TW250577B - A heat treatment process and its device - Google Patents
A heat treatment process and its deviceInfo
- Publication number
- TW250577B TW250577B TW83106053A TW83106053A TW250577B TW 250577 B TW250577 B TW 250577B TW 83106053 A TW83106053 A TW 83106053A TW 83106053 A TW83106053 A TW 83106053A TW 250577 B TW250577 B TW 250577B
- Authority
- TW
- Taiwan
- Prior art keywords
- pipe
- heat treatment
- gas
- gas supply
- emission
- Prior art date
Links
Landscapes
- Heat Treatment Of Articles (AREA)
- Furnace Details (AREA)
Abstract
A heat treatment process, which uses a longitudinal heat treatment device to thermally treat the processed object in which the longitudinal heat treatment device comprises a reaction pipe comprised of two-layer pipe construction which is constituted of inner pipe and outer pipe, a first gas supply pipe and a second emission pipe which separately has an opening installed toward the inner side of the inner pipe, and a second gas supply pipe and a first emission pipe which separately has an opening between the inner pipe and the outer pipe; in which the heat treatment process comprises: a first process, which uses the first gas supply pipe and the first emission pipe to conduct the treatment gas flowing from the inner side of the reaction pipe toward its outer side during which the gas was heated and undergone membrane formation treatment on the surface of treated object under reduced pressure atmosphere; and a second process, which continues the first process and uses the second gas supply pipe and the second emission pipe to conduct the treatment gas flowing from the outer side of the reaction pipe toward its inner side during which the gas was heated and undergone oxidation or diffusion treatment on the surface of the treated object under reduced pressure atmosphere.
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19086293 | 1993-07-03 | ||
JP19425693 | 1993-07-08 | ||
JP19685193 | 1993-07-14 | ||
JP34643693A JP3276495B2 (en) | 1993-07-14 | 1993-12-22 | Atmospheric pressure high temperature processing apparatus and its gas replacement method |
JP34778493A JP3173697B2 (en) | 1993-07-08 | 1993-12-24 | Vertical heat treatment equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
TW250577B true TW250577B (en) | 1995-07-01 |
Family
ID=51401336
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW83106053A TW250577B (en) | 1993-07-03 | 1994-07-02 | A heat treatment process and its device |
Country Status (1)
Country | Link |
---|---|
TW (1) | TW250577B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI463546B (en) * | 2008-04-03 | 2014-12-01 | Tokyo Electron Ltd | Reaction tube and heat processing apparatus for a semiconductor process |
-
1994
- 1994-07-02 TW TW83106053A patent/TW250577B/en not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI463546B (en) * | 2008-04-03 | 2014-12-01 | Tokyo Electron Ltd | Reaction tube and heat processing apparatus for a semiconductor process |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |