to an inlet pipe for spraying a humidifying composition into the first compartment and an waste pipe for allowing the humidifying composition to be transported to be discarded, the inlet The piping system ends in a mechanism that sprays the humidifying composition on the first compartment. The function of the partition element is to establish the level of the humidifying composition in the first compartment. The first compartment is also connected to a gas inlet line for a dry, preferably high-purity inert gas, the gas inlet line having a terminal which is positioned (preferably above (Above the level of the sprayed liquid chemical composition being discarded) to allow contact between the inert gas and the humidified composition in the first compartment to form a wet inert gas, the first compartment further has An outlet for the wet inert gas; c) an outlet for the wet inert gas by a wet inert gas pipe To the second compartment jd) The second compartment has an inlet pipe and an outlet pipe for a liquid chemical composition, and a vapor space, and the vapor space is connected to the first via the wet inert gas pipe Compartment. A fourth embodiment of the device for conveying a liquid chemical composition according to the present invention includes: a) a pressure vessel including a first compartment and a second compartment, the first compartment and the second compartment being Separated by a partition element; b) the first compartment is connected to an inlet pipe for spraying the humidifying composition in a housing formed by a casing and a paper for permitting the black and white paper Standards are applicable to China National Standard (CNS) A4 specifications (210 X 297 mm) --------------------- Order ------- II I ( Please read the precautions on the back before filling this page) 583135 A7 _ —____ B7_ V. Description of the Invention (^) The composition is transported to an abandoned waste pipe, and the inlet pipe terminates in a humidified composition The mechanism sprayed into the container (the function of the partition element is preferably used to establish the level of the humidifying composition in the container), the casing is also connected to a And preferably a high-purity inert gas inlet pipe, the gas inlet pipe and the housing are suitable for allowing the inert gas and the fuel gas in the container The contact between the wet composition, the housing further has a mechanism for allowing the wet inert gas to move into the first compartment; C) the partition element has a function for permitting the wet inert gas from the first compartment The compartment passes through the mechanism to the second compartment; d) the second compartment is connected to an inlet and outlet conduit for the liquid chemical composition and a vapor space, the vapor space being a fluid The mode is connected to the first compartment via a mechanism that allows circulation in the compartment element. A fifth device embodiment is a slight modification of the fourth embodiment, and includes the following features: the housing has one or more mechanisms for allowing the humidifying device to come in contact with dry inert gas, Transversely through the shell falls into the second compartment. Preferably, the means for allowing the humidified composition to pass laterally through the casing is located at a position selected from the group containing the bottom of the casing, the side wall of the cover frame, or both. It will be understood within the scope of the present invention that there may be a plurality of casings in the first compartment, each casing having a gas inlet line and a spraying humidifying composition on each In a housing. A second aspect of the present invention includes a method for delivering a liquid chemical composition. Examples of the first preferred method include: '' ^, a _ ___10_ This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) ------------- --------- Order --------- line — j (Please read the notes on the back before filling this page) 583135 A7 _____B7_ V. Description of the invention (彳) a) A vaporizable liquid chemical composition (preferably including moisture) is injected into a pressure vessel, the pressure vessel having a vapor space and adapted to contain the liquid chemical composition; b) in a liquid state in the pressure vessel Chemical composition
份與一乾的、較佳爲高純度惰氣（較佳地藉由起泡）相接 觸，用以將該可蒸發成分的至少一部份從該液態化學組成 物轉移至該乾的惰氣，以形成在該蒸氣空間中的一種濕惰 氣；以及 X c) 使甩在該蒸氣空間中的濕惰氣加壓該液態化學組 成物而驅出該壓力容器。 輸送液態化學組成物的第二方法實施例係包括下列步 驟： a )提供一壓力容器，其包括一個第一隔間與一個第 二隔間，該第一隔間與該第二隔間係以一區隔元件區隔； b )以一加濕組成物至少部分地塡充該第一隔間，該 區隔元件係作用以在該第一隔間中建立加濕組成物的一位 準； c) 以一種在該惰氣與該加濕組成物之間提供接觸的 方式使一乾的、較佳爲高純度的惰氣流入該第一隔間中， 因而形成一種濕惰氣，該第一隔間更被連接到一個用於該 濕惰氣的出口管路； d) 經由一管路使該濕惰氣流入該第二隔間；以及 e) 以一液態化學組成物大體上塡充該第二隔間而容 許一蒸氣空間，該第二隔間經由該管路被連接到該第一-隔^ _____π_ 本紙張尺度適用中國國家標準（CNS)A4規格（210 χ 297公釐） --------------—I----訂---------丨 (請先閱讀背面之注意事項再填寫本頁) 583135 A7 ___B7^ __ 五、發明說明（一） 間。 輸送液態化學組成物之第三方法實施例包括下列步驟 a )提供一壓力容器，其包括一個第一隔間與一個第 一*隔間’ b弟隔間與&弟〜隔間係以一區隔兀件區隔； b )將一種加濕組成物噴灑於該第一隔間中，該區隔 元件的係作用以在該第一隔間中建立該加濕組成物的一位 準； 、: c )使一乾的、較佳爲高純度惰氣流入該第一隔間中 (較佳地高於該加濕組成物的位準），並使該惰氣與該加 濕組成物相接觸，因而形成〜濕惰氣； d )使該濕惰氣經由一管路從該第一隔間流入該第二 隔間；以及 e )以一液態化學組成物大致上塡充該第二隔間，以 允許一蒸氣空間，該第二隔間經由該管路被連接到該第一 隔間。 輸送液態化學組成物之第四方法實施例包括下列步驟 a )提供一壓力容器，其包括一個第一隔間與一個第 二隔間’該第一隔間與該第二隔間係以一區隔元件區隔， 該第一隔間具有一個由一殼體所成形的容室； b )將一加濕組成物噴灑於該容室，該區隔元件係作 用以建立在該第一隔間中該加濕組成物的一位準； c )使一乾的、較佳爲高純度惰氣流入該容室中ϋ用、、 __ 12 本紙張尺度適用中關家標準（CNS)A4規格⑽χ 297 ： --------^---------^ I ^ (請先閱讀背面之注意事項再填寫本頁) A7 583135 _____B7____ 五、發明說明（^ ) 以提供該惰氣與該加濕組成物之間的接觸’因而形成〜濕 惰氣； d)使該濕惰氣經由一管路從該第一隔間流入該第二 隔間；以及 e )以一液態化學組成物大致上塡充該第二隔間，容 許一蒸氣空間，該蒸氣空間經由該管路被連接到該第一隔 間。 本發明第一裝置的實施例傑容許一加濕組成物與一乾 的、較佳爲高純度惰氣相接觸，該加濕組成物係爲要被輸 送的液態化學組成物。接觸係發生於一壓力容器中，用以 形成一濕惰氣，該濕惰氣接著被用來加壓該液態化學組成 物使其驅出壓力容器外。因此，不需要額外的空間於如同 先前的裝置與方法的外部加濕器。因爲較佳地僅需要一非 常少量的蒸氣來飽和該乾惰氣，當該加濕組成物就是被輸 送的液態化學組成物時，大體上該液態化學組成物的成分 將不會改變。在第一實施例中，該濕惰氣的蒸氣含量也可 以藉由小心地使該乾惰氣流過該液態化學組成物而輕易地 被控制。 .本發明其他較佳實施例的特徵爲在整體主體之壓力容 器內的二個隔間。將被輸送的液態化學組成物係被供應至 一隔間中，且一相當少量的加濕組成物（如果有需要，可 以是將被輸送的液態化學組成物）與惰氣係以一種使得該 乾惰氣與該加濕組成物相接觸的方式被提供至另一個隔間 中。該二個隔間經由描述於本文的機構彼此相連通。掛此 13 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐) ' " ----------------------訂---------線—j (請先閱讀背面之注意事項再填寫本頁) 583135 A7 ____Β7_____ 五、發明說明（、> ) ，該液體化學組成物係被包括有較佳地爲水蒸氣（但並不 限於水蒸氣）的化學蒸氣驅離。該液態化學品散失於乾惰 氣中的問題係被防止，同時，乾殘餘物的問題係在同時被 消除。 以一較佳實施例，如上所述的該二個隔間係經由一管 路而彼此連通，而容許惰氣流入或流出該等隔間。 以一個另外的較佳實施例，如上所述的該二個隔間係 經由一系列在該區隔機構中分隔該二個隔間的機構而彼此 連通，較佳地係經由小開□，像是洞孔、風口、通道以及 其類似物。 本發明所有的實施例係被提供有所需的控制與隔離閥 門，用於排放或重新注入液體化學組成物於該壓力容器中 、引入與排出該液態化學組成物、以及塡充與釋出惰氣。 該壓力容器的較佳實施例可被運作來以一個或更多個並聯 的壓力容器輸送化學組成物。二個或更多個壓力容器通常 係並聯地安裝，用以連續地輸送液態化學組成物。本發明 壓力容器的較佳實施例也可以被串聯地配置，用以將化學 組成物從一個壓力容器再注入另一個壓力容器。 本發明的這些與其它優點及樣態將參照以下較佳實施 例的圖式及說明而被闡釋，雖然本發明並不僅限制於其中 0 圖式之簡單說明 圖1係藉著使氣體起泡通過化學組成物來增加惰氣溼 度之裝置與方法的較佳實施例之製程槪要側視圖；、:τ·· 14 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --- ----------------------訂---------I 一 (請先閱讀背面之注意事項再填寫本頁) 583135 A7 _ B7_ 五、發明說明（、）） 圖2係具有二個隔間與一個用於該二隔間之間連通的 外部管路之方法與裝置的較佳實施例之製程槪要側視圖； 圖3係圖2之較佳實施例的另一個隔間配置的製程槪 要側視圖；以及 圖4係具有二個隔間與一內部連通配置之方法與裝置 另一較佳實施例的製程槪要側視圖。 元件符號說明 (請先閱讀背面之注意事項再填寫本頁) --------訂---------線丨j 10 裝置 20 化學組成物入口管路 21 控制閥門 22 化學組成物出口管路 23 控制閥門 29 化學組成物隔間 30 小氣泡 31 壓力容器 32 化學組成物 40 擴散器 42 控制閥門 43、45 管路 46 控制閥門 47 止回閥門 50 側管 51a 、 51b 、 51c 、 51d 位準感測器 52、54 末端 15 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 583135 A7 _B7 五、發明說明（A ) 60 壓力釋放閥門 61 管路 62 蒸氣空間 100 裝置 133 區隔裝置 134 加濕組成物 135 惰氣隔間、容室 136 褰氣空間 137 通氣管路 138 惰氣控制閥門 139 細霧消除器 140 側管 141 空間 143 側管 150 加濕化學組成物入口管路 151 控制閥門、三向閥門 153 加濕組成物出口管路 154 惰氣入口管路 156 控制閥門 157 機構 158 殼體 159 環狀通道 160 小洞孔 161 開口 〜c, 16 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱） •---------------------訂-------I I j (請先閱讀背面之注意事項再填寫本頁) 583135 A7 ---- -B7 五、發明說明（γ ) 21〇 噴頭 211 液態滴液 500 較佳裝置之實施例 較佳實施例的詳細說明 雖然本發明的方法與裝置大多關於將泥漿輸送到半導 體晶圓的CMP設備，本發明的方法與設備可被應用在任 何惰氣被用來加壓一隔間並且濕氣散失係爲一個問題的情 況中。例如，在生產某種硏磨物體時，泥漿係被用來產生 具有結構的硏磨劑”。一般參見Culler的美國第 5,368,619號專利，其係被結合於本文做爲參考。在將要被 固化的泥獎輸送至硏磨塗層時，可使用惰氣來移動泥獎， 並且可利用本發明的原理。由於主要的益處係減少加濕惰 氣所需的空間，以下的討論專注於半導體工業，然而，應 瞭解本發明並不限於使用於任何特別的形式。 化學組成物已經被使用於積體電路製程中的各種用途 中。例如，二氧化矽粉末的水性組成物與其它必須的化學 組成物係被使用於拋光或平面化晶圓的表面。在半導體製 造處理中，此製程通常被稱作化學機械拋光或化學機械平 面化（CMP)。爲了確保平面化製程的品質，該CMP 泥獎成分係較佳地被控制在化學添加劑與顆粒尺寸大小分 佈的特定範圍中。化學添加劑濃度通常被監控並線上調整 以符合其規範。因爲大顆粒可能會刮傷晶圓表面，顆粒大 小較佳地藉著過濾掉可能由凝固製程形成之直徑大於若干 微米的不需要顆粒而被監控與控制。因此’在化學組成:物、 17 張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁)Parts in contact with a dry, preferably high-purity inert gas, preferably by foaming, for transferring at least a portion of the vaporizable component from the liquid chemical composition to the dry inert gas, A wet inert gas formed in the vapor space; and X c) pressurizing the liquid chemical composition with the wet inert gas thrown in the vapor space to expel the pressure vessel. A second method embodiment for conveying a liquid chemical composition includes the following steps: a) providing a pressure vessel including a first compartment and a second compartment, the first compartment and the second compartment are connected by A partition element segment; b) at least partially filling the first compartment with a humidifying composition, the partition element acting to establish a level of humidifying composition in the first compartment; c) allowing a dry, preferably high-purity inert gas flow into the first compartment in a manner to provide contact between the inert gas and the humidifying composition, thereby forming a wet inert gas, the first The compartment is further connected to an outlet line for the wet inert gas; d) the wet inert gas flow into the second compartment via a line; and e) substantially filling the liquid with a liquid chemical composition The second compartment allows a vapor space, and the second compartment is connected to the first-partition via the pipe ^ _____ π_ This paper size applies the Chinese National Standard (CNS) A4 specification (210 x 297 mm)- ------------- I ---- Order --------- 丨 (Please read the notes on the back before filling this page) 583135 A7 ___ B7 ^ __ 5. Description of the Invention (1). A third method embodiment for conveying a liquid chemical composition includes the following steps a) A pressure vessel is provided, which includes a first compartment and a first * compartment. Partitioning the partitions; b) spraying a humidifying composition in the first compartment, the function of the partitioning element to establish the level of the humidifying composition in the first compartment; : C) a dry, preferably high-purity inert gas flow is introduced into the first compartment (preferably higher than the level of the humidifying composition), and the inert gas is in phase with the humidifying composition Contact, thereby forming ~ wet inert gas; d) flowing the wet inert gas from the first compartment into the second compartment via a pipeline; and e) substantially filling the second compartment with a liquid chemical composition To allow a vapor space, the second compartment is connected to the first compartment via the pipe. A fourth method embodiment for conveying a liquid chemical composition includes the following steps: a) providing a pressure vessel including a first compartment and a second compartment; the first compartment and the second compartment are arranged in a zone; A partition element partition, the first compartment having a container formed by a shell; b) spraying a humidifying composition on the container, the partition element acts to build on the first compartment One level of the humidifying composition; c) The use of a dry, preferably high-purity, inert gas flow into the container, __ 12 This paper size applies the Zhongguanjia Standard (CNS) A4 specification ⑽χ 297 : -------- ^ --------- ^ I ^ (Please read the notes on the back before filling this page) A7 583135 _____B7____ 5. Description of the invention (^) to provide the inert gas The contact with the humidified composition 'thus forms ~ wet inert gas; d) flowing the wet inert gas from the first compartment into the second compartment via a pipeline; and e) chemical composition in a liquid state An object substantially fills the second compartment, allowing a vapor space, which is connected to the first compartment via the pipe. The embodiment of the first device of the present invention allows a humidified composition to be in contact with a dry, preferably high-purity, inert gas phase, the humidified composition being a liquid chemical composition to be delivered. Contact occurs in a pressure vessel to form a wet inert gas, which is then used to pressurize the liquid chemical composition and drive it out of the pressure vessel. Therefore, no additional space is required for external humidifiers as in previous devices and methods. Because preferably only a very small amount of steam is needed to saturate the dry inert gas, when the humidified composition is the liquid chemical composition being delivered, generally the composition of the liquid chemical composition will not change. In the first embodiment, the vapor content of the wet inert gas can also be easily controlled by carefully passing the dry inert gas through the liquid chemical composition. Other preferred embodiments of the present invention are characterized by two compartments within the pressure vessel of the integral body. The liquid chemical composition to be transported is supplied to a compartment, and a relatively small amount of a humidifying composition (if necessary, the liquid chemical composition to be transported) and an inert gas system are used to make the The way in which the dry inert gas comes into contact with the humidified composition is provided to another compartment. The two compartments communicate with each other via the mechanism described herein. Hanging this 13 paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) '" ---------------------- Order- ------- line-j (please read the precautions on the back before filling this page) 583135 A7 ____ Β7 _____ 5. Description of the invention (, >), the liquid chemical composition is preferably water Chemical vapor drive-off of vapor (but not limited to water vapor). The problem that the liquid chemical is lost in the dry inert gas is prevented, and the problem of the dry residue is eliminated at the same time. In a preferred embodiment, the two compartments are connected to each other via a pipe as described above, allowing inert gas to flow into and out of the compartments. In a further preferred embodiment, the two compartments are connected to each other via a series of mechanisms that separate the two compartments in the compartment mechanism, as described above, preferably through a small opening, like They are holes, vents, passages and the like. All embodiments of the present invention are provided with the required control and isolation valves for draining or refilling the liquid chemical composition into the pressure vessel, introducing and discharging the liquid chemical composition, and filling and releasing the inertia. gas. The preferred embodiment of the pressure vessel can be operated to deliver the chemical composition in one or more pressure vessels connected in parallel. Two or more pressure vessels are usually installed in parallel to continuously convey the liquid chemical composition. The preferred embodiment of the pressure vessel of the present invention may also be configured in series to inject the chemical composition from one pressure vessel to another pressure vessel. These and other advantages and aspects of the present invention will be explained with reference to the drawings and descriptions of the following preferred embodiments, although the present invention is not limited to the simple description of 0 drawings. FIG. 1 is by bubbling gas through The process of the preferred embodiment of the device and method for increasing the humidity of inert gas with a chemical composition: a side view; τ ·· 14 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm)- ----------------------- Order --------- I I (Please read the notes on the back before filling this page) 583135 A7 _ B7_ V. Description of the Invention (,) Figure 2 is a manufacturing process of a preferred embodiment of a method and device having two compartments and an external pipeline for communication between the two compartments; a side view; FIG. 3 is a side view of a manufacturing process of another compartment configuration of the preferred embodiment of FIG. 2; and FIG. 4 is a manufacturing process of another preferred embodiment of a method and apparatus having two compartments and an internal communication configuration. To side view. Component symbol description (Please read the precautions on the back before filling this page) -------- Order --------- Line 丨 10 Device 20 Chemical composition inlet pipeline 21 Control valve 22 Chemical composition outlet line 23 Control valve 29 Chemical composition compartment 30 Small bubbles 31 Pressure vessel 32 Chemical composition 40 Diffuser 42 Control valve 43, 45 Pipe 46 Control valve 47 Check valve 50 Side pipes 51a, 51b, 51c, 51d level sensor 52, 54 end 15 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) 583135 A7 _B7 V. Description of the invention (A) 60 Pressure release valve 61 Pipe 62 Vapor space 100 Device 133 Partition device 134 Humidifying composition 135 Inert gas compartment, container 136 Radon space 137 Ventilation line 138 Inert gas control valve 139 Fine mist eliminator 140 Side pipe 141 Space 143 Side pipe 150 Humidification Chemical composition inlet line 151 Control valve, three-way valve 153 Humidification composition outlet line 154 Inert gas inlet line 156 Control valve 157 Mechanism 158 Housing 159 Ring channel 160 Small hole 161 opening ~ c, 16 This paper size is applicable to China National Standard (CNS) A4 specification (210 X 297 public love) • --------------------- Order- ----- II j (Please read the notes on the back before filling this page) 583135 A7 ---- -B7 V. Description of the invention (γ) 21〇 Nozzle 211 Liquid drip liquid 500 DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Although the methods and apparatuses of the present invention are mostly related to CMP equipment for transporting slurry to semiconductor wafers, the methods and apparatuses of the present invention can be applied to any inert gas used to pressurize a compartment and moisture Disappearance is a problematic situation. For example, in the production of certain honing objects, the mud system is used to produce a honing agent with a structure. "See generally U.S. Patent No. 5,368,619 to Culler, which is incorporated herein by reference. When the mud prize is delivered to the honing coating, an inert gas can be used to move the mud prize and the principles of the present invention can be utilized. Since the main benefit is to reduce the space required to humidify the inert gas, the following discussion focuses on the semiconductor industry, However, it should be understood that the present invention is not limited to use in any particular form. Chemical compositions have been used in various applications in integrated circuit manufacturing processes. For example, aqueous compositions of silicon dioxide powder and other necessary chemical compositions It is used to polish or planarize the surface of a wafer. In semiconductor manufacturing processes, this process is often referred to as chemical mechanical polishing or chemical mechanical planarization (CMP). To ensure the quality of the planarization process, the CMP mud award component The system is preferably controlled in a specific range of chemical additives and particle size distribution. Chemical additive concentrations are usually monitored and adjusted online In order to meet its specifications. Because large particles may scratch the surface of the wafer, the particle size is better monitored and controlled by filtering out unwanted particles that may be formed by the solidification process with diameters greater than a few microns. Therefore, 'in the chemical composition : 17 scales, applicable to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page)
A7 583135 B7 五、發明說明（Λ ) 的輸送期間，大尺寸顆粒的形成較佳地係被避免。 此種化學組成物通常以~壓力容器系統經由需要的分 配管路被輸送。圖1說明本發明用於輸送化學組成物之裝 置10的一個較佳實施例。一個壓力容器31係容納被輸送 之化學組成物32。具有一控制閥門21的化學組成物入口 管路20係接附到該容器31，用以將化學組成物供應至壓 力容器31中。具有一控制閥門23的化學組成物出口管路 22係接附到該容器，用以容許學組成物被輸送到使用者 工作站或其它容器處。管路20和22可替代地分別被連接 到壓力容器31。管路20和22兩者皆可以是任何與該壓力 容器31相容之材料。較佳的材料包括像是不鏽鋼的金屬、 以及像是聚四氟乙烯（P T F E )、過含氟氧化鹼樹脂（ P F A )、高密度聚乙烯與聚丙烯的塑膠材料。該等管路 20和22的直徑較佳地係介於0.125英吋（0.32公分）到 大約0.1英吋（2.54公分）之間。 一個側管50係以一末端52在靠近該壓力容器31頂端 ，而另一末端54在底部處而被接附到壓力容器31，用以 建立壓力容器31內部之頂部與底部部位之間的連通。 位準感測益51a，51b，51c和5 Id較佳地被安裝在該側 管上，用以監測該壓力容器31內側之化學組成物的位準。 側管50可以是與管路20以及22相同或是不同的塑膠材料 ，但是較佳地內部直徑範圍係大於或等於從0.5英吋（1.3 公分）。位準感測器51a，51b，51c和51d較佳地係選選擇 自如一般熟悉位準量測技藝者所使用的光學或容積式％當 ______ 18 _ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公爱) ------ • --------訂---------線—- (請先閱讀背面之>i音？事項再填寫本頁} 583135 A7 ____B7 五、發明說明（) 使用超音波位準感測器時，它們可直接地接附在該壓力容 器31的不同位置上。因此，在此情況中並不需要側管5〇 〇 用於局壓惰氣的一個具有一控制閥門46與一止回閥門 47的管路45通過靠近底部之壓力容器31的壁部，並且被 與一個擴散器40連接。管路45的材料亦可以與管路20和 22的材料相同。擴散器4〇較佳地係相似於一個容許惰氣 流過之過濾器匣的〜個薄膜匣。擴散器4〇亦可包括具有複 數個洞孔的一個或更多個管件，用以容許惰氣流過。在任 何物理構型中，擴散器40較佳地係一種可與將被輸送之化 學組成物相容的材料。 另外一個帶有一控制閥門42的管路43係被接附到壓 力容器31，用以當需要時以通氣壓力容器31。一個壓力釋 放閥門60係經由一管路61被接附到壓力容器31，用以一 旦壓力容器31內側的壓力高於一預設壓力時釋放氣體。該 等上述的控制閥門較佳地係氣動閥門，其包括可與該化學 組成物相容的材料，像是不鏽鋼、pTFE、pFA、高密度的 聚乙烯以及聚丙烯。 當運作時’化學組成物係經由管路20被塡入壓力容器 31中。壓力容器31內側化學組成物的份量以位準感測器 51a-d監測。一旦組成物位準被位準感測器51b監測到達 到一個局位準時，控制閥門21係被關閉。較佳地，像是氮 氣之高壓、超高純度的惰氣接著藉著開啓控制閥門46而經 由管路45被引入。該惰氣流過擴散器40並且在化學継成 _________ 19 本紙張尺祕中國國家標格（210 x--- ----------------------訂---------線丨j (請先閱讀背面之注意事項再填寫本頁) 583135 A7 ___ B7 _ 五、發明說明（j ) 物內形成小氣泡30。該氣泡的尺寸係以擴散器40的氣孔 或洞孔的尺寸而定。其較佳地使一擴散器產生直徑小於50 毫米、更佳地小於大約5毫米的氣泡。該氣體的流動較佳 地被控制在：流率的範圍大約從每分鐘1標準公升（s 1 P m )到大約100 s 1 p m，以及壓力的範圍從大約〇·5大 氣壓到5大氣壓。該氣泡係上升經過該化學組成物並且在 它們往上升的過程中收集一些蒸氣。該惰氣係塡充化學組 成物上方的蒸氣空間62，並且接著壓迫該化學組成物32。 該壓力容器31的高度，或更適當地，該化學組成物 32的深度，對於氣泡收集足夠的蒸氣係很重要。該壓力容 器31的高度較佳地係至少1米，且在該壓力容器31內側 之化學組成物32的深度較佳地係如位準感測器51b監測的 高位準爲至少0.5米。 在該惰氣之中蒸氣（較佳地爲水氣）含量的範圍較佳 地爲從50%RH到100%RH，更較佳地從大約80%RH 到大約95%R Η，且不管有沒有水氣存在，其它化學蒸氣 的濃度最大係達到一些p p m的水準。 當該化學組成物將要被輸送到一個或更多個使用者工 作站時，控制閥門23係被開啓，且化學品在含有蒸氣的惰 氣壓力之下係經由管路22流出壓力容器31。在此刻，含 有蒸氣的惰氣係被供入蒸氣空間62，用以塡充被移動之化 學組成物留下的空間。因此，該壓力容器31內部的壓力被 保持固定，且該化學組成物係以穩定的壓力和流率被輸送 。高純度的氮氣係較佳的，因爲其較任何其它惰氣係.廣，泛、 ___20__ 本紙I尺度適用中國國家標準（CNS)A4規格（210 X 297公爱) ----------------------訂---------I. (請先閱讀背面之注意事項再填寫本頁) -I n n n I -I n n ϋ n ϋ n ϋ ϋ ϋ ϋ I n I n I _ 583135 A7 ____B7______ 五、發明說明（4 ) 地被提供且相對地便宜。當該組成物到達一個被位準感測 器51c監測的低位準時，控制閥門23與21係被關閉。在 壓力容器31內部的高壓惰氣接著係藉由開啓控制閥門42 而被釋放。在此階段，化學組成物係藉著打開控制閥門21 而被塡入壓力容器31中。有需要時，化學組成物可以週期 性地被再次塡入壓力容器中或被排出以供輸送。兩個或更 多個此種壓力容器能以並聯的方式操作。當其中一個壓力 容器處於再塡充模式時，另外L個係處於排出模式，用以 達成將該化學組成物連續輸送至一個或更多個使用者工作 站。 壓力容器31較佳地包含金屬或塑膠材料，像是不鏽鋼 、PTFE、PFA、高密度聚乙烯、聚丙烯、玻璃以及在其內 側表面上塗覆其中一種此等塑膠或玻璃材料的鋼。壓力容 器31必須具有一種組合的材料特性以及足夠壁厚，以允許 該壓力容器承受達到大約1〇大氣壓的壓力。該壓力容器的 容量範圍較佳地從大約1公升到大約5000公升，更較佳地 從大約20公升到500公升。 因爲在與該化學組成物接觸之後現在該惰氣具有至少 一部份的該可蒸發部分，在該化學組成物的頂層中與殘留 於壓力容器31內壁上的組成物滴液中的蒸氣分子將不會散 失於惰氣中。因此，將不會形成乾的薄膜或乾的殘餘物。 以此較佳實施例，不需要如習知系統般的使用外部加濕器 來濕潤惰氣。此較佳實施例的一優點爲：此較佳實施例替 使用者節省空間，且係更有成本效益。另一項優點爲心整、 21 _ _ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 訂---------線丨·---------------------- A7 583135 ________B7 _ 五、發明說明（/ ) 個輸送系統將比習知系統更容易操作，因爲其已經消除了 一些元件。 該等氣泡在組成物表面的頂部逬裂之後，惰氣氣泡可 產生一些化學組成物的滴液。這些滴液可被濺灑於壓力容 器壁部的內表面上，並且最後再滴回該組合物本體。因爲 惰性的氮氣被蒸氣飽和，該等滴液永遠不會形成任何乾的 殘餘物。惰氣較佳地不會溶解在化學組成物中。這是因爲 溶解的以及氣相的惰氣之間的平衡在使用於半導體製造之 化學組成物的製造與封裝製程期間已經被良好地被建立。 因爲像是氮氣的惰氣在水性化合物中具有非常低的溶解度 ，高惰氣壓力造成的額外分解爲可忽略的。惰氣將不會對 化學組成物產生任何污染，如果較佳的超純度惰氣爲此目 的而被使用的話。在正常的操作環境（20°C )中，在氮氣 中化學組成物的部分壓力將非常的低。因此，將較佳的超 高純度氮氣經由化學組成物而起泡將不會顯著地改變該化 學組成物的組成。例如，因爲僅需要非常少量的水來飽和 氮氣，水濃度的改變也是可忽略的。例如，35公升的氮氣 在室溫（約2〇°C )以及30p s i g壓力之下，僅需要0.37 毫升（m 1 )的水就可變成飽和。 在替代的方法中，可使用化學組成物以將蒸氣提供給 惰氣。圖2表示本發明的另一個較佳裝置1〇〇。如圖2所 示，裝置具有一壓力容器31以容納化學組成物。一個 具有一控制閥門21的化學組成物入口管路20被連接到該 壓力容器31之化學組成物隔間29的底部，用於供應將被 __________22_____ 本紙張尺度適用中國國篆標準（CNS)A4規格（210 X 297公釐) ·" •---------------------訂--------«I j (請先閱讀背面之注意事項再填寫本頁) A7 583135 __ B7_ 五、發明說明（V丨） 輸送的化學組成物。一個具有一控制閥門23的化學組成物 出口管路22被連接到該壓力容器31的底部以輸送化學品 。在此實施例中係具有一個帶有一控制閥門151的加濕化 學組成物入口管路150，用於供應一小部分的加濕化學品 進入該壓力容器的一個惰氣隔間135。該控制閥門151選 擇性地係一三向閥門，其中一向允許該加濕組成物流入惰 性氣體隔間135，而另外一向允許加濕組成物的廢棄品流 出該隔間135。一加濕組成物出口管路153較佳地被連接 到一三向閥門151，用以排放該加濕組成物。 具有一控制閥門46的惰氣入口管路45係被提供以供 應較佳地爲高壓、高純度的惰氣進入惰氣隔間135，且具 有一控制閥門43的通氣管42被提供以容許通氣。一側管 M3係以一末端被連接到壓力容器31的底部，而另一末端 被連接到該通氣管42。一個另外的控制閥門42係被安裝 在通氣管42中介於側管143與通氣管42的連接處與壓力 容器31之間。較佳地有一個分歧管路50以一末端被連接 到該側管143，而另一末端被連接到該壓力容器的頂側壁 部。如圖1所示的較佳實施例，四個爲準感測器51a-51d 較佳地被安裝在側管143上，用以監測壓力容器31內側之 化學組成物的爲準。一細霧消除器139較佳地用以移除任 何從該組成物被帶離的細霧。 上述的管路與控制閥門較佳地係由與被輸送的化學組 成物相容的材料構成。較佳的爲像是不鏽鋼的金屬材料， 像是PTFE、PFA、高密度聚乙烯與聚丙烯的塑膠材料v以 ______23 本紙張尺度適用中國國家標準（CNS)A4規格（21〇 χ 297公釐） ---- . --------訂---------線-. (請先閱讀背面之注意事項再填寫本頁) 583135 A7 _____B7__ _ 五、發明說明（，） 及類似物。該等控制閥門較佳地爲氣動式。該細霧消除器 可爲任何市售的塑膠纖維型式或薄膜型式。 該壓力容器31較佳地係以相似於圖1描述的壓力容器 31的材料構成，並且被訂定尺寸成圖1的壓力容器31。爲 了容納將被輸送的化學組成物32與加濕組成物134 (較佳 爲除離子水）二者，該壓力容器31被一區隔裝置133被區 隔成兩個分離的隔間。惰氣隔間135位於壓力容器31的上 方部位中，用以容納加濕組成物，像是除離子水或被輸送 的組成物。化學組成物隔間29係位於該壓力容器31的下 方部位，用以容納將被輸送的化學組成物。該兩個隔間經 由通氣管路137的一部分、側管140、143以及管路50而 彼此連通。其較佳地可包括一個在管路50中的閥門，用以 容許濕的惰氣流經管路143，藉此，經由該液態的化學組 成物使濕的氣體起泡。 當操作該裝置100時，該化學組成物首先係經由組成 物入口管路20被饋入組成物隔間29。在此時，控制閥門 21爲開啓的、控制閥門23爲關閉的、惰氣控制閥門138 係關閉的、而通氣控制閥門爲開啓的。當隔間29內部的組 成物到達位準感測器51b監測的高位準時，控制閥門21被 關閉，並且塡充被停止。像是除離子水的加濕組成物或是 稀釋的化學組成物係被塡入惰氣隔間135中而到達加濕組 成物的控制深度，且該三向閥門到該組成物的供應側係被 關閉。該組成物的深度較佳地爲至少2英吋（5公分）， 用以使得惰氣入口管路154的尖端沒入該組成物中，.雖然、、 _____24___ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） --------^ ---------^ I . (請先閱讀背面之注意事項再填寫本頁) 583135 A7 _—___B7_ 五、發明說明（A) 這並非極爲必須者。加濕組成物應該藉由週期性地打開該 三向閥門而被供應至該隔間，用以保持控制的組成物位準 。當需要時，將該三向閥門151轉到“組成物出”的位置 來排放隔間135內部的廢棄組成物。該惰氣供應控制閥門 46較佳地爲一直打開的，用以容許在一個控制的壓力下將 惰氣塡入該小隔間135。該惰氣（較佳地爲高純度的氮氣 )使該氣體隔間內的加濕組成物起泡。在該加濕組成物中 的化學品或是水接著蒸發而進大惰氣。當隔間29內部的組 成物32將要被輸送至使用者工作站時，通氣閥門43爲關 閉的而控制閥門138爲開啓的。具有相對濕度大約爲50% 到100%的蒸氣以及/或濕氣的惰氣流過細霧消除器139、 管路137, 140與50而進入該化學隔間29的頂部部位。將 被輸送到終端使用者的化學組成物係被高壓惰氣加壓。當 該組成物出口控制閥門爲開啓的時，該化學組成物係經由 一系列管路與控制裝置流過出口管路22到達一個或更多個 使用者工作站。該項輸送可在任何時間藉著關閉控制閥門 23而被停止，並且可藉著開啓此控制閥門而恢復輸送。當 壓力容器31內的組成物到達一個位準感測器5lc監測的低 位準時，關掉該控制閥門23係停止輸送。在此時，惰氣控 制閥門138亦被關閉。通氣控制閥門43被打開以釋放壓力 容器內部的壓力。該壓力容器31的化學組成物隔間20接 著準備好被再塡充。此種再塡充與排放可被重複許多循環 。二個或更多個此種壓力容器31能夠以其中之一爲輸送模 式、另一個爲再塡充模式而並聯地操作，以便連續地,輸.7送. ___ 25 I紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公楚） --*~— ---I-----I---* — I —----^ . I - I-----I · (請先閱讀背面之注意事項再填寫本頁) A7 583135 ___—__B7________ 五、發明說明（j) 化學組成物至使用者工作站。 二個其它的位準感測器51a和5ld被用來監控壓力容 器31之隔間29內部化學組成物的高-高液面與低-低液 面。來自於這二個感測器的信號主要係用於安全的考量。 一旦位準到達高-高或低-低液面時，會產生一警報，並 且該系統可在一預定時間內停止操作。 加濕組成物或稀釋的化學組成物可經由一個如圖3所 示之具有一位於該隔間135內部之噴頭210的管路，而被 供應至該壓力容器31的氣體隔間135。以該噴頭噴灑加濕 組成物會產生液態滴液211。經由較佳地幾乎所有的長度 係延伸靠近氣體隔間135底部的管路45而將惰氣供應至氣 體隔間135。惰氣係接觸液態滴液211用以傳送蒸氣與/ 或濕氣至惰氣，並且接著在必須時，濕的惰氣係流經細霧 消除器139、控制閥門138、管路137、140與50而進入化 學組成物隔間29來加壓該化學組成物。組成物滴液將被收 集在作用如該氣體隔間135的地板、並且在該處建立加濕 組成物之位準的區隔元件133上，並且經由具有一控制閥 門151的管路153被排放。 圖4說明本發明另一個較佳裝置的實施例500。與圖2 和圖3所示的實施例相比較，圖4的實施例具有一個在氣 體隔間135內的殼體158。一管路150與閥門156係輸送 一種加濕組成物通過一個作用以噴灑在殼體158內之加濕 組成物的噴頭210，如211處所示者。惰氣也是經由一管 路45、閥門46與管路154被供應至殼體158中。機構彳57、、 _ 26 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ----------------------訂-------！線—一 (請先閱讀背面之注意事項再填寫本頁) A7 583135 ___B7 _ —_ 五、發明說明（/ ) 係被提供，用於容許帶有化學蒸氣與/或濕氣的惰氣流出 殼體158。機構157較佳地係選自以洞孔 '百葉板、氣泡 罩以及類似物所組成的群組。爲了移除惰氣中的任何滴液 ，像是塑膠纖維的細霧消除材料可以被安裝至該機構157 。在殼體158與壓力容器31的內壁之間較佳地有一個環狀 通道159，用以容許濕惰氣通過。在用於氣體隔間135與 化學組成物隔間29的區隔裝置133上較佳地有複數個小洞 孔160或類似的機構，用於該匕個隔間之間的連通。濕惰 氣將從氣體隔間135經由這些洞孔或其它機構進入隔間29 ，用以加壓將被輸送的化學組成物。 在操作期間，如圖1至3所示的較佳實施例，化學組 成物係經由一個帶有一控制閥門21的化學供應管路20而 被饋入壓力容器31的化學組成物隔間29。一旦該組成物 位準達到由位準感測器51b所監測的高位準，控制閥門21 係被關閉。用於通氣的控制閥門43係被關閉。藉由打開控 制閥門46,惰氣係被供應入殼體158。加濕組成物可以連 續地藉著噴頭210被噴灑以製造液態滴液。惰氣係接觸該 液態滴液，並且接著流入氣體組成物隔間135內的蒸氣空 間136，並且進一步地通過洞孔160流入空間141，用以加 壓化學組成物。一旦需要輸送化學組成物到使用者工作站 時，控制閥門23係被打開，且化學組成物流過管路22至 任何所需的外部管路與控制閥門而到達使用者工作站。保 持該控制閥門156開啓可連續地噴灑加濕組成物，在化學 排放管路中的控制閥門151也可以保持開啓以連續地有卩赦、 ______ 本紙張尺度適用中酬家標準（CNS)A4規格（21Q χ 297公爱) " (請先閱讀背面之注意事項再填寫本頁)A7 583135 B7 V. Description of invention (Λ) During the conveyance, the formation of large-sized particles is preferably avoided. This chemical composition is usually delivered in a ~ pressure vessel system via the required distribution line. Figure 1 illustrates a preferred embodiment of an apparatus 10 for transporting chemical compositions according to the present invention. A pressure vessel 31 contains the chemical composition 32 to be transported. A chemical composition inlet line 20 having a control valve 21 is attached to the container 31 to supply the chemical composition to the pressure container 31. A chemical composition outlet line 22 having a control valve 23 is attached to the container to allow the chemical composition to be delivered to a user workstation or other container. The lines 20 and 22 may alternatively be connected to a pressure vessel 31, respectively. Both lines 20 and 22 may be any material compatible with the pressure vessel 31. Preferred materials include metals such as stainless steel, and plastic materials such as polytetrafluoroethylene (PTF E), perfluoroalkali resin (PFA), high density polyethylene and polypropylene. The diameters of the tubes 20 and 22 are preferably between 0.125 inches (0.32 cm) and about 0.1 inches (2.54 cm). A side pipe 50 is attached to the pressure vessel 31 with one end 52 near the top of the pressure vessel 31 and the other end 54 at the bottom to establish communication between the top and bottom portions inside the pressure vessel 31 . The level sensing benefits 51a, 51b, 51c and 5 Id are preferably mounted on the side pipe to monitor the level of the chemical composition inside the pressure vessel 31. The side pipe 50 may be the same or different plastic material as the pipes 20 and 22, but preferably the inner diameter range is greater than or equal to 0.5 inches (1.3 cm). The level sensors 51a, 51b, 51c, and 51d are preferably optical or volumetric types used by those who are generally familiar with level measurement techniques. When ______ 18 _ This paper size applies to Chinese National Standards (CNS) A4 specifications (210 X 297 public love) ------ • -------- order --------- line --- (Please read the &i; i note on the back? Matters before Fill out this page} 583135 A7 ____B7 V. Description of the invention () When using an ultrasonic level sensor, they can be directly attached to different positions of the pressure vessel 31. Therefore, a side tube is not required in this case 500 A line 45 for a local pressure inert gas having a control valve 46 and a check valve 47 passes through the wall of the pressure vessel 31 near the bottom and is connected to a diffuser 40. The line 45 The material may also be the same as that of the pipes 20 and 22. The diffuser 40 is preferably similar to a membrane cassette that allows an inert gas flow through the filter cassette. The diffuser 40 may also include a plurality of holes One or more pipe fittings to allow inert gas flow through. In any physical configuration, the diffuser 40 is preferably a The chemical composition compatible material is delivered. Another line 43 with a control valve 42 is attached to the pressure vessel 31 to vent the pressure vessel 31 when needed. A pressure relief valve 60 is connected via a A pipeline 61 is attached to the pressure vessel 31 to release gas once the pressure inside the pressure vessel 31 is higher than a preset pressure. The above-mentioned control valves are preferably pneumatic valves which include a chemical composition Compatible materials, such as stainless steel, pTFE, pFA, high-density polyethylene, and polypropylene. When in operation, the 'chemical composition is pumped into the pressure vessel 31 via the pipeline 20. The chemical composition inside the pressure vessel 31 The weight is monitored by level sensors 51a-d. Once the composition level is monitored by the level sensor 51b to reach a local level, the control valve 21 is closed. Preferably, such as high pressure of nitrogen, Ultra-high purity inert gas is then introduced via line 45 by opening the control valve 46. The inert gas flows through the diffuser 40 and is chemically formed _________ 19 Chinese paper rule (210 x ---- --- ------------------ Order --------- line 丨 j (Please read the notes on the back before filling this page) 583135 A7 ___ B7 _ 5 2. Description of the invention (j) Small bubbles 30 are formed in the object. The size of the bubbles is determined by the size of the pores or holes of the diffuser 40. It is preferable that a diffuser produces a diameter of less than 50 mm, more preferably less than Bubbles of approximately 5 mm. The flow of the gas is preferably controlled at a flow rate ranging from approximately 1 standard liter (s 1 P m) to approximately 100 s 1 pm per minute, and a pressure ranging from approximately 0.5 Atmospheric pressure to 5 atmospheres. The bubbles rise through the chemical composition and collect some vapor as they rise. The inert gas is filled with a vapor space 62 above the chemical composition, and then presses the chemical composition 32. The height of the pressure vessel 31, or more appropriately, the depth of the chemical composition 32, is important for the sufficient vapor system to collect bubbles. The height of the pressure container 31 is preferably at least 1 meter, and the depth of the chemical composition 32 inside the pressure container 31 is preferably at least 0.5 meters as the high level monitored by the level sensor 51b. The content of steam (preferably water vapor) in the inert gas is preferably from 50% RH to 100% RH, more preferably from about 80% RH to about 95% R Η, regardless of There is no water vapor, and the concentration of other chemical vapors reaches a maximum of some ppm. When the chemical composition is to be delivered to one or more user workstations, the control valve 23 is opened, and the chemical flows out of the pressure vessel 31 through the line 22 under the pressure of inert gas containing vapor. At this moment, a vapor-containing inert gas system is supplied into the vapor space 62 to fill the space left by the moved chemical composition. Therefore, the pressure inside the pressure vessel 31 is kept fixed, and the chemical composition is delivered at a stable pressure and flow rate. High-purity nitrogen is better because it is more inert than any other inert gas system. Wide, pan, ___20__ This paper I standard is applicable to China National Standard (CNS) A4 specification (210 X 297 public love) -------- -------------- Order --------- I. (Please read the notes on the back before filling this page) -I nnn I -I nn ϋ n ϋ n ϋ ϋ ϋ ϋ I n I n I _ 583135 A7 ____B7______ 5. The description of the invention (4) is provided and is relatively cheap. When the composition reaches a low level monitored by the level sensor 51c, the control valves 23 and 21 are closed. The high-pressure inert gas inside the pressure vessel 31 is then released by opening the control valve 42. At this stage, the chemical composition is poured into the pressure vessel 31 by opening the control valve 21. When necessary, the chemical composition can be periodically reintroduced into the pressure vessel or discharged for transport. Two or more such pressure vessels can be operated in parallel. When one of the pressure vessels is in the recharge mode, the other L systems are in the discharge mode to achieve continuous delivery of the chemical composition to one or more user stations. The pressure vessel 31 preferably contains a metal or plastic material such as stainless steel, PTFE, PFA, high density polyethylene, polypropylene, glass, and steel coated with one of these plastic or glass materials on its inner surface. The pressure vessel 31 must have a combination of material characteristics and sufficient wall thickness to allow the pressure vessel to withstand pressures up to about 10 atmospheres. The capacity of the pressure vessel preferably ranges from about 1 liter to about 5,000 liters, and more preferably from about 20 liters to 500 liters. Because after contacting with the chemical composition, the inert gas now has at least a part of the vaporizable portion, the vapor molecules in the top layer of the chemical composition and the composition drops remaining on the inner wall of the pressure vessel 31 Will not be lost in inert gas. Therefore, no dry film or dry residue will form. With this preferred embodiment, there is no need to use an external humidifier to humidify the inert gas as is the case with conventional systems. An advantage of this preferred embodiment is that this preferred embodiment saves space for the user and is more cost effective. Another advantage is the straightening, 21 _ _ This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the precautions on the back before filling this page) Order ------ --- line 丨 · ---------------------- A7 583135 ________B7 _ 5. Description of the invention (/) Conveying systems will be easier to operate than conventional systems Because it has eliminated some components. After the bubbles have cracked on the top of the surface of the composition, the inert gas bubbles can produce drops of some chemical composition. These drops can be splashed on the inner surface of the wall of the pressure vessel and finally dripped back into the composition body. Because the inert nitrogen is saturated with steam, the drops never form any dry residue. The inert gas is preferably not dissolved in the chemical composition. This is because the balance between dissolved and gas-phase inert gas has been well established during the manufacturing and packaging processes of chemical compositions used in semiconductor manufacturing. Because inert gases like nitrogen have very low solubility in aqueous compounds, the additional decomposition caused by high inert gas pressures is negligible. The inert gas will not cause any pollution to the chemical composition if a better ultra-purity inert gas is used for this purpose. Under normal operating conditions (20 ° C), the partial pressure of the chemical composition in nitrogen will be very low. Therefore, bubbling the preferred ultra-high purity nitrogen gas through the chemical composition will not significantly change the composition of the chemical composition. For example, because only a very small amount of water is needed to saturate nitrogen, the change in water concentration is also negligible. For example, 35 liters of nitrogen at room temperature (approximately 20 ° C) and a pressure of 30 psig, requires only 0.37 ml (m1) of water to become saturated. In an alternative method, a chemical composition may be used to provide vapor to the inert gas. Fig. 2 shows another preferred apparatus 100 of the present invention. As shown in Figure 2, the device has a pressure vessel 31 to contain the chemical composition. A chemical composition inlet line 20 with a control valve 21 is connected to the bottom of the chemical composition compartment 29 of the pressure vessel 31 for supplying __________22_____ This paper size applies to China National Standard (CNS) A4 Specifications (210 X 297 mm) · " • --------------------- Order -------- «I j (Please read the back first Please pay attention to this page before filling in this page) A7 583135 __ B7_ V. Description of the invention (V 丨) Chemical composition for transportation. A chemical composition outlet line 22 having a control valve 23 is connected to the bottom of the pressure vessel 31 to convey chemicals. In this embodiment there is a humidifying chemical composition inlet line 150 with a control valve 151 for supplying a small amount of humidifying chemicals into an inert gas compartment 135 of the pressure vessel. The control valve 151 is optionally a three-way valve, in which the humidifying composition is always allowed to flow into the inert gas compartment 135, and the other is to allow the waste of the humidifying composition to flow out of the compartment 135. A humidifying composition outlet line 153 is preferably connected to a three-way valve 151 for discharging the humidifying composition. An inert gas inlet line 45 having a control valve 46 is provided to supply preferably high pressure, high purity inert gas into the inert gas compartment 135, and a vent pipe 42 having a control valve 43 is provided to allow ventilation . One end of the tube M3 is connected to the bottom of the pressure vessel 31 with one end, and the other end is connected to the vent tube 42. An additional control valve 42 is installed in the vent pipe 42 between the connection of the side pipe 143 and the vent pipe 42 and the pressure vessel 31. It is preferable that a branch pipe 50 is connected to the side pipe 143 at one end and the other end is connected to the top side wall portion of the pressure vessel. As shown in the preferred embodiment shown in FIG. 1, four quasi-sensors 51a-51d are preferably installed on the side pipe 143 to monitor the chemical composition inside the pressure vessel 31. A fine mist eliminator 139 is preferably used to remove any fine mist that is carried away from the composition. The aforementioned piping and control valve are preferably made of a material compatible with the chemical composition being conveyed. Metal materials such as stainless steel are preferred, and plastic materials such as PTFE, PFA, high-density polyethylene, and polypropylene v. ______23 This paper size is applicable to China National Standard (CNS) A4 (21〇χ 297 mm) ) ----. -------- Order --------- Line-. (Please read the precautions on the back before filling this page) 583135 A7 _____B7__ _ 5. Description of the invention (, ) And the like. The control valves are preferably pneumatic. The fine mist eliminator can be any commercially available plastic fiber type or film type. The pressure vessel 31 is preferably made of a material similar to that of the pressure vessel 31 described in FIG. 1, and is sized to the pressure vessel 31 of FIG. In order to accommodate both the chemical composition 32 and the humidified composition 134 (preferably deionized water) to be transported, the pressure vessel 31 is partitioned into two separate compartments by a partitioning device 133. The inert gas compartment 135 is located in the upper part of the pressure vessel 31, and is used for containing a humidified composition such as deionized water or a composition to be transported. The chemical composition compartment 29 is located below the pressure vessel 31 and contains a chemical composition to be transported. The two compartments communicate with each other through a part of the ventilation pipe 137, the side pipes 140, 143, and the pipe 50. It may preferably include a valve in line 50 to allow wet inert gas flow to pass through line 143, whereby the wet gas is bubbled through the liquid chemical composition. When the device 100 is operated, the chemical composition is first fed into the composition compartment 29 via the composition inlet line 20. At this time, the control valve 21 is opened, the control valve 23 is closed, the inert gas control valve 138 is closed, and the ventilation control valve is opened. When the composition inside the compartment 29 reaches the high level monitored by the level sensor 51b, the control valve 21 is closed and the charging is stopped. A humidified composition such as deionized water or a diluted chemical composition is poured into the inert gas compartment 135 to reach the controlled depth of the humidified composition, and the three-way valve to the supply side of the composition is closed. The depth of the composition is preferably at least 2 inches (5 cm), so that the tip of the inert gas inlet pipe 154 is immersed in the composition. Although ,, _____24___ This paper size applies the Chinese National Standard (CNS ) A4 size (210 X 297 mm) -------- ^ --------- ^ I. (Please read the notes on the back before filling this page) 583135 A7 _—___ B7_ 5 2. Description of the invention (A) This is not strictly necessary. Humidifying composition should be supplied to the compartment by periodically opening the three-way valve to maintain a controlled composition level. When necessary, the three-way valve 151 is turned to the "composition out" position to discharge the waste composition inside the compartment 135. The inert gas supply control valve 46 is preferably always open to allow inert gas to be pumped into the compartment 135 under a controlled pressure. The inert gas, preferably high purity nitrogen, foams the humidified composition in the gas compartment. The chemicals or water in the humidified composition then evaporates into a large inert gas. When the component 32 inside the compartment 29 is to be delivered to the user's workstation, the vent valve 43 is closed and the control valve 138 is opened. An inert gas vapor having a relative humidity of about 50% to 100% and / or moisture passes through the fine mist eliminator 139, the pipes 137, 140, and 50 into the top portion of the chemical compartment 29. The chemical composition to be delivered to the end user is pressurized by high pressure inert gas. When the composition outlet control valve is open, the chemical composition flows through the outlet line 22 through a series of pipes and control devices to one or more user workstations. The conveyance can be stopped at any time by closing the control valve 23, and the conveyance can be resumed by opening the control valve. When the composition in the pressure vessel 31 reaches the low level monitored by a level sensor 5lc, the control valve 23 is closed to stop the delivery. At this time, the inert gas control valve 138 is also closed. The ventilation control valve 43 is opened to release the pressure inside the pressure vessel. The chemical composition compartment 20 of the pressure vessel 31 is then ready to be refilled. This recharge and discharge can be repeated for many cycles. Two or more of these pressure vessels 31 can be operated in parallel with one of them as the conveying mode and the other as the refilling mode, so as to continuously lose .7 deliveries. ___ 25 I Paper size applies Chinese national standards (CNS) A4 specifications (210 X 297).-* ~---- I ----- I --- * — I —---- ^. I-I ----- I · (Please read the notes on the back before filling this page) A7 583135 ___—__ B7________ V. Description of the invention (j) Chemical composition to the user workstation. Two other level sensors 51a and 5ld are used to monitor the high-high liquid level and low-low liquid level of the chemical composition inside the compartment 29 of the pressure container 31. The signals from these two sensors are mainly used for safety considerations. Once the level reaches the high-high or low-low level, an alarm is generated and the system can be stopped for a predetermined time. The humidified composition or the diluted chemical composition may be supplied to the gas compartment 135 of the pressure vessel 31 through a pipeline having a spray head 210 located inside the compartment 135 as shown in FIG. 3. Spraying the humidified composition with this nozzle produces liquid droplets 211. The inert gas is supplied to the gas compartment 135 via a pipe 45 extending near the bottom of the gas compartment 135, preferably of almost all lengths. The inert gas system contacts the liquid drip 211 to transfer vapor and / or moisture to the inert gas, and then when necessary, the wet inert gas system flows through the fine mist eliminator 139, the control valve 138, the pipeline 137, 140 and 50 into the chemical composition compartment 29 to pressurize the chemical composition. Composition drips will be collected on the floor acting as the gas compartment 135, and the partition element 133 where the composition level is humidified, and discharged through a line 153 having a control valve 151 . FIG. 4 illustrates an embodiment 500 of another preferred apparatus of the present invention. Compared to the embodiment shown in Figs. 2 and 3, the embodiment of Fig. 4 has a housing 158 in a gas compartment 135. A pipeline 150 and a valve 156 convey a humidified composition through a spray head 210 for spraying the humidified composition in the housing 158, as shown at 211. The inert gas is also supplied into the housing 158 via a pipe 45, a valve 46 and a pipe 154. Institution 彳 57 ,, _ 26 This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) ---------------------- Order- ------!线 — 一 (Please read the precautions on the back before filling this page) A7 583135 ___B7 _ —_ 5. The description of the invention (/) is provided to allow the inert gas stream with chemical vapor and / or humidity to come out of the shell体 158. The mechanism 157 is preferably selected from the group consisting of a hole louver, a bubble hood, and the like. To remove any drips from the inert gas, fine mist-removing materials such as plastic fibers can be mounted to the mechanism 157. There is preferably an annular passage 159 between the housing 158 and the inner wall of the pressure vessel 31 to allow the passage of wet and inert gas. The partitioning device 133 for the gas compartment 135 and the chemical composition compartment 29 is preferably provided with a plurality of small holes 160 or the like for communication between the compartments. Wet inert gas will enter the compartment 29 from the gas compartment 135 through these holes or other mechanisms to pressurize the chemical composition to be transported. During operation, as shown in the preferred embodiment shown in Figs. 1 to 3, the chemical composition is fed into the chemical composition compartment 29 of the pressure vessel 31 via a chemical supply line 20 with a control valve 21. Once the composition level reaches a high level monitored by the level sensor 51b, the control valve 21 is closed. The control valve 43 for ventilation is closed. By opening the control valve 46, the inert gas is supplied into the housing 158. The humidifying composition may be continuously sprayed by the spray head 210 to produce a liquid drip. The inert gas contacts the liquid drop, and then flows into the vapor space 136 in the gas composition compartment 135, and further flows into the space 141 through the hole 160 to pressurize the chemical composition. Once the chemical composition needs to be delivered to the user workstation, the control valve 23 is opened and the chemical composition flows through the pipeline 22 to any required external pipelines and control valves to reach the user workstation. Keep the control valve 156 open to continuously spray the humidified composition, and the control valve 151 in the chemical discharge pipeline can also be kept open for continuous amnesty, ______ This paper standard applies the CNS A4 specification (21Q χ 297 public love) " (Please read the notes on the back before filling this page)
A7 583135 B7 五、發明說明（vi〇 ) 圖4a說明第五裝置的實施例，其係圖4之實施例的一 種稍微修改。所示者係在殼體158中靠近以及/或在其底 部的複數個開口 161:其作用以容許加濕組成物向下滴入 將被輸送的液態化學組成物中。 上述的較佳實施例較佳地係以一電腦控制系統或一 PLC系統自動化地***作。該等控制閥門較佳地係以自動 控制系統氣動***作與控制。來自於像是位準感測器的信 號係被饋入電腦或PLC，用於處理以及啓動必須的操作信 號至該系統。 從以上示於圖1、2、3、4以及4a之較佳實施例的描 述係可以刻瞭解本發明的各項優點。首先，該較佳實施 例較容易操作，因爲它們具有在一較佳整體裝置中所有較 佳的功能。藉由操作數個控制閥門，化學組成物能從該壓 力容器中被饋入以及被排出。在同時，高壓惰氣以及較佳 地一加濕組成物係被供應至該壓力容器，用於將該化學品 以及/或水蒸發入該惰热中’以便加壓將被輸送的化學組 成物。因此，不需要外部裝置以提供蒸氣至惰氣。將被輸 送之化學組成物的成分將不會因爲蒸發而有實質上的改變 。該等裝置也很容易被自動化。第二，因爲沒有使用另外 的外部加濕器來加濕該高壓惰氣，可以節省非常寶貴的空 間。第三，該壓力系統的整體成本將顯著減少，因爲習知 裝置與方法中相同的目的係使用較少的裝置。 雖然以上本發明較佳裝置與方法的說明係本發明的代 28 、 (請先閱讀背面之注意事項再填寫本頁) 參 訂---------線 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 583135 __B7_ 五、發明說明（4 ) 表，但是它們絕非意圖限制該後附申請專利範圍的範疇。 29 (請先閱讀背面之注意事項再填寫本頁) . ---訂·--------'^丨一 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐）A7 583135 B7 V. Description of the Invention (vi0) Fig. 4a illustrates an embodiment of the fifth device, which is a slight modification of the embodiment of Fig. 4. The one shown is near openings 161 in the housing 158 and / or at the bottom thereof: it functions to allow the humidified composition to drip down into the liquid chemical composition to be conveyed. The above-mentioned preferred embodiment is preferably operated automatically by a computer control system or a PLC system. The control valves are preferably operated and controlled pneumatically by an automatic control system. Signals from things like level sensors are fed into a computer or PLC to process and start the necessary operating signals to the system. The advantages of the present invention can be engraved from the description of the preferred embodiments shown in Figs. 1, 2, 3, 4, and 4a. First, the preferred embodiments are easier to operate because they have all the better functions in a better overall device. By operating several control valves, the chemical composition can be fed in and discharged from the pressure vessel. At the same time, a high-pressure inert gas and preferably a humidifying composition is supplied to the pressure vessel for evaporating the chemical and / or water into the inert heat 'in order to pressurize the chemical composition to be delivered . Therefore, no external device is required to provide steam to inert gas. The composition of the chemical composition to be delivered will not be substantially changed by evaporation. Such devices are also easily automated. Second, because no additional external humidifier is used to humidify the high-pressure inert gas, valuable space can be saved. Third, the overall cost of the pressure system will be significantly reduced because fewer devices are used for the same purpose in conventional devices and methods. Although the above description of the preferred device and method of the present invention is the 28th generation of the present invention (please read the precautions on the back before filling this page) Reference --------- The size of the thread paper is applicable to Chinese national standards (CNS) A4 specifications (210 X 297 mm) A7 583135 __B7_ V. Description of invention (4) Tables, but they are not intended to limit the scope of the attached patent application. 29 (Please read the notes on the back before filling out this page). --- Order · -------- '^ 丨 A paper size applies to China National Standard (CNS) A4 (210 X 297 mm) )