TW202410953A - Apparatus and method for the wet cleaning of a gas stream - Google Patents

Apparatus and method for the wet cleaning of a gas stream Download PDF

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TW202410953A
TW202410953A TW111146635A TW111146635A TW202410953A TW 202410953 A TW202410953 A TW 202410953A TW 111146635 A TW111146635 A TW 111146635A TW 111146635 A TW111146635 A TW 111146635A TW 202410953 A TW202410953 A TW 202410953A
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cleaning
filler
liquid
air
gas
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TW111146635A
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Chinese (zh)
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提諾 譚尼伯格
賽門 柯納 馬修
派威爾 詹 巴倫
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德商達斯環境專家有限責任公司
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/77—Liquid phase processes
    • B01D53/78—Liquid phase processes with gas-liquid contact
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/14—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by absorption
    • B01D53/18—Absorbing units; Liquid distributors therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
    • B01D46/14—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces arranged in a star shape
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/06—Spray cleaning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D47/00—Separating dispersed particles from gases, air or vapours by liquid as separating agent
    • B01D47/12—Washers with plural different washing sections
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Treating Waste Gases (AREA)
  • Gas Separation By Absorption (AREA)
  • Separation Of Particles Using Liquids (AREA)

Abstract

The invention relates to an apparatus (1), preferably in the form of a wet scrubber, for cleaning gaseous, liquid and solid impurities from a gas stream, and comprising a gas inlet (3), at least one first scrubbing section (6) for cleaning the gas stream with a scrubbing liquid, a gas outlet (5) and gas supply conduits, characterized in that the apparatus (1) further comprises a plurality of gas inlets (3) for different gas streams, where the supply conduits connected to the gas inlets (3) have a continuous gradient to the apparatus (1) and preferably upstream of the gas inlets (3) have a liquid trap (14), and the apparatus (1) comprises a preliminary scrubbing chamber (16) having at least one spraying nozzle (10) and a textile packing (9), and comprises between a first scrubbing section (6) and a second scrubbing section (7) in the connecting conduit or downstream of the scrubbing section (6) at least one textile packing (9) and preferably comprises a spraying nozzle (10), and to a method for offgas cleaning using the apparatus.

Description

氣流溼式清潔裝置及方法 Airflow wet cleaning device and method

本發明是關於用以去除氣流中固態、液態及氣態雜質之氣流溼式清潔裝置及方法。 The present invention relates to a wet air cleaning device and method for removing solid, liquid and gaseous impurities from an air flow.

在半導體產業中，特別是微電子製造領域，會在多個程序中以各種液態化學品依序對晶圓進行清潔。這些程序產生的廢氣必須經由與加工設備相鄰近的溼式洗滌器予以處理，以防止從不同排氣導管所排出的不同氣流相混合後產生不當反應。然而，固態微粒或超細液滴霧氣可能在排氣導管前端或甚至在加工設備內部即已形成。由於這些微粒是自氣相形成，其尺寸通常小於1μm。 In the semiconductor industry, especially in the field of microelectronics manufacturing, wafers are cleaned sequentially with various liquid chemicals in multiple processes. The exhaust gases generated by these processes must be treated by wet scrubbers close to the processing equipment to prevent undesirable reactions caused by mixing of different gas streams discharged from different exhaust ducts. However, solid particles or ultrafine droplet mists may be formed in front of the exhaust duct or even inside the processing equipment. Since these particles are formed from the gas phase, their size is usually less than 1μm.

先前技術中已存在有多種使氣流中微粒沉降的方法及裝置。 There are many methods and devices for settling particles in airflow in the prior art.

例如，US 2008/0271603 A1描述一種空氣清潔系統，其清潔室中所含有的反應媒介水溶液能夠去除氣流中的汙染性微粒及/或氣態汙染物。為去除微粒，此系統並設置入口濾網及出口濾網，用以攔阻氣流中尺寸介於3-100μ與0.3-3μ之間的微粒。 For example, US 2008/0271603 A1 describes an air cleaning system in which a reaction medium aqueous solution contained in a cleaning chamber can remove polluting particles and/or gaseous pollutants in an airflow. To remove particles, the system is also provided with an inlet filter and an outlet filter to block particles with a size between 3-100μ and 0.3-3μ in the airflow.

DE 10 2018 127 371 A1則是關於一種結構緊密的溼式洗滌器，其作用為清潔例如半導體產業廢氣流中的固態、液態及氣態雜質，該洗滌器在其機殼內包含有旁通導管，用以經由至少一清洗段以橋接氣流路 徑。 DE 10 2018 127 371 A1 is about a compact wet scrubber for cleaning solid, liquid and gaseous impurities in waste gas streams, such as those in the semiconductor industry. The scrubber includes a bypass duct in its housing for bridging the gas flow path through at least one cleaning section.

先前技術使用於使氣體中微粒沉降的方式還包括能量需求高的文氏分離器(水刀或狹縫文氏管)及以高電壓運作的電過濾器。但由於氣體清潔必須避免有點火源存在，因而此種過濾器並不適用。 Other methods used in the prior art to precipitate particles in gases include energy-intensive Venturi separators (water jets or slotted Venturi tubes) and electric filters that operate at high voltages. However, since gas cleaning must avoid the presence of ignition sources, such filters are not suitable.

據此，業界需要一種有效且結構緊密、適用於使排放氣體中所含有之超細微粒沉降出來的氣體洗滌器。 Therefore, the industry needs an effective and compact gas scrubber suitable for settling ultrafine particles contained in exhaust gas.

本發明目的可藉由下述裝置及採用此種裝置的方法加以達成。 The purpose of the present invention can be achieved by the following device and method using such device.

一般溼式洗滌器較佳的是具有兩個以逆流原理運作的相鄰清洗段。由於氣體至液相的過渡取決於液體的有效表面積，上述清洗段通常是打造成填充管柱的形式。填充管柱的製作通常是在篩盤上鋪設適當填充元素，或採用以大型結構材料塊裝入管柱中的所謂規則填充方式實現。 Generally, wet scrubbers preferably have two adjacent cleaning sections operating on the countercurrent principle. Since the transition from gas to liquid phase depends on the effective surface area of the liquid, the cleaning sections are usually built in the form of packed columns. The packed columns are usually made by laying appropriate packing elements on the screen disc or by so-called regular packing, in which large blocks of structural material are installed in the column.

特別是在半導體產業的使用上而言，溼式洗滌器外部常會裝設旁通導管，其目的在允許氣流繞過溼式洗滌器，以免在溼式洗滌器拆卸維護時造成排氣中斷的問題。 Especially in the semiconductor industry, a bypass duct is often installed outside the wet scrubber to allow airflow to bypass the wet scrubber to avoid exhaust interruption when the wet scrubber is disassembled for maintenance.

加大清洗液的表面積並延長氣體留置而與液體接觸的時間有助於提升溼式洗滌器中的氣體分離效果。就極細微粒的沉降而言，延長留置時間或氣液接觸時間亦可透過微粒的擴散而改善沉降效果。但在半導體製造中，溼式洗滌器必須鄰近製造單元，其尺寸因此受限，故而上述加大面積或延長時間的方案並不適用。 Increasing the surface area of the cleaning liquid and extending the time that the gas stays in contact with the liquid can help improve the gas separation effect in the wet scrubber. For the sedimentation of very fine particles, extending the residence time or the gas-liquid contact time can also improve the sedimentation effect through the diffusion of particles. However, in semiconductor manufacturing, the wet scrubber must be close to the manufacturing unit, so its size is limited, so the above-mentioned solution of increasing the area or extending the time is not applicable.

本發明係利用增加微粒與表面間的相對速度及縮短填充材 料表面與氣相中所攜微粒之間的距離而達成改善微粒沉降之目的。為此，洗滌器中的一部分可具有較窄截面以增加流速，且較佳的是採用織品填料。此填料經清洗液沖洗。基於慣性，流速提升後可加強較大微粒的沉降。由於阻塞效應，填料孔徑越小，則微粒與液體表面之間的接觸越緊密且越有效。因此織品填料的孔徑較佳的是比氣體洗滌管柱中的填充元素填料更細/更小。氣體洗滌管柱使用的填充元素床較佳的是具有至少90%的自由體積且較佳的是具有至少150m2/m3的比表面積。對照之下，用於改善微粒沉降的較佳織品填料是由纖維或絲線所組成的柱體，所述纖維或絲線可為隨機纖維不織布、編織布或更佳的是針織布。填料較佳的是具有至少85%的自由體積且較佳的是具有至少400m2/m3的比表面積。 The present invention achieves the purpose of improving particle settling by increasing the relative velocity between the particles and the surface and shortening the distance between the surface of the packing material and the particles carried in the gas phase. To this end, a portion of the scrubber may have a narrower cross-section to increase the flow rate, and preferably a fabric filler is used. This filler is flushed with a cleaning liquid. Based on inertia, the increase in flow rate can enhance the sedimentation of larger particles. Due to the blocking effect, the smaller the pore size of the filler, the closer and more effective the contact between the particles and the liquid surface. Therefore, the pore size of the fabric filler is preferably finer/smaller than the filler element filler in the gas scrubbing column. The filler element bed used in the gas scrubbing column preferably has a free volume of at least 90% and preferably has a specific surface area of at least 150m2 / m3 . In contrast, a preferred fabric filler for improving particle settling is a column composed of fibers or filaments, which may be a random fiber nonwoven, a woven fabric, or more preferably a knitted fabric. The filler preferably has a free volume of at least 85% and preferably has a specific surface area of at least 400 m2 / m3 .

比表面積的定義是填充元素的幾何表面積，或床體或填料中纖維或絲線的表面積。若Ap為填充元素表面積或纖維表面積，Vb為床體或填料體積，則比表面積為Ap/Vb。自由體積的定義是床體或填料體積中未受填充元素或纖維所填充的部分。若Vp為填充元素體積且Vb為整個床體的體積，則自由體積定義為(Vb-Vp)/Vb。纖維或絲線同理類推。此等參數(比面積、空置部分)的使用可參考例如H.T.El-Dessouky等人在Chemical Engineering and Processing 39(2000)129-139中的定義。 The definition of specific surface area is the geometric surface area of the packing elements, or the surface area of the fibers or filaments in the bed or packing. If Ap is the surface area of the packing elements or the fiber surface area, and Vb is the volume of the bed or packing, then the specific surface area is Ap / Vb . The definition of free volume is the part of the bed or packing volume that is not filled with packing elements or fibers. If Vp is the volume of the packing elements and Vb is the volume of the entire bed, then the free volume is defined as ( Vb - Vp )/ Vb . The same applies to fibers or filaments. The use of these parameters (specific area, vacant part) can refer to the definitions of HT El-Dessouky et al. in Chemical Engineering and Processing 39 (2000) 129-139, for example.

但縮減孔徑卻可能增加填料上壓力損失的風險，且可能發生液體留滯在填料內的問題。因此上述尺寸較適合於洗滌器中氣體與清洗同向(向下)流動的部分。 However, reducing the pore size may increase the risk of pressure loss on the packing and may cause the problem of liquid being retained in the packing. Therefore, the above dimensions are more suitable for the part of the scrubber where the gas and cleaning flow in the same direction (downward).

若欲避免微粒排放入周遭空氣，最有效的對策莫過於防止其 形成。因此，最好能夠在各種氣流彼此混合並相互作用而產生微粒形成物質之前，將製程中各種來源的氣體分別供應至洗滌器，並使其分別與清洗液接觸。 The most effective way to prevent particulate matter from being emitted into the ambient air is to prevent it from forming. Therefore, it is best to supply the gases from various sources in the process to the scrubber separately and allow them to come into contact with the cleaning liquid separately before the various gas streams mix and interact with each other to produce particle-forming substances.

因此，本申請案之洗滌器較佳的是配備有模組式的前板或前框，其可輕易適應於個別情況，亦即個別製造地點待連接的廢氣導管數量及大小。此前板是裝設於洗滌器本體上，連接至初步洗滌室。前板上設有連接廢氣供應管路的進氣口。所述進氣口較佳的是以一傾斜度進入洗滌器，以便注入至導管中的液體能夠回流至洗滌器。在進氣口區可設有噴嘴，用於將清洗液噴灑入進氣口。如此一來，甚至能夠在來自不同供應管路的氣流混合前將水溶性氣體的濃度降低。 Therefore, the scrubber of the present application is preferably equipped with a modular front plate or front frame, which can be easily adapted to the individual situation, that is, the number and size of exhaust gas ducts to be connected at the individual manufacturing site. This front plate is mounted on the scrubber body and connected to the preliminary scrubbing chamber. The front plate is provided with an air inlet connected to the exhaust gas supply pipeline. The air inlet preferably enters the scrubber at an inclination so that the liquid injected into the duct can flow back to the scrubber. In the air inlet area, a nozzle can be provided for spraying the cleaning liquid into the air inlet. In this way, the concentration of water-soluble gases can even be reduced before the air flows from different supply pipelines are mixed.

由於上游程序，特別是在半導體製造中，通常為溼式程序，因此液體可能凝結在從加工設備通往洗滌器的供氣導管壁面上，甚至可能有液體經由供氣導管自加工設備改道流出，例如刻意沖入導管以將固態沉積物沖出的清水。因此，所述導管較佳的是在沒有任何「下陷點」的情況下，以連續傾斜度從加工設備進入洗滌器。為防止這些可能亦含有反應性化學物質的液體進入洗滌器並進入清洗液而破壞洗滌器效果，液阱可設置在供應管路及/或導管上略較進氣口上游之處。這些液阱的形式可例如是導管上的凹陷，例如可收集液體的貯液槽或筒罐。另外，在凹陷的上游或下游處可於管壁上設置凸出，以打散或阻擋液體，以免經由沿供應管路流下的液體噴射越過液阱的凹陷。液阱於下端處可設置排水孔，經由氣體屏障導入用以收集廢棄液體的適當收集容器或系統。此種液阱亦有助於在初步洗滌室非使用狀態時，例如，啟用繞過洗滌器的旁通管而將通往洗滌器的 連結關閉時，防止液體進入初步洗滌室。上述設計還能夠防止液位升高至超過最大容許液位而阻塞氣體通道，而能夠在洗滌器關閉或洗滌器維護期間對加工工具進行抽吸。 Since upstream processes, especially in semiconductor manufacturing, are usually wet processes, liquids may condense on the walls of the air supply duct leading from the processing equipment to the scrubber, and liquids may even be diverted from the processing equipment through the air supply duct, such as clean water that is deliberately flushed into the duct to flush out solid deposits. Therefore, the duct preferably enters the scrubber from the processing equipment with a continuous slope without any "sag points". In order to prevent these liquids, which may also contain reactive chemicals, from entering the scrubber and entering the cleaning liquid and destroying the scrubber effect, liquid traps can be arranged in the supply line and/or duct slightly upstream of the air inlet. These liquid traps can be in the form of depressions in the duct, such as liquid storage tanks or cylinders that can collect liquids. In addition, projections may be provided on the pipe wall upstream or downstream of the depression to break up or block the liquid from being ejected over the depression of the liquid trap by the liquid flowing down the supply line. The liquid trap may be provided with a drain hole at the lower end, which is led through a gas barrier into a suitable collection container or system for collecting waste liquid. Such a liquid trap also helps to prevent liquid from entering the preliminary washing chamber when the preliminary washing chamber is not in use, for example, when the connection to the scrubber is closed by activating a bypass pipe around the scrubber. The above design can also prevent the liquid level from rising to a level exceeding the maximum allowable liquid level and blocking the gas channel, and can be used to pump the processing tool when the scrubber is closed or during scrubber maintenance.

於洗滌器運作過程中，洗滌器中的填料或液滴分離器可能因形成的固體或生物成長而阻塞，因此必須針對這些組件進行清潔。為便於清潔作業，可設置繞經洗滌器的旁通管，以便在氣體無法順利流經洗滌器時或必須將洗滌器拆開進行維護時，加工設備可繼續運作或至少可經由廢氣導管對加工設備進行抽吸。 During the operation of the scrubber, the packing or droplet separator in the scrubber may become blocked due to the formation of solids or biological growth, and these components must be cleaned. To facilitate the cleaning operation, a bypass pipe around the scrubber can be provided so that if the gas cannot flow smoothly through the scrubber or the scrubber has to be disassembled for maintenance, the process equipment can continue to operate or at least be evacuated via the waste gas duct.

上述旁通管與通過洗滌器路徑之間的切換可利用如DE 10 2018 127 371 A1中所描述的閥件加以實現。若所用的模組式前板在初步洗滌室包含複數供應管路，則可選用具有兩組旁通閥的形式。在此情況下，第一旁通閥件設於初步洗滌室下方，第二閥件設於初步洗滌室上方。兩個閥件較佳的是連接同一驅動裝置，以確保同步切換。採用兩個分離閥件切換的設計有助於在切換過程中對初步洗滌室內的壓力進行更穩定的調節。 The switching between the bypass pipe and the path through the scrubber can be realized by means of valves as described in DE 10 2018 127 371 A1. If the modular front plate used contains multiple supply lines in the preliminary washing chamber, a form with two sets of bypass valves can be selected. In this case, the first bypass valve is arranged below the preliminary washing chamber and the second valve is arranged above the preliminary washing chamber. The two valves are preferably connected to the same drive device to ensure synchronous switching. The design of switching with two separate valves helps to more stably regulate the pressure in the preliminary washing chamber during the switching process.

此外，為調節進入洗滌器的壓力，在一較佳實施例中，可於旁通導管內設置調節風扇或調節節流閥。 In addition, in order to adjust the pressure entering the scrubber, in a preferred embodiment, a regulating fan or a regulating throttle valve can be installed in the bypass duct.

1:裝置 1:Device

2:前板 2: Front panel

3:進氣口 3: Air intake

4:旁通導管 4: Bypass pipe

5:出氣口 5: Air outlet

6:清洗段 6: Cleaning section

7:清洗段 7: Cleaning section

8:填料 8: Filling

9:填料 9: Filling

10:噴嘴 10: Nozzle

11:導引元素 11: Guiding elements

12:第一清洗液截液槽 12: First cleaning liquid interception tank

13:第二清洗液截液槽 13: Second cleaning liquid interception tank

14:液阱 14: Liquid trap

15:液阱排水孔 15: Liquid trap drain hole

16:初步洗滌室 16: Preliminary washing room

17:差別壓力測量 17: Differential pressure measurement

18:差別壓力測量連接器 18: Differential pressure measurement connector

19:壓力測量裝置 19: Pressure measuring device

20:截止閥 20: Stop valve

21:風扇 21: Fan

22:沖洗氣體連接 22: Flushing gas connection

23:液滴分離器(除霧器) 23: Droplet separator (demister)

24:供氣導管 24: Air supply duct

25:上游加工設備 25: Upstream processing equipment

圖1至圖4概要繪示本發明多種實施例。各圖面中是以相同符號標示相同組件或具有相同功效之組件。 Figures 1 to 4 schematically illustrate various embodiments of the present invention. The same symbols are used to indicate the same components or components with the same functions in each figure.

以下將藉由範例實施例進一步描述本發明，但本發明並不以此等實施例為限。於上文所述及將於下文所述的本發明裝置及方法特徵均 可自由組合，例如單獨實施或以二或多項特徵結合實施，不限於任何特定實施例。 The present invention will be further described below by means of exemplary embodiments, but the present invention is not limited to such embodiments. The features of the device and method of the present invention described above and to be described below can be freely combined, for example, implemented alone or in combination with two or more features, and are not limited to any specific embodiment.

依據本發明，洗滌器外殼較佳的是以不鏽鋼製成，且在內側設有防蝕層。此實施例的優點包括：能夠增加機械穩定度；與塑膠材料相較可降低運送過程中的受損風險，特別是在外部溫度較低時；供氣導管連接時導入負載不會危及功能；對於由熱處理廢氣帶來或因洗滌器中反應產生的熱度不具溫度敏感性。 According to the invention, the outer shell of the scrubber is preferably made of stainless steel and provided with an anti-corrosion layer on the inside. Advantages of this embodiment include: increased mechanical stability; reduced risk of damage during transportation compared to plastic materials, especially when the external temperature is low; introduction of loads when connecting the air supply duct will not endanger the function; and no temperature sensitivity to heat brought by heat treatment exhaust gas or generated by reactions in the scrubber.

本發明洗滌器包含旁通導管，其可確保即使在洗滌器維護或發生故障時，仍可對上游加工設備進行抽吸。 The scrubber of the present invention includes a bypass conduit that ensures that upstream processing equipment can still be pumped even when the scrubber is undergoing maintenance or malfunctions.

此外，依據本發明，以下為較佳實施例： In addition, according to the present invention, the following are preferred embodiments:

兩個清洗段間之連接導管是自第一清洗段上端向下連通至第二清洗段下端。此連接導管的截面小於清洗段管柱的截面，因此產生較高流速。此連接導管中設有填料(例如，填充元素、結構式填料、編織布)。 The connecting conduit between the two cleaning sections is connected from the upper end of the first cleaning section to the lower end of the second cleaning section. The cross section of this connecting conduit is smaller than the cross section of the cleaning section pipe column, so a higher flow rate is generated. The connecting conduit is provided with a filler (e.g., a filler element, a structured filler, a woven cloth).

填料上方設有噴嘴，用以噴出清洗液以潤溼填料。由於氣體與清洗液是沿同一方向流動，清洗液不會留滯在填料中。因而此處填料孔徑可小於清洗段。對氣體沉降而言，同向流動效率較差，但對微粒的較佳沉降而言，較高氣體速度及填料方向改變卻是有利條件。因此若採用較小孔徑及/或較密填料，並將導管方向朝下，雖然填料體積較小且氣體在填料中的停留時間較短，卻有助於改善微粒沉降。 There is a nozzle above the packing to spray the cleaning liquid to moisten the packing. Since the gas and the cleaning liquid flow in the same direction, the cleaning liquid will not be retained in the packing. Therefore, the pore size of the packing here can be smaller than the cleaning section. For gas sedimentation, the efficiency of co-directional flow is relatively poor, but for better sedimentation of particles, higher gas velocity and change of packing direction are favorable conditions. Therefore, if a smaller pore size and/or denser packing is used, and the guide tube is directed downward, although the packing volume is smaller and the gas stays in the packing for a shorter time, it helps to improve particle sedimentation.

本發明溼式洗滌器之裝置1(參見圖式2)具有複數分離的廢氣進氣口3，以防止來自不同處理室的廢氣相互混合反應而形成微粒。供氣導管24自上游加工設備25以連續傾斜度通往裝置1的進氣口3。供氣導管24 可包含設於進氣口3上游處的液阱14。在進氣口3中或初步洗滌室16中，緊接於進氣口進入初步洗滌室的開口之後設有噴嘴10，用以迅速降低廢氣中水溶性成分的濃度，如此可減少微粒形成的比率。初步洗滌室16下端同樣可設置填料9，由來自初步洗滌室16噴嘴10的清洗液噴溼。此填料9的作用與設置在清洗段6與7之間或清洗段下游處連接導管中的填料相似，主要用於微粒沉降。 The device 1 of the wet scrubber of the present invention (see Figure 2) has a plurality of separate exhaust gas inlets 3 to prevent exhaust gases from different processing chambers from mixing and reacting with each other to form particles. The air supply duct 24 leads to the air inlet 3 of the device 1 at a continuous inclination from the upstream processing equipment 25. The air supply duct 24 may include a liquid trap 14 arranged upstream of the air inlet 3. In the air inlet 3 or in the preliminary washing chamber 16, a nozzle 10 is provided immediately after the opening of the air inlet into the preliminary washing chamber to quickly reduce the concentration of water-soluble components in the exhaust gas, thereby reducing the rate of particle formation. The lower end of the preliminary washing chamber 16 can also be provided with a filler 9, which is wetted by the cleaning liquid from the nozzle 10 of the preliminary washing chamber 16. The function of this filler 9 is similar to that of the filler disposed between the cleaning sections 6 and 7 or in the connecting conduit downstream of the cleaning section, and is mainly used for particle sedimentation.

若用於微粒分離的填料9細緻，設備容易產生較大的壓力損失。且使用細緻填料9時，沉積物也可能使得設備更快發生阻塞，因此必須對清洗段及微粒沉降填料前後的壓差進行監控以確保設備可靠性能。因此，較佳的是在初步洗滌室16與第二清洗段之出氣口5之間設置一差別壓力測量17。 If the filler 9 used for particle separation is fine, the equipment is prone to greater pressure loss. When using fine filler 9, the sediment may also cause the equipment to clog more quickly, so the pressure difference before and after the cleaning section and the particle sedimentation filler must be monitored to ensure the reliable performance of the equipment. Therefore, it is better to set a differential pressure measurement 17 between the initial cleaning chamber 16 and the air outlet 5 of the second cleaning section.

若來自上游程序的微粒負載較高及/或若反應性氣體濃度高，可能導致初步洗滌室中壓力測量的測量連接阻塞。在此情況下，微粒可能阻塞測量開口並影響壓力測量準確度。因此測量連接可配備有一沖洗氣體連接(22)，經此供入例如乾空氣或氮氣，以防止微粒進入連接。但因此，含鹽洗滌溶液亦可能在連接管上乾涸，進而影響壓力測量結果。故而測量導管必須偶爾清潔。未免於清潔時中斷上游程序，在此設置兩組可交替使用的壓力測量連接器18。為此，壓力測量裝置19與上述兩組連接器18之間的連接導管採用分支設計且設有兩個截止閥20。在清潔其中一組測量連接時，可將對應測量導管分支關閉後拆下，由另一組連接繼續壓力測量任務，無需中斷。 If the particle load from the upstream process is high and/or if the reactive gas concentration is high, this can lead to a blockage of the measuring connection for the pressure measurement in the preliminary washing chamber. In this case, the particles can block the measuring opening and affect the pressure measurement accuracy. The measuring connection can therefore be equipped with a flushing gas connection (22) through which, for example, dry air or nitrogen is fed to prevent particles from entering the connection. However, as a result, the saline washing solution can also dry up on the connection tube and thus affect the pressure measurement result. The measuring line must therefore be cleaned occasionally. In order to avoid interrupting the upstream process during cleaning, two sets of pressure measurement connectors 18 that can be used alternately are provided. To this end, the connecting pipe between the pressure measuring device 19 and the two sets of connectors 18 is designed with branches and two stop valves 20. When cleaning one set of measuring connections, the corresponding measuring pipe branch can be closed and removed, and the pressure measurement task can be continued by the other set of connections without interruption.

為補償在清洗段及微粒沉降填料處產生的壓力損失，設備可 於清洗段下游及液滴分離器(除霧器)23下游設置整合式風扇21。設備入口處的壓力可用於調節風扇21功率，以維持入口處恆定壓力。調節的風扇21在高功率時耗用能量多於低功率。設備壓力損失亦取決於填料8、9的潤溼，特別是用於微粒沉降的填料9較細時。為減少風扇21能耗，可對細粒填料9的潤溼加以調節，使潤溼程度在目前上游程序並未產生微粒時降至最低。 To compensate for the pressure loss in the cleaning section and the particle settling filler, the device can be equipped with an integrated fan 21 downstream of the cleaning section and downstream of the droplet separator (demister) 23. The pressure at the inlet of the device can be used to adjust the power of the fan 21 to maintain a constant pressure at the inlet. The regulated fan 21 consumes more energy at high power than at low power. The pressure loss of the device also depends on the wetting of the fillers 8 and 9, especially when the filler 9 used for particle settling is finer. To reduce the energy consumption of the fan 21, the wetting of the fine-particle filler 9 can be adjusted to minimize the wetting degree when no particles are generated by the current upstream process.

為此，廢汙處置設備可自上游加工設備接收訊號。這些訊號可提供關於加工設備狀態及/或個別加工室狀態的資訊。廢汙處置設備可基於這些訊號決定是否需要改善微粒沉降。所述訊號或可提供微粒沉降要求條件。上述訊號的傳輸可例如經由開關接點或例如乙太網路或RS485等習用序列介面。 For this purpose, the waste disposal device can receive signals from upstream processing equipment. These signals can provide information about the status of the processing equipment and/or the status of individual processing chambers. Based on these signals, the waste disposal device can decide whether particle settling needs to be improved. The signals may provide particle settling requirements. The transmission of the above signals can be, for example, via switch contacts or a conventional serial interface such as Ethernet or RS485.

上述訊號亦可用於在不需處置廢氣及微粒的特定時間內傳輸資訊。因此加工設備可基於這些資訊讓廢氣改道通過旁通管，藉此節省用於泵件及風扇的能源。同樣可利用訊號因應加工設備要求的不同而改變廢汙處置設備入口的壓力。 The above signal can also be used to transmit information during specific times when waste gas and particulate treatment is not required. Therefore, the processing equipment can reroute the waste gas through a bypass pipe based on this information, thereby saving energy used for pumps and fans. The signal can also be used to change the pressure at the inlet of the waste treatment equipment according to the different requirements of the processing equipment.

基於安全考量，廢汙處置設備通常亦會以類似方式對加工設備回傳說明設備狀態的訊號，例如告知設備處於全功能營運狀態，或設備正在進行維護，或在監控參數超出指定範圍時提供警告或警報。 For safety reasons, waste disposal equipment will usually send back signals to processing equipment in a similar manner to indicate the equipment's status, such as informing that the equipment is in full functional operation, or that the equipment is undergoing maintenance, or providing warnings or alarms when monitoring parameters exceed specified ranges.

因此，本發明包含一種用於清潔氣流中氣態、液態及固態雜質之裝置，較佳者為一溼式洗滌器之形式，如以上說明及所附請求項中所述者。 The present invention therefore comprises an apparatus for cleaning a gas stream from gaseous, liquid and solid impurities, preferably in the form of a wet scrubber, as hereinbefore described and appended to the claims.

本發明進一步包含一種使用本發明裝置清潔一氣流中氣態、液態及固態雜質之方法，且最後包含本發明裝置於所稱方法中或用於 清潔一氣流中之氣態、液態及固態雜質之用途。 The invention further comprises a method for cleaning a gaseous, liquid and solid impurities in a gas stream using the device of the invention and finally comprises the use of the device of the invention in the said method or for cleaning a gaseous, liquid and solid impurities in a gas stream.

1:裝置 1:Device

2:前板 2: Front panel

3:進氣口 3: Air intake

5:出氣口 5: Air outlet

6:清洗段 6: Cleaning section

7:清洗段 7: Cleaning section

8:填料 8: Filling

9:填料 9: Filling

10:噴嘴 10: Nozzle

12:第一清洗液截液槽 12: First cleaning liquid interception tank

13:第二清洗液截液槽 13: Second cleaning liquid interception tank

16:初步洗滌室 16: Preliminary washing room

Claims (12)

一種用於清潔一氣流中之氣態、液態及固態雜質之裝置(1)，較佳者為一溼式洗滌器之形式，其包含： A device (1) for cleaning gaseous, liquid and solid impurities in an air stream, preferably in the form of a wet scrubber, comprising: 一進氣口(3)； An air inlet (3); 用於以一清洗液清潔該氣流之至少一第一清洗段(6)； At least one first cleaning section (6) for cleaning the air flow with a cleaning liquid; 一出氣口(5)；及 an air outlet (5); and 複數條供氣導管(24)； A plurality of air supply ducts (24); 其特徵為：該裝置(1)進一步包含供不同氣流進入之複數個進氣口(3)，其中連結該等進氣口(3)之該等供氣導管(24)具有一通往該裝置(1)之連續傾斜度，且較佳者該等進氣口(3)之上游具有一液阱(14)，且該裝置(1)包含一具有至少一個噴嘴(10)之初步洗滌室(16)，且該裝置(1)包含設置在該第一個清洗段(6)與第二個清洗段(7)間之一連接導管中或該第一個清洗段(6)下游之至少一填料(9)，該填料之比表面積為至少400m2/m3，且其形式較佳者為一織品材質之填料，且該裝置(1)較佳者包含一噴嘴(10)。 The device (1) further comprises a plurality of air inlets (3) for different air flows, wherein the air supply ducts (24) connecting the air inlets (3) have a continuous inclination leading to the device (1), and preferably a liquid trap (14) is provided upstream of the air inlets (3), and the device (1) comprises a preliminary washing chamber (16) having at least one nozzle (10), and the device (1) comprises at least one filler (9) arranged in a connecting duct between the first washing section (6) and the second washing section (7) or downstream of the first washing section (6), the filler having a specific surface area of at least 400 m2 / m3 and preferably in the form of a filler made of a textile material, and the device (1) preferably comprises a nozzle (10). 依據請求項1項之裝置(1)，其特徵為：該氣流是自該第一個清洗段(6)之上端經由該連接導管中該較佳者為織品之填料(9)向下流至該第二個清洗段(7)之下端或該出氣口(5)。 The device (1) according to claim 1 is characterized in that the air flow flows downward from the upper end of the first cleaning section (6) through the filler (9) in the connecting duct, which is preferably a fabric, to the lower end of the second cleaning section (7) or the air outlet (5). 依據請求項1項之裝置(1)，其特徵為：該裝置(1)包含一設有進氣口(3)之可替換前板(2)。 The device (1) according to claim 1 is characterized in that the device (1) comprises a replaceable front plate (2) provided with an air inlet (3). 依據請求項1項之裝置(1)，其特徵為：該連接導管中該較佳者為織品之填料(9)之孔徑小於該清洗段(6)或該等清洗段(6)及(7)中該填充元素填料(8)之孔徑。 The device (1) according to claim 1 is characterized in that the pore size of the filler (9) which is preferably a fabric in the connecting conduit is smaller than the pore size of the filler element (8) in the cleaning section (6) or the cleaning sections (6) and (7). 依據請求項1項之裝置(1)，其特徵為：該液阱(14)設有一排水孔(15)。 The device (1) according to claim 1 is characterized in that: the liquid trap (14) is provided with a drainage hole (15). 依據請求項1項之裝置(1)，其特徵為：該裝置(1)配備有一位於清洗段(6)、(7)下游之整合式風扇及一液滴分離器。 The device (1) according to claim 1 is characterized in that: the device (1) is equipped with an integrated fan and a droplet separator downstream of the cleaning section (6) and (7). 依據請求項1項之裝置(1)，其特徵為：在該初步洗滌室(16)與該最後清洗段(7)的出口之間，該裝置(1)安排有一用於差別壓力測量(17)之設備。 The device (1) according to claim 1 is characterized in that: between the outlet of the preliminary washing chamber (16) and the outlet of the final washing section (7), the device (1) is arranged with a device for differential pressure measurement (17). 依據請求項1項之裝置(1)，其特徵為：該初步洗滌室(16)包含兩組可替換使用之差別壓力測量(17)連接器(18)。 The device (1) according to claim 1 is characterized in that the preliminary washing chamber (16) comprises two sets of interchangeable differential pressure measurement (17) connectors (18). 依據請求項1項之裝置(1)，其特徵為：該初步洗滌室(16)中同樣包含一填料(9)，其形式較佳者為一織品之填料，其比表面積為至少400m2/m3。 The device (1) according to claim 1 is characterized in that the preliminary washing chamber (16) also contains a filler (9), preferably in the form of a textile filler with a specific surface area of at least 400 m2 / m3 . 一種用於清潔一氣流中氣態、液態及固態雜質之方法，其特徵為：係使用依據請求項1至9中任一項之清潔裝置(1)。 A method for cleaning gaseous, liquid and solid impurities in a gas stream, characterized by using a cleaning device (1) according to any one of claims 1 to 9. 一種將依據請求項1至9中任一項之裝置(1)使用在依據請求項10之方法中之用途。 A use of a device (1) according to any one of claims 1 to 9 in a method according to claim 10. 一種將依據請求項1至9中任一項之裝置(1)使用在清潔一氣流中氣態、液態及固態雜質之用途。 A method of using a device (1) according to any one of claims 1 to 9 to clean gaseous, liquid and solid impurities in an air flow.
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