TW250577B - A heat treatment process and its device - Google Patents

A heat treatment process and its device

Info

Publication number
TW250577B
TW250577B TW83106053A TW83106053A TW250577B TW 250577 B TW250577 B TW 250577B TW 83106053 A TW83106053 A TW 83106053A TW 83106053 A TW83106053 A TW 83106053A TW 250577 B TW250577 B TW 250577B
Authority
TW
Taiwan
Prior art keywords
pipe
heat treatment
gas
gas supply
emission
Prior art date
Application number
TW83106053A
Other languages
Chinese (zh)
Inventor
Kenichi Yamaga
Yuichi Mikata
Akito Yamamoto
Original Assignee
Tokyo Electron Co
Tokyo Denshi Tohoku Kk
Toshiba Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP34643693A external-priority patent/JP3276495B2/en
Priority claimed from JP34778493A external-priority patent/JP3173697B2/en
Application filed by Tokyo Electron Co, Tokyo Denshi Tohoku Kk, Toshiba Kk filed Critical Tokyo Electron Co
Application granted granted Critical
Publication of TW250577B publication Critical patent/TW250577B/en

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  • Furnace Details (AREA)

Abstract

A heat treatment process, which uses a longitudinal heat treatment device to thermally treat the processed object in which the longitudinal heat treatment device comprises a reaction pipe comprised of two-layer pipe construction which is constituted of inner pipe and outer pipe, a first gas supply pipe and a second emission pipe which separately has an opening installed toward the inner side of the inner pipe, and a second gas supply pipe and a first emission pipe which separately has an opening between the inner pipe and the outer pipe; in which the heat treatment process comprises: a first process, which uses the first gas supply pipe and the first emission pipe to conduct the treatment gas flowing from the inner side of the reaction pipe toward its outer side during which the gas was heated and undergone membrane formation treatment on the surface of treated object under reduced pressure atmosphere; and a second process, which continues the first process and uses the second gas supply pipe and the second emission pipe to conduct the treatment gas flowing from the outer side of the reaction pipe toward its inner side during which the gas was heated and undergone oxidation or diffusion treatment on the surface of the treated object under reduced pressure atmosphere.
TW83106053A 1993-07-03 1994-07-02 A heat treatment process and its device TW250577B (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP19086293 1993-07-03
JP19425693 1993-07-08
JP19685193 1993-07-14
JP34643693A JP3276495B2 (en) 1993-07-14 1993-12-22 Atmospheric pressure high temperature processing apparatus and its gas replacement method
JP34778493A JP3173697B2 (en) 1993-07-08 1993-12-24 Vertical heat treatment equipment

Publications (1)

Publication Number Publication Date
TW250577B true TW250577B (en) 1995-07-01

Family

ID=51401336

Family Applications (1)

Application Number Title Priority Date Filing Date
TW83106053A TW250577B (en) 1993-07-03 1994-07-02 A heat treatment process and its device

Country Status (1)

Country Link
TW (1) TW250577B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI463546B (en) * 2008-04-03 2014-12-01 Tokyo Electron Ltd Reaction tube and heat processing apparatus for a semiconductor process

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI463546B (en) * 2008-04-03 2014-12-01 Tokyo Electron Ltd Reaction tube and heat processing apparatus for a semiconductor process

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees