TW257796B - - Google Patents

Info

Publication number
TW257796B
TW257796B TW080109503A TW80109503A TW257796B TW 257796 B TW257796 B TW 257796B TW 080109503 A TW080109503 A TW 080109503A TW 80109503 A TW80109503 A TW 80109503A TW 257796 B TW257796 B TW 257796B
Authority
TW
Taiwan
Application number
TW080109503A
Original Assignee
Innovatique Sa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Innovatique Sa filed Critical Innovatique Sa
Application granted granted Critical
Publication of TW257796B publication Critical patent/TW257796B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54—Controlling or regulating the coating process
    • C23C14/541—Heating or cooling of the substrates
TW080109503A 1990-12-06 1991-12-03 TW257796B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9015331A FR2670218B1 (fr) 1990-12-06 1990-12-06 Procede de traitement de metaux par depot de matiere, et pour la mise en óoeuvre dudit procede.

Publications (1)

Publication Number Publication Date
TW257796B true TW257796B (zh) 1995-09-21

Family

ID=9402994

Family Applications (1)

Application Number Title Priority Date Filing Date
TW080109503A TW257796B (zh) 1990-12-06 1991-12-03

Country Status (10)

Country Link
US (2) US5278861A (zh)
EP (1) EP0489659B1 (zh)
JP (1) JPH0744080B2 (zh)
KR (1) KR940004902B1 (zh)
CN (1) CN1063128A (zh)
CA (1) CA2056910A1 (zh)
DE (2) DE489659T1 (zh)
ES (1) ES2031802T1 (zh)
FR (1) FR2670218B1 (zh)
TW (1) TW257796B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI455171B (zh) * 2008-06-11 2014-10-01 Whirlpool Sa 電漿製程及處理金屬件之反應器

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3121743B2 (ja) * 1994-08-10 2001-01-09 日立造船株式会社 プラズマ式溶融方法
DE4443740B4 (de) * 1994-12-08 2005-09-15 W. Blösch AG Vorrichtung zum Beschichten von Substraten
CH689558A5 (de) * 1995-07-11 1999-06-15 Erich Bergmann Bedampfungsanlage und Verdampfereinheit.
EP0832309A4 (en) * 1996-04-08 2001-06-20 Ronald Christy CATHODE ARC A CATHODE
US6131533A (en) * 1996-08-15 2000-10-17 Citizen Watch Co., Ltd. Jig for forming hard carbon film over inner surface of guide bush using the jig
US5972185A (en) * 1997-08-30 1999-10-26 United Technologies Corporation Cathodic arc vapor deposition apparatus (annular cathode)
US6036828A (en) * 1997-08-30 2000-03-14 United Technologies Corporation Apparatus for steering the arc in a cathodic arc coater
US5932078A (en) * 1997-08-30 1999-08-03 United Technologies Corporation Cathodic arc vapor deposition apparatus
DE19824364A1 (de) * 1998-05-30 1999-12-02 Bosch Gmbh Robert Verfahren zum Aufbringen eines Verschleißschutz-Schichtsystems mit optischen Eigenschaften auf Oberflächen
US6436254B1 (en) * 2001-04-03 2002-08-20 General Electric Company Cathode mounting system for cathodic arc cathodes
DE10126985A1 (de) * 2001-06-05 2002-12-12 Gabriel Herbert M Anordnung zur Stromzuführung für eine Kathode einer Lichtbogen-Verdampfungsvorrichtung
DE10256417A1 (de) * 2002-12-02 2004-06-09 Pvt Plasma Und Vakuum Technik Gmbh Lichtbogenverdampfungsvorrichtung
US20040126492A1 (en) * 2002-12-30 2004-07-01 Weaver Scott Andrew Method and apparatus for using ion plasma deposition to produce coating
DE502005003972D1 (de) 2005-02-18 2008-06-19 Siemens Ag MCrAIX-Legierung, Schutzschicht aus MCrAIX-Legierung und Verfahren zur Herstellung
US7329595B2 (en) * 2005-04-26 2008-02-12 Lucent Technologies Inc. Deposition of carbon-containing layers using vitreous carbon source
US8211234B2 (en) 2008-09-02 2012-07-03 United Technologies Corporation Coater platter homing tool
EP2236641B1 (de) 2009-03-30 2011-10-05 Oerlikon Trading AG, Trübbach Verfahren zur Vorbehandlung von Substraten fuer PVD Verfahren
CN102094172B (zh) * 2010-12-03 2014-01-01 无锡润鹏复合新材料有限公司 一种TiWN/MoS2复合薄膜的制备方法
DE102014014970B4 (de) 2014-10-14 2020-01-02 NICE Solar Energy GmbH Vorrichtung und Verfahren zur Schichtdickenmessung für Dampfabscheideverfahren
PL230547B1 (pl) 2015-04-29 2018-11-30 Amp Spolka Z Ograniczona Odpowiedzialnoscia Piec prozniowy hybrydowy
RU2662516C1 (ru) * 2017-07-21 2018-07-26 федеральное государственное бюджетное образовательное учреждение высшего образования "Уфимский государственный авиационный технический университет" Способ получения износостойкого градиентного покрытия системы ti-al на стальной детали в вакууме
EP3502302B1 (en) 2017-12-22 2022-03-02 Ge Avio S.r.l. Nitriding process for carburizing ferrium steels
CN110480025B (zh) * 2019-09-06 2020-12-08 陕西师范大学 一种高密度纳米材料气相制备方法

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE661185C (de) * 1936-02-01 1938-06-13 Bernhard Berghaus Verfahren und Vorrichtung zur Herstellung von metallischen UEberzuegen aus mittels eines Lichtbogens in einer Kammer verdampften Metallen
US3306764A (en) * 1959-08-19 1967-02-28 Nuclear Technical Service Corp Method for forming a refractory metal or carbide coating on refractory materials and article
US3494852A (en) * 1966-03-14 1970-02-10 Whittaker Corp Collimated duoplasmatron-powered deposition apparatus
US3454814A (en) * 1966-07-29 1969-07-08 Atomic Energy Commission Tubular vapor source
US3748253A (en) * 1972-01-24 1973-07-24 Gte Automatic Electric Lab Inc Apparatus with labyrinth heat exchanger for the sputtering depositionof thin films
US4009090A (en) * 1975-12-03 1977-02-22 Shatterproof Glass Corporation Sputter-coating of glass sheets or other substrates
CH631743A5 (de) * 1977-06-01 1982-08-31 Balzers Hochvakuum Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.
FR2465793A1 (fr) * 1979-09-26 1981-03-27 Leybold Heraeus Gmbh & Co Kg Procede pour le depot de couches d'alliage sur des substrats metalliques a une temperature elevee
US4290875A (en) * 1980-03-18 1981-09-22 Ultra Electronic Controls Limited Sputtering apparatus
DE3148354A1 (de) * 1981-12-07 1983-06-09 Siemens AG, 1000 Berlin und 8000 München Vorrichtung zur kathodenzerstaeubung eines metalles
SU1123313A1 (ru) * 1982-01-06 1988-11-07 Предприятие П/Я А-7904 Электродуговой испаритель
US4448799A (en) * 1983-04-21 1984-05-15 Multi-Arc Vacuum Systems Inc. Arc-initiating trigger apparatus and method for electric arc vapor deposition coating systems
US4556471A (en) * 1983-10-14 1985-12-03 Multi-Arc Vacuum Systems Inc. Physical vapor deposition apparatus
US4659899A (en) * 1984-10-24 1987-04-21 The Perkin-Elmer Corporation Vacuum-compatible air-cooled plasma device
CH669242A5 (de) * 1985-07-10 1989-02-28 Balzers Hochvakuum Targetplatte fuer kathodenzerstaeubung.
US4885075A (en) * 1987-01-27 1989-12-05 Machine Technology, Inc. Cooling device for a sputter target and source
JPS63210099A (ja) * 1987-02-26 1988-08-31 Nissin Electric Co Ltd ダイヤモンド膜の作製方法
GB2227755B (en) * 1988-12-08 1993-03-10 Univ Hull A process for improving the wear and corrosion resistance of metallic components
DE3937558C2 (de) * 1989-11-11 1997-02-13 Leybold Ag Katodenzerstäubungsvorrichtung
US5180478A (en) * 1990-12-19 1993-01-19 Intevac, Inc. Sputter coating source

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI455171B (zh) * 2008-06-11 2014-10-01 Whirlpool Sa 電漿製程及處理金屬件之反應器

Also Published As

Publication number Publication date
JPH0744080B2 (ja) 1995-05-15
EP0489659B1 (fr) 1996-01-03
FR2670218A1 (fr) 1992-06-12
CN1063128A (zh) 1992-07-29
US5278861A (en) 1994-01-11
ES2031802T1 (es) 1993-01-01
KR940004902B1 (ko) 1994-06-04
KR920012517A (ko) 1992-07-27
JPH04277499A (ja) 1992-10-02
EP0489659A1 (fr) 1992-06-10
CA2056910A1 (fr) 1992-06-07
DE69116117D1 (de) 1996-02-15
DE489659T1 (de) 1992-09-24
US5363400A (en) 1994-11-08
FR2670218B1 (fr) 1993-02-05

Similar Documents

Publication Publication Date Title
DE4191061T (zh)
TW257796B (zh)
DE9000832U1 (zh)
DE4190241T (zh)
DE9003106U1 (zh)
DE9001022U1 (zh)
DE9003369U1 (zh)
DE9003028U1 (zh)
DE9001464U1 (zh)
DE9002747U1 (zh)
DE9000305U1 (zh)
DE9000803U1 (zh)
DE9001902U1 (zh)
DE9001896U1 (zh)
DE9001981U1 (zh)
DE9002624U1 (zh)
DE9000921U1 (zh)
DE9002343U1 (zh)
DE9001525U1 (zh)
DE9003373U1 (zh)
DE9001978U1 (zh)
DE9002433U1 (zh)
DE9002873U1 (zh)
DE9003454U1 (zh)
DE9003091U1 (zh)