TW428122B - The integrated phase-shift and binary photomask and the manufacturing method of the same - Google Patents
The integrated phase-shift and binary photomask and the manufacturing method of the sameInfo
- Publication number
- TW428122B TW428122B TW88117377A TW88117377A TW428122B TW 428122 B TW428122 B TW 428122B TW 88117377 A TW88117377 A TW 88117377A TW 88117377 A TW88117377 A TW 88117377A TW 428122 B TW428122 B TW 428122B
- Authority
- TW
- Taiwan
- Prior art keywords
- shift
- opening
- blocking layer
- manufacturing
- same
- Prior art date
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
An integrated phase-shift and binary photomask and the manufacturing method of the same, wherein a transparent substrate is first provided, then form the phase shift layer and the blocking layer on the substrate sequentially. Then define the blocking layer and the phase shift layer to form a plurality of first openings and second openings for exposing the surface of the transparent substrate. Finally define the blocking layer so that the blocking layer only surrounds the circumference of the first opening. The area of the aforementioned first opening is larger than the predefined minimum area, and the area of the second opening is less than the predefined minimum area. The photomask is thereby manufactured wherein the circumference of the first opening is covered with the blocking layer, and the portion other than the first and the second opening is covered with a phase-shift layer.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW88117377A TW428122B (en) | 1999-10-08 | 1999-10-08 | The integrated phase-shift and binary photomask and the manufacturing method of the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW88117377A TW428122B (en) | 1999-10-08 | 1999-10-08 | The integrated phase-shift and binary photomask and the manufacturing method of the same |
Publications (1)
Publication Number | Publication Date |
---|---|
TW428122B true TW428122B (en) | 2001-04-01 |
Family
ID=21642562
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW88117377A TW428122B (en) | 1999-10-08 | 1999-10-08 | The integrated phase-shift and binary photomask and the manufacturing method of the same |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW428122B (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6767675B2 (en) | 2001-11-19 | 2004-07-27 | Renesas Technology Corp. | Mask and method of manufacturing the same |
CN107092160A (en) * | 2017-04-25 | 2017-08-25 | 友达光电股份有限公司 | Photomask, corresponding spacer structure and liquid crystal panel using same |
-
1999
- 1999-10-08 TW TW88117377A patent/TW428122B/en not_active IP Right Cessation
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6767675B2 (en) | 2001-11-19 | 2004-07-27 | Renesas Technology Corp. | Mask and method of manufacturing the same |
CN107092160A (en) * | 2017-04-25 | 2017-08-25 | 友达光电股份有限公司 | Photomask, corresponding spacer structure and liquid crystal panel using same |
TWI704411B (en) * | 2017-04-25 | 2020-09-11 | 友達光電股份有限公司 | Photo mask, corresponding spacer structure and liquid crystal panel using the same |
CN107092160B (en) * | 2017-04-25 | 2021-10-01 | 友达光电股份有限公司 | Photomask, method for forming spacer structure and method for forming liquid crystal panel |
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