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Application filed by Vanguard Int Semiconduct CorpfiledCriticalVanguard Int Semiconduct Corp
Priority to TW085108116ApriorityCriticalpatent/TW357398B/en
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Publication of TW357398BpublicationCriticalpatent/TW357398B/en
A method adjustment of plluted low-pressure sensors, including the step: (a) turning on an on-line valve for transmitting a chamer pressure to a reference sensor, where the on-line valve and the reference sensor are in serial connection and disposed on the route in parallel to the polluted low-pressure sensor; (b) manual adjustment of the polluted sensor until the output reading and the reference sensor reading overlap; and (c) turning off the on-line valve to keep the reference sensor from being exposured in the pollutant in the manufacturing process.
TW085108116A1996-07-051996-07-05Method and apparatus for solving production suspension time by means of parallel low-pressure sensor
TW357398B
(en)
Deposition film, method of measuring shape of deposition film, method of controlling manufacturing processes, manufacturing method, shape measuring apparatus and apparatus for controlling manufacturing processes.