513739 A7 _ B7 五、發明説明（1 ) [產業上之利用領域及先前之技術] 本發明係關於液處理裝置，尤其是例如：將預定的處 理液供給至液晶顯示裝置（LCD)用玻璃基板及半導體晶圓等 的基板來進行液處理的液處理裝置。 在液晶顯示裝置（LCD)及半導體裝置的照相石版過程中 ，將照像感光層液塗抹在經先淨處理的LCD基板及半導體 晶圓等的基板而形成感光層膜，以預定的圖案使感光層膜 曝光，來進行使其顯像處理的一連的處理。其中洗淨處理 、感光層處理、顯像處理係使用一般稱爲旋轉器型的液處 理裝置，在水平地保持基板呈靜止的狀態下，或使基板在 面內一邊旋轉，一邊進行將基板表面供給至預定處理液。 例如採用：對於LCD基板的顯像處理，將被曝光的基 板載置於旋轉夾具等固定，藉由在基板盛滿顯像液且形成 顯像液並預定時間放置來進行顯像反應，此預定時間經過 後幾乎與開始潤滑液的供給的同時旋轉基板使顯像液及潤 滑液從LCD基板揮乾，之後停止潤滑液的供給且以高速旋 轉基板進行旋轉乾燥之方法。 在此，用來將顯像液供給至基板的顯像液吐出噴嘴， 例如使用：在使顯像液呈帶狀吐出地形成顯像液吐出口的 一方向具有長形狀者。且，這種顯像液吐出噴嘴，安裝有 同樣具有在一方向較長，且與顯像液吐出噴嘴的寬同等的 寬的噴嘴保持臂。 且，顯像液吐出噴嘴係沿著基板表面，使在顯像液吐 出噴嘴的長度方向可朝垂直方向移動地，例如設置朝噴嘴 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐) (請先閲讀背面之注意事項再填寫本頁) •裝· 、11 經濟部智慧財產局員工消費合作社印製 513739 A7 B7 五、發明説明（2 ) (請先閲讀背面之注意事項再填寫本頁) 保持臂的移動方向延伸的導引軌道且將噴嘴保持臂的一端 嵌合在此導引軌道地，沿著導引軌道驅動噴嘴保持臂。在 將噴嘴保持臂保持在其一端的所謂懸臂樑構造中，噴嘴保 持臂的他端成爲完全自由地浮在空中的狀態，或安裝在朝 移動方向旋轉的車等，此車等係成爲：固定在液處理裝置 且接觸被設置的軌道等移動於軌道等上的構造。 但是，這幾年隨著所處理的基板的大型化，漸漸明白 將噴嘴保持臂作成習知的懸臂樑構造的情況時會發生種種 的問題。例如：爲了在經大型化的基板上均一地吐出顯像 液，雖需要將顯像液吐出噴嘴的長度方向的長度配合基板 的大小加長，但這時噴嘴保持臂的一端呈自由狀態的話， 因噴嘴保持臂及顯像液吐出噴嘴的自重而使噴嘴保持臂朝 長度方向傾斜，而使顯像液吐出噴嘴的顯像液吐出口的高 度位置不容易對基板表面平行地保持，其結果，成爲不容 易在基板上形成均一的聞門。 經濟部智慧財產局員工消費合作社印製 且’噴嘴保持臂的一端介由車等接觸軌道等的情況時 ，顯像液吐出口的高度位置雖可以對基板的表面保持平行 ，但在噴嘴保持臂的驅動中，因車等的旋轉所產生的振動 被傳達至顯像液吐出噴嘴而使顯像液的吐出無法均勻地進 行。而且，顯像液的吐出結束後上昇顯像液吐出噴嘴時， 因爲噴嘴保持臂的一端呈浮在空中的狀態，所以顯像液吐 出噴嘴產生傾斜，而產生顯像液會從形成在高度較低位置 的顯像液吐出口滴出的問題。 而且，顯像液吐出噴嘴的長度方向變長的話，當噴嘴 本紙張尺度適用中國國家標準（CNS ) A4規格（21()χ 297公釐） ^ ~ 513739 經濟部智慧財產局員工消費合作社印製 A7 ___ B7 ____五、發明説明（3 ) 保持臂的驅動時進行急速的發進動作或停止動作的情況時 ，因慣性使顯像液吐出噴嘴的擺動變大，使顯像液吐出時 恐會產生這種擺動及使顯像液的吐出均一性低下。 [本發明所欲解決的課題] 因此，本發明的目的，便在於提供一種不限於顯像液 對於處理液一般，安定地將處理液吐出噴嘴朝一方向移動 ，且可均一地將處理液供給至基板的液處理裝置。 本發明之第1觀點，係提供一種液處理裝置，具有：保 持基板的保持手段、及在被保持於前述保持手段的基板的 表面吐出預定的處理液的處理液吐出噴嘴、及保持前述處 理液吐出噴嘴的噴嘴保持臂、及在前述噴嘴保持臂的長度 .方向兩端部附近與前述噴嘴保持臂嵌合地相互平行配設的 導引軌道、及沿著被保持在前述保持手段的基板表面使前 述噴嘴保持臂朝前述導引軌道的長度方向移動的驅動機構 〇 本發明之第2觀點，係提供一種液處理裝置，具有：保 持基板的保持手段、及在被保持於前述保持手段的基板的 表面吐出預定的處理液的處理液吐出噴嘴、及保持前述處 理液吐出噴嘴的噴嘴保持臂、及在前述噴嘴保持臂的長度 方向兩端部附近與前述噴嘴保持臂嵌合地相互平行配設的 導引軌道、及沿著被保持在前述保持手段的基板表面使前 述噴嘴保持臂朝前述導引軌道的長度方向移動的驅動機構 、及爲了減低發生於前述噴嘴保持臂的擺動或振動而控制 本紙張尺度適用中國國家標準（CNS ) A4規格（21〇><297公釐） ΓβΤ~— (請先閲讀背面之注意事項再填寫本頁) •裝- 訂 線 513739 經濟部智慧財產局員工消費合作社印製 A7 _ B7________五、發明説明（4 ) 前述噴嘴保持臂的驅動加速度的驅動控制機構。 依據這種裝置，噴嘴保持臂因爲成爲呈平行設置的嵌 合於導引軌道的所謂的兩端支撐構造，所以不會有噴嘴保 持臂的一端的高度位置變化，或一端產生擺動，而成爲可 將噴嘴保持臂及處理液吐出噴嘴沿著導引軌道的長度方向 安定地移動。且，與將車等安裝在噴嘴保持臂而使滑走於 軌道上的構造相比，可減低振動的發生。而且，控制噴嘴 保持臂的驅動加速度，例如：藉由控制使緩和噴嘴保持臂 的驅動開始時及驅動結束時的動作，來減低發生於噴嘴保 持臂的振動或擺動，使可以均一地進行處理液的吐出。如 此，藉由使處理液均一地從基板吐出，可以提高安定製品 的品質，並也提高成品率。 [實施例] 茲佐以圖面說明本發明之液處理裝置。 以下，係以使用於其之一實施例的LCD基板的感光層 塗抹·顯像處理系統的顯像處理裝置（顯像處理單元）爲例， 詳細說明之。第1圖爲顯示具有顯像處理單元（DEV)24a〜24c 的LCD基板的感光層塗抹·顯像處理系統100之平面圖。 感光層塗抹·顯像處理系統100，係具有：載置收容複 數的LCD基板（基板）G的匣C的匣平台1、及具有供實施包 含感光層塗抹於基板及顯像的一連的處理用的複數的處理 單元的處理部2、及供在與曝光裝置（無圖示）間進行基板G 的移載用的介面部3，分別在處理部2的兩端各配置有匣平 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） — (請先閲讀背面之注意事項再填寫本頁) -裝· 、11 線 513739 經濟部智慧財產局員工消費合作社印製 A7 B7五、發明説明（5 ) 台1、介面部3。 匣平台1，在匣C及處理部2之間具有供搬運基板G用 的搬運機構10。而且，在匣平台1進行匣C的搬出入。且， 搬運機構10在沿著匣的配列方向設置的搬運路l〇a上具有可 移動的搬運臂11，利用此搬運臂11進行匣C及處理部2之間 的基板G的搬運。 處理部2，被分爲前段部2a及中段部2b及後段部2c，各 在其中央具有搬運路12、13、14，在這些搬運路的兩側各 配置有處理單元。而且，在這些之間設有中繼部15、16。 前段部2a，具有沿著搬運路12可移動的主搬運裝置π， 在搬運路1 2的一方側，配置有2個洗淨單兀（S C R) 21 a、21 b， 在搬運路12的他方側，配置有：紫外線照射單元（UV)和冷 卻單元（COL)呈2段重疊的處理塊25、加熱處理單元（HP)呈2 段重疊的處理塊26以及冷卻單元（COL)呈2段重疊的處理塊 27 ° 且，中段部2b，具有沿著搬運路13可移動的主搬運裝 置1 8，在搬運路1 2的一方側，一體地設有感光層塗抹單元 (CT) 22及用來除去基板G的周緣部的感光層的周緣感光層 除去單元（ER)23，在搬運路12的他方側，配置有：加熱處理 單元（HP)呈2段重疊的處理塊28、加熱處理單元（HP)和冷卻 單元（COL)呈上下重疊的處理塊29以及附著處理單元（AD)和 冷卻單元（COL)呈上下重疊的處理塊30。 而且，後段部2c，具有沿著搬運路14可移動的主搬運 裝置19，在搬運路14的一側方，配置有3個顯像處理單元 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） p (請先閱讀背面之注意事項再填寫本頁) -裝- 訂 線· 5ym9--^ P年第90121790號專利申請案 巴一 _充中文說明書修正頁 二 民國91年10月23日修正 五、發明説明（6 ) (請先閲讀背面之注意事項再填寫本頁) (DEV)24a〜24c，在搬運路14的他方側，配置有··加熱處理 單元（HP)2段重疊的搬運路31、及加熱處理單元（HP)和冷卻 單元（COL)呈上下重疊的處理塊32、33。 然而，處理部2，係形成：挾著搬運路且在一方側，只 配置有如洗淨單元（SCR)21a、感光層塗抹單元（CT)22、顯像 處理單元（DEV)24a的旋轉器系單元，在他方側，只配置有 加熱處理單元（HP)和冷卻單元（COL)等的熱系處理單元的構 造。 且，在中繼部15、16的旋轉器系單元配置側的部分， 配置有藥液供給單元34，而且，設有供進行主搬運裝置17 、18、19的維修用的空間35。 主搬運裝置17、18、19，各具有水平面內的2方向的X 軸驅動機構、Y軸驅動機構以及垂直方向的Z軸驅動機構 ，更具有以Z軸爲中心旋轉的旋轉驅動機構，且分別具有 支撐基板G的臂。 經濟部智慧財產局員工消費合作社印製 主搬運裝置17具有搬運臂17a，在與搬運機構10的搬運 臂11間進行基板G的移載，並且，具有對於前段部2a的各 處理單元的基板G的搬入·搬出、和在與中繼部1 5間進行 基板G的移載的機能。且，主搬運裝置18具有搬運臂18a， 在與中繼部1 5間進行基板G的移載，並且，具有對於中段 部2b的各處理單元的基板G的搬入·搬出、和與中繼部1 6 間進行基板G的移載的機能。而且，主搬運裝置19具有搬 運臂1 9a，在與中繼部16間進行基板G的移載，並且，具有 對於後段部2c的各處理單元的基板G的搬入·搬出、和在 -9- 本紙張尺度適用中國國家標準（CNS ) Α4規格（210X 297公釐） 513739 A7 B7 五、發明説明（7 ) 與介面部3間進行基板G的移載的機能。中繼部15、16也具 有冷卻板的機能。 介面部3，具有：當在處理部2間移載基板G時暫時地 保持基板G的延伸部36、及更設在其之兩側之用來配置緩 衝匣的2個緩衝台37、及在這些和曝光裝置（無圖示）之間進 行基板G的搬入出的搬運機構38。搬運機構38係具有沿著 延伸部36和緩衝台37的配列方向設置的搬運路38a上可移動 的搬運臂39，利用此搬運臂39在處理部2及曝光裝置之間進 行基板G的搬運。 如此地利用集約各處理單元而一體化，可以謀求省空 間及處理的效率化。 對於這種構造的感光層塗抹♦顯像處理系統100，匣C 內的基板G被搬運至處理部2，在處理部2中，首先在前段 部2a的處理塊25的紫外線照射單元（UV)進行表面改質·洗 淨處理，在冷卻單元（COL)被冷卻後，在洗淨單元（SCR)21a 、21b實施刮削洗淨，在處理塊26的任一加熱處理單元（HP) 被加熱乾燥後，在處理塊27的任一冷卻單元（COL)被冷卻。 之後，基板G被搬運至中段部2b，爲了提高感光層的 定著性，由處理塊30的上段的附著處理單元（AD)進行排水 化處理（HMDS處理），在下段的冷卻單元（C〇L)被冷卻後， 使感光層被塗抹在感光層塗抹單元（CT)22,在周緣感光層除 去單元（ER)23使基板G周緣的多餘的感光層被除去。之後 ，基板G，由中段部2b之中的加熱處理單元（HP)的一個被 預烘處理，在處理塊29或搬運臂39的下段的冷卻單元（C〇L) 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） _ ’ 〇 _ (請先閱讀背面之注意事項再填寫本頁) •裝· 訂 經濟部智慧財產局員工消費合作社印製 513739 A7 B7 五、發明説明（8 ) 被冷卻。 之後，基板G從中繼部16由主搬運裝置19介由介面部3 被搬運至曝光裝置且在那被曝光預定的圖案。而且，基板 G再介由介面部3被搬入，依據需要在後段部2c的處理塊31 、32、33的任一的加熱處理單元（HP)實施後曝光處理後，在 顯像處理單元（DEV)24a〜24c的任一被顯像處理，而形成預 定的回路圖案。經顯像處理的基板G，由後段部2c的任一 加熱處理單元（HP)實施後烘處理後，由任一冷卻單元（C〇L) 冷卻，利用主搬運裝置19、18、17及搬運機構10收容至匣平 台1上的預定的匣內。 接著，詳細說明顯像處理單元（DEV)24a〜24c。第2圖係 顯示顯像處理單元（DEV)24a〜24c的一實施例的平面圖，第 3圖係顯示第2圖所示的顯像處理單元（DEV) 24a〜24c的杯部 分之剖面圖，第4圖係顯示第2圖所示的顯像處理單元 (DEV) 24a〜24c之另一剖面圖。顯像處理單元（DEV) 24a〜 24c，係具有機械地保持基板G的保持手段，例如：設成利 用馬達等的旋轉驅動機構42旋轉旋轉夾具41，且爲在該旋 轉夾具41的下側配置有包圍旋轉驅動機構42的蓋43之構造 。旋轉夾具41利用無圖示的昇降機構可昇降，對於上昇位 置在與搬運臂19a間進行基板G的移載。旋轉夾具41利用真 空吸引力等可以吸著保持基板G。 在蓋43的外周2個底杯44、45係呈分離地設置，在此2個 底杯44、45間的上方，主要可昇降自如地設置供使顯像液 朝下方流下用的內杯46，在底杯45的外側，主要可與內杯 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） _ ” _ (請先閱讀背面之注意事項再填寫本頁) -裝· 訂 經濟部智慧財產局員工消費合作社印製 513739 經濟部智慧財產局員工消費合作社印製 A7 B7 ___五、發明説明（9 ) 46—體昇降自如地設置供使潤滑液朝下方流下的底杯47 ° 然而，在第3圖中，在左側係顯示顯像液的排出時內杯46及 底杯47已上昇的位置，在右側係顯示潤滑液的排出時已下 降這些的位置，且未顯示後述之噴嘴洗淨機構120等。 在底杯44的內周側的底部設有供旋轉乾燥時使單元內 排氣用的排氣口 49，且分別設有：在2個底杯44、45間主要 供排出顯像液用的排出管50a、及在底杯45的外周側底部主 要供潤滑液排出用的排出管50b。 如第2圖所示，在池48內，設有顯像液供給用的噴嘴支 撐臂51，在噴嘴支撐臂51安裝有使用於供將顯像液塗抹在 基板G用的的顯像液吐出噴嘴的一實施例之閘門形成用噴 嘴80。閘門形成用噴嘴80，係可以使用：例如使顯像液呈 .帶狀可朝垂直方向吐出，而全體在一方向較長，且在該長 度方向形成複數的吐出口者，或在長度方向形成溝狀的吐 出口的形態者。在閘門形成用噴嘴80從無圖示的顯像液供 給源以預定的時間送出顯像液。 噴嘴支撐臂51在長度方向的兩端附近係嵌合於被固定 在池48的導引軌道53a、53b。也就是說，噴嘴支撐臂51具有 所謂的兩端支撐構造。噴嘴支撐臂51可以直接與導引軌道 5 3a、53b嵌合，也可以如後述第4圖所示，將與噴嘴支撐臂 51的端部強力接合的別的構件嵌合在導引軌道53a、53b也 可以。且，導引軌道53a、5 3b的形狀並無限定，只要噴嘴 支撐臂5 1或與噴嘴支撐臂5 1的端部強力接合的別的構件， 不會朝與導引軌道53a、53b的長度方向垂直的任一方向脫 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） _ ' 一 (請先閱讀背面之注意事項再填寫本頁) 裝· 訂 線 513739 A7 B7 五、發明説明（10 ) 離的構造即可。 噴嘴支撐臂51成爲沿著導引軌道53a、5 3b的長度方向 利用驅動機構52橫切基板G且可以移動的構造，當不使用 閘門形成用噴嘴80時成爲可以在噴嘴待機部115待機。然而 ，在噴嘴待機部11 5設有洗淨閘門形成用噴嘴80的噴嘴洗淨 機構120 〇 在噴嘴支撐臂51的上面安裝有昇降裝置的氣缸58a，利 用此氣缸58a的動作可以進行支撐板58b的昇降。一方面， 閘門形成用噴嘴80對於該長度方向兩端部附近利用2條的吊 下棒58c從支撐板58b吊下，利用如此的昇降動作使閘門形 成用噴嘴80可昇降自如。由這些氣缸58a、支撐板58b、吊下 棒58c構成昇降機構58。 在保持使底杯47降下且使閘門形成用噴嘴80接近噴嘴 支撐臂5 1的上方位置（待避位置）的狀態下，藉由使噴嘴支撐 臂51朝導引軌道53a、53b的長度方向滑行，使閘門形成用 噴嘴80不需接觸底杯47的上部，而可以配置在內杯46內。 而且，利用昇降機構58使閘門形成用噴嘴80的顯像液吐出 Ο從基板G的表面配合預定高度的位置（處理位置），一藉 由邊吐出顯像液一邊使噴嘴支撐臂51移動（掃描）靜止的基板 G上，可以在基板G上形成顯像液閘門。 這種以將噴嘴支撐臂51保持在該長度方向的端部的兩 端支撐構造朝導引軌道53a、53b的長度方向移動的情況時 ，例如：與習知的只以一端支撐噴嘴保持臂的懸臂樑構造 的情況相比，可以抑制在噴嘴支撐臂5 1的長度方向發生傾 ^^1- a— ϋϋ 11 In·— ' ϋ^— ϋ-i (請先閲讀背面之注意事項再填寫本頁) 、τ513739 A7 _ B7 V. Description of the invention (1) [Application fields in the industry and previous technology] The present invention relates to a liquid processing device, in particular, for example, supplying a predetermined processing liquid to a glass substrate for a liquid crystal display device (LCD) A liquid processing apparatus that performs liquid processing on a substrate such as a semiconductor wafer. In the process of photographic lithography of liquid crystal display devices (LCD) and semiconductor devices, a photographic photosensitive layer liquid is applied to substrates such as LCD substrates and semiconductor wafers which have been cleaned to form a photosensitive layer film, and the photosensitive layer film is exposed in a predetermined pattern. The layer film is exposed to perform a series of processes for developing it. Among them, the cleaning process, the photosensitive layer process, and the development process use a liquid processing device generally called a rotator type. The substrate surface is kept horizontally while the substrate is stationary, or the substrate surface is rotated while the substrate is rotated in the plane. It is supplied to a predetermined processing liquid. For example, for the development processing of the LCD substrate, the exposed substrate is placed on a rotating fixture or the like, and the imaging reaction is performed by filling the substrate with a developing solution, forming the developing solution, and placing it for a predetermined time, and the predetermined time passes. The method of rotating the substrate at the same time as starting the supply of the lubricating liquid to dry the developing liquid and the lubricating liquid from the LCD substrate, and then stopping the supply of the lubricating liquid and rotating and drying the substrate at a high speed. Here, the developing solution discharge nozzle for supplying the developing solution to the substrate is, for example, one having a long shape in a direction in which the developing solution discharge port is formed so that the developing solution is discharged in a band shape. The developing liquid discharge nozzle is also provided with a nozzle holding arm which is also long in one direction and is as wide as the width of the developing liquid discharge nozzle. In addition, the developing liquid discharge nozzle is along the substrate surface, so that the length direction of the developing liquid discharge nozzle can be moved vertically. For example, the nozzle is oriented toward the nozzle. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297 mm). ) (Please read the precautions on the back before filling out this page) • Install · 11 Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, Consumer Cooperative 513739 A7 B7 V. Invention Description (2) (Please read the precautions on the back before filling in this Page) Hold the guide rail extending in the moving direction of the arm and fit one end of the nozzle holding arm to this guide rail, and drive the nozzle holding arm along the guide rail. In the so-called cantilever structure that holds the nozzle holding arm at one end, the other end of the nozzle holding arm floats completely in the air, or is mounted on a car that rotates in the direction of movement. A structure that moves on a rail or the like in a liquid processing device and contacts the installed rail or the like. However, in recent years, with the increase in the size of the substrates to be processed, it has become clear that various problems have occurred when the nozzle holding arm has a conventional cantilever structure. For example, in order to discharge the developing solution uniformly on a large-sized substrate, the length of the developing solution discharge nozzle in the longitudinal direction needs to be increased to match the size of the substrate. However, at this time, one end of the nozzle holding arm is in a free state. The weight of the holding arm and the developing liquid discharge nozzle tilts the nozzle holding arm in the longitudinal direction, so that the height position of the developing liquid discharge port of the developing liquid discharge nozzle cannot be easily held in parallel with the substrate surface. It is easy to form a uniform smell gate on the substrate. When printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs and when one end of the nozzle holding arm is in contact with a track or the like via a car, the height position of the imaging liquid ejection outlet can be parallel to the surface of the substrate, but the nozzle holding arm During the driving, the vibration caused by the rotation of the car or the like is transmitted to the developing solution discharge nozzle, so that the developing solution cannot be discharged uniformly. In addition, when the developer is ejected from the developer after the developer is ejected, the nozzle holding arm is floating in the air, so the developer ejection nozzle is tilted, and the developer is generated at a relatively high level. Problems with dripping of the developer discharge port at a low position. In addition, if the length of the developing liquid discharge nozzle becomes longer, when the paper size of the nozzle applies the Chinese National Standard (CNS) A4 specification (21 () x 297 mm) ^ ~ 513739 Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs A7 ___ B7 ____ 5. Description of the invention (3) When the rapid advance movement or stop movement is performed while the holding arm is being driven, the swing of the imaging liquid discharge nozzle becomes larger due to inertia, which may cause the imaging liquid to spit out. This kind of wobbling occurs and the uniformity of the discharge of the developer is lowered. [Problems to be Solved by the Present Invention] Therefore, an object of the present invention is to provide a process liquid ejection nozzle that is not limited to a developing liquid and is generally a processing liquid, and the processing liquid can be uniformly supplied to the processing liquid. Liquid processing device for substrates. A first aspect of the present invention is to provide a liquid processing apparatus including holding means for holding a substrate, a processing liquid discharge nozzle for discharging a predetermined processing liquid on a surface of the substrate held by the holding means, and holding the processing liquid. A nozzle holding arm that ejects a nozzle, and a guide rail that is arranged in parallel with the nozzle holding arm in a vicinity of both ends of the nozzle holding arm in the direction of the length of the nozzle holding arm, and along a substrate surface held by the holding means. A driving mechanism for moving the nozzle holding arm in the longitudinal direction of the guide rail. A second aspect of the present invention is to provide a liquid processing apparatus including holding means for holding a substrate and a substrate held by the holding means. A processing liquid discharge nozzle that discharges a predetermined processing liquid on a surface thereof, a nozzle holding arm that holds the processing liquid discharge nozzle, and a nozzle holding arm that is fitted in parallel with the nozzle holding arm near both ends in the longitudinal direction of the nozzle holding arm. The guide rail and the nozzle are held along the substrate surface held by the holding means. A driving mechanism that moves in the length direction of the guide rail, and controls the paper size in accordance with the Chinese National Standard (CNS) A4 specification (21〇 > < 297 mm) in order to reduce the swing or vibration that occurs in the nozzle holding arm. ） ΓβΤ ~ — (Please read the precautions on the back before filling this page) • Binding-513739 Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 _ B7________ 5. Description of the invention (4) Drive of the aforementioned nozzle holding arm Acceleration drive control mechanism. According to this device, since the nozzle holding arm has a so-called two-end support structure fitted to the guide rail in parallel, the height and position of one end of the nozzle holding arm are not changed, or one end is oscillated. The nozzle holding arm and the processing liquid discharge nozzle are stably moved along the longitudinal direction of the guide rail. Furthermore, it is possible to reduce the occurrence of vibrations compared to a structure in which a car or the like is mounted on a nozzle holding arm and is slid off the rail. In addition, by controlling the driving acceleration of the nozzle holding arm, for example, by controlling and mitigating the movement of the nozzle holding arm at the start and end of the driving, the vibration or oscillation of the nozzle holding arm can be reduced, and the processing liquid can be uniformly processed. Spit it out. In this way, by uniformly ejecting the processing liquid from the substrate, it is possible to improve the quality of the stable product and also improve the yield. [Examples] The liquid processing apparatus of the present invention will be described with reference to the drawings. In the following, a development processing device (development processing unit) of a photosensitive layer coating and development processing system for an LCD substrate used in one embodiment will be described in detail as an example. FIG. 1 is a plan view showing a photosensitive layer coating and developing processing system 100 of an LCD substrate having developing processing units (DEV) 24a to 24c. The photosensitive layer coating and developing processing system 100 includes a cassette platform 1 on which a cassette C containing a plurality of LCD substrates (substrates) G is placed, and a process for performing a series of processes including applying a photosensitive layer to a substrate and developing. The processing unit 2 of the plurality of processing units and the mesial surface portion 3 for transferring the substrate G to and from an exposure device (not shown) are provided with a cassette flat paper size at each end of the processing unit 2 Applicable to China National Standard (CNS) A4 specification (210X 297 mm) — (Please read the precautions on the back before filling out this page)-Packing ·, 11 Line 513739 Printed by A7 B7, Consumer Cooperative of Intellectual Property Bureau, Ministry of Economic Affairs DESCRIPTION OF THE INVENTION (5) 台 1 ， 介面 面 3. The cassette platform 1 includes a transport mechanism 10 for transporting the substrate G between the cassette C and the processing unit 2. Then, the cassette C is carried in and out on the cassette platform 1. In addition, the transport mechanism 10 has a movable transport arm 11 on a transport path 10a provided along the arrangement direction of the cassettes, and uses this transport arm 11 to transport the substrate G between the cassette C and the processing unit 2. The processing section 2 is divided into a front section 2a, a middle section 2b, and a rear section 2c, each of which has conveying paths 12, 13, and 14 in the center, and processing units are arranged on both sides of these conveying paths. Further, relay sections 15 and 16 are provided between these. The front section 2 a has a main conveying device π movable along the conveying path 12, and two cleaning units (SCR) 21 a and 21 b are arranged on one side of the conveying path 12 and on the other side of the conveying path 12. On the side, a processing block 25 in which the ultraviolet irradiation unit (UV) and the cooling unit (COL) are overlapped in two stages, a processing block 26 in which the heating process unit (HP) is overlapped in two stages, and a cooling unit (COL) in two stages are arranged The processing block is 27 °, and the middle section 2b has a main conveying device 18 that is movable along the conveying path 13. On one side of the conveying path 12, a photosensitive layer application unit (CT) 22 is integrally provided and used for A peripheral photosensitive layer removing unit (ER) 23 that removes the photosensitive layer in the peripheral portion of the substrate G is provided on the other side of the conveying path 12 with a processing block 28 in which the heat processing unit (HP) overlaps in two stages, and a heat processing unit ( A processing block 29 in which HP) and a cooling unit (COL) overlap each other, and a processing block 30 in which an attachment processing unit (AD) and a cooling unit (COL) overlap each other. In addition, the rear section 2c has a main conveying device 19 that is movable along the conveying path 14, and three developing processing units are arranged on one side of the conveying path 14. The paper size is in accordance with the Chinese National Standard (CNS) A4 standard ( 210 X 297 mm) p (Please read the notes on the back before filling this page)-Installation-Threading · 5ym9-^ P Year No. 90121790 Patent Application Ba Yi _ Fill Chinese Manual Amendment Page II Republic of 91 Amendment on October 23 V. Description of the invention (6) (Please read the notes on the back before filling in this page) (DEV) 24a ~ 24c, on the other side of the transport path 14, equipped with a heat treatment unit (HP) The two overlapping conveyance paths 31 and the processing blocks 32 and 33 that overlap with each other include a heating processing unit (HP) and a cooling unit (COL). However, the processing unit 2 is formed of a rotator system that is disposed on one side while holding the conveyance path, and is provided with, for example, a cleaning unit (SCR) 21a, a photosensitive layer application unit (CT) 22, and a development processing unit (DEV) 24a. The unit has a structure in which a heat treatment unit such as a heat treatment unit (HP) and a cooling unit (COL) are arranged on the other side. A medicinal solution supply unit 34 is disposed on a portion on the side where the rotator-based units of the relay units 15 and 16 are disposed, and a space 35 is provided for performing maintenance on the main transfer devices 17, 18, and 19. The main conveying devices 17, 18, and 19 each have an X-axis drive mechanism, a Y-axis drive mechanism, and a vertical Z-axis drive mechanism in two directions in a horizontal plane, and each has a rotary drive mechanism that rotates around the Z axis, and each has An arm supporting the substrate G is provided. The consumer goods cooperative printed by the Intellectual Property Bureau of the Ministry of Economic Affairs has a main conveying device 17 having a conveying arm 17a for transferring the substrate G to and from the conveying arm 11 of the conveying mechanism 10, and a substrate G for each processing unit of the front section 2a. The function of carrying in and carrying out and transferring the substrate G to and from the relay unit 15. In addition, the main transfer device 18 includes a transfer arm 18a for transferring the substrate G between the relay unit 15 and the substrate G, and loading and unloading of the substrate G with respect to each processing unit of the middle section 2b. The function of transferring the substrate G is performed in 16 places. In addition, the main transfer device 19 includes a transfer arm 19a for transferring the substrate G to and from the relay section 16. In addition, the main transfer device 19 includes a substrate G for each processing unit in the rear section 2c. This paper size applies the Chinese National Standard (CNS) A4 specification (210X 297 mm) 513739 A7 B7 V. Description of the invention (7) The function of transferring substrate G between substrate 3 and interface surface. The relay sections 15 and 16 also function as cooling plates. The interface portion 3 includes an extension portion 36 that temporarily holds the substrate G when the substrate G is transferred between the processing portions 2 and two buffer tables 37 on both sides of the extension portion 36 for arranging buffer boxes, and The conveyance mechanism 38 which carries in and out of the board | substrate G between these and an exposure apparatus (not shown). The conveyance mechanism 38 has a conveyance arm 39 that is movable along a conveyance path 38a arranged along the arrangement direction of the extension portion 36 and the buffer table 37, and uses this conveyance arm 39 to convey the substrate G between the processing unit 2 and the exposure device. By integrating the processing units in this way, it is possible to save space and improve processing efficiency. For the photosensitive layer application of this structure, the development processing system 100, the substrate G in the cassette C is transported to the processing section 2, and in the processing section 2, first, the ultraviolet irradiation unit (UV) of the processing block 25 of the front section 2a. Surface modification and cleaning treatment, after the cooling unit (COL) is cooled, scraping washing is performed in the cleaning units (SCR) 21a, 21b, and any one of the heat treatment units (HP) in the processing block 26 is heated and dried Thereafter, any one of the cooling units (COL) in the processing block 27 is cooled. Thereafter, the substrate G is transferred to the middle section 2b. In order to improve the fixation of the photosensitive layer, the upper processing unit 30 (AD) of the processing block 30 performs a drainage process (HMDS process), and the lower cooling unit (C〇). L) After being cooled, the photosensitive layer is applied to the photosensitive layer application unit (CT) 22, and the peripheral photosensitive layer removing unit (ER) 23 removes the excess photosensitive layer on the periphery of the substrate G. After that, the substrate G is pre-baked by one of the heat treatment units (HP) in the middle section 2b, and the cooling unit (C0L) in the lower stage of the processing block 29 or the conveying arm 39. The paper size applies the Chinese national standard (CNS) A4 specification (210 X 297 mm) _ '〇_ (Please read the precautions on the back before filling out this page) • Binding and ordering printed by the Intellectual Property Bureau Staff Consumer Cooperative of the Ministry of Economic Affairs 513739 A7 B7 V. Description of the invention (8) It is cooled. Thereafter, the substrate G is transferred from the relay unit 16 to the exposure device via the main conveyance device 19 via the intervening surface portion 3 and is exposed thereon to a predetermined pattern. Then, the substrate G is carried in again via the mesasing portion 3, and if necessary, the post-exposure processing is performed in any one of the heating processing units (HP) of the processing blocks 31, 32, and 33 of the rear section 2c, and then the development processing unit (DEV) Any one of 24a to 24c is developed to form a predetermined circuit pattern. The substrate G subjected to the development process is subjected to a post-baking treatment by any one of the heat treatment units (HP) of the rear section 2c, and then cooled by any of the cooling units (C0L), and is transported by the main conveyance device 19, 18, 17 and conveyance. The mechanism 10 is housed in a predetermined cassette on the cassette platform 1. Next, the development processing units (DEV) 24a to 24c will be described in detail. FIG. 2 is a plan view showing an embodiment of the development processing units (DEV) 24a to 24c, and FIG. 3 is a sectional view showing a cup portion of the development processing units (DEV) 24a to 24c shown in FIG. 2, FIG. 4 is another cross-sectional view of the development processing units (DEV) 24a to 24c shown in FIG. 2. The development processing units (DEV) 24a to 24c are holding means for mechanically holding the substrate G. For example, the development processing unit 24a to 24c is provided with a rotation driving mechanism 42 such as a motor to rotate the rotation jig 41, and is disposed below the rotation jig 41 The cover 43 has a structure surrounding the rotary drive mechanism 42. The rotary jig 41 can be raised and lowered by a lifting mechanism (not shown), and the substrate G is transferred between the raised position and the transfer arm 19a. The rotary jig 41 can suck and hold the substrate G by vacuum suction or the like. The two bottom cups 44 and 45 on the outer periphery of the lid 43 are provided separately. Above the two bottom cups 44 and 45, an inner cup 46 for mainly allowing the imaging liquid to flow downward can be set up and down freely. On the outside of the bottom cup 45, the paper size of the inner cup is mainly applicable to the Chinese national standard (CNS) A4 specification (210X297 mm) _ _ _ (Please read the precautions on the back before filling this page)-Binding and ordering Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 513739 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 ___ V. Description of the Invention (9) 46—The bottom cup for the lubricant to flow downwards is set up and down freely 47 ° However, in Fig. 3, the positions of the inner cup 46 and the bottom cup 47 have been raised when the developer is discharged on the left side, and these positions have been lowered when the lubricant is discharged on the right side. Nozzle cleaning mechanism 120, etc. The bottom of the inner peripheral side of the bottom cup 44 is provided with an exhaust port 49 for exhausting the inside of the unit during spin drying, and is provided with two bottom cups 44 and 45 respectively. The discharge pipe 50a mainly used for discharging the developing solution, and the bottom cup 45 The bottom of the outer peripheral side is mainly a discharge pipe 50b for discharging the lubricating liquid. As shown in FIG. 2, a nozzle support arm 51 for supplying a developing liquid is provided in the tank 48, and the nozzle support arm 51 is provided with a nozzle support arm 51. A gate forming nozzle 80 as an example of a developing solution discharge nozzle for applying the developing solution to the substrate G. The gate forming nozzle 80 can be used, for example, to form the developing solution in a band shape and can be oriented in a vertical direction. Spit out, and those who are long in one direction and have a plurality of discharge openings in the lengthwise direction, or those having groove-shaped discharge openings in the lengthwise direction. The gate forming nozzle 80 is used from a developing liquid (not shown). The supply source sends out the developing solution at a predetermined time. The nozzle support arm 51 is fitted to guide rails 53a and 53b fixed to the pool 48 near both ends in the longitudinal direction. That is, the nozzle support arm 51 has a so-called Support structure at both ends. The nozzle support arm 51 may be directly fitted to the guide rails 5 3a and 53b, or as shown in FIG. 4 described later, another member that is strongly engaged with the end of the nozzle support arm 51 may be fitted in The guide rails 53a and 53b may also be used. In addition, the shape of the guide rails 53a, 5 3b is not limited, as long as the nozzle support arm 51 or another member strongly engaged with the end of the nozzle support arm 51 does not extend toward the length of the guide rails 53a, 53b. Orientation in any direction perpendicular to the paper size Applicable to Chinese National Standard (CNS) A4 specifications (210X297 mm) _ 'I (Please read the precautions on the back before filling this page) Binding line 513739 A7 B7 V. Invention (10) The separation structure is sufficient. The nozzle support arm 51 has a structure that can move across the substrate G by the drive mechanism 52 along the length of the guide rails 53a, 5 and 3b. When the gate formation nozzle 80 is not used, It becomes possible to wait in the nozzle standby part 115. However, the nozzle standby unit 115 is provided with a nozzle cleaning mechanism 120 that cleans the gate forming nozzle 80. A cylinder 58a of a lifting device is mounted on the nozzle support arm 51. The operation of the cylinder 58a enables the support plate 58b. Lifting. On the other hand, the gate-forming nozzle 80 is suspended from the support plate 58b by two lifting rods 58c in the vicinity of both ends in the longitudinal direction, and the gate-forming nozzle 80 can be lifted and lowered freely by such a lifting operation. The air cylinder 58a, the support plate 58b, and the hanging rod 58c constitute a lifting mechanism 58. With the bottom cup 47 lowered and the gate formation nozzle 80 approaching the upper position (avoided position) of the nozzle support arm 51, the nozzle support arm 51 is slid in the length direction of the guide rails 53a, 53b. The gate forming nozzle 80 can be arranged in the inner cup 46 without contacting the upper part of the bottom cup 47. Then, the developing liquid of the gate formation nozzle 80 is discharged by the lifting mechanism 58. A position (processing position) of a predetermined height is fitted from the surface of the substrate G, and the nozzle supporting arm 51 is moved (scanning) while the developing liquid is discharged. ) On the stationary substrate G, a developing liquid gate can be formed on the substrate G. In the case where the two-end support structure that holds the nozzle support arm 51 at the end in the longitudinal direction is moved toward the longitudinal direction of the guide rails 53a, 53b, for example, it is similar to the conventional one that supports the nozzle holding arm with only one end. Compared with the cantilever structure, tilting in the length direction of the nozzle support arm 5 1 can be suppressed ^^ 1- a— ϋϋ 11 In · — '— ^ — ϋ-i (Please read the precautions on the back before filling in this Page), τ
I 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） -13 513739 A7 B7 五、發明説明（11 ) 斜。且，一邊抑制發生在噴嘴支撐臂5 1的振動及擺動，一 邊可安定地移動噴嘴支撐臂5 1。 而且，藉由作成兩端支撐噴嘴支撐臂5 1的構造，即使 基板G大型化使閘門形成用噴嘴80的長度方向的長度變長 ，也可以安定地朝導引軌道53a、53b的長度方向移動。且 ，因爲閘門形成用噴嘴80對於噴嘴支撐臂5 1利用2條吊下棒 5 8c被兩端支撐地保持，所以容易使閘門形成用噴嘴80的顯 像液吐出口保持與基板G的處理面平行，由此可將顯像液 均一地朝基板G塗抹。而且，如第3圖所不，噴嘴支撐臂51 的寬形成比閘門形成用噴嘴80的寬要寬而使剛性被確保’ 而成爲噴嘴支撐臂5 1的掃描時的振動等不容易傳達至閘門 形成用噴嘴80的構造。即使如此’也可均一地從閘門形成 用噴嘴80吐出顯像液。 接著，參照第4至6圖說明噴嘴支撐臂51的驅動機構52 的一實施例。第4圖係顯示顯像處理單元（DEV)24a〜24c之 驅動機構52的驅動部分PI、P2。且，第5圖係顯示第4圖的 左側所示的將驅動部分P1的構造從箭頭A方向來看的說明 圖，第6圖係顯市第4圖的右側所7^的將驅動部分P 2的構造 從箭頭B方向來看的說明圖。 如第4及5圖所示，對於顯像處理單元（DEV)24a〜24c之 驅動部分P1，設有在導引軌道53a的一端附近的下方爲旋 轉驅動機構的1個馬達61 a，在馬達61 a的旋轉軸安裝有帶輪 62a。在帶輪62a及配置在帶輪62a下方的帶輪64a之間架設 有皮帶71a，在安裝有帶輪64a的軸桿63a，安裝有別的帶輪 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） _ _ (請先閱讀背面之注意事項再填寫本頁) -裝· ,ιτ 經濟部智慧財產局員工消費合作社印製 513739 A7 經濟部智慧財產局員工消費合作社印製 _ B7 五、發明説明（12) 6 5 a。在從帶輪6 5 a朝導引軌道5 3 a的長度方向隔有預定距離 的位置上設有帶輪66a，在帶輪65a及帶輪66a之間架設有皮 帶72a。導引軌道53a，貫通與噴嘴支撐臂51連結的支撐板 6 9 a，且配設在支撐板6 9 a的上部的連結構件6 8 a係與安裝在 皮帶72a的一部分的固定構件67a連接。 利用這種構造，對於驅動部分P1，馬達61 a旋轉的話 帶輪62a旋轉，此旋轉利用皮帶71a傳達至帶輪64a，使軸桿 63a在軸周圍旋轉。利用軸桿63a的旋轉使帶輪65a旋轉， 架設於帶輪65a及帶輪66a之間的皮帶72a依據帶輪65a的旋 轉量旋轉。利用皮帶72a的旋轉使安裝在皮帶72a的固定構 件67a，依據馬達61a的旋轉方向朝導引軌道53a的長度方向 滑移預定距離。如此，固定構件67a滑移的話，使介由連結 構件68a接合的支撐板69a滑移。這時的導引軌道5 3a因爲 貫通支撐板69a，所以支撐板69a及連接在支撐板69a的噴嘴 支撐臂51安定地朝導引軌道53a的長度方向滑移。 一方面，如第4及6圖所示，軸桿63a配置成橫跨驅動部 分PI、P2間，馬達61a的旋轉介由軸桿63a傳達至驅動部分 P2。在軸桿63a的驅動部分P2側設有帶輪81a，與被設在帶 輪81a的上方的帶輪82a之間架設有皮帶73a。如此，使軸桿 63a的旋轉傳達至帶輪82a。在帶輪82a的旋轉軸配設有帶輪 83a，利用帶輪82a使帶輪83a旋轉。 在從帶輪83a朝導引軌道53b的長度方向隔有預定距離 的位置設有帶輪84a，在帶輪84a、84b之間架設有皮帶74a 。如此，依據帶輪83a的旋轉量使皮帶74a旋轉。在皮帶74a (請先閲讀背面之注意事項再填寫本頁) 裝· 訂 線_ 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） -15- 513739 經濟部智慧財產局員工消費合作社印製 A7 _ B7 _ 五、發明説明（13) 的一部分安裝有固定構件85a，固定構件85a將噴嘴支撐臂 51與在其之上部連結的連結構件86a連接。導引軌道53b因 爲配設成貫通連結構件86a，所以連結構件86a配合皮帶74a 的動作朝導引軌道53b的長度方向滑動。 如上述，對於驅動部分P2將軸桿63a的旋轉驅動力朝 上部傳達的構造的理由，係爲如第4圖所示，在驅動部分P2 側的池48的壁面形成供在搬運臂19a及旋轉夾具41之間進行 基板G的移載用的窗部6。 對於驅動機構52，1個馬達61a同時傳達至連結噴嘴支 撐臂51的驅動部分P1側的支撐板69a及驅動部分P2側的連 結構件86a，實現在噴嘴支撐臂51的導引軌道53a、53b的長 度方向的掃描。利用這種兩端驅動提高噴嘴支撐臂5 1的驅 .動控制特性。 驅動機構52，當噴嘴支撐臂51的動作開始時及結束時 爲了減低發生於噴嘴支撐臂51的擺動及振動，而抑制噴嘴 支撐臂5 1的驅動加速度。例如：在靜止狀態的噴嘴支撐臂 51當附與加速度急速開始滑行動作，或相反地急速停止滑 行動作中的噴嘴支撐臂5 1的情況時，會容易在閘門形成用 噴嘴80等施加較大的負荷，或容易發生振動及擺動。這種 閘門形成用噴嘴80的振動及擺動，在顯像液的吐出中，可 能會給與已形成顯像液閘門的部分的起波浪等的發生等的 影響。 在此，爲了回避這種問題，例如：當噴嘴支撐臂5 1的 的驅動開始時使速度漸漸地增加地慢慢地加速，一方面， 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） ~ " (請先閲讀背面之注意事項再填寫本頁) 裝· 訂 線 經濟部智慧財產局員工消費合作社印製 513739 A7 __ B7 _ 五、發明説明（14 ) 當驅動停止時使速度漸漸地減小地慢慢地停止，來控制噴 嘴支撐臂51的驅動加速度較佳的控制機構，係被組裝在後 述的控制裝置70。 如第4圖所示，所謂馬達61a周圍及皮帶7 la〜74a周圍 的發塵（發生粒子）所預測的部分，係從基板G的被曝晒的 氣雰被隔離，而成爲在基板G的表面無粒子飛散的構造。 在這些部分利用設置局部的排氣機構，作爲更確實地使粒 子不朝向基板G飛散的構造較佳。對於昇降機構58，例如 :也設置將昇降機構58及閘門形成用噴嘴80對於上昇位置 包圍的蓋，作成使其之蓋內排氣的構造較佳。 接著，在池48內設有安裝有吐出潤滑液的潤滑液吐出 噴嘴55的噴嘴支撐臂54。潤滑液吐出噴嘴55，例如：爲可 以使用具有管狀的吐出口者。噴嘴支撐臂54係與噴嘴支撐 臂51同樣具有兩端支撐構造，爲了確保預定的剛性而將該 寬設定較寬。 噴嘴支撐臂54，利用驅動機構56構成可沿著導引軌道 5 3 a、5 3 b的長度方向滑行自如，而可以一邊從潤滑液吐出 噴嘴5 5吐出潤滑液，一邊掃描基板G。然而，在第2圖中雖 無圖示，但配設有用來調整潤滑液吐出噴嘴55的高度位置 的昇降機構。 驅動機構56的驅動形態係與前述的驅動機構52的驅動 形態相同。也就是說，如第4及5圖所示，對於導引軌道53a 的長度方向的端部，在與配設有馬達61a的端部的相反側的 端部配設有馬達61 b，在馬達6 1 b的旋轉軸安裝有帶輪62b。 (請先閲讀背面之注意事項再填寫本頁)I Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper is sized to the Chinese National Standard (CNS) A4 (210X 297 mm) -13 513739 A7 B7 V. Description of the invention (11) Oblique. In addition, the nozzle support arm 51 can be moved stably while suppressing vibration and swing occurring in the nozzle support arm 51. Furthermore, by having a structure that supports the nozzle support arms 51 at both ends, even if the substrate G is enlarged and the length in the longitudinal direction of the gate forming nozzle 80 is increased, it can be moved stably toward the longitudinal directions of the guide rails 53a and 53b. . In addition, since the gate forming nozzle 80 is held by the two ends of the nozzle support arm 51 with two hanging rods 5 8c, it is easy to maintain the developing liquid discharge port of the gate forming nozzle 80 and the processing surface of the substrate G. In parallel, the developing liquid can be uniformly applied to the substrate G. Moreover, as shown in FIG. 3, the width of the nozzle support arm 51 is wider than the width of the nozzle 80 for gate formation, and the rigidity is ensured. As a result, vibrations during scanning of the nozzle support arm 51 are not easily transmitted to the gate. Structure of the forming nozzle 80. Even so ', the developing liquid can be discharged uniformly from the gate-forming nozzle 80. Next, an embodiment of the drive mechanism 52 of the nozzle support arm 51 will be described with reference to FIGS. 4 to 6. Fig. 4 shows the driving portions PI and P2 of the driving mechanism 52 of the development processing units (DEV) 24a to 24c. Moreover, FIG. 5 is an explanatory diagram showing the structure of the driving part P1 shown on the left side of FIG. 4 as viewed from the direction of arrow A, and FIG. 6 is a driving part P on the right side of FIG. 2 is an explanatory view of the structure viewed from the direction of arrow B. As shown in FIGS. 4 and 5, a driving part P1 of the development processing unit (DEV) 24 a to 24 c is provided with a motor 61 a that is a rotary driving mechanism below one end of the guide rail 53 a. A pulley 62a is attached to the rotating shaft of 61a. A belt 71a is set between the pulley 62a and the pulley 64a disposed below the pulley 62a. A shaft 63a is installed with the pulley 64a, and other pulleys are installed. The paper size applies to the Chinese National Standard (CNS) A4. Specifications (210X297 mm) _ _ (Please read the notes on the back before filling out this page) -Installed ·, ιτ Printed by the Employees 'Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 513739 A7 Printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs _ B7 V. Description of the invention (12) 6 5 a. A pulley 66a is provided at a predetermined distance from the pulley 65a to the longitudinal direction of the guide rail 53a, and a leather belt 72a is stretched between the pulley 65a and the pulley 66a. The guide rail 53a passes through the support plate 6 9a connected to the nozzle support arm 51, and a connecting member 6 8a arranged on the upper portion of the support plate 6 9a is connected to a fixing member 67a attached to a part of the belt 72a. With this structure, when the motor 61a rotates with respect to the driving portion P1, the pulley 62a rotates, and this rotation is transmitted to the pulley 64a by the belt 71a, so that the shaft 63a rotates around the shaft. The pulley 65a is rotated by the rotation of the shaft 63a, and the belt 72a suspended between the pulley 65a and the pulley 66a is rotated in accordance with the rotation amount of the pulley 65a. The rotation of the belt 72a causes the fixed member 67a mounted on the belt 72a to slide a predetermined distance in the length direction of the guide rail 53a in accordance with the rotation direction of the motor 61a. As described above, when the fixing member 67a slides, the support plate 69a joined via the connection member 68a slides. Since the guide rail 53a at this time penetrates the support plate 69a, the support plate 69a and the nozzle support arm 51 connected to the support plate 69a slide stably in the longitudinal direction of the guide rail 53a. On the other hand, as shown in Figs. 4 and 6, the shaft 63a is disposed across the driving portions PI and P2, and the rotation of the motor 61a is transmitted to the driving portion P2 through the shaft 63a. A pulley 81a is provided on the drive portion P2 side of the shaft 63a, and a belt 73a is stretched between the pulley 81a and the pulley 82a provided above the pulley 81a. In this way, the rotation of the shaft 63a is transmitted to the pulley 82a. A pulley 83a is arranged on the rotation shaft of the pulley 82a, and the pulley 83a is rotated by the pulley 82a. A pulley 84a is provided at a predetermined distance from the pulley 83a in the longitudinal direction of the guide rail 53b, and a belt 74a is stretched between the pulleys 84a and 84b. In this way, the belt 74a is rotated in accordance with the amount of rotation of the pulley 83a. On the belt 74a (please read the precautions on the back before filling in this page) Binding and Binding _ This paper size is applicable to China National Standard (CNS) A4 specification (210X297 mm) -15- 513739 Employees' Cooperatives of Intellectual Property Bureau, Ministry of Economic Affairs Printed A7 _ B7 _ 5. A part of the description of the invention (13) is provided with a fixing member 85 a which connects the nozzle support arm 51 with a connecting member 86 a which is connected to the upper part of the nozzle supporting arm 51. Since the guide rail 53b is disposed to penetrate the connecting member 86a, the connecting member 86a slides in the longitudinal direction of the guide rail 53b in accordance with the operation of the belt 74a. As described above, the reason for the structure in which the driving portion P2 transmits the rotational driving force of the shaft 63a toward the upper part is that, as shown in FIG. 4, the wall surface of the pool 48 on the driving portion P2 side is formed for the transfer arm 19a and rotating The window portion 6 for transferring the substrate G is performed between the jigs 41. As for the driving mechanism 52, one motor 61a is simultaneously transmitted to the supporting plate 69a on the driving portion P1 side and the connecting member 86a on the driving portion P2 side of the nozzle supporting arm 51, and realizes the guide rails 53a and 53b of the nozzle supporting arm 51. Scanning in the length direction. The two-end driving is used to improve the driving control characteristics of the nozzle support arm 51. The driving mechanism 52 suppresses the driving acceleration of the nozzle support arm 51 at the beginning and end of the operation of the nozzle support arm 51 in order to reduce the oscillation and vibration occurring in the nozzle support arm 51. For example, when the nozzle support arm 51 in a stationary state is rapidly attached to acceleration to start a coasting operation, or if the nozzle support arm 51 in the coasting operation is suddenly stopped, a large nozzle is easily applied to the gate forming nozzle 80 or the like. Load, or prone to vibration and swing. The vibration and swing of the gate-forming nozzle 80 may affect the occurrence of waves and the like in the portion where the developing-solution gate is formed during the discharge of the developing solution. Here, in order to avoid such a problem, for example, when the driving of the nozzle support arm 51 is started, the speed is gradually increased and gradually accelerated. On the one hand, this paper size applies the Chinese National Standard (CNS) A4 specification (210X297). (Mm) ~ (Please read the precautions on the back before filling out this page) Assembling and Threading Printed by the Intellectual Property Bureau Employee Consumer Cooperative of the Ministry of Economy 513739 A7 __ B7 _ V. Description of the invention (14) When the drive stops The control mechanism that controls the driving acceleration of the nozzle support arm 51 and gradually stops while gradually decreasing the speed gradually is assembled in a control device 70 described later. As shown in FIG. 4, the part predicted by the dust (particle generation) around the motor 61 a and around the belt 7 la to 74 a is isolated from the exposed atmosphere of the substrate G and becomes the surface of the substrate G. No particle scattering structure. It is preferable to use a local exhaust mechanism in these parts as a structure for more reliably preventing particles from scattering toward the substrate G. For the lifting mechanism 58, for example, it is also preferable to provide a structure surrounding the lifting position of the lifting mechanism 58 and the gate-forming nozzle 80 for the cover to elevate the inside of the cover. Next, a nozzle support arm 54 is provided in the tank 48 to which a lubricant discharge nozzle 55 for discharging a lubricant is attached. The lubricating liquid discharge nozzle 55 is, for example, a pipe having a tubular discharge port. The nozzle support arm 54 has a two-end support structure similar to the nozzle support arm 51, and the width is set to be wide to ensure a predetermined rigidity. The nozzle support arm 54 is constituted by the drive mechanism 56 so as to be able to slide freely along the length of the guide rails 5 3a and 5 3b, and can scan the substrate G while discharging the lubricant from the nozzle 55. However, although not shown in the second figure, a lifting mechanism for adjusting the height position of the lubricant discharge nozzle 55 is provided. The driving form of the driving mechanism 56 is the same as the driving form of the driving mechanism 52 described above. That is, as shown in FIGS. 4 and 5, the end portion in the longitudinal direction of the guide rail 53 a is provided with a motor 61 b at an end portion opposite to the end portion where the motor 61 a is provided. A pulley 62b is attached to the rotating shaft of 6 1 b. (Please read the notes on the back before filling this page)
本紙張尺度適用中國國家榡準（CNS ) A4規格（210X297公釐） -17- 經濟部智慧財產局員工消費合作社印製 513739 A7 ___ B7 ____ 五、發明説明（15 ) 在此考慮驅動機構56的省空間化，而使馬達61b安裝在帶輪 66a的橫側，將帶輪64b配置在帶輪62b的上方，且在這些 帶輪62b、64b之間架設皮帶71b。在安裝有帶輪64b的帶輪 63b另外配設有帶輪65b，且在從帶輪65b朝導引軌道53a的 長度方向隔有預定距離的位置上設有帶輪66b。而且，在帶 輪65b、66b之間架設有皮帶72b。 導引軌道53a，貫通與噴嘴支撐臂54連結的支撐板69b ’ 配設於支撐板69b的下部的連結構件68b係與安裝於皮帶72b 的一部分的固定構件6 7 b連接。 依據這種結構，對於驅動部分P1，馬達61b旋轉的話 帶輪62b也旋轉，此旋轉利用皮帶71b傳達至帶輪64b，由此 ，使帶輪63b在軸周圍旋轉。利用帶輪63b的旋轉使帶輪65b .旋轉，架設於帶輪65b及帶輪66b之間的皮帶72b依據帶輪 65b的旋轉量旋轉。利用皮帶72b的旋轉使安裝於皮帶72b 的固定構件67b，依據馬達61b的旋轉的方向朝導引軌道53a 的長度方向滑移預定距離。如此使固定構件67b移動的話， 介由連結構件68b接合的支撐板69b也滑移。這時因爲導引 軌道53a貫通支撐板69b，所以支撐板69b及連接在支撐板 69b的噴嘴支撐臂54，可安定地朝導引軌道53a的長度方向 滑行。 如第6圖所示，帶輪63b係設成橫跨驅動部分PI、P2之 間，使馬達61b的旋轉介由帶輪63b傳達至驅動部分P2。在 帶輪63b的驅動部分P2側設有帶輪81b，與設在帶輪81b的 上方的帶輪82b之間架設有皮帶73b。如此，帶輪63b的旋轉 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） _化_ (請先閲讀背面之注意事項再填寫本頁)This paper size applies to China National Standards (CNS) A4 (210X297 mm) -17- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs 513739 A7 ___ B7 ____ 5. Description of the invention (15) Consider the drive mechanism 56 here Space-saving, the motor 61b is mounted on the lateral side of the pulley 66a, the pulley 64b is arranged above the pulley 62b, and a belt 71b is set between these pulleys 62b and 64b. The pulley 63b to which the pulley 64b is attached is additionally provided with a pulley 65b, and a pulley 66b is provided at a position spaced a predetermined distance from the pulley 65b in the longitudinal direction of the guide rail 53a. A belt 72b is stretched between the pulleys 65b and 66b. The guide rail 53a passes through a support plate 69b 'connected to the nozzle support arm 54 and a connection member 68b disposed at a lower portion of the support plate 69b is connected to a fixing member 6 7b attached to a part of the belt 72b. According to this structure, when the motor 61b rotates with respect to the driving portion P1, the pulley 62b also rotates, and this rotation is transmitted to the pulley 64b by the belt 71b, thereby rotating the pulley 63b around the shaft. The pulley 65b is rotated by the rotation of the pulley 63b, and the belt 72b stretched between the pulley 65b and the pulley 66b is rotated in accordance with the rotation amount of the pulley 65b. The rotation of the belt 72b causes the fixing member 67b mounted on the belt 72b to slide a predetermined distance in the length direction of the guide rail 53a according to the rotation direction of the motor 61b. When the fixed member 67b is moved in this way, the support plate 69b joined via the connecting member 68b also slides. At this time, since the guide rail 53a penetrates the support plate 69b, the support plate 69b and the nozzle support arm 54 connected to the support plate 69b can stably slide in the longitudinal direction of the guide rail 53a. As shown in Fig. 6, the pulley 63b is provided across the driving portions PI and P2, and the rotation of the motor 61b is transmitted to the driving portion P2 via the pulley 63b. A pulley 81b is provided on the drive part P2 side of the pulley 63b, and a belt 73b is stretched between the pulley 81b and the pulley 82b provided above the pulley 81b. In this way, the rotation of the pulley 63b is in accordance with the Chinese National Standard (CNS) A4 specification (210X297 mm) _ 化 _ (Please read the precautions on the back before filling this page)
513739 A7 B7 五、發明説明（16 ) 傳達至帶輪82b。在帶輪82b配設有帶輪83b，利用帶輪82b 的旋轉使帶輪83b旋轉。 m- an 1 II an I ϋ (請先閲讀背面之注意事項再填寫本頁) 且，在從帶輪83b朝導引軌道53b的長度方向隔開的位 置設有帶輪84b。在帶輪83b、84b間架設有皮帶74b。如此 ，帶輪83b旋轉的話，依據帶輪83b的旋轉量使皮帶74b旋 轉。在皮帶74b的一部分安裝有固定構件85b，固定構件85b 係與將噴嘴支撐臂54連結於該上部的連結構件86b連接。導 引軌道53b因爲配設成貫通連結構件86b，所以連結構件86b 配合皮帶74b的動作朝導引軌道53b的長度方向滑行。如此 使噴嘴支撐臂54也被兩端驅動，而具有高驅動性能。 對於上述的顯像處理單元（DEV)24a〜24c，使旋轉夾具 4 1旋轉的旋轉驅動機構42、滑移顯像液用的噴嘴支撐臂5 1 的驅動機構52以及滑移潤滑液用的噴嘴支撐臂54的驅動機 構56，如第7圖所示，皆利用控制裝置70被控制。 經濟部智慧財產局員工消費合作社印製 接著，說明使用具有上述閘門形成用噴嘴80的顯像處 理單元（DEV) 24a〜24c的顯像處理過程。首先，在將內杯46 及底杯47保持在下段（第3圖右側位置）的狀態下，打開窗部6 將保持著基板G的搬運臂19a***顯像處理單元（DEV)24a〜 24c，配合此時間使旋轉夾具41上昇，將基板G朝旋轉夾具 41移載。 將搬運臂19a待避於顯像處理單元（DEV)24a〜24c之外 後，關閉窗部6，降下載置有基板G的旋轉夾具41保持在預 定位置。在閘門形成用噴嘴80不接觸底杯47上端地朝上方 被抬起的狀態下動作驅動機構52，使噴嘴支撐臂5 1朝內杯 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 513739 經濟部智慧財產局員工消費合作社印製 A7 B7 ________五、發明説明（17 ) 46內的預定位置移動。使用昇降機構58將閘門形成用噴嘴 80朝下方的預定位置移動保持，一邊從閘門形成用噴嘴80 將預定的顯像液吐出於基板G上一邊掃描噴嘴支撐臂5 1 ’ 藉由將閘門形成用噴嘴80在基板G上掃描，而形成顯像液 閘門。 形成顯像液閘門後，至預定的顯像處理時間（顯像反應 時間）經過爲止之間，動作昇降機構58使閘門形成用噴嘴80 回到上方位置，且將噴嘴支撐臂51朝噴嘴待機部115移動。 取而代之，驅動噴嘴支撐臂54，使潤滑液吐出噴嘴55對於 基板G上的預定位置保持預定的高度，上昇內杯46及底杯 47保持在在上段作業（第3圖的左側位置）。此上段位置，係 爲：基板G的表面的水平位置幾乎配合內杯46的錐面部的 .位置的高度。 以低速旋轉基板G且與進行脫乾顯像液動作的幾乎同 時從潤滑液吐出噴嘴55吐出潤滑液，且與這些動作幾乎同 時，利用排氣口 49開始排氣動作。也就是說，在顯像反應 時間的經過之前排氣口 49呈未動作的狀態較佳，由此，在 形成於基板G上的顯像液閘門，不會有因排氣口 49所產生 的氣流等的不良影響。 開始基板G的旋轉後，從基板G朝其外周飛散的顯像 液及潤滑液，碰到內杯46的錐面部及外周壁（垂直壁）而被導 至下方，從排出管50a排出。這時從基板G的旋轉開始至預 定的時間經過爲止，主要由顯像液所組成的顯像液濃度較 高的處理液從排出管50a排出。將排出管50a分岐於複數的 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） 20^ ' "~" (請先閱讀背面之注意事項再填寫本頁) 裝· 訂 -線_ 513739 A7 B7 五、發明説明（18 ) 排液回路，且設有可切換排液回路的切換閥等’藉由操作 此切換閥等，由預定的回路回收顯像液濃度較高的處理液 ，提供再利用較佳。且，可以由預定的回路廢棄顯像液濃 度較低的處理液。 在基板G的旋轉開始經過預定時間後，一邊吐出潤滑 液，一邊在旋轉基板G的狀態下降下內杯46及底杯47保持 在下段位置。下段位置，係爲：基板G的表面的水平位置 幾乎配合底杯47的錐面部的位置的高度。而且，爲了減少 顯像液的殘渣，可將旋轉數設定成比供脫乾顯像液用的旋 轉動作開始時要大。提高該基板G的旋轉數的操作，係與 內杯46及底杯47的降下動作同時或在其前後的階段進行也 可以。如此，從基板G飛散的主要由潤滑液所組成的處理 液，碰到底杯47的錐面部及外周壁而從排出管50b排出。 接著，停止潤滑液的吐出，進行潤滑液吐出噴嘴55的 高度調節，使潤滑液吐出噴嘴55及噴嘴支撐臂54待避於底 杯47之外。更提高基板G的旋轉數保持預定時間，進行乾 燥基板G的旋轉乾燥。此旋轉乾燥，一邊從基板G上方進 行將乾燥的氮氣等朝基板吹送較佳。 旋轉乾燥結束後停止基板G的旋轉，上昇旋轉夾具41 ，配合該時間將搬運臂19a***顯像處理單元（DEV) 24a〜 24c內進行基板G的移載，之後對於預定數量的基板g進 行上述重覆的動作。然而，從基板G的旋轉結束後至朝基 板G的搬運臂1 9a的移載爲止之間，停止由排氣口 49之排氣 動作。 本紙張尺度適用中國國家標準（CNS ) A4規格（210X 297公釐） (請先閲讀背面之注意事項再填寫本頁) -裝·513739 A7 B7 5. The invention description (16) is transmitted to the pulley 82b. The pulley 82b is provided with a pulley 83b, and the pulley 83b is rotated by the rotation of the pulley 82b. m- an 1 II an I ϋ (please read the precautions on the back before filling in this page). The pulley 84b is provided at a position spaced from the pulley 83b toward the length of the guide rail 53b. A belt 74b is set between the pulleys 83b and 84b. In this way, when the pulley 83b is rotated, the belt 74b is rotated according to the amount of rotation of the pulley 83b. A fixing member 85b is attached to a part of the belt 74b, and the fixing member 85b is connected to a connection member 86b that connects the nozzle support arm 54 to the upper portion. Since the guide rail 53b is arranged to penetrate the connecting member 86b, the connecting member 86b slides in the longitudinal direction of the guide rail 53b in accordance with the operation of the belt 74b. In this way, the nozzle supporting arm 54 is also driven at both ends, and has high driving performance. Regarding the above-mentioned development processing units (DEVs) 24a to 24c, the rotation driving mechanism 42 for rotating the rotation jig 41, the driving mechanism 52 for the nozzle support arm 51 for sliding the developing liquid, and the nozzle for sliding the lubricant As shown in FIG. 7, the driving mechanism 56 of the support arm 54 is controlled by the control device 70. Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Next, a description will be given of a development processing procedure using the development processing units (DEVs) 24a to 24c having the above-mentioned gate forming nozzle 80. First, with the inner cup 46 and the bottom cup 47 held at the lower stage (right position in FIG. 3), the window 6 is opened, and the transfer arm 19 a holding the substrate G is inserted into the development processing units (DEV) 24 a to 24 c. In accordance with this time, the rotary jig 41 is raised, and the substrate G is transferred toward the rotary jig 41. After the transfer arm 19a is kept away from the development processing units (DEV) 24a to 24c, the window portion 6 is closed, and the rotary jig 41 on which the substrate G is placed is held at a predetermined position. The drive mechanism 52 is actuated in a state where the nozzle 80 for gate formation is lifted upward without contacting the upper end of the bottom cup 47, so that the nozzle support arm 5 1 faces the inner cup. The paper size applies the Chinese National Standard (CNS) A4 specification (210X297) (%) 513739 Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs, A7 B7 ________ V. Invention description (17) 46 moves to a predetermined position. The lifter mechanism 58 is used to move and hold the nozzle 80 for forming a gate to a predetermined downward position, and scan the nozzle support arm 5 1 ′ while ejecting a predetermined developing liquid from the nozzle 80 for forming a gate onto the substrate G. The nozzle 80 is scanned on the substrate G to form a developing liquid gate. After the developing liquid gate is formed, until the predetermined developing processing time (development reaction time) elapses, the lift mechanism 58 is operated to return the gate forming nozzle 80 to the upper position, and the nozzle supporting arm 51 is directed toward the nozzle standby portion. 115 moves. Instead, the nozzle support arm 54 is driven to maintain the lubricant discharge nozzle 55 at a predetermined height on a predetermined position on the substrate G, and the rising inner cup 46 and the bottom cup 47 are maintained in the upper stage operation (the left position in FIG. 3). This upper position is such that the horizontal position of the surface of the substrate G almost matches the height of the. Position of the tapered surface portion of the inner cup 46. The substrate G is rotated at a low speed and the lubricant is ejected from the lubricant ejection nozzle 55 at almost the same time as the developing liquid dehydration operation is performed. At the same time as these operations, the exhaust operation is started using the exhaust port 49. In other words, it is preferable that the exhaust port 49 is in a non-operating state before the development reaction time elapses. Therefore, the developing liquid gate formed on the substrate G does not have a problem caused by the exhaust port 49. Adverse effects of air flow, etc. After the rotation of the substrate G is started, the developing liquid and the lubricating liquid scattered from the substrate G toward the outer periphery thereof are brought into contact with the tapered surface portion of the inner cup 46 and the outer peripheral wall (vertical wall), and are discharged from the discharge pipe 50a. At this time, from the start of the rotation of the substrate G to the elapse of a predetermined time, a processing liquid having a high concentration of the developing solution mainly composed of the developing solution is discharged from the discharge pipe 50a. Dividing the discharge pipe 50a into plural paper sizes is applicable to the Chinese National Standard (CNS) A4 specification (210X297 mm) 20 ^ '" ~ " (Please read the precautions on the back before filling this page)线 513739 A7 B7 V. Description of the invention (18) Discharge circuit, and a switching valve that can switch the drainage circuit is provided. It is better to provide reuse. Furthermore, the processing liquid having a low concentration of the developing liquid can be discarded by a predetermined circuit. After a predetermined period of time has elapsed from the start of rotation of the substrate G, the inner cup 46 and the bottom cup 47 are lowered while the substrate G is being rotated while being discharged, and the bottom cup 47 is maintained at the lower position. The lower position is a height at which the horizontal position of the surface of the substrate G almost matches the position of the tapered surface portion of the bottom cup 47. Furthermore, in order to reduce the residue of the developing solution, the number of rotations may be set to be larger than that at the start of the rotation operation for drying the developing solution. The operation of increasing the number of rotations of the substrate G may be performed simultaneously with the lowering operation of the inner cup 46 and the bottom cup 47, or at a stage before and after the lowering operation. In this manner, the processing liquid mainly composed of the lubricating liquid scattered from the substrate G hits the tapered surface portion and the outer peripheral wall of the bottom cup 47 and is discharged from the discharge pipe 50b. Then, the discharge of the lubricating liquid is stopped, and the height of the lubricating liquid discharge nozzle 55 is adjusted so that the lubricating liquid discharge nozzle 55 and the nozzle support arm 54 are kept out of the bottom cup 47. The number of rotations of the substrate G is further increased for a predetermined time, and the spin-drying of the substrate G is performed. In this spin-drying, dry nitrogen or the like is blown toward the substrate from above the substrate G. After the spin-drying is completed, the rotation of the substrate G is stopped, and the rotation jig 41 is raised, and the transfer arm 19a is inserted into the development processing units (DEV) 24a to 24c to transfer the substrate G, and then the above is performed for a predetermined number of substrates g Repeated action. However, after the rotation of the substrate G is completed and the transfer to the transfer arm 19a of the substrate G is stopped, the exhaust operation from the exhaust port 49 is stopped. This paper size applies to Chinese National Standard (CNS) A4 specification (210X 297 mm) (Please read the precautions on the back before filling this page)-Packing ·
、1T 經濟部智慧財產局員工消費合作社印製 513739 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明説明（19 ) 以上，雖說明本發明之實施例，但本發明並不限定於 上述形態，可作種種的變形。例如：在上述形態中，雖對 於噴嘴支撐臂51、54係爲與呈平行配設的導引軌道5 3a、5 3b 嵌合的兩端支撐構造，且爲利用驅動部分PI、P2的兩端驅 動構造，但例如：對於兩端支撐構造，只爲利用驅動部分 P1之一端驅動構造也可以。即使這種情況，也可以利用導 引軌道53a、53b確保噴嘴支撐臂51、54的位置精度。 導引軌道53a、53b的位置並不限定於上述實施例所示 之位置，只要在噴嘴支撐臂51、54的長度方向的端部附近 ，其高度位置並無限制。而且，加上導引軌道53a、53b，設 在噴嘴支撐臂5 1的長度方向的兩端附近，或依據情況設在 中央部、甚至別的導引軌道也可以。 而且，噴嘴支撐臂51、54的驅動機構52、56,雖使用 利用帶輪及皮帶傳達旋轉驅動力的方法，但例如：在導弓丨 軌道53a、53b，配設可在其之長度方向移動的線型致動器等 ，且即使作成接合此線型致動器及噴嘴支撐臂5 1、54的構 造或者是爲兩端支撐構造，而進行一端驅動或兩端驅動也 可以。 且，配置在噴嘴支撐臂51、54的顯像液吐出噴嘴及潤 滑液吐出噴嘴並不限定各爲1條，配設2條以上，且配設顯 像液及潤滑液的吐出形態不同的噴嘴也可以。在配設複數 的顯像液吐出噴嘴的情況時，構成可以從不同的顯像液吐 出噴嘴吐出不同種類或濃度的顯像液的話，則可以容易地 對應顯像液不同的基板G的顯像處理。 本纸張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐） (請先閲讀背面之注意事項再填寫本頁)1T printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 513739 printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (19) Above, although the embodiments of the present invention are described, the present invention is not limited to the above Forms can be deformed in various ways. For example, in the above form, although the nozzle support arms 51 and 54 are two-end support structures fitted with the guide rails 5 3a and 5 3b arranged in parallel, and both ends of the driving portions PI and P2 are used The drive structure, but for example, for the two-end support structure, it is also possible to use only one drive structure of the drive portion P1. Even in this case, the guide rails 53a, 53b can be used to ensure the positional accuracy of the nozzle support arms 51, 54. The positions of the guide rails 53a and 53b are not limited to the positions shown in the above embodiments, and there is no restriction on the height positions of the guide rails 53a and 53b as long as they are near the longitudinal ends of the nozzle support arms 51 and 54. Furthermore, the guide rails 53a and 53b may be provided near the both ends in the longitudinal direction of the nozzle support arm 51, or may be provided at the central portion according to circumstances, or even other guide rails may be provided. In addition, the drive mechanisms 52 and 56 of the nozzle support arms 51 and 54 use a pulley and a belt to transmit a rotational driving force, but for example, the guide bows 丨 rails 53a and 53b are provided to be movable in the longitudinal direction thereof. It is also possible to perform one-end drive or two-end drive even if a structure that joins the linear actuator and the nozzle support arms 5 1 and 54 or a two-end support structure is formed. In addition, the developer discharge nozzles and the lubricant discharge nozzles arranged on the nozzle support arms 51 and 54 are not limited to one each, and two or more nozzles are provided, and nozzles with different ejection forms of the developer and lubricant liquid are provided. Yes. When a plurality of developing solution discharge nozzles are provided, if different types or concentrations of developing solutions can be discharged from different developing solution discharge nozzles, it is possible to easily cope with the development of different substrates G of the developing solution. deal with. This paper size applies to China National Standard (CNS) A4 (210 X 297 mm) (Please read the precautions on the back before filling this page)
經濟部智慧財產局員工消費合作社印製 513739 A7 B7 五、發明説明（20 ) 而且，保持基板G的手段，不限定於利用吸附力保持 基板G的旋轉夾具41，也可以使用例如：在比基板G大的 旋轉板上將基板G載置於呈凸狀形成的複數的固定銷上， 當旋轉基板G時，不使基板G偏離基板G的端面的預定位 置，例如在4角由與基板G不同的銷等保持的機械方法。 而且，在顯像處理過程中，雖由昇降內杯46及底杯47 來進行顯像液的脫去、潤滑處理、旋轉乾燥時的位置調節 ，但固定內杯46及底杯47，一邊昇降41保持在預定位置， 一邊進行顯像液的脫去等的處理也可以。在上述實施例中 ，雖以LCD基板爲被處理基板作說明，但也可以使用半導 體晶圓、CD基板等的其他基板，且，不限定於顯像處理， 也可以使用於這些種種的基板的洗淨處理或感光層塗抹處 理等的其他的液處理等。 [發明之效果] 如上述，依據本發明，因爲噴嘴保持臂是與呈平行配 設的導引軌道嵌合的兩端支撐構造，所以噴嘴保持臂的一 端的高度位置不會產生變化，或在一端產生擺動，可將噴 嘴保持臂及處理液吐出噴嘴沿著導引軌道的長度方向安定 地移動。且，與將車安裝在噴嘴保持臂而滑走於軌道上的 構造相比，可以減低振動發生。而且，控制噴嘴保持臂的 驅動加速度，例如：藉由慢慢地控制噴嘴保持臂的驅動開 始時及驅動結束時的動作，可以減低發生於噴嘴保持臂的 擺動或振動，使可均一地進行處理液的吐出，而可獲得安 定製品的品質，提高生產成品率之顯著效果。 本紙張尺度適用中國國家標準（CNS ) A4規格（ 210X297公釐） _ % _ ' (請先閱讀背面之注意事項再填寫本頁)Printed by the Employees ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 513739 A7 B7 V. Description of the Invention (20) Furthermore, the means for holding the substrate G is not limited to the rotating jig 41 holding the substrate G by the adsorption force. For example, The substrate G is placed on a plurality of fixing pins formed in a convex shape on a large G rotating plate. When the substrate G is rotated, the substrate G is not deviated from a predetermined position on the end surface of the substrate G, for example, the substrate G Different pins hold mechanical methods. Moreover, during the development process, although the inner cup 46 and the bottom cup 47 are lifted to perform the removal of the developing solution, the lubrication process, and the position adjustment during the spin-drying, the inner cup 46 and the bottom cup 47 are fixed while being raised and lowered. 41 is maintained at a predetermined position, and processing such as removal of the developing solution may be performed. In the above embodiment, although the LCD substrate is described as the substrate to be processed, other substrates such as semiconductor wafers and CD substrates may be used, and the invention is not limited to development processing, and may be used for these various substrates. Other liquid treatments, such as a washing process or a photosensitive layer coating process. [Effects of the Invention] As described above, according to the present invention, since the nozzle holding arm has a two-end support structure that fits into a guide rail that is arranged in parallel, the height position of one end of the nozzle holding arm does not change, or One end swings, and the nozzle holding arm and the processing liquid discharge nozzle can be stably moved along the length of the guide rail. Furthermore, it is possible to reduce the occurrence of vibration as compared with a structure in which the vehicle is mounted on the nozzle holding arm and slips off the rail. In addition, by controlling the acceleration of the nozzle holding arm, for example, by slowly controlling the movements of the nozzle holding arm at the start and end of the driving, it is possible to reduce the swing or vibration of the nozzle holding arm and enable uniform processing. The liquid is discharged, and the quality of the stable product can be obtained, and the significant effect of improving the production yield is achieved. This paper size applies Chinese National Standard (CNS) A4 specification (210X297 mm) _% _ '(Please read the precautions on the back before filling this page)
經濟部智慧財產局員工消費合作社印製 513739 A7 B7 五、發明説明（21 ) [圖面之簡單說明] 第1圖係爲有關本發明的液處理裝置的一實施例的具有 顯像處理裝置（顯像處理單元）之感光層塗抹·顯像處理系統 之平面圖。 第2圖係顯示本發明的液處理裝置的顯像處理單元的一 實施例之平面圖。 第3圖係顯示第2圖所不的顯像處理裝置之剖面圖。 第4圖係顯示第2圖所示的顯像處理裝置之另一剖面圖 〇 第5圖係顯示第2圖所示的顯像處理裝置之的噴嘴支撐 臂的驅動機構之說明圖。 第6圖係顯示第2圖所示的顯像處理裝置的噴嘴支撐臂 .的驅動機構之另一說明圖。 第7圖係顯不第2圖所不的顯像處理裝置的驅動系之說 明圖。 [圖號說明] 1匣平台 2處理部 3介面部 24a〜24c顯像處理單元（DEV) 4 1旋轉夾具 46內杯 47底杯 48池 本紙張尺度適用中國國家標準（CNS ) A4規格（210 X 297公釐) " (請先閲讀背面之注意事項再填寫本頁)Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs 513739 A7 B7 V. Description of the invention (21) [Simplified description of the drawing] The first figure is an embodiment of the liquid processing device of the present invention with a development processing device ( A plan view of a photosensitive layer coating and development processing system of a development processing unit). Fig. 2 is a plan view showing an embodiment of a development processing unit of a liquid processing apparatus of the present invention. Fig. 3 is a cross-sectional view of the developing processing apparatus shown in Fig. 2. Fig. 4 is another sectional view of the developing processing apparatus shown in Fig. 2; Fig. 5 is an explanatory view showing the driving mechanism of the nozzle support arm of the developing processing apparatus shown in Fig. 2. Fig. 6 is another explanatory view showing a driving mechanism of the nozzle supporting arm of the developing processing apparatus shown in Fig. 2; Fig. 7 is an explanatory diagram showing a drive system of the image processing apparatus shown in Fig. 2; [Explanation of drawing number] 1 box platform 2 processing unit 3 interface surface 24a ~ 24c development processing unit (DEV) 4 1 rotating fixture 46 inner cup 47 bottom cup 48 pool This paper standard applies Chinese national standard (CNS) A4 specification (210 X 297 mm) " (Please read the notes on the back before filling this page)
513739 A7 B7 五、發明説明（22 ) 51噴嘴支撐臂 52驅動機構 53a、53b導引軌道 58昇降機構 61馬達 6 3 a軸桿 80閘門形成用噴嘴（顯像處理系統） 100感光層塗抹·顯像處理系統 G基板（LCD基板） (請先閱讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家標準（CNS ) A4規格（210X297公釐） - 25-513739 A7 B7 V. Description of the invention (22) 51 Nozzle support arm 52 Drive mechanism 53a, 53b Guide rail 58 Lifting mechanism 61 Motor 6 3 a Shaft 80 Nozzle for gate formation (imaging processing system) 100 Photosensitive layer painting and display Image processing system G substrate (LCD substrate) (Please read the precautions on the back before filling out this page) Printed on the paper by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs This paper applies the Chinese National Standard (CNS) A4 specification (210X297 mm)- 25-