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Priority claimed from US10/067,773external-prioritypatent/US20020164873A1/en
Application filed by Kobe Steel LtdfiledCriticalKobe Steel Ltd
Application grantedgrantedCritical
Publication of TW577120BpublicationCriticalpatent/TW577120B/en
A process for removing residues from the microstructure of an object is provided, which comprises steps of preparing a remover including CO2, an additive for removing the residues and a co-solvent dissolving the additive in said CO2 at a pressurized fluid condition; and bringing the object into contact with the remover so as to remove the residues from the object. An apparatus for implementing the process is also provided.
TW91122768A2002-02-082002-10-02Process, apparatus and composition for removing residues from the microstructure of an object
TW577120B
(en)
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus