TW265407B - - Google Patents

Info

Publication number: TW265407B
Authority: TW; Taiwan

Application number

TW81105439A

Other languages

Chinese (zh)

Original Assignee

Materials Research Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1991-05-17

Filing date

1992-07-09

Publication date

1995-12-11

1991-05-17 Priority claimed from US07/701,800 external-priority patent/US5259881A/en

1992-04-15 Priority claimed from US07/869,241 external-priority patent/US5350899A/en

1992-07-09 Application filed by Materials Research Corp filed Critical Materials Research Corp

1995-12-11 Application granted granted Critical

1995-12-11 Publication of TW265407B publication Critical patent/TW265407B/zh

Links

TW81105439A 1991-05-17 1992-07-09 TW265407B (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US07/701,800 US5259881A (en)	1991-05-17	1991-05-17	Wafer processing cluster tool batch preheating and degassing apparatus
US07/869,241 US5350899A (en)	1992-04-15	1992-04-15	Semiconductor wafer temperature determination by optical measurement of wafer expansion in processing apparatus chamber
US07/869,465 US5352248A (en)	1991-05-17	1992-04-15	Pyrometer temperature measurement of plural wafers stacked on a processing chamber

Publications (1)

Publication Number	Publication Date
TW265407B true TW265407B (en)	1995-12-11

Family

ID=51626728

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
TW81105439A TW265407B (en)	1991-05-17	1992-07-09

Country Status (1)

Country	Link
TW (1)	TW265407B (en)

1992
- 1992-07-09 TW TW81105439A patent/TW265407B/zh active

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