531436 A7 ----~-- B7__ 五、發明説明（i ) " --- 【技術領域】 (請先閱讀背面之注意事項再填窝本頁) 本發明係有關於排氣除害方法與排氣除害裝置及使用 於其中之除塵裝f，詳細而t，對於要將半導體或液晶顯 示器之模組的製造步驟以至於成膜步驟所使用之排氣予以 除害化的技術上，本發明為有效的方法及裝置。 【技術背景】 習知技術上，在半導體或液晶顯示器之模組的成膜步 驟上所使用之氣體，例如有成膜用的石夕烧及氨 ，潔淨用的氟系列氣體。矽烷或氨等成膜用氣體（亦稱為可 燃系列氣體），例如於處理室内藉著電漿放電而在基板上形 成Si膜或SiN膜，潔淨用的NFs等氟系列氣體（亦稱為助燃系 列氣體），能將殘留於處理室内之以形成SiF4而排放出系統 外。 對於包含如此的成膜氣體或潔淨用氣體的排放氣體， 習知技術上如第5圖所示係具備於成膜裝置之真空處理室 的後段。以燃燒式除害機構、洗淨式集塵機構而順序地處 理。 於燃燒式除害機構之前段且為真空處理室之後，大多 具有從潔淨排氣去除SiF4的機構。SiF4去除機構係設置於成 膜用處理室的氣體排出口附近，可對排氣補給水分而將 SiF4形成Si〇2( 一氧化碎）並捕集，而且藉由過滤以將siF4 從排氣系統排除者。 排氣之燃燒式除害機構將可燃系氣體或助燃系列氣體 予以燃燒而氧化並分別產生下列式子[1 ]〜[3 ]的化學反應 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 B7 五、發明説明（ [1] [2] [3] S1H4 + 2〇2~^ Si〇2 + 2H2O · · · 4NH3 + 7〇2—4N〇2 + 6H2O · ·. {請先閲讀背面之注意事项再填窝衣頁) 2NF3 + 2O2—2NO2+3F2 · · · « 而且在洗淨式集塵機構，將此燃燒氣體置於添加了鹼 的水中進行中和洗淨並予以集塵’藉此在捕集Si〇2之同時 ，將酸性成分（N〇2或F2)作為廢液而予以分離。 訂· 但是習知之前述Si〇2捕集機構或其後之配管以外，會 於洗淨式集塵機構或其後段的配管產生析出物，而造成配 痛的阻塞或洗淨裝置内的堵塞。因此，有必要頻繁地洗淨 該洗淨式集塵機構或洗淨配管。又，此等析出物因要使用 氟I來洗淨’故必須注意安全性。而且由於需要該等洗淨 的保養作業，因此亦會產生降低製程稼動率的問題。 本發明係以於如此的成膜裝置等半導體或液晶模組的 製造裝置中所發生之排放氣體的除害工程處理上，可減少 保養作業或提幵其作業的安全性為目的而完成者。 Φ, 【發明揭示】 本發明人等在分析上述排氣處理步驟之析出物時，得 知洗淨式集塵機構以後主要是矽化鈣（CaSiF6)，由成膜裝 置至燃燒式除害機構之經過路徑中所析出的析出物主要為 矽氟化銨（（NH4)2SiF6)。 、 而且進一步探索該析出物的析出原因時，碎氟化舞係 起因於排氣或燃燒氣體中所含有的Si〇2、燃燒時所發生之 氟酸、利用於洗淨水或處理水之水中所含有之舞。又，石夕531436 A7 ---- ~-B7__ 5. Description of the invention (i) " --- [Technical Field] (Please read the precautions on the back before filling in this page) The present invention relates to the exhaust gas removal method The exhaust gas detoxification device and the dust removal device f used therein are detailed and t. For the technology of detoxifying the exhaust gas used in the manufacturing steps of the semiconductor or liquid crystal display module and the film formation step, The invention is an effective method and device. [Technical Background] Conventionally, the gases used in the film-forming step of a semiconductor or liquid crystal display module include, for example, stone-fired sintering and ammonia for film-forming, and a fluorine-based gas for cleaning. Film-forming gases such as silane or ammonia (also known as combustible series gases). For example, a Si film or SiN film is formed on a substrate by plasma discharge in a processing chamber. Fluorine series gases such as NFs (also called combustion-supporting combustion) A series of gases) can be left in the processing chamber to form SiF4 and discharged outside the system. The exhaust gas containing such a film-forming gas or a cleaning gas is conventionally provided in a rear stage of a vacuum processing chamber of a film-forming apparatus as shown in FIG. 5. Dispose in order by a combustion-type detoxification mechanism and a cleaning-type dust collection mechanism. There is a mechanism for removing SiF4 from the clean exhaust gas after the front of the combustion type detoxification mechanism and after the vacuum processing chamber. The SiF4 removal mechanism is installed near the gas exhaust port of the processing chamber for film formation. The SiF4 can be replenished with moisture to form Si02 (monoxide monoxide) and capture it. Furthermore, the SiF4 can be removed from the exhaust system by filtration. Excluded. Exhaust combustion type detoxification mechanism burns combustible system gas or combustion-supporting series gas to oxidize and produce the following chemical reactions of the following formulas [1] ~ [3]. The paper size applies Chinese National Standard (CNS) A4 specification (210X297) (Mm) 531436 A7 B7 V. Description of the invention ([1] [2] [3] S1H4 + 2〇2 ~ ^ Si〇2 + 2H2O · · · 4NH3 + 7〇2-4N〇2 + 6H2O · ·. { Please read the precautions on the back before filling the nesting page.) 2NF3 + 2O2—2NO2 + 3F2 · · · «And in the cleaning type dust collection mechanism, this combustion gas is placed in water with alkali added to neutralize and clean it. Dust collection 'thereby collects SiO 2 and separates the acidic component (NO 2 or F 2) as a waste liquid. Order · However, in addition to the conventional SiO2 trapping mechanism or its piping, precipitates may be generated in the cleaning type dust collecting mechanism or the piping at the subsequent stage, which may cause blockage of the pain or blockage in the cleaning device. Therefore, it is necessary to frequently clean the cleaning-type dust collection mechanism or the cleaning pipe. In addition, since these precipitates are to be cleaned using fluorine I ', it is necessary to pay attention to safety. In addition, since such cleaning and maintenance work is required, there is also a problem of reducing the productivity of the process. The present invention is completed for the purpose of reducing the maintenance work or improving the safety of the operation on the decontamination engineering treatment of the exhaust gas generated in such a semiconductor film or liquid crystal module manufacturing device such as a film forming device. Φ, [Disclosure of the invention] When the inventors analyzed the precipitates in the above-mentioned exhaust treatment step, they learned that the cleaning type dust collection mechanism is mainly calcium silicide (CaSiF6), and the process from the film forming device to the combustion type harm removal mechanism The precipitates in the path are mainly ammonium silicon fluoride ((NH4) 2SiF6). When further exploring the cause of the precipitation, the broken fluorinated dance is caused by Si02 contained in the exhaust gas or the combustion gas, and the fluoric acid generated during combustion is used in the water of the washing water or the treated water Contained dance. Again, Shi Xi
本紙張尺度適用中國國家標準（CNS) A4規格（210X 297公釐) 531436 發明説明（ 氟化錄係起因於排氣中的Si〇2與氣酸⑽）與氨氣。 〃由於此等析出物可得知均係排氣中所含有的叫，在 (請先閱讀背面之注意事項再場寫本頁) 洗淨式集塵機構無法有效率地捕集Si〇2而會殘留在内部， 而於燃燒式集塵機構的前段，抓去除機構無法有效地發 揮功能，而無法捕集因與水的化學反應而產生的Si〇2,以 致於會漏泄於排氣中。且亦可得知特別是在洗淨式集塵機 構易殘留粒徑為G.H—範圍之微粒子的聊，而集塵率 僅50%左右而已。 於排氣處理步驟中，雖然具有於成膜裝置之後的Si去除 機構及於燃燒式&害機構之後的洗淨式集塵機才籌，然而不 能有效地發揮Si成分(SiH4、SiF4、Si02)的捕集的情形，對 於業者乃預料外的情況。又，本發明人等始檢知處理水中 的Ca>辰度南將會促進析出物的產生而會殘留&成分。 由以上所述情形，本發明人等發覺出上述本發明之課 題乃能藉著在洗淨式集塵機構之前段設置除塵機構（裝置） 而能獲得解決β又，本發明人發覺出本發明的課題乃將成 膜裝置至燃燒式除害機構之配管内部維持在不析出該部位 可析出之析出物的溫度而獲得解決的情形。 即’本發明之要旨如下列各項所述。 (1) 一種排氣除害方法，係含有Si成分之排氣的除害方 法，具有排氣之燃燒處理步驟；從燃燒處理所產生之燃燒 排氣中將含有Si粉塵予以除塵的除塵步驟；及將經除塵之 燃燒排氣予以水性洗淨的洗淨步驟。 (2) 如（1)項所記載之排氣除害方法，其中前述除塵步 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 ______B7 五、發明説明（4 ) ^ " '一~ - 驟中係使用袋濾器作為除塵機構（裝置）。 ⑶如⑵項所記載之排氣除害方法，其中前述除塵機 構（裝置）於其除塵經過路徑具有過據器，而於前述除塵機 構（裝置）之粉塵的粉塵撣去（撣落）步驟中，對前述過滤器 供給壓縮氣體，同時對前述過滤器之外部，賦予從前述過 濾器表面近旁朝向粉末排出側的氣體流。 (4) 如（2)或（3)項所記載之排氣除害方法，其中於前述 除塵步驟中，至少具有„!台(111為3以上的整數)的除塵機構， 各個除塵機構（裝置）分別以至少i台的除塵機構（裝置）進 行粉塵撣去步驟，最大以（m—D台的除塵機構（裝置）進行 集塵步驟的方式切換使用。 (5) 如（1)〜（4)項所記載之排氣除害方法，其中將前述 除塵步驟所除塵之氣體以因應該氣體之排出壓力的風量來 排出。 (6) 如（1)〜（5)項其中任何一項所記載之排氣除害方 法，其中前述洗淨步驟所導入之洗淨用水係使用純水〜硬 度0的水。 (7) 如（1)〜（6)項其中任何一項所記載之排氣除害方 法，其中前述燃燒處理步驟所導入之前述排氣，係維持在 不析出比在前述燃燒處理步驟更前階段可析出之析出物的 溫度。 (8) —種排氣除害方法，係含有以成分之排氣的除害方 法，具有排氣之燃燒處理步驟；從燃燒處理所產生之燃燒 排氣中將含有Si粉塵予以除塵的除塵步驟；且前述燃燒處 本紙張尺度適用中國國家標準（CNS) A4規格（2]〇χ297公爱） f請先閱讀背面之注意事项再填窝衣頁) •、一^· 531436 A7 -— _ B7 五、發明説明（5 ) 理步驟所導入之前述排氣，係維持在不析出比在前述燃燒 處理步驟更前階段可析出之析出物的溫度。 ί請先閱讀背面之注意事项再填窝本頁} (9) 一種排氣除害裝置，係含有si成分之排氣的除害裝 置，具有排氣之燃燒處理機構；從燃燒處理所產生之燃燒 排氣中將含有Si粉塵予以除塵的除塵機構；及將經除塵之 燃燒排氣予以水性洗淨的洗淨機構。 (10) 如（9)項所記載之排氣除害裝置，其中前述除塵步 驟中係使用袋濾器作為除塵機構。 (11) 如（10)項所記載之排氣除害裝置，其中於前述袋 濾器之經過路徑設置一部過濾器，而對前述過濾器供給壓 縮氣體，同時具有對前述過濾器之外部，賦予從前述過濾 器表面近旁朝向粉末排出側之氣體流的導入機構。 (12) 如（10)或（11)項所記載之排氣除害裝置，其中於 前述除塵機構中，至少具有m台（m為3以上的整數）的除塵機 構，各個除塵機構分別以至少1台的除塵機構進行粉塵撣去 步驟，而最大以（m—l)台的除塵機構（裝置）進行集塵步驟 的方式切換使用。 (13) 如（9)〜（12)項其中任何一項所記載之排氣除害 裝置，其中前述洗淨機構所導入之洗淨用水係使用純水〜 硬度0之範圍的水。 (14) 如（9)〜（13)項其中任何一項所記載之排氣除害 裝置，其中前述燃燒處理機構所導入之前述排氣，係維持 在不析出比在前述燃燒處理機構更前階段可析出之析出物 的溫度。 本紙張尺度適用中國國家標準（CNS) Α4規格（210X 297公釐） 531436 A7 ___B7 五、發明説明（6 ) ^ " (15) 如（9)〜（14)項其中任何-項所記載之排氣除害 裝置，其中具有因應從前述除塵機構排出之氣體壓力而可 改變風量的排氣機構。 (16) —種排氣除害裝置，係含有以成分之排氣的除害裝 置，具有排氣<燃燒處理機構；從燃燒處理所產生之燃燒 排氣中將含有Si粉塵予以除塵的除塵機構；及將前述燃燒 處理機構所導入之前述排氣，維持在不析出比在前述燃燒 處理機構更前階段可析出之析出物之溫度的機構。 (17) —種除塵裝置，係用於含有Si粉塵的除塵裝置，前 述除塵裝置由袋滤器所構成，且前述袋濾器之一構成部分 具有過濾器，前述過濾器之粉塵撣去機構，係具有對前述 過濾器供給壓縮氣體，同時對前述過濾器之外部，賦予從 前述過濾器表面近旁朝向粉末排出側的氣體流的氣體導入 機構。 (18) 如（17)項所記載之除塵裝置，其中前述除塵裝置 之粉塵排出口具有開閉式閥，於向前述過濾器進行粉塵集 塵時形成閉口，於賦予前述壓縮氣體及氣體流而進行粉塵 撣去時形成開口。 依據前述第（1)〜（7)及（9)〜（15)項之發明，由於可藉 著除塵步驟或除塵機構而去除含有Si粉塵，故可抑制在洗 淨步驟及機構所析出的析出物。因此可穩定地進行步驟及 裝置而減輕保養作業。 特別是除塵步驟及除塵機構使用袋濾器而能有效率地 捕捉0. 1〜1/zm左右之微細的Si〇2粒子。而且以過濾器之粉 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） (請先閲讀背面之注意事項再填寫各頁) .訂- 531436 A7 B7 五、發明説明（7 ) 塵撣去步驟加上供給壓縮氣體而賦予前述氣體流，乃能以 壓縮氣體有效地將浮游於粉塵機構内部之環境氣體中微細 的粉塵予以集塵·排出。又，藉著賦予該氣體流而將除塵 機構内置換成環境氣體而能形成易於捕捉含有Si粉塵的環 境。而且以因應該除塵後之氣體排出壓力之風量來排出， 而能確保總是可因應除塵步驟及機構之壓力損失的最適當 排出量。 在洗淨步驟及機構，洗淨用水以使用純水至硬度0範圍 的水，而能抑制洗淨步驟及機構或其後之步驟及機構產生 的含有Si析出物，能穩定地稼動而可簡略化保養作業。 又，依據前述（7)及（8)或（15)及（16)項之發明，導入燃燒 處理步驟及機構之排氣，藉著維持不會析出在比燃燒處理 步驟及機構前之階段可能析出之某析出物的溫度，而可避 免至燃燒處理步驟及機構之排氣配管中產生含有Si析出物 ，故能進行穩定的排氣除害步驟。 又，依據本發明之袋濾器，乃能有效地去除浮游在袋 濾器之殼體内之微細粒徑（特別是0.1〜1 μ m左右）的含有Si 粉塵。 【圖式之簡單說明】 第1圖係用以說明相關本發明之排氣除害裝置及排氣 除害方法的圖式。 ' 第2圖表示相關本發明之袋濾器。 第3圖表示相關本發明之第2實施樣態之排氣除害裝置 的概略。 • 10 · 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） (請先閲讀背面之注意事项再填窝表頁) •、訇丨 531436 A7 _______B7 五、發明説明（8 ) 第4圖表示相關本發明之第3實施樣態之排氣除害裝置 的概略。 第5圖表示習知排氣除害步驟。 【發明之最佳實施樣態】 以下詳細地說明本發明之實施樣態。 本發明之排氣除害方法、排氣除害裝置及除塵裝置均 可應用於含有Si成分排氣者。一般如此的排氣係發生於半 導體或液晶模組之製造步驟或裝置、特別是成膜步驟或成 膜裝置。因此本發明之排氣除害方法、排氣除害裝置及除 塵裝置期望適用於如此的步驟或裝置。特別是適用在成膜 步驟中，CVD、電漿CVD等氣相蒸著步驟或裝置所發生之 排氣時能明顯發揮其效果。 (實施樣態1) 第1圖表示相關本發明之排氣除害裝置及排氣除害方 法的概略圖。 除害裝置2具有燃燒處理機構4、除塵機構（裝置）14、 洗淨機構44。又，於第1圖中附隨記載著本除害裝置所裝著 或配置之薄膜等製造裝置，然而本實施樣態特別在於電漿 CVD成膜裝置。 燃燒處理機構4可利用習知公開的氧化燃燒裝置。從外 部供給燃燒用氣體，且以燃燒器供給火焰而以高熱燃燒並 氧化排氣成分。於燃燒處理機構4如之前所述，各種可燃系 列氣體（矽烷、氨、膦等）或助燃系列氣體（三氟化氣等）之 排氣’分別產生Si〇2(二氧化矽）、n〇2等所對應之元素的氧 ______ - 11 - 本紙張尺度適用中國國家標準（CNS) A4規格（2〗〇X297公爱） (請先閲讀背面之>±意事項再填窝衣頁} ·、ΤΓ— 531436 A7 _ B7_ 五、發明説明（9 ) 化物、水或氟等。因此燃燒排氣除了 Si02粒子之外，亦包 含此等各種燃燒排氣。 (請先閲讀背面之注意事项再填窝衣頁) 從燃燒處理機構4排出的燃燒排氣被導入除塵機構（裝 置）14。除塵機構（裝置）14可使用習知公知之各種除塵裝置 。例如能使用離心分離、洗滌器、袋濾器等，最好是袋濾 器。使用袋濾器的理由特別是0. 1〜1 // m左右之微粒子的除 塵效果高之故。 至於袋濾器乃有習知各種方式者。一般由過濾器來進 行粉塵撣去機構具有機械性振動方式、逆流洗淨方式、超 音波洗淨方式、逆噴方式、脈衝氣體方式等各種樣態，可 從此等方式之中因應設計事項内容而採用所要的方式。最 好是脈衝空氣方式的袋灑器。 第2圖表示於本發明在使用上較好之袋灑器的一例。通 常，脈衝空氣方式之袋灑器具有保持過濾器18之殼體16、 於殼體上部被區劃設置的上氣槽20、以及設於殼體下部的 集塵部30。而且本發明之除塵機構（裝置）14具有氣體導入機 構40。 於殼體16内適當地保持數條過濾器18，過濾器18通常 形成圓筒形的筒狀。過濾器18内部藉由管板21而連通著上 氣槽20的内部。 於殼體16之過濾器18的保持部位具有可從外部導入要 處理之燃燒排氣的導入部19。導入部19導入排氣時開口著 ，而於粉塵撣去時形成閉口。 上氣槽20係藉由殼體16及管板21而設置，藉著與過濾 -12 - 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 _____B7_ 五、發明説明（10 ) (諳先閱讀背面之生意事項再填窝衣頁) 器18内部連通而透過過濾器18而導入清淨化氣體，同時形 成可將壓縮氣體導入過濾器18内部的狀態。即，具有排出 經過濾器18除塵之清淨化氣體的排出部22、及對過濾器18 供給壓縮氣體的喷射裝置24。 排出部22於導入排氣而進行除塵時會開口，而於粉塵 撣去時會閉口。又，從外部供給壓縮氣體（壓縮空氣）至壓縮 空氣之喷射裝置24。壓縮氣體之供絡路徑上具有脈衝閥， 藉著脈衝閥的開閉而瞬間性地對過濾器18内部供給壓縮氣 體。而且雖然圖式未顯示，但是與供給壓縮氣體相同地能 導入使過濾器膨脹的引誘氣體至過濾器18内部。 又’於设體18之下部形成朝向下方而漸漸地使口徑變 小之錐狀的集塵部30。集塵部30之一部分且最好是在底部 具有粉塵排出部32，並連通於粉塵排出路徑36。 粉塵排出部32形成可手動或自動地控制該開閉。通常 具有開閉式閥34。 粉塵排出部32於導入燃燒排氣時閉口著，於粉塵撣去 時開口著。又，於粉塵撣去時在粉塵排出路徑36將搬送用 氣體（空氣）朝向排出方向導入。 因此，當粉塵撣去時粉塵排出部32開口的話，則殼體 16内之環境氣體會被一鼓作氣地從該排出部32抽向排出經 過路徑36側。即，從殼體16内將粉塵排出方向予以定向之 氣體流易被賦予於過濾器18之表面近旁。 而且除塵機構（裝置）14具有氣體導入機構4〇。氣體導 入機構40係可從外部將氣體導入殼體16内部之氣體導入裝 13 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 _B7___ 五、發明説明（11 ) 置。構成上並無特別限定。最好是可調整氣體導入量及氣 體導入時間等狀態。 (請先閱讀背面之注意事項再填寫本頁) 氣體導入機構40在殼體16内最妤是對應過濾器18之設 置部位而設置，以形成可將氣體供給至該部位的狀態。即 形成可從過濾器18的外側供給氣體。又，相對於過濾器18 不論是從其側方或從其上方，只要是能從過濾器之外側導 入氣體即可。由裝置之構成上而言，最好是構成能從過濾 器18之側方導入氣體。 氣體導入機構40於粉塵撣去時作動，粉塵排出部32為 開口狀態，而約與壓縮氣體噴射裝置24所形成之壓縮氣體 的噴射同時期地導入氣體。氣體之導入並無特別的限定， 惟係能藉著可控制開閉之開閉式閥的作動而控制者。導入 氣體並無特別限定，然而最好是空氣。 洸淨機構44乃可使用習知公知之排氣的液洗淨裝置。 通常利用可溶解的洗淨媒體（水性）而將排氣中的有害成分 溶解於洗淨媒體而予以除害，並能排出經淨化的氣體者。 有關該排氣處理機構乃可利用各種機構。排氣與洗淨 媒體之接觸形態可採用各種形態。可採用將排氣導入裝有 洗淨媒體的洗淨槽的方式，或是對於排氣以喷霧形式來供 給洗淨媒體的方式均可。 本發明最好是使用亦可去除排氣中的粉塵的機構。如 此一來，其理由乃能進一步確保後段的機構或步驟中能穩 定地稼動之故。有關該洗淨集塵機構，具體而言乃有洗淨 集塵裝置（scrubber)。由排氣與洗淨媒體之接觸形態而言乃 -14 - 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 _ B7_ 五、發明説明（12 ) (請先閲讀背面之注意事項再填寫衣頁) 可採用各種形態。最好是可採用以喷霧對排氣供給洗淨媒 體的方式（噴射洗滌器、喷霧塔、離心式集塵器、文丘里洗 滌器）、將氣體與洗淨媒體導入已充填了一定載體之塔的形 式（典型上為充填塔）等，而最好是充填塔。 至於洗淨機構44有關洗淨媒體最好是使用水。更好的 是使用硬度在10以下的軟水，特別好的是在純水至硬度0 範圍内的水。若是為該等水的話，即使於洗淨機構44内含 有Si成分亦可避免含有Si析出物的產生。該析出物在Si成分 (典型上為二氧化矽）及燃燒排氣所產生之氟酸之外，若是不 存在以鈣為首之周期表第1族〜第2族之金屬元素離子的話 則不會產生。該金屬元素離子為鈣、鈉、鉀等，典型上為 約。又，至於硬度在水100cm2中的氧化#5包含lmg時為1度 〇 又，通常氟酸等會產生於燃燒排氣中，因此洗淨媒體 最好是與氫化鈉等鹼性水溶液一同地供給。 其次說明以如此的洗淨機構44所進行之排氣除害步驟 。首先，供給至成膜裝置（形成薄膜裝置）之可燃系列氣體或 助燃系列氣體原原本本地，或供給水分而產生Si02並透過 捕集Si02之過濾器之後，通過排氣用配管而導入燃燒處理 機構4並進行燃燒處理步驟。 在燃燒處理步驟供給以燃燒性氣體或火焰所形成之高 溫而燃燒排氣中的可燃性氣體或助燃系列氣體。 其次燃燒排氣導入除塵機構（裝置）14而進行除塵步驟 。以除塵機構（裝置）14而經進行除塵之氣體，以比習知粉塵 15 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 _____B7_ 五、發明説明（I3 ) 量低的狀態導入洗淨機構44並進行洗淨步驟。 若是在除塵步驟中能有效地除塵的話，則在洗淨機構 中亦可不進行除塵。在洗淨機構同樣地進行除塵的話乃能 更有效果。 於洗淨步驟中，洗淨媒體係使用純水至硬度〇之範圍的 水’而即使於洗淨步驟不存在Si成分亦能有效避免產生析 出物，而可避免保養作業以確保穩定的運轉^ 以下特別說明使用第2圖所示之除塵機構（裝置）。 首先’除塵步驟係由集塵步驟及粉塵撣去步驟所構成 〇 於導入燃燒排氣時，排氣導入部19會開口，同時排出 部22亦會呈開口狀態。另一方面，於粉塵排出部32閥34被 關閉而呈閉口狀態。 在此狀態下被導入的燃燒排氣從過濾器18的外面向内 側通過而透過過濾器18内部及上氣槽20内部而從排出部22 被清淨化地排出。 於殼體16内由於集塵部30之粉塵排出部32呈開口狀態 ，因此會形成大部分微細的粒狀粉塵（典型上為〇·1〜 左右的氧化矽粒子）在殼體内浮游的狀態。 從排出部22來的排出壓力在一定以下或壓力損失在一 定以上的情形下，將停止集塵步驟而開始除塵步驟 '。在除 塵步驟之前，會停止導入燃燒排氣而使導入部19及排出部 22閉口。 除塵步驟係先開啟排出閥34而使集塵部30之粉塵排出 -16 - 本紙張尺度適用中國國家標準（CNS) A4規格（210X 297公釐） (請先閱讀背面之注意事項再填寫本頁) 訂— 531436 A7 _B7_ 五、發明説明（14 ) (請先閲讀背面之注意事項再填寫衣頁) 部32開口。此時在粉塵排出經路（經過路徑）36氣體會被供給 朝向粉塵的排出方向。因此會形成在殼體16内朝向下方的 氣體流，或是將容易地形成。即，容易形成從過濾器18的 表面近旁朝向粉塵排出方向之氣體流的狀態。 其次藉著調整壓縮氣體喷射裝置的闊而對過濾器18脈 波狀地供給氣體。在對過濾器18供給壓縮氣體之同時，或 是藉此設置時間間隔而作動氣體導入機構40,以從外側對 過濾器18表面供給外部氣體。 原本殼體16内構成易形成朝向粉塵排出方向之氣體流 ，然而更因此供給氣體而更強力地形成該氣體流。特別是 於過濾器18表面近旁可形成具有該方向性之穩定的氣體流 〇 藉由此氣體流可使浮游在殼體内的微粒粉塵從集塵部 30之排出部32排出。藉著該氣體流而置換殼體内的環境氣 體且由環境氣體排出微粒粉塵。 除塵機構（裝置）14於導入燃燒排氣時，排出部32為開口 狀態而排出浮游在殼體内的微粒粉塵的能力低，而使浮游 粉塵會蓄積於集塵步驟中，惟於粉塵撣去步驟中附著於過 濾器18之粉塵會一起從殼體16内排出。藉由如此的排出形 態而相輔相乘地從過濾器18及環境氣體良好地排出粉塵。 依據如此的除塵機構（裝置）14,乃能有效地從燃燒排氣 除塵。不僅可減少除塵機構（裝置）14或步驟，且能減輕後段 的處理機構或步驟中的保養而能確保穩定的稼動。特別因 能排除微細氧化矽粒子，故能達到除塵機構（裝置）14之過濾 17 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 _B7_ 五、發明説明（15 ) 品的長使用壽命，同時能有效地避免在後段之洗淨機構或 步驟中產生析出物。 (請先閱讀背面之注意事項再填寫本頁) 又，於實施樣態1之除塵機構（裝置）或步驟中所分離排 出之粉塵可藉著另外的集塵機構或步驟而集塵。集塵可依 據習知公知的方法來進行。 又，檢知（檢測得知）除塵機構（裝置）或步驟所產生的清 淨化氣體的壓力，而依據此檢知之壓力在排出機構上最好 是典型上可調整排出用吹射器之風量。藉著供給因應過濾 器之壓力損失的風量而排出清淨化氣體，而能達到集塵步 驟之連轉成本及設置成本之至少一方的省力化。又，清淨 化氣體之組成亦穩定化。 (實施樣態2) 其次說明本發明之其他實施樣態。 實施樣態2之排氣除害裝置或步驟特別係有關從成膜 裝置導入燃燒處理機構的排氣。 成膜裝置内的殘留矽（Si)於成膜後乃有被供給NF3等潔 淨氣體而形成SIF4的情形。亦有構成該氣體原原本本地當 作排氣或是從排氣系統除去的情形。 在實施樣態2不論係將該氣體與排氣一同排出，或是否 排出於系統之外，乃能運用於具有潔淨機構或步驟之成膜 裝置或步驟者。 ' 依據第3圖來說明實施樣態2之一例。在具有潔淨機構 之成膜裝置，以潔淨步驟所產生之SiF4氣體之潔淨排氣乃 原原本本地，或藉由系統外排出機構而導入燃燒處理機構 -18 - 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 _B7_ 五、發明説明（16 ) 。於第3圖所示之成膜裝置52固然表示了具有系統外排出機 構54，惟本實施樣態不一定必要具有該排出機構54。 (請先閲讀背面之注意事項再填窝本頁) 系統外排出機構54對於從成膜裝置42之處理室抽引的 潔淨排氣供給冷卻水，並使SiF4與水反應而析出Si02甚至是 氟化氫化合物，.並以過濾器來捕捉此等析出物者。 但是即使是具有如此的機構5 4亦無法完全地捕捉此等 析出物，又，同時亦會有所產生之氟酸或SiF4本身原就這 、/ 樣地通過過濾器的情形。 又，即便是不具有該排出機構54，排氣亦會有從成膜 裝置52排出而到達燃處理機構64之間會被冷卻而使水蒸氣 液化，藉此同樣的析出物會產生氟酸的情形。 在實施樣態2如第3圖所示，具有可將從成膜裝置52至 燃燒處理機構64之配管55内維持不會析出可被析出之析出 物之溫度的機構56。在此說明所謂可被析出之析出物乃意 味著從排氣於該成膜系統中所預測之析出物。 該機構56亦可為積極地加溫配管的機構，又亦可為將 〜 排氣之溫度予以保溫而維持在一定溫度的機構，或亦可為 具有此等機構雙方。 加溫機構，可例示如對配管55供給經加溫之氣體、或 是設置於配管55之外部或内部的加溫機構。第3圖所示之樣 態表示對配管55供給經加溫之氣體的機構56與設於龁管55 周圍的加溫機構5 7。 於對配管55内供給經加溫氣體的機構56，其氣體有必 要為非活性氣體，典型上為使用氮氣。又，外部加溫機構 -19 - 本紙張尺度適用中國國家標準（CNS) A4規格(210X297公釐） 531436 A7 I-------- B7 五、發明説明（17 ) s·—- ------S. 57亦可僅為加熱源’又，亦可兼具加熱源與保溫構件雙方 者。加熱源或保溫可不特別限定使用。 (請先閱讀背面之注意事項再填寫本頁) X ’採用將排出之氣體之溫度予以保溫之保溫機構中 祕溫構件並不㈣限定而可使用各種樣態。 冑著此等加溫機L溫機構所騎之配管55内的溫 纟，係在避免析出可預測之析出物方面為有效的溫度。，现 所預測之析出物依排氣成分或潔淨氣體而不同，惟若 A發生在生成Si膜時之含有si成分排氣的情形下，典型上為 魏化合物1別是可燃系列氣體中使用我、氨而在助 m體中使用nf3之氟氣體的情形下，則可預測為石夕氣化 銨（（NH4)2SiF6) 〇 矽氟化銨之析出（昇華）溫度為137〇c，因此藉著將配管 55内維持在超過此溫度而可避免此化合物的析出。最好是 150°C以上。 又，從成膜裝置54至燃燒處理機構64的配管55 ,最好 疋其整體以溫度維持機構來維持溫度。特別是從成膜裝置 | 排出之部位及其近旁之配管部位係急劇地降低排氣溫度的 部位，因此最好是包含該部位而維持溫度。 依據實施樣態2之排氣除害裝置或步驟，由於在從成膜 裝置54至燃燒處理機構64之配管具備有溫度維持機構，故 能抑制在該配管部位析出析出物，而可減輕保養作業，又 可避免使用洗淨劑之危險而提昇安全性。 而且，在燃燒處理機構或步驟之後段所具有之除塵機 構（裝置）或步驟中可減輕去除除塵的負擔。 -20 - 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） 531436 A7 B7 五、發明説明（18 ) 又，於實施樣態2特別已說明了從成膜裝置54至燃燒處 理機構64之間的配管、以及供給至燃燒處理步驟的排氣， 然而，本實施樣態當然亦可應用於第1實施樣態所包含之各 種樣態之裝置2或步驟。特別是袋濾器之除塵機構或除塵裝 置，尤其是使用以可進行以氣體導入機構40來進行之粉塵 撣去步驟之袋濾器的除塵機構或除塵裝置時，即便是在成 膜裝置54不具有系統外排出機構，亦可在達到燃燒處理機 構之前有效地防止析出物，而且可藉著除塵機構（裝置）有 效地除塵。 (實施樣態3) 其次說明本發明之實施樣態3。 於實施樣態3特別在除塵機構或步驟至少具備有m台（m 為3以上的整數）的除塵機構，各個除塵機構分別以至少1台 的除塵機構進行粉塵撣去步驟，最大以（m — 1)台的除塵機 構進行集塵步驟的方式切換使用。又，m宜為6台以下，最 好是3台。 參照第4圖來說明實施樣態3之一例。 於第4圖中以3台的除塵機構74、76及78構成除塵機構 11。 於實施樣態3之除塵機構74、76及78可各別使用公知的 除塵裝置，然而較好者是全部的除塵機構為袋濾器形式， 而粉塵撣去機構最好是脈衝氣體方式的袋濾器。而且，最 好是對過濾器供給壓縮氣體之同時，相對於過濾器的外部 從過濾器表面近旁可形成指向（定向）於粉塵排出側之氣流 21 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐〉 (請先閱讀背面之注意事項再填窝衣頁) .訂· # 531436 A7 _B7_ 五、發明説明（19 ) 的袋濾器。本實施樣態所適用之最佳樣態係實施樣態1所明 白表示的樣態。 (請先閱讀背面之注意事項再填寫衣頁) 至少3台除塵機構74、76及78相對於燃燒排氣之供給經 過路徑呈並列（聯）地配列。而連結於燃燒處理機構之燃燒排 氣的供結經過路徑可對應各除塵機構74、76及78而分支（分 路），且於經分支之配管具備有可調節燃燒排氣之供給量及 有無供給氣體的閥84、86及88。而且分別具備有從除塵機 構74、76及78被清淨化之氣體的排出用配管，以及可調節 排氣的闊94、96及98。 即使例如各除塵機構74、76及78之其中1台除塵機構進 行粉塵撣去步驟或進行保養，仿能以其他2台或1台來確保 必要的除塵能力。 所具備之m台各除塵機構最好分別具有相同的除塵能 力，即，最好是具有相同過濾面積。於本實施樣態各除塵 機構74、76及78最好分別具有相同的除塵能力，即，最好 是設計成相同過濾面積。 同時最好是最大（m — 1)台（最好是（m — 1)台）設計成必 要的除塵能力，即，最好是設計成可確保全過濾面積。因 此，於本實施樣態將各除塵機構設成必要的除塵能力（過濾 面積）為1時，則分別具有0.5的除塵能力（過濾面積），而整 體具有1.5的除塵能力（過濾面積）。即，以2台（m= 3時之（m 一 1))具有必要的除塵能力。 其次說明使用如此構成之除塵機構（裝置）32而進行之 燃燒排氣的除塵步驟。 -22 - 本紙張尺度適用中國國家標準（CNS) A4規格（210 X 297公釐） 531436 A7 _B7__ 五、發明説明（20 ) (請先閲讀背面之注意事項再填寫本頁) 第3圖中，從燃燒處理機構導入的燃燒排氣被導入除塵 機構76、78而進行除塵步驟。因此閥84、94為關閉狀態， 閥86、88、96及98呈開啟狀態。 此情形下，除塵機構76、78分別或是協動而具有一定 的除塵能力，故可進行適切的除塵步驟。在任何一方的除 塵機構（裝置）罔有必要的除塵能力的情形下亦可以1台稼動 〇 另一方面，除塵機構（裝置）74的使用會超過必要的除塵 能力，因此因應必要而於該除塵機構（裝置）7 4能進行粉塵撣 落步驟或保養。 而且，除塵機構（裝置）76及78之其中任何之一超過一定 壓力損失等情形而發生須要停止稼動事態的話，則停止對 該除塵機構導入燃燒排氣，並進行粉塵撣落步驟或保養， 而開始對對除塵機構（裝置）74導入燃燒排氣以進行除塵步 0 如此一來，具有多數除塵機構而於其一部分具有必要 的除塵能力時，藉著將所剩餘的除塵機構使用於粉塵撣落 步驟，即使是將習知運轉至除塵機構之壓力損失的容許範 圍而在粉塵撣落步驟或保養所須要時間儘可能變少，亦可 因應必要而容易地進行粉塵撣落步驟或保養。因此，可經 常以低壓力損失的狀態穩定地運轉，且達到穩定的除塵， 而形成能夠排出穩定組成的清淨化氣體。 特別是於實施樣態3，將全部的除塵機構m台設成全部 相同的除塵能力，而以（m—1)台具備必要的除塵能力，因 23 本紙張尺度適用中國國家標準（CNS) A4規格（210 X 297公釐） 531436 A7 ______B7____ 五、發明説明（21 ) 此整體能以最小限度的全除塵能力進行有效率的除塵步驟 。即，至少以1台除塵機構進行粉塵撣落步驟，而以最大 一 1)台除塵機構進行集塵步驟那樣地交替使用乃能維持低 壓力損失而能進行有效率且良好的除塵步驟。 又’當然亦可因應必要而使用超越除塵能力之除塵機 構而與其他除塵機構同時地進行除塵步驟。 在實施樣態3特別說明了除塵步驟及步驟，惟實施樣態 3之除塵步驟及步驟乃可應用於實施樣態或實施樣態2所包 含之各種樣態。 特別是實施樣態2所說明之藉著具有對應除塵機構所 排出之清淨化氣體壓力而可變化風量之拙出用送風器，而 能以最適當的壓力狀態進行除塵步驟，尤其是能以節省成 本的狀態來進行集塵步驟。 以上雖已說明了各種貫施樣態，然而本發明並非限定 於此等實施樣態，而係包含申請專利範圍所記載之範圍内 的樣態。又，申請專利範圍内所包含之樣態中的各機構及 步驟乃包含上述實施樣態中具體說明的樣態。 【產業上的利用性】 依據本發明乃能減輕對於在半導體或液晶模組等製造 裝置所發生的排氣除害步驟的保養作業，或是能提高其作 業的安全性，因此具有極大的工業上價值。 、 【元件標號對照】 2 除害裝置 4 燃燒處理機構 _ - 24 - 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐） ί請先閱讀背面之注意事項再填寫本頁) •、-J- 531436 A7 _B7五、發明説明（22 ) 14 除塵機構（裝置） 16 殼體 18 過濾器 19 導入部 20 上氣槽 21 管板 22 排出部 24 噴射裝置 30 集塵部 32 粉塵排出部 34 開閉式閥 36 粉塵排出路徑 40 氣體導入機構 44 洗淨機構 52 成膜裝置 54 排出機構 55 配管 56 供給經加溫之氣體的機構 57 加溫機構 64 燃處理機構 74、76、78 除塵機構 86 、 88 、 94 、 96 、 98 閥 25 (請先閲讀背面之注意事項再填窝本頁) /^丨 0, 本紙張尺度適用中國國家標準（CNS) A4規格（210X297公釐）This paper size applies to Chinese National Standard (CNS) A4 (210X 297 mm) 531436 Description of the invention (fluorination records are due to Si02 and gas acid in the exhaust gas) and ammonia. 〃As these precipitates can be found in the exhaust gas, please read the precautions on the back before writing this page. The cleaning type dust collection mechanism cannot efficiently collect Si〇2 and will Residues remain in the interior, and in the front section of the combustion dust collection mechanism, the grasping and removing mechanism cannot effectively function, and cannot capture Si02 produced by the chemical reaction with water, so that it will leak into the exhaust gas. It is also known that especially in the cleaning type dust collector, fine particles with a particle size of G.H- range are easily left, and the dust collection rate is only about 50%. In the exhaust treatment step, although the Si removal mechanism after the film forming device and the cleaning type dust collector after the combustion type & damage mechanism are only available, the Si component (SiH4, SiF4, Si02) cannot be effectively used. The situation of capture is unexpected for the operators. In addition, the present inventors have discovered that Ca < Chendunan > in treated water will promote the generation of precipitates and leave & components. From the above-mentioned circumstances, the present inventors have discovered that the problem of the present invention described above can be solved by installing a dust removal mechanism (device) in front of the cleaning type dust collection mechanism, and the inventors found that the present invention The problem is solved by maintaining the inside of the piping of the film forming device to the combustion-type detoxification mechanism at a temperature at which no precipitates can be deposited at the site. That is, the gist of the present invention is as described below. (1) An exhaust gas removal method, which is a method for removing exhaust gas containing Si component, and has a combustion treatment step for exhaust gas; a dust removal step for removing dust containing Si from the combustion exhaust gas generated by the combustion treatment; And a washing step of washing the dust-exhausted combustion exhaust gas with water. (2) The exhaust gas detoxification method as described in item (1), in which the paper size of the aforementioned dust removal step is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 531436 A7 ______B7 V. Description of the invention (4) ^ " '一 ~-The bag filter is used as the dust removal mechanism (device) in the step. (3) The exhaust gas detoxification method as described in item (2), wherein the dust removal mechanism (device) has a register in its dust removal path, and in the dust removal (falling) step of the dust from the dust removal mechanism (device) A compressed gas is supplied to the filter, and at the same time, a gas flow is provided from the vicinity of the surface of the filter toward the powder discharge side to the outside of the filter. (4) The exhaust gas detoxification method as described in (2) or (3), wherein in the aforementioned dust removal step, there is at least !! (111 is an integer of 3 or more) dust removal mechanisms, and each dust removal mechanism (device) ) The dust removal step is performed by at least i dust removal mechanisms (devices), and the maximum is switched by (m-D dust removal mechanism (device) dust collection steps.) (5) Such as (1) ~ (4 The exhaust gas detoxification method according to item), wherein the gas removed by the foregoing dust removal step is discharged with an air volume in accordance with the exhaust pressure of the gas. (6) As described in any one of items (1) to (5) The exhaust gas detoxification method, wherein the washing water introduced in the aforementioned washing step uses pure water to a hardness of 0. (7) The exhaust gas removal according to any one of the items (1) to (6) Hazardous method, wherein the exhaust gas introduced in the combustion treatment step is maintained at a temperature that does not precipitate precipitates that can be precipitated at a more advanced stage than the combustion treatment step. (8) An exhaust gas elimination method, which contains Exhaust gas elimination method with component, with exhaust gas combustion treatment Step; the dust removal step of removing Si-containing dust from the combustion exhaust gas generated by the combustion treatment; and the paper size of the aforementioned combustion site applies the Chinese National Standard (CNS) A4 specification (2) 〇χ297 公 爱 f Please read first Note on the back, then fill in the nest sheet) • ^ · 531436 A7 --- _ B7 V. Description of the invention (5) The aforementioned exhaust gas introduced in the processing step is maintained without precipitation than before the aforementioned combustion treatment step The temperature of the precipitates that can be precipitated in the stage. Ί Please read the precautions on the back before filling in this page} (9) An exhaust gas detoxification device, which is an exhaust gas detoxification device containing si component, with combustion of exhaust gas Treatment mechanism; dust removal mechanism that removes Si-containing dust from the combustion exhaust gas generated by the combustion treatment; and cleaning mechanism that water-cleans the dust-exhausted combustion exhaust gas. (10) As described in item (9) In the exhaust gas detoxification device, a bag filter is used as a dust removal mechanism in the aforementioned dust removal step. (11) The exhaust gas detoxification device according to item (10), wherein a filter is provided in the passage of the bag filter And right The filter supplies compressed gas, and also has an introduction mechanism for imparting a gas flow from the vicinity of the filter surface to the powder discharge side to the outside of the filter. (12) The row as described in (10) or (11) Gas detoxification device, in the aforementioned dust removal mechanism, there are at least m dust removal mechanisms (m is an integer of 3 or more), each dust removal mechanism uses at least one dust removal mechanism to perform the dust removal step, and the maximum is (m —L) The dust-removal mechanism (device) of the platform is switched to use the method of dust collection. (13) The exhaust gas-removal device described in any one of (9) to (12), in which the aforementioned cleaning mechanism The water used for the introduction was pure water to a hardness of 0. (14) The exhaust gas detoxification device according to any one of (9) to (13), wherein the exhaust gas introduced by the aforementioned combustion processing mechanism is maintained in a state where it does not precipitate more than the aforementioned combustion processing mechanism The temperature of the precipitates that can be precipitated in the stage. This paper size applies to China National Standard (CNS) A4 specification (210X 297 mm) 531436 A7 ___B7 V. Description of the invention (6) ^ " (15) As described in any one of (9) to (14) The exhaust gas elimination device includes an exhaust mechanism which can change the air volume according to the pressure of the gas discharged from the dust removal mechanism. (16) An exhaust hazard-removing device containing a component-based exhaust hazard-removing device < combustion processing mechanism; a dedusting mechanism for removing Si-containing dust from combustion exhaust gas generated by combustion processing; and the aforementioned exhaust gas introduced by the aforementioned combustion processing mechanism is maintained at a non-precipitating state than in the aforementioned combustion processing mechanism The mechanism of the temperature of the precipitates that can be precipitated in the previous stage. (17) A kind of dust removal device, which is used for a dust removal device containing Si dust. The dust removal device is composed of a bag filter, and one of the constituent parts of the bag filter has a filter. The dust removal mechanism of the filter has A compressed gas is supplied to the filter, and at the same time, a gas introduction mechanism is provided to the outside of the filter and a gas flow is provided from the vicinity of the filter surface toward the powder discharge side. (18) The dust-removing device according to item (17), wherein the dust discharge port of the dust-removing device has an open-close valve, which is closed when dust is collected from the filter, and is performed by applying the compressed gas and gas flow. Openings occur when dust is removed. According to the inventions of the aforementioned items (1) to (7) and (9) to (15), since Si-containing dust can be removed by a dust removing step or a dust removing mechanism, the precipitation in the cleaning step and the mechanism can be suppressed. Thing. Therefore, the steps and equipment can be performed stably and maintenance work can be reduced. In particular, the dust removal step and the dust removal mechanism use a bag filter to efficiently capture fine Si0 2 particles of about 0.1 to 1 / zm. And the paper size of the filter is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) (please read the precautions on the back before filling in each page). Order-531436 A7 B7 V. Description of the invention (7) Dust The step of removing and adding the compressed gas to the aforementioned gas flow can effectively collect and discharge fine dust in the ambient gas floating inside the dust mechanism with the compressed gas. In addition, by providing this gas flow, the inside of the dust removal mechanism is replaced with an ambient gas, thereby making it possible to create an environment in which Si dust is easily captured. Moreover, it is discharged according to the air volume corresponding to the gas discharge pressure after dust removal, and it is possible to ensure the most appropriate discharge volume that can always respond to the pressure loss of the dust removal step and mechanism. In the washing step and mechanism, pure water is used to clean water to a hardness of 0, and the Si-containing precipitates generated in the washing step and mechanism or in subsequent steps and mechanisms can be stably moved and can be simplified. Maintenance work. In addition, according to the inventions of the aforementioned (7) and (8) or (15) and (16), the exhaust gas of the combustion treatment step and the mechanism is introduced, and by maintaining the non-precipitation, it is more likely than the combustion treatment step and the mechanism before The temperature of a certain precipitate to be precipitated can avoid the occurrence of Si-containing precipitates in the exhaust piping to the combustion treatment step and the mechanism, so that a stable exhaust gas removal step can be performed. In addition, the bag filter according to the present invention can effectively remove Si-containing dust having a fine particle size (especially about 0.1 to 1 μm) floating in the case of the bag filter. [Brief description of the drawings] FIG. 1 is a diagram for explaining an exhaust gas elimination device and an exhaust gas elimination method of the present invention. 'Figure 2 shows a bag filter according to the present invention. Fig. 3 shows the outline of an exhaust gas elimination device according to a second embodiment of the present invention. • 10 · This paper size is in accordance with Chinese National Standard (CNS) A4 (210X297 mm) (Please read the precautions on the back before filling the nest sheet) • 訇 531436 A7 _______B7 V. Description of the invention (8) Section 4 The figure shows an outline of an exhaust gas elimination device according to a third embodiment of the present invention. Fig. 5 shows a conventional exhaust gas elimination step. [Best Embodiment of the Invention] The embodiment of the present invention will be described in detail below. The exhaust gas detoxification method, the exhaust gas detoxification device, and the dust removal device of the present invention can all be applied to an exhaust gas containing a Si component. Such exhaust gas generally occurs in a manufacturing step or device of a semiconductor or a liquid crystal module, especially a film forming step or a film forming device. Therefore, it is desirable that the exhaust gas detoxification method, exhaust gas detoxification device, and dust removal device of the present invention are applicable to such steps or devices. In particular, it is applicable to the vapor deposition step such as CVD and plasma CVD during the film formation step or the exhaust gas generated in the device can obviously exert its effect. (Embodiment Mode 1) Fig. 1 is a schematic diagram showing an exhaust gas elimination device and an exhaust gas elimination method according to the present invention. The detoxification device 2 includes a combustion treatment mechanism 4, a dust removal mechanism (apparatus) 14, and a cleaning mechanism 44. In addition, in the first figure, a manufacturing apparatus such as a thin film mounted or arranged on the detoxification apparatus is described. However, this embodiment is particularly a plasma CVD film forming apparatus. As the combustion treatment mechanism 4, a conventionally disclosed oxidation combustion device can be used. The combustion gas is supplied from the outside, and the flame is supplied by a burner to burn with high heat and oxidize exhaust components. In the combustion treatment mechanism 4 as described above, the exhaust gases of various combustible series gases (silane, ammonia, phosphine, etc.) or combustion-supporting series gases (trifluoride gas, etc.) generate Si02 (silicon dioxide) and n〇, respectively. Oxygen corresponding to element 2 etc. ______-11-This paper size is applicable to Chinese National Standard (CNS) A4 specifications (2) 〇297297 love (please read the > ± intentions on the back before filling the nesting page) ·, ΤΓ— 531436 A7 _ B7_ V. Description of the invention (9) Chemical compounds, water or fluorine, etc. Therefore, in addition to Si02 particles, the combustion exhaust gas also includes these various combustion exhaust gases. (Please read the precautions on the back before reading) Filler sheet) Combustion exhaust gas discharged from the combustion treatment mechanism 4 is introduced into a dust removal mechanism (device) 14. Various dust removal devices known in the art can be used as the dust removal mechanism (device) 14. For example, centrifugal separation, a scrubber, and a bag can be used. Filters, etc., are preferably bag filters. The reason for using a bag filter is particularly 0.1 to 1 // m. The fine dust removal effect is high. As for the bag filter, there are various methods known. Generally, the filter comes from the filter. The dust removal mechanism has Various modes such as mechanical vibration method, counter-current cleaning method, ultrasonic cleaning method, reverse spray method, and pulse gas method can be used from these methods according to the design matters. The pulse air method is preferred Figure 2 shows an example of a bag sprinkler that is better in use in the present invention. Generally, a pulse air bag sprinkler has a housing 16 that holds a filter 18, and is arranged on the upper part of the housing. The upper air tank 20 and the dust collecting part 30 provided in the lower part of the casing. The dust removing mechanism (apparatus) 14 of the present invention includes a gas introduction mechanism 40. A plurality of filters 18 and filters are appropriately held in the casing 16. 18 is generally formed into a cylindrical shape. The inside of the filter 18 communicates with the inside of the upper air tank 20 through the tube sheet 21. The holding portion of the filter 18 in the housing 16 has a combustion exhaust pipe which can be introduced from the outside to be processed. The gas introduction part 19. The introduction part 19 is open when introducing the exhaust gas, and forms a closed mouth when dust is removed. The upper air tank 20 is provided by the casing 16 and the tube sheet 21, and is filtered through Paper size applicable to China Standard (CNS) A4 (210X297 mm) 531436 A7 _____B7_ V. Description of the invention (10) (谙 Read the business matters on the back before filling the nesting page) The inside of the device 18 communicates with the purge gas through the filter 18, At the same time, a state in which the compressed gas can be introduced into the filter 18 is formed. That is, the compressed gas is provided with a discharge unit 22 that discharges the cleaned gas removed by the filter 18 and an injection device 24 that supplies the compressed gas to the filter 18. The discharge unit 22 When the dust is removed by air, it is opened and closed when the dust is removed. In addition, compressed air (compressed air) is supplied to the compressed air injection device 24 from the outside. A pulse valve is provided in the compressed gas supply path, and the compressed gas is supplied to the inside of the filter 18 momentarily by opening and closing the pulse valve. Also, although not shown in the drawing, it is possible to introduce the attractant gas which expands the filter into the inside of the filter 18 in the same way as supplying the compressed gas. Further, a tapered dust collecting portion 30 is formed on the lower portion of the body 18 so as to gradually decrease its diameter toward the lower side. A part of the dust collecting section 30 preferably has a dust discharging section 32 at the bottom and communicates with the dust discharging path 36. The dust discharge portion 32 is formed so that the opening and closing can be controlled manually or automatically. It usually has an on-off valve 34. The dust discharge portion 32 is closed when the combustion exhaust gas is introduced, and is opened when the dust is removed. When dust is removed, the transportation gas (air) is introduced in the dust discharge path 36 in the discharge direction. Therefore, when the dust discharge portion 32 is opened when the dust is removed, the ambient gas in the casing 16 is pumped from the discharge portion 32 to the discharge passage 36 side in a blast. That is, a gas flow that orients the dust discharge direction from inside the casing 16 is easily given near the surface of the filter 18. The dust removal mechanism (apparatus) 14 includes a gas introduction mechanism 40. The gas introduction mechanism 40 is a gas introduction device that can introduce gas into the inside of the casing 16 from the outside. 13 This paper size applies to the Chinese National Standard (CNS) A4 specification (210X297 mm) 531436 A7 _B7___ 5. Description of the invention (11). There is no particular limitation on the constitution. It is desirable to be able to adjust the gas introduction amount and gas introduction time. (Please read the precautions on the back before filling in this page.) The gas introduction mechanism 40 is installed in the housing 16 corresponding to the installation location of the filter 18 so that the gas can be supplied to this location. That is, a gas can be supplied from the outside of the filter 18. In addition, as long as the filter 18 can be introduced from the outside of the filter, either from its side or from above. In terms of the structure of the device, it is preferable that the device can be configured to introduce gas from the side of the filter 18. The gas introduction mechanism 40 operates when the dust is removed, and the dust discharge portion 32 is opened, and the gas is introduced at about the same time as the injection of the compressed gas formed by the compressed gas injection device 24. The introduction of gas is not particularly limited, but it can be controlled by the operation of an on-off valve that can control opening and closing. The introduction gas is not particularly limited, but it is preferably air. The cleaning mechanism 44 is a liquid cleaning device that can use a conventionally known exhaust gas. Dissolved harmful components in the exhaust gas are usually dissolved in the cleaning medium (aqueous) to dissolve them, and the purified gas can be discharged. As the exhaust treatment mechanism, various mechanisms can be used. Various forms of contact between the exhaust gas and the cleaning medium are possible. The exhaust gas may be introduced into a washing tank containing a cleaning medium, or the exhaust gas may be supplied to the cleaning medium in a spray form. In the present invention, it is preferable to use a mechanism that can also remove dust from the exhaust gas. The reason for this is to further ensure that the mechanism or steps in the later stages can be stably moved. The cleaning and dust collecting mechanism specifically includes a cleaning dust collecting device (scrubber). In terms of the contact form between the exhaust gas and the cleaning medium, it is -14-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 531436 A7 _ B7_ V. Description of the invention (12) (Please read the back Note: Please fill in the clothing page) Various forms are available. It is best to use a method of supplying the cleaning medium by spraying the exhaust gas (jet scrubber, spray tower, centrifugal dust collector, Venturi scrubber), and introducing the gas and the cleaning medium into a certain carrier. The form of the tower (typically a packed tower), etc., is preferably a packed tower. As for the cleaning medium 44 regarding the cleaning medium, water is preferably used. It is better to use soft water with a hardness of 10 or less, and particularly preferred is water in the range of pure water to 0 hardness. In the case of such water, even if the Si component is contained in the cleaning mechanism 44, the generation of Si-containing precipitates can be avoided. In addition to the Si component (typically silicon dioxide) and the fluoric acid generated by the combustion exhaust gas, this precipitate will not be present if there are no metal element ions from Groups 1 to 2 of the periodic table, including calcium. produce. The metal element ions are calcium, sodium, potassium, and the like, and are typically about. In addition, the oxidation # 5 with a hardness of 100 cm2 in water is 1 degree when 1 mg is contained. Usually, fluoric acid and the like are generated in the combustion exhaust gas. Therefore, the cleaning medium is preferably supplied together with an alkaline aqueous solution such as sodium hydride. . Next, the exhaust gas detoxification steps performed by such a cleaning mechanism 44 will be described. First, the combustible series gas or the combustion-supporting series gas supplied to the film-forming device (thin-film forming device) is supplied locally, or is supplied with moisture to generate Si02 and passes through the filter that captures Si02, and then is introduced into the combustion processing mechanism through an exhaust pipe 4 And carry out the combustion treatment step. In the combustion treatment step, the combustible gas or combustion-supporting gas in the exhaust gas is burned with the high temperature formed by the combustible gas or flame. Next, the combustion exhaust gas is introduced into a dust removal mechanism (device) 14 to perform a dust removal step. The dust-removing gas is removed by the dust-removing mechanism (device) 14. The standard of the paper is 15 than the conventional dust. This paper applies the Chinese National Standard (CNS) A4 specification (210X297 mm). 531436 A7 _____B7_ V. Low quantity of invention description The state is introduced into the washing mechanism 44 and a washing step is performed. If dust can be effectively removed in the dust removal step, dust removal may not be performed in the cleaning mechanism. It is more effective to perform dust removal in the same way as in the cleaning mechanism. In the cleaning step, the cleaning medium uses water in the range of pure water to a hardness of 0 ', and even if there is no Si component in the cleaning step, it can effectively avoid the generation of precipitates, and maintenance work can be avoided to ensure stable operation ^ The use of the dust removal mechanism (apparatus) shown in Fig. 2 will be specifically explained below. First, the dust removal step is composed of a dust collection step and a dust removal step. When the combustion exhaust gas is introduced, the exhaust gas introduction portion 19 is opened, and at the same time, the discharge portion 22 is also opened. On the other hand, the valve 34 in the dust discharge portion 32 is closed and closed. The combustion exhaust gas introduced in this state passes from the outside of the filter 18 to the inside, passes through the inside of the filter 18 and the inside of the upper air tank 20, and is cleanly discharged from the discharge portion 22. Since the dust discharge portion 32 of the dust collecting portion 30 is opened in the casing 16, most of fine particulate dust (typically, silicon oxide particles of about 0.1 to 1) floats in the casing. . When the discharge pressure from the discharge unit 22 is less than or equal to a certain value or the pressure loss is more than a certain value, the dust collection step is stopped and the dust removal step is started. Prior to the dust removal step, the introduction of combustion exhaust gas is stopped and the introduction portion 19 and the discharge portion 22 are closed. The dust removal step is to open the discharge valve 34 first to discharge the dust from the dust collection unit -16.-This paper size applies to China National Standard (CNS) A4 (210X 297 mm) (Please read the precautions on the back before filling this page ) Order — 531436 A7 _B7_ V. Description of the invention (14) (Please read the precautions on the back before filling in the clothing page) The section 32 is open. At this time, the gas is supplied in the dust discharge path (passing path) 36 toward the direction of dust discharge. As a result, a downwardly-directed gas flow is formed in the housing 16 or will be easily formed. That is, it is easy to form a state of a gas flow from the vicinity of the surface of the filter 18 toward the dust discharge direction. Next, by adjusting the width of the compressed gas injection device, gas is supplied to the filter 18 in a pulsed manner. When the compressed gas is supplied to the filter 18, the gas introduction mechanism 40 is activated by setting a time interval to supply external air to the surface of the filter 18 from the outside. Originally, a gas flow is easily formed in the casing 16 in the direction of dust discharge. However, the gas flow is more strongly formed by supplying the gas. In particular, a stable gas flow having this directivity can be formed near the surface of the filter 18. By this gas flow, particulate dust floating in the casing can be discharged from the discharge portion 32 of the dust collection portion 30. By this gas flow, the ambient gas in the casing is replaced, and particulate dust is discharged from the ambient gas. When the dust removal mechanism (device) 14 introduces the combustion exhaust gas, the discharge unit 32 is in an open state and has a low ability to discharge the particulate dust floating in the casing, so that the floating dust will be accumulated in the dust collection step, but the dust is removed. The dust attached to the filter 18 in the step is discharged from the casing 16 together. With such a discharge form, dust is discharged from the filter 18 and the ambient gas in a complementary manner. According to such a dust removing mechanism (device) 14, dust can be effectively removed from the combustion exhaust gas. Not only can the dust removal mechanism (apparatus) 14 or steps be reduced, but also the maintenance in the subsequent processing mechanism or steps can be reduced to ensure stable crop movement. In particular, because it can exclude fine silicon oxide particles, it can reach the filtration of the dust removal mechanism (device) 14 17 The paper size is applicable to China National Standard (CNS) A4 specifications (210X297 mm) 531436 A7 _B7_ V. Description of the invention (15) It has a long service life and can effectively avoid the formation of precipitates in the cleaning mechanism or steps in the later stage. (Please read the precautions on the back before filling this page.) In addition, the dust separated and discharged in the dust removal mechanism (device) or step of implementation mode 1 can be collected by another dust collection mechanism or step. Dust collection can be performed in accordance with conventional methods. In addition, the pressure of the purge gas generated by the dust removal mechanism (device) or step is detected (detected), and it is preferable that the pressure of the discharge mechanism based on the detected pressure is typically capable of adjusting the air volume of the ejector for discharge. By supplying the air volume in response to the pressure loss of the filter and discharging the purge gas, it is possible to achieve at least one of the continuous conversion cost of the dust collection step and the installation cost. Also, the composition of the cleaning gas is stabilized. (Embodiment 2) Next, another embodiment of the present invention will be described. The exhaust gas detoxification device or step of the second aspect is particularly related to the exhaust gas introduced from the film-forming device into the combustion treatment mechanism. After the film formation, the residual silicon (Si) may be supplied with a clean gas such as NF3 to form SIF4. There are also cases where the gas is originally used as exhaust gas or removed from the exhaust system. In Embodiment 2, whether the gas is exhausted together with the exhaust gas or whether it is exhausted outside the system, it can be applied to a film forming apparatus or step having a clean mechanism or step. '' An example of implementation mode 2 will be described with reference to FIG. 3. In a film-forming device with a cleaning mechanism, the clean exhaust of the SiF4 gas generated in the cleaning step is originally local, or is introduced into the combustion processing mechanism through an exhaust system outside the system-18-This paper size applies to Chinese National Standards (CNS) A4 specifications (210X297 mm) 531436 A7 _B7_ 5. Description of the invention (16). Although the film forming apparatus 52 shown in FIG. 3 is shown to have an out-of-system discharge mechanism 54, the embodiment does not necessarily need to have the discharge mechanism 54. (Please read the precautions on the back before filling this page.) The out-of-system discharge mechanism 54 supplies cooling water to the clean exhaust gas drawn from the processing chamber of the film forming device 42, and reacts SiF4 with water to precipitate Si02 and even hydrogen fluoride. Compounds, and filters to capture these precipitates. However, even with such a mechanism 54, these precipitates cannot be completely captured, and at the same time, the generated fluoric acid or SiF4 itself may pass through the filter as it is. In addition, even if the exhaust mechanism 54 is not provided, the exhaust gas is discharged from the film forming device 52 and reaches the combustion treatment mechanism 64 and is cooled to liquefy the water vapor. As a result, the same precipitates generate fluoric acid. situation. In the second aspect, as shown in Fig. 3, a mechanism 56 is provided which can maintain the temperature of the piping 55 from the film forming device 52 to the combustion processing mechanism 64 so that no precipitates can be deposited. It is explained here that the precipitates that can be precipitated mean the precipitates that are predicted from the exhaust gas in the film forming system. This mechanism 56 may be a mechanism that actively warms the piping, may be a mechanism that maintains a certain temperature to maintain the temperature of the exhaust gas, or may have both of these mechanisms. Examples of the heating mechanism include a heating gas supplied to the pipe 55 or a heating mechanism provided outside or inside the pipe 55. The state shown in Fig. 3 shows a mechanism 56 for supplying the heated gas to the pipe 55 and a heating mechanism 57 provided around the stern tube 55. A mechanism 56 for supplying a heated gas to the pipe 55 is required to be an inert gas, typically using nitrogen. In addition, the external heating mechanism-19-This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 531436 A7 I -------- B7 V. Description of the invention (17) s · —-- ----- S. 57 can also be a heating source only, or it can have both a heating source and a thermal insulation member. The heating source or the thermal insulation may be used without particular limitation. (Please read the precautions on the back before filling in this page) X ’In the thermal insulation mechanism that keeps the temperature of the exhausted gas, the secret temperature components are not limited and can be used in various forms. Holding the temperature in the piping 55 on which the L-temperature mechanism of the heater is mounted is a temperature effective for preventing the precipitation of predictable precipitates. The predicted precipitates are different depending on the exhaust gas composition or clean gas, but if A occurs in the case of si-component exhaust gas when the Si film is formed, typically Wei compound 1 is used in combustible gas series. In the case of using nf3 fluorine gas in the m-assisted body, ammonia, it can be predicted that the ammonium gasification ((NH4) 2SiF6) 〇 precipitation (sublimation) temperature of ammonium silicon fluoride is 137 ° C, By maintaining the temperature inside the piping 55 above this temperature, precipitation of this compound can be avoided. Above 150 ° C is preferred. The piping 55 from the film forming device 54 to the combustion processing mechanism 64 is preferably maintained at a temperature by a temperature maintaining mechanism. In particular, the part to be discharged from the film forming apparatus | and the nearby piping part are parts where the temperature of the exhaust gas is drastically reduced. Therefore, it is desirable to maintain the temperature by including the part. According to the exhaust gas detoxification device or procedure of the embodiment 2, since the temperature maintaining mechanism is provided in the piping from the film forming device 54 to the combustion processing mechanism 64, it is possible to suppress the precipitation of precipitates at the piping portion and reduce maintenance work. , And can avoid the danger of using detergents and improve safety. In addition, the dust removal mechanism (apparatus) or steps provided in the combustion treatment mechanism or steps can reduce the burden of dust removal. -20-This paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm) 531436 A7 B7 V. Description of the invention (18) Moreover, in the implementation mode 2, the film formation device 54 to the combustion processing mechanism have been specifically explained. The piping between 64 and the exhaust gas supplied to the combustion treatment step are, of course, this embodiment mode can also be applied to the device 2 or step of various modes included in the first embodiment mode. In particular, when the bag filter has a dust removing mechanism or a dust removing device, especially a bag filter having a dust removing step or a dust removing step by the gas introduction mechanism 40, even when the film forming device 54 does not have a system The external discharge mechanism can also effectively prevent precipitates before reaching the combustion treatment mechanism, and can effectively remove dust by the dust removal mechanism (device). (Embodiment 3) Next, Embodiment 3 of the present invention will be described. In the implementation mode 3, especially the dust removal mechanism or step is provided with at least m dust removal mechanisms (m is an integer of 3 or more), each dust removal mechanism uses at least one dust removal mechanism to perform the dust removal step, and the maximum is (m — 1) The mode of the dust removal mechanism of the station is switched and used. Also, m is preferably 6 or less, and most preferably 3. An example of Embodiment 3 will be described with reference to FIG. 4. In Fig. 4, three dust removing mechanisms 74, 76, and 78 constitute a dust removing mechanism 11. In the dust removal mechanisms 74, 76, and 78 of the implementation mode 3, known dust removal devices can be used respectively. However, it is preferable that all the dust removal mechanisms are in the form of bag filters, and the dust removal mechanism is preferably a pulse gas bag filter. . In addition, it is better to supply compressed air to the filter, and an airflow directed (orientated) to the dust discharge side can be formed from the surface of the filter relative to the outside of the filter. 21 This paper applies the Chinese National Standard (CNS) A4 standard. (210X297 mm) (Please read the precautions on the back before filling the nesting page). Order · # 531436 A7 _B7_ V. Bag filter of the description of the invention (19). The best form to which this implementation form applies is the implementation The state clearly shown in aspect 1. (Please read the precautions on the back before filling in the clothing page.) At least three dust removal mechanisms 74, 76, and 78 are arranged side by side (combined) with respect to the supply passage of the combustion exhaust. And the supply and exhaust passage of the combustion exhaust gas connected to the combustion processing mechanism can be branched (split) corresponding to each of the dust removal mechanisms 74, 76, and 78, and the branched pipe is provided with an adjustable supply amount and presence of combustion exhaust gas. Gas supply valves 84, 86, and 88. Furthermore, they are equipped with pipes for exhausting the gas cleaned from the dust removal mechanism 74, 76, and 78, and the widths 94, 96, and 98 of which the exhaust gas can be adjusted. Even for example, each dust collector One of the dust removal mechanisms 74, 76, and 78 performs dust removal steps or maintenance, and it is possible to ensure the necessary dust removal capability with the other two or one. It is best to have the same dust removal mechanism for each of m units. That is, it is better to have the same filtering area. In this embodiment, each of the dust removing mechanisms 74, 76, and 78 preferably has the same filtering ability, that is, it is best to design the same filtering area. The largest (m — 1) units (preferably (m — 1) units) are designed to have the necessary dust removal capacity, that is, it is best to design to ensure the full filtration area. Therefore, in this embodiment, each dust removal mechanism will be When the necessary dust removal capacity (filtration area) is set to 1, each has a dust removal capacity (filtration area) of 0.5, and the whole has a dust removal capacity (filtration area) of 1.5. That is, two units (m = 3 of ( m 一 1)) has the necessary dust-removing ability. Next, the dust-removal steps of the combustion exhaust gas using the dust-removing mechanism (device) 32 thus constituted will be explained. -22-This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 (Mm) 531436 A7 _B7__ 5. Description of the invention (20) (Please read the precautions on the back before filling out this page) In Figure 3, the combustion exhaust gas introduced from the combustion treatment mechanism is introduced into the dust removal mechanism 76 and 78 for dust removal. Steps. Therefore, the valves 84 and 94 are closed, and the valves 86, 88, 96, and 98 are open. In this case, the dust removal mechanism 76, 78 has a certain dust removal ability or cooperates, so appropriate dust removal can be performed. Steps: If one of the dust-removing mechanisms (devices) does not have the necessary dust-removing capacity, one unit can be moved. On the other hand, the use of the dust-removing mechanism (device) 74 will exceed the necessary dust-removing capacity. The dust removal mechanism (device) 74 can perform the dust falling step or maintenance. In addition, if any of the dust removal mechanisms (devices) 76 and 78 exceeds a certain pressure loss and it is necessary to stop the operation, the combustion exhaust is stopped from being introduced to the dust removal mechanism, and the dust falling step or maintenance is performed, and Start to introduce combustion exhaust gas to the dust removal mechanism (device) 74 to perform the dust removal step. As a result, when there are many dust removal mechanisms and some of them have the necessary dust removal capability, the remaining dust removal mechanism is used for dust fall. Even if the time required for the dust fall step or maintenance is as small as possible by operating the conventional operation to the allowable range of the pressure loss of the dust removal mechanism, the dust fall step or maintenance can be easily performed as necessary. Therefore, it is possible to operate stably with a low pressure loss and achieve stable dust removal, thereby forming a purge gas capable of discharging a stable composition. In particular, in implementation mode 3, all the dust-removing mechanism m units are set to have the same dust-removing capacity, and (m-1) units have the necessary dust-removing capacity. Because 23 paper standards are applicable to the Chinese National Standard (CNS) A4 Specifications (210 X 297 mm) 531436 A7 ______B7____ 5. Description of the invention (21) The whole can perform an efficient dust removal step with a minimum of total dust removal capacity. That is, the dust scooping step is performed by at least one dust removal mechanism, and the dust collection step is performed by a maximum of 1) dust removal mechanisms, which can be used alternately to maintain a low pressure loss and perform an efficient and good dust removal step. Of course, if necessary, a dust removal mechanism that exceeds the dust removal capability can be used to perform the dust removal step simultaneously with other dust removal mechanisms. The dust removal steps and steps are specifically described in the implementation mode 3, but the dust removal steps and steps of the implementation mode 3 can be applied to the implementation mode or the various modes included in the implementation mode 2. In particular, as described in the second aspect, the dust removal step can be performed at the most appropriate pressure state by using a blower for output air that can change the air volume according to the pressure of the cleaning gas discharged from the dust removal mechanism. Cost status to perform the dust collection step. Although various conventional application modes have been described above, the present invention is not limited to such application modes, but includes modes within the scope described in the scope of patent application. In addition, each mechanism and step in the form included in the scope of the patent application includes the form specifically described in the above implementation form. [Industrial applicability] According to the present invention, it is possible to reduce the maintenance work on the exhaust gas removal steps that occur in manufacturing equipment such as semiconductors or liquid crystal modules, or to improve the safety of its operation, so it has a great industry. On value. 、 [Comparison of component numbers] 2 Detoxification device 4 Combustion treatment mechanism _-24-This paper size applies to China National Standard (CNS) A4 (210X297 mm). Please read the precautions on the back before filling in this page), -J- 531436 A7 _B7 V. Description of the invention (22) 14 Dust removal mechanism (apparatus) 16 Housing 18 Filter 19 Introduction section 20 Upper air tank 21 Tube sheet 22 Discharge section 24 Spray device 30 Dust collection section 32 Dust discharge section 34 On-off valve 36 Dust discharge path 40 Gas introduction mechanism 44 Washing mechanism 52 Film-forming device 54 Discharge mechanism 55 Piping 56 Mechanism for supplying warmed gas 57 Heating mechanism 64 Combustion treatment mechanism 74, 76, 78 Dust removal mechanism 86, 88, 94, 96, 98 Valve 25 (Please read the precautions on the back before filling in this page) / ^ 丨 0, This paper size applies to China National Standard (CNS) A4 specification (210X297 mm)