TW275183B - - Google Patents
Info
- Publication number
- TW275183B TW275183B TW84109270A TW84109270A TW275183B TW 275183 B TW275183 B TW 275183B TW 84109270 A TW84109270 A TW 84109270A TW 84109270 A TW84109270 A TW 84109270A TW 275183 B TW275183 B TW 275183B
- Authority
- TW
- Taiwan
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6030039A JP2810909B2 (ja) | 1994-02-28 | 1994-02-28 | 露光装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW275183B true TW275183B (ko) | 1996-05-01 |
Family
ID=12292690
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW84109270A TW275183B (ko) | 1994-02-28 | 1995-09-06 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2810909B2 (ko) |
TW (1) | TW275183B (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5933216A (en) * | 1997-10-16 | 1999-08-03 | Anvik Corporation | Double-sided patterning system using dual-wavelength output of an excimer laser |
JP4949195B2 (ja) * | 2007-10-26 | 2012-06-06 | 株式会社アドテックエンジニアリング | 露光装置及び基板の矯正装置 |
JP6149214B2 (ja) * | 2013-03-26 | 2017-06-21 | サンエー技研株式会社 | 露光装置、露光方法 |
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1994
- 1994-02-28 JP JP6030039A patent/JP2810909B2/ja not_active Expired - Fee Related
-
1995
- 1995-09-06 TW TW84109270A patent/TW275183B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH07239551A (ja) | 1995-09-12 |
JP2810909B2 (ja) | 1998-10-15 |
Similar Documents
Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |