TW392065B - Laser interferometer, position measuring device and measuring method, exposure device and manufacturing methods thereof - Google Patents

Laser interferometer, position measuring device and measuring method, exposure device and manufacturing methods thereof Download PDF

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Publication number
TW392065B
TW392065B TW088113368A TW88113368A TW392065B TW 392065 B TW392065 B TW 392065B TW 088113368 A TW088113368 A TW 088113368A TW 88113368 A TW88113368 A TW 88113368A TW 392065 B TW392065 B TW 392065B
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TW
Taiwan
Prior art keywords
moving
mirror
aforementioned
optical system
patent application
Prior art date
Application number
TW088113368A
Other languages
Chinese (zh)
Inventor
Makoto Tsuchiya
Junji Hazama
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Nikon Corp
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Publication of TW392065B publication Critical patent/TW392065B/en

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/16—Measuring arrangements characterised by the use of optical techniques for measuring the deformation in a solid, e.g. optical strain gauge
    • G01B11/161—Measuring arrangements characterised by the use of optical techniques for measuring the deformation in a solid, e.g. optical strain gauge by interferometric means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

The present invention provides a laser interferometer for measuring the Y-direction position of the moving object while moving in X direction that comprises a separated optical system moving with different speed from the moving object along the X direction. The laser beam is separated into reference beam and measurement beam by means of the separated optical system and those beams are incident on the reference lens and moving lens of the moving object respectively. Then, the reflected beams from the moving lens and the reference lens are received by the light measurement device through the separated optical system; and the photoelectric conversion signal of said interference light is outputted as the information of Y-directional position. Because the separated optical system also moves along the X direction, it is enough to use the fixed lens having shorter length than the moving object.

Description

B7 修正 五、發明說明（冷） ___ 又，於搭載有偏光光束分離器21之光束分離器平台6上， 在XZ平面上以45度之角度固定有半透鏡44。又，於藉由 偏光光束分離器21之反射光路徑上，配置著將偏光光束分 離器21所反射之V成分朝向移動鏡22反射之全反射鏡45 。此全反射鏡45，係與光束分離器平台6上之偏光光束分 離器21及半透鏡44 一體式地移動於X軸方向。 於圖8所示係圖7之變形例。針對圖7所示之具體例 ，圖8所示之構成例，係使用反射鏡44a及44b，又變更接 收器42之位置，且使用1/4波長板24及25之點(位置)是 不同的。以虛線包圍之光學系統全體係配置於未圖示之平 台般的可動構件上，相對於可動平台之速度VI，其以V2 (例如V/2)來移動。 即使將圖7或圖8之雷射干涉儀組裝入曝光裝置，亦 可得到與前述第1實施形態同等之效果。 又，於上述各實施形態，係就關於本發明之雷射干涉 儀適用於液晶用掃描型曝光裝置的情形加以說明，但不僅 限於此，也相當適用於半導體製造用之步進及掃描方式之 掃描步進機或是近程方向式之直線對準器等的曝光裝置， 另外如具備一度空間移動平台之裝置。再者，本發明在用 以形成液晶顯示面板之具有複數投影光學系統（多透鏡）之 曝光裝置上亦適用之。 又，有關本發明之雷射干涉儀，即使應用於XY二度 空間移動平台，使用較平台全長爲短之反射鏡，也能高精 度地測出較平台全長爲長之行程範圍的全程中，垂直於該 26 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先M-讀背面之注意事項再填寫本頁) -衣--------訂---------線. 經濟部智慧財產局具工消费合作社印製 經濟部智慧財產局員X消費合作社印製 A7 B7 五、發明說明（7 ) 【技術範疇】 本發明係關於雷射干涉儀、位置測定裝置以及曝光裝 置’更詳細來說’係使以移動鏡反射之測定光束及以參考 鏡反射之參考光束相互干涉’而關於曝光裝置其具備測定 移動體位置之雷射干涉儀及位置測定裝置，以及將此干涉 儀或位置測定裝置做爲光罩平台以及基板平台之至少一方 的位置測定裝置。又’本發明係關於位置測定方法，以及 雷射干涉儀、位置測定裝置及曝光裝置的製造方法。依照 本發明之雷射干涉儀及位置測定裝置，特別可適用於液晶 顯示板或電漿顯示板等顯示元件製造用之掃描型曝光裝置 〇 【關連技術之說明】 近年，於製造液晶顯示板等之平板印刷工程，爲了對 應液晶基板之大型化，能將大面積一次曝光之掃描型曝光 裝置較多爲使用。做爲此種液晶用掃描型曝光裝置，係例 如特開平7-57986號公報所揭示般，將分別包含折射系及 凹面反射鏡之2個部份光學系統所成之等倍正立之投影光 學系統構件，使用複數組來構成投影光學系統，而相對此 投影光學系統使光罩及感光板（基板）一體式地移動，來 進行總括掃描曝光，此乃習知者。 但，若液晶基板大型化，則對於液晶用掃描型曝光裝 置來說，光罩平台與基板平台之掃描距離必然變長。因此 ，爲了使用雷射干涉儀來高精密地測定光罩平台及基板平 台之非掃描方向的位置，故於超出這些平台之掃描方向長 3 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公楚） r 裝-----I--訂---------線 J ->|\ (請先閲讀背面之注意事項再填寫本頁) A7 B7B7 Amendment 5. Description of the invention (cold) ___ On the beam splitter platform 6 equipped with a polarized beam splitter 21, a half lens 44 is fixed on the XZ plane at an angle of 45 degrees. Further, a total reflection mirror 45 that reflects the V component reflected by the polarized beam splitter 21 toward the moving mirror 22 is arranged on the reflected light path through the polarized beam splitter 21. The total reflection mirror 45 is integrally moved in the X-axis direction with the polarized beam splitter 21 and the half lens 44 on the beam splitter platform 6. The modification shown in FIG. 7 is shown in FIG. 8. Regarding the specific example shown in FIG. 7 and the configuration example shown in FIG. 8, the positions of the receiver 42 are changed by using the reflecting mirrors 44 a and 44 b, and the points (positions) using the quarter-wave plates 24 and 25 are different. of. The entire optical system surrounded by a dotted line is arranged on a movable member like a platform (not shown), and it moves at V2 (for example, V / 2) relative to the speed VI of the movable platform. Even when the laser interferometer of Fig. 7 or Fig. 8 is incorporated into the exposure apparatus, the same effect as that of the first embodiment can be obtained. In addition, in the above embodiments, the case where the laser interferometer of the present invention is applied to a scanning exposure device for liquid crystal is described, but it is not limited to this, and it is also quite suitable for the stepping and scanning methods for semiconductor manufacturing. An exposure device such as a scanning stepper or a short-range linear aligner, and an apparatus provided with a one-degree space moving platform. Furthermore, the present invention is also applicable to an exposure device having a plurality of projection optical systems (multi-lens) for forming a liquid crystal display panel. In addition, the laser interferometer of the present invention can accurately measure the entire range of the travel range longer than the platform's full length, even if it is applied to an XY two-dimensional space moving platform using a mirror shorter than the platform's overall length. Perpendicular to the 26 paper sizes, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applicable (please read the precautions on the back side before filling in this page)-衣 -------- Order- -------- Line. Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and printed by the Consumer Cooperative, and printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and printed by the Consumer Cooperative. A7 B7 V. Description of the invention (7) [Technical category] This invention is about laser Interferometer, position measurement device, and exposure device 'more specifically' refers to a measurement beam reflected by a moving mirror and a reference beam reflected by a reference mirror to interfere with each other ', and the exposure device includes a laser interferometer for measuring the position of a moving body And a position measuring device, and a position measuring device using the interferometer or the position measuring device as at least one of a mask stage and a substrate stage. The present invention also relates to a method for measuring a position, and a method for manufacturing a laser interferometer, a position measuring device, and an exposure device. The laser interferometer and the position measuring device according to the present invention are particularly suitable for a scanning exposure device for manufacturing a display element such as a liquid crystal display panel or a plasma display panel. [Explanation of Related Technology] In recent years, in the manufacture of liquid crystal display panels, etc. In the lithographic printing process, in order to support the enlargement of the liquid crystal substrate, a scanning exposure device capable of exposing a large area at a time is often used. As such a scanning exposure device for liquid crystals, for example, as disclosed in Japanese Patent Application Laid-Open No. 7-57986, an equal magnification erect projection optics formed by two partial optical systems including a refractive system and a concave mirror is provided. The system component uses a complex array to form a projection optical system, and relative to this projection optical system, the photomask and the photosensitive plate (substrate) are moved integrally to perform collective scanning exposure. However, if the liquid crystal substrate is enlarged, the scanning distance between the mask stage and the substrate stage will inevitably become longer for the scanning exposure apparatus for liquid crystal. Therefore, in order to use laser interferometers to measure the positions of the photomask and substrate platforms in non-scanning directions with high precision, the scanning directions beyond these platforms are longer. This paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 public Chu) r equipment ----- I--order --------- line J-> | \ (Please read the precautions on the back before filling this page) A7 B7

五、發明說明（VO 度的位置上，設置在掃描方向具有反射面之反射鏡以做爲 移動鏡或固定鏡是必需的。例如，於特開平10-74692號公 報等，揭示著關於具備在掃描方向延伸甚長之固定鏡之掃 描型曝光裝置。於此公報，揭示著於平台上固定有將雷射 光分離爲參考光束及測定光束之光束分離器、反射鏡、角 隅稜鏡，做爲參考鏡係使用由比平台還長之平面反射鏡構 成之固定鏡，又爲了高精密地測定平台之非掃描方向位置 而設置雙程的雷射干涉儀。 但，最近，液晶基板已更加大型化，故將記載於特開 平10-74692號公報之技術一成不變地引用而欲高精密地測 定平台之非掃描方向位置，變成越來越困難。此係由於伴 隨最近基板大型化故平台亦大型化，造成上述固定鏡的長 度變長，從而欲將其反射面充分精密予以加工及硏磨亦漸 漸變得困難。在未來液晶基板等更加大型化的趨勢是無庸 置疑的，對應此事態新技術的開發乃當務之急。 【發明之槪要】 經濟部智慧財產局員工消費合作社印製 ·(請先B3-讀背面之注意事項再填寫本頁) 本發明係爲解決習知技術的問題所得者，其第1目的 ，係提供一種雷射干涉儀、位置測定裝置及其製造方法， 其使用比移動體全長還短之反射鏡，於超出移動體全長之 移動行程的全程，進行垂直於長行程方向之位置測定。 本發明之第2目的，係提供一種曝光裝置及其製造方 法’即使將基板大型化之時，也能高精密地進行光罩平台 或基板平台之位置控制。 本發明之第3目的，係提供一種位置測定方法，其可 A7 _______ B7___ 五、發明說明（b) 使用比移動體全長還短之反射鏡’於超出移動體全長之移 動行程的全程，進行垂直於長行程方向之位置測定。 依本發明之第1形態，係提供一種雷射干涉儀，其使 用雷射光束來測定與移動於第2方向（X軸方向）之移動 體的垂直於第2方向之第1方向（Y軸方向）的位置’其 具備有： 將雷射光束分離爲測定光束及參考光束之分離光學系 統（21 或 21’）； 裝設於移動體（4或5)之反射測定光束的移動鏡（22 或 22 ’）； 與移動體係獨立而設置之將參考光束反射的參考鏡（ 26 或 26,）； 使分離光學系統以與移動體之移動速度不同的速度’ 移動於第2方向之移動裝置（6或6’）； 以及，測出以移動鏡反射之測定光束及以參考鏡反射 之參考光束，根據該等光束之干涉效果以求出移動體在第 1方向的位置之測定器。 依本發明，從光源射出之雷射光束經分離光學系統而 分離爲參考光束及測定光束。測定光束係照射於設置在移 動體之移動鏡的反射面上，參考光束則照射於參考鏡上。 接著，根據從測定光束之移動鏡來的反射光與從參考光束 之參考鏡來的反射光之干涉光的光電轉換信號，測定關於 移動體在第1方向的位置。 上述之測定係於移動體之移動中進行，由於分離光學 5 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） _(請先瞄讀背面之注意事項再填寫本頁> 裝 ----訂·--------線 經濟部智慧財產局員工消费合作社印製 A7 ___B7__ 五、發明說明（1) 系統也以與移動體不同之速度移動於第2方向，將移動鏡 之垂直於測定方向第1方向的第2方向（長行程方向）的 長度設爲L1，移動體之第2方向的移動速度設爲VI，分 離光學系統之第2方向的移動速度設爲V2時，若將移動 體之第2方向的移動行程設爲S，只要滿足S =丨VI/ ( V1-V2) I L1>L1，亦 g口 0< V2<2V1 (但 VI 妾 V2)之時 ，以分離光學系統分離之測定光束，將持續地照射至移動 鏡反射面之不同位置，使移動體之第1方向的位置測定爲 可能。因此，使用較移動體（測定對象物）全長還短之反 射鏡，乃可測出於超出移動體全長之移動行程的全程中， 垂直於長行程方向之方向的位置。 此處，依雷射干涉儀之位置測定，已知較其他之測定 裝置有甚高精密度，尤其是進行外差法測量之方式，更精 密的位置測量係爲可能。 依本發明之第2形態，係提供一種位置測定裝置，其 使用來自光源的光來測定移動於第2方向之移動體的垂直 於第2方向之第1方向的位置，係具備有： 將來自前述光源的光分離爲測定光束及參考光束之分 離光學系統； 裝設於前述移動體之反射測定光束的移動鏡；與前述 移動體係獨立設置之與前述移動鏡之間形成測定光束之光 路徑的一部分的固定鏡； 使分離光學系統以與移動體之移動速度不同的速度來 移動於第2方向之移動裝置； 6 尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） ^ I------------:*.*裝 ·(請先跹讀背私之注意事項ϋ寫本頁) « mmt ----訂---I---1線 i 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（ 以及，測出前述測定光束及參考光束，根據該等光束 之干涉效果以求出移動體在第1方向的位置之測量系統。 本發明之位置測定裝置，其移動鏡與固定鏡之間的光 路徑長度係以測定光束來量測。伴隨移動體之移動分離光 學系統也移動，因而被照射測定光束之移動鏡上的照射點 及固定鏡上的照射點也跟著移動。藉由調節分離光學系統 之移動速度’可使固定鏡之長度低於移動體之移動方向長 度。而藉由使分離光學系統位於移動鏡與固定鏡之間的光 路徑內，不管分離光學系統之移動路徑爲何，皆能由測定 光束得到關於移動鏡與固定鏡之間的光路徑長度及其變化 之訊息。又具備面對於前述測量系統使參考光束反射之參 考鏡。此參考鏡可使前述分離光學系統位於中間而與前述 測量系統對向來配置，而可設置參考鏡於移動裝置，例如 移動台上。固定鏡可使前述分離光學系統位於中間而與前 述移動鏡對向來配置。 依本發明之第3形態，係提供一種曝光裝置，其將形 成於光罩上之圖案複製至基板上，係包含有： 保持前述光罩使其移動於第2方向之移動光罩平台； 保持前述基板使其移動於第2方向之移動基板平台；以及 ，將至少與一方之平台的第2方向互爲垂直之第1方向的 位置，使用雷射光束來測定之雷射干涉儀； 該雷射干涉儀係包含有： 將前述雷射光束分離爲測定光束及參考光束之分離光 學系統； 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 先 閱- 讀 背 事 項 S “ ί裝 頁 _ w I I I I I I 訂 ▲ 經濟部智慧財產局員工消費合作社印製 Α7 Β7 五、發明說明（) 裝設於前述至少一方之平台上之反射測定光束的移動 鏡； 與前述至少一方之平台係獨立而設置之反射參考光束 的參考鏡； 使分離光學系統以與前述至少一方之平台的移動速度 不同之速度移動於第2方向之移動裝置； 以及，測出以前述移動鏡反射之測定光束及以前述參 考鏡反射之參考光束，根據該等光束之干涉效果以求出前 述至少一方之平台在第1方向位置之測定器。 依本發明之第4形態，係提供一種曝光裝置，其將形 成於光罩上之圖案複製至基板上，係具備有： 保持前述光罩使之移動於第2方向之移動光罩平台； 保持前述基板使之移動於第2方向之移動基板平台；以及 ，將至少與一方之平台的第2方向垂直之第1方向的位置 ，使用光束來測定之位置測定裝置； 該位置測定裝置係包含有： 將前述光束分離爲測定光束及參考光束之分離光學系 統； 裝設於前述至少一方之平台上之反射測定光束的移動 鏡； 與前述至少一方之平台係獨立而設置之與前述移動鏡 之間形成測定光束之光路徑一部分的固定鏡； 使分離光學系統以與前述至少一方之平台的移動速度 不同之速度移動於第2方向之移動裝置； $ 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） •(請先W讀背备之注意事項再填寫本頁) 裝--------訂---------線 經濟部智慧財產局員工消费合作社印製 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（1) 以及，測出前述測定光束及參考光束，根據該等光束 之干涉效果以求出前述至少一方之平台在第1方向的位置 之測量系統。 依本發明之第3及第4形態之曝光裝置，係使用比光 罩平台或基板平台全長還短之反射鏡，於超過光罩平台或 基板平台全長之移動行程的全程，高精密地測出關於垂直 於這些平台之長行程方向的方向之位置。此時，上述平台 之長行程方向的位置，相較於習知同樣具有該長行程方向 之測長光束的干涉儀，本發明更能高精密地測出。因此， 即使將基板大型化之時，也能高精密地進行平台之位置控 制，結果光罩與基板之高精密度的重合變成可能。再者， 不但可將曝光裝置小型化，同時能將製造成本降低。 依本發明之第5形態，係提供一種位置測定方法，其 藉由照射雷射光束至固定鏡與裝設在移動於第2方向之移 動體的移動鏡，利用干涉效果以測定與移動體之第2方向 互爲垂直之第1方向位置，係包含有： 將前述雷射光束分割成測定光束與參考光束； 使前述測定光束以與正在移動之移動體不同之速度移 動於第2方向的同時照射移動鏡，此時自移動鏡來的反射 光通過移動鏡與固定鏡之間； 以及，藉由比較通過移動鏡與固定鏡之間的測定光束 之相位與參考光束之相位，求出移動體在第1方向的位置 〇 依本發明之位置測定方法，藉由使測定光束以與移動 9 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） — II----II---t < ! ! I ! !$ /3.,1 人請先时讀背缸之注意事項再填寫本頁) A7 ---— B7_ 五、發明說明（） 鏡不同之速度’例如’以移動鏡之1/2的速度移動於第2 方向’有效利用移動鏡及固定鏡之長度，而可進行移動體 之位置測定。藉此，被照射參考光束之固定鏡的長度，可 低於移動體在第2方向的長度以下。因此，於固定鏡（或 移動鏡）之加工精度被要求或這些鏡之設置空間無法取得 的情形，本發明之方法即非常有效。 依本發明之第6形態，係提供根據本發明之第丨形態 的雷射干涉儀之製造方法。 依本發明之第7形態，係提供根據發明之第2形態的 位置測定裝置之製造方法。 依本發明之第8形態，係提供根據本發明之第3形態 的曝光裝置之製造方法。 依本發明之第9形態，係提供根據本發明之第4形態 的曝光裝置之製造方法。 依本發明之第10形態，係提供一種位置測定裝置，其 使用自光源來的光束，測定移動於第2方向之移動體的垂 直於第2方向之第1方向的位置，其具備有： 裝設於移動體之移動鏡及設置於該移動體以外之固定 鏡； 分割來自光源的光束，使其分別朝向移動鏡及固定鏡 之光學系統； 將該光學系統以與移動體之移動速度不同之速度移動 於第2方向之移動裝置； 以及’測出來自移動鏡及固定鏡的反射光光束，根據 _____ 10 ^張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） •(請先SJ讀背面之注意事項ί寫本頁) 裝 • iBl ----訂---------線 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（q) 該等光束之干涉效果以求出移動體在第1方向位置之測定 器。 依本發明之第10形態的位置測定裝置，可以例如示於 圖7或8之裝置來代表。此位置測定裝置，係將藉由移動 裝置移動之光學系統較移動體還慢移動，可使固定鏡之長 度較移動體在第2方向之長度還短。 【圖示之簡單說明】 圖1係槪略表示對第1實施形態之掃描型曝光裝置的 主要部之構成之圖。 圖2所示係測定圖1之光罩平台及感光板平台之非掃 描方向位置之Y干涉儀的各部構成之俯視圖。 圖3所不係掃描開始時之光罩平台及光束分離器平台 的位置關係圖。 圖4係表示掃描結束時之光罩平台及光束分離器平台 的位置關係圖。 圖5所示係第2實施形態的Y干涉儀之構成的俯視圖 〇 圖6所示係其他之實施形態的Y干涉儀之構成的俯視 圖。 圖7所示係其他之實施形態的Y干涉儀之構成的立體 圖。 圖8所示係圖7之Y干涉儀的變形例之立體圖。 【較佳具體例之說明】 《第1實施形態》 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先«讀背al·之注意ί項再填寫本頁) 裝 ----訂---------線 經濟部智慧財產局員工消费合作社印製 A7 B7 五 、發明說明（/ 明 以下，對本發明之第丨實施形態依據圖丨〜圖4來說 經濟部智慧財產局員工消費合作社印製 _1所示係將有關本發明之雷射干涉儀做爲位置測定 裝®來裝設的第1實施形態之曝光裝置100的主要部之構 成。其中該位置測定裝置係測定做爲移動體之光罩平台4 及感光板平台5在既定之第1方向（Y軸方向）的位置。 此曝光裝置100，係將光罩2及做爲基板之感光板3相對 於投影光學系統1來進行相對掃描，從而將形成於光罩2 之圖案總括複製至感光板3上之液晶顯示板製造用的掃描 型曝光裝置。此型之掃描型曝光裝置，係例如揭示於美國 專利第5,715,037號，掃描型曝光裝置之詳細內容請參照此 美國專利。以下之說明，係將投影光學系統1之光軸方向 設爲Z軸方向；與該Z軸垂直之面內，將光罩2與感光板 3進行相對掃描之掃描方向設爲X軸方向（第2方向）； 將垂直於此X軸方向之非掃描方向設爲Y軸方向（上述第 1方向）。 此曝光裝置100係具備有藉由曝光用照明光IL對光罩 2上之長方形狹縫狀的照明區域IMA均一地照明之未圖示 的照明光學系統、於該照明光學系統下方保持光罩2之光 罩平台4、配置於該光罩平台4下方之投影光學系統1、於 該投影光學系統1之下方爲保持感光板3而做爲基板平台 的感光板平台5等。 做爲前述投影光學系統1，此處係使用投射等倍之正 立正像之物。因此，若以自照明光學系統來的曝光用照明 12 f紙張尺度國國家標準（CNS)A4規格（210 X 297公釐） 請 先 讀 背V. Description of the invention (It is necessary to set a mirror with a reflective surface in the scanning direction as a moving or fixed mirror at the position of VO degrees. For example, Japanese Unexamined Patent Publication No. 10-74692, etc., discloses that Scanning type exposure device with a fixed mirror with a long scanning direction. In this publication, a beam splitter, a mirror, and a corner beam that separate laser light into a reference beam and a measurement beam are fixed on the platform. The reference mirror uses a fixed mirror consisting of a flat mirror longer than the platform, and a two-way laser interferometer is installed to measure the position of the platform in the non-scanning direction with high precision. However, recently, liquid crystal substrates have become larger. Therefore, it is becoming more and more difficult to refer to the technique described in Japanese Unexamined Patent Publication No. 10-74692 as it is, and it is more and more difficult to determine the position in the non-scanning direction of the platform with high precision. This is due to the recent increase in the size of the substrate. The length of the above-mentioned fixed mirror becomes longer, so that it is gradually difficult to process and polish the reflecting surface with sufficient precision. In the future, liquid crystal substrates The trend of larger scale is beyond doubt, and the development of new technologies in response to this situation is an urgent task. [Key points of invention] Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs. The present invention aims to solve the problems of the conventional technology. The first object of the present invention is to provide a laser interferometer, a position measuring device, and a manufacturing method thereof. The present invention uses a reflector shorter than the total length of a moving body. The entire length of the moving stroke of the moving body is measured at a position perpendicular to the long stroke direction. A second object of the present invention is to provide an exposure apparatus and a manufacturing method thereof, which can be performed with high precision even when the substrate is enlarged. Position control of photomask platform or substrate platform. The third object of the present invention is to provide a position measurement method which can be A7 _______ B7___ V. Description of the invention (b) Use a mirror shorter than the full length of the moving body The entire length of the moving stroke of the body is measured at a position perpendicular to the long stroke direction. According to the first aspect of the present invention, a thunder is provided. An interferometer that uses a laser beam to measure a position perpendicular to the second direction of the first direction (Y-axis direction) with a moving body moving in the second direction (X-axis direction). It includes: a laser beam Separating optical system (21 or 21 ') that separates the measuring beam and reference beam; a moving mirror (22 or 22') installed on the moving body (4 or 5) that reflects the measuring beam; it will be installed independently of the moving system A reference mirror (26 or 26,) reflecting the reference beam; a moving device (6 or 6 ') that moves the separation optical system at a speed different from the moving speed of the moving body (6 or 6'); and The measuring beam that is reflected and the reference beam that is reflected by the reference mirror are used to determine the position of the mobile body in the first direction based on the interference effect of these beams. According to the present invention, the laser beam emitted from the light source passes through the separation optical system It is separated into a reference beam and a measurement beam. The measuring beam is irradiated on the reflecting surface of the moving mirror provided on the moving body, and the reference beam is irradiated on the reference mirror. Next, based on the photoelectric conversion signals of the reflected light from the moving mirror of the measurement beam and the interference light of the reflected light from the reference mirror of the reference beam, the position of the moving body in the first direction is measured. The above measurement is performed during the movement of the moving body. Because the separation optics is 5 paper sizes, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applicable. _ (Please read the precautions on the back before filling in this page > Install ---- Order · -------- Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 ___B7__ 5. Description of the invention (1) The system also moves in the second direction at a speed different from that of the moving body Let the length of the second direction (long stroke direction) of the moving mirror perpendicular to the first direction of the measurement direction be L1, the moving speed in the second direction of the moving body be VI, and the moving speed in the second direction of the separation optical system. When it is set to V2, if the moving stroke in the second direction of the moving body is set to S, as long as S = 丨 VI / (V1-V2) I L1 > L1, and the port 0 < V2 < 2V1 (but VI 妾 V2 ), The measurement beam separated by the separation optical system will be continuously irradiated to different positions on the reflecting surface of the moving mirror, making it possible to measure the position in the first direction of the moving body. Therefore, a more moving body (measurement object) is used. Reflector with short full length can be measured beyond the full length of the moving body Positions perpendicular to the direction of the long stroke during the entire length of the long travel stroke. Here, according to the position measurement of the laser interferometer, it is known to have much higher accuracy than other measurement devices, especially for heterodyne measurement. According to a second aspect of the present invention, there is provided a position measuring device that uses light from a light source to measure a position of a moving body moving in a second direction perpendicular to the second direction. The position in the first direction includes: a separation optical system that separates light from the light source into a measurement beam and a reference beam; a moving mirror installed on the moving body that reflects the measurement beam; A fixed mirror that forms part of the light path of the measuring beam between the moving mirrors; a moving device that moves the separation optical system in the second direction at a speed different from the moving speed of the moving body; 6-scale applicable Chinese National Standard (CNS) A4 specification (210 X 297 mm) ^ I ------------: *. * Equipment · (Please read the precautions for your privacy before writing this page) «mmt ---- Order --- I --- 1 line i Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (and the measurement system for measuring the aforementioned measuring beam and reference beam, and determining the position of the moving body in the first direction based on the interference effect of these beams In the position measuring device of the present invention, the length of the optical path between the moving mirror and the fixed mirror is measured by a measuring beam. The separation optical system also moves with the movement of the moving body, and therefore is irradiated on the moving mirror that irradiates the measuring beam. The point and the irradiation point on the fixed mirror also move. By adjusting the moving speed of the separation optical system ', the length of the fixed mirror can be lower than the length of the moving body. By placing the separation optical system in the light path between the moving mirror and the fixed mirror, regardless of the moving path of the separation optical system, the light path length and the change between the moving mirror and the fixed mirror can be obtained from the measurement beam. Message. A reference mirror for reflecting the reference beam to the aforementioned measurement system is also provided. This reference mirror allows the aforementioned separation optical system to be located in the middle and be opposed to the aforementioned measurement system, and a reference mirror may be provided on a mobile device, such as a mobile stage. The fixed mirror may be arranged so that the separation optical system is located in the middle and faces the moving mirror. According to a third aspect of the present invention, there is provided an exposure device that copies a pattern formed on a photomask onto a substrate and includes: a moving photomask platform that holds the photomask and moves it in a second direction; holding The substrate interfering with a moving substrate platform in a second direction; and a laser interferometer using a laser beam to measure a position in a first direction perpendicular to the second direction of at least one of the platforms using a laser beam; The radio interferometer includes: a separation optical system that separates the aforementioned laser beam into a measurement beam and a reference beam; this paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) “Ί Page_ w IIIIII Order ▲ Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 Β7 V. Description of the invention () A moving mirror that reflects the measurement beam on the platform of at least one of the foregoing; and the platform of at least one of the foregoing Are independent reference mirrors that reflect the reference beam; move the separation optical system at a speed different from that of at least one of the aforementioned platforms 2 direction moving device; and measuring the measurement beam reflected by the aforementioned moving mirror and the reference beam reflected by the aforementioned reference mirror, and determining the measurement of the position of the at least one of the platforms in the first direction based on the interference effect of these beams According to a fourth aspect of the present invention, there is provided an exposure device which copies a pattern formed on a photomask onto a substrate, and is provided with: a moving photomask platform that holds the photomask and moves it in a second direction. A position measurement device that holds the substrate and moves it in the second direction; and a position measurement device that measures a position in the first direction perpendicular to the second direction of at least one of the platforms using a light beam; the position measurement device is Including: a separating optical system for separating the aforementioned light beam into a measuring beam and a reference beam; a moving mirror for reflecting the measuring beam installed on at least one of the platforms; and a moving mirror provided separately from the at least one platform A fixed mirror forming a part of the light path of the measuring beam therebetween; making the separation optical system level with at least one of the foregoing The mobile device moves in the second direction at different speeds; $ This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) • (Please read the precautions for backing up before filling this page ) -------- Order --------- Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs Printed A7 B7 V. Invention Description (1) And a measurement system that measures the measurement beam and the reference beam, and determines the position of the at least one of the platforms in the first direction based on the interference effects of the beams. According to the third and fourth aspects of the present invention, the exposure device, A mirror shorter than the full length of the reticle or substrate platform is used to accurately measure the position about the direction perpendicular to the long stroke direction of the platform over the entire travel distance of the reticle or substrate platform. At this time, the position of the above-mentioned platform in the long-stroke direction can be measured with higher precision than the conventional interferometer that also has the long-length beam in the long-stroke direction. Therefore, even when the substrate is enlarged, the position of the stage can be controlled with high precision, and as a result, high-precision overlay of the photomask and the substrate becomes possible. Furthermore, not only can the exposure device be miniaturized, but also the manufacturing cost can be reduced. According to a fifth aspect of the present invention, there is provided a position measurement method which uses an interference effect to measure the position of a moving body by irradiating a laser beam to a fixed mirror and a moving mirror mounted on a moving body moving in a second direction. The first direction position where the second direction is perpendicular to each other includes: dividing the laser beam into a measurement beam and a reference beam; and moving the measurement beam in the second direction at a speed different from that of a moving moving body The moving mirror is irradiated, and at this time, the reflected light from the moving mirror passes between the moving mirror and the fixed mirror; and, by comparing the phase of the measurement beam and the phase of the reference beam between the moving mirror and the fixed mirror, a moving body is obtained Position in the first direction. According to the position measuring method of the present invention, by moving the measuring beam to and from 9 paper sizes, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applied — II ---- II --- t <!! I!! $ /3.,1 Please read the precautions of the back cylinder first and then fill out this page) A7 ---— B7_ V. Description of the invention () Different speed of the mirror's 'Move at half the speed of the moving mirror In the second direction 'effective use length of the movable mirror and the fixed mirror, but it may be the position of the movable body measured. This allows the length of the fixed mirror to be irradiated with the reference beam to be shorter than the length of the moving body in the second direction. Therefore, the method of the present invention is very effective in cases where the precision of processing of fixed mirrors (or moving mirrors) is required or the installation space of these mirrors cannot be obtained. According to a sixth aspect of the present invention, there is provided a method for manufacturing a laser interferometer according to the sixth aspect of the present invention. According to a seventh aspect of the present invention, there is provided a method for manufacturing a position measuring device according to the second aspect of the present invention. According to an eighth aspect of the present invention, there is provided a method for manufacturing an exposure apparatus according to the third aspect of the present invention. According to a ninth aspect of the present invention, there is provided a method for manufacturing an exposure apparatus according to the fourth aspect of the present invention. According to a tenth aspect of the present invention, there is provided a position measuring device that uses a light beam from a light source to measure a position of a moving body moving in a second direction perpendicular to the first direction of the second direction, and includes: A moving mirror provided on the moving body and a fixed mirror provided outside the moving body; the light beam from the light source is divided to face the optical system of the moving mirror and the fixed mirror respectively; the optical system is set at a speed different from the moving speed of the moving body A mobile device that moves in the second direction at a speed; and 'Measured the reflected light beam from the moving mirror and the fixed mirror, according to the _____ 10 ^ Zhang scale applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) • ( Please read the precautions on the back of this page first, write this page) Installation • iBl ---- Order --------- Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of Invention (q) The measuring effect of the interference effects of these beams is to determine the position of the moving body in the first direction. The position measuring device according to the tenth aspect of the present invention can be represented by, for example, the device shown in Fig. 7 or 8. This position measuring device will move the optical system moved by the mobile device slower than the moving body, so that the length of the fixed mirror is shorter than the length of the moving body in the second direction. [Brief description of the figure] Fig. 1 is a diagram schematically showing a configuration of a main part of a scanning exposure apparatus according to the first embodiment. Fig. 2 is a plan view showing the structure of each part of the Y interferometer for measuring the positions of the mask stage and the photosensitive plate stage in the non-scanning direction of Fig. 1. Figure 3 does not show the positional relationship between the mask stage and the beam splitter stage at the beginning of the scan. Fig. 4 is a diagram showing the positional relationship between the mask stage and the beam splitter stage at the end of scanning. Fig. 5 is a plan view showing the structure of a Y interferometer of the second embodiment. Fig. 6 is a plan view showing the structure of a Y interferometer of another embodiment. Fig. 7 is a perspective view showing the structure of a Y interferometer according to another embodiment. FIG. 8 is a perspective view of a modified example of the Y interferometer of FIG. 7. [Explanation of the preferred specific example] "First Implementation Form" The paper size is applicable to the Chinese National Standard (CNS) A4 (210 X 297 mm) (please read «Al · Notes and fill in this page first>) Binding ---- Order --------- Printed by the Consumers ’Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention For example, as shown in the print _1 printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, the structure of the main part of the exposure apparatus 100 according to the first embodiment in which the laser interferometer according to the present invention is used as a position measuring device® is installed. The position measuring device measures the positions of the mask stage 4 and the photosensitive plate stage 5 as moving bodies in a predetermined first direction (Y-axis direction). The exposure apparatus 100 uses the mask 2 and the substrate as a substrate. The photosensitive plate 3 performs relative scanning with respect to the projection optical system 1 so that the pattern formed on the photomask 2 is collectively copied to the scanning type exposure device for manufacturing a liquid crystal display panel on the photosensitive plate 3. This type of scanning type exposure device, For example, disclosed in U.S. Patent No. 5,715,037 For the details of the scanning exposure device, please refer to this U.S. patent. The following description is to set the optical axis direction of the projection optical system 1 to the Z axis direction; in a plane perpendicular to the Z axis, the mask 2 and the photosensitive plate 3 The scanning direction for relative scanning is set to the X-axis direction (second direction); the non-scanning direction perpendicular to the X-axis direction is set to the Y-axis direction (the first direction described above). This exposure device 100 is provided with An illumination optical system (not shown) for uniformly illuminating the rectangular slit-shaped illumination area IMA on the mask 2 with the exposure illumination light IL. The mask platform 4 holding the mask 2 under the illumination optical system is disposed on the mask platform 4. The projection optical system 1 under the reticle platform 4 and the photosensitive plate platform 5 serving as a substrate platform to hold the photosensitive plate 3 below the projection optical system 1. As the aforementioned projection optical system 1, projection is used here. It is an object that is upright. Therefore, if the exposure lighting from a self-illuminating optical system is 12 f paper standard national standard (CNS) A4 specification (210 X 297 mm), please read the back first

$(1衰裝 頁I I 訂 B7 五、發明說明（〖丨） 光IL照射光罩2上之照明區域IMA，其照明區域IMA的 部分電路圖案的等倍像（部分正立像），將成爲投射至感 光板3上之與前述照明區域IMA共軛之曝光區域IA。又， 例如於特開平7-57986號公報所揭示般，亦可將投影光學 系統1以複數組之等倍正立的投影光學系統單元來構成。 此種投影光學系統單元，請參照特開平7-57986號公報及 與其對應之美國專利第5,729,331號。 光罩平台4及感光板平台5，係搭載於未圖示之剖面 爲C字狀的輸送架上。對此更詳細說明，光罩平台4實際 上係搭載於前述輸送架之上板部，藉由未圖示之馬達等驅 動裝置可於XY面內微動而構成之。於此光罩平台4上之 光罩2係以真空吸附等而被水平地保持著。此光罩平台4 之XY位置，係藉光罩側干涉儀系統以既定之分解能，例 如0.5〜lnm大小之分解能而被測定。關於此光罩側干涉儀 系統之後將詳述。 又，感光板平台5實際上係搭載於前述輸送架之底板 部上，藉由未圖示之馬達等驅動裝置可於XY面內微動而 構成之。於此感光板平台5上之表面塗布有光阻（感光劑 )之感光板3係以真空吸附等而被水平地保持。此感光板 平台5之XY位置，係藉感光板側干涉儀系統以既定之分 解能，例如0.5〜lnm大小之分解能而被測定。又，亦可將 光罩平台4及感光板平台5之其中之一固定於輸送架上。 此曝光裝置100，係藉由將輸送架驅動於X軸方向， 而相對於投影光學系統1使光罩平台4及感光板平台5 — 13 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 乂請先W讀背面之注意事項再填寫本頁) 裝----I---訂---------線 經濟部智慧財產局員工消費合作社印製 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（[1) 體式地予以相對掃描，藉此，將光罩2上之圖案區域全面 的電路圖案複製至表面塗布著光阻之感光板3上。 其次，關於光罩側干涉儀系統根據圖1及圖2詳述之 。又，由於感光板側干涉儀系統與光罩側干涉儀系統具相 同之構成，故對於圖1、圖2對應之構成部分，係在同一 符號上附加{’}來區別，其詳細之說明則予以省略。 光罩側干涉儀系統，係具備測定做爲移動體之光罩平 台4在掃描方向(X軸方向)位置之X干涉儀，及測定在非 掃描方向(Y軸方向)位置之Y干涉儀。就這些X干涉儀、Y 干涉儀而言，實際上最廣爲使用的係邁克爾遜·莫利型之 外差法·雷射干涉儀。此等干涉儀，可參照例如於美國專 利第5,767,971號先前揭示者。 X干涉儀係具備如圖1所示之雷射頭10、偏光光束分 離器11、移動鏡12、固定鏡13、四分之一波長板（以下 ，稱爲「1/4 λ板」）14、15，以及接收器16等。 雷射頭10其內部具備光源及測量部。做爲光源使用著 利用賽曼效果之2周波雷射。由於此光源之頻率已安定化 ，利用賽曼效果可輸出僅2〜3MHz不同振動頻率（因此波 長亦不同），且由含有偏光方向爲互相垂直之第1偏向成 分及第2偏向成分的高斯分布之圓形光束而成的雷射光束 。第1偏光成分係相對於偏光光束分離器11之光分離面（ 參照圖2之21a)的光入射面，即平行於包含至光分離面 的入射光及光分離面的法線之面的偏光成分（也稱爲p偏 光），以下稱此爲Η成分。又，第2之偏光成分係相對於 14 — — — —— — —--i — — — — — — ^ 111111 ·(請先«'讀背(6-之注意事項再填寫本頁) 線 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 經濟部智慧財產局員工消費合作社印製 A7 _B7_ 五、發明說明（^) 偏光光束分離器11之光分離面而垂直於光入射面之偏光成 分（也稱爲s偏光），以下稱此爲V成分。 測量部係設置於雷射頭10之內部，使從光源輸出之前 述2個振盪波長成分(即V成分及Η成分)相互干涉，監視 其相位變化，將此監視信號做爲用以測量相位差之基準信 號而被送至未圖示之信號處理系統。 前述偏光光束分離器11，係使既定之偏光成分通過， 而對與此成分垂直之偏光成分予以反射的光學元件，此處 係使從雷射頭10來之Η成分透過而反射V成分以分離Η 成分及V成分。 移動鏡12係固定於光罩平台4之X軸方向一側（一X 側）的端面，相對於投影光學系統而與光罩平台一起移動 之鏡。固定鏡13係固定於裝置內之既定的位置（例如，固 定於投影光學系統1)。 此處，說明此干涉儀之構成各部的作用。自雷射頭10 射出之雷射光入射至偏光光束分離器11，此入射之雷射光 會被分離爲Η成分（測定光束）及V成分（參考光束）。 然後，以光束分離器11反射之參考光束（V成分）， 透過1/4λ板15，轉換爲圓偏振光，以固定鏡13反射後， 乃相反於先前方向而再次透過1/4λ板15。藉此，參考光 束其偏光方向被轉換爲垂直於最初入射至1/4波長板15之 方向（與Η成分相同之偏光方向），透過偏光光束分離器 11入射至接收器16。 另一方面，透過光束分離器11之測定光束（Η成分） 15 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） 11 I 111 I i ---11 I — —訂------- (請先时讀背面之注意事項再填寫本頁) 經濟部智慧財產局員工消費合作社印製 Α7 Β7 五、發明說明（（+) ’將透過1/4λ板14，轉換爲圓偏振光，以移動鏡12反射 後，乃相反於先前方向而再次透過1/4 λ板14。藉此，測 定光束其偏光方向被轉換爲垂直於入射至1/4波長板14之 方向（與V成分相同之偏光方向），被偏光光束分離器11 反射後將與參考光束同軸地重合，從而行進於同一之光路 徑上而入射至接收器16。 接收器16其內部係具備未圖示之偏振器及光電轉換元 件，偏振器係對於自偏光光束分離器11來的V成分及Η 成分（即測定光束及參考光束）以期偏光角成爲45度方向 而設定之。因此，偏振器僅讓V成分之偏向角方向的向量 成分通過，同時僅讓Η成分之偏向角方向的向量成分通過 。之後，通過偏振器之V成分的向量成分VV及Η成分的 向量成分VH等之干涉光入射至光電轉換元件。此光電轉 換元件，係將兩向量成分之干涉光進行光電轉換後所得之 電氣信號（干涉信號）供給至未圖示之信號處理系統。 於此信號處理系統中，係如前所述自雷射頭10提供有 用以進行相位測量之基準信號，而信號處理系統係使用該 基準信號進行演算，以期高精密地求出移動鏡12之X位 置（光罩平台2之X軸方向的移動量）。又，依信號處理 系統之信號處理的詳細內容，係藉由關於外差法干涉儀之 眾知之方法進行處理，其詳細之說明在此省略。 Υ千涉儀係具備著做爲光源部之雷射頭20、做爲分離 光學系統之偏光光束分離器21、移動鏡22、做爲反射光學 構件之固定鏡23、1/4 λ板24,25，做爲光路徑折返構件之 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公愛） 乂請先W讀背面之注意事項再填寫本頁) 裝----I---訂----I----線 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（β) 直角梭鏡26及接收器27等。此Υ干涉儀係測定做爲移動 體之光罩平台4在Υ軸方向位置的有關本發明之雷射干涉 儀。圖2所示係此Υ干涉儀之俯視圖。 雷射頭20、偏光光束分離器21、接收器27係使用與 前述之雷射頭10、偏光光束分離器11、接收器16同樣之 物。 移動鏡22係於光罩平台4之Υ軸方向的一側（一 γ側 )的端部，沿著X軸方向以第1長度L1被設置，此移動 鏡22之一 Υ側的側面係設爲反射面22a。由圖2可明顯地 看出L1比光罩平台4之X軸方向長度（全長）短。 此處，在構成有參考鏡的前提下，直角梭鏡26係與偏 光光束分離器21、1/4 λ板24、25以既定之位置關係固定 於做爲移動裝置之光束分離器平台6上。此光束分離器平 台6係以未圖示之線性馬達等驅動系統，在與光罩平台4 幾乎相同的面上將其驅動於X軸方向。 固定鏡23係隔著光束分離器平台6而固定於與移動鏡 22相反側之既定的位置。此固定鏡23之Υ軸方向另一側 (+ Υ側）的面係沿著X辦方向以第2長度L2延伸之反射 面 23a。 此處，將此Y干涉儀之構成各部的作用參照圖2來說 明之。自雷射頭20射出之雷射光將入射至偏光光束分離器 21，而此入射之雷射光於光分離面21a乃分離爲Η成分（ 參考光束）及V成分（測定光束）。 透過光分離面21a之參考光束（Η成分：具有平行於 17 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） -------——— — — 4 ' 裝！1 訂-！ •線 /1' ' (請先«·讀背面之注意^項再填寫本頁) A7 B7__ 五、發明說明（“） 圖2之紙面的振動方向之直線偏光），於透過偏光光束分 離器21內之後，被做爲參考鏡之直角梭鏡26反射，沿著 與入射光路徑平行之光路徑折返，再次透過偏光光束分離 器21而入射於接收器27。 另一方面，於光分離面21a反射之測定光束（V成分 :具有垂直於圖2之紙面的振動方向之直線偏光），係透 過1/4λ板24後轉換爲圓偏振光，而於移動鏡22之反射面 22a被反射後，再次透過1/4 λ板24。藉此，測定光束其偏 光方向再度從圓偏振光轉換成直線偏光，但直線偏光之偏 光方向的轉換與最初到達1/4λ板25時的入射方向互相垂 直（與Η成分相同方向）。其次，透過偏光光束分離器21 ，再透過1/4 λ板25後被轉換爲圓偏振光。接著，此測定 光束於固定鏡23之反射面23a被反射，再次透過1/4λ板 25。藉此，如前述般，測定光束其偏光方向的轉換與最初 到達1/4波長板25時的入射方向相反（與Η成分同方向） ，而於偏光光束分離器21被反射，朝向直角梭鏡26。接 著，此測定光束藉由直角梭鏡26沿著與入射光路徑平行之 光路徑而折返，再次於偏光光束分離器21反射，而透過 1/4又板25於固定鏡23之反射面23a被反射。然後，此測 定光束，再次透過ΙΜλ板25時其偏光方向逆轉爲與Η成 分同方向，透過偏光光束分離器21之後，再透過1/4又板 24，於移動鏡22被反射，在透過1Μ λ板24後再度轉換其 偏光方向（與V成分同方向）。最後，於偏光光束分離器 21被反射後，與參考光束同軸地重合，彼此行進於同一之 18 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先w'讀背&之注意事項再填寫本頁) 裝---—訂.！!1!線 經濟部智慧財產局員工消費合作社印製 經濟部智慧財產局員工消費合作社印製 A7 _B7____ 五、發明說明（） 光路徑上而入射至接收器27。 於接收器27內係與接收器16內同樣地，將兩成分之 向量成分的干涉光供應於光電轉換元件，藉由此光電轉換 元件將兩成分之干涉光進行光電轉換，而所得之電氣信號 (干涉信號）則供給於未圖示之信號處理系統，與上述同 樣地藉由該信號處理系以測量固定鏡23與移動鏡22在Y 軸方向的距離（移動鏡22之Y軸方向位置）。 於本實施形態之Y干涉儀，其參考光束之光路徑長度 完全包含於測定光束之全光路徑長度之中，而兩者之差等 於（固定鏡與移動鏡之間的光路徑長度）X2。即，移動鏡 在移動時藉由測定器測出之干涉效果的變動，係表示著固 定鏡與移動鏡之間的光路徑長度之變動，亦表示著移動鏡 在Y方向的位置變化。 又，於本實施形態，設置著光束分離器用干涉儀，其 爲測定光束分離器平台6在X軸方向的位置。此光束分離 器用干涉儀與前述之X干涉儀同樣地具備圖1所示之雷射 頭30 '偏光光束分離器31、移動鏡32、固定鏡33、1/4λ 板34,35，以及接收器36等，與前述之X干涉儀的情形相 同，固定於光束分離器平台6之移動鏡32的X位置最後係 藉由信號處理系統而測出。因此，將光束分離器平台6移 動於X方向時，可對其進行位置控制。 本實施形態所示之Υ干涉儀，其光束分離器21丨系位 於移動鏡22與固定鏡23之間的測定光束之光路徑內。因 此，即使光束分離器21於Υ方向有稍微偏離，亦不影響 19 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） • I — — — — — — — — 4i ·1111111 ^ ·1111111 (請先閱讀背面之注意事項^寫本頁)$ (1 decay page II order B7 V. Description of the invention (〖丨) Light IL illuminates the illumination area IMA on the photomask 2, and an equal magnification image (partially erect image) of a part of the circuit pattern of the illumination area IMA will become a projection To the exposure area IA conjugated to the aforementioned illumination area IMA on the photosensitive plate 3. Also, as disclosed in, for example, Japanese Unexamined Patent Publication No. 7-57986, the projection optical system 1 can also be projected at an equal number of times in a complex array. The optical system unit is constituted. For such a projection optical system unit, please refer to Japanese Patent Application Laid-Open No. 7-57986 and its corresponding U.S. Patent No. 5,729,331. The mask stage 4 and the photosensitive plate stage 5 are mounted on a cross section (not shown). It is a C-shaped conveyor. For a more detailed description, the photomask platform 4 is actually mounted on the upper plate portion of the conveyor, and is constituted by a micro-movement in the XY plane by a driving device such as a motor (not shown). The reticle 2 on the reticle platform 4 is held horizontally by vacuum suction or the like. The XY position of the reticle platform 4 is based on the reticle-side interferometer system with a predetermined decomposition energy, such as 0.5 ~ Decomposition energy of lnm size was measured. This photomask-side interferometer system will be described in detail later. In addition, the photosensitive plate stage 5 is actually mounted on the bottom plate portion of the aforementioned conveyor, and is configured to be finely moved in the XY plane by a driving device such as a motor (not shown). The photosensitive plate 3 coated with a photoresist (photosensitive agent) on the surface of the photosensitive plate platform 5 is held horizontally by vacuum adsorption or the like. The XY position of the photosensitive plate platform 5 is by the photosensitive plate side interferometer. The system is measured with a predetermined decomposition energy, for example, a decomposition energy with a size of 0.5 to 1 nm. In addition, one of the photomask stage 4 and the photosensitive plate stage 5 can be fixed on a conveyor frame. The exposure device 100 is obtained by The conveyor is driven in the X-axis direction, and relative to the projection optical system 1, the photomask platform 4 and the photosensitive plate platform 5 — 13 This paper size applies to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 乂 Please W first (Please read the notes on the back and fill in this page) Packing ---- I --- Order --------- Printed by the Consumers' Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention ([1) By scanning, the entire circuit pattern of the pattern area on the photomask 2 is copied onto the photosensitive plate 3 having a surface coated with a photoresist. Next, the mask-side interferometer system will be described in detail with reference to FIGS. 1 and 2. In addition, since the photosensitive plate-side interferometer system and the photomask-side interferometer system have the same structure, the components corresponding to FIG. 1 and FIG. 2 are identified by adding {'} to the same symbol. The detailed description is as follows: Omit it. The mask-side interferometer system includes an X-interferometer for measuring the position of the mask stage 4 as a moving body in the scanning direction (X-axis direction), and a Y-interferometer for measuring the position in the non-scanning direction (Y-axis direction). Among these X interferometers and Y interferometers, the Michelson Morley type heterodyne method laser interferometer is actually the most widely used. These interferometers can be referred to, for example, those previously disclosed in U.S. Patent No. 5,767,971. The X interferometer is provided with a laser head 10, a polarized beam splitter 11, a moving mirror 12, a fixed mirror 13, and a quarter-wave plate (hereinafter referred to as a "1/4 λ plate") 14 as shown in FIG. 1 , 15, and receiver 16 and so on. The laser head 10 includes a light source and a measurement unit. As a light source, a two-cycle laser using the Saiman effect is used. Since the frequency of this light source has been stabilized, it can output different vibration frequencies of only 2 to 3 MHz (therefore, the wavelengths are also different) by using the Syman effect, and it has a Gaussian distribution containing the first deflection component and the second deflection component whose polarization directions are perpendicular to each other. Laser beam formed by a circular beam. The first polarized light component is a polarized light that is parallel to a light incident surface of the light separation surface (see FIG. 2A of FIG. 2) of the polarized beam splitter 11, that is, a surface that is parallel to the incident light to the light separation surface and a normal to the light separation surface. Component (also known as p-polarized light), hereinafter referred to as Η component. The second polarized light component is relative to 14 — — — — — — —i — — — — — — ^ 111111 · (please «'read back (6--notes before filling out this page) threadbook Paper size applies Chinese National Standard (CNS) A4 (210 X 297 mm) Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 _B7_ V. Description of the invention (^) The light separation surface of the polarized beam splitter 11 is perpendicular to the light The polarization component (also referred to as s-polarized light) of the incident surface is hereinafter referred to as the V component. The measurement unit is provided inside the laser head 10 so that the aforementioned two oscillation wavelength components (ie, the V component and the chirp component) output from the light source. ) Interfere with each other, monitor their phase changes, and send this monitoring signal as a reference signal to measure the phase difference to the signal processing system (not shown). The aforementioned polarizing beam splitter 11 passes a predetermined polarization component, The optical element that reflects the polarized light component perpendicular to this component is here to transmit the tritium component from the laser head 10 and reflect the V component to separate the tritium component and the V component. The moving mirror 12 is fixed on the mask platform 4 of the X axis direction The end face (on the X side) is a mirror that moves with the mask platform relative to the projection optical system. The fixed mirror 13 is fixed to a predetermined position in the device (for example, fixed to the projection optical system 1). Here, the description The components of this interferometer function. The laser light emitted from the laser head 10 enters the polarized beam splitter 11, and the incident laser light is separated into a chirped component (measurement beam) and a V component (reference beam). The reference beam (V component) reflected by the beam splitter 11 passes through the 1 / 4λ plate 15 and is converted into circularly polarized light. After being reflected by the fixed mirror 13, it passes through the 1 / 4λ plate 15 again in the opposite direction. Therefore, the polarization direction of the reference beam is converted to a direction perpendicular to the 1/4 wavelength plate 15 (the same polarization direction as that of the chirped component), which is incident on the receiver 16 through the polarization beam splitter 11. On the other hand, transmission The measuring beam of the beam splitter 11 (the tritium component) 15 This paper size is applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm) 11 I 111 I i --- 11 I — —Order ------ -(Please read the note on the back first Please fill in this page again) Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Α7 Β7 V. Description of the invention ((+) 'will be transmitted through the 1 / 4λ plate 14 to circularly polarized light and reflected by the moving mirror 12, Opposite the previous direction, it transmits again through the 1/4 λ plate 14. By this, the polarization direction of the measuring beam is converted into the direction perpendicular to the 1/4 wavelength plate 14 (the same polarization direction as the V component), and the beam is polarized. After the splitter 11 reflects, it will coincide with the reference beam coaxially, so that it travels on the same light path and enters the receiver 16. The receiver 16 has a polarizer and a photoelectric conversion element (not shown) inside. The V component and the Η component (ie, the measurement beam and the reference beam) from the polarized beam splitter 11 are set so that the polarization angle becomes 45 degrees. Therefore, the polarizer allows only the vector component of the V component which is deflected in the angular direction to pass, and only the vector component of the Η component which is deflected in the angular direction. Then, interference light that has passed through the vector component VV of the polarizer and the vector component VH of the chirped component is incident on the photoelectric conversion element. This photoelectric conversion element is an electric signal (interference signal) obtained after photoelectric conversion of interference light of two vector components to a signal processing system (not shown). In this signal processing system, as mentioned above, the self-laser head 10 provides a reference signal useful for phase measurement, and the signal processing system uses the reference signal to perform calculations in order to obtain X of the moving mirror 12 with high precision. Position (the amount of movement in the X-axis direction of the mask stage 2). In addition, the details of signal processing by the signal processing system are processed by a well-known method regarding a heterodyne interferometer, and detailed descriptions thereof are omitted here. ΥThe instrument is equipped with a laser head 20 as a light source section, a polarized beam splitter 21 as a separation optical system, a moving mirror 22, a fixed mirror 23 as a reflective optical member, and a 1/4 λ plate 24. 25. The paper size used as the return path of the light path is applicable to the Chinese National Standard (CNS) A4 (210 X 297 public love). 乂 Please read the precautions on the back before filling this page.) Installation ---- I-- -Order ---- I ---- Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Description of the invention (β) Right-angle shuttle mirror 26 and receiver 27, etc. This chirped interferometer is a laser interferometer according to the present invention that measures the position of the mask stage 4 as a moving body in the z-axis direction. Figure 2 is a top view of the chirped interferometer. The laser head 20, the polarized beam splitter 21, and the receiver 27 are the same as those of the laser head 10, the polarized beam splitter 11, and the receiver 16 described above. The moving mirror 22 is attached to an end of one side (a γ side) of the mask stage 4 in the Υ-axis direction, and is provided along the X-axis direction with a first length L1. A Υ-side side of the moving mirror 22 is provided. Is a reflective surface 22a. It is obvious from FIG. 2 that L1 is shorter than the length (full length) of the mask stage 4 in the X-axis direction. Here, on the premise that a reference mirror is formed, the right-angle shuttle lens 26 is fixed to the beam splitter platform 6 as a mobile device in a predetermined positional relationship with the polarized beam splitter 21, 1/4 λ plate 24, 25. . This beam splitter platform 6 is driven by a drive system such as a linear motor (not shown), and is driven in the X-axis direction on almost the same surface as the mask stage 4. The fixed mirror 23 is fixed to a predetermined position on the side opposite to the moving mirror 22 via the beam splitter platform 6. The surface on the other side (+ Υ side) of the fixed mirror 23 in the y-axis direction is a reflecting surface 23a extending along the X direction with a second length L2. Here, the function of each component of the Y interferometer will be described with reference to FIG. 2. The laser light emitted from the laser head 20 is incident on the polarized beam splitter 21, and the incident laser light is separated into a chirped component (reference beam) and a V component (measurement beam) on the light separation surface 21a. Reference beam transmitted through the light separation surface 21a (Η component: having a size parallel to 17 paper standards applicable to the Chinese National Standard (CNS) A4 specification (210 X 297 mm)) ！ 1 Order-! • Line / 1 '' (please read the ^ item on the back ^ before filling this page) A7 B7__ 5. Description of the invention (“) The linearly polarized light in the vibration direction of the paper in Figure 2) After being polarized in the polarized beam splitter 21, it is reflected by the right-angle shuttle mirror 26 as a reference mirror, folds back along a light path parallel to the incident light path, passes through the polarized beam splitter 21 again, and enters the receiver 27. On the other hand, The measurement beam (V component: linearly polarized light having a direction perpendicular to the vibration direction of the paper surface of FIG. 2) reflected on the light separation surface 21a is converted into circularly polarized light after passing through the 1 / 4λ plate 24, and is reflected on the reflecting surface of the moving mirror 22. After 22a is reflected, it passes through the 1/4 λ plate 24 again. In this way, the polarization direction of the measuring beam is converted from circularly polarized light to linear polarization again. The incident directions are perpendicular to each other (same direction as the tritium component) Secondly, it passes through the polarized beam splitter 21 and is converted into circularly polarized light after passing through the 1/4 λ plate 25. Then, the measurement beam is reflected on the reflecting surface 23a of the fixed mirror 23 and passes through the 1/4 λ plate 25 again. As a result, as described above, the conversion of the polarization direction of the measurement beam is opposite to the incident direction (same direction as the chirped component) when it first reaches the quarter-wave plate 25, and the polarized beam splitter 21 is reflected toward the right-angle shuttle lens. 26. Next, the measuring beam is returned by the right-angle shuttle mirror 26 along a light path parallel to the incident light path, reflected again by the polarized beam splitter 21, and transmitted through the 1/4 and plate 25 on the reflecting surface of the fixed mirror 23. 23a is reflected. Then, when this measurement beam passes through the λλ plate 25 again, its polarization direction is reversed to the same direction as the tritium component. After passing through the polarized beam splitter 21, it passes through the 1/4 and plate 24 and is reflected by the moving mirror 22. After the 1M λ plate 24 is transmitted, its polarization direction is changed again (same direction as the V component). Finally, after the polarized beam splitter 21 is reflected, it coincides with the reference beam coaxially and travels to the same 18 with each other. This paper size applies China National Standard (CNS) A4 specification (210 X 297 mm) (please read the precautions & fill in this page first) Install ----- order. !! 1! Staff of Intellectual Property Bureau, Ministry of Economic Affairs Printed by the Consumer Cooperative, printed by the Intellectual Property Bureau of the Ministry of Economic Affairs, printed by the Consumer Cooperative A7 _B7____ V. Description of the invention () Light path and incident on the receiver 27. The receiver 27 is the same as the receiver 16, and the two components are The interference light of the vector component is supplied to the photoelectric conversion element, and the interference light of the two components is photoelectrically converted by the photoelectric conversion element, and the obtained electrical signal (interference signal) is supplied to a signal processing system (not shown), which is the same as the above. This signal processing system measures the distance between the fixed mirror 23 and the moving mirror 22 in the Y-axis direction (the position of the moving mirror 22 in the Y-axis direction). In the Y interferometer of this embodiment, the optical path length of the reference beam is completely included in the total optical path length of the measuring beam, and the difference between the two is equal to (the optical path length between the fixed mirror and the moving mirror) X2. That is, the change in the interference effect measured by the measuring device when the moving mirror is moving indicates the change in the length of the light path between the fixed mirror and the moving mirror, and it also indicates the change in the position of the moving mirror in the Y direction. In this embodiment, an interferometer for a beam splitter is provided, which measures the position of the beam splitter stage 6 in the X-axis direction. This interferometer for a beam splitter is provided with the laser head 30 ′ shown in FIG. 1, a polarizing beam splitter 31, a moving mirror 32, a fixed mirror 33, a 1 / 4λ plate 34, 35, and a receiver, as in the aforementioned X interferometer. 36 and the like, as in the case of the aforementioned X interferometer, the X position of the moving mirror 32 fixed to the beam splitter platform 6 is finally measured by a signal processing system. Therefore, when the beam splitter stage 6 is moved in the X direction, the position can be controlled. In the chirped interferometer shown in this embodiment, the beam splitter 21 is located in the light path of the measurement beam between the moving mirror 22 and the fixed mirror 23. Therefore, even if the beam splitter 21 deviates slightly in the Υ direction, it does not affect 19 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) • I — — — — — — — — 4i · 1111111 ^ · 1111111 (Please read the notes on the back first ^ Write this page)

五、發明說明（） 通過光束分離器21之移動鏡22與固定鏡23之光路徑長度 。如前述般，Y干涉儀所觀測之物係於移動鏡22與固定鏡 23間之光照射點的光路徑長度；平台(或者說是裝設於平台 上之移動鏡)移動於X方向時之上述光路徑長度，亦即移動 鏡在Y方向位置的變化。因此，於本實施形態，光束分離 器平台6之移動（移動精度）不影響欲觀測之移動鏡在Y 方向位置的變化。 又，信號處理系可利用增幅器、A/D轉換器及微處理 器等（圖示皆予以省略）來構成。 其次，就上述所構成之此第1實施形態之掃描型曝光 裝置100在掃描曝光時光罩平台4及光束分離器平台6的 驅動方法之一例說明之。此處，事先將光罩平台4在掃描 方向的移動行程設爲2L、移動鏡22之長度設爲L1，又固 定鏡23之長度L2 (LI、L2之長度皆爲L+ α )。此處， α爲既定之邊界，實際上爲微小量。又，感光板平台側之 動作因與光罩平台側相同，故省略其說明。 圖3所示係掃描開始時光罩平台4及光束分離器平台 6的位置關係。於此圖3之狀態下，未圖示之控制裝置係 將搭載光罩平台4及感光板平台5的未圖示之輸送架，以 速度V開始驅動於+ Χ方向，同時將光束分離器平台6以 速度V/2開始驅動於+ χ方向。接著，經過既定時間t後 掃描結束’而掃描結束時之光罩平台4及光束分離器平台 6成爲如圖4所示的位置關係。 此時’很明顯可看出光罩平台4之移動距離爲2L，其 _ 20 -請先83'讀背赴之注意事項再填寫本頁) 1!訂- -------線 經濟部智慧財產局員工消費合作社印製 本紙张尺度週用甲関豕‘準（CNS)A4規格⑽χ 297公楚） A7 B7 五、發明說明（q ) 移動時間爲t = 2L/V。而於此時間t內光束分離器平台6 之移動距離爲V/2Xt = L。因此’依本實施形態，從圖3 及圖4也明顯地可看出，從掃描開始位置至掃描結束位置 爲止，由於Y干涉儀之測定光束持續照射移動鏡22及固 定鏡23，故使用較光罩平台4之全長還短之長度約l的移 動鏡22及固定鏡23，於較光罩平台4之全長還長的光罩 平台4之掃描範圍（行程2L之範圍）的全程上，進行非掃 描方向（Y軸方向）之高精度的位置測量乃爲可能。關於 感光板平台5也是同樣地，於行程2L之掃描範圍的全程， 進行非掃描方向（Y軸方向）之高精度的位置測量係可能 的。 如以上說明，藉由本實施形態之γ干涉儀，使用比光 罩平台4及感光板平台5之X軸方向長度還短，且長度約 爲其移動行程（2L)—半之反射鏡（移動鏡22及固定鏡 23,移動鏡22’及固定鏡23’），乃可進行高精度之垂直於 光罩平台4及感光板平台5之X軸方向的Y軸方向之位置 測定。 因此，依本實施形態之曝光裝置100，即使將做爲基 板之感光板3大型化之時，也能高精度地測出光罩平台4 、感光板平台5之非掃描方向的位置。又，光罩平台4、 感光板平台5之掃描方向的位置，可以習知般相同的方式 ，藉由將該掃描方向之干涉儀光束照射於小型移動鏡12、 12’而高精度地測出。因此，能高精度地進行光罩2及感光 板3之位置控制，其結果，光罩與基板之高精度的重合乃 21 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） •(請先町讀背面之注意事項1¾寫本頁) 裝--------訂---------線 經濟部智慧財產局員工消費合作社印製 A7 B7 五、發明說明（VO ) 爲可能。 又’於上述實施形態中，光罩側及感光板側之移動鏡 、固定鏡在掃描方向的長度同約爲L，但本發明並不僅限 於此。例如，若光罩側及感光板側之移動鏡的長度約爲L1 ’光罩側及感光板側之固定鏡的長度約爲L2之時，相對於 光罩平台4及感光板平台5之掃描速度VI，則藉由將光束 分離器平台6 (6’）之掃描速度設爲約L2/ (L1 + L2) XV ，乃可對光罩平台4及感光板平台5在掃描方向之槪略（ L1 + L2)行程進行掃描。 又，於上述實施形態，雖已對光罩平台4及感光板平 台5搭載於C字形的輸送架上一體式移動之情形加以說明 ，但並不限於此，亦可爲將光罩平台及感光板平***立而 移動於掃描方向之構成。 又，於上述第1實施形態，說明了僅Y干涉儀使用直 角梭鏡之雙程干涉儀的情形，當然X干涉儀及光束分離器 用干涉儀也同樣可爲雙程的構成，藉此，即使有測定對象 物之旋轉誤差，這些干涉儀亦與Y干涉儀同樣地可進行高 精度之位置測定。 《第2的實施形態》 其次，根據圖5對本發明之第2實施形態加以說明。 此處，關於與前述之第1的實施形態相同或近似構成部分 ，乃使用同一符號，同時簡略其說明或省略之。 此第2實施形態，僅測定光罩平台及感光板平台在非 掃描方向的位置處Y干涉儀的構成與前述之第1的實施形 22 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先Bff讀背面之注意事項1¾寫本頁： 裝 —訂---------線 經濟部智慧財產局員工消費合作社印製 A7 B7____ 五、發明說明（Ή) 態不同，而其他部分之構成相同之故，僅針對此γ干涉儀 說明之。於本實施形態，感光板側干涉儀之構成因與光罩 側相同，在此省略其詳細之說明。 圖5係槪略地表示有關第2實施形態之光罩側的Y干 渉儀之構成。此Y干渉儀，係具備做爲光源部之雷射頭20 、做爲分離光學系統之偏光光束分離器21、移動鏡22、 ΙΜλ板24,25、鏡40、直角梭鏡41及接收器27等。 在構成有參考鏡之情況下，鏡40係與偏光光束分離器 21、1/4λ板24,25、直角梭鏡41以既定之位置關係固定於 光束分離器平台6上。 此處，說明此Υ干涉儀之構成各部的作用。從雷射頭 20射出之雷射光係入射於偏光光束分離器21，此入射之雷 射光藉光分離面21a分離爲Η成分（係具有平行於圖5之 紙面的振動方向之直線偏光，此處意謂著參考光束）及V 成分（係具有垂直於圖5之紙面的振動方向之直線偏光， 此處意謂著測定光束）。 接著，通過光分離面21a之參考光束，透過1/4 λ板25 後轉換爲圓偏振光，於鏡40被反射後，再次透過ΐ/4λ板 25。藉此，參考光束其偏光方向的轉換與最初到達1/4波 長板25時的入射時的入射方向互相垂直（即，與V成分 相同之偏光方向），又於偏光光束分離器21被反射，而朝 向直角梭鏡41。接著，此參考光束藉由直角梭鏡41沿著 與入射光路徑平行之光路徑折返，再次於偏光光束分離器 21反射，而透過1/4 λ板25於鏡40被反射。然後，此參考 23 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先H'讀背卧之注意事項再填寫本頁) 裝-------訂---------線 經濟部智慧財產局員工消費合作社印製 Β7 經濟部智慧財產局員工消費合作社印製 五、發明說明（r&gt;) 光束，再次透過1/4λ板25時，再度轉換其偏光方向（爲 與Η成分相同之偏光方向），最後透過偏光光束分離器21 後入射至接收器27。 另一方面，於光分離面21a被反射之測定光束（V成 分），係透過1/4λ板24後轉換爲圓偏振光，而於移動鏡 22之反射面22a被反射後，再次透過1/4 λ板24。藉此， 測定光束其偏光方向被1/4 λ板24轉換，透過偏光光束分 離器21，朝向直角梭鏡41。接著，此測定光束藉由直角梭 鏡41沿著與入射光路徑平行之光路徑折返，再次透過偏光 光束分離器21後，透過1/4λ板24轉換爲圓偏振光。然後 ，此測定光束於移動鏡22之反射面22a被反射，透過1/4 又板24，其偏光方向的轉換與最初到達ΐ/4λ板24時的入 射時方向相反，而於偏光光束分離器21被反射，與參考光 束同軸地重合後，彼此行進於同一之光路徑上而入射至接 收器27。 然後，於接收器27內，如前述，相對於既定之變更成 分的兩成分之向量成分的干涉光被提供至光電轉換元件， 藉由此光電轉換元件，將兩成分之干涉光進行光電轉換後 之電器信號（干涉信號）供給至未圖示之信號處理系統， 藉該信號處理系統而測出移動鏡22在Υ軸方向的位置。 若依據具備此種構成之Υ干涉儀的此第2實施形態之 曝光裝置’由於沒有固定鏡的存在故其長度上不受限制， 而可測定光罩平台4在非掃描方向的位置。 此時’若將移動鏡22之長度射爲L1，光罩平台4之 24 («·先町讀背面之注意事項再缜寫本頁&gt; 裝V. Description of the invention () The light path length of the moving mirror 22 and the fixed mirror 23 passing through the beam splitter 21. As mentioned above, the object observed by the Y interferometer is the length of the light path of the light irradiation point between the moving mirror 22 and the fixed mirror 23; when the platform (or a moving mirror installed on the platform) moves in the X direction The above-mentioned light path length, that is, the position change of the moving mirror in the Y direction. Therefore, in this embodiment, the movement (movement accuracy) of the beam splitter platform 6 does not affect the change in the Y-direction position of the moving mirror to be observed. The signal processing system can be configured by using an amplifier, an A / D converter, a microprocessor, etc. (the illustrations are omitted). Next, an example of a method of driving the mask stage 4 and the beam splitter stage 6 in the scanning exposure apparatus 100 of the first embodiment configured as described above during scanning exposure will be described. Here, the moving stroke of the mask stage 4 in the scanning direction is set to 2L, the length of the moving mirror 22 is set to L1, and the length L2 of the fixed mirror 23 is set (the lengths of LI and L2 are both L + α). Here, α is a predetermined boundary and is actually a minute amount. The operation of the platen side of the photosensitive plate is the same as that of the platen side of the photomask, so its explanation is omitted. Figure 3 shows the positional relationship between the mask stage 4 and the beam splitter stage 6 at the start of scanning. In the state of FIG. 3, the control device (not shown) is a conveyor (not shown) equipped with a photomask platform 4 and a photosensitive plate platform 5 and starts to drive in the + X direction at a speed V, and at the same time the beam splitter platform 6 starts to drive in the + χ direction at a speed of V / 2. Then, after a predetermined time t has elapsed, the scan is completed ', and the mask stage 4 and the beam splitter stage 6 at the end of the scan have a positional relationship as shown in Fig. 4. At this time, it is obvious that the moving distance of the reticle platform 4 is 2L, and its _ 20-Please read the precautions of 83 'before going to this page) 1! Order ----------- Ministry of Economic Affairs Printed by the Intellectual Property Bureau's Consumer Cooperatives, this paper is printed on a paper scale for weekly use (CNS) A4 specification (χ 297). A7 B7 5. Description of the invention (q) The moving time is t = 2L / V. During this time t, the moving distance of the beam splitter platform 6 is V / 2Xt = L. Therefore, according to this embodiment, it is obvious from FIG. 3 and FIG. 4 that from the scanning start position to the scanning end position, since the measurement beam of the Y interferometer continues to irradiate the moving mirror 22 and the fixed mirror 23, the use of The moving mirror 22 and the fixed mirror 23 with a length of about 1 and a length of the mask platform 4 are performed over the entire range of the scanning range (the range of the stroke 2L) of the mask platform 4 which is longer than the full length of the mask platform 4. High-precision position measurement in the non-scanning direction (Y-axis direction) is possible. The same applies to the photosensitive platen stage 5. It is possible to perform high-precision position measurement in the non-scanning direction (Y-axis direction) throughout the scanning range of the stroke 2L. As described above, by using the gamma interferometer of this embodiment, the length of the X-axis direction of the mask stage 4 and the photosensitive plate stage 5 is shorter, and the length is about half of its moving stroke (2L) —a half mirror (moving mirror) 22 and fixed mirror 23, moving mirror 22 'and fixed mirror 23') can perform high-precision position measurement in the Y-axis direction perpendicular to the X-axis direction of the mask stage 4 and the photosensitive plate stage 5. Therefore, according to the exposure apparatus 100 of this embodiment, even when the photosensitive plate 3 as a base plate is enlarged, the positions of the mask stage 4 and the photosensitive plate stage 5 in the non-scanning direction can be measured with high accuracy. In addition, the positions in the scanning direction of the photomask stage 4 and the photosensitive plate stage 5 can be measured in the same manner as conventionally, and the small moving mirrors 12 and 12 'can be accurately measured by irradiating the interferometer beam in the scanning direction with the small moving mirrors 12 and 12'. . Therefore, the position control of the reticle 2 and the photosensitive plate 3 can be performed with high accuracy. As a result, the high-precision coincidence of the reticle and the substrate is 21. This paper size conforms to the Chinese National Standard (CNS) A4 (210 X 297 mm) ) • (Please read the precautions on the back of this article 1¾ write this page) -------- Order --------- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7 V. Invention description (VO) is possible. In the above-mentioned embodiment, the lengths of the moving mirror and the fixed mirror on the photomask side and the photosensitive plate side in the scanning direction are both about L, but the present invention is not limited to this. For example, if the lengths of the moving mirrors on the photomask side and the photosensitive plate side are about L1 ', the lengths of the fixed mirrors on the photomask side and the photosensitive plate side are about L2. Velocity VI, by setting the scanning speed of the beam splitter platform 6 (6 ') to about L2 / (L1 + L2) XV, it is possible to neglect the scanning platform 4 and the photosensitive plate platform 5 in the scanning direction ( L1 + L2) stroke for scanning. Moreover, in the above-mentioned embodiment, although the case where the mask stage 4 and the photosensitive plate stage 5 are mounted on a C-shaped conveyer and moved integrally has been described, it is not limited to this, and the mask stage and the photosensitive The plate platform is independent and moves in the scanning direction. Furthermore, in the first embodiment described above, the case where the Y-interferometer uses a two-way interferometer with a right-angle shuttle lens has been described. Of course, the X-interferometer and the interferometer for a beam splitter can also have a two-pass configuration. There is a rotation error of the measurement object, and these interferometers can perform high-precision position measurement similarly to the Y interferometer. << Second Embodiment >> Next, a second embodiment of the present invention will be described with reference to Fig. 5. Here, the same reference numerals are used for the same or similar components as those of the first embodiment described above, and their descriptions are omitted or omitted. In this second embodiment, only the structure of the Y interferometer and the first embodiment described above are measured only at the positions of the photomask stage and the photosensitive plate stage at positions other than the scanning direction. The paper size is in accordance with the Chinese National Standard (CNS) A4 specification (210 X 297 mm) (Please read the notes on the back Bff first 1¾Write this page: Binding ------------- Printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs A7 B7____ V. Description of the invention (Ή ), The structure of other parts is the same, so only the gamma interferometer will be described. In this embodiment, because the structure of the photosensitive plate side interferometer is the same as that of the photomask side, its detailed description is omitted here. The 5 series shows the structure of the Y-type interferometer on the mask side of the second embodiment. The Y-type interferometer is provided with a laser head 20 as a light source section and a polarized beam splitter 21 as a separation optical system. , Moving mirror 22, IMλ plates 24, 25, mirror 40, right-angle shuttle lens 41, receiver 27, etc. In the case of a reference mirror, the mirror 40 is connected to the polarized beam splitter 21 and 1 / 4λ plate 24, 25. The right-angle shuttle lens 41 is fixed to the beam splitter flat with a predetermined positional relationship. The stage 6. Here, the function of each part of the chirped interferometer will be described. The laser light emitted from the laser head 20 is incident on the polarized beam splitter 21, and the incident laser light is separated into a chirped component by the light separation surface 21a. (It is a linearly polarized light having a direction parallel to the vibration direction of the paper surface of FIG. 5, which means a reference beam here) and a V component (is a linearly polarized light having a vibration direction perpendicular to the direction of the paper surface of FIG. 5, which means a measurement beam Then, the reference beam passing through the light separation surface 21a passes through the 1/4 λ plate 25 and is converted into circularly polarized light. After being reflected by the mirror 40, it passes through the ΐ / 4λ plate 25 again. With this, the reference beam has its polarization direction The conversion of the and the incident direction at the time of the incident when first reaching the quarter-wave plate 25 is perpendicular to each other (that is, the same polarization direction as the V component), and is reflected by the polarized beam splitter 21 and faces the right-angle shuttle lens 41. Then This reference beam is turned back by the right-angle shuttle lens 41 along a light path parallel to the incident light path, reflected again by the polarized beam splitter 21, and reflected by the mirror 40 through the 1/4 λ plate 25. Then, this reference 23 This paper is suitable for China National Standard (CNS) A4 specification (210 X 297 mm) (please fill in this page before reading the H's reclining position) ------------ Order --------- line Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economics. B7 Printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs. 5. Description of the invention (r &gt;) When the beam passes through the 1 / 4λ plate 25 again, its polarization direction is changed again. The same polarization direction), and finally passes through the polarized beam splitter 21 and then enters the receiver 27. On the other hand, the measurement beam (V component) reflected on the light separation surface 21a passes through the 1 / 4λ plate 24 and is converted into a circle. The polarized light is reflected by the reflecting surface 22 a of the moving mirror 22 and then passes through the 1/4 λ plate 24 again. Thereby, the polarization direction of the measurement beam is converted by the 1/4 lambda plate 24, passes through the polarization beam splitter 21, and faces the right-angle shuttle 41. Next, the measurement beam is returned by the right-angle shuttle lens 41 along a light path parallel to the incident light path, passes through the polarized beam splitter 21 again, and is converted into circularly polarized light by the 1 / 4λ plate 24. Then, the measurement beam is reflected on the reflecting surface 22a of the moving mirror 22, and passes through the 1/4 and 24 plates. The polarization direction conversion is opposite to the direction of the incident light when it first reaches the ΐ / 4λ plate 24, and it is a polarized beam splitter. 21 is reflected and coincides with the reference beam coaxially, and then travels on the same light path and enters the receiver 27. Then, in the receiver 27, as described above, the interference light of the two-component vector component with respect to the predetermined change component is supplied to the photoelectric conversion element, and the photoelectric conversion element performs photoelectric conversion of the two-component interference light. An electrical signal (interference signal) is supplied to a signal processing system (not shown), and the position of the moving mirror 22 in the z-axis direction is measured by the signal processing system. If the exposure apparatus' according to the second embodiment provided with a chirped interferometer having such a configuration has no fixed mirror, its length is not limited, and the position of the mask stage 4 in the non-scanning direction can be measured. At this time, 'If the length of the moving mirror 22 is shot as L1, and the reticle stage 4 of 24 («· Please read the precautions on the back of the first town before writing this page>

• I ----訂---------線- 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） A7 B7 五、發明說明（y1)) (請先町讀背®-之注意事項再填寫本頁) 移動速度設爲VI，將光束分離器平台6之移動速度設爲 V2，且光罩平台4在X軸方向的移動行程（掃描長）設爲 S時’只要滿足 S = I VI/ (VI - V2) | LI &gt; L1，即，0 &lt; V2 &lt; 2V1 (但V14V2)，則由於測定光束因不斷照射於移 動鏡22之反射面22a的不同位置，可對光罩平台4在Y軸 方向的位置測定之。 例如，若 V2 = VI / 2，貝[J S = 2L1。又，仿！1 如 V2 = 9 / 10XV1之時，則S = 10L1。又，於上述第1、第2實施 形態，係就Y干涉儀爲具備有直角梭鏡之雙程干涉儀之情 形加以說明，但不僅限於此，若於掃描中做爲測定對象物 之光罩平台等幾乎不會發生旋轉之此種構成的情況，亦可 使用單程構成。圖6所示係將上述第2實施形態之Y干涉 儀以單程構成時之干涉儀的一例。此圖6之干涉儀，係取 代掉圖5中之直角梭鏡41而將接收器27固定於光束分離 器平台6上。即使採用此圖6之雷射干涉儀，亦可得到與 上述第2的實施形態同等之效果。又，取代掉圖6中之接 收器27，於光束分離器平台6上在X軸方向以45度固定 經濟部智慧財產局員工消費合作社印製 反射鏡，而於此反射鏡之反射光路徑上配置接收器27也可 〇 又，於上述第1實施形態，係就將移動鏡22及固定鏡 23對向配置於同一水平面內之情形加以說明，但不僅限於 此，例如，如圖7所示，亦可將移動鏡22及構成參考鏡之 固定鏡23相互地平行配置於不同之高度位置。於此圖7之 干涉儀，固定鏡42係例如裝設於投影光學系統之鏡筒部。 25 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） B7 修正 五、發明說明（冷） ___ 又，於搭載有偏光光束分離器21之光束分離器平台6上， 在XZ平面上以45度之角度固定有半透鏡44。又，於藉由 偏光光束分離器21之反射光路徑上，配置著將偏光光束分 離器21所反射之V成分朝向移動鏡22反射之全反射鏡45 。此全反射鏡45，係與光束分離器平台6上之偏光光束分 離器21及半透鏡44 一體式地移動於X軸方向。 於圖8所示係圖7之變形例。針對圖7所示之具體例 ，圖8所示之構成例，係使用反射鏡44a及44b，又變更接 收器42之位置，且使用1/4波長板24及25之點(位置)是 不同的。以虛線包圍之光學系統全體係配置於未圖示之平 台般的可動構件上，相對於可動平台之速度VI，其以V2 (例如V/2)來移動。 即使將圖7或圖8之雷射干涉儀組裝入曝光裝置，亦 可得到與前述第1實施形態同等之效果。 又，於上述各實施形態，係就關於本發明之雷射干涉 儀適用於液晶用掃描型曝光裝置的情形加以說明，但不僅 限於此，也相當適用於半導體製造用之步進及掃描方式之 掃描步進機或是近程方向式之直線對準器等的曝光裝置， 另外如具備一度空間移動平台之裝置。再者，本發明在用 以形成液晶顯示面板之具有複數投影光學系統（多透鏡）之 曝光裝置上亦適用之。 又，有關本發明之雷射干涉儀，即使應用於XY二度 空間移動平台，使用較平台全長爲短之反射鏡，也能高精 度地測出較平台全長爲長之行程範圍的全程中，垂直於該 26 本紙張尺度適用中國國家標準（CNS)A4規格（210 X 297公釐） (請先M-讀背面之注意事項再填寫本頁) -衣--------訂---------線. 經濟部智慧財產局具工消费合作社印製 五 A7 B7 、發明說明（λϊ ) 長行程方向的位置。意即，亦可適用於做爲步進機等晶圓 平台之位置測定裝置。再者，做爲基板之板，其不僅可當 作液晶用之基板，亦可當作使用於曝光裝置上之光罩用玻 璃基板。 如以上說明，藉由有關本發明之雷射干渉儀、位置測 定裝置及位置測定方法，使用較移動體全長爲短之反射鏡 ’於較移動體全長爲長之移動行程的全程中，可進行垂直 於該長行程方向之位置測定，此爲本發明之一優良效果。 有關本發明之曝光裝置，即使於基板大型化之情形，亦具 有可高精度地進行平台之位置控制的效果。本發明之製造 方法，係爲了製造依本發明之新式雷射干涉儀、位置測定 裝置，以及曝光裝置之適當的方法。 請 先 M- 讀 背 意 % ί . 本· 頁I 一 I I I I I I 訂 線. 經濟部智慧財產局貝工消t合作社印製 27 本紙張尺度適用中囲國家標準（CNS)A4規格（210 X 297公釐）• I ---- Order --------- Line-This paper size is applicable to China National Standard (CNS) A4 (210 X 297 mm) A7 B7 V. Description of Invention (y1)) (please first Please read this page for the instructions of Machidabe®-). Set the movement speed to VI, the movement speed of beam splitter platform 6 to V2, and the movement stroke (scan length) of mask stage 4 in the X-axis direction. In the case of S, as long as S = I VI / (VI-V2) | LI &gt; L1, that is, 0 &lt; V2 &lt; 2V1 (but V14V2), the measurement beam is continuously irradiated to the reflecting surface 22a of the moving mirror 22 The position of the mask stage 4 in the Y-axis direction can be measured at different positions. For example, if V2 = VI / 2, [J S = 2L1. Again, imitation! 1 If V2 = 9 / 10XV1, then S = 10L1. Also, in the first and second embodiments described above, the case where the Y interferometer is a two-way interferometer equipped with a right-angle shuttle lens is described, but it is not limited to this. If it is used as a mask for the measurement object during scanning In the case where such a structure as a platform hardly rotates, a one-way structure may be used. Fig. 6 shows an example of an interferometer when the Y interferometer of the second embodiment is configured in a single pass. The interferometer in FIG. 6 is a receiver 27 fixed to the beam splitter platform 6 in place of the right-angle shuttle lens 41 in FIG. 5. Even when the laser interferometer of Fig. 6 is used, the same effect as that of the second embodiment can be obtained. In addition, instead of the receiver 27 in FIG. 6, a reflector is printed on the beam splitter platform 6 at 45 degrees in the X-axis direction by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs, and on the reflected light path of the reflector The receiver 27 can also be arranged. In the first embodiment described above, the case where the moving mirror 22 and the fixed mirror 23 are oppositely arranged in the same horizontal plane will be described, but it is not limited to this. For example, as shown in FIG. 7 It is also possible to arrange the moving mirror 22 and the fixed mirror 23 constituting the reference mirror parallel to each other at different height positions. In the interferometer of Fig. 7, the fixed mirror 42 is, for example, mounted on the lens barrel portion of the projection optical system. 25 This paper size applies the Chinese National Standard (CNS) A4 specification (210 X 297 mm) B7 Amendment V. Description of the invention (cold) ___ On the beam splitter platform 6 equipped with a polarized beam splitter 21, at XZ A half lens 44 is fixed on the plane at an angle of 45 degrees. Further, a total reflection mirror 45 that reflects the V component reflected by the polarized beam splitter 21 toward the moving mirror 22 is arranged on the reflected light path through the polarized beam splitter 21. The total reflection mirror 45 is integrally moved in the X-axis direction with the polarized beam splitter 21 and the half lens 44 on the beam splitter platform 6. The modification shown in FIG. 7 is shown in FIG. 8. Regarding the specific example shown in FIG. 7 and the configuration example shown in FIG. 8, the positions of the receiver 42 are changed by using the reflecting mirrors 44 a and 44 b, and the points (positions) using the quarter-wave plates 24 and 25 are different. of. The entire optical system surrounded by a dotted line is arranged on a movable member like a platform (not shown), and it moves at V2 (for example, V / 2) relative to the speed VI of the movable platform. Even when the laser interferometer of Fig. 7 or Fig. 8 is incorporated into the exposure apparatus, the same effect as that of the first embodiment can be obtained. In addition, in the above embodiments, the case where the laser interferometer of the present invention is applied to a scanning exposure device for liquid crystal is described, but it is not limited to this, and it is also quite suitable for the stepping and scanning methods for semiconductor manufacturing. An exposure device such as a scanning stepper or a short-range linear aligner, and an apparatus provided with a one-degree space moving platform. Furthermore, the present invention is also applicable to an exposure device having a plurality of projection optical systems (multi-lens) for forming a liquid crystal display panel. In addition, the laser interferometer of the present invention can accurately measure the entire range of the travel range longer than the platform's full length, even if it is applied to an XY two-dimensional space moving platform using a mirror shorter than the platform's overall length. Perpendicular to the 26 paper sizes, the Chinese National Standard (CNS) A4 specification (210 X 297 mm) is applicable (please read the precautions on the back side before filling in this page)-衣 -------- Order- -------- Line. Printed by the Intellectual Property Bureau of the Ministry of Economic Affairs and Industrial Cooperatives, the five A7 B7, invention description (λϊ) positions in the long stroke direction. In other words, it can also be used as a position measurement device for wafer platforms such as steppers. Furthermore, as a substrate plate, it can be used not only as a substrate for a liquid crystal, but also as a glass substrate for a mask used in an exposure apparatus. As described above, with the laser interferometer, the position measuring device, and the position measuring method of the present invention, it is possible to use a reflector that is shorter than the full length of the moving body over the entire length of the moving stroke that is longer than the full length of the moving body. The measurement of the position perpendicular to the long stroke direction is an excellent effect of the present invention. The exposure device of the present invention has the effect that the position of the stage can be controlled with high accuracy even in the case of a large substrate. The manufacturing method of the present invention is an appropriate method for manufacturing a novel laser interferometer, a position measuring device, and an exposure device according to the present invention. Please read M-%% for your reading. This page ⅠIIIIIII order. Printed by Beige Consumer Co., Ltd., Intellectual Property Bureau, Ministry of Economic Affairs 27 This paper is applicable to China National Standard (CNS) A4 (210 X 297) %)

Claims (1)

A8 B8 C8 D8 申請專利範圍 (請先閱讀背面之注意事項再填寫本頁) 前述移動體於第2方向之移動速度設爲vi、前述分離光學 系統在第2方向之移動速度設爲V2時，則（L1 + L2) / VI =L2/V2之關係式成立。 6 ·如申請專利範圍第1項之雷射干涉儀，其中，分 離光學系統係光束分離器，測定光束及參考光束分別被該 光束分離器分離爲s偏光及p偏光。 7 .如申請專利範圍第1項之雷射干涉儀，其中，參 考鏡包含直角梭鏡。 8 · —種位置測定裝置，係使用來自光源的光來測定 移動於第2方向之移動體的垂直於第2方向之第1方向的 位置，其具備有： 將來自前述光源的光分離爲測定光束及參考光束之分 離光學系統； 裝設於前述移動體之用以反射測定光束的移動鏡； 與前述移動體係獨立而設置之固定鏡，該固定鏡與前 述移動鏡之間形成測定光束之光路徑的一部分； 經濟部智慧財產局員工消費合作社印製 使分離光學系統以與移動體之移動速度不同的速度移 動於第2方向之移動裝置；以及 測定出前述測定光束及參考光束，根據該等光束之干 涉效果以求出移動體在第1方向的位置之測定系統。 9 .如申請專利範圍第8項之位置測定裝置，係另外 具備有參考鏡，以使參考光束可朝向前述測定系統反射。 1 0 .如申請專利範圍第9項之位置測定裝置，其中 ，前述參考鏡係將前述分離光學系統夾在中間，而與前述 本紙張尺度逍用中國國家樑準（CNS ) A4规格（210X297公釐） A8 B8 C8 D8 六、申請專利範圍 1 . 一種雷射干涉儀，係使用雷射光束來測定移動於 第2方向之移動體的垂直於第2方向之第1方向的位置， 其具備有： 將雷射光束分離爲測定光束及參考光束之分離光學系 統； 裝設於移動體之用以反射測光束的移動鏡； 與移動體係獨立而設置之用以反射參考光束的參考鏡 &gt; 使分離光學系統以與移動體之移動速度不同的速度移 動於第2方向之移動裝置；以及 測定出被移動鏡反射之測定光束及被參考鏡反射之參 考光束，根據該等光束之干涉效果以求出移動體在第1方 向的位置之測定器。 2 .如申請專利範圍第1項之雷射干涉儀，其中，前 述移動裝置係將前述分離光學系統和前述參考鏡一起移動 〇 3 .如申請專利範圍第1項之雷射干涉儀，係另外具 備有固定鏡，該固定鏡係以測定光束可通過移動鏡與固定 鏡之間的方式配置著。 4 .如申請專利範圍第1項之雷射干涉儀，其中，前 述分離光學系統之移動速度較移動鏡之移動速度爲慢。 5 .如申請專利範圍第3項之雷射干涉儀，其中，前 述移動鏡具有延伸於第2方向之長度爲L1的反射面，而前 述固定鏡具有延伸於第2方向之長度爲L2的反射面，若將 ______J_ -^/1 \ {請先閎讀背面之注意事項再填寫本頁) 訂 經濟部智慧財產局員工消費合作社印製 本紙張尺度適用中國國家揉準（CNS ) A4规格（210X297公釐） A8 B8 C8 D8 申請專利範圍 (請先閱讀背面之注意事項再填寫本頁) 前述移動體於第2方向之移動速度設爲vi、前述分離光學 系統在第2方向之移動速度設爲V2時，則（L1 + L2) / VI =L2/V2之關係式成立。 6 ·如申請專利範圍第1項之雷射干涉儀，其中，分 離光學系統係光束分離器，測定光束及參考光束分別被該 光束分離器分離爲s偏光及p偏光。 7 .如申請專利範圍第1項之雷射干涉儀，其中，參 考鏡包含直角梭鏡。 8 · —種位置測定裝置，係使用來自光源的光來測定 移動於第2方向之移動體的垂直於第2方向之第1方向的 位置，其具備有： 將來自前述光源的光分離爲測定光束及參考光束之分 離光學系統； 裝設於前述移動體之用以反射測定光束的移動鏡； 與前述移動體係獨立而設置之固定鏡，該固定鏡與前 述移動鏡之間形成測定光束之光路徑的一部分； 經濟部智慧財產局員工消費合作社印製 使分離光學系統以與移動體之移動速度不同的速度移 動於第2方向之移動裝置；以及 測定出前述測定光束及參考光束，根據該等光束之干 涉效果以求出移動體在第1方向的位置之測定系統。 9 .如申請專利範圍第8項之位置測定裝置，係另外 具備有參考鏡，以使參考光束可朝向前述測定系統反射。 1 0 .如申請專利範圍第9項之位置測定裝置，其中 ，前述參考鏡係將前述分離光學系統夾在中間，而與前述 本紙張尺度逍用中國國家樑準（CNS ) A4规格（210X297公釐） Α8 Β8 C8 D8 六、申請專利範圍 測定系統彼此對向配置著。 1 1 .如申請專利範圍第10項之位置測定裝置，其中 ’前述固定鏡係將前述分離光學系統夾在中間，而與前述 移動鏡彼此對向配置著》 1 2 .如申請專利範圍第11項之位置測定裝置，其中 ’當前述移動體移動時，移動鏡與固定鏡之間光路徑長度 的變動係藉由測定系統求出。 1 3 .如申請專利範圍第8項之位置測定裝置，其中 ，前述分離光學系統之移動速度較移動鏡之移動速度爲慢 〇 1 4 .如申請專利範圍第8項之位置測定裝置，其中 ，前述移動鏡具有延伸於第2方向之長度爲L1的反射面， 而前述固定鏡具有延伸於第2方向之長度爲L2的反射面， 若將前述移動體於第2方向之移動速度設爲VI、前述分離 光學系統在第2方向之移動速度設爲V2時，則（L1 + L2 )/ VI = L2/V2之關係式成立。 1 5 .如申請專利範圍第8項之位置測定裝置，其中 ，前述分離光學系統係光束分離器，測定光束及參考光束 分別被該光束分離器分離爲s偏光及p偏光。 1 6 .如申請專利範圍第9項之位置測定裝置，其中 ，前述移動裝置係其上方配置有分離光學系統之移動平台 ，而該移動平台上配置有參考鏡。 1 7 .如申請專利範圍第8項之位置測定裝置’係另 外於移動鏡與分離光學系統之間以及固定鏡與分離光學系 _ _ Ί _ 1 本紙張尺度逋用中國家梯率（CNS ) A4规格（21〇&gt;&lt;297公兼） Γ請先Η讀背面之注$項再填寫本頁) 訂' 經濟部智慧財產局員工消费合作社印製 經濟部智慧財產局員工消費合作社印製 A8 B8 C8 D8 六、申請專利範圍 統之間分別配置有相位調整光學系統。 1 8 ·如申請專利範圍第8項之位置測定裝置，其中 ’前述移動鏡係延伸於第1方向而配置。 1 9 · 一種曝光裝置，能將形成於光罩上之圖案複製 至基板上，係包含有： 保持則述光罩使其移動於第2方向之移動光罩平台 ;保持前述基板使其移動於第2方向之移動基板平台；以 及’對至少一方之平台的垂直於第2方向之第1方向的位 置’使用雷射光束來測定之雷射干涉儀； 前述雷射干涉儀係包含有： 將前述雷射光束分離爲測定光束及參考光束之分離光 學系統； 裝設於前述至少一方之平台上的用以反射測定光束之 移動鏡； 與前述至少一方之平台係獨立而設置的用以反射參考 光束之參考鏡； 使分離光學系統以與前述至少一方之平台的移動速度 不同之速度移動於第2方向之移動裝置；以及 測定出被前述移動鏡反射之測定光束及被前述參考鏡 反射之參考光束，根據該等光束之干涉效果以求出前述至 少一方之平台在第1方向位置之測定器。 2 0 .如申請專利範圍第19項之曝光裝置，其中’前 述移動裝置係將分離光學系統和前述參考鏡一起移動。 2 1 .如申請專利範圍第19項之曝光裝置，係另外具 本紙張尺度適用中國國家梂率（CNS ) A4说格（2i〇x297公釐） -1裝 訂 7線 (請先閱讀背面之注意事項再填 ^+頁) 經濟部智慧財產局貝工消費合作社印製 B8 __§__ 六、申請專利範圍 備有固定鏡，該固定鏡係以測定光束可通過移動鏡與固定 鏡之間的方式配置著。 2 2 .如申請專利範圍第21項之曝光裝置，其中，前 述移動鏡具有延伸於第2方向之長度爲L1的反射面，而前 述固定鏡具有延伸於第2方向之長度爲L2的反射面，若將 前述至少一方之平台在第2方向的移動速度設爲VI、前述 分離光學系統在第2方向之移動速度設爲V2時，則（L1 + L2) / VI = L2 / V2之關係式成立。 2 3 .如申請專利範圍第19項之曝光裝置，其中，分 離光學系統係一種光束分離器，測定光束及參考光束分別 被該光束分離器分離爲s偏光及p偏光。 2 4 .如申請專利範圍第19項之曝光裝置，其中，前 述參考鏡爲直角梭鏡。 2 5 .如申請專利範圍第19項之曝光裝置，其中，前 述移動鏡係包含裝設於光罩平台之第1移動鏡以及裝設於 基板平台之第2移動鏡。 2 6 .如申請專利範圍第19項之曝光裝置，係另外具 備用以搭載光罩平台與基板平台之輸送架以及投影光學系 統，該輸送架係相對於投影光學系統來移動光罩卒台及基 板平台。 2 7 · —種曝光裝置，能將形成於光罩上之圖案複製 至基板上，係包含有： 保持前述光罩使其移動於第2方向之移動光罩平台； 保持前述基板使其移動於第2方向之移動基板平台；以及 ______5___ 本紙張尺度適用中國國家榡率（CNS ) M规格（2i〇x297公漦） (·請先閱讀背面之注f項再填寫本頁) -! 六、申請專利範圍 A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 ’對至少與一方之平台的第2方向互爲垂直之第1方向的 位置’使用雷射光束來測定之位置測定裝置； 該位置測定裝置係包含有： 將前述雷射光束分離爲測定光束及參考光束之分離光 學系統； 裝設於前述至少一方之用以反射測定光束之平台上的 移動鏡； 與前述至少一方之平台係獨立而設置之與前述移動鏡 之間形成測定光束之光路徑一部分的固定鏡； 使分離光學系統以與前述至少一方之平台的移動速度 不同之速度移動於第2方向之移動裝置；以及 測出前述測定光束及前述參考光束，根據該等光束之 干涉效果以求出前述至少一方之平台在第1方向位置之測 定器。 2 8 .如申請專利範圍第27項之曝光裝置，係另外具 備有參考鏡，以使參考光束可朝向前述測量系統反射。 2 9 .如申請專利範圍第28項之曝光裝置，其中，前 述參考鏡係將前述分離光學系統夾在中間，而與前述測量 系統彼此對向配置著。 ‘ 3 0 _如申請專利範圍第29項之曝光裝置，其中，前 述固定鏡係將前述分離光學系統夾在中間，而與前述移動 鏡彼此對向配置著。 3 1 ·如申請專利範圍第27項之曝光裝置，其中，當 前述至少一方之平台移動時，移動鏡與固定鏡之間光路徑 .請 閱 讀 背 意 事 項 再 埴 裝 頁 訂 本紙張尺度速用中國國家梂準（CNS ) A4规格（210X297公釐） AS B8 C8 D8 六、申請專利範圍 長度的變動係藉由測量系統求出。 3 2 .如申請專利範圍第27項之曝光裝置，其中，前 述移動鏡具有延伸於第2方向之長度爲L1的反射面，而前 述固定鏡具有延伸於第2方向之長度爲L2的反射面，若將 前述至少一方之平台在第2方向的移動速度設爲VI '前述 分離光學系統在第2方向之移動速度設爲V2時，則（L1 + L2)/V1 =L2/V2之關係式成立。 3 3 .如申請專利範圍第27項之曝光裝置，其中，前 述分離光學系統係一種光束分離器，測定光束及參考光束 分別被該光束分離器分離爲s偏光及P偏光。 3 4 ·如申請專利範圍第28項之曝光裝置’其中，前 述移動裝置係一種其上配置有分離光學系統之移動平台， 而該移動平台上配置有參考鏡。 3 5 _如申請專利範圍第27項之曝光裝置’係另外於 移動鏡與分離光學系統之間以及固定鏡與分離光學系統之 間配置有相位調整光學系統。 經濟部中央梂準局®C工消费合作社印氧 fn 、T (請先閲讀背私之注意事項再填寫本頁) 3 6 ·如申請專利範圍第27項之曝光裝置’其中’前 述移動鏡係包含裝設於光罩平台之第1移動鏡以及裝設於 基板平台之第2移動鏡。 3 7 .如申請專利範圍第27項之曝光裝置’係另外具 備搭載有光罩平台與基板平台之輸送架以及投影光學系統 ，該輸送架係相對於投影光學系統來移動光罩平台及基板 平台。 3 8 ·—種位置測定方法，其藉由照射雷射光束至固 τ 本紙張尺度逋用中困國家樣準（CNS ) A4規格（210X297公釐) ~ A8 B8 C8 D8 々、申請專利範圍 定鏡與裝設在移動於第2方向之移動體的移動鏡，利用干 涉效果以測定與移動體之第2方向互爲垂直之第1方向位 置，係包含有： 將前述雷射光束分割爲測定光束與參考光束； 使前述測定光束以與正在移動之移動體不同之速度移 動於第2方向的同時照射移動鏡，此時來自移動鏡的反射 光通過移動鏡與固定鏡之間；以及 藉由比較通過移動鏡與固定鏡之間的測定光束之相位 與參考光束之相位，求出移動體在第1方向的位置。 3 9 .如申請專利範圍第38項之測定方法，其中，測 定光束之光路徑係包含參考光束之光路徑。 4 0 .如申請專利範圍第38項之測定方法，其中，前 述移動鏡具有延伸於第2方向之長度爲L1的反射面，而前 述固定鏡具有延伸於第2方向之長度爲L2的反射面，若將 前述移動體於第2方向之移動速度設爲VI、前述分離光學 系統在第2方向之移動速度設爲V2時，則（L1 + L2) / VI =L2 / V2之關係式成立。 4 1 .如申請專利範圍第38項之測定方法，係將分割 雷射光束爲測定光束及參考光束之光束分離器，藉由將其 以不同於在第2方向移動體之速度移動，而使測定光束以 與移動體不同之速度移動於第2方向。 4 2 .如申請專利範圍第38項之測定方法，係將測定 光束照射於移動鏡而朝向固定鏡其反射之後，使測定光束 與參考光束合一。 _____8___ 本紙張尺度適用中國國家標準（CNS ) M規格（210x297公釐） (請先閲讀背面之注意事項再本頁) 訂 •修?·· 經濟部智慧財產局員工消費合作社印製 A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 Γ、申請專利範圍 4 3 .—種雷射干涉儀之製造方法，係使用雷射光束 來測定移動於第2方向之移動體的垂直於第2方向之第1 方向的位置，其提供有： 將雷射光束分離爲測定光束及參考光束之分離光學系 統； 於移動體上裝設將測定光束反射之移動鏡； 與移動體係獨立而設置之反射參考光束的參考鏡； 使分離光學系統以與移動體之移動速度不同的速度， 移動於第2方向之移動裝置；以及 測出以移動鏡反射之測定光束及以參考鏡反射之參考 光束’根據該等光束之干涉效果以求出移動體在第1方向 的位置之測定器。 4 4 ·如申請專利範圍第43項之製造方法，其中，前 述移動裝置係移動平台，而於該移動平台上設置分離光學 系統。 4 5 .如申請專利範圍第44項之製造方法，係於前述 移動平台上設置前述參考鏡。 4 6 ·如申請專利範圍第43項之製造方法，係於前述 分離光學系統中另外設置有照射雷射光之雷射光源。 4 7 .—種位置測定裝置之製造方法，係使用來自光 源的光測定移動於第2方向之移動體的垂直於第2方向之 第1方向的位置，其提供有： 將來自前述光源的光分離爲測定光束及參考光束之分 離光學系統； 請 先 讀 再%( 本 裝 訂 線 本紙張尺度適用中國Η家梯準（CNS ) Α4規格（210X297公釐） A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 「、申請專利範圍 於移動體上裝設將測定光束反射之移動鏡； 與前述移動鏡之間形成測定光束之光路徑一部分之固 定鏡； 使分離光學系統以與移動體之移動速度不同的速度移 動於第2方向之移動裝置；以及 測出前述測定光束及參考光束，根據該等光束之干涉 效果以求出移動體在第1方向的位置之測量系統。 4 8 ·如申請專利範圍第47項之製造方法，係另外設 置有參考鏡，以使參考光束可朝向測量系統反射。 4 9 .如申請專利範圍第48項之製造方法，其中，前 述參考鏡係將前述分離光學系統夾在中間，而與前述測量 系統彼此對向配置著。 5 0 ·如申請專利範圍第49項之製造方法，其中，前 述固定鏡係將前述分離光學系統夾在中間，而! 鏡彼此對向配置著。 、 5 1 ·—種曝光裝置之製造方法，其將形成於|習々 圖案複製至基板上，係提供有： ％ 保持前述光罩使其移動於第2方向之移動先;¥¥台&gt; ·, 保持前述基板使其移動於第2方向之移動|彳反¥台_ 將雷射光束分離爲測定光束及參考光束; 統； 將測定光束反射之移動鏡設置於光罩平台 之至少一方上； 將參考光束反射之參考鏡； 請 先 聞 背 項 再 V 本 頁 袭 訂 線 本紙張尺度逋用中國國家橾準（CNS ) A4规格（210X297公釐） 六、申請專利範圍 A8 B8 C8 D8 經濟部智慧財產局員工消費合作社印製 使分離光學系統與前述至少一方之平台的移動速度不 同之速度移動於第2方向之移動裝置；以及 測出以前述移動鏡反射之測定光束及以前述參考鏡反 射之參考光束，根據該等光束之干涉效果以求出前述至少 一方之平台在第1方向位置之測定器。 5 2 .如申請專利範圍第51項之製造方法，係另外設 置有固定鏡，其將使測定光束通過移動鏡與固定鏡之間。 5 3 .—種曝光裝置之製造方法，係將形成於光罩之 圖案複製至基板上，其提供有： 保持前述光罩使其移動於第2方向之移動光罩平台； 保持前述基板使其移動於第2方向之移動基板平台； 將雷射光束分離爲測定光束及參考光束之分離光學系 統； 將測定光束反射之移動鏡設置於光罩平台及基板平台 之至少一方上； 與前述移動鏡之間形成測定光束之光路徑一部分之固 定鏡； 使分離光學系統與前述至少一方之平台的移動速度不 同之速度移動於第2方向之移動裝置；以及 測出以前述移動鏡反射之測定光束及以前述參考鏡反 射之參考光束’根據該等光束之干涉效果以求出前述至少 一方之平台在第1方向位置之測量系統。 5 4 .如申請專利範圍第53項之製造方法，係另外設 置有參考鏡’以使參考光束可朝向前述測量系統反射。 請 先 閲- 讀 背 項 再 本 頁 裝 訂 六、申請專利範圍 A8 B8 C8 D8 5 5 ·如申請專利範圍第54項之製造方法，其中，前 述參考鏡係將前述分離光學系統夾在中間，而與前述測量 系統彼此對向配置著。 5 6 .如申請專利範圍第55項之製造方法，其中，前 述固定鏡係將前述分離光學系統夾在中間，而與前述移動 鏡彼此對向配置著。 5 7 .—種位置測定裝置，係使用來自光源的光測定 移動於第2方向之移動體的垂直於第2方向之第1方向的 位置，其特徵在於包含有： 裝設於移動體之移動鏡以及與該移動體係分開設置之 固定鏡； 將來自光源的光束分割，使其分別朝向移動鏡及固定 鏡之光學系統； 使該光學系統以與移動體之移動速度不同的速度移動 於第2方向之移動裝置；以及 測出來自移動鏡及固定鏡之反射光光束，根據該等光 束之干涉效果以求出於移動體在第1方向位置之測定器。 請 先 閱― 讀 背 意 糞( 本 頁 訂 線 經濟部智慧財產局員工消費合作社印製 一張 纸 」本 適 I Μ 公 7 9 2A8 B8 C8 D8 Patent application scope (please read the precautions on the back before filling this page) When the moving speed of the moving body in the second direction is set to vi and the moving speed of the separating optical system in the second direction is set to V2, Then the relation of (L1 + L2) / VI = L2 / V2 holds. 6. The laser interferometer according to item 1 of the patent application range, wherein the separation optical system is a beam splitter, and the measurement beam and the reference beam are separated into s-polarized light and p-polarized light by the beam splitter, respectively. 7. The laser interferometer according to item 1 of the patent application scope, wherein the reference mirror includes a right-angle shuttle mirror. 8 · A position measuring device for measuring a position of a moving body moving in a second direction perpendicular to the first direction of the second direction using light from a light source, the device comprising: separating light from the light source into a measurement Separating optical system of light beam and reference beam; a moving mirror installed on the moving body to reflect the measuring beam; a fixed mirror provided separately from the moving system, the measuring beam forming the light of the measuring beam between the fixed mirror and the moving mirror Part of the path; a mobile device printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs to cause the separation optical system to move in a second direction at a speed different from the moving speed of the moving body; and measure the aforementioned measuring beam and reference beam, A measurement system for determining the position of a moving body in the first direction by the interference effect of a light beam. 9. The position measuring device according to item 8 of the patent application scope is additionally provided with a reference mirror so that the reference beam can be reflected toward the aforementioned measuring system. 10. The position measuring device according to item 9 of the scope of the patent application, wherein the aforementioned reference mirror is sandwiched between the aforementioned separation optical system and the aforementioned Chinese paper standard (CNS) A4 (210X297) (Centi) A8 B8 C8 D8 6. Patent application scope 1. A laser interferometer uses a laser beam to measure the position of a moving body moving in the second direction perpendicular to the first direction of the second direction. : Separating optical system that separates the laser beam into the measuring beam and the reference beam; a moving mirror mounted on a moving body to reflect the measuring beam; a reference mirror set to reflect the reference beam independently of the moving system &gt; The separation optical system moves the moving device in the second direction at a speed different from the moving speed of the moving body; and measures the measurement beam reflected by the moving mirror and the reference beam reflected by the reference mirror, and determines the interference effect based on these beams. The measuring device of the position of the moving body in the first direction is output. 2. The laser interferometer according to item 1 of the scope of patent application, wherein the aforementioned moving device moves the separation optical system and the reference mirror together. 03. The laser interferometer according to item 1 of the scope of patent application, additionally A fixed mirror is provided so that the measurement beam can pass between the moving mirror and the fixed mirror. 4. The laser interferometer according to item 1 of the patent application range, wherein the moving speed of the aforementioned separation optical system is slower than the moving speed of the moving mirror. 5. The laser interferometer according to item 3 of the scope of patent application, wherein the moving mirror has a reflection surface with a length L1 extending in the second direction, and the fixed mirror has a reflection with a length L2 extending in the second direction. If you have ______J_-^ / 1 \ {Please read the notes on the back before filling this page) Order the paper size printed by the Employees' Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs and apply the Chinese National Standard (CNS) A4 specification ( 210X297 mm) A8 B8 C8 D8 patent application scope (please read the precautions on the back before filling this page) The moving speed of the aforementioned moving body in the second direction is set to vi, and the moving speed of the aforementioned separating optical system in the second direction is set When it is V2, then the relationship (L1 + L2) / VI = L2 / V2 holds. 6. The laser interferometer according to item 1 of the patent application range, wherein the separation optical system is a beam splitter, and the measurement beam and the reference beam are separated into s-polarized light and p-polarized light by the beam splitter, respectively. 7. The laser interferometer according to item 1 of the patent application scope, wherein the reference mirror includes a right-angle shuttle mirror. 8 · A position measuring device for measuring a position of a moving body moving in a second direction perpendicular to the first direction of the second direction using light from a light source, the device comprising: separating light from the light source into a measurement Separating optical system of light beam and reference beam; a moving mirror installed on the moving body to reflect the measuring beam; a fixed mirror provided separately from the moving system, the measuring beam forming the light of the measuring beam between the fixed mirror and the moving mirror A part of the path; a mobile device printed by the Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economic Affairs to cause the separation optical system to move in the second direction at a speed different from the moving speed of the moving body; and measuring the aforementioned measuring beam and reference beam, according to these A measurement system for determining the position of a moving body in the first direction by the interference effect of a light beam. 9. The position measuring device according to item 8 of the patent application scope is additionally provided with a reference mirror so that the reference beam can be reflected toward the aforementioned measuring system. 10. The position measuring device according to item 9 of the scope of the patent application, wherein the aforementioned reference mirror is sandwiched between the aforementioned separation optical system and the aforementioned Chinese paper standard (CNS) A4 (210X297) (Centi) Α8, B8, C8, D8 6. The patent application range determination systems are arranged facing each other. 1 1. The position measuring device according to item 10 of the scope of patent application, in which 'the fixed mirror is sandwiched between the separation optical system and arranged opposite to the moving mirror' 1 2. As the scope of patent application is 11 In the position measurement device of the item, 'when the aforementioned moving body moves, the variation in the length of the light path between the moving mirror and the fixed mirror is obtained by a measurement system. 1 3. If the position measuring device of the eighth item of the patent application, wherein the moving speed of the aforementioned separation optical system is slower than the moving speed of the moving mirror. 104. If the position measuring device of the eighth item of the patent application, The moving mirror has a reflecting surface with a length L1 extending in the second direction, and the fixed mirror has a reflecting surface with a length L2 extending in the second direction. If the moving speed of the moving body in the second direction is set to VI When the moving speed of the aforementioned separation optical system in the second direction is set to V2, the relational expression (L1 + L2) / VI = L2 / V2 holds. 15. The position measuring device according to item 8 of the scope of patent application, wherein the aforementioned separation optical system is a beam splitter, and the measurement beam and the reference beam are separated into s-polarized light and p-polarized light by the beam splitter, respectively. 16. The position determination device according to item 9 of the scope of patent application, wherein the aforementioned mobile device is a mobile platform with a separation optical system disposed above it, and a reference mirror is disposed on the mobile platform. 1 7. The position measuring device such as item 8 of the scope of patent application is in addition between the moving mirror and the separation optical system and between the fixed mirror and the separation optical system _ _ _ _ 1 National paper gradient (CNS) A4 specifications (21〇 &gt; &lt; 297) and Γ Please read the note on the back before filling in this page) Order 'Printed by the Employee Consumer Cooperative of the Intellectual Property Bureau of the Ministry of Economy A8 B8 C8 D8 6. The phase adjustment optical system is respectively arranged between the scope of patent application. 1 8 · The position measuring device according to item 8 of the scope of the patent application, wherein the aforementioned moving mirror system is arranged to extend in the first direction. 1 9 · An exposure device capable of copying a pattern formed on a photomask to a substrate, comprising: a moving photomask platform holding the photomask to move it in a second direction; holding the aforementioned substrate to move it to A moving substrate platform in a second direction; and a laser interferometer for measuring a position of at least one of the platforms perpendicular to the first direction of the second direction using a laser beam; the aforementioned laser interferometer includes: The aforementioned laser beam is separated into a measurement optical beam and a reference optical beam separation optical system; a moving mirror mounted on at least one of the platforms for reflecting the measurement beam; and a platform for reflecting the reference independently of the at least one of the platforms A reference mirror for a light beam; a moving device for moving the separation optical system in a second direction at a speed different from the moving speed of the at least one of the platforms; and measuring a measurement beam reflected by the moving mirror and a reference reflected by the reference mirror The light beam is a measuring device for determining the position of at least one of the aforementioned platforms in the first direction based on the interference effect of these light beams. 2 0. The exposure device according to item 19 of the scope of patent application, wherein the aforementioned moving device moves the separation optical system together with the aforementioned reference mirror. 2 1. If the exposure device in the scope of application for the item 19 of the patent application, it is another paper size applicable to the Chinese National Standard (CNS) A4 format (2i0x297 mm) -1 binding 7 lines (please read the note on the back first) ^ + Page for further remarks) B8 printed by Shelley Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs __§__ VI. The scope of patent application is equipped with a fixed mirror. Configured. 2 2. The exposure device according to item 21 of the scope of patent application, wherein the moving mirror has a reflecting surface with a length L1 extending in the second direction, and the fixed mirror has a reflecting surface with a length L2 extending in the second direction. If the moving speed of the at least one of the platforms in the second direction is set to VI and the moving speed of the separation optical system in the second direction is set to V2, then the relationship of (L1 + L2) / VI = L2 / V2 Established. 2 3. The exposure device according to item 19 of the patent application scope, wherein the separation optical system is a beam splitter, and the measurement beam and the reference beam are separated into s-polarized light and p-polarized light by the beam splitter, respectively. 24. The exposure device according to item 19 of the patent application scope, wherein the aforementioned reference mirror is a right-angle shuttle mirror. 25. The exposure device according to item 19 of the scope of patent application, wherein the aforementioned moving mirror includes a first moving mirror mounted on a mask stage and a second moving mirror mounted on a substrate stage. 26. If the exposure device according to item 19 of the patent application scope is provided with a conveyance rack and a projection optical system for carrying the photomask platform and the substrate platform, the conveyance rack moves the photomask stage and the projection optical system relative to the projection optical system. Substrate platform. 2 7 · — An exposure device capable of copying a pattern formed on a photomask onto a substrate, comprising: a moving photomask platform holding the photomask and moving it in the second direction; and holding the substrate and moving it on Mobile substrate platform in the 2nd direction; and ______5___ This paper size is applicable to China National Standard (CNS) M specification (2i〇x297 cm) (· Please read the note f on the back before filling this page)-! 六 、 Patent application scope A8 B8 C8 D8 Position measuring device for measuring the position of the first direction which is perpendicular to the second direction of at least one side of the platform by the consumer consumption cooperative of the Intellectual Property Bureau of the Ministry of Economy; The position measurement device includes: a separation optical system for separating the laser beam into a measurement beam and a reference beam; a moving mirror installed on at least one of the platforms for reflecting the measurement beam; and a platform system with the at least one of the foregoing A fixed mirror provided separately and forming a part of a light path of a measuring beam between the moving mirror and the moving mirror; Moving speed of the moving speed is different in the second direction of the mobile device; and the detected light beam and the reference beam was measured, the order of the at least one platform set position measuring device in the first direction of the light beam in accordance with the effect of such interference. 28. If the exposure device under the scope of patent application No. 27 is provided with a reference mirror, the reference beam can be reflected toward the aforementioned measurement system. 29. The exposure device according to item 28 of the scope of patent application, wherein the aforementioned reference mirror is sandwiched between the aforementioned separation optical system and arranged opposite to the aforementioned measurement system. ‘3 0 _ The exposure device according to item 29 of the patent application, wherein the fixed mirror is sandwiched between the separation optical system and the moving mirror is opposed to each other. 3 1 · If the exposure device in the scope of patent application No. 27, when the platform of at least one of the foregoing is moved, the light path between the moving mirror and the fixed mirror. China National Standard (CNS) A4 specification (210X297 mm) AS B8 C8 D8 6. The variation of the length of the patent application range is calculated by the measurement system. 3 2. The exposure device according to item 27 of the scope of patent application, wherein the moving mirror has a reflecting surface with a length L1 extending in the second direction, and the fixed mirror has a reflecting surface with a length L2 extending in the second direction. If the moving speed of the at least one of the platforms in the second direction is set to VI 'When the moving speed of the separation optical system in the second direction is set to V2, then the relational expression of (L1 + L2) / V1 = L2 / V2 Established. 3 3. The exposure device according to item 27 of the scope of patent application, wherein the aforementioned separation optical system is a beam splitter, and the measurement beam and the reference beam are separated into s-polarized light and P-polarized light by the beam splitter, respectively. 34. The exposure device according to item 28 of the patent application, wherein the aforementioned mobile device is a mobile platform on which a separation optical system is arranged, and the mobile platform is provided with a reference mirror. 3 5 _ If the exposure device in the scope of patent application No. 27 'is a phase adjustment optical system is additionally arranged between the moving mirror and the separation optical system and between the fixed mirror and the separation optical system. The Central Bureau of Standards of the Ministry of Economic Affairs® C Industry Consumer Cooperatives printed oxygen fn, T (please read the precautionary notes before filling out this page) 3 6 · If the exposure device for the scope of patent application No. 27 of the 'Among' the aforementioned mobile mirror system It includes a first moving mirror mounted on a mask stage and a second moving mirror mounted on a substrate stage. 37. If the exposure device according to item 27 of the scope of the patent application 'is additionally provided with a conveyance rack and a projection optical system equipped with a photomask platform and a substrate platform, the conveyance rack moves the photomask platform and the substrate platform relative to the projection optical system. . 3 8 · —A method of position measurement by irradiating a laser beam to a fixed τ The paper size is used in the National Standard for Difficulties (CNS) A4 (210X297 mm) ~ A8 B8 C8 D8 The mirror and a moving mirror mounted on a moving body moving in the second direction use an interference effect to measure a first direction position that is perpendicular to the second direction of the moving body, including: dividing the aforementioned laser beam into a measurement A light beam and a reference beam; the aforementioned measuring beam is irradiated with a moving mirror while moving in a second direction at a speed different from that of a moving moving body, and at this time the reflected light from the moving mirror passes between the moving mirror and the fixed mirror; and The phase of the measurement beam and the phase of the reference beam between the moving mirror and the fixed mirror are compared to determine the position of the moving body in the first direction. 39. The measurement method according to item 38 of the scope of patent application, wherein the optical path of the measurement beam includes the optical path of the reference beam. 40. The measuring method according to item 38 of the scope of patent application, wherein the moving mirror has a reflecting surface with a length L1 extending in the second direction, and the fixed mirror has a reflecting surface with a length L2 extending in the second direction. If the moving speed of the moving body in the second direction is set to VI and the moving speed of the separation optical system in the second direction is set to V2, then the relationship (L1 + L2) / VI = L2 / V2 holds. 41. The measuring method according to item 38 of the scope of patent application is a beam splitter that divides the laser beam into a measuring beam and a reference beam, and moves it at a speed different from that of the moving body in the second direction, so that The measurement beam moves in the second direction at a speed different from that of the moving body. 4 2. If the measuring method of item 38 of the scope of the patent application is applied, the measuring beam is irradiated to the moving mirror and reflected toward the fixed mirror, and then the measuring beam is combined with the reference beam. _____8___ This paper size applies to Chinese National Standard (CNS) M specification (210x297 mm) (Please read the precautions on the back before this page) Revision ···· Printed by Employees ’Cooperatives of Intellectual Property Bureau of the Ministry of Economic Affairs A8 B8 C8 D8 Printed by the Consumer Cooperative of Intellectual Property Bureau of the Ministry of Economic Affairs Γ, patent application scope 4 3. A laser interferometer manufacturing method uses a laser beam to measure the perpendicularity of a moving body moving in the second direction to the second direction. The position in the first direction provides: a separation optical system for separating a laser beam into a measurement beam and a reference beam; a moving mirror for reflecting the measurement beam on a moving body; and a reflected reference beam provided independently of the moving system A reference mirror; a moving device that moves the separation optical system at a speed different from the moving speed of the moving body in the second direction; and measures a measurement beam reflected by the moving mirror and a reference beam reflected by the reference mirror 'according to these A measuring device for determining the position of the moving body in the first direction by the interference effect of the light beam. 4 4 · The manufacturing method according to item 43 of the patent application scope, wherein the aforementioned mobile device is a mobile platform and a separation optical system is provided on the mobile platform. 4 5. The manufacturing method according to item 44 of the scope of patent application is to set the aforementioned reference mirror on the aforementioned mobile platform. 4 6 · The manufacturing method according to item 43 of the scope of patent application, in which the above-mentioned separation optical system is additionally provided with a laser light source for irradiating laser light. 4 7. A method for manufacturing a position measuring device, which uses light from a light source to measure a position of a moving body moving in a second direction perpendicular to the first direction of the second direction, and provides: Separating optical system for measuring light beam and reference light beam; please read it again (% of this binding line and paper size are applicable to China National Standard (CNS) A4 size (210X297 mm) A8 B8 C8 D8 Employees of Intellectual Property Bureau, Ministry of Economic Affairs Printed by the Consumer Cooperative, "The scope of the patent application is to install a moving mirror that reflects the measuring beam on the moving body; a fixed mirror that forms part of the light path of the measuring beam between the moving mirror and the aforementioned moving mirror; enables the separation optical system to move with the moving body A measuring device that moves in the second direction at different speeds; and a measurement system that measures the aforementioned measurement beam and reference beam, and determines the position of the moving body in the first direction based on the interference effect of these beams. 4 8 · If applied The manufacturing method of item 47 of the patent scope is additionally provided with a reference mirror so that the reference beam can be reflected toward the measurement system. 4 9. Please refer to the manufacturing method of the scope of patent No. 48, wherein the aforementioned reference mirror is sandwiched between the aforementioned separation optical system and arranged opposite to the aforementioned measuring system. 5 0 · For the manufacturing method of the scope of patent application No. 49, Among them, the aforementioned fixed mirror is sandwiched between the aforementioned separated optical systems, and the mirrors are arranged facing each other. 5 1 · —A manufacturing method of an exposure device, which is formed by copying the Xi pattern onto a substrate. Provides:% Hold the aforementioned reticle to move it in the second direction first; ¥¥ 台 &gt; ·, Hold the aforementioned substrate to move it in the second direction | 彳 反 ¥ 台 _ Separate the laser beam into The measuring beam and reference beam; system; set the moving mirror for measuring the beam reflection on at least one side of the mask platform; the reference mirror for reflecting the reference beam; please listen to the back item first. China National Standards (CNS) A4 specification (210X297 mm) 6. Scope of patent application A8 B8 C8 D8 The Intellectual Property Bureau of the Ministry of Economic Affairs's consumer cooperative prints the separation optical system to the aforementioned A mobile device that moves in the second direction at a speed different from the moving speed of the platform of the least one side; and the measurement beam reflected by the aforementioned moving mirror and the reference beam reflected by the aforementioned reference mirror are measured, and the interference effect of these beams is used to obtain The measuring device of the at least one of the platforms in the first direction. 5 2. If the manufacturing method of the scope of the patent application No. 51, a fixed mirror is additionally provided, which will pass the measurement beam between the moving mirror and the fixed mirror. 5 3. A method of manufacturing an exposure device is to copy a pattern formed on a photomask onto a substrate, which is provided with: a moving photomask platform holding the aforementioned photomask and moving it in the second direction; holding the aforementioned substrate and moving it A moving substrate platform in the second direction; a separation optical system that separates the laser beam into a measuring beam and a reference beam; a moving mirror reflecting the measuring beam is arranged on at least one of the mask platform and the substrate platform; A fixed mirror that forms part of the light path of the measuring beam between the two; makes the moving speed of the separation optical system different from that of at least one of the aforementioned platforms A moving device moving at a speed in the second direction; and measuring a measurement beam reflected by the aforementioned moving mirror and a reference beam reflected by the aforementioned reference mirror 'to obtain at least one of the aforementioned platforms in the first direction based on the interference effect of these beams Position measurement system. 54. The manufacturing method according to item 53 of the patent application scope is additionally provided with a reference mirror 'so that the reference beam can be reflected toward the aforementioned measurement system. Please read first-read the back item, and then bind on this page. 6. Patent application scope A8 B8 C8 D8 5 5 · If the patent application scope of the 54th manufacturing method, the aforementioned reference mirror is sandwiched between the aforementioned separation optical system, and The measurement system is arranged to face each other. 56. The manufacturing method according to item 55 of the patent application, wherein the fixed mirror is sandwiched between the separation optical system and the moving mirror is arranged to face each other. 5 7. A position measuring device for measuring the position of a moving body moving in the second direction perpendicular to the first direction of the second direction using light from a light source, which is characterized by: Mirror and a fixed mirror provided separately from the moving system; splitting a light beam from a light source so that it respectively faces the optical system of the moving mirror and the fixed mirror; making the optical system move at a speed different from the moving speed of the moving body at the second A moving device in a direction; and a reflected light beam from a moving mirror and a fixed mirror, and a measuring device for determining the position of the moving body in the first direction according to the interference effect of these beams. Please read ―Reading Back to the Dung (This page is printed on a sheet of paper printed by the Consumer Cooperatives of the Intellectual Property Bureau of the Ministry of Economic Affairs ''.
TW088113368A 1998-08-20 1999-08-05 Laser interferometer, position measuring device and measuring method, exposure device and manufacturing methods thereof TW392065B (en)

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KR101968916B1 (en) * 2017-03-21 2019-04-15 한국표준과학연구원 Flat Mirror Profile Measuring Apparatus and Method Of The Same

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JPH06273129A (en) * 1993-03-24 1994-09-30 Ricoh Co Ltd Method and apparatus for measuring rotary surface
JP3669063B2 (en) * 1996-07-05 2005-07-06 株式会社ニコン Projection exposure equipment
JPH1074692A (en) * 1996-06-25 1998-03-17 Nikon Corp Exposure system
US5757160A (en) * 1996-12-23 1998-05-26 Svg Lithography Systems, Inc. Moving interferometer wafer stage

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Publication number Priority date Publication date Assignee Title
CN107436532A (en) * 2017-09-06 2017-12-05 昆山昌禾精密电子有限公司 A kind of fixing device for photographic plate

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