TW487221U - Drying apparatus for wafer - Google Patents

Drying apparatus for wafer

Info

Publication number
TW487221U
TW487221U TW90201115U TW90201115U TW487221U TW 487221 U TW487221 U TW 487221U TW 90201115 U TW90201115 U TW 90201115U TW 90201115 U TW90201115 U TW 90201115U TW 487221 U TW487221 U TW 487221U
Authority
TW
Taiwan
Prior art keywords
wafer
drying apparatus
drying
Prior art date
Application number
TW90201115U
Other languages
Chinese (zh)
Inventor
Yin-Guei Jung
Original Assignee
Touchtek Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Touchtek Corp filed Critical Touchtek Corp
Priority to TW90201115U priority Critical patent/TW487221U/en
Publication of TW487221U publication Critical patent/TW487221U/en

Links

TW90201115U 2001-01-19 2001-01-19 Drying apparatus for wafer TW487221U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW90201115U TW487221U (en) 2001-01-19 2001-01-19 Drying apparatus for wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW90201115U TW487221U (en) 2001-01-19 2001-01-19 Drying apparatus for wafer

Publications (1)

Publication Number Publication Date
TW487221U true TW487221U (en) 2002-05-11

Family

ID=21680724

Family Applications (1)

Application Number Title Priority Date Filing Date
TW90201115U TW487221U (en) 2001-01-19 2001-01-19 Drying apparatus for wafer

Country Status (1)

Country Link
TW (1) TW487221U (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI683384B (en) * 2019-01-25 2020-01-21 奇景光電股份有限公司 Wafer drying apparatus
CN111211043A (en) * 2020-02-27 2020-05-29 至微半导体(上海)有限公司 Drying method for improving wafer drying efficiency
CN111312581A (en) * 2020-02-27 2020-06-19 至微半导体(上海)有限公司 Exhaust method capable of improving wafer drying efficiency
CN111312580A (en) * 2020-02-27 2020-06-19 至微半导体(上海)有限公司 Micro-amplitude vibration method for high-aspect-ratio graphic wafer
CN114427781A (en) * 2020-10-29 2022-05-03 中国科学院微电子研究所 Supercritical drying device and supercritical drying equipment
CN117497461A (en) * 2023-12-29 2024-02-02 无锡尚积半导体科技有限公司 Wafer coating pretreatment device

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI683384B (en) * 2019-01-25 2020-01-21 奇景光電股份有限公司 Wafer drying apparatus
CN111211043A (en) * 2020-02-27 2020-05-29 至微半导体(上海)有限公司 Drying method for improving wafer drying efficiency
CN111312581A (en) * 2020-02-27 2020-06-19 至微半导体(上海)有限公司 Exhaust method capable of improving wafer drying efficiency
CN111312580A (en) * 2020-02-27 2020-06-19 至微半导体(上海)有限公司 Micro-amplitude vibration method for high-aspect-ratio graphic wafer
CN111312580B (en) * 2020-02-27 2022-07-15 至微半导体(上海)有限公司 Micro-amplitude vibration method for high aspect ratio graphic wafer
CN111312581B (en) * 2020-02-27 2022-07-15 至微半导体(上海)有限公司 Exhaust method capable of improving wafer drying efficiency
CN111211043B (en) * 2020-02-27 2022-10-18 至微半导体(上海)有限公司 Drying method for improving wafer drying efficiency
CN114427781A (en) * 2020-10-29 2022-05-03 中国科学院微电子研究所 Supercritical drying device and supercritical drying equipment
CN117497461A (en) * 2023-12-29 2024-02-02 无锡尚积半导体科技有限公司 Wafer coating pretreatment device
CN117497461B (en) * 2023-12-29 2024-04-12 无锡尚积半导体科技有限公司 Wafer coating pretreatment device

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Legal Events

Date Code Title Description
GD4K Issue of patent certificate for granted utility model filed before june 30, 2004
MM4K Annulment or lapse of a utility model due to non-payment of fees