TW259850B - - Google Patents
Info
- Publication number
- TW259850B TW259850B TW082100661A TW82100661A TW259850B TW 259850 B TW259850 B TW 259850B TW 082100661 A TW082100661 A TW 082100661A TW 82100661 A TW82100661 A TW 82100661A TW 259850 B TW259850 B TW 259850B
- Authority
- TW
- Taiwan
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5708192 | 1992-02-07 | ||
| JP4233080A JPH05303207A (ja) | 1992-02-07 | 1992-08-07 | リソグラフィ用現像液及びリソグラフィ工程 |
| JP4233082A JPH05303208A (ja) | 1992-02-07 | 1992-08-07 | リソグラフィ用現像液及びリソグラフィ工程 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW259850B true TW259850B (zh) | 1995-10-11 |
Family
ID=13045534
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW082100661A TW259850B (zh) | 1992-02-07 | 1993-02-02 |
Country Status (4)
| Country | Link |
|---|---|
| JP (2) | JPH05303208A (zh) |
| KR (1) | KR960015482B1 (zh) |
| MY (1) | MY121957A (zh) |
| TW (1) | TW259850B (zh) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR0150146B1 (ko) * | 1995-12-20 | 1998-12-01 | 김광호 | 전자사진 현상방식 프린터의 전사전압 자동조절 제어방법 |
| JP4015823B2 (ja) | 2001-05-14 | 2007-11-28 | 株式会社東芝 | アルカリ現像液の製造方法，アルカリ現像液，パターン形成方法，レジスト膜の剥離方法，及び薬液塗布装置 |
| JP5619458B2 (ja) * | 2010-03-31 | 2014-11-05 | Hoya株式会社 | レジストパターンの形成方法及びモールドの製造方法 |
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1992
- 1992-08-07 JP JP4233082A patent/JPH05303208A/ja active Pending
- 1992-08-07 JP JP4233080A patent/JPH05303207A/ja active Pending
-
1993
- 1993-02-02 TW TW082100661A patent/TW259850B/zh not_active IP Right Cessation
- 1993-02-05 MY MYPI93000187A patent/MY121957A/en unknown
- 1993-02-06 KR KR1019930001611A patent/KR960015482B1/ko not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| MY121957A (en) | 2006-03-31 |
| JPH05303208A (ja) | 1993-11-16 |
| KR930018651A (ko) | 1993-09-22 |
| JPH05303207A (ja) | 1993-11-16 |
| KR960015482B1 (ko) | 1996-11-14 |
Similar Documents
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| MK4A | Expiration of patent term of an invention patent |